TW201519962A - Application device for forming coating having discontinuous pattern onto strip-shaped film substrate, and method for manufacturing strip-shaped film substrate having uneven pattern - Google Patents

Abstract

An application device which forms a coat on a coating formation surface of a strip-shaped film substrate and comprises: an application roller which adheres a coating material on the outer peripheral surface and rotates; a coating liquid supply member which supplies the coating material to the application roller; a film substrate conveyance unit which continuously conveys while causing the coating formation surface of the film substrate to be in contact with the application roller; and a non-application region formation mechanism which forms a non-application region that continues in at least one direction on the film substrate. This application device is capable of forming a coating having a discontinuous pattern onto the substrate by a simple method.

Description

Coating device for forming a coating film having a discontinuous pattern on a belt-shaped film substrate, and method for producing a belt-shaped film member having a concave-convex pattern

The present invention relates to a coating apparatus and a coating film forming method for forming a coating film having a desired discontinuous pattern on a belt-shaped film substrate, and a film for producing a concave-convex pattern forming region on a substrate. A device and method for a member, and a method of manufacturing a substrate having a concavo-convex pattern.

As a method of forming a coating film on a belt-shaped film substrate, a method such as a gravure coating method is known in which a coating film material is adhered to a rotating coating roller, and the film substrate is conveyed and applied to the coating roller. The coating material is contacted to form a coating film on the film substrate.

The coating film forming method is used in various applications such as an electrode sheet such as a solar cell, a fuel cell, or a storage battery, an antireflection film, and a catalyst coating. However, in such applications, not only the coating film is formed on the substrate. On one side, it is necessary to form a coating film on a substrate which is divided into various shapes and areas. In this case, the coating-free region continuous in the longitudinal direction and the width direction can be formed by the method described in Patent Document 1, and a coating having an intermittent (discontinuous) pattern in the longitudinal direction and the width direction of the substrate can be formed. membrane. In the method described in Patent Document 1, the film substrate is conveyed in the longitudinal direction, and the backing roller placed in contact with the coating roller through the substrate is intermittently separated from the coating roller to thereby form the film. The substrate is separated from the applicator roll A coating film is formed in a continuous direction in the width direction of the film substrate, whereby a coating film is formed intermittently (discontinuously in the longitudinal direction) with respect to the longitudinal direction of the substrate. Moreover, the coating roller having the groove portion formed in the circumferential direction on the outer peripheral surface is used, and the film substrate is brought into contact with the coating roller while removing the coating material in the groove portion by a doctor blade or the like that is engaged with the groove portion. Further, the film is conveyed in the longitudinal direction to form a coating-free region continuous in the longitudinal direction (transport direction) of the film substrate, whereby the coating film is intermittently formed (discontinuously in the width direction) in the width direction of the substrate. According to the above method, a coating film having a discontinuous (discontinuous) pattern in the longitudinal direction and the width direction of the substrate can be formed.

Further, as a method of forming a fine pattern such as a semiconductor integrated circuit, In addition to the lithography method, a nanoimprint method is known. The nanoimprint method is a technique in which a nano-scale pattern can be transferred by sandwiching a resin between a mold and a substrate, and depending on the method of use, a thermal nanoimprint method, a photon imprint method, etc. have been studied. . Among them, the photon imprinting method is composed of i) coating of a resin layer, ii) pressing of a mold, iii) photohardening, and iv) four steps of die-off, in which a nano process can be realized by such a simple process. The processing of dimensions is very good at this point. In particular, since the resin layer uses a photocurable resin which is cured by light irradiation, the time required for the pattern transfer step is short, and high productivity can be expected. Therefore, not only semiconductor elements but also optical regions such as organic EL elements and LEDs, MEMS, and biochips are expected to be put into practical use.

The organic EL element (organic light-emitting diode) is a hole that enters from the anode through the hole injection layer and electrons that enter from the cathode through the electron injection layer are respectively transmitted to the light-emitting layer, and are organic molecules in the light-emitting layer. The two combine again to excite organic molecules, thereby emitting light. Therefore, in order to use the organic EL element as a display device or an illumination device, it is necessary to take out light from the light-emitting layer from the surface of the element with good efficiency, and thus it is known in Patent Document 2 that it will have a concave shape. A method in which a diffraction grating substrate of a convex pattern is provided on a light extraction surface of an organic EL element.

Further, the applicant disclosed a method in which a concave-convex pattern is transferred onto a substrate by using a flexible mold such as a film-like mold to manufacture a diffraction grating substrate for an organic EL element. The method of the concave and convex pattern. Patent Document 3 discloses that a film-shaped mold can be produced by transferring a concave-convex pattern of a roll-shaped metal mold to a film substrate through a roll process.

[Practical Technical Literature]

[Patent Literature]

Patent Document 1: Japanese Laid-Open Patent Publication No. 2000-51778

Patent Document 2: Japanese Laid-Open Patent Publication No. 2006-236748

Patent Document 3: WO2013/065384

When the metal substrate on which the uneven pattern is formed is wound around a roll and fixed as a mold, it is necessary to apply a weld or a resin filling to the gap between the end portions of the metal substrate to fill the gap. In the joint portion (joining portion) thus formed, irregularities due to welding, a resin gap, and the like may occur. According to the investigation by the applicant, it has been found that when a film-like mold is produced by using the roll process described in Patent Document 2, the film substrate is non-closed due to the unevenness of the joint portion of the mold. When the film is invaded, there is a problem that the pattern is defective, or the curable resin enters the gap between the joint portions, and the film substrate cannot be peeled off from the mold, which may cause problems such as breakage of the film substrate.

Accordingly, it is an object of the present invention to provide a film member having a concave-convex pattern which can be prevented from being caused by a transfer defect or a peeling failure due to a seam portion of a roll-shaped mold. Method and manufacturing equipment.

Moreover, another object of the present invention is to provide a coating device and a coating method. The method can form a coating film having a desired discontinuous (separation) pattern on a substrate in a simple manner, and is suitable for coating film formation of various patterns. Further, there is provided an apparatus and method for producing a film member having a concave-convex pattern forming region having a desired discontinuous pattern on a substrate by using such a coating device and a coating method.

Furthermore, it is also provided to manufacture a film member manufactured by the present invention as a mold. A method of a substrate having a concavo-convex pattern.

According to a first aspect of the present invention, a coating apparatus for forming a film on a coating film forming surface of a belt-shaped film substrate, comprising: a coating roller, and coating a coating material on an outer peripheral surface and rotating; The supply member supplies the coating material to the coating roller, and the film substrate conveying portion continuously conveys the coating film forming surface of the film substrate while contacting the coating roller; and the uncoated region The forming mechanism forms a non-coated region continuous in at least one direction on the film substrate.

In the above-described coating apparatus, the non-coated region forming mechanism may include an actuating roller that is biased toward the position where the film substrate is displaced from the application roller at a position where the film substrate is in contact with the application roller. The film substrate moves and is separated from the coating roller on the upstream side or the downstream side in the conveying direction of the film substrate; The coating direction is a coating-free region forming mechanism, and a coating-free region continuous in the conveying direction of the film substrate is formed.

In the above-described coating apparatus, the coating direction non-coating region forming means may include a belt-shaped mask providing portion located on the upstream side of the coating roller in the conveying direction of the film substrate, and the film substrate may be The coating film forming surface is provided with a belt-shaped mask which is banded along the conveying direction of the film substrate; and the strip-shaped mask peeling portion is located downstream of the coating roller in the conveying direction of the film substrate The strip mask is peeled off from the film substrate.

In the above-described coating device, the transfer direction non-coating region forming means may include a liquid-repellent material applying portion located on the upstream side of the coating roller in the conveying direction of the film substrate and coating the liquid-repellent material It is applied to the aforementioned coating film forming surface of the film substrate.

In the above coating apparatus, the application roller may include the coating direction non-coating region forming mechanism, and the conveying direction non-application region forming mechanism may be formed on the outer circumferential surface of the coating roller and applied to the coating Two or more liquid holding regions continuous in the circumferential direction of the roller, and a liquid non-retaining region formed between the respective liquid holding regions on the outer peripheral surface of the coating roller.

In the coating apparatus, the coating liquid supply member may include the conveying direction non-coating region forming mechanism, and the conveying direction non-coating region forming mechanism may include at least two of the application roller in a rotation axis direction. The above coating liquid supply room.

In the above coating device, the actuating roller may be provided separately from the application roller on the downstream side in the conveying direction of the film substrate.

The coating device may include a tension control unit for maintaining the tension of the film substrate constant during the conveyance of the film substrate.

In the above coating apparatus, the non-coating region forming means may include an air knife that blows a gas toward the coating film forming surface of the film substrate to make the film substrate non-contact with the coating roller.

In the above coating apparatus, the non-coated region forming mechanism may further include a suction roller that is disposed to face the air knife, and that attracts the film substrate when the film substrate and the coating roller are not in contact And keep it. The suction roller may also have a mechanism for exhausting gas. The non-coated region forming mechanism may further include another air knife that blows gas toward the back surface of the coating film forming surface of the film substrate.

In the above-described coating apparatus, the non-coated region forming mechanism may further include a coating-free region forming mechanism that forms a non-coated region in the transport direction of the film substrate in the film substrate.

In the above-described coating apparatus, the coating direction non-coating region forming means may include a belt-shaped mask providing portion located on the upstream side of the coating roller in the conveying direction of the film substrate, and the film substrate may be The coating film forming surface is provided with a belt-shaped mask which is banded along the conveying direction of the film substrate; and the strip-shaped mask peeling portion is located downstream of the coating roller in the conveying direction of the film substrate The strip mask is peeled off from the film substrate.

The coating device may be configured to include a coating region forming mechanism in the conveying direction. The liquid-repellent material coating portion is located on the upstream side of the coating roller in the conveying direction of the film substrate, and the liquid-repellent material is applied to the coating film forming surface of the film substrate.

In the above coating apparatus, the application roller may include the coating direction non-coating region forming mechanism, and the conveying direction non-application region forming mechanism may be formed on the outer circumferential surface of the coating roller and applied to the coating Two or more liquid holding regions continuous in the circumferential direction of the roller, and a liquid non-retaining region formed between the respective liquid holding regions on the outer peripheral surface of the coating roller.

In the coating apparatus, the coating liquid supply member may include the conveying direction non-coating region forming mechanism, and the conveying direction non-coating region forming mechanism may include at least two of the application roller in a rotation axis direction. The above coating liquid supply room.

In the above-mentioned coating apparatus, the non-coated region forming means may include a pattern mask providing portion located on the upstream side of the coating roller in the conveying direction of the film substrate, and the coating film on the film substrate The pattern mask is provided on the forming surface, and the pattern mask peeling portion is located on the downstream side of the coating roller in the transport direction of the film substrate, and the pattern mask is peeled off from the film substrate.

In the above coating device, the pattern mask may have a pattern that is divided in the conveying direction of the pattern mask.

The coating device may be the pattern mask having the pattern mask The continuous direction of the transport direction.

In the above coating device, the non-coated region forming mechanism may further include A coating-free region forming mechanism is formed on the film substrate so as to form a non-coated region continuous in the conveying direction of the film substrate.

According to a second aspect of the present invention, there is provided a device for manufacturing a strip-shaped film member having a concave-convex pattern, comprising: a coating portion for applying a concave-convex forming material on a belt-shaped film substrate to form a film; and a transfer portion having a transfer roller having a concave-convex pattern, wherein the concave-convex pattern is transferred to the film; and a conveying unit that continuously conveys the film substrate from the coating portion to the transfer portion; the coating portion has a first aspect Coating device.

Further, the apparatus for manufacturing a film member may further include: a detecting unit that detects a rotation state of the transfer roller; and a control unit that controls the coating unit; and the transfer roller is a thin plate-shaped mold having the uneven pattern a transfer roller that is wound around the base roller and whose end portions of the thin plate-shaped mold are connected to each other on the outer circumferential surface of the base roller; and the control unit controls the coating portion based on the rotation state detected by the detection unit. The film substrate is coated on the film substrate in a state in which the uncoated portion of the film substrate not coated with the unevenness forming material is opposed to the seam portion of the thin plate-shaped mold of the transfer roller in the transfer portion. The aforementioned film is laminated on the aforementioned transfer roller.

According to a third aspect of the present invention, a coating apparatus of a first aspect is provided in a thin A method of forming a coating film on a film substrate, comprising the step of forming a non-coated region on the film substrate.

According to a fourth aspect of the present invention, there is provided a method of producing a strip-shaped film member having a concavo-convex pattern, comprising: a coating step of applying a concavo-convex forming material to a film substrate while conveying a strip-shaped film substrate; a film; and a transfer step of transferring the uneven pattern of the transfer roller to the film while conveying the film substrate; and in the coating step, contacting the film substrate with the unevenness forming material to form the film A coating portion coated with the unevenness forming material is formed on the substrate, and the film substrate is separated from the unevenness forming material to form an uncoated portion to which the uneven forming material is not applied, thereby intermittently applying the aforementioned In the transfer step, the transfer roller has a thin plate-shaped mold having the uneven pattern wound around a base roll, and the end portions of the thin plate-shaped mold are coupled to each other on the outer peripheral surface of the base roll. a printing roller, wherein the film stack on the film substrate is stacked in such a manner that the uncoated portion of the film substrate faces the seam portion of the thin plate-shaped mold of the transfer roller Pressing on the aforementioned transfer roller.

The method of manufacturing the film member may further include a detecting step of detecting a rotation state of the transfer roller, and controlling coating of the film substrate in the coating step according to a rotation state detected by the detecting step. The time at which the above-mentioned unevenness forms a material.

The coating device of the present invention is provided on the film substrate to form at least one side The coating-free region forming mechanism (hereinafter simply referred to as "no-coating region forming mechanism") is applied to the continuous uncoated region, so that a coating film having a discontinuous (separated) pattern can be formed on the substrate. For example, by the non-coated region forming mechanism, the coating roller is moved by contact or separation while conveying the film substrate, whereby a coating-free region continuous in the width direction of the film substrate can be formed. When the air-blade is used to form a mechanism for the film substrate to be moved or displaced by the application roller, the device can be singulated. When a non-coated region forming mechanism that applies a film substrate to which a pattern mask is applied while contacting the application roller is used, a coating film having a pattern of a coating-free region having a shape corresponding to the shape of the pattern mask can be used. Formed on a film substrate. Therefore, since the mechanical structure for displacing the conveyance path of the film substrate is not required, the device configuration is simple. The non-coated region forming mechanism may further include a mechanism for forming a non-coated region continuous in the longitudinal direction (transport direction) of the film substrate, whereby a coating film having various patterns can be easily formed on the substrate. Further, a film substrate having a concave-convex pattern formed on a substrate in a desired region can be produced using the coating device. Further, in the method for producing a film member having a concavo-convex pattern of the present invention, the concavo-convex forming material is intermittently applied to the film substrate to face the seam portion of the film substrate and the transfer roller. By forming the uncoated portion of the unevenness forming material, it is possible to reduce the transfer failure and the peeling failure, and the film member can be efficiently produced. When the produced film member is used to manufacture a substrate for an organic EL device, the substrate to be produced has good light extraction efficiency. Therefore, the coating apparatus and the coating method of the present invention, and the manufacturing apparatus and manufacturing method of the film member having the uneven pattern are used for an electrode sheet, an antireflection film, such as an organic EL element, a solar cell, a fuel cell, or a storage battery. It is extremely effective in the manufacture of substrates such as catalyst coating.

11‧‧‧Striped mask

26‧‧‧Drain film

40, 41‧‧ ‧ coating roller

42‧‧‧Acoustic roller

44‧‧‧ Air knife

46‧‧‧Attraction roller

50, 50', 50" ‧ ‧ pattern mask

62‧‧‧ Optical Sensor

74‧‧‧Press roller

80‧‧‧film substrate

80a‧‧‧film components

82‧‧‧ Coating liquid supply member

84‧‧·coating film

86‧‧‧The Ministry of Painting

88‧‧‧Unpainted Department

90‧‧‧Transfer roller

90a‧‧‧ base roller

90b‧‧‧thin plate mold

90c‧‧‧Seam

100a~d‧‧‧film member manufacturing device

120‧‧‧film transport department

130‧‧‧Tension Control Department

140A~D‧‧‧ Coating Department

140a~p‧‧‧ coating device

160‧‧‧Transfer Department

180‧‧‧Control Department

Fig. 1 is a view conceptually showing a coating apparatus according to a first embodiment.

Fig. 2 is a view conceptually showing a coating apparatus of a second embodiment.

Fig. 3 is a view conceptually showing a coating apparatus according to a third embodiment.

Fig. 4 is a view conceptually showing a coating apparatus of a fourth embodiment.

5(a) to 5(c) are diagrams conceptually showing a coating apparatus according to a fifth embodiment for forming a coating film which is discontinuous in the longitudinal direction of the substrate.

Fig. 6 is a view conceptually showing a coating apparatus according to a sixth embodiment for forming a coating film which is discontinuous in the longitudinal direction and the width direction of the substrate.

Fig. 7 is a view conceptually showing a coating apparatus according to a seventh embodiment for forming a coating film which is discontinuous in the longitudinal direction and the width direction of the substrate.

Fig. 8 is a view conceptually showing a coating apparatus according to an eighth embodiment for forming a coating film which is discontinuous in the longitudinal direction and the width direction of the substrate.

Fig. 9 is a view conceptually showing a coating apparatus according to a ninth embodiment for forming a coating film which is discontinuous in the longitudinal direction and the width direction of the substrate.

Fig. 10 is a view conceptually showing a coating apparatus according to a tenth embodiment for forming a coating film having a discontinuous pattern on a substrate.

Fig. 11 is a view conceptually showing a coating apparatus for forming an eleventh embodiment having a coating film having a discontinuous pattern on a substrate.

Figure 12 is a conceptual view showing the 12th step of forming a coating film having a discontinuous pattern on a substrate. A diagram of a coating apparatus of an embodiment.

Fig. 13 is a view conceptually showing a coating apparatus for forming a coating film having a discontinuous pattern on a substrate.

Fig. 14 is a view conceptually showing a coating apparatus for forming a coating film having a discontinuous pattern on a substrate.

Fig. 15 is a view conceptually showing an apparatus for manufacturing a strip-shaped film member having a concavo-convex pattern according to a fifteenth embodiment of the coating apparatus according to the first to fourth embodiments.

Fig. 16 is a view conceptually showing an apparatus for manufacturing a strip-shaped film member having a concavo-convex pattern according to a sixteenth embodiment of the coating apparatus according to the fifth to ninth embodiments.

Fig. 17 is a view conceptually showing an apparatus for manufacturing a strip-shaped film member having a concavo-convex pattern according to a seventeenth embodiment of the coating apparatus according to the tenth to fourteenth embodiments.

Fig. 18 is a flow chart showing a method of manufacturing a strip-shaped film member having a concavo-convex pattern according to a nineteenth embodiment.

Fig. 19 is a flow chart conceptually showing an apparatus for manufacturing a strip-shaped film member having a concavo-convex pattern according to a twentieth embodiment.

Fig. 20 is a schematic cross-sectional view showing a transfer roller used in a method of manufacturing a strip-shaped film member having a concavo-convex pattern according to a nineteenth embodiment.

Fig. 21 is a view showing in detail a coating portion of a manufacturing apparatus of a strip-shaped film member having a concavo-convex pattern according to a twentieth embodiment.

Fig. 22 is a view showing in detail a transfer portion of a manufacturing apparatus of a strip-shaped film member having a concavo-convex pattern according to a twentieth embodiment.

Fig. 23 is a view showing an example of a control unit of a manufacturing apparatus for a strip-shaped film member having a concavo-convex pattern according to a twentieth embodiment.

Fig. 24 is a view conceptually showing an example of a state in which a concavo-convex pattern of a strip-shaped film member is transferred onto a substrate.

25(a) to (c) are diagrams conceptually showing an example of a pattern of a pattern mask used in the coating apparatus of the tenth embodiment.

Hereinafter, an embodiment of a coating apparatus, a manufacturing apparatus and a manufacturing method of a strip-shaped film member having a concavo-convex pattern, and a member having a concavo-convex pattern produced using the concavo-convex pattern will be described with reference to the drawings.

[First Embodiment]

A first embodiment of a coating apparatus of the present invention will be described with reference to Fig. 1 . As shown in FIG. 1, the coating device 140a mainly includes a film conveying unit 120a that continuously feeds out the film substrate 80, and applies a liquid on the film substrate 80 sent from the film conveying unit 120a to form a coating film 84. The roller 40, the operation roller 42 that supplies the coating liquid (coating material) to the application roller 40, and the belt-shaped cover which is provided on the upstream side of the application roller 40 and which imparts a belt-shaped mask (mask sheet) 11 to the film substrate 80. The cover providing portion 270 and the strip-shaped mask peeling portion 290 which is located on the downstream side of the application roller 40 and which peels off the tape mask 11 on the film substrate 80. Further, the coating device 140a may be provided with a tension control portion for maintaining the tension of the film substrate 80 constant. In the coating device 140a, the operation roller 42, the belt-shaped mask providing portion 270, and the belt-shaped mask peeling portion 290 function as a non-coated region forming mechanism. The belt-shaped mask providing portion 270 and the belt-shaped mask peeling portion 290 particularly function as a coating-free region forming mechanism in the transport direction. The following details The structure of each part of the Ming Dynasty.

<film conveying unit>

As shown in FIG. 1, the film conveying unit 120a mainly has a conveying roller 78 for conveying the belt-shaped film substrate 80 in the conveying direction (the direction of the arrow in FIG. 1). Further, although not shown in Fig. 1, a delivery roller that feeds the film substrate 80 and a take-up roller that is provided downstream of the application roller 40 to wind up the film substrate 80 may be provided (see Fig. 15). The film substrate 80 can be transported in the transport direction by the rotational driving of the transport roller 78 and/or the rotational driving of the feed roller and the take-up roller.

The film substrate 80 is continuously processed in order to be transported while being transported. A film substrate in the form of a strip or strip. The film substrate 80 is, for example, a film-like glass, a resin, a polyethylene terephthalate (PET), a polyethylene naphthalate (PEN), a polycarbonate (PC), a cycloolefin polymer ( COP), an organic material such as polymethyl methacrylate (PMMA), polystyrene (PS), polyurethane (PI), or polyacrylic acid. The film substrate can be transparent or opaque. In order to improve the adhesion of the film substrate 80 to the coating film formed on the surface thereof, the film substrate 80 may also be subjected to an easy subsequent treatment on the surface. A gas barrier layer or the like can also be provided. Although the size of the film substrate 80 can be appropriately set, for example, the width of the film substrate 80 can be set to 50 to 3000 mm, and the thickness can be set to 1 to 500 μm.

<Coating roller and coating liquid supply member>

The application roller 40 applies a liquid to the film substrate 80 to form a coating film 84. A gravure roll was used as the application roller 40. The uneven roller has a liquid holding region 40a in which fine irregularities are formed on the outer peripheral surface, and is rotated about a rotation axis by a drive system (not shown). The coating liquid supply member 82 includes a chamber in which the coating material is stored, and a portion of the coating roller 40 is immersed in the stored coating material. When the application roller 40 rotates, the coating material is held in the circumferential direction of the liquid holding region 40a of the application roller 40. Coating roller 40 The coating film 40 is placed opposite to the surface of the film substrate 80 (coating film forming surface), and the coating film held by the liquid holding region 40a of the coating roller 40 is brought into contact with the continuously conveyed film while rotating the coating roller 40. The substrate 80 is formed by adhering a coating material to the film substrate 80 to form a coating film 84.

The size of the application roller 40 and its liquid holding region 40a can be appropriately set. Prevent The length of the liquid-retaining region 40a in the direction of the rotation axis direction is preferably smaller than the width of the film substrate 80 from the viewpoint that the film-stopping material exceeds the right and left end portions of the film substrate 80 and wraps around the back surface of the film substrate 80.

<Actuation roller>

The actuating roller 42 is selectively displaced to the back surface of the supporting film substrate 80 (the surface opposite to the coating film forming surface) so that the film substrate 80 is in contact with the application roller 40 (i.e., the solid line in Fig. 1). The position of the actuating roller 42 (hereinafter referred to as "contact position" as appropriate) and the position at which the film substrate 80 is separated from the application roller 40 (that is, the position of the actuating roller 42 shown by a broken line in Fig. 1 is hereinafter referred to as " Separate position"). In Fig. 1, the movement trajectory of the contact position and the separation position of the operation roller 42 is indicated by an arrow. The actuating roller 42 can be changed in position by a mechanism for moving the film base material 80 to the application roller 40, such as an actuator (not shown). When the operation roller 42 is at the contact position, the coating material held by the application roller 40 comes into contact with the film substrate 80, and the coating material adheres to the film substrate 80 to form the coating film 84. On the other hand, when the operation roller 42 is at the separation position, since the film substrate 80 is separated from the coating material held by the application roller 40, the coating material does not adhere to the film substrate 80, and the coating film is not formed. Therefore, by switching the position of the operation roller 42 while conveying the film substrate 80, the coating film 84 which is discontinuous in the conveyance direction of the film substrate 80 can be formed.

As shown in FIG. 1, the actuating roller 42 is not disposed at a position opposed to the application roller 40. Further, it is provided at a position separated by a predetermined distance δ from the application roller 40. This configuration has the following technical features significance. In Fig. 1, when the operation roller 42 is at the separation position, the film substrate 80 does not contact the application roller 40, and the film substrate 80 is in a state of being stretched between the operation roller 42 and the support roller 18 on the upstream side. When the actuating roller 42 is moved from the separated position to the contact position, the distance moved by the actuating roller 42, that is, the moving distance d1 of the film substrate 80 in contact with the actuating roller 42, is higher than between the film substrate 80 and the coating roller 40. The distance change amount d2 is large. The ratio of the moving distance of the actuating roller 42 to the distance between the film substrate 80 and the coating roller 40 corresponding to the distance is roughly equivalent to the distance between the supporting roller 18 and the actuating roller 42 and the supporting roller 18 and the coating roller 40. The ratio of the distance between the two. Therefore, the distance between the application roller 40 and the film substrate 80 can be increased or the film substrate 80 can be applied to the application roller 40 by adjusting the movement of the actuation roller spaced apart from the application roller 40 by the support roller 18. Position alignment accuracy. Further, by moving the operation roller 42 to the contact position and the film substrate 80 is brought into contact with the application roller 40 to change the position of the operation roller 42, the film substrate 80 can be pressed with high precision to the application roller 40. Power. In particular, when the film substrate 80 is in contact with the application roller 40, there is a contact between the operation roller 42 and the film substrate 80 in the tangential direction of the point where the application roller 40 contacts the film substrate 80, but The position of the actuating roller is such that the distance from the radius of the actuating roller 42 is such that the actuating roller 42 is moved to the contact position side (the direction away from the separating position), so that the application of the coating roller 40 to the film substrate 80 can be stabilized. The separation distance δ between the actuating roller 42 and the application roller 40 is effective if it is equal to or larger than the diameter of the actuating roller, and depends on the diameter of the actuating roller 42, but it can be disposed, for example, by separating 150 mm to 250 mm.

<Belt mask giving unit>

The band-shaped mask (mask sheet) 11 is shielded from the film substrate 80 in a region where the conveyance direction is continuous, and is conveyed together with the film substrate 80 to be continuously processed. The belt mask 11 is a belt-like or elongated member. As the strip mask 11, for example, a film of the same material as the film substrate 80 can be used. also, It is also possible to use a material such as polyphenylene sulfide (PPS) or polyethylene (PE) which repels the coating material (the coating material does not get wet). Alternatively, the surface of the belt-shaped mask 11 may be subjected to a liquid-repellent treatment by a fluororesin, a crucible or the like to repel the surface of the belt-shaped mask 11 (the surface on the opposite side to the surface in contact with the film substrate 80). By causing the strip mask 11 to repel the coating material, the amount of the coating material can be suppressed. The back surface of the strip mask 11 (the surface in contact with the film substrate 80) may also have adhesiveness to fix the strip mask 11 on the film substrate 80. The width of the strip mask 11 can be appropriately determined depending on the width of the coating-free pattern formed on the film substrate 80 in the direction in which the film substrate 80 is conveyed, the width of the uncoated region, or the desired product form. However, it may be smaller than the width of the film substrate 80. Moreover, although the thickness of the strip mask 11 can be, for example, 5 μm to 1000 μm, it is more likely to be damaged when it is too thin from the viewpoint of workability, and it is difficult to wind up using a take-up roll when it is too thick. Moreover, if it is too thick, the application roller 40 and the film base material 80 cannot contact, and it is difficult to apply. The belt-shaped cover 11 is taken out from the belt-shaped cover-feeding roller 13, and taken up by the belt-shaped cover take-up roll 15.

The belt-shaped mask providing portion 270 is provided by the belt-shaped mask feeding roller 13 and the opposite coating roller 40 is disposed on the upstream side of the film substrate in the transport direction and is a pair of rollers that are opposite to each other, that is, the bonding roller 17 and the support roller 18. In the belt-shaped mask providing portion 270, the belt-shaped mask 11 fed from the belt-shaped mask feeding roller 13 is superposed on the film base material 80 and sandwiched between the bonding roller 17 and the support roller 18, thereby A tape mask 11 is applied to the film substrate 80 in the conveyance direction of the film substrate 80. In the position where the strip-shaped mask 11 in the width direction of the film substrate 80 is provided, it can be seen that the coating film pattern formed on the film substrate 80 is continuous with the uncoated region of the film substrate 80 in the conveying direction. It is also possible to provide a mechanism for moving the belt-shaped cover feeding roller 13 in a direction orthogonal to the conveying direction (the width direction of the film substrate 80).

<Belt mask peeling section>

The strip-shaped mask peeling portion 290 is composed of a peeling roller 19 and a supporting roller 20 which are a pair of rollers which are opposed to each other in the transport direction of the film substrate and which are opposed to each other. The strip-shaped mask peeling portion 290 is conveyed in a direction in which the strip-shaped mask 11 is separated from the film substrate 80 by being placed on the film substrate 80 between the peeling roller 19 and the support roller 20, The strip mask 11 is peeled off from the film substrate 80. The strip mask 11 to be peeled off can be taken up by a belt-shaped cover take-up roll 15 provided at a position away from the conveyance path of the film substrate 80.

Further, the belt mask 11 can be rotated by the bonding roller 17 and the peeling roller 19. The drive and/or belt-shaped cover feed roller 13 and the belt-shaped cover take-up roller 15 are rotationally driven or driven by the film substrate 80 to be transported in the transport direction.

<tension control unit>

Further, the coating device 140a may further have a tension control unit (not shown) that maintains the tension of the film substrate 80 constant at any portion of the film conveying unit. The tension control unit functions to maintain the tension of the film substrate 80 by the tension fluctuation of the film substrate 80 that is placed on the coating device 140a by moving the operation roller 42 to the contact position or the separation position. . Although various mechanisms or control methods can be employed for the tension control unit, for example, a dancer roll may be provided on the transport path of the film substrate 80. Further, the driving of the film feeding roller can be directly controlled by the tension of the film substrate 80. In this case, a tension sensor (not shown) such as a roller having a tension detecting function can be disposed in contact with the film substrate 80. The tension sensor can be connected to a control device for controlling the driving of the delivery roller, for example, a control system of a motor that rotationally drives the delivery roller, and the motor is controlled to rotate the delivery roller according to the tension value detected by the tension sensor. Speed changes. Thereby, the film substrate 80 The tension is kept constant, and the slack or protrusion of the film substrate caused by the moving motion of the actuating roller can be eliminated.

The tension of the film substrate 80 is kept constant in the tension control unit. The mechanism can also be used to feed a roller-connected torque motor (not shown). The torque motor can adjust the rotational speed or torque in accordance with the change in the load applied to the delivery roller. Therefore, if the torque of the torque motor is set to be constant, even if the tension applied to the film substrate 80 changes, the rotational force (torque) for rotating the delivery roller can be kept constant at any time.

The tension of the film substrate 80 is kept constant in the tension control unit. The mechanism may also be provided with a magnetic powder clutch (not shown) on the delivery roller. The magnetic powder clutch is a magnetic powder such as iron powder in a joint surface between a drive shaft (input shaft) that transmits the motive force of the motor and a transmission shaft (output shaft) that transmits the motive force thereof, and is usually controlled by a magnetic field generated from an electromagnetic stone provided on the clutch. The density and the like are controlled to control the transmission of the motive force. In this case, by setting the magnetic powder clutch to slip out when a predetermined torque is applied to the delivery roller, the torque of the delivery roller can be controlled to be constant. Alternatively, by providing the above-described tension control portion, the magnetic powder density can be adjusted in accordance with the value of the tension applied to the film substrate 80, whereby the torque of the feed roller can be controlled by the slip of the clutch.

Next, it is explained that the film substrate 80 is formed using the coating device 140a as described above. The movement direction (longitudinal direction) and the operation of the coating film 84 in which the width direction is discontinuous.

First, the film transfer unit 120a is transferred, and the film substrate 80 is sent out. The roller is sent to the belt mask providing portion 270 through the transport roller 78. In the belt-shaped mask providing portion 270, the belt-shaped mask 11 which is fed from the belt-shaped mask feeding roller 13 by the bonding roller 17 and the supporting roller 18 is sandwiched together with the film base material 80 to form the belt-shaped mask 11 Superimposed on the surface of the film substrate 80 (coating film forming surface) The established position on the top.

Next, the film substrate 80 on which the strip mask 11 is laminated is transferred to the application roller. 40 opposite positions (front side of the coating roller 40). When the portion of the film substrate 80 where the coating film 84 is to be formed is conveyed to the front surface of the application roller 40, the operation roller 42 is moved to the contact position (the position indicated by the solid line in Fig. 1) by an actuator or the like. By the movement of the actuating roller 42, the film substrate 80 and the strip mask 11 are brought into contact with the application roller 40 while moving in the transport direction, whereby the film substrate 80 and the strip mask 11 have a predetermined film thickness. A coating film 84 is formed. Further, in the case where the belt-shaped mask 11 is formed by repelling the material of the coating material or the liquid-repellent treatment is applied to the surface of the belt-shaped mask 11, the coating film is not formed on the belt-shaped mask 11. When the film substrate 80 is continuously conveyed to the front surface of the application roller 40 without continuously forming the coating film 84 in the width direction, the operation roller 42 is moved to the separation position by an actuator or the like (in FIG. Position shown). By the movement of the actuating roller 42, the film substrate 80 and the strip mask 11 which are moved in the transport direction are separated from the application roller 40, so that no coating film is formed on the film substrate 80 and the strip mask 11, On the other hand, a coating-free region continuous in the width direction of the film substrate 80 is formed. As described above, by changing the position of the operation roller 42 in a predetermined cycle, the coating film 84 which is discontinuous in the conveying direction of the film substrate 80 can be formed on the film substrate 80 and the belt mask 11.

The film substrate 80 and the strip mask 11 are next conveyed to the strip mask peeling portion. 290. After the film substrate 80 on which the strip mask 11 is laminated passes between the peeling roller 19 and the support roller 20, the strip mask 11 is transported away from the film substrate 80, and the strip mask 11 is removed from the film. The substrate 80 is peeled off. The strip mask 11 after peeling is taken up by a belt-shaped cover take-up roll 15. Since the coating film formed on the belt mask 11 is also peeled off from the film substrate 80 together with the belt mask 11, it is thin The region of the film substrate 80 that overlaps the strip mask 11 becomes a non-coated region in which a coating film is not formed. In this manner, a coating-free region in which the film substrate 80 is continuous in the conveying direction is formed, and the coating film 84 which is discontinuous in the width direction of the film substrate 80 can be formed. In addition, although the strip mask 11 shown in FIG. 1 has a linear shape, the strip mask 11 may have a shape such as a curved line or a fold line shape, and may also be formed in a shape continuous to the film substrate 80 by the shape of the strip mask 11. The uncoated area of the transport direction.

In the above manner, the film substrate 80 can be transferred using the coating device 140a. A coating film 84 having discontinuous directions and width directions is formed on the film substrate 80. The coating film 84 on the film substrate 80 has a pattern in which a plurality of blocks (concave-convex pattern forming regions) separated from each other in the conveying direction and the width direction of the film substrate 80 are arranged.

In addition, although a strip-shaped strip mask 11 is used in FIG. 1, it can also be used. Two or more strip-shaped strip masks 11. A plurality of uncoated regions extending in the transport direction of the film substrate may be formed depending on the number of strip masks used. A coating film having a desired length in the width direction of the film substrate 80 and separated at a desired distance in the width direction of the film substrate 80 can be formed in accordance with the distance between the strip masks and the width of the strip mask. 84. Further, the coating device 140a can form a coating film 84 having a desired length in the conveying direction of the film substrate 80 and separated at a desired distance in the conveying direction of the film substrate 80, depending on the timing of the displacement of the operation roller 42 or the like. Therefore, the coating film of various patterns can be easily formed using the coating device 140a.

[Second Embodiment]

A second embodiment of the coating apparatus of the present invention will be described with reference to Fig. 2 . As shown in FIG. 2, the coating device 140b mainly includes a film conveying unit 120a that continuously feeds out the film substrate 80, and applies a liquid on the film substrate 80 sent from the film conveying unit 120a to form a coating film 84. Roller 40, counter-coating The coating roller 40 supplies the coating liquid supply member 82 for applying the coating liquid, the driving roller 42 that displaces the conveying path of the film substrate 80, and the liquid dispensing on the upstream side of the coating roller 40 and applying the liquid-repellent material to the film substrate 80. Material coating portion 310. Further, the coating device 140b may be provided with a tension control portion for maintaining the tension of the film substrate 80 constant. In the coating device 140b, the operation roller 42 and the liquid-repellent material application portion 310 function as a non-coated region forming mechanism. The liquid-repellent material application portion 310 particularly functions as a coating-free region forming mechanism in the transport direction.

Film conveying unit 120a of coating device 140b, coating roller 40, coating liquid supply structure The member 82, the operation roller 42, and the tension control unit have the same configuration as the film transport unit 120a, the application roller 40, the coating liquid supply member 82, the actuation roller 42, and the tension control unit of the coating device 140a of the first embodiment. The description is omitted.

<liquid dispensing material coating section>

As shown in FIG. 2, the liquid-repellent material application unit 310 includes a liquid-repellent material application roller 22 and a liquid-repellent material supply chamber 24. The length of the coating surface of the liquid-repellent material application roller 22 in the direction of the rotation axis can be regarded as the width of the uncoated region or the desired product which is formed on the film substrate 80 in the direction in which the film substrate 80 is conveyed. The shape and the like are appropriately determined, but may be smaller than the width of the film substrate 80. A liquid-like liquid-repellent material is stored in the liquid-repellent material supply chamber 24. The liquid-repellent material is preferably, for example, substantially different in surface energy with respect to the coating film, and if the coating film is a hydrophilic material, it is preferably a liquid-repellent material containing fluorine, for example. When the coating film is a hydrophobic material, it is preferably a hydrophilic material containing oxygen, for example. The liquid-repellent material application roller 22 is provided to be rotated in a state where one of the application surfaces is partially immersed in the liquid-repellent material in the liquid-repellent material supply chamber 24. When the liquid-repellent material application roller 22 is immersed in the liquid-repellent material, the coating surface of the liquid-repellent material application roller 22 covers the liquid-repellent material in the circumferential direction. maintain. The liquid-repellent material application roller 22 applies a liquid-repellent material to the film substrate 80 while rotating while contacting the surface (coating film forming surface) of the film substrate 80 to form a liquid-repellent film 26. Further, the position at which the liquid-repellent material application roller 22 is disposed in the width direction of the film substrate 80 can be appropriately determined depending on the position of the film-free substrate 80 which is continuous with the uncoated region of the film substrate 80 in the transport direction. It is also possible to provide a mechanism for moving the liquid-repellent material supply chamber 24 containing the liquid-repellent material application roller 22 in a direction orthogonal to the conveyance direction. Further, after the liquid-repellent material application roller 22 (downstream side), a heater or a heat roller for drying or hardening the liquid-repellent material may be provided on the back surface of the film substrate 80 (opposite to the coating film formation surface). surface). The temperature is between 50 and 250 degrees, and the temperature can be set depending on the heat resistance of the film substrate 80. It is also possible to provide a UV irradiator instead of a heater or a heat roller.

Next, it is explained that the film substrate 80 is formed using the coating device 140b as described above. The movement direction (longitudinal direction) and the operation of the coating film 84 in which the width direction is discontinuous.

First, the film transfer unit 120a is transferred, and the film substrate 80 is sent out. The roller is sent to the liquid-repellent material application unit 310 through the transfer roller 78. In the liquid-repellent material application portion 310, the liquid-repellent material application roller 22 is rotated while the application surface on which the liquid-repellent material is held is brought into contact with a predetermined position of the film substrate 80. Thereby, the liquid-repellent film 26 which is continuous in the conveyance direction of the film base material 80 is formed in the predetermined position on the surface (coating film formation surface) of the film base material 80.

Next, the film substrate 80 on which the liquid repellent film 26 is formed is transferred to the application roller. 40 opposite positions (front side of the coating roller 40). In the same manner as the operation of the coating device 140a according to the first embodiment of the present invention, when the portion of the film substrate 80 where the coating film 84 is to be formed is conveyed to the front surface of the application roller 40, the actuator roller or the like is used to actuate the roller. 42 moves to the contact position (the position shown by the solid line in Figure 2) Set). By the movement of the operation roller 42, the film substrate 80 comes into contact with the application roller 40 while moving in the conveyance direction. Thereby, the coating film 84 is formed on the film substrate 80 with a predetermined film thickness. At this time, in the region where the liquid-repellent film 26 is formed on the film substrate 80, a film is not formed in order to repel the coating film material. Therefore, the coating-free region which is continuous in the conveying direction of the film substrate 80 can be formed in accordance with the region in which the liquid-repellent film 26 is formed, and the coating film 84 which is discontinuous in the width direction of the film substrate 80 can be formed. Further, when the film substrate 80 is continuously conveyed to the front surface of the application roller 40 without forming the coating film 84 in the width direction, the operation roller 42 is moved to the separation position by an actuator or the like (in FIG. The location of the diagram). By the movement of the actuating roller 42, since the film substrate 80 moved in the transport direction is separated from the application roller 40, a coating film is not formed on the film substrate 80, and is formed continuously in the width direction of the film substrate 80. No coating area. As described above, by changing the position of the operation roller 42 in a predetermined cycle, the coating film 84 which is discontinuous in the conveyance direction of the film substrate 80 can be formed on the film substrate 80.

In the above manner, the film substrate 80 can be transferred using the coating device 140b. A coating film 84 having discontinuous directions and width directions is formed on the film substrate 80. The coating film 84 on the film substrate 80 has a pattern in which a plurality of blocks are separated from each other in the conveying direction and the width direction of the film substrate 80.

In addition, in FIG. 2, a liquid-repellent material coating roller 22 having a coating surface is used. To form a linear liquid-repellent film 26, a plurality of liquid-like liquid-repellent films 26 may be formed by using a liquid-repellent material application roller having a plurality of coated surfaces. A plurality of uncoated regions extending in the transport direction of the film substrate can be formed in accordance with the number of the liquid-repellent films 26 formed. Further, the liquid-repellent material application roller 22 can be moved in the direction of the rotation axis. Thereby, the direction of the extension extending to the film substrate can be The coating area is formed at a desired position in the width direction of the film substrate. The distance between the respective application materials of the liquid-repellent material coating rolls 22, the width and position of each of the liquid-repellent material application rolls 22, and the like can be formed to have a desired length in the width direction of the film substrate 80 and in the width direction of the film substrate 80. The coating film 84 is separated by a desired distance. Further, the coating device 140b can form a coating film 84 having a desired length in the conveying direction of the film substrate 80 and separated at a desired distance in the conveying direction of the film substrate 80, depending on the timing of displacement of the operation roller 42 or the like. Therefore, the coating film of various patterns can be easily formed using the coating device 140b.

[Third embodiment]

A third embodiment of the coating apparatus of the present invention will be described with reference to Fig. 3 . As shown in FIG. 3, the coating device 140c mainly includes a film conveying unit 120a that continuously feeds out the film substrate 80, and applies a liquid on the film substrate 80 sent from the film conveying unit 120a to form a coating film 84. The roller 41, the coating liquid supply member 82 that supplies the coating liquid to the application roller 41, and the operation roller 42 that displaces the conveyance path of the film substrate 80. Further, the coating device 140c may be provided with a tension control unit for maintaining the tension of the film substrate 80 constant. In the coating device 140c, the operation roller 42 and the application roller 41 function as a coating-free region forming mechanism. In particular, the application roller 41 functions as a coating-free region forming mechanism in the conveyance direction.

The film conveying unit 120a of the coating device 140c, the coating liquid supply member 82, and the actuation The roller 42 and the tension control unit have the same configuration as the film transport unit 120a, the coating liquid supply member 82, the actuation roller 42, and the tension control unit of the coating device 140a of the first embodiment.

<application roller>

The application roller 41 applies a liquid to the film substrate 80 to form a coating film 84. Use with outer circumference The uneven roller in which two or more liquid holding regions 41a having fine unevenness are formed is used as the coating roller 41. Two or more liquid holding regions 41a are respectively continuous in the circumferential direction of the application roller 41. The coating material supplied from the coating liquid supply member 82 is held in the liquid holding portion 41a of the coating roller 41. The region 41b sandwiched by the respective liquid holding regions 41a in the direction of the rotation axis of the application roller 41 is subjected to treatment for not holding the coating material (hereinafter, such a region 41b is appropriately referred to as a liquid non-retaining region 41b). Such a treatment can be performed, for example, by forming the concave portion of the region 41b into a flat surface having no unevenness, by performing liquid-repelling on the surface of the region 41b, and recessing the region 41b with respect to the liquid holding region 41a. The application roller 41 is disposed opposite to the surface (coating film forming surface) of the film substrate 80, and the coating film held by the liquid holding region 41a is brought into contact with the continuously transported film substrate while the coating roller 41 is rotated. The material 80 is formed by adhering a coating material to the film substrate 80 to form a coating film 84.

The length and position of the application roller 41 and the liquid holding region 41a in the direction of the rotation axis can be appropriately set depending on the length and position of the coating film 84 formed on the film substrate 80 in the width direction of the film substrate 80.

Next, an operation of forming the coating film 84 which is discontinuous in the conveying direction (longitudinal direction) and the width direction of the film substrate 80 by the coating device 140c as described above will be described.

First, the film conveyance unit 120a is conveyed, and the film substrate 80 is conveyed from the delivery roller through the conveyance roller 78 to a position facing the application roller 41 (the front surface of the application roller 41). In the same manner as the operation of the coating device 140a according to the first embodiment of the present invention, when the portion of the film substrate 80 where the coating film 84 is to be formed is conveyed to the front surface of the application roller 41, the actuator roller or the like is used to actuate the roller. 42 moves to the contact position (the position shown by the solid line in Fig. 3). By the movement of the operation roller 42, the film substrate 80 comes into contact with the application roller 41 while moving in the conveyance direction. Due to the liquid in the coating roller 41 Since the body holding region 41a holds the coating material, the coating film 84 is formed on the film substrate 80 in a region opposed to the liquid holding region 41a with a predetermined film thickness. On the other hand, since the coating material is not held in the liquid non-retaining region 41b of the application roller 41, the coating film 84 is not formed on the film substrate 80 in the region opposed to the liquid non-holding region 41a. Thereby, the coating-free region which is continuous in the conveying direction of the film substrate 80 can be formed, and the coating film 84 which is discontinuous in the width direction of the film substrate 80 can be formed. In the film substrate 80, when the portion where the coating film 84 is not formed in the width direction is conveyed to the front surface of the application roller 41, the operation roller 42 is moved to the separation position by an actuator or the like (in FIG. The location of the diagram). By the movement of the actuating roller 42, since the film substrate 80 moved in the transport direction is separated from the application roller 41, a coating film is not formed on the film substrate 80, and is formed continuously in the width direction of the film substrate 80. No coating area. As described above, by changing the position of the operation roller 42 in a predetermined cycle, the coating film 84 which is discontinuous in the conveyance direction of the film substrate 80 can be formed on the film substrate 80.

In the above manner, the film substrate 80 can be transferred using the coating device 140c. A coating film 84 having discontinuous directions and width directions is formed on the film substrate 80. The coating film 84 on the film substrate 80 has a pattern in which a plurality of blocks are separated from each other in the conveying direction and the width direction of the film substrate 80.

In addition, although FIG. 3 uses two liquid holding regions 41a and one liquid. The application roller 41 of the non-retaining region 41b may be used, but an application roller having three or more liquid holding regions 41a and two or more liquid non-retaining regions 41b may be used. A plurality of uncoated regions extending in the transport direction of the film substrate can be formed depending on the number of liquid non-retaining regions. The film substrate 80 can be formed on the basis of the width and position of each of the liquid holding regions 41a and the liquid non-holding regions 41b. The coating film 84 having a desired length in the width direction and separated at a desired distance in the width direction of the film substrate 80. Further, the coating device 140c can form a coating film 84 having a desired length in the conveying direction of the film substrate 80 and separated at a desired distance in the conveying direction of the film substrate 80, depending on the timing of the displacement of the operation roller 42 or the like. Therefore, the coating film of various patterns can be easily formed using the coating device 140c.

[Fourth embodiment]

A fourth embodiment of the coating apparatus of the present invention will be described with reference to Fig. 4 . As shown in FIG. 4, the coating device 140d mainly includes a film conveying unit 120a that continuously feeds out the film substrate 80, and applies a liquid on the film substrate 80 sent from the film conveying unit 120a to form a coating film 84. The roller 40 includes a coating liquid supply member 82' including two or more coating liquid supply chambers 82a for supplying the coating liquid to the coating roller 40, and an operation roller 42 for displacing the conveying path of the film substrate 80. Further, the coating device 140d may be provided with a tension control unit for maintaining the tension of the film substrate 80 constant. In the coating device 140d, the operation roller 42 and the coating liquid supply member 82' function as a coating-free region forming mechanism. The coating liquid supply member 82' particularly functions as a coating-free region forming mechanism in the conveying direction.

The film conveying unit 120a of the coating device 140d, the application roller 40, the operation roller 42, and the tension control unit, and the film conveying unit 120a of the coating device 140a of the first embodiment, the application roller 40, the operation roller 42, and the tension control The same structure.

<coating supply member>

The coating liquid supply member 82' includes two or more coating liquid supply chambers 82a in which the coating material is stored, and one portion of the coating film material is applied to the stored coating material. When the application roller 40 rotates, the coating material is held in the area of the coating material in the liquid holding region 40a of the coating roller 40, and the coating material is not immersed in the coating film 40 in the region of the coating material. . On film substrate 80 The size and the position of the coating liquid supply chamber 82a in the width direction can be appropriately set depending on the length and position of the coating film 84 formed on the film substrate 80 in the width direction of the film substrate 80.

Next, an operation of forming the coating film 84 which is discontinuous in the conveying direction (longitudinal direction) and the width direction of the film substrate 80 by the coating device 140d as described above will be described.

First, the film conveyance unit 120a is conveyed, and the film substrate 80 is conveyed from the delivery roller through the conveyance roller 78 to a position facing the application roller 40 (the front surface of the application roller 40). In the same manner as the operation of the coating device 140a according to the first embodiment of the present invention, when the portion of the film substrate 80 where the coating film 84 is to be formed is conveyed to the front surface of the application roller 40, the actuator roller or the like is used to actuate the roller. 42 moves to the contact position (the position shown by the solid line in Fig. 4). By the movement of the operation roller 42, the film substrate 80 comes into contact with the application roller 40 while moving in the conveyance direction. The liquid holding area 41a of the application roller 40 is formed with a region in which the coating material supplied from the two or more coating liquid supply chambers 82a is held, and a region in which the coating material is not supplied and the coating material is not held. The coating film material is adhered to the region of the film substrate 80 opposed to the region where the coating material is held by the application roller 40, and the coating film 84 is formed with a predetermined film thickness. On the other hand, the coating film 84 is not formed in the region of the film substrate 80 opposed to the region where the coating film material is not held by the application roller 40. Thereby, the coating-free region which is continuous in the conveying direction of the film substrate 80 can be formed, and the coating film 84 which is discontinuous in the width direction of the film substrate 80 can be formed. In the film substrate 80, when the portion where the coating film 84 is not formed in the width direction is conveyed to the front surface of the application roller 40, the operation roller 42 is moved to the separation position by an actuator or the like (in FIG. The location of the diagram). By the movement of the actuating roller 42, since the film substrate 80 moved in the transport direction is separated from the application roller 40, a coating film is not formed on the film substrate 80, and is formed continuously in the width direction of the film substrate 80. No coating area. The actuating roller 42 is repeatedly reversed by a predetermined period as described above. By the operation of the position change, the coating film 84 which is discontinuous in the conveyance direction of the film substrate 80 can be formed on the film substrate 80.

In the above manner, the film substrate 80 can be transferred using the coating device 140d. A coating film 84 having discontinuous directions and width directions is formed on the film substrate 80. The coating film 84 on the film substrate 80 has a pattern in which a plurality of blocks are separated from each other in the conveying direction and the width direction of the film substrate 80.

In addition, although two liquid supply chambers 824 are used in FIG. 4, three may be used. The above coating liquid supply room. A plurality of regions in which the coating material is held on the liquid holding region 40a of the coating roller 40 can be formed according to the number of the coating liquid supply chambers, and a coating material is not formed between the regions in which the coating material is held. region. A plurality of uncoated regions extending in the transport direction of the film substrate can be formed in accordance with the number of regions of the liquid holding region 40a of the application roller 40 where the coating material is not held. Alternatively, instead of providing a plurality of coating liquid supply chambers for one coating roller, a plurality of coating rollers each provided with a coating liquid supply chamber may be used. In this case, each of the application rollers is disposed at a position where the conveyance direction of the film substrate 80 is different, and the coating liquid supply chamber of each application roller is disposed at a position separated from each other in the width direction of the film substrate 80. Further, a mechanism capable of independently moving the coating liquid supply chambers in the axial direction may be provided. The coating film having a desired length in the width direction of the film substrate 80 and separated at a desired distance in the width direction of the film substrate 80 can be formed depending on the distance between the coating liquid supply chambers, the width and position of each chamber, and the like. 84. Further, the coating device 140d can form a coating film 84 having a desired length in the conveying direction of the film substrate 80 and separated at a desired distance in the conveying direction of the film substrate 80, depending on the timing of displacement of the operation roller 42 or the like. Therefore, the coating film of various patterns can be easily formed using the coating device 140d.

[Fifth Embodiment]

In the fifth embodiment, a coating device 140e for forming a coating film which is discontinuous in the longitudinal direction (transport direction) of the substrate will be described. As shown in FIG. 5(a), the coating device 140e mainly includes a film conveying unit 120a that continuously feeds out the film substrate 80, and a liquid is applied onto the film substrate 80 sent from the film conveying unit 120a to form a coating film 84. The coating roller 40, the coating liquid supply member 82 that supplies the coating liquid (coating material) to the coating roller 40, and the upstream side of the coating roller 40 in the conveying direction of the film substrate 80 to the film substrate 80 The surface (the surface on which the coating film 84 is formed) is blown by the gas to displace the conveying path of the film substrate 80 by the air knife 44. In the coating device 140e, the air knife 44 functions as a coating-free region forming mechanism. The detailed structure of each part will be described below.

The film conveying portion 120a of the coating device 140e, the coating roller 40, and the coating liquid supply Since the member 82 is configured in the same manner as the film transporting unit 120a, the application roller 40, and the coating liquid supply member 82 of the coating device 140a of the first embodiment, the description thereof will be omitted.

<Air knife>

The air knife 44 is located on the upstream side with respect to the application roller 40 in the conveyance direction of the film base material 80, and extends in the direction (width direction) orthogonal to the conveyance direction of the film base material 80. The air knife 44 is formed with a slit for blowing a high-pressure gas along its extending direction (the longitudinal direction of the air knife 44). The air knife 44 sprays a high-pressure gas on the surface (coating film forming surface) of the film substrate 80, and the path of the film substrate 80 is transferred from the film substrate 80 to the coating roller 40 by the wind pressure thereof. (The path shown by the solid line in Fig. 5(a), hereinafter appropriately referred to as "contact path") is moved to the path where the film substrate 80 is separated from the application roller 40 (shown in phantom in Fig. 5(a) The path shown, hereinafter appropriately referred to as "separation path", enables the film substrate 80 to be in non-contact with the application roller 40.

When the gas knife 44 does not blow out the gas, the conveying path of the film substrate 80 is followed. Touch the path. In this case, the coating material held by the coating roller 40 contacts the film substrate 80, and the coating material adheres to the film substrate 80 to form the coating film 84. On the other hand, when the gas knife 44 blows out the gas, the transport path of the film substrate 80 follows the separation path. In this case, since the film substrate 80 is separated (becomes non-contact) from the coating material held by the coating roller 40, the coating material does not adhere to the film substrate 80, and the coating film 84 is not formed. By switching the gas from the air knife 44 while switching the film substrate 80, the coating film 84 which is discontinuous in the transport direction of the film substrate 80 can be formed. The coating device 140e may further include a control device for controlling switching of a switch for blowing gas from the air knife 44.

The film substrate 80 in a state where the transport path of the film substrate 80 is a separation path The distance from the application roller 40 is preferably in the range of 5 to 50 mm. This distance can be obtained by the slit width of the air knife 44 and the gas pressure to be ejected, the distance between the contact path of the film substrate 80 and the air knife 44, the distance between the air knife 44 and the application roller 40, and the tension of the film substrate 80. Wait to adjust.

As the gas blown from the air knife 44, for example, it can be used by various filtering Remove air or water (clean dry gas) from water droplets or dust, or blunt gas such as nitrogen. From the viewpoint of the working environment, it is preferable to clean the air such as a dry gas.

Next, a description will be given of a coating apparatus 140e using the fifth embodiment as described above. The operation of the coating film 84 which is discontinuous in the conveyance direction (longitudinal direction) of the film substrate 80 is formed.

First, the film transfer unit 120a is transferred, and the film substrate 80 is sent out. The roller is conveyed by the conveyance roller 78 to a position facing the application roller 40 (the front surface of the application roller 40). A portion in which the coating film 84 is not formed continuously in the width direction in the film substrate 80 is conveyed to the front surface of the application roller 40 At this time, the gas is blown from the air knife 44 so that the transport path of the film substrate 80 becomes a separation path. Thereby, a non-coated region continuous in the width direction of the film substrate 80 is formed. Next, when the portion of the film substrate 80 where the coating film 84 is to be formed is conveyed to the front surface of the application roller 40, the gas from the air knife 44 is stopped, so that the conveyance path of the film substrate 80 becomes a contact path. Thereby, the film substrate 80 is brought into contact with the application roller 40 while moving in the conveyance direction, and the coating film 84 is formed on the film substrate 80 with a predetermined film thickness. By repeating the start and stop of the gas blowing from the air knife 44 as described above, the coating film 84 which is discontinuous in the conveying direction of the film substrate 80 can be formed on the film substrate 80.

In the above manner, the film substrate 80 can be transferred using the coating device 140e. A coating film 84 having a discontinuous direction is formed on the film substrate 80. The coating film 84 on the film substrate 80 is separated from each other in the conveying direction of the film substrate 80. The coating device 140e can be easily formed to have a desired length in the conveying direction of the film substrate 80 and at a desired distance in the conveying direction of the film substrate 80 by changing the start and stop timings of the gas blowing from the air knife 44. The coated film 84 is separated. Since the coating device 140e moves the film substrate relative to the application roller by using an air knife, a complicated device structure for maintaining the tension of the film substrate at a certain level is not required, and a discontinuous coating film can be formed by a simple device. .

As shown in FIG. 5(b), the coating device 140e may further include a suction roller 46. In the coating device 140e', the suction roller 46 is provided on the side of the back surface of the film substrate 80 (the surface opposite to the coating film forming surface) facing the air knife 44. The suction roller 46 can hold the film substrate 80 on the separation path by sucking the gas ejected by the air knife 44 to suck the film substrate 80 moved on the separation path.

The suction roller 46 is a roller that generates an attraction force from the outer side to the inner side of the outer peripheral surface of the roller. Further, the suction roller 46 may also be exhausted from the inner side to the outer side of the outer peripheral surface of the roller. Suction roller usually Since the air blower (having a suction port and a discharge port) is provided, it can be exhausted by replacing the suction port and the discharge port. The suction roller 46 has, for example, a cylindrical roller body, and a plurality of through holes penetrating the peripheral wall of the roller body are provided on the outer peripheral surface of the roller body. The through hole may be provided by making the material of the outer peripheral surface of the suction roller 46 a porous body such as ceramic. The through hole may be formed by using a perforated metal or the like to form the outer circumferential surface of the suction roller 46 in a mesh shape. The shape of the through hole can be circular, elliptical, rhombic, slit, or the like. The suction roller 46 can suck the gas or the object outside the roller to the inside of the roller through the through hole, or discharge the gas inside the roller to the outside of the roller. The switching of the suction and exhaust of the suction roller 46 can be performed in synchronization with the switching of the blowing switch of the air knife 44 as will be described later. The coating device 140e' may include a control device that controls the air knife 44 and the suction roller 46 to operate in synchronization.

The transfer side formed on the film substrate 80 using the coating device 140e' will be described below. The action of the coating film 84 that is discontinuous (in the longitudinal direction).

First, the film transfer unit 120a is transferred, and the film substrate 80 is sent out. The roller is conveyed by the conveyance roller 78 to a position facing the application roller 40 (the front surface of the application roller 40). When the film substrate 80 is continuously conveyed to the front surface of the application roller 40 without being formed in the width direction, the gas is blown from the air knife 44, and the outer peripheral surface of the suction roller 46 is attracted from the outer side to the inner side. The film substrate 80 is held and held, whereby the transport path of the film substrate 80 becomes a contact path. Thereby, a non-coated region continuous in the width direction of the film substrate is formed. Further, while the film substrate 80 is held by the suction force of the suction roller 46, the gas from the air knife 44 can be stopped. Next, when the portion of the film substrate 80 where the coating film 84 is to be formed is conveyed to the front surface of the application roller 40, the gas from the air knife 44 is stopped, and is discharged from the inner side to the outer side of the outer surface of the suction roller 46. Gas, thereby changing the transport path of the film substrate 80 to a contact path path. Thereby, the film substrate 80 is brought into contact with the application roller 40 while moving in the conveyance direction, so that the coating film 84 is formed on the film substrate 80 with a predetermined film thickness. Further, while the transport path of the film substrate 80 is the contact path, the suction roller 46 may also suck the gas through the through hole, or may be discharged or may not be sucked or discharged. For example, by discharging the gas from the suction roller 46, the gas can impart a force to press the film substrate 80 against the application roller 40, and can also promote the formation of the coating film on the film substrate 80. As described above, the film substrate 80 can be conveyed on the film substrate 80 while the film substrate 80 is conveyed, and the start and stop of the blowing of the gas from the air knife 44 and the suction and discharge of the suction roller 46 are repeated. The coating film 84 in which the conveying direction of 80 is discontinuous.

Using suction roller 46 The coating device 140e' may blow the gas from the air knife 46 only when the conveying path of the film substrate 80 is changed from the contact path to the separation path, and the gas may be stopped while the suction roller 46 holds the film substrate 80. The gas of the knife 44 is blown out. Therefore, the film substrate 80 can be prevented from undulating by the flow of the gas blown from the air knife 44 while the transport path of the film substrate 80 is at the separated position.

In addition, although a suction roller is used in FIG. 5(b), plural numbers can also be used. A suction roller is used to attract and hold the film substrate 80.

As shown in FIG. 5(c), the coating device can be further inserted in addition to the suction roller 46. The step has an air knife 48. In the coating device 140e", the air knife 48 is provided close to the suction roller 46 so as to be blown to the back surface of the film substrate 80. The coating device 140e' is discharged from the inside to the outside of the suction roller 46. The gas is changed to the contact path by the film substrate 80. However, in the coating device 140e", the suction roller 46 may stop the suction, and the air knife 48 blows the gas toward the back surface of the film substrate 80. Changing the transport path of the film substrate 80 to contact path. Therefore, the suction roller 46 used in the coating device 140e" may not be able to discharge the gas from the inner side to the outer side of the outer peripheral surface of the roller.

[Sixth embodiment]

In the sixth embodiment, a coating device 140f for forming a coating film which is discontinuous in the longitudinal direction (transport direction) and the width direction of the substrate will be described. As shown in FIG. 6, the coating device 140f mainly includes a film transfer unit 120a that continuously feeds out the film substrate 80, and a coating roll that applies a liquid on the film substrate 80 sent from the film transfer unit 120a to form a coating film 84. 40. A coating liquid supply member 82 for supplying a coating liquid (coating material) to the coating roller 40, on the upstream side of the coating roller 40 in the conveying direction of the film substrate 80, and on the surface of the film substrate 80 (forming a coating film) The air knife 44 that blows the gas to move the transport path of the film substrate 80 is located on the upstream side of the air knife 44 in the transport direction of the film substrate 80 and imparts a strip mask to the film substrate 80. The strip-shaped mask providing portion 270 of the (mask sheet) 11 and the strip-shaped mask of the strip-shaped mask 11 on the downstream side of the application roller 40 in the transport direction of the film substrate 80 and on the release film substrate 80 Stripping portion 290. In the coating device 140f, the air knife 44, the band-shaped mask providing portion 270, and the band-shaped mask peeling portion 290 function as a non-coated region forming mechanism. The belt-shaped mask providing portion 270 and the belt-shaped mask peeling portion 290 particularly function as a coating-free region forming mechanism in the transport direction.

Film conveying unit 120a of coating device 140f, coating roller 40, coating liquid supply structure Since the member 82 and the air knife 44 have the same configuration as the film transport unit 120a, the application roller 40, the coating liquid supply member 82, and the air knife 44 of the coating device 140e of the fifth embodiment, the description thereof will be omitted. Further, the belt-shaped mask providing portion 270 and the strip-shaped mask peeling portion 290 of the coating device 140f are the strip-shaped mask providing portion 270 and the strip-shaped mask peeling portion 290 of the coating device 140a of the first embodiment. Isomorphism to make. In addition, the belt-shaped mask providing portion 270 of the coating device 140f shown in FIG. 6 is provided with a bonding roller 17 in which the belt-shaped mask feeding roller 13 and the opposing coating roller 40 are located on the upstream side in the conveying direction of the film substrate. In the belt-shaped mask providing portion 270, the belt-shaped mask 11 fed from the belt-shaped mask feeding roller 13 is sandwiched between the film substrate 80 and the bonding roller 17, and is transported along the film substrate 80. A strip-shaped mask 11 is applied to the film substrate 80 in the direction. The position of the tape-shaped mask 11 in the width direction of the film substrate 80 can be appropriately set depending on the position of the film-form substrate 80 which is continuous with the coating-free region in the conveyance direction of the film substrate 80.

Next, it is explained that the film substrate 80 is formed using the coating device 140f as described above. The movement direction (longitudinal direction) and the operation of the coating film 84 in which the width direction is discontinuous.

First, the film transfer unit 120a is transferred, and the film substrate 80 is sent out. The roller is sent to the belt mask providing portion 270 through the transport roller 78. In the belt-shaped mask providing portion 270, the belt-shaped mask 11 fed from the belt-shaped mask feeding roller 13 is sandwiched between the film substrate 80 and the bonding roller 17, and the belt-shaped mask is placed. 11 is a predetermined position superposed on the surface (coating film forming surface) of the film substrate 80.

Next, the film substrate 80 on which the strip mask 11 is laminated is transferred to the application roller. 40 opposite positions (front side of the coating roller 40). When the film substrate 80 is continuously conveyed to the front surface of the coating roller 40 without forming the coating film 84 in the width direction, gas is blown from the air knife 44, and the film substrate 80 and the belt mask 11 are applied from the application roller 40. Separation also allows the transport path of the film substrate 80 to be a separation path. Thereby, a non-coated region continuous in the width direction of the film substrate is formed on the film substrate 80 and the strip mask 11. Next, when the portion of the film substrate 80 where the coating film 84 is to be formed is conveyed to the front surface of the application roller 40, the gas from the air knife 44 is stopped, and the film substrate 80 and the strip are formed. The mask 11 is in contact with the application roller 40, and even if the transport path of the film substrate 80 becomes a contact path. As a result, the film substrate 80 and the strip mask 11 are brought into contact with the application roller 40 while moving in the transport direction, and the coating film 84 is formed on the film substrate 80 and the strip mask 11 with a predetermined film thickness. Further, in the case where the belt-shaped mask 11 is formed by repelling the material of the coating material or the liquid-repellent treatment is applied to the surface of the belt-shaped mask 11, the coating film is not formed on the belt-shaped mask 11. By repeating the start and stop of the gas blowing from the air knife 44 as described above, the coating film 84 which is discontinuous in the conveying direction of the film substrate 80 can be formed on the film substrate 80 and the belt mask 11.

The film substrate 80 and the strip mask 11 are next conveyed to the strip mask peeling portion. 290. After the film substrate 80 on which the strip mask 11 is laminated passes between the peeling roller 19 and the support roller 20, the strip mask 11 is transported away from the film substrate 80, and the strip mask 11 is removed from the film. The substrate 80 is peeled off. The strip mask 11 after peeling is taken up by a belt-shaped cover take-up roll 15. Since the coating film formed on the belt-shaped mask 11 is also peeled off from the film substrate 80 together with the belt-shaped mask 11, the area of the film substrate 80 overlapping the belt-shaped mask 11 is not formed with the coating film. No coating area. In this manner, a coating-free region in which the film substrate 80 is continuous in the conveying direction is formed, and the coating film 84 which is discontinuous in the width direction of the film substrate 80 can be formed. In addition, although the strip-shaped mask 11 shown in FIG. 6 has a linear shape, the strip-shaped mask 11 may have a shape such as a curved line or a broken line shape, and may be formed in a shape continuous with the film substrate 80 as long as the shape of the strip-shaped mask 11 is formed. The uncoated area of the transport direction.

In the above manner, the film substrate 80 can be transferred using the coating device 140f. A coating film 84 having discontinuous directions and width directions is formed on the film substrate 80. The coating film 84 on the film substrate 80 has a pattern in which a plurality of blocks (concave-convex pattern forming regions) separated from each other in the conveying direction and the width direction of the film substrate 80 are arranged. In addition, a plurality of regions separated, called a plurality of In the isolated region, the shape of the region can be any shape such as a rectangle, a circle, or a polygon.

In addition, although a strip-shaped strip mask 11 is used in FIG. 6, it may be the same as the first one. In the coating device 140a of the embodiment, two or more strip-shaped strip-shaped masks are used in the same manner. A plurality of uncoated regions extending in the transport direction of the film substrate may be formed depending on the number of strip masks used. A coating film having a desired length in the width direction of the film substrate 80 and separated at a desired distance in the width direction of the film substrate 80 can be formed in accordance with the distance between the strip masks and the width of the strip mask. 84. Further, the coating device 140f can be formed to have a desired length in the conveying direction of the film substrate 80 and separated at a desired distance in the conveying direction of the film substrate 80, depending on the start and stop timing of the gas blowing of the air knife 44. Coating film 84. Therefore, the coating film of various patterns can be easily formed using the coating device 140f.

[Seventh embodiment]

In the seventh embodiment, a coating device 140g for forming a coating film which is discontinuous in the longitudinal direction (transport direction) and the width direction of the substrate will be described. As shown in FIG. 7, the coating device 140g mainly includes a film transfer unit 120a that continuously feeds out the film substrate 80, and a coating roll that applies a liquid on the film substrate 80 sent from the film transfer unit 120a to form a coating film 84. 40. A coating liquid supply member 82 for supplying a coating liquid (coating material) to the coating roller 40, on the upstream side with respect to the application roller 40 in the conveying direction of the film substrate 80, to form a coating film on the surface of the film substrate 80 The air knife 44 that blows the gas to displace the transport path of the film substrate 80 and the upstream side of the air knife 44 in the transport direction of the film substrate 80 and apply liquid repellency to the film substrate 80 A liquid dispensing material coating portion 310 of the material. In the coating device 140g, the air knife 44 and the liquid-repellent material application portion 310 function as a non-coated region forming mechanism. The liquid-repellent material application portion 310 particularly functions as a coating-free region forming mechanism in the transport direction.

Film conveying unit 120a of coating device 140g, coating roller 40, coating liquid supply structure Since the member 82 and the air knife 44 have the same configuration as the film transport unit 120a, the application roller 40, the coating liquid supply member 82, and the air knife 44 of the coating device 140e of the fifth embodiment, the description thereof will be omitted. Further, the liquid-repellent material application portion 310 of the coating device 140f is configured in the same manner as the liquid-repellent material application portion 310 of the coating device 140b of the second embodiment, and therefore the description thereof is also omitted.

Description of the use of the coating device 140g as described above to form a transfer on the film substrate 80 The operation of the coating film 84 in the direction (longitudinal direction) and in the width direction is discontinuous.

First, the film transfer unit 120a is transferred, and the film substrate 80 is sent out. The roller is sent to the liquid-repellent material application unit 310 through the transfer roller 78. In the liquid-repellent material application portion 310, the liquid-repellent material application roller 22 is rotated while the application surface on which the liquid-repellent material is held is brought into contact with a predetermined position of the film substrate 80. Thereby, the liquid-repellent film 26 which is continuous in the conveyance direction of the film base material 80 is formed in the predetermined position on the surface (coating film formation surface) of the film base material 80.

Next, the film substrate 80 on which the liquid repellent film 26 is formed is transferred to the application roller. 40 opposite positions (front side of the coating roller 40). Similarly to the operation of the coating device 140f of the sixth embodiment of the present invention, when the portion of the film substrate 80 that is not formed with the coating film 84 in the width direction is conveyed to the front surface of the application roller 40, it is blown from the air knife 44. The gas separates the film substrate 80 from the application roller 40, and even if the transport path of the film substrate 80 becomes a separation path. Thereby, a non-coated region continuous in the width direction of the film substrate is formed. Next, when the portion of the film substrate 80 where the coating film 84 is to be formed is conveyed to the front surface of the application roller 40, the gas from the air knife 44 is stopped, and the film substrate 80 is brought into contact with the application roller 40, even if the film base is The transport path of the material 80 becomes a contact path. Thereby, the film substrate 80 is brought into contact with the application roller 40 while moving in the conveyance direction, and is applied to the film substrate. On the 80, a coating film 84 is formed with a predetermined film thickness. At this time, in the region where the liquid-repellent film 26 is formed on the film substrate 80, a film is not formed in order to repel the coating film material. Therefore, the coating-free region which is continuous in the conveying direction of the film substrate 80 can be formed in accordance with the region in which the liquid-repellent film 26 is formed, and the coating film 84 which is discontinuous in the width direction of the film substrate 80 can be formed. By repeating the start and stop of the gas blowing from the air knife 44 as described above, the coating film 84 which is discontinuous in the conveying direction of the film substrate 80 can be formed on the film substrate 80.

In the above manner, the film substrate 80 can be transferred using the coating device 140g. A coating film 84 having discontinuous directions and width directions is formed on the film substrate 80. The coating film 84 on the film substrate 80 has a pattern in which a plurality of blocks are separated from each other in the conveying direction and the width direction of the film substrate 80.

In addition, in FIG. 7, a liquid-repellent coating roller 22 having a coating surface is used. A linear liquid-repellent film 26 is formed. However, similarly to the coating device 140b of the second embodiment, a liquid-repellent material application roller having a plurality of application surfaces may be used to form a plurality of linear liquid-repellent films. 26. A plurality of uncoated regions extending in the transport direction of the film substrate can be formed in accordance with the number of the liquid-repellent films 26 formed. Further, the liquid-repellent material application roller 22 can be moved in the direction of the rotation axis. Thereby, the uncoated region extending in the conveying direction of the film substrate can be formed at a desired position in the width direction of the film substrate. The distance between the respective application materials of the liquid-repellent material coating rolls 22, the width and position of each of the liquid-repellent material application rolls 22, and the like can be formed to have a desired length in the width direction of the film substrate 80 and in the width direction of the film substrate 80. The coating film 84 is separated by a desired distance. Further, the coating device 140g can be formed to have a desired length in the conveying direction of the film substrate 80 and separated at a desired distance in the conveying direction of the film substrate 80 in accordance with the start and stop timing of the gas blowing of the air knife 44. Coating film 84. Therefore, the coating film of various patterns can be easily formed using the coating device 140g.

[Eighth Embodiment]

In the eighth embodiment, a coating device 140h for forming a coating film which is discontinuous in the longitudinal direction (transport direction) of the substrate and in the width direction will be described. As shown in FIG. 8, the coating device 140h mainly includes a film transfer unit 120a that continuously feeds out the film substrate 80, and a coating roll that applies a liquid on the film substrate 80 sent from the film transfer unit 120a to form a coating film 84. 41. The coating liquid supply member 82 that supplies the coating liquid to the application roller 41, and the surface of the film substrate 80 (the surface on which the coating film 84 is formed) on the upstream side with respect to the application roller 41 in the conveyance direction of the film substrate 80. The air knife 44 that blows the gas to displace the transport path of the film substrate 80. In the coating device 140h, the operation roller 42 and the application roller 41 function as a coating-free region forming mechanism. In particular, the application roller 41 functions as a coating-free region forming mechanism in the conveyance direction.

Film conveying unit 120a of coating device 140h, coating liquid supply member 82, and air knife 44 is the same as the film transporting unit 120a, the coating liquid supply member 82, and the air knife 44 of the coating device 140e of the fifth embodiment, and thus the description thereof is omitted. Further, since the application roller 41 of the coating device 140h has the same configuration as the application roller 41 of the coating device 140c of the third embodiment, the description thereof will be omitted.

Next, it is explained that the film substrate 80 is formed using the coating device 140h as described above. The movement direction (longitudinal direction) and the operation of the coating film 84 in which the width direction is discontinuous.

First, the film transfer unit 120a is transferred, and the film substrate 80 is sent out. The roller is conveyed by the conveyance roller 78 to a position facing the application roller 41 (the front surface of the application roller 41). In the same manner as the operation of the coating device 140f of the sixth embodiment of the present invention, it is continuous in the film substrate 80. When the portion where the coating film 84 is not formed in the width direction is conveyed to the front surface of the application roller 41, the gas is blown from the air knife 44 to separate the film substrate 80 from the application roller 41, and even if the transport path of the film substrate 80 is separated. path. Thereby, a non-coated region continuous in the width direction of the film substrate is formed. Next, when the portion of the film substrate 80 where the coating film 84 is to be formed is conveyed to the front surface of the application roller 41, the gas from the air knife 44 is stopped, and the film substrate 80 is brought into contact with the application roller 41, even if the film base is The transport path of the material 80 becomes a contact path. Since the coating material is held in the liquid holding region 41a of the application roller 41, the coating film 84 is formed on the film substrate 80 in a region opposed to the liquid holding region 41a with a predetermined film thickness. On the other hand, since the coating material is not held in the liquid non-retaining region 41b of the application roller 41, the coating film 84 is not formed on the film substrate 80 in the region opposed to the liquid non-holding region 41a. Thereby, the coating-free region which is continuous in the conveying direction of the film substrate 80 can be formed, and the coating film 84 which is discontinuous in the width direction of the film substrate 80 can be formed. By repeating the start and stop of the gas blowing from the air knife 44 as described above, the coating film 84 which is discontinuous in the conveying direction of the film substrate 80 can be formed on the film substrate 80.

In the above manner, the film substrate 80 can be transferred using the coating device 140h. A coating film 84 having discontinuous directions and width directions is formed on the film substrate 80. The coating film 84 on the film substrate 80 has a pattern in which a plurality of blocks are separated from each other in the conveying direction and the width direction of the film substrate 80.

In addition, although there are two liquid holding regions 41a and one liquid in FIG. The application roller 41 of the non-retaining region 41b is not used. Similarly to the third embodiment, an application roller having three or more liquid holding regions and two or more liquid non-retaining regions may be used. A plurality of uncoated regions extending in the transport direction of the film substrate can be formed depending on the number of liquid non-retaining regions. It is possible to form a coating having a desired length in the width direction of the film substrate 80 and separating at a desired distance in the width direction of the film substrate 80, depending on the width and position of each of the liquid holding region 41a and each of the liquid non-holding regions 41b. Membrane 84. Further, the coating device 140h can be formed to have a desired length in the conveying direction of the film substrate 80 and separated at a desired distance in the conveying direction of the film substrate 80 in accordance with the start and stop timing of the gas blowing of the air knife 44. Coating film 84. Therefore, the coating film of various patterns can be easily formed using the coating device 140h.

[Ninth Embodiment]

In the ninth embodiment, a coating device 140i for forming a coating film which is discontinuous in the longitudinal direction (transport direction) and the width direction of the substrate will be described. As shown in FIG. 9, the coating device 140i mainly includes a film transfer unit 120a that continuously feeds out the film substrate 80, and a coating roll that applies a liquid on the film substrate 80 sent from the film transfer unit 120a to form a coating film 84. 40. The coating liquid supply member 82' for supplying the coating liquid to the coating roller 40, and the surface of the film substrate 80 on the upstream side of the coating roller 40 in the conveying direction of the film substrate 80 (the surface of the coating film 84 is formed) An air knife 44 that blows a gas to displace a conveying path of the film substrate 80. In the coating device 140i, the air knife 44 and the coating liquid supply member 82' function as a coating-free region forming mechanism. The coating liquid supply member 82' particularly functions as a coating-free region forming mechanism in the conveying direction.

Film conveying unit 120a and coating roller of coating device 140i according to the ninth embodiment 40 and the air knife 44 are the same as the film transport unit 120a, the application roller 40, and the air knife 44 of the coating device 140e of the fifth embodiment, and thus the description thereof is omitted. Further, since the coating liquid supply member 82' of the coating device 140i has the same configuration as the coating liquid supply member 82' of the coating device 140d of the fourth embodiment, the description thereof will be omitted.

Next, it is explained that the film substrate 80 is formed using the coating device 140i as described above. The movement direction (longitudinal direction) and the operation of the coating film 84 in which the width direction is discontinuous.

First, the film transfer unit 120a is transferred, and the film substrate 80 is sent out. The roller is conveyed by the conveyance roller 78 to a position facing the application roller 40 (the front surface of the application roller 40). Similarly to the operation of the coating device 140f of the sixth embodiment of the present invention, when the portion of the film substrate 80 that is not formed with the coating film 84 in the width direction is conveyed to the front surface of the application roller 40, it is blown from the air knife 44. The gas separates the film substrate 80 from the application roller 40, and even if the transport path of the film substrate 80 becomes a separation path. Thereby, a non-coated region continuous in the width direction of the film substrate is formed. Next, when the portion of the film substrate 80 where the coating film 84 is to be formed is conveyed to the front surface of the application roller 40, the gas from the air knife 44 is stopped, and the film substrate 80 is brought into contact with the application roller 40, even if the film base is The transport path of the material 80 becomes a contact path. The liquid holding area 40a of the application roller 40 is formed with a region in which the coating material supplied by the two or more coating liquid supply chambers 82a is held, and a region in which the coating material is not supplied and the coating material is not held. The coating film material is adhered to the region of the film substrate 80 opposed to the region where the coating material is held by the application roller 40, and the coating film 84 is formed with a predetermined film thickness. On the other hand, the coating film 84 is not formed in the region of the film substrate 80 opposed to the region where the coating film material is not held by the application roller 40. Thereby, the coating-free region which is continuous in the conveying direction of the film substrate 80 can be formed, and the coating film 84 which is discontinuous in the width direction of the film substrate 80 can be formed. By repeating the start and stop of the gas blowing from the air knife 44 as described above, the coating film 84 which is discontinuous in the conveying direction of the film substrate 80 can be formed on the film substrate 80.

In the above manner, the film substrate 80 can be transferred using the coating device 140i. A coating film 84 having discontinuous directions and width directions is formed on the film substrate 80. On the film substrate 80 The coating film 84 has a pattern in which a plurality of blocks are separated from each other in the conveying direction and the width direction of the film substrate 80.

In addition, although two coating liquid supply chambers 82a are used in FIG. 9, it is also possible to use the fourth solid material. In the coating device 140d of the embodiment, three or more coating liquid supply chambers are used in the same manner. A plurality of regions in which the coating material is held on the liquid holding region 40a of the coating roller 40 can be formed according to the number of the coating liquid supply chambers, and a coating material is not formed between the regions in which the coating material is held. region. A plurality of uncoated regions extending in the transport direction of the film substrate can be formed in accordance with the number of regions of the liquid holding region 40a of the application roller 40 where the coating material is not held. Alternatively, instead of providing a plurality of coating liquid supply chambers for one coating roller, a plurality of coating rollers each provided with a coating liquid supply chamber may be used. In this case, each of the application rollers is disposed at a position where the conveyance direction of the film substrate 80 is different, and the coating liquid supply chamber of each application roller is disposed at a position separated from each other in the width direction of the film substrate 80. Moreover, the coating liquid supply chamber can also be independently moved in the axial direction. The coating film having a desired length in the width direction of the film substrate 80 and separated at a desired distance in the width direction of the film substrate 80 can be formed depending on the distance between the coating liquid supply chambers, the width and position of each chamber, and the like. 84. Further, the coating device 140i can be formed to have a desired length in the conveying direction of the film substrate 80 and separated at a desired distance in the conveying direction of the film substrate 80, depending on the start and stop timing of the gas blowing of the air knife 44. Coating film 84. Therefore, the coating film of various patterns can be easily formed using the coating device 140i.

[Tenth embodiment]

The tenth embodiment describes a coating device 140j for forming a coating film of a discontinuous (separated) pattern on a substrate. As shown in FIG. 10, the coating device 140j mainly has a film base continuously fed out. The film conveying unit 120a of the material 80 applies a liquid to the film substrate 80 sent from the film conveying unit 120a to form a coating roller 40 of the coating film 84, and applies a coating liquid (coating material) to the coating roller 40. The liquid supply member 82 is disposed on the upstream side of the application roller 40 in the conveyance direction of the film substrate 80, and the pattern mask providing portion 170 to which the pattern mask 50 is applied to the film substrate 80, and the film substrate 80 are transported. The peeling portion 190 is masked on the downstream side of the application roller 40 in the direction to peel off the pattern mask 50 on the film substrate 80. In the coating device 140j, the pattern mask providing portion 170 and the pattern mask peeling portion 190 function as a non-coated region forming mechanism. The detailed structure of each part will be described below.

The film conveying portion 120a of the coating device 140j, the coating roller 40, and the coating liquid supply structure Since the member 82 has the same configuration as the film transporting unit 120a, the application roller 40, and the coating liquid supply member 82 of the coating device 140a of the first embodiment, the description thereof will be omitted. Further, the application roller 40 is disposed to face and contact the surface (coating film forming surface) of the film substrate 80 conveyed by the film conveying portion.

<pattern mask giving unit>

In the coating device 140j, as the pattern mask 50, a strip-shaped or strip-shaped sheet having a shape corresponding to the shape of the coating region in the pattern of the coating film formed on the film substrate 80 is used. For example, when the pattern mask has a lattice shape as shown in FIG. 10, the coating film 84 formed on the film substrate 80 has a pattern having a plurality of patterns separated by a lattice-like uncoated region. Area (concave pattern forming area). In addition, the so-called separation of a plurality of regions refers to a plurality of isolated regions, the shape of which is not limited. The size of the pattern mask 50 can be appropriately set. However, since it is continuously processed by being transported together with the film substrate 80, it can have the same width and length as the film substrate 80. In this way, the management of the alignment of the film substrate 80 with the position of the pattern mask 50 in the width direction is easy. The width of the pattern mask 50 can be appropriately set according to the required product form. Depending on the application, the width of the pattern mask 50 may be smaller or larger than the film substrate 80. The width of the pattern mask 50 is preferably larger than the width of the liquid holding area 40a from the function of the pattern mask 50 to shield the liquid holding area 40a of the application roller 40, but depending on the formed coating pattern, It may be small (for example, a case where only the center in the width direction of the liquid holding region 40a is shielded). As the material of the pattern mask 50, for example, a film similar to the film substrate 80 can be used. Further, a material such as polyphenylene sulfide (PPS) or polyethylene (PE) which repels the coating material (the coating material is not wet) can also be used. Alternatively, the surface of the pattern mask 50 may be subjected to a liquid-repellent treatment by a fluororesin, a crucible or the like so that the surface of the pattern mask 50 (the side opposite to the surface in contact with the film substrate 80) repels the coating material. By causing the pattern mask 50 to repel the coating material, the amount of the coating material can be suppressed. The back side of the pattern mask 50 (the side in contact with the film substrate 80) may also have adhesiveness to fix the pattern mask 50 on the film substrate 80. Moreover, although the thickness of the pattern mask 50 can be, for example, 5 μm to 1000 μm, it is more likely to be damaged when it is too thin from the viewpoint of workability, and it is difficult to wind up using a take-up roll when it is too thick. On the other hand, the thickness of the pattern mask can be appropriately selected depending on the film thickness of the coating film in the range of 5 μm to 1000 μm in thickness, whereby the film thickness control of the coating film can be easily performed. The pattern mask 50 is sent out from the pattern mask feeding roller 51, and is taken up by the pattern mask winding roller 52.

The pattern mask 50 can correspond to the shape of the coating film formed on the film substrate 80 (Fig. Case) with various patterns (blank areas). For example, as shown in FIGS. 25(a) and (b), it is possible to use a pattern having a division in the conveyance direction of the pattern mask (the direction indicated by the arrow in FIGS. 25(a) and (b)) ( Blank area) 50p, 50p' pattern mask 50, 50'. In the present application, the "pattern mask having a pattern that is divided in the transport direction of the pattern mask" includes not only the direction orthogonal to the transport direction but also the direction shown in Figs. 25(a) and (b). Patterned mask of the pattern, Also included is a pattern mask having a pattern that is broken in a direction intersecting at an arbitrary angle with respect to the transport direction, and an opening formed with a plurality of shapes, for example, a shape other than a rectangle, such as a circle, an ellipse, or a polygon. Part pattern masks, etc. Further, as shown in Fig. 25(c), a pattern mask 50" having a pattern 50p" continuous in the transport direction of the pattern mask (the direction indicated by the arrow in Fig. 25(c)) may be used. In the present application, the "pattern mask having a pattern continuous in the transport direction of the pattern mask" includes not only a pattern (blank area) but also a direction parallel to the transport direction as shown in FIG. 25(c). The pattern mask extending in the cover region further includes a pattern mask having a mask region extending in a direction inclined with respect to the transport direction, a mask mask extending in the transport direction while the mask region is curved, and further including a mask extending therefrom A pattern mask or the like of the mask area of the cover region branch. The pattern masks of the pattern masks 50, 50', and 50" can be formed by, for example, cutting a strip-shaped sheet.

In addition, the pattern mask may also have a direction parallel to the direction of the transport. The mask region continuously shields (covers) the region of the film substrate 80 that is in contact with the end portion of the liquid holding region 40a of the coating roller 40 in the conveying direction of the film substrate 80. In the coating device 140j, in the region where the film substrate 80 is in contact with the end portion of the liquid holding region 40a of the coating roller 40, the film thickness of the formed coating film or the like may be uneven, but by using the above-described The pattern mask 50 shields the area of the film substrate 80 from the end of the liquid holding region 40a of the application roller 40, and prevents the uneven coating film from being formed on the film substrate 80.

Pattern mask providing portion 170, by pattern mask feeding roller 51 and opposite coating roller 40 is disposed on the upstream side of the film substrate in the transport direction and is a pair of rollers that are opposite to each other, that is, the bonding roller 54 and the support roller 55. In the pattern mask providing portion 170, the roller 51 is fed from the pattern mask. The fed pattern mask 50 is superposed on the film substrate 80 and sandwiched between the bonding roller 54 and the supporting roller 55 to impart a pattern mask 50 to the film substrate 80 along the conveying direction of the film substrate 80.

<pattern mask peeling section>

The pattern mask peeling portion 190 is composed of a peeling roller 56 and a supporting roller 57 which are a pair of rollers which are opposed to each other in the transport direction of the film substrate and which are opposed to each other. The pattern mask peeling portion 190 is conveyed in a direction in which the pattern mask 50 is separated from the film substrate 80 in a state in which the peeling roller 56 and the supporting roller 57 are superposed on the film substrate 80, and the pattern is covered. The cover 50 is peeled off from the film substrate 80. The peeled pattern mask 50 can be wound up by a pattern masking roll 52 provided at a position away from the transport path of the film substrate 80.

Next, the description will be made on the film substrate 80 using the coating device 140j as described above. The action of the coating film 84 of the desired pattern.

First, the film transfer unit 120a is transferred, and the film substrate 80 is sent out. The roller is sent to the pattern mask applying portion 170. In the pattern mask providing portion 170, the pattern mask 50 sent from the pattern mask feeding roller 51 by the bonding roller 54 and the supporting roller 55 is sandwiched together with the film substrate 80, whereby the pattern mask 50 is superposed. The predetermined position on the surface (coating film forming surface) of the film substrate 80.

Next, the film substrate 80 on which the pattern mask 50 is superposed is transferred to the application roller. 40 opposite positions (front side of the coating roller 40). The film substrate 80 on which the pattern mask 50 is laminated is brought into contact with the application roller 40 while moving in the conveyance direction, and the coating film 84 is formed on the film substrate 80 and the pattern mask 50 with a predetermined film thickness. In addition, in the case where the pattern mask 50 is formed by repelling the material of the coating material or the liquid-repellent treatment is applied to the surface of the pattern mask 50, it is not formed on the pattern mask 50. Coating film.

The film substrate 80 is secondarily conveyed to the pattern mask peeling portion 190. In the overlap After the film substrate 80 of the pattern mask 50 passes between the separation roller 56 and the support roller 57, the pattern mask 50 is conveyed in a direction away from the film substrate 80, and the pattern mask 50 is peeled off from the film substrate 80. The peeled pattern mask 50 is taken up by the pattern mask take-up roll 52. Since the coating film formed on the pattern mask 50 is also peeled off from the film substrate 80 together with the pattern mask 50, the area of the film substrate 80 overlapping the pattern mask 50 becomes a non-coated film in which the coating film is not formed. In the region, the coating film 84 is formed only on the region of the film substrate 80 that is not laminated on the pattern mask 50. A coating film 84 having a desired pattern can be formed on the film substrate 80 in this manner.

The coating device 140j can be modified by changing the shape of the pattern mask 50 used. A coating film 84 having a desired pattern is formed in a convenient manner. For example, by using the pattern masks 50, 50' having the patterns 50p, 50p' which are separated in the direction orthogonal to the transport direction as shown in Figs. 25(a) and (b), the film base can be made When the material 80 is in contact with the application roller 40, a coating film having a pattern of discontinuous (discontinuous) in the conveyance direction of the film substrate 80 is formed. In order to form such a coating film pattern intermittently in the longitudinal direction (transport direction) of the film substrate, the method described in Patent Document 1 is required to move the film substrate in such a manner that the film substrate 80 is separated or contacted with respect to the application roller 40. The material transport path is not required in the coating device 140j of the present embodiment. Therefore, in the coating device 140j, a complicated device configuration for controlling the tension fluctuation of the film substrate caused by the movement of the transport path of the film substrate is not required. Further, by using the pattern masks 50, 50" having the mask pattern 50" having the pattern continuous in the transport direction as shown in Fig. 25(c), it is possible to form the interval in the width direction of the film substrate 80. (discontinuous) the coating of the pattern. In order to form such an interval in the width direction of the film substrate In the coating film pattern, the method described in Patent Document 1 is required to use a coating roller having a groove portion formed on the outer circumferential surface in the circumferential direction. However, the coating device 140j of the present embodiment is not necessary. Therefore, by using the coating device 140j, it is possible to easily form a coating film of a desired discontinuous pattern with a simple device configuration.

[Eleventh Embodiment]

The eleventh embodiment describes a coating device 140k for forming a coating film of a discontinuous pattern on a substrate. As shown in Fig. 11, the coating device 140k mainly includes a film transfer unit 120a that continuously feeds out the film substrate 80, and a coating roll that applies a liquid on the film substrate 80 sent from the film transfer unit 120a to form a coating film 84. 40. The coating liquid supply member 82 for supplying the coating liquid (coating material) to the coating roller 40 is positioned on the upstream side with respect to the application roller 40 in the conveying direction of the film substrate 80 to impart a pattern mask to the film substrate 80. The 50' pattern mask providing portion 170 is disposed on the downstream side of the application roller 40 in the transport direction of the film substrate 80 to mask the peeling portion 190 in the pattern of the pattern mask 50' on the release film substrate 80, in the film The belt-shaped mask providing portion 270 which is provided on the upstream side of the application roller 40 in the transport direction of the substrate 80 and which provides the strip-shaped mask 11 to the film substrate 80, and the application roller in the transport direction of the film substrate 80 The strip-shaped mask peeling portion 290 of the strip-shaped mask 11 on the downstream side of the film substrate 80 is peeled off. In the coating device 140k, the pattern mask providing portion 170, the pattern mask peeling portion 190, the band mask providing portion 270, and the strip mask peeling portion 290 function as a non-coated region forming mechanism. The belt-shaped mask providing portion 270 and the belt-shaped mask peeling portion 290 particularly function as a coating-free region forming mechanism in the transport direction.

Film conveying unit 120a of coating device 140k, coating roller 40, coating liquid supply structure The member 82, the pattern mask providing portion 170, and the pattern mask peeling portion 190 are the same as the tenth embodiment. Since the film transport unit 120a of the coating device 140j, the application roller 40, the coating liquid supply member 82, the pattern mask providing portion 170, and the pattern mask peeling portion 190 have the same configuration, the description thereof will be omitted. Further, the belt-shaped mask providing portion 270 and the strip-shaped mask peeling portion 290 of the coating device 140k are the same as the belt-shaped mask providing portion 270 and the strip-shaped mask peeling portion 290 of the coating device 140a of the first embodiment. The configuration is therefore omitted.

Next, the description will be made on the film substrate 80 using the coating device 140k as described above. The action of the coating film 84 of the desired pattern.

First, the film transfer unit 120a is transferred, and the film substrate 80 is sent out. The roller is sent to the pattern mask applying portion 170. In the pattern mask providing portion 170, the pattern mask 50' sent from the pattern mask feeding roller 51 by the bonding roller 54 and the supporting roller 55 is sandwiched together with the film substrate 80, thereby making the pattern mask 50' The predetermined position on the surface (coating film forming surface) of the film substrate 80 is superimposed.

Next, the film substrate 80 on which the pattern mask 50' is laminated is conveyed to the belt cover. Cover providing portion 270. In the belt-shaped mask providing portion 270, the belt-shaped mask 11 fed from the belt-shaped mask feeding roller 13 by the bonding roller 17 and the supporting roller 18 is sandwiched together with the film base material 80. Thereby, the film substrate 80 on which the pattern mask 50' is laminated is further laminated with the strip mask 11 at a predetermined position.

Next, the film substrate 80 in which the pattern mask 50' and the strip mask 11 are laminated The conveyance is carried out to a position facing the application roller 40 (the front surface of the application roller 40). The film substrate 80 on which the pattern mask 50' and the strip mask 11 are stacked is brought into contact with the application roller 40 while moving in the transport direction, on the film substrate 80, the pattern mask 50', and the strip mask 11. The coating film 84 is formed with a predetermined film thickness. In addition, in the case where the pattern mask 50' and/or the strip mask 11 is formed to repel the material of the coating material or In the case where the liquid crystal treatment is applied to the surface of the pattern mask 50' and/or the belt mask 11, the coating film is not formed on the pattern mask 50' and/or the belt mask 11.

The film substrate 80 is next conveyed to the strip mask peeling portion 290. In the overlap After the pattern mask 50' and the film substrate 80 of the strip mask 11 pass between the peeling roller 19 and the support roller 20, the strip mask 11 is transported away from the film substrate 80, and the strip mask 11 is placed. The film substrate 80 is peeled off. The strip mask 11 after peeling is taken up by a belt-shaped cover take-up roll 15. Since the coating film formed on the belt mask 11 is also peeled off from the film substrate 80 together with the belt mask 11, the area of the film substrate 80 and the pattern mask 50' overlapping with the belt mask 11 is not A coating film is formed. A coating film is formed only in a region that is not overlapped with the strip mask 11. In this way, a coating-free region continuous in the conveying direction of the film substrate 80 can be formed.

The film substrate 80 and the pattern mask 50' after the strip mask 11 is peeled off, and secondly It is conveyed to the pattern mask peeling part 190. After the film substrate 80 on which the pattern mask 50' is laminated passes between the peeling roller 56 and the support roller 57, the pattern mask 50' is conveyed away from the film substrate 80, and the pattern mask 50' is removed from the film. The substrate 80 is peeled off. The peeled pattern mask 50' is taken up by the pattern mask take-up roll 52. Since the coating film formed on the pattern mask 50' is also peeled off from the film substrate 80 together with the pattern mask 50', the area of the film substrate 80 overlapping the pattern mask 50' is not formed with the coating film. The coating film 84 is formed only in the region of the film substrate 80 that is not laminated on the pattern mask 50'.

In the above manner, the film substrate 80 and the strip mask 11 or the pattern mask 50' The overlapped region forms an uncoated region, and a coating film 84 is formed in a region where none of the strip mask 11 and the pattern mask 50' overlap. A desired pattern can be formed on the film substrate 80 in this manner. The coating film 84.

The coating device 140k can change the shape of the pattern mask 50' used by The coating film 84 having a desired pattern is simply formed. Further, by using the pattern mask 50' having a pattern that is divided in the direction orthogonal to the conveyance direction, the film substrate 80 can be formed in contact with the application roller 40 in the state of the film substrate 80. The coating film 84 in the intermittent (discontinuous) pattern is conveyed. In order to form such a coating film pattern intermittently in the longitudinal direction (transport direction) of the film substrate, the method described in Patent Document 1 is required to move the film substrate in such a manner that the film substrate 80 is separated or contacted with respect to the application roller 40. The conveying path of the material 80 is not necessary for the coating device 140k of the present embodiment. Therefore, a complicated device configuration for controlling the tension fluctuation of the film substrate caused by the movement of the transport path of the film substrate is not required. Therefore, the coating device 140k can easily form a coating film of a desired discontinuous pattern with a simple device.

Furthermore, the number, width and relative of the strip masks 11 can be changed by using The number, position, and width of the uncoated regions continuing in the transport direction on the film substrate 80 are changed at positions in the width direction of the film substrate 80. Therefore, for example, when a coating film having a different pattern of the number, position or width of the uncoated regions continuously in the conveying direction is formed for each of the plurality of film substrates, the strip of the strip mask to be used can be changed. The coating film of the desired pattern is formed on each of the film substrates by using a strip mask having a different width or by appropriately adjusting the position of the strip mask in the width direction of the film substrate 80. In this case, it is not necessary to separately prepare the pattern mask 50' having the shape of the uncoated region shape corresponding to each of the coating film patterns, and the pattern of the coating film can be changed only by changing the strip mask. Therefore, the coating film having various patterns can be formed more easily by using the coating device 140k of the present embodiment.

In addition, although the strip mask 11 shown in FIG. 11 has a linear shape, it is covered with a strip. The cover 11 may have a shape such as a curved line or a broken line shape, and may form a non-coated region continuous in the conveying direction of the film substrate 80 in the shape of the belt-shaped mask 11.

Further, in Fig. 11, the film is sequentially formed from the upstream side of the film substrate 80. The pattern mask providing portion 170, the strip mask providing portion 270, the strip mask peeling portion 290, and the pattern mask peeling portion 190, but the order of the pattern mask providing portion 170 and the strip mask providing portion 270 and the strip The order of the mask mask peeling portion 290 and the pattern mask peeling portion 190 may be reversed.

[12th embodiment]

The twelfth embodiment describes a coating device 140m for forming a coating film of a discontinuous pattern on a substrate. As shown in FIG. 12, the coating device 140m mainly includes a film transfer unit 120a that continuously feeds out the film substrate 80, and a coating roll that applies a liquid on the film substrate 80 sent from the film transfer unit 120a to form a coating film 84. 40. The coating liquid supply member 82 for supplying the coating liquid (coating material) to the coating roller 40 is positioned on the upstream side with respect to the application roller 40 in the conveying direction of the film substrate 80 to impart a pattern mask to the film substrate 80. The 50' pattern mask providing portion 170 is disposed on the downstream side of the application roller 40 in the transport direction of the film substrate 80 to mask the peeling portion 190 of the pattern mask 50' on the release film substrate 80, and In the transport direction of the film substrate 80, the liquid-repellent material coating portion 310 is provided on the film substrate 80 on the upstream side of the application roller 40 and the liquid-repellent material is applied to the film substrate 80. In the coating device 140m, the pattern mask providing portion 170, the pattern mask peeling portion 190, and the liquid-repellent material applying portion 310 function as a non-coated region forming mechanism. The liquid-repellent material application portion 310 particularly functions as a coating-free region forming mechanism in the transport direction.

Film conveying unit 120a of coating device 140m, coating roller 40, coating liquid supply structure The film 82, the pattern mask providing portion 170, and the pattern mask peeling portion 190 are combined with the film transport portion 120a of the coating device 140j of the tenth embodiment, the application roller 40, the coating liquid supply member 82, and the pattern mask providing portion. Since the 170 and the pattern mask peeling portion 190 have the same configuration, the description thereof will be omitted. Further, since the liquid-repellent material application portion 310 of the coating device 140m has the same configuration as the liquid-repellent material application portion 310 of the coating device 140b of the second embodiment, the description thereof will be omitted.

Next, the use of the coating device 140m as described above on the film substrate 80 will be described. The action of forming the coating film 84 of the desired pattern.

First, the film transfer unit 120a is transferred, and the film substrate 80 is sent out. The roller is sent to the pattern mask applying portion 170. In the pattern mask providing portion 170, the pattern mask 50' sent from the pattern mask feeding roller 51 by the bonding roller 54 and the supporting roller 55 is sandwiched together with the film substrate 80, thereby making the pattern mask 50' The predetermined position on the surface (coating film forming surface) of the film substrate 80 is superimposed.

Next, the film substrate 80 on which the pattern mask 50' is laminated is transferred to the liquid-repellent material Material coating portion 310. In the liquid-repellent material application portion 310, the liquid-repellent material application roller 22 is rotated while the application surface on which the liquid-repellent material is held is brought into contact with the film substrate 80 and the pattern mask 50' at a predetermined position. Thereby, the liquid-repellent film 26 continuous in the conveying direction of the film substrate 80 is formed at a predetermined position on the pattern substrate 50' of the film substrate 80.

Next, the film substrate 80 on which the liquid repellent film 26 is formed is transferred to the application roller. 40 opposite positions (front side of the coating roller 40). The film substrate 80 is in contact with the application roller 40 while moving in the conveyance direction. Thereby, the coating film 84 is formed on the film substrate 80 and the pattern mask 50' with a predetermined film thickness. At this time, the area on which the liquid-repellent film 26 is formed on the film substrate 80 and the pattern mask 50' In order to repel the coating material without forming a film, a coating film is formed only in a region where the liquid-repellent film 26 is not formed. In this manner, the uncoated region continuing in the transport direction of the film substrate 80 can be formed depending on the region in which the liquid-repellent film 26 is formed. Further, in the case where the pattern mask 50' is formed by repelling the material of the coating material or the liquid-repellent treatment is applied to the surface of the pattern mask 50', the coating film is not formed on the pattern mask 50'.

The film substrate 80 is secondarily conveyed to the pattern mask peeling portion 190. In the overlap After the film substrate 80 of the pattern mask 50' passes between the peeling roller 56 and the support roller 57, the pattern mask 50' is transported away from the film substrate 80, and the pattern mask 50' is peeled off from the film substrate 80. . The peeled pattern mask 50' is taken up by the pattern mask take-up roll 52. Since the coating film formed on the pattern mask 50' is also peeled off from the film substrate 80 together with the pattern mask 50', the area of the film substrate 80 overlapping the pattern mask 50' is not formed with the coating film. The coating film 84 is formed only in the region of the film substrate 80 that is not laminated on the pattern mask 50'.

In the above manner, the film substrate 80 is overlapped with the pattern mask 50' and The region where the liquid-repellent film 26 is formed forms an uncoated region, and the coating film 84 is formed only in a region where the pattern mask 50' is not overlapped and the liquid-repellent film 26 is not formed. A coating film 84 having a desired pattern can be formed on the film substrate 80 in this manner.

The coating device 140m can be changed in shape by the pattern mask 50' used The coating film 84 having a desired pattern is simply formed. Further, the coating device 140m can be formed on the film in a state where the film substrate 80 is brought into contact with the application roller 40 by using the pattern mask 50' having a pattern which is divided in the direction orthogonal to the conveyance direction. The coating film 84 of the intermittent (discontinuous) pattern of the substrate 80 is conveyed. In order to form such a discontinuity in the longitudinal direction (transport direction) of the film substrate In the coating film pattern, the method described in Patent Document 1 is required to move the film substrate 80 so as to separate or contact the film substrate 80 with respect to the application roller 40. However, the coating device 140m of the present embodiment has no This is necessary. Therefore, a complicated device configuration for controlling the tension fluctuation of the film substrate caused by the movement of the transport path of the film substrate is not required. Therefore, the coating device 140m can easily form a coating film of a desired discontinuous pattern with a simple device.

Furthermore, the number of coated faces of the application roller 22 can be changed by changing the used liquid-repellent material The number, position, and width of the uncoated regions continuing in the transport direction on the film substrate 80 are changed in the position of the mesh, the width, and the direction of the rotation axis. Therefore, for example, when a coating film having a different pattern of the number, position, or width of each of the plurality of film substrates continuously formed in the conveying direction is formed, the liquid-repellent material coating roller can be changed by using The number of the coated faces of 22, or the liquid-repellent coating roller 22 having the coated faces having different widths, or the liquid-repellent coating roller 22 is appropriately moved in the direction of the rotation axis, on each of the film substrates A coating film of a desired pattern is formed. In this case, it is not necessary to separately prepare the pattern mask 50' having the shape of the uncoated region shape corresponding to each of the coating film patterns, and the pattern of the coating film can be changed by merely changing the liquid-repellent material application roller. Therefore, the coating film having various patterns can be formed more easily by using the coating device 140m of the present embodiment.

[Thirteenth embodiment]

The thirteenth embodiment describes a coating device 140n for forming a coating film of a discontinuous pattern on a substrate. As shown in FIG. 13, the coating device 140n mainly includes a film transfer unit 120a that continuously feeds out the film substrate 80, and a coating roll that applies a liquid on the film substrate 80 sent from the film transfer unit 120a to form a coating film 84. 41. The coating liquid supply member 82 that supplies the coating liquid to the coating roller 41 is positioned on the upstream side of the coating roller 41 in the conveying direction of the film substrate 80 to impart a coating on the film substrate 80. The pattern mask providing portion 170 of the pattern mask 50' and the pattern masking peeling portion of the pattern mask 50' on the peeling film substrate 80 on the downstream side of the coating roller 41 in the conveying direction of the film substrate 80 190. In the coating device 140n, the pattern mask providing portion 170, the pattern mask peeling portion 190, and the application roller 41 function as a non-coated region forming mechanism. In particular, the application roller 41 functions as a coating-free region forming mechanism in the conveyance direction.

Film transporting unit 120a, coating liquid supply member 82, pattern of coating device 140n The mask providing portion 170 and the pattern mask peeling portion 190 are the same as the film transporting portion 120a, the coating liquid supply member 82, the pattern mask providing portion 170, and the pattern mask peeling portion 190 of the coating device 140j of the tenth embodiment. The configuration is therefore omitted. Further, since the application roller 41 of the coating device 140n has the same configuration as that of the application roller 41 of the coating device 140c of the third embodiment, the description thereof will be omitted.

Next, the description will be made on the film substrate 80 using the coating device 140n as described above. The action of the coating film 84 in a discontinuous pattern.

First, the film transfer unit 120a is transferred, and the film substrate 80 is sent out. The roller is sent to the pattern mask applying portion 170. In the pattern mask providing portion 170, the pattern mask 50' sent from the pattern mask feeding roller 51 by the bonding roller 54 and the supporting roller 55 is sandwiched together with the film substrate 80, thereby making the pattern mask 50' The predetermined position on the surface (coating film forming surface) of the film substrate 80 is superimposed.

Next, the film substrate 80 on which the pattern mask 50' is laminated is transferred to and coated. The roller 41 is conveyed at a position facing the front side (the front surface of the application roller 41). Since the coating material is held in the liquid holding area 41a of the application roller 41, the liquid substrate is protected on the film substrate 80 and the pattern mask 50'. The coating film 84 is formed with a predetermined film thickness in the region facing the holding region 41a. On the other hand, since the coating material is not held in the liquid non-retaining region 41b of the application roller 41, the film substrate 80 and the pattern mask 50' are not coated with the liquid non-holding region 41a. Membrane 84. Thereby, a non-coated region continuous in the transport direction can be formed on the film substrate 80 and the pattern mask 50'. Further, in the case where the pattern mask 50' is formed by repelling the material of the coating material or the liquid-repellent treatment is applied to the surface of the pattern mask 50', the coating film is not formed on the pattern mask 50'.

The film substrate 80 is secondarily conveyed to the pattern mask peeling portion 190. In the overlap After the film substrate 80 of the pattern mask 50' passes between the peeling roller 56 and the support roller 57, the pattern mask 50' is transported away from the film substrate 80, and the pattern mask 50' is peeled off from the film substrate 80. . The peeled pattern mask 50' is taken up by the pattern mask take-up roll 52. Since the coating film formed on the pattern mask 50 is also peeled off from the film substrate 80 together with the pattern mask 50', the area of the film substrate 80 overlapping the pattern mask 50' is not formed with the coating film. The coating film 84 is formed only in the region of the film substrate 80 that is not laminated on the pattern mask 50'.

In the above manner, the film substrate 80 is overlapped with the pattern mask 50' and A coating-free region is formed in a region facing the liquid non-holding region 41b of the application roller 41, and a coating film 84 is formed on a region that does not overlap the pattern mask 50' and faces the liquid holding region 41a of the application roller 41. . A coating film 84 having a desired pattern can be formed on the film substrate 80 in this manner.

The coating device 140n can change the shape of the mask 50' used by the pattern The coating film 84 having a desired pattern is simply formed. Further, the coating device 140n can be formed on the film in a state where the film substrate 80 is brought into contact with the application roller 40 by using the pattern mask 50' having a pattern which is divided in the direction orthogonal to the conveyance direction. The conveying direction of the substrate 80 is intermittent (discontinuous The coating film 84 of the pattern. In order to form such a coating film pattern intermittently in the longitudinal direction (transport direction) of the film substrate, the method described in Patent Document 1 is required to move the film substrate in such a manner that the film substrate 80 is separated or contacted with respect to the application roller 40. The conveying path of the material 80 is not necessary for the coating device 140n of the present embodiment. Therefore, a complicated device configuration for controlling the tension fluctuation of the film substrate caused by the movement of the transport path of the film substrate is not required. Therefore, the coating device 140n can easily form a coating film of a desired discontinuous pattern with a simple device.

Furthermore, the number of liquid holding regions of the application roller 41 can be changed, and the rotation can be performed. The width and position of the axial direction (that is, the number of liquid non-retaining regions of the application roller 41 and the width and position of the rotation axis direction) are changed to change the number of uncoated regions continuing in the conveying direction on the film substrate 80. , location and width. Therefore, for example, in the case where a coating film having a different pattern of the number, position or width of the uncoated regions continuously in the conveying direction is formed for each of the plurality of film substrates, the liquid retention of the coating roller to be used can be changed. The number of regions and the width in the direction of the rotation axis, or the application roller is appropriately moved in the direction of the rotation axis to form a coating film of a desired pattern on each film substrate. In this case, it is not necessary to separately prepare the pattern mask 50' having a shape corresponding to the shape of the uncoated region of each coating film pattern, and the pattern of the coating film can be changed only by changing the liquid holding region and the liquid non-holding region of the coating roller. . Therefore, the coating film having various patterns can be formed more easily by using the coating device 140n of the present embodiment.

[Fourteenth embodiment]

The fourteenth embodiment describes a coating device 140p for forming a coating film of a discontinuous pattern on a substrate. As shown in FIG. 14, the coating device 140p mainly includes a film conveying portion 120a that continuously feeds out the film substrate 80, and applies a liquid on the film substrate 80 sent from the film conveying portion 120a. The coating roller 40 that forms the coating film 84, the coating liquid supply member 82' that supplies the coating liquid to the coating roller 40, and the coating roller 40 on the upstream side in the conveying direction of the film substrate 80 are applied to the film substrate 80. The pattern mask applying portion 170 to which the pattern mask 50' is applied and the pattern mask 50' of the pattern mask 50' on the release film substrate 80 are disposed on the downstream side of the application roller 40 in the transport direction of the film substrate 80. Part 190. In the coating device 140p, the pattern mask providing portion 170, the pattern mask peeling portion 190, and the coating liquid supply member 82' function as a coating-free region forming mechanism. The coating liquid supply member 82' particularly functions as a coating-free region forming mechanism in the conveying direction.

The film conveying unit 120a of the coating device 140p, the coating roller 40, and the pattern mask The portion 170 and the pattern mask peeling portion 190 have the same configuration as the film transport unit 120a, the application roller 40, the pattern mask providing portion 170, and the pattern mask peeling portion 190 of the coating device 140j of the tenth embodiment. Therefore, the description is omitted. Further, since the coating liquid supply member 82' of the coating device 140p has the same configuration as the coating liquid supply member 82' of the coating device 140d of the fourth embodiment, the description thereof will be omitted.

Next, the description will be made on the film substrate 80 using the coating device 140p as described above. The action of the coating film 84 in a discontinuous pattern.

First, the film transfer unit 120a is transferred, and the film substrate 80 is sent out. The roller is sent to the pattern mask applying portion 170. In the pattern mask providing portion 170, the pattern mask 50' sent from the pattern mask feeding roller 51 by the bonding roller 54 and the supporting roller 55 is sandwiched together with the film substrate 80, thereby making the pattern mask 50' The predetermined position on the surface (coating film forming surface) of the film substrate 80 is superimposed.

Next, the film substrate 80 on which the pattern mask 50' is laminated is transferred to and coated. The roller 40 is conveyed at a position facing the front side of the application roller 40. Due to the liquid holding region 40a of the application roller 40, as described above, the region where the coating material supplied by the two or more coating liquid supply chambers 82a is held is not supplied with the coating material and the coating film is not retained. The area of the material. The coating film material is adhered to the region of the film substrate 80 and the pattern mask 50' where the coating film 40 is adhered to the region where the coating material is held, and the coating film 84 is formed with a predetermined film thickness. On the other hand, the coating film 84 is not formed on the film substrate 80 and the pattern mask 50' in the region of the film substrate 80 opposite to the region of the coating roller 40 where the coating material is not held. Thereby, a coating-free region continuous in the conveying direction of the film substrate 80 and the pattern mask 50' can be formed. Further, in the case where the pattern mask 50' is formed by repelling the material of the coating material or the liquid-repellent treatment is applied to the surface of the pattern mask 50', the coating film is not formed on the pattern mask 50'.

The film substrate 80 is secondarily conveyed to the pattern mask peeling portion 190. In the overlap After the film substrate 80 of the pattern mask 50' passes between the peeling roller 56 and the support roller 57, the pattern mask 50' is transported away from the film substrate 80, and the pattern mask 50' is peeled off from the film substrate 80. . The peeled pattern mask 50' is taken up by the pattern mask take-up roll 52. Since the coating film formed on the pattern mask 50' is also peeled off from the film substrate 80 together with the pattern mask 50', the area of the film substrate 80 overlapping the pattern mask 50' is not formed with the coating film. The coating film 84 is formed only in the region of the film substrate 80 that is not laminated on the pattern mask 50'.

In the above manner, the film substrate 80 is overlapped with the pattern mask 50' and An uncoated region is formed in a region opposite to a region where the liquid is not held by the application roller 40, and is coated on a region that is not overlapped with the pattern mask 50' and that is in contact with the region where the liquid is held by the application roller 40. Membrane 84. A coating film 84 having a desired pattern can be formed on the film substrate 80 in this manner.

The coating device 140p can change the shape of the mask 50' used by the pattern The coating film 84 having a desired pattern is simply formed. Further, the coating device 140p can be formed in the film in a state where the film substrate 80 is brought into contact with the application roller 40 by using the pattern mask 50' having a pattern which is divided in the direction orthogonal to the conveyance direction. The coating film 84 of the intermittent (discontinuous) pattern of the substrate 80 is conveyed. In order to form such a coating film pattern intermittently in the longitudinal direction (transport direction) of the film substrate, the method described in Patent Document 1 is required to move the film substrate in such a manner that the film substrate 80 is separated or contacted with respect to the application roller 40. The conveying path of the material 80 is not necessary for the coating device 140p of the present embodiment. Therefore, a complicated device configuration for controlling the tension fluctuation of the film substrate caused by the movement of the transport path of the film substrate is not required. Therefore, the coating device 140p can easily form a coating film of a desired discontinuous pattern with a simple device.

Furthermore, the number, width and coating of the coating liquid supply chamber used can be changed by The number, position, and width of the uncoated regions continuing in the conveying direction of the film substrate 80 are changed by the position of the application roller in the direction of the rotation axis, the distance between the coating liquid supply chambers, and the like. Therefore, for example, in the case where a coating film having a different pattern of the number, position or width of the uncoated regions continuously in the conveying direction is formed for each of the plurality of film substrates, the number of coating liquid supply chambers can be changed by using And a width or a suitable movement of the coating roller in the direction of the rotation axis to form a coating film of a desired pattern on each of the film substrates. In this case, it is not necessary to separately prepare the pattern mask 50' having the shape of the uncoated region shape corresponding to each of the coating film patterns, and the pattern of the coating film can be changed only by changing the coating liquid supply chamber. Therefore, the coating film having various patterns can be formed more easily by using the coating device 140p of the present embodiment.

Moreover, instead of providing a plurality of coating liquid supply chambers for one coating roller, It is used for a plurality of coating rolls each provided with a coating liquid supply chamber. In this case, each of the application rollers is disposed at a position where the conveyance direction of the film substrate 80 is different, and the coating liquid supply chamber of each application roller is disposed at a position separated from each other in the width direction of the film substrate 80. Further, the coating liquid supply chamber can be independently moved in the direction of the rotation axis of the application roller.

As apparent from the above description, the coating device 140a of the first to fourteenth embodiments 140P, comprising a non-coated region forming mechanism for forming a non-coated region continuous in at least one direction on a film substrate.

[Fifteenth embodiment]

In the present embodiment, a manufacturing apparatus using a strip-shaped film member having a concavo-convex pattern as described above for the coating apparatuses 140a to 140d will be described. As shown in FIG. 15, the apparatus 100a for manufacturing a strip-shaped film member having a concavo-convex pattern mainly includes a film transport unit 120 that continuously feeds out the film base material 80, and forms a concavity and convexity on the film base material 80 that is fed by the film transport unit 120. The coating portion 140A of the coating film 84 forming the material, and the transfer portion 160 on the downstream side of the coating portion 140A and transferring the concave-convex pattern to the coating film 84 of the unevenness forming material. A film substrate (hereinafter referred to as a film member) 80a including a concavo-convex forming material having a concavo-convex pattern is produced by the apparatus 100a for manufacturing a film member of the embodiment.

<film conveying unit>

As shown in FIG. 15, the film conveying unit 120 mainly has a feeding roller 72 that feeds the belt-shaped film substrate 80, a take-up roller 87 that is provided downstream of the transfer portion 160 and winds up the film member 80a, and a film base. The material 80 and the film member 80a are conveyed to the conveyance roller 78 in the conveyance direction. The delivery roller 72 and the take-up roller 87 are rotatably attached to a support table (not shown) that can be attached and detached. Can be fed by a roller The rotation of the 72 and the take-up roller 87 drives the film substrate 80 in the transport direction.

The film base material 80 is a belt that can be continuously processed while being conveyed. A film substrate of a shape or length. The film substrate 80 is, for example, a resin such as enamel resin, film glass, polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polycarbonate (PC), or a cycloolefin polymer ( COP), an organic material such as polymethyl methacrylate (PMMA), polystyrene (PS), polyurethane (PI), or polyacrylic acid. Film substrate 80 can be transparent or opaque. In order to improve the adhesion of the film substrate 80 to the coating film of the uneven-forming material formed on the surface thereof, the film substrate 80 may be subjected to an easy-to-treat treatment on the surface. Further, a gas barrier layer or the like may be provided on the surface of the film substrate 80. Although the size of the film substrate 80 can be appropriately set, for example, the width of the film substrate 80 can be set to 50 to 3000 mm, and the thickness can be set to 1 to 500 μm.

<Coating section>

The coating portion 140A is constituted by the coating devices 140a, 140b, 140c or 140d of the above-described embodiment, and a coating film 84 having a discontinuous (separated) pattern of the unevenness forming material is formed on the film substrate 80. Further, the conveying unit 120b of the coating apparatuses 140a to 140d of the above-described embodiment is a part of the film conveying unit 120 of the manufacturing apparatus of the embodiment.

<Transfer Department>

As shown in FIG. 15, the transfer unit 160 includes a transfer roller 90 and a pressing roller (nip roller) 74 opposed thereto.

The transfer roller 90 is a roller-shaped (cylindrical or cylindrical) mold having a concave-convex pattern on its outer peripheral surface. The transfer roller 90 has a drive shaft that is rotationally driven about a shaft by a driving device such as a motor. The size of the concave-convex pattern of the transfer roller can be appropriately set depending on the size of the film member to be manufactured and the like. For example, it can be made into a diameter of 50 to 1000 mm and an axial length of 50 to 3000 mm.

The transfer roller 90 used in the embodiment has a concave-convex pattern on the surface. The thin plate-shaped mold is attached to the outer peripheral surface of the cylindrical base roll. As the material of the base roll, for example, iron, copper, titanium, stainless steel, aluminum, or the like can be used. Further, the base roll can be made, for example, 50 to 1000 mm in diameter and 50 to 3000 mm in the axial direction. The thin plate-shaped mold includes, for example, a plate-shaped metal mold or a film-form resin film produced by a method described later. The resin constituting the resin mold also contains rubber such as natural rubber or synthetic rubber. The concave-convex pattern of the thin plate-shaped mold can be formed into a structure having a function of a microlens array structure, light diffusion, diffraction, etc., a strip structure composed of lines & spaces, a cylindrical shape, a cone shape, and a cone shape depending on the use of the film member to be manufactured. Column structure, triangular column shape, triangular pyramid shape, triangular frustum shape, square column shape, quadrangular pyramid shape, quadrangular pyramid shape, polygonal column shape, polygonal pyramid shape, polygonal pyramid shape, etc. pattern. For example, it is also possible to make the pitch of the unevenness uneven, and there is no irregular uneven pattern of directivity in the direction of the unevenness. The average pitch of the concavities and convexities can be, for example, in the range of 100 to 1,500 nm, and preferably in the range of 200 to 1200 nm, in the case of producing an optical substrate for use in the use of a thin film member for diffraction and scattering of visible light. In the same application, the average value (average height) of the depth distribution of the concavities and convexities is preferably in the range of 20 to 200 nm, and preferably in the range of 30 to 150 nm. The standard deviation of the depth of the concavities and convexities is preferably in the range of 10 to 100 nm, and preferably in the range of 15 to 75 nm.

Light scattered and/or diffracted from such concave and convex patterns is not single or narrow The light of the wavelength of the region is a band with a wider area, and the scattered light and/or the diffracted light are directed in all directions without directivity. In the above-mentioned "irregular concave-convex pattern", a two-dimensional high-speed Fourier is applied to the concave-convex analysis image obtained by analyzing the uneven shape of the surface. The Fourier transform image obtained by the conversion process has a pattern in which a circle or an annular shape is displayed, that is, a distribution of the pitch of the concavities and convexities in which the direction of the concavities and convexities is not directed, and includes a pseudo-periodic structure. Therefore, in the member having such a pseudo-periodic structure, as long as the distribution of the uneven pitch is a diffraction of visible light, it is very suitable as a member used for a light-emitting element such as an organic EL element, an LED, or an ECL. A member used for a photoelectric conversion element of a solar cell or a member for manufacturing the same.

A piece of mold can be used as a thin plate mold, which is wound around a base roll and mounted Installed. Alternatively, two or more stencils may be used as the thin plate-shaped mold, and the outer peripheral surface of the base roller may be wound by this or the like. The total length of the winding direction of the thin plate-shaped mold may be designed to be shorter than the circumferential length of the base roll. The thin plate-shaped mold can be fixed to the base roll using an adhesive, a magnet, or a screw. Further, when a metal mold (metal mold) is used as the thin mold, for example, the mold is wound around the base roll, and the end portion of the mold is welded to the base roll, whereby the mold can be fixed to the base. Roller. By fixing the thin plate-shaped mold to the base roll in the above manner, the ends of the thin plate-shaped mold can be joined to each other. It is also possible to apply a release treatment to the concave-convex pattern surface as necessary.

An example of a method of manufacturing a thin plate-shaped mold having a concave-convex pattern will be described. initial The production of the master pattern for forming the concave-convex pattern of the mold is performed. For the concave-convex pattern of the master mold, for example, a method of self-organization (microphase separation) of the block copolymer described in WO 2012/096368 (hereinafter, referred to as "BCP (Block) is preferably used. (Copolymer) Thermal Annealing Method) A method of self-organization of a block copolymer described in WO2013/161454 in a solvent atmosphere (hereinafter, suitably referred to as "BCP solvent annealing method"), or W02011/007878A1 The disclosed vaporized film on the polymer film is heated, cooled, and utilized on the surface of the polymer A method of forming irregularities (hereinafter, referred to as "BKL (Buckling) method" as appropriate). Instead of BCP thermal annealing, BCP solvent annealing, and BKL, it can also be formed by photolithography. In addition, for example, a microfabrication method such as a cutting method, an electron beam direct drawing method, a particle beam beam processing method, or an operation probe processing method, or a microfabrication method using self-organization of fine particles can be used. Make a concave and convex pattern of the master mold. When patterning is performed by BCP thermal annealing and BCP, the material forming the pattern can be any material selected from polymethacrylic acid selected from styrenic polymers such as polystyrene, such as polymethyl methacrylate. A block copolymer composed of two types of alkyl ester, polyethylene oxide, polybutadiene, polyisoprene, polyvinyl pyridine, and polylactic acid is suitable. Further, the concave-convex pattern obtained by the solvent annealing treatment may be irradiated with etching of energy rays represented by ultraviolet rays such as excimer UV light or etching by dry etching such as RIE (Reactive Ion Etching). Further, the uneven pattern which has been subjected to such etching may be subjected to heat treatment.

Formed by BCP thermal annealing, BCP solvent annealing, or BKL After the master of the pattern, a mold which can form a further transfer pattern by electroforming or the like is used as follows. First, a seed layer as a conductive layer for electroforming can be formed on a master having a pattern formed by electroless plating, sputtering, vapor deposition, or the like. In order to make the current density of the subsequent electroforming step uniform, and in order to make the thickness of the metal layer deposited by the subsequent electroforming step constant, the seed layer is preferably 10 nm or more. As a material of the seed layer, for example, nickel, copper, gold, silver, platinum, titanium, cobalt, tin, zinc, chromium, gold can be used. Cobalt alloy, gold. Nickel alloy, boron. Nickel alloy, solder, copper, nickel. Chrome alloy, tin-nickel alloy, nickel. Palladium alloy, nickel. cobalt. Phosphorus alloys, or alloys thereof. Secondly, it is deposited on the seed layer by electroforming (electric field plating). Metal layer. The thickness of the metal layer includes, for example, the thickness of the seed layer, and the entire thickness can be set to 10 to 3000 μm. As the material of the metal layer deposited by electroforming, any of the above metal species can be used as the seed layer. The metal layer to be formed preferably has an appropriate hardness and thickness from the viewpoints of ease of handling such as pressing, peeling, and washing of the resin layer for forming the mold.

The metal layer containing the seed layer obtained in this way has a concave-convex structure The master mold is peeled off to obtain a metal substrate. The peeling method may be physically removed, and the patterned material may be removed by dissolving and dissolving the dissolved organic solvent such as toluene, tetrahydrofuran (THF), chloroform or the like. When the master mold is peeled off from the metal substrate, the remaining material components can be removed by washing. As the washing method, wet cleaning using a surfactant or the like and dry cleaning using ultraviolet rays or plasma can be employed. Further, for example, an adhesive or an adhesive may be used to adhere and remove the remaining material components. The metal substrate (metal mold) to which the pattern from the master mold is transferred can be used as the thin plate mold of the present embodiment.

Further, the obtained metal substrate can be used, and the concave and convex structure of the metal substrate can be used The film (form) is transferred to a film-shaped support substrate to form a film-shaped resin mold. For example, after the curable resin is applied to the support substrate, the resin layer is cured while pressing the uneven structure of the metal substrate against the resin layer. As the support substrate, for example, a substrate made of an inorganic material such as glass or a ruthenium substrate, or polyethylene terephthalate (PET), polyethylene naphthalate (PEN), or polycarbonate (PC) can be used. a resin substrate such as a cycloolefin polymer (COP), a polymethyl methacrylate (PMMA), a polystyrene (PS), a polyimine (PI), or a polyacrylic acid, or a metal material such as nickel, copper or aluminum. The substrate formed. The support substrate may be transparent or opaque, and may be used to improve the adhesion on the substrate. Surface treatment or setting of easy adhesion layer, gas barrier layer, etc. Further, the thickness of the support substrate may be set in the range of 1 to 500 μm.

Examples of the curable resin include epoxy-based, acrylic-based, and methacrylic. Acid, vinyl ether, oxetane, urethane, melamine, urea, polyester, phenol, crosslinked liquid crystal, fluorine, fluorenone, polyamide, etc. Various resins such as monomers, oligomers, and polymers. The thickness of the curable resin is preferably in the range of 0.5 to 500 μm. When the thickness is less than the lower limit, the height of the concavities and convexities formed on the surface of the cured resin layer is likely to be insufficient. When the thickness is larger than the upper limit, the influence of the volume change of the resin generated during curing is increased, and the thickness may not be formed well. The possibility of concave and convex shapes.

As a method of applying the curable resin, for example, a spin coating method, a spray coating method, a dip coating method, a dropping method, a gravure printing method, a screen printing method, a relief printing method, or a die coating method can be employed (die- Various coating methods such as coat), curtain flow coating, inkjet coating, and sputtering. Further, the conditions for curing the curable resin vary depending on the type of the resin to be used. For example, the curing temperature is preferably in the range of room temperature to 250 ° C, and the curing time is 0.5 minutes to 3 hours. Further, it may be cured by irradiation with an energy ray such as an ultraviolet ray or an electron ray. In this case, the irradiation amount is preferably 10 mJ/cm ² to 5 J/cm ² .

Next, the metal substrate is removed from the hardened resin layer after hardening. Take off the metal The method of the substrate is not limited to the mechanical peeling method, and a known method can be employed. In this manner, a film-like resin mold which can be obtained by forming a cured resin layer having irregularities on a support substrate can be used as the thin plate mold of the present embodiment.

Further, coating on the uneven structure (pattern) of the metal substrate obtained by the above method The rubber-based resin material is formed by curing the applied resin material and peeling it off from the metal substrate, whereby a rubber mold to which the concave-convex pattern of the metal substrate is transferred can be produced. The obtained rubber mold can be used as the thin plate mold of the present embodiment.

In the transfer portion 160, the pressing roller 74 and the transfer roller 90 together are formed with irregularities. The film substrate 80 of the coating film 84 forming the material is sandwiched, and the film substrate 80 is pressed from the back surface of the film substrate 80 (the surface opposite to the surface on which the coating film of the unevenness forming material is formed). Moreover, in the embodiment shown in FIG. 15, the conveying roller 78 on the upstream side and the downstream side of the transfer portion 160 is disposed so that the film substrate 80 is wound around the transfer roller 90 by substantially half a square. In the present embodiment, the film substrate 80 is in contact with the transfer roller 90 on the front side or the vicinity of the pressing roller 74, and is separated from the transfer roller 90 by about half a cycle after the transfer roller 90 is wound, and is transferred from the transfer roller 90. Stripped. Thereby, the film member 80a is obtained. Further, in the present embodiment, the UV irradiation light source 85 is provided on the downstream side of the pressing roller 74 and on the upstream side of the position where the film substrate 80 is peeled off from the transfer roller 90. Instead of the UV irradiation source 85, a device such as a heater for curing the coating film 84 of the uneven forming material may be provided.

The film member manufacturing apparatus 100a may further be provided for sending out The film substrate 80 fed from the roller 72 and the film member 80a before being taken up by the take-up roll 87 are respectively neutralized by a static eliminator.

The film member manufacturing apparatus 100a can further include an observation portion 140A. An inspection device for forming the thickness or state of the coating film or an inspection device for observing the uneven pattern of the coating film 84 after being peeled off from the transfer roller 90.

[Sixth embodiment]

In the present embodiment, the use of the coating apparatuses 140e to 140i as described above is described as having a concave-convex pattern. A device for manufacturing a strip-shaped film member. The manufacturing apparatus 16b shown in FIG. 16 mainly includes a film transport unit 120 that continuously feeds out the film base material 80, and a coating film 84 on which a film forming material 84 is formed on the film substrate 80 that is fed by the film transport unit 120. The portion 140B and the transfer portion 160 which is located on the downstream side of the coating portion 140B and transfers the concave-convex pattern to the coating film 84 of the unevenness forming material. A film substrate (hereinafter referred to as a film member) 80a having a concavo-convex forming material with a concavo-convex pattern is manufactured by the film member manufacturing apparatus 100b. The film-making apparatus 100b is configured similarly to the film-making apparatus 100a of the fifteenth embodiment, except that the coating unit 140B is configured by the coating apparatuses 140e, 140f, 140g, 140h, or 140i of the above-described embodiment. .

[17th embodiment]

In the present embodiment, a manufacturing apparatus using a strip-shaped film member having a concavo-convex pattern as described above in the coating apparatuses 140j to 140p will be described. The manufacturing apparatus 16c shown in FIG. 17 mainly includes a film transporting unit 120 that continuously feeds out the film base material 80, and a coating film 84 on which the unevenness forming material is formed on the film base material 80 sent from the film transport unit 120. The portion 140C and the transfer portion 160 which is located on the downstream side of the coating portion 140C and transfers the concave-convex pattern to the coating film 84 of the unevenness forming material. A film substrate (hereinafter referred to as a film member) 80a having a concavo-convex forming material with a concavo-convex pattern is manufactured by the film member manufacturing apparatus 100c. The film forming apparatus 100c is configured similarly to the above-described thin film member manufacturing apparatus 100a except that the coating unit 140C is configured by the coating apparatuses 140j, 140f, 140k, 140m, 140n or 140p of the above-described embodiment.

[18th embodiment]

A method of manufacturing a film member having a concavo-convex pattern using the film member manufacturing apparatuses 100a to 100 of the above-described fifteenth to seventeenth embodiments in the eighteenth embodiment will be described with reference to Figs.

First, the conveyance of the conveyance unit 120 is started, and the film substrate 80 is taken out from the delivery roller 72. It is sent to the coating unit 140A, 140B or 140C through the conveying roller 78.

In the coating portion 140A, 140B or 140C, by the above coating device 140a Any of ~p is formed on the film substrate 80 by a coating film 84 having a discontinuous pattern of the unevenness forming material. Thereby, the coating film 84 is formed on the desired discontinuous region on the film substrate 80.

As the unevenness forming material, a photocurable resin, a thermosetting resin, or a thermosetting resin can be used. Examples of the thermoplastic resin include epoxy, acrylic, methacrylic, vinyl ether, oxetane, urethane, melamine, urea, polyester, and phenol. Various resins such as a cross-linking liquid crystal system, a fluorine-based, an anthrone-based or a polyamide-based monomer, an oligomer, and a polymer.

The uneven-forming material can be formed of an inorganic material because it is excellent in heat resistance, and in particular, a material such as cerium oxide, a Ti-based material, or an ITO (indium-tin oxide)-based material, ZnO, ZrO ₂ , or Al ₂ O _{3 can be used.} A sol-gel material. When a concave-convex pattern layer composed of cerium oxide is formed on a film substrate by a sol-gel method, a sol-gel material of a metal alkoxide (cerium oxide precursor) is prepared. As a precursor of cerium oxide, tetramethoxy decane (TMOS), tetraethoxy decane (TEOS), tetraisopropoxy decane, tetra-n-propoxy decane, tetraisobutoxy decane, and tetra can be used. a tetraalkoxide monomer represented by tetraalkoxydecane, methylbutoxy decane, ethyltrimethoxy, n-butoxy decane, tetra-butoxy decane, tetra-butoxy decane, etc. Decane, propyltrimethoxydecane, isopropyltrimethoxydecane, phenyltrimethoxydecane, methyltriethoxydecane (MTES), ethyltriethoxydecane, propyltriethoxydecane , isopropyl triethoxy decane, phenyl triethoxy decane, methyl tripropoxy decane, ethyl tripropoxy decane, propyl tripropoxy decane, isopropyl tripropoxy decane , phenyl tripropoxy decane, methyl triisopropoxy decane, ethyl triisopropoxy decane, propyl triisopropoxy decane, isopropyl triisopropoxy decane, phenyl triiso a trialkyl oxide monomer represented by a trialkoxy decane such as propoxy decane or tolyl triethoxy decane, dimethyl dimethoxy decane or dimethyl Diethoxydecane, dimethyldipropoxydecane, dimethyldiisopropoxydecane, dimethyldi-n-butoxydecane, dimethyldiisobutoxydecane, dimethyldidi Dibutoxydecane, dimethylditributoxydecane, diethyldimethoxydecane, diethyldiethoxydecane, diethyldipropoxydecane, diethyldiisopropyl Oxy decane, diethyl di-n-butoxy decane, diethyl diisobutoxy decane, diethyl second butoxy decane, dipropyl bis-butoxy decane, dipropyl dimethyl Oxydecane. Dipropyl diethoxy decane, dipropyl dipropoxy decane, dipropyl diisopropoxy decane, dipropyl di-n-butoxy decane, dipropyl diisobutoxy decane, dipropyl Di-second butoxy decane, dipropyl di-t-butoxy decane, diisopropyl dimethoxy decane, diisopropyl diethoxy decane, diisopropyl dipropoxy decane, Diisopropyldiisopropoxydecane, diisopropyldi-n-butoxydecane, diisopropyldiisobutoxydecane, diisopropyldi-2-butoxydecane,diisopropyl Third butoxy decane, diphenyl dimethoxy decane, diphenyl diethoxy decane, diphenyl dipropoxy decane, diphenyl diisopropoxy decane, diphenyl di-n-butyl a decane oxide represented by a dialkoxy decane such as oxydecane, diphenyl diisobutoxy decane, diphenyl bis second butoxy decane, diphenyl bis-butoxy decane or the like body. Further, an alkyltrialkoxide or a dialkyldialkoxydecane having an alkyl group having a C4 to C18 carbon atom can also be used. It is also possible to use a vinyl monomer such as vinyltrimethoxydecane or vinyltriethoxydecane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxydecane, 3-glycidoxypropane Propylmethyldimethoxydecane, 3-glycidoxypropyltrimethoxydecane, 3-glycidoxypropylmethyldiethoxydecane, 3-epoxypropoxypropane a monomer having an epoxy group such as a triethoxysilane or a monomer having a styryl group such as p-styryltrimethoxydecane, 3-methacryloylmethyldimethoxydecane, or 3-methyl Acryloxypropyltrimethoxydecane, 3-methacryloxypropylmethyldiethoxydecane, 3-methacryloxypropyltriethoxydecane, etc. a monomer having an acrylic group such as a monomer, 3-acryloyloxypropyltrimethoxydecane, or the like, N-2-(aminoethyl)-3-aminopropylmethyldimethoxydecane, N- 2-(Aminoethyl)-3-aminopropyltrimethoxydecane, 3-aminopropyltrimethoxydecane, 3-aminopropyltriethoxydecane, 3-triethoxymethane-N- (1,3-dimethyl-butylidene) propylamine, N-phenyl-3-amino Monomer-containing monomer such as aminotrimethoxydecane, 3-ureidopropyltriethoxydecane, etc., 3-mercaptopropylmethyldimethoxydecane, decyltrimethoxy a monomer having a mercapto group such as a monomer having a mercapto group such as decane or a monomer having a sulfide group such as 3-isocyanate propyl triethoxysilane or the like, such as a monomer having a mercapto group or a bis-(triethoxypropyl) tetrasulfide A polymer obtained by polymerizing a small amount of a metal alkoxide which is a composite material characterized by introducing a functional group and a polymer into a part of the material. Further, a part or all of the alkyl group and the phenyl group of the compounds may be replaced with fluorine. Further, examples thereof include metal acetamethylene acetate, metal carboxylate, oxychloride, chloride, and the like, but are not limited thereto. In addition, examples of the metal species include Ti, Sn, Al, Zn, Zr, In, and the like, and the like, but are not limited thereto. It is also possible to use a precursor in which the above-mentioned oxidized metal is appropriately mixed. Further, as the precursor of cerium oxide, a hydrazine coupling agent which has an affinity for reacting with cerium oxide in the molecule, a hydrolyzable group having reactivity, and an organic functional group having water repellency can be used. For example, a decane monomer such as n-octyltriethoxydecane, methyltriethoxydecane or methyltrimethoxydecane, vinyltriethoxydecane, vinyltrimethoxydecane or vinyl may be mentioned. Vinyl decane such as tris(2-methoxyethoxy)decane, vinylmethyldimethoxydecane, 3-methacryloxypropyltriethoxydecane, 3-methacryloyloxyl a decyl methacrylate such as propyltrimethoxydecane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxydecane, 3-glycidoxypropyltrimethoxydecane, 3-epoxy Ethylene decane such as propoxypropyltriethoxydecane, 3-mercaptopropyltrimethoxydecane, 3-mercaptopropyltriethoxydecane, etc., decyl decane, 3-octanoylthio-1-propyl Sulphoxane such as triethoxydecane, 3-aminopropyltriethoxydecane, 3-aminopropyltrimethoxydecane, N-(2-aminoethyl)-3-aminopropyltrimethoxydecane, An aminodecane such as N-(2-aminoethyl)-3-aminopropyldimethoxydecane or 3-(N-phenyl)aminopropyltrimethoxydecane, which is polymerized by polymerization of such monomers Things and so on.

When a mixture of TEOS and MTES is used as the uneven forming material, the mixing For example, the ratio can be set to 1:1 in terms of a molar ratio. The sol-gel material forms amorphous cerium oxide by performing hydrolysis and polycondensation reaction. In order to adjust the pH of the solution as a synthesis condition, an acid such as hydrochloric acid or a base such as ammonia may be added. The pH system is preferably 4 or less or 10 or more. Further, water may be added for the purpose of hydrolysis. The amount of water added can be 1.5 times or more in terms of the molar ratio with respect to the metal alkoxide species.

As a solution solvent of a concavo-convex forming material composed of a sol-gel material, for example, Examples thereof include alcohols such as methanol, ethanol, isopropanol (IPA), and butanol, aliphatic hydrocarbons such as hexane, heptane, octane, decane, and cyclohexane, and benzene, toluene, and the like. An aromatic hydrocarbon such as toluene or mesitylene, an ether such as diethyl ether, tetrahydrofuran or dioxane, acetone, methyl ethyl ketone, isophorone or cyclohexane Ketones such as ketones, butoxyethyl ether, hexyloxyethanol, methoxy Ether ketones such as keto-2-propanol and benzyloxyethanol, glycols such as ethylene glycol and propylene glycol, ethylene glycol dimethyl ether, diethylene glycol dimethyl ether, propylene glycol monomethyl ether a glycol ether such as acetate, an ester such as ethyl acetate, ethyl lactate or γ-butyrolactone; a phenol such as phenol or chlorophenol; N,N-dimethylformamide; A halogen-based solvent such as N-dimethylacetamide or N-methylpyrrolidone, a halogen-based solvent such as chloroform, dichloromethane, tetrachloroethane, monochlorobenzene or dichlorobenzene, or carbon disulfide. a hetero element compound, water, and a mixed solvent of these. In particular, ethanol and isopropyl alcohol are preferred, and those mixed with such water are also preferred.

As an additive of the unevenness forming material composed of a sol-gel material, it can be made Alcohol amines such as polyethylene glycol, polyethylene oxide, hydroxypropyl cellulose, polyvinyl alcohol, solution stabilizer, triethanolamine, etc., β-diketone, β-ketone, etc. Ester, formamide, dimethylformamide, dioxane, and the like. Further, as an additive of the sol-gel material solution, a material which generates an acid or a base by irradiation with light such as an energy ray represented by ultraviolet rays such as excimer UV light can be used. By adding such a material, the sol-gel material solution can be hardened by irradiation of light.

The thickness of the coating film 84 on which the unevenness forming material is formed is in the range of 0.5 to 500 μm. It is better inside. When the thickness is less than the lower limit, the height of the concavities and convexities formed on the surface of the concavo-convex forming material is likely to be insufficient. When the thickness exceeds the upper limit, the influence of the volume change of the concavo-convex forming material generated during curing becomes large. The possibility of forming a concave-convex shape well.

Next, a coating film 84 having a concavo-convex forming material is formed in a discontinuous region as desired. The base material 80 is conveyed by the transfer roller 78 which is stretched downstream of the application part 140A, 140B or 140C, and is conveyed to the transfer roller 90 and the press roller 74 of the transfer part 160. The substrate 80 is conveyed to the vicinity of the pressing roller 74, and the concave-convex pattern superposed on the transfer roller 90 in the opposite direction is pressed by the pressing roller 74. The uneven pattern of the printing roller 90 is transferred to the coating film 84.

The substrate 80 to which the uneven pattern is transferred by the pressing roller 74 can be irradiated with the UV light from the UV irradiation source 85 while the transfer roller 90 is pressed, thereby promoting the curing of the coating film 84. The condition for curing the uneven forming material differs depending on the type of material used as the uneven forming material. For example, when the uneven forming material is cured by heating, the curing temperature is preferably from room temperature to 250. The range of °C, the hardening time is 0.5 minutes to 3 hours. Further, it may be cured by irradiation with an energy ray such as an ultraviolet ray or an electron ray. In this case, the irradiation amount is preferably in the range of 20 mJ/cm ² to 5 J/cm ² . In the example shown in Figs. 15 to 17, the coating film 84 of the uneven-forming material can be irradiated with UV light by the UV irradiation source 85 disposed under the transfer roller 90.

a film substrate (film) of a coating film 84a having a cured unevenness forming material The member 80a) is changed along the outer circumference of the transfer roller 90, and is conveyed in the direction away from the transfer roller 90 to be peeled off from the transfer roller 90. Thereafter, the film member 80a is taken up by the take-up roll 87. The method of peeling the film member 80a from the transfer roller 90 is not limited to the mechanical peeling method, and any known method can be employed. For example, in FIGS. 15 to 17, the film member 80a of the coating film (concave-convex pattern layer) 84a having the cured unevenness forming material is conveyed in the direction of being separated from the transfer roller 90 by the downstream side of the pressing roller 74. The film member 80a can be peeled off from the transfer roller 90. Thus, the film member 80a having the uneven concave-convex pattern layer 84a formed with the unevenness formed on the film substrate 80 can be obtained. The uneven pattern layer 84a is formed on the film substrate 80 in a region having a desired discontinuous pattern.

Next, the description will be made with reference to the drawings for preventing the occurrence of the joint portion of the roll-shaped mold. Method and manufacturing equipment for film member having concave-convex pattern caused by poor transfer and peeling failure Set.

[19th embodiment]

Another method for producing a strip-shaped film member having a concavo-convex pattern will be described in the nineteenth embodiment. This manufacturing method, as shown in FIG. 18, mainly includes a coating step of forming a coating film on which a concave-convex forming material is formed on a film substrate, and a transfer step of transferring a concave-convex pattern of the transfer roller onto a coating film on the film substrate Further, the step of preparing a transfer roller having a concave-convex pattern may be further included. An example of a device used in this manufacturing method is shown in FIG. The film manufacturing apparatus 100d mainly includes an application portion 140D that performs a coating step, a transfer portion 160 that performs a transfer step, and a transfer portion 120 that transports the film substrate 80 to the application portion 140D and the transfer portion 160. . Hereinafter, the transfer roller used in the transfer unit 160 will be described, and the operation of each step and the detailed structure of each unit will be described next.

<Steps of preparing the transfer roller>

As shown in FIG. 20, the transfer roller used in the present embodiment is a roll-shaped (cylindrical or cylindrical) mold having a concave-convex pattern 90p on its outer peripheral surface. The transfer roller 90 has a drive shaft 90d that is rotationally driven about a shaft 90d by a driving device such as a motor. The size of the concave-convex pattern 90p of the transfer roller can be appropriately set depending on the size of the film member to be produced, etc., but can be, for example, 50 to 1000 mm in diameter and 50 to 3000 mm in the axial direction. In FIG. 20, the concave-convex pattern 90p of the transfer roller is exaggerated for the sake of explanation. However, the actual concave-convex pattern 90p of the transfer roller means a fine uneven pattern as will be described later.

The transfer roller 90 used in the embodiment and the film structure of the fifteenth embodiment Similarly, the transfer roller 90 of the manufacturing apparatus 100a of the device is configured such that the thin plate-shaped mold 90b having the uneven pattern 90p on the surface thereof is attached to the outer peripheral surface of the cylindrical base roller 90a. The material of the base roller 90a and the large The size may be the same as that of the base roll of the film manufacturing apparatus 100a of the fifteenth embodiment. The material of the thin plate-shaped mold 90b and the uneven pattern 90p may be the same as the thin plate-shaped mold of the manufacturing apparatus 100a of the film member of the fifteenth embodiment. The length of the thin plate-shaped mold 90b in the winding direction may be designed to be shorter than the circumferential length of the base roller 90a.

A single mold can be used as the thin plate-shaped mold 90b, which is wound around the base roll 90a. Install it. Alternatively, two or more stencils may be used as the thin plate-shaped dies 90b, and the outer peripheral surface of the base roller 90a may be wound by this or the like. The thin plate-shaped mold 90b can be fixed to the base roll 90a using an adhesive, a magnet, or a screw. Further, when a metal mold (metal mold) is used as the thin plate mold 90b, for example, a metal mold is wound around the base roll 90a, and the end portion of the metal mold is welded to the base roll 90a, whereby the metal mold can be used. It is fixed to the base roller 90a. By fixing the thin plate-shaped mold 90b to the base roller 90a in the above manner, the end portions of the thin plate-shaped mold 90b can be coupled to each other. In the present invention, the end portions of the thin plate-shaped molds 90b are connected to each other, not only means that the end portions of the thin plate-shaped molds 90b are in contact with each other, but also the end portions of the thin plate-shaped molds 90b are opposed to each other with a predetermined interval therebetween. A region between the end portions of the thin plate-shaped molds 90b to which the thin plate-shaped molds 90b are fixed to each other by the base plate 90a and the opposite ends thereof is referred to as a "seam portion" 90c. Further, in the end portion of the thin plate-shaped mold 90b, in order to attach the thin plate-shaped mold 90b to the base roller 90a, a screw or the like is provided, and the region in which the screw or the like is provided is also referred to as the joint portion 90c. In other words, the term "seam portion" as used herein refers to a region which is produced by attaching the thin plate-shaped mold 90b to the base roller 90a and cannot be used as a concave-convex pattern of the mold (mainly extending to the axis of the base roller). Direction area). When two sheets of the template are used as the thin plate-shaped mold 90b, the transfer of the thin plate-shaped mold 90b composed of the two templates having the concave-convex pattern 90p to the outer peripheral surface of the base roller 90a every half-cycle can be obtained as shown in FIG. Roller 90. Figure 20 In the transfer roller 90 shown, the joint portion 90c is filled with a resin. It is also possible to apply a mold release treatment to the concave-convex pattern surface 90p as necessary.

The thin plate-shaped mold 90b having the concave-convex pattern can be used in the same manner as in the fifteenth embodiment. The thin plate-shaped mold of the film member manufacturing apparatus 100a is manufactured by the same method.

In addition, in order to prepare the transfer roller 90, it is not necessary to make it by itself or by The manufacturer or the market obtains the transfer roller 90 in which the thin plate-shaped mold 90b having the concave-convex pattern is wound around the base roller 90a, and the end portions of the thin plate-shaped mold 90b are connected to each other on the outer peripheral surface of the base roller 90a.

<Step of forming a coating film>

The unevenness forming material is intermittently applied to a predetermined thickness on the strip-shaped film substrate. The coating portion formed with the coating film and the uncoated portion on which the coating film is not formed are formed on the film substrate by intermittently applying the uneven forming material.

As the film substrate, the film member used in the fifteenth embodiment can be used. The film substrate and the unevenness forming material of the manufacturing apparatus 100a are the same. As the unevenness forming material, the same as the uneven forming material used in the method for producing a film member of the eighteenth embodiment can be used. The thickness of the coating film of the unevenness forming material is preferably in the range of 0.5 to 500 μm as in the method for producing the film member of the eighteenth embodiment.

As a method of applying the unevenness forming material, for example, a gravure coating method or a net can be employed. Various coating methods such as a plate printing method, a letterpress printing method, and a die-coating method.

In order to apply the unevenness forming material intermittently to the film substrate, The coating device such as the coating roller, the coating die, or the coating head used in the coating method intermittently operates. For example, in the case of using a coating method using a coating roll such as a gravure coating method, by contacting a film substrate The coating material is applied to the film substrate by applying a roll. At this time, the substrate film is stopped from being applied from the application roller at a predetermined timing, and then the substrate film is brought into contact with the coating roller again to start the coating again at a predetermined timing, that is, the unevenness forming material can be intermittently formed. Apply to the film substrate. When the uneven formation material is applied by the die coating method, the uneven formation material can be discharged from the mold by applying pressure to the mold to apply the uneven formation material to the film substrate. At this time, the pressure applied to the mold is cut off at a predetermined timing to stop the discharge of the uneven-form forming material from the mold, and then the mold is again pressed at a predetermined timing to discharge the uneven-forming material and the coating is resumed, that is, the unevenness can be obtained. The forming material is intermittently applied to the film substrate.

a film of a portion (uncoated portion) of the uncoated uneven formation material on the substrate 80 The length of the substrate conveyance direction may be set to be larger than the length of the circumferential direction joint portion of the transfer roller from the viewpoint of reliably avoiding the transfer of the joint portion of the transfer roller.

<Transfer step>

In the transfer step, the transfer film is pressed against the coating film of the unevenness forming material formed on the substrate, and the uneven pattern of the transfer roller is transferred to the coating film. At this time, as shown in FIG. 22, the portion (uncoated portion) 88 of the film substrate 80 in which the coating film of the unevenness forming material is not formed is opposed to the seam portion 90c of the transfer roller 90, and the film base is formed. The portion (coating portion) 86 in which the coating film of the unevenness forming material is formed in the material 80 is placed on the thin plate-shaped mold 90b of the transfer roller 90, and the substrate 80 is superposed on the transfer roller 90. The film substrate 80 laminated on the transfer roller 90 may be pressed from the back surface of the substrate 80 to the transfer roller 90 by using a pressing roller (nip roller) 74.

When the substrate 80 is pressed against the transfer roller 90 or at a later time, the unevenness is formed The coating film 84 of the material is hardened. The condition for hardening the uneven forming material may be the same as that of the eighteenth embodiment. The film member is manufactured in the same manner.

Next, a coating film and a thin film having a concave-convex forming material having a hardened concave-convex pattern The film substrate is peeled off from the transfer roller. The method of peeling off the coating film and the film base material of the uneven-concave-forming material from the transfer roller may be the same as the peeling method in the method of manufacturing the film member of the eighteenth embodiment.

In addition, the transfer roller can be driven while rotating around the axis. Rotational speed, such as the speed of rotation and the position of the seam. It is also possible to control the timing at which the uneven formation material is applied in the above coating step based on the information on the detected rotation state. The rotation state of the transfer roller can be detected by a method of detecting the position of the transfer roller by a reflection plate or the like, or using a servo motor or an encoder or the like. Further, as will be described later, the step of detecting the seam portion is not essential, and this step may be omitted.

[Twentyth embodiment]

In the twentieth embodiment, a manufacturing apparatus of a film member having a concavo-convex pattern will be described. As described above, the film member manufacturing apparatus 100d mainly includes a film conveying unit 120 that continuously feeds out the film substrate 80, and a coating material for forming the unevenness forming material on the film substrate 80 sent from the film conveying unit 120. The coating portion 140D of the film 84 and the transfer portion 160 which is located on the downstream side of the coating portion 140D and which transfers the concave-convex pattern to the coating film 84 of the unevenness forming material. Further, the film member manufacturing apparatus 100d may include a control unit that controls the timing at which the coating material 140 intermittently applies the unevenness forming material to the film substrate 80 by the coating portion 140D.

The film transport unit 120, as shown in FIG. 19, mainly has a strip film a feeding roller 72 of the substrate 80, a take-up roller 87 provided downstream of the transfer portion 160 and winding up the film member 80a, And a conveying roller 78 for conveying the film substrate 80 and the film member 80a in the conveying direction. The delivery roller 72 and the take-up roller 87 may be rotatably attached to a support table (not shown) that can be attached or detached. The film substrate 80 can be transported in the transport direction by the rotational driving of the feed roller 72 and the take-up roller 87.

Furthermore, the film transport unit 120 may also include maintaining the tension of the film substrate 80. In the constant tension control unit 130, the tension control unit 130 can be constituted by an adjustment roller 32, a guide roller 34, and a cylinder (not shown) that is attached to the support shaft of the adjustment roller 32. It is configured such that a certain amount of force from the cylinder is applied to the regulating roller 32 through the fulcrum, and the regulating roller 32 can be moved to a position where the force from the cylinder is balanced with the force of stretching the regulating roller 32 by the tension of the film substrate. . Thereby, the film substrate 80 to be conveyed can maintain a constant tension at any time.

The coating portion 140D, as shown in detail in FIG. 21, is provided with a coating roller 40 and an actuating roller. 42 and a container 82 storing the uneven forming material. The application roller 40 forms a coating film 84 by applying a concavo-convex forming material to the film substrate 80 opposite to the surface of the film substrate 80 (the surface on which the unevenness forming material is applied). The actuating roller 42 is selectively displaced to the back surface of the supporting film substrate 80 (the side opposite to the surface on which the coating film 84 is formed) to bring the substrate 80 into contact with the application roller 40 (Figs. 19 and 21). The position of the actuating roller 42 shown by the line, hereinafter referred to as "contact position" as appropriate, and the position at which the base material 80 is separated from the application roller 40 (i.e., the position of the actuating roller 42 shown by the broken line in Figs. 19 and 21, Hereinafter, it is appropriately referred to as "separation position").

The size of the application roller 40 can be appropriately set. Preventing irregularities from forming a material from a film The length of the coating surface of the application roller in the direction of the rotation axis is preferably smaller than the width of the film substrate 80 from the viewpoint that the left and right end portions of the substrate 80 are excessively wound around the back surface of the film substrate 80. Further, in order to apply the uneven pattern to the coating film 84 of the uneven forming material, the length of the coating roller in the direction of the rotation axis can be made smaller than that of the transfer roller 90. The length of the pattern in the axial direction is small. The application roller 40 is provided in a state in which a part of the coating roller 40 is immersed in a state of being stored in a state in which the liquid-like unevenness forming material of the container 82 is rotated. When the application roller 40 is immersed in the unevenness forming material and rotated, the unevenness forming material is held on the outer circumferential surface (side surface) of the application roller 40. The actuating roller 42 can change the position (a mechanism for moving the film substrate with respect to the unevenness forming material) by using an actuator (not shown) or the like. When the operation roller 42 is at the contact position, the unevenness forming material held by the application roller 40 is in contact with the film substrate 80, and the coating film 84 of the unevenness forming material is formed on the substrate 80. On the other hand, when the operation roller 42 is at the separation position, since the base material 80 is separated from the unevenness forming material held by the application roller 40, the coating film of the unevenness forming material is not formed on the base material 80. By switching the position of the operation roller 42 in this manner, the coating portion 86 and the uncoated portion 88 of the unevenness forming material can be formed on the film substrate 80.

The transfer unit 160 is shown in detail in FIG. 22, and includes a transfer roller 90 and a counter-alignment therewith. The roller (clamping roller) 74 is pressed. The transfer roller 90 can be manufactured by the method described in the description of the step of preparing a transfer roller in the film-form member manufacturing method according to the nineteenth embodiment, and the transfer roller 90 is provided with a seam portion 90c in which a concave-convex pattern is not formed. . The film roll 80 is sandwiched between the film substrate 80 on which the coating film 84 having the unevenness forming material is formed, and the film substrate 80 is pressed from the back surface of the film substrate 80. In the embodiment shown in FIGS. 19 and 22, the transport roller 78 on the upstream side and the downstream side of the transfer portion 160 is disposed so that the film substrate 80 is wound around the transfer roller 90 by a substantially half. In the present embodiment, the film substrate 80 is in contact with the transfer roller 90 on the front side or the vicinity of the pressing roller 74, and is separated from the transfer roller 90 by about half a cycle after the transfer roller 90 is wound, and is peeled off from the transfer roller 90. Film substrate 80. Further, in the present embodiment, on the downstream side of the pressing roller 74 and on the upstream side from the position where the film substrate 80 is peeled off from the transfer roller 90, a coating film 84 such as a UV irradiation source 85 for hardening the uneven forming material is provided. s installation.

The apparatus for manufacturing a film member according to the twentieth embodiment may be as shown in FIG. A detecting device and a control unit 180 for detecting the position of the seam portion 90c of the transfer roller 90 are provided. For example, as shown in FIG. 23, a reflection plate 90e is provided at a position corresponding to the position of the seam portion 90c of the transfer roller on the drive shaft 90d of the transfer roller, and is received by the light receiving portion of the optical sensor 62 from the optical sensing. The light irradiated by the light of the device 62 can detect the position and the rotational speed. Further, the control unit 180 may be provided with a computer 64 that is based on the information on the position and the rotational speed of the seam portion 90c detected by the optical sensor 62, the circumferential length and interval of the seam portion 90c, and the coating. The position of the substrate 40 from the roller 40 to the transfer roller 90, the conveyance speed, and the like are used to calculate the position of the film substrate facing the seam portion 90c of the transfer roller 90, and the formation on the substrate 80 is calculated based on the calculation result. A portion where the coating film of the unevenness forming material (coating portion) and a portion where the coating film is not formed (uncoated portion) are formed to face the seam portion 90c of the transfer roller 90 in the transfer portion 160. A portion (uncoated portion) of the coating film of the unevenness forming material is not formed in the base material 80, and the position of the actuating roller 42 of the coating portion 140D is controlled based on the calculation result.

The film member manufacturing apparatus 100d may further be provided for sending out The film substrate 80 fed from the roller 72 and the film member 80a before being taken up by the take-up roll 87 are respectively neutralized by a static eliminator.

The film member manufacturing apparatus 100d can further include an observation portion 140D An inspection device for forming the thickness or state of the coating film or an inspection device for observing the uneven pattern of the coating film 84 after being peeled off from the transfer roller 90.

The operation of the film substrate 80 by the film member manufacturing apparatus 100d will be described.

In the transport unit 120, the film substrate 80 is sent out from the delivery roller 72, and is transported. The roller 78 reaches the coating portion 140D.

In the coating portion 140D, a portion of the film substrate 80 on which the coating film 84 should be formed When the part of the coating unit is conveyed to the front surface of the application roller 40, the control unit 180 controls the actuator or the like for moving the operation roller 42, and moves the operation roller 42 to the contact position (in FIG. 19 and 21, the solid line is used). Position shown). By the movement of the operation roller 42, the substrate 80 is brought into contact with the application roller 40 while moving in the conveyance direction, whereby the coating film 84 of the uneven formation material is formed on the base material 80 with a predetermined film thickness. At this time, since the regulating roller 32 of the tension control portion 130 is configured to move to a position where the force from the cylinder is balanced with the force of stretching the regulating roller 32 by the tension of the film substrate, the movement of the actuating roller 42 is increased. The film substrate 80 stretches the tension of the regulating roller 32, and moves the regulating roller 32 (moves to the position shown by the solid line in Fig. 19). Thereby, the tension of the film substrate 80 is kept constant. When the portion of the film substrate 80 where the coating film 84 is not formed (the portion that becomes the uncoated portion) is conveyed to the front surface of the application roller 40, the control portion 180 moves the operation roller 42 to the separation position (FIGS. 19 and 21). In the position shown by the dotted line). By the movement of the operation roller 42, since the base material 80 moved in the conveyance direction is separated from the application roller 40, an uncoated portion in which the coating film of the unevenness forming material is not formed is formed on the base material 80. At this time, since the tension of the dancer roller 32 of the tension control portion 130 being stretched from the film substrate 80 is reduced, the dancer roller 32 is moved to a new force from the cylinder and the dancer roller 32 is stretched by the tension of the film substrate. The position of the force balance (the position shown by the broken line in Fig. 19). Thereby, the tension of the film substrate 80 is kept constant. The control unit 180 performs intermittent coating in the coating unit 140D by repeatedly changing the position of the operation roller 42 at a predetermined cycle as described above.

Next, the substrate 80 on which the coating film 84 having the unevenness forming material is formed is stretched over the coating The conveyance roller 78 downstream of the application portion 140D is conveyed and transported to the transfer roller 90 and the pressing roller 74 of the transfer portion 160. In the transfer unit 160, the conveyed film substrate 80 is superposed on the transfer roller 90 and pressed by the pressing roller 74. At this time, as shown in FIG. 22, the uneven portion forming material uncoated portion 88 in the film substrate 80 is opposed to the seam portion 90c of the transfer roller 90, and the unevenness forming material coating in the film substrate 80 is applied. The portion 86 is disposed to overlap the transfer roller 90 with respect to the arrangement of the thin plate-shaped mold 90b of the transfer roller 90. Thereby, the uneven pattern 90p of the transfer roller 90 is pressed against the coating portion 86 on the film substrate 80, and the uneven pattern is transferred. At this time, since the joint portion 90c of the transfer roller 90 faces the uneven portion forming material uncoated portion 88 of the film substrate 80, it is possible to prevent the film member from being defective due to the unevenness or the gap of the joint portion 90c. Or the film substrate is damaged.

Next, the substrate 80 on which the uneven pattern is transferred by pressing the roller 74 is pressed The UV light from the UV irradiation source 85 is irradiated in the state of the transfer roller 90, whereby the hardening of the coating film 84 is promoted. Then, the film substrate (film member 80a) having the coating film of the cured concavo-convex forming material is changed along the outer circumference of the transfer roller 90, and is transported from the direction of the transfer roller 90 to be peeled off from the transfer roller 90. . Thereafter, the film member 80a is taken up by the take-up roll 87. Thus, the film member 80a on which the uneven pattern of the transfer roller 90 is transferred to the coating film can be obtained. The obtained film member 80a can also be used in place of a metal mold formed by electroforming, and the thin plate-shaped mold can be wound and fixed to a roll body to produce a transfer roll of another form.

Further, the above-described film member manufacturing apparatus 100d is provided with a detection transfer roller A 90-degree sensor of rotation, but such a detection device may not be assembled to the device. In this case, for example, the following steps can be applied to intermittently apply the seam portion of the transfer roller to the uncoated portion of the film forming member. First, the rotation from the seam portion of the transfer roller 90 The length and interval of the direction determine the length of the coating portion and the uncoated portion formed on the film substrate. Thereby, the time and period of bringing the film base material into contact with and separating from the coating roll were calculated from the conveyance speed of the film substrate. The actuating roller is actuated in such a manner that the coating roller and the film substrate are contacted and separated in accordance with the calculated time and period. Further, the coating start position of the film substrate (the end portion on the conveying direction side of the coating portion) is calculated from the coating distance from the coating roller to the film substrate of the transfer roller and the diameter of the transfer roller. The position of the joint of the transfer roller (rotation angle) at the front of the roller. Next, the joint portion of the transfer roller is aligned with the calculated position, and the driving of the film member manufacturing apparatus is started. Further, in this case, the cycle of contact and separation of the application roller and the film substrate starts from the point of time when the contact starts. According to the above, the uncoated portion of the unevenness forming material of the film member can be overlapped with the seam portion of the transfer roller.

In the tension control unit 130 of the manufacturing apparatus 100d of the film member, by adjusting The movement of the roller 32 maintains the tension of the film substrate 80 constant. As the tension control unit 130 that maintains the tension of the film substrate 80 constant, various mechanisms or control methods can be employed instead of the adjustment roller 32. For example, the tension of the film substrate 80 directly controls the driving of the feed roller 72. In this case, instead of the guide roller 34 and the adjustment roller 32, one of the tension control portions 130 of FIG. 19 is provided with a tension sensor (not shown) having a tension detecting function to be in contact with the film. Substrate 80. The tension sensor is connected to a control device for controlling the driving of the delivery roller 72, for example, a control system of a motor that rotationally drives the delivery roller 72, that is, the motor can be controlled to follow the tension value detected by the tension sensor. The rotation speed of the delivery roller 72 is changed. Thereby, the tension of the film substrate 80 is kept constant to eliminate the slack or protrusion of the film due to the intermittent operation.

The tension of the film substrate 80 is kept constant as the tension control unit 130. In other mechanisms, a torque motor (not shown) may be connected to the delivery roller 72. Torque motor can be applied The rotation speed or moment is adjusted by the change in the load of the delivery roller 72. Therefore, if the torque of the torque motor is set to be constant, even if the tension applied to the film substrate 80 changes, the rotational force (torque) for rotating the delivery roller can be kept constant at any time. By using the torque motor, one of the pair of tension control portions 130 of the tension control unit 130 of Fig. 19 can be omitted.

The tension of the film substrate 80 is kept constant in the tension control unit. The mechanism may also be provided with a magnetic powder clutch (not shown) on the delivery roller 72. The magnetic powder clutch is a magnetic powder such as iron powder in a joint surface between a drive shaft (input shaft) that transmits the motive force of the motor and a transmission shaft (output shaft) that transmits the motive force thereof, and is usually controlled by a magnetic field generated from an electromagnetic stone provided on the clutch. The density and the like are controlled to control the transmission of the motive force. In this case, by setting the magnetic powder clutch to slip when a predetermined torque is applied to the delivery roller 72, the torque of the delivery roller 72 can be controlled to be constant. Alternatively, by providing the above-described tension control portion, the magnetic powder density can be adjusted in accordance with the value of the tension applied to the film substrate 80, whereby the torque of the feed roller can be controlled by the slip of the clutch. When such a magnetic powder clutch is used, one of the pair of tension control units 130 of FIG. 19 and the adjustment roller 32 can be omitted.

Further, the tension and the tension are set for the film substrate 80 sent from the delivery roller 72. When the tension set by the tension control unit is different, the tension roller may be connected to the transport roller 78, the torque motor, or the magnetic powder clutch to control the tension of the delivery roller 72. The tension control of the tension control unit 130 is performed on the side of the roller 34.

In the twentieth embodiment, the coating portion 140D of the actuating roller 42 is used. Although the coating is intermittent, the coating unit 140D may be configured by any one of the coating apparatuses 140a to p of the first to fourteenth embodiments. The coating portion 140D is coated by the first to the 14th embodiments. In the case of any of 140a to p, it is possible to form a coating film having a pattern of intermittent (discontinuous), so that the uncoated portion can be overlapped with the seam portion 90c of the transfer roller 90. Transfer of the concave and convex pattern.

Moreover, it is possible to prevent transfer failure and peeling failure due to the seam portion of the roll die. The manufacturing method and the manufacturing apparatus are not limited to the above-described 19th and 20th embodiments, and the uncoated portion can be formed by superimposing the joint portion of the transfer roller and superimposing the concave-convex pattern. can.

[21st embodiment]

Further, by using a film member produced by the above method and manufacturing apparatus as a film-shaped mold, it is possible to manufacture a substrate having a concavo-convex structure layer on which a concavo-convex pattern of a film member is transferred. This method will be described in this embodiment.

Since the uneven structure layer on which the uneven pattern of the film-shaped mold is transferred is formed by the sol-gel method, the solution of the sol-gel material is initially prepared. Since the uneven structure layer is excellent in heat resistance, it is preferably formed of an inorganic material, and in particular, a material such as cerium oxide, a Ti-based material, or an ITO (indium tin oxide) material, ZnO, ZrO ₂ , or Al _{2 can be used.} A sol-gel material such as O ₃ . As the metal alkoxide (precursor) used for the solution for modulating the sol-gel material, a metal alkoxide (precursor) which can be used as a concavo-convex forming material in the embodiment of the method for producing a strip-shaped film member described above can be used. Materials, solvents, and materials exemplified by the additives.

A solution of the prepared sol-gel material is applied to the substrate. As a substrate, For example, a substrate made of an inorganic material such as glass, quartz, or a ruthenium substrate, or polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polycarbonate (PC), or a ring can be used. Olefin polymer (COP), a resin substrate such as polymethyl methacrylate (PMMA), polystyrene (PS), polyimine (PI), or polyacrylic acid. The substrate can be transparent or opaque. When the uneven pattern substrate obtained from the substrate is used for producing an organic EL element, the substrate is preferably a substrate including heat resistance and light resistance to UV light or the like. From this point of view, a substrate made of an inorganic material such as glass, quartz or tantalum substrate is preferable. In particular, if the substrate is formed of an inorganic material, the difference in refractive index between the substrate and the concavo-convex structure layer is small, and it is also preferable to prevent unintentional refraction and reflection in the optical substrate. In order to improve the adhesion on the substrate, a surface treatment, an easy-adhesion layer, or the like may be performed, and a gas barrier layer or the like may be provided for the purpose of preventing the intrusion of moisture, oxygen, or the like. Further, the substrate may be formed with an optical functional layer having various optical functions such as condensing and light diffusion on the surface opposite to the surface on which the uneven structure layer is formed. As a coating method of the sol-gel material, a rod coating method, a spin coating method, a spray coating method, a dip coating method, a die-coat method, an inkjet coating method, or the like can be used. Any coating method, but it is preferably a rod coating method from the viewpoint that the sol-gel material can be uniformly applied to a substrate having a large area and the coating is quickly finished before the sol-gel material gels. Mold coating method and spin coating method. In addition, since the embossed material pattern is formed in the subsequent step by using the sol-gel material layer, the surface of the substrate (including the surface treatment and the easy-to-adhere layer, etc.) may be flat, and the substrate itself is not Has the desired relief pattern. The film thickness of the applied sol-gel material may be, for example, 100 to 500 nm.

It is also possible to apply a coating film after the application of the sol-gel material (hereinafter also referred to as The solvent in the "sol gel material layer" is evaporated, and the substrate is kept in the atmosphere or under reduced pressure. If the holding time is short, the viscosity of the coating film becomes too low, and the concave-convex pattern cannot be transferred in the subsequent pressing step. If the holding time is too long, the polymerization reaction of the precursor progresses, and the coating film sticks. The degree becomes too high, and the uneven pattern cannot be transferred in the pressing step. Further, after the sol-gel material is applied, the polymerization of the precursor is carried out as the solvent evaporates, and the physical properties such as the viscosity of the sol-gel material also change in a short time. From the viewpoint of formation stability of the concavo-convex pattern, it is preferred that the pattern transfer can be performed well in a wide range of drying time, which can be dried by temperature (holding temperature), drying pressure, sol-gel material type, sol-gel The mixing ratio of the material species, the amount of the solvent used in the preparation of the sol-gel material (the concentration of the sol-gel material), and the like are adjusted.

Next, the film member manufactured by the above method and manufacturing apparatus is used as an uneven pattern The film-shaped mold for transfer is used, and the uneven pattern of the film-shaped mold is transferred to the sol-gel material layer, whereby the uneven structure layer is formed. At this time, the mold may be pressed against the sol-gel material layer using a pressing roller. In the roll process using the pressing roller, since the contact time between the die and the coating film is shorter than that of the PRESS type, it is possible to prevent the pattern from being distorted due to the difference in thermal expansion coefficient between the die or the substrate and the stage on which the substrate is mounted. Preventing bubbles or residual gas marks from being generated in the pattern due to the boiling of the solvent in the sol-gel material solution, and being in contact with the substrate (coating film), so that the transfer pressure and the peeling force are small, and it is easy to correspond to a large area. There is no advantage such as air bubble biting when pressed. Further, the substrate can be heated while pressing the mold. As an example in which the mold is pressed against the sol-gel material layer by using a pressing roller, as shown in FIG. 24, the film-shaped mold 80a can be fed between the pressing roller 122 and the substrate 10 which is conveyed to the lower side thereof, whereby The concave-convex pattern of the film-like mold 80a is transferred to the sol-gel material layer 12 on the substrate 10. In other words, when the film-shaped mold 80a is pressed against the sol-gel material layer 12 by the pressing roller 122, the film-like mold 80a and the substrate 10 are simultaneously conveyed, and the film-like mold 80a is coated on the sol-gel material on the substrate 10. Layer 12 surface. At this time, the pressing roller 122 is pressed against the back surface of the film-shaped mold 80a (the surface on the opposite side to the surface on which the uneven pattern is formed), and the film-shaped mold 80a is rotated. The substrate 10 is adhered to the side while traveling. Further, in order to feed the strip-shaped film-shaped mold 80a to the pressing roller 122, it is convenient to directly feed the film-shaped mold 80a from the film roll on which the strip-shaped film-shaped mold 80a is wound.

After pressing the mold on the sol-gel material layer, the sol-gel material layer may also be pre-forged. burn. The gelation of the sol-gel material layer progresses by pre-calcining to cure the pattern, and it is difficult to collapse at the time of peeling. In the case of pre-calcining, it is preferred to heat at a temperature of 40 to 150 ° C in the atmosphere. In addition, pre-calcining does not have to be carried out.

After pressing the mold or calcining the layer of sol-gel material, from the layer of sol-gel material Stripping the mold. A known peeling method can be employed as the die peeling method. The mold can be peeled off while heating, thereby releasing the gas generated from the sol-gel material layer, and generation of bubbles in the sol-gel material layer can be prevented. When the roll process is used, the peeling force can be made smaller than that of the plate-shaped mold used in the press type, and the mold can be easily peeled off from the sol-gel material layer without leaving the sol-gel material layer in the mold. In particular, since the reaction is performed while heating the sol-gel material layer, the reaction is easily performed, and the mold can be easily peeled off from the sol-gel material layer immediately after pressing. Further, in order to improve the mold release property, a peeling roll may also be used. As shown in Fig. 24, the peeling roller 123 is provided on the downstream side of the pressing roller 122, and the film-shaped mold 80a is rotatably supported by the peeling roller 123 while being pressed against the sol-gel material layer 12, whereby the film-shaped mold 80a can be driven. The state of adhering to the sol-gel material layer (coating film) 12 maintains the distance (fixed time) between the pressing roller 122 and the peeling roller 123. Then, the film-shaped mold 80a is pulled up from the peeling roller 123 on the downstream side of the peeling roller 123, and the traveling path of the film-shaped mold 80a is changed, whereby the film-shaped mold 80a is pulled from the sol-gel material layer 12 on which the unevenness is formed. from. Further, the aforementioned sol-gel may be performed while the film-like mold 80a is attached to the sol-gel material layer 12. The material layer 12 is pre-calcined or heated. Further, when the peeling roller 123 is used, it can be peeled off by, for example, heating to 40 to 150 ° C, whereby the peeling of the mold 80a can be facilitated.

It is also possible to harden the sol-gel material layer after peeling the mold from the sol-gel material layer. The uneven structure layer is thus formed. In the present embodiment, the sol-gel material layer can be cured by formal calcination. The sol-gel material layer is made stronger by detaching the hydroxyl group or the like contained in the cerium oxide (amorphous cerium oxide) constituting the sol-gel material layer (coating film) by the formal calcination. The formal calcination is preferably carried out at a temperature of 200 to 1200 ° C for about 5 minutes to 6 hours. By hardening the sol-gel material layer in this manner, it is possible to obtain a substrate having a concave-convex pattern corresponding to the concave-convex pattern of the mold, that is, a substrate obtained by directly forming a concave-convex structure layer made of a sol-gel material on a flat substrate. In this case, when the concavo-convex structure layer is ceria, it is amorphous or crystalline depending on the calcination temperature and the calcination time, or a mixed state of amorphous and crystalline. In addition, when a material which generates oxygen or an alkali by irradiation of light such as ultraviolet rays is added, when the uneven pattern is transferred, the uneven structure layer may be irradiated with an energy ray such as ultraviolet light or excimer UV to form a concave-convex structure. Layer hardening.

Further, the surface of the uneven structure layer may be subjected to a hydrophobizing treatment. Hydrophobic treatment The method may be a known method, for example, when the surface of the cerium oxide is used, it may be hydrophobized using dimethyldichlorosilane or trimethyl alkoxy decane, or hexamethyldifluoride may be used. A method of hydrophobizing a trimethylsulfonium alkylating agent such as a nitroxane or an oxime oil may also be a surface treatment method using a metal oxide powder of supercritical carbon dioxide. When the surface of the uneven structure layer is made hydrophobic, when the uneven pattern substrate manufactured by the manufacturing method of the embodiment is used for the production of an element such as an organic EL element, water can be easily removed from the substrate during the process. Defects such as dark spots or deterioration of components in the organic EL element are prevented.

Further, in the above embodiment, a sol-gel material is used as the uneven structure layer. The material may be a curable resin material in addition to the above inorganic materials. As the curable resin, a resin such as photocuring, heat curing, moisture curing, or chemical curing (two-liquid mixing) can be used. Specific examples thereof include epoxy, acrylic, methacrylic, vinyl ether, oxetane, urethane, melamine, urea, polyester, and phenol. Various resins such as a cross-linking liquid crystal system, a fluorine-based, an anthrone-based or a polyamide-based monomer, an oligomer, and a polymer. Further, a gas barrier layer or the like may be provided on the surface of the uneven structure layer for the purpose of preventing intrusion of gas such as moisture or oxygen.

When the curable resin is used to form the concavo-convex structure layer, for example, after the curable resin is applied to the substrate, the coating film can be cured while pressing the mold having the fine concavo-convex pattern on the curable resin layer after coating. The concave-convex pattern of the mold can be transferred to the curable resin layer. The curable resin can also be applied after being diluted with an organic solvent. As the organic solvent used in such a case, those who have dissolved the resin before hardening can be used. For example, it can be selected from known alcoholic solvents such as methanol, ethanol, and isopropyl alcohol (IPA), and ketone solvents such as acetone, methyl ethyl ketone, and methyl isobutyl ketone (MIBK). As a method of applying the curable resin, for example, a spin coating method, a spray coating method, a dip coating method, a dropping method, a gravure printing method, a screen printing method, a relief printing method, or a die coating method can be employed (die- Various coating methods such as coat), curtain flow coating, inkjet coating, and sputtering. The conditions for curing the curable resin vary depending on the type of the resin to be used. For example, the curing temperature is preferably in the range of room temperature to 250 ° C, and the curing time is 0.5 minutes to 3 hours. Further, it may be cured by irradiation with an energy ray such as an ultraviolet ray or an electron ray. In this case, the irradiation amount is preferably 10 mJ/cm ² to 5 J/cm ² .

Further, a decane coupling agent may be used as the material of the uneven structure layer. When the organic EL device is manufactured using the substrate having the uneven pattern (concave-convex structure) of the embodiment, the adhesion between the uneven structure layer and the electrode formed thereon can be improved, and the organic EL can be improved. The durability of the cleaning step or the high temperature processing step in the process of the component is improved. The decane coupling agent used for the concavo-convex structure layer is not particularly limited, but may be, for example, RSiX ₃ (R is selected from the group consisting of a vinyl group, a glycidoxy group, an acryl group, a methacryl group, and an amino group). An organic compound represented by at least one of an organic functional group of a mercapto group, X being a halogen element or an alkoxy group. As a method of applying the decane coupling agent, for example, a spin coating method, a spray coating method, a dip coating method, a dropping method, a gravure printing method, a screen printing method, a letterpress printing method, a die coating method, or a curtain can be employed. Various coating methods such as a flow coating method, an inkjet coating method, and a sputtering method. Thereafter, a film which is dried and hardened according to each material under appropriate conditions can be obtained. For example, it can be dried by heating at 100 to 150 ° C for 15 to 90 minutes.

The material of the concavo-convex structure layer may also be made of an inorganic material or a curable resin material. There are ultraviolet absorbing materials. The ultraviolet absorbing material has an effect of suppressing film deterioration by absorbing ultraviolet rays to convert light energy into a harmless form such as heat. As the ultraviolet absorber, a conventionally known material such as a benzotriazole-based absorbent, a triazine-based absorbent, a salicylic acid derivative-based absorbent, a benzophenone-based absorbent, or the like can be used.

Although the embodiment of the present invention has been described above, the coating apparatus and the coating method of the present invention, the apparatus and method for producing a film member having a concave-convex pattern, and the substrate having the uneven pattern using the film member manufactured thereby The manufacturing method is not limited to the above embodiment, and can be appropriately changed within the scope of the technical idea described in the claims. Moreover, the coating apparatus and the film member manufacturing apparatus of the present invention are not limited to the configuration of the above embodiment, and the conveying roller The configuration of various elements may also be different from the configuration shown in the drawings of the present application.

For example, in the coating apparatus of the present invention, when the liquid holding region and the liquid non-retaining region are formed on the outer circumferential surface of the coating roller, the liquid non-retaining region may have a flat surface or may be liquid-repellent processed. The liquid non-retaining area may also be a recess with respect to the liquid holding area. Further, the film formed by the coating device of the present invention may be a film having a plurality of regions separated from each other in the longitudinal direction and the width direction of the film substrate.

Further, in the coating apparatus of the present invention, the non-coated region forming means includes the pattern mask providing portion and the pattern mask peeling portion, and further includes a coating on the film substrate to form a continuous coating direction in the film substrate. When there is no coating region forming mechanism in the conveying direction of the region, the conveying direction has no coating region forming mechanism, and may include a belt-shaped mask providing portion located on the upstream side of the coating roller in the conveying direction of the film substrate. a strip-shaped mask that is provided in a strip shape along the transport direction of the film substrate on the coating film forming surface of the film substrate, and a strip-shaped mask peeling portion that is located above the coating roller The strip mask is peeled off from the film substrate at the downstream side in the transport direction of the substrate. Alternatively, the transfer direction non-coating region forming means may include a liquid-repellent material coating portion located on the upstream side of the coating roller in the transport direction of the film substrate, and applying a liquid-repellent material to the foregoing The coating film forming surface of the film substrate. Alternatively, the application roller may include the transfer direction non-application region forming mechanism, and the transfer direction non-application region forming mechanism may be formed on the outer circumferential surface of the application roller and continuous in the circumferential direction of the application roller. Two or more liquid holding regions and a liquid non-retaining region formed between the liquid holding regions on the outer peripheral surface of the coating roller, and the conveying direction non-coating region forming mechanism is included in the coating The direction of the rotation axis of the roller is divided into each other At least two or more coating liquid supply chambers are disposed.

In the coating step of the method for producing a film member of the present invention, the coating portion may be formed by using a coating roll having an uneven surface forming material on the outer peripheral surface. Further, in the coating step of the method for producing a film member of the present invention, the tension of the film substrate can be kept constant while the film substrate is being conveyed. Furthermore, the method for producing a film member of the present invention may further comprise the steps of preparing a transfer roller, wherein the transfer roller has a concave-convex pattern and a thin plate-shaped mold is wound around the base roller and the ends of the thin-plate-shaped mold are in a matrix The outer surfaces of the rolls are joined together. In the step of preparing the transfer roller, the thin plate-shaped mold may be a metal mold, and a metal mold may be produced by electroforming. Alternatively, in the step of preparing the transfer roller, the thin plate-shaped mold may be a film-shaped resin mold. Further, the joint portion of the thin plate mold may be filled with a resin. Further, the thin plate-shaped mold may have two or more stencils, and in the transfer roller, the end portions of the stencil are attached to each other on the outer peripheral surface of the base roller.

The apparatus for manufacturing a film member of the present invention may further include a tension control unit that maintains the tension of the film substrate while the film substrate is being conveyed. Further, a moving mechanism for moving the film substrate to the uneven material may be provided, and the film substrate may be brought into contact with the uneven material or the film substrate may be separated from the uneven material by the moving mechanism.

Further, a substrate having a concavo-convex pattern can be produced by using a film member produced by the method for producing a film member of the present invention, and the method for producing the substrate having the concavo-convex pattern can include an operation of forming a sol-gel material layer on the substrate, And a film member produced by the method for producing a film member of the present invention is used as a mold having a concave-convex pattern to transfer the uneven pattern of the mold to the sol-gel material layer.

The coating device of the present invention and the film member having the concave-convex pattern can be used for various Applications such as optical films or polarizing elements for producing organic EL elements, optical filters, microlens arrays, iridium arrays, optical waveguides, LEDs, flat panel displays, diffraction gratings, or lenticular images Optical components and optical components such as parts and lenses, solar cells, anti-reflection films, semiconductor wafers, pattern media, data storage, electronic paper, LSI, etc., anti-fog substrates, water-repellent substrates, hydrophilic substrates, paper making, food manufacturing Components used in applications such as DNA separation wafers, immunoassay wafers, cell culture papers, and nano-biomass, and their manufacture. In addition, it can also be used in various electronic components, especially semiconductor integrated circuits, flat panel displays, micro electro mechanical systems (MEMS), sensor components, optical discs, high-density memory discs and other magnetic recording media, nano. Components, optical components, thin film transistors for liquid crystal displays, organic transistors, color filters, barcode layers, pillars, ribs for liquid crystal alignment, microlens arrays, microreactors, photonic liquid crystals, and the like.

[Industrial availability]

In the coating apparatus of the present invention, a coating film having a discontinuous pattern can be formed on a substrate in a simpler manner. Further, by using the apparatus for manufacturing a film member of the coating apparatus of the present invention, it is possible to manufacture a film member having a concave-convex pattern forming region of a desired pattern on a substrate. Moreover, the method and apparatus for producing a film member having a concave-convex pattern forming region of a desired pattern of the present invention are formed by forming an uneven portion forming material on a portion of the film substrate opposite to the seam portion of the transfer roller. In the method of the working portion, the unevenness forming material is intermittently applied to the film substrate, whereby the transfer failure and the peeling failure due to the unevenness of the transfer portion and the like can be reduced, and the film member can be efficiently manufactured in the roll process. . A substrate having a concave-convex pattern such as an optical substrate produced by using the produced film member as a flexible mold is excellent in heat resistance, weather resistance, and corrosion resistance, and the optical is assembled. The process of the components of the substrate is also resistant, and the lifetime of the components can be made longer. Therefore, such a substrate can be suitably used for various applications such as an organic EL element or a solar cell.

11‧‧‧Striped mask

13‧‧‧Striped mask delivery roller

15‧‧‧Striped roll reel

17‧‧‧Finishing roller

18‧‧‧Support roller

19‧‧‧ peeling roll

20‧‧‧Support roller

40‧‧‧Application roller

40a‧‧‧Liquid holding area

42‧‧‧Acoustic roller

78‧‧‧Transport roller

80‧‧‧film substrate

82‧‧‧ Coating liquid supply member

84‧‧·coating film

120a‧‧‧film transport department

140a‧‧‧ Coating device

270‧‧‧Band masking department

290‧‧‧Band mask stripping

Claims (26)

A coating device for forming a film on a coating film forming surface of a belt-shaped film substrate, comprising: a coating roller that adheres and rotates a coating film material on an outer peripheral surface; and a coating liquid supply member that supplies the coating roller The film coating material; the film substrate conveying portion is continuously conveyed while the coating film forming surface of the film substrate is in contact with the coating roller; and the coating region forming mechanism is formed on the film substrate A continuous uncoated region at least in one direction. The coating device of claim 1, wherein the non-coated region forming mechanism comprises: an actuating roller, wherein the film substrate is displaced from a position separated from the coating roller at a position contacting the coating roller In a manner, the film is pressed and moved toward the film substrate, and is disposed apart from the coating roller on the upstream side or the downstream side in the conveying direction of the film substrate; and a coating region forming mechanism is not formed in the conveying direction, and is formed continuously from the film substrate. The uncoated area of the material transport direction. The coating apparatus according to the second aspect of the invention, wherein the conveying direction non-application area forming means includes: a belt-shaped mask providing portion located on an upstream side of the coating roller in a conveying direction of the film substrate; a strip-shaped mask which is provided in a strip shape along the transport direction of the film substrate on the coating film forming surface of the film substrate; and a strip-shaped mask peeling portion which is located on the film substrate from the coating roller The tape mask is peeled off from the film substrate at the downstream side in the conveyance direction. The coating device according to the second aspect of the invention, wherein the transfer direction non-application region forming mechanism includes: a liquid-repellent material coating portion located on the film substrate opposite to the application roller The liquid-repellent material is applied to the coating film forming surface of the film substrate in the upstream direction of the feeding direction. The coating device according to the second aspect of the invention, wherein the application roller includes the transfer direction non-application region forming mechanism, and the transfer direction non-application region forming mechanism includes the outer peripheral surface formed on the application roller Two or more liquid holding regions continuous in the circumferential direction of the application roller, and a liquid non-retaining region formed between the liquid holding regions on the outer circumferential surface of the coating roller. The coating apparatus according to claim 2, wherein the coating liquid supply member includes the conveying direction non-coating region forming mechanism, and the conveying direction non-coating region forming mechanism is included in a rotation axis direction of the coating roller Separating at least two of the coating liquid supply chambers. The coating device according to the second aspect of the invention, wherein the actuating roller is provided apart from the coating roller on a downstream side in a conveying direction of the film substrate. The coating device according to claim 2, further comprising a tension control unit for maintaining the tension of the film substrate constant during the conveyance of the film substrate. The coating device according to claim 1, wherein the non-coated region forming mechanism includes blowing a gas toward the coating film forming surface of the film substrate to make the film substrate non-contact with the coating roller. Air knife. The coating device according to claim 9, wherein the non-coated region forming mechanism further comprises a suction roller, the suction roller is disposed opposite to the air knife, and the film substrate is non-contact with the coating roller The film substrate is attracted and held. The coating apparatus of claim 10, wherein the suction roller has a mechanism for discharging a gas. The coating apparatus according to claim 10, wherein the non-coated region forming mechanism further comprises another air knife that blows gas toward the back surface of the coating film forming surface of the film substrate. The coating device according to claim 9, wherein the non-coated region forming mechanism further comprises a coating direction on the film substrate that forms a non-coated region continuous in a conveying direction of the film substrate, and is not coated. Regional formation agency. The coating apparatus according to claim 13, wherein the conveying direction non-application area forming means includes a belt-shaped mask providing portion located on an upstream side of the coating roller in a conveying direction of the film substrate, a strip-shaped mask which is provided in a strip shape along the transport direction of the film substrate on the coating film forming surface of the film substrate; and a strip-shaped mask peeling portion which is located on the film substrate from the coating roller The tape mask is peeled off from the film substrate at the downstream side in the conveyance direction. The coating apparatus according to claim 13, wherein the conveying direction non-application area forming means includes: a liquid-repellent material coating portion located at an upstream side of the coating roller in a conveying direction of the film substrate; A liquid repellency material is applied to the coating film forming surface of the film substrate. The coating device according to claim 13, wherein the application roller includes the transfer direction non-application region forming mechanism, and the transfer direction non-coated region forming mechanism includes the outer peripheral surface formed on the application roller. Two or more liquid holding regions which are continuous in the circumferential direction of the coating roller, and The outer circumferential surface of the application roller is formed in a liquid non-holding region between the liquid holding regions. The coating apparatus according to claim 13, wherein the coating liquid supply member includes the conveying direction non-coating region forming mechanism, and the conveying direction non-application region forming mechanism is included in a rotation axis direction of the coating roller Separating at least two of the coating liquid supply chambers. The coating device according to the first aspect of the invention, wherein the non-coated region forming mechanism includes: a pattern mask providing portion located at an upstream side of the coating roller in a conveying direction of the film substrate; a pattern mask is formed on the coating film forming surface of the substrate; and the pattern mask peeling portion is located on the downstream side of the coating roller in the conveying direction of the film substrate, and the pattern mask is peeled off from the film substrate . The coating device of claim 18, wherein the pattern mask has a pattern that is divided in a conveying direction of the pattern mask. The coating device according to claim 19, wherein the pattern mask has a pattern continuous in a conveying direction of the pattern mask. The coating device of claim 18, wherein the non-coated region forming mechanism further comprises a coating direction on the film substrate that forms a non-coated region continuous in a conveying direction of the film substrate, and is not coated. Regional formation agency. A manufacturing apparatus for a strip-shaped film member having a concave-convex pattern, comprising: a coating portion that applies a concave-convex forming material to form a film on a belt-shaped film substrate; and a transfer portion having a transfer roller having a concave-convex pattern, The concave-convex pattern is transferred to the aforementioned film; The conveying unit continuously conveys the film substrate from the coating unit to the transfer unit, and the coating unit has the coating device according to any one of claims 1 to 21. The apparatus for manufacturing a film member according to claim 22, further comprising: a detecting unit that detects a rotation state of the transfer roller; and a control unit that controls the coating unit; the transfer roller has the concave-convex pattern The thin plate-shaped mold is wound around the base roller, and the end portions of the thin plate-shaped mold are connected to each other on the outer peripheral surface of the base roller; the control unit is controlled based on the rotation state detected by the detecting unit. In the coating portion, in a state in which the uncoated portion of the film substrate on which the uneven portion forming material is not applied is opposed to the seam portion of the thin plate-shaped mold of the transfer roller in the transfer portion, The film on the film substrate is laminated on the transfer roller. A method of forming a coating film on a film substrate by using the coating device according to any one of claims 1 to 21, which comprises an operation of forming a non-coated region on the film substrate. A method for producing a strip-shaped film member having a concavo-convex pattern, comprising: a coating step of applying a concavo-convex forming material to a film substrate while conveying a strip-shaped film substrate to form a film; and transferring the same while carrying out the transfer step The film substrate transfers the uneven pattern of the transfer roller to the film; in the coating step, the film substrate is brought into contact with the uneven forming material to form the uneven portion formed on the film substrate. The coating portion of the material separates the film substrate from the unevenness forming material to form an uncoated portion to which the uneven forming material is not applied, thereby intermittently applying the uneven forming material; In the transfer step, the transfer roller is a transfer roller in which a thin plate-shaped mold having the concave-convex pattern is wound around a base roller, and end portions of the thin plate-shaped mold are coupled to each other on the outer circumferential surface of the base roller, The film uncoated portion of the film substrate is opposed to the seam portion of the thin plate-shaped mold of the transfer roller, and the film on the film substrate is superposed on the transfer roller. The method of manufacturing a film member according to claim 25, further comprising a detecting step of detecting a rotation state of the transfer roller; controlling the rotation state detected by the detecting step to control the aforesaid coating step The time at which the above-mentioned unevenness forming material is applied to the film substrate.