TW201339626A - Antireflective member - Google Patents
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- TW201339626A TW201339626A TW101147460A TW101147460A TW201339626A TW 201339626 A TW201339626 A TW 201339626A TW 101147460 A TW101147460 A TW 101147460A TW 101147460 A TW101147460 A TW 101147460A TW 201339626 A TW201339626 A TW 201339626A
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- 239000002253 acid Substances 0.000 description 1
- 239000003522 acrylic cement Substances 0.000 description 1
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- 125000004849 alkoxymethyl group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 230000000181 anti-adherent effect Effects 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 229910000410 antimony oxide Inorganic materials 0.000 description 1
- LJCFOYOSGPHIOO-UHFFFAOYSA-N antimony pentoxide Chemical compound O=[Sb](=O)O[Sb](=O)=O LJCFOYOSGPHIOO-UHFFFAOYSA-N 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- 229910001634 calcium fluoride Inorganic materials 0.000 description 1
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 1
- 239000000292 calcium oxide Substances 0.000 description 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 150000001785 cerium compounds Chemical class 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- GTBGXKPAKVYEKJ-UHFFFAOYSA-N decyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCOC(=O)C(C)=C GTBGXKPAKVYEKJ-UHFFFAOYSA-N 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 150000005690 diesters Chemical class 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000005294 ferromagnetic effect Effects 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 230000004313 glare Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 229910000464 lead oxide Inorganic materials 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 230000005291 magnetic effect Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 125000005641 methacryl group Chemical group 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- RXOHFPCZGPKIRD-UHFFFAOYSA-N naphthalene-2,6-dicarboxylic acid Chemical compound C1=C(C(O)=O)C=CC2=CC(C(=O)O)=CC=C21 RXOHFPCZGPKIRD-UHFFFAOYSA-N 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 239000011146 organic particle Substances 0.000 description 1
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000011775 sodium fluoride Substances 0.000 description 1
- 235000013024 sodium fluoride Nutrition 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/02—Physical, chemical or physicochemical properties
- B32B7/023—Optical properties
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Laminated Bodies (AREA)
Abstract
Description
本發明關於一種觸控面板或液晶顯示器等所使用的抗反射構件。 The present invention relates to an antireflection member used in a touch panel or a liquid crystal display or the like.
近年來,隨著觸控面板、液晶顯示器等的普及,用來抑制眩光等的抗反射構件(抗反射薄膜)正受到矚目。 In recent years, with the spread of touch panels, liquid crystal displays, and the like, an anti-reflection member (anti-reflection film) for suppressing glare or the like is attracting attention.
以往曾出現各種抗反射構件,其係具有層合了折射率相異的多個層的構造(參照例如日本專利文獻1)。 In the past, various antireflection members have been proposed which have a structure in which a plurality of layers having different refractive indices are laminated (see, for example, Japanese Patent Laid-Open Publication No. Hei.
[專利文獻1]日本專利公報特開2010-32735號 [Patent Document 1] Japanese Patent Laid-Open No. 2010-32735
如在上述般的抗反射構件之中,為了以濕式的方法謀求進一步低反射化,已知有層合中折射率層、高折射率層、低折射率層這三層的方法。 Among the antireflection members described above, in order to further reduce the reflection by a wet method, a method of laminating three layers of a medium refractive index layer, a high refractive index layer, and a low refractive index layer is known.
但是,在這種三層的抗反射構件中,雖然反射率變低,然而短波長側的光線(藍色,波長λ=400~500nm)、長波長側的光線(紅色,λ=600~800nm)的反射率比中波長區域的光線(黃色,λ=500~600nm)相對較高,因此反射 色明顯呈現紫色,外觀上發生問題的情形很多。 However, in the three-layer anti-reflection member, although the reflectance is low, the light on the short-wavelength side (blue, wavelength λ = 400 to 500 nm) and the light on the long-wavelength side (red, λ = 600 to 800 nm) The reflectance is relatively higher than that of the medium-wavelength region (yellow, λ=500~600nm), so the reflection The color is clearly purple, and there are many situations in which the appearance is problematic.
本發明鑑於上述問題點而完成,目的為提供一種抗反射構件,其係兼具低反射率特性與中性的色調。 The present invention has been made in view of the above problems, and an object thereof is to provide an antireflection member which has both low reflectance characteristics and neutral hue.
本發明之第1形態所關連之抗反射構件,係具備聚酯製基材、第一層、第二層、及第三層,這些要素係依照前述順序層合,前述第一層的折射率在1.52以上1.65以下的範圍,前述第二層的折射率在1.67以上1.80以下的範圍,且其厚度在100nm以上180nm以下的範圍,前述第三層的折射率在1.30以上1.45以下的範圍,且其厚度在70nm以上130nm以下的範圍。 The antireflection member according to the first aspect of the present invention includes a base material made of polyester, a first layer, a second layer, and a third layer, and these elements are laminated in the above-described order, and the refractive index of the first layer is In the range of 1.52 or more and 1.65 or less, the refractive index of the second layer is in the range of 1.67 or more and 1.80 or less, and the thickness thereof is in the range of 100 nm or more and 180 nm or less, and the refractive index of the third layer is in the range of 1.30 or more and 1.45 or less. The thickness is in the range of 70 nm or more and 130 nm or less.
本發明之第2形態所關連之抗反射構件,其中前述第一層的厚度在0.5μm以上100μm以下的範圍。 In the antireflection member according to the second aspect of the present invention, the thickness of the first layer is in a range of 0.5 μm or more and 100 μm or less.
本發明之第3形態所關連之抗反射構件係如第1或第2形態,其中標準C光源產生的透過色之CIE 1976L*a*b*色空間中的a*在-0.5以上0.0以下的範圍,b*在0.2以上0.8以下的範圍,標準C光源產生的反射色之CIE 1976L*a*b*色空間中的a*在-8.0以上9.0以下的範圍,b*在-9.0以上3.0以下的範圍。 The antireflection member according to the third aspect of the present invention is the first or second aspect, wherein a* of the CIE 1976L*a*b* color space of the transmission color generated by the standard C light source is -0.5 or more and 0.0 or less. In the range of b* in the range of 0.2 or more and 0.8 or less, the reflection color produced by the standard C light source has a range of a* in the CIE 1976L*a*b* color space of -8.0 or more and 9.0 or less, and b* is -9.0 or more and 3.0 or less. The scope.
本發明之第4形態所關連之抗反射構件係如第1至第3任一形態,其中前述第二層的厚度在100nm以上160nm以下的範 圍,前述第三層的厚度在70nm以上110nm以下的範圍。 The antireflection member according to the fourth aspect of the present invention is the first to third aspect, wherein the second layer has a thickness of 100 nm or more and 160 nm or less. The thickness of the third layer is in the range of 70 nm or more and 110 nm or less.
本發明之第5形態所關連之抗反射構件,其特徵為:在聚酯薄膜的表面依序層合第一層、第二層及第三層而形成,以折射率在1.52以上1.65以下的範圍且厚度在1.0μm以上10.0μm以下的範圍形成前述第一層,以折射率在1.67以上1.80以下的範圍且厚度在100nm以上160nm以下的範圍形成前述第二層,以折射率在1.30以上1.45以下的範圍且厚度在70nm以上110nm以下的範圍形成前述第三層。 An antireflection member according to a fifth aspect of the present invention is characterized in that a first layer, a second layer, and a third layer are sequentially laminated on a surface of a polyester film, and a refractive index of 1.52 or more and 1.65 or less is formed. The first layer is formed in a range of a thickness of 1.0 μm or more and 10.0 μm or less, and the second layer is formed in a range of a refractive index of 1.67 or more and 1.80 or less and a thickness of 100 nm or more and 160 nm or less, and a refractive index of 1.30 or more and 1.45. The third layer is formed in the range of 70 nm or more and 110 nm or less in the following range.
亦即,本發明之第5形態所關連之抗反射構件係如第4形態,其中前述第一層的厚度在1.0μm以上10.0μm以下的範圍。 In other words, the antireflection member according to the fifth aspect of the present invention is the fourth aspect, wherein the thickness of the first layer is in a range of 1.0 μm or more and 10.0 μm or less.
另外,在本發明中,在CIE 1976L*a*b*色空間之中,標準C光源產生的透過色的a*宜為在-0.5以上0.0以下的範圍,且b*宜為在0.2以上0.8以下的範圍,在CIE 1976L*a*b*色空間中,標準C光源產生的反射色的a*宜為在0.0以上9.0以下的範圍,且b*宜為在-9.0以上0.0以下的範圍。 Further, in the present invention, among the CIE 1976 L*a*b* color spaces, the a* of the transmission color generated by the standard C light source is preferably in the range of -0.5 or more and 0.0 or less, and b* is preferably 0.2 or more and 0.8. In the following range, in the CIE 1976 L*a*b* color space, the a* of the reflection color by the standard C light source is preferably in the range of 0.0 or more and 9.0 or less, and b* is preferably in the range of -9.0 or more and 0.0 or less.
亦即,本發明之第6形態所關連之抗反射構件係如第4或第5形態,其中標準C光源產生的透過色之CIE 1976L*a*b*色空間中的a*在-0.5以上0.0以下的範圍,b*在0.2以上0.8以下的範圍,標準C光源產生的反射色之CIE 1976La*b*色空間中的a*在0.0以上9.0以下的範圍 ,b*在-9.0以上0.0以下的範圍。 That is, the antireflection member according to the sixth aspect of the present invention is the fourth or fifth aspect, wherein a* of the CIE 1976L*a*b* color space of the transmission color by the standard C light source is -0.5 or more. In the range of 0.0 or less, b* is in the range of 0.2 or more and 0.8 or less, and the range of a* in the CIE 1976La*b* color space generated by the standard C light source is 0.0 or more and 9.0 or less. , b* is in the range of -9.0 or more and 0.0 or less.
本發明之第7形態所關連之抗反射構件係如第1至第3任一形態,其中前述第二層的厚度在130nm以上180nm以下的範圍,前述第三層的厚度在80nm以上130nm以下的範圍。 The antireflection member according to the seventh aspect of the present invention, wherein the second layer has a thickness of 130 nm or more and 180 nm or less, and the third layer has a thickness of 80 nm or more and 130 nm or less. range.
本發明之第8形態所關連之抗反射構件係如第7形態,其中標準C光源產生的透過色之CIE 1976L*a*b*色空間中的a*在-0.5以上0.0以下的範圍,b*在0.2以上0.8以下的範圍,標準C光源產生的反射色之CIE 1976L*a*b*色空間中的a*在-8.0以上2.0以下的範圍,b*在-6.0以上3.0以下的範圍。 The antireflection member according to the eighth aspect of the present invention is the seventh aspect, wherein a* of the CIE 1976L*a*b* color space of the transmission color by the standard C light source is in a range of -0.5 or more and 0.0 or less, b * In the range of 0.2 or more and 0.8 or less, a* in the CIE 1976L*a*b* color space of the reflection color by the standard C light source is in the range of -8.0 or more and 2.0 or less, and b* is in the range of -6.0 or more and 3.0 or less.
在本發明中,最小反射率宜為0.5%以下,平均視感反射率宜為0.7%以下,全光線透過率宜為94%以上。 In the present invention, the minimum reflectance is preferably 0.5% or less, the average visual reflectance is preferably 0.7% or less, and the total light transmittance is preferably 94% or more.
亦即,本發明之第9形態所關連之抗反射構件係如第1至第8任一形態,其中該最小反射率為0.5%以下,該平均視感反射率為0.7%以下,其全光線透過率為94%以上。 In other words, the anti-reflection member according to the ninth aspect of the present invention is the first to eighth aspects, wherein the minimum reflectance is 0.5% or less, and the average visual reflectance is 0.7% or less. The transmittance is above 94%.
本發明之第10的形態所關連之發明係如第1至第9任一形態,其中前述第一層係含有第一紫外線硬化型樹脂之硬化物,該第一紫外線硬化型樹脂,係含有具有反應性有機官能基之烷氧矽烷及其部分水解聚合物之中的至少一種,前述第二層係含有第二紫外線硬化型樹脂之硬化物, 該第二紫外線硬化型樹脂,係含有具有反應性有機官能基之烷氧矽烷及其部分水解聚合物之中的至少一種,前述第三層係由烷氧矽烷及其部分水解聚合物之中的至少一種硬化物與二氧化矽所構成。 The invention of any one of the first to ninth aspects, wherein the first layer contains a cured product of a first ultraviolet curable resin, and the first ultraviolet curable resin contains At least one of a reactive organofunctional alkoxysilane and a partially hydrolyzed polymer thereof, the second layer comprising a cured product of a second ultraviolet curable resin, The second ultraviolet curable resin is at least one of alkoxysilane having a reactive organic functional group and a partially hydrolyzed polymer thereof, and the third layer is composed of an alkoxysilane and a partially hydrolyzed polymer thereof. At least one hardened material is composed of cerium oxide.
本發明之第11的形態所關連之抗反射構件係如第10的形態,其中前述第一紫外線硬化型樹脂中的前述烷氧矽烷及其部分水解聚合物相對於前述第一層的比例為3質量%以上。 The anti-reflection member according to the eleventh aspect of the invention is the tenth aspect, wherein the ratio of the alkoxysilane and the partially hydrolyzed polymer thereof in the first ultraviolet curable resin to the first layer is 3 More than % by mass.
本發明之第12的形態所關連之抗反射構件,如第10或第11的形態,其中前述第二紫外線硬化型樹脂中的前述烷氧矽烷及其部分水解聚合物相對於前述第二層的比例為3質量%以上。 According to a tenth or eleventh aspect, the anti-reflection member according to the twelfth aspect of the present invention, wherein the alkoxysilane and the partially hydrolyzed polymer thereof in the second ultraviolet curable resin are opposite to the second layer The ratio is 3% by mass or more.
另外,在本發明中,前述第三層係以由烷氧矽烷與具有氟碳骨架之烷氧矽烷之混合物之聚合物所構成,並含有中空二氧化矽粒子為佳。 Further, in the present invention, the third layer is composed of a polymer of a mixture of an alkoxydecane and an alkoxysilane having a fluorocarbon skeleton, and preferably contains hollow cerium oxide particles.
亦即,本發明之第13的形態係如第1至第9任一形態,其中前述第三層係含有烷氧矽烷與具有氟碳骨架之烷氧矽烷之混合物之聚合物與中空二氧化矽粒子。 In a third aspect of the invention, the third aspect, wherein the third layer comprises a polymer of a mixture of an alkoxydecane and an alkoxysilane having a fluorocarbon skeleton and a hollow ceria. particle.
另外,在本發明中,宜在前述基材中與前述第一層相反側的表面層合防黏連層。 Further, in the invention, it is preferable that the anti-adhesion layer is laminated on the surface of the substrate opposite to the first layer.
亦即,本發明之第14的形態所關連之抗反射構件係如第1至第13之任一形態,其中進一步具備層合於前述基材中與前述第一層相反側的表面之防黏連層。 In any one of the first to thirteenth aspects, the anti-reflection member according to the fourteenth aspect of the present invention, further comprising the anti-adhesive layer laminated on the surface of the substrate opposite to the first layer Layered.
本發明兼具抗反射構件的低反射率特性與中性的色調。 The present invention combines the low reflectance characteristics of the antireflection member with the neutral hue.
以下對本發明的實施方式作說明。 Embodiments of the invention are described below.
在本發明的實施形態中,抗反射構件A如圖1所示般,係具備基材4、第一層(硬塗層)1、第二層(高折射率層)2、及第三層(低折射率層)3。基材4、第一層1、第二層2、及第三層3係依序層合。亦即,在基材4的第一主面(單面)上層合第一層1,在第一層1與基材4的相反側的主面上層合第二層2,第二層2與第一層1的相反側的主面(單面)上層合第三層3。基材4、第一層1、第二層2、及第三層3之中,任一要素皆具有透光性,抗反射構件A全體而言具有透光性。 In the embodiment of the present invention, as shown in FIG. 1, the anti-reflection member A includes a substrate 4, a first layer (hard coat layer) 1, a second layer (high refractive index layer) 2, and a third layer. (low refractive index layer) 3. The substrate 4, the first layer 1, the second layer 2, and the third layer 3 are laminated in this order. That is, the first layer 1 is laminated on the first main surface (single side) of the substrate 4, and the second layer 2 is laminated on the main surface on the opposite side of the first layer 1 and the substrate 4, and the second layer 2 is The third layer 3 is laminated on the main surface (single side) on the opposite side of the first layer 1. Any of the base material 4, the first layer 1, the second layer 2, and the third layer 3 has light transmissivity, and the antireflection member A has light transmissivity as a whole.
在本實施形態中,第一層1的折射率在1.52以上1.65以下的範圍。另外,第二層2的折射率在1.67以上1.80以下的範圍,且其厚度在100nm以上180nm以下的範圍。此外,第三層3的折射率在1.30以上1.45以下的範圍,且其厚度在70nm以上130nm以下的範圍。 In the present embodiment, the refractive index of the first layer 1 is in the range of 1.52 or more and 1.65 or less. Further, the refractive index of the second layer 2 is in the range of 1.67 or more and 1.80 or less, and the thickness thereof is in the range of 100 nm or more and 180 nm or less. Further, the refractive index of the third layer 3 is in the range of 1.30 or more and 1.45 or less, and the thickness thereof is in the range of 70 nm or more and 130 nm or less.
此外,光學材料的折射率,一般而言是以鈉的D射線(波長589.3nm)的折射率來表示。 Further, the refractive index of the optical material is generally expressed by the refractive index of sodium D-ray (wavelength 589.3 nm).
以這種方式設定第一層1、第二層2及第三層3的折射率及厚度,可減少抗反射構件的反射率的波長依存性, 並可使來自抗反射構件的反射光的顏色接近白色,且可實現抗反射構件A之低反射率化。 By setting the refractive indices and thicknesses of the first layer 1, the second layer 2, and the third layer 3 in this manner, the wavelength dependence of the reflectance of the antireflection member can be reduced. The color of the reflected light from the anti-reflection member can be made close to white, and the low reflectance of the anti-reflection member A can be achieved.
第一層1的厚度係以在0.5μm以上10.0μm以下的範圍為佳。此情況下,抗反射構件A的機械強度會提升。 The thickness of the first layer 1 is preferably in the range of 0.5 μm or more and 10.0 μm or less. In this case, the mechanical strength of the anti-reflection member A is increased.
在使CIE所規定的標準C光源的光線入射至此抗反射構件A的情況,透過色(透射光之色)之CIE 1976L*a*b*色空間中的a*宜為在-0.5以上0.0以下的範圍,b*宜為在0.2以上0.8以下的範圍。另外,在使CIE所規定的標準C光源的光線入射至此抗反射構件A的情況,反射色(反射光之色)之CIE 1976L*a*b*色空間中的a*宜為在-8.0以上9.0以下的範圍,b*宜為在-9.0以上3.0以下的範圍。 When the light of the standard C light source defined by the CIE is incident on the anti-reflection member A, the a* in the CIE 1976L*a*b* color space of the transmission color (the color of the transmitted light) is preferably -0.5 or more and 0.0 or less. The range of b* is preferably in the range of 0.2 or more and 0.8 or less. Further, in the case where the light of the standard C light source defined by the CIE is incident on the anti-reflection member A, the a* in the CIE 1976L*a*b* color space of the reflected color (the color of the reflected light) is preferably -8.0 or more. In the range of 9.0 or less, b* is preferably in the range of -9.0 or more and 3.0 or less.
在本實施形態中,前述第二層2的厚度在100nm以上160nm以下的範圍,且前述第三層3的厚度在70nm以上110nm以下的範圍為佳。此情況下,來自抗反射構件A的反射色更接近白色。第一層1的厚度如果在1.0μm以上10.0μm以下的範圍則更佳。此情況下,抗反射構件A之機械強度會充分提升。 In the present embodiment, the thickness of the second layer 2 is in the range of 100 nm or more and 160 nm or less, and the thickness of the third layer 3 is preferably in the range of 70 nm or more and 110 nm or less. In this case, the reflected color from the anti-reflection member A is closer to white. The thickness of the first layer 1 is more preferably in the range of 1.0 μm or more and 10.0 μm or less. In this case, the mechanical strength of the anti-reflection member A is sufficiently increased.
另外,在前述第二層2的厚度設定在100nm以上160nm以下的範圍,前述第三層3的厚度設定在70nm以上110nm以下的範圍時,使CIE所規定的標準C光源的光入射至抗反射構件A的情況,透過色(透射光之色)之CIE 1976L*a*b*色空間中的a*宜為在-0.5以上0.0以下的範圍,b*宜為在0.2以上0.8以下的範圍。另外,在使CIE所規定的標準C光源的光入射至此抗反射構件A的情 況,反射色(反射光之色)之CIE 1976L*a*b*色空間中的a*宜為在0.0以上9.0以下的範圍,b*宜為在-9.0以上0.0以下的範圍。此情況下,來自抗反射構件A的反射光尤其更接近白色,視認性不易降低。 Further, when the thickness of the second layer 2 is set to be in the range of 100 nm or more and 160 nm or less, and the thickness of the third layer 3 is set to be in the range of 70 nm or more and 110 nm or less, the light of the standard C light source defined by the CIE is incident on the antireflection. In the case of the member A, the a* in the CIE 1976L*a*b* color space of the transmission color (the color of the transmitted light) is preferably in the range of -0.5 or more and 0.0 or less, and b* is preferably in the range of 0.2 or more and 0.8 or less. In addition, the light of the standard C light source specified by the CIE is incident on the anti-reflection member A. In the CIE 1976L*a*b* color space of the reflection color (the color of the reflected light), a* is preferably in the range of 0.0 or more and 9.0 or less, and b* is preferably in the range of -9.0 or more and 0.0 or less. In this case, the reflected light from the anti-reflection member A is particularly closer to white, and the visibility is not easily lowered.
本實施形態中,第二層2的厚度亦可在130nm以上180nm以下的範圍,且第三層3的厚度亦可在80nm以上130nm以下的範圍。此情況下,反射光的顏色接近白色,然而稍微帶有藍色。此來自抗反射構件A的反射光來自與ITO膜的反射光重合而成的光線的顏色非常接近白色。因此,抗反射構件A適合於與作為透明電極所廣泛使用的併用ITO膜的用途。此情況下,可使來自ITO膜的反射光的顏色由外部看來不明顯。與併用ITO膜的抗反射構件A的用途,可列舉例如適用於後述影像顯示機器6的用途。 In the present embodiment, the thickness of the second layer 2 may be in the range of 130 nm or more and 180 nm or less, and the thickness of the third layer 3 may be in the range of 80 nm or more and 130 nm or less. In this case, the color of the reflected light is close to white, but slightly blue. The reflected light from the anti-reflection member A is derived from the reflected light of the ITO film and the color of the light is very close to white. Therefore, the anti-reflection member A is suitable for use with an ITO film which is widely used as a transparent electrode. In this case, the color of the reflected light from the ITO film can be made inconspicuous from the outside. The use of the antireflection member A in combination with the ITO film may be, for example, applied to an image display device 6 to be described later.
另外,在第二層2的厚度設定在130nm以上180nm以下的範圍,第三層3的厚度設定在80nm以上130nm以下的範圍時,在使CIE所規定的標準C光源的光線入射至抗反射構件A的情況,透過色(透射光的顏色)之CIE 1976L*a*b*色空間中的a*宜為在-0.5以上0.0以下的範圍,b*宜為在0.2以上0.8以下的範圍。另外,在使CIE所規定的標準C光源的光線入射至此抗反射構件A的情況,反射色(反射光之色)之CIE 1976L*a*b*色空間中的a*宜為在-8.0以上2.0以下的範圍,b*宜為在-6.0以上3.0以下的範圍。此情況下,來自抗反射構件A的反射光與 來自ITO膜的反射光重合而成的光線更接近白色,視認性不易降低。 Further, when the thickness of the second layer 2 is set to be in the range of 130 nm or more and 180 nm or less, and the thickness of the third layer 3 is set to be in the range of 80 nm or more and 130 nm or less, the light of the standard C light source defined by the CIE is incident on the antireflection member. In the case of A, a* in the CIE 1976L*a*b* color space of the transmission color (color of transmitted light) is preferably in the range of -0.5 or more and 0.0 or less, and b* is preferably in the range of 0.2 or more and 0.8 or less. Further, in the case where the light of the standard C light source defined by the CIE is incident on the anti-reflection member A, the a* in the CIE 1976L*a*b* color space of the reflected color (the color of the reflected light) is preferably -8.0 or more. In the range of 2.0 or less, b* is preferably in the range of -6.0 or more and 3.0 or less. In this case, the reflected light from the anti-reflection member A and The light from which the reflected light from the ITO film is superposed is closer to white, and the visibility is not easily lowered.
抗反射構件A的最小反射率亦可在0.5%以下,其平均視感反射率亦可在0.7%以下,此外其全光線透過率亦可在94%以上,此情況下,抗反射構件A可發揮出優異的透光性、透明性、低反射性,並且發揮出抗反射的優異性能。 The minimum reflectance of the anti-reflection member A may be 0.5% or less, the average visual reflectance may be 0.7% or less, and the total light transmittance may be 94% or more. In this case, the anti-reflection member A may be It exhibits excellent light transmittance, transparency, and low reflectivity, and exhibits excellent performance against reflection.
第一層1、第二層2、及第三層3的材質並未受到特別限制。在第一層1、第二層2、及第三層3的材質合適的組合的第一例中,第一層1含有第一紫外線硬化型樹脂的硬化物,該第一紫外線硬化型樹脂係含有具有反應性有機官能基之烷氧矽烷及其部分水解聚合物之中的至少一種。進一步在本例中,第二層2係含有第二紫外線硬化型樹脂之硬化物,該第二紫外線硬化型樹脂係含有具有反應性有機官能基之烷氧矽烷及其部分水解聚合物之中的至少一種。另外,在本例中,第三層3係由烷氧矽烷及其部分水解聚合物之中的至少一種硬化物與二氧化矽所構成。此情況下,第三層3的硬度變得非常高,藉此抗反射構件A的機械強度提升。藉此,抗反射構件A的耐擦傷性變高。另外,第一層1、第二層2及第三層3任一者皆含有含烷氧矽烷系化合物的組成物之硬化物,因此各層間的密著性會提升。特別是第一層1與第二層2皆含有紫外線硬化型樹脂的硬化物,該紫外線硬化型樹脂係含有具有反應性有機官能基的烷氧矽烷系化合物,因此藉由反應性有機官 能基發生反應,第一層1與第二層2的密著性會進一步提升。另外,第一層1係含有紫外線硬化型樹脂之硬化物,且具有夠高的厚度,因此抗反射構件A的硬度會提升。 The materials of the first layer 1, the second layer 2, and the third layer 3 are not particularly limited. In the first example of a suitable combination of materials of the first layer 1, the second layer 2, and the third layer 3, the first layer 1 contains a cured product of a first ultraviolet curable resin, and the first ultraviolet curable resin is At least one of alkoxysilane having a reactive organic functional group and a partially hydrolyzed polymer thereof. Further, in this example, the second layer 2 contains a cured product of a second ultraviolet curable resin containing an alkoxysilane having a reactive organic functional group and a partially hydrolyzed polymer thereof. At least one. Further, in this example, the third layer 3 is composed of at least one hardened material of alkoxysilane and a partially hydrolyzed polymer thereof and cerium oxide. In this case, the hardness of the third layer 3 becomes very high, whereby the mechanical strength of the anti-reflection member A is improved. Thereby, the scratch resistance of the anti-reflection member A becomes high. Further, since any of the first layer 1, the second layer 2, and the third layer 3 contains a cured product of a composition containing an alkoxydecane-based compound, the adhesion between the layers is improved. In particular, both the first layer 1 and the second layer 2 contain a cured product of an ultraviolet curable resin containing an alkoxydecane compound having a reactive organic functional group, and thus a reactive organic official When the energy base reacts, the adhesion between the first layer 1 and the second layer 2 is further enhanced. Further, since the first layer 1 contains a cured product of an ultraviolet curable resin and has a sufficiently high thickness, the hardness of the antireflection member A is increased.
在第一層1含有第一紫外線硬化型樹脂之硬化物的情況,第一紫外線硬化型樹脂中的烷氧矽烷及其部分水解聚合物相對於第一層1的比例係以3質量%以上為佳。此情況下,抗反射構件A的耐擦傷性會進一步提升,另外,層間的密著性亦進一步提升。 In the case where the first layer 1 contains a cured product of the first ultraviolet curable resin, the ratio of the alkoxysilane and the partially hydrolyzed polymer thereof in the first ultraviolet curable resin to the first layer 1 is 3% by mass or more. good. In this case, the scratch resistance of the anti-reflection member A is further improved, and the adhesion between the layers is further improved.
另外,在第二層2含有第二紫外線硬化型樹脂之硬化物的情況,第二紫外線硬化型樹脂中的之烷氧矽烷及其部分水解聚合物相對於第二層2的比例係以3質量%以上為佳。此情況下,抗反射構件A的耐擦傷性也會進一步提升,另外,層間的密著性亦進一步提升。 Further, in the case where the second layer 2 contains a cured product of the second ultraviolet curable resin, the ratio of the alkoxysilane and the partially hydrolyzed polymer thereof in the second ultraviolet curable resin to the second layer 2 is 3 masses. More than % is better. In this case, the scratch resistance of the anti-reflection member A is further improved, and the adhesion between the layers is further improved.
在第一層1、第二層2、及第三層3的材質合適的組合的第二例中,第三層3係含有烷氧矽烷與具有氟碳骨架之烷氧矽烷之混合物之聚合物與中空二氧化矽粒子。此情況下,第一層1及第二層2的材質並未受到特別限制。在本例中,第三層3容易低折射率化,甚至第三層3的防污性及耐藥品性會提升。 In a second example of a suitable combination of materials of the first layer 1, the second layer 2, and the third layer 3, the third layer 3 is a polymer containing a mixture of an alkoxy decane and an alkoxy decane having a fluorocarbon skeleton. With hollow ceria particles. In this case, the materials of the first layer 1 and the second layer 2 are not particularly limited. In this example, the third layer 3 is liable to have a low refractive index, and even the antifouling property and chemical resistance of the third layer 3 are improved.
另外,抗反射構件A亦可進一步具備防黏連層5。防黏連層5係層合於基材中與第一層1相反側的表面。此情況下,在抗反射構件A捲繞成輥筒狀等而重疊時,可抑制黏連的發生。另外,在重疊有抗反射構件A的情況,抗反射構件A的表面的平滑性會提升。 Further, the anti-reflection member A may further include an anti-adhesion layer 5. The anti-adhesion layer 5 is laminated on the surface of the substrate opposite to the first layer 1. In this case, when the anti-reflection member A is wound into a roll shape or the like and overlapped, the occurrence of adhesion can be suppressed. Further, in the case where the anti-reflection member A is superposed, the smoothness of the surface of the anti-reflection member A is improved.
以下針對抗反射構件A的構成要素進一步作詳細說明。 The constituent elements of the anti-reflection member A will be further described in detail below.
基材4為聚酯製。例如基材4由聚酯薄膜所形成。聚酯薄膜之中,特別是聚對苯二甲酸乙二酯(PET)或聚萘二甲酸乙二酯的雙軸延伸薄膜係具有優異的機械特性、耐熱性、耐藥品性等,因此適合作為磁帶、強磁性薄膜帶、包裝用薄膜、電子零件用薄膜、電氣絕緣薄膜、層合用薄膜、貼在顯示器等表面的薄膜、各種構件的保護用薄膜等的材料。特別是在顯示器用途方面,聚對苯二甲酸乙二酯(PET)或聚萘二甲酸乙二酯的雙軸延伸薄膜,適合作為液晶顯示裝置的構件的稜鏡片、觸控面板、背光板等的基膜、或電視的抗反射構件的基膜、電漿電視的前面濾光片所使用的抗反射構件、近紅外線阻隔薄膜、電磁波遮蔽薄膜的基膜等。 The base material 4 is made of polyester. For example, the substrate 4 is formed of a polyester film. Among the polyester films, particularly biaxially stretched films of polyethylene terephthalate (PET) or polyethylene naphthalate, which have excellent mechanical properties, heat resistance, chemical resistance, etc., are suitable as A material such as a magnetic tape, a ferromagnetic film tape, a film for packaging, a film for electronic parts, an electrical insulating film, a film for lamination, a film attached to a surface of a display, or a film for protection of various members. In particular, in the use of a display, a biaxially stretched film of polyethylene terephthalate (PET) or polyethylene naphthalate, which is suitable as a member of a liquid crystal display device, a touch panel, a backlight panel, etc. The base film, the base film of the antireflection member of the television, the antireflection member used for the front filter of the plasma TV, the near-infrared blocking film, the base film of the electromagnetic shielding film, and the like.
聚酯係以例如藉由對苯二甲酸、間苯二甲酸,2,6-萘二甲酸,4,4'-二苯基二羧酸等的芳香族二羧酸成分與乙二醇,1,4-丁二醇,1,4-環己烷二甲醇,以及1,6-己二醇等的二醇成分進行反應所產生的芳香族聚酯為佳,尤其以聚對苯二甲酸乙二酯、聚乙烯-2,6-萘二甲酸酯等為佳。另外,聚酯還可為前述例示的多個成分等的共聚合聚酯。 The polyester is, for example, an aromatic dicarboxylic acid component such as terephthalic acid, isophthalic acid, 2,6-naphthalenedicarboxylic acid or 4,4'-diphenyldicarboxylic acid, and ethylene glycol, 1 An aromatic polyester produced by reacting a diol component such as 4-butanediol, 1,4-cyclohexanedimethanol, and 1,6-hexanediol, especially polyethylene terephthalate Diester, polyethylene-2,6-naphthalate or the like is preferred. Further, the polyester may be a copolymerized polyester of a plurality of components and the like exemplified above.
基材4亦可含有有機或無機的粒子。此情況下,基材4的纏繞性、搬運性等提升。這種粒子可列舉碳酸鈣粒子 、氧化鈣粒子、氧化鋁粒子、高嶺土、氧化矽粒子、氧化鋅粒子、交聯丙烯酸樹脂粒子、交聯聚苯乙烯樹脂粒子、尿素樹脂粒子、三聚氰胺樹脂粒子、交聯聚矽氧樹脂粒子等。 The substrate 4 may also contain organic or inorganic particles. In this case, the winding property, handling property, and the like of the substrate 4 are improved. Such particles can be exemplified by calcium carbonate particles. Calcium oxide particles, alumina particles, kaolin, cerium oxide particles, zinc oxide particles, crosslinked acrylic resin particles, crosslinked polystyrene resin particles, urea resin particles, melamine resin particles, crosslinked polyoxymethylene resin particles, and the like.
基材4在不損及透明性的範圍亦可含有著色劑、抗靜電劑、紫外線吸收劑、抗氧化劑、潤滑劑、觸媒、其他樹脂等。 The base material 4 may contain a coloring agent, an antistatic agent, an ultraviolet absorber, an antioxidant, a lubricant, a catalyst, another resin, etc., in the range which does not impair transparency.
基材4的霧度係以3%以下為佳,此情況下,通過抗反射構件A的映像等的視認性提升,抗反射構件A為特別適合作為光學用途的薄膜。霧度如果在1.5%以下則更佳。 The haze of the substrate 4 is preferably 3% or less. In this case, the visibility of the antireflection member A or the like is improved, and the antireflection member A is a film which is particularly suitable for optical use. If the haze is 1.5% or less, it is more preferable.
基材4的厚度並不受特別限制,而以在25μm以上200μm以下的範圍為佳。尤其是若基材4的厚度在25μm以上100μm以下,則抗反射構件A可達到薄型化、輕量化,另外還可抑制在抗反射構件A的兩個表面(表、背面)發生干涉,進一步可抑制基材4加熱時的熱收縮,並且可抑制基材4的熱收縮造成的加工性惡化等的不良狀況。 The thickness of the substrate 4 is not particularly limited, but is preferably in the range of 25 μm or more and 200 μm or less. In particular, when the thickness of the substrate 4 is 25 μm or more and 100 μm or less, the antireflection member A can be made thinner and lighter, and interference between the two surfaces (front and back) of the antireflection member A can be suppressed, and further, The heat shrinkage at the time of heating of the base material 4 is suppressed, and the problem of deterioration of workability by heat shrinkage of the base material 4 can be suppressed.
基材4的表面反射率係以在4%以上6%以下的範圍為佳。若基材4的表面反射率在此範圍,則可抑制在基材4的兩個表面(表、背面)發生干涉,容易確保低反射率特性。 The surface reflectance of the substrate 4 is preferably in the range of 4% or more and 6% or less. When the surface reflectance of the substrate 4 is in this range, interference between the two surfaces (front and back surfaces) of the substrate 4 can be suppressed, and it is easy to ensure low reflectance characteristics.
本實施形態中,基材4的表面係以實施易接著處理為佳。易接著處理可列舉電漿處理、電暈處理等的乾式處理、鹼處理等的化學處理、形成易接著層的塗佈處理等。易 接著處理是在將作為抗反射構件A的材料的基材4單獨捲繞成輥筒狀等而重疊時,為了抑制黏連的發生或為了提升平滑性而實施。在上述易接著處理之中,宜在基材4的表面(第一主面上)層合易接著層。此情況下,在基材4與第一層1之間宜為隔著易接著層。甚至易接著處理亦可利用於提升基材4與第一層1之間的接著性。易接著層的材質並無特別限制,宜為由聚酯系樹脂、丙烯酸系樹脂等所形成。為了抑制抗反射構件A的反射率因為易接著層表面的界面反射而增加,易接著層的折射率希望與基材4的折射率及第一層1的折射率接近,尤其是在1.58~1.75的範圍為佳。易接著層的光學膜厚係以在120~160nm的範圍為佳。此情況下,可確保基材4與第一層1之間的高密著性,同時可抑制易接著層存在所造成的反射率增加或干涉斑的發生。 In the present embodiment, the surface of the substrate 4 is preferably subjected to easy subsequent treatment. The subsequent treatment may be a dry treatment such as a plasma treatment or a corona treatment, a chemical treatment such as an alkali treatment, or a coating treatment for forming an easy-adhesion layer. easy In the subsequent process, when the base material 4 which is a material of the anti-reflection member A is individually wound into a roll shape or the like and overlapped, it is carried out in order to suppress the occurrence of adhesion or to improve the smoothness. In the above-described easy-to-continue treatment, it is preferable to laminate the easy-adhesion layer on the surface (first main surface) of the substrate 4. In this case, it is preferable that the substrate 4 and the first layer 1 are interposed between the substrate and the first layer 1. Even easy handling can be utilized to enhance the adhesion between the substrate 4 and the first layer 1. The material of the easy-adhesion layer is not particularly limited, and is preferably formed of a polyester resin, an acrylic resin or the like. In order to suppress the reflectance of the anti-reflection member A from increasing due to the interface reflection on the surface of the adhesion layer, the refractive index of the adhesion layer is desirably close to the refractive index of the substrate 4 and the refractive index of the first layer 1, especially at 1.58 to 1.75. The range is good. The optical film thickness of the easy-adhesion layer is preferably in the range of 120 to 160 nm. In this case, high adhesion between the substrate 4 and the first layer 1 can be ensured, and an increase in reflectance or interference spots caused by the presence of the easy-to-adhere layer can be suppressed.
第一層1係以具有高於基材4的硬度的硬塗層的方式形成為佳。藉此,抗反射構件A的機械強度提升。第一層1的鉛筆硬度係以H以上為佳,如果是2H以上則更佳。 The first layer 1 is preferably formed in such a manner as to have a hard coat layer higher than the hardness of the substrate 4. Thereby, the mechanical strength of the anti-reflection member A is improved. The pencil hardness of the first layer 1 is preferably H or more, and more preferably 2H or more.
第一層1的折射率有必要為1.52以上1.65以下。藉由將第一層1的折射率設定在此範圍,可抑制第一層1與基材4之間干涉斑的發生。第一層1的厚度並未受到特別限制。另外,在本實施形態的其中一個形態中,第一層1 的厚度必須在1.0μm以上10.0μm以下的範圍。第一層1的厚度只要在此範圍,則抗反射構件A的機械強度會充分提升。另外,第一層1的厚度亦可在0.5μm以上10.0μm以下的範圍。第一層1的厚度只要在此範圍,則可提升抗反射構件A的機械強度。 The refractive index of the first layer 1 is required to be 1.52 or more and 1.65 or less. By setting the refractive index of the first layer 1 within this range, the occurrence of interference spots between the first layer 1 and the substrate 4 can be suppressed. The thickness of the first layer 1 is not particularly limited. Further, in one form of the embodiment, the first layer 1 The thickness must be in the range of 1.0 μm or more and 10.0 μm or less. As long as the thickness of the first layer 1 is in this range, the mechanical strength of the anti-reflection member A is sufficiently enhanced. Further, the thickness of the first layer 1 may be in the range of 0.5 μm or more and 10.0 μm or less. As long as the thickness of the first layer 1 is in this range, the mechanical strength of the anti-reflection member A can be improved.
第一層1係以由反應性硬化型樹脂組成物所形成為佳,例如以由熱硬化型樹脂組成物與游離輻射硬化型樹脂組成物之至少一者所形成為佳。熱硬化型樹脂組成物係含有酚樹脂、尿素樹脂、酞酸二烯丙酯樹脂、三聚氰胺樹脂、不飽和聚酯樹脂、聚胺甲酸乙酯樹脂、環氧樹脂、胺基醇酸樹脂、矽樹脂、聚矽氧烷樹脂等的熱硬化性樹脂。熱硬化性樹脂亦可因應必要與交聯劑、聚合起始劑、硬化劑、硬化促進劑、溶劑等一起使用。這種熱硬化型樹脂組成物可藉由例如塗佈於基材4(具有易接著層的情況為其表面)上,接下來將此熱硬化型樹脂組成物加熱使其熱硬化而形成第一層1。 The first layer 1 is preferably formed of a reactive curable resin composition, and is preferably formed of, for example, at least one of a thermosetting resin composition and a free radiation curable resin composition. The thermosetting resin composition contains a phenol resin, a urea resin, a diallyl citrate resin, a melamine resin, an unsaturated polyester resin, a polyurethane resin, an epoxy resin, an amino alkyd resin, an anthracene resin. A thermosetting resin such as a polyoxyalkylene resin. The thermosetting resin may be used together with a crosslinking agent, a polymerization initiator, a curing agent, a hardening accelerator, a solvent, and the like as necessary. Such a thermosetting resin composition can be formed by, for example, coating on a substrate 4 (having a surface having an easy adhesion layer), and then heating the thermosetting resin composition to heat-harden it to form a first Layer 1.
游離輻射硬化型樹脂組成物係以含有具有丙烯酸酯系的官能基的樹脂為佳。具有丙烯酸酯系官能基的樹脂可列舉例如比較的低分子量的多官能化合物之(甲基)丙烯酸酯等的寡聚物、預聚物等。前述多官能化合物可列舉聚酯樹脂、聚醚樹脂、丙烯酸樹脂、環氧樹脂、胺甲酸乙酯樹脂、醇酸樹脂、螺縮醛樹脂、聚丁二烯樹脂、聚硫醇聚烯樹脂、多元醇等。游離輻射硬化型樹脂組成物亦可進一步含有反應性稀釋劑。反應性稀釋劑可列舉(甲基)丙烯酸乙酯 、(甲基)丙烯酸乙基己酯、苯乙烯、甲基苯乙烯、N-乙烯基吡咯烷酮等的單官能單體,以及三羥甲基丙烷三(甲基)丙烯酸酯、(甲基)丙烯酸己二醇酯、三丙二醇二(甲基)丙烯酸酯、二乙二醇二(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯之多官能單體。 The free radiation curable resin composition is preferably a resin containing a functional group having an acrylate type. The resin having an acrylate functional group may, for example, be an oligomer or a prepolymer such as a (meth) acrylate of a comparative low molecular weight polyfunctional compound. Examples of the polyfunctional compound include a polyester resin, a polyether resin, an acrylic resin, an epoxy resin, an urethane resin, an alkyd resin, a acetal resin, a polybutadiene resin, a polythiol resin, and a polyvalent compound. Alcohol, etc. The free radiation curable resin composition may further contain a reactive diluent. The reactive diluent may, for example, be ethyl (meth)acrylate. a monofunctional monomer such as ethylhexyl (meth)acrylate, styrene, methylstyrene or N-vinylpyrrolidone, and trimethylolpropane tri(meth)acrylate or (meth)acrylic acid Hexanediol ester, tripropylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, pentaerythritol tri(meth)acrylate, dipentaerythritol hexa(meth)acrylate, 1,6- a polyfunctional monomer of hexanediol di(meth)acrylate or neopentyl glycol di(meth)acrylate.
在游離輻射硬化型樹脂組成物為紫外線硬化型樹脂組成物等的光硬化型樹脂組成物的情況,光硬化型樹脂組成物係以含有光聚合起始劑為佳。光聚合起始劑可列舉苯乙酮類、二苯基酮類、α-amyloxime酯、噻噸酮類等。光硬化型樹脂組成物中,除了光聚合起始劑之外還可含有光增感劑,或以其代替光聚合起始劑。光增感劑可列舉正丁胺、三乙胺、三正丁基膦、噻噸酮等。這種光硬化型樹脂組成物,可藉由例如塗佈於基材4上,接下來對此光硬化型樹脂組成物照射紫外線等的光使其光硬化而形成第一層1。 In the case where the free radiation curable resin composition is a photocurable resin composition such as an ultraviolet curable resin composition, the photocurable resin composition preferably contains a photopolymerization initiator. Examples of the photopolymerization initiator include acetophenones, diphenylketones, α-amyloxime esters, and thioxanthones. The photo-curable resin composition may contain a photo-sensitizer in addition to or in place of the photopolymerization initiator. Examples of the photosensitizer include n-butylamine, triethylamine, tri-n-butylphosphine, and thioxanthone. The photocurable resin composition can be applied to the substrate 4 by, for example, and then the photocurable resin composition is irradiated with light such as ultraviolet rays to be photocured to form the first layer 1.
第一層1的折射率可藉由用以形成第一層1的樹脂組成物的組成而輕易地調整。第一層1係含有折射率調整用粒子,並且可藉由調整其比例來調整第一層1的折射率。 The refractive index of the first layer 1 can be easily adjusted by the composition of the resin composition for forming the first layer 1. The first layer 1 contains particles for refractive index adjustment, and the refractive index of the first layer 1 can be adjusted by adjusting the ratio thereof.
折射率調整用粒子的粒徑要夠小,亦即折射率調整用粒子宜為所謂的超微粒子,此情況下,可充分維持第一層1的透光性。折射率調整用粒子的粒徑尤其以在0.5nm以上200nm以下的範圍為佳。此折射率調整用粒子的粒徑 ,是指具有與由粒子的電子顯微鏡照片影像計算出的投影面積相同面積的圓(面積等效圓)的直徑。折射率調整用粒子係以折射率較高的粒子為佳,尤其以折射率為1.6以上的粒子為佳。此粒子係以金屬或金屬氧化物的粒子為佳。 The particle diameter of the particles for refractive index adjustment is sufficiently small, that is, the particles for refractive index adjustment are preferably so-called ultrafine particles. In this case, the light transmittance of the first layer 1 can be sufficiently maintained. The particle diameter of the particles for refractive index adjustment is preferably in the range of 0.5 nm or more and 200 nm or less. Particle size of the refractive index adjusting particle Is the diameter of a circle (area equivalent circle) having the same area as the projected area calculated from the electron micrograph image of the particle. The particles for refractive index adjustment are preferably particles having a high refractive index, and particularly preferably particles having a refractive index of 1.6 or more. This particle is preferably a metal or metal oxide particle.
第一層1中的折射率調整用粒子的含量,可適當地調整以使第一層1的折射率成為適當的值,而尤其第一層1中的折射率調整用粒子的比例宜調整在5體積%以上70體積%以下。折射率調整用粒子的具體例可列舉含有選自鈦、鋁、鈰、釔、鋯、鈮、銻的一種或兩種以上的氧化物的粒子。氧化物的具體例可列舉ZnO(折射率1.90)、TiO2(折射率2.3~2.7)、CeO2(折射率1.95)、Sb2O5(折射率1.71)、SnO2(折射率1.8~2.0)、ITO(折射率1.95)、Y2O3(折射率1.87)、La2O3(折射率1.95)、ZrO2(折射率2.05)、Al2O3(折射率1.63)等。 The content of the refractive index adjusting particles in the first layer 1 can be appropriately adjusted so that the refractive index of the first layer 1 becomes an appropriate value, and in particular, the ratio of the refractive index adjusting particles in the first layer 1 is preferably adjusted. 5 vol% or more and 70 vol% or less. Specific examples of the particles for refractive index adjustment include particles containing one or two or more kinds of oxides selected from the group consisting of titanium, aluminum, lanthanum, cerium, zirconium, hafnium and ytterbium. Specific examples of the oxide include ZnO (refractive index 1.90), TiO 2 (refractive index: 2.3 to 2.7), CeO 2 (refractive index: 1.95), Sb 2 O 5 (refractive index: 1.71), and SnO 2 (refractive index: 1.8 to 2.0). ITO (refractive index 1.95), Y 2 O 3 (refractive index 1.87), La 2 O 3 (refractive index 1.95), ZrO 2 (refractive index 2.05), Al 2 O 3 (refractive index 1.63), and the like.
對第一層1賦予抗靜電性能亦為合適。此情況下,可抑制抗反射構件A的帶電,另外還可抑制塵埃附著在抗反射構件A。為了達到此目的,第一層1係以含有導電性粒子為佳。導電性粒子同時還可發揮出折射率調整用粒子的機能。導電性粒子係以奈米粒子為佳,尤其以粒徑為0.5nm以上200nm以下的超微粒子為佳。導電性粒子的粒徑亦為面積等效圓的直徑。導電性粒子的材質可列舉具有導電性的適當金屬、金屬氧化物等,具體而言可列舉選自銦、鋅、錫、銻的一種或兩種以上的金屬的氧化物,更具體而言,可列舉氧化銦(ITO)、氧化錫(SnO2)、銻/錫氧化 物(ATO)、鉛/鈦氧化物(PTO)、銻氧化物(Sb2O5)等。為了對第一層1賦予充分的抗靜電性能,宜含有導電性粒子,且第一層1的薄片電阻宜為1015Ω/sq.以下。第一層1之薄片電阻愈小,抗靜電性愈為提升,因此其下限並無特別設定,然而在縮小薄片電阻方面有極限,因此第一層1的薄片電阻的實質下限為106Ω/sq.。第一層1中的導電性粒子的含量可適當地調整以使第一層1的抗靜電性能成為適當的程度,而尤其以第一層1中的導電性粒子的比例調整成5質量%以上70質量%以下為佳。 It is also suitable to impart antistatic properties to the first layer 1. In this case, charging of the anti-reflection member A can be suppressed, and dust can be suppressed from adhering to the anti-reflection member A. In order to achieve this, the first layer 1 is preferably made of conductive particles. The conductive particles can also exhibit the function of the particles for refractive index adjustment. The conductive particles are preferably nanoparticles, and particularly preferably ultrafine particles having a particle diameter of 0.5 nm or more and 200 nm or less. The particle diameter of the conductive particles is also the diameter of the area equivalent circle. Examples of the material of the conductive particles include a suitable metal having conductivity, a metal oxide, and the like. Specific examples thereof include oxides of one or two or more kinds selected from the group consisting of indium, zinc, tin, and antimony. More specifically, Examples thereof include indium oxide (ITO), tin oxide (SnO 2 ), antimony/tin oxide (ATO), lead/titanium oxide (PTO), and antimony oxide (Sb 2 O 5 ). In order to impart sufficient antistatic property to the first layer 1, it is preferable to contain conductive particles, and the sheet resistance of the first layer 1 is preferably 10 15 Ω/sq. or less. The smaller the sheet resistance of the first layer 1 is, the more the antistatic property is improved, so the lower limit is not particularly set, but there is a limit in reducing the sheet resistance, so the practical lower limit of the sheet resistance of the first layer 1 is 10 6 Ω/ Sq. The content of the conductive particles in the first layer 1 can be appropriately adjusted so that the antistatic property of the first layer 1 is appropriate, and in particular, the ratio of the conductive particles in the first layer 1 is adjusted to 5% by mass or more. 70% by mass or less is preferred.
如先前所述般,第一層1亦可含有第一紫外線硬化型樹脂的硬化物,該第一紫外線硬化型樹脂係含有具有反應性有機官能基的烷氧矽烷及其部分水解聚合物之中的至少一種。為了達到此目的,在例如由紫外線硬化型樹脂組成物形成第一層1的情況,此紫外線硬化型樹脂組成物係以含有第一紫外線硬化型樹脂為佳。 As described above, the first layer 1 may further contain a cured product of a first ultraviolet curable resin containing an alkoxysilane having a reactive organic functional group and a partially hydrolyzed polymer thereof. At least one of them. In order to achieve this, in the case where the first layer 1 is formed of, for example, an ultraviolet curable resin composition, the ultraviolet curable resin composition preferably contains the first ultraviolet curable resin.
具有反應性有機官能基的烷氧矽烷中的反應性有機官能基,可列舉丙烯醯基、甲基丙烯醯基、縮水甘油基、異氰酸酯基等。具有反應性有機官能基的烷氧矽烷,可列舉3-甲基丙烯醯氧基丙基三甲氧基矽烷、3-甲基丙烯醯氧基丙基甲基二甲氧基矽烷、3-甲基丙烯醯氧基丙基三乙氧基矽烷、3-丙烯醯氧基丙基三甲氧基矽烷、3-丙烯醯氧基丙基甲基二甲氧基矽烷、3-縮水甘油醚基丙基三甲氧基矽烷、3-縮水甘油醚基丙基三乙氧基矽烷、3-異氰酸酯丙基三乙氧基矽烷、3-異氰酸酯丙基三乙氧基矽烷等。 Examples of the reactive organic functional group in the alkoxysilane having a reactive organic functional group include an acryloyl group, a methacryl fluorenyl group, a glycidyl group, and an isocyanate group. Examples of the alkoxydecane having a reactive organic functional group include 3-methylpropenyloxypropyltrimethoxydecane, 3-methylpropenyloxypropylmethyldimethoxydecane, and 3-methyl group. Propylene methoxypropyl triethoxy decane, 3-propenyl methoxy propyl trimethoxy decane, 3-propenyl methoxy propyl methyl dimethoxy decane, 3-glycidyl ether propyl trimethyl Oxaloxane, 3-glycidyl ether propyl triethoxy decane, 3-isocyanate propyl triethoxy decane, 3-isocyanate propyl triethoxy decane, and the like.
如先前所述般,在第一層1含有第一紫外線硬化型樹脂之硬化物的情況,第一紫外線硬化型樹脂中的烷氧矽烷及其部分水解聚合物相對於第一層1的比例係以3質量%以上為佳。此比例進一步以在5~10質量%的範圍為佳。此情況下,抗反射構件A的耐擦傷性進一步提升,另外,層間的密著性亦進一步提升。 As described above, in the case where the first layer 1 contains a cured product of the first ultraviolet curable resin, the ratio of the alkoxysilane and the partially hydrolyzed polymer thereof in the first ultraviolet curable resin to the first layer 1 is It is preferably 3% by mass or more. This ratio is further preferably in the range of 5 to 10% by mass. In this case, the scratch resistance of the anti-reflection member A is further improved, and the adhesion between the layers is further improved.
第二層2係由折射率高於第三層3的高折射率層所形成。第二層2的折射率在1.67以上1.80以下的範圍,且其厚度(實際膜厚)在100nm以上160nm以下的範圍。藉由將第二層2的折射率及厚度設定在如前述般的範圍,可抑制抗反射構件A的光反射性,且可將此來自抗反射構件A的反射光的色調整成適度的色調。若此第二層2的折射率大於前述範圍,則抗反射構件A的光反射性雖然較為減低,然而反射光的顏色變得過強,而為不佳。另外,若第二層2的厚度大於前述範圍,則來自抗反射構件A的反射光的顏色會帶有藍色,若此厚度變得更大,則抗反射構件A的反射率顯著增加,故為不佳。另外,若第二層2的厚度小於前述範圍,則反射色會帶有深紫色,故為不佳。 The second layer 2 is formed of a high refractive index layer having a higher refractive index than the third layer 3. The refractive index of the second layer 2 is in the range of 1.67 or more and 1.80 or less, and the thickness (actual film thickness) is in the range of 100 nm or more and 160 nm or less. By setting the refractive index and thickness of the second layer 2 in the range as described above, the light reflectivity of the anti-reflection member A can be suppressed, and the color of the reflected light from the anti-reflection member A can be adjusted to a moderate color tone. . If the refractive index of the second layer 2 is larger than the above range, the light reflectivity of the antireflection member A is reduced, but the color of the reflected light becomes too strong, which is not preferable. In addition, if the thickness of the second layer 2 is larger than the above range, the color of the reflected light from the anti-reflection member A may have a blue color, and if the thickness becomes larger, the reflectance of the anti-reflection member A is remarkably increased, Not good. Further, if the thickness of the second layer 2 is smaller than the above range, the reflected color will be dark purple, which is not preferable.
如上述般,若第二層2的厚度變大,則反射光會帶有藍色的傾向,而第二層2的厚度只要在100nm以上180nm以下的範圍,則反射光的顏色會充分接近白色。但 是,為了使反射光的顏色特別接近白色,此第二層2的厚度係以在如上述般100nm以上160nm以下的範圍為佳。此厚度如果在130nm以上160以下的範圍則更佳。 As described above, when the thickness of the second layer 2 is increased, the reflected light tends to have a blue color, and when the thickness of the second layer 2 is in the range of 100 nm or more and 180 nm or less, the color of the reflected light is sufficiently close to white. . but In order to make the color of the reflected light particularly close to white, the thickness of the second layer 2 is preferably in the range of 100 nm or more and 160 nm or less as described above. This thickness is more preferably in the range of 130 nm or more and 160 or less.
另外如先前所述般,在併用抗反射構件A與ITO膜的情況,為了使來自抗反射構件A的反射光來自與ITO膜的反射光重合而成的光線的顏色接近白色,第二層2的厚度係以在130nm以上180nm以下的範圍為佳。此厚度如果在160nm以上180nm以下的範圍則更佳。 Further, as described above, in the case where the antireflection member A and the ITO film are used in combination, in order to make the reflected light from the antireflection member A come from the reflected light of the ITO film, the color of the light is close to white, and the second layer 2 The thickness is preferably in the range of 130 nm or more and 180 nm or less. This thickness is more preferably in the range of 160 nm or more and 180 nm or less.
第二層2係以由反應性硬化型樹脂組成物所形成為佳,例如由熱硬化型樹脂組成物與游離輻射硬化型樹脂組成物之至少一者形成為佳。熱硬化型樹脂組成物係含有酚樹脂、尿素樹脂、酞酸二烯丙酯樹脂、三聚氰胺樹脂、不飽和聚酯樹脂、聚胺甲酸乙酯樹脂、環氧樹脂、胺基醇酸樹脂、矽樹脂、聚矽氧烷樹脂等的熱硬化性樹脂。熱硬化性樹脂亦可因應必要與交聯劑、聚合起始劑、硬化劑、硬化促進劑、溶劑等一起使用。 The second layer 2 is preferably formed of a reactive curable resin composition, and is preferably formed of, for example, at least one of a thermosetting resin composition and a free radiation curable resin composition. The thermosetting resin composition contains a phenol resin, a urea resin, a diallyl citrate resin, a melamine resin, an unsaturated polyester resin, a polyurethane resin, an epoxy resin, an amino alkyd resin, an anthracene resin. A thermosetting resin such as a polyoxyalkylene resin. The thermosetting resin may be used together with a crosslinking agent, a polymerization initiator, a curing agent, a hardening accelerator, a solvent, and the like as necessary.
游離輻射硬化型樹脂組成物係以含有具有丙烯酸酯系官能基的樹脂為佳。具有丙烯酸酯系官能基的樹脂,可列舉例如比較的低分子量的多官能化合物之(甲基)丙烯酸酯等的寡聚物、預聚物等。前述多官能化合物可列舉聚酯樹脂、聚醚樹脂、丙烯酸樹脂、環氧樹脂、胺甲酸乙酯樹脂、醇酸樹脂、螺縮醛樹脂、聚丁二烯樹脂、聚硫醇聚烯樹脂、多元醇等。游離輻射硬化型樹脂組成物亦可進一步含有反應性稀釋劑。反應性稀釋劑可列舉(甲基)丙烯酸乙酯 、(甲基)丙烯酸乙酯己酯、苯乙烯、甲基苯乙烯、N-乙烯基吡咯烷酮等的單官能單體,以及三羥甲基丙烷三(甲基)丙烯酸酯、己二醇(甲基)丙烯酸酯、三丙二醇二(甲基)丙烯酸酯、二乙二醇二(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯,1,6-己二醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯之多官能單體。 The free radiation curable resin composition is preferably a resin containing an acrylate functional group. The resin having an acrylate functional group may, for example, be an oligomer or a prepolymer such as a (meth) acrylate of a comparative low molecular weight polyfunctional compound. Examples of the polyfunctional compound include a polyester resin, a polyether resin, an acrylic resin, an epoxy resin, an urethane resin, an alkyd resin, a acetal resin, a polybutadiene resin, a polythiol resin, and a polyvalent compound. Alcohol, etc. The free radiation curable resin composition may further contain a reactive diluent. The reactive diluent may, for example, be ethyl (meth)acrylate. , monofunctional monomer such as ethyl (meth) acrylate, styrene, methyl styrene, N-vinyl pyrrolidone, and trimethylolpropane tri (meth) acrylate, hexane diol (A) Acrylate, tripropylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, pentaerythritol tri(meth)acrylate, dipentaerythritol hexa(meth)acrylate, 1,6- a polyfunctional monomer of hexanediol di(meth)acrylate or neopentyl glycol di(meth)acrylate.
在游離輻射硬化型樹脂組成物為紫外線硬化型樹脂組成物等的光硬化型樹脂組成物的情況,光硬化型樹脂組成物係以含有光聚合起始劑為佳。光聚合起始劑可列舉苯乙酮類、二苯酮類、α-amyloxime酯、噻噸酮類等。在光硬化型樹脂組成物中,除了光聚合起始劑之外還可含有光增感劑,或以其代替光聚合起始劑。光增感劑可列舉正丁胺、三乙胺、三正丁基膦、噻噸酮等。 In the case where the free radiation curable resin composition is a photocurable resin composition such as an ultraviolet curable resin composition, the photocurable resin composition preferably contains a photopolymerization initiator. Examples of the photopolymerization initiator include acetophenones, benzophenones, α-amyloxime esters, and thioxanthones. In the photocurable resin composition, a photo sensitizer may be contained in addition to or in place of the photopolymerization initiator. Examples of the photosensitizer include n-butylamine, triethylamine, tri-n-butylphosphine, and thioxanthone.
第二層2的折射率,可藉由用以形成第二層2的樹脂組成物的組成而輕易地調整。第二層2係含有折射率調整用粒子,並且可藉由調整其比例來調整第二層2的折射率。 The refractive index of the second layer 2 can be easily adjusted by the composition of the resin composition for forming the second layer 2. The second layer 2 contains particles for refractive index adjustment, and the refractive index of the second layer 2 can be adjusted by adjusting the ratio thereof.
折射率調整用粒子的粒徑要夠小,亦即折射率調整用粒子宜為所謂的超微粒子。此情況下,可充分維持第二層2的透光性。折射率調整用粒子的粒徑尤其以0.5nm以上200nm以下的範圍為佳。此折射率調整用粒子的粒徑,是指具有與由粒子的電子顯微鏡照片影像計算出的投影面積相同面積的圓(面積等效圓)的直徑。 The particle diameter of the particles for refractive index adjustment is sufficiently small, that is, the particles for refractive index adjustment are preferably so-called ultrafine particles. In this case, the light transmittance of the second layer 2 can be sufficiently maintained. The particle diameter of the particles for refractive index adjustment is preferably in the range of 0.5 nm or more and 200 nm or less. The particle diameter of the refractive index adjusting particles means a diameter having a circle (area equivalent circle) having the same area as the projected area calculated from the electron micrograph image of the particles.
折射率調整用粒子係以折射率較高的粒子為佳,尤其以折射率為1.6以上的粒子為佳。此粒子係以金屬或金屬氧化物的粒子為佳。 The particles for refractive index adjustment are preferably particles having a high refractive index, and particularly preferably particles having a refractive index of 1.6 or more. This particle is preferably a metal or metal oxide particle.
第二層2中的折射率調整用粒子的含量可適當地調整以使第二層2的折射率成為適當的值,而尤其以第二層2中的折射率調整用粒子的比例係以調整成5體積%以上70體積%以下為佳。 The content of the refractive index adjusting particles in the second layer 2 can be appropriately adjusted so that the refractive index of the second layer 2 becomes an appropriate value, and in particular, the ratio of the refractive index adjusting particles in the second layer 2 is adjusted. It is preferably 5% by volume or more and 70% by volume or less.
折射率調整用粒子的具體例可列舉含有選自鈦、鋁、鈰、釔、鋯、鈮、銻的一種或兩種以上的氧化物的粒子。氧化物的具體例可列舉ZnO(折射率1.90)、TiO2(折射率2.3~2.7)、CeO2(折射率1.95)、Sb2O5(折射率1.71)、SnO2(折射率1.8~2.0)、ITO(折射率1.95)、Y2O3(折射率1.87)、La2O3(折射率1.95)、ZrO2(折射率2.05)、Al2O3(折射率1.63)等。 Specific examples of the particles for refractive index adjustment include particles containing one or two or more kinds of oxides selected from the group consisting of titanium, aluminum, lanthanum, cerium, zirconium, hafnium and ytterbium. Specific examples of the oxide include ZnO (refractive index 1.90), TiO 2 (refractive index: 2.3 to 2.7), CeO 2 (refractive index: 1.95), Sb 2 O 5 (refractive index: 1.71), and SnO 2 (refractive index: 1.8 to 2.0). ITO (refractive index 1.95), Y 2 O 3 (refractive index 1.87), La 2 O 3 (refractive index 1.95), ZrO 2 (refractive index 2.05), Al 2 O 3 (refractive index 1.63), and the like.
第二層2係含有選自鈦、鋁、鈰、釔、鋯、鈮、銻的一種或兩種以上的氧化物的粒子,並且可含有甲基丙烯醯基官能性矽烷與丙烯醯基官能性矽烷之中的至少一者。此情況下,第二層2與第三層3的密著性提升。甲基丙烯醯基官能性矽烷,可列舉3-甲基丙烯醯氧基丙基三甲氧基矽烷、3-甲基丙烯醯氧基丙基甲基二甲氧基矽烷等。丙烯醯基官能性矽烷,可列舉3-丙烯醯氧基丙基三甲氧基矽烷、3-丙烯醯氧基丙基甲基二甲氧基矽烷等。 The second layer 2 contains particles of one or more oxides selected from the group consisting of titanium, aluminum, lanthanum, cerium, zirconium, lanthanum, cerium, and may contain methacryl oxime functional decane and acryl oxime functionality. At least one of decane. In this case, the adhesion between the second layer 2 and the third layer 3 is improved. Examples of the methacryl oxime functional decane include 3-methacryloxypropyltrimethoxydecane, 3-methylpropenyloxypropylmethyldimethoxydecane, and the like. Examples of the acryl-based functional decane include 3-propenyloxypropyltrimethoxydecane, 3-propenyloxypropylmethyldimethoxydecane, and the like.
第二層2中之甲基丙烯醯基官能性矽烷與丙烯醯基官能性矽烷的含量並不受特別限制,而以第二層2中之甲基 丙烯醯基官能性矽烷與丙烯醯基官能性矽烷的總量的比例在5質量%以上30質量%以下的範圍為佳。若前述比例為5質量%以上,則可充分提高第二層2與第三層3的密著性,另外,若前述比例在30質量%以下,則可充分提升第二層2中的交聯密度,並可充分提高第二層2的硬度。 The content of the methacryl fluorenyl functional decane and the acryl fluorenyl functional decane in the second layer 2 is not particularly limited, and the methyl group in the second layer 2 is not particularly limited. The ratio of the total amount of the acryl-based functional decane to the acryl-based functional decane is preferably in the range of 5 mass% or more and 30 mass% or less. When the ratio is 5% by mass or more, the adhesion between the second layer 2 and the third layer 3 can be sufficiently improved, and if the ratio is 30% by mass or less, the crosslinking in the second layer 2 can be sufficiently enhanced. The density and the hardness of the second layer 2 can be sufficiently increased.
在第二層2中與第一層1相反側的主面,係以在形成第三層3之前實施表面處理為佳。此情況下,可提升第二層2與第三層3之間的濕潤性、密著性等。表面處理的方法可列舉電漿處理、電暈放電處理、火焰處理等的物理的表面處理、利用偶合劑、酸、鹼的化學的表面處理等。 It is preferable that the main surface on the side opposite to the first layer 1 in the second layer 2 is subjected to surface treatment before forming the third layer 3. In this case, the wettability, the adhesion, and the like between the second layer 2 and the third layer 3 can be improved. Examples of the surface treatment include physical surface treatment such as plasma treatment, corona discharge treatment, and flame treatment, and chemical surface treatment using a coupling agent, an acid, and an alkali.
先前所述般,第二層2亦可含有第二紫外線硬化型樹脂的硬化物,該第二紫外線硬化型樹脂係含有具有反應性有機官能基的烷氧矽烷及其部分水解聚合物之中的至少一種。為了達到此目的,例如在由紫外線硬化型樹脂組成物形成第二層2的情況,此紫外線硬化型樹脂組成物係以含有第二紫外線硬化型樹脂為佳。 As described above, the second layer 2 may further contain a cured product of a second ultraviolet curable resin containing alkoxysilane having a reactive organic functional group and a partially hydrolyzed polymer thereof. At least one. In order to achieve this, for example, in the case where the second layer 2 is formed of the ultraviolet curable resin composition, the ultraviolet curable resin composition preferably contains the second ultraviolet curable resin.
具有反應性有機官能基的烷氧矽烷中的反應性有機官能基,可列舉丙烯醯基、甲基丙烯醯基、縮水甘油基、異氰酸酯基等。具有反應性有機官能基的烷氧矽烷,可列舉3-甲基丙烯醯氧基丙基三甲氧基矽烷、3-甲基丙烯醯氧基丙基甲基二甲氧基矽烷、3-甲基丙烯醯氧基丙基三乙氧基矽烷、3-丙烯醯氧基丙基三甲氧基矽烷、3-丙烯醯氧基丙基甲基二甲氧基矽烷、3-縮水甘油醚基丙基三甲氧基矽烷、3-縮水甘油醚基丙基三乙氧基矽烷、3-異氰酸酯丙基三 乙氧基矽烷、3-異氰酸酯丙基三乙氧基矽烷等。 Examples of the reactive organic functional group in the alkoxysilane having a reactive organic functional group include an acryloyl group, a methacryl fluorenyl group, a glycidyl group, and an isocyanate group. Examples of the alkoxydecane having a reactive organic functional group include 3-methylpropenyloxypropyltrimethoxydecane, 3-methylpropenyloxypropylmethyldimethoxydecane, and 3-methyl group. Propylene methoxypropyl triethoxy decane, 3-propenyl methoxy propyl trimethoxy decane, 3-propenyl methoxy propyl methyl dimethoxy decane, 3-glycidyl ether propyl trimethyl Oxydecane, 3-glycidyl ether propyl triethoxy decane, 3-isocyanate propyl three Ethoxy decane, 3-isocyanate propyl triethoxy decane, and the like.
如先前所述般,在第二層2含有第二紫外線硬化型樹脂的硬化物的情況,第二紫外線硬化型樹脂中的烷氧矽烷及其部分水解聚合物相對於第二層2的比例係以3質量%以上為佳。此比例進一步以在5~10質量%的範圍為佳。此情況下,抗反射構件A的耐擦傷性進一步提升,另外,層間的密著性亦進一步提升。 As described above, in the case where the second layer 2 contains a cured product of the second ultraviolet curable resin, the ratio of the alkoxysilane and the partially hydrolyzed polymer thereof in the second ultraviolet curable resin to the second layer 2 is It is preferably 3% by mass or more. This ratio is further preferably in the range of 5 to 10% by mass. In this case, the scratch resistance of the anti-reflection member A is further improved, and the adhesion between the layers is further improved.
第三層3的折射率係低於基材4、第一層1及第二層2之任一者的折射率。第三層3的折射率在1.30以上1.45以下的範圍,其厚度(實膜厚)在70nm以上110nm以下的範圍。 The refractive index of the third layer 3 is lower than the refractive index of any of the substrate 4, the first layer 1 and the second layer 2. The refractive index of the third layer 3 is in the range of 1.30 or more and 1.45 or less, and the thickness (solid film thickness) is in the range of 70 nm or more and 110 nm or less.
藉由將第三層3的折射率設定在如前述般的範圍,因為第一層1與第二層2的干涉作用,抗反射構件A的反射率會減低,進一步藉由將第三層3的厚度設定在如前述般的範圍,可適度地調整來自抗反射構件A的反射光的顏色。 By setting the refractive index of the third layer 3 to the range as described above, the reflectance of the anti-reflection member A is reduced due to the interference of the first layer 1 and the second layer 2, further by the third layer 3 The thickness is set in the range as described above, and the color of the reflected light from the anti-reflection member A can be appropriately adjusted.
第三層3的厚度如果在70nm以上130nm以下的範圍,則反射光的顏色會充分接近白色。但是,為了使反射光的顏色特別接近白色,此第三層3的厚度係以如上述般70nm以上110nm以下的範圍為佳。此厚度如果在70nm以上未滿80nm的範圍則更佳。 When the thickness of the third layer 3 is in the range of 70 nm or more and 130 nm or less, the color of the reflected light is sufficiently close to white. However, in order to make the color of the reflected light particularly close to white, the thickness of the third layer 3 is preferably in the range of 70 nm or more and 110 nm or less as described above. This thickness is more preferable if it is in the range of 70 nm or more and less than 80 nm.
另外,如先前所述般,在抗反射構件A與併用ITO 膜的情況中,為了使來自抗反射構件A的反射光來自與ITO膜的反射光重合而成的光線的顏色接近白色,第三層3的厚度係以在80nm以上130nm以下的範圍為佳。此厚度如果在110nm以上130nm以下的範圍則更佳。 In addition, as described previously, the anti-reflective member A and the combined ITO In the case of the film, in order to make the color of the light reflected from the antireflection member A from the reflected light of the ITO film close to white, the thickness of the third layer 3 is preferably in the range of 80 nm or more and 130 nm or less. This thickness is more preferably in the range of 110 nm or more and 130 nm or less.
第三層3係由例如含有黏結劑材料及因應必要所使用的折射率調整用粒子的組成物所形成。在黏結劑材料與折射率調整用粒子併用的情況,第三層3的折射率可藉由兩者的組合、摻合比等而適當地調整。 The third layer 3 is formed of, for example, a composition containing a binder material and particles for refractive index adjustment necessary for use. In the case where the binder material and the particles for refractive index adjustment are used in combination, the refractive index of the third layer 3 can be appropriately adjusted by a combination of the two, a blend ratio, and the like.
黏結劑材料可列舉以烷氧基矽系樹脂、飽和烴及聚醚之至少任一者為主鏈的聚合物(例如UV硬化型樹脂組成物、熱硬化型樹脂組成物等)、聚合物鏈中具有含氟原子的單元的樹脂等。 The binder material may be a polymer having at least one of an alkoxy fluorene-based resin, a saturated hydrocarbon, and a polyether as a main chain (for example, a UV-curable resin composition, a thermosetting resin composition, etc.), and a polymer chain. A resin or the like having a unit having a fluorine atom.
烷氧基矽系樹脂可列舉RmSi(OR')n所表示之烷氧基矽(R、R'為碳數1~10之烷基,m+n=4,m及n分別為整數)的部分水解縮合物的寡聚物及聚合物。烷氧基矽具體而言,可例示四甲氧基矽烷、四乙氧基矽烷、四異丙氧基矽烷、四正丙氧基矽烷、四正丁氧基矽烷、四第二丁氧基矽烷、四第三丁氧基矽烷、四-五乙氧基矽烷、四-五異丙氧基矽烷、四-五正丙氧基矽烷、四-五正丁氧基矽烷、四-五第二丁氧基矽烷、四-五第三丁氧基矽烷、甲基三甲氧基矽烷、甲基三乙氧基矽烷、甲基三丙氧基矽烷、甲基三丁氧基矽烷、二甲基二甲氧基矽烷、二甲基二乙氧基矽烷、二甲基乙氧基矽烷、二甲基甲氧基矽烷、二甲基丙氧基矽烷、二甲基丁氧基矽烷、甲基二甲氧基矽烷、甲基二 乙氧基矽烷、己基三甲氧基矽烷等。 The alkoxy fluorene-based resin may, for example, be an alkoxy fluorene represented by R m Si(OR') n (R, R' is an alkyl group having 1 to 10 carbon atoms, m + n = 4, and m and n are each an integer. An oligomer and a polymer of a partially hydrolyzed condensate. Specific examples of the alkoxy oxime include tetramethoxy decane, tetraethoxy decane, tetraisopropoxy decane, tetra-n-propoxy decane, tetra-n-butoxy decane, and tetra-butoxy decane. , tetra-butoxy decane, tetra-pentaethoxy decane, tetra-penta-isopropoxy decane, tetra-penta-propoxy decane, tetra-penta-n-butoxy decane, tetra-five second butyl Oxydecane, tetra-pentadecyloxydecane, methyltrimethoxydecane, methyltriethoxydecane, methyltripropoxydecane, methyltributoxydecane, dimethylformene Oxy decane, dimethyl diethoxy decane, dimethyl ethoxy decane, dimethyl methoxy decane, dimethyl propoxy decane, dimethyl butoxy decane, methyl dimethoxy Base decane, methyl diethoxy decane, hexyl trimethoxy decane, and the like.
黏結劑材料亦可採用具有可藉由熱或游離輻射進行反應而交聯的多個基團(聚合性雙鍵基等)的反應性有機矽化合物。此有機矽化合物之分子量係以5000以下為佳。這種反應性有機矽化合物,可列舉單末端乙烯基官能性聚矽烷、兩末端乙烯基官能性聚矽烷、單末端乙烯基官能聚矽氧烷、兩末端乙烯基官能性聚矽氧烷,以及使這些化合物反應所得到的乙烯基官能性聚矽烷及乙烯基官能性聚矽氧烷等。除了該等以外,反應性有機矽化合物還可列舉3-(甲基)丙烯醯氧基丙基三甲氧基矽烷、3-(甲基)丙烯醯氧基丙基甲基二甲氧基矽烷等的(甲基)丙烯醯氧基矽烷化合物。 As the binder material, a reactive organic hydrazine compound having a plurality of groups (polymerizable double bond groups or the like) which can be crosslinked by reaction with heat or free radiation can also be used. The molecular weight of the organic cerium compound is preferably 5,000 or less. Such a reactive organic hydrazine compound may, for example, be a mono-terminal vinyl functional polydecane, a two-terminal vinyl functional polydecane, a single-end vinyl functional polyoxyalkylene, a two-terminal vinyl functional polyoxyalkylene, and These compounds are reacted with a vinyl functional polydecane, a vinyl functional polyoxyalkylene or the like. In addition to these, examples of the reactive organic hydrazine compound include 3-(meth)acryloxypropyltrimethoxydecane, 3-(meth)acryloxypropylmethyldimethoxydecane, and the like. (Meth) propylene decyl decane compound.
折射率調整用粒子係以使用較低折射率的粒子為佳。折射率調整用粒子的材質可列舉二氧化矽、氟化鎂、氟化鋰、氟化鋁、氟化鈣、氟化鈉等。折射率調整用粒子係以含有中以空粒子為佳。中空粒子是指具有被外殼包圍的空洞的粒子。中空粒子的折射率係以1.20~1.45為佳。折射率調整用粒子,宜因應必要實施用以提升與黏結劑材料的濕潤性的表面處理。 The particles for refractive index adjustment are preferably particles having a lower refractive index. Examples of the material of the particles for refractive index adjustment include cerium oxide, magnesium fluoride, lithium fluoride, aluminum fluoride, calcium fluoride, and sodium fluoride. It is preferable that the particles for refractive index adjustment contain hollow particles in the middle. Hollow particles refer to particles having voids surrounded by an outer shell. The refractive index of the hollow particles is preferably from 1.20 to 1.45. For the particle for refractive index adjustment, it is desirable to carry out a surface treatment for improving the wettability with the binder material.
折射率調整用粒子的粒徑要夠小,亦即折射率調整用粒子宜為所謂的超微粒子。此情況下,可充分維持第三層3的透光性。折射率調整用粒子的粒徑尤其以在0.5nm~200nm的範圍為佳。此折射率調整用粒子的粒徑,是指具有與由粒子的電子顯微鏡照片影像計算出的投影面積相同 面積的圓(面積等效圓)的直徑。 The particle diameter of the particles for refractive index adjustment is sufficiently small, that is, the particles for refractive index adjustment are preferably so-called ultrafine particles. In this case, the light transmittance of the third layer 3 can be sufficiently maintained. The particle diameter of the particles for refractive index adjustment is preferably in the range of 0.5 nm to 200 nm. The particle diameter of the particle for refractive index adjustment means that it has the same projected area as that of the electron micrograph image of the particle. The diameter of the circle of the area (area equivalent circle).
第三層3中的折射率調整用粒子的含量可適當地調整以使第三層3的折射率值成為適當的值,而尤其以第三層3中的折射率調整用粒子的比例宜以調整成20~99體積%。 The content of the refractive index adjusting particles in the third layer 3 can be appropriately adjusted so that the refractive index value of the third layer 3 becomes an appropriate value, and in particular, the ratio of the refractive index adjusting particles in the third layer 3 is preferably Adjust to 20~99% by volume.
組成物亦可進一步含有撥水、撥油性材料。此情況下可對第三層3賦予防污性。撥水、撥油性材料可採用一般的蠟系材料等。尤其若使用含氟化合物,則第三層3的污垢,指紋等的清除性會特別提升,同時第三層3表面的摩擦阻力會減低,第三層3的耐磨耗性會提升。 The composition may further contain water-repellent and oil-repellent materials. In this case, the third layer 3 can be imparted with antifouling properties. For water-repellent and oil-repellent materials, general wax-based materials can be used. In particular, if a fluorine-containing compound is used, the dirtiness of the third layer 3, the fingerprint, and the like are particularly improved, and the frictional resistance of the surface of the third layer 3 is reduced, and the wear resistance of the third layer 3 is improved.
第三層3合適的形態,可例示由烷氧矽烷與具有氟碳骨架的烷氧矽烷的混合物的聚合物所構成且含有中空二氧化矽粒子者。此情況下,可得到確保低折射率或賦予防污性機能、賦予耐藥品性這些效果,而為合適。上述烷氧矽烷可例示聚甲氧基矽烷等。另外,具有氟碳骨架之烷氧矽烷可例示三甲氧基甲矽烷基十二氟己烷等。烷氧矽烷與具有氟碳骨架的烷氧矽烷的混合物,可藉由將具有氟碳骨架之烷氧矽烷以相對於烷氧矽烷100質量份而言為5~1900質量份的比例加以混合而調製。另外,烷氧矽烷與具有氟碳骨架之烷氧矽烷的混合物的聚合物,可藉由例如溶膠凝膠法等的聚合法而產生。烷氧矽烷與具有氟碳骨架的烷氧矽烷的混合物的聚合物的分子量係以500~3000為佳。另外,中空二氧化矽粒子與上述同樣地,折射率係以1.20~1.45為佳,粒徑係以0.5nm~200nm的範圍為佳。另外, 在第三層3中,以相對於烷氧矽烷與具有氟碳骨架的烷氧矽烷的混合物的聚合物100質量份而言含有中空二氧化矽粒子5~233質量份的比例為佳。 A suitable form of the third layer 3 is exemplified by a polymer composed of a mixture of an alkoxydecane and an alkoxysilane having a fluorocarbon skeleton and containing hollow cerium oxide particles. In this case, it is suitable to obtain an effect of ensuring a low refractive index or imparting antifouling properties and imparting chemical resistance. The alkoxydecane may, for example, be a polymethoxydecane or the like. Further, the alkoxydecane having a fluorocarbon skeleton may, for example, be trimethoxycarbamidyldodecylohexane or the like. A mixture of an alkoxydecane and an alkoxysilane having a fluorocarbon skeleton can be prepared by mixing alkoxysilane having a fluorocarbon skeleton in a ratio of 5 to 1900 parts by mass based on 100 parts by mass of the alkoxysilane. . Further, a polymer of a mixture of an alkoxydecane and an alkoxysilane having a fluorocarbon skeleton can be produced by a polymerization method such as a sol-gel method. The polymer of the mixture of alkoxy decane and alkoxy decane having a fluorocarbon skeleton preferably has a molecular weight of from 500 to 3,000. Further, the hollow ceria particles have a refractive index of preferably from 1.20 to 1.45 and a particle diameter of from 0.5 nm to 200 nm in the same manner as described above. In addition, In the third layer 3, a ratio of 5 to 233 parts by mass of the hollow cerium oxide particles is preferably contained in 100 parts by mass of the polymer of the mixture of the alkoxy decane and the alkoxy decane having a fluorocarbon skeleton.
第三層3可藉由將如上述般的組成物塗佈於第二層2上,進一步因應黏結劑材料的性狀對此組成物實施加熱、加濕、紫外線照射、電子束照射等的處理使其硬化而形成。 The third layer 3 can be applied to the second layer 2 by the above-described composition, and further, the composition can be subjected to heating, humidification, ultraviolet irradiation, electron beam irradiation or the like in accordance with the properties of the binder material. It is formed by hardening.
在基材4中與第一主面相反側的表面,係以層合防黏連層5為佳。亦即,防黏連層5係以層合在基材4中與層合第一層1的表面相反側的表面為佳。防黏連層5是在抗反射構件A捲繞成輥筒狀等而重疊的情況為了抑制黏連的發生或為了提升平滑性而形成。進一步而言,防黏連層5在抗反射構件A接著於某個構件(例如黏著性的層或丙烯酸系樹脂製膜等)而固定的情況,亦可利用來提升接著性。 It is preferable to laminate the anti-adhesion layer 5 on the surface of the substrate 4 opposite to the first main surface. That is, the anti-adhesion layer 5 is preferably laminated on the surface of the substrate 4 opposite to the surface on which the first layer 1 is laminated. The anti-adhesion layer 5 is formed so as to suppress the occurrence of adhesion or to improve the smoothness when the anti-reflection member A is wound into a roll shape or the like. Further, the anti-adhesion layer 5 may be used to improve the adhesion when the anti-reflection member A is fixed to a member (for example, an adhesive layer or an acrylic resin film).
為了抑制抗反射構件A的反射率因為防黏連層5的表面的界面反射而增加,防黏連層5的折射率希望為介於基材4的折射率與固定有抗反射構件A的構件的折射率之間的值,進一步防黏連層5的光學膜厚係以110~170nm為佳。為了達到此目的,防黏連層5的折射率係以1.45~1.65為佳。例如在基材4為折射率1.69的PET薄膜,抗反射構件A接著於折射率1.45~1.65的黏著層或 折射率1.45~1.65的丙烯酸系樹脂膜的情況,防黏連層5的折射率宜為1.62、光學膜厚宜為140nm。 In order to suppress the reflectance of the anti-reflection member A from increasing due to the interface reflection of the surface of the anti-adhesion layer 5, the refractive index of the anti-adhesion layer 5 is desirably a refractive index between the substrate 4 and a member to which the anti-reflection member A is fixed. The value between the refractive indices and the optical film thickness of the anti-adhesion layer 5 is preferably 110 to 170 nm. In order to achieve this, the refractive index of the anti-adhesion layer 5 is preferably from 1.45 to 1.65. For example, in the case where the substrate 4 is a PET film having a refractive index of 1.69, the anti-reflection member A is followed by an adhesive layer having a refractive index of 1.45 to 1.65 or In the case of the acrylic resin film having a refractive index of 1.45 to 1.65, the refractive index of the anti-adhesion layer 5 is preferably 1.62, and the optical film thickness is preferably 140 nm.
防黏連層5的材質並無限制,而宜為含有丙烯酸酯或聚胺酯-丙烯酸酯95質量%以上80質量%以下的範圍,進一步含有平均粒徑250nm的二氧化矽粒子5質量%以上20質量%以下的範圍。 The material of the anti-adhesion layer 5 is not limited, and is preferably in the range of 95% by mass or more and 80% by mass or less based on acrylate or polyurethane-acrylate, and further contains 5 mass% or more of 20% by mass of cerium oxide particles having an average particle diameter of 250 nm. % below the range.
在由本實施形態所得到的抗反射構件A中,在第一層1、第二層2、及第三層3的各反射光線會互相干涉而互相抵消,因此抗反射構件A全體的反射光的強度會顯著降低。 In the anti-reflection member A obtained in the present embodiment, the reflected light rays in the first layer 1, the second layer 2, and the third layer 3 interfere with each other and cancel each other, and therefore the reflected light of the entire anti-reflection member A is The intensity will be significantly reduced.
以往的抗反射薄膜,反射率會有波長依存性。一般而言認為光線在抗反射構件被反射的時,希望在人眼的敏感度最高的550nm附近的波長的反射率低。此情況下,在400~500nm(藍色)、或600~800nm(紅色)的波長的光線的反射率相對變高,因此反射色會帶有深紫色。 In the conventional antireflection film, the reflectance has a wavelength dependency. In general, when light is reflected by the antireflection member, it is desirable that the reflectance at a wavelength near 550 nm where the sensitivity of the human eye is the highest is low. In this case, the reflectance of light having a wavelength of 400 to 500 nm (blue) or 600 to 800 nm (red) is relatively high, and thus the reflected color is dark purple.
在本實施形態中,藉由使第二層2、及第三層3的折射率、膜厚最佳化,可使抗反射構件A的反射率的波長依存性降低,使反射色比以往更接近白色,且可實現低反射率。 In the present embodiment, by optimizing the refractive index and the film thickness of the second layer 2 and the third layer 3, the wavelength dependence of the reflectance of the anti-reflection member A can be lowered, and the reflection color can be made more than ever. It is close to white and can achieve low reflectivity.
在來自CIE所規定的標準C光源的光線入射至由本實施形態所得到的抗反射構件A的情況,穿透過抗反射構件A的透射光的顏色(透過色)之CIE 1976L*a*b*色空間 中的a*在-0.5以上0.0以下的範圍,b*在0.2以上0.8以下的範圍為佳。此情況下,穿透過抗反射構件A的透射光的顏色接近無色。此外,在來自CIE所規定的標準C光源的光線由第三層3的面入射至由本實施形態所得到的抗反射構件A的情況,來自抗反射構件A的反射光的顏色(反射色)之CIE 1976L*a*b*色空間中的a*宜為在0.0以上9.0以下的範圍,b*宜為在-9.0以上0.0以下的範圍。此情況下,反射光顏色接近白色,不會使視認性降低。 In the case where the light from the standard C light source defined by the CIE is incident on the anti-reflection member A obtained in the present embodiment, the color (transmissive color) of the transmitted light penetrating the anti-reflection member A is CIE 1976L*a*b* color. space Among them, a* is in the range of -0.5 or more and 0.0 or less, and b* is preferably in the range of 0.2 or more and 0.8 or less. In this case, the color of the transmitted light penetrating through the anti-reflection member A is nearly colorless. Further, in the case where the light from the standard C light source defined by the CIE is incident on the surface of the third layer 3 to the anti-reflection member A obtained in the present embodiment, the color (reflected color) of the reflected light from the anti-reflection member A is The a* in the CIE 1976L*a*b* color space is preferably in the range of 0.0 or more and 9.0 or less, and b* is preferably in the range of -9.0 or more and 0.0 or less. In this case, the color of the reflected light is close to white, and the visibility is not lowered.
特別是在第二層2的厚度設定在100nm以上160nm以下的範圍,第三層3的厚度設定在70nm以上110nm以下的範圍的情況,或第二層2的厚度設定在130nm以上160nm以下的範圍,第三層3的厚度設定在70μm以上未滿80μm的範圍的情況,以這樣的方式設定厚度的結果,如上述般透過色之a*宜為在-0.5以上0.0以下的範圍,b*宜為在0.2以上0.8以下的範圍,反射色a*宜為在0.0以上9.0以下的範圍,b*宜為在-9.0以上0.0以下的範圍。此情況下,反射光特別接近白色。 In particular, when the thickness of the second layer 2 is set to be in the range of 100 nm or more and 160 nm or less, the thickness of the third layer 3 is set to be in the range of 70 nm or more and 110 nm or less, or the thickness of the second layer 2 is set to be in the range of 130 nm or more and 160 nm or less. When the thickness of the third layer 3 is set to a range of 70 μm or more and less than 80 μm, the thickness is set in such a manner that, as described above, the transmission color a* is preferably in the range of -0.5 or more and 0.0 or less, b* is preferably In the range of 0.2 or more and 0.8 or less, the reflection color a* is preferably in the range of 0.0 or more and 9.0 or less, and b* is preferably in the range of -9.0 or more and 0.0 or less. In this case, the reflected light is particularly close to white.
另外,在第二層2的厚度設定在100nm以上180nm以下的範圍,第三層3的厚度設定在70nm以上130nm以下的範圍的情況,以這樣的方式設定厚度的結果,透過色之a*可在-0.5以上0.0以下的範圍,b*可在0.2以上0.8以下的範圍,反射色之a*可在-8.0以上9.0以下的範圍,b*可在-9.0以上3.0以下的範圍。此情況下,反射光也會充分接近白色。 Further, when the thickness of the second layer 2 is set to be in the range of 100 nm or more and 180 nm or less, and the thickness of the third layer 3 is set to be in the range of 70 nm or more and 130 nm or less, the thickness is set in such a manner that the transmission color a* can be used. In the range of -0.5 or more and 0.0 or less, b* may be in the range of 0.2 or more and 0.8 or less, a* of the reflection color may be in the range of -8.0 or more and 9.0 or less, and b* may be in the range of -9.0 or more and 3.0 or less. In this case, the reflected light will also be close to white.
另外,在第二層2的厚度設定在130nm以上180nm的範圍,第三層3的厚度設定在80nm以上130nm以下的範圍的情況,或第二層2的厚度設定在160nm以上180nm以下的範圍,第三層3的厚度設定在110nm以上130nm以下的範圍的情況,以這樣的方式設定厚度的結果,透過色之a*宜為在-0.5以上0.0以下的範圍,b*宜為在0.2以上0.8以下的範圍,反射色之a*宜為在-8.0以上2.0以下的範圍,b*宜為在-6.0以上3.0以下的範圍。此情況下,來自抗反射構件的反射光來自與ITO膜的反射光重合而成的光線的顏色非常接近白色。 Further, the thickness of the second layer 2 is set to be in the range of 130 nm or more and 180 nm, the thickness of the third layer 3 is set to be in the range of 80 nm or more and 130 nm or less, or the thickness of the second layer 2 is set to be in the range of 160 nm or more and 180 nm or less. When the thickness of the third layer 3 is set to be in the range of 110 nm or more and 130 nm or less, the thickness is set in such a manner that the a* of the transmission color is preferably in the range of -0.5 or more and 0.0 or less, and b* is preferably 0.2 or more and 0.8. In the following range, the a* of the reflection color is preferably in the range of -8.0 or more and 2.0 or less, and b* is preferably in the range of -6.0 or more and 3.0 or less. In this case, the color of the reflected light from the anti-reflection member from the reflected light of the ITO film is very close to white.
由本實施形態所得到的抗反射構件A藉由JIS K7361-1測得的全光線透過率亦可為94%以上,藉由JIS K7136測得的霧度亦可為0.9%以下,最小反射率亦可為0.5%以下,平均視感反射率亦可為0.7%以下。此情況下,抗反射構件A可發揮出優異的透光性、透明性、低反射性,並且發揮出抗反射的優異性能。最小反射率是指抗反射構件A在380~800nm的波長域的單色光線的反射率之中,在反射率最小的光線波長(最小反射率波長)下的反射率。另外,平均視感反射率是指藉由比視感度來校正在380~800nm的波長域的各波長的反射率,取平均而得之值。 The total light transmittance of the antireflection member A obtained by the present embodiment measured by JIS K7361-1 may be 94% or more, and the haze measured by JIS K7136 may be 0.9% or less, and the minimum reflectance may be It may be 0.5% or less, and the average visual reflectance may be 0.7% or less. In this case, the anti-reflection member A exhibits excellent light transmittance, transparency, and low reflectivity, and exhibits excellent performance against reflection. The minimum reflectance refers to the reflectance of the antireflection member A at the wavelength of the light having the smallest reflectance (minimum reflectance wavelength) among the reflectances of the monochromatic light in the wavelength range of 380 to 800 nm. In addition, the average visual reflectance is a value obtained by correcting the reflectance of each wavelength in the wavelength range of 380 to 800 nm by the specific sensitivities and averaging them.
在本實施形態中,可得到這種高性能的抗反射構件A。藉由將第一層1、第二層2、及第三層3各層的折射率及厚度設計成上述合適的範圍,可實現如前述般的高全光線透過率。另外,為了使霧度成為0.9%以下,在第二層2 含有無機粒子的情況以及在第三層3含有無機粒子的情況,此無機粒子的粒徑係以0.5μm以下為佳,並且基材4的霧度係以1.0%以下為佳。此外,在以基材4構成抗反射構件A的狀態,基材4的霧度只要在1.0%以下即可。例如即使因為在基材4的表面上有寡聚物粒子附著等的理由使得基材4單獨存在時的霧度為1.0%左右或高於此值,只要藉由在該基材4的表面上形成第一層1使得基材4的霧度成為1.0%以下,例如低達0.6%左右,即為合適。另外,藉由將第一層1、第二層2、及第三層3各層的折射率及厚度設計成上述適當的範圍,可實現如前述般的低最小反射率。 In the present embodiment, such a high-performance anti-reflection member A can be obtained. By designing the refractive indices and thicknesses of the respective layers of the first layer 1, the second layer 2, and the third layer 3 to the above-described appropriate ranges, high total light transmittance as described above can be achieved. In addition, in order to make the haze 0.9% or less, in the second layer 2 In the case of containing inorganic particles and the case where the third layer 3 contains inorganic particles, the particle diameter of the inorganic particles is preferably 0.5 μm or less, and the haze of the substrate 4 is preferably 1.0% or less. In addition, in the state in which the antireflection member A is formed of the base material 4, the haze of the base material 4 may be 1.0% or less. For example, even if the haze of the substrate 4 alone is about 1.0% or higher because of the adhesion of the oligomer particles on the surface of the substrate 4 or the like, as long as it is on the surface of the substrate 4 The first layer 1 is formed such that the haze of the substrate 4 becomes 1.0% or less, for example, as low as about 0.6%, which is suitable. Further, by designing the refractive indices and thicknesses of the respective layers of the first layer 1, the second layer 2, and the third layer 3 to the above-described appropriate ranges, the low minimum reflectance as described above can be achieved.
本發明兼具低反射率特性與中性的色調。亦即,已知以往一般的低反射率的抗反射構件(抗反射薄膜)的反射色會變強,色調變差。但是,本發明藉由第一層1、第二層2與第三層3這3層,可實現低反射率且中性的顏色(白色)。此外,實現低反射率且中性的顏色的方法進一步還有多層化之方法,然而會有製造成本大幅提高等的缺點,因此實用上不合適。 The present invention combines low reflectance characteristics with neutral hue. In other words, it is known that a conventional low-reflectance antireflection member (antireflection film) has a strong reflection color and a poor color tone. However, in the present invention, by the three layers of the first layer 1, the second layer 2, and the third layer 3, a low reflectance and a neutral color (white) can be realized. Further, the method of realizing a low reflectance and a neutral color has a method of multi-layering, but there is a disadvantage that the manufacturing cost is greatly improved, and thus it is practically unsuitable.
此外,「中性的色調」是指光線在抗反射構件A反射的情況,反射前後的光線的顏色不易發生色調的變化。 Further, the "neutral hue" refers to a case where light is reflected by the anti-reflection member A, and the color of the light before and after the reflection is less likely to change in hue.
由本實施形態所得到的抗反射構件A如上述般,可適用於影像顯示機器的抗反射用途。將具備由本實施形態 所得到的抗反射構件A的影像顯示機器6的例子的概略構成表示於圖2。 The anti-reflection member A obtained in the present embodiment can be applied to an anti-reflection application of an image display device as described above. Will be provided by this embodiment A schematic configuration of an example of the image display device 6 of the obtained anti-reflection member A is shown in Fig. 2 .
此影像顯示機器6為附觸控面板的影像顯示裝置,其係具備液晶顯示裝置等的影像顯示裝置7與觸控面板8。在圖2之中,觸控面板8係具有ITO透明電極9與透明黏著薄片層(OCA層)10交互層合的構成,而此為概略表示觸控面板8的構造之圖。在觸控面板8的最外層形成有由玻璃板或硬質樹脂薄膜等所構成之保護層11。 The image display device 6 is an image display device with a touch panel, and includes a video display device 7 such as a liquid crystal display device and a touch panel 8. In FIG. 2, the touch panel 8 has a configuration in which an ITO transparent electrode 9 and a transparent adhesive sheet layer (OCA layer) 10 are alternately laminated, and this is a view schematically showing the structure of the touch panel 8. A protective layer 11 made of a glass plate, a hard resin film, or the like is formed on the outermost layer of the touch panel 8.
由本實施形態所得到的抗反射構件A,被固定在此影像顯示機器6中的觸控面板8面向於影像顯示裝置7的表面上,此抗反射構件A的外面與影像顯示裝置7係藉由黏著膠帶12來固定。抗反射構件A配置成基材4中與第一層1相反側的主面面向於觸控面板8,第三層3中與第二層2相反側的主面面向於影像顯示裝置7。 The anti-reflection member A obtained in the present embodiment is fixed to the surface of the image display device 7 by the touch panel 8 fixed to the image display device 6. The outer surface of the anti-reflection member A and the image display device 7 are Adhesive tape 12 is fixed. The anti-reflection member A is disposed such that the main surface of the base material 4 opposite to the first layer 1 faces the touch panel 8, and the main surface of the third layer 3 opposite to the second layer 2 faces the image display device 7.
以這種方式構成的影像顯示機器6中,由影像顯示裝置7往觸控面板8照射的光線會因為抗反射構件A的作用而效率良好地入射至觸控面板8內,被觸控面板8反射的光線會變少。因此,影像顯示裝置7所表示的影像或映像會通過觸控面板8,能夠由外部清楚地視認。 In the image display device 6 configured in this manner, the light irradiated from the image display device 7 to the touch panel 8 is efficiently incident into the touch panel 8 by the action of the anti-reflection member A, and is touched by the touch panel 8. The reflected light will be less. Therefore, the image or image represented by the image display device 7 passes through the touch panel 8, and can be clearly seen from the outside.
來自抗反射構件A的反射光,與以往的抗反射薄膜的情況相比,色相接近白色,因此不會降低影像顯示機器6所顯示的影像等的視認性。 The reflected light from the anti-reflection member A has a hue close to white as compared with the case of the conventional anti-reflection film, and thus the visibility of an image or the like displayed by the image display device 6 is not lowered.
另外,在由外部對影像顯示機器6照射白色光等的光線,此光線在影像顯示機器6內被反射的情況,影像顯示 機器6所顯示的影像等的視認性也會變高。此情況下,影像顯示機器6所顯示的影像等的視認性,會大幅受到抗反射構件A中面向於影像顯示裝置7的表面的光線反射所影響,然而藉由與上述的情況同樣的機制,可減少由影像顯示裝置7反射至外部的反射光,藉此影像顯示機器6所顯示的影像等的視認性變高。 Further, when the image display device 6 is externally irradiated with light such as white light, the light is reflected in the image display device 6, and the image is displayed. The visibility of images and the like displayed by the machine 6 also becomes high. In this case, the visibility of the image displayed by the image display device 6 is greatly affected by the reflection of light reflected from the surface of the anti-reflection member A facing the image display device 7, but by the same mechanism as described above, The reflected light reflected from the image display device 7 to the outside can be reduced, whereby the visibility of the image displayed by the image display device 6 becomes high.
如圖2所示般,影像顯示機器6,可藉由將觸控面板8與影像顯示裝置7隔著空氣層13貼合而形成。於是,藉由將抗反射構件A貼在觸控面板8的下面,可防止空氣層13與觸控面板8的界面的光線反射。以這種方式,本發明之抗反射構件A主要可使用於安插在影像顯示機器6的內部例如觸控面板8的下面等的用途。此外還可考慮以透明黏著膠帶等消除埋在觸控面板8與影像顯示裝置7之間的空氣層之方法,然而在製造時氣泡容易混入,在7英吋以上的大畫面的情況中並未實用化。如圖2般,藉由將抗反射構件A貼在觸控面板8的下面,可實現與以透明黏著膠帶等消除空氣層的方法同等的低反射率。 As shown in FIG. 2, the image display device 6 can be formed by bonding the touch panel 8 and the image display device 7 via the air layer 13. Thus, by attaching the anti-reflection member A to the lower surface of the touch panel 8, light reflection at the interface between the air layer 13 and the touch panel 8 can be prevented. In this manner, the anti-reflection member A of the present invention can be mainly used for the purpose of being placed inside the image display device 6, for example, under the touch panel 8, and the like. Further, a method of removing an air layer buried between the touch panel 8 and the image display device 7 by a transparent adhesive tape or the like may be considered. However, bubbles are easily mixed during manufacture, and in the case of a large screen of 7 inches or more, Practical. As shown in FIG. 2, by attaching the anti-reflection member A to the lower surface of the touch panel 8, it is possible to achieve a low reflectance equivalent to a method of eliminating an air layer such as a transparent adhesive tape.
以下藉由實施例對本發明作具體說明。 The invention will be specifically described below by way of examples.
基材採用厚度100μm的聚酯薄膜(東洋紡績股份有限公司製Cosmoshine(註冊商標)「A4300」,易接著處理(兩 面),表面反射率5.1%)。在該聚酯薄膜經過易接著處理的一面上形成作為第一層的硬塗層。在形成硬塗層時,係將丙烯酸系紫外線硬化型樹脂(大日精化工業股份有限公司製「SEIKABEAM PET-HC301」,有效成分(固體成分)60質量%)以甲苯溶劑稀釋成30質量%,而得到硬塗層用的硬塗材料。將硬塗材料以線棒式塗佈機#10號塗佈在聚酯薄膜1上,使其在80℃下乾燥5分鐘之後,藉由UV照射(500mJ/cm2)使其硬化,而形成硬塗層。將此硬塗層的折射率與厚度揭示於後述表中。 The base material was a polyester film (Cosmoshine (registered trademark) "A4300" manufactured by Toyobo Co., Ltd., which was easily processed (both sides) and had a surface reflectance of 5.1%). A hard coat layer as a first layer is formed on the surface of the polyester film which is easily treated. In the case of forming a hard coat layer, an acrylic ultraviolet curable resin ("SEIKABEAM PET-HC301" manufactured by Dairi Seiki Co., Ltd., 60% by mass of active ingredient (solid content)) was diluted with a toluene solvent to 30% by mass. A hard coating material for a hard coat layer is obtained. The hard coat material was applied onto the polyester film 1 by a bar coater #10, dried at 80 ° C for 5 minutes, and then hardened by UV irradiation (500 mJ/cm 2 ) to form a hard coat material. Hard coating. The refractive index and thickness of this hard coat layer are disclosed in the table below.
接下來,在硬塗層上形成作為第二層的高折射率層。在形成高折射率層時,相對於丙烯酸系紫外線硬化型樹脂與高折射率粒子合計量,將丙烯酸系紫外線硬化型樹脂(大日精化工業股份有限公司製「SEIKABEAM MD-2 clear」,有效成分(固體成分)60質量%)60質量%,作為高折射率粒子的氧化鈦粒子(Tayca股份有限公司製「760T」,分散溶劑:甲苯,固體成分48質量%)40質量%加以混合,以甲苯溶劑稀釋成固體成分5質量%,而得到高折射率層材料。將高折射率材料以線棒式塗佈機#4號塗佈在硬塗層上,使其在80℃下乾燥5分鐘之後,藉由UV照射(500mJ/cm2)使其硬化,而形成高折射率層。將此高折射率層的折射率與厚度揭示於後述表中。 Next, a high refractive index layer as a second layer is formed on the hard coat layer. In the case of forming a high-refractive-index layer, the acrylic-based ultraviolet-curable resin (SEIKABEAM MD-2 clear) manufactured by Dairi Seiki Co., Ltd., is used as an active ingredient in the total amount of the acrylic ultraviolet-curable resin and the high-refractive-index particles. (solid content: 60% by mass) 60% by mass, and titanium oxide particles ("760T" manufactured by Tayca Co., Ltd., dispersing solvent: toluene, solid content: 48% by mass) of high refractive index particles are mixed at 40% by mass to be toluene The solvent was diluted to a solid content of 5% by mass to obtain a high refractive index layer material. The high refractive index material was coated on the hard coat layer by a wire bar coater #4, dried at 80 ° C for 5 minutes, and then hardened by UV irradiation (500 mJ/cm 2 ) to form High refractive index layer. The refractive index and thickness of this high refractive index layer are disclosed in the table below.
接下來,在高折射率層上形成作為第三層的低折射率層。在形成低折射率層時,將相對於低折射層材料總量的水解性烷氧矽烷(三菱化學股份有限公司製「MS56S」)0.6 質量%,中空二氧化矽微粒子溶膠(日揮觸媒化成股份有限公司製「CS60-IPA」,溶劑分散溶膠、固體成分20%)3.2質量%、0.1N硝酸4.6質量%、異丙醇89.6質量%、2-丁氧基乙醇20質量%加以混合,而得到低折射層材料。 Next, a low refractive index layer as a third layer is formed on the high refractive index layer. When a low refractive index layer is formed, a hydrolyzable alkoxysilane ("MS56S" manufactured by Mitsubishi Chemical Corporation) 0.6 relative to the total amount of the low refractive layer material is formed. % by mass, hollow cerium oxide microparticle sol ("CS60-IPA" manufactured by Nippon Chemical Co., Ltd., solvent-dispersed sol, solid content 20%) 3.2% by mass, 0.1 N nitric acid 4.6% by mass, and isopropanol 89.6 % by mass Further, 20% by mass of 2-butoxyethanol was mixed to obtain a material of a low refractive layer.
藉由線棒式塗佈機#4塗佈此低折射率層材料,而形成厚度100nm的塗膜,進一步在120℃放置1分鐘使其乾燥之後,在120℃、氧氣環境下對塗膜實施熱處理5分鐘。將此低折射率層的折射率與厚度揭示於後述表中。 The low refractive index layer material was applied by a bar coater #4 to form a coating film having a thickness of 100 nm, and further dried at 120 ° C for 1 minute, and then dried at 120 ° C in an oxygen atmosphere. Heat treatment for 5 minutes. The refractive index and thickness of this low refractive index layer are disclosed in the table below.
由以上的過程,可得到具有依序層合基材、硬塗層、高折射率層、及低折射率層的構造的抗反射構件。 From the above process, an antireflection member having a structure of a sequentially laminated base material, a hard coat layer, a high refractive index layer, and a low refractive index layer can be obtained.
基材採用與實施例1同樣的聚酯薄膜。 The same polyester film as in Example 1 was used as the substrate.
在該聚酯薄膜經過易接著處理的一面上形成作為第一層的硬塗層。在形成硬塗層時,將相對於丙烯酸系紫外線硬化型樹脂與二氧化矽粒子合計量的丙烯酸系紫外線硬化型樹脂(大日精化工業股份有限公司製「SEIKABEAM PET-HC301」,有效成分(固體成分)60質量%)50質量%、二氧化矽粒子(日產化學工業股份有限公司製「IPA-ST」,有效成分(固體成分)30質量%)50質量%加以混合,並以異丙醇溶劑稀釋成固體成分濃度30%,而得到硬塗層用的硬塗材料。將硬塗材料以線棒式塗佈機#10號塗佈在聚酯薄膜1上,使其在80℃下乾燥5分鐘之後,藉由UV照射(500mJ/cm2)使其硬化,而形成硬塗層。將此硬塗層的折 射率與厚度揭示於後述表中。 A hard coat layer as a first layer is formed on the surface of the polyester film which is easily treated. Acrylic ultraviolet curable resin (SEIKABEAM PET-HC301, manufactured by Daisei Seiki Co., Ltd.), which is an active ingredient (solid), is obtained by the combination of the acrylic ultraviolet curable resin and the cerium oxide particles. 60% by mass), 50% by mass, cerium oxide particles ("IPA-ST" manufactured by Nissan Chemical Co., Ltd., 30% by mass of active ingredient (solid content)), mixed with 50% by mass, and isopropyl alcohol solvent It was diluted to a solid concentration of 30% to obtain a hard coat material for a hard coat layer. The hard coat material was applied onto the polyester film 1 by a bar coater #10, dried at 80 ° C for 5 minutes, and then hardened by UV irradiation (500 mJ/cm 2 ) to form a hard coat material. Hard coating. The refractive index and thickness of this hard coat layer are disclosed in the table below.
接下來,在硬塗層上形成作為第二層的高折射率層。在形成高折射率層時,係以與實施例1同樣的方式進行。將此高折射率層的折射率與厚度揭示於後述表中。 Next, a high refractive index layer as a second layer is formed on the hard coat layer. When the high refractive index layer was formed, it was carried out in the same manner as in Example 1. The refractive index and thickness of this high refractive index layer are disclosed in the table below.
接下來,在高折射率層上形成作為第三層的低折射率層。在形成低折射率層時,係以與實施例1同樣的方式進行。將此低折射率層的折射率與厚度揭示於後述表中。 Next, a low refractive index layer as a third layer is formed on the high refractive index layer. When the low refractive index layer was formed, it was carried out in the same manner as in Example 1. The refractive index and thickness of this low refractive index layer are disclosed in the table below.
由以上的過程,可得到具有依序層合基材、硬塗層、高折射率層、及低折射率層的構造的抗反射構件。 From the above process, an antireflection member having a structure of a sequentially laminated base material, a hard coat layer, a high refractive index layer, and a low refractive index layer can be obtained.
基材採用與實施例1同樣的聚酯薄膜。 The same polyester film as in Example 1 was used as the substrate.
在該聚酯薄膜經過易接著處理的一面上形成作為第一層的硬塗層。在形成硬塗層時,將相對於丙烯酸系紫外線硬化型樹脂與氧化鈦粒子合計量的丙烯酸系紫外線硬化型樹脂(大日精化工業股份有限公司製「SEIKABEAM PET-HC301」,有效成分(固體成分)60質量%)85質量%、氧化鈦粒子(Tayca股份有限公司製「760T」、分散溶劑:甲苯、固體成分48質量%)15質量%加以混合,以甲苯溶劑稀釋成固體成分濃度30質量%,而得到硬塗層用的硬塗材料。將硬塗材料以線棒式塗佈機#10號塗佈在聚酯薄膜1上,使其在80℃下乾燥5分鐘之後,藉由UV照射(500mJ/cm2)使其硬化,而形成硬塗層。將此硬塗層的折射率與厚度揭示於後述表中。 A hard coat layer as a first layer is formed on the surface of the polyester film which is easily treated. In the case of forming a hard coat layer, an acrylic ultraviolet curable resin (SEIKABEAM PET-HC301) manufactured by Daisei Seiki Co., Ltd., and an active ingredient (solid content), which are combined with the acrylic ultraviolet curable resin and titanium oxide particles. 60% by mass of 85% by mass, and titanium oxide particles ("760T" manufactured by Tayca Co., Ltd., dispersing solvent: toluene, solid content: 48% by mass) were mixed at 15% by mass, and diluted with a toluene solvent to have a solid concentration of 30% by mass. And a hard coating material for a hard coat layer is obtained. The hard coat material was applied onto the polyester film 1 by a bar coater #10, dried at 80 ° C for 5 minutes, and then hardened by UV irradiation (500 mJ/cm 2 ) to form a hard coat material. Hard coating. The refractive index and thickness of this hard coat layer are disclosed in the table below.
接下來,在硬塗層上形成作為第二層的高折射率層。在形成高折射率層時,係以與實施例1同樣的方式進行。將此高折射率層的折射率與厚度揭示於後述表中。 Next, a high refractive index layer as a second layer is formed on the hard coat layer. When the high refractive index layer was formed, it was carried out in the same manner as in Example 1. The refractive index and thickness of this high refractive index layer are disclosed in the table below.
接下來,在高折射率層上形成作為第三層的低折射率層。在形成低折射率層時,係以與實施例1同樣的方式進行。將此低折射率層的折射率與厚度揭示於後述表中。 Next, a low refractive index layer as a third layer is formed on the high refractive index layer. When the low refractive index layer was formed, it was carried out in the same manner as in Example 1. The refractive index and thickness of this low refractive index layer are disclosed in the table below.
由以上的過程,可得到具有依序層合基材、硬塗層、高折射率層、及低折射率層的構造的抗反射構件。 From the above process, an antireflection member having a structure of a sequentially laminated base material, a hard coat layer, a high refractive index layer, and a low refractive index layer can be obtained.
基材採用與實施例1同樣的聚酯薄膜。 The same polyester film as in Example 1 was used as the substrate.
該聚酯薄膜經過易接著處理的一面上形成作為第一層的硬塗層。在形成硬塗層時,係以與實施例1同樣的方式進行。將此硬塗層的折射率與厚度揭示於後述表中。 The polyester film is formed as a hard coat layer as a first layer on the side which is easily treated. When the hard coat layer was formed, it was carried out in the same manner as in Example 1. The refractive index and thickness of this hard coat layer are disclosed in the table below.
接下來,在硬塗層上形成作為第二層的高折射率層。在形成高折射率層時,將相對於丙烯酸系紫外線硬化型樹脂與氧化鈦粒子合計量的丙烯酸系紫外線硬化型樹脂(大日精化工業股份有限公司製「SEIKABEAM MD-2 clear」,有效成分(固體成分)60質量%)70質量%、作為高折射率粒子的氧化鈦粒子(Tayca股份有限公司製「760T」,分散溶劑:甲苯,固體成分48質量%)30質量%加以混合,以甲苯溶劑稀釋成固體成分5質量%,而得到高折射率層材料。將高折射率材料以線棒式塗佈機#4號塗佈在硬塗層上,使其在80℃下乾燥5分鐘之後,藉由UV照射 (500mJ/cm2)使其硬化,而形成高折射率層。將此高折射率層的折射率與厚度揭示於後述表中。 Next, a high refractive index layer as a second layer is formed on the hard coat layer. In the case of forming a high refractive index layer, an acrylic ultraviolet curable resin ("SEIKABEAM MD-2 clear" manufactured by Daisei Seiki Co., Ltd.) is used as an active ingredient in the total amount of the acrylic ultraviolet curable resin and titanium oxide particles. 70% by mass of the titanium oxide particles ("760T" manufactured by Tayca Co., Ltd., dispersing solvent: toluene, solid content: 48% by mass) of 30% by mass of the high refractive index particles are mixed with a toluene solvent. The material was diluted to a solid content of 5% by mass to obtain a high refractive index layer material. The high refractive index material was coated on the hard coat layer by a wire bar coater #4, dried at 80 ° C for 5 minutes, and then hardened by UV irradiation (500 mJ/cm 2 ) to form High refractive index layer. The refractive index and thickness of this high refractive index layer are disclosed in the table below.
接下來,在高折射率層上形成作為第三層的低折射率層。在形成低折射率層時,係以與實施例1同樣的方式進行。將此低折射率層的折射率與厚度揭示於後述表中。 Next, a low refractive index layer as a third layer is formed on the high refractive index layer. When the low refractive index layer was formed, it was carried out in the same manner as in Example 1. The refractive index and thickness of this low refractive index layer are disclosed in the table below.
由以上的過程,可得到具有依序層合基材、硬塗層、高折射率層、及低折射率層的構造的抗反射構件。 From the above process, an antireflection member having a structure of a sequentially laminated base material, a hard coat layer, a high refractive index layer, and a low refractive index layer can be obtained.
基材採用與實施例1同樣的聚酯薄膜。 The same polyester film as in Example 1 was used as the substrate.
該聚酯薄膜經過易接著處理的一面上形成作為第一層的硬塗層。在形成硬塗層時,係以與實施例1同樣的方式進行。將此硬塗層的折射率與厚度揭示於後述表中。 The polyester film is formed as a hard coat layer as a first layer on the side which is easily treated. When the hard coat layer was formed, it was carried out in the same manner as in Example 1. The refractive index and thickness of this hard coat layer are disclosed in the table below.
接下來,在硬塗層上形成作為第二層的高折射率層。在形成高折射率層時,相對於將丙烯酸系紫外線硬化型樹脂與氧化鈦粒子合計量的丙烯酸系紫外線硬化型樹脂(大日精化工業股份有限公司製「SEIKABEAM MD-2 clear」,有效成分(固體成分)60質量%)30質量%、作為高折射率粒子的氧化鈦粒子(Tayca股份有限公司製「760T」,分散溶劑:甲苯,固體成分48質量%)70質量%加以混合,以甲苯溶劑稀釋成固體成分5質量%,而得到高折射率層材料。將高折射率材料以線棒式塗佈機#4號塗佈在硬塗層上,使其在80℃下乾燥5分鐘之後,藉由UV照射(500mJ/cm2)使其硬化,而形成高折射率層。將此高折射 率層的折射率與厚度揭示於後述表中。 Next, a high refractive index layer as a second layer is formed on the hard coat layer. In the case of forming a high-refractive-index layer, the acrylic-based ultraviolet curable resin (SEIKABEAM MD-2 clear) manufactured by Dainipis Seika Co., Ltd. is an active ingredient (for the total amount of the acrylic ultraviolet curable resin and the titanium oxide particles). 60% by mass of the titanium oxide particles ("760T" manufactured by Tayca Co., Ltd., dispersing solvent: toluene, solid content: 48% by mass) of 70% by mass of the high refractive index particles, and the mixture was mixed with toluene solvent. The material was diluted to a solid content of 5% by mass to obtain a high refractive index layer material. The high refractive index material was coated on the hard coat layer by a wire bar coater #4, dried at 80 ° C for 5 minutes, and then hardened by UV irradiation (500 mJ/cm 2 ) to form High refractive index layer. The refractive index and thickness of this high refractive index layer are disclosed in the table below.
接下來,在高折射率層上形成作為第三層的低折射率層。在形成低折射率層時,係以與實施例1同樣的方式進行。將此低折射率層的折射率與厚度揭示於後述表中。 Next, a low refractive index layer as a third layer is formed on the high refractive index layer. When the low refractive index layer was formed, it was carried out in the same manner as in Example 1. The refractive index and thickness of this low refractive index layer are disclosed in the table below.
由以上的過程,可得到具有依序層合基材、硬塗層、高折射率層、及低折射率層的構造的抗反射構件。 From the above process, an antireflection member having a structure of a sequentially laminated base material, a hard coat layer, a high refractive index layer, and a low refractive index layer can be obtained.
基材採用與實施例1同樣的聚酯薄膜。 The same polyester film as in Example 1 was used as the substrate.
該聚酯薄膜經過易接著處理的一面上形成作為第一層的硬塗層。在形成硬塗層時,係以與實施例1同樣的方式進行。將此硬塗層的折射率與厚度揭示於後述表中。 The polyester film is formed as a hard coat layer as a first layer on the side which is easily treated. When the hard coat layer was formed, it was carried out in the same manner as in Example 1. The refractive index and thickness of this hard coat layer are disclosed in the table below.
接下來,在硬塗層上形成作為第二層的高折射率層。在形成高折射率層時,除了將厚度定為100nm以外,係以與實施例1同樣的方式製作。將此高折射率層的折射率與厚度揭示於後述表中。 Next, a high refractive index layer as a second layer is formed on the hard coat layer. When the high refractive index layer was formed, it was produced in the same manner as in Example 1 except that the thickness was set to 100 nm. The refractive index and thickness of this high refractive index layer are disclosed in the table below.
接下來,在高折射率層上形成作為第三層的低折射率層。在形成低折射率層時,係以與實施例1同樣的方式進行。將此低折射率層的折射率與厚度揭示於後述表中。 Next, a low refractive index layer as a third layer is formed on the high refractive index layer. When the low refractive index layer was formed, it was carried out in the same manner as in Example 1. The refractive index and thickness of this low refractive index layer are disclosed in the table below.
由以上的過程,可得到具有依序層合基材、硬塗層、高折射率層、及低折射率層的構造的抗反射構件。 From the above process, an antireflection member having a structure of a sequentially laminated base material, a hard coat layer, a high refractive index layer, and a low refractive index layer can be obtained.
基材採用與實施例1同樣的聚酯薄膜。 The same polyester film as in Example 1 was used as the substrate.
該聚酯薄膜經過易接著處理的一面上形成作為第一層的硬塗層。在形成硬塗層時,係以與實施例1同樣的方式進行。將此硬塗層的折射率與厚度揭示於後述表中。 The polyester film is formed as a hard coat layer as a first layer on the side which is easily treated. When the hard coat layer was formed, it was carried out in the same manner as in Example 1. The refractive index and thickness of this hard coat layer are disclosed in the table below.
接下來,在硬塗層上形成作為第二層的高折射率層。在形成高折射率層時,除了將厚度定為160nm以外,係以與實施例1同樣的方式製作。將此高折射率層的折射率與厚度揭示於後述表中。 Next, a high refractive index layer as a second layer is formed on the hard coat layer. When the high refractive index layer was formed, it was produced in the same manner as in Example 1 except that the thickness was changed to 160 nm. The refractive index and thickness of this high refractive index layer are disclosed in the table below.
接下來,在高折射率層上形成作為第三層的低折射率層。在形成低折射率層時,係以與實施例1同樣的方式進行。將此低折射率層的折射率與厚度揭示於後述表中。 Next, a low refractive index layer as a third layer is formed on the high refractive index layer. When the low refractive index layer was formed, it was carried out in the same manner as in Example 1. The refractive index and thickness of this low refractive index layer are disclosed in the table below.
由以上的過程,可得到具有依序層合基材、硬塗層、高折射率層、及低折射率層的構造的抗反射構件。 From the above process, an antireflection member having a structure of a sequentially laminated base material, a hard coat layer, a high refractive index layer, and a low refractive index layer can be obtained.
基材採用與實施例1同樣的聚酯薄膜。 The same polyester film as in Example 1 was used as the substrate.
該聚酯薄膜經過易接著處理的一面上形成作為第一層的硬塗層。在形成硬塗層時,係以與實施例1同樣的方式進行。將此硬塗層的折射率與厚度揭示於後述表中。 The polyester film is formed as a hard coat layer as a first layer on the side which is easily treated. When the hard coat layer was formed, it was carried out in the same manner as in Example 1. The refractive index and thickness of this hard coat layer are disclosed in the table below.
接下來,在硬塗層上形成作為第二層的高折射率層。在形成高折射率層時,係以與實施例1同樣的方式進行。將此高折射率層的折射率與厚度揭示於後述表中。 Next, a high refractive index layer as a second layer is formed on the hard coat layer. When the high refractive index layer was formed, it was carried out in the same manner as in Example 1. The refractive index and thickness of this high refractive index layer are disclosed in the table below.
接下來,在高折射率層上形成作為第三層的低折射率層。在形成低折射率層時,將相對於低折射率層材料總量的水解性烷氧基甲矽烷基四氟化碳(Momentive股份有限 公司製「XC95-810」)0.4質量%、中空二氧化矽微粒子溶膠(日揮觸媒化成股份有限公司製「CS60-IPA」、異丙醇溶劑分散溶膠、固體成分20質量%)3.4質量%、0.1N硝酸4.6質量%、異丙醇89.6質量%、2-丁氧基乙醇2.0質量%加以混合,而得到低折射層材料。藉由線棒式塗佈機#4塗佈低折射率層材料,而形成厚度100nm的塗膜,進一步在120℃下放置1分鐘使其乾燥之後,在120℃、氧氣環境下對塗膜實施熱處理5分鐘。將此低折射率層的折射率與厚度揭示於後述表中。 Next, a low refractive index layer as a third layer is formed on the high refractive index layer. In the formation of the low refractive index layer, the hydrolyzable alkoxymethyl decyl carbon tetrafluoride relative to the total amount of the low refractive index layer material (Momentive shares limited) "XC95-810" manufactured by the company, 0.4 mass%, hollow cerium oxide microparticle sol ("CS60-IPA" manufactured by Nippon Chemical Co., Ltd., isopropyl alcohol solvent dispersion sol, solid content 20% by mass), 3.4% by mass, 0.1 N nitric acid 4.6% by mass, isopropyl alcohol 89.6% by mass, and 2-butoxyethanol 2.0% by mass were mixed to obtain a low refractive layer material. The low refractive index layer material was applied by a bar coater #4 to form a coating film having a thickness of 100 nm, and further dried at 120 ° C for 1 minute, and then dried at 120 ° C in an oxygen atmosphere. Heat treatment for 5 minutes. The refractive index and thickness of this low refractive index layer are disclosed in the table below.
由以上的過程,可得到具有依序層合基材、硬塗層、高折射率層、及低折射率層的構造的抗反射構件。 From the above process, an antireflection member having a structure of a sequentially laminated base material, a hard coat layer, a high refractive index layer, and a low refractive index layer can be obtained.
基材採用與實施例1同樣的聚酯薄膜。 The same polyester film as in Example 1 was used as the substrate.
在該聚酯薄膜經過易接著處理的一面上形成作為第一層的硬塗層。在形成硬塗層時,係以與實施例1同樣的方式進行。將此硬塗層的折射率與厚度揭示於後述表中。 A hard coat layer as a first layer is formed on the surface of the polyester film which is easily treated. When the hard coat layer was formed, it was carried out in the same manner as in Example 1. The refractive index and thickness of this hard coat layer are disclosed in the table below.
接下來,在硬塗層上形成作為第二層的高折射率層。在形成高折射率層時,係以與實施例1同樣的方式進行。將此高折射率層的折射率與厚度揭示於後述表中。 Next, a high refractive index layer as a second layer is formed on the hard coat layer. When the high refractive index layer was formed, it was carried out in the same manner as in Example 1. The refractive index and thickness of this high refractive index layer are disclosed in the table below.
接下來,在高折射率層上形成作為第三層的低折射率層。在形成低折射率層時,將相對於低折射層材料總量的水解性烷氧矽烷(三菱化學股份有限公司製「MS56S」)1.4質量%,中空二氧化矽微粒子溶膠(日揮觸媒化成股份有限 公司製「CS60-IPA」,溶劑分散溶膠,固體成分20質量%)2.4質量%、0.1N硝酸4.6質量%、異丙醇89.6質量%、2-丁氧基乙醇2.0質量%加以混合,而得到低折射層材料。藉由線棒式塗佈機#4塗佈低折射率層材料,而形成厚度100nm的塗膜,進一步在120℃下放置1分鐘使其乾燥之後,在120℃、氧氣環境下對塗膜實施熱處理5分鐘。將此低折射率層的折射率與厚度揭示於後述表中。 Next, a low refractive index layer as a third layer is formed on the high refractive index layer. When the low refractive index layer is formed, the hydrolyzable alkane ("MS56S" manufactured by Mitsubishi Chemical Corporation) is 1.4% by mass based on the total amount of the material of the low refractive layer, and the hollow cerium oxide microparticle sol is converted into a stock. limited Company company "CS60-IPA", solvent-dispersed sol, solid content 20% by mass) 2.4% by mass, 0.1 N nitric acid 4.6% by mass, isopropanol 89.6 mass%, and 2-butoxyethanol 2.0% by mass were mixed. Low refractive layer material. The low refractive index layer material was applied by a bar coater #4 to form a coating film having a thickness of 100 nm, and further dried at 120 ° C for 1 minute, and then dried at 120 ° C in an oxygen atmosphere. Heat treatment for 5 minutes. The refractive index and thickness of this low refractive index layer are disclosed in the table below.
由以上的過程,可得到具有依序層合基材、硬塗層、高折射率層、及低折射率層的構造的抗反射構件。 From the above process, an antireflection member having a structure of a sequentially laminated base material, a hard coat layer, a high refractive index layer, and a low refractive index layer can be obtained.
基材採用與實施例1同樣的聚酯薄膜。 The same polyester film as in Example 1 was used as the substrate.
該聚酯薄膜經過易接著處理的一面上形成作為第一層的硬塗層。在形成硬塗層時,係以與實施例1同樣的方式進行。將此硬塗層的折射率與厚度揭示於後述表中。 The polyester film is formed as a hard coat layer as a first layer on the side which is easily treated. When the hard coat layer was formed, it was carried out in the same manner as in Example 1. The refractive index and thickness of this hard coat layer are disclosed in the table below.
接下來,在硬塗層上形成作為第二層的高折射率層。在形成高折射率層時,係以與實施例1同樣的方式進行。將此高折射率層的折射率與厚度揭示於後述表中。 Next, a high refractive index layer as a second layer is formed on the hard coat layer. When the high refractive index layer was formed, it was carried out in the same manner as in Example 1. The refractive index and thickness of this high refractive index layer are disclosed in the table below.
接下來,在高折射率層上形成作為第三層的低折射率層。低折射率層的形成,除了將厚度定為70nm以外,係以與實施例1同樣的方式進行。將此低折射率層的折射率與厚度揭示於後述表中。 Next, a low refractive index layer as a third layer is formed on the high refractive index layer. The formation of the low refractive index layer was carried out in the same manner as in Example 1 except that the thickness was changed to 70 nm. The refractive index and thickness of this low refractive index layer are disclosed in the table below.
由以上的過程,可得到具有依序層合基材、硬塗層、高折射率層、及低折射率層的構造的抗反射構件。 From the above process, an antireflection member having a structure of a sequentially laminated base material, a hard coat layer, a high refractive index layer, and a low refractive index layer can be obtained.
基材採用與實施例1同樣的聚酯薄膜。 The same polyester film as in Example 1 was used as the substrate.
該聚酯薄膜經過易接著處理的一面上形成作為第一層的硬塗層。在形成硬塗層時,係以與實施例1同樣的方式進行。將此硬塗層的折射率與厚度揭示於後述表中。 The polyester film is formed as a hard coat layer as a first layer on the side which is easily treated. When the hard coat layer was formed, it was carried out in the same manner as in Example 1. The refractive index and thickness of this hard coat layer are disclosed in the table below.
接下來,在硬塗層上形成作為第二層的高折射率層。在形成高折射率層時,係以與實施例1同樣的方式進行。將此高折射率層的折射率與厚度揭示於後述表中。 Next, a high refractive index layer as a second layer is formed on the hard coat layer. When the high refractive index layer was formed, it was carried out in the same manner as in Example 1. The refractive index and thickness of this high refractive index layer are disclosed in the table below.
接下來,在高折射率層上形成作為第三層的低折射率層。低折射率層的形成,除了將厚度定為110nm以外,係以與實施例1同樣的方式進行。將此低折射率層的折射率與厚度揭示於後述表中。 Next, a low refractive index layer as a third layer is formed on the high refractive index layer. The formation of the low refractive index layer was carried out in the same manner as in Example 1 except that the thickness was set to 110 nm. The refractive index and thickness of this low refractive index layer are disclosed in the table below.
由以上的過程,可得到具有依序層合基材、硬塗層、高折射率層、及低折射率層的構造的抗反射構件。 From the above process, an antireflection member having a structure of a sequentially laminated base material, a hard coat layer, a high refractive index layer, and a low refractive index layer can be obtained.
基材採用與實施例1同樣的聚酯薄膜。 The same polyester film as in Example 1 was used as the substrate.
在該聚酯薄膜經過易接著處理的一面上形成防黏連層。在形成防黏連層時,藉由摻合丙烯酸系紫外線硬化型樹脂(大日精化工業股份有限公司製,型號PET-HC301,固體成分60質量%)與二氧化矽粒子(CIK Nanotek股份有限公司製,型號SIRMIBK15WT%-H24,平均粒徑50nm),使二氧化矽粒子的比例(固體成分換算)成為相對於丙烯酸 系紫外線硬化型樹脂與二氧化矽粒子合計量為15質量%,並將該等混合,而得到紫外線硬化型之樹脂組成物。藉由將樹脂組成物以線棒式塗佈機#10號塗佈在基材上,然後在80℃下加熱5分鐘使其乾燥,接下來以500mJ/cm2的條件照射紫外線使其硬化。 An anti-blocking layer is formed on the surface of the polyester film which is easily treated. When an anti-blocking layer is formed, an acrylic ultraviolet curable resin (manufactured by Dairi Seiki Co., Ltd., model PET-HC301, solid content: 60% by mass) and cerium oxide particles (CIK Nanotek Co., Ltd.) are blended. The amount of the cerium oxide particles (in terms of the solid content) is 15% by mass based on the total amount of the acrylic ultraviolet curable resin and the cerium oxide particles, and the amount of the cerium oxide particles is 15% by mass. The mixture was mixed to obtain an ultraviolet curable resin composition. The resin composition was applied onto a substrate by a bar coater #10, and then dried by heating at 80 ° C for 5 minutes, and then irradiated with ultraviolet rays under conditions of 500 mJ/cm 2 to be cured.
該聚酯薄膜經過易接著處理的一面(並未形成防黏連層的一面)上形成作為第一層的硬塗層。在形成硬塗層時,係以與實施例1同樣的方式進行。將此硬塗層的折射率與厚度揭示於後述表中。 The polyester film was formed as a hard coat layer as a first layer on the side which was easily treated (the side on which the anti-blocking layer was not formed). When the hard coat layer was formed, it was carried out in the same manner as in Example 1. The refractive index and thickness of this hard coat layer are disclosed in the table below.
接下來,在硬塗層上形成作為第二層的高折射率層。在形成高折射率層時,係以與實施例1同樣的方式進行。將此高折射率層的折射率與厚度揭示於後述表中。 Next, a high refractive index layer as a second layer is formed on the hard coat layer. When the high refractive index layer was formed, it was carried out in the same manner as in Example 1. The refractive index and thickness of this high refractive index layer are disclosed in the table below.
接下來,在高折射率層上形成作為第三層的低折射率層。在形成低折射率層時,係以與實施例1同樣的方式進行。將此低折射率層的折射率與厚度揭示於後述表中。 Next, a low refractive index layer as a third layer is formed on the high refractive index layer. When the low refractive index layer was formed, it was carried out in the same manner as in Example 1. The refractive index and thickness of this low refractive index layer are disclosed in the table below.
由以上的過程,防黏連層、得到具有依序層合基材、硬塗層、高折射率層、及低折射率層的構造的抗反射構件。 From the above process, the anti-blocking layer was obtained, and an anti-reflection member having a structure of a sequential laminated substrate, a hard coat layer, a high refractive index layer, and a low refractive index layer was obtained.
基材採用與實施例1同樣的聚酯薄膜。 The same polyester film as in Example 1 was used as the substrate.
該聚酯薄膜經過易接著處理的一面上形成作為第一層的硬塗層。在形成硬塗層時,藉由摻合丙烯酸系紫外線硬化型樹脂(大日精化工業股份有限公司製「SEIKABEAM PET-HC301」,有效成分(固體成分)60質量%)97質量份、甲基丙烯醯氧基矽烷(信越化學工業股份有限公司製,3-甲基丙烯醯氧基丙基三甲氧基矽烷、型號KBM-503)3質量份,而得到硬塗層用的硬塗材料。將硬塗材料以線棒式塗佈機#10號塗佈在聚酯薄膜1上,使其在80℃下乾燥5分鐘之後,藉由UV照射(500mJ/cm2)使其硬化,而形成硬塗層。將此硬塗層的折射率與厚度揭示於後述表中。 The polyester film is formed as a hard coat layer as a first layer on the side which is easily treated. In the case of forming a hard coat layer, an acrylic ultraviolet curable resin (SEIKABEAM PET-HC301, manufactured by Dairi Seiki Co., Ltd., active ingredient (solid content) 60% by mass), 97 parts by mass, methacryl 3 parts by mass of decyloxydecane (manufactured by Shin-Etsu Chemical Co., Ltd., 3-methacryloxypropyltrimethoxydecane, model KBM-503) was obtained to obtain a hard coat material for a hard coat layer. The hard coat material was applied onto the polyester film 1 by a bar coater #10, dried at 80 ° C for 5 minutes, and then hardened by UV irradiation (500 mJ/cm 2 ) to form a hard coat material. Hard coating. The refractive index and thickness of this hard coat layer are disclosed in the table below.
接下來,在硬塗層上形成作為第二層的高折射率層。在形成高折射率層時,藉由摻合丙烯酸系紫外線硬化型樹脂(大日精化工業股份有限公司製「SEIKABEAM MD-2 clear」,有效成分(固體成分)60質量%)60質量份、作為高折射率粒子的氧化鈦粒子(Tayca股份有限公司製「760T」、分散溶劑:甲苯,固體成分48質量%)40質量份、甲基丙烯醯氧基矽烷(信越化學工業股份有限公司製,3-甲基丙烯醯氧基丙基三甲氧基矽烷,型號KBM-503)3質量份,得到高折射率層材料。將高折射率材料以線棒式塗佈機#4號塗佈在硬塗層上,使其在80℃下乾燥5分鐘之後,藉由UV照射(500mJ/cm2)使其硬化,而形成高折射率層。將此高折射率層的折射率與厚度揭示於後述表中。 Next, a high refractive index layer as a second layer is formed on the hard coat layer. In the case of forming a high refractive index layer, 60 parts by mass of an active ingredient (solid content) (60% by mass) of "acrylic ultraviolet curable resin (SEIKABEAM MD-2 clear" manufactured by Dairi Seiki Co., Ltd.) is blended. Titanium oxide particles of high refractive index particles ("760T" manufactured by Tayca Co., Ltd., dispersing solvent: toluene, solid content: 48% by mass) 40 parts by mass, methacryloxydecane (manufactured by Shin-Etsu Chemical Co., Ltd., 3) -Methyl propylene methoxy propyl trimethoxy decane, model KBM-503) 3 parts by mass to obtain a high refractive index layer material. The high refractive index material was coated on the hard coat layer by a wire bar coater #4, dried at 80 ° C for 5 minutes, and then hardened by UV irradiation (500 mJ/cm 2 ) to form High refractive index layer. The refractive index and thickness of this high refractive index layer are disclosed in the table below.
接下來,在高折射率層上形成作為第三層的低折射率層。在形成低折射率層時,將相對於低折射層材料總量的水解性烷氧矽烷(三菱化學股份有限公司製「MS56S」)0.6質量%、中空二氧化矽微粒子溶膠(日揮觸媒化成股份有限公司製「CS60-IPA」、溶劑分散溶膠、固體成分20%)3.2 質量%、0.1N硝酸4.6質量%、異丙醇89.6質量%、2-丁氧基乙醇2.0質量%加以混合,而得到低折射層材料。藉由線棒式塗佈機#4塗佈低折射率層材料,而形成厚度100nm的塗膜,進一步在120℃下放置1分鐘使其乾燥之後,在120℃、氧氣環境下對塗膜實施熱處理5分鐘。將此低折射率層的折射率與厚度揭示於後述表中。 Next, a low refractive index layer as a third layer is formed on the high refractive index layer. When the low refractive index layer is formed, the hydrolyzable alkoxysilane ("MS56S" manufactured by Mitsubishi Chemical Corporation) is 0.6% by mass of the total amount of the material of the low refractive layer, and the hollow cerium oxide microparticle sol is formed. Co., Ltd. "CS60-IPA", solvent dispersion sol, solid content 20%) 3.2 The mass%, 0.1 N nitric acid 4.6% by mass, isopropyl alcohol 89.6% by mass, and 2-butoxyethanol 2.0% by mass were mixed to obtain a low refractive layer material. The low refractive index layer material was applied by a bar coater #4 to form a coating film having a thickness of 100 nm, and further dried at 120 ° C for 1 minute, and then dried at 120 ° C in an oxygen atmosphere. Heat treatment for 5 minutes. The refractive index and thickness of this low refractive index layer are disclosed in the table below.
由以上的過程,可得到具有依序層合基材、硬塗層、高折射率層、及低折射率層的構造的抗反射構件。 From the above process, an antireflection member having a structure of a sequentially laminated base material, a hard coat layer, a high refractive index layer, and a low refractive index layer can be obtained.
在實施例13之中,使第一層、第二層及第三層形成,其厚度如後述表所揭示般。藉此得到具有依序層合基材、硬塗層、高折射率層、及低折射率層的構造的抗反射構件。 In the thirteenth embodiment, the first layer, the second layer and the third layer were formed, and the thickness thereof was as disclosed in the table below. Thereby, an antireflection member having a structure of a sequentially laminated base material, a hard coat layer, a high refractive index layer, and a low refractive index layer was obtained.
基材採用與實施例1同樣的聚酯薄膜。 The same polyester film as in Example 1 was used as the substrate.
在此基材經過易接著處理的一面上形成作為第一層的硬塗層。在形成硬塗層時,將丙烯酸系紫外線硬化型樹脂(大日精化工業股份有限公司製「SEIKABEAM PET-HC301」,有效成分(固體成分)60質量%)以甲苯溶劑稀釋成30質量%,而得到硬塗層用的硬塗材料。將硬塗材料以線棒式塗佈機#10號塗佈在聚酯薄膜1上,使其在80℃下乾燥5分鐘之後,藉由UV照射(500mJ/cm2)使其硬化,而形成 硬塗層。將此硬塗層的折射率與厚度揭示於後述表中。 A hard coat layer as a first layer is formed on the substrate which is subjected to an easy-to-treat treatment. In the case of forming a hard coat layer, an acrylic ultraviolet curable resin ("SEIKABEAM PET-HC301" manufactured by Dairi Seiki Co., Ltd., 60% by mass of active ingredient (solid content)) was diluted with a toluene solvent to 30% by mass. A hard coat material for a hard coat layer is obtained. The hard coat material was applied onto the polyester film 1 by a bar coater #10, dried at 80 ° C for 5 minutes, and then hardened by UV irradiation (500 mJ/cm 2 ) to form a hard coat material. Hard coating. The refractive index and thickness of this hard coat layer are disclosed in the table below.
接下來,藉由與實施例13的情況相同的手段,而形成高折射率層及低折射率層。 Next, a high refractive index layer and a low refractive index layer were formed by the same means as in the case of Example 13.
將此高折射率層及低折射率層的折射率與厚度揭示於後述表中。 The refractive index and thickness of the high refractive index layer and the low refractive index layer are disclosed in the table below.
由以上的過程,可得到具有依序層合基材、硬塗層、高折射率層、及低折射率層的構造的抗反射構件。 From the above process, an antireflection member having a structure of a sequentially laminated base material, a hard coat layer, a high refractive index layer, and a low refractive index layer can be obtained.
基材採用與實施例1同樣的聚酯薄膜。 The same polyester film as in Example 1 was used as the substrate.
在此基材經過易接著處理的一面上以與實施例13~16相同的手段形成硬塗層。將此硬塗層的折射率與厚度揭示於後述表中。 A hard coat layer was formed on the substrate which was subjected to the easy-to-treat treatment in the same manner as in Examples 13 to 16. The refractive index and thickness of this hard coat layer are disclosed in the table below.
接下來,在硬塗層上以與實施例1相同的手段形成高折射率層。將此高折射率層的折射率與厚度揭示於後述表中。 Next, a high refractive index layer was formed on the hard coat layer in the same manner as in Example 1. The refractive index and thickness of this high refractive index layer are disclosed in the table below.
接下來,以與實施例13~16相同的手段形成低折射率層。將此低折射率層的折射率與厚度揭示於後述表中。 Next, a low refractive index layer was formed in the same manner as in Examples 13 to 16. The refractive index and thickness of this low refractive index layer are disclosed in the table below.
由以上的過程,可得到具有依序層合基材、硬塗層、高折射率層、及低折射率層的構造的抗反射構件。 From the above process, an antireflection member having a structure of a sequentially laminated base material, a hard coat layer, a high refractive index layer, and a low refractive index layer can be obtained.
基材採用與實施例1同樣的聚酯薄膜。 The same polyester film as in Example 1 was used as the substrate.
在此基材經過易接著處理的一面上以與實施例13~ 16相同的手段依序形成硬塗層及高折射率層。將此硬塗層及高折射率層的折射率與厚度揭示於後述表中。 On the side of the substrate that is easily processed, and the embodiment 13~ 16 The same means sequentially forms a hard coat layer and a high refractive index layer. The refractive index and thickness of the hard coat layer and the high refractive index layer are disclosed in the table below.
接下來,在高折射率層上形成作為第三層的低折射率層。低折射率層的形成,係藉由摻合含氟丙烯酸酯(共榮社化學股份有限公司製「LINC-3A」,有效成分(固體成分)100質量%)57質量份、中空二氧化矽微粒子溶膠(日揮觸媒化成股份有限公司製「CS60-IPA」、溶劑分散溶膠、固體成分20%)40質量份、光聚合起始劑(BASF股份有限公司製「IRGACURE184」,有效成分(固體成分)100質量%)3質量份,而得到低折射率層材料。藉由線棒式塗佈機#4塗佈此低折射率層材料,而形成塗膜,進一步在120℃放置1分鐘,並使其乾燥之後,在120℃、氧氣環境下對塗膜實施熱處理5分鐘。將此低折射率層的折射率與厚度揭示於後述表中。 Next, a low refractive index layer as a third layer is formed on the high refractive index layer. The low-refractive-index layer is formed by blending fluorine-containing acrylate ("LINC-3A" manufactured by Kyoeisha Chemical Co., Ltd., active ingredient (solid content) 100% by mass), 57 parts by mass, hollow cerium oxide microparticles. 40 parts by mass of a sol ("CS60-IPA", a solvent-dispersed sol, a solid component of 20%) manufactured by Nippon Chemical Co., Ltd., and a photopolymerization initiator (IRGACURE 184, manufactured by BASF Corporation), active ingredient (solid content) 100% by mass) 3 parts by mass to obtain a low refractive index layer material. The low refractive index layer material was applied by a wire bar coater #4 to form a coating film, which was further allowed to stand at 120 ° C for 1 minute, and dried, and then heat treated at 120 ° C in an oxygen atmosphere. 5 minutes. The refractive index and thickness of this low refractive index layer are disclosed in the table below.
由以上的過程,可得到具有依序層合基材、硬塗層、高折射率層、及低折射率層的構造的抗反射構件。 From the above process, an antireflection member having a structure of a sequentially laminated base material, a hard coat layer, a high refractive index layer, and a low refractive index layer can be obtained.
在實施例13之中,藉由調整形成第一層、第二層及第三層各層所需的材料中的成分的摻合比例,將第一層、第二層及第三層各層的折射率調整成如後述表所示般。另外,將第一層、第二層及第三層各層的厚度調整成如後述表所示般。 In Embodiment 13, the refraction of the first layer, the second layer, and the third layer is performed by adjusting the blending ratio of the components in the materials required to form the first layer, the second layer, and the third layer. The rate is adjusted as shown in the table below. Further, the thicknesses of the respective layers of the first layer, the second layer, and the third layer are adjusted as shown in the following table.
另外,與實施例12的情況同樣的方式形成防黏連 層。 Further, anti-adhesion was formed in the same manner as in the case of Example 12. Floor.
由以上的過程,可得到防黏連層、具有依序層合基材、硬塗層、高折射率層、及低折射率層的構造的抗反射構件。 From the above process, an anti-reflection member having an anti-adhesion layer, a structure having a sequential laminated substrate, a hard coat layer, a high refractive index layer, and a low refractive index layer can be obtained.
基材採用與實施例1同樣的聚酯薄膜。 The same polyester film as in Example 1 was used as the substrate.
該聚酯薄膜經過易接著處理的一面上形成作為第一層的硬塗層。在形成硬塗層時,係以與實施例1同樣的方式進行。將此硬塗層的折射率與厚度揭示於後述表中。 The polyester film is formed as a hard coat layer as a first layer on the side which is easily treated. When the hard coat layer was formed, it was carried out in the same manner as in Example 1. The refractive index and thickness of this hard coat layer are disclosed in the table below.
接下來,在硬塗層上形成作為第二層的高折射率層。在形成高折射率層時,除了將厚度定為83nm以外,係以與實施例1同樣的方式進行。將此高折射率層的折射率與厚度揭示於後述表中。 Next, a high refractive index layer as a second layer is formed on the hard coat layer. When the high refractive index layer was formed, the same procedure as in Example 1 was carried out except that the thickness was set to 83 nm. The refractive index and thickness of this high refractive index layer are disclosed in the table below.
接下來,在高折射率層上形成作為第三層的低折射率層。低折射率層的形成,除了將厚度定為100nm以外,係以與實施例1同樣的方式進行。將此低折射率層的折射率與厚度揭示於後述表中。 Next, a low refractive index layer as a third layer is formed on the high refractive index layer. The formation of the low refractive index layer was carried out in the same manner as in Example 1 except that the thickness was set to 100 nm. The refractive index and thickness of this low refractive index layer are disclosed in the table below.
由以上的過程,可得到具有依序層合基材、硬塗層、高折射率層、及低折射率層的構造的抗反射構件。 From the above process, an antireflection member having a structure of a sequentially laminated base material, a hard coat layer, a high refractive index layer, and a low refractive index layer can be obtained.
基材採用與實施例1同樣的聚酯薄膜。 The same polyester film as in Example 1 was used as the substrate.
該聚酯薄膜經過易接著處理的一面上形成作為第一層 的硬塗層。在形成硬塗層時,係以與實施例1同樣的方式進行。將此硬塗層的折射率與厚度揭示於後述表中。 The polyester film is formed as a first layer on the easy-to-handle side Hard coating. When the hard coat layer was formed, it was carried out in the same manner as in Example 1. The refractive index and thickness of this hard coat layer are disclosed in the table below.
接下來,在硬塗層上形成作為第二層的高折射率層。在形成高折射率層時,將相對於丙烯酸系紫外線硬化型樹脂與高折射率粒子合計量的丙烯酸系紫外線硬化型樹脂(大日精化工業股份有限公司製「SEIKABEAM MD-2 clear」,有效成分(固體成分)60質量%)75質量%、作為高折射率粒子的氧化鈦粒子(Tayca股份有限公司製「760T」,分散溶劑:甲苯、固體成分48質量%)25質量%加以混合,並以甲苯溶劑稀釋成固體成分5質量%,而得到高折射率層材料。將高折射率材料以線棒式塗佈機#4號塗佈在硬塗層上,使其在80℃下乾燥5分鐘之後,藉由UV照射(500mJ/cm2)使其硬化,而形成高折射率層。將此高折射率層的折射率與厚度揭示於後述表中。 Next, a high refractive index layer as a second layer is formed on the hard coat layer. In the case of forming a high-refractive-index layer, an acrylic ultraviolet-curable resin (SEIKABEAM MD-2 clear) manufactured by Daisei Seiki Co., Ltd., is used as an active ingredient in combination with an acrylic ultraviolet curable resin and high refractive index particles. (solid content: 60% by mass) of 75 mass%, and titanium oxide particles ("760T" manufactured by Tayca Co., Ltd., dispersing solvent: toluene, solid content: 48% by mass) of high refractive index particles are mixed at 25 mass%, and The toluene solvent was diluted to a solid content of 5% by mass to obtain a high refractive index layer material. The high refractive index material was coated on the hard coat layer by a wire bar coater #4, dried at 80 ° C for 5 minutes, and then hardened by UV irradiation (500 mJ/cm 2 ) to form High refractive index layer. The refractive index and thickness of this high refractive index layer are disclosed in the table below.
接下來,在高折射率層上形成作為第三層的低折射率層。在形成低折射率層時,係以與實施例1同樣的方式進行。將此低折射率層的折射率與厚度揭示於後述表中。 Next, a low refractive index layer as a third layer is formed on the high refractive index layer. When the low refractive index layer was formed, it was carried out in the same manner as in Example 1. The refractive index and thickness of this low refractive index layer are disclosed in the table below.
由以上的過程,可得到具有依序層合基材、硬塗層、高折射率層、及低折射率層的構造的抗反射構件。 From the above process, an antireflection member having a structure of a sequentially laminated base material, a hard coat layer, a high refractive index layer, and a low refractive index layer can be obtained.
基材採用與實施例1同樣的聚酯薄膜。 The same polyester film as in Example 1 was used as the substrate.
在該聚酯薄膜經過易接著處理的一面上形成作為第一層的硬塗層。在形成硬塗層時,係以與實施例1同樣的方 式進行。將此硬塗層的折射率與厚度揭示於後述表中。 A hard coat layer as a first layer is formed on the surface of the polyester film which is easily treated. When the hard coat layer is formed, the same method as in the first embodiment is used. To proceed. The refractive index and thickness of this hard coat layer are disclosed in the table below.
接下來,在硬塗層上形成作為第二層的高折射率層。在形成高折射率層時,將相對於丙烯酸系紫外線硬化型樹脂與高折射率粒子合計量的丙烯酸系紫外線硬化型樹脂(大日精化工業股份有限公司製「SEIKABEAM MD-2 clear」,有效成分(固體成分)60質量%)22質量%、作為高折射率粒子的氧化鈦粒子(Tayca股份有限公司製「760TC,分散溶劑:甲苯、固體成分48質量%)78質量%加以混合,以甲苯溶劑稀釋成固體成分5質量%,而得到高折射率層材料。將高折射率材料以線棒式塗佈機#4號塗佈在硬塗層上,使其在80℃下乾燥5分鐘之後,藉由UV照射(500mJ/cm2)使其硬化,而形成高折射率層。將此高折射率層的折射率與厚度揭示於後述表中。 Next, a high refractive index layer as a second layer is formed on the hard coat layer. In the case of forming a high-refractive-index layer, an acrylic ultraviolet-curable resin (SEIKABEAM MD-2 clear) manufactured by Daisei Seiki Co., Ltd., is used as an active ingredient in combination with an acrylic ultraviolet curable resin and high refractive index particles. (solid content: 60% by mass), 22% by mass, and titanium oxide particles ("760TC, dispersion solvent: toluene, solid content: 48% by mass") of high refractive index particles, 78% by mass, and mixed with toluene solvent Diluted into a solid content of 5% by mass to obtain a high refractive index layer material. The high refractive index material was coated on a hard coat layer by a bar coater #4, and dried at 80 ° C for 5 minutes. The high refractive index layer was formed by hardening by UV irradiation (500 mJ/cm 2 ), and the refractive index and thickness of the high refractive index layer are disclosed in the following table.
接下來,在高折射率層上形成作為第三層的低折射率層。在形成低折射率層時,係以與實施例1同樣的方式進行。將此低折射率層的折射率與厚度揭示於後述表中。 Next, a low refractive index layer as a third layer is formed on the high refractive index layer. When the low refractive index layer was formed, it was carried out in the same manner as in Example 1. The refractive index and thickness of this low refractive index layer are disclosed in the table below.
由以上的過程,可得到具有依序層合基材、硬塗層、高折射率層、及低折射率層的構造的抗反射構件。 From the above process, an antireflection member having a structure of a sequentially laminated base material, a hard coat layer, a high refractive index layer, and a low refractive index layer can be obtained.
在實施例13之中,使第一層、第二層及第三層形成,其厚度如後述表所揭示。藉此得到具有依序層合基材、硬塗層、高折射率層、及低折射率層的構造的抗反射構件。 In the thirteenth embodiment, the first layer, the second layer and the third layer were formed, and the thickness thereof was as disclosed in the following table. Thereby, an antireflection member having a structure of a sequentially laminated base material, a hard coat layer, a high refractive index layer, and a low refractive index layer was obtained.
關於上述各實施例及各比較例的抗反射構件,針對以下的項目作評估。 The antireflection members of the above respective examples and comparative examples were evaluated for the following items.
使用霧度計(日本電色工業股份有限公司製,型號NDH2000),測定各抗反射構件的霧度。 The haze of each antireflection member was measured using a haze meter (manufactured by Nippon Denshoku Industries Co., Ltd., model NDH2000).
使用霧度計(日本電色工業股份有限公司製,型號NDH2000)測定各抗反射構件的全光線透過率。 The total light transmittance of each of the anti-reflection members was measured using a haze meter (manufactured by Nippon Denshoku Industries Co., Ltd., model NDH2000).
使用分光光度計[日立HighTechnologies股份有限公司製,型號U-4100),測定各抗反射構件在380~800nm的波長域的光線的反射率。以此為基礎,導出反射率成為最小時的光線波長(最小反射率波長)、及在最小反射率波長下的光線反射率。 The reflectance of light rays in the wavelength range of 380 to 800 nm of each antireflection member was measured using a spectrophotometer [manufactured by Hitachi HighTechnologies Co., Ltd., model U-4100). Based on this, the wavelength of the light (the minimum reflectance wavelength) at which the reflectance becomes minimum and the reflectance of the light at the minimum reflectance wavelength are derived.
將各抗反射構件的背面塗黑,且測定裝置採用分光光度計(日立HighTechnologies股份有限公司製,型號U-4100),光源採用C光源,基於JIS R3106測定5°的正反射的分光反射率。藉此由所得到的結果導出平均視感反射率。 The back surface of each of the anti-reflection members was blackened, and a measuring apparatus was used with a spectrophotometer (manufactured by Hitachi High-Technologies Co., Ltd., model U-4100), and a light source was used as a light source, and a spectral reflectance of positive reflection of 5° was measured based on JIS R3106. Thereby, the average visual reflectance is derived from the obtained results.
使來自CIE所規定的標準C光源的光線由低折射率層側入射至各抗反射構件,對於穿透過抗反射構件的透射光的顏色之CIE 1976L*a*b*色空間中的a*及b*,藉由Konica-Minolta股份有限公司製分光測色計,型號CM3600D作測定。 Light from a standard C light source specified by the CIE is incident from the low refractive index layer side to each of the anti-reflection members, and a* in the CIE 1976 L*a*b* color space for the color of the transmitted light penetrating the anti-reflection member b*, measured by a spectrophotometer manufactured by Konica-Minolta Co., Ltd., model CM3600D.
使來自CIE所規定的標準C光源的光線由低折射率層側入射至各抗反射構件。此情況下,對於來自抗反射構件的10°視野的反射光的顏色之CIE 1976L*a*b*色空間中的L*、a*及b*,藉由Konica-Minolta股份有限公司製分光測色計,型號CM3600D作測定。 Light from a standard C light source defined by the CIE is incident on each of the anti-reflection members from the side of the low refractive index layer. In this case, L*, a*, and b* in the CIE 1976L*a*b* color space of the color of the reflected light from the anti-reflection member in the 10° field of view are measured by Konica-Minolta Co., Ltd. Color meter, model CM3600D for measurement.
另外,基於由此導出的L*、a*及b*計算出色差(=((L*)2+(a*)2+(b*)2)1/2)。 In addition, the excellent difference (=((L*) 2 +(a*) 2 +(b*) 2 ) 1/2 )) is calculated based on L*, a*, and b* derived therefrom.
此外,此色差之值愈小,光線的色調愈可評為中性。 In addition, the smaller the value of this color difference, the more the tone of the light can be rated as neutral.
準備ITO薄膜,其係由厚度為20nm的ITO膜與重疊於其上且厚度為188μm的PET製薄膜所構成。藉由丙烯酸系黏著劑將此ITO薄膜貼合在各抗反射構件的基材上。 An ITO film was prepared which was composed of an ITO film having a thickness of 20 nm and a PET film having a thickness of 188 μm superposed thereon. This ITO film was bonded to the substrate of each antireflection member by an acrylic adhesive.
使來自CIE所規定的標準C光源的光線由低折射率層側入射至此重疊有ITO膜的抗反射構件。此情況下,對於來自抗反射構件的10°視野的反射光的顏色之CIE 1976L*a*b*色空間中的L*、a*及b*,藉由Konica-Minolta股份有限公司製分光測色計,型號CM3600D作測定。 Light from a standard C light source defined by the CIE was incident from the low refractive index layer side to the antireflection member on which the ITO film was superposed. In this case, the CIE of the color of the reflected light from the 10° field of view of the anti-reflection member L*, a*, and b* in the 1976 L*a*b* color space were measured by a spectrophotometer manufactured by Konica-Minolta Co., Ltd., model CM3600D.
另外,基於由此導出的L*、a*及b*計算出色差(:((L*)2+(a*)2+(b*)2)1/2)。 In addition, the excellent difference (:((L*) 2 +(a*) 2 +(b*) 2 ) 1/2 ) is calculated based on L*, a*, and b* derived therefrom.
使用表面性測試機(Type14FW,新東科學股份有限公司製),在抗反射構件的低折射率層上,以250g的荷重按壓鋼絲絨#0000,同時以此鋼絲絨#0000摩擦低折射率層的表面10次。接下來,以目視觀察低折射率層的表面有無擦傷。其結果,將觀察到顯著擦傷的情況評為"A"、並未觀察到顯著擦傷的情況評為"B"。 Using a surface tester (Type 14FW, manufactured by Shinto Scientific Co., Ltd.), steel wool #0000 was pressed on the low refractive index layer of the antireflection member with a load of 250 g, and the low refractive index layer was rubbed with the steel wool #0000. The surface is 10 times. Next, the surface of the low refractive index layer was visually observed for scratches. As a result, the case where the significant scratch was observed was evaluated as "A", and the case where no significant scratch was observed was evaluated as "B".
將各抗反射構件配置於溫度85℃濕度85%的恆溫恆濕槽72小時。接下來,依據JIS D0202:1988對於各抗反射構件進行棋盤格膠帶剝離測試。黏著膠帶採用Nichiban股份有限公司製玻璃紙膠帶CT24。此測試的結果,將並未發生剝離的情況評為"A"、將發生剝離的情況評為"B"。 Each of the anti-reflection members was placed in a constant temperature and humidity chamber at a temperature of 85 ° C and a humidity of 85% for 72 hours. Next, a checkerboard tape peeling test was performed for each of the antireflection members in accordance with JIS D0202:1988. Adhesive tape was made of cellophane tape CT24 made by Nichiban Co., Ltd. As a result of this test, the case where no peeling occurred was rated as "A", and the case where peeling occurred was rated as "B".
將以上的結果揭示於後述表中。 The above results are disclosed in the tables below.
此外,在後述表中,低折射率層之組成"A"是指在低折射率層材料中摻合水解性烷氧矽烷與中空二氧化矽粒子 ,組成"B"是指在低折射率層材料中摻合含氟丙烯酸酯與中空二氧化矽粒子。 Further, in the table to be described later, the composition "A" of the low refractive index layer means that the hydrolyzable alkane and the hollow cerium oxide particles are blended in the material of the low refractive index layer. The composition "B" means that fluorine-containing acrylate and hollow cerium oxide particles are blended in the low refractive index layer material.
由前表明顯地可知,實施例1~34與比較例1~3相比,最小反射率或平均視感反射率較小,具有低反射特性。另外,實施例1~34與比較例1~5相比,透過色之a*及b*或反射色之a*及b*的偏差小,具有中性的色調。 As is apparent from the foregoing table, in Examples 1 to 34, compared with Comparative Examples 1 to 3, the minimum reflectance or the average visual reflectance was small, and the reflection property was low. Further, in Examples 1 to 34, compared with Comparative Examples 1 to 5, the deviations of a* and b* or the reflection color a* and b* of the transmission color were small, and the color tone was neutral.
其中,在實施例1~13以及15~28中,抗反射構件單獨使用時的反射光的顏色特別具有中性的色調。 Among them, in Examples 1 to 13 and 15 to 28, the color of the reflected light when the antireflection member was used alone was particularly neutral.
另外,在實施例1~5.7~9.11~21以及29~34中,抗反射構件與ITO膜重疊的情況,反射光的顏色尤其具有中性的色調。 Further, in Examples 1 to 5.7 to 9.11 to 21 and 29 to 34, when the antireflection member overlaps with the ITO film, the color of the reflected light has a neutral color tone.
如圖3所示般,實施例1與比較例1相比,反射率隨著波長的變化較少。亦即,在長波長區域(高於約600nm的波長區域)及短波長領域(低於約500nm的波長區域)之中,相較於比較例,實施例的反射率較小。另一方面,在中波長區域(約500~600nm之間的波長區域)之中,相較於比較例,實施例的反射率稍高。因此,在整個短波長區域至長波長區域,實施例的反射率與比較例的反射率相比變化較小,此結果代表可達到反射色的中性化。 As shown in FIG. 3, in Example 1, compared with Comparative Example 1, the reflectance was less changed with the wavelength. That is, among the long wavelength region (wavelength region higher than about 600 nm) and the short wavelength region (wavelength region lower than about 500 nm), the reflectance of the embodiment is smaller than that of the comparative example. On the other hand, among the medium wavelength regions (wavelength regions between about 500 and 600 nm), the reflectance of the examples was slightly higher than that of the comparative examples. Therefore, the reflectance of the embodiment is small as compared with the reflectance of the comparative example throughout the short-wavelength region to the long-wavelength region, and this result represents that the neutralization of the reflected color can be achieved.
A‧‧‧抗反射構件 A‧‧‧Anti-reflection member
1‧‧‧第一層 1‧‧‧ first floor
2‧‧‧第二層 2‧‧‧ second floor
3‧‧‧第三層 3‧‧‧ third floor
4‧‧‧基材 4‧‧‧Substrate
5‧‧‧防黏連層 5‧‧‧Anti-adhesion layer
圖1係表示本發明之實施形態的一例之概略剖面圖。 Fig. 1 is a schematic cross-sectional view showing an example of an embodiment of the present invention.
圖2係表示具備本發明之抗反射構件的影像顯示機器的一例之概略剖面圖。 Fig. 2 is a schematic cross-sectional view showing an example of a video display device including the antireflection member of the present invention.
圖3係表示實施例與比較例之反射率隨著波長的變化之圖形。 Fig. 3 is a graph showing changes in reflectance with wavelengths of Examples and Comparative Examples.
A‧‧‧抗反射構件 A‧‧‧Anti-reflection member
1‧‧‧第一層 1‧‧‧ first floor
2‧‧‧第二層 2‧‧‧ second floor
3‧‧‧第三層 3‧‧‧ third floor
4‧‧‧基材 4‧‧‧Substrate
5‧‧‧防黏連層 5‧‧‧Anti-adhesion layer
Claims (14)
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PCT/JP2012/076779 WO2013088836A1 (en) | 2011-12-16 | 2012-10-17 | Antireflective member |
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JP2015219508A (en) * | 2014-05-21 | 2015-12-07 | 大日本印刷株式会社 | Optical laminate, method for manufacturing optical laminate, image display device and method for improving interference fringe |
JP6803655B2 (en) * | 2015-07-17 | 2020-12-23 | 株式会社トッパンTomoegawaオプティカルフィルム | Transparent laminated film, transparent conductive film, touch panel and display device |
JP6470860B1 (en) * | 2018-03-15 | 2019-02-13 | マクセルホールディングス株式会社 | Coating composition, conductive film and liquid crystal display panel |
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JP2000347003A (en) * | 1999-06-02 | 2000-12-15 | Dainippon Printing Co Ltd | Optical film |
JP3835261B2 (en) * | 2001-11-21 | 2006-10-18 | コニカミノルタホールディングス株式会社 | Method for forming functional thin film, functional thin film laminate, optical film, and image display element |
JP2004118094A (en) * | 2002-09-27 | 2004-04-15 | Hitachi Maxell Ltd | Antireflection film, method of manufacturing the same, and antireflection panel using the same |
WO2005021259A1 (en) * | 2003-08-28 | 2005-03-10 | Dai Nippon Printing Co., Ltd. | Antireflection laminate |
JP2005301004A (en) * | 2004-04-13 | 2005-10-27 | Seiichi Suzuki | Antireflection film |
JP2006231316A (en) * | 2004-11-15 | 2006-09-07 | Jsr Corp | Manufacturing method of laminate |
JP5049628B2 (en) * | 2006-03-30 | 2012-10-17 | 富士フイルム株式会社 | Coating composition, optical film, polarizing plate, image display device, and method for producing optical film |
JP2008096701A (en) * | 2006-10-12 | 2008-04-24 | Seiko Epson Corp | Optical article |
JP5271575B2 (en) * | 2007-03-20 | 2013-08-21 | 富士フイルム株式会社 | Antireflection film, polarizing plate, and image display device |
JP4878582B2 (en) * | 2007-07-03 | 2012-02-15 | 富士フイルム株式会社 | Polarizing plate protective film, and polarizing plate and liquid crystal display device using the same |
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