TW201040288A - A powder form chemical compound to purify molten solders with its application tools and utilization methods - Google Patents
A powder form chemical compound to purify molten solders with its application tools and utilization methods Download PDFInfo
- Publication number
- TW201040288A TW201040288A TW98115468A TW98115468A TW201040288A TW 201040288 A TW201040288 A TW 201040288A TW 98115468 A TW98115468 A TW 98115468A TW 98115468 A TW98115468 A TW 98115468A TW 201040288 A TW201040288 A TW 201040288A
- Authority
- TW
- Taiwan
- Prior art keywords
- tin
- purifying
- molten tin
- molten
- synthetic chemical
- Prior art date
Links
- 239000000843 powder Substances 0.000 title claims abstract description 41
- 238000000034 method Methods 0.000 title claims abstract description 22
- 150000001875 compounds Chemical class 0.000 title claims abstract description 9
- 229910000679 solder Inorganic materials 0.000 title abstract description 32
- 239000012535 impurity Substances 0.000 claims abstract description 53
- 238000004519 manufacturing process Methods 0.000 claims abstract description 20
- 239000007788 liquid Substances 0.000 claims abstract description 15
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 5
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 203
- 239000000126 substance Substances 0.000 claims description 38
- 238000002844 melting Methods 0.000 claims description 19
- JWVAUCBYEDDGAD-UHFFFAOYSA-N bismuth tin Chemical compound [Sn].[Bi] JWVAUCBYEDDGAD-UHFFFAOYSA-N 0.000 claims description 13
- 238000002955 isolation Methods 0.000 claims description 8
- 238000011084 recovery Methods 0.000 claims description 8
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 claims description 6
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims description 6
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 claims description 6
- 239000013043 chemical agent Substances 0.000 claims description 5
- 229920006395 saturated elastomer Polymers 0.000 claims description 5
- 239000007921 spray Substances 0.000 claims description 5
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 claims description 4
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 claims description 4
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 claims description 4
- 239000002253 acid Substances 0.000 claims description 4
- 238000006243 chemical reaction Methods 0.000 claims description 4
- 238000004140 cleaning Methods 0.000 claims description 4
- 230000000694 effects Effects 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 claims description 4
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 claims description 4
- 229960000250 adipic acid Drugs 0.000 claims description 3
- 235000011037 adipic acid Nutrition 0.000 claims description 3
- 238000001354 calcination Methods 0.000 claims description 3
- 235000013877 carbamide Nutrition 0.000 claims description 3
- 239000001913 cellulose Substances 0.000 claims description 3
- 229920002678 cellulose Polymers 0.000 claims description 3
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 claims description 3
- 239000001632 sodium acetate Substances 0.000 claims description 3
- 235000017281 sodium acetate Nutrition 0.000 claims description 3
- 229910000029 sodium carbonate Inorganic materials 0.000 claims description 3
- 235000017550 sodium carbonate Nutrition 0.000 claims description 3
- 235000013547 stew Nutrition 0.000 claims description 3
- ATRRKUHOCOJYRX-UHFFFAOYSA-N Ammonium bicarbonate Chemical compound [NH4+].OC([O-])=O ATRRKUHOCOJYRX-UHFFFAOYSA-N 0.000 claims description 2
- 229910000013 Ammonium bicarbonate Inorganic materials 0.000 claims description 2
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 claims description 2
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 claims description 2
- 239000005083 Zinc sulfide Substances 0.000 claims description 2
- 235000012538 ammonium bicarbonate Nutrition 0.000 claims description 2
- 239000001099 ammonium carbonate Substances 0.000 claims description 2
- 235000019270 ammonium chloride Nutrition 0.000 claims description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims description 2
- 239000004327 boric acid Substances 0.000 claims description 2
- 235000010338 boric acid Nutrition 0.000 claims description 2
- 239000001110 calcium chloride Substances 0.000 claims description 2
- 235000011148 calcium chloride Nutrition 0.000 claims description 2
- OSILKTNFXJYZTB-UHFFFAOYSA-L calcium;dichlorate;dihydrate Chemical compound O.O.[Ca+2].[O-]Cl(=O)=O.[O-]Cl(=O)=O OSILKTNFXJYZTB-UHFFFAOYSA-L 0.000 claims description 2
- 210000003298 dental enamel Anatomy 0.000 claims description 2
- 229910052564 epsomite Inorganic materials 0.000 claims description 2
- 150000004678 hydrides Chemical class 0.000 claims description 2
- 239000000395 magnesium oxide Substances 0.000 claims description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 2
- WRUGWIBCXHJTDG-UHFFFAOYSA-L magnesium sulfate heptahydrate Chemical compound O.O.O.O.O.O.O.[Mg+2].[O-]S([O-])(=O)=O WRUGWIBCXHJTDG-UHFFFAOYSA-L 0.000 claims description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims description 2
- VGTPKLINSHNZRD-UHFFFAOYSA-N oxoborinic acid Chemical compound OB=O VGTPKLINSHNZRD-UHFFFAOYSA-N 0.000 claims description 2
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 claims description 2
- GRLPQNLYRHEGIJ-UHFFFAOYSA-J potassium aluminium sulfate Chemical compound [Al+3].[K+].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRLPQNLYRHEGIJ-UHFFFAOYSA-J 0.000 claims description 2
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 claims description 2
- 229940081974 saccharin Drugs 0.000 claims description 2
- 235000019204 saccharin Nutrition 0.000 claims description 2
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 claims description 2
- 229960004889 salicylic acid Drugs 0.000 claims description 2
- 235000017557 sodium bicarbonate Nutrition 0.000 claims description 2
- 229910000030 sodium bicarbonate Inorganic materials 0.000 claims description 2
- 239000011780 sodium chloride Substances 0.000 claims description 2
- 235000002639 sodium chloride Nutrition 0.000 claims description 2
- 239000004317 sodium nitrate Substances 0.000 claims description 2
- 235000010344 sodium nitrate Nutrition 0.000 claims description 2
- LIBWRRJGKWQFSD-UHFFFAOYSA-M sodium;2-nitrobenzenesulfonate Chemical compound [Na+].[O-][N+](=O)C1=CC=CC=C1S([O-])(=O)=O LIBWRRJGKWQFSD-UHFFFAOYSA-M 0.000 claims description 2
- 238000003786 synthesis reaction Methods 0.000 claims description 2
- 229910052984 zinc sulfide Inorganic materials 0.000 claims description 2
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 claims description 2
- 235000010980 cellulose Nutrition 0.000 claims 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 claims 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims 1
- 239000004202 carbamide Substances 0.000 claims 1
- 229940106135 cellulose Drugs 0.000 claims 1
- 239000000470 constituent Substances 0.000 claims 1
- 238000004090 dissolution Methods 0.000 claims 1
- 239000007789 gas Substances 0.000 claims 1
- 238000002156 mixing Methods 0.000 claims 1
- 238000004806 packaging method and process Methods 0.000 claims 1
- 239000012629 purifying agent Substances 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 claims 1
- 239000011592 zinc chloride Substances 0.000 claims 1
- 235000005074 zinc chloride Nutrition 0.000 claims 1
- 238000003466 welding Methods 0.000 abstract description 3
- 238000005476 soldering Methods 0.000 description 29
- 230000008018 melting Effects 0.000 description 17
- 239000002893 slag Substances 0.000 description 17
- 238000000746 purification Methods 0.000 description 13
- 238000010586 diagram Methods 0.000 description 8
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 8
- 229910001887 tin oxide Inorganic materials 0.000 description 8
- 238000007747 plating Methods 0.000 description 7
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 239000013078 crystal Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 4
- 230000005484 gravity Effects 0.000 description 4
- 206010036790 Productive cough Diseases 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000003116 impacting effect Effects 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 210000003802 sputum Anatomy 0.000 description 3
- 208000024794 sputum Diseases 0.000 description 3
- 238000003723 Smelting Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- GSJBKPNSLRKRNR-UHFFFAOYSA-N $l^{2}-stannanylidenetin Chemical compound [Sn].[Sn] GSJBKPNSLRKRNR-UHFFFAOYSA-N 0.000 description 1
- RVCKCEDKBVEEHL-UHFFFAOYSA-N 2,3,4,5,6-pentachlorobenzyl alcohol Chemical class OCC1=C(Cl)C(Cl)=C(Cl)C(Cl)=C1Cl RVCKCEDKBVEEHL-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- -1 Silver(II) Silver(II) Fluoride Chemical compound 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 235000009508 confectionery Nutrition 0.000 description 1
- 239000000599 controlled substance Substances 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229930189471 penicacid Natural products 0.000 description 1
- YFSUTJLHUFNCNZ-UHFFFAOYSA-N perfluorooctane-1-sulfonic acid Chemical compound OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F YFSUTJLHUFNCNZ-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 230000001568 sexual effect Effects 0.000 description 1
- 239000000779 smoke Substances 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 230000002459 sustained effect Effects 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Landscapes
- Manufacture And Refinement Of Metals (AREA)
Abstract
Description
201040288 . 六、發明說明: 【發明所屬之技術領域】 一種可淨化熔錫烺之合成化學粉末及其應用治具與 使用方法’用以淨化一波峰錫爐的熔錫煨,本發明尤指 一種添加於熔錫烺面上以後,具有在熔錫烺面上可即時 隨線(Rea卜time, In-line)形成一個活性化合物淨化烺 之液面,並持續分離錫渣(氧化錫或不熔錫,〇xide solder or Dross)中的錫與雜質並立即將分離之各項雜 〇 質吸收包覆的可淨化熔錫烺之合成化學粉末。 【先前技術】 熔錫烺焊接方法及設備,係應用於印刷電路板 (PCB)、電子零組件、印刷電路板組裝(pcBA)等生產技術 與工業領域,此種技術於第二次世界大戰前就已受到運 用,二戰後更因相關科學與技術的蓬勃發展,進而全面 廣泛的應用於全球軍事及民生電子工業迄今,相關技術 ❹ 與設備經過不斷演變、改善創新,以適應印刷電路板線 路佈局、零組件微型化,及提升信賴度及電路功能複雜 化的需求,而波峰沾錫及其焊接技術應用於穩定品質、 大量生I印刷電路寺反組裝與電子零組件焊接更顯得重 要,所述的波峰沾錫設備|史係已超㊣三十年以上,製 造代表廠商如:美國ElectrQvert、日本春田τ酬na、 曰本Koki日本Yoshida、台灣超鉞電子、台灣日椿電 . 機、德國mronics soltec、加拿大c〇fin、新加坡 4 201040288 CEM、何« Harris等公司;同時,為降低與改善波峰錫 爐運作時產生的錫漁(氧化锡、不溶踢、㈣化⑹心& Dross)、對焊錫用量的損耗與焊接品質不良的負面影 響相關廠商也因應推出「熔錫懷淨化粉末」或同性質 的'合液」’將這些化學品與自熔錫烺面撈出的錫渣進行 此〇,進而分離錫渣中的雜質與熔錫,以便於回收熔錫; 另一種實施的方式’則是將這些化學品直接倒入熔錫液 面,直接分離錫渣中的雜質與熔錫,此類型之熔錫烺淨 化粉末與溶液的代表廠商如下:美國Alfa Metals、日 本 Tamuna 荷蘭 Kester、美國 Qua!itech、新加坡 pmi 等公司。 然而,習知之熔錫煨淨化粉末與溶液的配方,在實務 上應用時’對錫渣(氧化錫、不熔錫)中雜質與熔錫的分 離回收率並不高,其一般的省錫量約只有22%〜42%,因 此,所產生的經濟效益較低,故未能普遍應用於波峰錫 爐量產生產線中,絕大部分的使用者,都採用直接將錫 漁賣回給錫供應商’以錫渣重量約6〇%原錫價格由錫供應 商回收’極少部分使用者則採用錫料回收再使用系統 (Solder recovery system,SRS)對錫渣(氧化錫、不熔 錫)中雜質與熔錫進行回收,其錫量回收率約可提高到約 45% ’但SRS設備價格與操作使用零組件耗材費用加入成 本計算後’則回收金額會遠低於直接將錫渣賣回給錫供 應商。 請參閱「第1圖」,圖中所示係為一習知錫爐的運行 5 201040288 示意圖’如圖所示’當一錫爐10於常態運行時,雜質2〇 會逐漸形成’而所述的雜質20包括錫渣及不熔錫層 (Oxide solder & Dross Layer),常態錫爐 10 運行時, 雜質20只會浮在熔錫烺30的烺面301,因為比重與質量 較低的雜質20 ’係以自由基分子的方式懸浮在溶錫炮 的烺面301,由於這些雜質20分子含有大量的「氧化錫」、 「錫粉」等,所以與熔錫煅30有相互之親和性,而緣由 此親和性,進而轉化成熔錫分子間的假性或臨時架橋鍵 (False or Temperary Catalist) ’這樣的轉化形成的新 合成分子一般就稱為「錫渣及不熔錫(〇xide s〇lder &201040288 . VI. Description of the invention: [Technical field of the invention] A synthetic chemical powder capable of purifying molten tin and its application and a method of using the method for purifying a tin-rolled tin of a wave soldering furnace, especially a kind After being added to the surface of the molten tin, it has an active compound to clean the surface of the molten metal on the surface of the molten tin, and continuously separates the dross (tin oxide or infusible). The tin and the impurities in tin, 〇xide solder or Dross) and immediately absorb the separated impurities to absorb the synthetic chemical powder of the purified tin bismuth. [Prior Art] Soldering tin crucible welding method and equipment are applied to production technology and industrial fields such as printed circuit board (PCB), electronic components, printed circuit board assembly (pcBA), etc. before the Second World War. It has been used, and after World War II, it has been widely used in the global military and people's livelihood electronics industry due to the vigorous development of related science and technology. Relevant technologies and equipment have been continuously evolved and improved to adapt to the layout of printed circuit boards. Minimization of components, and the need to improve reliability and circuit function complexity, while wave soldering and its soldering technology are more important for stable quality, mass production of printed circuit temple anti-assembly and electronic component soldering. The peak of the soldering equipment | history has been more than 30 years, manufacturing representatives such as: the United States ElectrQvert, Japan Chuntian τ reward na, Sakamoto Koki Japan Yoshida, Taiwan Super Electronics, Taiwan Nisshin Electric. Machine, German mronics Soltec, Canada c〇fin, Singapore 4 201040288 CEM, He « Harris and other companies; at the same time, in order to reduce and improve the peak tin Tin fishing (tin oxide, insoluble kicking, (four) (6) heart & Dross), the loss of solder consumption and the negative impact of poor solder quality in the operation of the furnace are also related to the introduction of "melting tin powder purification powder" or the same nature 'Mixed liquid' 'The slag of these chemicals and the self-fluxing tin slag is removed, and the impurities and tin in the dross are separated to facilitate the recovery of the molten tin; another way of implementation is These chemicals are directly poured into the molten tin surface to directly separate the impurities and molten tin in the tin slag. The representative manufacturers of this type of molten tin bismuth cleaning powder and solution are as follows: Alfa Metals, USA, Tamuna, Japan, Kester, USA Qua! Itech, Singapore pmi and other companies. However, the conventional formula of the powder and solution for melting tin and antimony is not high in the separation and recovery of impurities and molten tin in tin dross (tin oxide, non-melting tin), and its general tin saving. It is only about 22%~42%. Therefore, the economic benefits are low, so it is not widely used in the peak production line of Bofeng tin. Most users use the direct sales of tin fishing back to tin supply. "The price of tin slag is about 6〇% of the original tin price is recovered by the tin supplier." Very few users use the Solder recovery system (SRS) for tin slag (tin oxide, non-melting tin). Impurities and tins are recovered, and the tin recovery rate can be increased to about 45% 'but the price of SRS equipment and the cost of operating consumables are added to the cost calculation', then the recovery amount will be much lower than the direct sale of tin slag back to Tin supplier. Please refer to "Figure 1", which shows the operation of a conventional tin furnace. 5 201040288 Schematic diagram 'As shown in the figure 'When a tin furnace 10 is in normal operation, impurities 2〇 will gradually form' The impurity 20 includes a tin slag and a non-sinter solder layer (Oxide solder & Dross Layer). When the normal tin furnace 10 is in operation, the impurity 20 will only float on the 301 surface 301 of the molten tin , 30 because of the lower specific gravity and lower quality impurities. The 20' is suspended in the surface 301 of the dissolved tin gun by a radical molecule. Since these impurities contain a large amount of "tin oxide" and "tin powder", they have a mutual affinity with the molten tin. The new synthetic molecules formed by the conversion of the affinity or the conversion of the pseudo- or Temperary Catalist between the molten tin molecules are generally referred to as "tin slag and non-melting tin (〇xide s 〇lder &
Dross)」’即所述的雜質20 ;如上,所述的雜質2〇生成 的原因主要包括: (1) 熔錫烺30氧化後產生的「錫灰」; (2) 原熔錫掖30内含有的雜質,例如「馨土」; (3) 因溫差所產生的氧化金屬; (4) 助焊劑形成的殘渣; (5 )印刷電路板之沾錫面帶有的雜質; (6)熔錫煅30流動時因摩擦產生的碳粉等。 如上,若錫爐10以全新錫料熔解成熔錫煅3〇,第一 個小時内,雜質20產生的現象很輕微,然而,實務上的 實驗亦證實,雜質20產生的速度和效率,係與熔錫煅3〇 内含雜質量成正比,因此,若錫熔煨3〇的雜質含量過高, 在錫爐10運行至第二個小時後,雜質2〇(錫渣及不熔錫 層)的厚度幾乎成等比例增長,所以波峰錫爐的用戶均要 6 201040288 求維護人員每兩個小時必須撈出雜質2 0 (錫渣及不熔錫) 一次。 又,一般而言,錫渣中的錫含量平均約佔總重量的 95% ’但錫供應商回收計價則只有60%的價值,如此,即 造成用戶額外錫耗用損失約35%;又,錫爐1〇運行時所 產生的錫渣及不熔錫層係為一硬化層,此硬化層係經常 造成PCB台車及產品撞傷,另外由於熔錫懷3〇内含雜 質量若過高,則會連帶導致潤滑度(Lubricati〇n scale) 〇 降低、粗糙度(Roughness scale)升高、及黏稠度 _ (Viscosity scale)升高等問題,而這種高雜質量熔錫煨 的可焊性甚差;請進一步搭配參閱「第2圖」,圖中所示 係為習知錫爐焊接產品焊點表面放大五百倍後的分子晶 相排列照像圖,如圖所示,由於熔錫煅3〇的雜質含量過 高時,會造成焊點表面粗糙,這樣的金屬表面及内層可 焊性均甚差,會導致焊接後產生假焊、空焊、不完整焊、 導腳橋接、錫尖、冰柱等焊接不良的情況,也使得波峰 〇 沾錫這個PCBA成敗關鍵製程的成本也因而增加;為了 改善這個現象,大部份工程技術人員只能不斷提高生產 錫溫,但不斷提高生產錫溫的結果,則是會造成零件及 PCB等材料產生立即性的損傷,如此,即降低了產品整體 的k賴度,甚或可能造成不良品退貨及衍生賠償費用。 【發明内容】 有鑒於上述的問題,本發明者係依據多年來從事相 7 201040288 • 时㈣經驗’針對錫渣產生、时抑進行相關性的 . 研究及分析,期能找出更為適切的解決方案;緣此’本 發明主要的目的在於提供—種可節約用錫量、降低谭接 溫度及提升焊接品f之可信賴度,進㈣升產品焊接良 率的可淨化熔錫烺之合成化學粉末及其應用治具與使用 方法。 為達上述的目的,本發明者係將複數種化合物質混 合後,製成一種可淨化熔錫烺之合成化學粉末,使其添 Ο 加於熔錫烺後,在熔錫煅面上可即時隨線 (Real-time,In-1 ine)形成一個活性化合物淨化掖之焕 面,並可持續分離錫渣(氧化錫或不熔錫,〇xide s〇lder or Dross)中的錫與雜質並立即將分離之各項雜質吸收包 覆以達到淨化炼錫焕的功效’進而提升錫量之回收率。 為使貴審查委員可以清楚明瞭本發明之組成,以及 其實施後的功效,茲以下列說明搭配圖示,請參閱。 D 【實施方式】 常態錫爐運行時,唯有在波峰錫爐運作製造產品 時’才會使雜質產生而且逐.漸累積增加,而由於所述的 雜質包含:氧化錫(錫灰)、氧化各類金屬、助焊劑殘渣、 PCB沾錫面各類雜質、以及熔錫烺因循環流動時的摩擦 而產生之碳粉等,因此可以將這些雜質歸類為「熔錫煨 品質惡化主因」,而且這些雜質在波峰錫爐運作製造產品 時會一直增加,甚至在波峰錫爐運作一個小時以後會呈 8 201040288 _ 幾何倍數增長,因此,最根本的解決方式’即是使雜質 被迅速且有效的包覆,且此過程必需是持續不間斷。 本發明所述的可淨化熔錫烺之合成化學粉末及其應 用治具與使用方法,其中,所述的可淨化熔錫烺之合成 化學粉末(簡稱A0P-22S),係具有將錫渣内雜質與熔錫分 離的功效,同時並具有可持續將被分離的雜質迅速包覆 之能力,其至少由下列表中所示的數項化學物質混合而 成,其名稱及重量比例如「第3圖」中所示,其係為本 0 發明的化學物質之組成列表圖,請參閱圖中所示,本發 . 明所述的可淨化熔錫煨之合成化學粉末之組成成份主要 包括:礙酸氫鍵 Ammonium Bicarbonate、氣化錄 Ammonium Chloride、硼酸 Boric Acid、氣化飼 Calcium(II) Chloride、氣酸妈 Calcium Dichlorate、 水合纖維素 Cellulose Hydride 、 尿素 Diaminomethanal 、;寫利鹽 Epsomite 、己二酸Dross)"" is the impurity 20; as described above, the cause of the formation of the impurity 2〇 mainly includes: (1) "tin ash" generated after oxidation of the tin-bismuth 30; (2) within the original molten tin 30 Impurities contained, such as "sweet soil"; (3) oxidized metal due to temperature difference; (4) residue formed by flux; (5) impurities on the tinned side of printed circuit boards; (6) molten tin Toner or the like which is generated by friction when the calcination 30 flows. As above, if the tin furnace 10 is melted into a molten tin by a new tin material, the phenomenon of the impurity 20 is slight in the first hour. However, practical experiments have also confirmed that the speed and efficiency of the impurity 20 are It is proportional to the amount of impurities contained in the molten tin. Therefore, if the impurity content of the tin-melting crucible is too high, after the tin furnace 10 is operated for the second hour, the impurities are 2 〇 (tin slag and non-melting tin layer). The thickness of the solder is almost equal to the proportion, so the users of the wave soldering furnace must be 6 201040288. The maintenance personnel must remove the impurities 20 (slag and non-melting tin) once every two hours. In addition, in general, the tin content in the tin slag averages about 95% of the total weight 'but the tin supplier's recycling price is only 60% of the value, thus causing the user to lose about 35% of the additional tin consumption; The tin slag and the non-melting tin layer generated during the operation of the tin furnace are a hardened layer, which often causes a collision between the PCB trolley and the product, and because the content of the mixed tin in the molten tin is too high, This leads to problems such as a decrease in Lubricati〇n scale, an increase in roughness scale, and an increase in Viscosity scale, and the weldability of such a high-mass fused tin bismuth is very high. Poor; please refer to "Picture 2" for further matching. The figure shows the molecular crystal phase alignment photo after the surface of the solder joint of the soldering furnace of Xizhi soldering furnace is magnified 500 times, as shown in the figure, due to the tin melting If the impurity content of 3〇 is too high, the surface of the solder joint will be rough, and the solderability of the metal surface and the inner layer will be very poor, which will lead to false soldering, void soldering, incomplete soldering, bridge bridging, and tin tip after soldering. Poor welding, such as icicles, also makes the peaks The cost of this PCBA success or failure process has also increased; in order to improve this phenomenon, most engineers and technicians can only continuously increase the production temperature of tin, but the result of continuously increasing the temperature of tin production will result in the immediate production of parts and PCB materials. Sexual damage, in this way, reduces the overall price of the product, and may even result in defective product returns and derivative compensation costs. SUMMARY OF THE INVENTION In view of the above problems, the present inventors have been able to find out more suitable for the research and analysis of the correlation between the generation and the suppression of dross in the phase 7 201040288 • (4) experience. Solution; the main purpose of the present invention is to provide a kind of purifying molten tin which can save the amount of tin, reduce the temperature of the tandem joint and improve the reliability of the soldering product f, and the soldering yield of the (four) liter product. Chemical powder and its application fixture and method of use. In order to achieve the above object, the inventors have mixed a plurality of compounds to prepare a synthetic chemical powder for purifying molten tin, which is added to the molten tin and can be immediately applied to the molten calcined surface. Real-time (In-1 ine) forms an active compound to purify the radiant surface and continuously separate the tin and impurities in the tin slag (tin oxide or non-solder tin, 〇xide s〇lder or Dross) The impurities to be separated are absorbed and coated to achieve the effect of purifying tin smelting', thereby increasing the recovery rate of tin. In order for your review board to clearly understand the composition of the present invention and its efficacy after implementation, please refer to the following instructions for matching. D [Embodiment] When the normal tin furnace is in operation, only when the product is manufactured in the wave soldering furnace, the impurities will be generated and gradually increased, and the impurities include: tin oxide (tin ash), oxidation Various types of metals, flux residues, various impurities on the surface of the PCB, and carbon powder generated by the friction of the molten tin due to circulation, so that these impurities can be classified as "the main cause of deterioration of the quality of the molten tin". Moreover, these impurities will continue to increase in the operation of the wave soldering furnace. Even after the wave soldering furnace operates for one hour, it will increase by 8 201040288 _ geometric multiples. Therefore, the most fundamental solution is to make the impurities quickly and effectively. Wrap, and this process must be continuous. The synthetic chemical powder for purifying molten tin bismuth according to the present invention, the application jig thereof and the method for using the same, wherein the synthetic chemical powder (referred to as A0P-22S) for purifying molten tin bismuth has the inside of the slag The ability to separate impurities from molten tin, and at the same time have the ability to quickly coat the separated impurities, which are at least mixed by several chemical substances shown in the following list, and their names and weight ratios are, for example, "3rd. As shown in the figure, it is a list of the composition of the chemical substances of the present invention. Please refer to the figure. The composition of the synthetic chemical powder for purifying molten tin as described in the present invention mainly includes: Acid hydrogen bond Ammonium Bicarbonate, Ammonium Chloride, Boric Acid, Calcium (II) Chloride, Calcium Dichlorate, Cellulose Hydride, Diaminomethanal, Epsomite, adipic acid
Hexanedioic Acid、氧化鎮 Magnesium Oxide、偏棚酸 ◎ Oxoborinic Acid、溴化辨 Potassium Bromide、奸銘蓉Hexanedioic Acid, Oxidized Town Magnesium Oxide, Penic Acid ◎ Oxoborinic Acid, Brominated Potassium Bromide, 奸铭蓉
Potassium Aluminium Sulfate、糖精 Saccharin、柳酸 Salicylic Acid、氟化銀(II) Silver(II) Fluoride、 醋酸鈉 Sodium Acetate、碳酸納 Sodium Carbonate、 氣化納 Sodium Chloride、破酸氫納 Sodium Hydrogen Carbonate、破酸鈉 Sodium Nitrate、确基苯續酸鈉 Sodium Nitrobenzene Sulfonate 、氣化辞 Zinc • Chloride、硫化辞Zinc Sulfide等;如上所述的可淨化 201040288 熔錫烺之合成化學粉末,在氣密包裝袋内及室溫條件下 係呈鬆軟粉末狀態,當將此粉末倒在達到生產溫度(23〇 C~275°C)的熔錫煨面上後,此粉末即會熔解成烺態,並 在熔錫烺面上形成一層淨化合成化學物質煨面,該淨化 合成化學烺(以下簡稱淨化烺)具有的物理特性如下: (1) S· G比重< 3 ’(熔錫炮比重>7 <9,因此淨化液 可維持飄浮於、熔錫烺面上不會下沉); (2) pH值介於3. 5〜5. 5 ; (3) 液態黏稠度(Liquid form ⑽ spi ; (4) 在生產溫度(230 °c〜275 r )的熔錫烺面上不冒 煙; (5) 無氣味; (6) 不蒸發也不揮發; (7) 可完全分離錫渣及不熔錫中的雜質與熔錫,並可 立即將雜質持續性的包覆; (8) 完全溶於水,因此自熔錫烺面上撈出之吸收包覆 雜質飽和的淨化液泥,可在泡水後完全再分離; (9) 完全不含管制物質,符合至西元2〇〇9年為止的 國際環保(RoHS,PFOS,REACH)之最新規範; (1 〇)熔錫烺面上淨化烺層本身隔熱系數所得穩定溫 差>15°C ’因此具備阻隔熔錫烺熱度流失與阻隔 空氣接觸熔錫夜面造成氧化金屬的機會。 如上’當將本發明所述的可淨化熔錫烺之化學劑任j 201040288 - 在溶錫液面上後’其即會熔解成烺態,而此可淨化熔錫 液之化學劑係會形成淨化煅(以下簡稱淨化烺),其因具 備高分子、弱酸、低比重、低黏度及高效率分離雜質與 包覆雜質特殊合成分子,因此能迅速完全分離錫渣、以 及不熔錫中的所有雜質與熔錫,並可立即將雜質持續性 的包覆,又由於本發明的組成多數為高分子物質,因此 有月b力吸收數倍體積的雜質,故具有持續对久反應的特 性。 Ο 請搭配參閱「第4圖」,圖中所示係爲本發明的實施 - 過程之初期示意圖,如圖所示,將一波峰錫爐40的喷錫 口 401之四周,用一隔離框4〇2圍住後,並使之没入熔 錫烺50的熔錫烺面501約5ππη〜150mm深度,又,所述 的喷錫口 401可為一單喷錫口或一雙喷錫口之任一種; 將本發明所述的可淨化熔錫煅之化學粉末6〇投入波峰錫 爐40後,其即與生產溫度達23ITC〜275。(:的熔錫烺50 接觸,熔解之後的可淨化熔錫烺之化學粉末6〇即形成一 〇 淨化烺601,所述的淨化烺601此時被阻隔在隔離框402 及喷錫口 401的溶錫掖面501外,以防止淨化烺601存 在於喷錫口 401之隔離框402内的熔錫煅面501上,可 防止喷錫口 401流出的錫烺直接衝擊及接觸淨化烺6〇1, 並將部份淨化懷601拉入錫流而進入一幫浦403後,再 由噴錫口 401流出’而波峰錫爐40之喷錫口 401向下衝 擊之錫流,則會將雜質502帶出隔離框402外,然後浮 升到溶錫煨面5 01上被淨化掖6 01包覆,此時,雜質 11 201040288 502(錫渣及不熔錫層)則會迅速被淨化烺601取代。 再請參照圖中所示,將波峰錫爐40之噴錫口 401流 下的熔錫煅50,以一上空長方形管404承接後,再導引 熔錫煅50由兩側出口,將承接錫烺自錫燉面下5丽〜150丽 的深度流向波峰錫爐40中,防止熔錫烺50直接向下衝 擊並接觸到淨化烺601 ’並將部份淨化烺601拉入錫流, 進入幫浦403後,再由噴錫口 401流出,而由波峰錫爐 40的喷錫口 401向下衝擊之錫流,會將雜質502帶出至 Ο 上空長方形管404外’然後浮升到熔錫烺面5〇1上,被 淨化烺601包覆,此時,淨化烺601發揮作用,雜質5〇2(錫 渣及不熔錫層),被淨化烺601迅速取代。 清參閱「第5圖」,圖中所示係為本發明實施過程之 成熟期示意圖,如圖所示’將波峰錫爐4〇之喷錫口 4〇1 四周用隔離框402圍住,並没入錫烺面5〇1約5mm〜15〇mm 的深度,使本發明與生產溫度達23(TC〜275。(:熔錫烺50 接觸後,熔解成淨化煅6〇1,並被阻隔在隔離框4〇2及喷 Θ 錫口 401的熔錫烺面501外,防止淨化煨6〇1存在於噴 錫口 401之隔離框402内的熔錫烺面5〇1上,防止噴錫 口 401流出的熔錫烺5〇直接衝擊及接觸淨化烺6〇丨並 將部份淨化煨601拉入錫流進入幫浦4〇3,再由喷錫口 401流出’而波峰錫爐4〇之喷錫σ 4〇1向下衝擊之錫流, 則會將雜質502帶出隔離框外’然後浮升到炼錫液 面5〇1上被淨化烺601包覆,當本發明主要功能發揮作 用達到成熟期後,其作用過程原理即如本圖中所示,合 12 201040288 • 淨化液601發揮作用達到成熟期後,熔錫煅50達到超純 . 淨、高可焊性及低生產溫度狀態,總用錫量可節約 65%〜80%。 又’如本圖所示’將波峰錫爐40之喷錫口 401流下 的熔錫烺,以上空長方形管4〇4承接後,再導引熔錫烺 50由兩侧出口流出’由熔錫煨面5〇1下約5〜15〇咖的深 度流向波峰錫爐40中,防止溶錫液50直接向下衝擊並 接觸到所述淨化煨601(AOP_22S),並將部份淨化煨6〇1 〇 拉入錫流,使淨化煨601進入幫浦403後,再由喷錫口 . 流出,而喷錫口401向下衝擊之錫流,則會將雜質 502帶出上空長方形管404外,然後浮升到熔錫掖面5〇1 上被淨化掖601包覆,當本發明所稱的淨化烺6〇1之功 能發揮達到成熟期後,熔錫烺5 〇即可達到超純淨,高可 焊性及低生產溫度狀態,總用錫量可節約65~8〇%。 凊參閱「第6圖」,圖中所示係為應用本發明後之錫 烺焊接產品焊點表面放大500倍之分子晶相排列照像 圖,如圖所示,當本發明所稱之可淨化熔錫煅之化學劑 熔解成烺態之淨化煨,且其發揮作用達到成熟期後,可 使熔錫烺達到超純淨'高可焊性及低生產溫度的狀態, 目視熔錫煨由喷錫口流出的外觀,將耀眼如同鏡面,而 焊點外觀,則如本圖中所示,其分子晶相排列 Crystal Phase Array)係呈現完美的直線,代表熔錫烺 具有絕佳的可焊性(Perfect solder_AbiUty);請搭配 參照「第7圖」,所示係為習知錫爐運行時的焊點平 13 201040288 均厚度示意圖,如圖,習知的錫爐運行時,SAC3〇5 AU〇y 焊點平均厚度約(265°C )2839 u Inch 〜(230°C )3405 uPotassium Aluminium Sulfate, Saccharin, Salicylic Acid, Silver(II) Silver(II) Fluoride, Sodium Acetate, Sodium Carbonate, Sodium Chloride, Sodium Hydrogen Carbonate, Acid Breaking Sodium Nitrate, Sodium Nitrobenzene Sulfonate, Zinc • Chloride, Zinc Sulfide, etc.; as described above, the chemical powder of 201040288 molten tin can be purified in airtight bags and chambers. Under the condition of temperature, it is in a state of soft powder. When the powder is poured on the surface of the molten tin which reaches the production temperature (23〇C~275°C), the powder will melt into a bismuth state and be melted in the surface. A layer of purified synthetic chemical material is formed thereon, and the physical properties of the purified synthetic chemical hydrazine (hereinafter referred to as "purified hydrazine") are as follows: (1) S·G specific gravity < 3 '(specific gravity of molten tin gun > 7 < 9, Therefore, the liquid can be floated on the surface of the molten tin and will not sink. (2) The pH is between 3. 5 and 5. 5; (3) Liquid form (Liquid form (10) spi; (4) Production temperature (23 0 °c~275 r ) no smoke on the molten tin surface; (5) no odor; (6) no evaporation and no volatilization; (7) complete separation of tin and non-melting tin impurities and molten tin And the coating can be continuously coated continuously; (8) completely soluble in water, so the purified liquid mud which is absorbed from the surface of the molten tin and absorbed by the impurity can be completely separated after soaking in water; 9) Completely free of controlled substances, in line with the latest regulations of international environmental protection (RoHS, PFOS, REACH) up to 2 西 BC; (1 〇) stable temperature difference obtained by purifying the thermal insulation coefficient of the enamel layer on the molten tin surface >15°C 'Therefore, there is an opportunity to block the loss of heat of the molten tin and the contact of the air to the night of the molten tin to cause oxidation of the metal. As described above, the chemical agent for purifying the molten tin as described in the present invention is j 201040288 - After dissolving the tin liquid surface, it will melt into a sputum state, and the chemical agent system which can purify the molten tin liquid will form a purification calcination (hereinafter referred to as purifying hydrazine), which has a polymer, a weak acid, a low specific gravity, and a low viscosity. And high-efficiency separation of impurities and coating of impurities, special synthesis of molecules, so can be quickly and completely divided Tin slag, and all impurities and tin in the non-melting tin, and can be continuously coated with impurities, and since the composition of the present invention is mostly a polymer material, there is a monthly b force to absorb several times the volume of impurities, Therefore, it has the characteristics of continuous long-term reaction. Ο Please refer to “Fig. 4”, which is a schematic diagram of the initial implementation of the process of the present invention. As shown in the figure, a spacer 4 is used around the tin port 401 of a wave soldering furnace 40. After the 〇2 is enclosed, it is immersed in the molten tin surface 501 of the molten tin 50 to a depth of about 5ππη~150mm. Further, the tin-plating opening 401 can be a single-spray tin or a double-spray tin. After the chemical powder 6 of the purifying tin-smelting agent of the present invention is put into the wave soldering furnace 40, the production temperature is 23 ITC 275. (: The molten tin 烺 50 is contacted, and the chemical powder 6 可 which can be purified after melting is formed to form a clean 烺 601, and the clean 烺 601 is blocked at the isolation frame 402 and the squirting port 401 at this time. In addition to the molten tin surface 501, the cleaned crucible 601 is prevented from being present on the molten calcined surface 501 in the isolation frame 402 of the tin-plating port 401, thereby preventing direct impact and contact cleaning of the tin-bismuth flowing out of the tin-plating port 401. , and part of the purifying bottle 601 is pulled into the tin stream and enters a pump 403, and then flows out of the tin-plating port 401. And the tin-plating port 401 of the wave soldering tin 40 oscillates downwardly, which will cause impurities 502. Take out the isolation frame 402, and then float up to the molten tin surface 5 01 and be covered by the purification 掖 6 01. At this time, the impurity 11 201040288 502 (the tin slag and the non-melting tin layer) will be quickly replaced by the purification 烺 601 Referring to the figure, the molten tin which is flowed down from the tin port 401 of the wave soldering furnace 40 is calcined 50, and then received by a rectangular tube 404, and then the molten tin 50 is guided from both sides to receive the tin.烺From the tin stew surface, the depth of 5 Li ~ 150 Li flows to the Crest Tin Furnace 40 to prevent the molten tin 烺 50 from directly impacting and contacting Purify 烺 601 ' and pull part of the purification 烺 601 into the tin flow, enter the pump 403, and then flow out through the tin port 401, and the tin flow that is impacted downward by the tin-plating port 401 of the wave solder pot 40 will The impurity 502 is taken out to the outside of the rectangular tube 404, and then floats up to the molten tin surface 5〇1, and is covered by the purified crucible 601. At this time, the purifying crucible 601 functions, and the impurity 5〇2 (slag and no The molten tin layer is quickly replaced by the cleaned 烺 601. Refer to the “figure 5”, which is a schematic diagram of the maturity of the implementation process of the present invention, as shown in the figure 'Burn the tin furnace of the wave soldering furnace 4〇1 is surrounded by the isolation frame 402, and is not inserted into the surface of the tin-bismuth surface 5〇1 about 5mm~15〇mm, so that the present invention and the production temperature reach 23 (TC~275. (: after the molten tin 烺 50 contact, Melting into purified crucible 6〇1, and being blocked outside the insulating frame 4〇2 and the molten tin surface 501 of the squirting tin port 401, preventing the purification 煨6〇1 from being melted in the isolation frame 402 of the tin-filling port 401 On the 5烺1 surface of the tin crucible, prevent the molten tin 烺5〇 flowing out of the tin-plating port 401 from directly impacting and contacting the cleaning crucible 6〇丨 and pulling part of the purifying crucible 601 into the tin stream to enter the gang Pu 4〇3, and then flow out from the tin-plated port 401' and the tin-spinning tin furnace 4〇 spray tin σ 4〇1 downward impact of the tin flow, the impurity 502 will be taken out of the isolation frame' and then floated to the tin The liquid surface 5〇1 is coated with the purified crucible 601. When the main function of the present invention reaches the maturity stage, the principle of the action process is as shown in the figure, 12 201040288 • After the purification liquid 601 functions to reach the maturity stage The molten tin calcined 50 reaches ultra-pure. Net, high weldability and low production temperature state, the total amount of tin can be saved by 65%~80%. In addition, as shown in the figure, the molten tin crucible flowing down the nozzle 401 of the wave soldering tin furnace 40 is taken up by the above empty rectangular tube 4〇4, and then the molten tin crucible 50 is discharged from both sides of the outlet. The depth of about 5 to 15 煨 at 5〇1 of the kneading surface flows into the wave soldering furnace 40 to prevent the molten tin solution 50 from directly impacting downward and contacting the purification crucible 601 (AOP_22S), and partially purifying the crucible 6煨1 〇 pull in the tin flow, so that the purification 煨 601 enters the pump 403, and then flows out of the tin port. When the tin port 401 strikes the tin flow downward, the impurity 502 is taken out of the rectangular tube 404. Then, it floats up to the surface of the molten tin, 5〇1, and is covered by the purified crucible 601. When the function of the purified crucible 6〇1 of the present invention reaches the maturity stage, the molten tin crucible can reach ultra-pure and high. Solderability and low production temperature conditions, the total amount of tin can be saved by 65~8〇%.凊 Refer to “Fig. 6”, which is a photomicrograph of a molecular crystal phase magnified 500 times the surface of the solder joint of the tin-bismuth solder product after application of the present invention, as shown in the figure, as claimed in the present invention. The chemical agent for purifying the molten tin is melted into a purifying state, and after it reaches the maturity stage, the molten tin can be made into a state of ultra-pure 'high weldability and low production temperature, and the molten tin is sprayed. The appearance of the tin mouth will be dazzling like a mirror, and the appearance of the solder joint, as shown in this figure, the crystal phase alignment (Crystal Phase Array) is a perfect straight line, representing the excellent solderability of the molten tin. (Perfect solder_AbiUty); please refer to "Fig. 7", which is a schematic diagram of the average thickness of the solder joint flat 13 201040288 during the operation of the conventional tin furnace. As shown in the figure, the conventional tin furnace is running, SAC3〇5 AU〇 y average solder joint thickness (265 ° C) 2839 u Inch ~ (230 ° C) 3405 u
Inch之間;再請搭配參照「第8圖」,圖中所示係為應用 本發明後之焊點平均厚度不意圖’如圖所示,經應用本 發明後所產生的淨化烺,當其作用至成熟期時,SAC3〇5Inch; please refer to "Figure 8" again. The figure shows the average thickness of the solder joint after applying the present invention. It is not intended to be as shown in the figure. When it comes to maturity, SAC3〇5
Alloy焊點平均厚度約為(265。〇1228〜(23(TC)1287 uThe average thickness of Alloy solder joints is approximately (265. 〇1228~(23(TC)1287 u
Inch,此足以佐證應用本發明後,可使得不熔錫(Dr〇ss) 完全不產生,而氧化錫的損耗最低〇·〇5%,並且額外將各 種形態的焊點用錫量有效減低25〜55%,而在相同產品相 同生產量的條件下總用錫量可節約65~80%。 如上所述’本發明所稱之可淨化熔錫烺經熔解成烺 態之淨化掖後,能迅速完全分離錫渣及不熔錫中的所有 雜質與熔錫,並可立即將雜質持續性的包覆不放,當淨 化煅吸收包覆雜質達到飽和程度時,再將飽和淨化烺撈 出後,重新加入可淨化熔錫燉之化學劑,以再熔解成煨 態之新鮮淨化烺,保持淨化熔錫烺的功效。 综上所述,本發明其據以實施後,確實可以達到提 供一種可節約用錫量、降低焊接溫度及提升焊接品質之 可信賴度,進而提升產品焊接良率的可淨化熔錫掖之化 學劑的目的。 唯,以上所述者,僅為本發明之較佳之實施例而已, 並非用以限定本發明實施之範圍,任何熟習此技藝者, 在不脫離本發明之精神與範圍下所作之均等變化與修 飾,皆應涵蓋於本發明之專利範圍内。 201040288 綜上所述,本發明之功效,係符合申請專利要件之 「實用性」、「新穎性」與「進步性」;申請人爰依專利法 之規定,向 鈞局提起發明專利之申請。Inch, this is enough to prove that after applying the invention, the non-melting tin (Dr〇ss) can be completely produced, and the loss of tin oxide is at least 〇·〇5%, and the amount of solder used in various forms is effectively reduced by 25 ~55%, and the total amount of tin can be saved by 65~80% under the same production conditions of the same product. As described above, the purifying molten tin crucible referred to in the present invention can be completely separated into all impurities and tin in the tin dross and the non-melting tin after being melted into a clean state, and the impurities can be immediately sustained. When the coating is not saturated, when the purification and absorption of the coated impurities reaches a saturation level, the saturated purified sputum is removed, and the chemical agent for purifying the molten tin is re-added to re-melt the fresh purified sputum to maintain the purification. The effect of melting tin. In summary, after the implementation of the present invention, it is indeed possible to provide a chemical which can save the tin amount, reduce the soldering temperature and improve the reliability of the soldering quality, thereby improving the soldering yield of the product. The purpose of the agent. The above is only the preferred embodiment of the present invention, and is not intended to limit the scope of the present invention. Any change and modification made by those skilled in the art without departing from the spirit and scope of the invention. All should be covered by the patent of the present invention. 201040288 In summary, the effect of the present invention is in line with the "practicality", "novelty" and "progressiveness" of the patent application requirements; the applicant filed an application for an invention patent to the shackle in accordance with the provisions of the Patent Law.
15 201040288 【圖式簡單說明】 , 第1圖,為一習知錫爐的運行示意圖。 第2圖,為習知錫爐焊接產品焊點表面放大五百倍後的 分子晶相排列照像圖。 第3圖,為本發明的化學物質之組成列表圖。 第4圖,爲本發明的實施過程之初期示意圖。 第5圖’為本發明實施過程之成熟期示意圖。 第6圖,為應用本發明後之錫烺焊接產品焊點表面放大 〇 500倍之分子晶相排列照像圖。 . 第7圖,為習知錫爐運行時的焊點平均厚度示竟圖。 第8圖’為應用本發明後之焊點平均厚度示咅圖。 【主要元件符號說明】15 201040288 [Simple description of the diagram], Figure 1 is a schematic diagram of the operation of a conventional tin furnace. Fig. 2 is a photomicrograph of a molecular crystal phase after a 500-fold magnification of the solder joint surface of a conventional soldering furnace. Fig. 3 is a chart showing the composition of the chemical substance of the present invention. Figure 4 is a schematic view showing the initial stage of the implementation of the present invention. Figure 5 is a schematic diagram of the maturity of the implementation process of the present invention. Fig. 6 is a photomicrograph showing the alignment of the surface of the solder joint of the tin-bismuth solder product after the application of the present invention. Figure 7 shows the average thickness of the solder joints during the operation of the conventional tin furnace. Fig. 8 is a diagram showing the average thickness of solder joints after the application of the present invention. [Main component symbol description]
10 錫爐 20 雜質 30 溶錫液 301 烺面 40 波峰錫爐 401 喷錫口 402 隔離框 403 幫浦 404 上空長方形管 50 溶錫煨 501 熔錫煨面 16 201040288 502 雜質 60 可淨化熔錫烺之化學粉末 601 淨化燉 〇10 Tin furnace 20 Impurity 30 Dissolved tin solution 301 烺 surface 40 Crest tin furnace 401 Spray tin 402 isolation frame 403 Pump 404 Over the rectangular tube 50 Dissolved tin 煨 501 Fused 煨 surface 16 201040288 502 Impurity 60 Purification of molten tin Chemical powder 601 purification stew
1717
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW98115468A TWI381056B (en) | 2009-05-08 | 2009-05-08 | A powder form chemical compound to purify molten solders with its application tools and utilization methods. |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW98115468A TWI381056B (en) | 2009-05-08 | 2009-05-08 | A powder form chemical compound to purify molten solders with its application tools and utilization methods. |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201040288A true TW201040288A (en) | 2010-11-16 |
TWI381056B TWI381056B (en) | 2013-01-01 |
Family
ID=44995860
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW98115468A TWI381056B (en) | 2009-05-08 | 2009-05-08 | A powder form chemical compound to purify molten solders with its application tools and utilization methods. |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI381056B (en) |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FI121569B (en) * | 2005-10-14 | 2011-01-14 | Yara Suomi Oy | Process for precipitating metal oxides from a wastewater solution |
TWI403790B (en) * | 2009-10-19 | 2013-08-01 | Au Optronics Corp | Touch substrate and touch display panel |
-
2009
- 2009-05-08 TW TW98115468A patent/TWI381056B/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
TWI381056B (en) | 2013-01-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN101204762B (en) | Al and Al alloy soft braze welding metal displaced type unleaded welding soldering flux | |
CN102139425B (en) | A kind of high-reliability flux for aluminum soldering | |
CN100462183C (en) | Lead-free anti-oxidation rare-earth-contg. type SnZn alloy welding flux, and its prepn. method | |
CN101356293B (en) | Lead-free solder with low copper dissolution | |
CN105829016A (en) | Lead-free, silver-free solder alloys | |
JP5615227B2 (en) | Surface treatment agent for copper or copper alloy and use thereof | |
CN103620088B (en) | For surface treating composition and the utilization thereof of copper and copper alloy | |
WO2001080611A1 (en) | Method for soldering and soldered joint | |
CN101157162A (en) | SnAgCu lead-free solder with oxidation resistance | |
CN101585119A (en) | Oxidation resistant low silver lead-free solder alloy | |
CN103402695B (en) | Vehicle glass leadless welding alloy | |
CN1152974C (en) | Immersion Plating Process of Copper-clad Steel Wire Material by Solvent Activation Method | |
CN102166692A (en) | Halogen-free soldering flux | |
TW201040288A (en) | A powder form chemical compound to purify molten solders with its application tools and utilization methods | |
CN102284810A (en) | Soldering flux for diode | |
CN101886182A (en) | Synthesized chemical powder capable of purifying tin melt liquid and application fixture and use method thereof | |
US4647308A (en) | Soldering compositions, fluxes and methods of use | |
CN102554490B (en) | Copper dissolving resisting stannum-copper lead-free brazing filler metal alloy | |
CN102489892A (en) | SnZn-based lead-free brazing filler metal containing Cr | |
CN102489893A (en) | A kind of SnZn base lead-free solder alloy | |
JP2009072827A (en) | Method of manufacturing member to be formed with solder layer | |
CN102137953B (en) | Surface treating agent for copper or copper alloy and use thereof | |
JP5985368B2 (en) | Surface treatment solution for copper or copper alloy and use thereof | |
JP2007209989A (en) | High-temperature brazing filler metal | |
CN104708233A (en) | No-clean flux suitable for copper-aluminum soldering and preparation method thereof |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |