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TW201613022A - Substrate processing device - Google Patents

Substrate processing device

Info

Publication number
TW201613022A
TW201613022A TW104120935A TW104120935A TW201613022A TW 201613022 A TW201613022 A TW 201613022A TW 104120935 A TW104120935 A TW 104120935A TW 104120935 A TW104120935 A TW 104120935A TW 201613022 A TW201613022 A TW 201613022A
Authority
TW
Taiwan
Prior art keywords
substrate
supporting
supporting frames
chamber
conveying
Prior art date
Application number
TW104120935A
Other languages
Chinese (zh)
Other versions
TWI582888B (en
Inventor
Masatoshi Onoda
Original Assignee
Nissin Ion Equipment Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissin Ion Equipment Co Ltd filed Critical Nissin Ion Equipment Co Ltd
Publication of TW201613022A publication Critical patent/TW201613022A/en
Application granted granted Critical
Publication of TWI582888B publication Critical patent/TWI582888B/en

Links

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)

Abstract

The present invention provides a substrate processing device capable of supporting a large-sized supporting fame stably, preventing forming a large capacity of a gate chamber due to the large size of the supporting frame, and reducing the time for switching atmosphere of the gate chamber. The substrate processing device includes: a processing chamber for processing a substrate; a gate chamber for receiving the substrate; a conveying chamber between the processing chamber and the gate chamber for conveying the substrate; two supporting frames arranged in the processing chamber for holding different substrates; a supporting frame moving mechanism for moving the two supporting frames between a substrate receiving position and a substrate processing position, wherein the two supporting frames are arranged vertically at the substrate receiving position; and a substrate conveying mechanism for conveying the substrates received in the gate chamber in a vertical arrangement to the two supporting frames at the substrate receiving position. In addition, the supporting frame moving mechanism has two linear motion mechanisms for moving the supporting frames and a rotating mechanism for rotating the two supporting frames. In addition, the linear motion mechanism supports the supporting frames at the positions that are closer to an inner side than the two ends of the moving direction of the supporting frames.
TW104120935A 2014-09-19 2015-06-29 Substrate processing device TWI582888B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014191994A JP6086254B2 (en) 2014-09-19 2014-09-19 Substrate processing equipment

Publications (2)

Publication Number Publication Date
TW201613022A true TW201613022A (en) 2016-04-01
TWI582888B TWI582888B (en) 2017-05-11

Family

ID=55661991

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104120935A TWI582888B (en) 2014-09-19 2015-06-29 Substrate processing device

Country Status (4)

Country Link
JP (1) JP6086254B2 (en)
KR (1) KR101885124B1 (en)
CN (1) CN106206232B (en)
TW (1) TWI582888B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112239069A (en) * 2019-07-19 2021-01-19 亚智科技股份有限公司 Forked substrate conveying device and method thereof
JP7163944B2 (en) * 2020-09-15 2022-11-01 日新イオン機器株式会社 Substrate holder and ion implanter

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63175326A (en) * 1987-01-14 1988-07-19 Nissin Electric Co Ltd Ion processing device
JP3239779B2 (en) * 1996-10-29 2001-12-17 日新電機株式会社 Substrate processing apparatus and substrate processing method
KR19980033262U (en) * 1996-12-06 1998-09-05 박병재 Automobile front side member reinforcement structure
JP4083306B2 (en) * 1998-08-28 2008-04-30 松下電器産業株式会社 Rinsing method after plasma treatment
JP2005505146A (en) * 2001-10-12 2005-02-17 ユナキス・バルツェルス・アクチェンゲゼルシャフト Structure element manufacturing method and ultra-vacuum CVD reactor
CN101894779B (en) * 2003-08-29 2013-05-01 交叉自动控制公司 A method and apparatus for semiconductor processing
US8668422B2 (en) * 2004-08-17 2014-03-11 Mattson Technology, Inc. Low cost high throughput processing platform
JP4020124B2 (en) * 2005-02-25 2007-12-12 日新イオン機器株式会社 Ion beam irradiation equipment
JP2008172160A (en) * 2007-01-15 2008-07-24 Dainippon Screen Mfg Co Ltd Device and method for processing substrate
DE102007052182B4 (en) * 2007-10-31 2009-07-02 Grenzebach Maschinenbau Gmbh Apparatus and method for reacting shock-sensitive glass plates in clean rooms
JP5423205B2 (en) * 2008-08-29 2014-02-19 東京エレクトロン株式会社 Deposition equipment
JP5037551B2 (en) * 2009-03-24 2012-09-26 東京エレクトロン株式会社 Substrate replacement mechanism and substrate replacement method
JP4766156B2 (en) * 2009-06-11 2011-09-07 日新イオン機器株式会社 Ion implanter
KR101381832B1 (en) * 2009-07-14 2014-04-18 캐논 아네르바 가부시키가이샤 Substrate processing apparatus
JP5525399B2 (en) * 2010-09-16 2014-06-18 東京エレクトロン株式会社 Transport device, substrate processing system, and attitude control mechanism
JP5387622B2 (en) * 2011-06-17 2014-01-15 株式会社安川電機 Transfer robot
JP2013069874A (en) * 2011-09-22 2013-04-18 Tokyo Electron Ltd Substrate processing system, substrate transfer method, program and computer storage medium
JP5993625B2 (en) * 2012-06-15 2016-09-14 株式会社Ｓｃｒｅｅｎホールディングス Substrate reversing apparatus and substrate processing apparatus
JP6094256B2 (en) * 2013-02-22 2017-03-15 日新イオン機器株式会社 Ion beam irradiation equipment

Also Published As

Publication number Publication date
KR101885124B1 (en) 2018-08-03
JP6086254B2 (en) 2017-03-01
CN106206232A (en) 2016-12-07
TWI582888B (en) 2017-05-11
KR20160034178A (en) 2016-03-29
CN106206232B (en) 2017-10-13
JP2016063166A (en) 2016-04-25

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