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TW201237059A - Curable epoxy resin composition - Google Patents

Curable epoxy resin composition Download PDF

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Publication number
TW201237059A
TW201237059A TW101100543A TW101100543A TW201237059A TW 201237059 A TW201237059 A TW 201237059A TW 101100543 A TW101100543 A TW 101100543A TW 101100543 A TW101100543 A TW 101100543A TW 201237059 A TW201237059 A TW 201237059A
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Taiwan
Prior art keywords
resin composition
epoxy resin
compound
group
epoxy
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TW101100543A
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Chinese (zh)
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TWI535748B (en
Inventor
Hirose Suzuki
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Daicel Corp
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/22Di-epoxy compounds
    • C08G59/226Mixtures of di-epoxy compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/22Di-epoxy compounds
    • C08G59/26Di-epoxy compounds heterocyclic
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/32Epoxy compounds containing three or more epoxy groups
    • C08G59/3254Epoxy compounds containing three or more epoxy groups containing atoms other than carbon, hydrogen, oxygen or nitrogen
    • C08G59/3281Epoxy compounds containing three or more epoxy groups containing atoms other than carbon, hydrogen, oxygen or nitrogen containing silicon
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/32Epoxy compounds containing three or more epoxy groups
    • C08G59/38Epoxy compounds containing three or more epoxy groups together with di-epoxy compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293Organic, e.g. plastic
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/85Packages
    • H10H20/852Encapsulations
    • H10H20/854Encapsulations characterised by their material, e.g. epoxy or silicone resins
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Epoxy Resins (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Led Device Packages (AREA)

Abstract

The present invention provides a curable epoxy resin composition. The curable epoxy resin composition can provide cured products which have high transparency, heat resistance, light resistance and crack resistance. The curable epoxy resin composition is characterized by containing alicyclic epoxy compounds (A), monoallyl diglycidyl isocyanurate compounds (B) represented by following formula (1), siloxane derivatives having more than 2 epoxy groups in a molecule (C), curing agents (D) and curing accelerators (E).[In the formula, R1 and R2 represent a hydrogen atom or an alkyl group having 1 to 8 carbon atoms.]

Description

201237059 六、發明說明: 【發明所屬之技術領域】 本發明係關於硬化性環氧樹脂組成物、將該硬化性 環氧樹脂組成物硬化而成之硬化物、包含該硬化性環氧 樹脂組成物而構成之光半導體密封用樹脂組成物、及使 用該硬化性環氧樹脂組成物將光半導體元件密封而成之 光半導體裝置。 【先前技術】 近年來,光半導體裝置之高輸出化已有進展,於光 半導體裝置使用之樹脂要求高度的耐熱性及耐光性。例 如:於藍色、白色光半導體用之密封材(密封樹脂),由 光半導體元件發出之光及熱導致之密封樹脂的黃變成為 問題。黃變的密封樹脂,由於會吸收來自於光半導體元 件所發的光,故會使從光半導體裝置輸出之光的光度隨 時間降低。 至今為止,高耐熱性之密封樹脂,已知有含有異= 聚氰酸單烯丙基二環氧丙酯與雙酚A型環氧樹脂之組成 物之硬化物(參照專利文獻丨)^但是若將上述硬化物作為 高輪出的藍色、白色光半導體用之密封樹脂,會由於光 半導體元件發出的光及熱導致著色進行,使原本應輪出 的光被吸收,其結果會有從光半導體裝置輸出的光的先 度隨時間降低的問題。 [先前技術文獻] [專利文獻] [專利文獻1]日本特開2000-344867號公報 201237059 【發明内容】 [發明欲解決之課題] 就:有:度财熱性及耐光性且不易黃變之密封樹脂 而吕,已知有3,4-環氧環己基曱基(3 4 w 4娘氣)環己烷羧酸 酉曰、V氧環己基曱基(3,4-環氧)環己境敌酸醋與卜己 内醋,加成物、二環氧檸檬稀等具脂環骨架之液 狀脂環環氧樹脂。但是,該等脂環 ^^ ^ 衣軋树脂的硬化物不 对各種應力,當施加冷熱循環(反覆加熱與冷卻)此類的 熱衝擊時,或經歷回流步驟此類的高溫步驟時,會有產 生龜裂(裂隙)等問題。由於產生如此之龜裂,也會發生 從光半導體裳置輸出之光之光度隨時間降低等問題。 所以,現狀為需要光半導體裝置(尤其是具備高輸出 、南輝度之光半導體元件的光半導體裝置)輸出之光隨時 間的光度降低受抑制之兼具高度耐熱性、耐光性及耐龜 裂性之透明的密封樹脂。 '因此本發明之目的在於提供一種硬化性環氧樹脂組 成物’其能賦予兼具高透明性、耐熱性、耐光性、及耐 龜裂性之硬化物。 又,本發明之另一目的在於提供一種兼具高透明性 耐熱1±、耐光性、及財龜裂性之硬化物,其係將上述 硬化性環氧樹脂組成物硬化而成。 班又,本發明之另一目的在於提供一種包含上述硬化 衣氧Μ月曰組成物而構成的光半導體密封用樹脂組成物 ,其能獲得隨時間的光度降低受抑制之光半導體裝置。 又,本發明之另一目的在於提供一種光半導體裝置 201237059 ”係使用上述光半導體密封用樹脂組成物將光半導體 兀件密封而獲得,係以兼具高耐熱性、耐光性、透明性 、及耐龜裂性之硬化物密封光半導體元件,且隨時間之 光度降低受抑制。 [解決課題之手段] 案發明人為了解決上述課題’努力探討結果發 現.含有脂環環氧化合物、異三聚氰酸單烯丙基二環氧 丙00化合物、及分子内具有2個以上之環氧基之矽氧烷衍 生物,且更含有硬化劑及硬化促進劑、或硬化觸媒之硬 化性環氧樹脂組成物,可提供兼具優異耐熱性、耐光性 、透明性、耐龜裂性之硬化物,以該硬化物將光半導體 兀件予以密封而得之光半導體裝置,光度不易隨時間降 低’乃完成本發明。 ,亦P本發明&供一種硬化性環氧樹脂組成物,其 特徵為.包含脂環環氧化合物(A)、與以下式(1)表示之 異三聚氰酸單烯丙基二環氧丙酯化合物(B)、與分子内具 有2個以上之環氧基之矽氧烧衍生物(C)、與硬化劑(D)、 與硬化促進劑(E);201237059 VI. [Technical Field] The present invention relates to a curable epoxy resin composition, a cured product obtained by hardening the curable epoxy resin composition, and a curable epoxy resin composition. Further, the resin composition for sealing the optical semiconductor and the optical semiconductor device in which the optical semiconductor element is sealed using the curable epoxy resin composition. [Prior Art] In recent years, high output of optical semiconductor devices has progressed, and resins used in optical semiconductor devices require high heat resistance and light resistance. For example, in the sealing material (sealing resin) for blue and white light semiconductors, the light emitted from the optical semiconductor element and the yellow of the sealing resin caused by heat become a problem. The yellowing sealing resin lowers the luminosity of light output from the optical semiconductor device with time as it absorbs light emitted from the optical semiconductor device. Hereto, a highly heat-resistant sealing resin is known to contain a cured product of a composition of a poly(octylic acid monoallyl diglycidyl ester) and a bisphenol A type epoxy resin (see Patent Document). When the cured product is used as a sealing resin for a blue or white photo-semiconductor which is rotated in a high direction, coloring is caused by light and heat emitted from the optical semiconductor element, and light which should originally be taken out is absorbed, and as a result, there is a light. The problem that the light output by the semiconductor device decreases with time. [PRIOR ART DOCUMENT] [Patent Document 1] JP-A-2000-344867, JP-A No. 200037059 [Summary of the Invention] [Problems to be Solved by the Invention] There are: a seal that is rich in heat and light resistance and is not easily yellowed. Resin and Lu, known as 3,4-epoxycyclohexylfluorenyl (3 4 w 4 Niang) cyclohexane carboxylate, V-oxycyclohexyldecyl (3,4-epoxy) cyclohexane A liquid alicyclic epoxy resin having an alicyclic skeleton such as an acidified vinegar and a vinegar, an adduct, a di-epoxy lemon and the like. However, the hardened material of the alicyclic resin does not have various stresses, and when a thermal shock such as a thermal cycle (reverse heating and cooling) is applied, or a high temperature step such as a reflow step is performed, Cracks (cracks) and other issues. Due to such a crack, the luminosity of the light output from the photo-semiconductor is lowered with time. Therefore, the current state of the art requires an optical semiconductor device (especially an optical semiconductor device having a high-output, south-bright optical semiconductor device) to emit light with a reduced luminosity over time, which is highly resistant to heat, light, and cracking. Transparent sealing resin. Therefore, an object of the present invention is to provide a cured epoxy resin composition which can impart a cured product having high transparency, heat resistance, light resistance, and crack resistance. Further, another object of the present invention is to provide a cured product having high transparency, heat resistance, light resistance, and cracking property, which is obtained by curing the above-mentioned curable epoxy resin composition. Further, another object of the present invention is to provide an optical semiconductor sealing resin composition comprising the above-described hardened cerium oxide composition, which is capable of obtaining an optical semiconductor device in which luminosity reduction with time is suppressed. Further, another object of the present invention is to provide an optical semiconductor device 201237059" which is obtained by sealing a photo-semiconductor article using the resin composition for optical semiconductor sealing described above, and has high heat resistance, light resistance, transparency, and The crack-resistant hardened material seals the optical semiconductor element, and the luminosity reduction with time is suppressed. [Means for Solving the Problem] In order to solve the above problem, the inventors found that the results include an alicyclic epoxy compound and heterotrimerization. a cyanuric acid monoallyl diglycidyl 00 compound, and a decyl alkane derivative having two or more epoxy groups in the molecule, and further containing a curing agent, a hardening accelerator, or a hardening epoxy of a curing catalyst The resin composition can provide a cured product having excellent heat resistance, light resistance, transparency, and crack resistance, and an optical semiconductor device obtained by sealing the optical semiconductor element with the cured product, the luminosity is not easily lowered with time. The present invention has been completed. Also, the present invention provides a curable epoxy resin composition characterized by comprising an alicyclic epoxy compound (A) and the following formula (1). The isomeric glyceryl monoallyl diglycidyl ester compound (B), the oxirane derivative (C) having two or more epoxy groups in the molecule, and the hardener (D), and hardening Promoter (E);

[式中’R1及R2表示氫原子或碳數1〜8之烷基]。 又’本發明提供一種硬化性環氧樹脂組成物,其包 201237059[wherein R1 and R2 represent a hydrogen atom or an alkyl group having 1 to 8 carbon atoms]. Further, the present invention provides a curable epoxy resin composition, which is packaged in 201237059

含:脂環環氧化合物(A)、與以下式(丨)表示之異三聚氰 酸單烯丙基二環氧丙酯化合物(B)、與分子内具有2個以 上之環氧基之矽氧烷衍生物(C)、與硬化觸媒(F); [式中’R及R2表示氫原子或碳數1〜8之统基]。 再者’提供如前述硬化性環氧樹脂組成物,其中, 前述分子内具有2個以上之環氧基之矽氧烷衍生物(c)之 含量,相對於成分(A)、成分(B)、及成分(c)之合計量(1〇〇 重量°/〇)為5〜60重量。 再者’提供如前述硬化性環氧樹脂組成物,其中, 前述脂環環氧化合物(A)之脂環環氧基為環氧己烯基。 再者,提供如前述硬化性環氧樹脂組成物,其中, 前述脂環環氧化合物(A)以下式(1-1)表示: Ο 〆0 ( I — 1) ο 又’本發明提供將前述硬化性環氧樹脂組成物硬化 而成的硬化物。 又’本發明提供包含前述硬化性環氧樹脂組成物而 構成之光半導體密封用樹脂組成物。 201237059 又,本發明提供以前述光半導體密封用樹脂組成物 將光半導體元件予以密封而得之光半導體裝置。 [發明之效果] 本發月之硬化性環氧樹脂組成物由於具有上述構成 ,故籍由使該樹脂組成物硬化可獲得兼具高透明性、耐 熱性 < 光性、及耐龜裂性之硬化物。又,使用本發明 之硬化性帛氧樹脂組成物(光半導體密封用樹脂組成物) 將光半導體元件予以密封而得之光半導體裝置,光度不 易隨時間降低,能發揮優異的品質及耐久性。尤其,本 發月之硬化性環氧樹脂組成物,即使當作具備高輸出、 高輝度之光半導體元件之光半導體裝置之密封用樹脂使 用時,仍能抑制該光半導體裝置的光度隨時間降低。 【實施方式】 [實施發明之形態] <硬化性環氧樹脂組成物> 本發月之硬化性環氧樹脂組成物至少包含脂環環 氧=合物(A)、與以下式(1)表示之異三聚氰酸單烯丙基 一環氧丙Sa化合物(B) '與分子内具有2個以上之環氧基The alicyclic epoxy compound (A), the isoallyl cyanuric acid monoallyl diglycidyl ester compound (B) represented by the following formula (丨), and the epoxy group having two or more molecules in the molecule a decane derivative (C) and a hardening catalyst (F); wherein R' and R2 represent a hydrogen atom or a carbon number of 1 to 8. Furthermore, the content of the curable epoxy resin composition as described above, wherein the content of the oxoxane derivative (c) having two or more epoxy groups in the molecule is relative to the component (A) and the component (B) And the total amount of component (c) (1 〇〇 weight ° / 〇) is 5 to 60 weight. Furthermore, the above-mentioned curable epoxy resin composition is provided, wherein the alicyclic epoxy group of the alicyclic epoxy compound (A) is hexylene oxide. Furthermore, the above-mentioned curable epoxy resin composition is provided, wherein the above-mentioned alicyclic epoxy compound (A) is represented by the following formula (1-1): Ο 〆0 (I-1) ο A cured product obtained by hardening a curable epoxy resin composition. Further, the present invention provides a resin composition for optical semiconductor sealing comprising the above-mentioned curable epoxy resin composition. In addition, the present invention provides an optical semiconductor device in which an optical semiconductor element is sealed by the resin composition for optical semiconductor sealing. [Effects of the Invention] Since the curable epoxy resin composition of the present month has the above-described configuration, it is possible to obtain high transparency, heat resistance, light resistance, and crack resistance by curing the resin composition. Hardened matter. In addition, the optical semiconductor device obtained by sealing the optical semiconductor element using the curable epoxy resin composition of the present invention (resin composition for optical semiconductor sealing) has a low illuminance and can exhibit excellent quality and durability. In particular, when the curable epoxy resin composition of the present invention is used as a sealing resin for an optical semiconductor device having a high-output, high-luminance optical semiconductor device, the luminosity of the optical semiconductor device can be suppressed from decreasing with time. . [Embodiment] [Form of the invention] < Curable epoxy resin composition> The curable epoxy resin composition of the present month contains at least an alicyclic epoxy compound (A) and the following formula (1) ) is a monocyl monopropyl monoepoxypropane Sa compound (B) ' and has more than 2 epoxy groups in the molecule

1) 201237059 又,本發明之硬化性環氧樹脂組成物,至少包含· 脂環環氧化合物⑷、與以上式⑴表示之異三聚氰:單 烯丙基二環氧丙酯化合物(B)、與分子内具有2個以上2 環氧基之矽氧烷衍生物(c)、與硬化觸媒 〈脂環環氧化合物(A)&gt; 構成本發明之硬化性環氧樹脂組成物之脂 合物(…為分子内(1分子内)至少具有脂環 氧二 結構與環氧基之化合物。更且體 、衣) 物(A),包含⑴且有以構成/環’於脂環環氧化合 原子構成之環氧基之化合物、及 絲氧 結於脂環之化合物。 ^:氣基直接以早鍵鍵 述分子内I、 物(A)’不包含後 、 以上之環氧基之矽氧烷衍生物(〇。 成之環广構成脂環之相鄰的2個碳原子與氧原子構 氧基(脂環環氧基)之化合物, 慣用者。上诚s 』任思選用公知或 述知裱碳氧基,以環氧己烯基為較佳。 成之St八成脂環之相鄰的2個碳原子與氧原子構 想為下心物’從透明性、财熱性之觀點,尤理 &quot;)表不之脂環環氧化合物(脂環環氧樹脂)。1) 201237059 Further, the curable epoxy resin composition of the present invention contains at least the alicyclic epoxy compound (4) and the isomeric cyanide:monoallyl diglycidyl ester compound represented by the above formula (1) (B) And a halogenated alkane derivative (c) having two or more epoxy groups in the molecule, and a curing catalyst <alicyclic epoxy compound (A)> a fat constituting the curable epoxy resin composition of the present invention a compound (... is a compound having at least a lipid epoxide structure and an epoxy group in a molecule (in a molecule), and a substance (A), which comprises (1) and has a structure/ring 'in an alicyclic ring. A compound which oxidizes an epoxy group and an epoxy group which is bonded to an alicyclic ring. ^: The gas group directly uses the early bond to describe the intramolecular I, the substance (A)' does not contain the above or above epoxy group of the oxane derivative (〇. The ring of the ring constitutes the adjacent two of the alicyclic ring A compound having a carbon atom and an oxygen atom constituting an oxy group (alicyclic epoxy group), which is conventionally used. It is preferred to use a known or known ruthenium oxy group, and a cyclohexene group is preferred. The two carbon atoms and oxygen atoms adjacent to the alicyclic ring are conceived as an alicyclic epoxy compound (alicyclic epoxy resin) which is a lower core material from the viewpoint of transparency and finernity.

(I) 的2‘基)。上述遠:單鍵或連結基(具有1個以上之原子 、酯鍵、碳酸酽其 基斂基、醚鍵 基團等。曰土、醯胺基、及將該等連結多個而成的 201237059 式(i)中之x為單鍵之脂環環氧化合物,例如下式表 示之化合物。如此的脂環環氧化合物例如也可使用 CELL〇XlDE8000(Daicel(股)製)等市售品。(I) 2 'base). The above-mentioned far: a single bond or a linking group (having one or more atoms, an ester bond, a cesium carbonate group, an ether group, an ether bond group, etc., alumina, amidino group, and a plurality of these are connected to each other 201237059 The alicyclic epoxy compound in which x is a single bond in the formula (i), for example, a compound represented by the following formula. For such an alicyclic epoxy compound, for example, a commercially available product such as CELL® XlDE 8000 (manufactured by Daicel Co., Ltd.) can also be used.

上述2價之烴基,例如碳數丨〜18之直鏈狀或支鏈狀之 伸烷基、2價之脂環烴基等。碳數丨〜18之直鏈狀或支鏈狀 之伸烷基’例如:亞曱基、曱基亞甲基、二甲基亞甲基 、伸乙基、伸丙基、三亞甲基等。2價之脂環烴基’例如 :1,2-環伸戊基、1,3-環伸戊基、環亞戊基、1,2-環伸己 基、1,3-環伸己基' ι,4-環伸己基、環亞己基等2價之環 伸烷基(含環亞烷基)等。 上述連結基X’較佳為含氧原子之連結基,具體而言 例如。CO- ' -O-CO-0-、-COO-、-〇-、-CONH-;該等基連 接多個而得之基;該等基之1或2個以上與2價之烴基之1 或2個以上連結而得之基等。2價之烴基,例如上述例示 者。 上式(I)表示之脂環環氧化合物之代表例,例如下式 (1-1)〜(1-8)表示之化合物等。例如可使用CELLOXIDE 2021P、CELLOXIDE20 81(Daicel(股)製)等市售品。又, 下式(1-1)〜(1-8)中’卜m表示1〜30之整數。R表示碳數1〜8 之伸烷基,例如亞曱基、伸乙基、伸丙基、伸異丙基、 伸丁基、伸異丁基、伸第二丁基、伸戊基、伸己基、伸 庚基、伸辛基等直鏈狀或支鏈狀伸烷基。該等之中,亞 201237059 甲基、伸乙基、伸丙基、異伸丙基等碳數1〜3之直鏈狀或 支鏈狀伸烷基較佳。The above-mentioned divalent hydrocarbon group is, for example, a linear or branched alkyl group having a carbon number of 丨 18 or a divalent alicyclic hydrocarbon group. The linear or branched alkyl group having a carbon number of 丨 18 is, for example, an anthranylene group, a mercaptomethylene group, a dimethylmethylene group, an exoethyl group, a propyl group, a trimethylene group or the like. A divalent alicyclic hydrocarbon group 'for example: 1,2-cyclo-amyl, 1,3-cyclopentyl, cyclopentylene, 1,2-cyclohexyl, 1,3-cyclohexyl' ι, A bivalent cycloalkyl group (including a cycloalkylene group) such as a 4-cyclohexyl group or a cyclohexylene group. The above-mentioned linking group X' is preferably a linking group containing an oxygen atom, specifically, for example. CO- '-O-CO-0-, -COO-, -〇-, -CONH-; these groups are bonded to a plurality of groups; one or more of these groups and one of the divalent hydrocarbon groups Or a base obtained by linking two or more. A divalent hydrocarbon group such as the above exemplified. Representative examples of the alicyclic epoxy compound represented by the above formula (I) are, for example, compounds represented by the following formulas (1-1) to (1-8). For example, commercially available products such as CELLOXIDE 2021P and CELLOXIDE 20 81 (manufactured by Daicel Co., Ltd.) can be used. Further, in the following formulae (1-1) to (1-8), "b" represents an integer of 1 to 30. R represents an alkylene group having 1 to 8 carbon atoms, such as an anthracenylene group, an ethylidene group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a second butyl group, a pentyl group, and a stretching group. A linear or branched alkyl group such as a hexyl group, a heptyl group or a octyl group. Among these, a linear or branched alkyl group having 1 to 3 carbon atoms such as a methyl group, an ethyl group, a propyl group or an exo-propyl group is preferred.

00

0 (1—6)0 (1-6)

(ii)環氧基直接以單鍵鍵結於脂環的化合物,例如下 式(II)表示之化合物。(ii) a compound in which an epoxy group is directly bonded to an alicyclic ring by a single bond, for example, a compound represented by the following formula (II).

-〇-〇

R'-R'-

(Π) 式(II)中,R’為p元之醇去除p個-OH後之基,ρ、η代 201237059 表自然數。p元之醇[R,_(0H)p],例如2,2_雙(羥基甲基卜卜 T酵等多元醇等(碳數卜15之醇等)β p宜為卜6,11為1〜30 較佳。P為2以上時,各()内(圓括弧内)之基的n可為相 同也可為不同。上述化合物’具體而t,例如2,2-雙(羥 基曱基)-1-丁醇之1)2_環氧_4·(2·環氧乙烷基)環己烷加 成物、EHPE 3l5〇(Daicel(股)製)等。 該等脂環環氧化合物(A)可以單獨使用,或組合2種 以上使用。脂環環氧化合物(A),以上式(11)表示之3,4_ 環氧環己基甲基(3,4_環氧)環己烷羧酸酯、cell〇xide 2 0 2 1P尤佳。 脂環環氧化合物(A)之使用量(含量)不特別限定相 對於脂環環氧化合物(A)與異三聚氰酸單烯丙基二環氧 丙知化合物(B)之總量(1 00重量%),為50〜90重量%較佳, 更佳為60 90重量。/。,又更佳為7〇〜9〇重量脂環環氧化 合物(Α)之使用量低於5〇重量%時,異三聚氰酸單烯丙基 二環氧丙酿化合物(Β)之溶解性不夠,若置於室溫,有時 會谷易析出另一方面,脂環環氧化合物(Α)之使用量若 超過9 0重量。/〇’當製作光半導體裝置時,有時會容易發 生龜裂。成分(Α)、成分(Β)、及成分(C)之總量(1〇〇重量 %)中,脂環環氧化合物(Α)與異三聚氰酸單烯丙基二環氧 丙化合物(Β)之含量總和(總量)不特別限定為 重量%較佳。 本么月之硬化性環氧樹脂組成物含有硬化劑(D)當 作必要成分時,脂環環氧化合物(A)相對於硬化性環氧樹 脂組成物全量(100重量%)之含量不特別限定,宜為1〇〜9〇 -12- 201237059 重里/。更佳為1 5〜80重量〇/〇,又更佳為1 7〜70重量%。另 —1面,本發明之硬化性環氧樹脂組成物含有硬化觸媒 §作必要成分時,脂環環氧化合物(A)相對於硬化性 環氧樹脂組成物全量(1〇〇重量%)之含量不特別限定宜 為25〜9〇重量%,更佳為30〜85重量。/〇,又更佳為35〜8〇重 量%。 &lt;異二聚氰酸單烯丙基二環氧丙酯化合物(B)&gt; 本發明使用之異三聚氰酸單烯丙基二環氧丙酯化合 物(B) ’可以用下列通式(1)表示。(Π) In the formula (II), R' is a group of p-type alcohols after p-OH is removed, and ρ, η is 201237059. The p-type alcohol [R, _(0H)p], for example, 2, 2_ bis (hydroxymethylbubu T-fermented polyol, etc. (carbon number 15 alcohol, etc.) β p should be b 6,11 Preferably, 1 to 30. When P is 2 or more, n of each of the groups (in parentheses) may be the same or different. The above compound 'specifically, t, for example, 2,2-bis(hydroxy fluorenyl) 1) 1-butanol 1) 2_epoxy_4·(2·oxiranyl)cyclohexane adduct, EHPE 3l5〇 (made by Daicel). These alicyclic epoxy compounds (A) may be used singly or in combination of two or more. The alicyclic epoxy compound (A) is preferably a 3,4-epoxycyclohexylmethyl (3,4-epoxy)cyclohexanecarboxylate or a cell 〇xide 2 0 2 1P represented by the above formula (11). The amount (content) of the alicyclic epoxy compound (A) is not particularly limited with respect to the total amount of the alicyclic epoxy compound (A) and the isomeric cyanuric monoallyl propylene oxide compound (B) ( 100% by weight, preferably 50 to 90% by weight, more preferably 60 to 90% by weight. /. Further preferably, when the amount of the alicyclic epoxy compound (Α) is less than 5% by weight, the isocyanuric monoallyl propylene oxide compound (Β) is dissolved. Insufficient properties, if placed at room temperature, sometimes the valley is easy to precipitate. On the other hand, the amount of the alicyclic epoxy compound (Α) is more than 90% by weight. /〇' When a photo-semiconductor device is fabricated, cracks may easily occur. In the total amount (% by weight) of the component (Α), the component (Β), and the component (C), the alicyclic epoxy compound (Α) and the isomeric cyanuric acid monoallyl propylene oxide compound The sum (total amount) of the content of (Β) is not particularly limited to the weight %. When the hardening epoxy resin composition of this month contains a hardener (D) as an essential component, the content of the alicyclic epoxy compound (A) relative to the total amount (100% by weight) of the curable epoxy resin composition is not particularly Limited, should be 1〇~9〇-12- 201237059 重里/. More preferably, it is 1 5 to 80% by weight/〇, and more preferably 1 to 7 to 70% by weight. On the other hand, when the curable epoxy resin composition of the present invention contains a curing catalyst as an essential component, the alicyclic epoxy compound (A) is present in a total amount (1% by weight) relative to the curable epoxy resin composition. The content is not particularly limited to 25 to 9 % by weight, more preferably 30 to 85 by weight. /〇, and more preferably 35~8〇 weight%. &lt;Iso-di- cyanuric acid monoallyl diglycidyl ester compound (B)&gt; The isocyanuric acid monoallyl diglycidyl ester compound (B) used in the present invention can be used in the following formula (1) indicates.

上式(1)中,R1及R2表示氫原子或碳數1〜8之烷基。 碳數1〜8之烷基’例如:甲基、乙基、丙基、異丙茂 、丁基、異丁基、第一丁基、戊基、己基、庚基、辛茂 等直鏈狀或支鏈狀烷基。其中,甲基、乙基、丙基' ^ 丙基等碳數1〜3之直鏈狀或支鏈狀烷基為較佳。上式(1) 中之R1及R2為氫原子尤佳。 異三聚氰酸單烯丙基二環氧丙酯化合物(B)之代表 例,例如異三聚氰酸單烯丙基二環氧丙酯、異三聚氛酸 1-烯丙基-3,5-雙(2·甲基環氧丙基)酯、異三聚氰酸 曱基丙烯基)-3,5-二環氧丙酯、異三聚氰酸1_(2_甲基丙烯 基)-3,5-雙(2-甲基環氧丙基)酯等。又’異三聚氰酸單歸 -13- 201237059 丙基二環氧丙酯化 上使用。 σ物(B)可以單獨使用,或組合2種以 異一聚银^ 解於上述脂環環化=基二環氧丙醋化合物(B),可於溶 化合物⑷也異臂/物⑷之範圍任意混合,脂環環氧 ^ 、—聚氰酸單烯丙基二環氧丙酯化合物(B) 之比例不特別限定 烯丙基二環氧…广氧化合物⑷:異三聚氰酸單 6曰化合物(B)宜為50: 50〜90: 1〇(重量比 )較佳。為該範圍外_ s 罜罝比 ,^ λ, 時,異二聚氰酸單烯丙基二環氧丙酯 化合物(B)之溶解性不容易獲得。 異—聚虱酸單烯丙基二環氧丙酯化合物(B),也可使 用添加醇或酸針等會與環氧基反應之化合物而預先改性 者。 月曰¥環氧化合物⑷與異Zt酸單稀丙基二環氧 丙S曰化α物⑻之總量’相對於環氧樹脂(具環氧基之化 合物)之總量(100重量%)不特別限冑,從提高耐熱性、耐 光性、及耐龜裂性之觀點,為4G重量%以上較佳,更 為50重量。/。以上,又更佳為7〇重量%以上。 〈分子内具有2個以上之環氧基之矽氧烷衍生物(c)&gt; 本發明之硬化性環氧樹脂組成物之成分(c),即分子 内(一分子中)具有2個以上之環氧基之矽氧烷衍生物,負 責提高硬化物之耐熱性、耐綠,抑制光半導體裝置之 光度降低的作用。 分子内具有2個以上之環氧基之矽氧烷衍生物(c)中 ,矽氧烷骨架不特別限定,例如:環狀矽氧烷骨架;直 鏈狀之聚矽氧、或籠型或階梯型之聚倍半矽氧烷等聚矽 -14- 201237059 2骨架等。其中,上切氧烧骨架從提高硬化物之耐 二性、耐光性並抑制光度降低之觀點,為環狀錢燒骨 架、直鏈狀聚矽氧骨架較佳。亦gp,分子内具有2個以上 之環氧基之矽氧烷衍生物(c),宜為分子内具有2個以上 之環氧基之環狀矽氧烷、分子内具有2個以上之環氧基之 直鏈狀聚矽氧。又,分子内具有2個以上之環氧基之矽氧 烷衍生物(C),可以單獨使用,或組合2種以上使用。 分子内具有2個以上之環氧基之石夕氧烧衍生物(c)為 具請,上之環氧基之環狀石夕氧院日夺,形成石夕氧烧環之 Si-Ο早兀之數(與形成矽氧烷環之矽原子之數目相等)不 特別限定,從提高硬化物之耐熱性、耐光性之觀點 2〜12較佳,更佳為4〜8。 … 分子内具有2個以上之環氧基之矽氧烷衍生物(C)之 重量平均分子量不特別限定,從提高硬化物之耐熱性、 耐光性之觀點,為100〜3〇〇〇較佳,更佳為18〇〜2〇〇〇。 分子内具有2個以上之環氧基之矽氧烷衍生物(c), 一分子中之環氧基數目只要為2個以上即可,不特別限定 ,從提高硬化物之耐熱性、耐光性之觀點,2~4個(2個、 3個、或4個)較佳。 分子内具有2個以上之環氧基之矽氧烷衍生物(c), 其環氧當量(依據JIS K7236)不特別限定,從提高硬化物 之对熱性、耐光性之觀點,為180〜400較佳,更佳為 240〜400,又更佳為24〇〜35〇。 分子内具有2個以上之環氧基之矽氧烷衍生物(c)中 的環氧基不特別限定,從提高硬化物之耐熱性、耐光性In the above formula (1), R1 and R2 represent a hydrogen atom or an alkyl group having 1 to 8 carbon atoms. Alkyl group having 1 to 8 carbon atoms such as methyl, ethyl, propyl, isopropanol, butyl, isobutyl, first butyl, pentyl, hexyl, heptyl, octyl, etc. Or branched alkyl. Among them, a linear or branched alkyl group having 1 to 3 carbon atoms such as a methyl group, an ethyl group or a propyl 'propyl group is preferred. R1 and R2 in the above formula (1) are preferably a hydrogen atom. Representative examples of the isomeric cyanuric acid monoallyl diglycidyl ester compound (B), such as isoallyl cyanurethane diglycidyl ester, isotrimer acid 1-allyl-3 ,5-bis(2·methylepoxypropyl)ester, decylpropenyl)-3,5-diglycidyl ester, isomeric cyanuric acid 1_(2-methacryloyl) -3,5-bis(2-methylepoxypropyl) ester, and the like. Also, 'iso-cyanuric acid single-grade -13- 201237059 propyl diglycidyl ester was used. The σ substance (B) may be used singly or in combination of two kinds of heteropoly silver to the above alicyclic cyclization=based diglycidyl acetate compound (B), and the soluble compound (4) may also be an arm/object (4). The range is arbitrarily mixed, and the ratio of the alicyclic epoxy compound, the polycyanic acid monoallyl diglycidyl ester compound (B) is not particularly limited to the allyl epoxide... the oxy-oxygen compound (4): iso-cyanuric acid single Preferably, the compound (B) is preferably 50:50 to 90: 1 Torr (by weight). When the ratio is outside the range _ s 罜罝 , ^ λ, the solubility of the isomeric cyanuric monoallyl diglycidyl ester compound (B) is not easily obtained. The iso-polycapric acid monoallyl diglycidyl ester compound (B) may be previously modified by adding a compound which reacts with an epoxy group such as an alcohol or an acid needle. The total amount (100% by weight) of the total amount of the epoxy compound (4) and the iso-Zt acid mono-propyl propylene glycol sulfonium sulfonate (8) relative to the epoxy resin (the compound having an epoxy group) It is not particularly limited, and is preferably 4 G% by weight or more and more preferably 50% from the viewpoint of improving heat resistance, light resistance, and crack resistance. /. More preferably, it is more than 7% by weight. <The oxoxane derivative (c) having two or more epoxy groups in the molecule> The component (c) of the curable epoxy resin composition of the present invention, that is, two or more molecules (in one molecule) The cyclooxyalkylene derivative of the epoxy group is responsible for improving the heat resistance and green resistance of the cured product and suppressing the decrease in the luminosity of the optical semiconductor device. In the oxoxane derivative (c) having two or more epoxy groups in the molecule, the fluorination skeleton is not particularly limited, and examples thereof include a cyclic siloxane skeleton; a linear polyoxy siloxane, or a cage type or Stepped type of polysesquioxanes and other polyfluorene-14- 201237059 2 skeleton. Among them, the upper-cut oxygen-fired skeleton is preferably a ring-shaped crucible frame or a linear polyanthracene oxygen skeleton from the viewpoint of improving the resistance to the cured product and the light resistance and suppressing the decrease in luminosity. Further, the p-oxane derivative (c) having two or more epoxy groups in the molecule is preferably a cyclic oxirane having two or more epoxy groups in the molecule, and two or more rings in the molecule. A linear polyoxyl group of an oxy group. Further, the oxane derivative (C) having two or more epoxy groups in the molecule may be used singly or in combination of two or more. The oxime-oxygen derivative (c) having two or more epoxy groups in the molecule is a ring-shaped oxime of the epoxy group, and the Si-Ο early is formed. The number of ruthenium (equal to the number of ruthenium atoms forming a siloxane ring) is not particularly limited, and is preferably from 2 to 12, more preferably from 4 to 8, from the viewpoint of improving the heat resistance and light resistance of the cured product. The weight average molecular weight of the fluorinated alkane derivative (C) having two or more epoxy groups in the molecule is not particularly limited, and is preferably from 100 to 3 Å from the viewpoint of improving heat resistance and light resistance of the cured product. More preferably 18〇~2〇〇〇. The oxoxane derivative (c) having two or more epoxy groups in the molecule is not particularly limited as long as the number of epoxy groups in one molecule is two or more, and the heat resistance and light resistance of the cured product are improved. From the point of view, 2 to 4 (2, 3, or 4) are preferred. The oxirane derivative (c) having two or more epoxy groups in the molecule is not particularly limited as long as it has an epoxy equivalent (according to JIS K7236), and is 180 to 400 from the viewpoint of improving the heat resistance and light resistance of the cured product. Preferably, it is preferably 240 to 400, and more preferably 24 to 35 inches. The epoxy group in the oxoxane derivative (c) having two or more epoxy groups in the molecule is not particularly limited, and the heat resistance and light resistance of the cured product are improved.

S -15- 201237059 的2個碳原子與氧原子構 其中’環氧己缔基尤佳 之觀點,以構成脂肪族環之相鄰 成的環氧基(脂環環氧基)較佳,It is preferable that two carbon atoms and an oxygen atom of S -15-201237059 are in which the epoxy group is particularly preferable, and an adjacent epoxy group (alicyclic epoxy group) constituting the aliphatic ring is preferable.

基-2,4,6,8-四甲基-環四矽氧烷、4,8•二[2_(3_{氧雜雙環 [4.1.0]庚基})乙基]-2,6-二丙基-2,4,6,8-四曱基_環四矽 氧烷、2’4,8·三[2-(3-{氧雜雙環[4.1〇]庚基})乙基 ]-2,4,6,6’8-五甲基_環四矽氧烷、24,8三氧雜雙 環[4.1.〇]庚基})乙基]_6_丙基-2,4,6,8-四甲基-環四矽氧 烷、2,4,6,8-四[2-(3-{氧雜雙環[4.1.0]庚基})乙基 卜2,4,6,8-四甲基-環四矽氧烷、具環氧基之倍半矽氧烷等 。更具體而言’例如以下式表示之一分子中具有2個以上 之環氧基之環狀矽氧烷等。 -16- 201237059 \/-2,4,6,8-tetramethyl-cyclotetraoxane, 4,8•bis[2_(3_{oxabicyclo[4.1.0]heptyl})ethyl]-2,6- Dipropyl-2,4,6,8-tetradecyl-cyclotetraoxane, 2'4,8·tri[2-(3-{oxabicyclo[4.1〇]heptyl})ethyl] -2,4,6,6'8-pentamethyl-cyclotetraoxane, 24,8 trioxabicyclo[4.1.〇]heptyl})ethyl]_6_propyl-2,4,6 , 8-tetramethyl-cyclotetraoxane, 2,4,6,8-tetra[2-(3-{oxabicyclo[4.1.0]heptyl})ethyl b 2,4,6, 8-tetramethyl-cyclotetraoxane, sesquioxane having an epoxy group, and the like. More specifically, for example, the following formula represents a cyclic oxirane having two or more epoxy groups in one molecule. -16- 201237059 \/

(c),例Λ子内具有2個以上之環氣基之石夕氧烧衍生 人月使用日本特開2〇〇8-248“9號公報記載 衣氧基之聚矽氧樹脂,或日本特開2〇〇819422 公報記載之-分子中至少具有2個環氧官能性基之有 聚倍半矽氧烷樹脂等。 分子内具有2個以上之環氧基之矽氧烷衍生物(c 例如也可使用》子内具有2個以上之環氧基之環狀 烧’商品名「X-40-2678」(信越化學工業(股)製)、商。 名「X-40-2670」(信越化學工業(股)製)、商品名二 Χ-40·2720」等市售品。 -17- 201237059 分子内具有2個以上之環氧基之石夕氧烧衍生物 使用量(含量)不特別限定,相對於成分(A)、成分 成分(c)之合計量(100重量%),為5〜6〇重量%較佳更佳 為8〜55重量%’又更佳為10〜5〇重量%,尤佳為15〜4〇重量 〇/❶。分子内具有2個以上之環氧基之石夕氧燒衍生物⑹之使 用量若低於5重量% ’硬化物之耐熱性 光性有時會降 低。另一方面,分子内具有2個以上之環氧基之矽氧烷衍 生物(C)之使用量若超過60重量%,硬化物之耐龜裂性有 時會降低。 &lt;硬化劑(D)&gt; 硬化劑(D)具有使具環氧基之化合物硬化的作用。本 發明中,硬化劑(D)可使用就環氧樹脂用硬化劑而言為公 知或慣用之硬化劑。本發明中,硬化劑(D)又以25。〇為液 狀之酸酐較佳,例如:曱基四氫鄰苯二甲酸酐、甲基六 氫鄰苯二f酸酐、十二烯基琥珀酸酐、甲基内向亞曱基 四虱鄰表一甲酸針等。又,例如將鄰苯二甲酸針、四氫 鄰苯二甲酸酐、六氫鄰苯二甲酸酐、曱基環己烯二羧酸 奸等常溫(約25。〇為固體狀之酸酐溶於常溫(約25。〇為 液狀酸酐而成為液狀混合物,藉此,也可當作本發明之 硬化劑(D)使用。又,硬化劑(D)可以單獨使用,或組合2 種以上使用。如上述,硬化劑從硬化物之耐熱性、耐 光性、耐龜裂性之觀點,為飽和單環烴二羧酸酐(也包含 於環有院基等取代基鍵結者)為較佳。 又,本發明中,硬化劑(D)也可使用Rikacid MH-700( 新曰本理化(股)製)、HN-5500(曰立化成工業(股)製)等市 * 18 - 201237059 售品。 硬化劑(D)之使用量(含量)不特別限定,相對於本發 明之硬化性環氧樹脂組成物令含有之具環氧基之化合物 之全量(100重量份),為5〇〜2〇〇重量份較佳更佳為 1 00〜L 45重量份。更具體而言,以本發明之硬化性環氧樹 脂組成物中所含之全部具環氧基之化合物中的環氧基每 1备里,使用0.5〜1.5當量之比例較佳。硬化劑(D)之使用 量若低於50重量份,硬化不充分,硬化物之強韌性有降 低之傾向。另一方面,硬化劑(D)之使用量若超過2〇〇重 量份’硬化物會著色’有時色相會惡化。 &lt;硬化促進劑(E)&gt; 本發明之硬化性環氧樹脂組成物更包含硬化促進劑 (E)。硬化促進劑(E),係於具環氧基之化合物利用硬二 劑硬化時,具有促進硬化速度之機能之化合物。硬化促 進劑(E),可使用公知或慣用之硬化促進劑,例如:丨,8_ 二氮雜雙環[5.4.0]十一烯_7(DBU)、及其鹽(例如:酚鹽 、辛酸鹽、對曱苯磺酸鹽、曱酸鹽、四苯基硼酸鹽);1,5_ 二氮雜雙環[4.3.0]壬烯_5(DBN)、及其鹽(例如:鱗鹽、 锍鹽、4級銨鹽、鐄鹽);苄基二曱胺、2,4,6_參(二曱胺 基曱基)酚、n,n-二甲基環己胺等3級胺;2_乙基_4·甲基 咪唑、1 -氰基乙基-2-乙基·4_曱基咪唑等咪唑;磷酸酯、 三苯膦等膦類;四笨基鱗四(對曱苯基)硼酸鹽等鱗化合 物;辛酸錫、辛酸鋅等有機金屬鹽;金屬螯合物等。硬 化促進劑(Ε)可以單獨使用,或混合2種以上使用。(c) In the case of a group of two or more ring gas groups in the scorpion, the sulphur-oxygen resin is used in Japan. A polysilsesquioxane resin having at least two epoxy functional groups in the molecule, which is described in JP-A No. 2,819,422, and a pyrithione derivative having two or more epoxy groups in the molecule (c) For example, it is also possible to use a ring-burning product name "X-40-2678" (manufactured by Shin-Etsu Chemical Co., Ltd.) and a commercial product having two or more epoxy groups in the sub-item. The name "X-40-2670" ( Commercial products such as Shin-Etsu Chemical Co., Ltd., under the trade name Χ-40·2720. -17- 201237059 The amount (content) of the oxy-oxygen derivative containing two or more epoxy groups in the molecule is not In particular, it is preferably 5 to 6 % by weight, more preferably 8 to 55% by weight, and even more preferably 10 to 5 %, based on the total amount (100% by weight) of the component (A) and the component (c). % by weight, particularly preferably 15 to 4 〇 〇 / ❶. The amount of the oxy-oxygen derivative (6) having two or more epoxy groups in the molecule is less than 5% by weight. On the other hand, if the amount of the oxoxane derivative (C) having two or more epoxy groups in the molecule is more than 60% by weight, the crack resistance of the cured product may be <The hardener (D)&gt; The hardener (D) has a function of hardening the epoxy group-containing compound. In the present invention, the hardener (D) can be used as the hardener for the epoxy resin. It is a known or customary hardener. In the present invention, the hardener (D) is preferably a 25. hydrazine-based acid anhydride, for example, mercaptotetrahydrophthalic anhydride, methylhexahydrophthalic acid f An acid anhydride, dodecenyl succinic anhydride, methyl intrinsic fluorenylene tetraisoproton benzoic acid needle, etc. Further, for example, phthalic acid needle, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, Normal temperature (about 25. 〇 is a solid acid anhydride dissolved in normal temperature (about 25. 〇 is a liquid acid anhydride and becomes a liquid mixture, whereby it can also be used as the hardening of the present invention). Further, the curing agent (D) may be used singly or in combination of two or more. As described above, the curing agent is used. From the viewpoint of heat resistance, light resistance, and crack resistance of the compound, it is preferably a saturated monocyclic hydrocarbon dicarboxylic anhydride (including a substituent bonded to a ring such as a ring). Further, in the present invention, a hardener (D) It is also possible to use products such as Rikacid MH-700 (New 理 理 ( (), HN-5500 (曰立化成股份有限公司), etc. * 18 - 201237059. Use of hardener (D) The amount (content) is not particularly limited, and the total amount (100 parts by weight) of the epoxy group-containing compound contained in the curable epoxy resin composition of the present invention is preferably 5 Torr to 2 Torr. It is 1 00~L 45 parts by weight. More specifically, the epoxy group in the epoxy group-containing compound contained in the curable epoxy resin composition of the present invention is preferably used in an amount of from 0.5 to 1.5 equivalents per 1 part. When the amount of the curing agent (D) is less than 50 parts by weight, the curing is insufficient, and the toughness of the cured product tends to decrease. On the other hand, when the amount of the curing agent (D) is more than 2 parts by weight, the cured product is colored. Sometimes the hue is deteriorated. &lt;Curing accelerator (E)&gt; The curable epoxy resin composition of the present invention further contains a curing accelerator (E). The hardening accelerator (E) is a compound having a function of promoting the rate of hardening when the epoxy group-containing compound is hardened by a hardener. As the hardening accelerator (E), a known or conventional hardening accelerator such as hydrazine, 8_diazabicyclo[5.4.0]undecene-7 (DBU), and a salt thereof (for example, phenate, octanoic acid) can be used. Salt, p-toluenesulfonate, decanoate, tetraphenylborate); 1,5-diazabicyclo[4.3.0]nonene-5 (DBN), and salts thereof (eg, scale salts, cesium) Salt, grade 4 ammonium salt, phosphonium salt); benzyl diamine, 2,4,6-g (diguanylamino) phenol, n, n-dimethylcyclohexylamine and other tertiary amines; Imidazole such as ethyl 4-4 methylimidazole, 1-cyanoethyl-2-ethyl-4-ylimidazole; phosphines such as phosphates and triphenylphosphine; An scaly compound such as borate; an organic metal salt such as tin octylate or zinc octoate; a metal chelate compound or the like. The hardening accelerator (Ε) may be used singly or in combination of two or more.

又,本發明中,硬化促進劑(Ε)也可使用U-CAT SAFurther, in the present invention, the hardening accelerator (Ε) can also use U-CAT SA.

S -19 * 201237059 506、U-CAT SA 102、U-CAT 5003、U-CAT 18X、12XD( 開發品)(均為San-apro(股)製)、TPP-K、TPP-MK(均為北 興化學工業(股)製)、Ρχ-4ΕΤ(曰本化學工業(股)製)等市 售品。 硬化促進劑(Ε)之使用量(含量)不特別限定,相對於 硬化性環氧樹脂組成物中所含之具環氧基之化合物之全 量(100重量份)為〇.〇5〜5重量份較佳,更佳為〇.1〜3重量份 ’又更佳為0.2〜3重量份’尤佳為0.25〜2.5重量份。硬化 促進劑(Ε)之使用量若少於〇.〇5重量份,硬化促進效果有 時會不夠。另一方面’硬化促進劑(Ε)之使用量若超過5 重量份’硬化物會著色,有時色相會惡化。 &lt;硬化觸媒(F)&gt; 本發明之硬化性環氧樹脂組成物中,也可使用硬化 觸媒(F)代替上述硬化劑(D)及硬化促進劑(E) 〇與使用硬 化劑(D)及硬化促進劑之情形同樣,藉由使用硬化觸 媒(F) ’能使具有環氧基之化合物之硬化反應進行並獲得 硬化物。上述硬化觸媒不特別限定,可使用藉由實施 紫外線照射或加熱處理會產生陽離子物質並開始聚合之 陽離子觸媒(陽離子聚合起始劑)。 由於紫外線照射而產生陽離子物質之陽離子觸媒,例 如’·六a録酸鹽、五氟羥基銻酸鹽、六氟磷酸鹽、六氟砷 酸鹽等。該等陽離子觸媒可以單獨使用,或組合使用2種 以上。上述陽離子觸媒,例如商品名「UVACURE1590」 (Daicel · Cytec (股)製)、商品名「CD_101〇」、r cd-101 1 」CD-1012」(以上為美國sart〇inei^ )、商品名「irgacure -20- 201237059 264」(CibaJapan(股)製)、商品名「CIT-1682」(日本曹達 (股)製)等市售品為較佳可使用者。 實施加熱處理會產生陽離子物質之陽離子觸媒,例 如:芳基重氮鹽、芳基錤鹽、芳基銃鹽、芳烯(arene)_ 離子錯合物等,較佳為可使用例如pp_33、CP-66、S -19 * 201237059 506, U-CAT SA 102, U-CAT 5003, U-CAT 18X, 12XD (developed products) (all manufactured by San-apro), TPP-K, TPP-MK (all Commercial products such as Beixing Chemical Industry Co., Ltd. and Ρχ-4ΕΤ (Sakamoto Chemical Industry Co., Ltd.). The amount (content) of the hardening accelerator (Ε) is not particularly limited, and is 〇. 5 to 5 by weight based on the total amount (100 parts by weight) of the epoxy group-containing compound contained in the curable epoxy resin composition. Preferably, it is preferably from 1 to 3 parts by weight, and more preferably from 0.2 to 3 parts by weight, particularly preferably from 0.25 to 2.5 parts by weight. If the amount of the hardening accelerator (Ε) is less than 〇.〇5 parts by weight, the hardening promoting effect may sometimes be insufficient. On the other hand, if the amount of the curing accelerator (Ε) exceeds 5 parts by weight, the cured product may be colored, and the hue may be deteriorated. &lt;Curing Catalyst (F)&gt; In the curable epoxy resin composition of the present invention, a curing catalyst (F) may be used instead of the above curing agent (D) and a curing accelerator (E), and a curing agent may be used. (D) As in the case of the hardening accelerator, the hardening reaction of the compound having an epoxy group can be carried out by using the curing catalyst (F)' to obtain a cured product. The hardening catalyst is not particularly limited, and a cationic catalyst (cationic polymerization initiator) which generates a cationic substance by polymerization by ultraviolet irradiation or heat treatment and starts polymerization can be used. A cationic catalyst which generates a cationic substance by ultraviolet irradiation, for example, a hexa-a citrate, a pentafluorohydroxy decanoate, a hexafluorophosphate or a hexafluoroarsenate. These cationic catalysts may be used singly or in combination of two or more. The cation catalyst is, for example, trade name "UVACURE 1590" (Daicel · Cytec Co., Ltd.), trade name "CD_101〇", r cd-101 1 "CD-1012" (above, US sart〇inei^), trade name Commercial products such as "irgacure -20-201237059 264" (manufactured by Ciba Japan Co., Ltd.) and trade name "CIT-1682" (manufactured by Japan Soda Co., Ltd.) are preferred. The heat treatment may generate a cationic catalyst of a cationic substance, for example, an aryl diazonium salt, an aryl sulfonium salt, an aryl sulfonium salt, an arene ion ion complex, etc., and preferably, for example, pp_33 may be used. CP-66,

CP-77(ADEKA(股)製)、FC-509(3M製)、UVE1014(G.E. 製)、San-Aid SI-6 0L、San-Aid SI-8 0L、San-Aid SI-100L 、San”Aid SI-1 l.〇L(三新化學工業(股)製)、CG_24_61 (ciba Japan(股)製)等市售品。再者,鋁或鈦等金屬與乙醯乙酸 或二酮類之螯合化合物與三苯基矽醇等矽醇之化合物、 或紹或鈦等金屬與乙醯乙酸或二酮類之螯合化合物與雙 酚S等酚類之化合物亦可。該等陽離子觸媒可以單獨使用 ,或組合2種以上使用。 硬化觸媒(F)之使用量(含量)不特別限定,相對於硬 化性環氧樹脂組成物中含有之具環氧基之化合物之全量 (100重量份),為0.01〜15重量份較佳,更佳為〇〇1〜12重 量份,又更佳為〇.05〜1〇重量份,尤佳為〇卜⑺重量份。 藉由於該範圍内使用硬化觸媒(F),可獲得耐熱性、耐光 性、透明性優異之硬化物。 &lt;橡膠粒子&gt; 本發明之硬化性環氧樹脂組成物也可含有橡膠粒子 。橡膠粒子’例如:粒子狀NBR(丙稀腈丁二烯橡膠)、 ^應性末端羧基NBR(CTBN)、無金屬nbr、粒子狀sbr( 本乙烯-丁二烯橡膠)等。橡膠粒子,為具有橡膠彈性之 核部分、以及被覆該核部分之至少i層的勒層構成的多層 -21- 201237059 結構(核鞘結構),且表面具有當作能與脂環環氧化合物 反應之官能基的羥基及/或羧基,且平均粒徑為l〇nm〜5〇〇 nm、最大粒徑為50nm〜1000nm之橡膠粒子,也可為該橡 膠粒子之折射率與該硬化性環氧樹脂組成物之硬化物之 折射毕間之差為±0.02以内之橡膠粒子。上述橡膠粒子之 摻合量’可視需要適當調整’不特別限定,相對於硬化 性環氧樹脂組成物中含有之具環氧基之化合物之全量 (100重量份)’為0.5〜30重量份較佳,更佳4l〜2〇重量份 。橡膠粒子之使用量若低於0.5重量份,硬化物之耐龜裂 性有降低之傾向,另一方面,若橡膠粒子之使用量超過 3 0重量份’硬化物之耐熱性及透明性會有降低之傾向。 &lt;添加劑&gt; 本發明之硬化性環氧樹脂組成物中,除了上述以外 ,在不損及本發明效果之範圍内,也可使用各種添加劑 。上述添加劑例如若使用乙二醇、二乙二醇、丙二醇、 甘油等具羥基之化合物,能使反應溫和地進行。此外, 在不損及黏度或透明性之範圍内,也可含有聚石夕氧系戍 氟系消泡劑、塗平劑、γ -環氧丙氧基丙基三曱氧基石夕烧 等石夕烧偶合劑、界面活性劑、二氧化矽、氧化鋁等無機 填充劑、難燃劑、著色劑、抗氧化劑、紫外線吸收劑、 離子吸附體、顏料、螢光體、脫模劑等慣用之添加劑。 &lt;硬化物&gt; 藉由使本發明之硬化性環氧樹脂組成物硬化,可獲 得透明性 '耐熱性、耐光性、及耐龜裂性等各物性優異 之硬化物。硬化時之加熱溫度(硬化溫度)不特別限定,CP-77 (made by ADEKA), FC-509 (made by 3M), UVE1014 (made by GE), San-Aid SI-6 0L, San-Aid SI-8 0L, San-Aid SI-100L, San" Aid SI-1 l.〇L (Sanshin Chemical Industry Co., Ltd.), CG_24_61 (made by ciba Japan), and other metals such as aluminum or titanium and acetonitrile or diketone. A compound of a chelating compound such as a sterol such as triphenyl decyl alcohol or a chelating compound of a metal such as sulphur or titanium, an acetonitrile acetic acid or a diketone, or a phenol such as bisphenol S. The cationic catalyst may also be used. The amount (content) of the curing catalyst (F) is not particularly limited, and the total amount of the epoxy group-containing compound contained in the curable epoxy resin composition (100 weight) The portion is preferably 0.01 to 15 parts by weight, more preferably 1 to 12 parts by weight, still more preferably 〇.05 to 1 part by weight, particularly preferably 7b (7) parts by weight. A cured product excellent in heat resistance, light resistance, and transparency can be obtained by using a curing catalyst (F). <Rubber particles> The curable epoxy resin composition of the present invention can also be used. The rubber particles are contained, for example, particulate NBR (acrylonitrile butadiene rubber), ^ terminal carboxyl group NBR (CTBN), metal-free nbr, particulate sbr (present ethylene-butadiene rubber). The rubber particles are a multi-layered-21-201237059 structure (nuclear sheath structure) composed of a core portion having rubber elasticity and a layer of at least one layer covering the core portion, and having a surface capable of reacting with an alicyclic epoxy compound The rubber particles having a hydroxyl group and/or a carboxyl group of a functional group and having an average particle diameter of 10 nm to 5 nm and a maximum particle diameter of 50 nm to 1000 nm may also be a refractive index of the rubber particle and the hardenable epoxy The rubber particles having a difference in the refracting time of the cured product of the resin composition are within ±0.02. The blending amount of the rubber particles is appropriately adjusted as needed, and is not particularly limited, and is contained in the curable epoxy resin composition. The total amount (100 parts by weight) of the epoxy group compound is preferably 0.5 to 30 parts by weight, more preferably 4 to 2 parts by weight. The rubber particles are used in an amount of less than 0.5 part by weight, and the crack resistance of the cured product Have a tendency to decrease, another When the amount of the rubber particles used exceeds 30 parts by weight, the heat resistance and transparency of the cured product tend to be lowered. &lt;Additives&gt; The curable epoxy resin composition of the present invention, in addition to the above, Various additives may be used as long as the effects of the present invention are not impaired. For example, if a compound having a hydroxyl group such as ethylene glycol, diethylene glycol, propylene glycol or glycerin is used as the above additive, the reaction can be carried out gently. In the range of viscosity and transparency, it may also contain a polysulfide-oxygen-based fluorinated antifoaming agent, a coating agent, and a gamma-glycidoxypropyltrimethoxy oxysulfide or the like. Conventional additives such as inorganic fillers such as surfactants, cerium oxide, and aluminum oxide, flame retardants, colorants, antioxidants, ultraviolet absorbers, ion adsorbents, pigments, phosphors, and mold release agents. &lt;Cured product&gt; By curing the curable epoxy resin composition of the present invention, a cured product having excellent transparency, such as heat resistance, light resistance, and crack resistance, can be obtained. The heating temperature (hardening temperature) at the time of hardening is not particularly limited,

S -22- 201237059 為45〜200°C較佳,更佳為1〇〇〜19(rc ,又更佳為ι〇〇〜ΐ8〇ι 。又,硬化時之加熱時間(硬化時間)不特別限定,30〜600 分鐘較佳,更佳為45〜54〇分鐘,又更佳為6〇〜48〇分鐘。 硬化溫度與硬化時間低於上述範圍之下限値時,硬化不 足,反之,高於上述範圍之上限値時,肖脂成分有時會 f解,故均不佳。硬化條件取決於各種條件,例如··提 高硬化溫度時’硬化時間縮短,降低硬化溫度時,硬化 時間加長等’可藉此適當調整。 &lt;光半導體密封用樹脂組成物&gt; 本發明之光半導體密封用樹脂組成物,係包含本發 明之硬化性環氧樹脂組成物而構成。藉由使用本發明之 光半導體密封用樹脂組成物,可獲得以透明性、耐轨性 、耐光性、及耐龜!U生等各物性優異之硬化物將光半導 體凡件予以被封而成,光度不易隨時間降低之光半導體 裝置。上述光半導體裝置,即使具備高輸出、高輝度之 光半等體元件時’光度仍不易隨時間降低。 &lt;光半導體裝置&gt; 本發明之光半導體裝置,係藉由以本發明之硬化性 =樹脂組成物(光半導體密封用樹脂組成物)密封光半 導體元件而獲得。夯车邋胁—灿 _ 于光丰導體兀件之密封’係將以上述方 1備之硬化性環氧樹脂組成物注入既定之成形模内, Π::件進行加熱硬化。藉此,能以硬化性環氧樹脂 度盘硬導體凡件而獲得光半導體裝置。硬化溫 度'、硬化時間可設定為與上述相同範圍。 發月之硬化性%氧樹脂組成物,不限於上述光半 -23- 201237059 導體(光半導體元件)之密封 著劑、電絕緣材、疊層板、 、抗敍劑、複合材料、透明 光學元件、光學透鏡、光學 控面板、太陽能電池基板、 憶體等。 用途’也可利用於例如:黏 塗覆、印墨、塗料、填封劑 基材、透明片、透明薄膜、 構件、光造形、電子紙、觸 光導波路、導光板、全像記 [實施例] 以下依據實施例更詳細說明本發明,但本發明不限 於該等實施例。 製造例1 (硬化劑與硬化促進劑與添加劑之混合物,以下記載為κ 劑) 將硬化劑(新日本理化(股)製、Rikacid ΜΗ-700) : 100 重量份、硬化促進劑(SAN-APRO(股)製、U-CAT 18X): 0.5重量份、添加劑(和光純藥工業(股)製、乙二醇):1重 量份使用自公轉式攪拌裝置(THINKY(股)製、脫泡練太 郎AR-250)均勻混合,並脱泡獲得κ劑。 製造例2 (環氧樹脂) 將異三聚氰酸單烯丙基二環氧丙酯(四國化成工業( 股)、MA-DGIC)、脂環環氧化合物(Daicel(股)製、 CELLOXIDE2021P)、及分子内具有2個以上之環氧基之 矽氧烷衍生物(信越化學工業(股)製、X-40-2678 ;信越化 學工業(股)製、X-40-2720 ;信越化學工業(股)製、 X-40-2670),依照表1、表2所示之摻合配方(單元:重量 -24- 201237059 伤)混合,於80°C攪拌1小時,藉此使異三聚氰酸單烯丙 基二環氧丙酯溶解’獲得環氧樹脂(混合物)。 實施例1〜1 2、比較例1〜4 實施例1〜12’係將製造例2獲得之環氧樹脂與製造例 1獲得之K劑,依照表丨所示之摻合配方(單位:重量份) ’將各成分使用自公轉式攪拌裝置(THINKY(股)製、脫 泡練太郎AR_250)均勻混合、脱泡,獲得硬化性環氧樹脂 組成物。又,如表1所示,比較例1就環氧樹脂而言僅使 用脂環環氧化合物(Daicel化學工業(股)製、CELLOXIDE 20 2 1 P) ’比較例2〜4就環氧樹脂而言僅使用分子内具有2 個以上之環氧基之矽氧烧衍生物(信越化學工業(股)製、 X-40-2678 ;信越化學工業(股)製、χ_4〇_272〇 ;信越化學 工業(股)製、X-40-26 70) ’與上述同樣進行而獲得硬化性 環氧樹脂組成物》 將上述硬化性環氧樹脂組成物澆鑄於如第1圖所示 光半導體之導線架(InGaN元件、3.5mmx2.8mm)模後,於 1 20 c之烘箱(樹脂硬化烘箱)進行5小時加熱’藉此獲得以 硬化樹脂密封LED元件而得之光半導體裝置。第1圖中, 1〇〇代表反射件(光反射用樹脂組成物)、1〇1代表金屬配 線、102代表LED元件、103代表接合導線、1〇4代表透明 密封樹脂(硬化物)。 實施例1 3〜24、比較例5〜8 實施例1 3〜24 ’係將製造例2獲得之環氧樹脂與硬化觸 媒(三新化學工業(股)製、SAN-AID SI-100L),依照表2所 示之摻合配方(單位:重量份),將各成分使用自公轉式攪 % -25- 201237059 拌裝置(THINKY(股)製、脫泡練太郎AR-250)均勻混合、 脱泡,獲得硬化性環氧樹脂組成物。又,如表2所示,比 較例5係就環氧樹脂而言僅使用脂環環氧化合物(Daicel化 學工業(股)製、CELLOXIDE2021P),比較例6〜8係就環氧 樹脂而言僅使用分子内具有2個以上之環氧基之矽氧烷衍 生物(信越化學工業(股)製、χ_40-2678 ;信越化學工業( 股)製、X-40-2720 ;信越化學工業(股)製、x_4〇-2670), 與上述以同樣方式獲得硬化性環氧樹脂組成物。 將上述硬化性環氧樹脂組成物澆鑄於如第1圖所示 光半導體之導線架(InGaN元件、3.5mmx2.8mm)後,使 用烘箱(樹脂硬化烘箱)於11 〇°C加熱3小時,接著,於14〇。〇 加熱4小時,藉此獲得以硬化樹脂密封led元件而得之光 半導體裝置。 &lt;評價&gt; 針對實施例及比較例獲得之硬化性環氧樹脂組成物 以及光半導體裝置,以下列方法進行評價試驗。 [通電試驗] 實施例及比較例獲得之光半導體裝置之全光束,使 用全光束測定機測定(定為Γ 〇小時之全光束」)。再者, 測定於之恆溫槽内對光半導體裝置流過6〇mA之電 流100小時後之全光束(定為「1〇〇小時後之全光束」)。 並由下式計算光度保持率。結果如表1 '表2。 {光度保持率(%)} = {100小時後之全光束(lm)}/{〇小時之全光束 (lm)} X 1〇〇 -26- 201237059 [焊料耐熱性試驗] 將實施例及比較例獲得之光半導體裝置(就各硬化 性環氧樹脂組成物使用2個)於3(TC、70%RH之條件下使 吸濕168小時後,使用回流爐於26(TC實施10秒加熱處理2 次。之後’使用數位顯微鏡(VHX-900、KEYENCE(股) 製)觀察光半導體裝置之密封樹脂(硬化性環氧樹脂組成 物之硬化物)產生的龜裂的長度,並計測2個光半導體裝 置中具有長度為90 μιη以上之龜裂之光半導體裝置之個 數。結果如表1、表2。 [熱衝撃試驗] 將實施例及比較例獲得之光半導體裝置(各硬化性 環氧樹脂組成物使用2個)暴露於-40Τ:之氣體環境下3〇分 鐘,接著,於100°C之氣體環境下暴露30分鐘,以此當作 1個循環的熱衝擊,使用熱衝擊試驗機給予2〇〇個循環。 之後’使用數位顯微鏡(VHX-900、KEYENCE(股)製)觀 察光半導體裝置之密封樹脂(硬化性環氧樹脂組成物之 硬化物)產生的龜裂的長度,並計測2個光半導體裝置中 具有長度為90μιη以上之龜裂之光半導體裝置之個數。結 果如表1、表2 » [综合判定] 於通電試驗的光度保持率為90%以上,且焊料耐熱 ['生ν式驗與熱衝擊§式驗中產生長度以上之龜裂之光 半導體裝置個數均為〇個者,於綜合判定為〇(良好)。除 此以外於综合判定為X (不良)。結果如表1、表2。 -27- 201237059 寸 * 1 1 1 Ο § 〇 &lt;N X 1 1 1 o 1 § 〇 (N X 怒 A3 1 1 ο ^-1 1 1 § VO 〇〇 〇 &lt;N X Ϊ 怒 〇 1 1 1 1 § 〇 CN &lt;N X rj ί 〇 〇 1 1 § 〇 Ο 〇 Ϊ VO &gt;Λ 寸 1 1 § 〇 ο 〇 〇 i 3 VO 1 1 § 〇 ο 〇 〇\ 镩 $xc CS 〇〇 1 I 〇 § § 〇 ο 〇 00 Ο 〇 1 1 § 5; 〇 ο 〇 5'1 i' ^ 知|丨 1&quot; 1 1 | 〇 ο 〇 v〇 5 s v〇 1 1 § 〇 ο 〇 W*i (N 〇〇 1 o « § § 〇 ο 〇 寸 5 镩 o 〇 s 1 1 § § 〇 ο 〇 m ? 私 NO ir&gt; 1 1 § 〇 ο 〇 (N 5 s v〇 1 1 § S 〇 ο 〇 i pi 〇〇 〇 1 1 § § 〇 ο 〇 CL. s u υ 5 Q &lt; s OO 5 (N 0 &quot;T X 卜 &lt;N ό X 〇 Ό CN 0 寸 &gt;&lt; S g 冢 m 实 * m 冢 缆 奄 遝 寒荜龚 与®?噠 鋇 ^ 5 η 哿S域 s 201237059 〔(Νί 比較例 8 1 1 1 1 ο »-Η d VO oo 〇 ίΝ X 比較例 7 1 1 1 Ο »&quot;Η 1 yrs 〇 00 〇 &lt;Ν X 比較例 6 1 1 〇 1 1 d 3 〇 &lt;Ν X 比較例 5 〇 t 1 1 t yr\ 〇 00 v〇 (N &lt;Ν X 實施例 24 〇 〇 1 1 in o 5; 〇 Ο 〇 實施例 23 々 t 1 o 〇 Ο 〇 實施例 22 v〇 1 1 w-&gt; d (N ON 〇 Ο 〇 實施例 21 CS oo 1 1 Ο o § 〇 ο 〇 實施例 20 〇 o *—H 1 I o 〇 ο 〇 實施例 19 v〇 守 t I o (N 〇\ 〇 ο 〇 實施例 18 s v〇 1 t d m 〇\ 〇 ο 〇 實施例 17 CN OO r-H 1 ο 1 〇 〇 ο 〇 實施例 16 o o «—H 1 1 in o 窆 〇 ο 〇 實施例 15 2 1 1 *T) o m On 〇 ο 〇 實施例 14 s v〇 r—H 1 1 o (N 〇\ 〇 ο 〇 實施例 13 &lt;N OO ο 1 1 m d ON 〇 ο 〇 CEL2021P MA-DGIC Χ-40-2678 Χ-40-2720 X-40-2670 SI-100L 光度保持率[%] 焊料耐熱性試驗[個數] 熱衝擊試驗[個數] 綜合判定 環氧樹脂 硬化觸媒 i)in Si 5 # ^ ^ 硬化物 (光半導體 裝置) 201237059 又’實施例及比較例使用之成分如下。 (環氧樹脂) CEL2021P(CELLOXIDE2021P):3,4^ 氧環己基曱基 (3,4-環氧)環己烧叛酸酯、〇3丨061(股)製 MA-DGIC :異三聚氰酸單烯丙基二環氧丙酯、四國 化成工業(股)製 X-40-2678 :分子内具有2個環氧基之矽氧烷衍生物 、信越化學工業(股)製 X-40-2720 :分子内具有3個環氧基之矽氧烷衍生物 、信越化學工業(股)製 X-40-2670 :分子内具有4個環氧基之矽氧烷衍生物 、信越化學工業(股)製 (K 劑) .S -22- 201237059 is preferably 45~200°C, more preferably 1〇〇~19(rc, and even more preferably ι〇〇~ΐ8〇ι. Also, the heating time (hardening time) during hardening is not special Preferably, 30 to 600 minutes is better, more preferably 45 to 54 minutes, and even more preferably 6 to 48 minutes. When the hardening temperature and the hardening time are lower than the lower limit of the above range, the hardening is insufficient, and vice versa. When the upper limit of the above range is 値, the sorrel component may be deficient in f, and it is not preferable. The curing conditions depend on various conditions. For example, when the curing temperature is increased, the curing time is shortened, and when the curing temperature is lowered, the curing time is lengthened. The resin composition for optical semiconductor sealing of the present invention is composed of the curable epoxy resin composition of the present invention. The light of the present invention is used. In the resin composition for semiconductor sealing, it is possible to obtain a cured product which is excellent in various physical properties such as transparency, rail resistance, light resistance, and resistance to turtles, etc., and the optical semiconductor is sealed, and the illuminance is less likely to decrease with time. Optical semiconductor device In the optical semiconductor device described above, even when a light semiconductor device having a high output and a high luminance is provided, the illuminance is less likely to decrease with time. <Optical semiconductor device> The optical semiconductor device of the present invention is cured by the present invention. = resin composition (resin composition for optical semiconductor sealing) is obtained by sealing an optical semiconductor element. The seal of the 夯 邋 — 灿 于 于 于 于 兀 兀 于 于 于 于 于 于 于 于 于 于 于 于 于 于 于The material is injected into a predetermined forming mold, and the Π:: member is heat-hardened. Thereby, the optical semiconductor device can be obtained by using a hardened epoxy resin disk hard conductor member. The hardening temperature and the hardening time can be set to be the same as above. Scope. The hardening % oxygen resin composition of the moon is not limited to the above-mentioned light half-23-201237059 conductor (optical semiconductor component) sealing agent, electrical insulating material, laminated board, anti-synthesis agent, composite material, transparent Optical components, optical lenses, optical control panels, solar cell substrates, memory, etc. Uses can also be used, for example, for adhesive coating, ink, coatings, sealant substrates, Clear film, transparent film, member, optical shape, electronic paper, light-guided waveguide, light guide plate, hologram [Examples] Hereinafter, the present invention will be described in more detail based on examples, but the present invention is not limited to the examples. 1 (mixture of hardener and hardening accelerator and additive, hereinafter referred to as κ agent) Hardener (Nippon Chemical and Chemical Co., Ltd., Rikacid ΜΗ-700): 100 parts by weight, hardening accelerator (SAN-APRO) ), U-CAT 18X): 0.5 parts by weight, additive (manufactured by Wako Pure Chemical Industries, Ltd., ethylene glycol): 1 part by weight using a self-revolving stirring device (THINKY), defoaming Ryotaro AR -250) uniformly mixed and defoamed to obtain a κ agent. Production Example 2 (Epoxy Resin) Isopropyl methacrylate (Isochemical Co., Ltd., MA-DGIC), alicyclic epoxy compound (Daicel Co., Ltd., CELLOXIDE 2021P) And a oxane derivative having two or more epoxy groups in the molecule (Shin-Etsu Chemical Co., Ltd., X-40-2678; Shin-Etsu Chemical Co., Ltd., X-40-2720; Shin-Etsu Chemical Co., Ltd. Industrial (stock) system, X-40-2670), mixed according to the blending formula shown in Table 1 and Table 2 (unit: weight -24 - 201237059 injury), stirred at 80 ° C for 1 hour, thereby making the three Polycyanate monoallyl diglycidyl ester dissolved 'obtained epoxy resin (mixture). Examples 1 to 1 2, Comparative Examples 1 to 4 Examples 1 to 12' are the epoxy resins obtained in Production Example 2 and the K agents obtained in Production Example 1, according to the blending formula shown in Table ( (Unit: Weight (Part I) The components were uniformly mixed and defoamed using a self-rotating stirring device (THINKY (manufactured by the company), defoamed and ritual AR_250) to obtain a curable epoxy resin composition. Further, as shown in Table 1, in Comparative Example 1, only the alicyclic epoxy compound (CaiOXIDE 20 2 1 P, manufactured by Daicel Chemical Industry Co., Ltd.) was used for the epoxy resin. Only oxoxane derivatives having two or more epoxy groups in the molecule (Shin-Etsu Chemical Co., Ltd., X-40-2678; Shin-Etsu Chemical Co., Ltd., χ_4〇_272〇; Shin-Etsu Chemical Co., Ltd.) Industrial Co., Ltd., X-40-26 70) 'A cured epoxy resin composition is obtained in the same manner as above.>> The above-mentioned curable epoxy resin composition is cast into a lead frame of an optical semiconductor as shown in Fig. 1. After the mold (InGaN element, 3.5 mm x 2.8 mm), the film was heated in an oven (resin-hardened oven) of 1 20 c for 5 hours to obtain an optical semiconductor device obtained by sealing the LED element with a cured resin. In Fig. 1, 1 〇〇 represents a reflecting member (resin composition for light reflection), 1 〇 1 represents a metal wiring, 102 represents an LED element, 103 represents a bonding wire, and 1 〇 4 represents a transparent sealing resin (cured material). Example 1 3 to 24, Comparative Examples 5 to 8 Example 1 3 to 24' The epoxy resin and hardening catalyst obtained in Production Example 2 (Sanshin Chemical Industry Co., Ltd., SAN-AID SI-100L) According to the blending formula (unit: parts by weight) shown in Table 2, the ingredients were uniformly mixed using a self-revolving type mixing device (THINKY (manufactured by the company), degassing and ritual AR-250). Defoaming, a hardenable epoxy resin composition is obtained. Further, as shown in Table 2, in Comparative Example 5, only an alicyclic epoxy compound (manufactured by Daicel Chemical Industry Co., Ltd., CELLOXIDE 2021P) was used for the epoxy resin, and Comparative Examples 6 to 8 were only for the epoxy resin. A nonoxyl derivative having two or more epoxy groups in the molecule (manufactured by Shin-Etsu Chemical Co., Ltd., χ40-2678; Shin-Etsu Chemical Co., Ltd., X-40-2720; Shin-Etsu Chemical Co., Ltd. , x_4〇-2670), a hardenable epoxy resin composition was obtained in the same manner as described above. The above-mentioned curable epoxy resin composition was cast on a lead frame (InGaN element, 3.5 mm x 2.8 mm) of an optical semiconductor as shown in Fig. 1, and then heated at 11 ° C for 3 hours in an oven (resin-hardened oven), followed by heating for 3 hours at 11 ° C. At 14〇.加热 Heating for 4 hours, thereby obtaining an optical semiconductor device obtained by sealing a led element with a hardened resin. &lt;Evaluation&gt; The curable epoxy resin composition obtained in the examples and the comparative examples and the optical semiconductor device were subjected to an evaluation test by the following method. [Electrification test] The total light beam of the optical semiconductor device obtained in the examples and the comparative examples was measured by a full beam measuring machine (determined as a full beam of Γ 〇 hours). Further, the total light beam (defined as "total light beam after 1 hour") was measured in the constant temperature bath for a current of 6 mA for the optical semiconductor device. The photometric retention rate is calculated by the following formula. The results are shown in Table 1 'Table 2. {Photometric retention rate (%)} = {full beam (100) after 100 hours} / {full beam of light (lm)} X 1〇〇-26- 201237059 [Solder heat resistance test] Examples and comparisons The obtained optical semiconductor device (two for each curable epoxy resin composition) was subjected to moisture absorption for 168 hours under conditions of 3 (TC, 70% RH, and then subjected to heat treatment at 26 (TC for 10 seconds). 2 times. Then, the length of the crack generated by the sealing resin (cured material of the curable epoxy resin composition) of the optical semiconductor device was observed using a digital microscope (VHX-900, KEYENCE), and two lights were measured. The number of the optical semiconductor devices having a crack of 90 μm or more in the semiconductor device is shown in Tables 1 and 2. [Thermal punching test] The optical semiconductor devices obtained in the examples and the comparative examples (each hardenable epoxy) The resin composition was used for 2 minutes) in a gas atmosphere exposed to -40 Torr: for 3 minutes, and then exposed to a gas atmosphere of 100 ° C for 30 minutes to be used as a thermal shock of one cycle, using a thermal shock tester. Give 2 cycles. Then 'use a digital microscope VHX-900, KEYENCE (manufacturing)) The length of the crack generated by the sealing resin (cured material of the curable epoxy resin composition) of the optical semiconductor device was measured, and the length of the two optical semiconductor devices was measured to be 90 μm or more. The number of cracked light semiconductor devices. The results are shown in Table 1, Table 2 » [Comprehensive judgment] The photometric retention rate of the energization test is 90% or more, and the solder is heat-resistant ['s ν test and thermal shock § test) The number of optical semiconductor devices having a crack of more than the length is one, and it is judged to be 〇 (good) in the overall judgment. In addition, the overall judgment is X (bad). The results are shown in Table 1 and Table 2. -27- 201237059 inch* 1 1 1 Ο § 〇&lt;NX 1 1 1 o 1 § 〇(NX anger A3 1 1 ο ^-1 1 1 § VO 〇〇〇&lt;NX Ϊ 〇1 1 1 1 § 〇CN &lt ;NX rj ί 〇〇1 1 § 〇Ο 〇Ϊ VO &gt;Λ inch 1 1 § 〇ο 〇〇i 3 VO 1 1 § 〇ο 〇〇\ 镩$xc CS 〇〇1 I 〇§ § 〇ο 〇 00 Ο 〇1 1 § 5; 〇ο 〇5'1 i' ^ 知|丨1&quot; 1 1 | 〇ο 〇v〇5 sv〇1 1 § 〇ο 〇 W *i (N 〇〇1 o « § § 〇ο 〇 inch 5 镩o 〇s 1 1 § § 〇ο 〇m ? Private NO ir> 1 1 § 〇ο 〇 (N 5 sv〇1 1 § S 〇ο 〇i pi 〇〇〇1 1 § § 〇ο 〇CL. su υ 5 Q &lt; s OO 5 (N 0 &quot;TX 卜&lt;N ό X 〇Ό CN 0 inch&gt;&lt; S g 冢m * m 冢 奄遝 奄遝 与 与 与 与 与 2012 2012 5 5 5 5 5 2012 370 370 370 370 370 370 370 370 370 370 370 370 370 370 370 370 370 370 370 370 370 370 370 370 370 370 370 370 370 370 370 370 370 370 370 370 370 370 370 370 370 370 370 370 &quot;Η 1 yrs 〇00 〇&lt;Ν X Comparative Example 6 1 1 〇1 1 d 3 〇&lt;Ν X Comparative Example 5 〇t 1 1 t yr\ 〇00 v〇(N &lt;Ν X Example 24 〇〇1 1 in o 5; 〇Ο 〇 Example 23 々t 1 o 〇Ο 〇 Example 22 v〇1 1 w-&gt; d (N ON 〇Ο 〇 Example 21 CS oo 1 1 Ο o § 〇 ο 〇 Example 20 〇o *—H 1 I o 〇ο 〇 Example 19 v 〇 t I o (N 〇 〇 〇 〇 Example 18 sv〇1 tdm 〇 〇 〇 〇 Example 17 CN OO rH 1 ο 1 〇〇ο 〇 Example 16 oo «—H 1 1 in o 窆〇ο 〇 Example 1 5 2 1 1 *T) om On 〇ο 〇Example 14 sv〇r—H 1 1 o (N 〇\ 〇ο 〇Example 13 &lt;N OO ο 1 1 md ON 〇ο 〇CEL2021P MA-DGIC Χ -40-2678 Χ-40-2720 X-40-2670 SI-100L Photometric retention rate [%] Solder heat resistance test [number] Thermal shock test [number] Comprehensive evaluation of epoxy resin hardening catalyst i) in Si 5 # ^ ^ Hardened material (optical semiconductor device) 201237059 Further, the components used in the examples and comparative examples are as follows. (Epoxy Resin) CEL2021P(CELLOXIDE2021P): 3,4^ Oxycyclohexyldecyl (3,4-epoxy) cyclohexanol oxalate, 〇3丨061 (stock) MA-DGIC: Iso-Cyanide Acid monoallyl diglycidyl ester, X-40-2678 manufactured by Shikoku Chemicals Co., Ltd.: a cyclooxygen derivative having two epoxy groups in the molecule, X-40 manufactured by Shin-Etsu Chemical Co., Ltd. -2720: a oxane derivative having three epoxy groups in the molecule, X-40-2670 manufactured by Shin-Etsu Chemical Co., Ltd.: a cyclooxygen derivative having four epoxy groups in the molecule, Shin-Etsu Chemical Industry ( Stock system (K agent).

Rikacid ΜΗ_7〇0 : 4-曱基六氫鄰苯二甲酸野/六氣鄰 苯二甲酸酐=70/30、新日本理化(股)製 U-CAT 18X :硬化促進劑、SAN-APRO(股)製 乙二醇:和光純藥工業(股)製 (硬化觸媒) SI-100L(SAN-AID SI-100L):芳基锍鹽、=e 一所化學 工業(股)製 試驗設備 •樹脂硬化烘箱 ESPEC(股)製 GPHH-201 •恆溫槽 ESPEC(股)製小型高溫腔室 ST-120B1 -30- 201237059 •全光束測定機Rikacid ΜΗ_7〇0 : 4-mercapto hexahydrophthalic acid field / hexaphthalic phthalic anhydride = 70/30, New Japan Physicochemical (stock) U-CAT 18X: hardening accelerator, SAN-APRO Ethylene glycol: Wako Pure Chemical Industries Co., Ltd. (hardening catalyst) SI-100L (SAN-AID SI-100L): aryl sulfonium salt, =e a chemical industry (stock) test equipment • Resin Hardening oven ESPEC (stock) GPHH-201 • Thermostatic chamber ESPEC (stock) small high temperature chamber ST-120B1 -30- 201237059 • Full beam measuring machine

Optronic Laboratories公司製多重分光放射測定 系統 OL7 71 •熱衝擊試驗機Multi-spectral emission measurement system manufactured by Optronic Laboratories OL7 71 • Thermal shock tester

ESPEC(股)製小型冷熱衝擊裝置TSE-11-A *回流爐ESPEC (stock) small thermal shock device TSE-11-A * reflow furnace

曰本 ANTOM(股)製、UNI-5016F曰本 ANTOM (share) system, UNI-5016F

[產業上之可利用性] 本發明之硬化性環氧樹脂組成物,可理想地使用於 光半導體元件之密封用途。又,本發明之硬化性環氧樹 脂组成物,也可利用於黏著劑、電絕緣材、疊層板、塗 覆印墨、塗料、填封劑、抗蚀劑、複合材料、透明基 材、透明片、透明薄膜、光學元件、光學透鏡、光學構 件、光造形、電子紙、觸控面板、太陽能電池基板、光 導波路、導光板、全像記憶體等。 【圖式簡單說明】 第1圖顯示以本發明之硬化性環氧樹脂組成物將元 件(光半導體元件)密封而得之光半導體裝置之一實施形 態之概略圖。左側之圖(a)為立體圖,右側之圖(b)為剖 圖。 【主要元件符號說明】 100 反射件(光反射用樹脂組成物) 101 金屬配線 102 LED元件 103 接合導線 104 透明密封樹脂 -31-[Industrial Applicability] The curable epoxy resin composition of the present invention can be preferably used for sealing applications of optical semiconductor elements. Moreover, the curable epoxy resin composition of the present invention can also be used for an adhesive, an electrical insulating material, a laminated board, a coated ink, a coating, a potting agent, a resist, a composite material, a transparent substrate, Transparent sheets, transparent films, optical elements, optical lenses, optical members, optical shapes, electronic paper, touch panels, solar cell substrates, optical waveguides, light guides, holographic memories, and the like. [Brief Description of the Drawings] Fig. 1 is a schematic view showing an embodiment of an optical semiconductor device obtained by sealing a member (optical semiconductor element) of the curable epoxy resin composition of the present invention. The left side view (a) is a perspective view, and the right side view (b) is a cross-sectional view. [Description of main component symbols] 100 Reflector (resin composition for light reflection) 101 Metal wiring 102 LED component 103 Bonding wire 104 Transparent sealing resin -31-

Claims (1)

201237059 七、申請專利範圍: 1. 一種硬化性環氧樹脂組成物’其特徵係包含: 脂環環氧化合物(A)、與以下式(1)表示之異三聚氰 酸單烯丙基二環氧丙酯化合物(B)、與分子内具有2個以 上之ί哀氧基之矽氧烷衍生物(c)、與硬化劑(D)、與硬化 促進劑(Ε);201237059 VII. Patent application scope: 1. A curable epoxy resin composition' characterized by: an alicyclic epoxy compound (A), and an isomeric cyanuric acid monoallyl group represented by the following formula (1) a glycidyl ester compound (B), a oxoxane derivative (c) having two or more molecules in the molecule, a hardener (D), and a hardening accelerator (Ε); [式中’R1及R2表示氩原子或碳數1〜8之烷基]。 2. —種硬化性環氧樹脂組成物,其特徵係包含: 脂環環氧化合物(Α)、與以下式(1)表示之異三聚氰 酸單稀丙基二環氧丙酯化合物(Β)、與分子内具有2個以 上之環氧基之發氧烧衍生物(C)、與硬化觸媒(f);[wherein R1 and R2 represent an argon atom or an alkyl group having 1 to 8 carbon atoms]. 2. A curable epoxy resin composition, characterized by comprising: an alicyclic epoxy compound (Α), and a mono-l-propyl propylene carbonate compound represented by the following formula (1) ( Β), an oxy-oxygen derivative (C) having two or more epoxy groups in the molecule, and a curing catalyst (f); [式中’R1及R2表示氫原子或碳數1〜8之烷基]。 如申請專利範圍第1或2項之硬化性環氧樹脂組成物, 其中該分子内具有2個以上之環氧基之矽氧烷衍生物 (C)之含量’相對於成分(Α)、成分(Β)、及成分(c)之合 S -32- 201237059 計量(100重量%)為5〜60重量%。 4.如申請專利範圍第〗s=丄 至3項中任一項之硬化性環氧樹脂 組成物,其中該脂搽 衣J哀氧化合物(A)之脂環環氧基為環 氧己烯基。 5.如申請專利範圍第! s κ丄 1至4項中任一項之硬化性環氧樹脂 組成物,其中該脂環s $ 阳*衣%氧化合物(A)係以下式表示 之化合物; y' Ο[wherein R1 and R2 represent a hydrogen atom or an alkyl group having 1 to 8 carbon atoms]. The curable epoxy resin composition according to claim 1 or 2, wherein the content of the oxoxane derivative (C) having two or more epoxy groups in the molecule is relative to the component (Α), the component (Β), and the combination of the components (c) S - 32 - 201237059 The metering (100% by weight) is 5 to 60% by weight. 4. The sclerosing epoxy resin composition according to any one of the claims s= 丄 to 3, wherein the alicyclic epoxy group of the lipid oxime compound (A) is epoxy hexene base. 5. If you apply for a patent range! The sclerosing epoxy resin composition according to any one of items 1 to 4, wherein the alicyclic s $ 阳*% oxygen compound (A) is a compound represented by the following formula; y' Ο 6.—種硬化物,其係將如申請專利範圍第丨至5項中任 項之硬化性環氧樹脂組成物硬化而成。 7. —種光半導體密封用樹脂組成物,其係包含如申請 利範圍第1至5項中任一項之硬化性環氧樹脂組成物 構成。 .一種光半導體裝置,其係以如申請專利範圍第7項之光 半導體密封用樹脂組成物將光半導體元件予以密封而 獲得。 、 -33-A cured product obtained by hardening a curable epoxy resin composition according to any one of claims 5 to 5. A resin composition for sealing a photo-semiconductor comprising the curable epoxy resin composition according to any one of the first to fifth aspects of the invention. An optical semiconductor device obtained by sealing an optical semiconductor element with a resin composition for optical semiconductor sealing according to claim 7 of the patent application. , -33-
TW101100543A 2011-01-07 2012-01-06 Curable epoxy resin composition TWI535748B (en)

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