TW201341421A - Epoxy resin hardening accelerator - Google Patents
Epoxy resin hardening accelerator Download PDFInfo
- Publication number
- TW201341421A TW201341421A TW102108693A TW102108693A TW201341421A TW 201341421 A TW201341421 A TW 201341421A TW 102108693 A TW102108693 A TW 102108693A TW 102108693 A TW102108693 A TW 102108693A TW 201341421 A TW201341421 A TW 201341421A
- Authority
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- Taiwan
- Prior art keywords
- epoxy resin
- hardening accelerator
- group
- resin
- phenol
- Prior art date
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- 239000003822 epoxy resin Substances 0.000 title claims abstract description 46
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 46
- 239000005011 phenolic resin Substances 0.000 claims abstract description 31
- -1 phenoxide ion Chemical class 0.000 claims abstract description 17
- 239000000203 mixture Substances 0.000 claims abstract description 16
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 11
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 10
- 125000005496 phosphonium group Chemical group 0.000 claims abstract description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 7
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 7
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 7
- 150000001450 anions Chemical class 0.000 claims abstract description 4
- 229920005989 resin Polymers 0.000 claims description 34
- 239000011347 resin Substances 0.000 claims description 34
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 32
- 229920003986 novolac Polymers 0.000 claims description 28
- 125000004432 carbon atom Chemical group C* 0.000 claims description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 5
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 4
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 claims description 4
- 239000004848 polyfunctional curative Substances 0.000 claims description 4
- 229910052707 ruthenium Inorganic materials 0.000 claims description 4
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 claims description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 3
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 claims description 2
- 229930003836 cresol Natural products 0.000 claims description 2
- 229910052736 halogen Inorganic materials 0.000 claims description 2
- 125000005843 halogen group Chemical group 0.000 claims description 2
- 229910052738 indium Inorganic materials 0.000 claims description 2
- 229910001413 alkali metal ion Inorganic materials 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 abstract description 12
- 239000007788 liquid Substances 0.000 abstract description 8
- 238000002844 melting Methods 0.000 abstract description 5
- 230000008018 melting Effects 0.000 abstract description 5
- 238000007789 sealing Methods 0.000 abstract 1
- 150000003839 salts Chemical class 0.000 description 23
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 22
- DLQZLJMTDMZHHP-UHFFFAOYSA-N 2,2,2-triphenylethylhydrazine Chemical compound C1(=CC=CC=C1)C(CNN)(C1=CC=CC=C1)C1=CC=CC=C1 DLQZLJMTDMZHHP-UHFFFAOYSA-N 0.000 description 12
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 12
- 235000013824 polyphenols Nutrition 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 11
- XYFCBTPGUUZFHI-UHFFFAOYSA-N phosphine group Chemical group P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 10
- OIFBSDVPJOWBCH-UHFFFAOYSA-N Diethyl carbonate Chemical compound CCOC(=O)OCC OIFBSDVPJOWBCH-UHFFFAOYSA-N 0.000 description 8
- 239000003795 chemical substances by application Substances 0.000 description 8
- 235000012431 wafers Nutrition 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 239000003566 sealing material Substances 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 5
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 4
- 239000011256 inorganic filler Substances 0.000 description 4
- 229910003475 inorganic filler Inorganic materials 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 150000004714 phosphonium salts Chemical group 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 2
- 239000004305 biphenyl Substances 0.000 description 2
- 235000010290 biphenyl Nutrition 0.000 description 2
- 229910000420 cerium oxide Inorganic materials 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-M phenolate Chemical compound [O-]C1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-M 0.000 description 2
- USFPINLPPFWTJW-UHFFFAOYSA-N tetraphenylphosphonium Chemical compound C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 USFPINLPPFWTJW-UHFFFAOYSA-N 0.000 description 2
- CRSBERNSMYQZNG-UHFFFAOYSA-N 1-dodecene Chemical class CCCCCCCCCCC=C CRSBERNSMYQZNG-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- VEORPZCZECFIRK-UHFFFAOYSA-N 3,3',5,5'-tetrabromobisphenol A Chemical compound C=1C(Br)=C(O)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(O)C(Br)=C1 VEORPZCZECFIRK-UHFFFAOYSA-N 0.000 description 1
- 239000004114 Ammonium polyphosphate Substances 0.000 description 1
- OQDFXKFBTVHPKR-UHFFFAOYSA-N C1C2=CC=CC=C2C3=CC=CC(=C31)CC(C4=CC=CC=C4)(C5=CC=CC=C5)C6=CC=CC=C6 Chemical compound C1C2=CC=CC=C2C3=CC=CC(=C31)CC(C4=CC=CC=C4)(C5=CC=CC=C5)C6=CC=CC=C6 OQDFXKFBTVHPKR-UHFFFAOYSA-N 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical group [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical class [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 235000019826 ammonium polyphosphate Nutrition 0.000 description 1
- 229920001276 ammonium polyphosphate Polymers 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000004203 carnauba wax Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 230000006837 decompression Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- GELSOTNVVKOYAW-UHFFFAOYSA-N ethyl(triphenyl)phosphanium Chemical compound C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(CC)C1=CC=CC=C1 GELSOTNVVKOYAW-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 229910052751 metal Chemical class 0.000 description 1
- 239000002184 metal Chemical class 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- 239000004570 mortar (masonry) Substances 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical class CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Chemical class CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229940031826 phenolate Drugs 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-O phosphonium Chemical group [PH4+] XYFCBTPGUUZFHI-UHFFFAOYSA-O 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920001281 polyalkylene Polymers 0.000 description 1
- 150000008442 polyphenolic compounds Chemical group 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000008117 stearic acid Chemical class 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
- C08G59/681—Metal alcoholates, phenolates or carboxylates
- C08G59/683—Phenolates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
- C08G59/688—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used containing phosphorus
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Epoxy Resins (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
Description
本發明是有關於一種環氧樹脂硬化促進劑。更詳細而言,本發明是有關於一種適合於半導體等電子零件用的環氧樹脂系密封材的製造的包含四級鏻鹽的環氧樹脂硬化促進劑。 The present invention relates to an epoxy resin hardening accelerator. More specifically, the present invention relates to an epoxy resin hardening accelerator containing a quaternary phosphonium salt suitable for the production of an epoxy resin-based sealing material for electronic parts such as semiconductors.
自先前以來,酚醛清漆型環氧樹脂或聯苯型環氧樹脂就其硬化特性等方面而言,廣泛應用於半導體晶片其他各種電子零件等的用途。另外,使用三苯基膦(以下,簡稱為TPP(Triphenylphosphine))作為該些環氧樹脂的硬化促進劑。 Since the prior art, the novolac type epoxy resin or the biphenyl type epoxy resin has been widely used for various other electronic parts such as semiconductor wafers in terms of hardening characteristics and the like. Further, triphenylphosphine (hereinafter abbreviated as TPP (Triphenylphosphine)) is used as a curing accelerator for these epoxy resins.
使用TPP作為硬化促進劑的環氧樹脂的硬化因硬化時的初始硬度低、於半導體晶片的製造中難以自模具中脫模,故存在使半導體晶片生產線的迅速的流動變得困難等問題。作為該問題的改良方法,提出有四苯基鏻的四苯基硼酸鹽(以下,簡稱為TPP-K(Tetraphenylphosphonium tetraphenylborate))(參照專利文獻1)、TPP的烷基四級化鏻與多酚的鹽(參照專利文獻2)、TPP的烷基四級化鏻與酚樹脂的鹽(參照專利文獻3及專利文獻4)。但是,若使用該些硬化促進劑,則環氧樹脂的硬化時的初始硬度 變得比使用TPP時高,因此變得容易脫模,但當用於為了提昇耐熱性而高濃度地調配二氧化矽等無機填充材的密封材(因此,樹脂成分的比例降低)時,硬度依然不足,脫模性的改良並不充分。 The curing of the epoxy resin using TPP as the curing accelerator is low in initial hardness at the time of curing, and it is difficult to release the mold from the mold during the production of the semiconductor wafer, so that there is a problem that the rapid flow of the semiconductor wafer production line becomes difficult. As a method for improving the problem, tetraphenylborate of tetraphenylphosphonium (hereinafter abbreviated as TTP-K (Tetraphenylphosphonium tetraphenylborate)) (refer to Patent Document 1), alkyl quaternary phosphonium and polyphenol of TPP have been proposed. Salt (see Patent Document 2), a salt of an alkyl quaternized hydrazine of TPP and a phenol resin (see Patent Document 3 and Patent Document 4). However, if these hardening accelerators are used, the initial hardness of the epoxy resin during hardening Though it is higher than when TPP is used, it is easy to release the mold, but when it is used for a sealing material in which an inorganic filler such as cerium oxide is added in a high concentration in order to improve heat resistance (thus, the ratio of the resin component is lowered), the hardness Still not enough, the improvement of mold release is not sufficient.
而且,TPP-K因觸媒活性低,故若僅調配至環氧樹脂及 硬化劑中,則硬化未充分地進行,必須事先調配至酚樹脂中並進行加熱來將四苯基硼酸鹽轉換成酚樹脂鹽,此時存在微量地生成具有毒性的苯這一問題。另外,TPP的烷基四級化鏻的多酚的鹽的熔點為150℃以上,難以與環氧樹脂混合,會引起混合不良並形成濃度不均,而成為硬化不良的原因。另外,於高濃度地調配無機填充材的密封材組成中,當將TPP的烷基四級化鏻的酚樹脂鹽用作硬化促進劑時,使環氧樹脂、硬化劑及硬化促進劑的混合物加熱熔融而成的調配液的黏度變高,因此成為所謂的液體流動性不良的原因,上述液體流動性不良是指於模具填充時衝垮半導體晶片的配線,或於調配物遍布各個角落之前黏度上昇,形成未填充部分。 Moreover, TPP-K has low activity due to the catalyst, so it is only formulated to epoxy resin and In the hardener, the hardening is not sufficiently performed, and it is necessary to previously prepare the phenol resin and heat it to convert the tetraphenylborate into a phenol resin salt. At this time, there is a problem that a toxic benzene is slightly generated. Further, the polyalkylene salt of the alkyl quaternized hydrazine of TPP has a melting point of 150 ° C or more, and it is difficult to mix with an epoxy resin, which causes a poor mixing and causes uneven density, which causes a hardening failure. Further, in the sealing material composition in which the inorganic filler is blended at a high concentration, when a phenol resin salt of an alkyl quaternized hydrazine of TPP is used as a hardening accelerator, a mixture of an epoxy resin, a hardener, and a hardening accelerator is used. Since the viscosity of the preparation liquid heated and melted becomes high, it is a cause of the so-called liquid fluidity defect, and the liquid fluidity defect means the wiring of the semiconductor wafer at the time of mold filling, or the viscosity before the preparation is spread over every corner. Rise to form an unfilled portion.
[專利文獻] [Patent Literature]
[專利文獻1]日本專利特開昭48-800號公報 [Patent Document 1] Japanese Patent Laid-Open No. 48-800
[專利文獻2]日本專利特開昭55-157594號公報 [Patent Document 2] Japanese Patent Laid-Open No. 55-157594
[專利文獻3]日本專利特開2004-256643號公報 [Patent Document 3] Japanese Patent Laid-Open Publication No. 2004-256643
[專利文獻4]日本專利特開2005-162944號公報 [Patent Document 4] Japanese Patent Laid-Open Publication No. 2005-162944
於上述背景下,本發明的目的在於提供一種硬化環氧樹脂用的硬化促進劑,其可降低使包含環氧樹脂、硬化劑及硬化促進劑的混合物加熱熔融而成的調配液的黏度來提高液體流動性,另一方面,可提高硬化時的初始硬度來改善脫模性。 In view of the above, an object of the present invention is to provide a curing accelerator for curing an epoxy resin, which can improve the viscosity of a preparation liquid obtained by heating and melting a mixture containing an epoxy resin, a curing agent, and a curing accelerator. Liquid fluidity, on the other hand, can improve the initial hardness at the time of hardening to improve the mold release property.
本發明者等人為了解決上述問題而努力研究的結果,發現可解決上述課題的硬化促進劑,從而完成了本發明。即,本發明是一種環氧樹脂硬化促進劑,其包括由通式(1)所表示的四級鏻(A)、及提供作為與上述四級鏻(A)對應的陰離子的苯氧離子(phenoxide ion)的酚樹脂(B)而形成。 In order to solve the above problems, the inventors of the present invention have found that a curing accelerator capable of solving the above problems has been found, and the present invention has been completed. That is, the present invention is an epoxy resin hardening accelerator comprising a quaternary phosphonium (A) represented by the general formula (1) and a phenoxy ion provided as an anion corresponding to the above-described fourth-order ruthenium (A) ( Phenoxide ion) formed by the phenol resin (B).
[式中,R1~R5分別獨立地表示氫原子、碳數為1~4的直鏈或分支的烷基、或碳數為1~4的烷氧基] In the formula, R1 to R5 each independently represent a hydrogen atom, a linear or branched alkyl group having 1 to 4 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms.
根據本發明,可獲得具備如下的理想的特性的環氧樹脂硬化促進劑:將調配環氧樹脂、硬化劑及硬化促進劑並進行加熱熔融而成的調配液抑制成低黏度,另一方面,帶來迅速的硬化而對硬化時的環氧樹脂賦予高初始硬度。使用上述環氧樹脂硬化促 進劑的半導體密封材組成物因填充至半導體晶片的成型模具中時的液體流動性優異,故可避免填充時過度的力作用於半導體的配線且容易使調配物遍布各個角落,而且,可使已硬化的半導體晶片迅速地自模具中脫模,另外,由於初始硬度高,因此亦可為了提昇耐熱性而高濃度地調配無機填充劑,故特別適合於半導體密封材用途。 According to the present invention, it is possible to obtain an epoxy resin hardening accelerator having the following characteristics: the formulation liquid obtained by heating and melting the epoxy resin, the curing agent, and the curing accelerator is suppressed to have a low viscosity. It brings rapid hardening and imparts high initial hardness to the epoxy resin during hardening. Hardening with the above epoxy resin Since the semiconductor sealing material composition of the agent is excellent in liquid fluidity when it is filled in a molding die of a semiconductor wafer, excessive force during filling can be prevented from acting on the wiring of the semiconductor, and the preparation can be easily spread over various corners, and The hardened semiconductor wafer is quickly released from the mold, and since the initial hardness is high, the inorganic filler can be blended at a high concentration in order to improve heat resistance, and therefore it is particularly suitable for use in a semiconductor sealing material.
以下,對本發明的實施形態進行詳細說明。 Hereinafter, embodiments of the present invention will be described in detail.
於由通式(1)所表示的四級鏻(A)中,R1~R5分別獨立地表示氫原子、碳數為1~4的直鏈或分支的烷基、或碳數為1~4的烷氧基。作為R1~R5,較佳為氫、甲基、甲氧基。 In the quaternary phosphonium (A) represented by the formula (1), R1 to R5 each independently represent a hydrogen atom, a linear or branched alkyl group having 1 to 4 carbon atoms, or a carbon number of 1 to 4; Alkoxy group. R1 to R5 are preferably hydrogen, methyl or methoxy.
由上述通式(1)所表示的四級鏻(A)的特徵在於具有乙基鍵結於陽離子側的磷元素上而成的特定的四級鏻陽離子結構,該特定的結構賦予作為促進劑的高硬化性能。作為由通式(1)所表示的四級鏻(A),較佳為三苯基乙基鏻、三(間甲基苯基)乙基鏻、三(鄰甲氧基苯基)乙基鏻,特佳為三苯基乙基鏻(通式(1)中,R1~R5均為氫原子)。 The quaternary ruthenium (A) represented by the above formula (1) is characterized by having a specific quaternary phosphonium cation structure in which an ethyl group is bonded to a phosphorus element on the cation side, and the specific structure is imparted as a promoter. High hardening performance. As the quaternary phosphonium (A) represented by the formula (1), triphenylethylphosphonium, tris(m-methylphenyl)ethylanthracene or tris(o-methoxyphenyl)ethyl group is preferred.鏻, particularly preferably triphenylethyl hydrazine (in the formula (1), R1 to R5 are each a hydrogen atom).
本發明的環氧樹脂硬化促進劑包括酚樹脂(B),該酚樹脂(B)提供苯氧離子作為與由通式(1)所表示的四級鏻(A)對 應的陰離子。 The epoxy resin hardening accelerator of the present invention comprises a phenol resin (B) which provides a phenoxy ion as a quaternary ruthenium (A) pair represented by the general formula (1) The anion should be.
作為酚樹脂(B),可列舉苯酚酚醛清漆樹脂、甲酚酚醛清漆樹脂及由通式(2)所表示的樹脂。 Examples of the phenol resin (B) include a phenol novolak resin, a cresol novolak resin, and a resin represented by the formula (2).
[式中,R6為氫原子或甲基;R7為碳數為1~4的直鏈或分支的烷基、碳數為1~4的烷氧基、羥基、或鹵素原子;Z為選自下述群組中的結構,m、n分別獨立為0~20的整數,且表示m+n=0~20的整數]
由通式(2)所表示的樹脂之中,較佳為R6為氫原子、R7為甲氧基或乙氧基、Z為-CH2-基的樹脂。 Among the resins represented by the formula (2), a resin wherein R6 is a hydrogen atom, R7 is a methoxy group or an ethoxy group, and Z is a -CH2- group is preferred.
藉由利用烷氧基(甲氧基或乙氧基)取代酚樹脂中的酚性羥基,促進劑本身的黏度下降,與環氧樹脂等的混煉時間縮短,可將調配時的環氧樹脂與硬化劑的反應抑制得低,結果成型時的初始流動性變佳。 By replacing the phenolic hydroxyl group in the phenol resin with an alkoxy group (methoxy or ethoxy group), the viscosity of the accelerator itself is lowered, and the mixing time with the epoxy resin or the like is shortened, and the epoxy resin can be blended. The reaction with the hardener is suppressed to be low, and as a result, the initial fluidity at the time of molding is improved.
因此,作為本發明的硬化促進劑的製造方法,例如可列舉下述的[I]~[III]的方法,就可使鹵素離子及鹼金屬分別變成5 ppm以下這一觀點而言,較佳為[I]或[II]的方法。 Therefore, as a method for producing the curing accelerator of the present invention, for example, the following methods [I] to [III] can be used, and it is preferable that the halogen ion and the alkali metal are each 5 ppm or less. Is the method of [I] or [II].
[I]於存在或不存在溶劑(例如,乙醇:使用量基於三級膦的重量為10 wt%(重量百分比)~1,000 wt%)的條件下,以40℃~200℃,較佳為80℃~170℃的反應溫度使作為四級鏻(A)的原料的三級膦與等當量以上(較佳為1.1當量~5.0當量)的碳酸二乙酯進行反應而形成四級鏻鹽,進而添加上述酚樹脂(B)(基於四級鏻的當量為1.0當量~1.5當量),於10℃~150℃下攪拌1小時而進行鹽交換。於常壓或減壓下,以80℃~150℃將過剩的碳酸二乙酯與溶劑分離而獲得目標的硬化促進劑。再者,以下減壓的單位MPa表示錶壓(gage pressure)。 [I] in the presence or absence of a solvent (for example, ethanol: used in an amount of 10 wt% (weight%) to 1,000 wt% based on the weight of the tertiary phosphine), preferably 40 ° C to 200 ° C, preferably 80 The reaction temperature of °C to 170 °C reacts a tertiary phosphine which is a raw material of the fourth-grade cerium (A) with an equivalent amount or more (preferably 1.1 equivalents to 5.0 equivalents) of diethyl carbonate to form a quaternary phosphonium salt, and further The above phenol resin (B) (equivalent to 1.0 equivalent to 1.5 equivalent based on the quaternary phosphonium) was added, and the mixture was stirred at 10 ° C to 150 ° C for 1 hour to carry out salt exchange. The excess diethyl carbonate is separated from the solvent at 80 ° C to 150 ° C under normal pressure or reduced pressure to obtain a target hardening accelerator. In addition, the unit MPa of the following decompression means the gage pressure.
[II]以與[I]的方法相同的使用量將作為(A)的原料的三級膦與碳酸二乙酯、及上述酚樹脂(B)混合,於存在或不存在溶劑的條件下,以40℃~200℃,較佳為80℃~170℃的反應溫度進行反應後,於常壓或減壓下,以80℃~150℃將過剩的碳酸二乙酯與溶劑分離而獲得目標的硬化促進劑。 [II] mixing a tertiary phosphine as a raw material of (A) with diethyl carbonate and the above phenol resin (B) in the same amount as in the method of [I], in the presence or absence of a solvent, After the reaction is carried out at a reaction temperature of 40 ° C to 200 ° C, preferably 80 ° C to 170 ° C, the excess diethyl carbonate is separated from the solvent at 80 ° C to 150 ° C under normal pressure or reduced pressure to obtain a target. Hardening accelerator.
[III]於溶劑(例如,甲苯:使用量基於三級膦的重量為10 wt%~1,000 wt%)的存在下,以10℃~100℃,較佳為40℃~100℃的反應溫度使作為(A)的原料的三級膦與1.0當量~1.5當量的乙基鹵(Ethyl Halide)進行反應而形成四級鏻鹽。針對該四級鏻鹽,使用1當量的氫氧化鈉及1.0當量~1.5當量的酚樹脂(B) 進行鹽交換,將基於該混合物的重量添加50%~400%的水並於10℃~100℃下進行鹽交換而成者的有機層取出,於常壓或減壓下以80℃~150℃將溶劑分離而獲得目標的硬化促進劑。 [III] In the presence of a solvent (for example, toluene: used in an amount of 10% by weight to 1,000% by weight based on the weight of the tertiary phosphine), the reaction temperature is from 10 ° C to 100 ° C, preferably from 40 ° C to 100 ° C. The tertiary phosphine as the raw material of (A) is reacted with 1.0 equivalent to 1.5 equivalents of ethyl halide (Ethyl Halide) to form a quaternary phosphonium salt. For the quaternary phosphonium salt, 1 equivalent of sodium hydroxide and 1.0 equivalent to 1.5 equivalents of phenol resin are used (B) Perform salt exchange, remove 50%~400% of water based on the weight of the mixture, and remove the organic layer of the salt at 10 ° C ~ 100 ° C, 80 ° C ~ 150 ° C under normal pressure or reduced pressure The solvent is separated to obtain a target hardening accelerator.
例如於環氧樹脂(A成分)與酚樹脂(B成分)系硬化 的情況下,相對於酚樹脂(B成分)100重量份(以下簡稱為「份」),本發明的硬化促進劑的使用量較佳為設定成5份~20份的範圍,更佳為6份~15份。即,其原因在於:若未滿5份,則作為目標的環氧樹脂(A成分)與酚樹脂(B成分)的硬化反應難以進行,因此難以獲得充分的硬化性;若超過20份,則可看到硬化反應過快而損害成形性的傾向。 For example, epoxy resin (component A) and phenol resin (component B) are hardened. In the case of 100 parts by weight of the phenol resin (component B) (hereinafter referred to as "parts"), the amount of the curing accelerator of the present invention is preferably in the range of 5 parts to 20 parts, more preferably 6 parts. ~15 servings. In other words, if the amount is less than 5 parts, the curing reaction between the target epoxy resin (component A) and the phenol resin (component B) is difficult to proceed, so that it is difficult to obtain sufficient curability; if it exceeds 20 parts, It can be seen that the hardening reaction is too fast to impair the formability.
另外,於無損本發明的特性的範圍內,亦可將先前公知 的各種硬化促進劑與本發明的硬化促進劑併用。作為上述先前公知的各種硬化促進劑,例如可列舉:三芳基膦類、四苯基鏻.四苯基硼酸鹽、2-甲基咪唑等咪唑類、1,8-二氮雜雙環(5,4,0)十一烯-7等。該些硬化促進劑可單獨使用、或併用2種以上。 In addition, it is also known that it is not within the scope of the characteristics of the present invention. Various hardening accelerators are used in combination with the hardening accelerator of the present invention. Examples of the various hardening accelerators known in the prior art include triarylphosphines and tetraphenylphosphonium. Imidazoles such as tetraphenylborate and 2-methylimidazole, 1,8-diazabicyclo(5,4,0)undecene-7 and the like. These hardening accelerators may be used alone or in combination of two or more.
使用本發明的硬化促進劑的環氧樹脂組成物視需要亦 可調配熔融二氧化矽、氧化鋁等無機填充劑,環氧基矽烷(epoxysilane)系、乙烯基矽烷系、鈦酸酯系等的偶合劑,硬脂酸及其金屬鹽,棕櫚蠟等使與成型模具的脫模變得容易的內部脫模劑,碳黑等顏料,四溴雙酚A、聚磷酸銨鹽或三氧化銻等阻燃劑等。 The epoxy resin composition using the hardening accelerator of the present invention is also optionally An inorganic filler such as molten cerium oxide or aluminum oxide, a coupling agent such as epoxysilane, vinyl decane or titanate, stearic acid and its metal salt, palm wax, etc. An internal mold release agent which is easy to release the mold, a pigment such as carbon black, a flame retardant such as tetrabromobisphenol A, ammonium polyphosphate or antimony trioxide.
於使用本發明的硬化促進劑的環氧樹脂組成物的製造 中,利用捏合機、三輥機等混煉裝置,於80℃~120℃的溫度,較佳為90℃~110℃的溫度下將環氧樹脂(A成分)、硬化劑(B成分)、本發明的硬化促進劑及其他添加劑熔融混合來進行混煉。對所獲得的混合物進行冷卻並使其固化後加以粉碎,若有必要,則可藉由打錠成錠(tablet)狀來製造。 Manufacture of epoxy resin composition using the hardening accelerator of the present invention In the kneading device such as a kneader or a three-roller, the epoxy resin (component A) and the curing agent (component B) are heated at a temperature of 80 ° C to 120 ° C, preferably 90 ° C to 110 ° C. The hardening accelerator of the present invention and other additives are melt-mixed and kneaded. The obtained mixture is cooled, solidified, and pulverized, and if necessary, can be produced by tableting into a tablet.
[實施例] [Examples]
以下,藉由實施例來進一步說明本發明,但並不企圖將本發明限定於該實施例。於實施例中,「份」表示質量份。 The invention is further illustrated by the following examples, but is not intended to limit the invention thereto. In the examples, "parts" means parts by mass.
實施例1[硬化促進劑a1] Example 1 [hardening accelerator a1]
三苯基乙基鏻的酚樹脂鹽(軟化點為108℃) Phenol resin salt of triphenylethyl hydrazine (softening point is 108 ° C)
向攪拌式的高壓釜(autoclave)中加入碳酸二乙酯24份、乙醇36份、及三苯基膦60份,於160℃的反應溫度下反應80小時,而獲得三苯基乙基鏻單乙基碳酸鹽的乙醇溶液。 24 parts of diethyl carbonate, 36 parts of ethanol, and 60 parts of triphenylphosphine were added to a stirred autoclave, and reacted at a reaction temperature of 160 ° C for 80 hours to obtain a triphenylethyl fluorene. Ethyl carbonate in ethanol.
向加入有於150℃下進行了加熱熔融的苯酚酚醛清漆樹脂(明和化成公司製造,商品名為MEHC-7800S)80份的反應容器中,緩慢地添加上述所獲得的三苯基乙基鏻單乙基碳酸鹽的乙醇溶液24份,將所產生的二氧化碳去除,進而變成減壓來將殘存的乙醇去除。取出所獲得的熔融狀態的鹽,冷卻至室溫為止後,利用台式粉碎機進行粉碎並穿過100個網眼的金屬絲網,從而製成粉末狀的硬化促進劑a1。 The above-obtained triphenylethylguanidine was slowly added to a reaction vessel containing 80 parts of a phenol novolak resin (manufactured by Megumi Kasei Co., Ltd., trade name: MEHC-7800S) which was heated and melted at 150 ° C. 24 parts of an ethanol solution of ethyl carbonate was used to remove the generated carbon dioxide, and the pressure was reduced to remove the remaining ethanol. The obtained molten salt was taken out, cooled to room temperature, and then pulverized by a table pulverizer and passed through a mesh of 100 meshes to prepare a powdery hardening accelerator a1.
實施例2[硬化促進劑a2] Example 2 [hardening accelerator a2]
三苯基乙基鏻的苯酚酚醛清漆樹脂鹽(軟化點為100℃) Phenolic novolac resin salt of triphenylethyl hydrazine (softening point is 100 ° C)
除使用苯酚酚醛清漆樹脂(明和化成公司製造,商品名為MF-4)來代替酚樹脂的MEHC-7800S以外,以與上述實施例1相同的方式獲得硬化促進劑a2。 A hardening accelerator a2 was obtained in the same manner as in the above Example 1, except that MEFC-7800S was used instead of the phenol resin, which was a phenol novolak resin (manufactured by Megumi Kasei Co., Ltd., trade name: MF-4).
實施例3[硬化促進劑a3] Example 3 [hardening accelerator a3]
三苯基乙基鏻的苯酚酚醛清漆樹脂鹽(軟化點為103℃) Phenolic novolac resin salt of triphenylethyl hydrazine (softening point is 103 ° C)
除使用苯酚酚醛清漆樹脂(明和化成公司製造,商品名為MF-1M)來代替酚樹脂的MEHC-7800S以外,以與上述實施例1相同的方式獲得硬化促進劑a3。 A hardening accelerator a3 was obtained in the same manner as in the above Example 1, except that MEFC-7800S was used instead of the phenol resin, which was a phenol novolak resin (manufactured by Megumi Kasei Co., Ltd., trade name: MF-1M).
實施例4[硬化促進劑a4] Example 4 [hardening accelerator a4]
三苯基乙基鏻的苯酚酚醛清漆樹脂鹽(軟化點為105℃) Phenolic novolac resin salt of triphenylethyl hydrazine (softening point is 105 ° C)
除使用苯酚酚醛清漆樹脂(明和化成公司製造,商品名為MF-3M)來代替酚樹脂的MEHC-7800S以外,以與上述實施例1相同的方式獲得硬化促進劑a4。 A hardening accelerator a4 was obtained in the same manner as in the above Example 1, except that phenol novolak resin (manufactured by Megumi Kasei Co., Ltd., trade name: MF-3M) was used instead of the phenol resin MEHC-7800S.
實施例5[硬化促進劑a5] Example 5 [hardening accelerator a5]
三苯基乙基鏻的苯酚酚醛清漆改質樹脂鹽(軟化點為98℃) Phenolic novolac modified resin salt of triphenylethyl hydrazine (softening point is 98 ° C)
除使用苯酚酚醛清漆樹脂(MF-4的酚基經25%乙基化而成的樹脂)來代替酚樹脂的MEHC-7800S以外,以與上述實施例1相同的方式獲得硬化促進劑a5。 A hardening accelerator a5 was obtained in the same manner as in the above Example 1, except that MEFC-7800S in which a phenol novolak resin (a resin in which a phenol group of MF-4 was 25% ethylated) was used instead of the phenol resin.
實施例6[硬化促進劑a6] Example 6 [hardening accelerator a6]
三苯基乙基鏻的苯酚酚醛清漆改質樹脂鹽(軟化點為95℃) Phenolic novolac modified resin salt of triphenylethyl hydrazine (softening point is 95 ° C)
除使用苯酚酚醛清漆樹脂(MF-4的酚基經25%甲基化 而成的樹脂)來代替酚樹脂的MEHC-7800S以外,以與上述實施例1相同的方式獲得硬化促進劑a6。 In addition to the use of phenol novolac resin (the phenolic group of MF-4 is 25% methylated) A hardening accelerator a6 was obtained in the same manner as in the above Example 1 except that MECC-7800S was used instead of the phenol resin.
實施例7[硬化促進劑a7] Example 7 [hardening accelerator a7]
三苯基乙基鏻的苯酚酚醛清漆改質樹脂鹽(軟化點為100℃) Phenolic novolac modified resin salt of triphenylethyl hydrazine (softening point is 100 ° C)
除使用苯酚酚醛清漆樹脂(MF-1M的酚基經25%乙基化而成的樹脂)來代替酚樹脂的MEHC-7800S以外,以與上述實施例1相同的方式獲得硬化促進劑a7。 A hardening accelerator a7 was obtained in the same manner as in the above Example 1, except that MEFC-7800S in which a phenol novolak resin (a resin in which a phenol group of MF-1M was 25% ethylated) was used instead of the phenol resin.
實施例8[硬化促進劑a8] Example 8 [hardening accelerator a8]
三苯基乙基鏻的苯酚酚醛清漆改質樹脂鹽(軟化點為100℃) Phenolic novolac modified resin salt of triphenylethyl hydrazine (softening point is 100 ° C)
除使用苯酚酚醛清漆樹脂(MF-1M的酚基經25%甲基化而成的樹脂)來代替酚樹脂的MEHC-7800S以外,以與上述實施例1相同的方式獲得硬化促進劑a8。 A hardening accelerator a8 was obtained in the same manner as in the above Example 1, except that MEFC-7800S in which a phenol novolak resin (a resin in which a phenol group of MF-1M was methylated by 25%) was used instead of the phenol resin.
實施例9[硬化促進劑a9] Example 9 [hardening accelerator a9]
三苯基乙基鏻的苯酚酚醛清漆改質樹脂鹽(軟化點為105℃) Phenolic novolac modified resin salt of triphenylethyl hydrazine (softening point is 105 ° C)
除使用苯酚酚醛清漆樹脂(MF-3M的酚基經25%乙基化而成的樹脂)來代替酚樹脂的MEHC-7800S以外,以與上述實施例1相同的方式獲得硬化促進劑a9。 A hardening accelerator a9 was obtained in the same manner as in the above Example 1, except that MEFC-7800S in which a phenol novolak resin (a resin in which a phenol group of MF-3M was ethylated by 25%) was used instead of the phenol resin.
實施例10[硬化促進劑a10] Example 10 [hardening accelerator a10]
三苯基乙基鏻的苯酚酚醛清漆改質樹脂鹽(軟化點為105℃) Phenolic novolac modified resin salt of triphenylethyl hydrazine (softening point is 105 ° C)
除使用苯酚酚醛清漆樹脂(MF-3M的酚基經25%甲基化而成的樹脂)來代替酚樹脂的MEHC-7800S以外,以與上述實施例1相同的方式獲得硬化促進劑a10。 A hardening accelerator a10 was obtained in the same manner as in the above Example 1, except that MEFC-7800S in which a phenol novolak resin (a resin in which a phenol group of MF-3M was methylated by 25%) was used instead of the phenol resin.
實施例11[硬化促進劑a11] Example 11 [hardening accelerator a11]
三苯基乙基鏻的苯酚酚醛清漆樹脂鹽(軟化點為110℃) Phenolic novolac resin salt of triphenylethyl hydrazine (softening point is 110 ° C)
向耐高溫高壓密閉反應裝置中加入碳酸二乙酯20份、乙醇6份、三苯基膦26份、及苯酚酚醛清漆樹脂(明和化成公司製造,商品名為MF-4M)120份,於160℃的反應溫度下反應80小時後,變成減壓來將殘存的原料去除。取出所獲得的熔融狀態的鹽,冷卻至室溫為止後,利用台式粉碎機進行粉碎並穿過100個網眼的金屬絲網,從而製成粉末狀的硬化促進劑a11。 20 parts of diethyl carbonate, 6 parts of ethanol, 26 parts of triphenylphosphine, and 120 parts of phenol novolak resin (manufactured by Mingwa Chemical Co., Ltd., trade name: MF-4M) were added to the high temperature and high pressure sealed reactor. After reacting for 80 hours at a reaction temperature of ° C, the pressure was reduced to remove the remaining raw material. The obtained molten salt was taken out, cooled to room temperature, and then pulverized by a table pulverizer and passed through a mesh of 100 meshes to prepare a powdery hardening accelerator a11.
實施例12[硬化促進劑a12] Example 12 [hardening accelerator a12]
三苯基乙基鏻的苯酚酚醛清漆改質樹脂鹽(軟化點為108℃) Triphenylethyl hydrazine phenol novolac modified resin salt (softening point is 108 ° C)
除使用苯酚酚醛清漆樹脂(MF-4M的酚基經25%乙基化而成的樹脂)來代替酚樹脂的MEHC-7800S以外,以與上述實施例11相同的方式獲得硬化促進劑a12。 A hardening accelerator a12 was obtained in the same manner as in the above Example 11 except that MEFC-7800S which used a phenol novolak resin (a resin in which the phenol group of MF-4M was 25% ethylated) was used instead of the phenol resin.
比較例1[硬化促進劑b] Comparative Example 1 [hardening accelerator b]
TPP-K(四苯基鏻.四苯基硼酸鹽) TPP-K (tetraphenylphosphonium tetraphenylborate)
比較例2[硬化促進劑c] Comparative Example 2 [hardening accelerator c]
TPM-P(甲基三苯基鏻-對苯二甲酚樹脂鹽,軟化點為110℃) TPM-P (methyltriphenylphosphonium-p-xylylene phenolate resin, softening point is 110 ° C)
<硬化性試驗> <Sclerosing test>
A成分 A component
[環氧樹脂] [Epoxy resin]
聯苯型環氧樹脂(環氧當量為186,熔點為105℃) Biphenyl type epoxy resin (epoxy equivalent 186, melting point 105 ° C)
B成分 Component B
[酚樹脂] [phenol resin]
對苯二甲基型酚樹脂(羥基當量為176,軟化點為80℃) P-xylylene phenol resin (hydroxy equivalent weight 176, softening point 80 ° C)
C成分 C component
實施例1~實施例12、比較例1、比較例2的硬化促進劑 Hardening accelerators of Examples 1 to 12, Comparative Example 1, and Comparative Example 2
針對實施例1~實施例12及比較例1~比較例2中所獲得的粉末狀的硬化促進劑,以175℃的膠凝時間(gel time)變成35秒的方式調整添加量,添加上述聯苯型環氧樹脂100份、及上述硬化劑的調整量(以硬化促進劑中所含有的各種酚樹脂的OH基當量數及硬化劑的OH基當量數的合計、與環氧樹脂的環氧當量數的比變成1/1的方式調整調配量),然後利用自動乳缽(亞速旺(AS ONE)公司製造)均勻地混合。使用100℃的熱輥進行5分鐘混煉。冷卻後,進行粗粉碎,然後利用壓製機製成直徑為15 mm的錠。使用該錠並藉由硫化測試儀(Curelastometer)(日合商事公司製造)來測定175℃的膠凝時間及90秒後的扭矩值,並評 價初始硬化性。將所獲得的初始硬化物各例的成分組成與所獲得的結果示於表1。 With respect to the powdery hardening accelerators obtained in Examples 1 to 12 and Comparative Examples 1 to 2, the amount of addition was adjusted so that the gel time at 175 ° C was 35 seconds, and the above-mentioned addition was added. 100 parts of the benzene type epoxy resin and the adjustment amount of the above-mentioned curing agent (the total number of OH group equivalents of various phenol resins contained in the curing accelerator and the number of OH group equivalents of the curing agent, and the epoxy resin of the epoxy resin) The blending amount was adjusted in such a manner that the ratio of the number of equivalents became 1/1, and then uniformly mixed using an automatic mortar (manufactured by AS ONE). The mixture was kneaded for 5 minutes using a hot roll at 100 °C. After cooling, coarse pulverization was carried out, and then an ingot having a diameter of 15 mm was produced by a press. The ingot was used and the gel time of 175 ° C and the torque value after 90 seconds were measured by a Curelastometer (manufactured by Nikken Co., Ltd.), and the evaluation was made. The initial hardenability of the price. The component compositions of the respective examples of the obtained initial cured product and the results obtained are shown in Table 1.
根據90秒後的硬化扭矩與Tg的結果,與比較例相比, 本發明的硬化促進劑於已硬化時扭矩的上升急劇、且硬化物的Tg高。 According to the results of the hardening torque and Tg after 90 seconds, compared with the comparative example, The hardening accelerator of the present invention has a sharp rise in torque when it is hardened and has a high Tg of the cured product.
即,可知本發明的硬化促進劑的硬化促進性能優於比較 例的TPP-K、TPM-P。 That is, it is understood that the hardening accelerator of the present invention has better curing promotion performance than the comparison. Examples of TPP-K, TPM-P.
[產業上之可利用性] [Industrial availability]
本發明的硬化促進劑因可達成環氧樹脂的急劇的硬化與硬化物的高硬度,故作為提供半導體晶片製造中的填充性良好且模具脫模性良好的密封材用環氧樹脂的硬化促進劑有用。另外,因環氧硬化反應的促進效果高,故亦可應用於導電性材料、基板絕緣材料等其他電子材料,以及接著劑、塗料等用途。 Since the hardening accelerator of the present invention can achieve rapid hardening of the epoxy resin and high hardness of the cured product, it is provided as a curing agent for providing an epoxy resin for a sealing material which is excellent in filling property in semiconductor wafer production and excellent in mold release property. The agent is useful. Further, since the epoxy hardening reaction has a high promoting effect, it can be applied to other electronic materials such as conductive materials and substrate insulating materials, as well as applications such as adhesives and paints.
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WO2017145411A1 (en) * | 2016-02-25 | 2017-08-31 | 日立化成株式会社 | Epoxy resin molding material, molded product, molded cured product, and method for producing molded cured product |
JP7221871B2 (en) | 2017-09-29 | 2023-02-14 | 日鉄ケミカル&マテリアル株式会社 | Resin composition for fiber-reinforced composite material and fiber-reinforced composite material using the same |
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JPS61190523A (en) * | 1985-01-15 | 1986-08-25 | モ−トン チオコ−ル インコ−ポレ−テツド | Curable epoxy resin forming composition |
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