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TW201432370A - Phase shift mask and method for manufacturing the same - Google Patents

Phase shift mask and method for manufacturing the same

Info

Publication number
TW201432370A
TW201432370A TW102148235A TW102148235A TW201432370A TW 201432370 A TW201432370 A TW 201432370A TW 102148235 A TW102148235 A TW 102148235A TW 102148235 A TW102148235 A TW 102148235A TW 201432370 A TW201432370 A TW 201432370A
Authority
TW
Taiwan
Prior art keywords
phase shift
manufacturing
same
shift mask
covered
Prior art date
Application number
TW102148235A
Other languages
Chinese (zh)
Other versions
TWI592739B (en
Inventor
Kagehiro Kageyama
Satoru Mochizuki
Daisuke Nakamura
Original Assignee
Ulvac Coating Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Coating Corp filed Critical Ulvac Coating Corp
Publication of TW201432370A publication Critical patent/TW201432370A/en
Application granted granted Critical
Publication of TWI592739B publication Critical patent/TWI592739B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/29—Rim PSM or outrigger PSM; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)

Abstract

A method for manufacturing a phase shift mask includes a process of forming a second mask (RP2) having a predetermined opening pattern by which a shading layer (13) exposed to a surface and a pattern opening is covered and an etching stopper layer (12) and a phase shift layer (11), which are exposed to the pattern opening, are not covered in a shading region but covered in a phase shift region.
TW102148235A 2012-12-27 2013-12-25 Phase shift mask and method for manufacturing the same TWI592739B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012285846 2012-12-27

Publications (2)

Publication Number Publication Date
TW201432370A true TW201432370A (en) 2014-08-16
TWI592739B TWI592739B (en) 2017-07-21

Family

ID=51020962

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102148235A TWI592739B (en) 2012-12-27 2013-12-25 Phase shift mask and method for manufacturing the same

Country Status (5)

Country Link
JP (1) JP5865520B2 (en)
KR (1) KR101785177B1 (en)
CN (1) CN104718496B (en)
TW (1) TWI592739B (en)
WO (1) WO2014103875A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI622849B (en) * 2015-02-23 2018-05-01 Ｈｏｙａ股份有限公司 Photomask, photomask set, method of manufacturing a photomask and method of manufacturing a display device

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5089841B2 (en) * 1999-06-29 2012-12-05 スリーエム イノベイティブ プロパティズ カンパニー Optical system for projection display
JP6456748B2 (en) * 2015-03-28 2019-01-23 Hoya株式会社 Photomask manufacturing method, photomask and flat panel display manufacturing method
KR102126110B1 (en) * 2016-01-27 2020-06-24 주식회사 엘지화학 Film mask, preparing method thereof, pattern forming method using the same and pattern formed by using the same
JP6756796B2 (en) * 2018-10-09 2020-09-16 アルバック成膜株式会社 Mask blanks, halftone masks, manufacturing method

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0450942A (en) * 1990-06-15 1992-02-19 Fujitsu Ltd Reticle and its manufacturing method
JP3209257B2 (en) * 1995-04-21 2001-09-17 凸版印刷株式会社 Phase shift mask and method of manufacturing the same
JPH08334885A (en) * 1995-06-02 1996-12-17 Toppan Printing Co Ltd Halftone type phase shift mask and its production
JP3244107B2 (en) * 1995-06-02 2002-01-07 凸版印刷株式会社 Halftone phase shift mask and method of manufacturing the same
KR100429860B1 (en) * 1997-05-27 2004-06-16 삼성전자주식회사 Alternating Phase Inversion Mask and Manufacturing Method Thereof
US7029803B2 (en) * 2003-09-05 2006-04-18 Schott Ag Attenuating phase shift mask blank and photomask
JP2005208660A (en) * 2004-01-22 2005-08-04 Schott Ag Phase shift type mask blank of super-high transmission ratio
JP2005257962A (en) * 2004-03-11 2005-09-22 Semiconductor Leading Edge Technologies Inc Phase shift mask and method for manufacturing phase shift mask
JP4693451B2 (en) * 2005-03-22 2011-06-01 Ｈｏｙａ株式会社 Method for manufacturing gray tone mask and method for manufacturing thin film transistor substrate
JP4490980B2 (en) * 2007-02-16 2010-06-30 クリーンサアフェイス技術株式会社 Halftone blanks
WO2009057660A1 (en) * 2007-11-01 2009-05-07 Ulvac Coating Corporation Half-tone mask, half-tone mask blank and method for manufacturing half-tone mask

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI622849B (en) * 2015-02-23 2018-05-01 Ｈｏｙａ股份有限公司 Photomask, photomask set, method of manufacturing a photomask and method of manufacturing a display device

Also Published As

Publication number Publication date
WO2014103875A1 (en) 2014-07-03
KR20150063093A (en) 2015-06-08
CN104718496A (en) 2015-06-17
KR101785177B1 (en) 2017-11-06
JPWO2014103875A1 (en) 2017-01-12
TWI592739B (en) 2017-07-21
CN104718496B (en) 2019-06-28
JP5865520B2 (en) 2016-02-17

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