TW201314384A - Film exposure device - Google Patents

Abstract

An alignment film prepared by coating a substrate film with a film of an alignment material is wound onto a back roll and then fed to an alignment exposure film uptake device. The alignment film is supported in a taut manner by the back roll to eliminate wrinkles, and a mask and a slit mask are provided in the region through which the alignment film travels. Almost the entire surface of the alignment film is irradiated, through openings in the mask, with a CW circularly polarized exposure light from an exposure light source, and the alignment film is also irradiated, via a plurality of slits in the slit mask, with bands of a CCW circularly polarized light from an exposure light source. By employing this process, any reduction in the precision of formation of the exposed portions caused by vertical vibration of the thin alignment film can be prevented, and wrinkling of the film can also be prevented, enabling a polarizing film to be obtained in which the exposed portions are formed with high precision.

Description

Diaphragm exposure device

The present invention relates to a light alignment film for a polarizing film used in a three-dimensional (3D) image display device using a FPR (Film Patterned Retarder) method, that is, a film polarizing method, or an optical film for wide viewing angle. A film exposure device for use is formed.

In the 3D technology of the FPR method, a polarizing film that changes the direction of light is attached to each scanning line on a screen of a display device such as a liquid crystal display device, and the display device displays the right eye and the left eye on each scanning line. The image, at the same time, the polarizing film adhered to the polarized glasses is only for the right eye to pass the light that should be incident on the right eye, and the left eye only allows the light to be incident on the left eye to pass, so that the right eye and the left are incident. The image of the eye produces parallax and a stereoscopic display is achieved.

Fig. 50 is a schematic view showing the FPR type polarizing film 1. The polarizing film 1 is a strip-shaped left-eye polarizing portion 1a having a width corresponding to a scanning line level of a display device, and a strip having a width corresponding to a scanning line of a level of the display device. The polarizing portion 1b for the right eye of the shape is disposed alternately in the vertical direction and applied to the transparent substrate. The polarizing portion 1a for the left eye has a linearly polarized light of -45° or a CW (clockwise) circularly polarized light that is polarized in the clockwise direction. On the other hand, the polarizing portion 1b for the right eye has a linearly polarized light of +45° or a CCW (counter clockwise) polarized light in a counterclockwise direction. Then, the polarizing film 1 is adhered to the screen of the liquid crystal display device in such a manner that the polarizing portion 1a and the polarizing portion 1b correspond to the scanning lines of the liquid crystal display device, and the left-eye polarizing portion 1a is on the left of the liquid crystal display device. The scanning lines of the ophthalmic signals match, and the right-eye polarizing unit 1b matches the scanning line of the right-eye signal of the liquid crystal display device. Thereby, the display light emitted from the scanning line for the left eye of the screen of the liquid crystal display device transmits the polarizing film 1 The left-eye polarizing unit 1a transmits the left-eye polarizing film adhered to the left-eye lens of the polarizing glasses to the left eye, and the display light emitted from the scanning line of the right eye of the screen of the liquid crystal display device is Then, the right-eye polarizing portion 1b of the polarizing film 1 is transmitted, and the right-eye polarizing film adhered to the right-eye lens of the polarizing glasses is transmitted to the right eye. Thereby, the right eye and the left eye can see the image having the parallax, and the stereoscopic image can be recognized.

Fig. 51 is a schematic view showing the exposure apparatus of the conventional polarizing film 1. The alignment film 10 coated with the alignment material film on the surface of the transparent film substrate is released from the drum 100, and its movement trajectory is restricted by the rollers 102, 103 to pass through the vicinity of the arrangement position of the exposure light sources 104, 105, and is rolled on the drum 101. take. Between the rollers 102 and 103, the alignment film 10 is horizontally disposed, and above the horizontal movement region of the alignment film 10, the slit masks 106 and 107 are disposed in the moving direction, and the slit masks 106 and 107 are disposed. The exposure light sources 104 and 105 are disposed above the exposure light beams from the exposure light sources 104 and 105, and are irradiated to the alignment material film on the surface of the alignment film 10 through the slit masks 106 and 107. Cameras 108 and 109 for observing alignment marks are provided above one end of the slit masks 106 and 107, that is, on the side of the exposure light sources 104 and 105. On the upstream side of the slit mask 106 located in the moving direction of the alignment film 10, a laser marker 110 for forming an alignment mark on the side surface portion of the alignment film 10 is provided.

In the conventional exposure apparatus, as shown in FIG. 52, for the alignment film 10 moving between the rollers 102 and 103, the alignment mark 111 is formed on the side surface portion of the alignment film 10 by the laser marker 110, and The camera 108 observes the mark 111 from the opening 106b provided at one end of the slit mask 106, and adjusts the position perpendicular to the moving direction of the alignment film 10 of the slit mask 106 with respect to the slit 111. Further, in the slit mask 107, the camera 109 also observes the mark 111 from the opening 107b provided at one end portion of the slit mask 107, and adjusts the direction of movement of the alignment film 10 with the slit mask 107 to be perpendicular. s position. Then, since the exposure light from the exposure light source 104 is transmitted through the slit 106a of the slit mask 106 to the alignment material film of the surface of the alignment film 10, the alignment film 10 is continuously conveyed to the square indicated by the hollow arrow. Therefore, the exposed material film is formed in the strip-shaped exposure portion 10a which is aligned in the same direction. Further, the exposure light from the exposure light source 105 is transmitted through the slit 107a of the slit mask 107 to the alignment material film on the surface of the alignment film 10, and the exposure portion 10b is formed between the exposure portions 10a. The strip-shaped exposed portions 10a and 10b are spaced apart from each other with an interval corresponding to one scanning line component, and are formed on the alignment film 11 after exposure, for example, by coating liquid crystals in mutually different directions. The polarizing portions 1a and 1b of the liquid crystal molecules are arranged. Thereby, as shown in FIG. 50, the polarizing film 1 which differs in the polarizing direction between the polarizing parts of the adjacent strip shape can be manufactured.

A method for producing an optical film or the like for a liquid crystal display device is described in Patent Documents 1 and 2.

In the manufacturing process of the polarizing film 1 used for a liquid crystal display device or the like, the alignment film 10 coated with the alignment material film is easily deformed by a temperature change or the like, and is easily deformed, for example, by temperature change during exposure. For example, the alignment film 10 is easily expanded due to heating at the time of exposure, and is easily contracted due to cooling at the time of transportation. Then, particularly in the width direction perpendicular to the moving direction of the alignment film 10, when the alignment film 10 is deformed, the width of the formed strip-shaped exposed portions 10a, 10b cannot correspond to the image or pixel of the display device. Width, and display defects occur due to deviations in width from each other.

A technique for preventing display failure of a display device caused by deformation of a diaphragm has been proposed. For example, Patent Document 3 discloses a technique for preventing a film from being subjected to a water washing process or drying in a method of manufacturing a display device in which a reflective material for diffusing and reflecting external light is formed on a film of a glass substrate of a display device. The warpage of the film produced during the treatment and the warpage of the film accompanying the hardening of the reflective material are performed, and the reflective material is placed on the glass substrate, and the film is then passed through the adhesive layer.

Further, in Patent Document 4, a photosensitive tree for applying a color film to a film substrate is used. In the method for producing a color film in which a fat composition is exposed, developed, and thermally hardened to form an image, a film composed of a norbornene compound is used as a film substrate. And by setting the oxygen concentration in the heat hardening treatment to 10000 ppm or less, the thermal deformation of the diaphragm is prevented from occurring.

Further, as described above, in the film exposure apparatus which is exposed to the film and determines the alignment direction of the alignment film, conventionally, the inspection of the exposure quality at the time of film formation is performed after completion of the film. As shown in FIG. 52, in the exposure of the film using the two slit masks 106 and 107, the exposure line width and the polarization direction of the strip-shaped exposed portions 10a and 10b are confirmed for the entire length of the alignment film 10. The exposure process is completed, and after a series of film exposure steps are completed, the exposure line width and the polarization direction are checked as inspections for the article.

Further, as shown in FIG. 53, for example, when the slit mask 106 for forming the exposure portion 10a is formed by joining two small slit masks 106-1 and 106-2, it is necessary to confirm the slit. The joint between the masks 106-1 and 106-2 is also implemented as an inspection of the product.

[Practical Technical Literature] [Patent Literature]

[Patent Document 1] Japanese Patent Laid-Open Publication No. 2010-250172

[Patent Document 2] Japanese Patent Laid-Open Publication No. 2007-114563

[Patent Document 3] Japanese Patent Laid-Open Publication No. 2002-189219

[Patent Document 4] Japanese Patent Laid-Open Publication No. 2009-157006

However, in the above-described conventional technique, since the alignment film 10 is exposed in the state in which the alignment film 10 is interposed between the rollers 102 and 103, the alignment film is exposed. The vertical vibration of the alignment film 10 at the time of transport of the film 10 causes the interval between the slit masks 106 and 107 and the alignment film 10 to vary, and it is difficult to form the exposure portions 10a and 10b with high precision. Moreover, since the alignment film 10 which is stretched between the rolls 102 and 103 is likely to wrinkle, it is difficult to form the exposed portions 10a and 10b with high precision.

Further, in the above-described conventional technique, after the completion of the polarizing film 1, the exposure line width, the polarization direction, and the reticle splicing portion are confirmed by the product inspection. Therefore, if a problem is found in their quality, All the batch products will become defective products, and the whole batch of products has to be discarded, resulting in the problem of poor yield.

In the conventional film exposure apparatus shown in FIG. 51, the alignment exposure film 11 is exposed by CW circularly polarized light from the exposure light source 104 and CCW circularly polarized light from the exposure light source 105, and is applied to the alignment exposure film 11. As shown in FIG. 54, the alignment exposure film 11 that moves between the rollers 102 and 103 and moves in the direction of the arrow emits illumination from the inspection illumination light source 123 disposed below the exposure light source 123. The illumination light is irradiated to the alignment exposure film 11 through the linear polarizing plate 122a in the first direction (for example, p-polarized light), and the illumination light transmitted through the alignment exposure film 11 is transmitted through the λ/4 plate 121. The linear polarizing plate 122b in the second direction (for example, s-polarized light) is incident on the inspection camera 120. Thereby, the inspection camera 120 captures the exposure units 10a and 10b, and the width (line width), the position (the connection position), and the alignment direction of the exposure units 10a and 10b can be confirmed.

However, in this case, when the alignment film 11 is moved between the rollers 102 and 103, the inspection is performed by the illumination light having the polarization direction, and the alignment film 11 has vibration in the vertical direction. It is difficult to detect the width, position (joining position) of the exposed portions 10a, 10b, and the alignment direction thereof with high precision.

Further, the technique of Patent Document 3 is such that the reflective material causing the deformation of the diaphragm is moved onto the glass substrate, and therefore it is not possible to use it in the case where it is necessary to form the alignment material film as described above on the diaphragm. Further, Patent Document 4 prevents thermal deformation of the diaphragm The technique of the shape itself, rather than making it a high-precision exposure corresponding to the deformed diaphragm.

When the alignment film 10 is deformed in the width direction perpendicular to the moving direction of the alignment film 10 due to thermal deformation or the like, the width of the alignment film 10 after the deformation is considered, and the mask is replaced. That is, as shown in FIG. 55, the alignment film 10 expands in a direction perpendicular to the moving direction of the alignment film 10, for example, by heating during exposure, and shrinks in width before expansion due to cooling during transportation. Here, it is considered that the masks 106 and 107 are exposed to the masks 150 and 160, respectively, and the masks 150 and 160 are provided with slits in consideration of the expansion ratio in the width direction of the alignment film 10. However, in this case, it is necessary to prepare a plurality of types of photomasks in accordance with the expansion ratio of the alignment film 10, which causes a problem of increasing the manufacturing cost of the polarizing film sheets.

Further, in the conventional exposure apparatus, there is a problem that both the meandering of the diaphragm, the thermal expansion of the diaphragm, and the thermal contraction cannot be corrected and exposed with high precision.

Further, as described above, in manufacturing a three-dimensional (3D) image display device using polarized glasses (FPR method), a polarizing film (FPR) that changes the polarization direction on each scanning line is used. In the production of the FPR, two (Fig. 52) or three (Fig. 52) or three slits having scanning line widths are formed in the alignment film on which the alignment material film is coated on the film substrate. Fig. 53) The mask, and in each of the masks, two types of exposure light having different polarization directions are irradiated. At the time of the exposure, the positions of the exposure positions of the two or three masks are required to match, and if the accuracy of the exposure position is low, one or two of the upstream sides arranged in the moving direction of the alignment film are caused. The strip-shaped exposure portion of the photomask is partially overlapped with the strip-shaped exposure portion of the photomask disposed on the downstream side in the moving direction of the alignment film, and the position of the scanning line is deviated from the exposure portion.

An object of the present invention is to provide a film exposure apparatus which can prevent the formation precision of an exposed portion from being lowered due to vibration of a thin alignment film, and can prevent generation of wrinkles, and can be formed with exposure under high precision. Part of the polarizing film.

Another object of the present invention is to provide an exposure apparatus which does not require replacement of a mask even when the alignment film of the exposure target is deformed or biased in the width direction due to thermal expansion, thermal contraction, and meandering of the alignment film. The alignment film can be exposed to a predetermined position with high precision.

Still another object of the present invention is to provide an exposure apparatus and an FPR manufacturing method which can make each exposure section high when exposing a strip-shaped exposure section to a different position of the first exposure unit and the second exposure unit Position matching with precision.

A film exposure apparatus according to the present invention includes: a backing roll that applies an alignment film of an alignment material film on one surface of a transparent film substrate, and winds the alignment material film toward the outside to be wound thereon The alignment film supports the alignment film and moves the alignment film along the circumferential surface thereof. The first exposure unit includes a first slit mask that faces the alignment film wound around the back roller. Arranging, forming a plurality of parallel first slits in a moving direction of the alignment film; and first exposing the light source, and exposing the alignment material film of the alignment film through the first slit mask; a second exposure unit comprising: a second slit mask disposed on a downstream side of the first slit mask in a moving direction of the alignment film, and facing the alignment film wound around the back roller; Forming a parallel plurality of second slits in a moving direction of the alignment film; and a second exposure light source, wherein the alignment film of the alignment film is exposed through the second slit mask; wherein the second slit The second slit of the slit mask is the first slit of the first slit mask The arrangement of the first slit mask and the second slit mask is arranged such that the first slit and the second slit are biased in the width direction of the alignment film, and the bias is biased The amount is the amount of the pitch of 1/2 of the arrangement pitch of the first and second slits in the width direction of the alignment film.

Another film exposure apparatus according to the present invention is characterized by comprising a backing roller which is coated with an alignment film of an alignment material film on one surface of a transparent film substrate, and is wound around the alignment material film toward the outside. The alignment film is supported on the circumferential surface of the alignment film, and the first exposure unit includes a first slit mask that is wound around the back roller. Arranging the alignment film, forming a plurality of parallel first slits in a moving direction of the alignment film; and first exposing the light source, and transmitting the alignment film of the alignment film through the first slit mask And a second exposure unit including: a third photomask disposed on the downstream side of the first slit mask in a moving direction of the alignment film, and facing the alignment film wound around the back roller An opening extending in a width direction of the alignment film is formed, and a third exposure light source is exposed through the third mask to expose the alignment film of the alignment film.

Still another film exposure apparatus according to the present invention is characterized by comprising: a backing roller which is coated with an alignment film of an alignment material film on one surface of a transparent film substrate, and the alignment material film is wound toward the outside The alignment film is supported on the circumferential surface thereof while the alignment film is supported on the circumferential surface thereof. The first exposure unit includes a first slit mask and is wound around the back roller. Arranging the alignment film, and forming a plurality of parallel first slits in a moving direction of the alignment film; and a first exposure light source, the alignment material of the alignment film is transmitted through the first slit mask And a second exposure unit comprising: a fourth photomask, wherein the upstream side of the first slit mask in the moving direction of the alignment film faces the alignment film wound around the back roller; And arranging an opening extending in a width direction of the alignment film; and a fourth exposure light source, wherein the alignment material film of the alignment film is exposed through the fourth photomask.

One of the exposure light sources is a light source that irradiates the CW circularly polarized exposure light to the alignment film, and the other is a light source that irradiates the CCW circularly polarized exposure light to the alignment film; and, in the exposure light source One will use the alignment film for the alignment Exposure light obliquely incident at 40° in the moving direction of the film is irradiated to the light source of the alignment film, and the other is to irradiate the alignment film with exposure light at a 40° oblique incidence in the moving direction of the alignment film. The light source to the alignment film.

The exposure apparatus further includes, for example, a cooling member disposed on an upstream side of the backing roller positioned in a direction in which the alignment film is formed to cool the alignment film.

Further, the exposure apparatus further includes an inspection unit disposed on a downstream side of the second exposure unit positioned in a moving direction of the alignment film, and configured to inspect an exposure portion that is exposed to exposure light, wherein the exposure portion is in position The alignment film is irradiated onto the alignment exposure film after the exposure light; the inspection portion includes: an inspection roller that winds the alignment exposure film and rotates together with the alignment exposure film; and the light source is disposed on a circumferential surface of the inspection roller or the roller Internally, for emitting illumination light for inspection; and a light receiving portion disposed opposite to the roller for detecting illumination light transmitted through the alignment exposure film; and, the exposure unit, by the alignment material film In the upper exposure, the strip-shaped first exposure portion and the strip-shaped second exposure portion are alternately formed in the width direction of the alignment material film to form the alignment exposure film; and the inspection portion includes: the first polarizing plate Provided on the drum, and providing polarized light in the first direction to the illumination light from the light source; the second polarizing plate is disposed opposite to the drum, and the first incident light is incident on the light receiving portion. Polarization is imparted in the direction; and the λ/4 plate is disposed on the optical axis of the illumination light.

Further, the exposure unit forms the first exposure portion by irradiating the CW circularly polarized exposure light onto the exposure light source on the alignment film, and exposing the exposure light to the alignment film by exposing the CCW circularly polarized light. a light source for forming the second exposure portion; and the exposure unit exposing the alignment material film on the alignment film to form a strip-shaped first exposure portion and a strip-shaped second exposure portion in the alignment The alignment film is formed alternately in the width direction of the material film, and the light-receiving portion of the inspection portion is configured by a first light-receiving portion that is provided on the illumination light that transmits the alignment-exposed film. 1 in the first alignment direction of the exposure portion; and the second light receiving The portion is provided in the second alignment direction of the second exposure portion that transmits the illumination light of the alignment film.

Further, the exposure unit forms the first exposure portion by exposing the exposure light to the alignment film at an angle of 40° in the moving direction of the alignment film, and by using the alignment film for the alignment film The exposure light source of the 40° obliquely incident light is formed in the moving direction of the alignment film to form the second exposure portion. The film exposure device further includes a transparent scale member disposed on the optical axis of the light receiving portion. a ruler is formed in the width direction of the alignment film, and a scale is formed in the width direction of the first exposure portion or the second exposure portion on the alignment film.

Further, the film exposure apparatus further includes: a second inspection unit disposed in a conveyance region of the alignment exposure film before or after inspection by the inspection portion; and the second inspection portion including: a second light source a third polarizing plate for linearly polarizing the first direction to the inspection light from the second light source; and a second λ/4 plate for transmitting the third polarizing plate and further transmitting the alignment exposure The film is provided with the inspection light of the circularly polarized light in the first direction, and is converted into the linearly polarized light in the second direction; the fourth polarizing plate transmits the inspection light of the linearly polarized light in the second direction; and the second light receiving portion detects the transmission. The fourth polarizing plate inspects the light; the third light source emits the inspection light; and the fifth polarizing plate applies the linearly polarized light in the first or second direction to the inspection light from the third light source; and the third λ/ The fourth plate transmits the inspection light of the circularly polarized light in the second direction by transmitting the third polarizing plate and further transmitting the alignment film, and converts the light into the linear light in the second or first direction; and the sixth polarizing plate transmits the light. Check light of linear polarized light in the 2nd or 1st direction And a third light receiving portion, detecting the inspection light transmittance of the first polarizing plate 6.

The exposure apparatus of the present invention includes: a transporting device for moving the alignment film of the exposure target in the first direction; and a pair of alignment markers on the both sides of the alignment film to form the same a diaphragm alignment mark for an index of the amount of expansion and contraction of the film; a light source for emitting the exposure light; and a mask forming a plurality of slits arranged at intervals in a second direction perpendicular to the first direction, And a mask alignment mark is formed on each of the two ends in the second direction; and the light shielding member extends in the second direction to form an opening intersecting all the slits, and the opening and the slit are formed in the opening The intersecting portion transmits the exposure light; the detecting portion detects the reticle alignment mark and the film alignment mark together; and the control portion controls the light shielding member and the reticle in the first direction a relative position; wherein a width of the slit linearly changes in the first direction, and when viewed in the second direction, the interval between the slits is the same as a width of the slit; the control portion controls the mask The positional relationship between the light-shielding member and the light-shielding member in the first direction is such that the positional relationship between the mask alignment mark and the film alignment mark detected by the detecting portion has a predetermined relationship.

In the above exposure apparatus, for example, a pair of the reticle alignment marks are provided on one side edge in the width direction of the slit closest to each of the slits provided at the both end portions in the second direction, or The center line of the slit in the width direction is respectively disposed in parallel; at a position of the opening of the light shielding member, the control portion controls the relative position of the mask and the light shielding member in the first direction to align the diaphragm The interval between the mark and the reticle alignment mark in the second direction is constant; and the reticle is provided with one of the film alignment marks for the outside of the slit located in the second direction. a pair of observation windows, and the reticle alignment mark is disposed in the observation window, the detecting portion detects the reticle alignment mark, and detects the film alignment mark through the pair of observation windows.

Moreover, the control unit adjusts the position of the mask in the second direction so as to be located at a central position in the second direction between the pair of mask alignment marks detected by the detecting unit. Two sets of the light source, the light shielding member, and the photomask are disposed at a position in the second direction between the pair of diaphragm alignment marks. The slit of the hood of one side is configured to be on the other side The slit of the mask is biased by the amount of the arrangement pitch of the slit in the second direction; and by the exposure by the two light sources, the strip-shaped exposure portions having the alignment directions are different from each other Formed alternately in the second direction.

Another exposure apparatus according to the present invention includes: a transporting device for moving the alignment film of the exposure target in the first direction; and a pair of alignment markers formed on the both sides of the alignment film as the alignment film a diaphragm alignment mark of the index of the expansion and contraction; a light source for emitting the exposure light; and a mask forming a plurality of slits arranged at intervals in the second direction perpendicular to the first direction, and configured to Observing an observation window of one pair of the pair of diaphragm alignment marks, and forming a mask alignment mark in the observation windows; the light shielding member extending in the second direction to form and the slit Intersecting the opening of the opening, and transmitting the exposure light at a portion where the opening intersects the slit; the detecting portion is configured to detect the reticle alignment mark and the film alignment mark in the observation windows; And a control unit that adjusts a relative positional relationship between the light shielding member and the reticle in the first direction based on a detection result of the detection unit; wherein the slit is at one end of the second direction 1 slit is parallel to the first direction, the other end The second slit is inclined at the maximum inclination in the first direction, and the slit between the first slit and the second slit is gradually increased in accordance with the inclination angle from the first slit to the second slit. The width of the slit is linearly changed in the first direction, and the interval between the slits is the same as the width of the slit in the second direction; the first mask on the first slit side The alignment mark extends in the first direction, and the second mask alignment mark on the second slit side is parallel to the side edge of the second slit in the width direction or the center line in the width direction. extend.

In the exposure apparatus of the present invention, the control unit sets a reference value A of the distance between the first mask alignment mark and the corresponding first patch alignment mark, and sets a reference value B of a distance between the second mask alignment mark and the corresponding second diaphragm alignment mark, and the first mask alignment mark and the first diaphragm in the alignment film exposure When the distance between the alignment marks changes from the reference value A, the photomask is moved in the second direction, and the distance between the first mask alignment mark and the first diaphragm alignment mark is set. Adjusted to the reference value A; and when the distance between the second mask alignment mark and the second diaphragm alignment mark changes from the reference value B, the mask is moved in the first direction. The distance between the second alignment mark and the second patch alignment mark is adjusted to the reference value B.

Still another exposure apparatus of the present invention is characterized by comprising: a moving device for moving an alignment film formed with an alignment material film on the film substrate in one direction; a first exposure unit disposed in the moving region of the alignment film on the alignment material film on the alignment film Forming a first exposure pattern composed of a plurality of strip-shaped exposure portions, the plurality of strip-shaped exposure portions extending in the one direction and spaced apart from each other in a direction perpendicular to the one direction; the second exposure The unit is disposed on a downstream side of the first exposure unit in a moving direction of the alignment film, and the alignment material film on the alignment film forms a second exposure pattern composed of a plurality of strip-shaped exposure portions. a plurality of strip-shaped exposure portions are located in a region extending in the one direction and in a direction perpendicular to the one direction of the exposure portions of the first exposure patterns; the inspection portion is disposed in the first exposure unit and the portion a moving region of the alignment film between the second exposure units for detecting an exposure portion of the first exposure pattern; and a control portion based on a position of the exposure portion of the first exposure pattern detected by the inspection portion Control in the second exposure The exposure unit of an exposure position of the second pattern.

In the above exposure apparatus, for example, the first exposure unit includes: a first exposure light source; and a first photomask having a strip-shaped slit corresponding to the first exposure pattern; and the first photomask is provided by the first photomask The slit is formed by irradiating the exposure light from the first exposure light source to the alignment material film; the second exposure unit includes: the second exposure light And a second mask having a strip-shaped slit corresponding to the second exposure pattern; and the slit of the second mask is used to shape the exposure light from the second exposure source to be irradiated The alignment material film; the control unit adjusts a position in a direction perpendicular to the one direction of the second mask of the second exposure unit based on a position of the exposure portion of the first exposure pattern; and the moving device The alignment film is wound around the backing roller to move the alignment film, and the first exposure unit, the inspection unit, and the second exposure unit are disposed at positions facing the alignment film on the backing roller. on.

The inspection unit includes: an inspection light source disposed opposite to the back roller, and irradiating the inspection light toward the alignment film on the back roller; a camera detecting the reflected light reflected by the back roller; and a polarizer And filtering the polarization direction of the inspection light incident on the alignment film or the reflected light incident on the camera; and the inspection unit includes: inspecting the light source and embedding the circumferential surface of the back roller; And illuminating the alignment film toward the alignment film on the back roller; the camera is disposed opposite to the inspection light source for detecting transmitted light transmitted through the alignment film; and the polarizer for incident on the alignment film Check the light or the transmitted light incident on the camera, and apply the filter in the polarization direction.

The moving device defines a moving region of the alignment film by arranging the alignment film on a plurality of transport rollers; and the first exposure unit, the inspection portion, and the second exposure unit are disposed and transported a position opposite to the alignment film between the rollers; and the inspection portion includes: a light source for inspection, disposed on one side of the alignment film between the transport rollers, and irradiating the inspection film with the inspection light; the reflection mechanism is disposed Reflecting light transmitted through the alignment film on the other side of the alignment film; detecting a reflected light reflected by the reflection mechanism; and a polarizer for inspecting light incident on the alignment film and incident on the The reflected light of the camera is applied to the filter in the polarization direction.

The inspection portion includes: an inspection light source, and the arrangement between the transportation rollers Aligning one side of the film and irradiating the alignment film with the inspection light; the camera is disposed on the other side of the alignment film and detecting the transmitted light transmitted through the alignment film; and the polarizer for incident to the alignment The inspection light of the film and the transmitted light incident on the camera are respectively applied to the filter in the polarization direction; and the plurality of slits of the second mask are formed in a direction perpendicular to the first direction The mutual spacing of the adjacent slits linearly increases in the first direction; the second exposure unit has a light shielding member formed with an opening extending in a direction perpendicular to the first direction, the opening and the opening All the slits of the second mask intersect; and the control unit adjusts the position of the light shielding member with respect to the second mask in the first direction.

Further, the method for producing a polarizing film (FPR) according to the present invention is characterized in that the alignment film having the alignment material film formed on the film substrate is moved in one direction, and includes the following steps: a first exposure step, The first exposure unit provided in the moving region of the alignment film forms a first exposure pattern composed of a plurality of strip-shaped exposure portions on the alignment material film on the alignment film, and constitutes the first exposure pattern. The plurality of strip-shaped exposure portions extend in the one direction and are spaced apart from each other in a direction perpendicular to the one direction; and the second exposure step is provided in the moving direction of the alignment film a second exposure unit on the downstream side of the first exposure unit forms a second exposure pattern composed of a plurality of strip-shaped exposure portions on the alignment material film on the alignment film, and the plural exposure patterns constituting the second exposure pattern a strip-shaped exposure portion extending in the one direction and positioned in a direction perpendicular to the one direction in a direction between the exposure portions of the first exposure pattern; and an inspection step in the first exposure step and The second exposure And an exposure portion for detecting the first exposure pattern; wherein the second exposure step is controlled by the second exposure step based on a position of the exposure portion of the first exposure pattern detected by the inspection step The exposure position of the second exposure pattern of the cell.

Further, in the present invention, the alignment film is applied to the film substrate as an alignment film, and the alignment film is exposed as an alignment film, and the alignment film is coated with, for example, liquid crystal. It is called a polarizing film.

According to the invention, the alignment film of the alignment material film is formed on the surface, and the light is exposed from the first and second exposure light sources through the first and second narrow directions while being wound around the back roller and supported by the back roller. The reticle is slit and irradiated to the alignment material film. Therefore, the alignment film is supported by the backing roll, wrinkles during stretching, and the distance between the first and second slit masks and the alignment film is set with high precision, and the exposure is performed. Therefore, the accuracy of the formation of the exposure portion becomes extremely high. Therefore, according to the present invention, the strip-shaped exposed portion can be formed with high precision.

Hereinafter, embodiments of the present invention will be specifically described with reference to the drawings of the attached drawings. Fig. 1 is a schematic view showing a film exposure apparatus according to an embodiment of the present invention, and Fig. 2 is a view showing an alignment film 10 in the vicinity of the back roller. On the surface of the membrane substrate, an alignment material film is applied to a suitable coating device, and the alignment material film alignment film 10 is applied and directly conveyed to the arrangement position of the back roller 5, and as shown in FIG. After the drum 100 is wound up, it is released from the drum and conveyed to the back drum 5.

In the backing drum 5, the alignment film 10 is wound around a half (lower half) of the circumferential surface thereof, and the back surface of the alignment film 10 is in contact with the backing roller 5, and at the same time, the surface of the alignment film 10, that is, the alignment material film system Heading out. The masks 7 and 17 face the alignment material film and are disposed from the alignment film 10 by a certain distance (about 200 μm) so that the masks 7 and 17 are opposed to each other and sandwich the back roller 5 therebetween; Behind the slit masks 7, 17 are provided exposure light sources 6, 16. Thereby, the alignment film 10 coated with the alignment material film on the surface thereof is in contact with the circumferential surface of the back roller 5, and the wrinkles are stretched by a plurality of tensions when the alignment film 10 is conveyed, by the back roller 5 Get support. Then, by The alignment film 10 is continuously conveyed in the direction of the hollow arrow, and the exposure light is continuously irradiated from the exposure light sources 6, 16, and the exposure light is transmitted to the alignment film 10 through the opening 7a of the masks 7, 17 and the slit 17a. Thereby, the exposed exposure film 11 after the exposure is wound up on the take-up roller 101 (see FIG. 51) or the like.

The back drum 5 is a water-cooled drum that internally cools the water and is rotatable about its central axis. Then, the back roller 5 is freely rotatable, and while the alignment film 10 is moved, the back roller 5 is rotated so that its peripheral speed becomes the same as the moving speed of the alignment film 10. Thereby, the alignment film 10 can be supported in a state where there is no relative speed difference on the circumferential surface of the back drum 5. Thereby, the alignment film 10 is conveyed by applying a suitable tension to prevent wrinkles from being generated on the circumferential surface of the back drum 5.

In the vicinity of the beginning end portion of the portion of the backing roll 5 around which the alignment film 10 is wound, the photomask 7 is disposed facing the back roller 5, and a light source 6 for exposing light is disposed behind the photomask 7. It exposes the alignment film 10 via the photomask 7. Further, in the vicinity of the end portion of the portion on which the alignment film 10 is wound around the circumferential surface of the back roller 5, a slit mask 17 is disposed facing the back roller 5, and an exposure is disposed behind the slit mask 17. A light source 16 that exposes the alignment film 10 via the slit mask 17. The mask 7 has an opening 7a extending in the width direction of the alignment film 10 and opening in the entire width direction of the alignment film 10; in the slit mask 17, a plurality of long rectangles in the moving direction of the alignment film 10. The plurality of slits 17a are arranged in the width direction of the alignment film 10. The arrangement pitch of the slits 17a corresponds to the FPR type 3D liquid crystal display device and corresponds to the components of the two scanning lines 2.

Then, for example, the exposure light from the exposure light source 6 is a light that is polarized in a clockwise direction (CW (clockwise) circularly polarized light), and the exposure light from the exposure light source 16 is circularly polarized in a counterclockwise direction ( CCW (counter clockwise) light. As shown by the hollow arrow, for the alignment film 10 moving in one direction, by exposing the exposure light from the exposure light source 6 of the opening 7a of the reticle 7 to the alignment film 10, except for the portions of the alignment film 10 on both sides thereof Outside, exposure on one side Light. Further, by exposing the exposure light from the exposure light source 16 of the slit 17a of the slit mask 17 to the alignment film 10, the portion corresponding to the alignment film 10 of the slit 17a is exposed by the exposure light source 16. Light, print exposure.

On the surface of the alignment film 10, a reversible alignment material film is formed. First, the entire area of the alignment material film on the surface of the alignment film 10 is exposed by the CW circularly polarized exposure light transmitted through the opening 7a of the mask 7. Next, the strip-shaped region corresponding to the slit 17a is exposed by the exposure light from the CCW circularly polarized from the slit 17a of the slit mask 17. Thereby, the strip-shaped exposed portion (CCW circularly polarized light) corresponding to the slit 17a is the exposed portion 10b, and the strip-shaped portion (CW circularly polarized light) corresponding to the portion between the slits 17a becomes the exposed portion 10a.

Next, the operation of the film exposure apparatus of the present embodiment configured as described above will be described. The alignment material film is applied to the surface of the alignment film 10, for example, having a width of 1500 mm and a thickness of 100 μm, and the film length of one roller 100 is, for example, 2 km, and is usually transported at a speed of 2 to 10 m/min. Further, for example, the material of the substrate is COP (Cyclo-olefin polymer) or TAC (Triacetyl Cellulose Film) film. The alignment film 10 is conveyed to the arrangement position of the back roll 5, and is wound and supported by the back roll 5. Then, the alignment material film of the alignment film 10 irradiates the CW circularly polarized exposure light from the exposure light source 6 through the opening 7a of the photomask 7 to the nearly full area of the alignment film 10, and then, from the exposure light source 16, through the slit. The slit 17a of the mask 17 irradiates the exposure light of the CCW circularly polarized light in a strip shape, and the portion corresponding to the alignment film 10 of the slit 17a is exposed to the exposed portion of the CCW circularly polarized light from the exposed portion of the CW circularly polarized light. At this time, the alignment material film of the alignment film 10 is a reversible material, and the exposure light of the CW circularly polarized light is irradiated onto the entire surface of the nearly alignment film 10 to be aligned to the entire surface of the alignment film 10, thereby The exposure light that is circularly irradiated with the CCW circularly polarized light is aligned to the strip-shaped portion of the alignment film 10. Thereby, the portion of the alignment film 10 corresponding to the slit 17a is formed with an exposure portion 10b (see FIG. 50) which is circularly polarized by CCW. On the other hand, the strip-shaped portion between the exposed portions 10b forms the exposed portion 10a which is circularly polarized by CW. Thereby, the exposure portions 10a and 10b are alternately formed, and an FPR type polarizing film sheet in which the polarizing portions 1a and 1b are formed in one scanning line can be manufactured.

At this time, since the thin alignment film 10 is supported by the back roll 5 and exposed to the stretch wrinkles, the film is exposed through the slit 17a of the slit mask 17, so that the wrinkles of the alignment film 10 can be prevented and Vibration, and the exposure portions 10a, 10b can be formed with high precision. Further, since the exposure through the mask 7 is performed on the entire width direction of the alignment film 10, it is not necessary to match the position between the mask 7 and the slit mask 17, so that there is no problem of positional mismatch. It also makes it possible to form the exposure portions 10a, 10b with high precision. Then, in the present invention, the exposure of the one back roll 5 is performed twice, and it is not necessary to use the expensive back roll for each exposure, so that the manufacturing cost of the FPR polarizing film can be reduced.

Next, a second embodiment of the present invention will be described with reference to Figs. 3 and 4 . In the present embodiment, the alignment film 10 first receives the exposure light of the CW circularly polarized light from the exposure light source 6 via the slit mask 17 having the slit 17a, and then receives the exposure from the exposure mask 7 having the opening 7a. The illumination of the exposure light of the CCW circularly polarized light source 16 is the same as that of the first embodiment, and the other components are the same as those of the first embodiment. Therefore, the same components are denoted by the same reference numerals, and the detailed description thereof will be omitted. As shown in FIG. 4, the exposure light of the CW circularly polarized from the exposure light source 6 is exposed by the alignment material film on the alignment film 10 via the slit 17a to form a strip-shaped exposed portion 10a. At this time, the alignment material film on the alignment film 10 is a non-reversible material, and the portion of the alignment material film is aligned by irradiation of the CW circularly polarized exposure light. Next, the exposure light of the CCW circularly polarized from the exposure light source 16 is exposed to the alignment material film on the alignment film 10 through the opening 7a, and the CCW circularly polarized exposure light is irradiated onto the nearly entire surface of the alignment film 10. At this time, since the exposed portion 10a is made of an irreversible material and is aligned by CW circularly polarized light, the alignment does not change even if the exposure light of the CCW circularly polarized light is received. Then, the unexposed portion of the exposure light source 6 between the exposure portions 10a receives the exposure light from the CCW circularly polarized light of the exposure light source 16, and the portion is formed. It is an exposure portion 10b corresponding to CCW circularly polarized light. As a result, as shown in FIG. 50, as shown in FIG. 50, the polarizing film 1a in which the polarizing portion 1a and the polarizing portion 1b are alternately arranged corresponding to one scanning line can be manufactured.

As described above, in the present embodiment, after the strip-shaped exposure portion 10a is formed by CW circularly polarized light, the entire surface of the exposure light of the CCW circularly polarized light is exposed, and the exposure portion 10b is formed between the exposure portions 10a. In the same manner as in the first embodiment, the position of the mask 7 and the slit mask 17 is not required. Further, in the present embodiment, as in the first embodiment, the vibration and wrinkles of the alignment film 10 can be prevented, and the exposure portions 10a and 10b can be formed with high precision. Thereby, the FPR polarizing film 1 having the polarizing portions 1a and 1b integrated with high precision corresponding to one scanning line can be manufactured.

Next, a third embodiment of the present invention will be described with reference to Figs. 5 and 6(a) and (b). In the first and second embodiments described above, the formation of the FPR polarizing film is related to the formation of the photoalignment film. In the present embodiment, as in the first embodiment, the alignment film 10 is in contact with the back roll 5, and the start end portion of the moving region of the alignment film 10 that moves simultaneously with the passive rotation of the back roll 5, that is, in the back roll 5 A mask 7 having an opening 7a is disposed in the vicinity of the beginning end portion of the portion where the alignment film 10 is wound around the circumference, and a mask 17 having the slit 17a is disposed at the end portion after the movement region. The present embodiment differs from the first embodiment in that the exposure light from the exposure light source 6 is incident on the photomask 7 at an oblique angle of, for example, 40°, and the exposure light from the exposure light source 16 is, for example, -40. The inclination angle of ° is incident on the slit mask 17.

In the present embodiment, the alignment film 10 on which the reversible alignment material film is formed is irradiated with an exposure light inclined at 40° to the transport direction of the alignment film 10 to almost the entire area of the alignment film 10, and then irradiated with the alignment film 10 The conveyance direction is inclined at -40° to the strip-shaped region corresponding to the slit 17a (exposure portion 10d), and for this region, the exposure is performed by the -40° oblique exposure light. Also in the present embodiment, as in the first embodiment, the exposure portions 10c and 10d are formed by two exposures. In the exposure unit 10d, the alignment direction is determined by the exposure light incident obliquely at -40° of the second exposure, and the alignment direction is determined by the exposure light of the 40° oblique incidence of the first exposure in the exposure unit 10c. . Thereby, an optical alignment film having exposed portions 10c and 10d in mutually different light alignment directions can be obtained, and can be used as an optical alignment film of a liquid crystal display device to expand the viewing angle. Further, in the present embodiment, since the vibration and wrinkles of the alignment film 10 are not present, the exposure portions 10c and 10d can be formed with high precision. Moreover, the positional fit between the photomask 7 and the slit mask 17 is not required.

Next, a fourth embodiment of the present invention will be described with reference to Figs. 7 and 8 . The present embodiment is similar to the third embodiment in the formation of the photo-alignment film, but is different from the third embodiment in that the alignment material film on the alignment film 10 is a non-reversible material; The initial exposure uses a slit mask 17 having a slit 17a, and the alignment film 10 is irradiated by exposure light having an incident angle of 40° from the exposure light source 6; the second exposure is performed using the opening 7a. The reticle 7 illuminates the alignment film 10 by exposure light from an exposure light source 16 having an incident angle of -40° tilt.

In the present embodiment, first, the exposure light having an inclination of 40° with respect to the direction in which the alignment film 10 is formed is incident on the alignment film 10 via the slit 17a, and the strip-shaped exposure portion 10c is formed on the alignment film 10. By the exposure light incident obliquely at 40°, the strip-shaped exposure portion 10c is aligned so that the alignment direction thereof becomes 40°. Next, exposure light having an inclination of -40° with respect to the direction in which the alignment film 10 is applied is incident on the alignment film 10 through the opening 7a, and the entire surface is irradiated with the exposure light obliquely incident at -40°. At this time, since the exposure portion 10c is aligned using a non-reversible material, the alignment direction does not change even when subjected to irradiation with an exposure light of -40° inclination; the unexposed portion of the exposure light from the exposure light source 6 is Irradiated by the -40° tilted exposure light, the alignment direction is uniform in that direction. Thereby, an optical alignment film which alternately forms the exposed portion 10c inclined at 40° and the exposed portion 10d inclined at -40° can be obtained. Also in this embodiment, vibration and wrinkles of the alignment film 10 are not generated, so that the exposure portions 10c and 10d can be formed with high precision. In addition, the position between the mask 7 and the slit mask 17 is not required. Hehe.

Further, the present invention is not limited to the above embodiments, and various modifications are possible. For example, in the above embodiments, the slit mask 17 having the slit 17a and the mask 7 having the opening 7a are used, and the positional cooperation of the mask 7 and the slit mask 17 is not required, but as shown in FIG. As shown, the laser marker 110 can also be used to form the mark 111 on the alignment film 10, and the position of the mark 111 can be detected by the camera or the like at the position where the mask 7 and the slit mask 17 are disposed. When the mark 111 is used as an index to match the position of the mask 7 and the slit mask 17, as shown in Fig. 52, a slit mask having slits can be used in common. That is, the exposure portions 10a and 10b or the exposure portions 10c and 10d can be formed by two slit masks, respectively. At this time, the slit of one of the slit masks is formed at the same pitch as the arrangement pitch of the slits of the other slit mask; the amount of the gap between the slits is 1/2 of the spacing, in the alignment film One of the slit reticles is disposed in the width direction of 10 with respect to the other slit reticle. Further, in the third embodiment and the fourth embodiment, the incident tilt angles of the exposure light are 40° and -40°, but the incident tilt angle of the exposure light is not limited thereto, and various angles can be adopted. .

Next, a fifth embodiment of the present invention will be described. In the present embodiment, a cooling member that cools the alignment film is provided on the upstream side of the backing roller in the direction in which the alignment film is formed. Hereinafter, a fifth embodiment of the present invention will be specifically described with reference to Figs. 9 and 10 . According to the first to fourth embodiments described above, it is possible to prevent the formation accuracy of the exposure portion due to the vibration of the alignment film 10 from being lowered. However, in general, in the method of manufacturing the polarizing film, there are other cases. Problems. Fig. 11 is a schematic view showing a method of manufacturing the polarizing film 1 of the FPR method using the backing roll. The transparent membrane substrate 12 is coated on the coating device 2 with an alignment material film on its surface (shown as the bottom surface). The alignment film 10 to which the alignment material film is applied is guided to the winding drum 100 (see FIG. 51) by the air turning rods 3 and 4, and is taken up. After that, it is conveyed to the back roll 5, and after being temporarily wound on the surface of the back roll 5, it becomes polarized light through an exposure step, a liquid crystal coating step, and a post-baking step. The diaphragm 1 is then conveyed to a take-up device of the polarizing film 1. In this case, the alignment film 10 is in a state in which the surface of the alignment film is coated with the alignment material film, and the trajectory is restricted by the air turning rods 3 and 4, and the surface side of the alignment film 10 coated with the alignment material film becomes the air steering rod 3. On the four sides, in the air steering levers 3, 4, as shown in Fig. 12, a plurality of air discharge holes 31 are provided on the surface thereof, and the air is discharged from the discharge holes 31 so that the alignment film 10 does not come into contact with Air steering rods 3, 4. In other words, the alignment film 10 is restricted from being traversed by the state in which the air turning levers 3, 4 are floated.

The alignment film 10 is wound around the backing roll 5, and the back surface of the alignment film 10 is brought into contact with the backing roll 5, and the surface of the alignment film 10, that is, the alignment material film system faces outward. The slit masks 7b, 17 are disposed facing the alignment material film and spaced apart from the alignment film 10 by a certain distance (about 200 μm) so that the slit masks 7b, 17 are opposed to each other with the back roller 5 therebetween. Further, exposure light sources 6 and 16 are provided behind the slit masks 7b and 17. As a result, as shown in FIG. 13, the alignment film 10 coated with the alignment material film on the surface thereof is in contact with the circumferential surface of the backing roll 5, and the wrinkles are stretched by a certain tension when the alignment film 10 is conveyed. Supported by the back roller 5. Then, as shown in Fig. 14, by continuously conveying the alignment film 10 in the direction of the hollow arrow, and continuously irradiating the exposure light from the exposure devices 6, 16, the exposure light is transmitted through the slit 7c of the slit masks 7b, 17. The alignment film 10 is irradiated to the alignment film 10 at 17a, and the strip-shaped exposure portions 10a and 10b which are aligned in the same direction are formed on the alignment material film. The strip-shaped exposed portions 10a and 10b are spaced apart from each other with an interval corresponding to one scanning line component, and are aligned in directions different from each other.

However, as shown in FIG. 11, since the surface of the alignment film 10 is coated with the alignment material film, in order not to contact the air steering rods 3, 4, the discharge holes 31 formed on the surfaces of the air deflection rods 3, 4 are discharged. air. Therefore, the alignment film 10 is heated by the discharge of air, and as shown in Fig. 14, the vicinity of the back roller 5 and the slit masks 7b, 17 is planarly spread, and when reaching the slit masks 7b, 17 and the back roller At 5 o'clock, the alignment film 10 is expanded in the width direction thereof. Further, the expansion of the alignment film 10 is caused by prebaking before exposure. For example, the material of the substrate is COP (Cyclo-olefin polymer) or TAC (Triacetyl Cellulose Film) film. The width of the alignment film 10 is 1500 mm, and the thickness is 100 μm. It is 2 km, usually, transported at a speed of 2 to 10 m/min. For example, by thermal expansion of the alignment film 10, the width D ₀ is extended to 15 to 20 μm (= 2 ΔD). In this way, when the width D ₀ at the normal temperature of the alignment film 10 reaches the slit mask 7b, the both end edges of the alignment film 10 in the width direction are respectively expanded by ΔD, and the aligned alignment film 10 is set via the expansion. When the slits 7c and 17a of the slit masks 7b and 17 are exposed to each other, the extension amount 2ΔD becomes 0 when the exposure film 11 is cooled and returned to normal temperature, so that the distance between the exposure portions 10a and 10b is small. This component becomes small, and the strip-shaped polarizing portions 1a and 1b having a desired pitch cannot be obtained. Therefore, in the prior art, the arrangement pitch of the slits of the slit masks 7b and 17 is set to the interval between one scanning line and the amount of expansion of the thermal expansion is considered to make the alignment exposure film 11 to normal temperature. After cooling, it becomes a predetermined pitch. However, the amount of thermal expansion of the alignment film 10 differs depending on the material of the alignment film 10, the conveyance speed, and the like. It is rather complicated to prepare the slit masks 7b and 17 in advance, and it is difficult to form them with high precision. Polarized portions 1a, 1b.

Further, when exposed by the exposure light source 6, the alignment film 10 is also heated. Therefore, the inside of the back drum 5 is hollow, and the inside thereof is filled with cooling water to be water-cooled. Therefore, although the alignment film 10 is cooled by contact with the backing roll 5, the alignment film 10 receives a certain frictional force in contact with the circumferential surface of the backing roll 5, and is continuously restrained in the width direction, so that it is cooled even if it contacts the back roll 5. The alignment film 10 also does not rapidly shrink in the width direction thereof; as shown in FIG. 14, the alignment film 10 maintains an expanded state in the width direction during exposure, and thereafter, after being detached from the back roller 5, by the back roller 5 Cool down and cool down to the width at room temperature. Therefore, even if the backing roll 5 is cooled, the obtained polarizing film 1 maintains a state in which the line widths of the polarizing portions 1a and 1b are deviated.

Therefore, an object of the fifth embodiment is to form an exposure portion at a predetermined interval without restricting the thermal expansion of the alignment film 10, and to obtain a polarizing film having a polarizing portion with high precision. Fig. 9 is a schematic view showing a film exposure apparatus according to the fifth embodiment. The alignment film 10 is applied to the coating device 2 by the coating device 2 as in the prior art. After the surface of the alignment material film is applied, it is transported to the back drum 5 via the air turning rods 3 and 4 (see FIG. 11). Then, the alignment film 10 is wound around approximately half (lower half) of the circumferential surface of the backing roll 5, and is conveyed to the take-up device of the alignment film 11. The back drum 5 is a water-cooled drum that is internally cooled by water and is rotatable about its central axis. Then, the back roller 5 is freely rotatable, and while the alignment film 10 is moved, the back roller 5 is rotated so that its peripheral speed becomes the same as the moving speed of the alignment film 10. Thereby, the alignment film 10 is supported by the back roller 5 in a state where there is no relative speed difference with the circumferential surface of the back roller 5. Thereby, the alignment film 10 conveyed by application of an appropriate tension is prevented from being wrinkled on the circumferential surface of the back drum 5.

In the vicinity of the beginning end portion of the portion of the back surface of the backing roll 5 around which the alignment film 10 is wound, a slit mask 7b is disposed opposite to the back roller 5, and exposure light is disposed behind the slit mask 7b. The light source 6 exposes the alignment film 10 via the slit mask 7b. Further, in the vicinity of the end portion of the portion on which the alignment film 10 is wound around the circumferential surface of the back roller 5, a slit mask 17 is disposed facing the back roller 5, and an exposure is disposed behind the slit mask 17. A light source 16 that exposes the alignment film 10 via the slit mask 17. Although the light source 6 and the light source 16 are also dependent on the material of the alignment material film, for example, the polarization directions of the exposure light by irradiation are different from each other, or by irradiating the exposure light from different directions from each other for the alignment film 10, such as As shown in FIGS. 2, 4, 6, and 8, the light source 6 and the light source 16 can be alternately formed in the exposure portions 10a and 10b or the exposure portions 10c and 10d aligned in directions different from each other.

Then, on the upstream side of the backing drum 5 in the direction in which the alignment film 10 is oriented, the cooling drum 8 is disposed so as to be rotatable about its central axis. The cooling drum 8 is an internally water-cooled water-cooled drum. In the moving region of the alignment film 10, the cooling drum 8 is rotated by the alignment film 10 to rotate the alignment film 10.

Fig. 10 is a schematic view showing the alignment film 10 being developed in the vicinity of the back roller 5 and the slit masks 7b and 17. In the slit masks 7b and 17, a plurality of slits 7c and 17a are formed, and the arrangement pitch of the slits 7c and 17a corresponds to the 3D liquid crystal display of the FPR method. The device is equivalent to the amount of two scanning lines. Then, the arrangement of the slit masks 7b, 17 is translated in the width direction of the alignment film 10 by the amount of one scanning line so that the strip-shaped exposed portions formed by the slits 7c of the slit mask 7b are not The exposure portion is exposed by the slit 17a of the slit mask 17. That is, the slits 17a of the slit mask 17 are arranged at the same pitch as the arrangement pitch of the slits 7c of the slit mask 7b, and the slit mask 17 is 1/1 of the arrangement pitch of the slits 7c and 17a. The amount of the distance between the two is arranged to be biased in the width direction of the alignment film 10.

Next, the operation of the film exposure apparatus of the present embodiment configured as described above will be described. The alignment film 10 is coated with an alignment material film on its surface to restrict its movement trajectory from the state in which the air steering rods 3, 4 blow air, and is transported to the back roller 5. At this time, the blown air is heated to a temperature higher than the normal temperature by, for example, 0 to 3 ° C by the process of discharging from the air turning levers 3 and 4, and the temperature distribution thereof is also uneven. Therefore, the alignment film 10 is also stretched to a width of 2 ΔD (for example, 15 to 20 μm) at a width D ₀ (for example, 1500 mm) at a normal temperature, and reaches the arrangement position of the cooling drum 8. Then, the cooling drum 8 is rotated on the back surface of the alignment film 10 to cool the alignment film 10. On the way from the cooling drum 8 to the slit mask 7b, the alignment film 10 gradually cools down and contracts, and the width thereof gradually Zoom out. Then, when the alignment film 10 reaches the arrangement position of the slit mask 7b, the width of the alignment film 10 returns to the width at the normal temperature before the heating by the air turning rods 3, 4, etc., and the alignment film 10 is narrow. The arrangement position of the slit mask 7b receives the exposure light from the exposure light source 6 via the slit mask 7b.

That is, the alignment film 10 coated with the alignment material film on the surface is in contact with the lower half of the circumferential surface of the backing roll 5, and is stretched on the circumferential surface of the back roll 5 by the tension at the time of conveyance of the alignment film 10. The wrinkled state is supported by the back roller 5. Then, the alignment film 10 is continuously conveyed in the direction of the hollow arrow, and the exposure light from the exposure light source 6 is continuously irradiated at the beginning end portion of the portion supported by the back roller 5, and the exposure light is transmitted through the slit of the slit mask 7b. The alignment film 10 is irradiated to 7c, and a strip-shaped exposure portion 10a in which the alignment material film is aligned in the same direction is formed. The strip-shaped exposure portion 10a, the device There is an interval equal to one scanning line and separated from each other, and is formed by the spacing of the two scanning lines.

Next, since the alignment film 10 is moved to the arrangement position of the slit mask 17 at the rear end portion of the support portion of the back roller 5, the exposure light is irradiated from the exposure light source 16 to the alignment film 10 via the slit mask 17. Thereby, the unexposed portion exposed without the slit 7c is received through the slit 17a of the other slit mask 17 which is translated in the width direction of the alignment film 10 by the amount of one scanning line for the slit mask 7b. Irradiation of the exposure light from the exposure source 16. Thereby, the strip-shaped exposure portions 10b aligned in the same direction are formed between the exposure portions 10a, and the strip-shaped exposure portions 10a and 10b are alternately formed. The exposure portion 10a is linearly polarized at -45°, the exposed portion 10b is linearly polarized at +45°, or the exposed portion 10a is CW circularly polarized, and the exposed portion 10b is a film of CCW circularly polarized light. Thereby, an FPR type polarizing film can be manufactured.

At this time, although the alignment film 10 is heated by the irradiation of the exposure light at the time of exposure, the water-cooled back roller 5 is cooled, and the alignment film 10 does not rise. Therefore, the alignment film 10 always has a constant temperature while being in contact with the back roller 5, and its width D ₀ does not fluctuate due to heat. Therefore, in the alignment film 10, the positions of the exposure portions 10a and 10b corresponding to the respective scanning lines at the respective scanning lines can be made uniform with high precision.

As described above, according to the present embodiment, the alignment film 10 is cooled by the cooling member before being moved to the backing roller, and when it is wound around the backing roller, for example, it can be normal temperature, and an effective slit mask can be used at normal temperature. It is also possible to form a strip-shaped exposed portion with high precision.

Further, the present invention is not limited to the above embodiment, and various modifications are possible. The cooling member is not limited to the cooling drum 8, and a low-temperature object may be used in a non-contact manner with the alignment film 10. That is, the alignment film 10 can be cooled by radiation heat transfer by passing the alignment film 10 through the vicinity of the object at a low temperature.

Further, the present invention is not limited to the production of the FPR type polarizing film, and is also applicable to, for example, the formation of an alignment film for widening the viewing angle.

Next, a sixth embodiment of the present invention will be described. In the present embodiment, the inspection unit is placed on the downstream side of the exposure unit in the moving direction of the alignment film exposing the alignment film, and the exposure light exposure portion irradiated on the alignment film is inspected. The inspection unit includes: an inspection roller that winds the alignment film and rotates together with the alignment film; and a light source disposed on a circumferential surface of the inspection roller or inside the roller for emitting illumination light for inspection; The light receiving portion is disposed opposite to the roller for detecting illumination light transmitted through the alignment film.

Fig. 15 is a plan view showing an inspection portion of a film exposure apparatus according to an embodiment of the present invention, and Fig. 16 is a front sectional view thereof. The configuration of the exposure unit of the present embodiment is the same as that shown in Figs. 1 and 2 of the first embodiment, and detailed description thereof will be omitted. As shown in FIG. 1 and FIG. 2, an alignment material film is applied onto a surface of a membrane substrate by a suitable coating device, and an alignment film 10 coated with the alignment material film is directly transferred to an arrangement position of the back roller 5, or That is, as shown in FIG. 51, after being taken up as the drum 100, it is released from the drum 100 and conveyed to the back drum 5. After the alignment film 10 is exposed on the backing roll 5 to form an exposure portion, the alignment exposure film 11 of the exposure portion is formed and sent to an inspection portion to be described later.

Next, the inspection unit will be described with reference to Figs. 15 and 16 . The alignment film 11 is directly conveyed to the cylinder 20 of the inspection unit, and after being wound around the drum 20, it is taken up by the winding roller 101 (see FIG. 51) or the like. In the drum 20 of the inspection unit, a groove 20a extending in the drum axis direction is formed on the circumferential surface, and a rod-shaped inspection illumination source 21 extending in the drum axis direction is disposed in the groove 20a. Further, in the groove 20a, a linear polarizing plate 22 extending in the first direction (for example, p-polarized light) in the drum axis direction is disposed above the light source 21. The alignment film 11 is wound around the drum 20 to move at least in contact with the upper portion thereof, and an inspection camera 25 for detecting illumination light is disposed directly above the drum shaft of the drum 20. The inspection is performed with a camera 25, or extended to A linear sensor in the axial direction of the drum 20, or an area sensor that detects light in a rectangular planar area in the axial direction of the drum 20. Then, between the inspection camera and the drum shaft, a linear polarizing plate 24 of the lower λ/4 plate 23 and the upper second direction (for example, s-polarized light) is disposed. The drum 20 is freely rotatable about its axis, is moved by the alignment film 11 to be wound around the drum 20, and by the frictional force between the alignment films 11, the drum 20 can be at its peripheral speed and the alignment film 11 Rotate in the same state of movement speed. Then, when the groove 20a of the drum 20 is rotated to come to the upper end of the drum, the light source 21 and the camera 25 are aligned on the vertical optical axis.

Fig. 17 is a view showing a state of polarization of light by the diaphragm portions 62a, 62b and the λ/4 plate 63 corresponding to the linear polarizing plate 61 and the exposed portions 10a, 10b. Further, a λ/4 plate which converts linearly polarized light incident at 45° to the optical axis into CW circularly polarized light is used as a CW circular polarizing plate to convert linearly polarized light incident at 45° to the optical axis into λ/ of CCW circularly polarized light. The 4 plates are used as CCW circular polarizers. Further, in the incident light, a polarization component converted into CW circularly polarized light by a CW circular polarizing plate is used as p-polarized light, and a polarized component perpendicular to p-polarized light is used as s-polarized light, and a linear polarizing plate that transmits only p-polarized light is used as a linear polarizing plate. p polarizing plate, and a linear polarizing plate that only transmits s polarized light as an s polarizing plate. As shown in the upper diagram of Fig. 17, the illumination light emitted from the light source 60 is converted into p-polarized light by the p-polarized plate 61. The p-polarized light is transmitted through the diaphragm portion 62a of the first exposure portion 10a corresponding to the CW circularly polarized light, and is converted into CW circularly polarized light. When the CW circular polarized light is transmitted through the CW circular polarizing plate 63, it is converted into s polarized light. On the other hand, as shown in the lower diagram of Fig. 17, the illumination light emitted from the light source 60 is converted into p-polarized light by the p-polarizing plate 61, and then transmitted through the second exposure portion 10b corresponding to the CCW circularly polarized light. The diaphragm portion 62b is converted into CCW circularly polarized light. The CCW circularly polarized light is converted into p-polarized light if transmitted through the CW circular polarizing plate 63.

Thereby, the light transmitted through the first exposure portion 10a (CW circular polarizing portion) of the alignment exposure film 11 is emitted as a s-polarized ray, and the second exposure portion 10b (CCW circularly polarized light is transmitted through the alignment exposure film 11). Part of the light, as a p-polarized light The line emits a CW circular polarizer. Therefore, if an s polarizing plate is disposed between the CW circular polarizing plate and the camera, the light transmitted through the CW circular polarizing portion of the alignment exposure film 11 is incident on the camera and detected as a bright portion, and transmitted through the alignment exposure film 11. The light from the CCW circular polarizer does not enter the camera and is detected as a dark portion. On the other hand, if a p-polarized plate is provided between the CW circular polarizing plate and the camera, the light transmitted through the CCW circular polarizing portion of the alignment exposure film 11 is incident on the camera and detected as a bright portion, and the transmission alignment is exposed. The light of the CW circular polarizing portion of the film 11 is not incident on the camera and is detected as a dark portion. Therefore, by combining the linear polarizing plate and the λ/4 plate, the strip-shaped exposed portion on the alignment film 11 can be detected.

Next, the operation of the film exposure apparatus of the present embodiment configured as described above will be described. The alignment film 10 is coated with an alignment material film on its surface, for example, having a width of 1500 mm and a thickness of 100 μm, and the film length of one roller 100 is, for example, 2 km, and is usually transported at a speed of 2 to 10 m/min. Further, for example, the material of the substrate is a COP (Cyclo-olefin polymer) or a TAC (Triacetyl Cellulose Film) film. The alignment film 10 is conveyed to the arrangement position of the back drum 5, and is wound around the back drum 5 to be supported. Then, the alignment material film of the alignment film 10 irradiates the CW circularly polarized exposure light from the exposure light source 6 through the opening 7a of the mask 7 to the nearly full area of the alignment film 10, and then from the exposure light source 16 through the narrow The slit 17a of the slit mask 17 is irradiated to the CCW circularly polarized exposure light in a strip shape; the portion corresponding to the alignment film 10 of the slit 17a is exposed from the CW circularly polarized exposure portion to the exposure of the CCW circularly polarized light. unit. At this time, the alignment material film of the alignment film 10 is a reversible alignment material film, and the exposure light of the CW circularly polarized light is irradiated to the entire surface of the alignment film 10 to align the entire surface of the alignment film 10, and further, The strip-shaped irradiation of the exposure light of the CCW circularly polarized light is aligned to the strip-shaped portion of the alignment film 10. Thereby, the exposure portion 10b (see FIG. 2) which is circularly polarized by CCW is formed corresponding to the portion of the slit 17a of the alignment film 10. On the other hand, in the strip-shaped portion between the exposed portions 10b, the exposed portion 10a which is circularly polarized by CW is formed. Thereby, the exposure portions 10a and 10b can be alternately formed, and the FPR type polarizing film formed by the polarizing portions 1a and 1b corresponding to one scanning line can be manufactured.

At this time, since the thin alignment film 10 is supported by the back roll 5 or stretched and wrinkled, it is exposed through the slit 17a of the slit mask 17, so that wrinkles of the alignment film 10 can be prevented. Vibration, and the exposure portions 10a, 10b can be formed with high precision. Further, since the exposure through the mask 7 is performed on the entire region in the width direction of the alignment film 10, the positional matching between the mask 7 and the slit mask 17 is not required, and there is no problem of poor positioning. It also contributes to the formation of the exposure portions 10a, 10b with high precision. Then, in the present invention, since one back roll 5 is exposed twice, it is not necessary to use an expensive back roll for each exposure, and the manufacturing cost of the FPR polarizing film can be reduced.

Then, the exposed exposure film 11 after the exposure is directly conveyed to the drum 20 of the inspection unit, and after being wound around the drum 20, it is taken up by the winding drum 101 (see FIG. 51) or the like. Then, in the inspection portion, the exposure film 11 is aligned, and while the drum 20 is rotated, it moves at the same moving speed as the peripheral speed of the drum 20. Then, when the light source 21 in the groove 20a of the drum 20 is rotated to come upward, the light source 21 and the camera 25 are facing each other, and the illumination light from the light source 21 is incident on the camera 25. At this time, the light source 21 coincides with the optical axis of the camera 25, and the p-polarizing plate 22, the λ/4 plate 23, and the s-polarizing plate 24 are located on the optical axis. Then, the illumination light from the light source 21 is given a polarization axis of the p-polarized light by the p-polarizing plate 22, and the illumination light is transmitted through the alignment exposure film 11 to become CW circularly polarized light or CCW circularly polarized light, and is incident on λ/4. The plate 23 is converted into linearly polarized light by the λ/4 plate 23, and the circularly polarized light transmitted through the alignment film 11 is converted into a linearly polarized light. Then, only the light having the s-polarized polarization axis by the s-polarizing plate 24 is incident on the inspection lens. Camera 25. At this time, the exposure portion 10a on the alignment exposure film 11 has CW circularly polarized light, and when the exposure portion 10b on the alignment exposure film 11 has CCW circularly polarized light, it is converted into linearly polarized transmitted light by the λ/4 plate 23. Only the transmitted light of the polarizing axis having the s-polarized light is incident on the camera 25, and the transmitted light of the polarizing axis having the p-polarized light does not enter the camera 25. Thereby, in the camera 25, only the light of either the transmissive exposure portion 10a or the exposure portion 10b is brightly detected, so that the width (line width) of the exposure portion 10a or the exposure portion 10b can be detected. Then, in the exposure portion 10a or the exposure portion If the alignment direction of 10b is not the same, the contrast of the transmitted light detected by the camera 25 will become smaller, and the misalignment direction can be detected. In the case where an abnormality of the aligning portion of the splicing portion is used when a small reticle is used, it is possible to detect an abnormality in the width of the exposed portion or an improper alignment direction.

As a result, in the present embodiment, the drum 20 can be rotated, and the line width, the alignment direction, the state of the joint portion, and the like of the alignment film 11 can be inspected. In other words, for the alignment exposure film 11, the inspection of the exposure portion can be performed on each circumference of the drum 20. Therefore, when an abnormality is found by the inspection of the exposure portion, the exposure can be stopped, and the useless diaphragm exposure can be avoided, and the yield can be improved. At this time, since the alignment exposure film 11 is supported by the circumferential surface of the drum 20, the thin alignment exposure film 11 does not vibrate in a hollow state, so that the inspection of the alignment exposure film 11 can be performed with high precision. Further, although the alignment film 11 is bent in a horizontal posture at the edge of the groove 20a of the drum 20, if the edge portion of the groove 20a is previously processed to be smooth, the alignment film 11 is not scratched by the edge portion. .

Next, a seventh embodiment of the present invention will be described with reference to Fig. 18 . In the present embodiment, the roller 26 of the inspection unit is formed of a transparent material such as transparent glass, and the light source 21 and the p-polarized plate 22 are embedded in the drum 26. That is, the groove 26a is formed on the circumferential surface of the transparent drum 26, and after the light source 21 and the p-polarizing plate 22 are placed in the groove 26a, the upper portion of the groove 26a is closed by the transparent lid 26b. The top surface of the lid 26b is curved at the same curvature as the circumferential surface of the drum 26, and the drum 26 has a smooth cylindrical peripheral surface in a state in which the lid 26b is provided. Therefore, in the present embodiment, the portion of the groove 26a is not bent by the alignment film 11. In the present embodiment, the drum 26 and the lid 26b are formed of a transparent material, and the illumination light is emitted outside the drum, and after passing through the alignment exposure film 11, the camera 25 is finally incident.

Further, the number of grooves is the same as each of the above embodiments, and is not limited to one, and may be plural. Thereby, the pitch of the inspection place of the alignment exposure film 11 can be shortened, and it can be inspected frequently. Further, in the present invention, the λ/4 plate 23 can be used as a CW circle. The polarizing plate can also be used as a CCW circular polarizing plate. Further, the λ/4 plate 23 is not limited to the case where it is provided above the drum, and may be provided inside the grooves 20a and 26a of the drums 20 and 26. Further, the p-polarizing plate 22 and the s-polarizing plate 24 may be arranged in reverse.

The present invention is also applicable to the exposure apparatus of the second embodiment shown in FIGS. 3 and 4, the exposure apparatus of the third embodiment shown in FIGS. 5 and 6, and the fourth embodiment shown in FIGS. 7 and 8. Form of exposure device. In addition, although the first embodiment of FIGS. 1 and 2 and the second embodiment of FIGS. 3 and 4 relate to the formation of the FPR polarizing film, the third embodiment of FIGS. 5 and 6 and FIG. The fourth embodiment of Fig. 8 relates to the formation of the optical alignment film.

Next, an eighth embodiment of the present invention will be described with reference to Figs. 19 and 20 . The exposure unit of the eighth embodiment differs from the exposure unit of the sixth embodiment shown in Figs. 15 and 16 in that a vicinity of the drum 20 between the λ/4 plate 23 and the drum 20 is provided. The scale member 30 extending in the width direction of the exposure film 11 is aligned. The scale member 30 is provided with a scale having a longitudinal direction (width direction of the alignment exposure film 11) as a scale, and the camera 25 collectively detects the first exposure portion 10a or the second exposure portion on the alignment exposure film 11. 10b, and detecting the scale (scale) of the scale member 30.

In the present embodiment, the imaging of the first exposure unit 10a of the incident camera 25 and the imaging of the second exposure unit 10b are superimposed by the first polarizing plate 22, the second polarizing plate 24, and the λ/4 plate 23, The imaging of the scale of the scale member 30 is also incident on the camera 25. Therefore, unlike the sixth embodiment, the line width of the first exposure unit 10a and the second exposure unit 10b can be directly measured by the scale.

In the present invention, in addition to the inspection unit of the above-described embodiment, the second inspection unit is disposed in the conveyance region of the alignment exposure film before or after inspection by the inspection unit. The second inspection unit includes: a second light source for emitting inspection light; and a third polarizing plate, The linear ray in the first direction is applied to the inspection light from the second light source, and the second λ/4 plate is transmitted through the third polarizing plate and further transmitted through the alignment film to impart circular polarization in the first direction. The light beam is converted into linear polarized light in the second direction; the fourth polarizing plate transmits the inspection light of the linear polarized light in the second direction; the second light receiving portion detects the inspection light transmitted through the fourth polarizing plate; and the third light source a fifth polarizing plate for linearly polarizing the first or second direction with respect to the inspection light from the third light source; and a third λ/4 plate for transmitting the third polarizing plate and further The inspection light that transmits the circularly polarized light in the second direction is transmitted through the alignment film to be converted into a linearly polarized light in the second or first direction, and the sixth polarizing plate transmits the linearly polarized light in the second or first direction. And the third light receiving portion detects the inspection light transmitted through the sixth polarizing plate.

Next, a ninth embodiment of the present invention will be described with reference to Figs. 21 to 23 . This embodiment is the eighth embodiment shown in Figs. 19 and 20, and the foreign matter or the scratched person on the surface of the alignment film 11 is inspected. In the present embodiment, the alignment film 11 wound around the drum 20 is wound around the drum 40 and wound up on a take-up drum (not shown). The alignment film 11 is horizontally moved between the drum 20 and the drum 40, for example, and the light source 31a, the third polarizer 32a, and the second λ/ are disposed in the moving region of the alignment film 11 between the rollers 20 and 40. The fourth plate 33a, the fourth polarizing plate 34a, and the camera 35a are disposed such that the alignment film 11 is placed between the third polarizing plate 32a and the second λ/4 plate 33a, and the light source 31b and the fifth polarized light are disposed. The plate 32b, the third λ/4 plate 33b, the sixth polarizing plate 34b, and the camera 35b are disposed such that the alignment film 11 is interposed between the fifth polarizing plate 32b and the third λ/4 plate 33b.

In the present embodiment, as in the eighth embodiment, after the line widths of the first exposure unit 10a and the second exposure unit 10b are directly measured by the scale member 30, the alignment film 11 reaches the camera 35a and the camera 35b. Configure the location. As a result, as shown in FIG. 23, the light beam from the light source 31a is converted into a p-polarized light by the third polarizing plate 32a as the p-polarizing plate, and the CW circularly polarized light is transmitted through the alignment exposure film 11 (first The first exposure portion 10a of the circularly polarized light is converted into a CW circularly polarized light, and is converted into s-polarized light by the second λ/4 plate 33a which is a CW circular polarizing plate (refer to the upper diagram of FIG. 17). The fourth polarizing plate 34a that is transmitted as the p-polarizing plate is also not incident on the camera 35a. Therefore, the portion of the first exposure portion 10a is detected as a dark portion by the camera 35a. On the other hand, the light of the second exposure portion 10b that transmits the CCW circularly polarized light is converted into p-polarized light by the second λ/4 plate 33a which is the CW circular polarizing plate (refer to the lower diagram of FIG. 17), and transmitted as The fourth polarizing plate 34a of the p-polarizing plate is incident on the camera 35a, and the camera 35a detects the portion as a bright portion. At this time, when the crucible 51 is present (or peeled off) in the first exposure portion 10a, the portion is not converted into the CW circularly polarized light, and is detected as a bright portion in the dark portion. Further, when the foreign matter 52 is present in the second exposure portion 10b, the portion of the foreign matter 52 does not transmit light, and the camera 35a is detected as a portion of the band of the second exposure portion 10b of the bright portion. Detected as a dark part.

In the inspection unit in which the light source 31b and the camera 35b are disposed, the inspection light of the portion of the second exposure portion 10b that transmits CCW circularly polarized light (second circularly polarized light) is the third of the CCW circular polarizing plates. The λ/4 plate 33b is converted into s-polarized light, does not transmit the sixth polarizing plate 34b as the p-polarizing plate, and does not enter the camera 35b. Therefore, this portion is detected as a dark portion in the camera 35b. The inspection light of the portion of the first exposure portion 10a that transmits the CW circularly polarized light (first circularly polarized light) is converted into a CW circular deviation, and is converted by the third λ/4 plate 33b as a CCW circular polarizing plate. In the case of p-polarized light, the sixth polarizing plate 34b as the p-polarizing plate is transmitted and incident on the camera 35b, so that the camera 35b detects the portion as a bright portion. Therefore, in the camera 35b, the cymbal 51 (or flaking) on the second exposure portion 10b is detected as a bright portion among the bands in the dark portion, and the foreign matter 52 on the first exposure portion 10a is attached to the bright portion. The band is detected as a dark part. Thereby, the foreign matter 52 on the exposure film 11 or a defect such as the crucible 51 is detected by any of the cameras 35a and 35b. That is, the camera 51 detects the flaw 51 on the first exposure portion 10a, and the camera 35b detects the foreign matter 52. The cassette 51 on the second exposure unit 10b is detected by the camera 35b, and the foreign object 52 is detected by the camera 35a.

According to the present invention, during the movement of the exposure film 10, the alignment film 10 is exposed, and during the movement of the exposed alignment film 11, the alignment film 11 is wound around the roller, and the light source disposed inside the roller is The illumination light for the inspection is emitted, and the alignment exposure film 11 receives the illumination light while being wound around the roller. Then, the illumination light transmitted through the alignment exposure film 11 is received by the light receiving portion disposed outside the drum, and the alignment exposure film 11 is inspected. Thereby, when the light source rotates to the light receiving portion as the drum rotates, the illumination light of the transmission alignment film 11 is detected by the light receiving portion, the exposure quality is checked, and the exposure film 11 is aligned, and the circumference of the roller is moved during the movement. Check the exposure quality at the same interval. As a result, if there is a problem in the exposure quality, since the film can be directly stopped after the problem can be detected, and after the mask position is adjusted, the film exposure is started again, so that useless exposure can be avoided. When the polarizing film is formed, the yield can be improved. Further, in the present invention, since the alignment exposure film 11 wound around the drum is inspected, the inspection accuracy is lowered because the vibration of the exposure film 11 in the hollow state is not lowered, so that the inspection can be performed with high precision.

Next, a tenth embodiment of the present invention will be described. The exposure apparatus according to the embodiment includes a transport device for moving the alignment film of the exposure target in the first direction, and a pair of alignment markers for forming the alignment film as the alignment film on both side surfaces of the alignment film. a diaphragm alignment mark of the quantity index; a light source for emitting the exposure light; and a mask forming a plurality of slits arranged at intervals in a second direction perpendicular to the first direction, and Each of the two ends of the second direction is formed with a mask alignment mark; and the light shielding member extends in the second direction to form an opening that intersects all of the slits, and a portion of the opening that intersects the slit Transmitting the exposure light; detecting a portion of the mask alignment mark and the diaphragm alignment mark; and controlling a portion for controlling the relative position of the light shielding member and the mask in the first direction; The slit has a width that varies linearly in the first direction. When viewed in the second direction, the interval between the slits is the same as the width of the slit. The control unit controls the mask and the shading member. The relative position between the first direction, The detection unit The positional relationship between the detected reticle alignment mark and the diaphragm alignment mark is a predetermined relationship.

Fig. 24 (a) is a side view showing the configuration of the entire exposure apparatus according to the embodiment of the present invention, wherein Fig. 24 (b) is a plan view showing the reticle, and Fig. 24 (c) is an opening plate showing the same as a light shielding member. Top view. As shown in Fig. 24 (a), in the exposure apparatus of the present embodiment, the alignment film 201 to be exposed is continuously supplied from, for example, the roll-shaped supply reel 241 until it is wound up to the reel 244 on the winding side. In the meantime, for example, application of an alignment material film, exposure, drying treatment, or the like is performed. Further, in Fig. 24(a), only the exposure step for the alignment film 201 is illustrated. For example, the supply reel 241 and the take-up reel 244 are rotationally driven by a driving device such as a motor, and are continuously supplied to the alignment film 201 in the exposure device, and are provided on the front surface side or the back surface side of the alignment film 201. The conveying rollers 242, 243 and the like are supported, and the alignment film 201 is supported in a taut state. Then, in the exposure apparatus, the alignment film 201 is moved in one direction by the rotational driving force of the supply reel 241 and the take-up reel 244. In the present embodiment, two sets of light sources, a photomask, and an opening plate are provided above the alignment film 201 between the two transport rollers 242 and 243. Then, the exposure light beams having different polarization directions are emitted from the light sources 205A and 205B, and the exposure light beams of the transmission aperture plates 203A and 203B and the photomasks 202A and 202B are irradiated onto the alignment material film formed on the surface of the alignment film 201. An exposure portion having a different alignment direction is formed in a strip shape in each exposure light. That is, for example, the exposure portion a is formed by the exposure light emitted from the light source 205A, and the exposure portion a is linearly polarized in a polarization direction of -45° or circularly polarized in a polarization direction of CW (Clock Wise). Transmissive; and by the exposure light emitted from the light source 205B, the exposure portion b is formed, and the exposure portion b transmits a linearly polarized light having a polarization direction of +45° or a circularly polarized light having a polarization direction of CCW (Counter Clock Wise). .

On the upstream side of the moving direction of the alignment film 201, at the position where the alignment film 201 is subjected to heating at the time of exposure or cooling at the time of transportation, etc., an alignment indicator 206 is provided, and the alignment indicator 206 is aligned. The both side faces of the film 201 form a linear patch alignment mark 201a. Moreover, the diaphragm alignment mark 201a can be formed in the alignment The film substrate of the film 201 or the alignment material film of the alignment film 201 may be formed.

As shown in FIG. 24(b), the mask 202 is provided with a bottom portion 202a made of a light-shielding material, and a plurality of slits are arranged in a direction (second direction) perpendicular to the moving direction (first direction) of the alignment film 201. Each of the slits 202b is provided so as to have a width linearly varying in the longitudinal direction, and the interval between the slits is the same as the width of the slit in the direction perpendicular to the moving direction of the alignment film 201. That is, in the reticle shown in Fig. 24 (b), the width of each slit 202b is set such that the uppermost portion is the narrowest, and the more the lower side of the slit goes downward, the width becomes wider. . Then, each of the slits 202b extends obliquely to the moving direction of the alignment film 201. The inclination of the slit 202b is larger in the direction perpendicular to the moving direction of the alignment film 201 than the center of the mask 202, and the inclination of the side surface side is larger, for example, in the moving direction of the alignment film 201. When the length of the slit 202b is set to 300 mm, the edge of the slit on the most side surface side of the mask 202 is provided so that the end portion of the alignment film 201 in the moving direction is in the moving direction with the alignment film 201. The direction of the vertical is biased at about 500 μm.

In the side portion of the reticle 202, a viewing window 202d is used to detect the diaphragm alignment mark 201a, which is formed on the side surface of the alignment film 201 by, for example, the alignment indicator 206; The observation window 202d is provided to have the same length as the length of the slit in the moving direction of the alignment film 201, for example, and the mask alignment mark 202e is provided in the observation window 202d, and is inclined with respect to the moving direction of the alignment film 201. The reticle alignment mark 202e is located, for example, at a side edge of the slit 202b at both end portions in a direction perpendicular to the moving direction of the alignment film 201, and a parallel linear mark. As shown in FIG. 24(a), above the reticle 202, a camera 207 (symbols 207A, 207B in FIG. 24) is provided, and the reticle alignment mark can be detected by the camera 207 (207A, 207B). 202e, and the diaphragm alignment mark 201a is detected through the observation window 202d.

The opening plate 203 is a light-shielding plate made of, for example, SUS. As shown in Fig. 24(c), an opening 203b having a width of, for example, 20 to 30 mm is provided in the center of the bottom portion 203a so as to extend in one direction. Then, the opening 203b is disposed in the light source 205. Between the mask 202 and the mask 202, the longitudinal direction thereof is perpendicular to the moving direction of the alignment film 201. Therefore, a part of the exposure light emitted from the light source 205 is blocked by the opening plate 203, and only the exposure light of the opening of the opening plate 203 is transmitted to the mask 202. Therefore, by controlling the relative position of the reticle 202 and the light shielding member 203 in the moving direction of the alignment film 201 by the control portion, the irradiation position of the exposure light to the reticle 202 is moved in the moving direction of the alignment film 201, and the transmission is transmitted. The irradiation position of the exposure light irradiated onto the alignment film 201 by the slit 202b of the mask 202 moves in the moving direction of the alignment film 201, and the width of the exposure light irradiation region changes.

As shown in FIG. 25, the mask 202 can be configured to move relative to the opening direction of the opening plate 203 in the moving direction of the alignment film 201 by, for example, an actuator (not shown); the opening plate 203 and The relative position of the mask 202 in the moving direction of the alignment film 201 is controlled by a control unit (not shown). Then, the control unit controls the relative position of the mask 202 and the light shielding member 203 in the moving direction of the alignment film 201, for example, so that the positional relationship between the mask alignment mark 202e and the diaphragm alignment mark 201a becomes Established relationship.

As described above, in the present embodiment, the plurality of slits 202b provided in the mask 202 are inclined to extend in the moving direction of the alignment film 201, and the width of each slit 202b is set so as to be along the alignment film. The moving direction of 201 is linearly changed, and the interval between the slits is the same as the width of the slit when viewed from a direction perpendicular to the moving direction of the alignment film 201. Therefore, as shown in FIGS. 25(a) and 25(b), when the mask 202 is relatively moved in the moving direction of the alignment film 201 with respect to the opening plate 203, the opening 203b of the opening plate 203 is transmitted. The irradiation position of the exposure light irradiated to the mask 202 moves in the moving direction of the alignment film 201, and the width of the irradiation region of the exposure light that is transmitted through the slit 202b and irradiated onto the alignment film 201 changes. Thereby, even when the alignment film 201 is expanded due to, for example, a high temperature during exposure or the like, the strip-shaped exposure portion formed on the alignment film 201 can be adjusted in accordance with the width of the alignment film 201 after the deformation. The width. In the present embodiment, the control unit moves the mask 202 in the moving direction of the alignment film 201 so that, for example, The mask alignment mark 202e detected by the camera and the diaphragm alignment mark 201a are separated by a certain distance (for example, 10 mm) in a direction perpendicular to the moving direction of the alignment film 201. Thereby, even when the alignment film 201 is expanded in the width direction, the width of the exposure portion on the alignment film 201 can be adjusted based on the amount of elongation of the alignment film 201 in the width direction.

The method of controlling the width of the exposure unit by the control unit will be described in detail with reference to FIG. 26 . Fig. 26 is a view showing an adjustment of the position of the mask by the diaphragm alignment mark and the mask alignment mark as an example, and Fig. 26(a) is a view showing a state in which the alignment film is not deformed in the width direction. 26(b) shows a state in which the alignment film is expanded in the width direction. In FIG. 26, reference numeral 271 denotes a detection area using the camera 207, and for example, the width of the alignment film 201 in the detection direction of the detection area 271 is the same width as the opening 203b of the aperture plate 203, and the camera 207, the diaphragm is aligned with the mark 201a and the mask alignment mark 202e, and is detected in parallel with the position of the opening 203b and the moving direction of the alignment film 201. As shown in Fig. 26 (a), when the alignment film 201 is not deformed in the width direction, the distance between the diaphragm alignment mark 201a of the detection region 271 and the mask alignment mark 202e is, for example, 10 mm. Here, when the alignment film 201 is heated in the direction of exposure, for example, in the width direction, as shown in FIG. 26(b), the position of the diaphragm alignment mark 201a is outward in the observation window 202d. (left side in Fig. 26) moves, and the distance to the reticle alignment mark 202e becomes large. Therefore, when the position of the opening plate 203 is continuously exposed as shown in Fig. 26 (a), the alignment film 201 is cooled and shrunk by, for example, transportation, and is returned to the original width which is not expanded. The width of the exposure portion will become narrower. Therefore, the width of the exposure portion a and the exposure portion b formed in the exposed exposure film 201c after exposure is small, for example, the width of the image or the pixel of the display device is reduced, so that the display device of the exposure portion a and the exposure portion b is Deviation in width between images or pixels becomes a cause of poor display.

In the present embodiment, the control unit controls, for example, the position of the mask 202 in the moving direction of the alignment film 201 so that the diaphragm alignment mark 201a and the mask alignment mark 202e. Maintain a certain distance between them. That is, as shown in FIG. 26(b), the control unit moves the mask 202 relative to the opening direction of the opening plate 203 in the moving direction of the alignment film 201 by using the detection area 271 of the camera 207 to make the diaphragm. The distance between the alignment mark 201a and the mask alignment mark 202e becomes 10 mm, and the opening 203b of the opening plate 203 corresponds to a wide area of the slit 202b of the mask 202. Therefore, in the present embodiment, the width of the exposure portion on the alignment exposure film 201c can be greatly adjusted based on the amount of elongation of the alignment film 201 in the width direction. Therefore, in the present embodiment, even when the alignment film 201c is cooled and contracted by, for example, transport, and returns to the original width of the unexpanded, the exposure portion a formed on the alignment film 201c and the exposure portion a can be formed. The width of the exposure portion b can accurately correspond to, for example, the image of the display device or the width of the pixel, and display defects can be prevented.

Further, although the slit 202b of the mask and the diaphragm alignment mark 201a are actually separated by, for example, about 30 mm, as in the present embodiment, the mask alignment mark 202e is formed so as to be parallel to the position. The side edge of the slit 202b at both end portions in the direction perpendicular to the moving direction of the alignment film 201 can be selected from the side edge of the slit 202b provided at the end portion in the direction perpendicular to the moving direction of the alignment film 201. The alignment mark 202e can be aligned in a narrow range of, for example, about 10 mm, and the width of the exposure portion can be adjusted.

In addition, in FIG. 26, only one side surface of the alignment film 201 and the photomask 202 is shown in the convenience of illustration, but the control of the position of the mask is a film of the both sides of the alignment film 201. The sheet alignment mark 201a is performed between the mask alignment marks 202e on both side faces of the mask 202. In other words, the distance between the diaphragm alignment mark 201a on one side of the alignment film 201 and the mask alignment mark 202e, and the diaphragm alignment mark 201a on the other side of the alignment film 201 and the mask alignment mark Any distance between 202e, for example, is 10 mm.

However, when the alignment film 201 is meandered during the movement between the transport rollers 242 and 243, the mask 202 is perpendicular to the moving direction of the alignment film 201. The central position and the central position of the alignment film 201 are deviated, resulting in a distance between the diaphragm alignment mark 201a of one side surface of the alignment film 201 and the mask alignment mark 202e, and a diaphragm on the other side surface. The distance between the alignment mark 201a and the reticle alignment mark 202e becomes different. In order to eliminate the above problem, in the present embodiment, the control unit adjusts the position in the direction perpendicular to the moving direction of the alignment film 201 of the mask 202 so that the camera 207 is in a direction perpendicular to the moving direction of the alignment film 201. Detecting the center position of the pair of reticle alignment marks is coincident with the center position of the pair of diaphragm alignment marks 201a; thereby, the central position of the reticle 202 and the center position of the alignment film 201 can be made The position of the two matches. In other words, even if a meandering travel is generated, control can be performed such that the distance between the diaphragm alignment mark 201a on one side of the alignment film 201 and the mask alignment mark 202e, and the other side of the alignment film 201 The distance between the diaphragm alignment mark 201a and the reticle alignment mark 202e is, for example, 10 mm.

Next, the operation of the exposure apparatus of the present embodiment configured as described above will be described. The alignment film 201 of the exposure target is continuously supplied, for example, from the roll-shaped supply reel 241 until the reel on the take-up side is subjected to winding, for example, application, exposure, and drying of the alignment material film are applied. Wait. That is, an alignment material is applied in a film form on the surface of the alignment film 201 supplied in the exposure apparatus.

As shown in Fig. 27, in the present embodiment, first, a linear diaphragm alignment is continuously or intermittently formed on the side surface portion of the alignment film 201 supplied to the exposure device by the alignment indicator 206. Symbol 201a. At the time of forming the diaphragm alignment mark 201a, the alignment film 201 is not thermally deformed. The alignment film 201 on which the diaphragm alignment mark 201a is formed is continuously supplied to the exposure apparatus by, for example, a rotational driving force such as the supply reel 241 and the reel 244, and is transported by the transport roller in the exposure apparatus. 242, 243, etc. to obtain support, moving in the direction of 1 in the exposure device. At this time, for example, the alignment film 201 is expanded by a high temperature or the like at the time of exposure. When the alignment film 201 is transported by the transport rollers 242, 243, etc., in particular, the alignment film 201 is easily deformed in the width direction perpendicular to the moving direction thereof, and the alignment film 201 is expanded due to heating. The width becomes larger.

The alignment film 201 which has been thermally expanded before the exposure is transported to the irradiation position of the exposure light by transport by the transport rollers 242, 243 or the like. When the expanded alignment film 201 and the diaphragm alignment mark 201a are not extended in the width direction, as shown in FIG. 26(b), they are moved to the outside (left side of FIG. 26) in the observation window 202d. . The camera 207 detects the mask alignment mark 202e and the diaphragm alignment mark 201a via the observation window 202d, and the detection result is sent to a control unit (not shown). Then, the control unit relatively moves the mask 202 to the opening direction of the opening plate 203 in the moving direction of the alignment film 201 by, for example, an actuator, and the opening 203b of the opening plate 203 corresponds to the slit 202b of the mask 202. The wide area is such that the distance between the diaphragm alignment mark 201a and the reticle alignment mark 202e becomes 10 mm in the detection area 271 of the camera 207.

In the present embodiment, the slit 202b provided in the mask 202 has a length of 300 mm in the moving direction of the alignment film 201, and is provided at the edge of the slit 202b on the most side surface side of the mask 202. In the direction perpendicular to the moving direction of the alignment film 201, the end portion of the alignment film 201 in the moving direction is displaced by about 500 μm (1000 μm on both side surfaces of the mask 2). Therefore, for example, with the extension of the alignment film 201, when the diaphragm alignment mark 201a is moved laterally by 50 μm, the control unit controls so that the position of the photomask 202 does not expand from the corresponding alignment film 201. The position of the state is shifted by 30 mm in the moving direction of the alignment film 201, and the width of the irradiation region of the exposure light to the alignment film 201 is widened. That is, although the exposure light emitted from the light sources 205A, 205B is transmitted through the opening 203b of the opening plate 203 and irradiated onto the reticle 202, the reticle 202 for the opening plate 203 is moved by the moving direction of the alignment film 201. The relative position of the exposure light transmitted through the opening 203b of the aperture plate 203 and irradiated to the reticle 202 moves in the moving direction of the alignment film 201. In the present invention, the plurality of slits 202b provided in the mask 202 extend in the moving direction of the oblique alignment film 201, and the width of each slit 202b is set so as to be linearly along the moving direction of the alignment film 201. Variety. thereby, With the movement of the reticle 202, if the irradiation position of the exposure light to the reticle 202 moves in the moving direction of the alignment film 201, the width of the exposure light irradiation region which is transmitted through the slit 202b and irradiated onto the alignment film 201 changes. . As described above, in the present embodiment, even when the alignment film 201 is expanded and extended in the width direction, the width of the alignment film 201 after the deformation can be adjusted to be formed on the exposed alignment film 201c after exposure. The width of the strip-shaped exposure portion. Therefore, in the present embodiment, even when the alignment film 201 is deformed in the width direction perpendicular to the moving direction, the exposure can be performed without replacing the mask 202.

The alignment material film applied to the alignment film 201 by irradiation of the exposure light is subjected to light alignment in accordance with the polarization direction of the irradiation light to form the alignment exposure film 201c. For example, the exposure light emitted from the light source 205A forms an exposure portion a that transmits linearly polarized light having a polarization direction of -45° or circularly polarized light having a polarization direction of CW (Clock Wise). On the other hand, since the exposure light is not transmitted in the region between the slits 202b of the mask 202A, the unexposed portions remain between the exposed portions a. Since the interval between the slits 202b of the mask 202A is the same as the width of the slit 202b, the unexposed portion between the exposed portions a is equal to the width of the exposed portion a. In the present embodiment, the unexposed portion is exposed by the light source 205B, the mask 202B, and the opening plate 203B provided on the downstream side in the moving direction of the alignment film 201.

Even at this time, the position of the diaphragm alignment mark 201a and the mask alignment mark 202e is detected by, for example, the camera 207, and the detection result is transmitted to a control unit (not shown). Then, similarly to the step of forming the exposure portion a, the control portion controls the relative position of the mask 202 and the light blocking member 203 in the moving direction of the alignment film 201 so that the position of the diaphragm alignment mark 201a and the mask alignment mark 202e Relationships become established relationships. For example, control is performed to move the reticle 202 relative to the opening plate 203 in the moving direction of the alignment film 201. Therefore, in the downstream direction of the moving direction of the alignment film 201, the width of the strip-shaped exposed portion formed on the alignment film 201c can be adjusted corresponding to the width of the alignment film 201; even if the alignment film 201 is perpendicular to the moving direction thereof In the case where deformation occurs in the width direction, exposure may be performed without replacing the mask 202.

Then, by the irradiation of the exposure light emitted from the light source 205B, the exposure portion b that transmits the linearly polarized light having a polarization direction of +45° or the circularly polarized light having a polarization direction of CCW (Counter Clock Wise) is formed. The unexposed portion between the exposure portions a is adjacent to the exposure portion a.

The alignment film 201 is conveyed in a zigzag direction in a direction perpendicular to the moving direction. However, as described in the present embodiment, in the exposure apparatus in which two sets of the light source 205, the mask 202, and the aperture plate 203 are provided to irradiate two types of exposure light having different polarization directions, the alignment material film is optically aligned. For the two types of exposure light, the relative positional matching of the irradiation positions becomes important. For example, when the irradiation position of the exposure light is shifted in the width direction of the alignment film 201, the unexposed area remains, or the area where the exposure is overlapped is caused to cause poor exposure. However, in the present embodiment, the diaphragm alignment mark 201a is formed on both side surfaces of the alignment film 201, and the control unit controls the position in the direction perpendicular to the moving direction of the alignment film 201 of the mask 202 so that In the direction perpendicular to the moving direction of the alignment film 201, the camera 207 detects the center position of a pair of the mask alignment marks 202e, which coincides with the center position of the pair of diaphragm alignment marks 201a. In other words, even if a meandering travel is generated, the distance between the diaphragm alignment mark 201a on one side of the alignment film 201 and the mask alignment mark 202e, and the diaphragm on the other side of the alignment film 201 can be controlled. The distance between the alignment mark 201a and the reticle alignment mark 202e is, for example, 10 mm. Therefore, even if the alignment film 201 is zigzag traveling along with the movement, the exposure failure can be prevented by adjusting the position of the mask 202 in the direction perpendicular to the moving direction of the alignment film 201.

The alignment exposure film 201c of the exposure portion a and the exposure portion b is formed by the irradiation of the exposure light, and is cooled by the conveyance, and is contracted to the width before expansion. Thus, the polarizing film shown in FIG. 50 is produced, and the exposed portion a and the exposed portion b which are formed in a wide width are contracted to have a predetermined width.

As described above, in the present embodiment, even when the alignment film 201 is expanded in the width direction due to heating, the slit shape of the mask 202, the configuration of the opening plate 203, and the utilization control portion are employed. The control can also be performed without replacing the mask.

Further, in the present embodiment, the case where the alignment film 201 is expanded by heating is described. However, even when the alignment film 201 is cooled and contracted before exposure, for example, the control unit may be used. The positional relationship between the reticle 202 and the alignment film 201 of the opening plate 203 is controlled so that the positional relationship between the reticle alignment mark 202e and the diaphragm alignment mark 201a is a predetermined relationship, and the reticle can be replaced. The polarizing film 1 is manufactured with high precision.

Further, in the present embodiment, two sets of the light source 205, the mask 202, and the aperture plate 203 are disposed in the moving direction of the alignment film 201, and the light sources 205A and 205B emit exposure light having different polarization directions, respectively, in a series of steps. The case where the exposure portion a and the exposure portion b are formed will be described. However, the exposure device for forming the exposure portion a and the exposure portion b may use other exposure devices. Alternatively, by irradiating the irradiation direction of the exposure light to the alignment film 201, it is also possible to form the alignment exposure film 201c having a different alignment direction by using one exposure apparatus.

Further, in the present embodiment, the case where the opening plate 203 is disposed between the light source 205 and the reticle 202 will be described. However, in the present invention, only the opening of the slit 202b and the opening plate 203 by the reticle 202 is required. The 203b may limit the irradiation area of the exposure light to the alignment film 201, and the opening plate 203 may be disposed between, for example, the mask 202 and the alignment film 201.

Further, in the present embodiment, the camera 207 is disposed above the reticle 202, and the side surface of the reticle 202 is provided with the observation window 202d for detecting the diaphragm alignment mark 201a. However, in the present invention, the detecting portion such as the camera 207 may be provided below the alignment film 201. At this time, or not The observation window 202d is provided, for example, a reticle alignment mark 202e is provided on the bottom surface of the reticle 202, and the diaphragm alignment mark 201a and the reticle alignment mark 202e can be detected from below the alignment film 201 by the camera 207.

Further, as for the photomask 202, a photomask 202C having a slit 202b as shown in Fig. 28 can be used. In the reticle 202C, the plurality of slits 202b have a width that linearly changes in the moving direction of the alignment film 201; the interval between the slits is observed from a direction perpendicular to the moving direction of the alignment film 201, and The slits 202b have the same width. The mask 202C shown in FIG. 28 is provided in the slits at both end portions of the mask 202C, and is provided at one end of the slit 202b so that the side edge thereof is disposed in parallel with the moving direction of the alignment film 201; The other plurality of slits 202b extend obliquely to the moving direction of the alignment film 201; the inclination of the slits 202b is set to be from the one end side to the other end side in a direction perpendicular to the moving direction of the alignment film 201 , gradually getting bigger. When the photomask 202C is used, the position of the photomask 202 can be controlled based on the slit 202b having one end portion of the side edge parallel to the moving direction of the alignment film 201. The slit 202b of the other end portion which is inclined most, for example, to the moving direction of the alignment film 201, has a length of 300 mm in the moving direction of the alignment film 201, and its side edge is disposed so as to be perpendicular to the moving direction of the alignment film 201. When the direction is biased by about 1000 μm, the control unit controls the photomask 202 in the moving direction with the alignment film 201 when the distance between the patch alignment marks 201a increases by 100 μm with the extension of the alignment film 201. The substrate was moved outward by 100 μm in the vertical direction while being controlled so as to be moved by 30 mm in the moving direction of the alignment film 201. Thereby, the positional relationship between the mask alignment mark 202e and the diaphragm alignment mark 201a is the same as that in the case where the alignment film 201 does not extend, and the alignment film can be adjusted without replacing the mask 202C as in the first embodiment. The width of the exposure area of the exposure light of 201.

Further, in the present embodiment, a reversible alignment material film is formed on the alignment film 201, but an irreversible alignment material film may be formed.

Next, an eleventh embodiment of the present invention will be described. Figure 29 shows the benefit A drawing of an exposure step of the exposure apparatus according to the eleventh embodiment of the present invention is used. In the present embodiment, a reversible alignment material film is formed on the alignment film 201. Further, instead of the mask 202A in the tenth embodiment, the mask 202D is instead provided. In the reticle 202D, the slit 202b is not provided, and instead, the opening 202f is provided, and the width of the opening 202f is changed in the moving direction of the alignment film 201. Then, the exposure light is irradiated to the entire area of the exposure target region of the alignment film 201 through the opening 203b of the aperture plate 203 and the opening of the mask 202D. The other configurations are the same as those of the first embodiment.

In the present embodiment, a reversible alignment material film is formed on the surface of the alignment film 201. In the present embodiment, first, as shown in FIG. 29(a), the entire area of the alignment material film formed on the surface of the alignment film 201 is exposed by the exposure light emitted from the light source 205A. Then, as shown in FIG. 29(b), the exposure light emitted from the light source 205B is irradiated to the alignment material film in accordance with the opening of the opening plate 203B and the slit of the mask 202B. In the present embodiment, since the reversible alignment material film is used, the alignment direction of the portion irradiated with the second exposure is changed from the alignment direction of the portion irradiated with the first exposure. Therefore, in the present embodiment, the same alignment exposure film as in the tenth embodiment is formed.

In the present embodiment, when the alignment film 201 is expanded and extended in the width direction due to heating by exposure, the photomask 202 and the opening plate 203 in the moving direction of the alignment film 201 are controlled by the control portion. The relative position makes it possible to adjust the width of the strip-shaped exposure portion formed on the alignment film 201 without replacing the mask 202 for exposure.

Further, in the exposure apparatus of the tenth embodiment, even when the non-reversible alignment material film is formed on the surface of the alignment film 201, instead of the photomask 202B on the downstream side in the moving direction of the alignment film 201, it is replaced by The photomask 202D of the eleventh embodiment is exposed by exposure light emitted from the upstream side light source 205A so that the alignment material film corresponds to the opening of the aperture plate 203A and the predetermined width of the mask 202A. The slits are arranged to be aligned, and by exposing the entire surface of the exposure target region by exposure of the exposure light emitted from the light source 205B on the downstream side, the tenth embodiment and the 11 Alignment film of the same embodiment. At this time, by controlling the relative position of the mask 202 and the opening plate 203 in the moving direction of the alignment film 201 by the control unit, the width of the strip-shaped exposure portion formed on the alignment film 201 can be adjusted, or Exposure is performed without replacing the mask 202.

Next, a twelfth embodiment of the present invention will be described. An exposure apparatus according to a twelfth aspect of the present invention includes: a transport device for moving an alignment film to be exposed in a first direction; and a pair of alignment markers formed on the both sides of the alignment film as the alignment a diaphragm alignment mark of an index of the amount of expansion and contraction of the film; a light source for emitting the exposure light; and a mask forming a plurality of slits arranged at intervals in the second direction perpendicular to the first direction, and arranged An observation window for observing one pair of the pair of diaphragm alignment marks, and a mask alignment mark is formed in each of the observation windows; the light shielding member extends in the second direction to form and The slit intersects the opening, and transmits the exposure light at a portion where the opening intersects the slit; the detecting portion is configured to detect the reticle alignment mark and the film alignment in the observation window And a control unit that adjusts a relative positional relationship between the light shielding member and the reticle in the first direction based on a detection result of the detection unit; wherein, in the slit, at one end of the second direction The first slit is parallel to the first direction, and the other The second slit of the end portion is inclined at the maximum inclination in the first direction, and the slit between the first slit and the second slit is inclined from the first slit to the second slit. The width of the slit is linearly changed in the first direction, and the interval between the slits is the same as the width of the slit in the second direction; the first slit side 1. The mask alignment mark extends in the first direction, and the second mask alignment mark on the second slit side and one side edge in the width direction of the second slit or the center in the width direction The lines extend in parallel.

Next, a twelfth embodiment of the present invention will be described with reference to Figs. 30 to 36. This embodiment corresponds to the meandering of the alignment film and the corresponding alignment film. Both the thermal expansion and the deformation caused by the heat shrinkage are performed with high precision. Fig. 30 (a) is a plan view showing the mask 220 of the embodiment, and Fig. 30 (b) is a plan view showing the aperture plate 230 of the embodiment. The mask 220 is formed by arranging a plurality of slits 220b in a direction (second direction) perpendicular to a moving direction (first direction: indicated by a hollow arrow) of the alignment film 210 in a bottom portion 220a made of a light-shielding material. Each slit 220b is provided so that its width linearly changes in the longitudinal direction, and the interval between the slits is the same as the width of the slit 220b in the direction perpendicular to the moving direction of the alignment film 210. That is, in the mask 220 shown in Fig. 30 (a), the width of each slit 220b is set to be the narrowest at the uppermost portion, and becomes wider as it goes downward along the longitudinal direction of the slit. . Then, in each slit 220b, the slit 220b disposed at one end portion of the alignment film 210 in the width direction extends in parallel with the moving direction of the alignment film 210, and has a length y. Further, in the slit 220b, the slit 220b disposed at the other end portion of the alignment film 210 in the width direction extends obliquely to the moving direction of the alignment film 210, and is inclined so as to move in the moving direction of the alignment film 210. The distance of y is biased by the amount of x in the width direction of the alignment film 210. The slit 220b between the un-tilted slit 220b (parallel slit) of one end portion of the alignment film 210 and the slit 220b (maximum inclined slit) at the other end of the inclined film is inclined from the parallel slit toward the maximum The slit is inclined so that the inclination angle is gradually increased. Also, for example, y is 300 mm and x is 1 mm.

31(a) and (b) are diagrams showing the laser marker 250 in which the alignment marks are formed on the alignment film 210. The laser marker 250 is directed to the alignment film 210 that is continuously output from the film take-up roller 245, and the laser beam is irradiated on both side surfaces of the alignment film 210 to form alignment marks 210a and 210b. Further, when the laser light is irradiated onto the alignment film 210 from the laser marker 250, the bottom surface of the alignment film 210 is supported by the roller 246, and the surface of the alignment film 210 is fixed.

On both side faces of the reticle 220, for example, the observation window 220d for detecting the diaphragm alignment marks 210a, 210b is provided to the same length as the length of the slit 220b in the moving direction of the alignment film 210; The window 220d is provided with mask alignment marks 220e, 220f. The mask alignment mark 220f is flat in the moving direction of the alignment film 210 The observation window 220d is extended on the one end side, and the observation window 220d is formed with parallel slits 220b (parallel slits) in the moving direction of the alignment film 210 of the photomask 220. On the other hand, the mask alignment mark 220e is an observation window 220d provided on the other end side in the width direction of the alignment film 210, and extends in parallel with the side edge of the maximum inclined slit 220b provided on the other end side. .

The opening plate 230 is, for example, a opaque plate made of SUS. As shown in Fig. 30 (b), an opening 230b having a width of, for example, 20 to 30 mm is provided in the center of the bottom portion 230a so as to extend in one direction. The opening 230b has a length extending over the entire area of the arrangement area of the slit 220b of the reticle 220. Then, it is disposed above the photomask 220 such that the longitudinal direction of the opening 230b is perpendicular to the moving direction of the alignment film 210. That is, as shown in FIG. 32(a), a mask 220 is provided in the middle of the moving region of the alignment film 210, and the opening plate 230 is disposed above the mask 220. An exposure light source 270 is disposed above the aperture plate 230, and the exposure light irradiated from the exposure light source 270 illuminates the aperture plate 230, and a portion thereof is shielded from light by the aperture plate 230, and the portion of the exposure light transmitting opening 230b is irradiated to the mask. 220, and the exposure light of the slit 220b of the transmission mask 220 is irradiated to the alignment film 210.

The control unit controls the relative position of the mask 220 and the light blocking member 230 in the moving direction of the alignment film 210. That is, the control unit, as shown in FIGS. 33 to 36, moves the relative position with respect to the opening plate 230 of the reticle 220 in a state where the opening plate 230 is fixed, for example, to adjust the exposure light in the alignment. The irradiation position on the film 210, which is the overlapping area of the transmission opening 230b and the slit 220b at a planar viewing angle.

As shown in Fig. 32 (a), above the observation window 220d of the reticle 220, a bifocal linear camera 260 is disposed. The bifocal linear camera 260 is a pair of diaphragms that are visible in the observation window 220d. The alignment marks 210a, 210b and the mask alignment marks 220f, 220e are observed by the detection area 271.

Next, the control aspect of the control unit and the operation of the exposure apparatus of this embodiment will be described. As shown in FIG. 32(b), the mask alignment mark 220f extending in the moving direction (first direction) of the alignment film 210 is used as the first mask alignment mark 220f to be aligned with the first mask. The mark 220f is collectively observed in the observation window 220d as the first diaphragm alignment mark 210b. Further, the mask alignment mark 220e extending obliquely to the moving direction (first direction) of the alignment film 210 is used as the second mask alignment mark 220e, and is observed together with the second mask alignment mark 220e. The diaphragm alignment mark 210a observed in the window 220d serves as the second diaphragm alignment mark 210a. Further, in the following operation, the opening plate 230 is not moved.

At the start of exposure, as shown in FIG. 33, if the distance between the first patch alignment mark 210b and the first mask alignment mark 220f of the detection area 271 viewed by the camera 260 is A, When the distance between the second patch alignment mark 210a and the second mask alignment mark 220e is B, the control unit sets the distance A to the first patch alignment mark 210b to be aligned with the first mask. The reference value of the distance between the marks 220f is set to the reference value of the distance between the second patch alignment mark 210a and the second mask alignment mark 220e.

Then, as shown in FIG. 34(a), the alignment film 210 is meandering, and the alignment film 210 is biased in the second direction (the width direction of the alignment film 210) at the position of the mask 220 at the initial stage of exposure. In this case, in the detection area 271, the distance between the first patch alignment mark 210b and the first mask alignment mark 220f changes from the reference value A. Here, as shown in FIG. 34(b), the control unit adjusts the movement of the mask 220 in the second direction (indicated by a hollow arrow) to align the first patch alignment mark 210b with the first mask. The distance between the marks 220f coincides with the reference value A. When the alignment film 210 is not thermally expanded or thermally contracted, the distance between the second patch alignment mark 210a and the second mask alignment mark 220e also coincides with the reference value B. Thereby, as shown in FIG. 32(b), the exposure light is transmitted through the region where the opening 230b of the aperture plate 230 overlaps the slit 220b of the mask 220, and a plurality of parallel-line exposure portions are formed to move in the first direction. The alignment film 210. Due to the exposure portion, the curve is fitted to the alignment film 210 Since the reticle is moved in the second direction by the folding, the position of the reticle 210 (the position on the aligning film 210 in the case where the zigzag does not occur) is not changed.

Next, as shown in FIG. 35(a), when the alignment film 210 is thermally expanded, by the observation result of the detection area 71 of the camera 260, for example, it is detected that although the first diaphragm alignment mark The distance between 210b and the first mask alignment mark 220f is the same as the reference value A, but the distance between the second patch alignment mark 210a and the second mask alignment mark 220e is deviated from the reference value B. small. In this way, the control unit adjusts the movement of the mask 220 to the opening plate 230 in the direction indicated by the hollow arrow in FIG. 35(b) (in the direction shown in FIG. 32, the moving direction of the alignment film 210). As a result, since the exposure light of the portion of the opening 230b of the transmissive opening plate 230 overlapping the slit 220b of the reticle 220 does not move the opening plate 230, the reticle 220 faces the hollow arrow shown in FIG. 30(a). When the movement is reversed, the width of the transmission slit 220b is wider and wider, and the linear exposure portion of the exposed exposure film 210c after exposure has a wide width and a large change in the interval. Thereby, even if the alignment exposure film 210c thermally expands, the width becomes large, and accordingly, the exposure portion on the alignment exposure film 210c is broad in the width direction of the alignment exposure film 210c. Therefore, when the exposure exposure film 210c is cooled to return to the temperature at the start of exposure by the exposure portion exposed in the exposure step of FIG. 35, the width and the interval of the exposure portion at the start of exposure can be made uniform. And the effect of thermal expansion of the alignment film 210 is eliminated.

Next, Fig. 36 shows an example in the case where the alignment film 210 is subjected to meandering and thermal expansion. As shown in FIG. 36(a), the interval between the first patch alignment mark 210b and the first mask alignment mark 220f of the detection region 271 observed by the camera 260 is changed from the reference value A, and further The interval between the second patch alignment mark 210a and the second mask alignment mark 220e varies from the reference value B. In this way, the control unit first adjusts and moves the mask 220 in the second direction as shown in FIG. 36(b) to set the first patch alignment mark 210b and the first mask alignment mark 220f. Distance, with reference value A Consistent. Thereafter, in the detection area 271 of the camera 260, the distance between the second patch alignment mark 210a and the second mask alignment mark 220e is detected, and when it does not coincide with the reference value B, as shown in FIG. 36 ( c), the control unit adjusts the movement of the mask 220 in the first direction. In the case of the example shown in Fig. 36 (c), as in the case of Fig. 35 (b), since the transmission light of the portion where the transmission opening 230b overlaps the slit 220b, the transmission is wider and spaced in the slit 220b. The wider portion is blended with the thermal expansion of the alignment film 210, and the exposed portion on the exposed exposure film 210c after exposure has a wider width and a wider interval than in the initial stage of exposure. Therefore, when the alignment exposure film 210c is cooled and returned to the normal temperature, it becomes the same as the width and interval of the exposed portion at the initial stage of exposure. Thereby, even when the meandering of the alignment film 210 and the thermal expansion of the alignment film 210 occur, the exposure portion on the alignment film 210c can be made coincident with the start of exposure (or as a reference value determiner). A high-precision exposure portion is formed.

Further, in each of the above embodiments, the mask alignment mark is formed such that the side edge of the mask on the mark side of the slit closest to the mask alignment mark is parallel to the mask alignment mark. The present invention is not limited thereto, and a reticle alignment mark may be formed such that the reticle of the slit closest to the aligning mark of the reticle is aligned with the opposite side edge of the mark, and the aligning mark of the reticle Parallel, in addition, a reticle alignment mark may be formed such that the center line of the width direction of the slit closest to the reticle is parallel to the reticle alignment mark. Further, in the present invention, the mask may be aligned with the mark, and the side edge of the mask on the mark side of the slit closest to the slit, the side edge of the opposite side, or the center line of the width of the slit may be used as a reference line. At the time of formation, the distance between the width of the nearest slit and the linear change in the first direction is considered, and the distance between the mask alignment mark and the reference line is set. In other words, it is possible to determine the reticle alignment mark and the slit nearest thereto, and not to be parallel, but to measure the expansion and contraction of the alignment film at intervals of the two, and to linearly change in the first direction. The amount of change in the linearity of the interval between the reticle alignment mark and the slit closest thereto can be used for the amount of linear change in the first direction of the width of the nearest slit.

In the present invention, in the photomask, the plurality of slits are in the moving direction with the alignment film. The first direction is perpendicular to the second direction, and is arranged at intervals. The width of the slit changes linearly in the first direction, and the interval between the slits is the width of the slit when viewed in the second direction. the same. Then, a light shielding member is provided to overlap the photomask, and the light shielding member forms an opening that extends in the second direction and intersects all the slits. Therefore, in the present invention, the exposure light that transmits the opening of the light shielding member extending in the second direction and the slit of the reticle is irradiated onto the alignment film. Then, the detecting unit detects the reticle alignment mark and the film alignment mark disposed on the reticle, and the control unit controls the relative position of the reticle and the light shielding member in the first direction, so that the detecting unit detects The positional relationship between the mask alignment mark and the diaphragm alignment mark has a predetermined relationship. Therefore, in the present invention, the relative position of the slit of the photomask and the opening of the light shielding member can be adjusted, and the width of the irradiation region of the exposure light to the alignment film can be accurately adjusted based on the width after the deformation. Therefore, even when the alignment film of the exposure target is deformed in the width direction, exposure can be performed without replacing the photomask.

Further, in another exposure apparatus of the present invention, the first slit of one end portion in the second direction is parallel to the first direction by the adjustment and movement of the mask in the second direction, and the first slit The first mask alignment mark is formed in parallel, and the distance between the first mask alignment mark and the diaphragm alignment mark becomes a predetermined reference value A, and the exposure position due to the meandering of the alignment film can be prevented. change. Further, by adjusting the movement of the mask in the first direction, the distance between the second slit of the other end portion in the second direction and the second mask alignment mark becomes a predetermined reference value B, thereby preventing The change in exposure position due to thermal expansion or thermal contraction of the alignment film.

Next, a thirteenth embodiment of the present invention will be described. The exposure apparatus according to the embodiment includes a moving device for moving the alignment film on which the alignment material film is formed on the film substrate in one direction, and the first exposure unit is disposed in the movement region of the alignment film. a first exposure pattern composed of a plurality of strip-shaped exposed portions formed on the alignment film on the alignment film, wherein the plurality of strip-shaped exposed portions extend in the one direction and are perpendicular to the one direction The second exposure unit is disposed on the downstream side of the first exposure unit in the moving direction of the alignment film, and is spaced apart from each other; The alignment material film on the alignment film forms a second exposure pattern composed of a plurality of strip-shaped exposure portions, the plurality of strip-shaped exposure portions being located in the one direction and perpendicular to the one direction a region inspection portion between the exposure portions of the first exposure pattern in the direction of the movement of the alignment film between the first exposure unit and the second exposure unit for detecting the first exposure And a control unit that controls an exposure position of the second exposure pattern of the second exposure unit based on a position of the exposure unit of the first exposure pattern detected by the inspection unit.

In this case, when the exposure apparatus of the present invention is applied to a method for producing an FPR, the method for producing the FPR includes the following steps while moving the alignment film on which the alignment material film is formed on the film substrate in one direction. a first exposure step of forming a first exposure unit composed of a plurality of strip-shaped exposure portions by forming a first exposure unit provided in a moving region of the alignment film, and forming an alignment film formed on the alignment film on the alignment film. The plurality of strip-shaped exposure portions of the first exposure pattern extend in the one direction and are spaced apart from each other in a direction perpendicular to the one direction; and the second exposure step is provided in the second exposure step a second exposure unit on the downstream side of the first exposure unit in the moving direction of the alignment film, wherein the alignment film on the alignment film forms a second exposure pattern composed of a plurality of strip-shaped exposure portions, and the second exposure unit is formed. a plurality of strip-shaped exposure portions of the exposure pattern extending in the one direction and positioned in a direction perpendicular to the one direction of the exposed portions of the first exposure pattern; and an inspection step The first exposure And an exposure portion for detecting the first exposure pattern between the second exposure step; wherein the second exposure step is controlled based on a position of the exposure portion of the first exposure pattern detected by the inspection step The exposure position of the second exposure pattern of the second exposure unit is used.

Fig. 37 is a view showing an exposure apparatus according to a thirteenth embodiment of the present invention, and Fig. 38 is a view showing an exposure portion formed on the alignment exposure film 310a. The alignment film 310 having the alignment material film on the surface thereof is transported to the back roller 315 by a moving device (not shown), and is wound from the back roller 315 and then sent out from the back roller 315. Then, the alignment film 310 contacts the back roller 315 to support the back surface thereof to the back roller 315. In the moving region of the alignment film 310, the first exposure unit 320 is disposed on the most upstream side thereof, and the second exposure unit 321 is disposed on the most downstream side thereof, and between the first exposure unit 320 and the second exposure unit 321 The location is configured with an inspection unit 330.

The first exposure unit 320 has, for example, an exposure light source 322 that irradiates the CW circularly polarized exposure light toward the mask 323, and the exposure light from the exposure light source 322 is irradiated onto the alignment film 310 via the mask 323. membrane. The second exposure unit 321 has, for example, an exposure light source 324 that irradiates the CCW circularly polarized light toward the mask 325, and the exposure light from the exposure light source 324 is irradiated onto the alignment film 310 via the mask 325. membrane. As shown in FIG. 38, the masks 323 and 325 are respectively formed with elongated rectangular slits 323a and 325a extending in the moving direction 309 of the alignment film 310. The widths of the slits 323a, 325a are the widths of one scanning line, and the slits 323a, 325a are spaced apart from each other and also have a width of one scanning line. Then, the masks 323 and 325 are disposed such that the slit 323a of the mask 325 and the slit 325a of the mask 325 correspond to mutually adjacent scanning lines in a direction perpendicular to the moving direction 309 of the alignment film 310. The slits 323a, 325a are made to interact. Therefore, the arrangement pitch of the slits 323a and 325a corresponds to two scanning line divisions of the FPR type 3D liquid crystal display device.

In the backing roller 315, the alignment film 310 is wound around a half (lower half) of the circumferential surface thereof, and the back surface of the alignment film 310 is in contact with the back roller 315, and at the same time, the surface of the alignment film 310, that is, the alignment material film system Heading out. The masks 323 and 325 are disposed facing the alignment material film and spaced apart from the alignment film 310 by a distance (about 200 μm) so that the masks 323 and 325 are opposed to each other with the back roller 315 therebetween. Exposure light sources 322, 324 are disposed behind the masks 323, 325. Thereby, the alignment film 310 coated with the alignment material film on the surface is in contact with the circumferential surface of the back roller 315, and is stretched by the tension when the alignment film 310 is conveyed, and is subjected to the back roller 315. Support. Then, by continuously transporting the alignment film 310 in the moving direction 309, and continuously exposing the exposure light from the exposure light sources 322, 324, the exposure light is transmitted through the slits 323a, 325a of the masks 323, 325 to illuminate the alignment. Film 310.

The back drum 315 is a water-cooled drum that cools the inside and is rotatable about its central axis. Then, the back roller 315 is freely rotatable and rotated while the alignment film 310 is moved so that its peripheral speed is the same as the moving speed of the alignment film 310. Thereby, the alignment film 310 is supported in a state where the circumferential surface of the back roller 315 does not have a relative speed difference. Thereby, the alignment film 310 which is conveyed by applying an appropriate tension is prevented from being wrinkled on the circumferential surface of the back roller 315.

The exposure light from the exposure light source 322 is CW circularly polarized light, and the exposure light from the exposure light source 324 is CCW circularly polarized light. Then, as shown in FIG. 38, during the movement of the alignment film 310 in the moving direction 309, the respective exposure light passes through the slits 323a, 325a of the masks 323, 325, and the alignment material film on the alignment film 310 is irradiated. The exposure portion of the slit 323a is, for example, an exposure portion 301a that is a CW circularly polarized light for the left eye, and an exposure portion 301b that is a CCW circularly polarized light for the right eye, for example, corresponding to the exposure portion of the slit 325a.

The inspection unit 330 includes a camera 331 disposed above the back roller 315 and facing the detection direction directly downward. The half mirror 334 is disposed under the camera 331; the linear polarizing plate 332 is further disposed at half. Below the mirror 334; and inspection of the light source 333, the inspection light is illuminated for the half mirror 334. Thereby, the inspection light of the light source 333 is inspected by itself, reflected by the half mirror 334, and transmitted to the alignment film 310 on the back roller 315 by the linear polarizing plate 332; the reflected light reflected on the back roller 315 is transmitted linearly polarized. The plate 332 is incident on the camera 331 via the half mirror 334.

45(a) and 45(b) are diagrams for explaining the principle of the present invention, showing a state of polarization of light by a combination of a linear polarizing plate and a λ/4 plate. As shown in the upper diagram of Fig. 45, the illumination light emitted from the light source 360 is converted into p-polarized light by the p-polarized plate 361. The p-polarized light is converted into CW circularly polarized light by the CW circular polarizing plate 362. The CW circularly polarized light is passed through a CW circular polarizing plate 363. Converted to s polarized light. On the other hand, as shown in the lower diagram of FIG. 45, the illumination light emitted from the light source 360 is converted into the p-polarized light by the p-polarized plate 361, and then converted into the CW circularly polarized light by the CW circular polarizing plate 362. Thereafter, it is converted into p-polarized light by the CCW circular polarizing plate 364. Further, the first exposure portion 301a of the alignment exposure film 310a after the alignment film 310 is exposed has a function of converting linearly polarized light in a specific direction into CW circularly polarized light. That is, a CW circular polarizing plate and an equivalent optical axis can be defined.

That is, as shown in Fig. 44 (a), when the CW circular polarizing plate 336 and the upper s polarizing plate 337 are disposed between the camera 331 and the alignment exposure film 310a, the inspection light emitted from the light source 333 is borrowed. The light which is converted into p-polarized light by the p-polarized plate 332 is incident on the alignment exposure film 310a. The light transmitted through the first exposure portion 301a (CW circular polarization portion) of the alignment exposure film 310a is converted into s-polarized light by the CW circular polarizing plate 336, and is non-exposed between the first exposure portions 301a of the transmission alignment film 310a. The light of the portion (non-polarized portion) is converted into CW circularly polarized light by the CW circular polarizing plate 336. Therefore, the light transmitted through the CW circular polarizing portion of the alignment exposure film 310a is transmitted through the s polarizing plate 337, and is incident on the camera 331 to be detected as a bright portion, and on the other hand, the light in the non-exposed portion of the transmission alignment film 310a is transmitted. The s polarizer 337 cannot be transmitted, and is not incident on the camera 331, so it is detected as a dark portion. Further, as shown in FIG. 44(b), when the CCW circular polarizing plate 338 and the p-polarizing plate 332 above it are disposed between the camera 331 and the alignment exposure film 310a, the first exposure portion 301a of the alignment exposure film 310a is transmitted. The light of the (CW circular polarizing portion) is converted into p-polarized light by the CCW circular polarizing plate 338, and the light of the non-exposed portion (non-polarized portion) between the first exposed portions 301a of the visible exposure film 310a is borrowed. The CCW circular polarizing plate 338 converts light into CCW circularly polarized light. Therefore, the light transmitted through the CW circular polarizing portion of the alignment exposure film 310a is transmitted through the p-polarizing plate 332, is incident on the camera 331 and is detected as a bright portion, and on the other hand, is transmitted through the non-exposed portion of the alignment exposure film 310a. The p-polarized plate 332 cannot be transmitted, and is not incident on the camera 331, so it is detected as a dark portion. Therefore, the strip-shaped exposure portion on the alignment exposure film 310a can be detected by the combination of the linear polarizing plate and the λ/4 plate.

However, in the present invention, the first exposure portion 301a of the CW circularly polarized light formed by the first exposure unit 320 can be detected without using such an optical system in which a plurality of linear polarizing plates and a λ/4 plate are combined. In other words, the inspection light emitted from the light source 333 is converted into the p-polarized light by the p-polarized plate 332, and is incident on the alignment exposure film 310a. Among the light incident on the alignment exposure film 310a, the light incident on the first exposure portion 301a is converted into a CW circularly polarized light. The CW circularly polarized light is reflected by the back roller 315, and is again incident on the first exposure portion 301a, and is converted into s-polarized light as in the case of transmitting the CW circular polarizing plate. Thereafter, although the light of the s-polarized light is again incident on the p-polarized plate 332, the p-polarized plate 332 is not transmitted, and the camera 331 is detected as a dark portion. On the other hand, among the light incident on the alignment exposure film 310a, the light that is incident on the non-exposed portion (non-polarized portion) between the first exposure portions 301a is directly transmitted through the non-exposed portion while the light of the p-polarized light is held. The state in which the roller 315 is reflected and the p-polarized light is again transmitted is transmitted through the non-exposed portion and transmitted through the p-polarizing plate 332, and is incident on the camera 331, so that the camera 331 detects it as a bright portion. Therefore, the inspection light transmitted through the first exposure portion 301a (CW circular polarization portion) is detected as a dark portion in the camera 331, and the inspection light transmitted through the non-exposed portion between the first exposure portions 301a is transmitted to the camera 331 as a bright portion. Being detected.

Thereby, the inspection unit 330 detects the position (width and interval) of the first exposure unit 301a (CW circular polarization unit) formed by the first exposure unit 320. Here, the control unit (not shown) controls the exposure of the second exposure unit 321 based on the detection result of the position (width and interval) of the first exposure unit 301a. Specifically, the position in the direction perpendicular to the transport direction of the alignment film 310 of the second mask 325 of the second exposure unit 321 is adjusted so that the second exposure unit 301b and the second exposure unit 321 are formed. The boundary of the exposure portion 301a is not overlapped, and a gap is not formed between the first exposure portion 301a and the second exposure portion 301b.

Further, when the size of the width of the first exposure portion 301a is larger or smaller than a predetermined value due to expansion or contraction of the alignment film 310, etc., only the second light is used. The adjustment of the position of the cover 325 does not allow the first exposure unit 301a and the second exposure unit 301b to overlap without forming a gap. Therefore, it is necessary to enlarge or reduce the second exposure unit 301b as will be described later.

Next, the operation of the thirteenth embodiment of the present invention described above will be described. The first exposure unit 320 forms, for example, a first exposure unit 301a (CW circular polarization unit) for CW circularly polarized light for the left eye. The alignment film 310 on which the first exposure unit 301a is formed comes to the inspection unit 330 while rotating the back roller 315, and detects the position (width and interval) of the first exposure unit 301a in the camera 331. In this way, the control unit determines whether or not the first exposure unit 301a is formed at a predetermined design position based on the detection result, and controls the second exposure when the position of the first exposure unit 301a deviates from a predetermined design position. The unit 321 adjusts the position of the second mask 325 of the second exposure unit 321 and changes the position of the second exposure unit 301b from the initial setting value so that the first exposure unit 301a and the second exposure unit 301b do not overlap. And no non-exposure portion is formed.

By the above operation, the inspection unit 330 detects the position (width and interval) of the first exposure unit 301a. Therefore, the second exposure unit 321 can be combined with the first exposure unit actually formed by the first exposure unit 320. The exposure is controlled in the state of 301a, and the second exposure unit 301b is formed.

Next, a modification of this embodiment will be described with reference to Fig. 39. In the present modification, the optical axis of the inspection light emitted from the light source 333 intersects the surface of the back roller 315 with the optical axis of the reflected light detected by the camera 331, and after the inspection light is transmitted through the alignment film 310, The surface of the back roller 315 is reflected, and the reflected light is captured by the camera 331. The inspection light emitted from the light source 333 is converted into p-polarized light by the p-polarized plate 332, and the light transmitted from the back roller 315 is incident on the camera 331.

In the exposure apparatus configured as above, the inspection light emitted from the light source 333 is performed by p The polarizing plate 332 is converted into p-polarized light and is incident on the alignment film 310. Among the light rays incident on the alignment film 310, the light incident on the first exposure portion 301a is converted into CW circularly polarized light, reflected by the back roller 315, and again incident on the first exposure portion 301a of the alignment film 310, thereby being converted. The light that is s polarized light is transmitted through the s polarizing plate and is detected as a bright portion in the camera 331. On the other hand, among the light rays incident on the alignment film 310, the light incident on the non-exposed portion (non-polarized portion) between the first exposure portions 301a is directly transmitted through the non-exposed portion while maintaining the light of the p-polarized light, and the back roller is used. 315 reflects, and again, the state in which the light of the p-polarized light is maintained is directly transmitted through the non-exposed portion, and the s-polarized plate 37 is not transmitted, and the camera 331 detects the non-exposed portion as a dark portion. Therefore, the inspection light transmitted through the first exposure unit 301a (CW circular polarization unit) is detected by the camera 331 as a bright portion, and the inspection light transmitted through the non-exposure portion between the first exposure units 301a is taken. Since the camera 331 is detected as a dark portion, the position (width and interval) of the first exposure portion 301a can be detected.

Next, a fourteenth embodiment of the present invention will be specifically described with reference to Fig. 40. In the present embodiment, the inspection light source 333 of the inspection unit 330 is incorporated in the back roller 315. A groove 317 extending in the drum axial direction is formed on the circumferential surface of the back roller 315, and a rod-shaped inspection illumination light source 333 extending in the drum axial direction is disposed in the groove 317. Further, in the groove 317, a p-polarized plate 332 extending in the drum axial direction is disposed above the light source 333. In the same manner as in the first embodiment, the alignment film 310 is wound around the back roller 315 and moved together with the rotation of the back roller 315, and an inspection camera for detecting the inspection light is disposed in the upper region of the roller shaft of the back roller 315. 331. The inspection camera 331 is a linear sensor extending in the axial direction of the back roller 315 or a region sensor for detecting light in a rectangular planar area of the horizontal direction of the back roller 315. Then, between the inspection camera 331 and the alignment film 310, a CW circular polarizing plate 336 and an s polarizing plate 337 above it are disposed. The back roller 315 is similar to the first embodiment, and is rotatably rotatable about its axis, and the alignment film 310 is wound around the back roller 315 to move, and the back roller 315 is at the same circumferential speed as the moving speed of the alignment film 310. Rotate in the state. Then, when the groove 317 of the back roller 315 is rotated to reach the upper end of the drum, the light source 333 and the camera 331 It is aligned on the vertical axis of the light.

In the inspection unit 330 of the present embodiment, when the groove 317 is rotated to the uppermost end, that is, when the light source 333 in the groove 317 faces the camera 331, the inspection light emitted from the light source 333 is transmitted through the p-polarized plate 332. Further, the alignment film 310 is transmitted, and further, the CW circular polarizing plate 336 is transmitted, and transmitted through the s polarizing plate 337, and then incident on the camera 331. Then, the inspection light from the light source 333 is converted into p-polarized light by the p-polarized plate 332, and is incident on the alignment film 310. The light incident on the alignment film 310, the light incident on the first exposure portion 301a is converted into CW circularly polarized light, converted into s-polarized light by the CW circular polarizing plate 336, and then transmitted through the s polarizing plate 337 and applied to the camera. 331 is detected as a bright part. On the other hand, among the light rays incident on the alignment film 310, the light incident on the non-exposed portion (non-polarized portion) between the first exposure portions 301a cannot be transmitted through the state in which the non-exposed portion is kept in the p-polarized light, and is transmitted by the CW circle. The polarizing plate 336 is converted into CW circularly polarized light, and transmitted through the s polarizing plate 337, and is detected as a dark portion in the camera 331. Therefore, the inspection light rays transmitted through the first exposure unit 301a (CW circular polarization unit) are detected as bright portions in the camera 331, and the inspection light transmitted through the non-exposure portions between the first exposure portions 301a is applied to the camera 331. Since it is detected as a dark portion, the position (width and interval) of the first exposure portion 301a can be detected. Therefore, this embodiment can exhibit the same effects as the first embodiment.

When the CCW circular polarizing plate 338 is disposed at the position of the CW circular polarizing plate 336, the inspection light transmitted through the first exposure portion 301a and the CCW circular polarizing plate 338 is converted into p-polarized light, and cannot be transmitted through the s polarizing plate 337. Therefore, the camera 331 detects the first exposure unit 301a as a dark portion. As described above, since the light transmitted through the non-exposed portion (non-polarized portion) between the first exposure portions 301a is detected by the camera 331 as the dark portion, the first exposure portion 301a and the non-exposure portion cannot be distinguished. Therefore, in the case of the CCW circular polarizing plate 338, as shown in Fig. 44 (b), it is necessary to use the p-polarizing plate 332 instead of the s polarizing plate 337. Thereby, the camera 331 detects the first exposure unit 301a as a bright portion.

Further, since the groove 317 is present in the back roll 315 of the present embodiment, the alignment film 310 moves over the groove 317. Therefore, in order to fix the position of the camera 331 in the optical axis direction of the alignment film 310 with high precision, a curved glass cover can be provided on the upper portion of the groove 317 with the same radius of curvature as the top surface of the back roller 315. The entire circumference of the back drum 315 is made to be a uniform circumferential surface.

Next, a modification of the fourteenth embodiment of Fig. 40 will be described with reference to Figs. 41(a) and 41(b). In the present modification, the structure of the back roller 340 is different from that of the back roller 315 of FIG. The back roller 340 of the present modification is composed of a substantially cylindrical core portion 342 and a cylindrical surface portion 341 in which the core portion 342 is fitted. Although the core portion 342 does not rotate, the surface portion 341 is disposed coaxially with the core portion 342, and the shaft can be rotated as a rotation axis. The surface portion 341 is the same as the back roller 315, and is rotated by the rotational driving of the alignment film 310. The surface portion 341 is formed of, for example, a transparent material such as glass or acryl (acrylic). A groove 343 extending in the axial direction of the core portion 342 is formed at an upper end portion of the core portion 342, and a light source 333 and a p-polarizing plate 332 are disposed in the groove 343. The exposure operation of the present modification is the same as the exposure operation of the fourteenth embodiment shown in FIG. 40. However, in the present modification, since the light source 333 and the p-polarized plate 332 do not move, it is possible to continuously check and monitor the horizontal direction. The advantage of the exposure state of the alignment film 310 on the optical axis of the light source 333 and the camera 331 is eliminated.

Next, a fifteenth embodiment of the present invention will be described with reference to Fig. 42. In the present embodiment, the alignment film 310 is transported in one direction by the roller 311, and in the moving region of the alignment film 310, the first exposure unit 320 is disposed in this order, and the inspection unit 330 and the second exposure unit 321 are arranged in this order. Further, the inspection unit 330 includes a camera 331 that is disposed opposite to the alignment film 310 that moves in the horizontal direction, and an s polarizer 337 that is disposed between the camera 331 and the alignment film 310 on the optical axis of the camera 331. The half mirror 334 is disposed under the s polarizing plate 337; the reflecting plate 341 is disposed on the optical axis of the camera 331 and below the alignment film 310; and the light source 333 is coaxial with the optical axis of the camera 331 via the half mirror 334. The inspection light is irradiated onto the alignment film 310; and the p-polarization plate 332 is disposed between the light source 333 and the half mirror 334.

Thereby, the alignment film 310 of the first exposure portion 301a having the CW circularly polarized light is formed by the first exposure unit 320, and is moved to the inspection unit 330. Then, the inspection light from the light source 333 is converted into p-polarized light by the p-polarized plate 332, and incident on the alignment film 310 via the half mirror 334. Among the light incident on the alignment film 310, the light incident on the first exposure portion 301a is converted into a CW circularly polarized light, reflected by the reflection plate 341, and then incident on the first exposure portion 301a, converted into s-polarized light, and transmitted. The half mirror 334 transmits the s polarizing plate 337 and is detected as a bright portion on the camera 331. On the other hand, among the light incident on the alignment film 310, the light that is incident on the non-exposed portion (non-polarized portion) between the first exposure portions 301a maintains the state of the light of the p-polarized light and is directly transmitted through the non-exposed portion to the reflection plate 341. Since it is reflected and incident on the s-polarized plate 336, it is not transmitted through the s-polarized plate 336, and is detected as a dark portion in the camera 331. Therefore, the present embodiment can also exhibit the same effects as those of the thirteenth embodiment and the fourteenth embodiment.

Next, a sixteenth embodiment of the present invention will be described with reference to Fig. 43. In the present embodiment, an inspection light source 333 is provided below the alignment film 310. In the present embodiment, a CW circular polarizing plate 336 and an s polarizing plate 337 are provided between the camera 331 and the alignment film 310. Then, a p-polarized plate 332 is disposed between the light source 333 and the alignment film 310, and the inspection light emitted from the light source 333 is converted into p-polarized light by the p-polarized plate 332, and is incident on the alignment film 310. Among the light incident on the alignment film 310, the light transmitted through the first exposure portion 301a is converted into a CW circularly polarized light, converted into s-polarized light by the CW circular polarizing plate 336, and transmitted through the s polarizing plate 337. The camera 331 is detected as a bright portion. On the other hand, due to the light incident on the non-exposed portion between the first exposure portions 301a, the state of the light that maintains the p-polarized light is directly transmitted through the non-exposed portion, and is converted into the CW circularly polarized light by the CW circular polarizing plate 336, It is incident on the s polarizing plate 337, so that the camera 331 is detected as a dark portion. Therefore, this embodiment can also exhibit the same effects as those of the thirteenth to fifteenth embodiments.

Further, the expansion or contraction of the alignment film 310 or the meandering of the alignment film 310 occurs, and the position (width and width) of the first exposure portion 1a formed in the first exposure unit 320 is formed. When the interval and the size exceed a predetermined design value, it is preferable to consider the formation of the second exposure unit 301b of the second exposure unit 321 and the fluctuation of the size of the first exposure unit 301a.

FIG. 46 is a view showing the mask 325 of the second exposure unit 321 when the factors such as the expansion of the alignment film 310 are considered. Fig. 46 (a) is a plan view showing the mask 325, and Fig. 46 (b) is a plan view showing the opening plate 326.

As shown in FIG. 46(a), the photomask 325 is provided with a plurality of slits in a direction perpendicular to the moving direction 309 of the alignment film 310, for example, on the bottom portion 302a formed of a light-shielding material provided on the transparent plate. 302b; each slit 302b is provided such that its width linearly changes in the longitudinal direction, and the interval between the slits is the same as the width of the slit in a direction perpendicular to the moving direction 309. That is, in the mask 325 shown in Fig. 46 (a), the width of each slit 302b is set to be the narrowest at the uppermost portion, and becomes wider as it goes downward in the longitudinal direction of the slit. Then, each slit 302b extends in the oblique movement direction 309. The inclination of the slit 302b is inclined in the direction perpendicular to the moving direction 309, and the inclination of the side surface side of the mask 325 is larger than the inclination of the center. For example, when the length of each slit 302b in the moving direction 309 is set to 300 mm, The edge of the slit on the most side surface side of the mask 325 is set to be biased by about 500 μm in the direction perpendicular to the moving direction 309 between the end portions in the moving direction 309.

The observation window 302d for the diaphragm alignment mark 301c (refer to FIG. 48) formed on the side surface portion of the alignment film 310 is detected by the alignment marker (not shown) on the side surface portion of the mask 325. It is disposed to the same extent as the length of the slit 302b in the moving direction 309, for example. Further, the diaphragm alignment mark 301c shown in Fig. 48 indicates the state observed through the observation window 302d. Then, in the observation window 302d, a mask alignment mark 302e is provided to be inclined with respect to the moving direction 309. The reticle alignment mark 302e is a linear mark which is parallel to the side edge of the slit 302b which is located at both end portions in the direction perpendicular to the moving direction 309, for example. Above the reticle 325, a camera (not shown) is provided, by which the reticle alignment mark 302e can be detected and passed through the observation window. 302d, detecting the diaphragm alignment mark 301c on the alignment film 310.

The opening plate 326 is, for example, a opaque plate made of SUS. As shown in Fig. 46 (b), an opening 303b having a width of, for example, 20 to 30 mm is provided in the center of the bottom portion 303a to extend in one direction. Then, the longitudinal direction of the opening 303b and the vertical movement direction 309 are disposed between the light source 324 and the photomask 325. Therefore, the exposure light emitted from the light source 324 is shielded from light by a portion of the aperture 326, and only the exposure light transmitted through the opening 303b of the aperture plate 326 is irradiated to the mask 325. Therefore, by controlling the relative position of the mask 325 and the opening plate 326 in the moving direction 309 by the control unit (not shown), the strip-shaped irradiation position of the exposure light moves relative to the mask 325 in the moving direction 309, and transmits The slit 302b of the mask 325 is irradiated onto the irradiation position of the exposure light on the alignment film 310, and moves in the moving direction 309, and the width of the exposure light irradiation region changes.

The mask 325, as shown in FIG. 47, can be moved relative to the opening plate 326 in the moving direction 309 by the actuator or the like (not shown), and the movement of the opening plate 326 and the mask 325 is performed. The relative position of the direction 309 is controlled by a control unit (not shown). Then, the control unit has a predetermined relationship between the positional relationship between the mask alignment mark 302e and the diaphragm alignment mark 301c, and the relative position of the mask 325 and the opening plate 326 in the moving direction 309 is, for example, as follows. Generally controlled.

That is, as described above, in the present embodiment, the plurality of slits 302b provided in the mask 325 extend obliquely in the moving direction 309, and the width of each slit 302b is set so as to be along the moving direction 309. Linearly varying, the interval between the slits is the same as the width of the slit when viewed from a direction perpendicular to the moving direction 309. Therefore, as shown in FIGS. 47(a) and 47(b), when the mask 325 is moved relative to the opening plate 326 in the moving direction 309, the opening 303b of the opening plate 326 is transmitted to the mask 325. The irradiation position of the exposure light also moves in the moving direction 309, and the width of the irradiation region of the exposure light that is transmitted through the slit 302b and irradiated onto the alignment film 310 changes. Thereby, the alignment film 310 is generated even by, for example, a high temperature at the time of exposure or the like. In the case of expansion, the width of the strip-shaped exposure portion (polarizing portion) formed on the alignment exposure film 310a may be adjusted in accordance with the width of the deformed alignment film 310.

In this embodiment, as shown in FIG. 48, the control unit moves the mask 325 in the moving direction 309 so that, for example, the mask alignment mark 302e and the diaphragm alignment mark 301c are detected by the camera. A certain distance (for example, 10 mm) is isolated in a direction perpendicular to the moving direction 309. Thereby, even if the alignment film 310 is expanded in the width direction thereof, the width of the exposure portion on the alignment exposure film 310a can be adjusted based on the elongation amount in the width direction of the alignment film 310.

Fig. 48 (a) is a view showing a state in which the alignment film 310 is not deformed in the width direction, and Fig. 48 (b) is a view showing a state in which the alignment film 310 is expanded in the width direction. In FIG. 12, reference numeral 371 indicates that the detection area of the camera, for example, the width of the movement direction 309 of the detection area 371 is the same width as the opening 303b of the aperture plate 326, and the camera system will have a diaphragm. The alignment mark 301c and the mask alignment mark 302e are detected in a position juxtaposed in the moving direction 309 of the opening 303b. As shown in Fig. 48 (a), when the alignment film 310 is not deformed in the width direction, the distance between the diaphragm alignment mark 301c of the detection area 371 and the mask alignment mark 302e is, for example, 10 mm. Here, the alignment film 310 is expanded in the width direction thereof due to, for example, heating during exposure, as shown in FIG. 48(b), the position of the diaphragm alignment mark 301c is in the observation window 302d, facing outward ( Moving in the left side in Fig. 48, the distance to the reticle alignment mark 302e becomes larger.

In the first exposure unit 320, when the alignment film 310 is not expanded, and the first exposure unit 301a is formed according to a predetermined design value, the second exposure unit 321 is expanded as described above in the alignment film 310. In this state, when the second exposure unit 321b is exposed to the predetermined design value by the second exposure unit 321, the first exposure unit 301a and the second exposure unit 301b are deviated, which causes display failure. In other words, when the alignment film 310 reaches the second exposure unit 321, the width and the interval of the strip-shaped first exposure portion 301a become larger due to the expansion of the alignment film 310. The second exposure unit 321 forms the second exposure unit 301b according to the design value, and the first exposure unit 301a and the second exposure unit 301b overlap each other, or a gap is formed to cause an unexposed portion to be generated.

Here, in the present embodiment, for example, the relative position to the opening plate 326 of the mask 325 in the moving direction 309 is adjusted to maintain a constant distance between the diaphragm alignment mark 301c and the mask alignment mark 302e. That is, as shown in FIG. 48(b), in the detection area 371 of the camera, the mask 325 is relatively moved with respect to the opening plate 326 in the moving direction 309, and the opening 303b of the opening plate 326 is correspondingly The width of the slit 302b of the mask 325 is wide so that the distance between the diaphragm alignment mark 301c and the mask alignment mark 302e becomes 10 mm. Therefore, in the present embodiment, the width of the exposure portion on the alignment exposure film 310a can be greatly adjusted based on the amount of elongation of the alignment film 310 in the width direction. Therefore, in the present embodiment, even if the alignment film 310 is contracted by cooling due to, for example, transportation, and returns to the unexpanded element width, the strip-shaped second exposure formed on the alignment film 310a can be formed. The width and interval of the portion 301b are accurately matched to, for example, the image or the width and interval of the display device to prevent display failure.

Moreover, although the slit 302b of the mask 325 and the diaphragm alignment mark 301c are actually separated by, for example, about 30 mm, as in the present embodiment, the reticle alignment mark 302e is parallel to the position and the moving direction 309. The side edges of the slits 302b at both end portions in the vertical direction are formed, and the mask alignment mark 302e can be selected at the side edge of the slit 302b provided at the end portion in the direction perpendicular to the moving direction 309, for example, about The alignment is performed within a narrow range of 10 mm, and the width of the exposed portion can be adjusted.

Further, in Fig. 48, although only one side surface portion of the alignment film 310 and the photomask 325 is shown in the drawing, the control of the position of the mask is performed on the diaphragm alignment of the both side faces of the alignment film 310. The symbol 301c is performed between the mask alignment marks 302e on both side faces of the mask 325. In other words, the distance between the diaphragm alignment mark 301c on one side of the alignment film 310 and the mask alignment mark 302e, and the diaphragm alignment mark 301c on the other side of the alignment film 310 and the mask alignment mark Distance between 302e, either For example 10mm.

However, if the alignment film 310 is meandering during the movement between the transport rollers 311, the center position of the mask 325 in the direction perpendicular to the moving direction 309 and the center position of the alignment film 310 may be deviated, resulting in an alignment film. The distance between the diaphragm alignment mark 301c and the mask alignment mark 302e on one side surface portion 310 is different from the distance between the diaphragm alignment mark 301c and the mask alignment mark 302e on the other side surface portion. In order to eliminate this problem, in the present embodiment, in a direction perpendicular to the moving direction 309, the position in the direction perpendicular to the moving direction 309 of the mask 325 is adjusted so that the pair of masks detected by the camera are aligned. The center position of the symbol 302e coincides with the center position of the pair of diaphragm alignment marks 301c, whereby it is preferable to position the center position of the mask 325 and the center position of the alignment film 310. In other words, even if the meandering of the alignment film 310 is generated, it is preferable to control the distance between the film alignment mark 301c and the mask alignment mark 302e on one side of the alignment film 310, and the other side of the alignment film 310. The distance between the diaphragm alignment mark 301c and the reticle alignment mark 302e is such that either is, for example, 10 mm.

Further, as for the photomask of the second exposure unit 321, a photomask 325A having a slit 302b as shown in FIG. 49 can be used. In the mask 325A, the plurality of slits 302b have a width which also varies linearly in the moving direction 309; the interval between the slits is the same as the width of the slit 302b when viewed from a direction perpendicular to the moving direction 309. The slits 302b provided at one end portion of the mask 325A and the mask 325A shown in FIG. 49 are provided in the slit 302b at one end, and the side edges thereof are provided parallel to the moving direction 309, and the other plurality of slits are provided. The slit 302b extends in the oblique movement direction 309, and the inclination of the slit 302b is gradually increased from the one end side to the other end side in the direction perpendicular to the moving direction 309. When such a mask 325A is used, the position of the mask 302 can be controlled with the slit 302b having one end portion parallel to the side edge of the moving direction 309 as a reference. The slit 302b, for example, the other end portion which is most inclined with respect to the moving direction 309, is disposed such that its length in the moving direction 309 is 300 mm, and its side edge is offset by about 1000 μm in the direction perpendicular to the moving direction 309. In the case of leaning, when the distance between the diaphragm alignment marks 301c is increased by 100 μm with the extension of the alignment film 310, the control unit controls to move the mask 302 outward by 100 μm in the direction perpendicular to the moving direction 309. At the same time, the control moves 30 mm in the moving direction 309. Thereby, the positional relationship between the mask alignment mark 302e and the diaphragm alignment mark 301c is the same as the case where the extension of the alignment film 310 is not performed, and the exposure light to the alignment film 310 can be adjusted without replacing the mask 325A. The width of the illuminated area.

When the first exposure unit 320 is inflated in the alignment film 310, the first mask 323 of the first exposure unit 320 is also the same as the second mask 325, and the inclined slit and the opening plate are used. Similarly, it is preferable that the width and the interval of the strip-shaped exposure portion of the first exposure portion to be formed are enlarged in accordance with the amount of expansion of the alignment film 310. Thereby, when the alignment exposure film 310a is naturally cooled by the exposure unit, the first exposure unit 301a and the second exposure unit 301b can be aligned with each other on the scanning lines of the display device with high precision.

Further, the expansion of the alignment film 310 is not limited, and when the alignment film 310 is shrunk, the mask having the inclined slit 302b and the opening 303b extending in the width direction of the alignment film 310 may be used in the same manner. The opening plate 326 is used to adjust the exposure position and width in accordance with the reduction amount of the alignment film 310.

In the exposure apparatus and the FPR manufacturing method of the present invention, after the first exposure pattern including the plurality of strip-shaped exposure portions exposed by the first exposure unit is formed, the exposure portion of the first exposure pattern is detected by the inspection portion. The control unit adjusts the position of the exposure unit of the second exposure pattern exposed by the second exposure unit based on the position of the exposure unit of the first exposure pattern. For example, the control unit adjusts the position of the second mask of the second exposure unit in a direction perpendicular to the moving direction of the alignment film based on the position of the exposure unit of the first exposure pattern. Thereby, the first exposure pattern of the first exposure unit and the exposure position of the second exposure pattern by the second exposure unit are controlled with high precision at a predetermined position on the alignment film. thereby, Since the first exposure pattern and the second exposure pattern do not overlap at the boundary thereof, and the unexposed portion is not formed, the 3D display image does not deteriorate.

[The possibility of industrial use]

According to the present invention, the FPR type polarizing film and the optical alignment film can be manufactured with high precision, and contribute to the high definition of the 3D method or the 2D liquid crystal display device.

1‧‧‧ polarizing film

1a, 1b‧‧‧ polarizing department

2‧‧‧ Coating device

3, 4‧‧‧air steering rod

5‧‧‧Back roller

6, 16, 104, 105, 270, 322, 324‧ ‧ exposure light source

7, 150, 160, 202, 202A, 202B, 202C, 202D, 220, 221‧‧ ‧ mask

7a, 202c, 202f, 203b, 230b, 303b‧‧‧ openings

7b, 17‧‧‧ slit mask

7c, 17a, 106a, 202b, 220b, 302b‧‧‧ slits

8‧‧‧Cooling roller

10‧‧‧Alignment film

10a, 10b, 10c, 10d, 301a, 301b, a, b‧‧‧ exposure section

11‧‧‧Alignment exposure film

12‧‧‧Metal substrate

20, 26, 40, 245, 246‧‧ ‧ rollers

20a, 26a‧‧ ‧ ditch

21, 60, 205A, 205B, 333, 360‧‧‧

22, 24, 32, 32a, 32b, 34, 34a, 34b, 61, 63, 122a, 122b, 332, 336, 337, 361, 362, 363, 364‧‧ ‧ polarizing plate

23, 33a, 33b, 121‧‧‧λ/4 board

25, 35a, 35b, 108, 109, 120, 207A, 207B, 260, 331‧ ‧ camera

30‧‧‧ ruler components

31a, 31b‧‧‧Configuring light source

26b‧‧‧ Cover

51‧‧‧瑕疵

52‧‧‧ Foreign objects

62a, 62b‧‧‧ diaphragm section

100, 101, 102, 103‧‧‧ rollers

106, 107‧‧‧ mask

106-1, 106-2‧‧‧ slit mask

110‧‧‧Laser marker

123‧‧‧Inspection lighting source

201, 210‧‧‧ alignment film

201a, 210a, 210b‧‧‧ alignment marks

201c, 210c‧‧‧ alignment film

202a, 203a, 302a, 303a‧‧‧ bottom

202d, 220d‧‧‧ observation window

202e, 220e, 220f‧‧‧Photomask alignment marks

203, 203A, 203B, 230, 326‧‧‧ aperture plates

206, 250‧‧‧ alignment marker

241‧‧‧Supply reel

242, 243‧‧‧ Transport rollers

244‧‧‧ (rolling side) reel

271, 371‧‧‧Detection area

301c‧‧‧ diaphragm alignment mark

302d‧‧‧ observation window

302e‧‧‧Photomask alignment mark

309‧‧‧ moving direction

315‧‧‧Back roller

323, 325, 325A‧‧‧ mask

310‧‧‧Alignment film

310a‧‧‧Alignment exposure film

320, 321‧‧‧ exposure unit

330‧‧ ‧ Inspection Department

334‧‧‧Half mirror

340‧‧‧Back roller

341‧‧‧ Surface

342‧‧‧ core

343‧‧‧ditch

Fig. 1 is a schematic view showing a film exposure apparatus according to a first embodiment of the present invention.

Fig. 2 is a view showing the development of an alignment film in the vicinity of the back roller and the slit mask of the film exposure apparatus according to the first embodiment of the present invention.

Fig. 3 is a schematic view showing a film exposure apparatus according to a second embodiment of the present invention.

Fig. 4 is a view showing the development of an alignment film in the vicinity of the back roller and the slit mask of the film exposure apparatus according to the second embodiment of the present invention.

Fig. 5 is a schematic view showing a film exposure apparatus according to a third embodiment of the present invention.

Fig. 6 (a) and (b) are views showing the development of an alignment film in the vicinity of the back roller and the slit mask of the film exposure apparatus according to the third embodiment of the present invention.

Fig. 7 is a schematic view showing a film exposure apparatus according to a fourth embodiment of the present invention.

(a) and (b) show the pattern in which the alignment film is formed in the vicinity of the back roll and the slit mask of the film exposure apparatus according to the fourth embodiment of the present invention.

Fig. 9 is a schematic view showing a film exposure apparatus according to a fifth embodiment of the present invention.

Fig. 10 is a view showing the development of an alignment film in the vicinity of the back roller and the slit mask of the film exposure apparatus according to the fifth embodiment of the present invention.

Fig. 11 is a view showing a method of manufacturing a polarizing film using an FPR method using a back roll.

Fig. 12 is a schematic perspective view showing an air steering lever.

Fig. 13 is a view showing a film exposure apparatus using a back roll.

Fig. 14 is a view showing the development of an alignment film in the vicinity of a back roll and a slit mask of a film exposure apparatus using a back roll.

Fig. 15 is a plan view showing an inspection unit of the film exposure apparatus according to the sixth embodiment of the present invention.

Fig. 16 is a front sectional view showing an inspection unit of the film exposure apparatus according to the sixth embodiment of the present invention.

Fig. 17 is a view showing a direction of polarization.

Fig. 18 is a front sectional view showing an inspection unit of the film exposure apparatus according to the seventh embodiment of the present invention.

Fig. 19 is a plan view showing an inspection unit of the film exposure apparatus according to the eighth embodiment of the present invention.

Fig. 20 is a front sectional view showing an inspection unit of the film exposure apparatus according to the eighth embodiment of the present invention.

Fig. 21 is a plan view showing an inspection unit of the film exposure apparatus according to the ninth embodiment of the present invention.

Fig. 22 is a front sectional view showing an inspection unit of the film exposure apparatus according to the ninth embodiment of the present invention.

Fig. 23 is an operation explanatory view showing an inspection unit of the film exposure apparatus according to the ninth embodiment of the present invention.

Fig. 24 (a) is a side view showing the configuration of the entire exposure apparatus according to the tenth embodiment of the present invention, (b) is a plan view showing the mask, and (c) is a plan view showing the aperture plate.

[Fig. 25] (a) and (b) show a pattern in which the relative positional relationship between the apertured plate and the reticle is displayed together with the alignment film when the different alignment films are exposed in the width to be exposed.

[Fig. 26] (a) and (b) are diagrams showing an adjustment of the position of the mask by the diaphragm alignment mark and the mask alignment mark as an example.

Fig. 27 is a view showing an exposure state when the alignment film is thermally deformed in the exposure apparatus according to the tenth embodiment of the present invention.

Fig. 28 is a plan view showing a modification of the photomask in the exposure apparatus according to the tenth embodiment of the present invention.

Fig. 29 (a) and (b) are diagrams showing an exposure procedure by an exposure apparatus according to an eleventh embodiment of the present invention.

Fig. 30 (a) and (b) are plan views showing a mask and an opening plate of an exposure apparatus according to a twelfth embodiment of the present invention.

Fig. 31 (a) and (b) are views showing a laser marker formed on an alignment film to form an alignment mark.

[Fig. 32] (a) and (b) show the pattern of the focus camera that detects the alignment mark.

Fig. 33 is a view showing the operation of the twelfth embodiment of the present invention.

Fig. 34 (a) and (b) are views showing the operation of the twelfth embodiment of the present invention.

Fig. 35 (a) and (b) are views showing the operation of the twelfth embodiment of the present invention.

Fig. 36 (a) to (c) are diagrams showing the operation of the twelfth embodiment of the present invention.

Fig. 37 is a view showing the operation of the thirteenth embodiment of the present invention.

FIG. 38 is a view showing a first exposure unit and a second exposure unit formed by the first exposure unit and the second exposure unit.

Fig. 39 is a view showing a modification of the exposure apparatus according to the thirteenth embodiment of the present invention.

Fig. 40 is a view showing an exposure apparatus according to a fourteenth embodiment of the present invention.

Fig. 41 (a) and (b) are views showing a modification of the exposure apparatus according to the fourteenth embodiment of the present invention.

Fig. 42 is a view showing the exposure apparatus of the fifteenth embodiment of the present invention.

Fig. 43 is a view showing the exposure apparatus of the sixteenth embodiment of the present invention.

[Fig. 44] (a) and (b) are diagrams showing a method of detecting the first exposure portion.

[Fig. 45] (a) and (b) show a pattern of the polarized state of the inspection light by the polarizing plate.

Fig. 46 shows an adjustment of the exposure position in the second exposure unit, wherein (a) is a diagram showing a modification of the reticle, and (b) is a diagram showing an aperture plate.

Fig. 47 is a view showing a method of adjusting the exposure position: (a) is a diagram showing the relative positional relationship between the mask and the opening plate when the alignment film is not expanded; (b) is shown in the alignment film. A pattern of the relative positional relationship between the reticle and the aperture plate when inflated.

FIG. 48 is a view similarly showing an adjustment method of the exposure position: (a) is a diagram showing a relative positional relationship between the reticle and the aperture plate when the alignment film is not expanded, and (b) is displayed in the alignment direction. The film produces a pattern of relative positional relationship between the reticle and the aperture plate when inflated.

Fig. 49 is a view showing a modification of the reticle.

Fig. 50 is a schematic view showing a polarizing film of the FPR method.

Fig. 51 is a schematic view showing a method of exposing a conventional polarizing film.

Fig. 52 is a plan view showing a method of exposing a slit mask by a conventional polarizing film.

Fig. 53 is a plan view showing a method of exposing a film to a small slit mask of a conventional polarizing film.

Fig. 54 is a schematic view showing an exposure inspection unit.

Fig. 55 is a view showing, as an example, a pattern in which an alignment film is thermally deformed in a conventional exposure apparatus.

5‧‧‧Back roller

6, 16‧‧‧ exposure light source

7‧‧‧Photomask

10‧‧‧Alignment film

11‧‧‧Alignment exposure film

17‧‧‧ slit mask

Claims (31)

A film exposure apparatus comprising: a backing roller which is coated with an alignment film of an alignment material film on one surface of a transparent film substrate, and the alignment material film is wound on the outer side and supported by the circumferential surface thereof While the alignment film is moved, the alignment film is moved along the circumferential surface thereof, and the first exposure unit includes a first slit mask that is disposed opposite to the alignment film wound around the back roller, and is disposed on the alignment film a plurality of parallel first slits are formed in a moving direction of the alignment film; and a first exposure light source is configured to expose the alignment material film of the alignment film through the first slit mask; and the second exposure unit The second slit mask is disposed on the downstream side of the first slit mask in the moving direction of the alignment film, and is disposed opposite to the alignment film wound around the back roller, and is disposed on the alignment film a second plurality of parallel slits are formed in the moving direction; and the second exposure light source is exposed to the alignment film of the alignment film through the second slit mask; wherein the second slit mask The second slit is arranged between the first slit and the first slit of the first slit mask The first slit mask and the second slit mask are disposed such that the first slit and the second slit are biased in the width direction of the alignment film, and the amount of the bias is The amount of the pitch of 1/2 of the arrangement pitch of the first and second slits in the width direction of the alignment film. A film exposure apparatus comprising: a backing roller that applies an alignment film of an alignment material film on one surface of a transparent film substrate, and winds the alignment material film toward the outside to be wound thereon The alignment film supports the alignment film and moves the alignment film along the circumferential surface thereof. The first exposure unit includes a first slit mask that is disposed to be aligned with the alignment film of the back roller. And forming a parallel first plurality of slits in a moving direction of the alignment film; and a first exposure light source, wherein the alignment film of the alignment film is exposed through the first slit mask; and the second The exposure unit includes: a third photomask that faces the alignment film wound around the back roller on a downstream side of the first slit mask in a moving direction of the alignment film Further, an opening is formed in the width direction of the alignment film, and a third exposure light source is used to expose the alignment film of the alignment film through the third mask. A film exposure apparatus comprising: a backing roller that applies an alignment film of an alignment material film on one surface of a transparent film substrate, and winds the alignment material film toward the outside to be wound thereon The alignment film supports the alignment film and moves the alignment film along the circumferential surface thereof. The first exposure unit includes a first slit mask that is disposed to be aligned with the alignment film of the back roller. And forming a parallel first plurality of slits in a moving direction of the alignment film; and a first exposure light source, wherein the alignment film of the alignment film is exposed through the first slit mask; and the second The exposure unit includes: a fourth photomask that is disposed on the upstream side of the first slit mask in a moving direction of the alignment film, and is disposed to be aligned with the alignment film of the back roller; An opening extending in a width direction of the alignment film; and a fourth exposure light source that exposes the alignment material film of the alignment film through the fourth photomask. The film exposure device according to any one of claims 1 to 3, wherein: one of the exposure light sources is a light source that irradiates CW circularly polarized light to the alignment film, and the other The light source for irradiating the CCW circularly polarized light to the light source of the alignment film. The film exposure apparatus according to any one of claims 1 to 3, wherein: one of the exposure light sources is obliquely incident on the alignment film at a 40° direction of movement of the alignment film. The exposure light illuminates the light source of the alignment film, and the other is a light source that irradiates the alignment film with exposure light obliquely incident at -40° in the moving direction of the alignment film. The film exposure apparatus according to any one of claims 1 to 5, further comprising: a cooling member disposed on an upstream side of the back roller positioned in a direction in which the alignment film is oriented to cool the alignment membrane. The film exposure device according to any one of claims 1 to 6, further The inspection unit is disposed on a downstream side of the second exposure unit positioned in a moving direction of the alignment film, and is configured to inspect an exposure portion that is exposed to exposure light, and the exposure portion is positioned after the exposure light is irradiated to the alignment film. The inspection unit includes: an inspection roller that winds the alignment film and rotates together with the alignment film; and a light source disposed on a circumferential surface of the inspection roller or inside the roller for emitting The illumination light for inspection; and the light receiving portion is disposed opposite to the roller for detecting illumination light transmitted through the alignment film. The film exposure apparatus according to claim 7, wherein the exposure unit exposes the first exposure portion in a strip shape and the second shape in a strip shape by exposing the alignment material film on the alignment film. The exposure portion is formed alternately in the width direction of the alignment film to form the alignment exposure film. The inspection portion includes: a first polarizing plate disposed on the roller and illuminating light from the light source in the first direction The second polarizing plate is provided opposite to the roller, and the polarized light is applied to the light incident on the light receiving portion in a direction perpendicular to the first direction; and the λ/4 plate is disposed on the illumination light. On the optical axis. The film exposure device of claim 8, wherein the exposure unit forms the first exposure portion by irradiating an exposure light of the CW circularly polarized light onto the alignment film. An exposure light source of the CCW circularly polarized light is irradiated onto the exposure light source on the alignment film to form the second exposure portion. The film exposure apparatus according to claim 7, wherein the exposure unit exposes the first exposure portion in a strip shape and the second shape in a strip shape by exposing the alignment material film on the alignment film. The exposure portion is formed alternately in the width direction of the alignment film to form the alignment exposure film, and the light receiving portion of the inspection portion is configured by a first light receiving portion that is disposed to transmit the alignment film The first exposure portion of the illumination light is in the first alignment direction; and the second light reception portion is provided in the second alignment direction of the second exposure portion that transmits the illumination light of the alignment exposure film. The film exposure apparatus of claim 10, wherein: the exposure unit is in the moving direction of the alignment film by the alignment film Forming the first exposure portion at an angle of 40° obliquely incident light, forming the second exposure portion, and forming the second exposure light by obliquely entering the exposure film at an angle of -40° with respect to the alignment film in the moving direction of the alignment film Exposure section. The film exposure apparatus according to claim 8 or 10, further comprising: a transparent scale member disposed on an optical axis of the light receiving portion, extending in a width direction of the alignment exposure film, and in the alignment A scale is formed in the width direction of the first exposure portion or the second exposure portion on the exposure film. The film exposure apparatus according to any one of claims 7 to 12, further comprising: a second inspection unit disposed to convey the alignment exposure film before or after inspection by the inspection unit The second inspection unit includes: a second light source for emitting the inspection light; and a third polarizing plate for linearly polarizing the first direction to the inspection light from the second light source; and the second λ/4 plate. The third polarizing plate is transmitted through the alignment film to transmit the inspection light of the circularly polarized light in the first direction to the linearly polarized light in the second direction, and the fourth polarizing plate transmits the linearly polarized light in the second direction. Detecting light; a second light receiving portion for detecting inspection light transmitted through the fourth polarizing plate; a third light source for emitting inspection light; and a fifth polarizing plate for imparting a first light to the inspection light from the third light source It is a linearly polarized light in the second direction; the third λ/4 plate transmits the inspection light of the circularly polarized light in the second direction by transmitting the third polarizing plate and further transmitting the alignment film, and is converted into the second or the second Linear polarization in 1 direction; 6th polarizer, transmitting the 2nd or The inspection light of the linearly polarized light in the first direction; and the third light receiving unit detects the inspection light transmitted through the sixth polarizing plate. An exposure apparatus comprising: a transporting device for moving an alignment film of an exposure object in a first direction; and a pair of alignment markers for forming an index of the amount of expansion and contraction of the alignment film on both side surfaces of the alignment film a diaphragm alignment mark; a light source for emitting exposure light; and a photomask formed at a distance from each other in a second direction perpendicular to the first direction And a plurality of slits arranged in the second direction, and a mask alignment mark is formed on each of the two ends in the second direction; and the light shielding member extends in the second direction to form an opening intersecting all the slits And the portion of the opening intersecting the slit transmits the exposure light; the detecting portion detects the reticle alignment mark and the film alignment mark together; and the control portion controls the light shielding member and the a relative position of the mask in the first direction; wherein a width of the slit linearly changes in the first direction, and when viewed in the second direction, the interval between the slits is the same as a width of the slit The control unit controls a relative position between the reticle and the light shielding member in the first direction, so that the positional relationship between the reticle alignment mark detected by the detecting portion and the diaphragm alignment mark becomes Established relationship. The exposure apparatus of claim 14, wherein: the pair of the mask alignment marks are respectively in the width direction of the slit closest to the slits provided at both end portions of the second direction a side edge or a center line in the width direction of the slit is disposed in parallel; at a position of the opening of the light shielding member, the control portion controls the relative position of the photomask and the light shielding member in the first direction to make the film The interval between the sheet alignment mark and the mask alignment mark in the second direction is constant. The exposure apparatus according to claim 14 or 15, wherein in the reticle, an observation of a pair of the alignment marks of the diaphragm is provided outside the slit located in the second direction a window, and the reticle alignment mark is disposed in the observation window; the detecting portion detects the reticle alignment mark, and detects the film alignment mark through the pair of observation windows. The exposure device according to any one of claims 14 to 16, wherein the control unit adjusts the position of the reticle in the second direction so that one of the pairs detected by the detecting portion The center position of the reticle alignment mark in the second direction coincides with the center position in the second direction between the pair of film alignment marks. The exposure apparatus according to any one of claims 14 to 17, wherein: Two sets of the light source, the light shielding member, and the photomask are disposed at the position separated by the first direction, and the slit of the mask is disposed in the second direction in the slit of the mask of the other side. The amount of alignment of the slits is biased. The exposure apparatus according to claim 18, wherein the strip-shaped exposure portions that are different in the alignment direction are alternately formed in the second direction by exposure by the two light sources. An exposure apparatus comprising: a transporting device for moving an alignment film of an exposure target in a first direction; and a pair of alignment markers forming an index of the amount of expansion and contraction of the alignment film on both sides of the alignment film a diaphragm alignment mark; a light source for emitting the exposure light; and a mask forming a plurality of slits arranged at intervals in the second direction perpendicular to the first direction, and configured to observe the pair The diaphragm is aligned with the observation window of one pair of the marks, and the mask alignment marks are formed in the observation windows; the light shielding member extends in the second direction to form an opening intersecting all the slits. And transmitting, in the portion where the opening intersects the slit, the exposure light; the detecting portion is configured to detect the reticle alignment mark and the film alignment mark in the observation windows; and the control portion is based on The detection result of the detecting unit adjusts a relative positional relationship between the light shielding member and the reticle in the first direction; wherein, in the slit, the first slit in one end of the second direction is parallel In the first direction, the second slit pair at the other end The first direction is inclined at a maximum inclination, and the slit between the first slit and the second slit is inclined such that the inclination angle gradually increases from the first slit to the second slit; The width of the slit linearly changes in the first direction, and the interval between the slits is the same as the width of the slit in the second direction; the first mask alignment mark on the first slit side is The second mask alignment mark on the second slit side extends in parallel with one side edge in the width direction of the second slit or a center line in the width direction. The exposure apparatus of claim 20, wherein: The control unit sets a reference value A of the distance between the first mask alignment mark and the corresponding first patch alignment mark, and sets the second mask alignment mark and the corresponding second diaphragm pair. a reference value B of the distance between the reference marks, and in the alignment film exposure, when the distance between the first mask alignment mark and the first patch alignment mark changes from the reference value A, The mask is moved in the second direction, and the distance between the first mask alignment mark and the first patch alignment mark is adjusted to a reference value A; and the second mask is aligned When the distance between the mark and the second diaphragm alignment mark changes from the reference value B, the mask is moved in the first direction, and the second alignment mark is aligned with the second diaphragm. The distance between the marks is adjusted to the reference value B. An exposure apparatus comprising: a moving device for moving an alignment film on which a film of an alignment material is formed on a film substrate in one direction; and a first exposure unit disposed in a moving region of the alignment film, a first exposure pattern composed of a plurality of strip-shaped exposed portions formed on the alignment film on the alignment film, wherein the plurality of strip-shaped exposed portions extend in the one direction and are perpendicular to the one direction The second exposure unit is disposed on the downstream side of the first exposure unit in the moving direction of the alignment film, and the alignment material film on the alignment film forms a plurality of strip-shaped exposure portions. In the second exposure pattern that is formed, the plurality of strip-shaped exposure portions are located in an area inspection portion that extends in the one direction and is in contact with the exposure portion of the first exposure pattern in a direction perpendicular to the one direction. a moving portion of the alignment film between the first exposure unit and the second exposure unit for detecting an exposure portion of the first exposure pattern; and a control portion based on the first detected by the inspection portion Exposure pattern exposure The position of the light portion is controlled at an exposure position of the second exposure pattern of the second exposure unit. The exposure apparatus according to claim 22, wherein the first exposure unit includes: a first exposure light source; and a first photomask provided with a strip-shaped slit corresponding to the first exposure pattern; Forming the exposure light from the first exposure light source by the slit of the first photomask to irradiate the alignment material a film; the second exposure unit includes: a second exposure light source; and a second photomask provided with a strip-shaped slit corresponding to the second exposure pattern; and the slit of the second photomask is shaped by The exposure light of the second exposure light source is irradiated onto the alignment material film; and the control unit adjusts the one of the second photomasks in the second exposure unit based on the position of the exposure portion of the first exposure pattern The position in the direction perpendicular to the direction. The exposure apparatus according to claim 22, wherein the moving device winds the alignment film around the backing roller to move the alignment film; the first exposure unit, the inspection unit, and the first 2 The exposure unit is disposed at a position opposed to the alignment film on the back roller. The exposure apparatus of claim 24, wherein the inspection unit comprises: an inspection light source disposed opposite to the back roller, and irradiating the inspection light toward the alignment film on the back roller; the camera And detecting the reflected light reflected by the back roller; and the polarizer applies a filtering direction of the polarization direction to the inspection light incident on the alignment film or the reflected light incident on the camera. The exposure device of claim 24, wherein: the inspection portion comprises: inspecting a light source, embedding into a circumferential surface of the back roller, and illuminating the inspection film toward the alignment film on the back roller; Provided opposite to the inspection light source for detecting transmitted light transmitted through the alignment film; and a polarizer for imparting inspection light incident on the alignment film or transmitted light incident on the camera Filter in the direction of polarization. The exposure apparatus of claim 22 or 23, wherein: the moving device defines a moving region of the alignment film by straddle the alignment film on a plurality of transport rollers; and the first exposure unit The inspection unit and the second exposure unit are disposed at positions facing the alignment film between the transport rollers. The exposure apparatus of claim 27, wherein the inspection unit comprises: a light source for inspection, disposed on one side of the alignment film between the transport rollers, and irradiating the inspection film with the inspection light; the reflection mechanism ,Assume And disposed on the other side of the alignment film to reflect light transmitted through the alignment film; a camera to detect reflected light reflected by the reflection mechanism; and a polarizer for inspecting light incident on the alignment film and incident on The reflected light of the camera is applied to the filter in the polarization direction. The exposure apparatus of claim 27, wherein the inspection unit comprises: a light source for inspection, disposed on one side of the alignment film between the transport rollers, and irradiating the inspection film with the inspection light; the camera Provided on the other side of the alignment film and detecting transmitted light transmitted through the alignment film; and a polarizer for respectively applying the inspection light incident on the alignment film to the transmitted light incident on the camera Filter in the direction of polarization. The exposure apparatus according to any one of claims 22 to 29, wherein the plurality of slits of the second mask are formed so as to be adjacent to each other in a direction perpendicular to the first direction The mutual spacing increases linearly in the first direction; the second exposure unit has a light blocking member, and the light blocking member is formed with an opening extending in a direction perpendicular to the first direction, the opening and the second light All the slits of the cover intersect; and the control unit adjusts the position of the light shielding member relative to the second mask in the first direction. A method for producing a polarizing film (FPR), characterized in that, while moving an alignment film having an alignment material film formed on a film substrate in one direction, the method includes the following steps: a first exposure step, by being disposed in the film a first exposure unit in a moving region of the alignment film, wherein the alignment film on the alignment film forms a first exposure pattern composed of a plurality of strip-shaped exposure portions, and the plurality of strips constituting the first exposure pattern The exposure portions extend along the one direction and are spaced apart from each other in a direction perpendicular to the one direction; and the second exposure step is performed by the first exposure unit disposed in a moving direction of the alignment film a second exposure unit on the downstream side, the alignment material film on the alignment film forms a second exposure pattern composed of a plurality of strip-shaped exposure portions, and the plurality of strip-shaped exposures constituting the second exposure pattern a portion extending along the one direction and positioned between the exposed portions of the first exposure pattern in a direction perpendicular to the one direction And an inspection step of detecting an exposure portion of the first exposure pattern between the first exposure step and the second exposure step; wherein, based on the first exposure pattern detected by the inspection step The position of the exposure unit controls the exposure position of the second exposure pattern of the second exposure unit in the second exposure step.