TW201522528A - Pigment dispersion for black matrix, and pigment-dispersed resist composition for black matrix containing same - Google Patents
Pigment dispersion for black matrix, and pigment-dispersed resist composition for black matrix containing same Download PDFInfo
- Publication number
- TW201522528A TW201522528A TW103135764A TW103135764A TW201522528A TW 201522528 A TW201522528 A TW 201522528A TW 103135764 A TW103135764 A TW 103135764A TW 103135764 A TW103135764 A TW 103135764A TW 201522528 A TW201522528 A TW 201522528A
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- TW
- Taiwan
- Prior art keywords
- black matrix
- pigment dispersion
- pigment
- group
- epoxy compound
- Prior art date
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- 239000000049 pigment Substances 0.000 title claims abstract description 118
- 239000011159 matrix material Substances 0.000 title claims abstract description 92
- 239000006185 dispersion Substances 0.000 title claims abstract description 78
- 239000000203 mixture Substances 0.000 title claims abstract description 41
- 150000001875 compounds Chemical class 0.000 claims abstract description 76
- 239000006229 carbon black Substances 0.000 claims abstract description 59
- 239000004593 Epoxy Substances 0.000 claims abstract description 50
- 230000002378 acidificating effect Effects 0.000 claims abstract description 45
- 239000002270 dispersing agent Substances 0.000 claims abstract description 33
- 239000002904 solvent Substances 0.000 claims abstract description 18
- 229920005989 resin Polymers 0.000 claims description 22
- 239000011347 resin Substances 0.000 claims description 22
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical group C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 claims description 16
- 239000003999 initiator Substances 0.000 claims description 11
- 235000010290 biphenyl Nutrition 0.000 claims description 8
- 239000004305 biphenyl Substances 0.000 claims description 8
- ZMESHQOXZMOOQQ-UHFFFAOYSA-N 1-(naphthalen-1-ylmethyl)naphthalene Chemical group C1=CC=C2C(CC=3C4=CC=CC=C4C=CC=3)=CC=CC2=C1 ZMESHQOXZMOOQQ-UHFFFAOYSA-N 0.000 claims description 6
- 125000006840 diphenylmethane group Chemical group 0.000 claims description 6
- 235000019241 carbon black Nutrition 0.000 description 55
- -1 epoxy acrylate compound Chemical class 0.000 description 32
- 239000002253 acid Substances 0.000 description 28
- 239000003960 organic solvent Substances 0.000 description 26
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 15
- 239000011248 coating agent Substances 0.000 description 15
- 238000000576 coating method Methods 0.000 description 15
- 125000003277 amino group Chemical group 0.000 description 13
- 230000000052 comparative effect Effects 0.000 description 13
- 238000009413 insulation Methods 0.000 description 13
- 229920000642 polymer Polymers 0.000 description 11
- 239000000463 material Substances 0.000 description 10
- 241000557626 Corvus corax Species 0.000 description 9
- 125000000524 functional group Chemical group 0.000 description 9
- 229920002120 photoresistant polymer Polymers 0.000 description 9
- 229920000728 polyester Polymers 0.000 description 9
- 150000002148 esters Chemical class 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 239000000178 monomer Substances 0.000 description 8
- KPSSIOMAKSHJJG-UHFFFAOYSA-N neopentyl alcohol Chemical compound CC(C)(C)CO KPSSIOMAKSHJJG-UHFFFAOYSA-N 0.000 description 8
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 8
- 239000007787 solid Substances 0.000 description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 7
- 239000007795 chemical reaction product Substances 0.000 description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 6
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 5
- 239000000654 additive Substances 0.000 description 5
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 5
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 5
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 4
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 4
- 238000009835 boiling Methods 0.000 description 4
- 229920001577 copolymer Polymers 0.000 description 4
- 239000003822 epoxy resin Substances 0.000 description 4
- XLLIQLLCWZCATF-UHFFFAOYSA-N ethylene glycol monomethyl ether acetate Natural products COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 4
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- LPEKGGXMPWTOCB-UHFFFAOYSA-N methyl 2-hydroxypropionate Chemical compound COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 229920000647 polyepoxide Polymers 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 3
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 3
- 230000002776 aggregation Effects 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- GCTPMLUUWLLESL-UHFFFAOYSA-N benzyl prop-2-enoate Chemical compound C=CC(=O)OCC1=CC=CC=C1 GCTPMLUUWLLESL-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 239000006059 cover glass Substances 0.000 description 3
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- HSDFKDZBJMDHFF-UHFFFAOYSA-N methyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OC HSDFKDZBJMDHFF-UHFFFAOYSA-N 0.000 description 3
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 3
- 229920000768 polyamine Polymers 0.000 description 3
- 239000004417 polycarbonate Substances 0.000 description 3
- 229920000515 polycarbonate Polymers 0.000 description 3
- 239000013049 sediment Substances 0.000 description 3
- OWSKJORLRSWYGK-UHFFFAOYSA-N (3-methoxy-3-methylbutyl) propanoate Chemical compound CCC(=O)OCCC(C)(C)OC OWSKJORLRSWYGK-UHFFFAOYSA-N 0.000 description 2
- FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-naphthoquinone Chemical compound C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 description 2
- RWNUSVWFHDHRCJ-UHFFFAOYSA-N 1-butoxypropan-2-ol Chemical compound CCCCOCC(C)O RWNUSVWFHDHRCJ-UHFFFAOYSA-N 0.000 description 2
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 2
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- LEJBBGNFPAFPKQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxy)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOC(=O)C=C LEJBBGNFPAFPKQ-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- XFCMNSHQOZQILR-UHFFFAOYSA-N 2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOC(=O)C(C)=C XFCMNSHQOZQILR-UHFFFAOYSA-N 0.000 description 2
- HCLJOFJIQIJXHS-UHFFFAOYSA-N 2-[2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOCCOC(=O)C=C HCLJOFJIQIJXHS-UHFFFAOYSA-N 0.000 description 2
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 2
- PTJDGKYFJYEAOK-UHFFFAOYSA-N 2-butoxyethyl prop-2-enoate Chemical compound CCCCOCCOC(=O)C=C PTJDGKYFJYEAOK-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 2
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 2
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 2
- HCGFUIQPSOCUHI-UHFFFAOYSA-N 2-propan-2-yloxyethanol Chemical compound CC(C)OCCO HCGFUIQPSOCUHI-UHFFFAOYSA-N 0.000 description 2
- FVCSARBUZVPSQF-UHFFFAOYSA-N 5-(2,4-dioxooxolan-3-yl)-7-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C(C(OC2=O)=O)C2C(C)=CC1C1C(=O)COC1=O FVCSARBUZVPSQF-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-M Glycolate Chemical compound OCC([O-])=O AEMRFAOFKBGASW-UHFFFAOYSA-M 0.000 description 2
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- DIQMPQMYFZXDAX-UHFFFAOYSA-N Pentyl formate Chemical compound CCCCCOC=O DIQMPQMYFZXDAX-UHFFFAOYSA-N 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- 238000004220 aggregation Methods 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- DMLAVOWQYNRWNQ-UHFFFAOYSA-N azobenzene Chemical group C1=CC=CC=C1N=NC1=CC=CC=C1 DMLAVOWQYNRWNQ-UHFFFAOYSA-N 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 239000011324 bead Substances 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 2
- 150000001718 carbodiimides Chemical class 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- HNEGQIOMVPPMNR-IHWYPQMZSA-N citraconic acid Chemical compound OC(=O)C(/C)=C\C(O)=O HNEGQIOMVPPMNR-IHWYPQMZSA-N 0.000 description 2
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 description 2
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 2
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 2
- GFUIDHWFLMPAGY-UHFFFAOYSA-N ethyl 2-hydroxy-2-methylpropanoate Chemical compound CCOC(=O)C(C)(C)O GFUIDHWFLMPAGY-UHFFFAOYSA-N 0.000 description 2
- BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 description 2
- IJUHLFUALMUWOM-UHFFFAOYSA-N ethyl 3-methoxypropanoate Chemical compound CCOC(=O)CCOC IJUHLFUALMUWOM-UHFFFAOYSA-N 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 239000012948 isocyanate Substances 0.000 description 2
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical group OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- 239000011976 maleic acid Substances 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229920000083 poly(allylamine) Polymers 0.000 description 2
- 229920000058 polyacrylate Polymers 0.000 description 2
- 229920001515 polyalkylene glycol Polymers 0.000 description 2
- 229920000570 polyether Polymers 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 229920001228 polyisocyanate Polymers 0.000 description 2
- 239000005056 polyisocyanate Substances 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000011164 primary particle Substances 0.000 description 2
- GHJOIQFPDMIKHT-UHFFFAOYSA-N propane-1,2,3-triol;prop-2-enoic acid Chemical compound OC(=O)C=C.OCC(O)CO GHJOIQFPDMIKHT-UHFFFAOYSA-N 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- MAOBFOXLCJIFLV-UHFFFAOYSA-N (2-aminophenyl)-phenylmethanone Chemical compound NC1=CC=CC=C1C(=O)C1=CC=CC=C1 MAOBFOXLCJIFLV-UHFFFAOYSA-N 0.000 description 1
- KNXAMURPSBLVRZ-UHFFFAOYSA-N (decylamino)methanol Chemical compound CCCCCCCCCCNCO KNXAMURPSBLVRZ-UHFFFAOYSA-N 0.000 description 1
- VZXTWGWHSMCWGA-UHFFFAOYSA-N 1,3,5-triazine-2,4-diamine Chemical group NC1=NC=NC(N)=N1 VZXTWGWHSMCWGA-UHFFFAOYSA-N 0.000 description 1
- YQYZZTOIMUEGDJ-UHFFFAOYSA-N 1,4-dimethylindole Chemical compound CC1=CC=CC2=C1C=CN2C YQYZZTOIMUEGDJ-UHFFFAOYSA-N 0.000 description 1
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 1
- QZOPRMWFYVGPAI-UHFFFAOYSA-N 1-chloroindole Chemical compound C1=CC=C2N(Cl)C=CC2=C1 QZOPRMWFYVGPAI-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical group C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- PIZHFBODNLEQBL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1 PIZHFBODNLEQBL-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- PJQBVFNKHHUCNS-UHFFFAOYSA-N 2,3-dichloropurine Chemical compound ClC1=NC=C2N=CN=C2N1Cl PJQBVFNKHHUCNS-UHFFFAOYSA-N 0.000 description 1
- QRIMLDXJAPZHJE-UHFFFAOYSA-N 2,3-dihydroxypropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(O)CO QRIMLDXJAPZHJE-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- JKNCOURZONDCGV-UHFFFAOYSA-N 2-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound CN(C)CCOC(=O)C(C)=C JKNCOURZONDCGV-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 1
- COBPKKZHLDDMTB-UHFFFAOYSA-N 2-[2-(2-butoxyethoxy)ethoxy]ethanol Chemical compound CCCCOCCOCCOCCO COBPKKZHLDDMTB-UHFFFAOYSA-N 0.000 description 1
- LTHJXDSHSVNJKG-UHFFFAOYSA-N 2-[2-[2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCOCCOC(=O)C(C)=C LTHJXDSHSVNJKG-UHFFFAOYSA-N 0.000 description 1
- LSRXVFLSSBNNJC-UHFFFAOYSA-N 2-[2-[2-[2-[2-(2-phenoxyethoxy)ethoxy]ethoxy]ethoxy]ethoxy]ethanol Chemical compound OCCOCCOCCOCCOCCOCCOC1=CC=CC=C1 LSRXVFLSSBNNJC-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/44—Carbon
- C09C1/48—Carbon black
- C09C1/56—Treatment of carbon black ; Purification
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C3/00—Treatment in general of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties
- C09C3/10—Treatment with macromolecular organic compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D17/00—Pigment pastes, e.g. for mixing in paints
- C09D17/001—Pigment pastes, e.g. for mixing in paints in aqueous medium
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D17/00—Pigment pastes, e.g. for mixing in paints
- C09D17/004—Pigment pastes, e.g. for mixing in paints containing an inorganic pigment
- C09D17/005—Carbon black
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D17/00—Pigment pastes, e.g. for mixing in paints
- C09D17/004—Pigment pastes, e.g. for mixing in paints containing an inorganic pigment
- C09D17/007—Metal oxide
- C09D17/008—Titanium dioxide
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- G02B5/003—Light absorbing elements
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- G—PHYSICS
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
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- G—PHYSICS
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G—PHYSICS
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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Abstract
Description
本發明係關於一種維持高遮光性且具有較高之絕緣性之黑矩陣用顏料分散物、及含有其之黑矩陣用顏料分散光阻組成物。 The present invention relates to a pigment dispersion for a black matrix which maintains high light-shielding property and has high insulation property, and a pigment dispersion resist composition for a black matrix containing the same.
近年來,黑矩陣用顏料分散物之用途涉及多方面,例如於液晶或電漿等之平板顯示器中,為了於畫面之顯示區域內著色圖案之間隙或顯示區域周邊部分之邊緣設置遮光膜(黑矩陣)而使用,又,使用有TFT之液晶顯示器,為了於TFT之外光側等設置遮光膜(黑矩陣)而使用。而且,液晶顯示器主要係為了防止來自背光之洩漏光映入至畫面,提高顯示特性(對比度及色純度)而發揮作用,又,電漿顯示器主要係為了防止因各色光之混濁引起之暈開映入至畫面,提高顯示特性(對比度及色純度)而發揮作用。 In recent years, the use of a pigment dispersion for a black matrix involves various aspects, for example, in a flat panel display such as a liquid crystal or a plasma, in order to provide a light-shielding film for the gap of the colored pattern or the edge of the peripheral portion of the display region in the display region of the screen (black) In addition, a liquid crystal display having a TFT is used, and a light shielding film (black matrix) is provided for the light side or the like other than the TFT. Moreover, the liquid crystal display mainly functions to prevent the leakage light from the backlight from being reflected into the screen and to improve the display characteristics (contrast and color purity), and the plasma display is mainly for preventing the fainting caused by the turbidity of the respective colors of light. Enter the screen to improve display characteristics (contrast and color purity).
例如,為了將液晶顯示器之背光之白色光轉換成著色光而利用之彩色濾光片通常係藉由如下方法製造:於形成有黑矩陣之玻璃或塑膠片等透明基板表面,按照條紋狀或者馬賽克狀等之圖案依序形成紅、綠、藍之不同色調之像素。 For example, a color filter used for converting white light of a backlight of a liquid crystal display into colored light is usually manufactured by a method of forming a transparent substrate surface such as a glass or a plastic sheet on which a black matrix is formed, in a stripe shape or a mosaic. The pattern of the shape and the like sequentially forms pixels of different hues of red, green and blue.
又,於結合圖像顯示裝置與位置輸入裝置之觸控面板中, 亦同樣地利用形成有黑矩陣之彩色濾光片作為遮光膜,迄今為止,一般係隔著覆蓋玻璃,形成於與感測器基板相反之側。然而,隨著對觸控面板之輕量化之要求變高,進行開發如下之技術以謀求更輕量化:於覆蓋玻璃之相同側同時形成遮光膜及觸控感測器之技術。於此種情形時,於在覆蓋玻璃上形成黑矩陣後,需要形成用於感測器之電極等,故首先要求如即便黑矩陣跨及複數個電極而接觸亦不會引起誤動作的高絕緣性,此外亦要求高密合性或耐化學品性。 Moreover, in the touch panel combined with the image display device and the position input device, Similarly, a color filter in which a black matrix is formed is used as a light-shielding film, and conventionally, it is formed on the side opposite to the sensor substrate via a cover glass. However, as the demand for weight reduction of the touch panel has become high, the following techniques have been developed to achieve a lighter weight: a technique of simultaneously forming a light-shielding film and a touch sensor on the same side of the cover glass. In this case, after forming a black matrix on the cover glass, it is necessary to form an electrode for the sensor or the like. Therefore, it is first required to have high insulation which does not cause malfunction even if the black matrix is crossed and a plurality of electrodes are contacted. In addition, high adhesion or chemical resistance is also required.
因此,為了獲得具有高絕緣性之黑矩陣,揭示有如下等技術:作為遮光性顏料而利用碳黑,而且作為光硬化性材料而利用含酸基之環氧丙烯酸酯化合物(例如,參照專利文獻1);使用利用多官能環氧樹脂(其中,實施例中,僅例示2官能者作為多官能環氧樹脂)對碳黑進行被覆處理而成之絕緣性碳黑(例如,參照專利文獻2)。 Therefore, in order to obtain a black matrix having high insulating properties, there are disclosed techniques in which carbon black is used as a light-shielding pigment, and an epoxy group-containing epoxy acrylate compound is used as a photocurable material (for example, refer to the patent literature) 1) An insulating carbon black obtained by coating a carbon black with a polyfunctional epoxy resin (in the example, a bifunctional one is used as a polyfunctional epoxy resin) (for example, see Patent Document 2) .
可藉由該等所揭示之技術而獲得高絕緣性,但近年來進而要求薄膜之具備高遮光性及高絕緣性之黑矩陣,需要提高作為遮光性材料之碳黑之含有比率。然而,碳黑具有導電性,故若提高含有比率,則成為絕緣性降低之主要原因,該等所揭示之技術無法滿足同時實現高遮光性及高絕緣性之要求。 The high insulation property can be obtained by the technique disclosed in the above, but in recent years, a black matrix having high light-shielding property and high insulation property of a film is required, and it is necessary to increase the content ratio of carbon black as a light-shielding material. However, since carbon black has electrical conductivity, if the content ratio is increased, the insulating property is lowered, and the disclosed techniques cannot satisfy the requirements of achieving high light-shielding property and high insulating property at the same time.
專利文獻1:日本特開平08-278629號公報 Patent Document 1: Japanese Laid-Open Patent Publication No. 08-278629
專利文獻2:日本特開平09-124969號公報 Patent Document 2: Japanese Patent Publication No. 09-124969
因此,本發明之課題在於提供一種具有高遮光性及高絕緣性之黑矩陣用顏料分散物、及含有其之黑矩陣用顏料分散光阻組成物。 Accordingly, an object of the present invention is to provide a pigment dispersion for a black matrix having high light-shielding property and high insulation property, and a pigment dispersion resist composition for a black matrix containing the same.
本發明人等根據下述認知:若為了使黑矩陣用光阻組成物之塗膜為更薄之膜並且具有高遮光性,而增加塗膜中之碳黑之含有比率,則因碳黑為導電性而導致塗膜之絕緣性降低;而發現:於藉由光硬化而形成黑矩陣用光阻組成物之塗膜後,若以高溫進行後硬化處理,則絕緣性之降低會變得明顯。 The present inventors have recognized that, in order to increase the content ratio of carbon black in the coating film in order to increase the content ratio of carbon black in the coating film in order to make the coating film of the photoresist composition for the black matrix a thinner film and have high light-shielding property, The electrical conductivity causes a decrease in the insulating property of the coating film. It is found that after the coating film of the photoresist composition for a black matrix is formed by photohardening, if the post-hardening treatment is performed at a high temperature, the decrease in insulation property becomes conspicuous. .
本發明人等推測,該現象暗示因後硬化之加熱導致經光硬化之塗膜暫時軟化而產生碳黑之凝集之可能性,從而對如下材料進行研究:於碳黑表面形成耐熱性高之樹脂被膜,即便發生凝集亦抑制絕緣性之降低,進而不會對形成黑矩陣時之顯影特性等造成不良影響。 The present inventors presume that this phenomenon suggests that the heat-cured coating film is temporarily softened by the heat of post-hardening to cause agglomeration of carbon black, and the following materials are studied: a resin having high heat resistance is formed on the surface of the carbon black. Even if aggregation occurs in the film, the decrease in insulation property is suppressed, and the development characteristics and the like in forming the black matrix are not adversely affected.
其結果,本發明人等發現如下情形而以至完成本發明:若利用酸性碳黑、及多官能環氧化合物,則即便增加酸性碳黑之含有比率,亦可維持高絕緣性。 As a result, the inventors of the present invention have found that the present invention can be achieved by using acidic carbon black and a polyfunctional epoxy compound, and even if the content ratio of the acidic carbon black is increased, high insulating properties can be maintained.
即,本發明係關於一種黑矩陣用顏料分散物,其含有酸性碳黑、顏料分散劑、多官能環氧化合物、及溶劑,且上述多官能環氧化合物係相對於100質量份之上述酸性碳黑而含有0.1~50質量份。 That is, the present invention relates to a pigment dispersion for a black matrix containing an acidic carbon black, a pigment dispersant, a polyfunctional epoxy compound, and a solvent, and the above polyfunctional epoxy compound is based on 100 parts by mass of the above acidic carbon. It is black and contains 0.1 to 50 parts by mass.
又,本發明中,上述多官能環氧化合物較佳為具有選自二苯基甲烷骨架、二萘基甲烷骨架、三骨架、及聯苯骨架中之至少1種骨架之環氧化合物。 Further, in the invention, the polyfunctional epoxy compound preferably has a selected from the group consisting of a diphenylmethane skeleton, a dinaphthylmethane skeleton, and three An epoxy compound of at least one of a skeleton and a biphenyl skeleton.
又,本發明亦為一種黑矩陣用顏料分散光阻組成物,其含有上述黑矩陣用顏料分散物、鹼可溶性樹脂、光聚合性化合物、及光聚合起始劑。 Moreover, the present invention is also a pigment dispersion resist composition for a black matrix, which comprises the pigment dispersion for a black matrix, an alkali-soluble resin, a photopolymerizable compound, and a photopolymerization initiator.
又,本發明中,較佳為4官能以上之多官能環氧化合物。 Further, in the present invention, a tetrafunctional or higher polyfunctional epoxy compound is preferred.
以下,詳細地對本發明之黑矩陣用顏料分散物、及含有其之黑矩陣用顏料分散光阻組成物進行說明。 Hereinafter, the pigment dispersion for a black matrix of the present invention and the pigment dispersion resist composition for a black matrix containing the same will be described in detail.
對於本發明之黑矩陣用顏料分散物具有較高之絕緣性之機制並未明確,但推測如下。 The mechanism for the high insulating property of the pigment dispersion for a black matrix of the present invention is not clear, but it is presumed as follows.
可認為,於本發明之黑矩陣用顏料分散物中,酸性碳黑及多官能環氧化合物呈如下狀態:該酸性碳黑之表面具有之取代基與多官能環氧化合物具有之取代基相互作用,而於該酸性碳黑之表面吸附有多官能環氧化合物。因此,藉由使多官能環氧化合物具有多個結部位,可提高與碳黑表面之官能基相互作用之機率。 It is considered that in the pigment dispersion for a black matrix of the present invention, the acidic carbon black and the polyfunctional epoxy compound are in a state in which the substituent on the surface of the acidic carbon black interacts with a substituent having a polyfunctional epoxy compound. And a polyfunctional epoxy compound is adsorbed on the surface of the acidic carbon black. Therefore, by having the polyfunctional epoxy compound have a plurality of junction sites, the probability of interaction with the functional groups on the surface of the carbon black can be improved.
又,於塗敷黑矩陣用光阻組成物時,自藉由使多官能環氧化合物之環氧基與酸性碳黑表面之官能基相互作用而吸附之狀態,可充分考量到:利用光硬化時及後硬化時之熱來進行反應,而形成酸性碳黑之環氧樹脂被覆物。 Further, when the photoresist composition for a black matrix is applied, the state in which the epoxy group of the polyfunctional epoxy compound interacts with the functional group on the surface of the acidic carbon black is adsorbed, and it is possible to fully consider the use of photohardening. The reaction is carried out with heat at the time of post-hardening to form an epoxy resin coating of acid carbon black.
如此,即便酸性碳黑彼此因凝集而接觸,導電性之碳黑表面亦不會直接接觸,而成為介隔有非導電性之多官能環氧化合物被膜之接觸。進而,若多官能環氧化合物具有多環結構之骨架,則高溫時酸性碳黑之被膜之維持優異,故推測可與大體積相結合地維持較高之絕緣性。 As described above, even if the acidic carbon blacks are in contact with each other due to aggregation, the surface of the conductive carbon black does not directly contact, and is in contact with the non-conductive polyfunctional epoxy compound film. Further, when the polyfunctional epoxy compound has a skeleton having a polycyclic structure, the coating of the acid black black is excellent at a high temperature, and it is presumed that the insulating property can be maintained in combination with a large volume.
本發明之黑矩陣用顏料分散物含有酸性碳黑。 The pigment dispersion for a black matrix of the present invention contains acidic carbon black.
作為上述酸性碳黑,可使用自先前以來為了形成黑矩陣而使用之酸性碳黑。 As the acidic carbon black, an acid carbon black which has been used since the formation of a black matrix has been used.
作為上述酸性碳黑之具體例,可列舉:三菱化學公司製造之MA7、MA8、MA11、MA14、#1000、#2350等;德固賽公司製造之Special Black 350、Special Black 250、Special Black 550等;Cabot公司製造之MOGUL L、REGAL 400R等;Columbian Carbon公司製造之RAVEN 1200、RAVEN 1250、RAVEN 1255、RAVEN 1190U、RAVEN 1170、RAVEN 1035、RAVEN 1080U、RAVEN 1060U、RAVEN 1100U等。 Specific examples of the acidic carbon black include MA7, MA8, MA11, MA14, #1000, #2350, etc. manufactured by Mitsubishi Chemical Corporation; Special Black 350, Special Black 250, Special Black 550, etc. manufactured by Degussa Corporation. ; MOGUL L, REGAL 400R, etc. manufactured by Cabot; RAVEN 1200, RAVEN 1250, RAVEN 1255, RAVEN 1190U, RAVEN 1170, RAVEN 1035, RAVEN 1080U, RAVEN 1060U, RAVEN 1100U, etc. manufactured by Columbian Carbon.
於上述酸性碳黑中,較佳為pH值為5以下,且具有羧基等酸性基者。又,較佳為粒徑為20~60nm者。若為此種酸性碳黑,則可與下述多官能環氧化合物較佳地相互作用,而對本發明之黑矩陣用顏料分散物賦予高絕緣性。 Among the above acidic carbon blacks, those having a pH of 5 or less and having an acidic group such as a carboxyl group are preferred. Further, it is preferably one having a particle diameter of 20 to 60 nm. In the case of such an acidic carbon black, it is possible to preferably interact with the polyfunctional epoxy compound described below to impart high insulating properties to the pigment dispersion for a black matrix of the present invention.
作為滿足上述特性之酸性碳黑,可列舉Special Black 250、Special Black 350等。 Examples of the acidic carbon black satisfying the above characteristics include Special Black 250, Special Black 350, and the like.
再者,上述粒徑係指藉由顯微鏡觀察而測定或算出之平均一次粒徑。 In addition, the said particle diameter means the average primary particle diameter measured or computed by microscopic observation.
上述酸性碳黑之含量較佳為於本發明之黑矩陣用顏料分散物中,含有3~70質量%。若上述酸性碳黑之含量未達3質量%,則存在遮光性降低之情形。另一方面,若上述酸性碳黑之含量超過70質量%,則存在顏料分散變得困難之情形。 The content of the acidic carbon black is preferably from 3 to 70% by mass in the pigment dispersion for a black matrix of the present invention. When the content of the acidic carbon black is less than 3% by mass, the light-shielding property may be lowered. On the other hand, when the content of the acidic carbon black exceeds 70% by mass, it may be difficult to disperse the pigment.
上述酸性碳黑之含量之更佳下限為於本發明之黑矩陣用顏料分散物中含有10質量%,上述酸性碳黑之含量之更佳上限為於本發明之黑矩陣用顏料分散物中含有50質量%。 A more preferred lower limit of the content of the acidic carbon black is 10% by mass in the pigment dispersion for a black matrix of the present invention, and a higher upper limit of the content of the acidic carbon black is contained in the pigment dispersion for a black matrix of the present invention. 50% by mass.
本發明之黑矩陣用顏料分散物含有顏料分散劑。 The pigment dispersion for a black matrix of the present invention contains a pigment dispersant.
作為上述顏料分散劑,係含鹼性基之顏料分散劑,可使用陰離子性界面活性劑、含鹼性基之聚酯系顏料分散劑、含鹼性基之丙烯酸系顏料分散劑、含鹼性基之胺酯(urethane)系顏料分散劑、含鹼性基之碳二醯亞胺系顏料分散劑等。 The pigment dispersant is a pigment-dispersing agent containing a basic group, and an anionic surfactant, a polyester-based pigment dispersant containing a basic group, an acrylic-based pigment dispersant containing a basic group, and an alkalinity can be used. A urethane-based pigment dispersant, a basic carbodiimide-based pigment dispersant, and the like.
該等含鹼性基之顏料分散劑可單獨使用,又,亦可使用2種以上之組合。其中,就獲得良好之顏料分散性之方面而言,較佳為含鹼性基之高分子顏料分散劑。 These basic base-containing pigment dispersants may be used singly or in combination of two or more kinds. Among them, a polymer pigment dispersant containing a basic group is preferred in terms of obtaining good pigment dispersibility.
作為含鹼性基之高分子顏料分散劑之具體例,可列舉: Specific examples of the polymer pigment dispersant containing a basic group include:
(1)聚胺化合物(例如,聚烯丙胺、聚乙烯胺、聚乙烯聚亞胺等聚(低級伸烷基胺)等)之胺基及/或亞胺基、與選自由具有游離羧基之聚酯、聚醯胺及聚酯醯胺所構成之群中之至少1種之反應產物(日本專利特開2001-59906號公報); (1) an amine group and/or an imine group of a polyamine compound (for example, a poly(lower alkyleneamine) such as polyallylamine, polyvinylamine or polyethylene polyimine), and a group selected from the group consisting of having a free carboxyl group. a reaction product of at least one of a group consisting of polyester, polyamine, and polyester decylamine (Japanese Patent Laid-Open Publication No. 2001-59906);
(2)聚(低級)伸烷基亞胺、甲基亞胺基雙丙胺等低分子胺化合物、與具有游離羧基之聚酯之反應產物(日本特開昭54-37082號公報、日本特開平01-311177號公報); (2) a reaction product of a low molecular amine compound such as a poly(lower) alkylene imine or a methyliminodipropylamine, and a polyester having a free carboxyl group (Japanese Unexamined Patent Application Publication No. Hei No. Hei No. 54-37082 Bulletin 01-311177);
(3)使甲氧基聚乙二醇等醇類或己內酯聚酯等具有1個羥基之聚酯類、具有2~3個異氰酸酯基反應性官能基之化合物、具有異氰酸酯基反應性官能基及3級胺基之脂肪族或雜環式烴化合物依序與聚異氰酸酯化合物之異氰酸酯基反應而成之反應產物(日本特開平02-612號公報); (3) A polyester having one hydroxyl group such as an alcohol such as methoxypolyethylene glycol or a caprolactone polyester, a compound having 2 to 3 isocyanate-reactive functional groups, and an isocyanate-reactive functional group. a reaction product obtained by reacting an aliphatic or heterocyclic hydrocarbon compound of a 3-stage amine group with an isocyanate group of a polyisocyanate compound (JP-A-02-612);
(4)使聚異氰酸酯化合物及具有胺基之烴化合物與具有醇性羥基之丙烯酸酯之聚合物反應而成之化合物; (4) a compound obtained by reacting a polyisocyanate compound and a hydrocarbon compound having an amine group with a polymer having an acrylate having an alcoholic hydroxyl group;
(5)使聚醚鏈加成至低分子胺基化合物而成之反應產物; (5) a reaction product obtained by adding a polyether chain to a low molecular weight amine compound;
(6)使具有胺基之化合物與具有異氰酸酯基之化合物反應而成之反應產物(日本特開平04-210220號公報); (6) a reaction product obtained by reacting a compound having an amine group with a compound having an isocyanate group (JP-A-2004-210220);
(7)使具有游離羧基之線性聚合物及具有1個2級胺基之有機胺化合物與聚環氧化合物反應而成之反應產物(日本特開平09-87537號公報); (7) a reaction product obtained by reacting a linear polymer having a free carboxyl group and an organic amine compound having a 2-stage amine group with a polyepoxy compound (JP-A-09-87537);
(8)單末端具有可與胺基反應之官能基之聚碳酸酯化合物與聚胺化合物之反應產物(日本特開平09-194585號公報); (8) a reaction product of a polycarbonate compound having a functional group reactive with an amine group at a single terminal and a polyamine compound (JP-A-09-194585);
(9)選自甲基丙烯酸甲酯、甲基丙烯酸乙酯、甲基丙烯酸丙酯、甲基丙烯酸丁酯、甲基丙烯酸硬脂酯、甲基丙烯酸苄酯、丙烯酸甲酯、丙烯酸乙酯、丙烯酸丙酯、丙烯酸丁酯、丙烯酸硬脂酯、丙烯酸苄酯等甲基丙烯酸酯或丙烯酸酯中之至少1種、與丙烯醯胺、甲基丙烯醯胺、N-羥甲基醯胺、乙烯基咪唑、乙烯基吡啶、具有胺基及聚己內酯骨架之單體等含鹼性基之聚合單體中之至少1種、及苯乙烯、苯乙烯衍生物、其他聚合性單體中之至少1種之共聚物(日本特開平01-164429號公報); (9) selected from the group consisting of methyl methacrylate, ethyl methacrylate, propyl methacrylate, butyl methacrylate, stearyl methacrylate, benzyl methacrylate, methyl acrylate, ethyl acrylate, At least one of methacrylate or acrylate such as propyl acrylate, butyl acrylate, stearyl acrylate or benzyl acrylate, and acrylamide, methacrylamide, N-hydroxymethyl decylamine, ethylene At least one of a basic group-containing polymerizable monomer such as a base imidazole, a vinyl pyridine, a monomer having an amine group and a polycaprolactone skeleton, and a styrene, a styrene derivative, or another polymerizable monomer a copolymer of at least one type (JP-A-01-164429);
(10)含鹼性基之碳二醯亞胺系顏料分散劑(國際公開WO04/000950號公報); (10) A carbon diimide-based pigment dispersant containing a basic group (International Publication WO 04/000950);
(11)由具有3級胺基、4級銨鹽基等鹼性基之嵌段及不具有官能基之嵌段所構成之嵌段共聚物(參照日本特開2005-55814號之記載); (11) a block copolymer composed of a block having a basic group such as a 3-stage amine group or a 4-stage ammonium salt group and a block having no functional group (refer to Japanese Patent Laid-Open Publication No. 2005-55814);
(12)使聚碳酸酯化合物與聚烯丙胺進行麥可加成反應(Michael addition reaction)而獲得之顏料分散劑(日本特開平09-194585號公報); (12) A pigment dispersing agent obtained by subjecting a polycarbonate compound to a polyallylamine by a Michael addition reaction (JP-A-09-194585);
(13)分別具有至少1個聚丁二烯鏈及含鹼性氮基之碳二醯亞胺系化合物(日本特開2006-257243號公報); (13) a carbodiimide compound having at least one polybutadiene chain and a basic nitrogen group, respectively (JP-A-2006-257243);
(14)於分子內分別具有至少1個具有醯胺基之側鏈、及含鹼性氮基之 碳二醯亞胺系化合物(日本特開2006-176657號公報)等。 (14) having at least one side chain having a guanamine group and a basic nitrogen group in the molecule A carbodiimide-based compound (JP-A-2006-176657) or the like.
(15)具有含環氧乙烷鏈及環氧丙烷鏈之構成單位,且具有藉由四級化劑而四級化之胺基之聚胺酯(polyurethane)系化合物(日本特開2009-175613號公報); (15) A polyurethane compound having an amine group containing an ethylene oxide chain and a propylene oxide chain and having an amine group which is quaternized by a quaternizing agent (JP-A-2009-175613) );
(16)使於分子內具有異氰尿酸酯環之異氰酸酯化合物之異氰酸酯基、與於分子內具有活性氫基且具有咔唑環及/或偶氮苯骨架之化合物之活性氫基反應而獲得之化合物,且於該化合物之分子內,相對於來自具有異氰尿酸酯環之異氰酸酯化合物之異氰酸酯基、與藉由異氰酸酯基與活性氫基之反應產生之胺酯鍵及脲鍵之合計,咔唑環與偶氮苯骨架之數目為15~85%(日本特願2009-220836)。 (16) reacting an isocyanate group of an isocyanate compound having an isocyanurate ring in a molecule with an active hydrogen group of a compound having an active hydrogen group in the molecule and having an indazole ring and/or an azobenzene skeleton a compound, and in the molecule of the compound, in combination with an isocyanate group derived from an isocyanate compound having an isocyanurate ring, and an amine ester bond and a urea bond derived from the reaction of an isocyanate group with an active hydrogen group, The number of carbazole rings and azobenzene skeletons is 15 to 85% (Japanese Patent No. 2009-220836).
於上述含鹼性基之高分子顏料分散劑中,更佳為含鹼性基之胺酯系高分子顏料分散劑、含鹼性基之聚酯系高分子顏料分散劑、含鹼性基之丙烯酸系高分子顏料分散劑,進而較佳為含有胺基之胺酯系高分子顏料分散劑、含有胺基之聚酯系高分子顏料分散劑、含有胺基之丙烯酸系高分子顏料分散劑。於上述含鹼性基之胺酯系高分子顏料分散劑中,特佳為具有選自由聚酯鏈、聚醚鏈、及聚碳酸酯鏈所構成之群中之至少1種之含鹼性基(胺基)之胺酯系高分子顏料分散劑。 In the above-mentioned basic group-containing polymer pigment dispersant, a basic group-containing amine ester-based polymer pigment dispersant, a basic group-containing polyester-based polymer pigment dispersant, and a basic group-containing group are more preferable. Further, the acrylic polymer pigment dispersant is preferably an amine group-containing amine ester polymer pigment dispersant, an amine group-containing polyester polymer pigment dispersant, and an amine group-containing acrylic polymer pigment dispersant. In the above-mentioned basic group-containing amine ester-based polymer pigment dispersant, it is particularly preferred to have at least one basic group selected from the group consisting of a polyester chain, a polyether chain, and a polycarbonate chain. (Amine) amine ester-based polymer pigment dispersant.
上述含鹼性基之分散劑較佳為相對於100質量份之上述酸性碳黑而含有1~200質量份。 The above-mentioned basic group-containing dispersing agent is preferably contained in an amount of from 1 to 200 parts by mass per 100 parts by mass of the above acidic carbon black.
若上述含鹼性基之分散劑之含量未達1質量份,則存在損壞顏料分散物之穩定性之情形。另一方面,若上述含鹼性基之分散劑之含量超過200質量份,則存在損壞塗膜之遮光性或絕緣性之情形。 If the content of the above-mentioned basic group-containing dispersant is less than 1 part by mass, there is a case where the stability of the pigment dispersion is impaired. On the other hand, when the content of the above-mentioned basic group-containing dispersant exceeds 200 parts by mass, the light-shielding property or the insulating property of the coating film may be impaired.
又,上述含鹼性基之分散劑更佳為相對於100質量份之上述酸性碳黑而含有1~60質量份。 Further, the above-mentioned basic group-containing dispersing agent is more preferably contained in an amount of from 1 to 60 parts by mass per 100 parts by mass of the acidic carbon black.
本發明之黑矩陣用顏料分散物含有多官能環氧化合物。 The pigment dispersion for a black matrix of the present invention contains a polyfunctional epoxy compound.
本發明之黑矩陣用顏料分散物可藉由使上述多官能環氧樹脂與存在於上述酸性碳黑表面之官能基較佳地相互作用,而賦予高絕緣性。 The pigment dispersion for a black matrix of the present invention can impart high insulation properties by allowing the above polyfunctional epoxy resin to preferably interact with a functional group present on the surface of the acidic carbon black.
作為上述多官能環氧化合物,可列舉自先前以來為了形成黑矩陣用顏料分散物而使用之多官能環氧化合物。 As the polyfunctional epoxy compound, a polyfunctional epoxy compound which has been used in order to form a pigment dispersion for a black matrix has been mentioned.
作為上述多官能環氧化合物,較佳為具有選自二苯基甲烷骨架、二萘基甲烷骨架、三骨架、及聯苯骨架中之至少1種骨架者。 The polyfunctional epoxy compound preferably has a selected from the group consisting of a diphenylmethane skeleton, a dinaphthylmethane skeleton, and three At least one of the skeleton and the biphenyl skeleton.
上述二苯基甲烷骨架、二萘基甲烷骨架、及聯苯骨架具有類似於上述酸性碳黑之表面結構之結構,故變得易於接近酸性碳黑,於烘烤黑矩陣用顏料分散光阻組成物時,易於與存在於酸性碳黑表面之官能基反應,因此可認為可較佳地對本發明之黑矩陣用顏料分散物賦予高絕緣性。 The above-mentioned diphenylmethane skeleton, dinaphthylmethane skeleton, and biphenyl skeleton have a structure similar to that of the above-mentioned acidic carbon black, so that it becomes easy to be close to acidic carbon black, and is composed of a pigment dispersion resist for baking black matrix. In the case of a substance, it is easy to react with a functional group existing on the surface of the acidic carbon black. Therefore, it is considered that the pigment dispersion for a black matrix of the present invention can be preferably provided with high insulating properties.
又,具有上述三骨架之多官能環氧化合物中,由於三骨架具有鹼性,故變得易於接近酸性碳黑,於烘烤黑矩陣用顏料分散光阻組成物時,易於與存在於酸性碳黑表面之官能基反應,因此可認為可較佳地對本發明之黑矩陣用顏料分散物賦予高絕緣性。 Again, with the above three Skeletal polyfunctional epoxy compound, due to three Since the skeleton is alkaline, it becomes easy to access the acidic carbon black, and when the pigment dispersion composition of the pigment for black matrix is baked, it is easy to react with the functional group present on the surface of the acidic carbon black, and thus it can be considered that the present invention can be preferably used. The black matrix pigment dispersion imparts high insulation.
作為具有選自上述二苯基甲烷骨架、二萘基甲烷骨架、三骨架、及聯苯骨架中之至少1種骨架之多官能環氧化合物,可列舉下述式(1)~(3)。 As having the above-mentioned diphenylmethane skeleton, dinaphthylmethane skeleton, and three Examples of the polyfunctional epoxy compound of at least one of the skeleton and the biphenyl skeleton include the following formulas (1) to (3).
商品名:TEPIC(日產化學公司製造)
商品名:EPICLON 830(DIC公司製造)
商品名:JER-YX-4000(三菱化學公司製造)
上述多官能環氧化合物較佳為4官能以上之多官能環氧化合物。若為上述4官能以上之多官能環氧化合物,則高溫時被膜之維持優異,故被認為可與大體積相結合地維持高絕緣性。 The polyfunctional epoxy compound is preferably a tetrafunctional or higher polyfunctional epoxy compound. When the above-mentioned tetrafunctional or higher polyfunctional epoxy compound is excellent in the maintenance of the film at a high temperature, it is considered that the high insulating property can be maintained in combination with a large volume.
上述4官能以上之多官能環氧化合物更佳為具有二苯基甲烷骨架、二萘基甲烷骨架、三骨架、及聯苯骨架之4官能以上之多官能環氧化合物。作為此種化合物,可列舉下述式(4)。 More preferably, the above-mentioned tetrafunctional or higher polyfunctional epoxy compound has a diphenylmethane skeleton, a dinaphthylmethane skeleton, and three A tetrafunctional or higher polyfunctional epoxy compound having a skeleton and a biphenyl skeleton. As such a compound, the following formula (4) is mentioned.
商品名:JER-604(三菱化學公司製造)
上述多官能環氧化合物相對於100質量份之上述酸性碳黑而含有0.1~50質量份。 The polyfunctional epoxy compound is contained in an amount of 0.1 to 50 parts by mass based on 100 parts by mass of the acidic carbon black.
若上述多官能環氧化合物之含量相對於100質量份之上述酸性碳黑而未達0.1質量份,則無法獲得高電阻之黑矩陣用顏料分散物。另一方面,若上述多官能環氧化合物之含量相對於100質量份之上述酸性碳黑而超過50質量份,則存在因環氧基之聚合而損壞分散液之穩定性之可能性。 When the content of the polyfunctional epoxy compound is less than 0.1 part by mass based on 100 parts by mass of the acidic carbon black, a high-resistance pigment dispersion for a black matrix cannot be obtained. On the other hand, when the content of the polyfunctional epoxy compound exceeds 50 parts by mass based on 100 parts by mass of the acidic carbon black, there is a possibility that the stability of the dispersion is deteriorated by polymerization of an epoxy group.
上述多官能環氧化合物之較佳含量之下限係相對於100質量份之上述酸性碳黑而為5質量份,上述多官能環氧化合物之較佳含量之上限係相對於100質量份之上述酸性碳黑而為20質量份。 The lower limit of the preferred content of the polyfunctional epoxy compound is 5 parts by mass based on 100 parts by mass of the above acidic carbon black, and the upper limit of the preferred content of the polyfunctional epoxy compound is relative to 100 parts by mass of the above acidity. Carbon black is 20 parts by mass.
本發明之黑矩陣用顏料分散物含有溶劑。 The pigment dispersion for a black matrix of the present invention contains a solvent.
作為上述溶劑,係自先前以來使用者,可使酸性碳黑穩定地分散,且可使上述顏料分散劑、上述多官能環氧化合物、及下述鹼可溶性樹脂溶解。 As the solvent, the acid carbon black can be stably dispersed by the user, and the above-described pigment dispersant, the above polyfunctional epoxy compound, and the following alkali-soluble resin can be dissolved.
作為上述溶劑,較佳為常壓(1.013×102kPa)下之沸點為100~250℃之酯系有機溶劑、醚系有機溶劑、醚酯系有機溶劑、酮系有機溶劑、芳香族烴系有機溶劑、含氮系有機溶劑等。 The solvent is preferably an ester organic solvent having a boiling point of 100 to 250 ° C under normal pressure (1.013 × 10 2 kPa), an ether organic solvent, an ether ester organic solvent, a ketone organic solvent, or an aromatic hydrocarbon system. An organic solvent, a nitrogen-containing organic solvent, or the like.
作為此種溶劑,具體而言,可例示:乙二醇單甲醚、乙二醇單乙醚、乙二醇單異丙醚、乙二醇單丁醚、二乙二醇單甲醚、二乙二醇單乙醚、丙二醇單甲醚、丙二醇單乙醚、丙二醇單丁醚、二乙二醇二乙醚、二乙二醇二甲醚、二乙二醇甲基乙醚等醚系有機溶劑類;乙二醇單甲醚乙酸酯、乙二醇單乙醚乙酸酯、乙二醇單丁醚乙酸酯、丙二醇單甲醚乙酸酯、丙二醇單乙醚乙酸酯等醚酯系有機溶劑類;甲基異丁基酮、環己酮、2-庚 酮、δ-丁內酯等酮系有機溶劑類;2-羥基丙酸甲酯、2-羥基丙酸乙酯、2-羥基-2-甲基丙酸乙酯、丙酸3-甲基-3-甲氧基丁酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯、乙氧基乙酸乙酯、羥基乙酸酯、甲酸正戊酯等酯系有機溶劑類;N-甲基吡咯啶酮、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺等含氮系有機溶劑類等;該等有機溶劑可單獨使用或混合2種以上使用。 Specific examples of such a solvent include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monoisopropyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, and diethyl ether. An ether-based organic solvent such as diol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, diethylene glycol diethyl ether, diethylene glycol dimethyl ether or diethylene glycol methyl ether; An ether ester type organic solvent such as alcohol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate; Isobutyl ketone, cyclohexanone, 2-glycan Ketone, δ-butyrolactone and other ketone organic solvents; methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate, ethyl 2-hydroxy-2-methylpropionate, 3-methyl propionate 3-methoxybutyl ester, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethoxy An ester-based organic solvent such as ethyl acetate, hydroxyacetate or n-amyl formate; N-methylpyrrolidone, N,N-dimethylformamide, N,N-dimethylacetamide The nitrogen-containing organic solvent or the like may be used alone or in combination of two or more.
本發明之黑矩陣用顏料分散物可為了提高酸性碳黑之分散性而含有選自由含酸基之顏料衍生物、含酸基之色素衍生物、及含酸基之色素中間物所構成之群中之至少1種、以及鹼可溶性樹脂。 The pigment dispersion for a black matrix of the present invention may contain a group selected from a pigment derivative containing an acid group, a dye derivative containing an acid group, and a dye intermediate containing an acid group in order to improve the dispersibility of the acidic carbon black. At least one of them, and an alkali-soluble resin.
首先,作為含酸基之顏料衍生物、含酸基之色素衍生物,可例示具有酸基之酞菁系顏料衍生物、具有酸基之蒽醌系顏料衍生物、具有酸基之萘系顏料衍生物等。其中,具有磺酸基之酞菁系顏料衍生物就酸性碳黑之分散性之方面而言較佳。 First, as the acid group-containing pigment derivative or the acid group-containing dye derivative, a phthalocyanine-based pigment derivative having an acid group, an anthraquinone-based pigment derivative having an acid group, and an acid-based naphthalene-based pigment can be exemplified. Derivatives, etc. Among them, the phthalocyanine-based pigment derivative having a sulfonic acid group is preferred in terms of dispersibility of acidic carbon black.
上述含酸基之顏料衍生物、上述含酸基之色素衍生物、及上述含酸基之色素中間物較佳為相對於100質量份之上述酸性碳黑而含有0~20質量份。 The acid group-containing pigment derivative, the acid group-containing dye derivative, and the acid group-containing dye intermediate are preferably contained in an amount of from 0 to 20 parts by mass per 100 parts by mass of the acidic carbon black.
上述含酸基之顏料衍生物、上述含酸基之色素衍生物、及上述含酸基之色素中間物更佳為相對於100質量份之上述酸性碳黑而含有0.5~10質量份。 The acid group-containing pigment derivative, the acid group-containing dye derivative, and the acid group-containing dye intermediate are preferably contained in an amount of 0.5 to 10 parts by mass based on 100 parts by mass of the acidic carbon black.
作為上述鹼可溶性樹脂,可列舉後述記載之鹼可溶性共聚物樹脂、鹼可溶性卡多樹脂(cardo resin)等。 The alkali-soluble copolymer resin described later, an alkali-soluble cardo resin, and the like are mentioned as the alkali-soluble resin.
上述鹼可溶性樹脂較佳為相對於100質量份之上述酸性碳黑而含有0~100質量份。 The alkali-soluble resin is preferably contained in an amount of from 0 to 100 parts by mass based on 100 parts by mass of the acidic carbon black.
上述鹼可溶性樹脂更佳為相對於100質量份之上述酸性碳黑而含有0.5~60質量份。 The alkali-soluble resin is more preferably contained in an amount of from 0.5 to 60 parts by mass based on 100 parts by mass of the acidic carbon black.
本發明之黑矩陣用顏料分散物係酸性碳黑、顏料分散劑、上述多官能環氧化合物、溶劑、及視需要添加之選自由含酸基之顏料衍生物、含酸基之色素衍生物、含酸基之色素中間物、及鹼可溶性樹脂所構成之群中之至少1種之混合物。黑矩陣用顏料分散物可使用輥磨機、捏合機、高速攪拌機、珠磨機、球磨機、砂磨機、超音波分散機、高壓分散裝置等,對該等之混合物進行分散處理而獲得。 The pigment dispersion for a black matrix of the present invention is an acidic carbon black, a pigment dispersant, the above polyfunctional epoxy compound, a solvent, and optionally a pigment derivative selected from an acid group-containing pigment derivative and an acid group-containing pigment derivative. A mixture of at least one of a group consisting of an acid group-containing dye intermediate and an alkali-soluble resin. The pigment dispersion for the black matrix can be obtained by subjecting the mixture to a dispersion treatment using a roll mill, a kneader, a high speed mixer, a bead mill, a ball mill, a sand mill, an ultrasonic disperser, a high pressure dispersing device, or the like.
其次,對本發明之黑矩陣用顏料分散光阻組成物進行說明。 Next, the pigment dispersion resist composition for a black matrix of the present invention will be described.
本發明之黑矩陣用顏料分散光阻組成物係如下者:主要由上述黑矩陣用顏料分散物、以及鹼可溶性樹脂、光聚合性化合物、光聚合起始劑、溶劑構成,視需要適當地添加聚合抑制劑等各種添加劑而獲得。 The pigment dispersion resist composition for a black matrix of the present invention is mainly composed of the pigment dispersion for a black matrix, an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, and a solvent, and is appropriately added as necessary. It is obtained by various additives such as a polymerization inhibitor.
作為使用於本發明之黑矩陣用顏料分散光阻組成物之鹼可溶性樹脂,可例示鹼可溶性共聚物、鹼可溶性卡多樹脂等。 The alkali-soluble resin used in the pigment dispersion resist composition for a black matrix of the present invention may, for example, be an alkali-soluble copolymer or an alkali-soluble cardo resin.
作為鹼可溶性共聚物,例如為使丙烯酸、甲基丙烯酸、衣康酸、順丁烯二酸、順丁烯二酸酐、順丁烯二酸單烷基酯、甲基順丁烯二酸、甲基順丁烯二酸酐、甲基順丁烯二酸單烷基酯等含羧基之不飽和單體、與選自由苯乙烯、丙烯酸2-羥基乙酯、甲基丙烯酸2-羥基乙酯、丙烯酸烯丙酯、 甲基丙烯酸烯丙酯、丙烯酸苄酯、甲基丙烯酸苄酯、甘油單丙烯酸酯、甘油甲基丙烯酸酯、具有二環戊二烯骨架之單(甲基)丙烯酸酯、N-苯基順丁烯二醯亞胺、聚苯乙烯巨單體、及聚甲基丙烯酸甲酯巨單體所構成之群中之至少1種反應而獲得之共聚物。 As the alkali-soluble copolymer, for example, acrylic acid, methacrylic acid, itaconic acid, maleic acid, maleic anhydride, maleic acid monoalkyl ester, methyl maleic acid, and methyl a carboxyl group-containing unsaturated monomer such as methacrylic anhydride or methyl maleic acid monoalkyl ester, and selected from the group consisting of styrene, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, and acrylic acid. Allyl ester, Allyl methacrylate, benzyl acrylate, benzyl methacrylate, glycerin monoacrylate, glycerol methacrylate, mono(meth)acrylate with dicyclopentadiene skeleton, N-phenyl cis-butyl A copolymer obtained by reacting at least one of a group consisting of an enediamine, a polystyrene macromonomer, and a polymethyl methacrylate macromonomer.
作為上述鹼可溶性卡多樹脂,可列舉茀環氧(甲基)丙烯酸衍生物與二羧酸酐及/或四羧酸二酐之加成產物即具有茀骨架之環氧(甲基)丙烯酸酯酸加成物等。 The alkali-soluble cardo-resin may, for example, be an epoxy (meth) acrylate acid having an anthracene skeleton, which is an addition product of a fluorene (meth)acrylic acid derivative and a dicarboxylic anhydride and/or a tetracarboxylic dianhydride. Additives, etc.
上述鹼可溶性樹脂可單獨使用或併用2種以上使用。鹼可溶性樹脂就塗膜形成性、鹼性顯影性之方面而言,較佳為酸值為20~300mgKOH/g,重量平均分子量為1000~20萬。上述鹼可溶性樹脂可根據要求之性能而適當地使用1種或組合2種以上使用。 These alkali-soluble resins may be used singly or in combination of two or more. The alkali-soluble resin preferably has an acid value of 20 to 300 mgKOH/g and a weight average molecular weight of 1,000 to 200,000 in terms of film formability and alkali developability. The above-mentioned alkali-soluble resin can be used singly or in combination of two or more kinds depending on the desired properties.
黑矩陣用顏料分散光阻組成物中之上述鹼可溶性樹脂之含量較佳為於黑矩陣用顏料分散光阻組成物中之固形物成分中成為5~50質量%之範圍。 The content of the alkali-soluble resin in the pigment dispersion resist composition of the black matrix is preferably in the range of 5 to 50% by mass in the solid content in the pigment dispersion resist composition for a black matrix.
作為使用於本發明之黑矩陣用顏料分散光阻組成物之光聚合性化合物,可列舉具有光聚合性不飽和鍵之單體、低聚物等。 The photopolymerizable compound used as the pigment dispersion resist composition for a black matrix of the present invention may, for example, be a monomer or oligomer having a photopolymerizable unsaturated bond.
具體而言,作為於分子內具有1個光聚合性不飽和鍵之單體,例如可使用甲基丙烯酸甲酯、甲基丙烯酸丁酯、甲基丙烯酸2-乙基己酯、丙烯酸甲酯、丙烯酸丁酯、丙烯酸2-乙基己酯等甲基丙烯酸烷基酯或丙烯酸烷基酯;甲基丙烯酸苄酯、丙烯酸苄酯等甲基丙烯酸芳烷基酯或丙烯酸芳烷基酯;甲基丙烯酸丁氧基乙酯、丙烯酸丁氧基乙酯等甲基丙烯酸烷氧基烷基酯或丙烯酸烷氧基烷基酯;甲基丙烯酸N,N-二甲胺基乙酯、丙烯酸N,N- 二甲胺基乙酯等甲基丙烯酸胺基烷基酯或丙烯酸胺基烷基酯;二乙二醇單乙醚、三乙二醇單丁醚、二丙二醇單甲醚等聚伸烷基二醇單烷基醚之甲基丙烯酸酯或丙烯酸酯;六乙二醇單苯醚等聚伸烷基二醇單芳基醚之甲基丙烯酸酯或丙烯酸酯;甲基丙烯酸異冰片酯或丙烯酸異冰片酯;甘油甲基丙烯酸酯或甘油丙烯酸酯;甲基丙烯酸2-羥基乙酯或丙烯酸2-羥基乙酯等。 Specifically, as a monomer having one photopolymerizable unsaturated bond in the molecule, for example, methyl methacrylate, butyl methacrylate, 2-ethylhexyl methacrylate, methyl acrylate, or the like can be used. An alkyl methacrylate or an alkyl acrylate such as butyl acrylate or 2-ethylhexyl acrylate; an aralkyl methacrylate or an aryl acrylate such as benzyl methacrylate or benzyl acrylate; Alkoxyalkyl methacrylate or alkoxyalkyl acrylate such as butoxyethyl acrylate or butoxyethyl acrylate; N,N-dimethylaminoethyl methacrylate, N,N acrylic acid - Aminoalkyl methacrylate such as dimethylaminoethyl ester or aminoalkyl acrylate; polyalkylene glycol such as diethylene glycol monoethyl ether, triethylene glycol monobutyl ether or dipropylene glycol monomethyl ether a methacrylate or acrylate of a monoalkyl ether; a methacrylate or acrylate of a polyalkylene glycol monoaryl ether such as hexaethylene glycol monophenyl ether; an isobornyl methacrylate or an isobornyl acrylate Ester; glycerin methacrylate or glycerin acrylate; 2-hydroxyethyl methacrylate or 2-hydroxyethyl acrylate.
作為於分子內具有2個以上之光聚合性不飽和鍵之單體,例如可使用雙酚A二甲基丙烯酸酯、1,4-丁二醇二甲基丙烯酸酯、1,3-丁二醇二甲基丙烯酸酯、二乙二醇二甲基丙烯酸酯、甘油二甲基丙烯酸酯、新戊二醇二甲基丙烯酸酯、聚乙二醇二甲基丙烯酸酯、聚丙二醇二甲基丙烯酸酯、四乙二醇二甲基丙烯酸酯、三羥甲基丙烷三甲基丙烯酸酯、新戊四醇三甲基丙烯酸酯、新戊四醇四甲基丙烯酸酯、二新戊四醇四甲基丙烯酸酯、二新戊四醇六甲基丙烯酸酯、二新戊四醇五甲基丙烯酸酯、雙酚A二丙烯酸酯、1,4-丁二醇二丙烯酸酯、1,3-丁二醇二丙烯酸酯、二乙二醇二丙烯酸酯、甘油二丙烯酸酯、新戊二醇二丙烯酸酯、聚乙二醇二丙烯酸酯、聚丙二醇二丙烯酸酯、四乙二醇二丙烯酸酯、三羥甲基丙烷三丙烯酸酯、新戊四醇三丙烯酸酯、新戊四醇四丙烯酸酯、二新戊四醇四丙烯酸酯、二新戊四醇六丙烯酸酯、二新戊四醇五丙烯酸酯等。 As a monomer having two or more photopolymerizable unsaturated bonds in the molecule, for example, bisphenol A dimethacrylate, 1,4-butanediol dimethacrylate, and 1,3-butyl can be used. Alcohol dimethacrylate, diethylene glycol dimethacrylate, glycerin dimethacrylate, neopentyl glycol dimethacrylate, polyethylene glycol dimethacrylate, polypropylene glycol dimethacrylate Ester, tetraethylene glycol dimethacrylate, trimethylolpropane trimethacrylate, neopentyl alcohol trimethacrylate, neopentyl alcohol tetramethacrylate, dipentaerythritol tetramethyl Acrylate, dipentaerythritol hexamethacrylate, dipentaerythritol pentamethacrylate, bisphenol A diacrylate, 1,4-butanediol diacrylate, 1,3-butane Alcohol diacrylate, diethylene glycol diacrylate, glycerin diacrylate, neopentyl glycol diacrylate, polyethylene glycol diacrylate, polypropylene glycol diacrylate, tetraethylene glycol diacrylate, trihydroxyl Methyl propane triacrylate, neopentyl alcohol triacrylate, neopentyl alcohol tetraacrylate, dioxane Tetraol tetraacrylate, dipentaerythritol hexaacrylate, dipentaerythritol pentaacrylate, and the like.
作為具有上述光聚合性不飽和鍵之低聚物,可使用使上述單體適當地聚合而獲得者。該等光聚合性化合物可單獨使用或組合2種以上使用。 As the oligomer having the photopolymerizable unsaturated bond, those obtained by appropriately polymerizing the above monomers can be used. These photopolymerizable compounds may be used singly or in combination of two or more.
於本發明中,上述光聚合性化合物之使用量係基於本發明之黑矩陣用顏料分散光阻組成物中之總固形物成分,較佳在3~50質量%之範圍。 In the present invention, the amount of the photopolymerizable compound used is preferably from 3 to 50% by mass based on the total solid content of the pigment dispersion resist composition for a black matrix of the present invention.
作為使用於本發明之黑矩陣用顏料分散光阻組成物之光聚合起始劑,並無特別限定,例如可使用二苯甲酮、N,N'-四乙基-4,4'-二胺基二苯甲酮、4-甲氧基-4'-二甲胺基二苯甲酮、苯偶醯(benzil)、2,2-二乙氧基苯乙酮、安息香、安息香甲醚、安息香異丁醚、苯偶醯二甲基縮酮(benzil dimethylketal)、α-羥基苯異丁酮、9-氧硫、2-氯-9-氧硫、1-羥基環己基苯酮、第三丁基蒽醌、1-氯蒽醌、2,3-二氯蒽醌、3-氯-2-甲基蒽醌、2-乙基蒽醌、1,4-萘醌、1,2-苯并蒽醌、1,4-二甲基蒽醌、2-苯基蒽醌、三系光聚合起始劑、肟酯(oxime ester)系光聚合起始劑等。該等光聚合起始劑可單獨使用或併用2種以上使用。 The photopolymerization initiator used as the pigment dispersion resist composition for a black matrix of the present invention is not particularly limited, and for example, benzophenone, N, N'-tetraethyl-4, 4'-di can be used. Aminobenzophenone, 4-methoxy-4'-dimethylaminobenzophenone, benzil, 2,2-diethoxyacetophenone, benzoin, benzoin methyl ether, Benzoin isobutyl ether, benzil dimethylketal, alpha-hydroxy phenyl isobutyl ketone, 9-oxygen sulphide 2-chloro-9-oxosulfur , 1-hydroxycyclohexyl benzophenone, tert-butyl hydrazine, 1-chloroindole, 2,3-dichloropurine, 3-chloro-2-methylindole, 2-ethyl hydrazine, 1 , 4-naphthoquinone, 1,2-benzopyrene, 1,4-dimethylindole, 2-phenylindole, three A photopolymerization initiator, an oxime ester photopolymerization initiator, and the like. These photopolymerization initiators may be used singly or in combination of two or more.
於本發明中,上述光聚合起始劑之使用量係基於本發明之黑矩陣用顏料分散光阻組成物中之總固形物成分,較佳為處於1~20質量%之範圍。 In the present invention, the amount of the photopolymerization initiator used is based on the total solid content of the pigment dispersion resist composition for a black matrix of the present invention, and is preferably in the range of 1 to 20% by mass.
作為使用於本發明之黑矩陣用顏料分散光阻組成物之溶劑,可使用與上述列舉之溶劑相同者。特佳為常壓(1.013×102kPa)下之沸點為100~250℃之酯系有機溶劑、醚系有機溶劑、醚酯系有機溶劑、酮系有機溶劑、芳香族烴系有機溶劑、含氮系有機溶劑等。若大量含有沸點超過250℃之有機溶劑,則存在如下情形:於對塗佈形成之塗膜進行預烤時,有機溶劑不會充分地蒸發而殘存於乾燥塗膜內,乾燥塗膜之耐熱性降低。又,若大量含有沸點未達100℃之有機溶劑,則存在如下情形:難以進行無不均而均勻地塗佈,而無法獲得表面平滑性優異之塗膜。 As the solvent used in the pigment dispersion resist composition for a black matrix of the present invention, the same solvents as those exemplified above can be used. Particularly preferred are ester-based organic solvents having a boiling point of 100 to 250 ° C under normal pressure (1.013 × 10 2 kPa), ether-based organic solvents, ether-ester organic solvents, ketone-based organic solvents, aromatic hydrocarbon-based organic solvents, and the like. A nitrogen-based organic solvent or the like. When a large amount of the organic solvent having a boiling point of more than 250 ° C is contained, when the coating film formed by coating is pre-baked, the organic solvent does not sufficiently evaporate and remains in the dried coating film, and the heat resistance of the dried coating film is dried. reduce. In addition, when a large amount of the organic solvent having a boiling point of less than 100 ° C is contained, it is difficult to apply uniformly without unevenness, and a coating film excellent in surface smoothness cannot be obtained.
作為此種溶劑,具體而言,有乙二醇單甲醚、乙二醇單乙醚、 乙二醇單異丙醚、乙二醇單丁醚、二乙二醇單甲醚、二乙二醇單乙醚、丙二醇單甲醚、丙二醇單乙醚、丙二醇單丁醚、二乙二醇二乙醚、二乙二醇二甲醚、二乙二醇甲基乙醚等醚系有機溶劑類;乙二醇單甲醚乙酸酯、乙二醇單乙醚乙酸酯、乙二醇單丁醚乙酸酯、丙二醇單甲醚乙酸酯、丙二醇單乙醚乙酸酯等醚酯系有機溶劑類;甲基異丁基酮、環己酮、2-庚酮、δ-丁內酯等酮系有機溶劑類;2-羥基丙酸甲酯、2-羥基丙酸乙酯、2-羥基-2-甲基丙酸乙酯、丙酸3-甲基-3-甲氧基丁酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯、乙氧基乙酸乙酯、羥基乙酸酯、甲酸正戊酯等酯系有機溶劑類;N-甲基吡咯啶酮、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺等含氮系有機溶劑類等;可將該等單獨使用或混合2種以上使用。 As such a solvent, specifically, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, Ethylene glycol monoisopropyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, diethylene glycol diethyl ether Ether-based organic solvents such as diethylene glycol dimethyl ether and diethylene glycol methyl ether; ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monobutyl ether acetate Ether esters such as ester, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate; organic solvents such as methyl isobutyl ketone, cyclohexanone, 2-heptanone, and δ-butyrolactone; Class; methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate, ethyl 2-hydroxy-2-methylpropionate, 3-methyl-3-methoxybutyl propionate, 3-methoxy Methyl propyl propionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl ethoxyacetate, hydroxyacetate, formic acid An organic solvent such as an ester of amyl ester; a nitrogen-containing organic solvent such as N-methylpyrrolidone, N,N-dimethylformamide or N,N-dimethylacetamide; Either alone or in combination of two or more.
於該等溶劑中,就溶解性、分散性、塗佈性等方面而言,較佳為二乙二醇二甲醚、二乙二醇甲基乙醚、乙二醇單甲醚乙酸酯、丙二醇單甲醚乙酸酯、丙二醇單乙醚乙酸酯、環己酮、2-庚酮、2-羥基丙酸乙酯、丙酸3-甲基-3-甲氧基丁酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸甲酯、甲酸正戊酯等。特佳為丙二醇單甲醚乙酸酯。 Among these solvents, diethylene glycol dimethyl ether, diethylene glycol methyl ether, ethylene glycol monomethyl ether acetate, and the like are preferable in terms of solubility, dispersibility, coatability and the like. Propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, cyclohexanone, 2-heptanone, ethyl 2-hydroxypropionate, 3-methyl-3-methoxybutyl propionate, 3-methyl Ethyl oxypropionate, methyl 3-ethoxypropionate, n-amyl formate, and the like. Particularly preferred is propylene glycol monomethyl ether acetate.
該等溶劑就上述顏料分散劑、上述多官能環氧化合物、上述鹼可溶性樹脂之溶解性、顏料分散性、塗佈性等方面而言,較佳為於使用於上述黑矩陣用顏料分散光阻組成物之總有機溶劑中,含有50質量%以上,更佳為含有70質量%以上。 The solvent is preferably used in the above-mentioned black matrix pigment dispersion resist in terms of solubility of the above pigment dispersant, the polyfunctional epoxy compound, and the alkali-soluble resin, pigment dispersibility, and coatability. The total organic solvent of the composition is contained in an amount of 50% by mass or more, and more preferably 70% by mass or more.
於本發明之黑矩陣用顏料分散光阻組成物中,亦可視需要而適當地使 用除上述者以外之其他光聚合性化合物、熱聚合抑制劑、抗氧化劑等各種添加劑。 In the pigment dispersion resist composition for a black matrix of the present invention, it may be appropriately made as needed Various additives such as a photopolymerizable compound, a thermal polymerization inhibitor, and an antioxidant other than the above are used.
製造本發明之黑矩陣用顏料分散光阻組成物之方法係本發明之較佳之實施形態之一例,本發明並不限定於此。例如,可利用如下方法:於黑矩陣用顏料分散物添加光聚合性化合物、光聚合起始劑、鹼可溶性樹脂,且視需要添加有機溶劑及其他添加劑,並使用攪拌裝置等進行攪拌混合。 The method of producing the pigment-dispersing photoresist composition for a black matrix of the present invention is an example of a preferred embodiment of the present invention, and the present invention is not limited thereto. For example, a photopolymerizable compound, a photopolymerization initiator, and an alkali-soluble resin may be added to the pigment dispersion for a black matrix, and an organic solvent and other additives may be added as needed, and stirred and mixed using a stirring device or the like.
再者,黑矩陣用顏料分散光阻組成物中之碳黑以黑矩陣用顏料分散光阻組成物之固形物成分中之質量%計,較佳為30~80質量%。 Further, the carbon black in the pigment dispersion resist composition for a black matrix is preferably 30 to 80% by mass based on the mass% of the solid content of the pigment dispersion resist composition for a black matrix.
根據本發明,可提供一種具有高遮光性及高絕緣性之黑矩陣用顏料分散物、及含有其之黑矩陣用顏料分散光阻組成物。 According to the invention, it is possible to provide a pigment dispersion for a black matrix having high light-shielding property and high insulation property, and a pigment dispersion resist composition for a black matrix containing the same.
以下,使用實施例具體地對本發明進行說明,但本發明係只要不脫離其主旨及適用範圍,則並不限定於該等實施例。再者,於本實施例中,若未特別說明,則「份」及「%」分別表示「質量份」及「質量%」。 Hereinafter, the present invention will be specifically described by using the examples, but the present invention is not limited to the examples as long as they do not depart from the gist of the invention and the scope of application. Further, in the present embodiment, "parts" and "%" indicate "parts by mass" and "mass%", respectively, unless otherwise specified.
以下之實施例、比較例中使用之黑矩陣用顏料分散物之材料如下。 The materials of the pigment dispersion for black matrix used in the following examples and comparative examples are as follows.
Special Black 250(德固賽公司製造、吸油量:46ml/100g、pH值:3.1、平均一次粒徑56nm) Special Black 250 (manufactured by Degussa, oil absorption: 46ml/100g, pH: 3.1, average primary particle size 56nm)
BYK-161(BYK Chemie公司製造、Disperbyk-161、胺值11mgKOH/g、酸值0mgKOH/g) BYK-161 (manufactured by BYK Chemie, Disperbyk-161, amine value 11 mgKOH/g, acid value 0 mgKOH/g)
JER-604(三菱化學公司製造、具有聯苯骨架之多官能環氧化合物) JER-604 (a multifunctional epoxy compound with a biphenyl skeleton manufactured by Mitsubishi Chemical Corporation)
EPICLON 830(DIC公司製造、具有二苯基甲烷骨架之多官能環氧化合物) EPICLON 830 (manufactured by DIC, a polyfunctional epoxy compound having a diphenylmethane skeleton)
JER-YX-4000(三菱化學公司製造、具有聯苯骨架之多官能環氧化合物) JER-YX-4000 (a multifunctional epoxy compound with a biphenyl skeleton manufactured by Mitsubishi Chemical Corporation)
TEPIC(日產化學公司製造、具有三骨架之多官能環氧化合物) TEPIC (manufactured by Nissan Chemical Co., Ltd., with three Skeleton polyfunctional epoxy compound)
DENACOL EX-141(長瀨化成公司製造、單官能環氧化合物) DENACOL EX-141 (manufactured by Changchun Chemical Co., Ltd., monofunctional epoxy compound)
Solsperse 5000(Lubrizol公司製造、酞菁衍生物) Solsperse 5000 (manufactured by Lubrizol, phthalocyanine derivative)
PGMEA(丙二醇單甲醚乙酸酯) PGMEA (propylene glycol monomethyl ether acetate)
以下之實施例、比較例中使用之黑矩陣用顏料分散光阻組成物之材料如下。 The materials of the pigment dispersion resist composition for a black matrix used in the following examples and comparative examples are as follows.
BzMA/MAA(甲基丙烯酸苄酯/甲基丙烯酸共聚物、理論酸值:120mgKOH/g、質量平均分子量:25000) BzMA/MAA (benzyl methacrylate/methacrylic acid copolymer, theoretical acid value: 120 mg KOH/g, mass average molecular weight: 25,000)
DPHA(二新戊四醇六丙烯酸酯) DPHA (dipentaerythritol hexaacrylate)
Irgacure 907(BASF公司製造、2-甲基-1[4-(甲硫基)苯基]-2-嗎啉基丙烷-1-酮) Irgacure 907 (manufactured by BASF, 2-methyl-1[4-(methylthio)phenyl]-2-morpholinylpropan-1-one)
PGMEA(丙二醇單甲醚乙酸酯) PGMEA (propylene glycol monomethyl ether acetate)
以成為表1之組成(表1中之各材料之使用量為質量%)之方式混合各種材料,藉由珠磨機混練一整天,而製備實施例1~6、比較例1~4之黑矩陣用顏料分散物。 The materials of Table 1 were mixed (the amount of each material used in Table 1 was mass%), and the materials were mixed by a bead mill for a whole day to prepare Examples 1 to 6 and Comparative Examples 1 to 4. A pigment dispersion for a black matrix.
使用高速攪拌機,以成為表1之組成(表1中之各材料之使用量為質量%)之方式均勻地混合實施例1~6、比較例1~4之各黑矩陣用顏料分散物與其他材料,之後,藉由孔徑為3μm之過濾器進行過濾而獲得實施例1~6、比較例1~4之各黑矩陣用顏料分散光阻組成物。 The pigment dispersions of the black matrix samples of Examples 1 to 6 and Comparative Examples 1 to 4 and the other examples were uniformly mixed in a high-speed mixer so as to have the composition of Table 1 (the amount of each material used in Table 1 is % by mass). After the material was filtered through a filter having a pore size of 3 μm, the pigment dispersion resist compositions for the black matrix of Examples 1 to 6 and Comparative Examples 1 to 4 were obtained.
對於實施例1~6、比較例1~4中獲得之黑矩陣用顏料分散物、及黑矩陣用顏料分散光阻組成物,藉由下述方法評價分散穩定性、光學密度、及表面電阻值,並將其結果示於表2。 With respect to the pigment dispersion for a black matrix obtained in Examples 1 to 6 and Comparative Examples 1 to 4 and the pigment dispersion resist composition for a black matrix, dispersion stability, optical density, and surface resistance value were evaluated by the following methods. And the results are shown in Table 2.
將實施例1~6、比較例1~4之各黑矩陣用顏料分散物分別採集至玻璃瓶並塞緊,根據下述評價基準評價於室溫保存7天後之狀態。 Each of the black matrix pigment dispersions of Examples 1 to 6 and Comparative Examples 1 to 4 was collected in a glass bottle and stoppered, and the state after storage at room temperature for 7 days was evaluated according to the following evaluation criteria.
A:增黏、沈澱物均未看到 A: No increase in viscosity or sediment
B:看到若輕輕搖晃則可恢復至原樣之程度之增黏或沈澱物 B: Viscosity or sediment that can be restored to the original level if shaken gently
C:看到即便強烈地搖晃亦不會恢復至原樣之程度之增黏或沈澱物 C: Viscosity or sediment that does not return to its original state even if it is shaken strongly
藉由旋轉塗佈機,以膜厚成為1μm之方式,將實施例1~6、比較例1 ~4之各黑矩陣用顏料分散光阻組成物塗佈至玻璃基板上,於以100℃預烤3分鐘後,藉由高壓水銀燈曝光,進而以230℃進行3小時之後烘烤而獲得僅形成於固體部之黑色光阻圖案。藉由麥克貝斯(Macbeth)濃度計(TD-931、商品名、麥克貝斯公司製造)測定所獲得之各固體部之黑色光阻圖案之光學密度(OD值)。 Examples 1 to 6 and Comparative Example 1 were obtained by a spin coater so that the film thickness became 1 μm. Each of the black matrix of ~4 was coated on the glass substrate with a pigment dispersion resist composition, prebaked at 100 ° C for 3 minutes, exposed to a high pressure mercury lamp, and further baked at 230 ° C for 3 hours to obtain only formation. A black photoresist pattern on the solid portion. The optical density (OD value) of the black resist pattern of each solid portion obtained was measured by a Macbeth densitometer (TD-931, trade name, manufactured by Macbeth).
藉由旋轉塗佈機,以膜厚成為1μm之方式,將實施例1~6、比較例1~4之各黑矩陣用顏料分散光阻組成物塗佈至玻璃基板上,於以100℃預烤3分鐘後,藉由高壓水銀燈曝光,進而以230℃進行3小時之後烘烤而獲得僅形成於固體部之黑色光阻圖案。藉由Advance公司製造、本體:微小電流計R8340、選用零件(option):屏蔽箱(shield box)R12702A,測定所獲得之各固體部之黑色光阻圖案之表面電阻值。 The pigment dispersion resist compositions of the black matrix of Examples 1 to 6 and Comparative Examples 1 to 4 were applied onto a glass substrate by a spin coater so that the film thickness was 1 μm, and the film was preliminarily prepared at 100 ° C. After baking for 3 minutes, it was exposed by a high pressure mercury lamp, and further baked at 230 ° C for 3 hours to obtain a black resist pattern formed only on the solid portion. The surface resistance value of the black resist pattern of each of the obtained solid portions was measured by an Advance company, a body: a micro galvanometer R8340, and an option: a shield box R12702A.
實施例1~6之黑矩陣用光阻組成物係於高遮光性及高絕緣性之兩方面優異。 The photoresist compositions for the black matrix of Examples 1 to 6 are excellent in both high light-shielding property and high-insulation property.
另一方面,比較例1、2、4之黑矩陣用光阻組成物未能獲得同時實現高遮光性及高絕緣性者。 On the other hand, the photoresist compositions for the black matrix of Comparative Examples 1, 2, and 4 failed to obtain high light-shielding properties and high insulation properties.
又,比較例3之黑矩陣用顏料分散物之分散穩定性較差,未能獲得可 足以成為光學密度及表面電阻值評價之對象之黑矩陣用光阻組成物。 Further, the pigment dispersion of the black matrix of Comparative Example 3 was inferior in dispersion stability and could not be obtained. A photoresist composition for a black matrix which is sufficient for evaluation of optical density and surface resistance value.
根據本發明,可提供一種具有高遮光性及高絕緣性之黑矩陣用顏料分散物、及含有其之黑矩陣用顏料分散光阻組成物。 According to the invention, it is possible to provide a pigment dispersion for a black matrix having high light-shielding property and high insulation property, and a pigment dispersion resist composition for a black matrix containing the same.
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CN107446409A (en) * | 2017-04-01 | 2017-12-08 | 济南市塑料油墨厂 | A kind of dumb light black ink with insulating properties |
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