TW201303067A - Raw material gas generating device - Google Patents

Abstract

This invention is to suppress a decrease of the concentration of the raw material gas. A raw material gas generating device 101 is provided to heat a solid raw material 102 in a container 111, in order to generate a raw material gas for CVD processing. A carrier gas introduced into the container 111 via a venting pipe 113 is diffused by a diffusate 131 of a gas diffusing member 115, and then is sprayed from the openings 115A in a vertically downward direction. The raw material gas generated from the solid raw material 102, together with the carrier gas, are discharged to the outside of the container 111 from the top side of the solid raw material 102 via a venting pipe 116. This invention is applicable to a raw material gas generating device, for example, for generating raw material gas for CVD processing.

Description

Raw material gas generating device

The present invention relates to a material gas generating device, and more particularly to a material gas generating device for generating a raw material gas for CVD (Chemical Vapor Deposition) processing.

Conventionally, in a raw material gas generating device that generates a raw material gas for CVD processing, a container in which a powdery solid raw material such as a carbonyl metal or the like is placed is heated to generate a raw material gas, and a carrier gas is introduced into a container to feed the raw material. The gas is discharged to the outside of the container together with the carrier gas, and supplied to the laser processing apparatus for performing CVD processing (for example, refer to Patent Document 1).

Fig. 1 shows an example of the configuration of such a material gas generating device.

The material gas generating device 1 of Fig. 1 is configured to include a cylindrical container 11, a disk-shaped cover 12, a vent pipe 13, a valve 14, a diffuser 15, a vent pipe 16, and a valve 17.

The container 11 is set to a predetermined temperature by a heating means (not shown), and the solid raw material 2 in the container 11 is sublimated by the heat, thereby generating a material gas.

On the other hand, the carrier gas system is introduced into the container 11 through the vent pipe 13, and is diffused substantially uniformly in all directions except the diffuser 15 by the diffuser 15 provided at the front end of the vent pipe 13. Then, the diffused carrier gas flows through the container 11, and the raw material gas generated from the solid raw material 2 is sent through a vent pipe 16 to a laser processing apparatus (not shown) for performing CVD processing.

At this time, since the carrier gas flows substantially in the vicinity of the surface of the solid raw material 2 by the action of the diffuser 15, the solid raw material 2 is almost uniformly consumed in almost any part.

Further, after the solid raw material 2 is filled in the container 11, the particle size of the surface of the solid raw material 2 is immediately sublimated, so that the concentration of the material gas in the container 11 is increased, so that it is discharged from the vent pipe 16 and supplied to the mine. The concentration of the material gas (hereinafter referred to as the supply material gas concentration) occupied by the gas (hereinafter referred to as the supply gas) of the injection processing device is increased. Thereafter, as the smaller particle diameter of the solid raw material 2 is consumed, the concentration of the raw material gas in the container 11 is lowered, and the concentration of the supplied raw material gas is stabilized.

[Previous Technical Literature] [Patent Literature]

[Patent Document 1] Japanese Patent Laid-Open Publication No. 2001-59178

In the material gas generating device 1, when the flow rate of the carrier gas is increased, the concentration of the supply material gas is lowered, and the amount of decrease in the concentration of the supply material gas is increased by the consumption of the solid material 2.

Specifically, in the case where the flow rate of the carrier gas is small, the time during which the carrier gas stays in the container 11 becomes long, and the material gas generated from the surface of the solid raw material 2 is sufficiently transported to the vent pipe 16 by the carrier gas. Opening portion 16A. Therefore, the difference in concentration of the material gases in the container 11 is small, and the decrease in the concentration of the material gas in the vicinity of the opening 16A of the vent pipe 16 is suppressed. As a result, the decrease in the concentration of the feed material gas can be suppressed.

In addition, as shown in Fig. 2, even due to the consumption of solid raw material 2 The distance between the surface of the solid raw material 2 and the opening 16A of the vent pipe 16 is increased, and the difference in the concentration of the material gas in the container 11 is still small, so that the amount of decrease in the concentration of the supply material gas can be suppressed to be small.

On the other hand, when the flow rate of the carrier gas is increased, the side of the diffuser 15 is ejected, and the carrier gas which does not pass through the vicinity of the surface of the solid raw material 2 and directly flows into the vent pipe 16 or stays in the upper portion of the vessel 11 increases. By the flow of the carrier gas, the flow of the carrier gas from the surface of the solid raw material 2 toward the opening portion 16A of the vent pipe 16 is prevented, so that the material gas stays near the surface of the solid raw material 2. Therefore, the difference in concentration of the material gases in the vertical direction in the container 11 is increased, and the concentration of the material gas in the vicinity of the opening 16A of the vent pipe 16 is lowered. As a result, the concentration of the feed material gas is lowered.

In addition, as shown in FIG. 2, the distance between the surface of the solid raw material 2 and the opening 16A of the vent pipe 16 is increased by the consumption of the solid raw material 2, and the carrier gas flowing near the surface of the solid raw material 2 is expanded. The ratio is decreased, and the difference in concentration of the material gases in the upper and lower directions in the container 11 is increased. As a result, the amount of decrease in the concentration of the supply material gas due to the consumption of the solid raw material 2 becomes large.

The present invention has been made in view of the above circumstances, and an object thereof is to suppress a decrease in the concentration of a material gas.

A material gas generating device according to an aspect of the present invention is a device for generating a material gas from a solid raw material in a container closed by a lid, the material gas generating device comprising: an introduction member having a material for transporting a material at a front end portion a carrier gas is introduced into the first opening in the container; and the diffusion member is disposed above the material to block the first opening. The carrier gas that has entered the container diffuses, and has a second opening that ejects the diffused carrier gas in a vertically downward direction; and a discharge member that discharges the source gas together with the carrier gas from the upper side of the material to the outside of the container.

In one aspect of the invention, the carrier gas system introduced into the container from the first opening of the introduction member is diffused by the diffusion member, and the diffused carrier gas is ejected vertically downward from the second opening of the diffusion member. The raw material gas is discharged together with the carrier gas from the upper side of the raw material to the outside of the container.

Thereby, the decrease in the concentration of the material gas can be suppressed.

The introduction member and the discharge member are constituted by, for example, a vent pipe. This diffusion member is composed of, for example, a gas diffusion member including a diffusion body of a sintered metal or the like.

The second opening of the diffusion member may be disposed substantially at the center of the horizontal direction of the container.

Thereby, the decrease in the concentration of the material gas can be more effectively suppressed.

The diffusion member may have a plurality of second openings, and the plurality of second openings may be arranged substantially symmetrically with the center in the horizontal direction of the container as a center.

Thereby, the decrease in the concentration of the material gas can be more effectively suppressed.

According to an aspect of the invention, it is possible to suppress a decrease in the concentration of the material gas.

[Formation of the Invention]

Hereinafter, a mode for carrying out the invention (hereinafter referred to as an embodiment) will be described. Further, the description is made in the following order.

1. First embodiment

2. Second embodiment

3. Third embodiment

4. Change

<1. First embodiment> [Configuration Example of Material Gas Generator 101]

Fig. 3 is a cross-sectional view showing a configuration example of a material gas generating device 101 according to the first embodiment of the material gas generating device to which the present invention is applied.

The material gas generating device 101 is a device that heats the solid raw material 102 placed in the container 111 to generate a raw material gas for CVD processing. The solid raw material 102 is composed of, for example, a carbonyl metal or the like having a high saturated vapor pressure of about 1 hPa at room temperature to about 50 ° C.

The material gas generating device 101 is configured to include a cylindrical container 111, a disk-shaped lid 112, a vent pipe 113, a valve 114, a gas diffusion member 115, a vent pipe 116, and a valve 117.

The container 111 is set to a suitable temperature by a heating means (not shown), and the solid raw material 102 is sublimated by the heat of the container 111 to generate a material gas.

The lid 112 is detachably mounted to the container 111. For example, when the solid material 102 is filled in the container 111, the lid 112 is removed from the container 111. Further, the portion in contact with the container 111 and the lid 112 is hermetically sealed so that the gas in the container 111 does not leak.

Further, a vent pipe 113 and a vent pipe 116 are provided on the lid 112 so as to penetrate in the vertical direction.

The vent pipe 113 is for introducing the carrier gas carrying the material gas into the container 111. Further, the carrier gas system uses an inert gas such as argon gas.

Further, a valve 114 is provided on the vent pipe 113, which allows the carrier gas to flow or be cut off.

Further, a gas diffusion member 115 is provided at the front end of the vent pipe 113. The gas diffusion member 115 is composed of a diffuser 131 and a frame 132.

The diffuser 131 is made of, for example, a sintered metal, and is provided to block the opening 113A (first opening) at the front end of the vent pipe 113. Thereby, all of the carrier gas discharged from the opening 113A of the vent pipe 113 flows into the diffuser 131 and is diffused by the diffuser 131.

Further, the diffuser 131 is covered by the frame 132 except for the portion of the opening 113A at the front end of the vent pipe 113 and the lower surface thereof. Thereby, the carrier gas diffused by the diffuser 131 is discharged from the lower surface of the diffuser 131, and the opening 115A (second opening) of the gas diffusion member 115 formed by the frame 132 faces vertically downward. Spurt in the direction.

The vent pipe 116 is connected to a laser processing apparatus (not shown) that performs CVD processing by a gas-tight joint or the like, and the raw material gas and the carrier gas (that is, the supply gas) are carried out from the container 111 to be supplied to the laser processing. Device. Further, a valve 117 is provided on the vent pipe 116, which allows the supply gas to flow or be cut off.

[Gas Flow of Material Gas Generator 101]

Here, the flow of the gas in the material gas generating device 101 will be described.

The carrier gas introduced into the container 111 through the vent pipe 113 is discharged from the opening 113A of the vent pipe 113, diffused by the diffuser 131 of the gas diffusion member 115, and ejected from the opening 115A in the vertical downward direction. The carrier gas ejected from the gas diffusion member 115 is lowered in a substantially vertical downward direction to the surface of the solid raw material 102, and is sprayed to the surface of the solid raw material 102, and diffused toward the inner wall of the container 111 along the surface of the solid raw material 102. . Then, the carrier gas rises along the inner wall of the container 111.

The raw material gas generated from the solid raw material 102 is transported to the opening portion 116A of the vent pipe 116 by the flow of the carrier gas, and flows into the vent pipe 116 together with the carrier gas. Then, the material gas and the carrier gas (that is, the supply gas) are supplied to the CVD processing apparatus through the vent pipe 116.

As described above, in the material gas generating device 101, most of the carrier gas ejected from the gas diffusion member 115 flows in the vicinity of the surface of the solid material 102 for the transportation of the material gas. On the other hand, there is almost no carrier gas which flows directly into the vent pipe 116 or stays in the upper portion of the container 111 without passing near the surface of the solid raw material 102.

Therefore, the material gas generated on the surface of the solid raw material 102 is efficiently transported to the opening portion 116A of the vent pipe 116 by the carrier gas, so that the difference in concentration of the material gases in the upper and lower directions in the container 111 is small. As a result, it is possible to suppress a decrease in the concentration of the material gas (supply material gas concentration) occupied by the supply gas supplied to the laser processing apparatus.

Further, the portion of the solid raw material 102 directly blown by the carrier gas ejected from the gas diffusion member 115 is consumed faster than the peripheral portion thereof, and therefore, as shown in Fig. 4, it is generated on the surface of the solid raw material 102. Depression. However, even if a depression is generated, the surface of the solid raw material 102 is caused The distance between the opening portion 116A of the vent pipe 116 is increased, and the material gas can be efficiently transported to the opening portion 116A of the vent pipe 116 by the flow of the carrier gas. Therefore, the material gas in the upper and lower directions in the container 111 can be suppressed. The increase in concentration difference. As a result, the amount of decrease in the concentration of the supplied material gas due to the consumption of the solid raw material 102 can be suppressed to a minimum.

Therefore, the concentration of the supply material gas supplied to the supply gas of the laser processing apparatus can be stabilized for a long period of time.

Further, even if the flow rate of the carrier gas is increased, most of the carrier gas is used for the transportation of the material gas, and the difference in the concentration of the material gas in the upper and lower directions in the container 111 is hardly increased, so that the decrease in the concentration of the supply material gas can be suppressed.

Therefore, the flow rate of the carrier gas can be increased without increasing the capacity of the container 111 without causing a decrease in the concentration of the supply material gas.

Further, the present invention can be realized by a simple configuration, in particular, without using a high-priced spare or a complicated constitution.

<2. Second embodiment> [Configuration Example of Raw Material Gas Generator 201]

Fig. 5 is a cross-sectional view showing a configuration example of a material gas generating device 201 according to a second embodiment of the material gas generating device to which the present invention is applied. In the drawings, the same reference numerals are given to the parts corresponding to those in FIG.

The material gas generating device 201 differs from the material gas generating device 101 of Fig. 3 in the arrangement of the vent pipe 113 and the gas diffusion member 115. That is, in the material gas generating device 201, the vent pipe 113 and the gas diffusion member 115 are disposed in the horizontal direction of the container 111. The approximate center.

In addition, the flow of the gas in the material gas generating device 201 is substantially the same as that of the material gas generating device 101 except that the carrier gas ejected from the gas diffusing member 115 is sprayed at substantially the center of the surface of the solid material 102. Therefore, in the material gas generating device 201, as the solid raw material 102 is consumed, as shown in Fig. 6, a depression is generated at substantially the center of the surface of the solid raw material 102.

In the above-described material gas generating device 101, the depression on the surface of the solid raw material 102 is formed near the inner wall of the container 111, so that when the depression is increased, it collides with the inner wall of the container 111, thereby suppressing the area of the depression. expand.

On the other hand, in the material gas generating device 201, a recess is formed substantially at the center of the surface of the solid material 102, so that even if the recess is increased, it does not collide with the inner wall of the container 111. Therefore, the enlargement of the surface area of the recess is not suppressed.

Therefore, since the surface area of the solid raw material 102 increases as the consumption of the solid raw material 102 proceeds, the raw material gas generating device 201 can suppress the decrease in the concentration of the raw material gas more than the raw material gas generating device 101.

In addition, Fig. 7 is a graph comparing the supply material gas concentration of the material gas generating device 201 and the conventional material gas generating device 1. The horizontal axis represents the use time, and the vertical axis represents the supply material gas concentration. Further, the upper curve shows the change in the supply material gas concentration of the material gas generator 201, and the lower curve shows the change in the supply material gas concentration of the material gas generator 1.

Thus, the material gas generating device 201 is larger than the material gas generating device 1 Further, the decrease in the concentration of the supply material gas accompanying the consumption of the solid raw material 102 can be suppressed.

<3. Third embodiment> [Configuration Example of Material Gas Generator 301]

Fig. 8 is a cross-sectional view showing a configuration example of a material gas generating device 301 according to a third embodiment of the material gas generating device to which the present invention is applied. In the drawings, the same reference numerals are given to the parts corresponding to those in FIG.

The material gas generating device 301 is different from the material gas generating device 201 of FIG. 5 in that a gas diffusion member 311 is replaced at the front end of the vent pipe 113 instead of the gas diffusion member 115.

The gas diffusion member 311 is different from the gas diffusion member 115 in the number of the diffusion bodies as compared with the gas diffusion member 115. Specifically, the gas diffusion member 311 is composed of diffusers 331a to 331d (the diffusion bodies 331b and 331d are not shown) and the frame 332.

Fig. 9 is a view of the gas diffusion member 311 as viewed from below. Below the gas diffusion member 311, openings 311A to 311D formed by the frame 332 are provided so as to be substantially symmetrical with respect to the central axis C as a center. In this way, since the gas diffusion member 311 is disposed substantially at the center in the horizontal direction of the container 111, the openings 311A to 311D are arranged substantially symmetrically with the center of the container 111 in the horizontal direction as a center. Further, although not shown in FIG. 9, diffusers 331a to 331d are provided on the upper portions of the openings 311A to 311D, respectively.

Further, the casing 332 is formed such that the carrier gas discharged from the opening 113A of the vent pipe 113 flows into the upper surface of the diffusers 331a to 331d and from below. The path of the discharge. Therefore, the carrier gas that has flowed into the gas diffusion member 311 is diffused by the diffusers 331a to 331d, and is discharged from the lower surfaces of the diffusers 331a to 331d, and is ejected from the openings 311A to 311D in the vertical downward direction.

Thereby, in the material gas generating device 301, the carrier gas can be more uniformly sprayed onto the surface of the solid raw material 102 as compared with the material gas generating device 101 and the material gas generating device 201. Therefore, the size and depth of the depressions generated on the surface of the solid raw material 102 become small.

Therefore, the material gas generated on the surface of the solid raw material 102 can be more efficiently transported to the opening portion 116A of the vent pipe 116 by the carrier gas, whereby the difference in concentration of the material gases in the upper and lower directions in the container 111 can be reduced. As a result, the decrease in the concentration of the feed material gas can be more effectively suppressed.

Further, the positions of the openings 311A to 311D and the diffusers 331a to 331d may be disposed at other positions substantially symmetrical about the central axis C of the gas diffusion member 115.

For example, as shown in FIG. 10, the opening 311A may be disposed on the central axis C of the gas diffusion member 311, and the openings 311B to 311D and the diffusion bodies 331a to 331d may be disposed substantially symmetrically about the central axis C. (not shown).

Further, the number of the openings (diffusion bodies) is not limited to one or four, and may be set to any number. In addition, when a plurality of openings (diffusion bodies) are provided, as exemplified in FIGS. 9 and 10, it is preferable to arrange the center axis C of the gas diffusion member as a center.

Further, the diameter and the number of the openings of the gas diffusion member are preferably set to optimum values based on the flow rate of the carrier gas, the size of the container 111, and the like.

<4. Change example>

Hereinafter, a modification of the embodiment of the present invention will be described.

[Variation 1]

For example, the material gas generating devices 101 to 301 are not particularly limited in shape and position as long as they are configured such that the carrier gas can be ejected from the upper side of the solid material 102 in a vertically downward direction. For example, the vent pipe 113 may be formed in an L shape and passed through the side surface of the container 111 to introduce a carrier gas from the side of the container 111.

[Variation 2]

In addition, the shape and position of the vent pipe 116 are not particularly limited as long as the opening portion 116A is provided at a position higher than the surface of the solid material 102 in the container 111 and the supply gas can be discharged to the outside of the container 111.

[Variation 3]

Further, the shape of the container 111 is not limited to a cylindrical shape, and may be other shapes.

[Variation 4]

In addition, the number of the vent pipes for gas introduction and gas discharge is not limited to one, and two or more may be provided.

Further, the embodiment of the present invention is not limited to the above embodiment, and various modifications can be made without departing from the spirit and scope of the invention.

101‧‧‧Material gas generating device

102‧‧‧ solid materials

111‧‧‧ Container

112‧‧‧ Cover

113‧‧‧ snorkel

115‧‧‧ gas diffusion members

115A‧‧‧ openings

116‧‧‧ snorkel

131‧‧‧Diffuser

132‧‧‧ frame

201‧‧‧Material gas generating device

301‧‧‧Material gas generating device

311‧‧‧ gas diffusion members

311A~311D‧‧‧ openings

331a~331d‧‧‧ diffuser

332‧‧‧ frame

Fig. 1 is a view showing an example of a configuration of a conventional material gas generating device.

Fig. 2 is a view showing an example of a configuration of a conventional material gas generating device.

Fig. 3 is a view showing a first embodiment of a material gas generating device to which the present invention is applied.

Fig. 4 is a view showing a first embodiment of a material gas generating device to which the present invention is applied.

Fig. 5 is a view showing a second embodiment of the material gas generating device to which the present invention is applied.

Fig. 6 is a view showing a second embodiment of the material gas generating device to which the present invention is applied.

Fig. 7 is a graph comparing the concentration of the material gas of the conventional material gas generating device and the material gas generating device to which the present invention is applied.

Fig. 8 is a view showing a third embodiment of the material gas generating device to which the present invention is applied.

Fig. 9 is a view showing an example of the position of the opening of the gas diffusion member.

Fig. 10 is a view showing an example of the position of the opening of the gas diffusion member.

101‧‧‧Material gas generating device

102‧‧‧ solid materials

111‧‧‧ Container

112‧‧‧ Cover

113‧‧‧ snorkel

114, 117‧‧‧ valve

115‧‧‧ gas diffusion members

113A, 115A‧‧‧ openings

116‧‧‧ snorkel

116A‧‧‧ Opening

131‧‧‧Diffuser

132‧‧‧ frame

Claims (4)

A material gas generating device is a device for generating a material gas from a solid raw material in a container closed by a lid, the material gas generating device characterized by: an introduction member having a carrier at a front end portion for transporting the material gas a gas is introduced into the first opening in the container; a diffusion member is disposed above the material to block the first opening, and the carrier gas introduced into the container is diffused and has a carrier to be diffused a second opening that ejects the gas in a vertically downward direction; and a discharge member that discharges the raw material gas from the upper side of the raw material to the outside of the container together with the carrier gas. The material gas generating device according to claim 1, wherein the second opening is disposed substantially at the center of the horizontal direction of the container. The material gas generating device according to the first aspect of the invention, wherein the diffusing member has a plurality of the second openings, and the plurality of the second openings are arranged substantially symmetrically with respect to a center in a horizontal direction of the container. The material gas generating device according to any one of claims 1 to 3, wherein the diffusing member is formed by an outer frame and a diffuser housed in the frame, the outer frame is for covering the first The diffusion system and the portion other than the second opening are disposed to block the first opening.