TW201231491A - Compound and film containing the same - Google Patents
Compound and film containing the same Download PDFInfo
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- TW201231491A TW201231491A TW100148566A TW100148566A TW201231491A TW 201231491 A TW201231491 A TW 201231491A TW 100148566 A TW100148566 A TW 100148566A TW 100148566 A TW100148566 A TW 100148566A TW 201231491 A TW201231491 A TW 201231491A
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- Taiwan
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- compound
- formula
- group
- film
- structural unit
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- 150000001875 compounds Chemical class 0.000 title claims abstract description 185
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 27
- 229920000642 polymer Polymers 0.000 claims description 83
- 239000000758 substrate Substances 0.000 claims description 71
- 125000001424 substituent group Chemical group 0.000 claims description 58
- 239000002904 solvent Substances 0.000 claims description 33
- 238000004519 manufacturing process Methods 0.000 claims description 26
- 125000001072 heteroaryl group Chemical group 0.000 claims description 22
- 125000003118 aryl group Chemical group 0.000 claims description 20
- 238000000576 coating method Methods 0.000 claims description 20
- 239000011248 coating agent Substances 0.000 claims description 18
- 229910052799 carbon Inorganic materials 0.000 claims description 17
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 15
- 229910052786 argon Inorganic materials 0.000 claims description 13
- 125000004429 atom Chemical group 0.000 claims description 11
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 claims description 4
- 244000025254 Cannabis sativa Species 0.000 claims 1
- 238000012857 repacking Methods 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 abstract description 53
- 239000002243 precursor Substances 0.000 abstract description 4
- 239000010408 film Substances 0.000 description 87
- 239000010410 layer Substances 0.000 description 57
- 239000000243 solution Substances 0.000 description 42
- 238000010438 heat treatment Methods 0.000 description 40
- 238000006243 chemical reaction Methods 0.000 description 33
- 238000000034 method Methods 0.000 description 30
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 28
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 24
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 21
- 238000000862 absorption spectrum Methods 0.000 description 20
- 239000007789 gas Substances 0.000 description 20
- 230000015572 biosynthetic process Effects 0.000 description 18
- 239000010409 thin film Substances 0.000 description 18
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 15
- 125000004432 carbon atom Chemical group C* 0.000 description 15
- -1 poly 3-hexyl group Chemical group 0.000 description 15
- 125000000217 alkyl group Chemical group 0.000 description 14
- 230000005685 electric field effect Effects 0.000 description 14
- 238000003786 synthesis reaction Methods 0.000 description 14
- 239000003054 catalyst Substances 0.000 description 13
- 238000005259 measurement Methods 0.000 description 13
- 239000012299 nitrogen atmosphere Substances 0.000 description 13
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 12
- 239000004793 Polystyrene Substances 0.000 description 11
- 239000012295 chemical reaction liquid Substances 0.000 description 11
- 229960001701 chloroform Drugs 0.000 description 11
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 11
- 229910052737 gold Inorganic materials 0.000 description 11
- 239000010931 gold Substances 0.000 description 11
- 229920002223 polystyrene Polymers 0.000 description 11
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 10
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 10
- 238000004528 spin coating Methods 0.000 description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 125000003545 alkoxy group Chemical group 0.000 description 9
- 239000007864 aqueous solution Substances 0.000 description 9
- 239000007822 coupling agent Substances 0.000 description 9
- 238000010992 reflux Methods 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 238000006069 Suzuki reaction reaction Methods 0.000 description 8
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 8
- 239000012298 atmosphere Substances 0.000 description 8
- 229940125904 compound 1 Drugs 0.000 description 8
- 229910052732 germanium Inorganic materials 0.000 description 8
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 8
- QFLWZFQWSBQYPS-AWRAUJHKSA-N (3S)-3-[[(2S)-2-[[(2S)-2-[5-[(3aS,6aR)-2-oxo-1,3,3a,4,6,6a-hexahydrothieno[3,4-d]imidazol-4-yl]pentanoylamino]-3-methylbutanoyl]amino]-3-(4-hydroxyphenyl)propanoyl]amino]-4-[1-bis(4-chlorophenoxy)phosphorylbutylamino]-4-oxobutanoic acid Chemical compound CCCC(NC(=O)[C@H](CC(O)=O)NC(=O)[C@H](Cc1ccc(O)cc1)NC(=O)[C@@H](NC(=O)CCCCC1SC[C@@H]2NC(=O)N[C@H]12)C(C)C)P(=O)(Oc1ccc(Cl)cc1)Oc1ccc(Cl)cc1 QFLWZFQWSBQYPS-AWRAUJHKSA-N 0.000 description 7
- 229910052801 chlorine Inorganic materials 0.000 description 7
- 229940126214 compound 3 Drugs 0.000 description 7
- 229940125898 compound 5 Drugs 0.000 description 7
- 239000013078 crystal Substances 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- 125000005843 halogen group Chemical group 0.000 description 7
- 229910052707 ruthenium Inorganic materials 0.000 description 7
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 6
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 6
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 6
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 6
- 125000001309 chloro group Chemical group Cl* 0.000 description 6
- 229940125782 compound 2 Drugs 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 125000004433 nitrogen atom Chemical group N* 0.000 description 6
- 238000006116 polymerization reaction Methods 0.000 description 6
- 238000007872 degassing Methods 0.000 description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 5
- 238000001704 evaporation Methods 0.000 description 5
- 230000008020 evaporation Effects 0.000 description 5
- 238000005227 gel permeation chromatography Methods 0.000 description 5
- 239000011261 inert gas Substances 0.000 description 5
- 125000001624 naphthyl group Chemical group 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 239000012071 phase Substances 0.000 description 5
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 229940125773 compound 10 Drugs 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- ZLVXBBHTMQJRSX-VMGNSXQWSA-N jdtic Chemical compound C1([C@]2(C)CCN(C[C@@H]2C)C[C@H](C(C)C)NC(=O)[C@@H]2NCC3=CC(O)=CC=C3C2)=CC=CC(O)=C1 ZLVXBBHTMQJRSX-VMGNSXQWSA-N 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 4
- 239000011541 reaction mixture Substances 0.000 description 4
- 229910000029 sodium carbonate Inorganic materials 0.000 description 4
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- QRQKPCVDBZQDGZ-UHFFFAOYSA-N 3,3,3-trichloropropylbenzene Chemical compound ClC(Cl)(Cl)CCC1=CC=CC=C1 QRQKPCVDBZQDGZ-UHFFFAOYSA-N 0.000 description 3
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 125000001153 fluoro group Chemical group F* 0.000 description 3
- 125000003707 hexyloxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 3
- 125000005447 octyloxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 3
- 239000012044 organic layer Substances 0.000 description 3
- 229910052763 palladium Inorganic materials 0.000 description 3
- YJVFFLUZDVXJQI-UHFFFAOYSA-L palladium(ii) acetate Chemical compound [Pd+2].CC([O-])=O.CC([O-])=O YJVFFLUZDVXJQI-UHFFFAOYSA-L 0.000 description 3
- 229920000301 poly(3-hexylthiophene-2,5-diyl) polymer Polymers 0.000 description 3
- 238000007639 printing Methods 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- CINOYIQWMMQTGN-UHFFFAOYSA-N 1,1,1-trichlorononadecane Chemical compound C(CCCCCCCCCCCCCCCCC)C(Cl)(Cl)Cl CINOYIQWMMQTGN-UHFFFAOYSA-N 0.000 description 2
- AUHZEENZYGFFBQ-UHFFFAOYSA-N 1,3,5-trimethylbenzene Chemical compound CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- 238000005698 Diels-Alder reaction Methods 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- 238000005481 NMR spectroscopy Methods 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 206010036790 Productive cough Diseases 0.000 description 2
- 238000003723 Smelting Methods 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- DHXVGJBLRPWPCS-UHFFFAOYSA-N Tetrahydropyran Chemical compound C1CCOCC1 DHXVGJBLRPWPCS-UHFFFAOYSA-N 0.000 description 2
- 239000007983 Tris buffer Substances 0.000 description 2
- 229910052769 Ytterbium Inorganic materials 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- 125000002178 anthracenyl group Chemical group C1(=CC=CC2=CC3=CC=CC=C3C=C12)* 0.000 description 2
- 239000012300 argon atmosphere Substances 0.000 description 2
- 125000006615 aromatic heterocyclic group Chemical group 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- 125000005228 aryl sulfonate group Chemical group 0.000 description 2
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 2
- 150000001721 carbon Chemical class 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 239000012043 crude product Substances 0.000 description 2
- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- MWKFXSUHUHTGQN-UHFFFAOYSA-N decan-1-ol Chemical compound CCCCCCCCCCO MWKFXSUHUHTGQN-UHFFFAOYSA-N 0.000 description 2
- 125000006612 decyloxy group Chemical group 0.000 description 2
- GPAYUJZHTULNBE-UHFFFAOYSA-N diphenylphosphine Chemical compound C=1C=CC=CC=1PC1=CC=CC=C1 GPAYUJZHTULNBE-UHFFFAOYSA-N 0.000 description 2
- 150000002148 esters Chemical group 0.000 description 2
- KTWOOEGAPBSYNW-UHFFFAOYSA-N ferrocene Chemical compound [Fe+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 KTWOOEGAPBSYNW-UHFFFAOYSA-N 0.000 description 2
- 230000006698 induction Effects 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000004811 liquid chromatography Methods 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 125000001820 oxy group Chemical group [*:1]O[*:2] 0.000 description 2
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 2
- MUJIDPITZJWBSW-UHFFFAOYSA-N palladium(2+) Chemical compound [Pd+2] MUJIDPITZJWBSW-UHFFFAOYSA-N 0.000 description 2
- HXITXNWTGFUOAU-UHFFFAOYSA-N phenylboronic acid Chemical compound OB(O)C1=CC=CC=C1 HXITXNWTGFUOAU-UHFFFAOYSA-N 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 2
- IVDFJHOHABJVEH-UHFFFAOYSA-N pinacol Chemical compound CC(C)(O)C(C)(C)O IVDFJHOHABJVEH-UHFFFAOYSA-N 0.000 description 2
- 125000005575 polycyclic aromatic hydrocarbon group Chemical group 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920002098 polyfluorene Polymers 0.000 description 2
- SCVFZCLFOSHCOH-UHFFFAOYSA-M potassium acetate Chemical compound [K+].CC([O-])=O SCVFZCLFOSHCOH-UHFFFAOYSA-M 0.000 description 2
- 229910000027 potassium carbonate Inorganic materials 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 210000003802 sputum Anatomy 0.000 description 2
- 208000024794 sputum Diseases 0.000 description 2
- 239000004575 stone Substances 0.000 description 2
- 125000001273 sulfonato group Chemical group [O-]S(*)(=O)=O 0.000 description 2
- 229910001936 tantalum oxide Inorganic materials 0.000 description 2
- 150000003505 terpenes Chemical class 0.000 description 2
- 235000007586 terpenes Nutrition 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 125000001544 thienyl group Chemical group 0.000 description 2
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 2
- KZPYGQFFRCFCPP-UHFFFAOYSA-N 1,1'-bis(diphenylphosphino)ferrocene Chemical compound [Fe+2].C1=CC=C[C-]1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=C[C-]1P(C=1C=CC=CC=1)C1=CC=CC=C1 KZPYGQFFRCFCPP-UHFFFAOYSA-N 0.000 description 1
- OIXUJRCCNNHWFI-UHFFFAOYSA-N 1,2-dioxane Chemical compound C1CCOOC1 OIXUJRCCNNHWFI-UHFFFAOYSA-N 0.000 description 1
- SXWIAEOZZQADEY-UHFFFAOYSA-N 1,3,5-triphenylbenzene Chemical compound C1=CC=CC=C1C1=CC(C=2C=CC=CC=2)=CC(C=2C=CC=CC=2)=C1 SXWIAEOZZQADEY-UHFFFAOYSA-N 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- GVEHCXOZCZQOOM-UHFFFAOYSA-N 1,6-difluorohexane Chemical compound FCCCCCCF GVEHCXOZCZQOOM-UHFFFAOYSA-N 0.000 description 1
- WZZBNLYBHUDSHF-DHLKQENFSA-N 1-[(3s,4s)-4-[8-(2-chloro-4-pyrimidin-2-yloxyphenyl)-7-fluoro-2-methylimidazo[4,5-c]quinolin-1-yl]-3-fluoropiperidin-1-yl]-2-hydroxyethanone Chemical compound CC1=NC2=CN=C3C=C(F)C(C=4C(=CC(OC=5N=CC=CN=5)=CC=4)Cl)=CC3=C2N1[C@H]1CCN(C(=O)CO)C[C@@H]1F WZZBNLYBHUDSHF-DHLKQENFSA-N 0.000 description 1
- XBGUIVFBMBVUEG-UHFFFAOYSA-N 1-methyl-4-(1,5-dimethyl-4-hexenylidene)-1-cyclohexene Chemical compound CC(C)=CCCC(C)=C1CCC(C)=CC1 XBGUIVFBMBVUEG-UHFFFAOYSA-N 0.000 description 1
- OHZAHWOAMVVGEL-UHFFFAOYSA-N 2,2'-bithiophene Chemical compound C1=CSC(C=2SC=CC=2)=C1 OHZAHWOAMVVGEL-UHFFFAOYSA-N 0.000 description 1
- FUSFWUFSEJXMRQ-UHFFFAOYSA-N 2-bromo-1,1-dimethoxyethane Chemical compound COC(CBr)OC FUSFWUFSEJXMRQ-UHFFFAOYSA-N 0.000 description 1
- KZMAWJRXKGLWGS-UHFFFAOYSA-N 2-chloro-n-[4-(4-methoxyphenyl)-1,3-thiazol-2-yl]-n-(3-methoxypropyl)acetamide Chemical compound S1C(N(C(=O)CCl)CCCOC)=NC(C=2C=CC(OC)=CC=2)=C1 KZMAWJRXKGLWGS-UHFFFAOYSA-N 0.000 description 1
- MVIYEDRRNFOTIX-UHFFFAOYSA-N C(CCCCCCCC)OC1=C(C=CC=C1)P(C1=C(C=CC=C1)OCCCCCCCCC)C1=C(C=CC=C1)OCCCCCCCCC Chemical compound C(CCCCCCCC)OC1=C(C=CC=C1)P(C1=C(C=CC=C1)OCCCCCCCCC)C1=C(C=CC=C1)OCCCCCCCCC MVIYEDRRNFOTIX-UHFFFAOYSA-N 0.000 description 1
- IYAPQLLKQVELOF-UHFFFAOYSA-N C(Cl)(Cl)Cl.C=CC1=CC=CC=C1 Chemical compound C(Cl)(Cl)Cl.C=CC1=CC=CC=C1 IYAPQLLKQVELOF-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
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- 238000001308 synthesis method Methods 0.000 description 1
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- PYJJCSYBSYXGQQ-UHFFFAOYSA-N trichloro(octadecyl)silane Chemical compound CCCCCCCCCCCCCCCCCC[Si](Cl)(Cl)Cl PYJJCSYBSYXGQQ-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
- C08G61/122—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides
- C08G61/123—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides derived from five-membered heterocyclic compounds
- C08G61/126—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides derived from five-membered heterocyclic compounds with a five-membered ring containing one sulfur atom in the ring
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- C08G2261/3246—Monomer units or repeat units incorporating structural elements in the main chain incorporating heteroaromatic structural elements in the main chain condensed containing nitrogen and sulfur as heteroatoms
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- C08G2261/30—Monomer units or repeat units incorporating structural elements in the main chain
- C08G2261/36—Oligomers, i.e. comprising up to 10 repeat units
- C08G2261/364—Oligomers, i.e. comprising up to 10 repeat units containing hetero atoms
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Abstract
Description
201231491 六、發明說明: 【發明所屬之技術領域】 本發明係關於一種化合物及含有該化合物之薄膜。 【先前技術】 在有機電晶體(transistor)等有機半導體元件之製 造過程中,可省去在矽系電晶體等無機半導體元件之製造 上必要的高溫步驟及真空步驟,可減低在製造上需要的能 量。再者,有機半導體元件,可能成為具有柔軟性之薄膜 狀之元件,而作為次世代元件受到注目。 具有7Γ共耗結構之化合物顯示導電性及半導體性,作 為有機半導體化合物被使用在有機半導體元件中而受到注 目。具有7Γ共輛結構之化合物者,具體而言,已知如聚3-己基。塞吩(poly 3 - hexylthiophene) (P3HT)等。 在非專利文獻1中,記載將聚3 -己基噻吩之氣仿溶 液於石夕晶片(si 1 icon wafer)上旋轉塗佈形成有機半導體 層之有機電晶體。 然而,上述有機電晶體之電晶體特性並不足夠,為使 有機電晶體之有機半導體層含有而尋求有用的新規格有機 半導體化合物。 在非專利文獻2中,具有7Γ共軛結構之化合物者,記 載有聚蒽(polyanthracene)、及蒽及苯等之共聚物。蒽部 分多為發光性,具有一部份7Γ共軛結構之蒽部分聚合物, 為顯示電發光(electroluminescence) 性可能性高的材 料。201231491 6. INSTRUCTIONS OF THE INVENTION: TECHNICAL FIELD The present invention relates to a compound and a film containing the same. [Prior Art] In the manufacturing process of an organic semiconductor element such as an organic transistor, a high-temperature step and a vacuum step necessary for the manufacture of an inorganic semiconductor element such as a lanthanide transistor can be omitted, and the manufacturing requirement can be reduced. energy. Further, the organic semiconductor element may become a flexible film-like element, and is attracting attention as a next-generation element. A compound having a 7 Å co-consumption structure exhibits conductivity and semiconductivity, and has been attracting attention as an organic semiconductor compound used in an organic semiconductor element. A compound having a structure of 7 Å is specifically known as a poly 3-hexyl group. Poly 3 - hexylthiophene (P3HT) and the like. Non-Patent Document 1 discloses an organic transistor in which a gas-like solution of poly-3-hexylthiophene is spin-coated on a Si 1 icon wafer to form an organic semiconductor layer. However, the above-described organic transistor has insufficient crystal characteristics, and a useful new specification organic semiconductor compound has been sought for the organic semiconductor layer of the organic transistor. In Non-Patent Document 2, a compound having a 7-inch conjugated structure is described as a copolymer of polyanthracene, hydrazine, and benzene. The ruthenium portion is mostly luminescent, and has a part of a 7-inch conjugated structure of a ruthenium partial polymer, which is a material exhibiting high possibility of electroluminescence.
323797 S 201231491 具有7Γ共軛結構之化合物多為非溶解性,合成方法容 易變得複雜。因此,在非專利文獻2中,加熱可使聚蒽、 及蒽及苯等之共聚物變化’對溶劑顯示溶解性的前驅物而 被提案。上述前驅物,對於聚蒽、或蒽及苯之共聚物的蒽 [先前無水韻果酸行Diels-Alder附加之結構。 [非專利文獻] 非專利文獻1: Lett.) ’ 第 53 卷,323797 S 201231491 Compounds with a 7-inch conjugated structure are mostly insoluble, and the synthesis method is easily complicated. Therefore, in Non-Patent Document 2, it is proposed to change the copolymer of polyfluorene, hydrazine, and benzene by heating to exhibit a solubility in a solvent. The above precursor, for the polyfluorene, or the copolymer of hydrazine and benzene [previously anhydrous rhododendron is a structure added by Diels-Alder. [Non-Patent Document] Non-Patent Document 1: Lett.) ’ Volume 53,
Commun.)第 【發明内容】Commun.) Section [Summary of the Invention]
Applied Physics Letters( Appl. Phys. 第18號,第195至197頁(1988年) 2 : Chemical Communication ( Chem. 74 頁(1997 年) (發明欲解決的課 本發9月仓;g 有機電晶體之決上述向來之問題者,其目的係提供含於 合物及含有兮機半導體層之有用的具有π共軛結構之化 共軛結構之化2合物之薄膜,以及提供用於獲得含有該7Γ (解決課題的手:物)的前驅物化合物。 係h供具有式(1)表示之結構單元Applied Physics Letters (Appl. Phys. No. 18, pp. 195-197 (1988) 2 : Chemical Communication (Chem. 74 (1997) (The textbook to be solved by the invention is issued in September; g organic crystal The object of the above-mentioned problems is to provide a film containing a compound and a compounded conjugated structure having a π-conjugated structure, which is contained in a semiconductor semiconductor layer, and a method for obtaining the same. (Precursor compound for solving the problem of the subject matter), h is provided for the structural unit represented by the formula (1)
323797 5 201231491 〔式中’ Ri及R2,各自獨立 、 獨立,表示氫原子或取代基。代基。R及R4,各自 至3之整數。γ表示之2價基。:自獨立’表示〇 同亦可相異。R2為複數 數個時,該等可相 及 卞°亥專可相同亦可相異。〕,以 由式(2)、(3)、或⑷表示之結構單元323797 5 201231491 [In the formula, Ri and R2 are each independently and independently represent a hydrogen atom or a substituent. Daiji. R and R4, each to an integer of 3. γ represents the divalent group. : From independence, 〇 can also be different. When R2 is plural, these can be the same or different. ], a structural unit represented by the formula (2), (3), or (4)
:式⑴至⑷巾’ R5表示取代基。s表示i至4之整 —p t:0至4之整數。q表示〇至4之整數。R5為複數 個時,該4可相同亦可相異。〕、The formula (1) to (4) towel 'R5 represents a substituent. s represents the integer from i to 4 - p t: an integer from 0 to 4. q represents an integer from 〇 to 4. When R5 is plural, the 4s may be the same or different. 〕,
式(5)表示之結構單元 —^—Ar1 (5)The structural unit represented by the formula (5) —^—Ar1 (5)
〔式中 ’ Ar 表不-CsC-、-C (RA) =C (RA) -、- N —N—、一C (RB) =N—、可具有取代基之環碳數8以上之 伸方基、或可具有取代基之伸雜芳基。但是,Arl非前述式 (1)所表不之基。2個RA,各自獨立,表示氫原子或取代 基。RB表示氫原子或取代基。〕,以及下式(6)表示之結 構單元 6 323797 201231491 Αγ2-Ν 卜3—士 Ar4_[wherein Ar represents -CsC-, -C (RA) =C (RA) -, -N -N-, a C (RB) =N-, and may have a substituent with a ring number of 8 or more a aryl group or a heteroaryl group which may have a substituent. However, Arl is not a base of the above formula (1). Two RAs, each independently, represent a hydrogen atom or a substituent. RB represents a hydrogen atom or a substituent. ], and the structural unit represented by the following formula (6) 6 323797 201231491 Αγ2-Ν Bu 3——士 Ar4_
Ar5 Ar6Ar5 Ar6
Ar 7斗 (6) 〔式中,r及rr各自表示結構單元(_Ar3 —NAr6_ )之 數目及結構單it ( - Ar -NAr7 -)之數目,各自獨立,為 〇或卜Ar2、Ar3、Ar4及Ar5,各自獨立,表示可具有取代 基之伸芳基或可具有取代基之伸雜芳基。Ar 7 hopper (6) [wherein, r and rr each represent the number of structural units (_Ar3 - NAr6_) and the number of structural units it ( - Ar -NAr7 -), which are independent, respectively, or are Ar2, Ar3, Ar4 And Ar5, each independently, represents an extended aryl group which may have a substituent or a heteroaryl group which may have a substituent.
Ar、Ar及Ar8,各自獨立,表示可具有取代基之芳基 或可具有取代基之雜芳基。〕 =成群組選擇之至少一種結構單元的化合物。 前述式(1)中,於左側苯環,除和其右側之2個碳 原子(此等中之1個與R3結合,另i個與r4結合)結合之 2個f環碳原子以外’其他苯環碳原子内之任-個,可與 取代氮原子之⑽R1基’以及1個鄰接結構單元(未圖示) 2。同樣地,前述式⑴中,s個R5基分別取代各個氯 ’、,除了鄰接結構單元(未圖示)結合之2個環碳原子 二該二基=其他環碳原子之任-個,即S個環二 子、.,。::類似式⑴及式⑴之其他式亦同樣地解釋。 表示之㉔Mi _ 具有2㈣上式⑴ 、W 70。此時,式(1)表示之結構單元彼此 相同,或可相異。 稱早凡彼此間可 323797 7 201231491 _在某種形態時,前述化合物更且具有】個以上式(?) 表示之結構單元Ar, Ar and Ar8, each independently, represent an aryl group which may have a substituent or a heteroaryl group which may have a substituent. ] = a compound of at least one structural unit selected in groups. In the above formula (1), the benzene ring on the left side is different from the two carbon atoms on the right side (one of these is bonded to R3, and the other is bonded to r4). Any one of the benzene ring carbon atoms may be substituted with the (10) R1 group ' of the nitrogen atom and one adjacent structural unit (not shown) 2 . Similarly, in the above formula (1), s R5 groups are substituted for each chlorine ', respectively, except for two ring carbon atoms to which a neighboring structural unit (not shown) is bonded, or two of the other ring carbon atoms, that is, S ring two sons, .,. :: Other formulas of the similar formula (1) and formula (1) are also explained in the same manner. Indicates that 24Mi _ has 2 (four) above equations (1) and W 70. At this time, the structural units represented by the formula (1) are identical to each other or may be different. It is said that it is possible to be between each other. 323797 7 201231491 _In a certain form, the above compound has more than one structural unit represented by the above formula (?)
在某種形態時,Y表示之2價基,係選自由式(γ—D 至(Y —8)各自表示之基所成群組之至少一種基In a certain form, Y represents a divalent group selected from at least one group of groups represented by the formula (γ-D to (Y-8).
〔式(Y—1)至(γ —8)中,R1。至 参:f[In the formula (Y-1) to (γ-8), R1. To the reference: f
:示氯原子或取代基。I表示氣原子或•素原複 =二=同亦可相異。〕亦即,前軸 具有1個式(1)表示之結構單元時, 係以上述式(Υ-υ至(γ —8)之任—個表賈基」 :具有2個以上式⑴表示之結構,: : 令的Υ,彼此間可相同,或可相異。 具U冓早兀 在某種形態時,前述化合物為重量平 以上之高分子化合物。 子量為3000 在某種形態時,前述化合物,更且具有式⑴: indicates a chlorine atom or a substituent. I means that the gas atom or the prime element = two = the same can also be different. In other words, when the front axis has one structural unit represented by the formula (1), the above formula (Υ-υ to (γ - 8) is used for any one of the formulas:" has two or more formulas (1). Structure, : : The Υ of the order may be the same or different from each other. When the 冓 is in a certain form, the compound is a polymer compound having a weight of more than 3,000. When the amount is 3000, in a certain form, The aforementioned compound, and has the formula (1)
323797 S 201231491323797 S 201231491
〔式中,n、m、R1、R2、R3及R4表示與式(1)中之該等相 同意義。〕 表示之結構單元。 再者,本發明,提供含有前述任一種化合物及溶媒之 溶液。 再者,本發明提供含有前述任一種化合物之薄膜。 再者,本發明提供具有基體及薄膜之積層體, 前述薄膜係將前述溶液塗佈於該基體上形成含有包 含式(1)所表示結構單元之化合物的塗膜,其次, 對該塗膜加與能量,使塗膜中含有之包含式(1 )所 表示結構單元之化合物的全體内之至少一部份中,所含式 (1)表示之結構單元變換成式(8)表示之結構單元而獲 得之膜。 再者,本發明係提供具有薄膜及基體之積層體的製造 方法,包含下列步驟: 將前述溶液塗佈於基體上,形成含包含式(1)所表 示結構單元之化合物的塗膜之步驟, 對該塗膜加與能量,使塗膜中含有之包含式(1)所 表示結構單元之化合物的全體内之至少一部份中,所含式 9 323797 201231491 (1 )表示之結構單元變換成式(8)表示之結構單元而形 成膜之步驟。 (發明效果) 可提供含於有機電晶體之有機半導體層中之有用的 具有7Γ共軛結構之化合物及含有該化合物之薄膜,以及用 於獲得含有該7Γ共輛結構之化合物的前驅物化合物。 【實施方式】 以下,詳細說明本發明。 本發明之化合物包含式(1)表示之結構單元。Wherein n, m, R1, R2, R3 and R4 have the same meanings as in the formula (1). 〕 indicates the structural unit. Furthermore, the present invention provides a solution containing any of the foregoing compounds and a solvent. Further, the present invention provides a film containing any of the foregoing compounds. Furthermore, the present invention provides a laminate having a substrate and a film, wherein the film is coated on the substrate to form a coating film containing a compound containing the structural unit represented by the formula (1), and secondly, the coating film is added. And at least a part of the whole of the compound containing the structural unit represented by the formula (1) contained in the coating film, and the structural unit represented by the formula (1) is converted into the structural unit represented by the formula (8) And the film obtained. Furthermore, the present invention provides a method for producing a laminate having a film and a substrate, comprising the steps of: applying the solution to a substrate to form a coating film containing a compound containing the structural unit represented by the formula (1), The coating film is added with energy so that at least a part of the entire compound containing the structural unit represented by the formula (1) contained in the coating film is converted into a structural unit represented by the formula 9 323797 201231491 (1). The step of forming a film by the structural unit represented by the formula (8). (Effect of the Invention) A compound having a 7-inch conjugated structure and a film containing the compound, and a precursor compound for obtaining a compound having the 7-inch structure can be provided, which are useful in an organic semiconductor layer of an organic transistor. [Embodiment] Hereinafter, the present invention will be described in detail. The compound of the present invention contains a structural unit represented by the formula (1).
式(1)中,R1及R2,各自獨立,表示取代基。取代基 之中,以鹵素原子、碳數1至30之基為佳。 鹵素原子者,列舉如敗原子、氯原子、漠原子、蛾原 子。 其中,以氟原子、氯原子為佳。 碳數1至30之基者,列舉如乙基、丁基、己基、辛 基、癸基等烷基、曱氧基、乙氧基、丁氧基、己氧基、辛 氧基、十二基氧基等烷氧基,噻吩基等雜芳基,苯基、萘 基等芳基,氰基。碳數1至30之基中之氫亦可以鹵素原子 取代。碳數1至30之基中之氫原子以鹵素原子取代時,鹵In the formula (1), R1 and R2 each independently represent a substituent. Among the substituents, a halogen atom and a carbon number of 1 to 30 are preferred. For halogen atoms, examples include a deficient atom, a chlorine atom, a desert atom, and a moth atom. Among them, a fluorine atom or a chlorine atom is preferred. The base of carbon number 1 to 30, such as ethyl, butyl, hexyl, octyl, decyl, etc. alkyl, decyloxy, ethoxy, butoxy, hexyloxy, octyloxy, twelve An alkoxy group such as a oxy group, a heteroaryl group such as a thienyl group, an aryl group such as a phenyl group or a naphthyl group, or a cyano group. The hydrogen in the group having 1 to 30 carbon atoms may be substituted by a halogen atom. When a hydrogen atom in a group having 1 to 30 carbon atoms is substituted with a halogen atom, the halogen
10 323797 S 201231491 素原子之中以氟原子取代為佳。 η及m,各自獨立,表示0至3之整數。η及m以0為 佳。R1為複數個時,該等可相同亦可相異。R2為複數個時, 該等可相同亦可相異。 式(1)中,R3及R4表示氫原子或取代基。R3或R4所 表示取代基之例者,列舉與R1表示之取代基相同之基。由 化合物合成之容易度觀點,R3及R4以氫原子為佳。 式(1)中,Y表示之2價基。2價基之中,以加與熱 及光等能量可脫離之基為佳。Y表示之2價基例示如以下 之基。10 323797 S 201231491 It is preferred to replace the fluorine atom with a fluorine atom. η and m, each independently, represent an integer from 0 to 3. η and m are preferably 0. When R1 is plural, the same may be the same or different. When R2 is plural, the same may be the same or different. In the formula (1), R3 and R4 represent a hydrogen atom or a substituent. Examples of the substituent represented by R3 or R4 include the same substituents as those represented by R1. From the viewpoint of easiness of compound synthesis, R3 and R4 are preferably a hydrogen atom. In the formula (1), Y represents a divalent group. Among the two valence groups, it is preferable to add energy such as heat and light to be separated. The two-valent group represented by Y is exemplified as the following.
式(Y—1)至式(Y — 8)中,R1()至R2°,為相同或相 異,表示氫原子或取代基。其中,以氫原子或碳數1至30 之基為佳。 R1()至R19為取代基時,該取代基之例者,列舉如甲基、 乙基、丁基、己基、辛基、十二基等烧基,曱氧基、乙氧 基、丁氧基、己氧基、辛氧基、十二基氧基等烷氧基,苯 基、萘基等芳基。烷基者,以碳數1至30之烷基為佳,碳 數1至20之烷基為較佳,碳數1至12之烷基為更佳,碳 數1至6之烷基為特佳, R2°為取代基時,該取代基之例者,列舉如曱基、乙基、 11 323797 201231491 丁基、己基、辛基、十二基等燒基,f氧基乙氧基、丁 氧基、己氧基、辛氧基、十二基氧基等烷氧基,苯基、萘 基等芳基,乙烯基、含酯結構之基〇 I表不氣素原子。虐素原子者,列舉如氟肩子、氯原 子、漠原子、碘原子。齒素原子之中,以氯原子、漠原子 為佳’氣原子為較佳。 式(Y 1)至式(Y-8)所表示基之中,以式(γ—3) 至式(Y-7)表示之基為佳,式(γ—3)至式(γ—5)表 不之基為較佳。例如,較佳的Υ係於式(Υ-3)或式(γ —4)中,ΙΤ、γ、”及Rl9,為碳數1至1〇之烧氧基, 特別地,為碳數丨至4之烷氧基所成之基。 、本發明之化合物具有··式⑴所表示之結構單元, 2及具有π共減構之結構單元。具有π㈣結構之結構 早凡的具體例包含選自下列式⑴表示之結構單元、式(3) 表示之結構單元、式⑷表示之結構單元、<(5)表示 之結構單元及式⑷表示之結構單元所成群組之至少 結構單亓^ #In the formula (Y-1) to the formula (Y-8), R1() to R2° are the same or different and each represents a hydrogen atom or a substituent. Among them, a hydrogen atom or a group having 1 to 30 carbon atoms is preferred. When R1() to R19 are a substituent, examples of the substituent include a group such as a methyl group, an ethyl group, a butyl group, a hexyl group, an octyl group, a dodecyl group, a decyloxy group, an ethoxy group, and a butoxy group. An alkoxy group such as a hexyloxy group, an octyloxy group or a dodecyloxy group; an aryl group such as a phenyl group or a naphthyl group; The alkyl group is preferably an alkyl group having 1 to 30 carbon atoms, preferably an alkyl group having 1 to 20 carbon atoms, more preferably an alkyl group having 1 to 12 carbon atoms, and an alkyl group having 1 to 6 carbon atoms. Preferably, when R2 is a substituent, examples of the substituent include, for example, anthracenyl group, ethyl group, 11 323797 201231491 butyl group, hexyl group, octyl group, dodecyl group, etc., f-oxyethoxy group, butyl group An alkoxy group such as an oxy group, a hexyloxy group, an octyloxy group or a dodecyloxy group; an aryl group such as a phenyl group or a naphthyl group; and a vinyl group having an ester structure; Those who are atomic, such as fluorine shoulders, chlorine atoms, desert atoms, iodine atoms. Among the dentate atoms, a chlorine atom or a desert atom is preferred, and a gas atom is preferred. Among the groups represented by the formula (Y 1) to the formula (Y-8), the group represented by the formula (γ-3) to the formula (Y-7) is preferred, and the formula (γ-3) to the formula (γ-5) The basis of the table is preferred. For example, preferred lanthanum is in the formula (Υ-3) or the formula (γ-4), ΙΤ, γ, "and Rl9, which are alkoxy groups having a carbon number of 1 to 1 Å, in particular, a carbon number 丨The compound of the present invention has a structural unit represented by the formula (1), 2 and a structural unit having a π-co-subtraction structure. Specific examples of structures having a π(tetra) structure include At least one structural unit of the group represented by the following structural formula (1), the structural unit represented by the formula (3), the structural unit represented by the formula (4), the structural unit represented by the formula (5), and the structural unit represented by the formula (4) ^ #
201231491201231491
式(2)至式(4)中,R5表示取代基。R5所表示取代 基之例者,列舉與R1所表示取代基之例相同之基。 式(2)中,s表示1至4之整數。式中,p表 示0至4之整數。p以〇為佳。式(4)中,q表示〇至4 之整數。q以〇為佳。 式(2)至式(4)中,R5為複數個時,該等可相同亦 可相異。 式(5)中,Ar 丨表示一CsC—、一C(RA) =:C(RA) —、 N—N—、一c (rb) 、可具有取代基之環碳數8以 上之伸芳基、或可具有取代基之伸雜芳基。但是,Arl非前 述式(\)所表示之基。2個RA,各自獨立表示氫原子或取 代基。RB表示氫原子或取代基。^或RB所表示取代基之例 者,列舉與Rl所表示取代基之例相同之基。 伸芳基者,列舉如由單環之芳香族烴除去2個氫原子 之基、由多環之芳香族烴除去2個氫原子之基、由2個以 上之芳香族烴直接結合或介由伸乙烯基(v 之化合物除去2錢好之基。 伸方基為由單環之芳香族烴除去2個氫原子之基時, 323797 13 201231491 =伸芳基之碳數以8至6G為佳,8至48為較佳,8至3〇 ‘.、、更佳’ 8 i 14為特佳。該碳數不含取代基之碳數。 多環之芳香族烴除去2個氫原子之基時, =::以1〇至6〇為佳,1〇至48為 ου馮更佳,1〇至14 王 伸芳A為由客搭數不含取代基之碳數。 可具有取;基之伸芳:2個氮原子之基時, R R ]者,列舉如下列之基。In the formulae (2) to (4), R5 represents a substituent. Examples of the substituent represented by R5 include the same substituents as those of the substituent represented by R1. In the formula (2), s represents an integer of 1 to 4. Wherein p represents an integer from 0 to 4. p is better. In the formula (4), q represents an integer from 〇 to 4. q is better. In the formulae (2) to (4), when R5 is plural, the same may be the same or different. In the formula (5), Ar 丨 represents a CsC—, a C(RA)=:C(RA)—, N—N—, a c (rb), a ring having a ring number of 8 or more. a base or a heteroaryl group which may have a substituent. However, Arl is not represented by the above formula (\). Two RAs each independently represent a hydrogen atom or a substituent. RB represents a hydrogen atom or a substituent. The example in which the substituent is represented by ^ or RB is the same as the substituent of the substituent represented by R1. Examples of the aryl group include a group in which two hydrogen atoms are removed from a single-ring aromatic hydrocarbon, two hydrogen atoms are removed from a polycyclic aromatic hydrocarbon, and two or more aromatic hydrocarbons are directly bonded or intercalated. The vinyl group (the compound of v removes 2 money base. When the exudation group is a group in which two hydrogen atoms are removed from a single-ring aromatic hydrocarbon, 323797 13 201231491 = the carbon number of the extended aryl group is preferably 8 to 6G. 8 to 48 is preferred, and 8 to 3 〇'., and more preferably '8 i 14 is particularly preferred. The carbon number does not contain the carbon number of the substituent. When the polycyclic aromatic hydrocarbon removes two hydrogen atoms , =:: 1〇至6〇 is better, 1〇至48 is ου冯更佳, 1〇至14 王伸芳A is the carbon number of the guest without the substituent. It can be taken; : For the case of two nitrogen atoms, RR], the following groups are listed.
' R、R R R' R, R R R
R 5R 5
R R R 6R R R 6
R R R RR R R R
R R RR R R
323797 s 14 10 9 201231491323797 s 14 10 9 201231491
15 323797 20123149115 323797 201231491
上述式中,R各自獨立表示氫原子或取代基。R為取 代基時,列舉如甲基、乙基、丁基、2-丁基、己基、2一乙 基己基、辛基、十二基、十六基等烷基,曱氧基、乙氡基、 丁氧基、己氧基、辛氧基、十二基氧基等烷氧基、苯基、 16 323797 201231491 萘基等芳基,噻吩基等雜芳基、鹵素原子、氰基。R為烷 基時,以碳數1至20之烷基為佳,碳數〗至12之烷基: 較佳,碳數1至8之烷基為更佳^ R為烷氧基時,以碳數1 至20之烷氧基為佳,碳數丨至12之烷氧基為較佳,碳數 1至8之烷氧基為更佳。 伸芳基為由2個以上之芳香族烴直接結合或介由伸乙 烯基結合之化合物除去2個氫原子之基時,芳香族烴者以 苯為佳。伸芳基為由2個以上之苯直接結合或介由伸乙烯 基結合之化合物除去2個氫原子之基時,亦可具有取代基 之伸芳基之例者,列舉如下列之基。In the above formula, R each independently represents a hydrogen atom or a substituent. When R is a substituent, an alkyl group such as a methyl group, an ethyl group, a butyl group, a 2-butyl group, a hexyl group, a 2-ethylhexyl group, an octyl group, a dodecyl group or a hexadecanyl group is exemplified, and an oxime group or an ethyl group is exemplified. An alkoxy group such as a butyl group, a butoxy group, a hexyloxy group, an octyloxy group or a decyloxy group; a phenyl group; an aryl group such as a naphthyl group; a heteroaryl group such as a thienyl group; a halogen atom; and a cyano group. When R is an alkyl group, it is preferably an alkyl group having 1 to 20 carbon atoms, and an alkyl group having a carbon number of 12 to 12: preferably, an alkyl group having 1 to 8 carbon atoms is more preferably when R is an alkoxy group. The alkoxy group having 1 to 20 carbon atoms is preferred, the alkoxy group having a carbon number of 12 to 12 is preferred, and the alkoxy group having 1 to 8 carbon atoms is more preferred. When the aryl group is a group in which two hydrogen atoms are directly bonded or a compound in which an ethylene group is bonded by a vinyl group, the aromatic hydrocarbon is preferably benzene. The aryl group is an example in which two or more benzene groups are directly bonded or a group in which two hydrogen atoms are removed by a vinyl-bonding compound, and examples of the exoaryl group having a substituent may be mentioned, and the following groups are listed.
323797 17 201231491 R R R b〇 ^323797 17 201231491 R R R b〇 ^
R R R RR R R R
R RR R
上述式中’ R表示與前述相同意義。 伸雜芳基者,列舉如由單環之芳香族雜環化合物除去 2個氫原子之基、由多環之芳香族雜環化合物除去2個氯 肩子之基、由2個以上含有至幻個芳香族雜環化合物之 323797In the above formula, 'R means the same meaning as described above. Examples of the heteroaryl group include a group in which two hydrogen atoms are removed from a monocyclic aromatic heterocyclic compound, and two chlorine-containing shoulder groups are removed from a polycyclic aromatic heterocyclic compound, and two or more Aromatic heterocyclic compounds 323797
S 18 201231491 方香族化合物直接結合或介由伸乙烯基結合之化合物除去 2個氮原子之基。 ' 伸雜^基為由單環之芳香族雜環化合物除去2個氫原 子之基或由多環之芳香族雜環化合物除去2個氫原子之基 時’該伸雜芳基之碳數’以3至60為佳,3至2〇為較佳。 該碳數不含取代基之碳數。 伸雜芳基為由單環之芳香族雜環化合物除去2個氮原 子之基或由多環之芳香族雜環化合物除去2個氫原子之美 時,可具有取代基之伸雜芳基其例者,列舉如下列之基二S 18 201231491 The scented compound is directly bonded or removed by a vinyl-bonded compound to remove two nitrogen atom groups. ' The carbon number of the heteroaryl group when the base of two hydrogen atoms is removed by a monocyclic aromatic heterocyclic compound or the base of two hydrogen atoms is removed by a polycyclic aromatic heterocyclic compound. It is preferably from 3 to 60, and preferably from 3 to 2 is preferred. This carbon number does not contain the carbon number of the substituent. When the heteroaryl group is a group in which two nitrogen atoms are removed from a monocyclic aromatic heterocyclic compound or two hydrogen atoms are removed from a polycyclic aromatic heterocyclic compound, a heteroaryl group which may have a substituent is exemplified. , listed as the following two
323797 19 201231491323797 19 201231491
20 323797 s 20123149120 323797 s 201231491
21 323797 20123149121 323797 201231491
22 323797 s 20123149122 323797 s 201231491
23 323797 201231491 R R R r23 323797 201231491 R R R r
D R R R RD R R R R
129 上述式中,R表示與前述相同意義。 =雜芳基為由2個以上含有至少i個芳香族雜環化合 物之芳香紹b合物直接結合或介由伸乙婦基結合之化合物 除去2個氫原子之基時,可具有取代基之伸雜芳基其例 者,列舉如下列之基。129 In the above formula, R represents the same meaning as described above. =heteroaryl group may have a substituent when the two or more hydrogen atoms are bonded directly or in combination with a compound of at least one aromatic heterocyclic compound. Examples of heteroaryl groups include the following groups.
R R R RR R R R
RR
323797 24 201231491323797 24 201231491
148 149148 149
R RR R
R RR R
151 25 323797 201231491151 25 323797 201231491
RR
衣不興月丨j述相间立黑 氮原子。L為複數個時,可相^ =表示—,或 “以可具有取代基環碳數8以 衫 取代基之伸雜芳基為佳。 “基或可具有 式(6)令,Ar2、Ar3、Ar4及紅5,各自獨立表示可 具有取代基之伸芳基或可具有取代基之伸雜芳基。伸芳 基、伸雜芳基之例者,列舉如伸苯基、與Ari所表示之伸 26 323797 % 201231491 务基、伸雜芳基之例相同之基。The clothes are not prosperous, and the black nitrogen atoms are formed. When L is plural, it may be represented by ==, or "extended heteroaryl group which may have a substituted ring carbon number of 8 and a shirt substituent. "The group may have the formula (6), Ar2, Ar3 And Ar4 and red 5 each independently represent an extended aryl group which may have a substituent or a heteroaryl group which may have a substituent. Examples of the aryl group and the heteroaryl group are as shown in the example of a phenyl group, which is the same as the one represented by Ari, which is represented by the extension of 26 323797 % 201231491.
Ar2、Ar3、Ar4及Ar5,以可具有取代基之伸苯基為佳。 式(6)中,Ar6、Ar7及Ar8,各自獨立,表示可具有 取代基之芳基或可具有取代基之雜芳基。 芳基之例者,列舉如笨基、萘基、蒽基。雜芳基之例 者,列舉如嗟吩基。Ar2, Ar3, Ar4 and Ar5 are preferably a phenyl group which may have a substituent. In the formula (6), Ar6, Ar7 and Ar8 each independently represent an aryl group which may have a substituent or a heteroaryl group which may have a substituent. Examples of the aryl group include, for example, a strepyl group, a naphthyl group, and an anthracenyl group. Examples of heteroaryl groups are exemplified by porphinyl groups.
Ar6、Ar7及Ar8’各自獨立,以可具有取代基之苯基為 佳,可具有烷基之苯基為較佳。 式(6)令,r及rr,分別表示結構單元(_紅 —)之數目及結構單元(—Ar5—MAr*7 、 A, 干u、 Ar Mr 一)之數目,各自獨 立,為0或1。 工 r、Ar、Ar或Ar8所表示基中之碳原子, 可與Ar5、Ar6、Ar7或Ar«表示之基所結合之氮原子與其結 合之紅2、紅士4士5士7或“所表示基中之碳原子, 直接結合,或亦可介由一〇—、—s—、— ~~ ^ \ ~ \)) —、一 c (,—〇_、—N(RC)—、—c(,—N ⑻—或 ―:⑻2:結合’而形成5至7員環。表示烷基、芳基、 雜芳基或方烧基。Ar6, Ar7 and Ar8' are each independently, and a phenyl group which may have a substituent is preferred, and a phenyl group which may have an alkyl group is preferred. Equation (6), r and rr, respectively, indicate the number of structural units (_red-) and the number of structural units (-Ar5-MAr*7, A, dry u, Ar Mr-1), each independently, being 0 or 1. a carbon atom in the group represented by r, Ar, Ar or Ar8, a red atom bonded to a nitrogen atom bonded to a group represented by Ar5, Ar6, Ar7 or Ar«, and a red, 2, 5, 5 or 7 Indicates that the carbon atoms in the group are directly bonded, or may also be referred to by a 〇-, -s-, -~~ ^ \ ~ \)) -, a c (, -〇_, -N(RC)-, - c(, -N(8)- or -:(8)2: combines to form a 5- to 7-membered ring, which represents an alkyl group, an aryl group, a heteroaryl group or a aryl group.
R RR R
式(6)所表示結構單元之例者,列舉如下列之芙。 R R R R R 土Examples of the structural unit represented by the formula (6) are as follows. R R R R R
323797 158 27 201231491 上述式中,R表示與前述相同意義。 本發明之化合物分別可僅含有丄種式(2)至式(6) 所表示之結構單元,亦可含有2種以上。 本發明之化合物,更且,可含有j個以上式⑺所 表示之結構單元。 (7) 本發明之化合物,更且,可含有式(8)所表示之1 個以上結構單元。323797 158 27 201231491 In the above formula, R represents the same meaning as described above. The compound of the present invention may contain only the structural unit represented by the formula (2) to the formula (6), or may contain two or more kinds. Further, the compound of the present invention may contain more than j structural units represented by the formula (7). (7) The compound of the present invention may further contain one or more structural units represented by the formula (8).
1^、1^3及1^4,表示與式(1) 中該等之相同意義。 c本發明之化合物以含有2個以上式⑴所表示結損 早疋者為佳。所含有之式⑴所表示結構單元 間可相同,或可相異。 本發明之化合物分子量無特別限制,何種分子量均巧 ,用’但以高分子化合物為佳。本發明中之高分子化合物 指出以聚苯乙烯(po 1 ystyrene )換算之重量 3xl〇3以上者。 -刀于1為 323797 28 201231491 本發a月之化合物之中以使用重量平均分子量3χ1〇3至 1x10之回分子化合物為佳。重量平均分子量在以 上,於製作構件(deviee)時其膜形成方面,可抑制缺陷產 生在1x10以下則對溶媒之溶解性及製成元件時之塗佈 性變高。 4重1平均分子量更佳者,$ 8><1〇3至5χ1〇6’,特佳為 1x10至lxl〇6。製作構件時其膜形成方面,由抑制缺陷產 生之觀點,以10000以上為佳。 <苯乙稀換算之數平岣分子量以ΐχ1〇3至1χ1〇8為佳, 較佳為2χ1()3至1χ1(Γ°聚笨乙稀換算之數平均分子量為1 〇 =上時’容易獲得強知的薄膜。另方面,為1 〇8以下 時巧分子化合物之溶解性高,容易製作薄膜。 、、本發明中之重量平均分子量係指使用凝膠滲透層析 法(GPC gel permeation chr〇mat〇graphy),利 烯標準品算出之重量平均分子量。 A本乙 本發明之化合物為南分子化合物時,由對 度觀點’以該高分子化合物具有之全部重複單位之八 作,100時,作為重複單位所含之式(1)表示之結構:里 的量以20至99為佳,30至60為較佳。 早元 ,4同刀卞1匕5初,隹/刀于鏈末端若參與聚合之義 留時,將獲得之高分子化合物用於有機元件時因為有斗 降低可月b性,因而末端以與聚合無關安定的基^,者 佳。該安定的基讀分子鏈线之共減構具有連續技 、、’σ &的基為佳。具體而言,於日本特開平9_454了8號八 323797 29 201231491 之化:者記載之取代基作為示例。 之容易性,…I门刀子化δ物用於元件時,鑑於製作元件 可製作0.〇Γ街溶媒之溶解度高者。具體而言,以具有 0.1重量y以重量%以上溶液之溶解性為佳’具有可製作 重量%心^溶液之溶解性者為較佳,具有可製作4 ^岭夜之溶解性者為更佳。 方法7特==曰為高分子化合物時,該化合物之製造 .々制,但列舉如使用利用Ni觸媒之還原性偶 =:方法、使用stiUe偶合反應之方法、使用Suzuki 於化合物合成之容易度,使用Suzuki 偶合反應之方法。馨 偶合反應方法為佳 使用Suzuki偶合反應之方法者,例如列舉具有:使 下式所示之1種以上之化合物1^, 1^3, and 1^4, which have the same meaning as those in the formula (1). c The compound of the present invention is preferably one containing two or more of the junction loss expressed by the formula (1). The structural units represented by the formula (1) contained may be the same or may be different. The molecular weight of the compound of the present invention is not particularly limited, and it is preferred that the molecular weight is good, but a polymer compound is preferred. The polymer compound in the present invention indicates a weight of 3 x 10 or more in terms of polystyrene (po 1 ystyrene ). - Knife is 1 323797 28 201231491 Among the compounds of the present month, it is preferred to use a molecular compound having a weight average molecular weight of 3χ1〇3 to 1x10. When the weight average molecular weight is more than the above, the film formation in the production of the member (deiee) can suppress the solubility of the solvent at 1x10 or less and the coating property at the time of forming the device. The 4-weight 1 average molecular weight is better, $8><1〇3 to 5χ1〇6', and particularly preferably 1x10 to lxl〇6. In terms of film formation in the production of the member, it is preferably 10,000 or more from the viewpoint of suppressing the occurrence of defects. <The number of styrene conjugates is preferably ΐχ1〇3 to 1χ1〇8, preferably 2χ1()3 to 1χ1 (the average molecular weight of Γ° polystyrene is 1 〇=上上' It is easy to obtain a well-known film. On the other hand, when it is 1 〇8 or less, the solubility of the molecular compound is high, and it is easy to produce a film. The weight average molecular weight in the present invention means the use of gel permeation chromatography (GPC gel permeation). Chr〇mat〇graphy), the weight average molecular weight calculated from the limene standard. A. When the compound of the present invention is a southern molecular compound, from the viewpoint of solubility, the total repeating unit of the polymer compound has eight, 100 In the case of the structure represented by the formula (1) contained in the repeating unit: the amount in the range is preferably from 20 to 99, and preferably from 30 to 60. Early, 4, the same knife, 1匕5, 隹/knife in the chain When the terminal is involved in the polymerization, the polymer compound obtained is used for the organic element because the bucket has a lower b-type, and the terminal is preferably a base which is not related to the polymerization. The stable base molecular chain is stable. The total attenuation of the line has a continuous technique, and the basis of 'σ & Specifically, it is exemplified in Japanese Patent Laid-Open No. 9-454, No. 8, No. 323797 29 201231491, and the substituents described therein are taken as an example. The easiness, when the I-knife is used for the element, the manufacturing element can be made 0. The solubility of the solvent in the street is high. Specifically, it is preferable to have a solubility of 0.1% by weight or more by weight of the solution, and it is preferable to have a solubility of a weight-producing solution. ^The solubility of Ling night is better. Method 7 == 曰 is a polymer compound, the manufacture of the compound. Tanning, but enumerated, such as using a reducing couple using a Ni catalyst =: method, using stiUe coupling The method of the reaction, the method of using Suzuki to synthesize the compound, and the Suzuki coupling reaction method. The conjugate coupling reaction method is preferably a method using a Suzuki coupling reaction, and for example, a compound having one or more compounds represented by the following formula
Qi-E 丨-Q2 (1〇〇) 〔式中El表不式(1)所表示之結構單元。(^及q2 ,為相 同或相異’表示蝴酸殘基或硼酸酯殘基。〕及下式所表示 之1種以上之化合物 m2-i2 ( 200 ) 〔式中,E2表示式(2)至式(8)所表示之結構單元。L 及T2,為相同或相異,表示鹵素原子 、烧基績酸S旨(a 1 ky 1 sulf〇nate)基、芳基磺酸酯(aryl sulfonate)基或芳基 烷基磺酸酯基。〕 在纪觸媒及驗存在下進行反應之步驟之製造方法。 使用於反應之式( 200 )所表示之1種以上之化合物 30 323797 201231491 的莫耳數合計,相對於式(100)所表示1種以上之化合物 的莫耳數合計,以過剩者為佳。將使用於反應之式 所表示1種以上之化合物的莫耳數合計當作1莫耳時,式 (100)所表示1種以上之化合物的莫耳數合計以〇 6至 0.99莫耳時為佳,0.7至0.95莫耳時為更佳。 式( 200 )中,1及L所表示鹵素原子者,列舉如氣 原子、氯原子、溴原子、碘原子。鑑於高分子化合物之合 成容易度,以溴原子、碘原子為佳,以溴原子為更佳。 式(200)中,Τι及T2所表不烧基續酸自旨基者,以^甲 烷磺酸酯基、乙烷磺酸酯基、三氟曱烷磺酸酯基作為示例。 芳基磺酸酯基者,以苯磺酸酯基、對-曱苯磺酸自旨基作為示 例。芳基烷基磺酸酯基者,以苄基磺酸酯基作為示例。 使用在Suzuki偶合反應之把觸媒者,列舉如pd ( 〇 > 觸媒、Pd(II)觸媒等。把觸媒之具體例者,列舉如把〔 (三苯膦)〕、鈀醋酸鹽類、二氯雙(三苯膦)絶(,作 由反應(聚合)操作之容易度、反應(聚合)速度之觀點旦 以二氯雙(三苯膦)鈀(II)、鈀醋酸鹽類為佳。 鈀觸媒之添加量,無特別限定,只要為觸媒之有敦玲 即可,相對於式(10〇)所表示化合物1莫耳,、通常,蕙 〇. 〇〇〇1莫耳至0· 5莫耳,較佳為〇. 0003莫耳至〇.丨莫耳為 使用在Suzuki偶合反應之鹼者,為無機驗、有機 無機鹽等。無機驗者,列舉如碳酸狎、碳酸納、氣氧 等。有機鹼者,列舉如三乙基胺、三丁基胺 · 列舉如氟化鉋等。 热機皿者, 31 323797 201231491 1莫耳, 20莫耳, 鹼之添加量,相對於式(100)所表示化合物 通常,為0· 5莫耳至1〇〇莫耳,較佳為0. 9莫耳至 更佳為1莫耳至10莫耳。 前述鈀觸媒使用鈀醋酸鹽類時,亦可添加磷化合物作 為配位子(1 i gand )。磷化合物之例者,列舉如三苯膦 一 (鄰-曱苯基)膦、三(鄰-曱氧基笨基)膦。添加麟化: 物時,其添加量,相對於鈀觸媒1莫耳,通常為0 5莫^ 至100莫耳’較佳為0. 9莫耳至20莫耳,更佳為丨莫耳至 10莫耳。Qi-E 丨-Q2 (1〇〇) [wherein El represents a structural unit represented by the formula (1). (^ and q2, which are the same or different 'is a butterfly acid residue or a boronic acid ester residue.) and one or more compounds m2-i2 (200) represented by the following formula: wherein E2 represents a formula (2) ) to the structural unit represented by the formula (8). L and T2 are the same or different, and represent a halogen atom, a sulphuric acid S (a 1 ky 1 sulf〇nate) group, an aryl sulfonate (aryl). a sulfonate or a arylalkyl sulfonate group. A method for producing a reaction in the presence of a catalyst and a test. The compound of the formula (200) is used in the reaction of the compound 30 323797 201231491 In total, the total number of moles of one or more compounds represented by the formula (100) is preferably as a surplus, and the total number of moles of one or more compounds represented by the reaction formula is regarded as In the case of 1 mol, the total number of moles of the compound represented by the formula (100) is preferably from 〇6 to 0.99 mol, more preferably from 0.7 to 0.95 mol. In the formula (200), 1 and The halogen atom represented by L is exemplified by a gas atom, a chlorine atom, a bromine atom, and an iodine atom. The bromine atom and the iodine atom are preferred, and the bromine atom is more preferred. In the formula (200), the oxime and the T2 are represented by a non-alkyl group, and the methane sulfonate group and the ethane sulfonic acid are used. The ester group and the trifluorosulfonate group are exemplified. The aryl sulfonate group is exemplified by a benzenesulfonate group and a p-toluenesulfonic acid group. The arylalkyl sulfonate group is used. The benzyl sulfonate group is exemplified. For the catalyst used in the Suzuki coupling reaction, for example, pd ( 〇 > catalyst, Pd (II) catalyst, etc., specific examples of the catalyst are listed. ([Triphenylphosphine)], palladium acetate, dichlorobis(triphenylphosphine), (for the ease of reaction (polymerization) operation, the reaction (polymerization) speed of the dichlorobis (three) Phenylphosphine) palladium (II) or palladium acetate is preferred. The amount of the palladium catalyst to be added is not particularly limited, as long as it is a catalyst, and the compound represented by the formula (10〇) is 1 molar. , usually, 蕙〇. 〇〇〇1 molar to 0. 5 moles, preferably 〇. 0003 Moer to 〇. 丨 Moer is used in the Suzuki coupling reaction, for inorganic testing, Inorganic salts, etc. Inorganic testers, such as barium carbonate, sodium carbonate, gas oxygen, etc. Organic bases, such as triethylamine, tributylamine, etc., such as fluorinated planers, etc. 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 It is 1 mol to 10 mol. When the palladium catalyst is a palladium acetate, a phosphorus compound may be added as a ligand (1 i gand ). As examples of the phosphorus compound, there are exemplified by triphenylphosphine-(o-nonylphenyl)phosphine and tris(o-o-oxyphenyl)phosphine. When adding the lining: the amount of the addition, relative to the palladium catalyst 1 mole, usually 0 5 moles to 100 moles, preferably 0. 9 moles to 20 moles, more preferably 丨莫耳To 10 moles.
Suzuki偶合反應方面,反應通常在溶媒中進行。溶媒 之例者,列舉如N,N-二甲基甲醯胺、曱苯、二曱氧基乙燒、 四氫呋喃。由高分子化合物之溶解性觀點,以甲苯、四氣 °夫喃為佳。再者,將驗加入水溶液之反應系中,可於水相 及有機相之2相溶媒中使單體反應。使用鹼為無機鹽時, 通常’加入水溶液之反應系中,於2相溶媒中使單體反靡。 尚且,將驗加入水溶液之反應系中,於2相之溶媒中 使單體反應時’視必要,可將4級銨鹽等之相間移動觸媒 加入反應系中。In the case of the Suzuki coupling reaction, the reaction is usually carried out in a solvent. Examples of the solvent include, for example, N,N-dimethylformamide, toluene, dimethoxyethyl bromide, and tetrahydrofuran. From the viewpoint of solubility of the polymer compound, toluene or tetrakisole is preferred. Further, in the reaction system of the aqueous solution, the monomer can be reacted in a two-phase solvent of the aqueous phase and the organic phase. When a base is used as the inorganic salt, the monomer is usually ruthenium in a 2-phase solvent in a reaction system in which an aqueous solution is added. Further, in the reaction system of the aqueous solution, when the monomer is reacted in the solvent of the two phases, a phase shifting catalyst such as a fourth-order ammonium salt or the like may be added to the reaction system as necessary.
Suzuki偶合反應之溫度’係依前述溶媒,惟通常,為 50°C至160°C左右。由高分子化合物之高分子量化觀點, 以6(TC至120t為佳。再者,亦可升溫至溶媒之沸點附近 而使迴流。The temperature of the Suzuki coupling reaction depends on the above solvent, but usually it is about 50 ° C to 160 ° C. From the viewpoint of high molecular weight of the polymer compound, it is preferably 6 (TC to 120 t. Further, it is also possible to raise the temperature to the vicinity of the boiling point of the solvent to reflux.
Suzuki偶合反應之進行時間(反應時間),可將達到 目標之聚合度時作為終點,通常,為〇1小時至2〇〇小時 323797 32 201231491 左右,以1小時至30小時左右為佳。The progress time (reaction time) of the Suzuki coupling reaction can be used as the end point when the degree of polymerization of the target is reached. Usually, it is about 1 hour to 2 hours 323797 32 201231491, preferably about 1 hour to 30 hours.
Suzuki偶合反應係於氬氣、氮氣等惰性氣體環境下I巴 觸媒不會失活之反應系進行。例如,以氬氣及氮氣等,使 充分脫氣之系内進行。具體而言,將反應容器(反應系) 内以氮氣充分取代,脫氣之後,在此聚合容器中,加入式 (100)表示之化合物、式( 200 )表示之化合物、二氯雙 (三苯膦)鈀(II),再以氮氣將反應容器充分取代,脫氣 之後,加入預先以l氣通氣起泡,經脫氣之溶媒,例如, 脫氣之曱苯後,於該溶液中,滴入預先經氮氣通氣起泡脫 氣之驗,例如,經脫氣之碳酸納水溶液後,加熱、升溫、 例如,在迴流溫度,同時保持惰性氣體環境下進行聚合8 小時。 含有式(8)所表示結構單元之本發明化合物,係對 於含有式(1)所表示結構單元,且不含式(8)所表示結 構單元之化合物加與能量,使Y表示之2價基脫離即可製 造之。起始化合物具有Y表示之2價基複數個時,可將Y 表示之2價基全部脫離,或亦可使該等基之一部份脫離。 <含有本發明之化合物及溶媒的溶液> 本發明之溶液,含有本發明之化合物及溶媒。溶媒之 例者,由化合物之溶解性觀點,列舉如芳香族烴溶媒、鹵 素取代芳香族烴溶媒、脂肪族烴溶媒、幽素取代脂肪族烴 溶媒、醚溶媒。芳香族烴溶媒之例者,列舉如二甲苯、1,3, 5-三甲苯(mes i ty 1 ene )、曱氧苯(anisole)、環己基苯。鹵 素取代芳香族烴溶媒之例者,列舉如氯苯、二氯苯、三氯 33 323797 201231491 苯。脂肪族經溶媒之例者,列舉如四氫蔡(tetralin)。齒 綠代脂肪埃烴溶媒之例者,列舉如四氣化碳、氯仿、二 氣曱烧、一氣乙院、氯丁烧'漠丁烧、氣戍烧、漠戊烧、 氣己己烧、氣環已烧、漠環已烧。醚溶媒之例者, 列舉如四氫咬喃、四氫派喃(tetrahydropyran)。 使用4岭液將含有本發明之化合物的薄膜成膜時,若 ☆液中a媒之雜低,則用於形成均—薄膜之乾燥步驟會 有控制困難之情況。因此,溶媒之彿點以⑽。c以上為佳, 2 0 0 °C以上為較佳。 <含有本發明之化合物的薄膜> 含有本發明之化合物的薄膜其製造方法並無特別限 制鑑於成膜之容易度,以將含有本發明之化合物及溶媒 的溶液塗佈於基板等而形成之方法為佳。 塗佈方法者,列舉如澆鑄(cast)方法、旋轉塗佈(spin C〇at)方法、刮條塗佈(bar coat)法、喷墨(inkjet) 方法、利用凸版之印刷方法、利用孔版之印刷方法、於第 1版塗佈後轉印至第2版並利用第2版印刷之方法等。 基板者並無特別限制,例示如玻璃、聚乙烯、聚苯乙 稀及氣樹脂所成之㈣及薄膜、残鋼及料金屬、石夕晶 片等。 έ有本發月之含有式(8)所表示結構單元之化合物 的薄膜’係對於含有式⑴所表減構單元,且*含式(8) 所表示結構單元之化合物所形成的薄膜加與能量,使Υ表 示之2價基一部份脫離即可製造之。The Suzuki coupling reaction is carried out in an inert gas atmosphere such as argon or nitrogen, in which the Ib catalyst is not deactivated. For example, argon gas, nitrogen gas or the like is used to carry out sufficient degassing. Specifically, the reaction vessel (reaction system) is sufficiently substituted with nitrogen gas, and after degassing, a compound represented by the formula (100), a compound represented by the formula (200), and dichlorobis(triphenylbenzene) are added to the polymerization vessel. Palladium (II), and the reaction vessel is sufficiently substituted with nitrogen. After degassing, a solvent which is previously ventilated with a gas, degassed, for example, degassed benzene, is added to the solution. The test is carried out by previously bubbling degassing by nitrogen gas, for example, after degassing the aqueous solution of sodium carbonate, heating, raising the temperature, for example, at a reflux temperature while maintaining an inert gas atmosphere for 8 hours. The compound of the present invention containing a structural unit represented by the formula (8) is a compound having a structural unit represented by the formula (1), and a compound having no structural unit represented by the formula (8) is added with energy, and Y is represented by a divalent group. It can be manufactured by leaving it. When the starting compound has a plurality of divalent groups represented by Y, all of the divalent groups represented by Y may be detached, or one of the groups may be detached. <Solution containing the compound of the present invention and a solvent> The solution of the present invention contains the compound of the present invention and a solvent. In the case of the solvent, examples of the solubility of the compound include an aromatic hydrocarbon solvent, a halogen-substituted aromatic hydrocarbon solvent, an aliphatic hydrocarbon solvent, a crypto-substituted aliphatic hydrocarbon solvent, and an ether solvent. Examples of the aromatic hydrocarbon solvent include, for example, xylene, 1,3,5-trimethylbenzene (mesic), anisole, and cyclohexylbenzene. Examples of halogen-substituted aromatic hydrocarbon solvents include, for example, chlorobenzene, dichlorobenzene, and trichloro 33 323797 201231491 benzene. Examples of aliphatic solvents include, for example, tetralin. Examples of the green-green aliphatic hydrocarbon solvent are listed as four gasified carbon, chloroform, two gas smoldering, one gas sputum, chloroprene sulphur 'dibutin burning, gas smoldering, molybdenum burning, gas burning, The gas ring has burned and the ring has burned. Examples of the ether solvent include tetrahydropyran and tetrahydropyran. When a film containing the compound of the present invention is formed into a film by using a tetraline solution, if the amount of a medium in the liquid is low, the drying step for forming the uniform film may be difficult to control. Therefore, the Buddha's point of the solvent is (10). Preferably, c is above, and above 200 °C is preferred. <Film containing the compound of the present invention> The method for producing the film containing the compound of the present invention is not particularly limited, and a solution containing the compound of the present invention and a solvent is applied to a substrate or the like in view of easiness of film formation. The method is better. The coating method includes, for example, a casting method, a spin coating method, a bar coating method, an inkjet method, a printing method using a relief, and a stencil. The printing method is a method of transferring to the second edition after the first edition is applied, and printing by the second edition. The substrate is not particularly limited, and examples thereof include (4) glass, polyethylene, polystyrene, and gas resin, and films, residual steel, and metal materials, and stone crystal tablets. A film comprising a compound containing a structural unit represented by the formula (8) in the present month is added to a film containing a compound having the structural unit represented by the formula (1) and having a structural unit represented by the formula (8) The energy can be made by removing a part of the divalent base represented by Υ.
34 323797 S 201231491 <積層體> 本發明之積層體為具有基體及薄膜之積層體,前述薄 膜係將含有本發明之化合物及溶媒的溶液塗佈於該基體上 而形成含有式(1)所表示結構單元之化合物的塗膜,其次, 對該塗膜加與能量,使塗膜所含之包含式(1)所表示結構 單元之化合物其全體内至少一部分所含之式(1)所表示之 結構單元變換成式(8)所表示之結構單元而獲得之薄膜者。 對包含式(1)所表示結構單元之化合物加與能量, 則式(1)中Y所表示之2價基脫離,生成包含式(8)所 表示結構單元之化合物。 該能量之例者,列舉如熱能量、光能量。 使用熱能量時,只要係Y所表示之2價基自前述化合 物脫離之溫度以上,並且較該化合物分解之溫度更低的溫 度即可,可設定任意之溫度。通常以150°C至400°C之範圍 為佳,較佳為200°C至350°C。進行熱處理之時間者,可選 定工業的範圍,通常為1分至50小時,佳為10分至24 小時。熱處理之氣體環境者,惰性氣體環境為佳,如氮氣 中、氬氣中、真空中作為示例。惰性氣體環境中含有氧氣 時,以氧氣濃度100體積ppm以下者為佳,10 ppm以下者 為較佳。再者,惰性氣體環境為真空時,氧氣分壓在200Pa 以下者為佳,較佳為50Pa。 藉由光使Y所表示之2價基脫離之方法者,以400nm 以下波長之紫外線照射的方法作為示例。光強度如係使Y 所表示之2價基脫離之強度則無特別限制。光照射時之氣 35 323797 201231491 體%丨兄’亦以情性氣體環境為佳,其範圍可適用前述之示 例範圍^ 本發明之積層體’可使用於有機電晶體、有機電場發 光元件等。 基體可為玻璃、薄膜等基板,亦可具有基板及電極, 亦可具有基板及電極及有機層。將積層體使用於有機電晶 體時’基體’以由基板及閘(gate)電極及閘絕緣層形成 者為佳°將積層體使用於有機電場發光元件時,基體以由 基板及陽極及有機層形成者為佳。 本發明之積層體的製造方法為具有薄膜及基體之積 層體的製造方法’係具有:將含有本發明之化合物及溶媒 的溶液塗佈於該基體上,形成含有式(丨)所表示結構單元 之化合物的塗膜之步驟,以及對該塗膜加與能量,使塗膜 中所3之包含式(1 )所表示結構單元之化合物全體内至少 :部分所含之式(1)所表示結構單元變換成式(8) 所表 不結構單元而形成薄膜之步驟的積層體的製造方法。 <有機電晶體> 本發明之化合物適用於有機電晶體之有機半導體 層有機電晶體係具備,源(source)電極及汲(drain) 電極、於此等之間形成電流通路之有機半導體層(活性 層)、控制通過電流通路之電流量之閘電極者,以電場效應 型有機電晶體、靜電誘導财機電晶體等作為示例。 電場效應型薄膜有機電晶體以具備源電極及汲電 極、於此等之間形成電流通路之有機半導體層(活性層)、 36 32379734 323797 S 201231491 <Laminate> The laminate of the present invention is a laminate having a matrix and a film, and the film is coated on the substrate with a solution containing the compound of the present invention and a solvent to form a formula (1). The coating film of the compound of the structural unit is further added to the coating film, and the compound (1) contained in at least a part of the entire compound including the structural unit represented by the formula (1) contained in the coating film is contained. A film obtained by converting a structural unit represented by the structural unit represented by the formula (8). When the compound containing the structural unit represented by the formula (1) is added with energy, the divalent group represented by Y in the formula (1) is desorbed to form a compound containing the structural unit represented by the formula (8). Examples of such energy include, for example, thermal energy and light energy. When heat energy is used, any temperature may be set as long as the divalent group represented by the system Y is separated from the temperature of the compound and is lower than the temperature at which the compound is decomposed. It is usually in the range of from 150 ° C to 400 ° C, preferably from 200 ° C to 350 ° C. The time for heat treatment can be selected from the industrial range, usually from 1 minute to 50 hours, preferably from 10 minutes to 24 hours. For a gas atmosphere of heat treatment, an inert gas atmosphere is preferred, such as nitrogen, argon, or vacuum as an example. When oxygen is contained in an inert gas atmosphere, the oxygen concentration is preferably 100 ppm by volume or less, and 10 ppm or less is preferred. Further, when the inert gas atmosphere is a vacuum, the oxygen partial pressure is preferably 200 Pa or less, preferably 50 Pa. A method of illuminating a divalent group represented by Y by light, and irradiating with ultraviolet rays having a wavelength of 400 nm or less is exemplified. The light intensity is not particularly limited as long as the strength of the divalent group represented by Y is removed. Gas at the time of light irradiation 35 323797 201231491 The body is also in an atmosphere of an atmosphere, and the range of the above-described example can be applied. The laminated body of the present invention can be used for an organic transistor, an organic electric field emitting element, or the like. The substrate may be a substrate such as glass or a film, or may have a substrate and an electrode, or may have a substrate, an electrode, and an organic layer. When the laminate is used in an organic transistor, the 'base' is preferably formed by a substrate, a gate electrode, and a gate insulating layer. When the laminate is used for an organic electroluminescent device, the substrate is composed of a substrate, an anode, and an organic layer. The formation is better. The method for producing a laminate of the present invention is a method for producing a laminate having a film and a substrate, wherein a solution containing the compound of the present invention and a solvent is applied onto the substrate to form a structural unit represented by the formula (丨). a step of coating a film of the compound, and adding energy to the coating film, such that the compound represented by the formula (1) contained in at least part of the compound including the structural unit represented by the formula (1) in the coating film 3 The unit is converted into a method for producing a laminate in which the step of forming a thin film is represented by the formula (8). <Organic transistor> The compound of the present invention is suitable for use in an organic semiconductor layer of an organic transistor, and includes an organic electrode layer in which a source electrode and a drain electrode form a current path therebetween. (Active layer), a gate electrode that controls the amount of current passing through the current path, and an electric field effect type organic transistor, an electrostatic induction electron electromechanical crystal, or the like is exemplified. An electric field effect type thin film organic transistor having an organic semiconductor layer (active layer) having a source electrode and a tantalum electrode and forming a current path therebetween, 36 323797
S 201231491 控制通過此電流通路之電流量 半導體層及閘電極之間的絕之閘電極,以及配置於有機 特別以源電極及汲電極佳。 層)而設置,更且包夾有機半接有機半導體層(活性 電極者為佳。 導體層連結之絕緣層設置閘 靜電誘導型薄獏有機電晶體,/ 極、於此等之間成為電流通路 係具有源電極及及電 以及控制通過電流通路之電流息有機半導體層(活性層)、 置在有機半導體層中為佳。=之間電極,此閘電極以設 機半導體層中設置之閘電極源電極、汲電極及有 佳。於此,閘電極之結構者 接有機半導體層設置為 電流通路,而且對開電極施加=電極流向沒電極形成 之電流量的結構為宜,列舉如控制流過電流通路 [實施例] 以下,為求將本發明更詳細說 一 發明不限定於此等者。 實施例表示,但本 (NMR測定) 丽R測定係將化合物溶解至重 (Varian社製、IN〇VA3〇〇)進行。方,使用NMR設備 (數平均分子量及重量平均分子量^ 關於數平均分子量及重量平均分= 透層析(GPC),求出聚苯乙烯換算之^一量係藉由凝膠滲 平均分子量。GPC設備,使用島津製^岣分子量及重量 LC-HJAvp (管柱:TsKgel SuperHM =製,商品名: U〇S〇H製)2支及 323797 37 201231491S 201231491 Controls the amount of current passing through this current path. The absolute gate electrode between the semiconductor layer and the gate electrode, and the organic electrode, especially the source electrode and the germanium electrode. The layer is provided, and the organic semiconductor layer is sandwiched between the organic semiconductor layers (the active electrode is preferred. The insulating layer to which the conductor layer is connected is provided with a gate-electrostatic induction type thin organic transistor, / pole, which becomes a current path between the layers) Preferably, the organic semiconductor layer (active layer) having the source electrode and the electric current and controlling the current through the current path is disposed in the organic semiconductor layer. The electrode is disposed between the gate electrode and the gate electrode disposed in the semiconductor layer. The source electrode and the ruthenium electrode are preferably used. Here, the structure of the gate electrode is connected to the organic semiconductor layer as a current path, and it is preferable to apply a structure to the open electrode that the electrode flows to the electrode without forming an electrode. [Examples] Hereinafter, the present invention is not limited to the above, and the present invention is shown in the examples. However, the present example shows that the compound is dissolved in a heavy amount (manufactured by Varian Co., Ltd., IN〇). VA3〇〇), using NMR equipment (number average molecular weight and weight average molecular weight ^ about number average molecular weight and weight average score = permeation chromatography (GPC), find polystyrene The amount of the conversion is determined by the average molecular weight of the gel. The GPC equipment is made of Shimadzu Corporation, molecular weight and weight LC-HJAvp (manufactured by TsKgel SuperHM = product name: U〇S〇H). 323797 37 201231491
TsKgel SuperH2000 (TOSOH製)1支以直列接續,移動相: 四氫咬喃,流速:0. 6ml/分,樣品濃度:約0. 5重量%、 檢出器:示差折射率檢出器或UV檢出器)或,Waters製、 商品名:Alliance GPC/V2000C 管柱:PLgel MIXED-B(Varian 製)3支以直列接續,管柱溫度:140°C、移動相:鄰二氣 苯,流速:1 ml/分,樣品濃度:約〇. 77重量%、檢出器: 示差折射率檢出器或UV檢出器)。 高分子化合物之吸收波長的測定,使用在紫外、可 視、近紅外之波長範圍可操作的分光光度計(例如,曰本 分光製’紫外可視近紅外分光光度計JASCO-V670 )。使用 JASCO-V670時,可能測定之波長範圍為200至1500nm,故 以該波長範圍進行測定。首先,測定使用於測定之基板的 吸收光譜。基板者,使用石英基板、玻璃基板等。其次, 在該基板上塗佈含有高分子化合物之溶液,乾燥形成含有 高分子化合物之薄膜。其後,將薄膜及基板之積層體的吸 收光譜加以測定。以薄膜及基板之積層體的吸收光譜與基 板的吸收光譜兩者之差為薄膜的吸收光譜。 參考例1 (化合物(C-2)之合成)1⁄4重量%, Detector: Differential refractive index detector or UV Detector), Waters, trade name: Alliance GPC/V2000C Pipe column: PLgel MIXED-B (Varian) 3 in series, column temperature: 140 ° C, mobile phase: o-diphenyl, flow rate : 1 ml/min, sample concentration: approx. 77 wt%, detector: differential refractive index detector or UV detector). The absorption wavelength of the polymer compound is measured using a spectrophotometer operable in the ultraviolet, visible, and near-infrared wavelength range (for example, a sputum spectroscopic "UV visible near-infrared spectrophotometer JASCO-V670". When JASCO-V670 is used, the wavelength range that can be measured is 200 to 1500 nm, so it is measured in this wavelength range. First, the absorption spectrum of the substrate used for the measurement was measured. As the substrate, a quartz substrate, a glass substrate, or the like is used. Next, a solution containing a polymer compound is applied onto the substrate, and dried to form a film containing the polymer compound. Thereafter, the absorption spectrum of the laminate of the film and the substrate was measured. The difference between the absorption spectrum of the laminate of the film and the substrate and the absorption spectrum of the substrate is the absorption spectrum of the film. Reference Example 1 (Synthesis of Compound (C-2))
38 323797 S 20123149138 323797 S 201231491
(C-1)(C-1)
添加化合物(C-l )(東京化成工業社製)20. 16g (60. OOmmol )、馬來酸酐 20.59g (210· Ommol )、及曱苯 250mL,在室溫(25°C )以氬氣通氣起泡30分鐘。此時, 化合物(C-1)對曱苯係不溶,反應系中為不均一。設定油 浴溫度為120°C,藉由使反應液迴流3. 5小時,進行 Diels-Alder反應,使反應系内成為均一。其後,將甲醇 20mL每隔30分共5回(計100mL)加入反應液,.使加熱迴 流3小時,獲得酸酐開環之單酯體。其後,將濃硫酸lg 每隔3小時共2回加入反應液,使加熱迴流6小時。使用 蒸發器將反應液中溶媒除去之後,加入己烷200mL,於室 溫攪拌1小時,除去馬來酸酐。將曱醇200mL加入反應液, 再將濃硫酸lg每隔3小時共2回加入,使加熱迴流6小時 後,將反應液過濾取除不溶物。以使用氯仿作展開溶媒之 管柱進行反應液之分離,分離物以己烷再沉澱,獲得無色 粉末之蒽的架橋體(化合物(C-2)) 25. 17g。 實施例1 39 323797 201231491 (高分子化合物1之合成)Addition of compound (Cl) (manufactured by Tokyo Chemical Industry Co., Ltd.) 20.16g (60. 00mmol), maleic anhydride 20.59g (210·Ommol), and toluene 250mL, ventilated at room temperature (25 ° C) with argon gas Soak for 30 minutes. At this time, the compound (C-1) is insoluble to the indolebenzene, and the reaction system is not uniform. The temperature of the oil bath was set to 120 ° C, and the reaction liquid was refluxed for 3.5 hours to carry out a Diels-Alder reaction to make the inside of the reaction system uniform. Thereafter, 20 mL of methanol was added to the reaction liquid for 5 times (100 mL) every 30 minutes, and the mixture was heated to reflux for 3 hours to obtain an acid anhydride ring-opened monoester body. Thereafter, the concentrated sulfuric acid lg was added to the reaction liquid twice a week for 3 hours, and the mixture was heated under reflux for 6 hours. After the solvent in the reaction mixture was removed using an evaporator, 200 mL of hexane was added thereto, and the mixture was stirred at room temperature for 1 hour to remove maleic anhydride. 200 mL of decyl alcohol was added to the reaction liquid, and lg of concentrated sulfuric acid was added twice every 3 hours, and after heating under reflux for 6 hours, the reaction liquid was filtered to remove insoluble matter. Separation of the reaction liquid was carried out using a column using chloroform as a solvent, and the residue was reprecipitated with hexane to obtain a bridge of the colorless powder (compound (C-2)) 25. 17 g. Example 1 39 323797 201231491 (Synthesis of Polymer Compound 1)
(C-2) (A)(C-2) (A)
於手套箱内之lOOmL反應管中,將化合物(C-2) 311mg、聯11塞吩(bithiophene)之二硼酸酯體(化合物(A)) 292mg、氯化甲基三烧基錢(methyltrialkylammonium chloride)(商品名 A1 iquat336 (登錄商標)、Aldrich 杜 製)秤量後加入,其後,在氮氣環境之手套箱内,將脫氣 之曱苯12g、脫氣之碳酸鉀水溶液12g、及觸媒之四(三笨 膦)Is (Pd (PPh3) 4) 1.5mg加入反應管。前述礙酸卸水 溶液係將碳酸鉀282mg溶解至脫氣之純水I2g中製造之。 於迴流條件使反應17小時後,將相對於化合物(c一2) 為0. 13莫耳等量之 >臭苯添加至反應液,使繼續迴流1 5 小時,更且,將相對於化合物(C-2)為〇. 13莫耳等量之 苯硼酸添加至反應液,使繼續迴流L 5小時後,停止反應。 將反應液中之水層除去後,添加氯仿至有機層,使加 熱溶解後,以蒸發器濃縮,進行減壓乾燥,獲得粗精製物。 將氣仿加至所得粗精製物使加熱溶解後,使用以氧化紹及 氧化石夕積層之管柱進行3回精製處理4柱處理後之溶液 以蒸發器濃縮,進行減壓乾燥獲得黃色粉狀之高分子化人 物1二高分子化合物i之收量為·mg。高分子化口 之聚苯乙龍算的數平均分子量為17,⑽,聚苯乙稀換算 323797 40 201231491 的重量平均分子量為31,300。 參考例2 (化合物(C-3)之合成)In the 100 mL reaction tube in the glove box, the compound (C-2) 311 mg, the bithiophene diborate body (compound (A)) 292 mg, methyltrialkylammonium chloride (methyltrialkylammonium) Chloride) (trade name A1 iquat336 (registered trademark), Aldrich Duo) was weighed and added, and then, in a glove box under nitrogen atmosphere, degassed terpene 12g, degassed potassium carbonate aqueous solution 12g, and catalyst Four (three stupid phosphine) Is (Pd (PPh3) 4) 1.5 mg was added to the reaction tube. The above acid-blocking aqueous solution was prepared by dissolving 282 mg of potassium carbonate in degassed pure water I2g. After the reaction was carried out for 17 hours under reflux conditions, the compound (c-2) was added to the reaction mixture with respect to the compound (c-2), and the odor benzene was added to the reaction liquid to continue reflux for 15 hours, and more, relative to the compound. (C-2) was added to the reaction liquid with an equal amount of 13 moles of phenylboronic acid, and the reaction was stopped after continuing to reflux for 5 hours. After removing the aqueous layer in the reaction mixture, chloroform was added to the organic layer to dissolve the mixture, and the mixture was concentrated by an evaporator and dried under reduced pressure to obtain a crude product. After adding the gas to the obtained crude product and dissolving it by heating, it is subjected to three-stage refining treatment using a column of oxidized and oxidized stone layer, and the solution after the four-column treatment is concentrated by an evaporator, and dried under reduced pressure to obtain a yellow powder. The yield of the polymerized person 1 polymer compound i is · mg. The number average molecular weight of the polystyrene monomer in the polymerized port was 17, (10), and the weight average molecular weight of the polystyrene conversion 323797 40 201231491 was 31,300. Reference Example 2 (Synthesis of Compound (C-3))
對4 口燒瓶,加入化合物(C-2) 4.802 g、雙(頻哪 醇)二硼(bis(pinacolato)diboron) 10. 16g 及二鳄烷 150mL ’在室溫(25°C )使用氬氣於4 口燒瓶中通氣起泡。 將〔1,1’ -雙(二苯膦)二茂鐵〕二氣鈀(Π)〔1,Γ -bis (diphenylphosphine) ferrocene] dichloro palladium (II) 408. 3 mg、1,1’ _雙(二苯膦)二茂鐵 277. 2呢及 醋酸鉀3. 926g加入後,使反應液加熱迴流7小時。反應後, 藉由液相層析痛認原料消失。反應係在氬氣環境下進行。 利用遽器將反應液中難溶之鹼分離。反應液以蒸發器乾燥 30分鐘程度,去除溶媒。以參考例1同樣方法,將反應液 用管柱分離後,使分離物溶解在少量丙酮中,加入曱醇擾 拌,藉由加入少量水,獲得化合物(c_2)之雙(頻哪醇) 酯體(化合物(C-3)) 3· 50g。化合物(〇3)之收量為60. 9 %,藉由液相層析儀求得之面積百分率其純度為97 5%。 所得化合物(C-3)之1h-NMR (CDzCl2 (ppm))位移值 顯示為(s,24H)、3. 17(m,2H)、3.48( d,6H)、4.58( s,2H)、 7. 28 ( m,2H)、7. 50 (m,2H)、7. 67 ( s,2H)、確認生成目標 323797 41 201231491 物。 實施例2 (高分子化合物2之合成)For 4-necked flask, add compound (C-2) 4.802 g, bis(pinacolato)diboron 10. 16g and dicrosin 150mL 'Use argon at room temperature (25 ° C) Ventilation was carried out in a 4-neck flask. [1,1'-bis(diphenylphosphino)ferrocene] 1, palladium-bis (diphenylphosphine) ferrocene] dichloro palladium (II) 408. 3 mg, 1,1' _ double (Diphenylphosphine) ferrocene 277. 2 and potassium acetate 3. After the addition of 926 g, the reaction solution was heated to reflux for 7 hours. After the reaction, the raw materials disappeared by liquid chromatography. The reaction was carried out under an argon atmosphere. The insoluble base in the reaction liquid is separated by a crucible. The reaction solution was dried by an evaporator for 30 minutes to remove the solvent. In the same manner as in Reference Example 1, the reaction solution was separated by a column, and the isolate was dissolved in a small amount of acetone, and a mixture of sterol was added thereto to obtain a bis(pinacol) ester of the compound (c_2) by adding a small amount of water. (Compound (C-3)) 3·50g. The yield of the compound (〇3) was 60.9 %, and the area fraction obtained by liquid chromatography was 97 % by purity. The 1h-NMR (CDzCl2 (ppm)) shift values of the obtained compound (C-3) are shown as (s, 24H), 3.17 (m, 2H), 3.48 (d, 6H), 4.58 (s, 2H), 7. 28 (m, 2H), 7.50 (m, 2H), 7.67 (s, 2H), confirm the target 323797 41 201231491. Example 2 (Synthesis of Polymer Compound 2)
對50mL 3 口燒瓶,將化合物(C-3 ) 230mg、三苯胺 衍生物(化合物(B)) 184mg、氣化曱基三烷基銨(商品名 Aliquat336(登錄商標)、Aldrich社製)81mg秤量加入後, 在氬氣環境下,將脫氣之曱苯12 mL加入後,升溫至90°C。 其次,將I巴二醋酸鹽(Pd ( OAc) 2) 0. 92mg及三(鄰-曱 氧基苯)膦(P ( 〇-MeOPh) 3) 34. 95mg加至反應液,升溫 至100°C後,將脫氣之16. 7%碳酸鈉(Na2C〇3)水溶液2· 54g 滴下。其後,在l〇〇°C進行半反應5小時27分後,使化合 物(C-3) 4. 59mg、0· 95mg Pd ( OAc) 2、4. 95mg P ( ο-MeOPh ) 3溶解在甲苯4mL,將所得甲苯溶液加至反應液中。其後, 在100°C進行反應2小時10分。放置冷卻至室溫後,將反 應液之油層以水洗淨2回,以3%醋酸水溶液洗淨1回, 以水洗淨3回後,加入硫酸鈉(Na2S〇4)乾燥之。其後, 使用氧化鋁及氧化矽積層之管柱進行精製,將經管柱處理 之溶液濃縮,濃縮液加至甲醇,回收析出物,乾燥,獲得 高分子化合物2。高分子化合物2之收量為133 mg。高分 42 323797In a 50 mL three-necked flask, 230 mg of the compound (C-3), 184 mg of the triphenylamine derivative (compound (B)), and vaporized mercaptotrialkylammonium (trade name: Aliquat 336 (registered trademark), manufactured by Aldrich Co., Ltd.) were weighed in an amount of 81 mg. After the addition, 12 mL of degassed terpene was added under an argon atmosphere, and the temperature was raised to 90 °C. Next, I bar diacetate (Pd (OAc) 2) 0.92 mg and tris(o-nonyloxyphenyl)phosphine (P ( 〇-MeOPh) 3) 34. 95 mg were added to the reaction solution, and the temperature was raised to 100 °. After C, a degassed 16.7% sodium carbonate (Na2C〇3) aqueous solution was dropped at 2.54 g. Thereafter, after a half reaction for 5 hours and 27 minutes at 10 ° C, the compound (C-3) 4.59 mg, 0.95 mg Pd (OAc) 2, 4.95 mg P ( ο-MeOPh ) 3 was dissolved in 4 mL of toluene was added to the reaction solution. Thereafter, the reaction was carried out at 100 ° C for 2 hours and 10 minutes. After standing to cool to room temperature, the oil layer of the reaction mixture was washed with water for 2 times, washed with a 3% aqueous solution of acetic acid for 1 time, washed with water for 3 times, and dried over sodium sulfate (Na 2 S 4 ). Thereafter, the column was purified using a column of alumina and yttria, and the solution treated by the column was concentrated, and the concentrate was added to methanol to collect a precipitate, which was dried to obtain a polymer compound 2. The yield of the polymer compound 2 was 133 mg. High score 42 323797
S 201231491 =二之重,換算的數平均分子量為聚 本乙烯換异的重量平均分子量為14, 〇〇〇。 實施例3 ’ ° (薄膜之製作) 將其調整為含有0.5 於矽晶片及玻璃上旋 高分子化合物1溶解在氯仿中, 重i/尚分子化合物1之氯仿溶液, 轉塗佈,獲得薄膜。 實施例4 (積層體之製造)S 201231491 = weight of two, the converted number average molecular weight is the weight average molecular weight of the polyethylene conversion is 14, 〇〇〇. Example 3 ‘° (Production of Film) This was adjusted to contain 0.5 Å of a ruthenium wafer and a glass. The polymer compound 1 was dissolved in chloroform, and the chloroform solution of the compound 1 was transferred to a film to obtain a film. Example 4 (Manufacture of laminate)
將石夕晶片上之薄膜及玻璃上之薄膜在氮氣環境下,於 300°C進行加熱處理,製造積層體。 關於矽晶片上形成之薄膜,對其加熱處理前後之薄膜 的紅外吸收光譜以紅外分光光度計測定之。加熱處理前之 薄膜的紅外吸收光譜Η及加熱處理後之薄膜的紅外吸收 光譜12表示於第1圖。再者,關於玻璃上形成之薄膜’對 其加熱處理前後之薄膜的紫外可視吸收光譜以紫外-可視 吸光光度計測定之。 加熱處理前之薄膜的紫外可視吸收光譜21及加熱處 理後之薄膜的紫外可視吸收光譜22表示於第2圖。 藉由薄膜之加熱,源自.薄膜醋結構在紅外吸收光 323797 43 201231491 1750cm_1之波峰消失。再者,藉由薄膜之加熱,生成源自 共軛系擴張之紫外可視吸收光譜之540nm之波峰。結^ 示於表1。 〔表1〕 矽晶片上之薄膜紅 外吸收光譜在 ΠδΟαιΓ1之波峰 玻璃上之薄膜紫外 可視吸收光譜在 540nm之波峰 加熱前 有波峰 無波峰 300度加熱後 無波峰 有波峰 參考例3 (有機電晶體之製作) 使用高分子化合物1,以下列方法製作具有第3圖所 示結構之有機薄膜電晶體。首先,將作成閘電極之高濃度 摻雜((1叩丨叩)之11-型矽基板31的表面熱氧化,形成1〇〇舰 之矽氧化膜32。 其火,藉由光飯刻法(photolithography)於碎氧化 祺32上製作通道長20μιη、通道寬2職之源電極33、汲電 極34 (由自矽氧化膜側,以鉻、金之順序積層之膜所形 成)。將如此獲得之基板充分洗淨後,使用六亞曱基二矽氮 、元(HMDS )’ U由方疋轉塗佈將基板之表面施行石夕烧處理。其 次’將高分子化合物丨溶解在氣仿而製備u質量%之溶 ^,以麟器過濾之。將過渡後之溶液,藉由旋轉塗佈法 衾佈於上述已進行表面處理之基板上。其後,在氮氣環境 323797 44 201231491 下’於300°c進行熱處理1小時,形成有機半導體層35。 (電晶體特性之測定) 對製作之有機薄膜電晶體 ,於閘電壓Vg為10至〜 60V、源/汲間電壓Vsd為—6〇v下測定電晶體特性。由測 定之特性算出獲得之電場效應移動度,為5xlO_3cm2/Vs。 結果表示於表2。 參考例4 (有機電晶體之製作) 使用高分子化合物2,以下列方法製作具有第4圖所 示結構之有機薄膜電晶體。首先,將作成閘電極之高濃度 換雜之η型碎基板31的表面熱氧化,形成1 〇〇nijj之碎氧 化膜32。將如此獲得之基板充分洗淨後,使用矽烧偶合劑 十八基三氯矽烷(octadecyltrichlorosilane)對基板之 表面進行矽烷處理。其次,將高分子化合物2溶解在氯仿 而製備0.5質量%之溶液。將此溶液於上述已進行表面處 理之基板上藉由旋轉塗佈法塗佈之。其後,在氮氣環境下, 於300 C進行熱處理1小時,形成有機半導體層35。其次, 藉由電阻加熱蒸鍍步驟於有機半導體層35上製作通道長 20/zm、通道寬2職之源電極33、汲電極34 (由自有機半 導體層侧,以Mo〇3、金之順序積層之膜所形成)。 (電晶體特性之測定) 對製作之有機薄膜電晶體,在閘電壓Vg為1〇至― 60V、源/汲間電壓Vsd為—6〇v下測定電晶體特性。由測 定之特性算出獲得之電場效應移動度,為2 4χ1〇_4 323797 45 201231491 cm2/Vs。結果表示於表2。 實施例5 (高分子化合物3之合成)The film on the Shi Xi wafer and the film on the glass were heat-treated at 300 ° C in a nitrogen atmosphere to produce a laminate. Regarding the film formed on the ruthenium wafer, the infrared absorption spectrum of the film before and after the heat treatment was measured by an infrared spectrophotometer. The infrared absorption spectrum of the film before the heat treatment and the infrared absorption spectrum 12 of the film after the heat treatment are shown in Fig. 1. Further, the ultraviolet visible absorption spectrum of the film before and after the heat treatment of the film formed on the glass was measured by an ultraviolet-visible spectrophotometer. The ultraviolet visible absorption spectrum 21 of the film before the heat treatment and the ultraviolet visible absorption spectrum 22 of the film after the heat treatment are shown in Fig. 2. By the heating of the film, the peak of the thin film vinegar structure disappears in the infrared absorption light 323797 43 201231491 1750 cm_1. Further, by heating of the film, a peak of 540 nm derived from the ultraviolet visible absorption spectrum of the conjugated system expansion is generated. The knots are shown in Table 1. [Table 1] Infrared absorption spectrum of the film on the yttrium wafer The ultraviolet visible absorption spectrum of the film on the peak glass of ΠδΟαιΓ1 has a peak without peaks before heating at 540 nm. There is no peak after peak heating. Reference Example 3 (Organic transistor (Production) Using the polymer compound 1, an organic thin film transistor having the structure shown in Fig. 3 was produced by the following method. First, the surface of the 11-type germanium substrate 31 which is doped with a high concentration of the gate electrode is thermally oxidized to form a tantalum oxide film 32 of a ship. The fire is etched by the light meal method. (photolithography) on the crushed ruthenium oxide 32, a channel length of 20 μm, a channel width of the source electrode 33, and a germanium electrode 34 (formed by a film laminated in the order of chromium and gold from the tantalum oxide film side) is obtained. After the substrate is sufficiently washed, the surface of the substrate is subjected to a smelting treatment by using a hexamethylene difluoride, a HMDS, and a U-turn coating. Next, the polymer compound is dissolved in the gas imitation. Prepare a mass% of the solution and filter it with a lining. The solution after the transition is applied to the surface-treated substrate by spin coating. Thereafter, under a nitrogen atmosphere of 323797 44 201231491 The heat treatment was performed at 300 ° C for 1 hour to form an organic semiconductor layer 35. (Measurement of transistor characteristics) For the fabricated organic thin film transistor, the gate voltage Vg was 10 to 60 V, and the source/turn voltage Vsd was -6 〇V. Determine the characteristics of the transistor, and calculate the characteristics of the measurement. The electric field effect mobility was 5 x 10 × 3 cm 2 /Vs. The results are shown in Table 2. Reference Example 4 (Production of Organic Electrode) Using the polymer compound 2, an organic thin film transistor having the structure shown in Fig. 4 was produced by the following method. First, the surface of the n-type fracture substrate 31 which is a high-density mixed gate electrode is thermally oxidized to form a crushed oxide film 32 of 1 〇〇nijj. After the substrate thus obtained is sufficiently washed, the simmering coupling agent is used. The surface of the substrate was subjected to decane treatment with octadecyltrichlorosilane. Secondly, a polymer compound 2 was dissolved in chloroform to prepare a 0.5% by mass solution, and this solution was spin-coated on the surface-treated substrate. Thereafter, the film was heat-treated at 300 C for 1 hour in a nitrogen atmosphere to form an organic semiconductor layer 35. Second, a channel length of 20/zm was formed on the organic semiconductor layer 35 by a resistance heating evaporation step. The source electrode 33 and the ytterbium electrode 34 of the wide position (formed by a film laminated in the order of Mo 〇 3 and gold from the side of the organic semiconductor layer) (measurement of the characteristics of the transistor) The organic thin film transistor has a transistor characteristic measured at a gate voltage Vg of 1 〇 to 60 V and a source/turn voltage Vsd of -6 〇 v. The electric field effect mobility obtained by the measured characteristic is 2 4 χ 1 〇_4 323797 45 201231491 cm2/Vs. The results are shown in Table 2. Example 5 (Synthesis of Polymer Compound 3)
對200ml 4 口燒瓶加入化合物(D) 392. 2mg、化合物 (C-2) 480. 2mg、四氫呋喃20mL,在室溫(25°C )進行氬 氣通氣起泡30分鐘。其次’將三(二亞苄基丙酮)二把 18.31mg、三(第三丁基)鐫四氟硼酸鹽(tri (tert-butyl) phosphonium tetrafluoroborate) 23. 21mg 加入反應液 中。將反應液於室溫攪拌同時,將27. 6重量%碳酸鉀水溶 液2g以30分鐘滴下,升溫至50°C。10分鐘後,升溫至 80°C進行3小時迴流。 將所得反應液’以N,N-二乙基二硫代胺基甲酸納 (sodium N,N-diethyldithi〇carbamate)水溶液谁一 加熱氣仿可溶部份,通過以氧化鋁及氧化 . 層之管杈 0 燥,獲得高 淨,將高分子化合物過濾。所得高分子化合物 仃洗 * ^ 1 ’ 將在 經管柱處理之液體加至甲醇,回收析出物, 分子化合物3。高分子化合物3之收量為 化合物3之聚苯乙烯換算的數平均分子量 高分子 乙烯換算的重量平均分子量為42,4〇〇。為Π,500,聚笨 參考例5 323797 46 201231491 (有機電晶體之製作) 使用高分子化合物3,以下列方法製作具有第4圖所 示結構之有機薄膜電晶體。首先,將作成閘電極之高濃度 摻雜之η-型石夕基板31的表面熱氧化,形成lOOnm之石夕氧 化膜32。將如此獲得之基板充分洗淨後,使用矽烷偶合劑 十八基三氯矽烷對基板之表面進行矽烷處理。其次,將高 分子化合物3溶解在氯仿而製備0. 5質量%之溶液。將此 溶液加熱至50°C,藉由旋轉塗佈法塗佈在50°C加熱之上述 已進行表面處理之基板上。其後,在氮氣環境下,於300 °C進行熱處理1小時,形成有機半導體層35。其次,藉由 電阻加熱蒸鍍步驟於有機半導體層35上製作通道長20// in、通道寬2匪之源電極33、>及電極34 (由自有機半導體 層側,以Mo〇3、金之順序積層之膜所形成)。 (電晶體特性之測定) 對製作之有機薄膜電晶體,在閘電壓Vg為10至一 60V、源/汲間電壓Vsd為一60V下測定電晶體特性。由測 定之特性算出獲得之電場效應移動度,為7. Ox 10 —3 cm2/Vs。結果表示於表2。 實施例6 (高分子化合物4之合成) 47 323797 201231491Into a 200 ml 4-necked flask, Compound (D) 392. 2 mg, Compound (C-2) 480. 2 mg, and tetrahydrofuran 20 mL were added, and argon gas was bubbled at room temperature (25 ° C) for 30 minutes. Next, 18.31 mg of tris(tert-butyl) phosphonium tetrafluoroborate (23 mg) of tris(dibenzylideneacetone) was added to the reaction liquid. While stirring the reaction solution at room temperature, 2 g of a 27.6% by weight aqueous potassium carbonate solution was added dropwise over 30 minutes, and the temperature was raised to 50 °C. After 10 minutes, the temperature was raised to 80 ° C and refluxed for 3 hours. The obtained reaction liquid is treated with an aqueous solution of sodium N,N-diethyldithicarbamate (Sodium N,N-diethyldithi〇carbamate), which is heated to form a soluble portion, passed through alumina and oxidized. Tube 杈 0 is dry, high purity is obtained, and the polymer compound is filtered. The obtained polymer compound was washed * ^ 1 ' The liquid treated in the column was added to methanol to recover the precipitate, and the molecular compound 3 was obtained. The yield of the polymer compound 3 is a polystyrene-equivalent number average molecular weight of the compound 3. The weight average molecular weight of the polymer in terms of ethylene is 42,4 Å. Π, 500, 聚笨 Reference Example 5 323797 46 201231491 (Production of Organic Electrode) Using the polymer compound 3, an organic thin film transistor having the structure shown in Fig. 4 was produced by the following method. First, the surface of the high-concentration doped n-type crystal substrate 31, which is a gate electrode, is thermally oxidized to form a 10 angstrom oxide film 32. After the substrate thus obtained was sufficiently washed, the surface of the substrate was subjected to decane treatment using a decane coupling agent, octadecyltrichloromethane. 5质量百分比的溶液。 Next, the high molecular compound 3 was dissolved in chloroform to prepare a 0.5% by mass solution. This solution was heated to 50 ° C and coated on the above-mentioned surface-treated substrate heated at 50 ° C by a spin coating method. Thereafter, heat treatment was performed at 300 ° C for 1 hour in a nitrogen atmosphere to form an organic semiconductor layer 35. Next, a source electrode 33 having a channel length of 20//in, a channel width of 2 Å, and an electrode 34 are formed on the organic semiconductor layer 35 by a resistance heating evaporation step (from the side of the organic semiconductor layer, Mo 〇 3, Gold is formed by a film of sequential layers). (Measurement of transistor characteristics) For the produced organic thin film transistor, the transistor characteristics were measured at a gate voltage Vg of 10 to 60 V and a source/turn voltage Vsd of 60 V. The electric field effect mobility obtained by the measured characteristic is 7. Ox 10 -3 cm2 / Vs. The results are shown in Table 2. Example 6 (Synthesis of Polymer Compound 4) 47 323797 201231491
οο
使用化合物(Ε)代替化合物(Β)以外,與實施例2 以同樣方法合成高分子化合物4。高分子化合物4之收量 為 35mg。 參考例6 (有機電晶體之製作) 使用尚分子化合物4 ’以下列方法製作具有第4圖戶) 示結構之有機電晶體。首先,將作成閘電極之高濃度推亲 之η-型石夕基板31的表面熱氧化,形成1〇〇nm之石夕氧化用 32。其次’將高分子化合物4溶解在鄰二氣苯製備〇 2 ^ 量%之溶液。將此溶液加熱至14代,並藉由旋轉塗制 塗佈在已加熱至un:之上述基板上。其後,在氮氣则 下,於獄進行熱處理1小時,形成有機半導體層35。 其次,藉由電阻加熱蒸鑛步驟於有機半導體層35上製個 道長m、通道寬2mm之源電極33、料極% (由 機半導體制’以Mq〇3、金之财積層謂卿成)。 323797 48 201231491 (電晶體特性之測定) 對製作之有機薄膜電晶體,在閘電壓Vg為1〇至— 60V、源/汲間電壓Vsd為一60V下測定電晶體特性。由測 定之特性算出獲得之電場效應移動度,為ΐ 2χ1〇_3 cm2/Vs。結果表示於表2。 實施例7 (高分子化合物5之合成)Polymer compound 4 was synthesized in the same manner as in Example 2 except that the compound (Ε) was used instead of the compound (Β). The yield of the polymer compound 4 was 35 mg. Reference Example 6 (Production of organic transistor) An organic transistor having a structure shown in Fig. 4 was produced by the following method using the molecular compound 4'. First, the surface of the η-type slab substrate 31, which is a high concentration of the gate electrode, is thermally oxidized to form a bismuth oxide 32 at 1 〇〇 nm. Next, the polymer compound 4 was dissolved in o-dioxane to prepare a solution of ^ 2 % by volume. This solution was heated to 14 passages and applied by spin coating to the above substrate which had been heated to un:. Thereafter, heat treatment was carried out for 1 hour in a nitrogen atmosphere to form an organic semiconductor layer 35. Next, on the organic semiconductor layer 35, a source electrode 33 having a channel length m and a channel width of 2 mm and a material electrode % (made by a semiconductor semiconductor, Mq 〇 3, and a gold accumulation layer) are formed by a resistance heating and smelting step. 323797 48 201231491 (Measurement of transistor characteristics) For the produced organic thin film transistor, the transistor characteristics were measured at a gate voltage Vg of 1 〇 to -60 V and a source/turn voltage Vsd of 60 V. The electric field effect mobility obtained from the measured characteristics is ΐ 2χ1〇_3 cm2/Vs. The results are shown in Table 2. Example 7 (Synthesis of Polymer Compound 5)
(C-3) (F)(C-3) (F)
使用化合物(F)代替化合物(B)以外,與實施例2 以同樣方法合成高分子化合物5。高分子化合物5之收量 為190mg。高分子化合物5之聚笨乙烯換算的數平均分子 1為60, 000 ,聚苯乙烯換算的重量平均分子量為94, 〇〇〇。 參考例7 (有機電晶體之製作) 使用高分子化合物5 ’以下列方法製作具有第4圖所 示結構之有機電晶體。首先,將作成閘電極之高濃度摻雜 之η-型石夕基板31的表面熱氧化,形成i〇〇nm之矽氡化膜 323797 49 201231491 32。將如此獲得之基板充分洗淨後,使用矽烷偶合劑十八 基三氯矽烷對基板之表面進行矽烷處理。其次,將高分子 化合物5溶解在氣仿而製備0. 5質量%之溶液。將此溶液 藉由旋轉塗佈法塗佈在上述已進行表面處理之基板上。其 後,在氮氣環境下,於300°C進行熱處理1小時,形成有 機半導體層35。其次,藉由電阻加熱蒸鍍步驟於有機半導 體層35上製作通道長20/zm、通道寬2mm之源電極33、沒 電極34 (由自有機半導體層側,以Mo〇3、金之順序積層之 膜所形成)。 (電晶體特性之測定) 對製作之有機薄膜電晶體,在閘電壓Vg為1〇至— 60V、源/汲間電壓vsd為一60V下測定電晶體特性。由測 定之特性算出獲得之電場效應移動度,為7. 5 χ丨〇 — 4 cm /Vs。結果表示於表2。 實施例8Polymer compound 5 was synthesized in the same manner as in Example 2 except that the compound (F) was used instead of the compound (B). The yield of the polymer compound 5 was 190 mg. The number average molecular molecule 1 of the polymer compound 5 in terms of polystyrene was 60,000, and the weight average molecular weight in terms of polystyrene was 94, 〇〇〇. Reference Example 7 (Production of organic transistor) An organic transistor having the structure shown in Fig. 4 was produced by the following method using the polymer compound 5'. First, the surface of the high-density doped n-type slab substrate 31 is thermally oxidized to form a bismuth film of 323 nm 323797 49 201231491 32. After the substrate thus obtained was sufficiently washed, the surface of the substrate was subjected to decane treatment using a decane coupling agent octadecyltrichloromethane. 5质量百分比的溶液。 Next, the polymer compound 5 was dissolved in a gas sample to prepare a solution of 0.5% by mass. This solution was applied onto the above-mentioned surface-treated substrate by spin coating. Thereafter, heat treatment was performed at 300 ° C for 1 hour in a nitrogen atmosphere to form an organic semiconductor layer 35. Next, a source electrode 33 having a channel length of 20/zm and a channel width of 2 mm and a non-electrode 34 are formed on the organic semiconductor layer 35 by a resistance heating vapor deposition step (from the side of the organic semiconductor layer, in the order of Mo〇3, gold) The film is formed). (Measurement of transistor characteristics) For the produced organic thin film transistor, the transistor characteristics were measured at a gate voltage Vg of 1 Torr to -60 V and a source/turn-to-turn voltage vsd of 60V. The electric field effect mobility obtained from the measured characteristics is 7.5 - 4 cm /Vs. The results are shown in Table 2. Example 8
(高分子化合物6之合成) Μα Μβ CioHoK(Synthesis of Polymer Compound 6) Μα Μβ CioHoK
50 323797 s 201231491 使用化合物(G )代替化合物(β )以外,與實施例2 以同樣方法合成高分子化合物6。高分子化合物6之收量 為lOOmg。高分子化合物6之聚笨乙烯換算的數平均分子 量為20, 000 ’聚苯乙烯換算的重量平均分子量為28,⑽〇 ^ 參考例8 ’ (有機電晶體之製作) 使用高分子化合物6,以下列方法製作具有第4圖所 不結構之有機電晶體。首先,將作成閘電極之高濃度摻雜 之η-型石夕基板31的表面熱氧化,形成i〇〇nm之石夕氧化膜 32。 將如此獲得之基板充分洗淨後,使用矽烷偶合劑苯乙 基二氯石夕烧(phenethyl trichlorosilane)對基板之表面 進行石夕烧處理。其次,將高分子化合物β溶解在甲苯而製 備0.5質量%之溶液。將此溶液在1〇(rc加熱,藉由旋轉 塗佈法塗佈在i〇〇c已加熱之上述已進行表面處理的基板 上。其後,在氮氣環境下,於3〇〇°C進行熱處理1小時, 形成有機半導體層35。其次,藉由電阻加熱蒸鍍步驟於有 機半導體層35上製作通道長20/zm、通道寬2mm之源電極 33、 汲電極34 (由自有機半導體層側,以M〇〇3、金之順序 積層之膜所形成)。 (電晶體特性之測定) 對製作之有機薄膜電晶體,在閘電壓Vg為1〇至一 60V、源/汲間電壓Vsd為〜6〇v下測定電晶體特性。由測 定之特性算出獲得之電場效應移動度,為ΐ 8χΐ〇_ 2cm2/Vs。結果表示於表2。 323797 51 201231491 實施例9 (高分子化合物7之合成)50 323797 s 201231491 The polymer compound 6 was synthesized in the same manner as in Example 2 except that the compound (G) was used instead of the compound (β). The yield of the polymer compound 6 was 100 mg. The polymer compound 6 has a polystyrene-equivalent number average molecular weight of 20,000 Å. The polystyrene-equivalent weight average molecular weight is 28, (10) 〇 ^ Reference Example 8 ' (Production of an organic transistor) Using a polymer compound 6, the following The column method produces an organic transistor having a structure not shown in Fig. 4. First, the surface of the n-type slab substrate 31 doped with a high concentration of the gate electrode is thermally oxidized to form a iridium oxide film 32 of i 〇〇 nm. After the substrate thus obtained was sufficiently washed, the surface of the substrate was subjected to a heat treatment using a decane coupling agent phenethyl trichlorosilane. Next, the polymer compound ? was dissolved in toluene to prepare a 0.5 mass% solution. This solution was heated at 1 Torr (rc) by spin coating on the above surface-treated substrate heated by i〇〇c. Thereafter, it was carried out at 3 ° C under a nitrogen atmosphere. After heat treatment for 1 hour, the organic semiconductor layer 35 is formed. Next, a source electrode 33 having a channel length of 20/zm and a channel width of 2 mm and a germanium electrode 34 are formed on the organic semiconductor layer 35 by a resistance heating evaporation step (from the side of the organic semiconductor layer) It is formed by a film laminated in the order of M〇〇3 and gold. (Measurement of transistor characteristics) For the fabricated organic thin film transistor, the gate voltage Vg is 1 〇 to 60 V, and the source/turn voltage Vsd is The transistor characteristics were measured at ~6 〇v. The electric field effect mobility calculated from the measured characteristics was ΐ 8 χΐ〇 2 cm 2 /Vs. The results are shown in Table 2. 323797 51 201231491 Example 9 Synthesis of Polymer Compound 7 )
使用化合物(H)代替化合物(B)以外,與實施例2 以同樣方法合成高分子化合物7。高分子化合物7之收量 為74mg。高分子化合物7之聚苯乙烯換算的數平均分子量 為59, 000,聚苯乙烯換算的重量平均分子量為89, 000。 參考例9 (有機電晶體之製作) 使用高分子化合物7,以下列方法製作具有第4圖所 示結構之有機電晶體。首先,將作成閘電極之高濃度摻雜 之η-型石夕基板31的表面熱氧化,形成100nm之石夕氧化膜 32。將如此獲得之基板充分洗淨後,使用矽烷偶合劑苯乙 基三氯矽烷對基板之表面進行矽烷處理。其次,將高分子 化合物7溶解在曱苯而製備0. 5質量%之溶液。將此溶液Polymer compound 7 was synthesized in the same manner as in Example 2 except that the compound (H) was used instead of the compound (B). The yield of the polymer compound 7 was 74 mg. The polymer compound 7 had a polystyrene-equivalent number average molecular weight of 5.9 000 and a polystyrene-equivalent weight average molecular weight of 890,000. Reference Example 9 (Production of organic transistor) Using the polymer compound 7, an organic transistor having the structure shown in Fig. 4 was produced by the following method. First, the surface of the η-type slab substrate 31 which is doped with a high concentration of the gate electrode is thermally oxidized to form a 100 nm oxidized film 32. After the substrate thus obtained was sufficiently washed, the surface of the substrate was subjected to decane treatment using a decane coupling agent phenethyltrichloromethane. 5质量百分比的溶液。 Next, the polymer compound 7 was dissolved in benzene to prepare a solution of 0.5% by mass. This solution
52 323797 S 201231491 藉由旋轉塗佈法塗佈在上述已進行表面處理的基板上。其 後’在氮氣環境下,於27(TC進行熱處理1小時,形成有 機半導體層35。其次,藉由電阻加熱蒸鑛步驟於有機半導 體層35上製作通道長2〇βιη、通道寬2mm之源電極33、、及 電極34 (由自有機半導體層侧,以M〇〇3、金之順序積層之 膜所形成)。 曰 (電晶體特性之測定) 對製作之有機薄膜電晶體,在閘電壓Vg為10至— 60V、源/汲間電壓vsd為—60V下測定電晶體特性。由測 定之特性算出獲得之電場效應移動度,為3. 3χ1〇-3 cra2/Vs。結果表示於表2。 實施例1 〇 (高分子化合物8之合成)52 323797 S 201231491 is coated on the above-mentioned surface-treated substrate by spin coating. Thereafter, under the nitrogen atmosphere, heat treatment was performed for 27 hours at TC to form the organic semiconductor layer 35. Secondly, a channel length of 2 〇βιη and a channel width of 2 mm were formed on the organic semiconductor layer 35 by a resistance heating distillation step. The electrode 33 and the electrode 34 (formed by a film laminated in the order of M〇〇3 and gold from the side of the organic semiconductor layer). 曰 (Measurement of transistor characteristics) For the fabricated organic thin film transistor, at the gate voltage The Vg is 10 to -60 V, and the source/turn-to-turn voltage vsd is measured at -60 V. The electric field effect mobility calculated from the measured characteristics is 3. 3 χ 1 〇 -3 cra2 / Vs. The results are shown in Table 2. Example 1 〇 (synthesis of polymer compound 8)
使用化合物(C-4)代替化合物(C-2)以外,與實施 53 323797 201231491 例1同樣方法合成高分子化合物8。高分子化合物8之收 量為1 OOmg。 參考例10 (有機電晶體之製作) 使用高分子化合物8,以下列方法製作具有第4圖所 示結構之有機電晶體。首先,將作成閘電極之高濃度摻雜 之η-型石夕基板31的表面熱氧化,形成lOOnm之石夕氧化膜 32。將如此獲得之基板充分洗淨後,使用矽烷偶合劑苯乙 基三氯矽烷對基板之表面進行矽烷處理。其次,將高分子 化合物8溶解在氯仿而製備0. 5質量%之溶液。將此溶液 藉由旋轉塗佈法塗佈在上述已進行表面處理的基板上。其 後,在氮氣環境下,於300°C進行熱處理30分鐘,形成有 機半導體層35。其次,藉由電阻加熱蒸鍍步驟於有機半導 體層35上製作通道長20/zm、通道寬2匪之源電極33、汲 電極34 (由自有機半導體層側,以Mo〇3、金之順序積層之 膜所形成)。 (電晶體特性之測定) 對製作之有機薄膜電晶體,在閘電壓Vg為10至一 60V、源/汲間電壓Vsd為一60V下測定電晶體特性。由測 定之特性算出獲得之電場效應移動度,為4.8xl0~2 cm2/Vs。結果表示於表2。 實施例11 (高分子化合物9之合成)Polymer compound 8 was synthesized in the same manner as in Example 1 of 53 323 797 201231491 except that the compound (C-4) was used instead of the compound (C-2). The yield of the polymer compound 8 was 100 mg. Reference Example 10 (Production of organic transistor) Using the polymer compound 8, an organic transistor having the structure shown in Fig. 4 was produced by the following method. First, the surface of the n-type slab substrate 31 which is doped with a high concentration of the gate electrode is thermally oxidized to form a 10 Å SiO film 32. After the substrate thus obtained was sufficiently washed, the surface of the substrate was subjected to decane treatment using a decane coupling agent phenethyltrichloromethane. 5质量百分比的溶液。 Next, the polymer compound 8 was dissolved in chloroform to prepare a 0.5% by mass solution. This solution was applied onto the above-mentioned surface-treated substrate by spin coating. Thereafter, heat treatment was performed at 300 ° C for 30 minutes in a nitrogen atmosphere to form an organic semiconductor layer 35. Next, a source electrode 33 having a channel length of 20/zm, a channel width of 2 Å, and a germanium electrode 34 are formed on the organic semiconductor layer 35 by a resistance heating evaporation step (from the side of the organic semiconductor layer, in the order of Mo〇3, gold) The film formed by the layer). (Measurement of transistor characteristics) For the produced organic thin film transistor, the transistor characteristics were measured at a gate voltage Vg of 10 to 60 V and a source/turn voltage Vsd of 60 V. The electric field effect mobility obtained from the measured characteristics is 4.8xl0~2 cm2/Vs. The results are shown in Table 2. Example 11 (Synthesis of Polymer Compound 9)
54 323797 S54 323797 S
[12¾ 201231491[123⁄4 201231491
(C-3)(C-3)
〇12Η25〇12Η25
(J)(J)
使用化合物⑴代替化合物( : 以同樣方法合成高分子化合物9。高二與實施例 為〜高分子化合物9之聚笨合物:之收 量為叫聚笨乙獅的重量平均分;=均分 參考例11 刀于量為82,000 (有機電晶體之製作)The compound (1) is used instead of the compound ( : the polymer compound 9 is synthesized in the same manner. The high-two and the embodiment are the polymer compound 9 poly-complex: the yield is the weight average of the polystyrene lion; = equal reference Example 11 The knife is 82,000 (manufactured by organic transistor)
-^用〶分子化合物9 ’以下列方法製作具有第4 I 二型^機電晶體。首先,將作成閘電極之高濃度私 32。將如Γ 的表面熱氧化,形成1〇〇nm之石夕氧化) 基三氯^獲得之基板充分洗淨後,使用錢偶合劑苯1 化人物、元對基板之表面進行矽烷處理。其次,將高分― 化。物Q溶解在氣仿而製 冬… 藉由旋轉泠佑".5質里%之备液。將此溶% 轉塗佈法塗佈在上述已進行表面處理 後,在氮氣環境下’於25〇。 叛上 機半導_ 35。以,㈣處理1切,形成有 籍由電阻加熱蒸鍍步騾於有機半導 323797 55 201231491 體層35上製作通道長2〇 、通道寬2mm之源電極33、汲 電極34 (由自有機半導體層側,以m〇〇3、金之順序積層之 膜所形成)。 (電晶體特性之測定) 對製作之有機薄膜電晶體,在閘電壓Vg為1〇至— 60V、源/汲間電壓vsd為-6〇v下測定電晶體特性。由測 定之特性算出獲得之電場效應移動度,為13χ1〇-3 cm /Vs。結果表示於表2。 實施例12 (高分子化合物10之合成)-^ The electrophoretic crystal having the 4th I type II was produced by the following method using the fluorene molecular compound 9'. First, the high concentration of the gate electrode is made 32. After the substrate such as ruthenium is thermally oxidized to form a substrate of 1 〇〇 nm, the substrate obtained by trichloromethane is sufficiently washed, and then the surface of the substrate is subjected to decane treatment using a money coupling agent. Second, the high score is turned into. The substance Q is dissolved in the gas to make the winter... By rotating the Blessing ".5% of the stock solution. This dissolution-coating method was applied to the above-mentioned surface-treated, and was subjected to a nitrogen atmosphere at 25 Torr. Rebellious machine semi-guided _ 35. (4) Treating 1 cut, forming a source electrode 33 having a channel length of 2 Å, a channel width of 2 mm, and a ytterbium electrode 34 (from the organic semiconductor layer) by a resistive heating evaporation step on the organic semiconductor 323797 55 201231491 The side is formed by a film laminated in the order of m〇〇3 and gold). (Measurement of transistor characteristics) For the produced organic thin film transistor, the transistor characteristics were measured at a gate voltage Vg of 1 Torr to -60 V and a source/turn voltage vsd of -6 〇v. The electric field effect mobility obtained from the measured characteristics is 13χ1〇-3 cm /Vs. The results are shown in Table 2. Example 12 (Synthesis of Polymer Compound 10)
使用化合物(K)代替化合物(B)以外,與實施例2 以同樣方法合成高分子化合物10。高分子化合物1〇之收 量為133mg。高分子化合物1〇之聚笨乙烯換算的數平均分 子篁為54, 000,聚苯乙烯換算的重量平均分子量為 90, 000 〇 參考例12 (有機電晶體之製作) 使用高分子化合物1〇,以下列方法製作具有第4圖所 示結構之有機電晶體。以,將作成閘電極之高漠度摻雜 之η-型矽基板31的表面熱氧化,形成1〇〇nm之矽氧化膜 323797 56 201231491 32。將如此獲得之基板充分洗淨後,使用矽烷偶合劑苯乙 基三氯矽烷對基板之表面進行矽烧處理。其次,將高分子 化合物10溶解在氯仿而製備0. 5質量%之溶液。將此溶液 藉由旋轉塗佈法塗佈在上述已進行表面處理的基板上。其 後,在氮氣環境下,於330°C進行熱處理1小時,形成有 機半導體層35。其次,藉由電阻加熱蒸鍍步驟於有機半導 體層35上製作通道長20# m、通道寬2mm之源電極33、汲 電極34 (由自有機半導體層侧,以Mo〇3、金之順序積層之 膜所形成)。 (電晶體特性之測定) 對製作之有機薄膜電晶體,在閘電壓Vg為10至一 60V、源/汲間電壓Vsd為一60V下測定電晶體特性。由測 定之特性算出獲得之電場效應移動度,為4. 8xl(T 3 cm2/Vs。結果表示於表2。 實施例13 (高分子化合物11之合成)The polymer compound 10 was synthesized in the same manner as in Example 2 except that the compound (K) was used instead of the compound (B). The yield of the polymer compound 1 〇 was 133 mg. The polymer compound 1 〇 has a number average molecular enthalpy of 54 000 in terms of polystyrene, and a weight average molecular weight of 90,000 in terms of polystyrene. Reference Example 12 (Production of Organic Crystal) Using a polymer compound 1 〇, An organic transistor having the structure shown in Fig. 4 was produced in the following manner. The surface of the high-intensity doped n-type germanium substrate 31, which is a gate electrode, is thermally oxidized to form a germanium oxide film of 1 〇〇 nm 323797 56 201231491 32. After the substrate thus obtained was sufficiently washed, the surface of the substrate was subjected to a calcination treatment using a decane coupling agent styrene trichloromethane. 5质量百分比的溶液。 Next, the polymer compound 10 was dissolved in chloroform to prepare a solution of 0.5% by mass. This solution was applied onto the above-mentioned surface-treated substrate by spin coating. Thereafter, heat treatment was performed at 330 ° C for 1 hour in a nitrogen atmosphere to form an organic semiconductor layer 35. Next, a source electrode 33 having a channel length of 20# m and a channel width of 2 mm and a germanium electrode 34 are formed on the organic semiconductor layer 35 by a resistance heating vapor deposition step (from the side of the organic semiconductor layer, in the order of Mo〇3, gold) The film is formed). (Measurement of transistor characteristics) For the produced organic thin film transistor, the transistor characteristics were measured at a gate voltage Vg of 10 to 60 V and a source/turn voltage Vsd of 60 V. The electric field effect mobility calculated from the measured characteristics was 4. 8 x 1 (T 3 cm 2 /Vs. The results are shown in Table 2. Example 13 (Synthesis of Polymer Compound 11)
使用化合物(L)代替化合物(B)以外,與實施例2 以同樣方法合成高分子化合物11。高分子化合物11之收 量為145mg。高分子化合物11之聚苯乙烯換算的數平均分 子量為25, 000,聚苯乙烯換算的重量平均分子量為 57 323797 201231491 41,000。 參考例13 (有機電晶體之製作) 使用高分子化合物11,以下列方法製作具有第4圖所 示結構之有機電晶體。首先,將作成閘電極之高濃度摻雜 之η-型石夕基板31的表面熱氧化,形成100nm之石夕氧化膜 32。將如此獲得之基板充分洗淨後,使用矽烷偶合劑苯乙 基三氯矽烷對基板之表面進行矽烷處理。其次,將高分子 化合物11溶解在氯仿而製備0. 5質量%之溶液。將此溶液 藉由旋轉塗佈法塗佈在上述已進行表面處理的基板上。其 後,在氮氣環境下,於300°C進行熱處理1小時,形成有 機半導體層35。其次,藉由電阻加熱蒸鍍步驟於有機半導 體層35上製作通道長20 ym、通道寬2mm之源電極33、汲 電極34 (由自有機半導體層側,以Mo〇3、金之順序積層之 膜所形成)。 (電晶體特性之測定) 對製作之有機薄膜電晶體,在閘電壓Vg為10至一 60V、源/汲間電壓Vsd為一 60V下測定電晶體特性。由測 定之特性算出獲得之電場效應移動度,為2.9 xl(T 4cm2/Vs。結果表示於表2。 58 323797The polymer compound 11 was synthesized in the same manner as in Example 2 except that the compound (L) was used instead of the compound (B). The yield of the polymer compound 11 was 145 mg. The polymer compound 11 had a polystyrene-equivalent number average molecular weight of 25,000 and a polystyrene-equivalent weight average molecular weight of 57 323797 201231491 41,000. Reference Example 13 (Production of organic transistor) Using the polymer compound 11, an organic transistor having the structure shown in Fig. 4 was produced by the following method. First, the surface of the η-type slab substrate 31 which is doped with a high concentration of the gate electrode is thermally oxidized to form a 100 nm oxidized film 32. After the substrate thus obtained was sufficiently washed, the surface of the substrate was subjected to decane treatment using a decane coupling agent phenethyltrichloromethane. 5质量%的溶液。 Next, the polymer compound 11 was dissolved in chloroform to prepare a 0.5% by mass solution. This solution was applied onto the above-mentioned surface-treated substrate by spin coating. Thereafter, heat treatment was performed at 300 ° C for 1 hour in a nitrogen atmosphere to form an organic semiconductor layer 35. Next, a source electrode 33 having a channel length of 20 μm and a channel width of 2 mm and a germanium electrode 34 are formed on the organic semiconductor layer 35 by a resistance heating vapor deposition step (from the side of the organic semiconductor layer, in the order of Mo 3 and gold) Formed by the film). (Measurement of transistor characteristics) For the produced organic thin film transistor, the transistor characteristics were measured at a gate voltage Vg of 10 to 60 V and a source/turn voltage Vsd of 60 V. The electric field effect mobility obtained from the measured characteristics was 2.9 xl (T 4 cm 2 /Vs. The results are shown in Table 2. 58 323797
S 201231491 & 〔表 2〕 高分子化合物 電場效應移動度 (cm2/Vs ) 參考例3 高分子化合物1 5xl03 參考例4 高分子化合物2 2.4xl0-4 參考例5 高分子化合物3 7· 0χ1(Γ3 參考例6 高分子化合物4 1. 2χ10'3 參考例7 高分子化合物5 7. 5χ10'4 參考例8 高分子化合物6 1. 8χ10-2 參考例9 高分子化合物7 3. 3χ10-3 參考例10 高分子化合物8 4. 8χ10-2 參考例11 高分子化合物9 1. 3χ10'3 參考例12 高分子化合物10 4. 8χ10'3 參考例13 高分子化合物11 2. 9χ10-4 【圖式簡單說明】 第1圖係實施例3之薄膜加熱前後之紅外線吸收光 譜。 第2圖係實施例3之薄膜加熱前後之紫外線可視光 吸收光譜。 第3圖係表示參考例3製造之有機電晶體構造之剖面 圖。 第4圖係表示參考例4至11製造之有機電晶體構造 59 323797 201231491 之剖面圖。 【主要元件符號說明】 11 加熱處理前之薄膜的紅外吸收光譜 12 加熱處理後之薄膜的紅外吸收光譜 21 加熱處理前之薄膜的紫外可視吸收光譜 22 加熱處理後之薄膜的紫外可視吸收光譜 31 n-型矽基板 32 矽氧化膜 33 源電極 34 汲電極 35 有機半導體層S 201231491 & [Table 2] Electric field effect mobility (cm2/Vs) of polymer compound Reference example 3 Polymer compound 1 5xl03 Reference Example 4 Polymer compound 2 2.4xl0-4 Reference example 5 Polymer compound 3 7·0χ1 ( Γ3 Reference Example 6 Polymer Compound 4 1. 2χ10'3 Reference Example 7 Polymer Compound 5 7. 5χ10'4 Reference Example 8 Polymer Compound 6 1. 8χ10-2 Reference Example 9 Polymer Compound 7 3. 3χ10-3 Reference Example 10 Polymer Compound 8 4. 8χ10-2 Reference Example 11 Polymer Compound 9 1. 3χ10'3 Reference Example 12 Polymer Compound 10 4. 8χ10'3 Reference Example 13 Polymer Compound 11 2. 9χ10-4 [Pattern BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is an infrared absorption spectrum before and after heating of a film of Example 3. Fig. 2 is an ultraviolet visible light absorption spectrum before and after heating of the film of Example 3. Fig. 3 is an organic transistor manufactured by Reference Example 3. Cross-sectional view of the structure. Fig. 4 is a cross-sectional view showing the organic transistor structure manufactured by Reference Examples 4 to 11 59 323797 201231491. [Explanation of main components] 11 Infrared absorption spectrum of the film before heat treatment 12 After heat treatment Drain electrode 34 of the infrared absorption spectrum of the thin film 21 the film is heated prior to the ultraviolet visible absorption spectrum of the treated film 22 is heated after the UV-visible absorption spectrum of the process 33 of the source electrode 32 of silicon oxide film 31 n- type silicon substrate 35 of the organic semiconductor layer
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