TW201303091A - Method and device for the directional solidification of a non-metal melt - Google Patents
Method and device for the directional solidification of a non-metal melt Download PDFInfo
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- 238000000034 method Methods 0.000 title claims abstract description 48
- 238000007711 solidification Methods 0.000 title claims abstract description 46
- 230000008023 solidification Effects 0.000 title claims abstract description 46
- 229910052755 nonmetal Inorganic materials 0.000 title claims abstract description 6
- 239000000155 melt Substances 0.000 claims abstract description 43
- 239000013078 crystal Substances 0.000 claims description 82
- 239000007788 liquid Substances 0.000 claims description 29
- 229910052751 metal Inorganic materials 0.000 claims description 14
- 239000002184 metal Substances 0.000 claims description 14
- 238000010438 heat treatment Methods 0.000 claims description 11
- 238000007796 conventional method Methods 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 description 22
- 229910052732 germanium Inorganic materials 0.000 description 16
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 16
- 239000002245 particle Substances 0.000 description 9
- 239000012071 phase Substances 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 6
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 5
- 229910052707 ruthenium Inorganic materials 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 238000002425 crystallisation Methods 0.000 description 4
- 230000008025 crystallization Effects 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 229910052797 bismuth Inorganic materials 0.000 description 3
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 3
- 230000006911 nucleation Effects 0.000 description 3
- 238000010899 nucleation Methods 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- 238000001816 cooling Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000009977 dual effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 230000010363 phase shift Effects 0.000 description 2
- 241000723382 Corylus Species 0.000 description 1
- 235000007466 Corylus avellana Nutrition 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 1
- 230000001052 transient effect Effects 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/007—Mechanisms for moving either the charge or the heater
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Silicon Compounds (AREA)
Abstract
Description
本發明係有關於一種依據申請專利範圍第1項所述之方法及依據申請專利範圍第15項所述之裝置,尤指一種非金屬熔液定向凝固方法及其裝置。
The present invention relates to a method according to the first aspect of the patent application and to the device according to claim 15 of the patent application, in particular to a non-metal melt directional solidification method and apparatus therefor.
在太陽能工業領域經常定向凝固矽晶來生產太陽能電池,首先,在石英坩堝內熔融顆粒狀的矽料,然後,藉助垂直溫度梯度凝固熔液,形成矽錠,並將其切割成薄矽片,最後再將其加工成太陽能電池。
矽片既可以是多晶矽,亦可以是單晶矽。通常單晶矽太陽能電池效率較高,多晶矽片大多透過錠凝固法獲得。
為了生產單晶片,需要用到大容量單晶,其透過定向凝固非金屬熔液而獲得,其中主要的製作方法為直拉法,亦被稱作切克拉爾斯基法。該製作方法的具體步驟請參考Wikipedia (http://de.wikipedia.org/wiki/Czochralski-Verfahren)。與凝固塊製造方法相比,切克拉爾斯基法所用裝置昂貴,製作成本高,但是通過此方法生產的單晶材料的電池效率高。另外,與錠凝固法相比,切克拉爾斯基法制作過程中,矽中氧含量較高,從而會導致太陽能電池進一步退化。
故此,需要運用錠凝固法或者以錠凝固法為基礎的其他更好的製作方法來生產單晶矽或准單晶矽。
DE 10 2007 035 756 A1 或WO 2007/084936 A2專利案係描述了運用單晶式籽晶成功製造單晶矽或准單晶矽的有效途徑。將至少一單晶式籽晶置入方形的石英坩堝底部,然後,如傳統錠凝固法所述,將剩餘矽料置入坩堝內單晶式籽晶上方,最後將坩堝置入加熱爐內進行錠凝固。該加熱爐具有不同的加熱區,也就是該加熱爐具有一個或者多個頂端加熱器,表層加熱器或底層加熱器,並在裝置底部安裝一主動散熱器或一被動散熱器。加熱爐內各個加熱區溫度不同,形成溫度梯度,從而使位於坩堝上方的矽料熔化,而位於坩堝底部的單晶區保持固態。在接下來的凝固過程中,單晶區作為單晶式籽晶,成長為單晶體,並在凝固方向上形成縱向移動的固液介面。當然,即使沒有單晶式籽晶,也可以成長單晶體,這時,需要在坩堝底部中心的凹槽內形核,此時,透過控制溫度,可以在坩堝內從凹槽處形成的晶核開始長晶。
溫度梯度影響熔液內的對流速度,因為熔液的對流速度主要由溫度環境來決定。另外,固定磁場或瞬態磁場也可以影響對流速度。此外,即使行波場中的磁場強度對相對較弱,也可以對熔液內的對流速度產生很大的影響。
WO 2010/060802 A2專利案介紹了具有至少兩個不同頻率的,重疊設置的行波場,且第一行波場自下而上經過熔液,而第二行波場自上向下經過熔液。具體說,行波場為雙頻磁場,其一頻率向熔液或坩堝的上方移動,而另一頻率向溶液或坩堝的下方移動。據此,可以透過熔液邊緣較低的對流速度,來保護坩堝的氮化矽層。較佳為,生成一相對設置的高頻和低頻磁場,由此產生的勞倫茲力以及對流速度在邊緣區較小,而體積力則保持不變。這一措施主要用來保護坩堝壁鍍層,因此並不能改善單晶錠或准單晶錠的生產。
DE 10 2006 020 234 A1專利案介紹了一種凝固非金屬熔液的裝置,該裝置具有一縱向移動之行波場,該磁場內所有電感電流的頻率一致。
DE 103 49 339 A1專利案介紹了一種帶有加熱器的晶體生長爐,該晶體生長爐同時為一產生行波場的感應器,該感應器與一三相交流電源連接,形成一行波場,該行波場只具有一個頻率。
WO 2011/076157 A1專利案亦介紹了一種凝固非金屬熔液的方法,該方法藉助一行波場來控制熔液的對流速度。為了在固液介面達到均勻混合,勞倫茲力不能對稱分佈。
為此,研發出了定向凝固非金屬熔液的方法,尤其是錠凝固法。在坩堝底部裝置至少一單晶式籽晶,從該籽晶的位置開始對熔液進行凝固,並在凝固方向上形成縱向移動之固液介面。
另外,在非金屬熔液中,透過無數感應器形成至少一行波場,以降低坩堝壁附近熔液的對流速度,並保護坩堝壁鍍層。
生產似單晶矽經常用到錠凝固法,借此生產的似單晶矽通常在其中心具有一單晶區域,但在其中心周圍卻佈滿了大的多晶區域,部分多晶體顆粒非常精細,其中還經常出現數個晶體孿生顆粒,故,生產出來的晶圓,只有10%是從該單晶區域取得(Photon,2005年5月),其他晶圓要麼具有多晶區域,要麼完全由多晶體組成。由於組織結構不同,對單晶區域和多晶區域的後續處理也不同,因此,透過此凝固方法所得的單晶矽片的後續處理費用比傳統錠凝固法要高出很多。
為此,需要不斷改進生產方法,以完全消除多晶區域或者將多晶區域限於矽錠的邊緣區域(因為矽錠的邊緣一般都會被扔掉),以此,來節約生產成本。
In the solar industry, the solidification of twins is often carried out to produce solar cells. First, the granular material is melted in a quartz crucible, and then the molten solid is solidified by a vertical temperature gradient to form a crucible ingot and cut into thin hazelnuts. Finally, it is processed into a solar cell.
The ruthenium may be either polycrystalline or monocrystalline. Generally, single crystal germanium solar cells are highly efficient, and polycrystalline germanium sheets are mostly obtained by ingot solidification.
In order to produce a single wafer, a large-capacity single crystal is required, which is obtained by directional solidification of a non-metallic melt, the main production method being the Czochralski method, which is also called the Chekrasal method. Please refer to Wikipedia (http://de.wikipedia.org/wiki/Czochralski-Verfahren) for specific steps in this production method. Compared with the solidified block manufacturing method, the apparatus used in the Clarence method is expensive and high in production cost, but the single crystal material produced by this method has high battery efficiency. In addition, compared with the ingot solidification method, the oxygen content in the crucible is high during the production of the Clarence method, which may cause further degradation of the solar cell.
Therefore, it is necessary to produce a single crystal germanium or a quasi-single crystal germanium by using an ingot solidification method or other better production methods based on the ingot solidification method.
The DE 10 2007 035 756 A1 or WO 2007/084936 A2 patent describes an efficient way to successfully produce single crystal germanium or quasi-single crystal germanium using single crystal seed crystals. At least one single crystal seed crystal is placed in the bottom of the square quartz crucible, and then, as described in the conventional ingot solidification method, the remaining crucible is placed above the single crystal seed crystal in the crucible, and finally the crucible is placed in the heating furnace. The ingot solidifies. The furnace has a different heating zone, i.e., the furnace has one or more top heaters, a surface heater or a bottom heater, and an active heat sink or a passive heat sink is mounted on the bottom of the unit. The temperature of each heating zone in the furnace is different, forming a temperature gradient such that the crucible above the crucible melts and the single crystal zone at the bottom of the crucible remains solid. In the subsequent solidification process, the single crystal region acts as a single crystal seed crystal, grows into a single crystal, and forms a longitudinally moving solid-liquid interface in the solidification direction. Of course, even if there is no single crystal seed crystal, a single crystal can be grown. In this case, it is necessary to nucleate in the groove at the center of the bottom of the crucible. At this time, by controlling the temperature, the crystal nucleus formed in the crucible can be long. crystal.
The temperature gradient affects the convection velocity in the melt because the convection velocity of the melt is primarily determined by the temperature environment. In addition, a fixed magnetic field or a transient magnetic field can also affect the convection speed. In addition, even if the magnetic field strength in the traveling wave field is relatively weak, it can have a large influence on the convection velocity in the melt.
The WO 2010/060802 A2 patent describes a traveling wave field with overlapping settings with at least two different frequencies, and the first wave field passes through the melt from bottom to top, while the second wave field passes through the melt from top to bottom. liquid. Specifically, the traveling wave field is a dual-frequency magnetic field with one frequency moving above the melt or crucible and the other frequency moving below the solution or crucible. Accordingly, the tantalum nitride layer can be protected by the lower convection velocity at the edge of the melt. Preferably, a relatively high frequency and low frequency magnetic field is generated, and the resulting Lorentz force and convection velocity are small in the edge region while the volume force remains unchanged. This measure is mainly used to protect the ruthenium wall coating and therefore does not improve the production of single crystal ingots or quasi-single crystal ingots.
The DE 10 2006 020 234 A1 patent describes a device for solidifying a non-metallic melt having a longitudinally moving traveling wave field in which the frequencies of all the inductor currents are identical.
The DE 103 49 339 A1 patent describes a crystal growth furnace with a heater which is simultaneously a sensor for generating a traveling wave field, which is connected to a three-phase AC power source to form a wave field. The traveling wave field has only one frequency.
The WO 2011/076157 A1 patent also describes a method of solidifying a non-metallic melt which controls the convection velocity of the melt by means of a line of waves. In order to achieve uniform mixing in the solid-liquid interface, the Lorentz force cannot be symmetrically distributed.
To this end, methods for directional solidification of non-metallic melts have been developed, in particular ingot solidification. At least one single crystal seed crystal is disposed at the bottom of the crucible, and the molten solid is solidified from the position of the seed crystal, and a solid liquid interface that moves longitudinally is formed in the solidification direction.
In addition, in the non-metallic melt, at least one wave field is formed through the innumerable inductors to reduce the convection velocity of the melt near the crucible wall and to protect the crucible plating.
The production of single crystal germanium is often carried out by ingot solidification, whereby a single crystal germanium produced usually has a single crystal region in its center, but is surrounded by a large polycrystalline region around its center, and some polycrystalline particles are very Fine, in which several crystal twin particles often appear, so only 10% of the wafers produced are obtained from the single crystal region (Photon, May 2005), and other wafers either have polycrystalline regions or are completely It consists of polycrystals. Due to the difference in the structure of the structure, the subsequent treatment of the single crystal region and the polycrystalline region is also different. Therefore, the subsequent processing cost of the single crystal crucible obtained by the solidification method is much higher than that of the conventional ingot solidification method.
For this reason, it is necessary to continuously improve the production method to completely eliminate the polycrystalline region or to limit the polycrystalline region to the edge region of the bismuth ingot (because the edge of the bismuth ingot is generally thrown away), thereby saving production costs.
本發明之主要目的在於提供一定向凝固非金屬熔液的方法,尤其是提供一製造矽錠的錠凝固法,以改善上述生產方法之缺陷。透過本發明之非金屬熔液定向凝固方法,可以促進單晶體的生長,並使坩堝邊緣沒有或只有少量多晶體出現,且減少晶體孿生顆粒的產生。由於單晶矽錠和似單晶矽錠對其邊緣區域的純度要求較高,因此,本發明之方法及其裝置尤其適用於製造單晶矽錠或似單晶矽錠。SUMMARY OF THE INVENTION A primary object of the present invention is to provide a method of solidifying a non-metallic melt in a certain direction, and more particularly to provide an ingot solidification method for producing a niobium ingot to improve the defects of the above production method. Through the non-metallic melt directional solidification method of the present invention, the growth of a single crystal can be promoted, and no or only a small amount of polycrystals are present at the edge of the crucible, and the generation of crystal twin particles is reduced. Since single crystal germanium ingots and single crystal germanium ingots require high purity in their edge regions, the method and apparatus of the present invention are particularly suitable for the manufacture of single crystal germanium ingots or single crystal germanium ingots.
為實現上述之目的,係藉由本發明之申請專利範圍第1項中所述之製造方法以及其申請專利範圍次要項第15項所述之製造裝置來達成。In order to achieve the above object, it is achieved by the manufacturing method described in the first aspect of the patent application of the present invention and the manufacturing apparatus according to the fifteenth aspect of the patent application.
較佳為,透過至少一組具有可設定頻率的相移交流電供電給感應器,以在熔液中生成至少一單頻行波場,這樣,固液介面就會形成一曲面,該曲面朝凝固方向凸出,該熔液在該至少一行波場的作用下,沿凝固方向的反向流動,該行波場的頻率可設定為50Hz。Preferably, the inductor is powered by at least one set of phase-shifted alternating current having a settable frequency to generate at least one single-frequency traveling wave field in the molten metal, so that the solid-liquid interface forms a curved surface, and the curved surface faces The solidification direction is convex, and the molten metal flows in the opposite direction of the solidification direction under the action of the at least one wave field, and the frequency of the traveling wave field can be set to 50 Hz.
由於單晶式籽晶不能側面齊平地全部放入坩堝內,所以,在邊緣區域勢必會形成多晶域,另外,在凝固過程中,坩堝壁上會不斷出現雛晶,雛晶斜向長入單晶域,進而影響單晶生長,故,似單晶矽的多晶區域主要在坩堝壁附近的形核過程中形成。Since the single crystal seed crystal cannot be placed flush into the crucible, the polycrystalline domain is bound to form in the edge region. In addition, during the solidification process, the crystallites appear on the crucible wall, and the crystallites grow obliquely. The single crystal domain, which in turn affects the growth of the single crystal, is such that the polycrystalline region resembling a single crystal germanium is mainly formed during the nucleation process near the crucible wall.
另外,在單晶域的邊緣會形成晶體孿生顆粒,晶體孿生顆粒在深冷區直接在單晶體附近形核。較少的對流運動和熔液的均勻混合會導致固液介面聚集不純的熔液,並最終導致區域凝固溫度降低,從而形成深冷區,這一過程經常發生在具有區域凹槽的宏觀凸出固液介面區內,通常在坩堝壁附近。因此,在似單晶矽形成過程中要確保固液介面的均勻混合,並在關鍵區域形成至少一稍微凸出的固液介面。In addition, crystal twin particles are formed at the edges of the single crystal domain, and the crystal twin particles are directly nucleated near the single crystal in the deep cold zone. Less convective motion and uniform mixing of the melt will cause the solid-liquid interface to accumulate impure melt and eventually cause the zone solidification temperature to decrease, thereby forming a cryogenic zone, a process that often occurs in macroscopic projections with regional grooves. In the solid-liquid interface area, usually near the wall of the crucible. Therefore, uniform mixing of the solid-liquid interface is ensured during the formation of the single crystal germanium, and at least a slightly convex solid-liquid interface is formed in the critical region.
透過增加位元錯密度,也會在似單晶矽中形成少量多晶區域,進而導致位錯聯合,因為,在這種情況下,會偶爾自發形成多晶區域。By increasing the bit error density, a small amount of polycrystalline regions are formed in the single crystal germanium, which leads to dislocation joints, because in this case, polycrystalline regions are occasionally formed spontaneously.
本案發明人認為,上述晶體孿生顆粒的成形過程以及坩堝壁上出現的形核過程會導致孿生晶體以及多晶體區域的形成和擴張,透過本發明之定向凝固方法,該成因將被有效抑制。The inventors of the present invention considered that the formation process of the above-mentioned crystal twin particles and the nucleation process occurring on the crucible wall cause formation and expansion of twin crystals and polycrystalline regions, which are effectively suppressed by the directional solidification method of the present invention.
在整個凝固過程中,保持固液介面凸出,可以防止雛晶從坩堝滲入晶錠中心,儘管這一現象可以透過精確的溫度控制來達成,但事實證明,本發明之至少一行波場在許多方面都更具有優勢,且該行波場在熔液邊緣沿凝固方向的反向作用。Maintaining the solid-liquid interface bulging during the entire solidification process prevents the crystallites from penetrating into the center of the ingot, although this phenomenon can be achieved by precise temperature control, but it has been proved that at least one wave field of the present invention is in many Aspects are more advantageous, and the traveling wave field acts in the opposite direction of the solidification direction of the melt edge.
透過行波場調整固液介面,明顯比透過溫度控制更加精確。該至少一行波場要相對橫軸(X軸)儘量對稱分佈勞倫茲力密度。實際上,在溫度控制過程中,固液介面的凸出度會隨矽錠高度的提升而越來越小,因為凝固後的晶體的熱傳導性明顯劣於熔液的熱傳導性。Adjusting the solid-liquid interface through the traveling wave field is significantly more accurate than the temperature control. The at least one wave field is symmetrically distributed with the Laurentz force density relative to the horizontal axis (X-axis). In fact, during the temperature control process, the convexity of the solid-liquid interface becomes smaller as the height of the bismuth ingot increases, because the thermal conductivity of the solidified crystal is significantly inferior to the thermal conductivity of the melt.
本發明另一實施例具有兩個行波場,行波場各具有不同的頻率,該些頻率同向經過熔液,具體說,該兩個行波場沿凝固方向的反向經過熔液,這樣一方面可以增加對流,另一方面可以更好地調整固液介面的曲面,該曲面朝凝固方向凸出。該高頻元件(第一頻率)主要作用於邊緣附近,透過選擇合適的電流強度,固液介面可以明顯對稱彎曲,坩堝壁附近可以均勻混合。同時,第二低頻(第二頻率)用於產生一體積力。透過第一頻率和第二頻率可以確保固液介面在整個結晶面保持凸出,並增加對流,確保均勻混合,以有效防止深冷區的形成。Another embodiment of the present invention has two traveling wave fields, each of which has a different frequency, and the frequencies pass through the molten metal in the same direction. Specifically, the two traveling wave fields pass through the molten metal in the opposite direction of the solidifying direction. In this way, on the one hand, convection can be increased, and on the other hand, the curved surface of the solid-liquid interface can be better adjusted, and the curved surface protrudes in the solidification direction. The high-frequency component (first frequency) mainly acts near the edge, and by selecting an appropriate current intensity, the solid-liquid interface can be obviously symmetrically curved, and the mixture can be uniformly mixed near the wall. At the same time, the second low frequency (second frequency) is used to generate a volumetric force. Through the first frequency and the second frequency, it is ensured that the solid-liquid interface remains convex over the entire crystal surface, and convection is increased to ensure uniform mixing to effectively prevent the formation of the deep-cooling zone.
本發明之方法尤其適用於定向凝固熔爐內的矽液。The method of the invention is particularly suitable for use in turbid liquids in directional solidification furnaces.
本發明之方法具有以下優點:The method of the invention has the following advantages:
本發明之感應器在坩堝內縱向延伸,至少在熔液的兩個區域內安裝至少兩個感應器,從坩堝底部觀察,該些感應器具有不同的高度,上部感應器位於熔液上方,至少一中部或一下部感應器位於熔液中部或下部,用交流電為感應器供電,使通過感應器上部和中部或下部的交流電的振幅不同。The inductor of the present invention extends longitudinally in the crucible, and at least two inductors are installed in at least two regions of the melt. The inductors have different heights when viewed from the bottom of the crucible, and the upper inductor is located above the melt, at least A central or lower sensor is located in the middle or lower portion of the melt and supplies power to the inductor with alternating current, such that the amplitude of the alternating current passing through the upper and middle or lower portions of the inductor is different.
較佳為通過上部感應器的交流電振幅大於通過中部或下部感應器的交流電振幅。Preferably, the amplitude of the alternating current through the upper inductor is greater than the amplitude of the alternating current through the middle or lower inductor.
當然,亦可以安裝三個感應器,分別位於熔液的上部,中部和下部,用交流電為感應器供電,上部感應器的交流電振幅大於中部和下部感應器的交流電振幅。Of course, it is also possible to install three inductors, which are respectively located at the upper, middle and lower portions of the melt, and supply the inductor with alternating current. The amplitude of the alternating current of the upper inductor is greater than the amplitude of the alternating current of the middle and lower inductors.
較佳為通過上部,中部和下部感應器的交流電振幅各不相同,交流電振幅自上而下逐漸變小,或者通過上部感應器的交流電振幅大於通過下部感應器的交流電振幅,而通過中部感應器的交流電振幅最大。Preferably, the amplitudes of the alternating currents through the upper, middle and lower inductors are different, the amplitude of the alternating current gradually decreases from top to bottom, or the amplitude of the alternating current through the upper inductor is greater than the amplitude of the alternating current passing through the lower inductor, and passes through the central inductor. The AC has the largest amplitude.
較佳為,利用一第一組具有第一可設定頻率的相移交流電流和一第二組具有第二可設定頻率的相移交流電流對該些感應器供電,以形成行波場,這樣就可以在坩堝邊緣和坩堝內部形成固液介面曲面,該曲面朝凝固方向凸出,較佳為,第一頻率至少為第二頻率的兩倍,第一頻率最小為250Hz,第二頻率最大為50Hz。Preferably, the inductors are powered by a first set of phase-shifted alternating currents having a first settable frequency and a second set of phase-shifted alternating currents having a second settable frequency to form a traveling wave field, such that It is possible to form a solid-liquid interface curved surface at the edge of the crucible and the inside of the crucible, the curved surface protruding toward the solidification direction, preferably, the first frequency is at least twice the second frequency, the first frequency is at least 250 Hz, and the second frequency is at most It is 50Hz.
具有第二頻率的交流電具有一個或數個第二振幅,具有第一頻率的交流電具有一個或數個第一振幅,第一振幅比第二振幅大20%。The alternating current having the second frequency has one or several second amplitudes, and the alternating current having the first frequency has one or several first amplitudes, the first amplitude being 20% greater than the second amplitude.
另外,位於坩堝的感應器縱向延伸,一上部感應器位於熔液上部,至少一中部感應器位於熔液中部,一下部感應器位於熔液下部,用具有第一頻率或第二頻率的交流電為感應器供電,以使通過上部,中部和下部感應器的交流電振幅各不相同。用具有第二頻率的交流電給感應器供電,使經過上部感應器的交流電振幅大於經過中部或下部感應器的交流電振幅。In addition, the sensor located in the 纵向 extends longitudinally, an upper sensor is located in the upper part of the melt, at least one middle sensor is located in the middle of the molten metal, and the lower sensor is located in the lower part of the molten metal, and the alternating current having the first frequency or the second frequency is The inductor is powered so that the amplitude of the alternating current through the upper, middle and lower sensors is different. The inductor is powered by an alternating current having a second frequency such that the amplitude of the alternating current passing through the upper inductor is greater than the amplitude of the alternating current passing through the central or lower inductor.
較佳為,具有第二頻率的交流電振幅在10安培和800安培之間,而具有第一頻率的交流電振幅在12.5安培和1000安培之間。Preferably, the alternating current amplitude having the second frequency is between 10 amps and 800 amps, and the alternating current amplitude having the first frequency is between 12.5 amps and 1000 amps.
也可以在坩堝內安裝兩組感應器,其中一組感應器由具有第一頻率的交流電供電,而另外一組感應器則由具有第二頻率的交流電供電。It is also possible to install two sets of sensors in the crucible, one of which is powered by an alternating current having a first frequency and the other of which is powered by an alternating current having a second frequency.
為了加熱熔液,為感應器提供供暖電流,該電流由直流和交流組成,其中交流電的份額要達到最低規定值,也就是10%,為了生成至少一行波場,該交流電應該具有至少一頻率,尤其是一第二頻率。In order to heat the melt, a heating current is supplied to the inductor, which is composed of direct current and alternating current, wherein the share of the alternating current reaches a minimum specified value, that is, 10%, and the alternating current should have at least one frequency in order to generate at least one wave field. Especially a second frequency.
第一組和第二組相移交流電為不等距相移交流電。
The first group and the second group of phase-shifted alternating currents are unequal phase-shifted alternating current.
以下將藉助圖示對本發明之具體實施例進行詳細的說明。Specific embodiments of the present invention will be described in detail below with reference to the drawings.
如圖中所示為本發明之凝固裝置100 或本發明之對非金屬熔液130進行定向凝固的結晶裝置,該裝置位於一坩堝內。熔液130為矽熔液,坩堝為方形石英坩堝。坩堝120上安裝數個感應器110,透過交流供電在熔液130內感應產生磁場。至少形成一具有至少50Hz頻率的行波場,該行波場縱向或沿凝固方向的反向經過該熔液,而影響熔液的邊緣區域,使在液相和固相之間的介面PG具有一凸出曲面。As shown in the figure, the solidification apparatus 100 of the present invention or the crystallization apparatus for directional solidification of the non-metal melt 130 of the present invention is located in a crucible. The melt 130 is a crucible melt and the crucible is a square quartz crucible. A plurality of inductors 110 are mounted on the crucible 120 to induce a magnetic field in the melt 130 through an alternating current power supply. Forming at least a traveling wave field having a frequency of at least 50 Hz, the traveling wave field passing through the molten metal in the longitudinal direction or in the direction of solidification, affecting the edge region of the molten metal, so that the interface PG between the liquid phase and the solid phase has A convex surface.
在本實施例中,形成兩個行波場W1和W2,其頻率各不相同,但方向相同。較佳為,兩個行波場縱向自上而下延伸,也就是沿凝固方向的反向延伸。In the present embodiment, two traveling wavefields W1 and W2 are formed, the frequencies of which are different, but the directions are the same. Preferably, the two traveling wave fields extend longitudinally from top to bottom, that is, in the opposite direction of the solidification direction.
例如在縱向方向上依次安裝三個感應器110a到110c,藉助一第一組相移交流電I1a. I1b 和I1c和一第二組相移交流電I2a, I2b和 I2c為感應器110a到110c供電,第一組相移交流電I1a. I1b 和I1c的第一頻率f1為400Hz,第二組相移交流電I2a, I2b和 I2c的第二低頻率f為220Hz。For example, three inductors 110a to 110c are sequentially mounted in the longitudinal direction, and power is supplied to the inductors 110a to 110c by means of a first set of phase shifting alternating currents I1a.I1b and I1c and a second set of phase shifting alternating currents I2a, I2b and I2c. The first frequency f1 of a set of phase-shifted alternating currents I1a.I1b and I1c is 400 Hz, and the second low frequency f of the second set of phase-shifted alternating currents I2a, I2b and I2c is 220 Hz.
將上述交流磁場W1和W2堆疊,形成一雙頻行波場,該磁場縱向自上而下經過該凝固熔液130,通過調整頻率f1和f2的參數和電流振幅的參數使固液介面PG的曲面保持期待中的凸出狀態。如圖所示之固液介面的變化可知,隨著晶體的生長,固液介面自下而上移動,也就是沿凝固方向移動。The above alternating magnetic fields W1 and W2 are stacked to form a dual-frequency traveling wave field, which passes through the solidified molten metal 130 from top to bottom, and adjusts the parameters of the frequencies f1 and f2 and the parameters of the current amplitude to make the solid-liquid interface PG The surface remains in the expected convex state. As shown in the change of the solid-liquid interface, as the crystal grows, the solid-liquid interface moves from bottom to top, that is, in the solidification direction.
在一般製造方法中,沒有單頻,雙頻或者多頻行波場,因此,當長晶速度大於每小時5毫米時,就會突然出現凹陷介面。通過調節溫度,很難有效改善這一現象。由於溫度會受到坩堝導熱性,晶體導熱性以及熔液對流的影響,故,透過調節溫度很難或幾乎不可能獲得期待的熔液邊緣介面。因此,在凝固熔液中,單晶區域可能會越來越小,如果晶錠較高,位於晶錠上方的單晶區域可能會被完全擠掉。In the general manufacturing method, there is no single-frequency, dual-frequency or multi-frequency traveling wave field, and therefore, when the crystal growth rate is more than 5 mm per hour, a concave interface suddenly appears. By adjusting the temperature, it is difficult to effectively improve this phenomenon. Since the temperature is affected by the thermal conductivity of the crucible, the thermal conductivity of the crystal, and the convection of the melt, it is difficult or almost impossible to obtain the desired melt edge interface by adjusting the temperature. Therefore, in the solidified melt, the single crystal region may become smaller and smaller, and if the ingot is higher, the single crystal region located above the ingot may be completely squeezed out.
與一般製造方法相反,根據本發明之製造方法,可以有效控制似單晶矽內的多晶體和晶體孿生顆粒的含量,並降低生產成本。藉助行波場(見圖:W1和W2),晶錠在任何高度都可以保持一凸出固液介面,尤其是在邊緣區域,這樣就能確保在坩堝內形核過程中可能出現的顆粒能夠快速離開坩堝,此外,透過本發明之方法,也可以防止深冷區和晶體孿生顆粒的產生。在本實施例中,生成一雙頻磁場,其頻率大小不同,但方向相同。高頻主要在坩堝邊緣附近作用,透過選擇合適的電流強度,可以使坩堝壁附近的固液介面徹底向內彎曲,同時,利用第二低頻產生一體積力。In contrast to the general manufacturing method, according to the manufacturing method of the present invention, the content of polycrystals and crystal twin particles in a single crystal germanium can be effectively controlled, and the production cost can be lowered. With the traveling wave field (see figures W1 and W2), the ingot can maintain a convex solid-liquid interface at any height, especially in the edge region, thus ensuring that particles that may appear during the nucleation process in the crucible can The crucible is quickly removed, and in addition, the formation of the cryogenic zone and the twin particles of the crystal can be prevented by the method of the present invention. In this embodiment, a dual frequency magnetic field is generated, the frequency of which is different, but the direction is the same. The high frequency mainly acts near the edge of the crucible. By selecting the appropriate current intensity, the solid-liquid interface near the crucible wall can be completely inwardly bent, and at the same time, a volume force is generated by the second low frequency.
隨著結晶高度的提升,底部冷卻效應也越來越不明顯,為了彌補此缺陷,應該進一步加強低頻元件在熔液上部的作用,因此,產生磁場的上部線圈電流強度要高於下部線圈的電流強度,這樣,透過加強熔液上部的勞倫茲力,就可以彌補變弱的底部冷卻效應。而高頻組件的電流強度在整個晶錠高度上都保持不變。透過該磁場元件的組合,可以從單晶式籽晶位置開始穿過晶錠橫截面及晶錠高度來達成凸出式的結晶。As the crystallization height increases, the bottom cooling effect becomes less and less obvious. In order to compensate for this defect, the effect of the low frequency component on the upper part of the melt should be further strengthened. Therefore, the current intensity of the upper coil generating the magnetic field is higher than that of the lower coil. The strength, in this way, can be compensated for by the strengthening of the Lorentz force in the upper part of the melt. The current intensity of the high frequency component remains constant throughout the ingot height. Through the combination of the magnetic field elements, the crystallization of the ingot can be achieved from the position of the single crystal seed crystal through the cross section of the ingot and the height of the ingot.
通過選擇電流強度參數和頻率參數,可以準確控制固液介面的凸出度。例如,透過調節頻率f1和f2,可以使坩堝邊緣的對流速度相對較大,並確保對流方向朝下。同時,也可以保證流向熔液內部的流速大於0.01到2 cm/sec。透過從擴展方向開始參數化頻率,以及透過感應器的相移,振幅和幾何形狀可以有效調節勞倫茲力密度的走向以及流速或對流影響。為了生成行波場,必須給感應器供應較高的電流,最多為1000安培,由於歐姆損耗,故得以對感應器進行加熱。為了避免該熱能經由散熱方式而被排除,該感應器亦可被當作加熱件,故得對熔液加熱進行有效的控制。如果對產生行波場的交流電供應直流加熱電流,會更加有益。交流電和直流電比例可以依據生產流程來進行調節。By selecting the current intensity parameter and the frequency parameter, the convexity of the solid-liquid interface can be accurately controlled. For example, by adjusting the frequencies f1 and f2, the convection velocity of the rim edge can be relatively large and the convection direction can be made downward. At the same time, it is also possible to ensure that the flow rate to the inside of the melt is greater than 0.01 to 2 cm/sec. By parameterizing the frequency from the extended direction and the phase shift through the inductor, the amplitude and geometry can effectively adjust the direction of the Lorentz force density and the influence of flow rate or convection. In order to generate a traveling wave field, the inductor must be supplied with a higher current, up to 1000 amps, and the inductor can be heated due to ohmic losses. In order to prevent the heat energy from being removed by means of heat dissipation, the inductor can also be used as a heating element, so that the melt heating can be effectively controlled. It would be more beneficial to supply a DC heating current to the alternating current that produces the traveling wave field. The AC and DC ratios can be adjusted according to the production process.
勞倫茲力密度的空間分佈對於固液介面形成凸面至為重要,而勞倫茲力密度的空間分佈在交流電流I1a到I1c 和 I2a到I2c作用下形成。事實表明,藉助單頻行波場就可以在介面邊緣形成凸面,此時,具有第一頻率f1的交流電流I1a到I1c具有不同的電流強度,而該電流強度主要取決於感應器110a到110b的安裝高度。上部感應器110a的電流強度要高於下部感應器110b和110c的電流強度。如表格1所示,第一頻率為400Hz時,交流電I1a 到I1c 的電流強度,在該單頻行波場中,不需要輸入第二頻率或第二交流電I2a – I2c,也就是:
│I1a│ > │I1b│ > │I1c│ 及│I2a│ = │I2b│ = │I2c│ = 0The spatial distribution of the Lorentz force density is important for the solid-liquid interface to form a convex surface, and the spatial distribution of the Lorentz force density is formed by the alternating currents I1a to I1c and I2a to I2c. It has been shown that a convex surface can be formed at the edge of the interface by means of a single-frequency traveling wave field. At this time, the alternating currents I1a to I1c having the first frequency f1 have different current intensities, and the current intensity mainly depends on the sensors 110a to 110b. Installation height. The current intensity of the upper inductor 110a is higher than the current intensity of the lower inductors 110b and 110c. As shown in Table 1, the current intensity of the alternating current I1a to I1c when the first frequency is 400 Hz, in which the second frequency or the second alternating current I2a - I2c need not be input, that is:
│I1a│ > │I1b│ > │I1c│ and │I2a│ = │I2b│ = │I2c│ = 0
表 1 (單頻行波場: 第一頻率f1 = 400 Hz, 第二頻率f2 = 0)Table 1 (single frequency traveling wave field: first frequency f1 = 400 Hz, second frequency f2 = 0)
如表格2所示,第一頻率為300Hz,第二頻率為20Hz,此時,具有第一頻率f1的交流電流強度一樣,都為200安培,而具有第二頻率f2的交流電流強度不等,最低為400安培,也就是:
│I1a│ = │I1b│ = │I1c│= 200 A 及 │I2a│ > │I2b│ > │I2c│As shown in Table 2, the first frequency is 300 Hz, and the second frequency is 20 Hz. At this time, the alternating current current having the first frequency f1 is the same, both are 200 amps, and the alternating current currents having the second frequency f2 are not equal. The minimum is 400 amps, which is:
│I1a│ = │I1b│ = │I1c│= 200 A and │I2a│ > │I2b│ > │I2c│
表2 (雙頻行波場: 第一頻率f1 = 300 Hz, 第二頻率f2 = 20 Hz)Table 2 (Double frequency traveling wave field: first frequency f1 = 300 Hz, second frequency f2 = 20 Hz)
另外,高頻交流電I1a – I1c的電流強度也可以不同,表3中列出了電流強度的參數值,也就是:
│I1a│ < │I1b│ < │I1c│ 及 │I2a│ > │I2b│ > │I2c│
In addition, the current intensity of the high-frequency alternating current I1a – I1c can also be different. The parameter values of the current intensity are listed in Table 3, namely:
│I1a│ < │I1b│ < │I1c│ and │I2a│ > │I2b│ > │I2c│
表3 (雙頻行波場: 第一頻率f1 = 300 Hz, 第二頻率f2 = 20 Hz)Table 3 (Double frequency traveling wave field: first frequency f1 = 300 Hz, second frequency f2 = 20 Hz)
如表3所示,輸入高頻f1的交流電流I1a – I1c強度自上而下增加,而輸入低頻f2的交流電I2a – I2c電流強度自下向上升高。As shown in Table 3, the intensity of the alternating current I1a - I1c input to the high frequency f1 increases from top to bottom, and the current of the alternating current I2a - I2c input to the low frequency f2 rises from the bottom to the top.
感應器或線圈通電時,線圈間存在相位差,感應器縱向安裝只是縱向延伸的線性模式的一部分,該線性模式在段和段之間流入不同的相移電流。When the inductor or coil is energized, there is a phase difference between the coils, and the longitudinal installation of the inductor is only part of a longitudinally extending linear mode that flows different phase-shift currents between the segments.
透過本發明之磁場W1和W2形成一凸出固液介面PG或PG’,該介面在坩堝邊緣亦可以促進單晶生長,並有效抑制和消除多晶生長,介面凸出度透過勞倫茲力密度走向來調節,而勞倫茲力密度又受電流強度和頻率的影響。Through the magnetic fields W1 and W2 of the present invention, a convex solid-liquid interface PG or PG' is formed, which can also promote single crystal growth at the edge of the crucible, and effectively suppress and eliminate polycrystalline growth, and the interface convexity is transmitted through the Lorentz force. The density is adjusted to adjust, and the Lorentz force density is affected by the current intensity and frequency.
本發明之裝置也可用於方形熔融坩堝內,線圈亦可以沿坩堝邊緣方形設置,即使這樣也不會影響磁場的形成。感應器亦可以縱向套入,較佳為,應用一組感應器,且為該組感應器輸入雙頻率。當然,也可以為每一頻率設置一組感應器。感應器亦可被用作加熱裝置,為該加熱裝置輸入直流電,在此情況下,具有頻率f1和f2的交流電流至少要占加熱電流的10%。故利用本發明之裝置可有效凝固非金屬熔液,尤其是矽熔液,並可也控制單晶矽或似單晶矽的縱向生長。The apparatus of the present invention can also be used in a square melting crucible, and the coil can also be placed square along the edge of the crucible, even if this does not affect the formation of the magnetic field. The sensor can also be inserted longitudinally, preferably by applying a set of sensors and inputting dual frequencies for the set of sensors. Of course, it is also possible to set a set of sensors for each frequency. The inductor can also be used as a heating device for which direct current is input, in which case the alternating current having the frequencies f1 and f2 accounts for at least 10% of the heating current. Therefore, the apparatus of the present invention can be used to effectively solidify non-metallic melts, especially ruthenium melts, and can also control the longitudinal growth of single crystal ruthenium or single crystal ruthenium.
100...實施該生產過程的裝置(熔液爐)100. . . Device for carrying out the production process (melt furnace)
110...感應器(水平線圈)110. . . Sensor (horizontal coil)
110a-110c...電感線圈110a-110c. . . Inductor coil
120...坩堝(具有內鍍層的石英玻璃坩堝)120. . .坩埚 (quartz glass crucible with inner plating)
130...熔液(矽熔液)130. . . Melt
140...單晶式籽晶140. . . Single crystal seed crystal
I1a~I1c...第一組相移交流電流I1a~I1c. . . First set of phase shifted alternating current
I2a~I2c...第二組相移交流電流I2a~I2c. . . Second set of phase shifting alternating current
W1、W2...第一或第二行波場(方向相同,並與凝固方向相反的方向)W1, W2. . . First or second row of wave fields (the same direction and opposite to the direction of solidification)
f1、f2...行波場W1或W2的第一或第二頻率F1, f2. . . First or second frequency of traveling wave field W1 or W2
PG、PG′...固液介面PG, PG'. . . Solid-liquid interface
圖1 係為本發明之凝固裝置或本發明之對非金屬熔液進行定向凝固的結晶裝置。
BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a crystallization apparatus for directional solidification of a non-metallic melt according to the present invention.
100...實施該生產過程的裝置(熔液爐)100. . . Device for carrying out the production process (melt furnace)
110...感應器(水平線圈)110. . . Sensor (horizontal coil)
110a~110c...電感線圈110a~110c. . . Inductor coil
120...坩堝(具有內鍍層的石英玻璃坩堝)120. . .坩埚 (quartz glass crucible with inner plating)
130...熔液(矽熔液)130. . . Melt
140...單晶式籽晶140. . . Single crystal seed crystal
I1a-I1c...第一組相移交流電流I1a-I1c. . . First set of phase shifted alternating current
I2a-I2c...第二組相移交流電流I2a-I2c. . . Second set of phase shifting alternating current
W1,W2...第一或第二行波場(方向相同,與凝固方向相反的方向)W1, W2. . . First or second row of wave fields (the same direction, opposite to the direction of solidification)
f1,f2...行波場W1或W2的第一或第二頻率F1, f2. . . First or second frequency of traveling wave field W1 or W2
Claims (16)
藉由感應器(110)提供至少一第一組具有可設定頻率(f1)的相移交流電流,亦即在熔液(130)內透過數個感應器(110)產生一行波場(W1),這樣就可以至少在坩堝(120)邊緣形成一固液介面(PG,PG’)之曲面,該曲面朝凝固方向(Y)凸出; 並且,
該熔液(130)在至少一行波場(W1)作用下,可以相對凝固方向(Y)流動,且預設頻率(f1)最低可為50Hz。A method for directionally solidifying a non-metal melt (130), the melt (130) being located in a crucible (120) having at least one single crystal seed crystal (140) at the bottom of the crucible (120), and the molten metal (130) The position of the single crystal seed crystal (140) begins to solidify and forms a longitudinally moving solid-liquid interface (PG, PG') in the solidification direction (Y), which is characterized by:
Providing at least one first group of phase-shifted alternating currents having a settable frequency (f1) by means of an inductor (110), that is, generating a line of waves (W1) through the plurality of inductors (110) in the molten metal (130) So that a curved surface of a solid-liquid interface (PG, PG') can be formed at least at the edge of the crucible (120), the curved surface protruding toward the solidification direction (Y);
The molten metal (130) can flow relative to the solidification direction (Y) under the action of at least one wave field (W1), and the preset frequency (f1) can be at least 50 Hz.
該裝置在坩堝(120)上安置數個感應器(110),為感應器(110)供應至少一組具有可設定頻率(f1)的相移交流電(I1a, I1b, I1c),使在熔液(130)內形成至少一行波場(W1),並至少在坩堝(120)的邊緣形成一曲面,該曲面朝凝固方向(Y)凸出,這樣,該行波場(W1)就可沿凝固方向(Y)的反方向經過熔液(130),該頻率(f1)至少為50Hz。A device for directionally solidifying a non-metal melt (130) having a crucible (120), a crucible (120) containing a melt (130), and at least one single crystal seed crystal (140) in the crucible (120), The molten metal (130) solidifies from the single crystal seed crystal (140) and forms a solid-liquid interface (PG, PG') that moves longitudinally in the solidification direction (Y), and is characterized by:
The device houses a plurality of inductors (110) on the crucible (120), and supplies the inductor (110) with at least one set of phase-shifted alternating current (I1a, I1b, I1c) having a settable frequency (f1) to enable the melt Forming at least one wave field (W1) in (130), and forming a curved surface at least at the edge of the crucible (120), the curved surface protruding toward the solidification direction (Y), so that the traveling wave field (W1) can be along The opposite direction of the solidification direction (Y) passes through the melt (130), which has a frequency (f1) of at least 50 Hz.
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