TW201237950A - Substrate treatment apparatus - Google Patents

Abstract

The substrate treatment apparatus of this invention comprises a nozzle and a nozzle arm. The nozzle discharges processing liquid to a substrate. The nozzle arm holds the aforementioned nozzle and extends horizontally. At least one part of the nozzle arm has an orthogonal section, and is inclusive of a top section at the center top of the aforementioned orthogonal section, a side section at the side of the aforementioned top section, and an upper inclined section from the aforementioned top section descending toward the aforementioned side section.

Description

201237950 VI. Description of the Invention: [Technical Field] The present invention relates to a substrate processing apparatus for processing a substrate. The substrate to be processed includes, for example, a semiconductor wafer, a substrate for a liquid crystal display device, a substrate for plasma display, a substrate for FED (Field Emissive Display), a substrate for a disk, and a substrate for a disk. A substrate for a magneto-optical disk, a substrate for a photomask, a ceramic substrate, a substrate for a solar cell, or the like. [Prior Art] In a manufacturing process of a semiconductor device or a liquid crystal display device, a substrate such as a glass substrate for a semiconductor wafer or a liquid crystal display device is treated with a processing liquid. The monolithic substrate processing apparatus that processes the substrate one by one, for example, includes a spin chuck that holds the substrate horizontally and rotates, and a discharge chuck on the upper surface of the substrate held by the k-turn chuck Liquid nozzle. The nozzle is held at the front end of the horizontally extending nozzle arm. The nozzle arm is coupled to the squirting mechanism. The nozzle swinging mechanism rotates the nozzle and the nozzle arm about a vertical axis of rotation disposed on the side of the rotating chuck. When the processing liquid is supplied from the nozzle to the I surface of the substrate in the substrate processing apparatus i, the nozzle and the nozzle arm are disposed above the substrate held by the spin chuck. Moreover, the substrate is rotated about a vertical axis by rotating the chuck. Then, the processing liquid is discharged from the surface of the substrate to the rotating state. Thereby, the processing liquid is supplied from the mouth to the upper surface of the substrate. After the supply of the processing liquid to the substrate by the nozzle is completed, the nozzle swinging mechanism retracts the nozzle and the nozzle arm from above the substrate. [Patent Document 1] [Patent Document 1] Japanese Patent Laid-Open Publication No. Hei 2〇1〇_177371 [Invention] The use of a female in the county is used for the love department, and there is a place of ί: The condition on the nozzle arm of the device. The nozzle arm moves over the substrate. Therefore, if the nozzle arm of the treatment liquid is attached to the nozzle arm, the treatment liquid adhering to the nozzle arm is dropped and dropped. For example, there is a case where the recording liquid is attached to the nozzle arm, and the attached processing liquid falls on the substrate when the money nozzle arm moves. If the treatment night falls on the substrate on which the chemical treatment has been performed, the uniformity of the occupational fluid treatment is lowered. Further, if the treatment liquid is dropped on the substrate which has been subjected to the drying treatment, the drying is poor. Therefore, the present invention provides a plate processing apparatus having a liquid removal effect. The substrate processing apparatus of the basic invention of the thin invention includes: a nozzle, a processing fluid for processing, and a nozzle arm that holds the nozzle and extends in the longitudinal direction of the material plane; and the arm that is orthogonal to the longitudinal direction At least the orthogonal coffee of the material, including the top portion above the tangent (10), on the side more lateral than the top:: Continuously descending to the upper portion of the upper cent. (4) According to this configuration, the nozzle arm of the holding nozzle is oriented along the horizontal plane in the longitudinal direction 100134597 4 201237950: at least a part of the orthogonal section of the one-arm arm (orthogonal to the length direction: face) includes continuous from the top The upper side inclined portion is lowered to the side portion. Since the upper inclined portion is continuously lowered, even if the treatment liquid adheres to the upper inclined portion, the treatment liquid is discharged downward along the upper inclined portion. Then, the treatment liquid is removed from the nozzle arm and dropped. That is, even if the treatment liquid adheres to the nozzle arm, the treatment liquid can be removed from the nozzle f in a short time. Therefore, the residual amount of the treatment liquid to the nozzle arm can be reduced. In the embodiment of the present invention, the orthogonal cross section further includes a lowermost bottom portion in the orthogonal cross section and a lower side inclined portion continuously descending from the side portion to the bottom portion. According to this configuration, the orthogonal section of the nozzle arm includes the lower side inclined portion from the (four) continuous lowering to the bottom. Since the lower inclined portion continuously descends, even if the treatment liquid adheres to the lower inclined portion, the treatment liquid also flows downward along the lower inclined portion. Then, the treatment liquid is dropped from the nozzle arm to be removed. Therefore, the residual amount of the treatment liquid to the nozzle arm can be reduced. In one embodiment of the present invention, the orthogonal cross section includes a pair of right and left side ends on the most lateral side of the orthogonal cross section, wherein one side end includes the top portion and the side portion includes another side end And the upper inclined portion is continuously lowered from the one side end to the other side end. According to this configuration, the - side end includes the top portion, and the side portion includes the other side end opposite to the one side end. The upper inclined portion extends from the top to the side. Therefore, the upper inclined portion extends from the side end to the other side end. The heart is orthogonal 1 Ϊ 00134597 5 201237950 The upper part of the face extends from one side to the other side, and the closer it is to the other side, the lower. Therefore, the treatment liquid attached to the upper portion of the orthogonal section flows down to the side end (the other end) of the common side. Thereby, the liquid droplets attached to the upper portion of the orthogonal cross section can be bonded to each other and dropped by their own weight. Therefore, the residual amount of the treatment liquid to the nozzle arm can be reduced. The substrate processing apparatus according to the embodiment of the present invention further includes a second gas nozzle that discharges gas to the lower portion of the nozzle arm. According to this configuration, the gas system discharged from the first gas nozzle blows the lower portion of the nozzle arm. As described above, the treatment liquid of the nozzle f is blown along the nozzle arm to the treatment liquid of the nozzle arm to be blown. Thereby, the attachment to the chemical liquid can be added to the secret of the nozzle arm. Therefore, it is possible to reduce the configuration in which the gas of the second gas nozzle is discharged along the upper material from the first gas nozzle. The side of the mouth arm that flows in the longitudinal direction flows according to this configuration 'from the first}$ in the longitudinal direction. Therefore, the gas system spouted by the mouth and mouth will expand along the range of the nozzle arm. Thereby, the gas can be blown from the nozzle arm from the first gas nozzle, and the treatment liquid can be reduced to the nozzle. Therefore, the first gas nozzle may be configured such that the gas is discharged from the lower portion of the nozzle arm to the side of the nozzle arm. In this case, the above upper side 100134597

S 201237950 Preferably, the inclined portion is lowered toward the side from which the gas from the second gas nozzle is blown. According to this configuration, the gas system discharged from the first gas nozzle blows the lower portion of the nozzle arm from the side. The upper inclined portion is lowered toward the side from which the gas from the i-th gas nozzle is blown. Therefore, the treatment liquid adhering to the upper inclined portion flows downward toward the side from which the gas from the first gas nozzle is blown. In other words, the gas system discharged from the first gas nozzle is inclined toward the position where the treatment liquid adhering to the upper inclined portion is concentrated. Therefore, it is effective to remove the treatment liquid from the upper inclined portion. The nozzle arm is preferably formed of a hydrophobic material. According to this, the hydrophobicity of the nozzle arm material (4) is formed, so that the material arm is hydrophobic. Therefore, the # attached to the nozzle arm can be removed from the nozzle arm in a short time and with a small force compared to the case where the nozzle arm is hydrophilic. Further, since the liquid is repelled, the treatment liquid held in the nozzle arm can be reduced: by this treatment, the residual amount of the treatment liquid to the nozzle arm can be further reduced. in. According to the substrate processing apparatus of the embodiment of the present invention, the pure water nozzle for discharging pure water on the upper surface of the nozzle arm is incorporated. Directional According to this configuration, the upper surface of the mouth and mouth is supplied with water from the pure nozzle. In this way, the money can be washed on the upper surface of the sneeze, and 4 is washed away. Therefore, it is possible to prevent the adhesion (four) mouth = the chemical liquid from falling on the substrate, so that the substrate is exposed. Moreover, if the water supplied by the treatment arm is supplied with water, the nozzle is 100134597 ^ η 201237950. The pure arm is removed, so that the water can be prevented from falling from the nozzle arm to the substrate after the end of supplying pure water to the nozzle arm. . In an embodiment of the invention, the nozzle includes a lower portion of the nozzle disposed below the spray arm. In this case, the substrate processing apparatus ‘ preferably further includes a second gas nozzle that discharges gas to the lower portion of the nozzle. In this configuration, the gas system discharged from the second gas nozzle is sprayed on the lower portion of the nozzle than the nozzle arm. Since the lower portion of the nozzle is disposed in the treatment liquid that moves on the outer surface of the nozzle than the nozzle, or through the nozzle arm, the treatment liquid of the bird flows down the nozzle. Therefore, the gas system discharged from the nozzle can read the ground treatment liquid efficiently. In the embodiment, the nozzle arm is configured to include the emulsion from which the first gas nozzle is sprayed from the first gas nozzle to the front end portion. The base end portion is formed upward from the upper m Γ type, and the second gas nozzle is configured to flow in the direction of the tip end portion by the 苐2 gas nozzle: toward the upper end from the base end portion The gas system discharged from the first gas nozzle is discharged from the mouth of the nozzle arm toward the tip end portion of the nozzle arm, and flows from the second gas jet direction from the second gas direction toward the base end. The gas system spit out from the front end of the body is facing the same side 100134597 ~

S 201237950 is moving. Therefore, it is possible to suppress or prevent the gas ejected from the i-th gas nozzle from colliding with the gas ejected from the second gas nozzle, and the momentum of the gas ejected from each gas nozzle is weakened. Thereby, it can surely remove the treatment liquid adhering to the nozzle and the nozzle arm. A substrate processing apparatus according to an embodiment of the present invention further includes: a substrate holding means for holding the substrate; and a moving means for positioning the nozzle arm at a processing position of the base held by the substrate holding means The nozzle moves between standby positions retracted from above the substrate held by the substrate holding means. In this case, it is preferable that the second gas nozzle is configured such that gas is discharged to the lower portion of the nozzle arm located at the standby position. According to this configuration, the nozzle arm moves between the processing position and the standby position by transmitting the driving force of the moving means to the nozzle arm. The gas system discharged from the first gas nozzle is blown toward the lower portion of the nozzle arm at the standby position. Therefore, the first gas nozzle can be disposed at the standby position. That is, the i-th gas nozzle may not be configured to move with the nozzle arm. Therefore, it is possible to suppress or prevent an increase in the size of the movable portion including the nozzle arm. Preferably, at least the portion of the nozzle arm includes a portion above the substrate held by the substrate holding means in the processing position. According to this configuration, the portion located above the substrate held by the substrate holding means at the processing position has an orthogonal cross section. Therefore, even if the treatment liquid adheres to this portion, the treatment liquid can be removed in a short time. Therefore, even if the nozzle arm 100134597 9 201237950 is moved on the substrate, the treatment liquid can be suppressed or prevented from falling from the nozzle arm on the substrate. Thereby, substrate contamination or quality deterioration can be suppressed or prevented. [Embodiment] Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. Fig. 1 is a diagram showing a schematic configuration of a substrate processing apparatus i according to an i-th embodiment of the present invention. Fig. 2 is a plan view showing a schematic configuration of a substrate processing apparatus 1 according to a third embodiment of the present invention. The substrate processing apparatus 1 is a one-chip substrate processing apparatus that processes the substrate w one by one. The substrate at the substrate is provided with a level _ holding substrate w and

Rotating the reading and reading 2, cutting the nozzle 3 of the processing liquid on the upper surface of the substrate W of the fourth (four), the nozzle arm 4 holding the nozzle 3, the blocking plate 5 disposed above the rotating chuck 2, and A partition wall (not shown) that divides the processing chambers 6 that accommodate these configurations 2 to 5. Further, the substrate processing apparatus L is provided with a control device 7 that controls opening and closing of the operation of the apparatus for mounting the substrate processing apparatus. The slave transfer chuck 2 packs s has a disk-shaped rotary base (4) n 8 horizontally rotating around the vertical axis passing through the center of the substrate W, and a rotary motor (four) η which rotates the rotary base 8 around the vertical axis 09. The rotary package 2 can hold the substrate type money horizontally in the horizontal plane of the scale board W, and the vacuum chuck of the substrate w is horizontally held by the back surface (lower surface) of the substrate W. In the embodiment of the invention, the rotary chuck 2 is, for example, a clamp chuck. 100134597 201237950 The nozzle 3 is a two-fluid nozzle that generates a plurality of droplets by colliding a liquid with a gas, and discharges the generated plurality of droplets onto the substrate W. In the first embodiment, pure water as an example of a liquid is supplied to the nozzle 3, and nitrogen gas as an example of a gas is supplied to the nozzle 3. The nozzle 3 is disposed above the spin chuck 2 with its discharge port facing downward. The nozzle 3 is not limited to the two-fluid nozzle, and may be a straight nozzle that discharges the treatment liquid in a continuous flow state, or may be a nozzle that discharges a gas such as nitrogen. The nozzle 3 is held at the front end 20 of the nozzle arm 4. The nozzle arm 4 extends in the longitudinal direction D1 along the horizontal plane. As shown in Fig. 2, the base end portion 21 of the nozzle arm 4 is coupled to the nozzle rotating mechanism 1A. The nozzle rotating mechanism 1 rotates the nozzle 3 and the nozzle arm 4 around a vertical nozzle rotation axis L1 provided on the side of the rotary chuck 2. The nozzle rotating mechanism 1 is configured such that the nozzle 3 and the nozzle arm 4 are disposed at a processing position above the rotating chuck 2 (the position shown in FIG. 2 and the position of the table in FIG. 2 in the solid line), and the nozzle 3 The standby position at which the spin chuck 2 is retracted (the phantom factory indicated by the two-point chain line in Fig. 2 moves horizontally. The box 曰 (P〇d) 11 that holds the processing liquid is disposed at the standby position. The casing u is upwardly opened _ plus the opening Μ. The casing u is disposed below the nozzle 3 when placed in the standby position, and the blocking plate 5 has almost the same straightness as the substrate w. In the horizontal position, the fulcrum plate slab member is used. The slab lifting mechanism 13 and the slab __ ^ 2 are connected to the slogan 100134597. The slab is lifted and lowered to the 201237950 frame 13 to make the louver 5 and the fulcrum 12 The lower surface of the blocking plate 5 is raised and lowered close to the processing position of the upper surface of the substrate W and the retracted position (the position shown in Fig. 1) provided above the processing position. The blocking plate rotating mechanism 14 is such that the blocking plate 5 is provided. And the support shaft 12 rotates around a vertical light line passing through the center of the substrate w. The support shaft 12 is 1] cylindrical. The support shaft 12 The internal space is connected to the through hole 15 that penetrates the center portion of the blocking plate 5 in the vertical direction. The first pipe 16_into the =12 is the second pipe 17 connected to the first pipe 16. If the second pipe is spliced to the second pipe When the pure water valve 18 of the 17 is opened, pure water is supplied to the first pipe 16 from the second pipe ο, and when the pure water valve 18 is closed, the pure supply of the supply pipe S of the second pipe μ is stopped. The pure water supplied from the 16th is discharged from the lower portion of the first pipe 16 constituting the port center nozzle 19 to the central portion of the substrate. When the processing liquid is supplied from the central axis nozzle 19 to the substrate w, for example, by the control device 7, the rotary motor 9 is controlled to rotate the W held by the chuck 2, and the key is set to 7 so that the shutter 5 is placed in the state of the processing position, so that the female is called the nozzle 19 in the rotated state. The processing liquid discharged from the central axis nozzle 19 is supplied to the central portion of the upper surface of the substrate W, and then spreads outward along the upper surface of the substrate W by the centrifugal force generated by the rotation of the substrate w. Thus, the treatment liquid is supplied to the entire upper surface of the substrate w, and the substrate w is processed. In the nozzle 3 from the control means 7 rotates the substrate manufactured by the motor 9,

When W supplies the treatment liquid, for example, by controlling the substrate W 100134597 201237950 held by the spin chuck 2, the control device 7 causes the nozzle 3 to be in the processing position, and the processing liquid is rotated from the nozzle 3 to the state of rotation. In the first embodiment of the substrate w, in the first embodiment, the nozzle 3 is a two-fluid nozzle, so that a plurality of droplets are ejected from the nozzle 3 toward the upper surface of the substrate W. In this way, the board is supplied with the treatment liquid on the top of the board, and the county board W. " Fig. 3 is a side view of the nozzle arm 4 according to the first embodiment of the present invention. Fig. 4 is a cross-sectional view of the arm 4 in the direction of the arrow ～ shown in Fig. 3. Figure 3 shows the status of the machine's position. The nozzle 3 and the nozzle arm 4 are disposed in a rod-shaped member in which the nozzle arm 4 includes the distal end portion 2G and the proximal end portion 21. That is, the nozzle arm 4 includes a tip end portion 2A, a base end portion 2, and a fourth end portion of the bar-shaped arm portion 22. The material 22 is oriented in the longitudinal direction D;; = the end portion 21 is respectively coupled to one of the ends: a nozzle at the front end portion 20. Front end portion 2. The direction is from the base end portion 21 and extends from the end portion of the arm portion 22 downward. The nozzle 3 is a column and the full potential of the crucible is maintained at the front end portion 20. The nozzle 3 includes a nozzle lower portion 23 that extends downward from the front end. The nozzle lower portion 23 is disposed below the known portion 21 and the arm portion 22. Further, the base end portion 21 is attached to the base 25 by screws 24. The driving force of the nozzle rotating mechanism 10 is transmitted to the nozzle arm 4 via the base 25. The front end portion 2G and the arm portion 22 are located at a portion above the substrate w held by the square turn chuck 2 at the processing position (see the figure. The nozzle arm 4 is formed of a hydrophobic material. As a hydrophobic material, for example 100134597 13 201237950 I exemplifies a fluororesin such as polytetrafluoroethylene. As shown in Fig. 4, the 'arm portion 22 has a right side surface 27 of the bag surface 26, a left side surface 28, and a v-shaped lower surface 29, and a pentagonal shape ^ orthogonal section cu A section orthogonal to the longitudinal direction D1). The positive and negative face CU of the arm is fixed from one end of the arm portion 22 to the other end of the arm portion 22 and P. That is, the 'orthogonal section C' has the same shape and the same size (the same shape and the same size) from the end of the arm portion 22 to the other portion of the arm. In the adjacent portion 22, a rod-shaped core material sheet in which the nozzle arm 4 is reinforced is embedded. The core material 3 is formed, for example, of non-ferrous steel. Further, inside the arm portion 22, a liquid supply f 31 for supplying the liquid to the nozzle 3 and a milk supply and supply unit 32 for supplying the gas to the nozzle 3 are inserted. The core material 3G, the liquid supply pipe 31, and the gas supply pipe % extend in the longitudinal direction m in the arm portion 22. As shown in Figure 3, the liquid is supplied. The s 31 and the gas supply officer 32 protrude from the arm portion 22 toward the front end portion π side, and are connected to the nozzle 3. The substrate processing apparatus 1 further includes: supplying pure water to the nozzle arm 4 to be sprayed. ^ #4 The cleaning of the third pure water spray 3 (pure water nozzle) and the second pure water squirt 34, and the first gas nozzle 35 for supplying gas to the nozzle arm 4 to remove the pure water adhering to the nozzle arm 4. And the second gas nozzle 36. As shown in Fig. 3, the first pure water nozzle 33 and the second pure water nozzle 34 are disposed in the vicinity of the base end portion 21 of the nozzle arm 4. The second pure water nozzle % is disposed above the nozzle arm *, and the second pure water nozzle 34 is disposed below the nozzle arm 4. Further, as shown in Fig. 4, the first pure water nozzle 33 and the second pure water nozzle 34 are disposed in the width direction of the orthogonal cross section C1 (horizontal direction orthogonal to the longitudinal direction m) 100134597 14

S 201237950 The vertical axis CL1 of the center. The i-th pure water nozzle 33 and the second pure water nozzle 34 are held together with the nozzle arm 4 so as to horizontally move around the nozzle rotation axis u. . As shown in Fig. 3, the first pure water nozzle 33 and the second pure water nozzle 34 are supplied with pure water as a cleaning liquid via a common pure water valve 37. That is, when the pure water valve 37 is opened, pure water is supplied to the second pure water nozzle 33, and pure water is discharged from the second pure water nozzle 33 to the nozzle arm 4. When the pure water valve 37 is opened, pure water is supplied to the second pure water nozzle 34, and pure water is discharged from the second pure water nozzle 34 to the nozzle arm 4. Therefore, when the pure water valve 37 is opened, pure water is discharged from the upper pure water nozzle 33 and the second pure water nozzle 34. The first and third waters are arranged such that the pure water is horizontally discharged from the first pure water nozzle 33, for example. The pure water discharged from the second pure water nozzle 33 flows along the nozzle arm 4 in the longitudinal direction D1. On the other hand, the pure water discharged from the second pure water nozzle 34 is disposed in the second pure water nozzle 34 so that pure water is discharged obliquely upward from the second pure water nozzle 34, for example, and is supplied to the nozzle arm 4 Lower part. Then, the pure water supplied to the nozzle arm 4 flows along the nozzle arm 4 • in the longitudinal direction D1. Further, as shown in FIG. 3, the first gas nozzle 35 and the second gas nozzle 36 are disposed below the nozzle arm 4. The first gas nozzles 35 are disposed on the base end portion 21 side of the nozzle arm 4, and the second gas nozzles 36 are disposed on the food-side portion 20 side of the nozzle arm 4. The first gas nozzle 35 is disposed so as not to overlap the nozzle arm 4 in plan view (see Fig. 2). Further, the second gas nozzle 36 is provided with 100134597 15 201237950 placed in the vicinity of the lower portion 23 of the soothing nozzle. The second gas nozzle 36 faces the nozzle lower portion 23 in the horizontal direction. The first gas nozzle 35 and the second gas nozzle 36 are held by the first stays 38 and the second stays 39 arranged at the standby position. Therefore, when the nozzle 3 and the nozzle arm 4 are rotated about the nozzle rotation axis u, the first gas nozzle 35 and the second gas nozzle 36 are relatively moved with respect to the nozzle 3 and the nozzle arm 4. As shown in Fig. 3, the n-th gas nozzle % and the second gas nozzle % are supplied with nitrogen as a gas through the common gas valve 4G. That is, when the gas reading is turned on, nitrogen gas is supplied to the first gas nozzle 35, and nitrogen gas is discharged from the first 'i gas nozzle 35 to the nozzle arm 4. When the gas valve 40 is opened, nitrogen gas is supplied to the second gas nozzle 36, and the second gas discharge port of the second gas nozzle is discharged to the nozzle 3. Therefore, when the gas valve 40 is opened, nitrogen gas is discharged from the first gas nozzle 35 and the second gas nozzle 36. The first gas nozzle 35 is disposed such that nitrogen gas is discharged obliquely upward from the first gas nozzle 35, for example. Nitrogen gas discharged from the first gas nozzle % is blown to the nozzle arm 4. _, the nitrogen gas which is sprayed on the nozzle f4 flows in the longitudinal direction (1) along the lower portion of the nozzle arm 4. Further, since the p gas nozzle 35 and the nozzle arm 4 are disposed so as not to overlap each other in a plan view, the nitrogen gas discharged from the first gas nozzle 35 is blown from the lower portion of the squirt*. On the other hand, the 帛2 gas nozzle 36 is disposed such that the nitrogen gas is horizontally discharged from the second gas nozzle 36, for example. The nitrogen gas discharged from the second gas nozzle % is blown to the nozzle lower portion 23. 100134597 201237950 Figure 5 is an enlarged view of a portion of u 4 . Hereinafter, the cross section of the nozzle arm 4 (the orthogonal cross section C1 of the arm portion 22) will be described in detail. As described above, the orthogonal cross section C1 is, for example, a pentagonal shape. The orthogonal cross section C1 includes an upper portion 41, a right side portion 42 (side portion, another side end), a left side portion 43 (one side end), and a lower σ Μ4. The upper portion 41, the right side portion 42, the left side portion 43, and the lower portion are the portions of the upper surface 26, the right side surface 27, the left side surface 28, and the lower surface 29. The upper portion 41 is inclined with respect to the horizontal plane. The right side portion 42 and the left side portion 43 extend in the vertical direction. The lower portion 44 is inclined with respect to the horizontal plane. The lower material is, for example, a V shape. The upper 41 includes a left end 45 (top), a right end 46, and an upper inclined portion 47 connecting the left end 45 and the right end 46. The left end μ of the upper portion 4i is located at the uppermost portion on the orthogonal section C1. Therefore, the right end 46 of the upper portion 41 is located lower than the left end 45 of the upper portion 41. 1 The lower end portion 46 is lowered, and the upper side inclined portion 47 is continuously lowered as the left end 45 of the top upper portion 41 so as to be closer to the right end 46. The upper side inclined portion 47 is attached to the right end of the upper portion 41 46 is: descending to the right side portion 42 the angle is, for example, fixed. The upper inclined portion is inclined by the upper inclined portion 47, and the straight track is changed by 1:1, and the straight line is not determined by the straight line of the solid form, and the side inclined portion 47 may be the first embodiment and the lower portion. Two: the curve that protrudes downward.匕έ has left end 48, right her" right end 49 between the lower end 5 〇 (bottom +, arranged at the left end 48 and side inclined (four), and connected right end 49 4 48 and the lower end 5 〇 left, 00, 34597 5 右侧 right The lower end 50 is located at the lowermost portion on the orthogonal cross-section C1. Therefore, the left end 48 and the right end 49 of the lower portion 44 are located above the lower end 50. The left inclined portion 51 is from the left side. The left portion 48 of one portion, that is, the left end 48 of the lower portion 44, is continuously inclined downwardly as the bottom lower end 50. Similarly, the right inclined portion 52 is continuously lowered from the right end 49 of the lower portion 44, which is a portion of the right portion 42, The manner of the bottom lower end 50 is continuously inclined. The inclination angles of the left inclined portion 51 and the right inclined portion 52 may be fixed or continuously changed. Moreover, the inclination angle or the change state of the left inclined portion 51 may be compared with the right side. The inclined portion 52 may be the same or different. The lower portion 44 is inclined such that the width (the length in the left-right direction) of the orthogonal cross section C1 decreases toward the lower end 50. Further, the left side portion 43 is from the left end 45 of the upper portion 41 toward The square extends to the left end 48 of the lower portion 44. The left end 45 of the upper portion 41, the left side portion 43, and the left end portion 48 of the lower portion 44 are located on the leftmost side in the orthogonal cross section C1. The left end 45 of the upper portion 41 is a portion of the upper portion 41 while Also, it is a part of the left side portion 43. Similarly, the left end 48 of the lower portion 44 is a portion of the lower portion 44 and is also a portion of the left side portion 43. The left side portion 43 is located at one of the most lateral side ends on the orthogonal cross section C1. Further, the right side portion 42 extends downward from the right end 46 of the upper portion 41 to the right end 49 of the lower portion 44. The right end 46, the right side portion 42, and the right end 49 of the lower portion 44 of the upper portion 41 are located at the rightmost side on the orthogonal section C1. The right end 46 of the upper portion 41 is a portion of the upper portion 41 and is also a portion of the right side portion 42. 100134597 18 201237950 Similarly, the right end 49 of the lower portion 44 is a portion of the lower portion 44 and is also a portion of the right side portion 42. 42 is the other side end located on the most lateral side in the orthogonal cross section C1. That is, the right side portion 42 and the left side portion 43 are disposed on the opposite side to the left and right side ends of the opposite side with respect to the axis CL1. 35 series from the nozzle arm 4 The side is configured to discharge gas toward the lower portion of the nozzle arm 4. That is, the nitrogen gas discharged from the first gas nozzle 35 is blown from the right side to the right side surface 27 or the lower surface 29 of the nozzle arm 4. As described above, the upper side The inclined portion 47 is inclined so as to be closer to the right end 46 of the upper portion 41. Therefore, the upper inclined portion 47 is lowered toward the side from which the gas from the first gas nozzle 35 is blown (see Fig. 8). A flow chart showing an example of the operation when the nozzle 3 and the nozzle arm 4 are cleaned is shown in Fig. 7. Fig. 7 is a cross-sectional view showing an example of the operation of pure water when pure water is supplied to the nozzle arm 4. Fig. 8 is a cross-sectional view showing an example of the operation of pure water when nitrogen gas is supplied to the nozzle arm 4. Hereinafter, reference is made to FIG. 3. Further, in the following description, FIG. 1, FIG. 6, FIG. 7, and FIG. 8 are appropriately referred to. The cleaning of the nozzle 3 and the nozzle arm 4 is performed, for example, in a state where the substrate W is not held on the spin chuck 2. In the cleaning of the nozzle 3 and the nozzle arm 4, first, pure water is discharged from the first pure water nozzle 33 and the second pure water nozzle 34 to the nozzle arm 4 (Step S of FIG. 6) ). Specifically, the control device 7 opens the pure water valve 37 in a state where the nozzle 3 and the nozzle arm 4 are in the standby position, and discharges pure water from the first pure water nozzle 33 and the second pure water nozzle 34. 100134597 19 201237950 Most of the pure water discharged from the first pure water nozzle 33 is supplied to the upper surface 26 of the arm portion 22, and a part of the pure water discharged from the first pure water nozzle 33 is supplied to the arm portion 22. Right side surface 27 and left side surface 28. Since the upper surface 26 of the arm portion 22 is inclined with respect to the horizontal plane, the pure water supplied to the upper surface 26 of the arm portion 22 moves downward along the longitudinal direction D1 toward the distal end portion 20, and flows downward along the upper surface 26 (refer to Figure 7). Then, the pure water reaching the right end 46 of the upper portion 41 is scattered laterally from the right end 46 of the upper portion 41 or downward along the right side surface 27. Further, the pure water supplied to the right side surface 27 and the left side surface 28 moves downward along the longitudinal direction D1 toward the distal end portion 20, and flows downward along the right side surface 27 or the left side surface 28. Then, as shown in Fig. 7, the pure water reaching the lower end of the right side surface 27 (the right end 49 of the lower portion 44) and the lower end of the left side surface 28 (the left end 48 of the lower portion 44) is dropped from the right side 27 or the left side 28, or down The surface 29 flows downward. On the other hand, most of the pure water discharged from the second pure water nozzle 34 is supplied to the lower surface 29 of the arm portion 22, and a part of the pure water discharged from the second pure water nozzle 34 is supplied to the arm portion 22. Right side surface 27 and left side surface 28. As described above, the pure water supplied to the right side surface 27 and the left side surface 28 falls from the right side surface 27 or the left side surface 28, or flows downward along the lower surface 29. On the other hand, since the lower surface 29 of the arm portion 22 is inclined with respect to the horizontal plane, the pure water supplied to the lower surface 29 of the arm portion 22 moves toward the distal end portion 20 in the longitudinal direction D1 and flows downward along the lower surface 29 ( Refer to Figure 7). That is, the pure water supplied to the lower surface 29 of the arm portion 22 flows from the nozzle lower surface 29 along a portion of the pure water of 100134597 20 201237950 50 in such a manner as to move toward the lower end 50. Then, the lower arm 4 is reached and falls. The pure water discharged from the first pure water nozzle 33 and the second pure water nozzle % is supplied to the upper surface 26, the right side surface 27, the left side surface 28, and the lower surface 29 of the arm portion 22. Thereby, foreign matter such as fine particles adhering to the arm portion 22 or the treatment liquid is washed away by pure water. In addition, the pure water supplied from the first pure water nozzle 33 and the second pure water nozzle 34 to the arm portion 22 flows toward the distal end portion 2A in the longitudinal direction D1. Then, the pure water reaching the vicinity of the front end portion 2 is moved from the arm portion to the front end portion 20, and flows downward along the front end portion 2A or the nozzle 3. By this, the foreign matter or the like adhering to the tip end portion 20 or the nozzle 3 is washed away by pure water. Then, the pure water dropped from the front end portion 20 or the nozzle 3 is caught by the casing u. Then, nitrogen gas is discharged from the first gas nozzle 35 and the second gas nozzle 36 to the nozzle 3 and the nozzle arm 4 (step S2 of Fig. 6 and gas supply step). Specifically, the control device 7 opens the gas valve 40 while the nozzle 3 and the nozzle arm 4 are in the standby position, and discharges nitrogen gas from the first gas nozzle 35 and the second gas nozzle 36. Most of the nitrogen gas discharged from the first gas nozzle 35 is blown on the lower surface 29 of the arm portion 22, and the one portion of the nitrogen gas ejected from the first gas nozzle 35 is applied to the right side surface 27 of the arm portion 22 and The left side surface 28 is blown (see Fig. 8). The nitrogen gas that blows the lower surface 29 of the arm portion 22 flows along the lower surface 29 toward the distal end portion 20 in the longitudinal direction D1. Further, the nitrogen gas on the right side surface 27 and the left side surface 28 of the blowing arm portion 22 flows along the right side surface 27 or the left side surface 28 toward the front end portion 100134597 21 201237950 20 in the longitudinal direction D1. Thereby, the pure water adhering to the lower surface 29, the right side surface 27, and the left side surface 28 of the arm portion κ is removed by blowing nitrogen gas. On the other hand, most of the nitrogen gas discharged from the second gas nozzle 36 is blown to the nozzle lower portion 23. Further, nitrogen gas which is discharged from the first gas nozzle 35 to the arm portion 22 and reaches the vicinity of the tip end portion 20 flows along the tip end portion 2 () or the nozzle 3. Therefore, the tip end portion 20 is blown with nitrogen gas discharged from the second gas nozzle, and the nozzle 3 is blown with nitrogen gas discharged from the second gas nozzle 35 and the second gas nozzle 36. Thereby, the pure water adhering to the tip end portion or the nozzle 3 is blown off and removed. By discharging nitrogen gas from the first gas nozzle 35, pure water is removed from the right side surface 27 and the left side surface 28 of the lower surface 29 of the arm portion 22. Although the nitrogen gas discharged from the first gas nozzle 35 is hardly supplied to the upper surface % of the arm portion 22, the pure water supplied to the upper surface 26 of the arm portion 22 flows down due to the inclination of the upper surface 26, thereby Surface 26 is removed. Therefore, pure water can be removed from the entire arm portion 22 by removing pure water from the lower surface 29, the right side surface 27, and the left side surface 28 of the arm portion 22. Further, since the nitrogen gas discharged from the second gas nozzle 35 is also supplied to the nozzle 3 and the tip end portion 20, the pure water adhering to the nozzle 3 and the nozzle arm 4 can be efficiently removed. Then, pure water is discharged from the center shaft nozzle 19 to the nozzle 3 and the front end portion 20 of the nozzle arm 4 (step S3 in Fig. 6 and second pure water supply step). Specifically, the control device 7 controls the nozzle in a state where the shutter 5 is placed at the standby position.

100134597 22 S 201237950 Rotating mechanism 10 moves nozzle 3 and nozzle arm 4 to the processing position (see Fig. 1). That is, the control device 7 moves the nozzle 3 below the center shaft nozzle 19. After the j, the control device 7 opens the pure water valve 18 in a state where the nozzle 3 is positioned below the center shaft nozzle 19, and discharges pure water from the center shaft nozzle 19 to the nozzle 3. Most of the pure water discharged from the center shaft nozzle is supplied to the nozzle 3 and the front end portion 2 of the nozzle arm 4. In other words, pure water is supplied from the first pure water nozzle 33 and the second pure water nozzle 34 to the nozzle 3 and the tip end portion 2, and pure water is supplied from the center shaft nozzle 19. Thereby, pure water can be sufficiently supplied to the nozzle 3 and the tip end portion 20. In particular, pure water can be reliably supplied to the range of the pure water from the second pure water nozzle % and the second pure water nozzle 34 (the concave portion of the nozzle 3 or the curved portion of the nozzle arm 4). Thereby, the foreign matter or the treatment liquid attached to the nozzle 3 and the tip end portion 20 can be surely removed. Next, the step of discharging the nitrogen fine 6 from the first gas nozzle 35 and the second gas nozzle % to the nozzle 3 and the nozzle arm 4, and the second gas supply, specifically, the control device 7 places the blocking plate 5 at the standby position. Under the condition, the nozzle rotating mechanism 1G' is controlled to move the nozzle 3 and the arm 4 to the machine position. Then, the control unit 7 opens the gas valve 4G to cause the nitrogen gas to be ejected from the first and second gas nozzles 36 by causing the nozzle, and the rear arm 4 of the long-term rear arm 4 to be in the standby position. As described above, (4) the pure water on the smart core 20 and the arm portion 22 is removed by the nitrogen gas spouted from the gas nozzles 35 and the gas nozzles 36 of the jth chamber, and the second is borrowed. In this way, the nozzle 2 and the nozzle arm 4 are dried, and the nozzle 3 and the nozzle arm are finished. The first nozzle 赀 0^3 and 100134597 23 201237950 As described above, in the first embodiment, the nozzle arm 4 of the holding nozzle 3 is along The horizontal plane extends in the longitudinal direction D1. The orthogonal cross section C1 of the arm portion 22 includes an upper side inclined portion 47 from the top (left end 45) continuously descending to the right side portion 42. Since the upper inclined portion 47 is continuously lowered, even if the treatment liquid adheres to the upper inclined portion 47, the treatment liquid flows downward along the upper inclined portion 47. Then, this treatment liquid is dropped from the nozzle arm 4 and removed. That is, even if the treatment liquid adheres to the nozzle arm 4, the treatment liquid can be removed from the nozzle arm 4 in a short time. Therefore, the residual amount of the treatment liquid to the nozzle arm 4 can be reduced. Further, in the first embodiment, the orthogonal cross section C1 includes the right inclined portion 52 which is continuously lowered from the right side portion 42 to the bottom portion (lower end 44), and the left inclined portion 51 which is continuously lowered from the left side portion 43 to the bottom portion. Since the right inclined portion 52 and the left inclined portion 51 are continuously lowered to the bottom, even if the treatment liquid adheres to the right inclined portion 52 and the left inclined portion 51', the treatment liquid will follow the right inclined portion 52 and the left inclined portion 51. Flowing downwards 'The treatment liquid is then removed from the spray when the arm 4 is dropped. Therefore, the residual amount of the treatment liquid to the nozzle arm 4 can be reduced. Further, in the first embodiment, the one end of the orthogonal cross section C1 includes a top portion (left end 45), and the right side portion 42 includes the other side end of the orthogonal cross section C1. The upper side inclined portion 47 extends from the top to the right side portion 42A. Therefore, the upper inclined portion 47 extends from the side end to the other side end. That is, the upper portion 41 of the orthogonal cross-section C1 extends from the - side end to the other side end, and decreases toward the other side end. Therefore, it is attached to the upper section 41 of the orthogonal section C1.

24 S 201237950 The treatment liquid flows down to the side of the common side (the other side). Thereby, the droplets attached to the upper portion 41 of the regular six-section α are combined with each other, and the weight can be lowered by the parent. Therefore, in the first embodiment, the nitrogen gas discharged from the first gas nozzle 35 is blown to the lower portion of the nozzle arm 4 in the first embodiment. As described above, the treatment liquid attached to the nozzle arm 4 flows downward along the nozzle arm 4. That is, the processing liquid adhering to the nozzle arm * is concentrated on the lower portion of the nozzle arm 4. Nitrogen gas was blown at a position where the treatment liquid was concentrated. Thereby, the treatment liquid adhering to the nozzle arm 4 can be blown off and removed at a high rate. Therefore, it can reduce the amount of the treatment liquid for the nozzle arm. In the first embodiment, the nitrogen gas discharged from the first gas nozzle 35 flows along the nozzle arm 4 in the longitudinal direction m. Therefore, the range in which the gas is blown from the nozzle 35 to the mouth arm 4 will be expanded. In this way, we remove Wei from a wider range. Therefore, the residual of the treatment liquid to the nozzle arm 4 can be reduced. Further, in the first embodiment, the nitrogen gas discharged from the second gas nozzle 35 is blown from the lower side of the nozzle arm 4 from the side. The upper inclined portion 47 is lowered toward the side from which the nitrogen gas from the first gas nozzle 35 is blown. Therefore, the treatment liquid adhering to the upper inclined portion 47 flows down to the side from which the nitrogen gas from the first gas nozzle 35 is blown. In other words, the spout from the i-th gas nozzle 35 is blown at a position where the processing liquid adhering to the upper inclined portion 47 is concentrated. Therefore, it is possible to efficiently remove the treatment liquid adhering to the upper inclined portion 47. 100134597 25 201237950 In the first embodiment, the nozzle arm 4 is hydrophobic. Therefore, compared with the case where the nozzle arm 4 is hydrophilic, the treatment liquid adhering to the nozzle arm 4 can be removed in a short time and with a small force (4) of the mouth arm 4. Moreover, the amount of the treatment liquid from the nozzle arm 4 can be emitted by the treatment liquid. Therefore, the residual amount of the treatment liquid to the nozzle arm 4 can be further reduced. Further, in the first Behsch configuration, water discharged from the first pure water nozzle 33 is supplied to the upper surface % of the nozzle arm 4. Thereby, foreign matter such as particles adhering to the upper surface 26 of the nozzle #4 or the treatment liquid can be washed away. Therefore, the tub can suppress or prevent the foreign matter or the treatment liquid adhering to the upper surface 26 of the nozzle arm 4 from falling on the substrate W, causing the substrate w to be contaminated. Further, as described above, the pure water supplied to the nozzles 4 is removed from the spray 4 in a short period of time along the (four) nozzle arm 4, so that it is possible to suppress or prevent the supply of pure water to the nozzle arm 4 after completion of the pure water. The nozzle arm 4 is dropped on the substrate w. Further, in the first embodiment, the nitrogen gas discharged from the second gas nozzle 36 is aligned with the lower nozzle portion 23 below the nozzle arm 4. Since the nozzle lower portion 23 is disposed below the nozzle arm 4, the treatment liquid adhering to the outer surface of the nozzle 3 or the treatment liquid moving to the nozzle 3 along the nozzle arm 4 is lowered to the nozzle. Therefore, the nitrogen gas discharged from the second gas nozzle % is blown at the position of the towel of the treatment liquid. Therefore, it can efficiently remove the treatment liquid. Further, in the first embodiment, the gas-jet injection $_4 discharged from the i-th gas nozzle % flows from the proximal end portion 21 toward the distal end portion 2 () direction D2 (see 100134597 26 201237950, see Fig. 3). Similarly, the nitrogen gas discharged from the second gas nozzle % flows along the nozzle lower portion 23 from the base end portion 21 toward the tip end portion 20 in the direction D2. That is, the nitrogen gas discharged from each of the gas nozzles 35 and 36 flows in the same direction. Therefore, it is possible to suppress or prevent the nitrogen gas discharged from the first gas nozzle 35 from colliding with the nitrogen gas discharged from the second gas nozzle 36, and the momentum of the nitrogen gas discharged from the disordered nozzles 35 and 36 is weakened. Thereby, the treatment liquid adhering to the nozzle 3 and the nozzle arm 4 can be surely removed. Further, in the first embodiment, the driving force of the nozzle rotating mechanism 10 is transmitted to the nozzle arm 4' to move the nozzle arm 4 between the processing position and the standby position. The nitrogen gas discharged from the first gas nozzle 35 is blown to the lower portion of the nozzle arm 4 at the standby position. Therefore, the first gas nozzle 35 can be disposed at the standby position of the nozzle arm 4. That is, the i-th gas nozzle % may not be configured to move together with the nozzle arm 4. Therefore, the enlargement of the movable portion including the nozzle arm 4 can be suppressed or prevented. Further, in the first embodiment, the portion located above the substrate W held by the spin chuck 2 at the processing position, that is, the arm portion 22 has an orthogonal cross section C1. Therefore, even if the treatment liquid adheres to the arm portion 22, the treatment liquid can be removed in a short time. Therefore, even if the nozzle arm 4 is moved on the substrate W, the treatment liquid can be surely prevented or prevented from falling from the nozzle arm 4 on the substrate w. Thereby, contamination or deterioration of the quality of the substrate W can be suppressed or prevented. Although the description of the embodiments of the present invention has been made as described above, the present invention is not limited to the above-described first embodiment, and may be embodied in other forms as well as 100134597 27 201237950. For example, in the first embodiment described above, the case where the orthogonal cross section C1 is a pentagonal shape as shown in Fig. 5 has been described. However, the shape of the orthogonal section C1 may also be a shape in which the upper and lower sides of Fig. 5 are reversed. In other words, the upper portion of the orthogonal cross section C1 may be inverted V-shaped, and the lower portion of the orthogonal cross section C1 may be an oblique line extending from one end to the other end. Further, the orthogonal cross section C1 may be a polygon other than a pentagon. Specifically, for example, as shown in Fig. 9, the nozzle arm 204, the orthogonal cross section C201 of the nozzle arm 204 may have a triangular shape, and the orthogonal cross section C201 includes a top portion 245, a side portion 246, and an upper side inclined portion 247. Further, the orthogonal cross section C201 includes a bottom portion 250 and a lower side inclined portion 252. Further, as shown in Fig. 10, the nozzle arm 304 and the orthogonal cross section C301 of the nozzle arm 304 may have a quadrangular shape. The orthogonal cross section C301 includes a top portion 345, a side portion 346, and an upper side inclined portion 347. Further, the orthogonal cross section C301 includes a bottom portion 350 and a lower side inclined portion 352. Further, in the first embodiment, the case where the orthogonal cross section C1 is divided by a plurality of straight lines has been described. However, the orthogonal cross section C1 may include a straight line and a curved line, and may be divided by a curved line. Specifically, for example, in the nozzle arm 404 shown in Fig. 11, the orthogonal cross section C401 of the nozzle arm 404 can be divided by a curve which is convex toward the lower side and a straight line which is inclined with respect to the horizontal plane. The orthogonal cross section C401 includes a top portion 445, a side portion 446, and an upper side inclined portion 447. Further, the orthogonal section C401 includes 100134597 28 201237950 having a bottom portion 450 and a lower side inclined portion 452. Further, in the above-described first embodiment, the arm portion 22 has a fixed cross section (orthogonal cross section ci) from one end portion of the arm portion 22 to the other end portion of the arm portion 22. However, the profile of the arm portion 22 can also vary. Specifically, the cross section of the arm portion 22 at any two positions may be similar (same shape), and the sectional area (size) of the arm portion 22 may be continuously changed. In this case, the sectional area of the arm portion 22 may be smaller as it is closer to one end portion of the arm portion 22 (the end portion on the front side portion 20 side). Further, the cross-sectional shape of the arm portion 22 (the shape of the orthogonal cross-section ci) may be continuously changed as approaching one end portion of the arm portion 22. In this case, the sectional area of the arm portion 22 may be fixed or may be reduced as it approaches one end of the arm portion 22. In the first embodiment, the case where the pure water is supplied from the first pure water nozzle 33 and the second pure water nozzle 34 to the nozzle arm 4 has been described. However, pure water may be supplied to the nozzle arm 4 from nozzles other than the first pure water nozzle 33 and the second pure water nozzle 34. Specifically, a pure water nozzle 553 (see Fig. 1) for supplying pure water may be provided on the upper surface of the shutter 5. In this case, the control device 7 can also discharge the pure water from the pure water nozzle 553 to the upper surface of the shut-off plate 5 in the rotating state by controlling the shutter rotating mechanism 14 to rotate the blocking plate 5. The pure water discharged from the pure helium nozzle 553 is supplied to the upper surface of the shutter 5, and is collapsed toward the periphery of the shutter 5 by the centrifugal force generated by the rotation of the shutter 5, thereby the self-shield 5 Falling pure water will collide and divide the processing chamber 6 <brows away from the wall 100134597 29 201237950 (not shown) and bounce back. Then, the pure water that is bounced back is supplied to the nozzle arm 4. Thereby, the foreign matter or the treatment liquid adhering to the nozzle arm 4 can be washed away. Further, in the above-described first embodiment, it has been described that the holding nozzles 312 are provided in the ejector 4, and the nozzles 3 can be held at the ends of the material 22 without providing the tip end portion 2/. That is, the end portion of the material can also be the end portion of the holding nozzle 3. In the first embodiment, the gas ejected from the first gas nozzle 35 and the second gas nozzle 36 is nitrogen. However, the first emulsion nozzle 35 and the second gas nozzle 36 are discharged. The gas is not limited to nitrogen gas, and may be an inert gas other than nitrogen such as argon gas, or may be dry air or clean air. Further, in the above-described first embodiment, the fluid (pure water or nitrogen gas) is horizontally discharged from the first pure water nozzle 33 and the second gas nozzle 36, and the pure water nozzle 34 and the first gas nozzle 35 are obliquely upward. The situation of spit out fluid. However, the discharge direction of the fluid from the first pure water nozzle 33 and the second gas nozzle 36 may be an oblique upward direction or a downward oblique direction. Further, the discharge direction of the pure water from the second pure water nozzle 34 and the first gas nozzle 35 may be in the horizontal direction. In the first embodiment, the first pure water nozzle 33 and the second pure water nozzle 34 are supplied with pure water via the common pure water valve 37, and the first gas nozzle 35 is supplied to the first gas nozzle 35 via the common gas valve 40. And the case where the second gas nozzle 36 supplies nitrogen gas. However, pure water may be supplied to the first pure water nozzles 100134597 30 201237950 33 and the second pure water nozzle 34 via individual valves. Similarly, the first gas nozzle 35 and the second gas nozzle 36 may be supplied with nitrogen gas via an individual valve. Further, the present invention can be implemented in various design changes within the scope of the matters described in the claims. [Brief Description of the Drawings] Fig. 1 is a side view showing a schematic configuration of a substrate processing apparatus according to a first embodiment of the present invention. Fig. 2 is a plan view showing a schematic configuration of a substrate processing apparatus according to a first embodiment of the present invention. Fig. 3 is a side view showing a configuration of a nozzle arm according to a first embodiment of the present invention. Figure 4 is a cross-sectional view of the nozzle arm as seen from the direction of arrow IV shown in Figure 3. Figure 5 is an enlarged view of a portion of Figure 4. Fig. 6 is a flow chart for explaining an example of the operation of cleaning the nozzle and the nozzle arm. Fig. 7 is a cross-sectional view for explaining an example of pure water operation when pure water is supplied to the nozzle arm. Fig. 8 is a cross-sectional view for explaining an example of pure water operation when nitrogen is supplied to the nozzle arm. Fig. 9 is a cross-sectional view showing a nozzle arm according to a second embodiment of the present invention. Figure 10 is a cross-sectional view showing a nozzle arm according to a third embodiment of the present invention. 100134597 31 201237950 Fig. 11 is a cross-sectional view showing a nozzle arm according to a fourth embodiment of the present invention. [Description of main component symbols] 1 Substrate processing device 2 Rotating chuck (substrate holding means) 3 Nozzle 4 Nozzle arm 5 Interrupting plate 6 Processing chamber 7 Control device 8 Rotating base 9 Rotary motor 10 Nozzle rotating mechanism (moving means) 11 Box Body 12 Support shaft 13 Breaking plate lifting mechanism 14 Breaking plate rotating mechanism 15 Through hole 16 First pipe 17 Second pipe 18 Pure water valve 19 Center shaft nozzle 20 Front end

100134597 32 S 201237950 21 Base end 22 Arm (at least part of the nozzle arm) 23 Nozzle lower part 24 Screw 25 Base 26 Nozzle arm upper surface 27 Right side 28 Left side 29 Lower surface 30 Core material 31 Liquid supply pipe 32 Gas supply Tube 33 First pure water nozzle (pure water nozzle) 34 Second pure water nozzle 35 First gas nozzle 36 Second gas nozzle 37 Pure water valve 38 First stay 39 Second stay 40 Gas valve 41 Upper part 42 Right side (side, side) 100134597 33 201237950 43 44 45 46 47 48 49 50 51 52 204 245 246 247 250 252 304 345 346 347 350 352 Left side (one side) Lower left end (top) Right side upper side inclined part Left end right end lower end (bottom) Left side inclined part right side inclined part (lower side inclined part) Nozzle arm top side upper side inclined part bottom lower side inclined part Nozzle arm top side upper side inclined part bottom lower side inclined part

100134597 34 S 201237950 404 Nozzle arm 445 Top 446 Side 447 Upper side inclined part 450 Bottom part 452 Lower side inclined part 553 Pure water nozzle CL1 Axis LI Nozzle rotation axis Cl Orthogonal section C201 Orthogonal section C301 Orthogonal section C401 Orthogonal section D1 Length direction D2 from the base end toward the front end direction SI to S4 Step W Substrate IV Arrow 100134597 35

Claims (1)

201237950 VII. Patent Application Range 1. A substrate processing apparatus comprising: a nozzle that discharges a processing fluid that processes a substrate; and a nozzle arm that holds the nozzle and extends toward a length along a horizontal plane And the at least-part orthogonal* cross section of the nozzle arm orthogonal to the longitudinal direction includes a top portion located at an uppermost portion of the orthogonal cross section, a side portion further than the top portion 4, and The top portion is continuously lowered to the upper side inclined portion up to the side portion. 2. If you apply for a patent scope! In the substrate processing apparatus of the present invention, the orthogonal aj surface entrance includes a bottom portion located at a lowermost portion in the orthogonal cross section, and a lower side inclined portion continuously descending from the side portion to the bottom portion. 3. The substrate processing apparatus according to claim 1, wherein the positive parent cross section includes a pair of right and left side ends on the most lateral side of the orthogonal cross section, wherein one side end includes the top portion, and The side portion includes the other side end, and the upper side inclined portion continuously descends from the one side end to the other side end. 4. The substrate processing apparatus according to claim 1, further comprising a second gas nozzle that discharges gas to a lower portion of the nozzle arm. 5. The substrate processing apparatus according to claim 4, wherein the first gas nozzle is configured such that a gas discharged from the second gas nozzle flows along a length of the nozzle arm along the nozzle arm of the 100134597 36 S 201237950 The way it is structured. 6. The substrate processing apparatus according to claim 4, wherein the first gas nozzle is configured to discharge gas from a side of the nozzle arm toward a lower portion of the nozzle arm, and the upper inclined portion is oriented The side from which the gas from the first gas nozzle is blown is lowered. 7. The substrate processing apparatus of claim 1, wherein the nozzle arm is formed of a hydrophobic material. 8. The substrate processing apparatus according to claim 1, further comprising a pure water nozzle for discharging pure water to the upper surface of the nozzle arm. 9. The substrate processing apparatus according to claim 1, wherein the nozzle includes a lower portion of the nozzle disposed below the nozzle arm, and the substrate processing apparatus further includes a second gas that discharges gas to the lower portion of the nozzle nozzle. 10. The substrate processing apparatus according to claim 9, wherein the nozzle arm includes a rod-shaped member that holds an end portion of the nozzle and a base end portion, and the first gas nozzle is from the first gas nozzle The gas to be discharged flows toward the front end portion from the base end portion, and the second gas nozzle is directed toward the base end portion by the gas 100134597 37 201237950 discharged from the second gas nozzle. The direction in which the front end portion flows is formed. The substrate processing apparatus according to any one of the items 1 to 1G, further comprising: a &amp; plate holding means 'which holds the wire; and a moving means' which causes the nozzle arm to be located at the nozzle a processing position above the substrate held by the substrate holding hand &amp; and a movement position between the nozzle held from the substrate and being retracted above the substrate held by the segment; and the first gas nozzle is located at the standby position The nozzle arm is configured to discharge gas under the nozzle arm. 12. The substrate processing apparatus of claim 5, wherein at least a portion of the spray t# includes a portion above the substrate held by the soil holding means at the processing position. 100134597 38 S