TW201232820A - Semiconductor light emitting structure - Google Patents
Semiconductor light emitting structure Download PDFInfo
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- TW201232820A TW201232820A TW100134586A TW100134586A TW201232820A TW 201232820 A TW201232820 A TW 201232820A TW 100134586 A TW100134586 A TW 100134586A TW 100134586 A TW100134586 A TW 100134586A TW 201232820 A TW201232820 A TW 201232820A
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 206
- 239000000758 substrate Substances 0.000 claims abstract description 31
- 230000000994 depressogenic effect Effects 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 4
- 239000004744 fabric Substances 0.000 claims 1
- 239000002689 soil Substances 0.000 claims 1
- 238000000605 extraction Methods 0.000 description 10
- 238000010586 diagram Methods 0.000 description 6
- 230000003247 decreasing effect Effects 0.000 description 4
- 239000004020 conductor Substances 0.000 description 3
- 238000000149 argon plasma sintering Methods 0.000 description 2
- 230000001788 irregular Effects 0.000 description 2
- 239000004575 stone Substances 0.000 description 2
- 229910002601 GaN Inorganic materials 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 1
- 235000014676 Phragmites communis Nutrition 0.000 description 1
- 230000003796 beauty Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 108090000765 processed proteins & peptides Proteins 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
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201232820201232820
i W/4y»KA 六、發明說明: 【發明所屬之技術領域】 本發明是有關於一種發光元件,且特別是有關於一種 半導體發光結構。 【先前技術】 由於發光二極體(Light-Emitting Diode,LED)具 有壽命長、體積小、低振動、散熱低、能源消耗低等優點, 發光二極體已廣泛應用於指示燈或居家光源等裝置中。近 年來,隨著多色域及高亮度的發展,發光二極體已應用在 大型顯示看板、交通號誌等。在不久的將來,發光二極體 將變得更為省電,避免環境受到破壞,以取代傳統的鎢絲 燈泡及水銀燈管。 發光二極體為半導體發光元件,其主要的組成是基材 (substrate)、蠢晶層(epitaxy layer)以及二個外部 電極。磊晶層包括N型半導體層、P型半導體層以及位於 N型及P型半導體層之間的一發光層。當發光二極體的正 極及負極兩端施加電壓時,電子將與電洞在發光層内結 合,再以光的形式發出。 然而,發光二極體其基材的折射係數通常大於半導體 層的折射係數,使得基材内大於全反射角之出射光線於基 材與半導體層之間的介面處發生全反射的問題,因而導致 大部分的光線被侷限在基材内部而無法取出,進而導致光 取出效率不佳。 201232820i W/4y»KA VI. Description of the Invention: [Technical Field] The present invention relates to a light-emitting element, and more particularly to a semiconductor light-emitting structure. [Prior Art] Since the Light-Emitting Diode (LED) has the advantages of long life, small size, low vibration, low heat dissipation, and low energy consumption, the light-emitting diode has been widely used for indicator lights or home light sources. In the device. In recent years, with the development of multi-color gamut and high brightness, light-emitting diodes have been applied to large display billboards and traffic signs. In the near future, light-emitting diodes will become more energy-efficient, avoiding environmental damage and replacing traditional tungsten filament bulbs and mercury tubes. The light-emitting diode is a semiconductor light-emitting element, and its main components are a substrate, an epitaxy layer, and two external electrodes. The epitaxial layer includes an N-type semiconductor layer, a P-type semiconductor layer, and a light-emitting layer between the N-type and P-type semiconductor layers. When a voltage is applied across the positive and negative electrodes of the light-emitting diode, electrons are combined with the holes in the light-emitting layer and then emitted as light. However, the refractive index of the substrate of the light-emitting diode is generally larger than the refractive index of the semiconductor layer, so that the problem that the emitted light of the substrate larger than the total reflection angle is totally reflected at the interface between the substrate and the semiconductor layer, thereby causing Most of the light is confined inside the substrate and cannot be removed, resulting in poor light extraction efficiency. 201232820
TW7498PA 【發明内容】 本發明係有關於一種半導體發光結構,使發光層所出 射之大部分光線能在半導體層以及基材的介面處反射或 散射,以使光能向外發射,進而提高光取出效率。 根據本發明之一方面,提出一種半導體發光結構,包 括一基材、一第一半導體層、一發光層以及一第二半導體 層:基材具有—上表面以及—下表面,上表面與下表面不 平订。第一半導體層配置於上表面。發光層配置於第一半 導體的至少一部分表面上。第二半導體層配置於發光層 上。 ⑤本發明之另一方面,提出一種半導體發光結構, 匕基材、-圖案化結構、一第一半導體層、一發光芦 以及-第二半導體層。基材具有一上表面以及一下表面: 面與下表面不平行,且上表面為—曲面、-斜面或一 A-圖案化結構凸出或凹陷於上表面,以使上表面成 第一半^的第了半導體層配置於粗化面。發光層配置於 光層、至少—部分表面上。第二半導體層配置於發 包括m出—種半導體發光結構, -二:一:有導體:,發光層以及一第二半導體層。第 导體I、有—上表面以及一下表面,上表 :千仃。發光層配置於第-半導體之上表面。第 層配置於發光層上。 弟一+導體 根據本發明之另-方面,提出一種半導體發光結構’ 4 201232820TW7498PA SUMMARY OF THE INVENTION The present invention relates to a semiconductor light emitting structure, such that most of the light emitted from the light emitting layer can be reflected or scattered at the interface of the semiconductor layer and the substrate, so that the light can be emitted outward, thereby improving light extraction. effectiveness. According to an aspect of the invention, a semiconductor light emitting structure is provided, comprising a substrate, a first semiconductor layer, a light emitting layer and a second semiconductor layer: the substrate has an upper surface and a lower surface, an upper surface and a lower surface Not flat. The first semiconductor layer is disposed on the upper surface. The light emitting layer is disposed on at least a portion of the surface of the first semiconductor. The second semiconductor layer is disposed on the light emitting layer. In another aspect of the invention, a semiconductor light emitting structure, a germanium substrate, a patterned structure, a first semiconductor layer, a light emitting reed, and a second semiconductor layer are provided. The substrate has an upper surface and a lower surface: the surface is not parallel to the lower surface, and the upper surface is a curved surface, a beveled surface or an A-patterned structure protruding or recessed on the upper surface to make the upper surface into the first half ^ The first semiconductor layer is disposed on the roughened surface. The luminescent layer is disposed on the optical layer, at least on a portion of the surface. The second semiconductor layer is disposed on the semiconductor-emitting structure, and has a conductor: a light-emitting layer and a second semiconductor layer. The first conductor I, the upper surface and the lower surface, the above table: Millennium. The light emitting layer is disposed on the upper surface of the first semiconductor. The first layer is disposed on the light emitting layer.弟一+conductor According to another aspect of the present invention, a semiconductor light emitting structure is proposed ’ 4 201232820
1 W7498PA 包括-第-半導體層、—圖案化結構、—發光層以及一第 二半導體層。第一半導體層具有一上表面以及一下表面, 上表面與下表面不平行,上表面為一曲面一斜面或一曲 折面。圖案化結構凸出或凹陷於上表面,以使上表面成為 一粗化面。發光層配置於粗化面。第二半導體層配置於發 光層上。 為了對本發明之上述及其他方面有更佳的瞭解,下文 特舉較佳實施例,並配合所附圖式,作詳細說明如下: 【實施方式】 本實粑例之半導體發光結構,係以基材的傾斜上表面 或具有圖案化結構的傾斜上表面,絲線以大於全反射角 之入射角度在基材與半導體層(P型或N型半導體層)的 父界處發生反射或散射。由於基材與半導體層的交界處相 對於發光層並非是水平面’以致於光反射或光散射之程度 明顯增加’進而提高光取出效率。 以下係提出各種實施例進行詳細說明,實施例僅用以 作為範例說明,並非用以限縮本發明欲保護之範圍。在第 -、第二類型實施例中’係以藍寶石基材、碳化石夕基材或 石夕基材做為載體,氮化鎵蟲晶層形成在上述基材上,其佑 序包括一 N型半導體層、一發光層以及- P型半導體層。 部为P型半導體層經由姓刻而顯露出部分N型半導體層之 表面。P側電極形成在P型半導體層之表面上 形成在N型半導體層之顯露表面上,使得半導體 的兩電極分別配置在對角方向的角落上或相對方1 W7498PA includes a -th semiconductor layer, a patterned structure, a light emitting layer, and a second semiconductor layer. The first semiconductor layer has an upper surface and a lower surface. The upper surface is not parallel to the lower surface, and the upper surface is a curved surface or a curved surface. The patterned structure is convex or recessed on the upper surface to make the upper surface a roughened surface. The light emitting layer is disposed on the roughened surface. The second semiconductor layer is disposed on the light emitting layer. In order to better understand the above and other aspects of the present invention, the preferred embodiments of the present invention will be described in detail below with reference to the accompanying drawings. The inclined upper surface of the material or the inclined upper surface having the patterned structure, the wire is reflected or scattered at a parent angle of the substrate and the semiconductor layer (P-type or N-type semiconductor layer) at an incident angle greater than the total reflection angle. Since the interface between the substrate and the semiconductor layer is not a horizontal plane with respect to the light-emitting layer, so that the degree of light reflection or light scattering is significantly increased, thereby improving the light extraction efficiency. The following is a detailed description of various embodiments, which are intended to be illustrative only and not to limit the scope of the invention. In the first and second types of embodiments, the sapphire substrate, the carbonized stone substrate or the stone substrate is used as a carrier, and a gallium nitride crystal layer is formed on the substrate, and the order includes a N. a semiconductor layer, a light emitting layer, and a p-type semiconductor layer. The portion is a P-type semiconductor layer which exposes a surface of a portion of the N-type semiconductor layer. The P-side electrode is formed on the surface of the P-type semiconductor layer on the exposed surface of the N-type semiconductor layer such that the two electrodes of the semiconductor are respectively disposed at corners in the diagonal direction or opposite sides
201232820 TW7498PA 側上,如第17A〜17H圖所示之俯視圖。 在第三、四類型實施例中,銦化鎵磊晶層依序包括一 N型半導體層、一發光層以及一 p型半導體層。兩個相對 側的電極分別形成在p型半導體層之上表面以及N型半導 體層之下表面。其中一電極(P側電極或N側電極)的配 置方式如第18A〜18E圖之俯視圖所示。 第一類型實施例 請參照第1A及1B圖,其繪示依照本發明一實施例之 半導體發光結構的剖面示意圖。半導體發光結構丨〇〇包括 一基材110、一第一半導體層120、一發光層13〇、一第二 半導體層140以及二個電極122、124。基材11〇具有一上 表面112以及一下表面114。上表面112與下表面114不 平行。第一半導體層120配置於上表面112。發光層13〇 配置於第一半導體層12〇的至少一部分表面上。第二半導 體層140配置於發光層13〇上。在一實施例中,上表面112 可為一斜面,向左傾斜或向右傾斜。上表面112相對於下 表面114的傾斜角0約為5〜3〇度左右,但不此為限。發 光層130朝上表面112射出的光線s可被反射或散射至半 導體發光結構1〇〇之左侧或右侧,以避開位於半導體發光 結構100上方之二電極122、124。 清參照第2A及2B圖’其繪示依照本發明一實施例之 半導體發光結構的剖面示意圖。本實施例之半導體發光結 構之形式與第1A及1B圖所示之半導體發光結構1〇〇相 似,相同的標號不再標示,其差異在於:上表面112具有 201232820201232820 TW7498PA side view, as shown in the figure 17A~17H. In the third and fourth types of embodiments, the indium gallium delphiide epitaxial layer sequentially includes an N-type semiconductor layer, a light-emitting layer, and a p-type semiconductor layer. Two opposite side electrodes are respectively formed on the upper surface of the p-type semiconductor layer and the lower surface of the N-type semiconductor layer. One of the electrodes (P side electrode or N side electrode) is arranged as shown in the top view of Figs. 18A to 18E. First Type Embodiment Referring to Figures 1A and 1B, there are shown schematic cross-sectional views of a semiconductor light emitting structure in accordance with an embodiment of the present invention. The semiconductor light emitting structure includes a substrate 110, a first semiconductor layer 120, a light emitting layer 13A, a second semiconductor layer 140, and two electrodes 122, 124. The substrate 11 has an upper surface 112 and a lower surface 114. Upper surface 112 is not parallel to lower surface 114. The first semiconductor layer 120 is disposed on the upper surface 112. The light emitting layer 13 is disposed on at least a portion of the surface of the first semiconductor layer 12A. The second semiconductor layer 140 is disposed on the light-emitting layer 13A. In an embodiment, the upper surface 112 can be a sloped surface that slopes to the left or to the right. The inclination angle 0 of the upper surface 112 with respect to the lower surface 114 is about 5 to 3 degrees, but is not limited thereto. The light ray s emitted from the light-emitting layer 130 toward the upper surface 112 can be reflected or scattered to the left or right side of the semiconductor light-emitting structure 1 , to avoid the two electrodes 122, 124 located above the semiconductor light-emitting structure 100. 2A and 2B are views showing a cross-sectional view of a semiconductor light emitting structure in accordance with an embodiment of the present invention. The semiconductor light-emitting structure of this embodiment is similar in form to the semiconductor light-emitting structure 1A shown in Figs. 1A and 1B, and the same reference numerals are not shown, the difference being that the upper surface 112 has 201232820
I W749»PA 一傾斜凹陷部111或一傾斜凸出部113,可朝左右兩側傾 斜。傾斜凹陷部111或傾斜凸出部113具有一第一斜面 112a以及一第二斜面112b,連接於一交界線L上。第一 斜面112a與第二斜面112b相對於下表面114分別具有5 〜30度左右之傾斜角01、02,但不此為限。發光層13〇 朝傾斜的上表面射出的光線可被反射或散射至半導體發 光結構100之左側及右側,以避開位於半導體發光結構1〇〇 上方之二電極122、124。 請參照第3A及3B圖’其繪示依照本發明一實施例之 半‘體發光結構的剖面示意圖。本實施例之半導體發光結 構之形式與第1A及1B圖所示之半導體發光結構1〇〇相 似,相同的標號不再標示,其差異在於:上表面112為一 曲折面,其具有兩個傾斜凹陷部115、116或兩個傾斜凸 出部117、118,其數量不加以限制。每一個傾斜凹陷部 U5、116或傾斜凸出部117、118具有第一斜面n2a以及 第二斜面112b,其連接於各自的交界線L上。第一斜面 心與第二斜面112b相對於下表® 114分別具有5〜30 度左右之傾斜角’但不此為限。發光層13G朝曲折的上表 面射出的光線可被反射或散射至半導體發光結構剛之左 側及右側’以避開位於半導體發光結構_上方之二電極 =參照第4A及4B圖,其綠示依照本發明—實施例之 巷導,發光結構的剖面示意圖。本實施例之半導體發光結 ^之,式與第u及1β圖所示之半導體發光結構100相 似’相同的標號不再標示,其差異在於:上表面為一曲面 201232820I W749»PA An inclined recess 111 or an inclined projection 113 can be inclined toward the left and right sides. The inclined recessed portion 111 or the inclined convex portion 113 has a first inclined surface 112a and a second inclined surface 112b connected to a boundary line L. The first inclined surface 112a and the second inclined surface 112b have inclination angles 01 and 02 of about 5 to 30 degrees with respect to the lower surface 114, respectively, but are not limited thereto. The light emitted from the light-emitting layer 13A toward the inclined upper surface may be reflected or scattered to the left and right sides of the semiconductor light-emitting structure 100 to avoid the two electrodes 122, 124 located above the semiconductor light-emitting structure 1''. Referring to Figures 3A and 3B, a cross-sectional view of a half-body light emitting structure in accordance with an embodiment of the present invention is shown. The semiconductor light-emitting structure of the present embodiment has a form similar to that of the semiconductor light-emitting structure 1A shown in FIGS. 1A and 1B, and the same reference numerals are not used. The difference is that the upper surface 112 is a meandering surface having two tilts. The number of the recesses 115, 116 or the two inclined projections 117, 118 is not limited. Each of the inclined recessed portions U5, 116 or the inclined convex portions 117, 118 has a first inclined surface n2a and a second inclined surface 112b which are connected to the respective boundary lines L. The first beveled face and the second beveled face 112b have an inclination angle of about 5 to 30 degrees with respect to the lower table ® 114, respectively, but are not limited thereto. The light emitted from the light-emitting layer 13G toward the upper surface of the meandering may be reflected or scattered to the left and right sides of the semiconductor light-emitting structure to avoid the two electrodes located above the semiconductor light-emitting structure _ reference to Figures 4A and 4B, and the green color is in accordance with the present EMBODIMENT OF THE INVENTION - A schematic view of a cross-section of a light-emitting structure. The semiconductor light-emitting junction of the present embodiment has the same reference numerals as the semiconductor light-emitting structure 100 shown in the u and 1β patterns, and the difference is that the upper surface is a curved surface 201232820
TW7498PA 112c,而曲面112C上之切線τ的斜率由一側往另一侧漸 增或漸減,以形成一凹狀曲面或一凸狀曲面,如第4Α及 4Β圖所示。通過凹狀曲面或凸狀曲面之切線τ相對於下表 面114具有0〜30度左右之傾斜角。發光層13〇朝曲面U2c 射出的光線可被反射或散射至半導體發光結構1〇〇之左側 或右側,以避開位於半導體發光結構1〇〇上方之二電極 122 、 124 。 凊參照第5A及5B圖,其繪示依照本發明一實施例之 半導體發光結構的剖面示意圖。在第^及2B圖中繪示的 第一斜面112a與第二斜面112b分別具有不同的傾斜角, 即0 1关02,但在本實施例中’傾斜凹陷部ln或傾斜凸 出部113位於基材11〇中央,且第一斜面U2a與第二斜 面112b具有相同的傾斜角,即01= 02。第一斜面112& 與第二斜面112b相對於下表面丨丨4之傾斜角約5〜3〇度 左右,但不此為限。 第二類型實施例 請參照第6A〜6C圖,其繪示依照本發明一實施例之 半導體發光結構的剖面示意圖。半導體發光結構2〇〇包括 一基材210、一圖案化結構2〇2、一第一半導體層22〇、一 ^光層230以及一第一半導體層240。基材210具有一上 表面212以及一下表面214。上表面212與下表面214不 平行。上表面212可為一曲面、一斜面或一曲折面。圖案 化結構202凸出或凹陷於上表面212,以使上表面212成 為一粗化面。第一半導體層220配置於粗化上表面212。 201232820TW7498PA 112c, and the slope of the tangent τ on the curved surface 112C is gradually increased or decreased from one side to the other to form a concave curved surface or a convex curved surface, as shown in Figures 4 and 4. The tangent τ passing through the concave curved surface or the convex curved surface has an inclination angle of about 0 to 30 degrees with respect to the lower surface 114. The light emitted from the light-emitting layer 13 〇 toward the curved surface U2c can be reflected or scattered to the left or right side of the semiconductor light-emitting structure 1 , to avoid the two electrodes 122, 124 located above the semiconductor light-emitting structure 1A. Referring to Figures 5A and 5B, there are shown cross-sectional views of a semiconductor light emitting structure in accordance with an embodiment of the present invention. The first inclined surface 112a and the second inclined surface 112b shown in FIGS. 2 and 2B respectively have different inclination angles, that is, 0 1 off 02, but in the present embodiment, the 'inclined concave portion ln or the inclined convex portion 113 is located. The substrate 11 is centrally located, and the first slope U2a and the second slope 112b have the same inclination angle, that is, 01=02. The inclination angle of the first slope 112 & and the second slope 112b with respect to the lower surface 丨丨 4 is about 5 to 3 degrees, but is not limited thereto. Second Type of Embodiment Referring to Figures 6A to 6C, there are shown schematic cross-sectional views of a semiconductor light emitting structure in accordance with an embodiment of the present invention. The semiconductor light emitting structure 2 includes a substrate 210, a patterned structure 2, a first semiconductor layer 22, a light layer 230, and a first semiconductor layer 240. Substrate 210 has an upper surface 212 and a lower surface 214. Upper surface 212 is not parallel to lower surface 214. The upper surface 212 can be a curved surface, a beveled surface, or a meandering surface. The patterned structure 202 is convex or recessed on the upper surface 212 such that the upper surface 212 becomes a roughened surface. The first semiconductor layer 220 is disposed on the roughened upper surface 212. 201232820
Ί W7498FA 發光層230配置於第一半導體層22〇的至少一部分表面 上。第二半導體層240配置於發光層23〇上。在第6Α圖 中所繪示之圓形區域已放大為第21Α圖及第21β圖。請參 '、、、第21Α及第21Βϋ ’上表面212為-斜面,且圖案化結 構202具有多個尖端部2〇4,此些尖端部204之中線c實 貝上垂直上表面212 (第21Α圖)或垂直下表面214 (第 21Β圖)。另外,在第6(]圖之實施例中,上表面為一曲面 212c,且圖案化結構202具有多個尖端部2〇4,此些尖端 4 204之中線c貫質上與對應通過曲面212c之切線τ相 互垂直。 a在第6B圖之實施例中,上表面212具有一傾斜凹陷 部211 f或一傾斜凸出部,如第2β圖)。傾斜凹陷部 具有一第一斜面212a以及一第二斜面212b,連接於一交Ί W7498FA The light emitting layer 230 is disposed on at least a portion of the surface of the first semiconductor layer 22A. The second semiconductor layer 240 is disposed on the light emitting layer 23A. The circular area shown in Fig. 6 has been enlarged to the 21st and 21st. Referring to ',, 21, 21 and 21', the upper surface 212 is a bevel, and the patterned structure 202 has a plurality of tip portions 2〇4, wherein the tip portion 204 has a vertical upper surface 212 on the line c Figure 21) or vertical lower surface 214 (Fig. 21). In addition, in the embodiment of FIG. 6 , the upper surface is a curved surface 212c, and the patterned structure 202 has a plurality of tip portions 2〇4, and the lines c of the tips 4 204 are consistently intersected and correspondingly curved. The tangent τ of 212c is perpendicular to each other. a In the embodiment of Fig. 6B, the upper surface 212 has an inclined depressed portion 211f or an inclined convex portion, such as the second β-Fig. The inclined recess has a first inclined surface 212a and a second inclined surface 212b connected to the intersection
界線L上。除了圖案化結構202之外,本實施例與第2A 圖所不之結構相似。圖案化結構2〇2具有多個尖端部 此些尖端部204之中線C實質上垂直第一斜面2心或第 二斜面212b。 ,明參七、第7A〜7C圖,其繪示依照本發明一實施例之 半導體發光結構的剖面示意圖。當上表面212具有一傾斜 凹陷部211 (或一傾斜凸出部,如帛2B圖),圖案化結構 202包括夕個微透鏡2〇5,凸出或凹陷於上表面。微透 鏡205的^r圖形可為半圓形、錐形、四邊形或梯形。在 第7B圖之實施例中,更可形成—布拉格反射層 206於基 材210的上表面212,以增加光取出效率。 。月參肽第8A〜8F圖,其繪示依照本發明一實施例之 201232820On the line L. This embodiment is similar to the structure of FIG. 2A except for the patterned structure 202. The patterned structure 2〇2 has a plurality of tip portions. The line C among the tip portions 204 is substantially perpendicular to the first bevel 2 or the second bevel 212b. FIG. 7A to FIG. 7C are cross-sectional views showing a semiconductor light emitting structure according to an embodiment of the present invention. When the upper surface 212 has a slanted recess 211 (or a slanted projection, such as 帛 2B), the patterned structure 202 includes a singular microlens 2〇5 that protrudes or is recessed on the upper surface. The pattern of the micro lens 205 may be semicircular, tapered, quadrangular or trapezoidal. In the embodiment of Fig. 7B, a Bragg reflection layer 206 may be formed on the upper surface 212 of the substrate 210 to increase light extraction efficiency. . Figure 8A-8F of the monthly reference peptide, which is shown in accordance with an embodiment of the present invention 201232820
TW7498PA 半導體發光結構的剖面示意圖。圖案化結構2〇2包括多個 柱狀部207a,此些柱狀部2〇7a之頂面以多個位於相鄰柱 狀部207a之間的凹槽2〇7b相互分離。此些柱狀部2〇7a 之所有頂面以曲形或錐形型態鋪設,且各個柱狀部2〇7a 的高度呈高低變化,例如漸高或漸低。在第8A〜8C圖之 實施例中,此些柱狀部2〇7a之所有頂面構成一向内彎曲 的輪廓或一向内傾斜的輪廓,而高度最低的柱狀部2〇7& 係位於圖案化結構202的中央處。在第8D〜8F的實施例 中此些柱狀部2 0 7a之所有頂面構成一向外弯曲的輪廓 或一向外傾斜的輪廓’而高度最高的柱狀部2〇7a係位於 圖案化結構202的中央處。 根據第二類型實施例,上表面212可為一曲面、一斜 面或一曲折面。圖案化結構202可具有規律的幾何圖案及 /或不規律的幾何圖案,例如是微透鏡、尖端部或柱狀部 等’以避免基材210内大於全反射角之出射光線於基材21〇 與半導體層220之間的介面處發生全反射的問題,而導致 大部分的光線被侷限在基材210内部。由於光可從基材210 向外射出,因而增加發光二極體的光取出效率。 第三類型實施例 請參照第9圖,其繪示依照本發明一實施例之半導體 發光結構的剖面示意圖。半導體發光結構3〇〇包括一第一 半導體層310、一發光層320、一第二半導體層330以及 二個位於相對側之電極322、324。電極322、324分別配 置於第一半導體層310的下方與第二半導體層330上方的 201232820Schematic diagram of the TW7498PA semiconductor light-emitting structure. The patterned structure 2〇2 includes a plurality of columnar portions 207a, and the top surfaces of the columnar portions 2〇7a are separated from each other by a plurality of grooves 2〇7b between the adjacent columnar portions 207a. All of the top surfaces of the columnar portions 2〇7a are laid in a curved or tapered shape, and the heights of the respective columnar portions 2〇7a vary in height, for example, gradually increasing or decreasing. In the embodiment of Figures 8A-8C, all of the top surfaces of the columnar portions 2〇7a constitute an inwardly curved profile or an inwardly inclined profile, and the lowest height columnar portion 2〇7& At the center of the structure 202. In the embodiments of FIGS. 8D-8F, all of the top surfaces of the columnar portions 2 0 7a form an outwardly curved profile or an outwardly inclined profile and the highest height columnar portion 2〇7a is located in the patterned structure 202. Central office. According to a second type of embodiment, the upper surface 212 can be a curved surface, a beveled surface or a meandering surface. The patterned structure 202 can have a regular geometric pattern and/or an irregular geometric pattern, such as a microlens, a tip or a column, etc. to avoid exiting light from the substrate 21 that is greater than the total reflection angle in the substrate 210. The problem of total reflection occurs at the interface with the semiconductor layer 220, causing most of the light to be confined inside the substrate 210. Since light can be emitted outward from the substrate 210, the light extraction efficiency of the light emitting diode is increased. Third Type Embodiment Referring to Figure 9, a cross-sectional view of a semiconductor light emitting structure in accordance with an embodiment of the present invention is shown. The semiconductor light emitting structure 3 includes a first semiconductor layer 310, a light emitting layer 320, a second semiconductor layer 330, and two electrodes 322, 324 on opposite sides. The electrodes 322 and 324 are respectively disposed under the first semiconductor layer 310 and above the second semiconductor layer 330 201232820
里 W 中央。第一半導體層310具有一上表面312以及一下表面 314。上表面312與下表面314不平行。發光層320配置 於第一半導體層310之上表面312。第二半導體層330配 置於發光層320上。在一實施例中,上表面312可為一斜 面,向左傾斜或向右傾斜。上表面312相對於下表面314 的傾斜角0約為5〜30度左右,但不此為限。發光層32〇 由上表面312射出的光線可被射向半導體發光結構3〇〇之 左側或右側,以避開位於半導體發光結構3〇〇上方及下方 之二電極322、324。 明參照第10A及10B圖,其繪示依照本發明一實施例 之半導體發光結構的剖面示意圖。本實施例之半導體發光 結構與第9圖所示之半導體發光結構3〇〇相似,相同的標 號不再‘示,其差異在於.上表面3丨2具有一傾斜凹陷部 311或一傾斜凸出部313,可朝左右兩侧傾斜。凹陷部Μ】 或凸出部313具有一第一斜面312a以及一第二斜面 312b ’連接於一交界線L上。第一斜面3心與第二斜面 312b相對於下表面314分別具有5〜3〇度左右之傾斜角θ 1 02,但不此為限。發光層320由傾斜的上表面312射 出的光線可被射向半導體發光結構3〇〇之左侧及右側,以 避開位於半導體發光結構3〇〇上方及下方之二電極322、 324。 ,請參照第11A及11B圖’其緣示依照本發明一實施例 =半導體發光結構的剖面示意圖。本實施例之半導體發光 、门。構之形式與第9圖所示之半導體發光結構_相似,相 问的標號不再標示,其差異在於:上表fi312為一曲折面, 11 201232820W Central. The first semiconductor layer 310 has an upper surface 312 and a lower surface 314. Upper surface 312 is not parallel to lower surface 314. The light emitting layer 320 is disposed on the upper surface 312 of the first semiconductor layer 310. The second semiconductor layer 330 is disposed on the light emitting layer 320. In an embodiment, the upper surface 312 can be a bevel that slopes to the left or to the right. The inclination angle 0 of the upper surface 312 with respect to the lower surface 314 is about 5 to 30 degrees, but is not limited thereto. The light emitted from the upper surface 312 of the light-emitting layer 32A can be directed to the left or right side of the semiconductor light-emitting structure 3A to avoid the two electrodes 322, 324 located above and below the semiconductor light-emitting structure 3A. Referring to Figures 10A and 10B, there are shown cross-sectional views of a semiconductor light emitting structure in accordance with an embodiment of the present invention. The semiconductor light emitting structure of the present embodiment is similar to the semiconductor light emitting structure 3A shown in FIG. 9, and the same reference numerals are not shown, except that the upper surface 3丨2 has an inclined depressed portion 311 or an oblique convex portion. The portion 313 can be inclined to the left and right sides. The recessed portion 313 has a first inclined surface 312a and a second inclined surface 312b' connected to a boundary line L. The first inclined surface 3 and the second inclined surface 312b have an inclination angle θ 1 02 of about 5 to 3 degrees with respect to the lower surface 314, respectively, but are not limited thereto. The light emitted from the inclined upper surface 312 of the light-emitting layer 320 can be directed to the left and right sides of the semiconductor light-emitting structure 3A to avoid the two electrodes 322, 324 located above and below the semiconductor light-emitting structure 3A. Referring to Figures 11A and 11B, there is shown a cross-sectional view of a semiconductor light emitting structure in accordance with an embodiment of the present invention. The semiconductor light-emitting device and the door of this embodiment. The form of the structure is similar to that of the semiconductor light-emitting structure shown in Fig. 9, and the reference numerals are no longer indicated, and the difference is that the above table fi312 is a meandering surface, 11 201232820
I W7498PA 其具有兩個凹陷部315、316或兩個凸出部317、gig,其 數量不加以限制。每一個凹陷部315、316或凸出部317、 318具有第一斜面312a以及第二斜面312b,其連接於各 自的交界線L上。第一斜面312a與第二斜面312b相對於 下表面314分別具有5〜30度左右之傾斜角,但不此為 限。發光層320由曲折的上表面312射出的光線可被射向 半導體發光結構300之左侧及右侧,以避開位於半導體發 光結構300上方及下方之二電極322、324。 請參照第12A及12B圖,其繪示依照本發明一實施例 之半導體發光結構的剖面示意圖。本實施例之半導體發光 結構之形式與第9圖所示之半導體發光結構3〇〇相似,相 同的標號不再標示,其差異在於:上表面為一曲面312c, 而曲面312c上之切線τ的斜率由一侧往另一側漸增或漸 減,以形成一凹狀曲面或一凸狀曲面,如第12A及⑽圖 所示。通過凹狀曲面或凸狀曲面之切線τ相對於下表面314 具有〇〜30度左右之傾斜角。發光層32〇由曲面31&射 出的光線可被射向半導體發光結構3〇〇之左側及右側,以 避開位於半導體發光結構300上方之二電極322、324。 請參照第13Α及13Β ϋ,其緣示依照本發明—實施例 之半導體發光結構的剖面示意圖。在第1〇Α及1〇Β圖中繪 示的第-斜面312a與第二斜面312b分別具有不同的傾斜 角即0 1竽0 2,但在本實施例中,傾斜凹陷部311或傾 斜凸出部313位於第-半導體層31()中央,且第一斜面 312a與第一斜面312b具有相同的傾斜角,即 第斜面312a與第二斜面312b相對於下表面314之傾斜 12 201232820I W7498PA has two recesses 315, 316 or two projections 317, gig, the number of which is not limited. Each of the recesses 315, 316 or projections 317, 318 has a first bevel 312a and a second bevel 312b that are coupled to respective boundary lines L. The first inclined surface 312a and the second inclined surface 312b have inclination angles of about 5 to 30 degrees with respect to the lower surface 314, respectively, but are not limited thereto. The light emitted from the curved upper surface 312 of the light-emitting layer 320 can be directed to the left and right sides of the semiconductor light-emitting structure 300 to avoid the two electrodes 322, 324 located above and below the semiconductor light-emitting structure 300. Referring to Figures 12A and 12B, there are shown cross-sectional views of a semiconductor light emitting structure in accordance with an embodiment of the present invention. The form of the semiconductor light emitting structure of the present embodiment is similar to that of the semiconductor light emitting structure 3A shown in FIG. 9, and the same reference numerals are not shown, the difference is that the upper surface is a curved surface 312c, and the tangent line τc on the curved surface 312c The slope is gradually increased or decreased from one side to the other to form a concave curved surface or a convex curved surface as shown in Figs. 12A and (10). The tangent τ passing through the concave curved surface or the convex curved surface has an inclination angle of about -30 degrees with respect to the lower surface 314. The light emitted from the curved surface 31& can be directed to the left and right sides of the semiconductor light emitting structure 3A to avoid the two electrodes 322, 324 located above the semiconductor light emitting structure 300. Referring to Figures 13 and 13A, there is shown a schematic cross-sectional view of a semiconductor light emitting structure in accordance with the present invention. The first inclined surface 312a and the second inclined surface 312b shown in FIGS. 1 and 1 respectively have different inclination angles, that is, 0 1 竽 0 2, but in the present embodiment, the inclined concave portion 311 or the inclined convex portion The output portion 313 is located at the center of the first semiconductor layer 31 (), and the first inclined surface 312a and the first inclined surface 312b have the same inclination angle, that is, the inclination of the first inclined surface 312a and the second inclined surface 312b relative to the lower surface 314 12 201232820
1 W7498PA 角約5〜30度左右,但不此為限。 根據第二類型實施例,上表面312可為一曲面、一斜 面或一曲折面。由於第一半導體層31〇與發光層32〇之間 的介面並非是水平面,可避免光被電極反射,因而光散射 及向外出射明顯增加,進而增加光取出效率。 第四類型之實施例 明參恥第14A〜14C圖,其緣示依照本發明一實施例 之半導體發光結構的剖面示意圖。半導體發光結構4〇〇包 括一第一半導體層41〇、一圖案化結構4〇2、一發光層42〇、 第一半導體層430以及兩個位於相對側之電極422、 424。第一半導體層410具有一上表面412以及一下表面 414。上表面412與下表面414不平行。上表面412可為 一曲面、一斜面或一曲折面。圖案化結構4〇2凸出或凹陷 於上表面412’以使上表面412成為一粗化面。發光層420 配置於粗化上表面412。第二半導體層430配置於發光層 420上。在第14A圖中所繪示之之圓形區域已放大為第2U 圖及第21B圖。請參照第21A及第21B圖,上表面412為 一傾面’且圖案化結構402具有多個尖端部404,此些尖 端部404之中線C實質上垂直上表面412 (第21A圖)或 垂直下表面414(第21B圖)。另外,在第14C圖之實施例 中,上表面為一曲面412c ’且圖案化結構402具有多個尖 端部404 ’此些尖端部404之中線C實質上與對應通過曲 面412c之切線T相互垂直。 在第14B圖之實施例中’上表面412具有一傾斜凸出 13 201232820 I W74V8PA 部411 (或一傾斜凹陷部’如第10A圖)。傾斜凸出部411 具有一第一斜面412a以及一第二斜面412b,連接於一交 界線L上。除了圖案化結構402之外,本實施例與第1 圖所示之結構相似。圖案化結構402具有多個尖端部404, 此些尖端部404之中線C實質上垂直第—斜面412a或第 二斜面412b。 請參照第15A〜15C圖’其繪示依照本發明一實施例 之半導體發光結構的剖面示意圖。當上表面412具有一傾 斜凸出部411 (或一傾斜凹陷部,如第ι〇Α圖),圖案化結 構402包括多個微透鏡405’凸出或凹陷於上表面412。 微透鏡405的幾何圖形可為半圓形、錐形、四邊形或梯形。 在第7B圖之實施例中,更可形成一布拉格反射層4〇6於 第一半導體層410的上表面412’以增加光取出效率。、 請參照第16A〜16F圖’其繪示依照本發明一實施例 之半導體發光結構的剖面示意圖。圖案化結構4〇2包括多 個柱狀部407a’此些柱狀部407a之頂面以多個位於相鄰 柱狀部407a之間的凹槽407b相互分離。此些杈狀部4〇7a 之所有頂面以曲形或錐形型態鋪設,且夂乂 _ 谷個柱狀部407a 的高度呈高低變化,例如漸高或漸低。扃 —-在第16A〜16C圖 之實施例中’此些柱狀部407a之所有頂品诚 、 貝面構成一向内彎 曲的輪廓或一向内傾斜的輪廓’而高度喿 夂取低的桎肤都4n7 係位於圖案化結構402的中央處。在第 乐16D〜〗βρ沾香始 例中,此些柱狀部407a之所有頂面構 ▲、貫 靡或-向外傾斜的輪廓,而高度最高的枝狀:外·f曲的輪 於圖案化結構402的中央處。 4 407a’係位 2012328201 W7498PA angle is about 5~30 degrees, but not limited to this. According to a second type of embodiment, the upper surface 312 can be a curved surface, a beveled surface or a meandering surface. Since the interface between the first semiconductor layer 31 and the light-emitting layer 32 is not a horizontal surface, light can be prevented from being reflected by the electrodes, so that light scattering and outward emission are significantly increased, thereby increasing light extraction efficiency. The fourth type of embodiment is shown in Figs. 14A to 14C, which is a schematic cross-sectional view of a semiconductor light emitting structure according to an embodiment of the present invention. The semiconductor light emitting structure 4 includes a first semiconductor layer 41, a patterned structure 4, a light emitting layer 42A, a first semiconductor layer 430, and two electrodes 422, 424 on opposite sides. The first semiconductor layer 410 has an upper surface 412 and a lower surface 414. Upper surface 412 is not parallel to lower surface 414. Upper surface 412 can be a curved surface, a beveled surface, or a meandering surface. The patterned structure 4〇2 is convex or recessed on the upper surface 412' such that the upper surface 412 becomes a roughened surface. The light emitting layer 420 is disposed on the roughened upper surface 412. The second semiconductor layer 430 is disposed on the light emitting layer 420. The circular area depicted in Fig. 14A has been enlarged to the 2Uth and 21st. Referring to FIGS. 21A and 21B, the upper surface 412 is a tilting surface' and the patterned structure 402 has a plurality of tip portions 404, wherein the line C of the tip portions 404 is substantially perpendicular to the upper surface 412 (FIG. 21A) or Vertical lower surface 414 (Fig. 21B). In addition, in the embodiment of FIG. 14C, the upper surface is a curved surface 412c' and the patterned structure 402 has a plurality of tip portions 404'. The line C of the tip portions 404 is substantially opposite to the tangent T corresponding to the curved surface 412c. vertical. In the embodiment of Fig. 14B, the upper surface 412 has an oblique projection 13 201232820 I W74V8PA portion 411 (or an inclined depression portion as shown in Fig. 10A). The inclined projection 411 has a first inclined surface 412a and a second inclined surface 412b connected to a boundary line L. This embodiment is similar to the structure shown in Fig. 1 except for the patterned structure 402. The patterned structure 402 has a plurality of tips 404, and the lines C of the tips 404 are substantially perpendicular to the first bevel 412a or the second bevel 412b. Referring to Figures 15A-15C, a schematic cross-sectional view of a semiconductor light emitting structure in accordance with an embodiment of the present invention is shown. When the upper surface 412 has a sloped projection 411 (or an oblique depression, such as the first imaginary), the patterned structure 402 includes a plurality of microlenses 405' that are convex or concave on the upper surface 412. The geometry of the microlens 405 can be semi-circular, tapered, quadrangular or trapezoidal. In the embodiment of Fig. 7B, a Bragg reflection layer 4?6 is further formed on the upper surface 412' of the first semiconductor layer 410 to increase light extraction efficiency. Referring to FIGS. 16A-16F, a cross-sectional view of a semiconductor light emitting structure in accordance with an embodiment of the present invention is shown. The patterned structure 4〇2 includes a plurality of columnar portions 407a'. The top surfaces of the columnar portions 407a are separated from each other by a plurality of grooves 407b between the adjacent columnar portions 407a. All of the top surfaces of the weir portions 4〇7a are laid in a curved or conical shape, and the height of the __ valley columnar portions 407a varies in height, for example, gradually increasing or decreasing.扃--In the embodiment of Figures 16A-16C, 'all of the tops of the columnar portions 407a, the beauties constitute an inwardly curved profile or an inwardly inclined profile' and the height is low. Both 4n7 are located at the center of the patterned structure 402. In the first example of the first 16th to the ρβρ scent, all the top surfaces of the columnar portions 407a are structured by ▲, 靡 or - outwardly inclined, and the highest height of the branches: the outer and the outer At the center of the patterned structure 402. 4 407a’ position 201232820
TW7498PA 根據第四類型實施例,上表面412可為一曲面、一斜 面或一曲折面。圖案化結構402可具有規律的幾何圖案及 /或不規律的幾何圖案,例如是微透鏡、尖端部或柱狀部 407a等,以避免第一半導體層41〇内大於全反射角之出射 光線於發光層420與第一半導體層41〇之間的介面處發生 全反射的問題,而導致大部分的光線被侷限在第一半導體 層410内部。由於光可從第一半導體層31〇向外射出,因 而增加發光二極體的光取出效率。 請參照第17A〜17H圖,其繪示依照本發明第一類型 實施例之半導體發光結構的俯視圖。上表面412具有多個 等高線P1〜P3 ’此些等高線P1〜P3分別以矩形形式或以 線條排列,以表示連續排列之等高線之間的高度差異。根 據等高線P1〜P3之分佈以及各個電極122、124的位置, 上表面112的傾斜程度以及表面輪靡可被緣製出來,以達 到最佳化光取出效率。在第17A、17C及17H圖之實施例 中’將電極124配置在最高或最低的等高線μ中。在 第17B 17F及17G圖之實施例中,將二個電極1 μ、124 配置在相同高度的等高線P3上。在第17D及m圖之實 施例中冑-個電極122、124配置在不同高度的等高線 上P卜P2。 明多…、第18A〜18E圖,其綠示依照本發明第三類型 實施例之半導體發光結構的俯視圖。第一半導體層的 上表面412具有多個等高線P1〜P2,此些等高線P1〜P2 /刀別以,㈣式或以線條排列,以表示連續排列之等高線 之間的高度差異。根據等高線P1〜P2之分佈以及電極324 15 201232820TW7498PA According to a fourth type of embodiment, the upper surface 412 can be a curved surface, a beveled surface or a meandering surface. The patterned structure 402 may have a regular geometric pattern and/or an irregular geometric pattern, such as a microlens, a tip portion or a columnar portion 407a, etc., to avoid exiting light in the first semiconductor layer 41 that is larger than the total reflection angle. A problem of total reflection occurs at the interface between the light-emitting layer 420 and the first semiconductor layer 41, and most of the light is confined inside the first semiconductor layer 410. Since light can be emitted from the first semiconductor layer 31, the light extraction efficiency of the light-emitting diode is increased. Referring to Figures 17A to 17H, there are shown top views of a semiconductor light emitting structure in accordance with a first type of embodiment of the present invention. The upper surface 412 has a plurality of contour lines P1 to P3'. These contour lines P1 to P3 are respectively arranged in a rectangular form or in a line to indicate a difference in height between successively arranged contour lines. Depending on the distribution of the contour lines P1 to P3 and the positions of the respective electrodes 122, 124, the degree of inclination of the upper surface 112 and the surface rim can be edged to achieve optimum light extraction efficiency. In the embodiment of Figs. 17A, 17C and 17H, the electrode 124 is disposed in the highest or lowest contour line μ. In the embodiment of Figs. 17B 17F and 17G, the two electrodes 1 μ, 124 are arranged on the contour P3 of the same height. In the embodiment of Figures 17D and m, the electrodes 122, 124 are arranged on contours of different heights P P2. Fig. 18A to Fig. 18E, which is a plan view showing a semiconductor light emitting structure according to a third type of embodiment of the present invention. The upper surface 412 of the first semiconductor layer has a plurality of contour lines P1 to P2 which are arranged in (4) or in a line to indicate a difference in height between successively arranged contour lines. According to the distribution of the contour lines P1 to P2 and the electrodes 324 15 201232820
(W /498HA 的位置’上表面312的傾斜程度以及表面輪廓可被繪製出 來,以達到最佳化光取出效率。在第18A〜18E圖之實施 例中,將一電極324配置在最高或最低的等高線p2中。 等尚線P1〜P2的數量可依照需求設計,本發明不加以限 制。 其他類型實施例 請參照第19A〜19H圖及第20A〜20H圖,其分別繪示 依,、、、本土月實施例之圖案化結構的示意圖。圖荦化社構 _具有-幾何形狀,包括錐形、四角形、半球=化= 或其組σ。在第19A〜19D圖之實施例甲,多個凸起⑽ 以島狀方式規律性排列在上表面512。在第19£〜igH圖之 實施例中,多個凸起510以條狀方式規律性排列在上表面 :另-方面’第2〇A〜簡圖之圖案化結構與第應〜 之圖案化結構的形狀相反’其具有幾何形狀之凹穴 608 ^ 第2〇A〜2〇D圖之實施例中,多個^ 二:如錐形孔、半圆孔)以島狀方式規律性排列在 十表面612。在第2〇E〜簡圖之實施例中多個凹穴_ 歹'如V形槽、半圓形槽、四角形槽或梯形槽等)以條狀 方式規律性排列在上表面612。 4專)以條狀 除了規律性排列之外,圖案化 多健起(㈣㈣彻— 201232820(While position of W / 498HA 'the degree of tilt of the upper surface 312 and the surface profile can be drawn to achieve optimum light extraction efficiency. In the embodiment of Figures 18A-18E, one electrode 324 is placed at the highest or lowest In the contour line p2, the number of the equal lines P1 to P2 can be designed according to requirements, and the present invention is not limited. For other types of embodiments, please refer to the figures 19A to 19H and 20A to 20H, which respectively show Schematic diagram of the patterned structure of the local month embodiment. The figure has a geometry, including a cone, a quadrangle, a hemisphere = a = or a group σ. In the embodiment of the 19A-19D, a The protrusions (10) are regularly arranged on the upper surface 512 in an island-like manner. In the embodiment of the 19th to igH diagram, the plurality of protrusions 510 are regularly arranged in a strip shape on the upper surface: another-the aspect '2nd图案A~ The schematic structure of the schematic diagram is opposite to the shape of the patterned structure of the first ~ the geometry of the recess 608 ^ In the embodiment of the second 〇A~2〇D diagram, a plurality of ^ 2: The tapered holes and the semi-circular holes are regularly arranged on the ten surface 612 in an island-like manner. In the embodiment of the second 〇E to the diagram, a plurality of pockets _ 歹 ' such as V-shaped grooves, semi-circular grooves, quadrangular grooves or trapezoidal grooves, etc. are regularly arranged in the strip shape on the upper surface 612. 4 special) in strips In addition to the regular arrangement, the pattern is more healthy ((4) (4) Che - 201232820
TW7498PA 以島狀方式排列在上表面。或是,第一類凸起(例如錐 形)、第二類凸起(例如半球形)以及多個凹穴(例如V 形槽、半圓形槽)以島狀及條狀方式排列在上表面。上述 之實施例並非用以限制本發明。在其他實施例中,圖案化 結構的排列方式可依照實際需求調整。 綜上所述,雖然本發明已以較佳實施例揭露如上,然 其並非用以限定本發明。本發明所屬技術領域中具有通常 知識者,在不脫離本發明之精神和範圍内,當可作各種之 更動與潤飾。因此,本發明之保護範圍當視後附之申請專 利範圍所界定者為準。 【圖式簡單說明】 第1A及1B圖繪示依照本發明一實施例之半導體發光 結構的剖面示意圖。 第2A及2B圖繪示依照本發明一實施例之半導體發光 結構的剖面示意圖。 第3A及3B圖繪示依照本發明一實施例之半導體發光 結構的剖面示意圖。 第4A及4B圖繪示依照本發明一實施例之半導體發光 結構的剖面示意圖。 第5A及5B圖繪示依照本發明一實施例之半導體發光 結構的剖面示意圖。 第6A〜6C圖繪示依照本發明一實施例之半導體發光 結構的剖面示意圖。 17 201232820The TW7498PA is arranged on the upper surface in an island shape. Or, the first type of protrusions (such as a cone), the second type of protrusions (such as a hemisphere), and a plurality of pockets (such as a V-shaped groove, a semi-circular groove) are arranged in an island shape and a strip shape. surface. The above embodiments are not intended to limit the invention. In other embodiments, the arrangement of the patterned structures can be adjusted according to actual needs. In the above, the present invention has been disclosed in the above preferred embodiments, but it is not intended to limit the present invention. Those skilled in the art can make various changes and modifications without departing from the spirit and scope of the invention. Therefore, the scope of the invention is defined by the scope of the appended claims. BRIEF DESCRIPTION OF THE DRAWINGS FIGS. 1A and 1B are schematic cross-sectional views showing a semiconductor light emitting structure according to an embodiment of the present invention. 2A and 2B are schematic cross-sectional views showing a semiconductor light emitting structure according to an embodiment of the present invention. 3A and 3B are cross-sectional views showing a semiconductor light emitting structure in accordance with an embodiment of the present invention. 4A and 4B are schematic cross-sectional views showing a semiconductor light emitting structure in accordance with an embodiment of the present invention. 5A and 5B are schematic cross-sectional views showing a semiconductor light emitting structure according to an embodiment of the present invention. 6A to 6C are schematic cross-sectional views showing a semiconductor light emitting structure according to an embodiment of the present invention. 17 201232820
TW7498PA 第7A〜7C圖繪示依照本發明一實施例之半導體發光 結構的剖面示意圖。 第8A〜8F圖繪示依照本發明一實施例之半導體發光 結構的剖面示意圖。 第9圖繪示依照本發明一實施例之半導體發光結構的 剖面示意圖。 第10A及10B圖繪示依照本發明一實施例之半導體發 光結構的剖面示意圖。 第11A及11B圖繪示依照本發明一實施例之半導體發 光結構的剖面示意圖。 第12A及12B圖繪示依照本發明一實施例之半導體發 光結構的剖面示意圖。 第13A及13B圖繪示依照本發明一實施例之半導體發 光結構的剖面示意圖。 第14A〜14C圖繪示依照本發明一實施例之半導體發 光結構的剖面示意圖。 第15A〜15C圖繪示依照本發明一實施例之半導體發 光結構的剖面示意圖。 第16A〜16F圖繪示依照本發明一實施例之半導體發 光結構的剖面示意圖。 第17A〜17H圖綠示依照本發明第一類型實施例之半 導體發光結構的俯視圖。 第18A〜18E圖繪示依照本發明第三類型實施例之半 導體發光結構的俯視圖。 第19A〜19H圖及第20A〜20H圖分別繪示依照本發明 201232820TW7498PA FIGS. 7A to 7C are schematic cross-sectional views showing a semiconductor light emitting structure according to an embodiment of the present invention. 8A to 8F are schematic cross-sectional views showing a semiconductor light emitting structure according to an embodiment of the present invention. Figure 9 is a cross-sectional view showing a semiconductor light emitting structure in accordance with an embodiment of the present invention. 10A and 10B are schematic cross-sectional views showing a semiconductor light emitting structure in accordance with an embodiment of the present invention. 11A and 11B are schematic cross-sectional views showing a semiconductor light emitting structure in accordance with an embodiment of the present invention. 12A and 12B are schematic cross-sectional views showing a semiconductor light emitting structure in accordance with an embodiment of the present invention. 13A and 13B are schematic cross-sectional views showing a semiconductor light emitting structure in accordance with an embodiment of the present invention. 14A to 14C are schematic cross-sectional views showing a semiconductor light-emitting structure according to an embodiment of the present invention. 15A-15C are cross-sectional views showing a semiconductor light emitting structure in accordance with an embodiment of the present invention. 16A to 16F are schematic cross-sectional views showing a semiconductor light emitting structure according to an embodiment of the present invention. Figs. 17A to 17H are green views showing a plan view of a semiconductor light emitting structure according to a first type of embodiment of the present invention. 18A to 18E are plan views showing a semiconductor light emitting structure according to a third type of embodiment of the present invention. Figures 19A to 19H and 20A to 20H are respectively shown in accordance with the present invention 201232820
I W /4y8PA 一實施例之圖案化結構的示意圖。 第21A圖及第21B圖分別繪示尖端部之中線實質上垂 直第一半導體層之上表面或下表面的示意圖。 【主要元件符號說明】 100、200、300、400 :半導體發光結構 110、 210 :基材 111、 211、311 :傾斜凹陷部 112、 212、312 :上表面 112a、212a、312a、412a :第一斜面 112b、212b、312b、412b :第二斜面 112c、212c、312c、412c :曲面 113、 313、411 :傾斜凸出部 114、 214、314 :下表面 115、 116、315、316 :凹陷部 117、118、317、318 :凸出部 120、220、310、410 :第一半導體層 122、124、222、224、322、324 :電極 130、230、320、420 :發光層 140、240、330、430 :第二半導體層 202、402 :圖案化結構 204、 404 :尖端部 205、 405 :微透鏡 206、 406 :布拉格反射層 207a、407a :柱狀部 19 201232820I W /4y8PA Schematic representation of the patterned structure of an embodiment. 21A and 21B are schematic views respectively showing that the middle of the tip portion is substantially perpendicular to the upper surface or the lower surface of the first semiconductor layer. [Main component symbol description] 100, 200, 300, 400: semiconductor light emitting structure 110, 210: substrate 111, 211, 311: inclined depressed portions 112, 212, 312: upper surface 112a, 212a, 312a, 412a: first Bevels 112b, 212b, 312b, 412b: second slopes 112c, 212c, 312c, 412c: curved surfaces 113, 313, 411: inclined projections 114, 214, 314: lower surfaces 115, 116, 315, 316: depressions 117 , 118, 317, 318: protrusions 120, 220, 310, 410: first semiconductor layer 122, 124, 222, 224, 322, 324: electrodes 130, 230, 320, 420: light-emitting layer 140, 240, 330 430: second semiconductor layers 202, 402: patterned structures 204, 404: tip portions 205, 405: microlenses 206, 406: Bragg reflection layers 207a, 407a: columnar portions 19 201232820
i w /^vorA 207b、407b :凹槽 500 :圖案化結構 510 :凸起 512 :上表面 610 :凹穴 602 :錐形孔 604 :四角形孔 606 :半圓孔 608 :梯形孔 S :光線 0、0 1、Θ 2 :傾斜角 L :交界線 T :切線 C :中線 P1〜P3 :等高線Iw /^vorA 207b, 407b: groove 500: patterned structure 510: protrusion 512: upper surface 610: pocket 602: tapered hole 604: square hole 606: semi-circular hole 608: trapezoidal hole S: light 0, 0 1, Θ 2: Tilt angle L: Junction line T: Tangent line C: Center line P1 to P3: Contour line
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CN201110371827XA CN102623600A (en) | 2011-01-31 | 2011-11-21 | semiconductor light emitting structure |
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US10090437B2 (en) | 2013-02-11 | 2018-10-02 | Lumileds Llc | LED having etched light emitting surface for increased light extraction |
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US10090437B2 (en) | 2013-02-11 | 2018-10-02 | Lumileds Llc | LED having etched light emitting surface for increased light extraction |
TWI659546B (en) * | 2013-02-11 | 2019-05-11 | Koninklijke Philips N.V. | Light emitting device and method of manufacturing the same |
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