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TW200931806A - Three dimensional programmable devices - Google Patents

Three dimensional programmable devices Download PDF

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Publication number
TW200931806A
TW200931806A TW097137797A TW97137797A TW200931806A TW 200931806 A TW200931806 A TW 200931806A TW 097137797 A TW097137797 A TW 097137797A TW 97137797 A TW97137797 A TW 97137797A TW 200931806 A TW200931806 A TW 200931806A
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Taiwan
Prior art keywords
programmable
memory
array
unit
logic
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TW097137797A
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Chinese (zh)
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TWI466446B (en
Inventor
Raminda U Madurawe
Thomas H White
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Tier Logic Inc
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Priority claimed from US11/986,022 external-priority patent/US20090128189A1/en
Priority claimed from PCT/US2008/063483 external-priority patent/WO2009139768A1/en
Application filed by Tier Logic Inc filed Critical Tier Logic Inc
Publication of TW200931806A publication Critical patent/TW200931806A/en
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Publication of TWI466446B publication Critical patent/TWI466446B/en

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Abstract

In a first aspect, a three dimensional programmable logic device (PLD) comprises a plurality of distributed programmable elements located in a substrate region; and a contiguous array of configuration memory cells, a plurality of said memory cells coupled to the plurality of programmable elements to configure the programmable elements, wherein: the memory array is positioned substantially above or below the substrate region; and the memory array and the substrate region layout geometries are substantially similar. In a second aspect, the 3D PLD comprises a contiguous array of metal cells, each metal cell having the configuration memory cell dimensions and a metal stub coupled to a said configuration memory cell and to one or more of said programmable elements.

Description

200931806 九、發明說明: 【發明所屬之技術領域】 本發明係關於可程式化邏輯裝置。 1 【先前技術】 • 傳統上,諸如定製、半定製或特定應用積體電路(ASIC) 裝置之積體電路(1C)裝置已用於電子產品中以減少成本, 增強效能或符合空間約束。然而,定製或半定製IC之設計 及製造可能係耗時且昂貴的。定製涉及產品定義階段期間 〇 的較長設計週期以及製造階段期間的高非循環工程(NRE) 成本。為了吸收設計修改或若在最終測試階段期間發現定 製或半定製1C中的邏輯誤差,可能必須重複設計及製造週 期較長的仿真及原型週期進一步加重上市時間及NRE成 本。因此,ASIC僅服務特定應用而且係因高容量及低成本 而定製構建。 稱為閘極陣列(包括平台ASIC及結構ASIC)之另一類型的 半S製裝置以減小的NRE成本藉由使用類似於之軟體 模&而同步化該叹计來定製模組區塊。結構规C提供與閉 極車歹J相比的較大模組區塊,而且可以或可以不提供預制 “ ”脈網路以簡化設計努力。在二種情況下,一軟體工具 /寻不里歷忒行放置與對時序收斂的後繼線路,,RC”擷取 的几長迭代β在次微米程序科技中,線路延遲係 極複雜的而且難以預測。遺失石夕位準設計確認間極陣列產 ^多個接針及較長的設計迭代,從而進—步惡化—迅速設 十解:、方式。大部分使用者需要設計之迭代微調以使其設 134972.doc 200931806 計完美* 近年來趨勢已背離定製或半定製IC而朝場可程式化組 件,其功能並非當製造積體電路時而在使用之前藉由”現 場"的終端使用者來決定。現貨之一般可程式化邏輯裝置 (PLD)或場可程式化閘極陣列(FPGA)產品極大地簡化設計 週期。此等產品提供使用者容易使用的軟體以透過可程式 化性使定製邏輯擬合該裝置,並提供能力以微調並最佳化 設計來改良矽效能。因為預先特徵化線路”RC”延遲,所以 使用者能夠極迅速且極準確地達到複雜放置及時序收斂。 此可程式化性或可變更性之靈活性在矽面積方面係昂貴 的’但是減少設計週期以及對設計者的預付Nre成本。在 此揭示内容中’術語FPGA及PLD係可交換地用以意指可 程式化裝置。 FPGA(包括PLD)提供低再循環工程成本、快速周轉(通 常可在幾分鐘至幾小時内在FPGA中放置並選路設計)、以 及低風險之優點,因為可後來在產品設計週期中容易地修 正設計。僅對大量生產運行在使用較多傳統ASIC方法十存 在成本利益。與PLD及FPGA相比,一 ASIC具有硬線邏輯 連接’其係在晶片設計階段識別。ASIC沒有多個邏輯選 擇’沒有多個選路選擇而且沒有組態記憶體用以定製邏輯 及選路。此對於該ASIC係一較大晶片區域及成本節省,即 FPGA石夕區域由於此等可程式化額外負擔而可以係ASIC區 域的10至40倍。較小的八81(::晶粒大小導致較佳效能及較佳 可A度。一完全定製ASIC亦具有定製的邏輯功能,其與相 134972.doc 200931806 同邏輯功能之PLD及FPGA實施方案相比可能需要更少的 閘極。因此,一 ASIC係明顯比一等效閘極計數FPGA小、 快、便宜而且可靠。折衷係在上市時間(FPGA優點)對低成 * 本及較佳可靠度(ASIC優點)之間。針對由與ASIC相比之 * FPGA所提供的可程化式性的矽面積之成本決定使用者不 得不對邏輯功能之用戶可重新組態性以及邏輯模組之間的 選路承擔的額外成本。可程式化性包括組態記憶體及 FPGA中的MUX額外負擔。 © 10至40x矽區域缺點導致ASIC與FPGA之間的明顯成本及 效能不均等。矽面積額外負擔之一明顯部分係由一 FPGA(包括相關聯的組態記憶體)中的可程式化互連消耗。 移除選路以減少矽額外負擔使一FPGA不能用。已在IDS參 考,尤其在申請案序列號10/267,483、10/267,484及 10/267,51 1中揭示具有優於2D FPGA的較佳邏輯閘極矽密 度改良之一3D FPGA。此類技術可減少FPGA與ASIC邏輯 閘極矽區域之比率至2至10倍。減少FPGA邏輯區域損失會 — 改良與ASIC相比的FPGA之數值。當Si區域比率達到一臨 ' 限值(該臨限值係由該裝置的壽命容量需求決定)時,其將 ' 消除對ASIC設計的需求,而且FPGA設計將成為用於系統 設計的新標準。 一複雜邏輯設計係分成較小邏輯區塊並程式化於提供在 FPGA中的邏輯元件或邏輯區塊中。邏輯元件提供序列及 組合邏輯設計實施方案。組合邏輯沒有記憶體而且輸出單 獨地反應本輸入之函數。藉由將記憶體插入於邏輯路徑中 134972.doc 200931806 以儲存過去的歷史來實施序列邏輯。當前FPGA架構包括 電晶體對、N AND或閘極、多工器、查找表(LUT)以及 AND-OR結構作為一基本邏輯元件。在一傳統FpGA中,該 基本邏輯7L件係識別為一巨集單元。此後術語邏輯元件將 包括邏輯7L件、巨集單元、架構邏輯單元以及用以實施一 邏輯功能之一部分的任何其他基本邏輯單元。一 FP(}a之 粒度指一基本邏輯元件之邏輯内容(小或大卜複雜邏輯設 計係分成用以擬合定製FP(JA顆粒。在細顆粒架構中,一 較小基本邏輯元件係封閉在選路矩陣中並複製。此等架構 以複雜選路為代價提供邏輯擬合。在粗顆粒架構中,許多 基本邏輯7L件係採用區域選路包裝於具有較大功能性的一 邏輯區塊中,該邏輯區塊接著加以複製。邏輯區塊複製利 用全域選路技術。較大邏輯區塊使邏輯擬合困難並使選路 較容易。FPGA架構的一挑戰係提供纟易的邏輯擬合(像細 顆粒一樣)並維持容易的選路(像粗顆粒一樣)。 從可程式化選路矩陣選擇用於邏輯元件、邏輯單元或邏 輯區塊的輸入及輸出。一選路線路係專用於每一者。圖i 中顯示包含參考1 (Seals & Whapsh(m)中說明的邏輯元件之 -範例性選路矩陣。在該範例中,自邏輯元件⑻至ι〇4的 輸入及輸㈣ϋ路至具有可料化通道連接的22個水平及 12個垂直互連線路。此等連接可以係熔絲、抗熔絲或包含 一連接狀態及一斷開狀態的SRAM受控制傳遞閘極電晶 體元件101之個輸出係顯示為與至較黑線中的元件1 的輸入之一輕合:因為垂直線路#3係用以完成該麵合。元 I34972.doc 200931806 件103之一個輸出亦係顯示為與至較黑線中的元件104的輸 入之一輕合:因為垂直線路#8係用以完成該耦合。因此每 一個輸入及每一個輸出佔用一或多個專用線路以完成該耦 合。因此’連接性所需要的線路數目、線路片段、可程式 化連接以及Si區域隨織物内的邏輯元件之數目n而迅速地 成長。 圖2中顯示具有與圖丨選路一起使用的内建〇正反器之邏 輯元件’如參考1中所說明。其中,元件2〇1、2〇2及203係 分別由一個輸入信號控制的2:1 MUX。元件204係一 OR閘 極而205係一 D正反器。在無全球預設及清除信號下,八個 輸入饋送該邏輯區塊,並且一個輸出離開該邏輯區塊。此 9個線路係在圖1中顯示為具有可程式化連接性。因此9個 線路必須經指派用以連接圖2中所示的邏輯元件。所有2輸 入、所有3輸入及一些4輸入可變功能係在該邏輯區塊中實 現並鎖存至該D正反器。在參考1 (seais & whapshott)及參 考2 (Sharma)中論述用於各種商用裝置的Fpga架構。在參 考 3 (Betz,Rose & Marquardt)及參考4 (Lemieux & Lewis) 中提供關於FPGA選路架構的一綜合論題。 選路區塊線路結構定義如何將邏輯區塊彼此連接。鄰近 邏輯元件以及晶粒相對邊角邏輯元件可能需要連接。由附 於邏輯元件的輸出緩衝器來驅動線路信號,並且驅動強度 並不改變線路長度的描述°較長線路可能需要轉發器以週 期性地更新信號。緩衝器及轉發器消耗較大Si區域並且係 極昂貴的。線路延遲變為不可預測的,因為線路長度係在 134972.doc -10- 200931806 邏輯最佳化期間隨機地選擇以使設計最佳地擬合一給定 FPGA。FPGA亦在分割邏輯之時序驅動最佳化期間招_ 長運行時間。因為FPGA在晶粒大小上生長為較大,所以 線路片段之數目及連接邏輯的線路長度增加。線路延遲可 控制晶片效能^線路延遲與線路長度之平方成比例成長, 並且倒轉至相鄰線路的距離。最大晶片大小以每側約2 cm 之遮罩尺寸保持,以,而金屬線路間距係隨科技縮放比例 而減小。一良好的時序最佳化需要深度瞭解特定Fp(}A擬 合器、線路片段之長度以及相關程序參數;未在設計外殼 内發現的技巧進行擬合。在分段線路架構中,提供昂貴的 固定緩衝器以驅動選定線上的全球信號。此等緩衝器係太 少’因為其係太昂貴,而且僅提供單向資料流程。可預測 時序係FPGA的另一挑戰。此將增強FPGAt的放置及選路 工具能力以最佳地擬合並最佳化時序臨界邏輯設計。較多 線路使問題惡化,而較少線路使問題保持易處理,從而減 少FPGA成本。 在此申請案中引用的IDS參考中詳細地論述先前技術 FPGA架構。此等專利揭示用以連接FpGA中的邏輯元件以 及PLD中的巨集單元之特殊選路區塊。在所有引用 中,一固定選路區塊經程式化用以定義用於邏輯區塊的輸 入及輸出,而該邏輯區塊實行一特定邏輯功能。此類專用 互連線路促使FPGA之成本超過等效功能性asic。用以程 式化FPGA的使用者說明書係保持在耦合至FpGA中的邏輯 之FPGA組態記憶體中。用以程式化一揮發性FpGA的使用 134972.doc 200931806 者說明書亦係在一外部記憶體晶片中複製,然而自該記憶 體晶片的資料係擷取並載入於晶片揮發性組態記憶體上以 組態該FPGA。因此IDS引用之FPGA招致對晶片上組態記 憶體以及可程式化性所需要的MUX之巨大損失《一些人進 ' 一步需要昂貴的晶片外增壓ROM以保持組態資料。因此組 態記憶體費用係以SRAM為基礎之FPGA的二倍。 圖3中顯示在A與B之間程式化與可程式化開關及可程式 化縱橫點同義之點對點連接的四種方法。未顯示用以程式 ® 化該連接的一組態電路。IDS中列舉的所有專利使用此等 基本連接之一或多者以組態邏輯元件及可程式化互連。使 用者藉由程式化一記憶體位元來實施該決策。此種組態係 不同於一軟體指令’因為記憶體位元係在實體上產生一控 制信號以主動地實施該決策。在圖3 A中,一導電熔絲鏈結 310連接A至B。其係正常連接的,而且高電流或雷射束之 傳遞將使導體燒斷。在圖3B中,一電容抗熔絲元件32〇斷 0 開A至B。其係係正常開啟的,而且高電流之傳遞將取出 . 絕緣體以使端子短路。熔絲及抗熔絲由於變化之不可逆性 而白係次性可程式化的。在圖3C中,傳遞閘極裝置33〇 連接A至B。閘極信號s〇決定連接之性質,即開啟或關閉。 =係一非破壞性變化。該閘極信號係藉由操縱邏輯信號, 或藉由包括5己憶體的組態電路而產生。記憶體的選擇因使 用者而變化。在圖3〇中,浮動傳遞閘極裝置34〇連接八至 =θ控制閘極信號S〇耦合該裝置之一部分至浮動閘極。在 5孚動閘極中捕獲的電子決定該連接之開啟或關閉狀態。 I34972.doc 200931806 熱電子及Fowler-Nordheim穿随係用以將電荷注入於浮動 閘極上的二個機制。當高品質絕緣體囊封該浮動閘極時, 捕獲的電荷會保留10年以上。此等提供非揮發性記憶體。 • EPROM、EEPROM及快閃記憶體使用浮動閘極而且係非揮200931806 IX. DESCRIPTION OF THE INVENTION: TECHNICAL FIELD OF THE INVENTION The present invention relates to programmable logic devices. 1 [Prior Art] • Traditionally, integrated circuit (1C) devices such as custom, semi-custom or application-specific integrated circuit (ASIC) devices have been used in electronics to reduce cost, enhance performance or meet space constraints. . However, the design and manufacture of custom or semi-custom ICs can be time consuming and expensive. Customization involves a long design cycle during the product definition phase and high acyclic engineering (NRE) costs during the manufacturing phase. In order to absorb design modifications or to find logic errors in custom or semi-custom 1C during the final test phase, it may be necessary to repeat design and manufacturing cycles with longer simulation and prototyping cycles to further increase time to market and NRE costs. As a result, ASICs only serve specific applications and are built for high capacity and low cost. Another type of semi-S device, called a gate array (including a platform ASIC and a fabric ASIC), is used to customize the module area by reducing the NRE cost by synchronizing the sham meter using a soft phantom & Piece. Structural gauge C provides a larger module block than the closed rim J, and may or may not provide a pre-made "pulse network" to simplify design efforts. In both cases, a software tool/seeking history and subsequent lines that converge on timing, RC" takes a few long iterations. In submicron program technology, the line delay is extremely complicated and difficult. Predicting. Lost stone ridges quasi-design confirms that the inter-pole array produces multiple pins and longer design iterations, which further deteriorates - quickly set up ten solutions: mode. Most users need iterative fine-tuning of the design to make Its 134,972.doc 200931806 is perfect* In recent years, the trend has deviated from custom or semi-custom ICs and can be programmed into the field. Its function is not to use the "live" terminal before using the integrated circuit. The user decides. Spot general programmable logic devices (PLDs) or field programmable gate array (FPGA) products greatly simplify the design cycle. These products provide software that is easy for users to use to customize the logic to fit the device through programmability and provide the ability to fine-tune and optimize the design to improve performance. Because of the pre-characterized line "RC" delay, the user is able to achieve complex placement and timing closure very quickly and extremely accurately. This flexibility of programmability or changeability is expensive in terms of area, but reduces the design cycle and the cost of prepaid Nre to the designer. In this disclosure, the terms FPGA and PLD are used interchangeably to mean a programmable device. FPGAs (including PLDs) offer low recycling engineering costs, fast turnarounds (usually placed in FPGAs and routing designs in minutes to hours), and the advantages of low risk, as they can be easily corrected later in the product design cycle design. There are only a few cost benefits in the use of more traditional ASIC methods for mass production operations. Compared to PLDs and FPGAs, an ASIC has a hard-wired logic connection that is identified during the chip design phase. The ASIC does not have multiple logic options. There are no multiple routing options and no configuration memory for custom logic and routing. This is a large wafer area and cost savings for the ASIC, i.e., the FPGA area can be 10 to 40 times larger than the ASIC area due to such a stylized additional burden. The smaller eight 81 (:: grain size results in better performance and better A. A fully custom ASIC also has custom logic functions, which are implemented with the same logic function PLD and FPGA 134972.doc 200931806 The scheme may require fewer gates than the solution. Therefore, an ASIC is significantly smaller, faster, cheaper, and more reliable than an equivalent gate count FPGA. The tradeoff is time to market (FPGA advantage) versus low and better. Between reliability (ASIC advantages). The cost of the scalable area provided by the *FPGA compared to the ASIC determines the user's reconfigurability of the logic function and the logic module. The additional cost of routing is included. Programmability includes additional memory MUX in the configuration memory and FPGA. © 10 to 40x矽 area defects lead to significant cost and performance inequality between ASIC and FPGA. One of the obvious burdens is consumed by the programmable interconnects in an FPGA (including associated configuration memory). Removing the routing to reduce the extra burden makes an FPGA unusable. It has been referenced in IDS, especially in Application sequence Nos. 10/267, 483, 10/267, 484, and 10/267, 51 1 disclose a preferred 3D FPGA with better logic gate 矽 density improvement than 2D FPGAs. This technique reduces FPGA and ASIC logic gate 矽 regions. The ratio is 2 to 10 times. Reduce the loss of FPGA logic area - improve the value of the FPGA compared to the ASIC. When the Si area ratio reaches a near limit (which is determined by the life capacity requirement of the device) It will 'eliminate the need for ASIC design, and FPGA design will become the new standard for system design. A complex logic design is divided into smaller logic blocks and programmed into logic elements or logic blocks provided in the FPGA. The logic element provides a sequence and combinatorial logic design implementation. The combinatorial logic has no memory and outputs a function that separately reflects the input. By inserting the memory into the logical path 134972.doc 200931806 to store the past history to implement the sequence Logic. Current FPGA architectures include transistor pairs, N AND or gates, multiplexers, look-up tables (LUTs), and AND-OR structures as a basic logic component. In a traditional FpGA, The basic logic 7L component is identified as a macrocell. Hereinafter the term logic component will include a logical 7L component, a macrocell, an architectural logic unit, and any other basic logic unit to implement a portion of a logic function. An FP(}a The granularity refers to the logical content of a basic logic component (small or large complex logic design is divided into fitting custom FP (JA particles. In the fine particle architecture, a smaller basic logic component is enclosed in the routing matrix). And copy. These architectures provide a logical fit at the expense of complex routing. In a coarse-grained architecture, many of the basic logic 7L pieces are wrapped in a logical block with greater functionality using region routing, which is then replicated. Logical block copying uses global routing techniques. Larger logic blocks make logic fitting difficult and make routing easier. One of the challenges of the FPGA architecture is to provide easy logic fitting (like fine particles) and maintain easy routing (like coarse particles). The inputs and outputs for logic elements, logic cells, or logic blocks are selected from the programmable routing matrix. A route is dedicated to each. Figure i shows an exemplary routing matrix containing the logic elements described in Reference 1 (Seals & Whapsh(m). In this example, the input and output (4) from the logic elements (8) to ι〇4 have 22 horizontal and 12 vertical interconnections connected to the materialization channel. These connections may be fuses, anti-fuse or SRAM controlled transfer gate transistor elements 101 including a connected state and an open state. The output is shown as being lightly coupled to one of the inputs to component 1 in the darker line: because vertical line #3 is used to complete the face. One of the outputs of element I34972.doc 200931806 is also shown as One of the inputs of element 104 in the black line is lightly coupled: because vertical line #8 is used to complete the coupling. Thus each input and each output occupies one or more dedicated lines to complete the coupling. The number of lines required, the line segments, the programmable connections, and the Si area grow rapidly with the number n of logic elements in the fabric. Figure 2 shows the logic of a built-in 〇 flip-flop with the 丨 routing. Component 'parameter 1, wherein elements 2〇1, 2〇2, and 203 are respectively controlled by an input signal of 2:1 MUX. Element 204 is an OR gate and 205 is a D flip-flop. With the clear signal set, eight inputs feed the logic block and one output leaves the logic block. The nine lines are shown in Figure 1 as having programmable connectivity. Therefore, the nine lines must be assigned. To connect the logic elements shown in Figure 2. All 2 inputs, all 3 inputs, and some 4 input variable functions are implemented in the logic block and latched to the D flip-flop. In reference 1 (seais & Whapshott) and Reference 2 (Sharma) discuss the Fpga architecture for various commercial devices. Provide a comprehensive topic on FPGA routing architecture in Reference 3 (Betz, Rose & Marquardt) and Reference 4 (Lemieux & Lewis) The routing block circuit structure defines how the logical blocks are connected to each other. The adjacent logic elements and the die relative corner logic elements may need to be connected. The output signal is attached by the output buffer attached to the logic element, and the driving strength is not Change line Description of path lengths. Longer lines may require repeaters to periodically update the signal. Buffers and transponders consume large Si areas and are extremely expensive. Line delays become unpredictable because the line length is at 134972. Doc -10- 200931806 The logic optimization period is randomly chosen to best fit the design to a given FPGA. The FPGA also takes long run times during the timing-driven optimization of the split logic. Because the FPGA is in grain size The upper growth is larger, so the number of line segments and the length of the connection logic are increased. The line delay controls the wafer efficiency. The line delay grows in proportion to the square of the line length and is reversed to the distance of the adjacent line. The maximum wafer size is maintained at a mask size of approximately 2 cm per side, and the metal line spacing is reduced with the technology scale. A good timing optimization requires a deep understanding of the specific Fp(}A fitter, the length of the line segment and associated program parameters; the techniques not found within the design shell are fitted. In the segmented line architecture, expensive Fixed buffers to drive global signals on selected lines. These buffers are too few 'because they are too expensive and only provide a one-way data flow. Predictable timing is another challenge for FPGAs. This will enhance the placement of FPGAs and Routing tool capabilities to best fit and optimize timing critical logic designs. More lines make the problem worse, and fewer lines keep the problem manageable, reducing FPGA costs. IDS reference referenced in this application The prior art FPGA architecture is discussed in detail. These patents disclose special routing blocks for connecting logic elements in the FpGA and macro units in the PLD. In all references, a fixed routing block is programmed. To define the inputs and outputs for the logic block, and the logic block implements a specific logic function. Such dedicated interconnect lines cause the cost of the FPGA to exceed the equivalent power. Sexual asic. The user manual for programming the FPGA is maintained in the FPGA configuration memory coupled to the logic in the FpGA. To program the use of a volatile FpGA 134972.doc 200931806 The specification is also external Copying in the memory chip, but the data from the memory chip is captured and loaded on the wafer volatile configuration memory to configure the FPGA. Therefore, the FPGA referenced by IDS incurs configuration memory on the wafer and The huge loss of MUX required for stylization "some people go in one step and need expensive off-chip boost ROM to keep the configuration data. So the configuration memory cost is twice that of the SRAM-based FPGA." There are four ways to display a point-to-point connection between a programmatic and programmable switch and a programmable vertical and horizontal point between A and B. A configuration circuit for programming this connection is not shown. All patents listed in IDS Use one or more of these basic connections to configure logic elements and programmatic interconnects. The user implements this decision by stylizing a memory bit. This configuration is different from a software finger. 'Because the memory bit system generates a control signal on the entity to actively implement the decision. In Figure 3A, a conductive fuse link 310 connects A to B. It is normally connected and has high current or laser The transfer of the beam will cause the conductor to blow. In Figure 3B, a capacitive anti-fuse element 32 is turned off 0 to A to B. The system is normally turned on and the high current transfer will be taken out. The insulator is shorted to the terminals. The fuse and the anti-fuse are sub-programmable due to the irreversibility of the change. In Figure 3C, the transfer gate device 33 is connected to A to B. The gate signal s〇 determines the nature of the connection, ie, on or Closed = A non-destructive change. The gate signal is generated by manipulating logic signals or by a configuration circuit comprising 5 memories. The choice of memory varies depending on the user. In Fig. 3A, the floating transfer gate device 34 is connected eight to = θ to control the gate signal S 〇 to couple a portion of the device to the floating gate. The electrons captured in the 5 volt gate determine the on or off state of the connection. I34972.doc 200931806 Thermoelectric and Fowler-Nordheim wear two mechanisms for injecting charge onto a floating gate. When a high quality insulator encapsulates the floating gate, the trapped charge remains for more than 10 years. These provide non-volatile memory. • EPROM, EEPROM, and flash memory use floating gates and are non-swing

• 發性的。抗熔絲及以SRAM為基礎之架構係廣泛用於商業 FPGA,而EPROM、EEPROM、抗熔絲及熔絲鏈結係廣泛 用於商業PLD。揮發性SRAM記憶體不需要高程式化電 壓,可自由地用於每一個邏輯程序,可與標準CMOS ® SRAM記憶體相容,給予程序及電壓縮放比例並且已成為 現代極大FPGA裝置的實際選擇。遺憾的係其需要外部昂 貴地增壓ROM以節省組態資料。 圖4A中顯示一揮發性以六電晶體SRAM為基礎之組態電 路。SRAM記憶體元件可以係6電晶體、5電晶體、以完全 COMS、R負載或TFT PMOS負載為基礎之單元等。背對背 連接的二個反相器403及404形成該記憶體元件。此記憶體 元件係一鎖存器。該鎖存器可以係完全CMOS、R負載、 ❹ PMOS負載或任何其他負載。圖4A中未顯示用於該等反相 ' 器的電力及接地端子。存取NMOS電晶體401及402以及存 ' 取線路GA、GB、BL及BS提供用以組態該記憶體元件的構 件。分別施加零及一於BL及BS上’而且使GA及GB升高致 能寫入零於裝置401中及一於裝置402中。輸出S0遞送邏輯 一。分別施加一及零於BL及BS上,而且使GA及GB升高致 能寫入一於裝置401中及零於裝置402中。輸出S〇遞送邏輯 零。SRAM構造可允許僅施加BL或BS上的零信號以寫入資 134972.doc • 13- 200931806 料於該鎖存器中。SRAM單元可僅具有一個存取電晶體4〇1 或 402。 只要電力係開啟的’ SRAM鎖存器就將保持該資料狀 態。當關閉電力時,SRAM位元需要從一外側永久記憶體 (ROM)加以恢復至其先前狀態。該外側記憶體並非輕合至 可程式化邏輯以組態該邏輯,而且資料擷取係與微處理器 擁取外部DRAM記憶體資料以儲存並用於區域快取記憶體 中相同。在用於可程式化邏輯的文獻中,此第二非揮發性 記憶體亦係稱為組態記憶體,而且不應該與耦合至可程式 化邏輯的組態記憶體之申請者的定義混淆。 圖4B中解說圖4A中控制如圖3C中所示的邏輯傳遞閘極 的SRAM組態電路。元件450表示該組態電路。由圖4α_ 的記憶體元件直接驅動的S〇輸出驅動該傳遞閘極之閘極電 極。除S〇輸出及鎖存器以外,450中的電力、接地、資料 及寫入致能信號構成SRAM組態電路。寫入致能電路包括 圖4A中所示的GA、GB、BL、BS信號。圖4B中顯示一以 SRAM為基礎之開關,其中傳遞閘極410可以係—pM〇s、 NMOS或CMOS電晶體對。NMOS由於其較高傳導而係較佳 的。NMOS電晶體410之閘極電極上的閘極電壓S〇決定開啟 或關閉連接.具有邏輯位準一的S 0完成點對點連接,而邏 輯位準零保持該等節點斷開。由耦合至NMOS電晶體410之 閘極的一組態電路450產生該邏輯位準。用於包含該SRAM 裝置及傳遞閘極之該可程式化開關的符號係在圖4C中顯示 為交又陰影圓圈460。SRAM記憶體資料可在該裝置的操作 134972.doc 14- 200931806 中隨時加以改變,從而即時改變一應用及選路,因此引起 FPGA裝置中的可重新組態計算之概念。 一可程式化MUX利用複數個點對點開關。圖㈣示三個 . 不同的以龐為基礎之可程式化邏輯構造。圖从顯示一 ' 可程式化2:1 MUX。在該中,二個傳遞閘極川及512 允許二個輸入⑷,連接至輸出〇。具有二個互補輸出控制 信號s0及SQ·的一組態電路550提供可程式化性。當%=1, So 〇時,I。係麵合至〇。當Sg=(),8。,= 1時;“係輕合至〇。 © 纟55〇内具有一個記憶體元件情況下,—個輸入係始終麵 合至該輸出《若在550内提供二個位元,則可以產生二個 相互排斥輸出S〇&S〗。若在該邏輯設計中存在此一要求, 則此將不允許I。或1丨耦合至〇。圖58顯示由2個記憶體元件 控制的-可程式化4:1 MUX。當由4個記憶體元件輸出^至 S3替換4個輸入:^至〗3,而且由二個輸入^及^控制該傳遞 閘極時的一類似構造係稱為4輸入查找表(LUT)。圖⑶中的 β 4:1 MUX採用包含於組態電路56〇(未顯示)中的二個記憶體 7L件561及562來操作。類似於圖5A,I〇、J丨、12或13之一係 根據狀態連接至〇。例如,當,Si = 1時;l係耦 . 合至0。同樣地,當S0=〇並且s〗=〇時,13係耦合至〇。圖5C; 中顯示一3位元可程式化3:1 Μυχ。點〇可分別經由傳遞閘 極53 1、533或532連接至A、B或C。包含於一組態電路 570(未顯示)中的記憶體元件571、572及573控制此等傳遞 閘極輸入信號。需要三個記憶體元件以連接D至僅一個 點、任何二個點或所有三個點。在可重新組態計算中,記 134972.doc -15- 200931806 憶體70件571、572及573中的資料可即時加以改變以按需 要改變A、B、C及D之間的連接性。 ❹• Hairy. Anti-fuse and SRAM-based architectures are widely used in commercial FPGAs, while EPROM, EEPROM, anti-fuse and fuse links are widely used in commercial PLDs. Volatile SRAM memory does not require high program voltages and is freely available for every logic program. It is compatible with standard CMOS® SRAM memory, giving program and voltage scaling and has become the practical choice for modern very large FPGA devices. Unfortunately, it requires an externally expensive boost ROM to save configuration data. A configurable circuit based on a six-crystal SRAM is shown in Figure 4A. The SRAM memory component can be a 6-cell transistor, a 5-transistor, a cell based on a full COMS, R-load or TFT PMOS load, and the like. The two inverters 403 and 404 connected back to back form the memory element. This memory component is a latch. The latch can be a full CMOS, R load, PMOS PMOS load or any other load. The power and ground terminals for these inverters are not shown in Figure 4A. Accessing NMOS transistors 401 and 402 and storing 'take lines GA, GB, BL, and BS provide components for configuring the memory elements. Zero and one are applied to BL and BS respectively, and GA and GB rise enable are written to zero in device 401 and in device 402. Output S0 delivers logic one. One and zero are applied to the BL and the BS, respectively, and the GA and GB rise enable are written in the device 401 and zero in the device 402. Output S〇 delivers logic zero. The SRAM configuration allows for the application of only zero signals on the BL or BS to be written in the 134972.doc • 13- 200931806. The SRAM cell can have only one access transistor 4〇1 or 402. As long as the power system is turned on, the 'SRAM latch will maintain the data status. When power is turned off, the SRAM bit needs to be restored from an external permanent memory (ROM) to its previous state. The outer memory is not flashed to the programmable logic to configure the logic, and the data retrieval system is the same as the microprocessor fetching external DRAM memory data for storage and use in the area cache memory. In the literature for programmable logic, this second non-volatile memory is also referred to as configuration memory and should not be confused with the definition of the applicant of the configuration memory coupled to the programmable logic. The SRAM configuration circuit for controlling the logic transfer gate shown in Figure 3C in Figure 4A is illustrated in Figure 4B. Element 450 represents the configuration circuit. The S〇 output, which is directly driven by the memory element of Fig. 4α_, drives the gate electrode of the transfer gate. In addition to the S〇 output and latch, the power, ground, data, and write enable signals in the 450 form the SRAM configuration circuit. The write enable circuit includes the GA, GB, BL, BS signals shown in Figure 4A. An SRAM-based switch is shown in Figure 4B, wherein the pass gate 410 can be a pM 〇 s, NMOS or CMOS transistor pair. The NMOS is preferred due to its higher conduction. The gate voltage S〇 on the gate electrode of NMOS transistor 410 determines whether the connection is turned on or off. S 0 with a logic level of one completes the point-to-point connection, while the logic level zero keeps the nodes disconnected. This logic level is generated by a configuration circuit 450 coupled to the gate of NMOS transistor 410. The symbol for the programmable switch containing the SRAM device and the transfer gate is shown in Figure 4C as a cross-hatched circle 460. The SRAM memory data can be changed at any time in the operation of the device 134972.doc 14- 200931806, thereby instantly changing an application and routing, thus causing the concept of reconfigurable computing in the FPGA device. A programmable MUX utilizes a plurality of point-to-point switches. Figure (4) shows three. Different Pon-based programmable logic constructs. The figure shows a 'programmable 2:1 MUX. In this, two pass gates and 512 allow two inputs (4) to be connected to the output port. A configuration circuit 550 having two complementary output control signals s0 and SQ· provides programmability. When %=1, So 〇, I. The tie is joined to the 〇. When Sg = (), 8. , = 1; "lights to 〇. © 纟 55 具有 has a memory component, - the input system always faces to the output "If two bits are provided in 550, then two Mutually exclusive outputs S〇&S. If there is such a requirement in the logic design, this will not allow I or 1丨 to be coupled to 〇. Figure 58 shows the -programmable by two memory elements 4:1 MUX. When 4 outputs are replaced by 4 memory elements ^ to S3: ^ to 〖3, and a similar structure when the two gates ^ and ^ control the transfer gate is called 4 input. Lookup Table (LUT) The β 4:1 MUX in Figure (3) operates with two memory 7L pieces 561 and 562 included in configuration circuit 56 (not shown). Similar to Figure 5A, I〇, J One of 丨, 12 or 13 is connected to 〇 according to the state. For example, when Si = 1; l is coupled to 0. Similarly, when S0 = 〇 and s = 〇, 13 is coupled to 〇 Figure 5C; shows a 3-bit programmable 3:1 Μυχ. The point 〇 can be connected to A, B or C via a transfer gate 53 1 , 533 or 532 respectively. Included in a configuration circuit 570 (not The memory elements 571, 572, and 573 in the display control these pass gate input signals. Three memory elements are required to connect D to only one point, any two points, or all three points. In the calculation, note 134972.doc -15- 200931806 The information in 70 pieces 571, 572 and 573 can be changed immediately to change the connectivity between A, B, C and D as needed.

在IDS參考引用中,揭示以3D FpGA構造構建區塊的三 維概念。在一第一態樣中,3D FPGA藉由將組態記憶體定 位於可程式化邏輯内容上方來減少矽區域。在第二態樣 中’一昂貴使用者可程式化RAM記憶體係首先用以將一複 雜設計瞄準一可程式化裝置,而且當設計凍結時,由一便 宜遮罩可程式化ROM記憶體替換該ram。在一第三態樣 中’包含多數載子傳導的一薄膜電晶體係用以構造3維組 態電路。薄膜SRAM記憶體具有優於塊體SRAM的較佳阿 伐(alpha)粒子免疫性。在一第四態樣中,一 3維薄膜電晶 體SRAM記憶體元件係用以程式化可程式化邏輯。在一第 五態樣中’ MUX係堆疊於邏輯上而且組態記憶體係堆疊於 MUX上以明顯減少石夕覆蓋區。個別地或結合其他揭示内容 而使用的該等揭示内容之一或多證實優於傳統2d可程式化 邏輯裝置的3D可程式化邏輯裝置之明顯改良。 【發明内容】 此揭示内容展示與3D FPGA電路相關聯的構造複雜性及 創新。一3D FPGA裝置需要供信號線路存取該晶片的複數 個I/O及墊、配置在一邏輯區塊之某一規則或不規則構造 中的複數個可程式化邏輯/選路元件、配置在某一陣列構 造中的複數個可程式化邏輯區塊、由使用者頻繁用以與可 程式化邏輯介接的一或多個智慧財產(IP)核心、與該fpga 之所有上述組件互動的一可程式化互連矩陣、以及許多其 134972.doc -16- 200931806In the IDS reference, the three-dimensional concept of building blocks in 3D FpGA construction is revealed. In a first aspect, the 3D FPGA reduces the 矽 region by placing the configuration memory above the programmable logic content. In the second aspect, an expensive user programmable RAM memory system is first used to target a complex design to a programmable device, and when the design freezes, the memory is replaced by a cheap mask programmable ROM memory. Ram. In a third aspect, a thin film electro-crystalline system containing majority carrier conduction is used to construct a 3-dimensional configuration circuit. Thin film SRAM memory has better alpha particle immunity than bulk SRAM. In a fourth aspect, a 3-dimensional thin film transistor SRAM memory component is used to program the programmable logic. In a fifth aspect, the 'MUX system is stacked logically and the configuration memory system is stacked on the MUX to significantly reduce the Shihua coverage area. One or more of the disclosures used individually or in combination with other disclosures demonstrate significant improvements over 3D programmable logic devices of conventional 2d programmable logic devices. SUMMARY OF THE INVENTION This disclosure demonstrates the architectural complexity and innovation associated with 3D FPGA circuits. A 3D FPGA device requires a plurality of I/Os and pads for signal lines to access the chip, a plurality of programmable logic/route components disposed in a regular or irregular configuration of a logic block, and configured a plurality of programmable logic blocks in an array structure, one or more intellectual property (IP) cores frequently used by a user to interface with programmable logic, and one interacting with all of the above components of the fpga Programmable interconnect matrix, and many of its 134972.doc -16- 200931806

=。在典型2DFPGA構造中,該組態記憶截係交互分 株種構建區塊内並按需要由金屬線路柄合至該等邏輯 讀。通常地,較低位準金屬層(例如金屬t、金屬2 屬3)係用以構造區域電路,例如輕合可程式化元件至 §己憶體單元。在標準單元ASIC^,較低位準金屬層_轉 用以構造標準單元。電路組件之配置在改良邏輯放 並減少3D晶片之成本中起到至關重要的作用1為不存在 允許3D主動組件堆疊的有效率軟體工具所以3d晶片構 造需要較新的構造技術。 如本文中所揭示,將矽有效率地用於耦合至一有效率互 連及選路織物以配置3D電路組件的使用者定義組件(例如 可程式化邏輯、IP、墊等)來構造3D可程式化邏輯晶片。 此類程序在重複中識別適當的垂直互連方法以耦合組態記 憶體至可程式化邏輯而且易於構造互連織物。此外,3D FPGA需要橫向互連,其縫合在一起以形成較長的線路, 以及垂直互連以不阻隔可以實現此所採用的效率。有效率 垂直組癌係採用重複結構達到’該等結構允許具有變化的 使用者要求之複雜可程式化邏輯構建區塊容易地整合於由 變化的邏輯及記憶體密度組成的晶片中,並針對系統設計 免疫性遞送經濟及有效率3D可程式化晶片之系列。 在一態樣申,一三維可程式化邏輯裝置(PLD)包含:一 可程式化邏輯區塊,其具有以一預定佈局幾何結構定位在 該邏輯區塊中的複數個可組態元件;以及組態記憶體單元 之一第一陣列,該等記憶體單元之每一者係麵合至該等可 134972.doc -17- 200931806 組態元件之一或多者以程式化該邏輯區塊至-使用者說明 書’其中該第-陣列實質上符合該預定佈局幾何結構而且 該第-陣列係實質上定位於該邏輯區塊上方或下方。 -以上態樣之實施方案可包括下列實施方案之—或多者。 ·-可程式化邏輯裝置可包括複數個可程式化邏輯區塊障 列。-邏輯區塊可在-陣列中加以複製,或者複數個複雜 邏輯區塊可代替該陣列而使用。一單元可採用一或多個邏 肖區塊創建並在—陣列中複製以更有效率地構造-邏輯區 & 料列。-可程式化邏輯區塊可進—步包括複數個可程式 化邏輯單元及邏輯元件。該邏輯單元自身可在一陣列中加 以複製以形成該邏輯區塊…邏輯單元可稱為—邏輯區 塊’因此該邏輯區塊可包括酉己置在陣列中的複數個邏輯單 兀。一可程式化邏輯單元可進一步包括複數個可程式化元 件,此類元件包括邏輯及選路元件。一記憶體單元可儲存 才曰令之一部分以程式化一邏輯元件。因此一用戶可使用 診 纪憶體資料以儲存一指令來完全程式化該PLD。該邏輯單 ^ 兀可使該等可程式化元件與不可組態電路組件混合。在一 個範例中,一可程式化開關可採用一可程式化電路令的邏 輯電晶體交互分散。在另一個範例中,一可程式化多工器 電路可採用一可程式化電路中的邏輯電晶體交互分散。在 另一個範例中’鎖存器及正反器可採用可程式化查找表電 路及可程式化MUX電路交互分散以構造一可程式化邏輯單 元。一可程式化互連結構可連接複數個邏輯單元、或邏輯 區塊、或邏輯陣列至彼此、至墊結構以及至IP區塊。此類 134972.doc -18· 200931806 互連結構完成該積體電路之功能性並形成至輸入及輸出塾 的連接。該等互連結構包括—可程式化㈣。大部分共同 開關係-傳遞間極裝置。一傳遞閉極係可電連接二個點的 一 NMOS電晶體、一PM〇s電晶體或一€1^〇8電晶體對。一 傳遞閘極係-傳導率調變元件,纟包括—連接狀態以及一 斷開狀態。連接二個點的其他方法包括熔絲鏈結及抗熔絲 電合器。連接二個點的其他方法可包括一電化學或鐵電或 ❸=. In a typical 2D FPGA configuration, the configuration memory truncation is interactively built into blocks and, as needed, the metal line handles are coupled to the logical reads. Typically, lower level metalloid layers (e.g., metal t, metal 2 genus 3) are used to construct regional circuitry, such as lightly configurable components to § memory cells. In the standard cell ASIC^, the lower level metallization layer_ is used to construct a standard cell. The configuration of the circuit components plays a vital role in improving logic placement and reducing the cost of 3D wafers. 1 There is no efficient software tool that allows stacking of 3D active components. Therefore, 3D wafer construction requires newer construction techniques. As disclosed herein, the 矽 is efficiently used to couple 3D to a user-defined component (eg, programmable logic, IP, pad, etc.) that is coupled to an efficient interconnect and routing fabric to configure the 3D circuit components. Stylized logic chip. Such programs identify appropriate vertical interconnect methods in the iteration to couple the configuration memory to the programmable logic and to easily construct the interconnect fabric. In addition, 3D FPGAs require lateral interconnects that are stitched together to form longer lines, and vertical interconnects that do not block the efficiencies that can be achieved. Efficient vertical group cancer systems use repetitive structures to achieve 'these structures allow complex programmable logic building blocks with varying user requirements to be easily integrated into wafers composed of varying logic and memory densities, and for systems Design a family of immune delivery economics and efficient 3D programmable wafers. In one aspect, a three-dimensional programmable logic device (PLD) includes: a programmable logic block having a plurality of configurable elements positioned in the logic block in a predetermined layout geometry; Configuring a first array of memory cells, each of the memory cells being coupled to one or more of the 134972.doc -17-200931806 configuration elements to program the logic block to The user specification 'where the first array substantially conforms to the predetermined layout geometry and the first array is positioned substantially above or below the logic block. - Embodiments of the above aspects may include - or more of the following embodiments. • A programmable logic device can include a plurality of programmable logic block barriers. - Logical blocks can be replicated in the array, or a plurality of complex logical blocks can be used in place of the array. A unit can be created with one or more logical blocks and replicated in an array to more efficiently construct a logical region & - The programmable logic block can further include a plurality of programmable logic units and logic elements. The logic unit itself may be duplicated in an array to form the logical block... the logical unit may be referred to as a "logical block" so that the logical block may include a plurality of logical units that have been placed in the array. A programmable logic unit can further include a plurality of programmable elements, such as logic and routing elements. A memory unit can store a portion of the program to program a logic element. Therefore, a user can use the diagnostic data to store an instruction to fully program the PLD. The logic unit can mix the programmable components with the non-configurable circuit components. In one example, a programmable switch can be interactively dispersed using a programmable circuit. In another example, a programmable multiplexer circuit can be interactively dispersed using logic transistors in a programmable circuit. In another example, the latches and flip-flops can be interactively dispersed using a programmable look-up table circuit and a programmable MUX circuit to construct a programmable logic unit. A programmable interconnect structure can connect a plurality of logic cells, or logic blocks, or logic arrays to each other, to a pad structure, and to an IP block. This type of 134972.doc -18· 200931806 interconnect structure completes the functionality of the integrated circuit and forms a connection to the input and output ports. The interconnect structures include - programmable (4). Most of the common relationship - the transfer of the pole device. A transfer closed-pole system can electrically connect two points of an NMOS transistor, a PM〇s transistor or a pair of transistors. A pass gate-conductivity modulation element, including a - connection state and an off state. Other methods of connecting two points include fuse links and anti-fuse combiners. Other methods of connecting two points may include an electrochemical or ferroelectric or ❸

任何其他單元。程式化此等裝置包括形成一傳導路徑或一 非傳導路徑之一。 傳遞閘極上的閘極電極信號允許一可程式化方法控制 -開啟及關閉連接。在該等可程式化邏輯區塊及可程式化 線路結構中包括複數個傳遞間極。該結構可包括由包含由 CMOS f晶體組成的電路,丨包含娜、、 yVERT、〇R、N0R、查找表、真值表、廳χ、算術邏輯 早凡、中央處理單元、可程式化記憶體及傳遞間極型邏輯 夕個邏輯電路可組合成—較大邏輯區塊。组態電路 係用以提供可程式化性。組態電路具有記憶體元件及存取 電路以改變記憶體f料。每—記憶體元件可以係—電晶體 或一極體或電子裝置之一群組。該等記憶體元件可以由 =〇S裝置、電容器、二極體、電阻器及其他電子組件製 ^。該等記憶體元件可由諸如薄膜電晶體(TFT)、薄膜電 。及薄膜—極體之溥膜裝置製造。可從由揮發性及非揮 發!生錢體元件組成料組選擇該記憶體元件^亦可從包 含熔絲、抗熔絲、SRAM單元、DRAM單元、先學單元、 I34972.doc -19- 200931806 金屬任選鏈結、EPROM、EEPROM、快閃記憶體、磁性及 鐵電元件之群組選擇該記憶體元件。記憶體元件可以係一 傳導率調變元件。可提供一或多個冗餘記憶體元件以控制 同一電路區塊。此類技術不應該與傳統dram或快閃ΐ己憶 . 體裝置中的冗餘性混淆。該記憶體元件可產生一輸出信號 以控制傳遞閘極邏輯。組態記憶體元件可產生用以得到一 控制信號的一信號。組態記憶體元件可產生用以定義一查 找表的一資料信號。該控制信號係柄合至一傳遞閘極邏輯 & 元件、AND陣列、NOR陣列、一 MUX或一查找表(LUT)邏 輯。熟習此項技術者應瞭解,記憶體元件係不產生控制信 號的傳統記憶體裝置。 邏輯區塊及邏輯單元包括輸出及輸入。邏輯功能實行邏 輯操作。邏輯功能操縱輸入信號以在一或多個輸出中提供 一所需回應。該等輸入信號可加以儲存在儲存元件中。該 等輸出信號可加以儲存在儲存元件中。該等輸入及輸出信 號可以係同步或異步信號。邏輯功能之輸入可接收自記憶 9 體、或該裝置上的輸入接針、或該裝置中的其他邏輯區塊 之輸出。邏輯區塊之輸出可耦合至其他輸入、或儲存裝 • 置、或該裝置中的輸出墊、或用作控制邏輯。輸入及輸出Any other unit. Stylizing such devices includes forming one of a conductive path or a non-conductive path. Passing the gate electrode signal on the gate allows a programmable approach to control - opening and closing the connection. A plurality of transfer interpoles are included in the programmable logic blocks and the programmable circuit structure. The structure may include a circuit comprising a crystal composed of CMOS f, including na, yVERT, 〇R, N0R, lookup table, truth table, hall, arithmetic logic, central processing unit, programmable memory And the transfer between the polar logic logic circuits can be combined into a larger logical block. The configuration circuit is used to provide programmability. The configuration circuit has a memory component and an access circuit to change the memory. Each memory component can be a group of transistors or a pole or an electronic device. The memory components can be fabricated from =〇S devices, capacitors, diodes, resistors, and other electronic components. The memory elements can be electrically conductive, such as thin film transistors (TFTs), thin films. And the film-electrode decimator device manufacturing. The memory component can be selected from a group consisting of volatile and non-volatile! bulk materials. It can also be included from fuses, anti-fuse, SRAM cells, DRAM cells, first-study units, I34972.doc -19- 200931806 The memory element is selected by a group of metal optional links, EPROM, EEPROM, flash memory, magnetic and ferroelectric elements. The memory component can be a conductivity modulation component. One or more redundant memory elements can be provided to control the same circuit block. Such techniques should not be confused with redundancy in traditional dram or flash memory. The memory component can generate an output signal to control the transfer gate logic. The configuration memory component can generate a signal for obtaining a control signal. The configuration memory component can generate a data signal that defines a lookup table. The control signal is coupled to a pass gate logic & component, AND array, NOR array, a MUX or a look up table (LUT) logic. Those skilled in the art will appreciate that a memory component is a conventional memory device that does not produce a control signal. The logic blocks and logic units include outputs and inputs. The logic function performs a logical operation. The logic function manipulates the input signal to provide a desired response in one or more outputs. The input signals can be stored in a storage element. The output signals can be stored in a storage element. The input and output signals can be synchronous or asynchronous signals. The input of the logic function can be received from the memory body, or the input pin on the device, or the output of other logic blocks in the device. The output of the logic block can be coupled to other inputs, or storage devices, or output pads in the device, or used as control logic. Input and output

經由可程式化開關麵合至一互連織物D 使用能夠製造CMOS電晶體的一基本邏輯程序來製造結 構單元。在P型、N型、磊晶或SOI基板晶圓上形成此等電 晶體。在一基板層上構造每一個積體電路。在同一矽基板 上構造的包括組態記憶體的組態電路佔據一較大;g夕覆蓋 134972.doc -20- 200931806 區。與一類似功能性定製線路結構相比,此添加可程式化 線路結構的成本。用以連接線路的傳遞閘極及組態電路之 3維整合提供藉由參考併入之應用中的明顯成本減少。 該等傳遞閘極及組態電路可構造於—或多個金屬層上方。 該等金屬層可用於結構單元之内部及交互連接^藉由插入 一薄膜電晶體(TFT)模組或一雷射熔絲模型,或任何其他 垂直記憶體結構,可將該等可程式化線路電路形成於該等 、.、w構單元電路上方。該等記憶體模組可加以插入在任何通 道層中、在一個金屬層之間或在一邏輯程序之頂部金屬層 的頂部上。該記憶體元件可產生一輸出信號以控制邏輯閘 極。記憶體元件可產生用以得到一控制信號的一信號。 一邏輯區塊及一邏輯單元包括佈局幾何結構。在該佈局 幾何結構内,有效率地配置電晶體以減少該佈局所需要的 矽之覆蓋區。此等電晶體係採用固定互連以及可程式化互 連而彼此耦合。可隨機配置一邏輯單元或一邏輯區塊中的 可程式化元件。可採用佈局區域規則地配置一些可程式化 元件。一些可程式化元件可以較近地隔開,而其他可程式 化元件可彼此隔開得較遠。一邏輯單位單元可重複複數次 以形成一邏輯區塊單元。該等可程式化元件可實質上隨機 地定位在該邏輯單元或該邏輯區塊内以採用最少佈局區域 構造個別單元。可能需要一記憶體單元以程式化該可程式 化元件。一記憶體單元可耦合至一可程式化元件以程式化 該可程式化元件。一記憶體單元可耦合至複數個可程式化 元件以程式化該等元件。複數個記憶體單元可程式化一邏 134972.doc -21 - 200931806 輯區塊或一邏輯單元。複數個記憶體單元係在構造為一記 憶體單元陣列時更有效率地構造。一可程式化邏輯裝置可 . #有-第-佈局區域’其包含具有隨機分配的複數個可組 態元件之一可程式化邏輯區塊。該裝置可具有一第二佈局 . 冑何結構’其包含組態記憶體單元之-鄰接陣列,該陣列 係藉由複製-記憶體單元而構造。為了改良該佈局之效 率,該第-佈局幾何結構可實質上係與該第二佈局幾何結 冑相同’而且該第二佈局幾何結構可實質上定位於該第一 #局幾何結構之上。因此記憶體單元之一有效率地構造之 陣列經設計用以程式化一有效率地構造之邏輯區塊或邏輯 單疋。此外,包含邏輯區塊及記憶體單元陣列二者的一單 位單元可經複製用以構造較大構建區塊。在較大構建區塊 中,該等記憶體單元可組合以形成記憶體單元之一鄰接較 大有效率構造及定位之陣列。因此一較大邏輯單元之構造 允許有效率地構造較大邏輯陣列。 ❹ 在一第一具體實施例中,該邏輯區塊具有一第一數目的 . 獨立可程式化元件(一獨立程式化元件意指由一單一記憶 體單元所程式化的一或多個可程式化元件)。用以程式化 該邏輯區塊的記憶體單元之該陣列具有實質上類似的第一 數目之記憶體單元。該邏輯區塊經最佳化用以包含一實質 上相等數目的記憶體單元,因此該記憶體單元區域/幾何 結構與包含該等可程式化元件的該邏輯區塊區域/幾何結 構緊密地匹配。 依據本發明,一 3D PLD可包括一1/0單元,其具有帶定 134972.doc -22· 200931806 位於其中的複數個可組態元件之一第一 Ϊ/Ο區域以及一第 二I/O區域;以及組態記憶體單元之一第二陣列,其具有 複數個組態記憶體單元,該等第二陣列單元之每一者係搞 合至該第一 I/O區域中的該等可組態元件之一或多者以程 • 式化該I/O單元至一使用者說明書,其中該第二陣列及該 第一 I/O區域實質上符合該預定佈局幾何結構而且該第二 陣列係實質上定位於該第一 I/O區域上方或下方。 以上態樣之實施方案可包括下列實施方案之一或多者。 〇 一可程式化邏輯裝置包括複數個I/O單元,每一 I/O單元允 許PLD之一輸入或一輸出耦合至一外部裝置。I/O單元可包 括塊狀接合’或按需要線路接合的一塾區域。該等I/O單 元可沿周長配置,或配置在儲存庫中,或均勻地分配在該 PLD内。該等I/O單元可耦合至該PLD之互連織物。該I/O 單元可以係可程式化的,該單元提供複數個I/O標準之一 以由一使用者選擇為一期望I/O特徵。該I/O單元可提供多 個電壓操作選項。該I/O單元可提供共用複數個輸入及輸 出當中的一接針。該I/O單元可提供包括LVDS、SDR、 DDR、LVTTL、LVPECL、LVCMOS、PCI、PCIX、GTL、 * GTLP、HSTL、SSTL、BLVDS 的 I/O標準之一或多者。因 此一使用者可組態一 I/O單元至一提供的特徵,其包括但 不限於所示的清單。 一 I/O單元包括佈局幾何結構。在該佈局幾何結構内, 有效率地配置I/O電路電晶體以減少該佈局所需要的矽之 覆蓋區。該等I/O電路電晶體佔用一 I/O電路區域/幾何結 134972.doc -23- 200931806 t卯單元包括-金屬墊,該墊佔用一㈣何結構或一 &域。該墊幾何結構可以係鄰近於1/〇電路幾何結構。 該I/O電路幾何結射包括^功能料之—第—區域以Coupling to an interconnect fabric D via a programmable switch D uses a basic logic program capable of fabricating a CMOS transistor to fabricate the structural unit. These transistors are formed on a P-type, N-type, epitaxial or SOI substrate wafer. Each integrated circuit is constructed on a substrate layer. The configuration circuit including the configuration memory constructed on the same germanium substrate occupies a larger area; the eve covers the 134972.doc -20-200931806 area. This adds the cost of programming the line structure compared to a similar functional custom line structure. The three-dimensional integration of the transfer gates and configuration circuitry used to connect the lines provides significant cost reduction in the applications incorporated by reference. The transfer gates and configuration circuitry can be constructed over - or a plurality of metal layers. The metal layers can be used for internal and interactive connections of the structural unit. The programmable circuit can be formed by inserting a thin film transistor (TFT) module or a laser fuse model, or any other vertical memory structure. The circuit is formed above the circuit of the . The memory modules can be inserted in any of the via layers, between a metal layer or on top of a metal layer on top of a logic program. The memory component can generate an output signal to control the logic gate. The memory component can generate a signal for obtaining a control signal. A logical block and a logical unit include a layout geometry. Within the layout geometry, the transistors are efficiently configured to reduce the footprint of the turns required for the layout. These electro-crystalline systems are coupled to each other using fixed interconnects and programmable interconnects. A logic unit or a programmable element in a logic block can be randomly configured. Some stylized components can be configured regularly using the layout area. Some of the programmable elements can be spaced closer together, while other programmable elements can be spaced further apart from one another. A logical unit cell can be repeated a plurality of times to form a logical block unit. The programmable elements can be positioned substantially randomly within the logic unit or the logic block to construct individual units with a minimum layout area. A memory unit may be required to program the programmable element. A memory unit can be coupled to a programmable element to program the programmable element. A memory unit can be coupled to a plurality of programmable elements to program the elements. A plurality of memory cells can be programmed into a block 134972.doc -21 - 200931806 block or a logical unit. A plurality of memory cells are constructed more efficiently when constructed as a memory cell array. A programmable logic device can have a #有-第-layout area' which contains a programmable logic block having a plurality of randomly configurable component elements. The device can have a second layout. Any structure that includes an contiguous array of configuration memory cells is constructed by replica-memory cells. To improve the efficiency of the layout, the first layout geometry can be substantially identical to the second layout geometry' and the second layout geometry can be positioned substantially above the first #office geometry. Thus an array of memory cells that are efficiently constructed is designed to be programmed to efficiently construct logical blocks or logic blocks. In addition, a unit of unit containing both logical blocks and memory cell arrays can be replicated to construct a larger building block. In larger building blocks, the memory cells can be combined to form an array of one of the memory cells abutting a more efficient configuration and positioning. Thus the construction of a larger logic unit allows for efficient construction of larger logic arrays. In a first embodiment, the logical block has a first number of independent programmable elements (a separate stylized element means one or more programmable programs that are programmed by a single memory unit) Components). The array of memory cells used to program the logic block has a substantially similar first number of memory cells. The logic block is optimized to include a substantially equal number of memory cells, such that the memory cell regions/geometry closely match the logical block region/geometry comprising the programmable elements . In accordance with the present invention, a 3D PLD can include a 1/0 unit having a first Ϊ/Ο region and a second I/O of a plurality of configurable components with 134972.doc -22· 200931806 located therein. a second array of one of the configuration memory cells having a plurality of configuration memory cells, each of the second array elements being compliant with the first I/O region One or more of the configuration elements to program the I/O unit to a user specification, wherein the second array and the first I/O area substantially conform to the predetermined layout geometry and the second array The system is positioned substantially above or below the first I/O area. Embodiments of the above aspects may include one or more of the following embodiments. 〇 A programmable logic device includes a plurality of I/O units, each of which allows one of the inputs or an output of the PLD to be coupled to an external device. The I/O unit may comprise a block joint' or a stack of areas that are joined as needed. The I/O units can be configured along the perimeter, or configured in a repository, or evenly distributed within the PLD. The I/O units can be coupled to the interconnect fabric of the PLD. The I/O unit can be programmable, and the unit provides one of a plurality of I/O standards to be selected by a user as a desired I/O feature. This I/O unit provides multiple voltage operation options. The I/O unit provides a pin for sharing a plurality of inputs and outputs. The I/O unit can provide one or more of the I/O standards including LVDS, SDR, DDR, LVTTL, LVPECL, LVCMOS, PCI, PCIX, GTL, * GTLP, HSTL, SSTL, BLVDS. Thus a user can configure an I/O unit to a provided feature including, but not limited to, the list shown. An I/O unit includes a layout geometry. Within the layout geometry, the I/O circuit transistors are efficiently configured to reduce the footprint of the turns required for the layout. The I/O circuit transistors occupy an I/O circuit area/geometry. 134972.doc -23- 200931806 The t卯 unit includes a metal pad that occupies one (four) structure or one & The pad geometry can be adjacent to the 1/〇 circuit geometry. The geometrical emission of the I/O circuit includes the first region of the functional material

及可程式化電路之一第二區域。該第二區域可以係鄰近於 可程式化邏輯幾何結構,因此可形成__較大可程式化幾何 結構。該等!/〇電晶體係採用固定互連以及可程式化互連 而彼此耗合…而單元中的可程式化元件可以僅定位在 該I/O電路幾何結構中,更佳地定位在經隨機配置用以改 良佈局效率的該第二區域t。可採用該佈局幾何結構規則 地配置一些可程式化元件。一些可程式化元件可以較近地 隔開,而其他可程式化元件可彼此隔開得較遠。一ι/〇單 元可重複複數次以形成一1/0單元群組。該等1/〇電路幾何 結構可聚集以形成電路元件之鄰接區域,該等電路元件包 ❹ 括可形成一實質上隨機定位之1/0電路佈局幾何結構之_ 重複結構的可程式化元件。可能需要一記憶體單元以程式 化該可程式化元件。一記憶體單元可耦合至一可程式化元 件以程式化該可程式化元件。一記憶體單元可耦合至複數 個可程式化元件以程式化該等元件。複數個記憶體單元可 程式化一 I/O電路。複數個記憶體單元係在構造為一記憶 體單元陣列時更有效率地構造。一 I/O單元可具有一第— 佈局幾何結構’其包含具有隨機分配的複數個可組態元件 之一 I/O電路。該裝置可具有一第二佈局幾何結構,其包 含纽態記憶體單元之一鄰接陣列,該陣列係藉由複製一記 憶體單元而構造。為了改良該佈局之效率,該第一佈局幾 lH972.doc -24- 200931806 何結構可實質上係與該第-佑A继^ & 茨弟一佈局幾何結構相同,而且該第 二佈局幾何結構可實質上宗仂於 貝貞上疋位於該第一佈局幾何結構上 方。因此記憶料元之—有效率構造之陣雜設計用以程 式化-有效率構造之1/0單元。此外,包含轉及ι/〇電路 一者的該1/0單元可經複製用以構造較大】/〇區塊。在較大 構建區塊中,1¾等記憶體單元可組合以形成記憶體單元之 :鄰接較大有效率構造及定位之陣列。因此具有記憶體單 兀之覆蓋# 1/0單疋之構造允許有效率地構造較大卯群 組〇 此外,程式化-可程式化邏輯區塊陣列所需要的記憶體 單元之陣列’以及用以程式化該I/Q單元群組的記憶體單 元之陣列可進一步組合以形成有效率地構造並定位之記憶 體單元之-鄰接陣列。在—項具體實施例中,該等可程式 化π件之全部可定位在實質上矩形佈局幾何結構中,而且 該鄰接記憶體單元陣列可具有一相同幾何結構。記憶體單 元之總數可與獨立程式化的元件之總數匹配,因此該構造 係有效率的。 依據本發明,一PLD可包括一可程式化智慧財產(ιρ)區 塊,其具有帶定位於一區域内的複數個可組態元件之一第 IP區域以及一第二Ι/p區域;以及組態記憶體單元之一第 三陣列,其具有組態記憶體單元並且係耦合至該第一 1?區 域中的該等可組態元件之一或多者,該第三陣列中的複數 個記憶體單元係耦合至IP區塊中的該複數個可組態元件以 程式化該IP區塊至一使用者說明書,其中該第三陣列以及 134972.doc •25- 200931806 該第一 ip區域符合該預定佈局幾何結構而且該第三陣列係 實質上定位於該第一 IP區域上方或下方。 以上態樣之實施方案可包括下列實施方案之一或多者。 * 一可程式化邏輯裝置包括複數個IP區塊,每一 IP區塊允許 • 一使用者實施一特定功能。複數個輸入及輸出耦合該”區 塊至該互連織物。該IP區塊可沿周長配置,或配置在儲存 庫中,或均勻地分配在該PLD内。該IP區塊可以係可程式 化的’該區塊提供複數個改變功能之一以由一使用者選擇 β 為一期望特徵。該ip區塊可提供多個電力/效能折衷。該ΙΡ 區塊可以係具有資料寬度及深度可變性的一記憶體區塊。 該IP區塊可以係具有變化的DSP能力的一乘法累加單元。 該IP區塊可以係具有變化指令集能力的一 CPU區塊。該IP 區塊可以係提供可程式化性的PLL或DLL區塊。因此—使 用者可組態一 IP區塊至提供的特徵之一,其包括但不限於 以上列舉的IP。 ❹ 一 ΪΡ區塊包括佈局幾何結構。在該佈局幾何結構内,有 效率地配置IP電路電晶體以減少該佈局所需要的石夕之覆蓋 區。該等IP電路電晶體佔用一固定IP電路幾何結構以及一 或多個可程式化IP電路幾何結構。在一記憶體丨卩區塊中, 該固定IP幾何結構可包含(單埠、雙槔等)記憶體單元,而 該可程式化IP區域可包含該等可程式化元件以組態資料寬 度及深度,構建FIFO,以及耦合該„>區塊至互連織物。該 可程式化電路區域可以係鄰近於可程式化邏輯幾何結構, 因此可形成一較大可程式化幾何結構。該等Ip電晶體係採 134972.doc • 26 - 200931806 用固定互連以及可程式化互連而彼此耦合。一1?區塊中的 可程式化元件可以僅定位在該可程式化電路區域中,其令 該等可程式化元件經隨機配置用以改良佈局效率。可採用 該佈局幾何結構規則地配置一些可程式化元件。一些可程 式化凡件可以較近地隔開’而其他可程式化元件可彼此隔 開得較遠。一IP區塊可重複複數次以形成一Ip區塊群組。 該等ip電路區域可聚集以形成電路元件之鄰接區域,該等 電路元件包括可形成一實質上隨機定位之Ip可程式化元件 佈局幾何結構之一重複結構的可程式化元件。可能需要一 "己憶體單元以程式化該可程式化元件。一記憶體單元可耦 合至一可程式化元件以程式化該可程式化元件。一記憶體 單元可耦合至複數個可程式化元件以程式化該等元件。複 數個记憶體單元可程式化一 IP區塊。複數個記憶體單元係 在構造為一記憶體單元陣列時更有效率地構造。一Ip區塊 可具有一第一佈局幾何結構,其包含具有隨機分配的複數 個可組態元件之一IP電路。該裝置可具有一第二佈局幾何 結構,其包含組態記憶體單元之一鄰接陣列,該陣列係藉 由複製一記憶體單元而構造,為了改良該佈局之效率,該 第一佈局區域/幾何結構可實質上係與該第二佈局區域/幾 何結構相同,而且該第二佈局幾何結構可實質上定位於該 第一佈局幾何結構上方。因此記憶體單 之陣列經設利《程式化-有效率搆造之IP區塊。 I 3不可程式化及可程式化電路二者的該^區塊可經複製 用以構造較大IP區塊。在較大構建區塊中,該等組態記憶 134972.doc -27- 200931806 體单元可組合以形成記憶體單元之一鄰接較大有效率構造 及定位之陣列。該等組態記憶體單元係定位在該等Ip區塊 之該可程式化電路區域上方,從而佔用同一幾何結構β因 " 此具有記憶體單元之覆蓋的一 ip區塊之構造允許有效率地 •構造較大IP區塊。 在另一態樣令,一三維可程式化邏輯裝置(PLD)包含: 複數個I/O單元,每一 I/O單元包含:一固定電路區域;以 及一可程式化電路區域,其具有用以組態該1/0單元的複 ® 數個可程式化元件;以及一或多個智慧財產(IP)核心,每 一 IP核心包含:一固定電路區域;以及一可程式化電路區 域,其具有用以組態該IP核心的複數個可程式化元件;以 及一可程式化邏輯區塊陣列區域,其包含:經複製用以形 成該陣列的複數個實質上相同的可程式化邏輯區塊,每一 該邏輯區塊進一步包含複數個可程式化元件;以及一可程 式化區域’其包含該可程式化邏輯區塊陣列區域之定位可 • 程式化元件,IP核心可程式化電路區域之一或多者以及 . 1/0單元可程式化電路區域之一或多者·,以及一組態記憶 體陣列,其包含耦合至該可程式化區域中的該等可程式化 _ 元件之一或多者的組態記憶體單元,該記憶體陣列程式化 該可程式化區域,其中:該記憶體陣列係實質上定位在該 可程式化區域上方或下方;而且該記憶體陣列以及該等可 程式化區域佈局幾何結構係實質上相同的。 在另一態樣中’一三維可程式化邏輯裝置(PLD)包含複 數個分配之可程式化元件’其係定位在一基板區域中;以 134972.doc •28- 200931806 及組態記憶體單元之一鄰接陣列,複數個該等記憶體單元 係耦合至該複數個可程式化元件以組態該等可程式化元 件’其中:該記憶體陣列係實質上定位在該基板區域上方 或下方;而且該記憶體陣列以及該基板區域佈局幾何結構 係實質上類似的。該PLD進一步包含:金屬單元之一鄰接 陣列,每一金屬單元具有組態記憶體單元尺寸而且一金屬 短柱係耦合至該組態記憶體單元以及該等可程式化元件之 一或多者。此外,該金屬單元陣列係定位在該記憶體單元 陣列下方而且在該等可程式化元件上方。此外,二或多個 金屬單元進一步包括鄰近於從該單元之一端延伸至該單元 之相對端的該金屬短柱之一金屬線,其中二或多個鄰近金 屬單元形成一連續金屬線。 在另一態樣中,一垂直組態之可程式化邏輯裝置(PLD) 包括:一單位單元,其中該單位單元幾何結構包括一第一 方向上的一第一尺寸以及正交於該第一方向之一第二方向 上的一第二尺寸;以及組態記憶體單元之一陣列,該陣列 係藉由將一記憶體單元放置在該單位單元幾何結構内並複 製該單位單元以形成該記憶體陣列來構造;以及複數個可 程式化元件,其係定位於實質上類似於該組態記憶體單元 陣列之幾何結構的一幾何結構中;以及第一金屬單元之一 陣列,該陣列係藉由複製一陣列中的該等單位單元尺寸之 一第一金屬陣列而構造,該第一金屬單元進一步包含:一 第—區域,其係由一或多個並聯金屬匯流排線組成,該匯 流排線在該第一或第二方向上的相對單元邊界之間延伸以 134972.doc •29· 200931806 形成一全通匯流排線路;以及一第二區域,其係由耦合至 定位於該第一金屬短柱上方的該組態記憶體單元之一金屬 短柱以及定位於該第一金屬短柱下方的該等可程式化元件 之一或多者組成。此外,該3D PLD進一步包括:第二金 屬單tl之一陣列’該陣列係藉由複製一陣列中的該等單位 單儿尺寸之一第二金屬單元來構造,該第二金屬單元進— 步包含:一第一區域,其係由二或多個並聯金屬線組成, 該金屬線在該第一或第二方向上的相對單元邊界之間延伸 以形成全域選路線路;以及一第二區域,其係由金屬短柱 及金屬線組成以促進組態記憶體單元及信號之垂直選路。 以上具體實施例之優點可以係下列優點之一或多者。該 等具體實施例基於在3D FPGA之構造期間耦合至垂直定位 的組態元件之目的而提供可程式化元件及金屬互連之群 組。該創新亦係關於在該等佈局幾何結構内創建單位單元 以促進該3D構造。可配置該等可程式化區塊,因此該陣列 中的該等可程式化元件之全部組合以形成可程式化元件之 一較大區域。該等IP區塊係配置成鄰近於邏輯區塊,因此 該等可程式化元件組合成另—較大可程式化區《。配置該 等I/O單元,因此該等1/〇單元中的該等可程式化單元進一 步添加至共同可程式化區域中,從而提供可程式化元件之 一更大覆蓋區。此等聚結可程式化區域可經構建用以具有 單位單元之一陣列的準確(或接近準確)尺寸。該陣列可包 括單位單元之Μ個列及N個行,其中M&N係大於一的整 數。較佳地Μ及N係大於100的整數,而且更佳地m&n係 134972.doc -30- 200931806 ❹ ❷ 大於麵的整數。可程式化元件之聚結區域現在係耦合至 垂直定位的組態記憶體單元之一較大陣列。藉由一中間金 屬層中的金屬短柱進-步促進該輕合。金屬選路、電力及 接地係分配在相同金屬層中。因此―單位金屬單元之概令 對構造此等三維互連係重要的。每—記憶料元輸出耗: 至-金屬短柱。每-金屬短柱麵合至—或多個可程式化元 件。垂直互連(意指ζ方向)不能中斷水平互連(意指X及γ方 向)。金屬匯流排係定位在用於全域互連及匯流排的該等 金屬短柱之間。在該等第一及第二金屬層中,金屬線在X 或Υ方向(正交於該X方向)上運行。可存在如所陳述的複數 個第一金屬層及第二金屬層。全域及區域互連線路亦係定 位於金屬單元中。該金屬單元之一第一區域包括用於互連 的全球金屬線路,而且該金屬單元之一第二區域包括用於 該垂直組態的區域互連。當使用一單一單元陣列以組態一 聚結可程式化元件區域,而非使用不相交及無效率製作的 隨機記憶體單元或較小單元時’更有效率地構造該記憶體 一 早70。 因此當前教示提供構建3D可程式化裝置的新方法。此等 裝置包括在一基板層或平面中構造的可程式化元件《配置 並聚集多個電路區塊内的可程式化元件,因此該等可程式 化元件在該基板層上形成較大叢集。由垂直定位於該等可 程式化元件上方的一組態記憶體單元來組態每一叢集。該 陣列中的一記憶體單元係耦合至一或多個可程式化元件。 因此由複數個組態記憶體單元陣列程式化複數個可程式化 134972.doc 31 · 200931806 元件叢集。此一裝置從使用者觀點看提供垂直組態該 FPGA至使用者的說明書之能力。一旦該使用者滿意該效 能及功能性,則該使用者能夠容易地將該組態記憶體單元 • 從一昂貴3D RAM元件改變為一便宜ROM元件以採用一 • ASIC形式凍結該設計。此一變化不需要設計活動,從而節 省設計者的可觀NRE成本及時間。其進一步節省系統板中 的昂貴增壓ROM。自一原始較小較便宜且較快pld或 FPGA的一 ASIC之容易轉输定製將極大地增強上市時間、 © 效能及產品可靠度。 【實施方式】 在本發明之以下詳細說明中,參考形成其一部分的附 圖’且其中藉由解說顯示其中可實施本發明的特定具體實 施例。此等具體實施例經足夠說明用以致能熟習此項技術 者實施本發明。可利用其他具體實施例,而且可進行結 構、邏輯以及電性變化而不脫離本發明之範_。 定義:下列說明中使用的術語"晶圓"及"基板"包括具有 一曝露表面的任何結構,採用其形成本發明之積體電路 (1C)結構。術語基板係瞭解為包括半導體晶圓。術語基板 亦係用以指在處理期間的半導體結構,並可包括已製造於 其上的其他層。晶圓及基板二者包括掺雜及未摻雜半導 體、由一基底半導體或絕緣體支撐的磊晶半導體層、S0I 材料以及熟習此項技術者熟知的其他半導體結構。術語 導體係瞭解為包括半導體,而且術語"絕緣體"係定義為 包括不及稱為導體之材料具導電性的任何材料。因此每一 134972.doc -32- 200931806 個1C包括一基板。 ❹And a second area of one of the programmable circuits. The second region can be adjacent to the programmable logic geometry, thus forming a larger programmable geometry. The !/〇 晶 system uses a fixed interconnect and a programmable interconnect to mate with each other... and the programmable elements in the cell can be positioned only in the I/O circuit geometry, better positioned in the The second region t is randomly configured to improve layout efficiency. Some programmable elements can be configured regularly using this layout geometry. Some of the programmable elements can be spaced closer together, while other programmable elements can be spaced further apart from one another. A ι/〇 unit can be repeated a plurality of times to form a 1/0 unit group. The 1/〇 circuit geometries can be aggregated to form contiguous regions of circuit elements, including circuitizable elements that form a substantially random-positioned 1/0 circuit layout geometry. A memory unit may be required to program the programmable element. A memory unit can be coupled to a programmable element to program the programmable element. A memory unit can be coupled to a plurality of programmable elements to program the elements. A plurality of memory cells can program an I/O circuit. A plurality of memory cells are constructed more efficiently when constructed as a memory cell array. An I/O unit can have a first-layout geometry that includes one of a plurality of configurable components with random assignments. The apparatus can have a second layout geometry comprising an adjacent array of one of the state memory cells constructed by duplicating a memory cell. In order to improve the efficiency of the layout, the first layout may be substantially the same as the layout structure of the first and second layouts, and the second layout geometry is The scorpion can be substantially above the top layout geometry. Therefore, the memory element is designed to efficiently process the 1/0 unit of the efficient construction. In addition, the 1/0 unit including one of the transfer and ι/〇 circuits can be copied to construct a larger 〇 block. In larger building blocks, memory cells such as 13⁄4 can be combined to form a memory cell: an array of adjacent highly efficient structures and locations. Therefore, the overlay of the memory unit #1/0 unit allows the efficient construction of larger groups. In addition, the array of memory units required for the stylized-programmable logic block array is used. The array of memory cells that are programmed to group the I/Q cells can be further combined to form an adjacent array of memory cells that are efficiently constructed and positioned. In a particular embodiment, all of the programmable π members can be positioned in a substantially rectangular layout geometry, and the contiguous memory cell array can have an identical geometry. The total number of memory cells can be matched to the total number of independently stylized components, so the architecture is efficient. In accordance with the present invention, a PLD can include a programmable intellectual property (ιρ) block having an IP region and a second Ι/p region with a plurality of configurable components positioned within an area; A third array of one of the configuration memory cells having a configuration memory unit and coupled to one or more of the configurable elements in the first area, the plurality of the third array The memory unit is coupled to the plurality of configurable elements in the IP block to program the IP block to a user specification, wherein the third array and the first ip area are 134972.doc • 25- 200931806 The predetermined layout geometry and the third array is positioned substantially above or below the first IP region. Embodiments of the above aspects may include one or more of the following embodiments. * A programmable logic device includes a plurality of IP blocks, each of which allows a user to implement a particular function. A plurality of inputs and outputs couple the "block" to the interconnect fabric. The IP block can be configured along a perimeter, or disposed in a repository, or evenly distributed within the PLD. The IP block can be programmable The block provides one of a plurality of changing functions to select β as a desired feature by a user. The ip block can provide multiple power/performance tradeoffs. The block can have data width and depth. Denatured memory block. The IP block can be a multiply-accumulate unit with varying DSP capabilities. The IP block can be a CPU block with varying instruction set capabilities. The IP block can provide A stylized PLL or DLL block. Therefore - the user can configure an IP block to one of the provided features, including but not limited to the IPs listed above. ❹ A block includes the layout geometry. Within the layout geometry, the IP circuit transistors are efficiently configured to reduce the coverage area required for the layout. The IP circuit transistors occupy a fixed IP circuit geometry and one or more programmable IP circuit geometries Knot In a memory block, the fixed IP geometry can include (單埠, double, etc.) memory cells, and the programmable IP region can include the programmable components to configure the data width. And depth, build the FIFO, and couple the „> block to the interconnect fabric. The programmable circuit area can be adjacent to the programmable logic geometry so that a larger programmable geometry can be formed. These Ip crystal system systems are coupled to each other using fixed interconnects and programmable interconnects. The programmable elements in a block can be located only in the programmable circuit area, which allows the programmable elements to be randomly configured to improve layout efficiency. Some programmable elements can be regularly configured using the layout geometry. Some programmable components can be spaced closer together while other programmable components can be spaced further apart from one another. An IP block can be repeated a plurality of times to form an Ip block group. The ip circuit regions can be gathered to form contiguous regions of circuit elements including programmable elements that form a repeating structure of a substantially randomly positioned Ip programmable element layout geometry. A "remembering unit may be needed to program the stylized component. A memory unit can be coupled to a programmable element to program the programmable element. A memory unit can be coupled to a plurality of programmable elements to program the elements. A plurality of memory cells can be programmed into an IP block. A plurality of memory cells are constructed more efficiently when constructed as a memory cell array. An Ip block can have a first layout geometry that includes an IP circuit having a plurality of configurable elements that are randomly assigned. The apparatus can have a second layout geometry comprising an contiguous array of one of the configuration memory cells, the array being constructed by duplicating a memory cell, the first layout area/geometry to improve the efficiency of the layout The structure can be substantially identical to the second layout area/geometry, and the second layout geometry can be positioned substantially above the first layout geometry. Therefore, the array of memory sheets is set by the "programmed-efficiently constructed IP block." The block of both I3 unprogrammable and programmable circuits can be copied to construct a larger IP block. In larger building blocks, the configuration memory 134972.doc -27- 200931806 body units can be combined to form an array of one of the memory cells adjacent to the more efficient construction and positioning. The configuration memory cells are positioned above the programmable circuit region of the Ip blocks, thereby occupying the same geometry β because of the configuration of an ip block with memory cell coverage allowing for efficiency • Construct a large IP block. In another aspect, a three-dimensional programmable logic device (PLD) includes: a plurality of I/O cells, each I/O cell comprising: a fixed circuit region; and a programmable circuit region having To configure a plurality of programmable elements of the 1/0 unit; and one or more intellectual property (IP) cores, each IP core comprising: a fixed circuit area; and a programmable circuit area, Having a plurality of programmable elements for configuring the IP core; and a programmable logic block array region comprising: a plurality of substantially identical programmable logic blocks replicated to form the array Each of the logic blocks further includes a plurality of programmable elements; and a programmable area 'which includes a positionable programmable element of the programmable logic block array area, and an IP core programmable circuit area One or more and one or more of the 1/0 unit programmable circuit regions, and a configuration memory array including one of the programmable _ components coupled into the programmable region or a memory unit that stylizes the programmable area, wherein: the memory array is substantially positioned above or below the programmable area; and the memory array and the programmable The geometry of the regional layout is essentially the same. In another aspect, a three-dimensional programmable logic device (PLD) includes a plurality of distributed programmable elements that are positioned in a substrate region; 134972.doc • 28- 200931806 and a configuration memory unit One of the adjacent arrays, the plurality of memory cells being coupled to the plurality of programmable elements to configure the programmable elements' wherein: the memory array is substantially positioned above or below the substrate region; Moreover, the memory array and the substrate area layout geometry are substantially similar. The PLD further includes: one of the metal cells abutting the array, each metal cell having a configuration memory cell size and a metal stub coupled to the configuration memory cell and one or more of the programmable elements. Additionally, the array of metal cells is positioned below the array of memory cells and over the programmable elements. Additionally, the two or more metal cells further include a metal line adjacent the metal stub extending from one end of the cell to the opposite end of the cell, wherein two or more adjacent metal cells form a continuous metal line. In another aspect, a vertically configured programmable logic device (PLD) includes: a unit cell, wherein the unit cell geometry includes a first dimension in a first direction and orthogonal to the first a second dimension in one of the directions in the second direction; and an array of one of the memory cells configured to form the memory by placing a memory cell within the unit cell geometry and copying the unit cell a body array; and a plurality of programmable elements positioned in a geometry substantially similar to the geometry of the array of configured memory cells; and an array of the first metal cells, the array Constructed by replicating a first metal array of one of the unit cell sizes in an array, the first metal unit further comprising: a first region consisting of one or more parallel metal bus bars, the bus bar a line extending between opposing cell boundaries in the first or second direction to form an all-pass busbar line 134972.doc •29·200931806; and a second region, the system It is coupled to the first is positioned above the metal studs of the configuration memory cell and one of the metal studs positioned below the first of these metal studs programmable element one or more components. In addition, the 3D PLD further includes: an array of the second metal single t1. The array is constructed by replicating one of the unit single size of the second metal unit in an array, the second metal unit is further advanced The method includes: a first region, which is composed of two or more parallel metal wires, the metal wires extending between opposite cell boundaries in the first or second direction to form a global routing circuit; and a second region It consists of metal short columns and metal wires to facilitate the vertical routing of the configuration memory cells and signals. The advantages of the above specific embodiments may be one or more of the following advantages. These embodiments provide a group of programmable elements and metal interconnects based on the purpose of coupling to vertically positioned configuration elements during construction of the 3D FPGA. This innovation is also about creating unit cells within these layout geometries to facilitate this 3D construction. The programmable blocks can be configured such that all of the programmable elements in the array are combined to form a larger area of the programmable elements. The IP blocks are arranged adjacent to the logical blocks, so the programmable elements are combined into another larger programmable area. The I/O units are configured such that the programmable units in the 1/〇 units are further added to the common stylable area to provide a larger footprint of the programmable elements. These coalesced programmable regions can be constructed to have an accurate (or nearly accurate) size of an array of unit cells. The array can include a plurality of columns of unit cells and N rows, where M&N is an integer greater than one. Preferably, the N and N are integers greater than 100, and more preferably the m&n system 134972.doc -30- 200931806 ❹ ❷ an integer greater than the face. The coalescing region of the programmable component is now coupled to a larger array of vertically positioned configuration memory cells. This light combination is facilitated by a metal stud in an intermediate metal layer. Metal routing, power and grounding are distributed in the same metal layer. Therefore, the principle of “unit metal units” is important for constructing such three-dimensional interconnection systems. Per-memory element output consumption: to - metal short column. Each metal short cylinder is joined to - or a plurality of programmable elements. Vertical interconnections (meaning ζ directions) do not interrupt horizontal interconnections (meaning X and γ directions). Metal busbars are positioned between the metal stubs for the global interconnect and busbars. In the first and second metal layers, the metal lines run in the X or Υ direction (orthogonal to the X direction). There may be a plurality of first metal layers and second metal layers as set forth. The global and regional interconnections are also located in the metal unit. A first region of the metal unit includes a global metal line for interconnection, and a second region of the metal unit includes a region interconnect for the vertical configuration. When a single cell array is used to configure a coalesced programmable element region, rather than using disjoint and inefficiently produced random memory cells or smaller cells, the memory is constructed more efficiently. The current teachings therefore provide a new way to build 3D programmable devices. Such devices include a programmable element constructed in a substrate layer or plane that "configures and aggregates programmable elements within a plurality of circuit blocks such that the programmable elements form a larger cluster on the substrate layer. Each cluster is configured by a configuration memory unit positioned vertically above the programmable elements. A memory cell in the array is coupled to one or more programmable elements. Therefore, a plurality of programmable 134972.doc 31 · 200931806 component clusters are programmed by a plurality of configuration memory cell arrays. This device provides the ability to vertically configure the FPGA to the user's instructions from a user perspective. Once the user is satisfied with the performance and functionality, the user can easily change the configuration memory unit from an expensive 3D RAM element to a cheap ROM element to freeze the design in an ASIC form. This change does not require design activities, saving the designer's considerable NRE cost and time. It further saves expensive boost ROM in the system board. Easy-to-transfer customization from an original smaller, cheaper and faster pd or FPGA ASIC will greatly enhance time to market, © performance and product reliability. [Embodiment] In the following detailed description of the invention, reference to the drawings These specific embodiments are described to enable those skilled in the art to practice the invention. Other embodiments may be utilized, and structural, logical, and electrical changes may be made without departing from the scope of the invention. Definition: The terms "wafer" and "substrate" used in the following description include any structure having an exposed surface, which is used to form the integrated circuit (1C) structure of the present invention. The term substrate is understood to include semiconductor wafers. The term substrate is also used to refer to a semiconductor structure during processing and may include other layers that have been fabricated thereon. Both the wafer and the substrate include doped and undoped semiconductors, epitaxial semiconductor layers supported by a base semiconductor or insulator, SOI materials, and other semiconductor structures well known to those skilled in the art. The term system is understood to include semiconductors, and the term "insulator" is defined to include any material that is less conductive than a material known as a conductor. Therefore each 134972.doc -32- 200931806 1C includes a substrate. ❹

術浯模組層”包括使用一系列預定程序步驟所製造的一 結構。该結構之邊界係由—第―程序步驟、—或多個中間 程序步驟以及一最終程序步驟來定義。所得結構係形成於 一基板上。一半導體裝置之一斷面可用以識別模組層邊 界。應瞭解諸如光阻圖案化以及清理之—些處理步驟並不 留下結㈣印給—模組層。應進-步瞭解諸如沈積及#刻 之一些處理步驟並不留下結構壓印於一模組層中。因此一 模組層包括可以或可以不形成-結構μ印之處理步驟。 術語"傳遞閘極"及"開關"指在開啟時可傳遞一信號並且 在關閉時阻隔信號傳遞的—結構。—傳遞閘極在開啟時連 接二個點’而且在關閉時斷開二個點。一傳遞閘極在開啟 時耦合二個點 而且在關閉時解耦二個點》一傳遞閘極可 以係一浮動閘極電晶體'一NMOS電晶體、一pM〇s電晶 體或-CMOS電晶體對。電晶體之閉極電極決定該連接的 狀iL' CMOS傳遞閘極需要耦合至NM〇s& pM〇s閘極電 極的互補信號。一控制邏輯信號係連接至用於可程式化邏 輯的-電晶體之閘極電極。—傳遞間極可以係傳導率調變 7L件。可藉由一組態構件使傳導率在一足夠導電狀態與一 足夠非導電狀態之間變化。可組態元件可包含一化學、磁 性、電性、光學及鐵電或任何其他特性,其允許該元件在 該二個狀態之間改變其傳導率。 術語”緩衝器,,包括接收一弱傳入信號並發射一強輸出信 號之一結構。緩衝器提供高驅動電流以維持信號完整性。 134972.doc -33- 200931806 緩衝器包括轉發器,其更新長線路中的信號完整性。緩衝 器進一步包括-單-反相器,以及—系列連接反相器,其 中該系列中的每一反相器的大小係較大以提供一較高驅動 * 電流。 ’ 術語”橋接器"包括管理線路之—集或叢集内的選路之一 結構。到達-線路上的橋接器之信號可加以發射至該橋接 器中的—或多個其他線路。一橋接器包括線路叢集上的簡 I發射、緩衝式發射、單向或多向選路。-橋接器包括開 © 關區塊、MUX及線路。 術語"組態電路"包括一或多個可組態元件以及連接,其 可經程式化用以依據預定使用者期望功能性來控制一或多 個電路區塊。組態電路包括該記憶體元件以及用以修改該 記憶體元件之存取電路(因此稱為記憶體電路)。該組態電 路中的一記憶體元件係耦合至一可程式化電路區塊以組態 該電路區塊。因此一組態電路係不同於記憶體裝置中的傳 ❹統電路。組態電路並不包括由該記憶體元件所控制的該邏 _ 輯傳遞閘極。在—項具體實施例中,該組態電路包括複數 個記憶體元件以儲存指令來組態一 FpGA ^在另一項具體 實施例中,該組態電路包括一第一可選擇組態,其中複數 個記憶體元件經形成用以儲存指令以控制一或多個電路區 塊。該組態電路包括一第二可選擇組態,其中形成一預定 導電圖案代替該記憶體電路以控制實質上相同的電路區 塊。忒s己憶體電路包括諸如二極體、電晶體、電阻器、電 容器、金屬鏈結等之元件。該記憶體電路亦包括薄膜元 134972.doc -34- 200931806 ,τ π穴肢只娜捫甲,該組態電路包括—預定導電 圖案,其包含通道、電阻器、電容器或其他適當ROM電路 之-或多項代替RAM電路以控制電路區塊。組態電路不應 該與記憶體裝置中的記憶體電路混淆。 術語”時間多工”包括區分時域中的一數值之能力。該數 值可以係一IC中的一電壓、一信號或任何電特性。複數個 時間間隔形成一有效時間週期。在該時間週期内,一數值The "defective module layer" includes a structure fabricated using a series of predetermined program steps. The boundary of the structure is defined by a - program step, - or a plurality of intermediate program steps, and a final program step. The resulting structure is formed. On a substrate, a section of a semiconductor device can be used to identify the boundary of the module layer. It should be understood that some processing steps such as photoresist patterning and cleaning do not leave a junction (4) printed on the module layer. Steps to understand some of the processing steps such as deposition and engraving do not leave the structure imprinted in a module layer. Thus a module layer includes processing steps that may or may not form a structure. The term "pass gate "&"Switch" means a structure that transmits a signal when it is turned on and blocks the signal transmission when it is turned off. - The transfer gate connects two points when it is turned on and turns off two points when it is turned off. The transfer gate couples two points when turned on and decouples two points when turned off. A pass gate can be a floating gate transistor 'an NMOS transistor, a pM 〇s transistor or a CMOS transistor pair . The closed electrode of the crystal determines the connected iL' CMOS pass gate needs to be coupled to the complementary signal of the NM〇s & pM〇s gate electrode. A control logic signal is connected to the transistor for the programmable logic The gate electrode - the transfer interpole can be modulated by a conductivity of 7 L. The conductivity can be varied between a sufficiently conductive state and a sufficiently non-conducting state by a configuration member. The configurable component can comprise a Chemical, magnetic, electrical, optical, and ferroelectric or any other characteristic that allows the element to change its conductivity between the two states. The term "buffer," includes receiving a weak incoming signal and emitting a strong output. One of the structures of the signal. The buffer provides high drive current to maintain signal integrity. 134972.doc -33- 200931806 The buffer includes a repeater that updates the signal integrity in long lines. The buffer further includes a -single-inverter, and a series of connected inverters, wherein each of the inverters in the series is relatively large in size to provide a higher drive current. The 'terminology' bridge includes a structure that manages one of the lines or a set of routes within the cluster. The signals arriving at the bridge on the line can be transmitted to the bridge or multiple other lines. The device includes a simple I transmission, a buffered transmission, a one-way or a multi-directional routing on the line cluster. The bridge includes an open block, a MUX, and a line. The term "configuration circuit" includes one or more Configuring components and connections that can be programmed to control one or more circuit blocks in accordance with a predetermined user desired functionality. The configuration circuit includes the memory component and an access circuit for modifying the memory component (hence the memory circuit). A memory component in the configuration circuit is coupled to a programmable circuit block to configure the circuit block. Therefore, a configuration circuit is different from the memory device. The configuration circuit does not include the logic transfer gate controlled by the memory component. In the specific embodiment, the configuration circuit includes a plurality of memory components to store instructions. state An FpGA ^ In another embodiment, the configuration circuit includes a first selectable configuration in which a plurality of memory elements are formed to store instructions to control one or more circuit blocks. The circuit includes a second alternative configuration in which a predetermined conductive pattern is formed in place of the memory circuit to control substantially identical circuit blocks. The circuit includes a diode such as a diode, a transistor, a resistor, a capacitor a metal link, etc. The memory circuit also includes a thin film element 134972.doc -34-200931806, a τ π acupoint, a configuration circuit including a predetermined conductive pattern including a channel, a resistor, The capacitor circuit or other suitable ROM circuit replaces the RAM circuit to control the circuit block. The configuration circuit should not be confused with the memory circuit in the memory device. The term "time multiplexing" includes distinguishing a value in the time domain. Capability. This value can be a voltage, a signal, or any electrical characteristic in an IC. A plurality of time intervals form an effective time period. During the time period, a value

包括複數個有效狀態:每一狀態歸因於該週期内的每一時 間間隔。S此時間多提供一構件以識別—日夺間週期内的 複數個有效值。 術語"幾何結構"係在此申請案中定義為一特定結構或一 電路之形狀。幾何結構包括一區域以及一邊界。因此電路 幾何結構指該電路之電路元件的形狀或佈局覆蓋區。在一 笛卡爾(Cartesian)座標系統中,電路幾何結構可採取三角 形、正方形、矩形、Τ、L或任何其他形狀。—矩形幾何結 構的特徵為一第一方向上的一第一尺寸以及正交於該第一 方向之-第二方向上的—第二尺寸。電路幾何結構包括一 基板層、該區域及該邊界上的該電路佈局覆蓋區之尺寸。 如在此申請案中使用的術語"水平"係定義為平行於一晶 圓或基板之傳統平面或表面而不管該晶圓或基板之方位的 平面。術語"垂直”指垂直於如以上定義之水平方向的一 方向。諸如,,上"、”側"、”較高"、"較低"、"之上"以及,,下 面之介系岡係相對於在該晶圓或基板之頂部表面上的傳 統平面或表面而不管該晶圓或基板之方位來定義。因此, 134972.doc -35· 200931806 下列詳細說明不視為具限制意義。 ^用如圖3(:中所示的可程式化傳遞閘極邏輯進行一三 皙’· ’點連接’然而’產生控制信號So的記憶體元件係實 ❹ ❹ 定位於該傳遞閘極邏輯元件上方或下方而非鄰近於該 :遞閘極。可由複數個垂直麵合記憶體元件組態複數個傳 Ί極。可採用薄膜電晶體(TFT)科技或任何其他適當科 技達到垂直組態。不管該記憶體元件之垂直位置,需要透 過水平互連導航的—新垂直互連方案㈣合該複數個垂直 記憶體元件至該複數個可程式化元件,例如傳遞開極 33〇。多個輸入(節點A)可採用該複數個傳遞閘極邏輯元件 耦合至多個輸出(節點B)。在圖4B中的開關之一 3D構造 中,包括該記憶體元件的整個組態電路可定位於該傳遞閘 極上方。在另一項具體實施例中,僅SRAM鎖存器可定位 於傳遞閘極410上方’而解碼電晶體(例如圖4a中的4〇1、 402)可與圖4β中的電晶體410並列定位。因為傳遞閘極41〇 之閘極電極藉由設計沒有電流洩漏路徑(即其係一高阻抗 節點)’所以需要極小的電流位準以驅動該閘極電極至一 開啟或關閉狀態。該組態電路(圖4Β中的450)需要產生二 個輸出(邏輯零及邏輯一)以程式化該連接中的NM〇s(或 PMOS)傳遞閘極^ 3D組態電路450包含一記憶體元件。大 部分CMOS SRAM記憶體遞送邏輯零或邏輯一輸出。此3D 記憶體元件可由該使用者組態以選擇S〇之極性,因而選擇 該連接之狀態。該記憶體元件可以係揮發性或非揮發性 的。在揮發性記憶體中,其可採用一或多個DRAM、 134972.doc • 36· 200931806 SRAM、光學或可輸出一有效信號s〇之任何類型的記憶體 元件來構造。在非揮發性記憶體中,其可以係熔絲、^熔 絲、EPROM、EEPR0M、快閃記憶體、鐵電、磁性或可輸 出一有效信號S〇之任何其他種類的記憶體裝置。信號%可 以係一記憶體元件之一直接輸出,或得自該組態電路的一 輸出。一反相器可用以恢復S〇信號位準至完全軌對轨電壓 位準。組態電路450中的SRAM可在一提高Vcc位準下操作 以輸出一提高S〇電壓位準。此當在一分離TFT模組中構建 SRAM時係尤其可行的。可由熟習此項技術者容易地得到 用以產生有效S〇信號的其他組態電路。 TFT電晶體、切換裝置以及鎖存器SRAM單元係說明在 藉由參考併入的於2004年11月2日申請之申請案序列號 10/979,024、於2003年4月14日申請之申請案序列號 10/413,809(現在為 U.S. 6,855,988)以及於 2003年 4 月 14 日申 請之申請案序列號10/413,810(現在為U.S. 6,828,689)中。 其顯示用以構造3D電晶體及儲存裝置的構件以及方法。在 一較佳具體實施例中,該組態電路係構建在垂直定位於該 等邏輯電路上方的薄膜半導體層上。該SRAM記憶體元件 (如圖4A中所示的一薄膜電晶體(TFT)CMOS鎖存器)包括形 成於實質上不同於一第一半導體單晶基板層以及用於邏輯 電晶體構造之一閘極多晶矽層的二個半導體薄膜層上之二 個較低效能背對背反相器。此鎖存器係堆疊於用於沒有對 石夕區域及成本的損失之慢記憶體應用的邏輯電路上方。此 鎖存器經調適用以接收除組態信號以外的電力及接地電 134972.doc -37· 200931806 壓。亦在薄膜層上形成用於TFT鎖存器的二個程式化存取 電晶體。因此在圖4B中,450中所示的所有六個組態電晶 體係構造於垂直地在傳遞電晶體41〇上方的tft層中。電晶 體410係在該連接之傳導路徑中而且需要係高效能單晶: 電晶體。此垂直整合在經濟上可以極小成本額外負擔添加 一以SRAM為基礎之組態電路以創建一可程式化解決方 式。此垂直整合可延伸至可垂直地整合於邏輯電路上方的 所有其他記憶體元件。 ❹A plurality of valid states are included: each state is attributed to each time interval within the cycle. S provides a component at this time to identify a plurality of valid values in the day-to-day cycle. The term "geometry" is defined in this application as the shape of a particular structure or circuit. The geometry includes an area and a boundary. Thus circuit geometry refers to the shape or layout footprint of the circuit components of the circuit. In a Cartesian coordinate system, the circuit geometry can take the form of a triangle, a square, a rectangle, a Τ, an L, or any other shape. The rectangular geometric structure is characterized by a first dimension in a first direction and a second dimension in a second direction orthogonal to the first direction. The circuit geometry includes a substrate layer, the area, and the size of the circuit layout footprint on the boundary. The term "horizon" as used in this application is defined as a plane parallel to a conventional plane or surface of a wafer or substrate regardless of the orientation of the wafer or substrate. The term "vertical" refers to a direction that is perpendicular to the horizontal direction as defined above. For example, upper ", side", "higher", "lower", "above" The lower layer is defined relative to the conventional plane or surface on the top surface of the wafer or substrate regardless of the orientation of the wafer or substrate. Therefore, 134972.doc -35· 200931806 The following detailed description does not It is considered to be of a limited meaning. ^ Use the programmable transfer gate logic shown in Figure 3 (for a three-dimensional '· 'point connection'. However, the memory component that generates the control signal So is located. The transfer gate logic element is above or below but not adjacent to: the pass gate. A plurality of pass gates can be configured by a plurality of vertical face memory devices. Thin film transistor (TFT) technology or any other suitable technology can be used. A vertical configuration is achieved. Regardless of the vertical position of the memory component, a new vertical interconnection scheme (four) that needs to be navigated through the horizontal interconnection is combined with the plurality of vertical memory components to the plurality of programmable components, such as 33. A plurality of inputs (node A) may be coupled to the plurality of outputs (node B) using the plurality of pass gate logic elements. In one of the switches 3D configuration of Figure 4B, including the entire configuration of the memory elements The circuit can be positioned above the transfer gate. In another embodiment, only the SRAM latch can be positioned above the transfer gate 410 and the decoder transistor (eg, 4〇1, 402 in Figure 4a) can be It is positioned side by side with the transistor 410 in Fig. 4β. Since the gate electrode of the transfer gate 41 is designed without a current leakage path (i.e., it is a high impedance node), an extremely small current level is required to drive the gate. The electrode is turned on or off. The configuration circuit (450 in Figure 4) needs to generate two outputs (logic zero and logic one) to program the NM〇s (or PMOS) pass gate in the connection ^ 3D The configuration circuit 450 includes a memory component. Most of the CMOS SRAM memory delivers a logic zero or a logic one output. The 3D memory component can be configured by the user to select the polarity of the S, thus selecting the state of the connection. Memory component can Volatile or non-volatile. In volatile memory, it can use one or more DRAMs, 134972.doc • 36· 200931806 SRAM, optical or any type of memory component that can output a valid signal s〇 In non-volatile memory, it can be a fuse, a fuse, an EPROM, an EEPR0M, a flash memory, a ferroelectric, a magnetic or any other kind of memory device that can output an effective signal S〇. The signal % can be output directly from one of the memory elements or from an output of the configuration circuit. An inverter can be used to restore the S〇 signal level to the full rail to rail voltage level. The SRAM in configuration circuit 450 can operate at an increased Vcc level to output an increased S〇 voltage level. This is especially feasible when constructing SRAM in a separate TFT module. Other configuration circuits for generating an effective S〇 signal are readily available to those skilled in the art. The TFT transistor, the switching device, and the latch SRAM unit are described in the application Serial No. 10/979,024 filed on Nov. 2, 2004, filed on Nov. 14, 2003. No. 10/413,809 (now US 6,855,988) and the application Serial No. 10/413,810 (now US 6,828,689) filed on Apr. 14, 2003. It shows the components and methods used to construct the 3D transistor and storage device. In a preferred embodiment, the configuration circuit is constructed on a thin film semiconductor layer that is vertically positioned above the logic circuits. The SRAM memory component (such as a thin film transistor (TFT) CMOS latch as shown in FIG. 4A) includes a gate formed substantially different from a first semiconductor single crystal substrate layer and used for a logic transistor structure Two lower performance back-to-back inverters on the two semiconductor film layers of the very polysilicon layer. This latch is stacked on top of a logic circuit for slow memory applications that do not have a loss of cost and cost. This latch is tuned to receive power and ground power in addition to the configuration signal. 134972.doc -37· 200931806 Pressure. Two stylized access transistors for the TFT latches are also formed on the thin film layer. Thus, in Figure 4B, all six configuration cell systems shown in 450 are constructed in a tft layer vertically above the transfer transistor 41A. The electromorph 410 is in the conduction path of the connection and requires a high performance single crystal: a crystal. This vertical integration is economically possible to add an SRAM-based configuration circuit at an additional cost to create a programmable solution. This vertical integration extends to all other memory components that can be vertically integrated above the logic. ❹

利用薄臈電晶體可組態電路之新3維可程式化邏輯裝置 係揭示在藉由參考併入之申請案序列號1〇/267,483、申請 案序列號10/267,484(現在已放棄)以及申請案序列號 1〇/267,51 1(現在為U.S. 6,747,478)中。該揭示内容說明3£> 可程式化裝置以及可程式化特定應用可轉換裝置。該3D PLD係採用一可程式化記憶體模組來製造,其中該記憶體 模組係定位於該邏輯模組上方。該ASIC係採用一導電圖案 代替該3D PLD中的記憶體模組來製造。記憶體模組以及 導電圖案皆提供邏輯電路之相同控制,從而保存映射至任 一裝置的邏輯功能性。對於記憶體位元圖案之每一集,存 在一獨特導電圖案以達到相同邏輯功能性。該組態電路之 垂直整合導致對PLD的明顯成本減少,而且消除用於該 ASIC的TFT記憶體允許針對使用者的額外成本減少。接著 說明具有此類垂直記憶體整合的晶片。然而,此等教示並 不說明如何在該邏輯模組中配置該等可程式化元件,如何 在該記憶體模組中配置該等記憶體元件,以及如何互連該 134972.doc •38- 200931806 等模組。FPGA之一明顯創新來自互連織物,其將 化及不可程式化元件-起縫合於❹者以使料 ^ 可預測軟體環境中。當前揭示内容說明如何構造此類3D PLD 以及 3D FPGA。A new 3-dimensional programmable logic device utilizing a thin tantalum transistor configurable circuit is disclosed in the application Serial No. 1/267,483, application Serial No. 10/267,484 (now abandoned) and application The serial number is 1〇/267,51 1 (now US 6,747,478). The disclosure illustrates a 3£> programmable device and a programmable application-specific convertible device. The 3D PLD is fabricated using a programmable memory module, wherein the memory module is positioned above the logic module. The ASIC is fabricated using a conductive pattern instead of the memory module in the 3D PLD. Both the memory module and the conductive pattern provide the same control of the logic to preserve the logic functionality mapped to any device. For each set of memory bit patterns, there is a unique conductive pattern to achieve the same logic functionality. The vertical integration of the configuration circuitry results in a significant cost reduction for the PLD, and eliminating the TFT memory for the ASIC allows for additional cost reductions for the user. Next, a wafer having such vertical memory integration will be described. However, such teachings do not teach how to configure the programmable elements in the logic module, how to configure the memory elements in the memory module, and how to interconnect the 134972.doc •38- 200931806 And other modules. One of the obvious innovations in FPGAs comes from interconnected fabrics, which are spliced and non-programmable components – to make them predictable in a soft environment. The current disclosure explains how to construct such 3D PLDs as well as 3D FPGAs.

圖6A顯示依據本發明之一第一具體實施例的—3 FPGA(或PLD)之-第-具體實施例的俯視圖。其包括一半 導體晶片(或積體電路或叫區域6〇1,該區域係藉由透㈣ 習此項技術者已知的方法與技術藉由切割—完全處理之半 導體晶圓來獲得。晶片區域6G1具有—邊界,而且此邊界 具有一晶粒密封區域(未顯示)以改良該晶片之可靠度如 熟習此項技術者所瞭解。該晶片區域具有複數個墊=域, 例如由該晶粒密封邊界完全封閉的墊區域6〇2。此等墊區 域602可沿所示的周長對準。該等墊區域6〇2可沿該周長交 錯,或配置在行、列或該技術中已知的任何其他形式中。 晶片601進一步包括一或多個3維電路區塊,例如區塊 603。在一較佳具體實施例中,電路區塊6〇3包括組態電路 區塊,該等區塊係配置在如圖6A中所示的一陣列中。該陣 列可由Μ個列及N個行組成,其中N係大於或等於一的 整數。一電路區塊603可構造於定位於該FPGA之互連金屬 層上方的TFT層上。電路區塊603可構造於夾在該FPGA之 互連金屬層之間的TFT層上’該互連促進FPGA電路之電路 連接。電路區塊603可包含一或多個金屬層以構造組態電 路。3D組態電路603之一第一區塊係從組態電路之一第二 區塊分離,該分離藉由二個區塊之間的實質空間。此類空 134972.doc •39- 200931806 間可包括寬金屬匯流排線,例如604及605。此等寬金屬線 可進一步包含為晶片供應電力所需要的電力及接地電壓。 該等空間可進一步包含該FPGA所需要的時脈及其他金屬 信號線。該3維區塊並非經構造用以覆蓋圖6A中的墊區域 602以促進至該等墊的外部線路接合或覆晶接合或任何其 他類型之接合。電路區塊603隱藏圖6A之俯視圖中的區塊 下面之特徵。 在圖6B所示之一第二較佳具體實施例中,一墊6〇2可進 一步定位於一組態電路區塊603上方以促進墊602之塊狀接 合。此等墊602可經由熟習此項技術者所瞭解的重新分配 金屬層而進一步耦合至1/0結構。本發明並非在範疇上限 於所示的墊構造之解說性範例,而且熟習此項技術者將認 識到構造墊603之其他方法。 圖6C提供當從該晶片剝離包含電路區塊603的製造層(以 及該電路層上方的任何金屬)時圖6A之俯視圖。電路區塊 603之移除允許下面的區塊之可見度另外藉由該等區塊而 隱藏。在一較佳3D晶片構造中,其進—步展示擔當至底層 電路之互連的其他金屬線,例如606及607。其展示智慧財 產(IP)核心/IP電路區塊(例如61 〇)、可程式化邏輯區塊陣列 (例如608)以及可程式化選路區域(例如609)。在所示的較 佳配置中’一 IP區塊61〇係定位於一第一與第二邏輯區塊 陣列608之間。在圖6C中,IP區塊係顯示為沿邏輯區塊陣 列之水平及垂直邊界定位。在其他配置中,此類IP區塊可 僅沿水平邊界或僅沿垂直邊界定位。在其他配置中,複數 134972.doc • 40· 200931806 個ip區塊可聚集成一較大區塊,其係與一可程式化邏輯陣 列區塊(例如608)混合。在一項具體實施例中,聚集的巧區 塊可具有f質上類似於該可程式化邏輯區塊陣列之區域。 因此在構造一 3D FPGA之邏輯區域中說明的概念不應該在 限制意義上解釋為所示的解說性圖。 圖7A經顯示用以解說配置傳統2〇 FpGA裝置之可程式化 元件中的先刖技術。圖7A係由Xilinx公司商品化的最佳技 術彻ex FPG謂置之俯視圖。該等金屬層及隔離氧化物 層係在圖7A中從頂至底部移除,因此電晶體構造係可見 的。因此在照片上看見閘極多主動Si區域邊界以及接點壓 印。在圖7A中,看出SRAM單元(例如7〇7)係配置在列7〇4 中而且SRAM輸出係麵合至可程式化元件。—些輸出係耗 合在多晶矽(多晶矽)中’如圖7八中所I,而其他輸出係由 已加以移除並且不能看見的金屬耦合。在列7〇4中,二個 SRAM單元70乃及7071)係配置成背對背,而且該對經複製 用以形成記憶體單元之列。列7〇1、7〇3及7〇5中的電晶體 形成緩衝器,每一緩衝器係藉由可程式化電路耦合至信號 輸入及/或輸出。列702及706顯示可程式化多工器(Μυχ)電 路,一MUX之每一閘極多晶石夕區域係輕合至一 sram單元 HitUH由所見的多_或藉由已加以移除並且不能 看見的金屬)。圖7A内的可程式化元件(例如列7〇2及7〇5之 MUX中的閘極多晶錢何結構)係看見為經隨㈣位用以 達到佈局區域效率。類似於列704的8尺八]^單元之其他列係 在此裝置構造中定位於緩衝器列7〇1下方。應該注意從一 134972.doc -41 - 200931806 記憶體位元密度觀點看,一柱狀區域内的8尺八“單元密度 必須與局部化於該記憶體列上方及下方之該區域内的獨立 程式化兀件匹配。在圖7A中,每一 SRAM單元具有—輸出 (未顯示的金屬)而且該輸出係耦合至一或多個可程式化元 件。因此"最新先前技術” 2D FPGA中的可程式化元件係: (1)與SRAM單元混合,(ii)以列形式經配置用以有效率地耦 合邏輯至此趟單元,㈣具有正交於記憶體列之行條紋Figure 6A shows a top plan view of a -3 FPGA (or PLD)-first embodiment in accordance with a first embodiment of the present invention. It comprises a semiconductor wafer (or integrated circuit or region 〇1) obtained by dicing-fully processing the semiconductor wafer by methods and techniques known to those skilled in the art. 6G1 has a boundary, and the boundary has a grain sealing area (not shown) to improve the reliability of the wafer as is known to those skilled in the art. The wafer area has a plurality of pads = domains, such as sealed by the grains. A fully enclosed pad region 6〇2. These pad regions 602 can be aligned along the perimeter shown. The pad regions 6〇2 can be staggered along the perimeter, or configured in rows, columns, or the technique. In any other form known, the chip 601 further includes one or more 3-dimensional circuit blocks, such as block 603. In a preferred embodiment, the circuit block 6〇3 includes configuration circuit blocks, such The block system is arranged in an array as shown in Figure 6 A. The array can be composed of a plurality of columns and N rows, wherein N is an integer greater than or equal to one. A circuit block 603 can be constructed to be positioned on the FPGA. On the TFT layer above the interconnect metal layer. The way block 603 can be constructed on a TFT layer sandwiched between interconnect metal layers of the FPGA. The interconnect facilitates circuit connections of the FPGA circuit. The circuit block 603 can include one or more metal layers to construct the configuration circuit. The first block of one of the 3D configuration circuits 603 is separated from the second block of one of the configuration circuits by the substantial space between the two blocks. Such space 134972.doc •39- 200931806 A wide metal bus bar may be included, such as 604 and 605. The equal metal wires may further include power and ground voltage required to supply power to the wafer. The spaces may further include clocks and other metal signals required by the FPGA. The 3D block is not configured to cover the pad region 602 of Figure 6A to facilitate external wire bonding or flip chip bonding or any other type of bonding to the pads. Circuit block 603 hides the top view of Figure 6A Features in the lower block of the block. In a second preferred embodiment of FIG. 6B, a pad 6〇2 can be further positioned over a configuration circuit block 603 to facilitate block bonding of the pads 602. These pads 602 can be familiar with this The redistribution of the metal layer as understood by the skilled artisan is further coupled to the 1/0 structure. The invention is not limited in scope to the illustrative example of the pad configuration shown, and those skilled in the art will recognize other methods of constructing the pad 603. Figure 6C provides a top view of Figure 6A when the fabrication layer (and any metal over the circuit layer) comprising the circuit block 603 is stripped from the wafer. The removal of the circuit block 603 allows the visibility of the underlying block to be additionally These blocks are hidden. In a preferred 3D wafer configuration, it further demonstrates other metal lines that act as interconnects to the underlying circuitry, such as 606 and 607. It displays the intellectual property (IP) core/IP circuit area. Blocks (eg, 61 〇), programmable logic block arrays (eg, 608), and programmable routing areas (eg, 609). In the preferred configuration shown, an IP block 61 is positioned between a first and second logical block array 608. In Figure 6C, the IP blocks are shown as being positioned along the horizontal and vertical boundaries of the logical block array. In other configurations, such IP blocks may be located only along horizontal boundaries or only along vertical boundaries. In other configurations, the plural 134972.doc • 40· 200931806 ip blocks can be aggregated into a larger block that is mixed with a programmable logic array block (eg, 608). In a specific embodiment, the aggregated blocks may have areas that are qualitatively similar to the array of programmable logic blocks. Therefore, the concepts illustrated in the logic region of constructing a 3D FPGA should not be interpreted in a limiting sense as the illustrative diagram shown. Figure 7A is shown to illustrate prior art techniques in configuring a programmable element of a conventional 2" FpGA device. Figure 7A is a top view of the best technology commercialized by Xilinx. The metal layers and the isolating oxide layers are removed from top to bottom in Figure 7A, so the transistor structure is visible. Therefore, the boundary of the gate active multiple Si region and the contact stamping are seen on the photo. In Figure 7A, it is seen that the SRAM cells (e.g., 7〇7) are arranged in column 7〇4 and the SRAM output is coupled to the programmable elements. Some of the output is constrained in polysilicon (polysilicon) as shown in Figure 7-8, while the other outputs are coupled by metal that has been removed and not visible. In column 〇4, two SRAM cells 70 and 7071) are configured to be back-to-back, and the pair is replicated to form a column of memory cells. The transistors in columns 7〇1, 7〇3, and 7〇5 form buffers, each of which is coupled to the signal input and/or output by a programmable circuit. Columns 702 and 706 show programmable multiplexer circuits, each gate of a MUX is lightly coupled to a sram unit HitUH as seen by more _ or by having removed and cannot See the metal). The programmable elements in Figure 7A (e.g., gate polymorphs in the MUX of columns 7〇2 and 7〇5) are seen as being used with the (four) bits to achieve layout area efficiency. The other columns of the 8 oct. 8 unit similar to column 704 are positioned below the buffer column 7 〇 1 in this device configuration. It should be noted that from the point of view of the memory bit density of 134972.doc -41 - 200931806, the 8 denier "cell density in a columnar region must be independently stylized in the region localized above and below the memory column. Matching. In Figure 7A, each SRAM cell has an output (not shown metal) and the output is coupled to one or more programmable elements. Therefore, "the latest prior art" The components are: (1) mixed with the SRAM cell, (ii) configured in columns to efficiently couple logic to the cell, and (iv) have row stripes orthogonal to the memory column

口中的可程式化及SRAM元件之匹配密度,(iv)耗合至sram 單元之輸出。 當將記憶體單元配置在較大區塊中時,而非當個別地或 以對形式放置該等記憶體單元時,達到最佳記憶體區域。 此一有效率記憶體區域不能用於2D FPGA中因為每一記 憶體單元必須耦合至一或多個可程式化元件。一記憶體區 塊(在深度上比幾個位元深)在該陣列之頂部上並沒有足夠 的空間以構造必須麵合每—記憶體單元輸出至—或多個相 鄰可程式化元件的金屬互連^依據當前較佳具體實施例, 在石夕基板表面巾沒tSRAM單元的情況下構造3D觸八之 邏輯區塊。圖7时顯示-可程式化邏輯單元之此—配置的 -第-具體實施例。或者,圖7Β可稱為一邏輯區塊、一邏 =單元一單位單元、-基本邏輯元件或藉由任何其他名 稱。其能夠提供複數個輸入之—複雜邏輯操縱。該單元包 ^複數個可程式化電路,例如711至717,每一電路包含複 數個隨機定位的可程式化元件(或該# "控制信號必須耦合的 7程式化輸入節點)。該單元可包括—第一方向上的一第 134972.doc •42- 200931806 一尺寸以及正交於該第一方向之一第二方向上的一第二尺 寸。在-矩形笛卡爾座標系統中,該單元可包括一矩形幾 何結構。在-圓形座標系統中,該單元可包括具有一特性 半徑的-圓形幾何結構。該單元可具有—正方形幾何杜 構,或任何其他幾何結構。金屬互連可常駐於該單元幾何 結構上方。第-複數個金屬互連可用作區域互連。區域互 連可耦合該單元内的電路元件以提供鄰近節點之耦合。第 一複數個互連可用作全域互連。全域互連可提供一第一單 位單元中的電路元件以耦合至一第二單位單元中的電路元 件。-或多個互連可以係可程式化的。—或多個互連可以 係固定的,而不可程式化的。 圖7B中的單元包括可程式化電路711中的可程式化邏輯 元件。該等可程式化邏輯元件可以係在m(Mux)電 路、一查找表(LUT)電路、一算術邏輯單元(ALu)電路、 - AND/OR邏輯電路、或可程式化邏輯裝置巾使用的任何 其他邏輯元件中。在此論述中,—LUT電路係基於解說目 的用以說明該可程式化單位單元中的邏輯元件之使用而不 限制本發明之範脅至LUT邏輯。用於LUT 711的使用者可 組態資料係保持在定位於圖7B中所示的佈局區域之上的組 態記憶體單元中。在其他具體實施例中,可能有利的係保 持LUT查找數值的队驗單^常駐於鄰近於電路區塊7ιι的 具有LUT幾何結構之Si基板上。—増人⑶了結構可包括22 個SRAM單元以保持組態資料,而—4輸人電路可能需 要24個SRAM^以保持f料。在藉由參考封閉的引用 134972.doc •43· 200931806 中,揭示具有2~固以上組態位元(用於N輸入LUT)以有效率 地包裝邏輯之可分LUT結構。因此LUT 7 11可以係一可分 割/可分LUT電路。其可以係在最佳地最佳化該邏輯單元之 ' 架構中選擇的一 6輸入、8輸入或一較高輸入LUT電路。一 - 或多個LUT結構可加以定位於一邏輯單元中。包括作為該 組態記憶體單元之3D SRAM的複數個組態記憶體單元保持 資料以程式化該LUT電路之查找數值。因此一組態記憶體 位元之一輸出必須作為一資料輸入(亦稱為LUT數值輸入) © 耦合至一 LUT電路7 11。此一輸入係隨機定位於711中所示 的LUT佈局區域内。一垂直定位記憶體單元之輸出可在將 其作為一 LUT數值輸入耦合至LUT電路之前加以緩衝。一 LUT電路可加以程式化以藉由改變儲存於組態記憶體中的 資料來構造一邏輯功能。複數個LUT電路可經組合用以構 造較大(較高輸入)邏輯功能。一LUT電路需要在真實及問 候信號位準中接收的一或多個主要輸入,其中該LUT電路 在一或多個輸出中輸出該等輸入之一邏輯功能。此類輸入 W 及輸出可藉由可程式化構件耦合至複數個互連。 ' 圖7B中的一可程式化邏輯單元可包括一可程式化輸入 ' MUX,例如712、715及716。該輸入MUX可加以構造為一 單一級或多級MUX。MUX之一第一位準可提供複數個互 連之一可程式化耦合至一邏輯單元輸入。MUX之一第二級 可提供複數個該等邏輯單元輸入之一可程式化耦合至一 LUT輸入。因此可能存在用於一給定線路的可程式化選擇 之一複雜層級以作為一輸入耦合至一 LUT邏輯電路。該可 134972.doc • 44- 200931806The stylized and SRAM component matching density in the port, (iv) is the output of the sram unit. The best memory area is achieved when the memory cells are arranged in larger blocks, rather than when the memory cells are placed individually or in pairs. This efficient memory region cannot be used in a 2D FPGA because each memory cell must be coupled to one or more programmable components. A memory block (deeper than a few bits deep) does not have enough space on top of the array to construct the output of each memory cell to - or multiple adjacent programmable elements Metal Interconnects ^ According to the presently preferred embodiment, a logical block of 3D touch eight is constructed in the case where the surface substrate of the Shixi substrate is free of tSRAM cells. Figure 7 shows a - the specific embodiment of the -programmable logic unit. Alternatively, Figure 7A may be referred to as a logical block, a logical = unit-unit unit, a basic logical element, or by any other name. It can provide multiple inputs - complex logic manipulation. The unit includes a plurality of programmable circuits, such as 711 through 717, each of which includes a plurality of randomly located programmable elements (or the # " 7 programmed input nodes to which the control signals must be coupled). The unit may include a first dimension 134972.doc • 42- 200931806 in a first direction and a second dimension orthogonal to one of the first directions in a second direction. In a rectangular rectangular Cartesian coordinate system, the unit can include a rectangular geometry. In a circular coordinate system, the unit may comprise a circular geometry having a characteristic radius. The unit can have a square geometry or any other geometry. Metal interconnects can reside permanently above the cell geometry. The first plurality of metal interconnects can be used as a regional interconnect. A regional interconnect can couple circuit elements within the unit to provide coupling of adjacent nodes. The first plurality of interconnects can be used as a global interconnect. The global interconnect can provide circuit elements in a first unit of cells to couple to circuit elements in a second unit of cells. - or multiple interconnections can be programmatic. — or multiple interconnects can be fixed and not stylized. The unit of Figure 7B includes programmable logic elements in programmable circuit 711. The programmable logic elements can be any of the m (Mux) circuits, a look up table (LUT) circuit, an arithmetic logic unit (ALu) circuit, an AND/OR logic circuit, or a programmable logic device. Among other logic components. In this discussion, the LUT circuit is based on the purpose of explanation to illustrate the use of logic elements in the programmable unit cell without limiting the scope of the present invention to LUT logic. The user configurable data for LUT 711 remains in the configurable memory unit located above the layout area shown in Figure 7B. In other embodiments, it may be advantageous to maintain a checklist of values for the LUT lookup resident on a Si substrate having a LUT geometry adjacent to the circuit block 7ι. - Deaf (3) The structure may include 22 SRAM cells to maintain configuration data, while the -4 input circuit may require 24 SRAMs to hold the F material. A reference to a closed reference 134972.doc • 43· 200931806 reveals a separable LUT structure with 2~ solid configuration bits (for N input LUTs) to efficiently package logic. Therefore, the LUT 7 11 can be a splittable/separable LUT circuit. It can be a 6-input, 8-input or a higher-input LUT circuit selected in the architecture that optimally optimizes the logic unit. One or more LUT structures can be located in a logical unit. A plurality of configuration memory unit holding data as a 3D SRAM of the configuration memory unit is used to program the lookup value of the LUT circuit. Therefore, one of the outputs of a configuration memory bit must be coupled to a LUT circuit 7 11 as a data input (also known as a LUT value input). This input is randomly located within the LUT layout area shown in 711. The output of a vertical positioning memory unit can be buffered prior to being coupled as an LUT value input to the LUT circuit. An LUT circuit can be programmed to construct a logic function by changing the data stored in the configuration memory. A plurality of LUT circuits can be combined to construct a larger (higher input) logic function. A LUT circuit requires one or more primary inputs received in real and question signal levels, wherein the LUT circuit outputs one of the input logic functions in one or more outputs. Such inputs W and outputs can be coupled to a plurality of interconnects by programmable components. A programmable logic unit in Figure 7B can include a programmable input 'MUX, such as 712, 715, and 716. The input MUX can be constructed as a single level or multi-level MUX. One of the first levels of the MUX provides one of a plurality of interconnects that can be programmatically coupled to a logic unit input. One of the second stages of the MUX can provide a plurality of inputs of the logic elements that can be programmatically coupled to a LUT input. Thus there may be a complex level of programmable selection for a given line to couple as an input to a LUT logic. The 134972.doc • 44- 200931806

e 程式化性係儲存奴位於圖76之幾何結構上方的組態記憶 趙中。該可程式化MUX係由—組態記憶體單元之-輸出組 L在較佳具體實施例中,該記憶體單元係一 TFT SRAM記憶體單元。在—較佳具體實施例中,該記㈣單 疋可包括-分壓器電路以輕合不同於tft sram操作電麼 位準的可選擇電壓位準。因&,複數個sram記憶體單元 複數個輸出’每—輸出係輕合至—或多個順X電晶體 閘極以程式化輸入MUX 712、715及716。該等可程式化元 件係隨機g&置在該邏輯單元内。該等輸人可加以配置 在一特定組態中以最大化輸人與該單位單元上方之互連線 路的連接性。在-較佳具體實施例中,Μυχ之—第一位準 可定位於邏輯單元之周長周®。在一較佳具體實施例 中,MUX之-第二位準可聚集於一邏輯單元的中心附近。 色ux元件係一開關。其提供一連接狀態以及一斷開狀 〜、在連接狀態中,該MUX耦合一第一節點至一第二節 點在斷㈤狀態中,該Μυχ從一第二節點解麵一第一節 因此需要合理的電耦合及解耦以將一連接狀態從一斷 j狀態刀離。在—FPGA中,需要該記憶體輸出以提供此 品別此一區別通常並非為記憶體應用中的記憶體單元所 需要。 。圖7B中的一可程式化邏輯單元可包括一可程式化暫存 器。例如714。一暫存器可用以實施該邏輯單元中的同步 邏輯计算。—暫存11可經旁通以實施-邏輯單元中的異步 邏輯。—暫存器可用以儲存該邏輯單元内或在該邏輯單元 134972.doc -45· 200931806 以外的-輸入或-輸出。該暫存器可以係鎖存器、正反器 或電子電路中使用的任何其他儲存裝置。一或多個全域信 號可與該储存裝置互動。此類信號可以係時脈、設定、重 * 言免信號之-或多者。此等暫存器可提供區域反相信號之可 • 、组態構件。在藉由參考封閉的揭示内容中,可組態儲存裝 置係顯示為具有可改變回應序列,例如靠或孤或d。因 此暫存器714可組態一使用者期望狀態。可按期望組態至 該暫存器的輸入以及該暫存器之輸出。該邏輯單元可包括 ❿ 複數個暫存器。 圖7B中的一可程式化邏輯單元可包括一可程式化輸出 MUX,例如717及718。該輸出Mux可加以構造為一單一 級或多級MUX。MUX之一第一位準可提供可程式化互連 以耦合至邏輯單元輸入。Μυχ之一第二級可提供一邏輯單 元輸出以藉由一可程式化構件耦合至一緩衝式LUT輸出。 因此可能存在用於一給定線路的可程式化選擇之一複雜層 藝 級以耦合至一 LUT邏輯電路之一緩衝式輸出。該可程式化 性係儲存在定位於圖7B之幾何結構上方的組態記憶體中。 該可程式化MUX係由一組態記憶體單元之一輸出組態。在 ' 一較佳具體實施例中,該記憶體單元係一 SRAM記憶體單 元。因此,複數個SRAM記憶體單元產生複數個輸出,每 輸出係耦合至一或多個MUX電晶體閘極以程式化輸出 MUX 717及718。該等可程式化元件係隨機配置在該邏輯 單元内。該等輸出MUX可加以配置在一特定組態中以最大 化輸出與該單位單元上方之互連線路的連接性。一 Μυχ 134972.doc -46 - 200931806 件係一開關。其提供一連接狀態以及一斷開狀態。在一連 接狀態中,該MUX耦合一第一節點至一第二節點。在一斷 開狀態中,該MUX從一第二節點解耦一第一節點。因此需 • 要合理的耦合及解耦以將一連接狀態與一斷開狀態分離。 * 在FPGA中,需要該記憶體輸出以提供此區別,此一區 別通常並非為記憶體應用中的記憶體單元所需要。 圖7B中的一可程式化邏輯單元可包括一可程式化選路電 路,例如713。該選路電路可加以構造為一單一級或多級 〇 MUX。該選路電路可包括-緩衝結構以緩衝信號。一選路 電路可促進一第一線路片段以藉由-可程式化構件耦合至 一第二線路片段。因此可由複數個邏輯單元中的一或多個 選路電路創建一先進可程式化線路網路。一些線路可在一 選路電路中終止。一終止線路可耦合至一選路電路中的一 或多個其他線路。一些線路可在一選路電路中傳遞。一傳 遞線路可辆合至一選路電路中的_或多個其他線路。—選 ❹,電路可包括MUX之-第—位準。Μυχ之該第—位準可 提供耗合複數個線路至一緩衝器輸入的 :該祕電路可包括廳之-第二位準。職之該Π位 "七'供相σ 一緩衝器輸出至複數個線路的一可程式化構 ^。可在一選路電路中提供一雙向線路連接。該選路電路 :包括縱橫電路。藉由參考封閉的揭示内容進一步詳細 說明可用於該3D FPGA中的選路電路之—或多個具體實施 例。存在用於一給定第一線路的可程式化選擇之一複雜層 級以輕合一第二線路,因此一選路工具可有效率地選路— 134972.doc -47- 200931806 ❹ ❹ FPGA互連織物中的信號。該可程式化性係儲存在定位於 圖7B之幾何、结構上方的組態記憶體中。藉由搞合至該選路 電路的一組態記憶體單元之一輸出來組態該可程式化選路 電路。在一較佳具體實施例中,該記憶體單元係一TFT SRAM §己憶體單元。因此,複數個SRAM記憶體單元產生 複數個輸A母—輸出係麵合至—或多個電晶體閑極 以程式化選路電路713。選路電路713之料可程式化元件 係隨,配置在該邏輯單元内。該等選路電路可加以配置在 一特定組態中以最大化邏輯單元之間的線路連接性。 可由如圖7C中所示的一組態記憶體陣列來組態圖7b中 的一可程式化邏輯單元。該記憶體陣列包括—記憶體單元 721。β亥圯憶體單元在一陣列中經複製用以構造該鄰接記 憶體陣列。每一記憶體單元具有一第一方向上的一第一尺 寸以及正交於該第一方向之一第二方向上的一第二尺寸。 該記憶體陣列可包括_列及關行,Μ及Ν係大於或等於 一的整數。因此該記憶體陣列包括ΜχΝ個記憶體單元。該 記憶體陣列係定位於圖7Β中所示的該邏輯單元上方。該^ 憶體,列以及邏輯單元可包括實質上類似的尺寸。因此該 邏輯單可視為具有單位單元之一陣列,每一單位單元具 有-記憶體單元之尺寸。每一記憶體單元可包括一或多個 記憶體元件。在一項具體實施例中,該記憶體單元係— SRAM單7"。在"較佳具體實施例中,該記憶體單元係如 圖中所示的-8電晶體SRAM單元。在圖7D中,該記憶 體單元包括諸如731之二個反相器以形成_鎖存器。其包 134972.doc •48- 200931806 括諸如732之存取電晶體以改變儲存在該鎖存器中的資 料。在一全域重設模式中,一陣列中的所有位元係經由存 取電晶體732耦合至vss線以將所有位元設定至一特定狀e Stylized storage slaves are located in the configuration memory above the geometry of Figure 76. The programmable MUX is comprised of - the output memory unit - in the preferred embodiment, the memory unit is a TFT SRAM memory unit. In a preferred embodiment, the (4) unit can include a voltage divider circuit to tap a selectable voltage level that is different from the tft sram operation level. Because of &, a plurality of sram memory cells, a plurality of outputs 'each-output are lighted to — or a plurality of cis X transistor gates to programmatically input MUX 712, 715, and 716. The programmable elements are randomly g& placed in the logical unit. These inputs can be configured in a particular configuration to maximize the connectivity of the input to the interconnect above the unit. In a preferred embodiment, the first level can be located at the circumference of the logic unit. In a preferred embodiment, the second level of the MUX can be gathered near the center of a logical unit. The color ux component is a switch. Providing a connection state and a disconnection type. In the connection state, the MUX is coupled to a first node to a second node in a broken (five) state, and the first node is decomposed from a second node. Reasonable electrical coupling and decoupling to separate a connected state from a broken j state. In an FPGA, this memory output is required to provide this distinction. This distinction is usually not required for memory cells in memory applications. . A programmable logic unit in Figure 7B can include a programmable register. For example, 714. A register can be used to implement the synchronization logic calculations in the logic unit. - The temporary storage 11 can be bypassed to implement the asynchronous logic in the - logical unit. - The scratchpad can be used to store -input or -output in the logic unit or outside of the logic unit 134972.doc -45.200931806. The register can be a latch, a flip-flop or any other storage device used in an electronic circuit. One or more global signals can interact with the storage device. Such signals can be clocked, set, or signal-free. These registers provide the configuration and components of the area inversion signal. In the closed disclosure by reference, the configurable storage device is shown as having a changeable response sequence, such as by orphan or d. Therefore, the register 714 can configure a user desired state. The input to the scratchpad and the output of the scratchpad can be configured as desired. The logic unit can include a plurality of registers. A programmable logic unit in Figure 7B can include a programmable output MUX, such as 717 and 718. The output Mux can be constructed as a single or multi-level MUX. One of the first levels of the MUX provides a programmable interconnect to be coupled to the logic unit input. One of the second stages provides a logic unit output for coupling to a buffered LUT output by a programmable component. Thus there may be a complex level of programmable selection for a given line to couple to one of the buffered outputs of a LUT logic. The programmability is stored in a configuration memory located above the geometry of Figure 7B. The programmable MUX is configured by one of the configuration memory cells. In a preferred embodiment, the memory unit is a SRAM memory unit. Thus, a plurality of SRAM memory cells produce a plurality of outputs, each output coupled to one or more MUX transistor gates to program output MUXs 717 and 718. The programmable components are randomly arranged within the logic unit. The output MUXs can be configured in a particular configuration to maximize the connectivity of the output to the interconnect lines above the unit cell. A 134 134972.doc -46 - 200931806 is a switch. It provides a connected state and a disconnected state. In a connected state, the MUX couples a first node to a second node. In an off state, the MUX decouples a first node from a second node. Therefore, it is necessary to properly couple and decouple to separate a connected state from a disconnected state. * In an FPGA, this memory output is required to provide this distinction, which is usually not required for memory cells in memory applications. A programmable logic unit in Figure 7B can include a programmable routing circuit, such as 713. The routing circuit can be constructed as a single stage or multiple stages 〇 MUX. The routing circuit can include a buffer structure to buffer the signal. A routing circuit can facilitate a first line segment to be coupled to a second line segment by a programmable component. Thus an advanced programmable circuit network can be created by one or more of the plurality of logic cells. Some lines can be terminated in a routing circuit. A termination line can be coupled to one or more other lines in a routing circuit. Some lines can be passed in a routing circuit. A transmission line can be connected to _ or a plurality of other lines in a routing circuit. - Optional, the circuit can include the -first level of the MUX. The first level can provide a plurality of lines to a buffer input: the secret circuit can include a hall-second level. The position of the job "seven' supply phase σ a buffer output to a programmable configuration of a plurality of lines. A bidirectional line connection can be provided in a routing circuit. The routing circuit includes a vertical and horizontal circuit. One or more specific embodiments that may be used in the routing circuit in the 3D FPGA are described in further detail with reference to the closed disclosure. There is a complex level of programmable selection for a given first line to lighten a second line, so a routing tool can efficiently route - 134972.doc -47- 200931806 ❹ ❹ FPGA Interconnect The signal in the fabric. The programmability is stored in a configuration memory located above the geometry, structure of Figure 7B. The programmable routing circuit is configured by engaging one of the outputs of a configuration memory unit of the routing circuit. In a preferred embodiment, the memory cell is a TFT SRAM § memory cell. Thus, a plurality of SRAM memory cells generate a plurality of A-master-output system faces to - or a plurality of transistor idlers to program the routing circuit 713. The programmable circuit component of the routing circuit 713 is disposed in the logic unit. The routing circuits can be configured in a particular configuration to maximize line connectivity between the logic units. A programmable logic unit of Figure 7b can be configured by a configuration memory array as shown in Figure 7C. The memory array includes a memory unit 721. The 圯 圯 memory unit is replicated in an array to construct the contiguous memory array. Each memory cell has a first dimension in a first direction and a second dimension in a second direction orthogonal to the first direction. The memory array can include an _ column and a singular line, and the Μ and Ν are integers greater than or equal to one. Thus the memory array comprises a memory unit. The memory array is positioned above the logic unit shown in Figure 7A. The memory, columns, and logic cells can include substantially similar dimensions. Thus the logical list can be viewed as having an array of unit cells, each unit cell having the size of a memory cell. Each memory unit can include one or more memory elements. In a specific embodiment, the memory unit is - SRAM Single 7". In the preferred embodiment, the memory cell is a -8 transistor SRAM cell as shown. In Figure 7D, the memory cell includes two inverters, such as 731, to form a _ latch. Its package 134972.doc • 48- 200931806 includes an access transistor such as 732 to change the information stored in the latch. In a global reset mode, all of the bits in an array are coupled to the vss line via the access transistor 732 to set all of the bits to a particular shape.

一解碼模式係用 以經由存取電晶體732將一資料狀態零寫入至該鎖存器 中。資料之一列(一單一列線所共同)經同時組態用以寫入 由諸如733 資料狀態零,或按需要將資料狀態保留在一A decode mode is used to write a data state zero to the latch via access transistor 732. One of the data columns (common to a single column line) is simultaneously configured to be written by a data state such as 733, or the data state is retained as needed

之電晶體組成的一電阻器除法電路係用以從該鎖存器產生 一輸出信號。根據鎖存的資料狀態,該輸出信號係在電壓 VccL位準或Vss位準處。對於該TFT SRAM鎖存器,VccL 電壓位準可以係不同於VecT。資料狀態一輸出電壓 VccL,而資料狀態零輸出電壓Vss。藉由參考封閉的揭示 内容為3D可程式化裝置提供詳細組態電路。在圖7c中, 一單一記憶體單元經有效率地複製用以構造該陣列。該記 憶體單元可加以放置在一單位單元内。該單位單元可包括 一單一圮憶體單元,或可以係大於一單一記憶體單元。該 單位單元可經複製用以形成該組態記憶體陣列,每一單位 單几具有放置在該單位單元内的一記憶體單元。因此整個 單位單70區域或該單位單元區域之一部分可由該組態記憶 體單佔用。不像一 21)配置一樣,該等記憶體輸出線路垂 直地耦合(選路)至下面的可程式化元件。因此 ,與該2D配 置相比,存在不同金屬密度限制。例如,垂直線路並沒有 如2D配置中的橫向密度限制。然而,與一 2D配置相 比’垂直線路限制如何定位其他選路線路。如本文中所揭 134972.doc •49· 200931806 示,在該較佳具體實施例中,垂直定位於該邏輯單元上方 的記憶體單元之一準確佈局區域(至下面的邏輯單元佈局 區域之準確佈局區域)經看見提供該PLE)裝置之一最佳構 造。此外如本文中所揭示,該記憶體陣列中的記憶體位元 之數目經最佳化用以與該邏輯單元中的獨立可程式化元件 之總數(準確或接近準確)匹配。因此,對於隨機定位之可 程式化7L件,依據當前教示之一可程式化邏輯單元具有與 定位於邏輯單元上方的記憶體單元之重複陣列實質上相同 的佈局幾何結構。在其他具體實施例中,此等佈局區域可 以係實質上類似的而且不準確的。 因此依據當前教示,一新穎3D FPGA包括:一可程式化 邏輯區塊(圖7B),其具有隨機定位於該邏輯區塊内的複數 個可組態元件(電路711至718中);以及組態記憶體單元之 一第一陣列(圖7C),其具有經複製用以構造該第一陣列的 一組態記憶體單元721,該記憶體單元係耦合至該等可組 態兀件之一或多者,該第一陣列中的複數個記憶體單元係 耦合至邏輯區塊中的該複數個可組態元件以程式化該邏輯 區塊至一使用者說明書;其中,該第一陣列(圖7〇以及該 可程式化邏輯區塊(圖7B)具有一實質上類似的佈局幾何結 構而且該第一陣列係實質上定位於該邏輯區塊之上。 應容易瞭解,此一可程式化邏輯單元以及該邏輯單元上 方的該組態記憶體陣列可經複製用以形成一可程式化邏輯 陣列。每一邏輯單元之個別記憶體陣列與其他者合併以形 成一個鄰接較大的有效率記憶體陣列。該等邏輯單元進一 134972.doc -50- 200931806 步t集以產生包含隨機分配之可程式化元件的一較大可程 式化邏輯區域。因此依據當前教示,一新穎3D FPG A進一 步包括:複數個可程式化邏輯單元(圖7B),該等邏輯單元 之每一者具有隨機分配之複數個可程式化元件(電路711至 71 8中)’該複數個邏輯單元係由組態記憶體單元(諸如圖 7D中的每一單元)之一鄰接陣列組態,其中記憶體單元之 該陣列包括與該複數個可程式化邏輯單元實質上類似的佈 局幾何結構;而且記憶體單元之該陣列係定位於該複數個 可程式化邏輯單元之上,該陣列十的複數個記憶體單元係 麵合至該等可程式化元件以程式化該複數個邏輯單元至一 使用者說明書。因此一 3D FPGA係較容易藉由複製一有效 率構造的極小單一可程式化邏輯單元來構造。 在該3D構造之一項具體實施例中,圖7C中的記憶體單 元之該陣列係定位於圖7B之邏輯單元中的該複數個可程式 化元件之上。在一較佳具體實施例中,複數個金屬層係定 位於該等邏輯元件以及記憶體單元之間。此一配置需要定 位於該二個電路區塊之間的該等金屬層之特殊構造。 圖8中顯示用以垂直耦合組態記憶體至可程式化元件的 一金屬構造之一項具體實施例。在圖8中,諸如8〇1之一金 屬短柱經提供用以耦合諸如圖7D中的一記憶體單元(圖7〇 中的記憶體單元之陣列中的單元721)之一個輸出至由該信 號位元所組態之圖7B中的一或多個可程式化元件。以一陣 列形式複製金屬短柱801。一極小金屬單位單元8〇3可構造 為具有一第一方向上的一尺寸805以及正交於該第一方向 134972.doc 51 200931806 2:!:方向上的一尺寸804。使此等尺寸與定位於該耦 σ、 Jl方的組態記憶體單元之記憶體陣列尺寸匹配。 區域803顯示此一金屬 卜 早1早70其中一金屬短柱係定位 ❹ ❹ ;第區域中而且一鄰接金屬線係定位於一第二區域 中。該金屬線跨越該等單位單元,因此當構造一金屬陣列 時,其形成—連續全域金屬線。在一第一具體實施例中, 諸如8〇2之一金屬線係定位於如圖8中所示之第二方向上的 二個鄰近短柱之間。在—第二具體實施例中,諸如謝之 金屬線係疋位於第一方向上的二個鄰近短柱之間,好像 圖8係順時針旋轉9G度…金屬線可用作-電力匯流排、 一接地匯流排、-時脈信號或任何其他全域控制信號線。 因此,用以耦合記憶體單元(圖7C中顯示)之一陣列的輸出 至-3D可程式化邏輯裝置(pLD)中的—可程式化邏輯單元 (圖7B中顯示)之可程式化元件的一金屬柄合層(圖8中顯示) 包括·複數個金屬短柱8〇3,其係配置在具有一第一方向 上的一第一尺寸805以及一第二方向上的一第二尺寸8〇4之 -陣列中’該等第一及第二尺寸係與該記憶體單元陣列中 的該記憶體單元之尺寸相同’其中一金屬匯流排係定位於 該第一或第二方向上的二個鄰近短柱之間。此一金屬層提 供一 3D FPGA中的記憶體陣列之有效率耦合至底層邏輯, 並且為3D構造中所需要的電力、接地及全域信號選路提供 足夠的金屬。 圖9A中顯示依據當前教示的3D FPGA之一第一具體實施 例的一斷面圖。其中,金屬短柱9〇2、904、906提供以上 134972.doc -52- 200931806 記憶體陣列與以下可程式化元件之間的耦合。金屬線 905 907係定位於鄰近短柱之間《複數個記憶體單 兀916係定位於該耦合金屬層上方。記憶體單元916之一輸 出係輕U至金屬短柱902,其係進一步耦合至以下該斷 面圖中未顯不之一或多個可程式化元件。記憶體單元㈣ 與金屬短柱902之間的耦合包括一通道915。在金屬短柱 2與904之間,垂直於該視圖運行的一較長金屬線903係 用於電力、接地或全域控制信號。在其他具體實施例中, 複數個並聯全域控制金屬線可定位於二個鄰近金屬短柱之 間。一記憶體單元916可包括複數個記憶體元件。其可包 括複數個電晶體,明確而言係複數個薄膜電晶體。其可包 括能夠提供一邏輯輸入至金屬短柱9〇2的一或多個可組態 元件。藉由參考併入的揭示内容說明薄臈電晶體、反相器 以及適合於3D SRAM構造的記憶體單元。記憶體單元916 可包括RAM或ROM記憶體元件。一 RAM記憶體單元916可 進一步包括額外金屬線(例如917)以完全構造一記憶體陣 列。一金屬線917可定位於圖9A中所示的包含9〇1至908之 一電力及接地金屬層上方。金屬區域901及908可用作3D FPGA之墊區域。當構造具有多個晶片的系統時,諸如所 示的901之一墊區域可能需要接合至其他ic裝置。在一項 具體實施例中,墊區域901及913可以不含定位於該等塾區 域上方的記憶體元件。在另一項具體實施例中,一金屬區 域913可類似於記憶體單元916上方的金屬區域917而定位 並耗合至塾區域901。此一金屬區域913可形成一重新分配 134972.doc •53· 200931806 墊區域。該重新分配墊區域可藉由分配金屬層耦合至一特 定墊區域901。在一較佳具體實施例中,記憶體單元916形 成一規則§己憶體陣列於金屬短柱陣列903/905/907上方,從 而形成一谷易耦合的耦合方案,金屬短柱9〇3/9〇5/9〇7可透 過垂直及水平連接線路之一系統進一步耦合至底層可程式 化元件。在所說明的構造中,每一耦合在該可程式化邏輯 電路中的一高阻抗節點處終止,而且線路電容用以穩定組 態之節點上的控制電壓。 圖9B中顯示依據當前教示的3D fpga之一第二具體實施 例的一斷面圖。其中,由一 R〇M元件替換一 RAM元件(圖 9A中)。在該具體實施例中,一 r〇m元件僅係連接至—電 力供應或一接地供應的一金屬連接。一 R〇M元件可以係一 硬線RAM元件以始終儲存一特定資料值(容易看出一鎖存 器之二側可與電力供應及接地供應短路,因此該鎖存器始 終保持一特定資料值)。在圖9B中,金屬線942、944載送 電力,而金屬線943、945載送接地。金屬短柱932可耦合 至電力(金屬線942)或接地(金屬線943)。金屬短柱934可同 樣地麵合至電力(金屬線944)或接地(金屬線943)。因此— 定製金屬圖案為下面的可程式化元件提供組態。如圖叩中 所示包含線路942至945的一分離金屬層提供與底層邏輯之 電力電壓相比提供不同電力電壓至短柱932、934的能力。 若相同電力及接地電壓足夠,則不需要諸如942至945的額 外金屬層;相反,金屬線933、935中的電力及接地電魔係 用以為該等短柱供應電力至所需要的電壓位準。因此金屬 134972.doc •54· 200931806 短柱932、9M可經定製用以獲得一預定資料值以程式化下 面的可程式化元件。在金屬短柱932與934之間,垂直於該 視圖運行的一較長金屬線933係用於電力、接地或全域控 制信號。在其他具體實施例中,複數個並聯全域金屬線可 定位於二個鄰近金屬短柱之間。藉由參考併入的揭示内容 說明將以RAM為基礎的PLD裝置轉換為以R〇M為基礎的 PLD裝置,二者皆保存一時序特性,或達到一較高效能轉 換’或達到一較低功率轉換。金屬區域941及946可用作3D FPGA之墊區域。當構造具有多個晶片的系統時,如所示 的一墊區域可能需要接合至其他IC裝置。在一項具體實施 例中,墊區域941及946可沿該PLD之周長而定位。在另一 項具體實施例中,該等墊區域可定位於該PLD之頂部表面 之上的一格柵中。一重新分配金屬層可用以耦合周長墊區 域(例如931)至金屬短柱區域932上方的重新分配之墊區域 (例如940)。金屬短柱932/934可透過垂直及水平連接線路 之一系統進一步耦合至底層可程式化元件。在所說明的構 造中,每一粞合可在該邏輯電路中的一高阻抗節點處終 止,而且線路電容可用以穩定此類電容可組態節點上的控 制電壓。當前教示中的另一優點係沒有切換信號橫穿垂直 組態之線路片段而且組態線路片段可吸收如維持該FpGA 中的時序臨界線路之信號完整性所需要之一樣多的繞路。 圖10A顯示構造可程式化元件、可程式化互連以及垂直 連接的組態記憶體之一較佳具體實施例。在模組層1〇〇1中 使用電晶體以構造電路。此類電路包括AND、nand、〇r 134972.doc -55- 200931806 型邏輯電路、反相器、緩衝器、驅動器型信號恢復電路、 鎖存器、正反器、記憶體型儲存電路、MUX、開關、縱橫 型連接性電路、LUT、ALU、DSP、CPU型計算電路、 PLL、DLL、AtoD、DtoA型類比電路以及ip區塊》因此模 • 組層1001包括在典型積體電路中發現的可程式化及不可程 式化電路組件。模組層1〇〇1可包括一或多個金屬層以提供 該等電晶體當中某一位準的互連。模組層1〇〇1可包括一或 多個可組態元件,及/或一或多個組件,其形成組態模組 O 内的-或多個可組態元件所需要的組態電路之一部 刀。諸如1002、1〇〇3及1〇〇4之模組層中的複數個金屬互連 經提供用以互連模組層1〇〇1内的電路區塊。在一較佳具體 實施例中,模組層1002中的多數互連線路橫穿一第一方 向。模組層1003中的多數互連線路橫穿正交於該第一方向 之一第二方向。模組層1004中的多數互連線路橫穿該第一 方向。同樣地,複數個金屬模組層經垂直配置用以提供模 粵,組屠1001中的電路節點之間的增強選路。此類互連線路雖 然存在但是未在圖9A中加以顯示。一模組層1〇〇5包括諸如 圖9A中的916之複數個組態記憶體單元。(圖1〇A中未顯示 , 圖从中的金屬短柱層9〇1至908)。一組態記憶體單元可包 括一單位單元區域1006。單位單元職在鄰接陣列中經複 製用以構造模組層1005。模組層1〇〇5中的每一單元係耦合 至模組層讀中的一或多個可程式化元件,圖i〇a中未: 示此麵合。為了促進該柄合,需要接著加以論述的新賴金 屬佈局型式。 134972.doc •56- 200931806A resistor divider circuit of the transistor is used to generate an output signal from the latch. Depending on the state of the latched data, the output signal is at the voltage VccL level or Vss level. For this TFT SRAM latch, the VccL voltage level can be different from VecT. The data state is an output voltage VccL, while the data state is zero output voltage Vss. A detailed configuration circuit is provided for the 3D programmable device by reference to the closed disclosure. In Figure 7c, a single memory cell is efficiently replicated to construct the array. The memory unit can be placed in a unit cell. The unit cell may comprise a single memory unit or may be larger than a single memory unit. The unit cell can be replicated to form the array of configuration memory, each unit having a memory cell placed within the unit cell. Therefore, the entire unit single 70 area or a part of the unit unit area can be occupied by the configuration memory. Unlike the 21) configuration, the memory output lines are vertically coupled (routed) to the underlying programmable elements. Therefore, there are different metal density limitations compared to this 2D configuration. For example, vertical lines do not have a lateral density limit as in a 2D configuration. However, compared to a 2D configuration, the 'vertical line limits how to locate other routing lines. As disclosed herein, 134972.doc • 49· 200931806 shows that in the preferred embodiment, one of the memory cells vertically positioned above the logic cell has an accurate layout area (to the exact layout of the logical cell layout area below) The area is seen to provide the best configuration of one of the PLE) devices. Moreover, as disclosed herein, the number of memory bits in the memory array is optimized to match the total number (accurate or near accurate) of the individual programmable elements in the logic unit. Thus, for a randomly located programmable 7L piece, one of the programmable logic cells has substantially the same layout geometry as the repeating array of memory cells located above the logic cell, according to one of the current teachings. In other embodiments, such layout areas may be substantially similar and inaccurate. Thus, in accordance with the present teachings, a novel 3D FPGA includes: a programmable logic block (FIG. 7B) having a plurality of configurable components (circuits 711 through 718) randomly positioned within the logical block; a first array of state memory cells (Fig. 7C) having a configuration memory unit 721 that is replicated to construct the first array, the memory unit being coupled to one of the configurable components Or a plurality of memory cells in the first array are coupled to the plurality of configurable components in the logic block to program the logic block to a user specification; wherein the first array ( Figure 7A and the programmable logic block (Fig. 7B) have a substantially similar layout geometry and the first array is positioned substantially above the logical block. It should be readily understood that this can be programmed The logic unit and the array of configuration memory above the logic unit can be duplicated to form a programmable logic array. The individual memory arrays of each logic unit are combined with others to form a larger adjacency effective Memory arrays. The logic elements are further 134972.doc -50- 200931806 steps to generate a larger programmable logic region containing randomly assigned programmable elements. Therefore, according to current teachings, a novel 3D FPG A further The method includes: a plurality of programmable logic units (FIG. 7B), each of the logic units having a plurality of randomly assignable programmable elements (circuits 711 to 718) - the plurality of logic units are configured by One of the memory cells (such as each cell in Figure 7D) abuts the array configuration, wherein the array of memory cells includes a layout geometry substantially similar to the plurality of programmable logic cells; and the memory cells The array is positioned on the plurality of programmable logic units, and the plurality of memory cells of the array are coupled to the programmable elements to program the plurality of logic units to a user specification. A 3D FPGA system is relatively easy to construct by replicating an extremely small single programmable logic unit that is efficiently constructed. In one embodiment of the 3D construction The array of memory cells in Figure 7C is positioned over the plurality of programmable elements in the logic cell of Figure 7B. In a preferred embodiment, a plurality of metal layers are positioned at the logic elements And between the memory cells. This configuration requires a special configuration of the metal layers positioned between the two circuit blocks. Figure 8 shows a metal for vertically coupling the configuration memory to the programmable elements. A specific embodiment of the construction. In Fig. 8, a metal stub such as 8〇1 is provided for coupling a unit such as a memory unit in Fig. 7D (the memory cell in Fig. 7A) One of the outputs 721) is output to one or more of the programmable elements of Figure 7B configured by the signal bits. The metal stubs 801 are replicated in an array. The one very small metal unit cell 8〇3 can be configured to have a dimension 805 in a first direction and a dimension 804 orthogonal to the first direction 134972.doc 51 200931806 2:!: direction. The dimensions are matched to the size of the memory array of the configuration memory unit located at the coupling σ, Jl side. The region 803 shows that the metal is positioned one of the early 70s and one of the metal stubs is positioned in the first region and an adjacent metal line is positioned in a second region. The metal lines span the unit cells, so when a metal array is constructed, it forms a continuous global metal line. In a first embodiment, one of the metal wires, such as 8〇2, is positioned between two adjacent stubs in a second direction as shown in FIG. In a second embodiment, a metal wire system such as Xie is located between two adjacent stubs in a first direction, as if Fig. 8 is rotated 9G clockwise... the wire can be used as a power bus, A ground bus, - clock signal, or any other global control signal line. Thus, the output of the array of one of the memory cells (shown in Figure 7C) is coupled to the programmable component of the -programmable logic cell (shown in Figure 7B) in the -3D programmable logic device (pLD) A metal shank layer (shown in FIG. 8) includes a plurality of metal stubs 8〇3 disposed in a first dimension 805 having a first direction and a second dimension 8 in a second direction The first and second dimensions of the array are the same as the size of the memory cell in the memory cell array. One of the metal busbars is positioned in the first or second direction. Between adjacent short columns. This metal layer provides an efficient coupling of the memory array in a 3D FPGA to the underlying logic and provides sufficient metal for the power, ground, and global signal routing required in the 3D architecture. A cross-sectional view of a first embodiment of a 3D FPGA in accordance with the present teachings is shown in FIG. 9A. Among them, the metal stubs 9, 2, 904, 906 provide the coupling between the above 134972.doc -52- 200931806 memory array and the following programmable elements. Metal wire 905 907 is positioned between adjacent stubs. A plurality of memory cells 916 are positioned above the coupling metal layer. One of the memory cells 916 outputs a light U to metal stub 902 that is further coupled to one or more of the programmable elements in the following cross-sectional view. The coupling between the memory unit (4) and the metal stub 902 includes a channel 915. Between the metal stubs 2 and 904, a longer metal line 903 running perpendicular to the view is used for power, ground or global control signals. In other embodiments, a plurality of parallel global control wires can be positioned between two adjacent metal stubs. A memory unit 916 can include a plurality of memory elements. It may comprise a plurality of transistors, specifically a plurality of thin film transistors. It may include one or more configurable components capable of providing a logic input to the metal stubs 9〇2. A thin germanium transistor, an inverter, and a memory cell suitable for 3D SRAM construction are illustrated by reference to the incorporated disclosure. The memory unit 916 can include a RAM or ROM memory element. A RAM memory unit 916 can further include additional metal lines (e.g., 917) to fully construct a memory array. A metal line 917 can be positioned over a power and ground metal layer comprising 9〇1 to 908 as shown in Figure 9A. Metal regions 901 and 908 can be used as pad regions for 3D FPGAs. When constructing a system having multiple wafers, a pad area such as one of the 901 shown may need to be bonded to other ic devices. In a specific embodiment, pad regions 901 and 913 may be free of memory components positioned above the pupil regions. In another embodiment, a metal region 913 can be positioned and lumped to the germanium region 901 similar to the metal region 917 above the memory cell 916. This metal region 913 can form a redistribution 134972.doc • 53· 200931806 pad area. The redistribution pad region can be coupled to a particular pad region 901 by a distribution metal layer. In a preferred embodiment, the memory unit 916 forms a regular § memory array over the metal stub array 903/905/907 to form a valley-coupled coupling scheme, the metal stub 9〇3/ The 9〇5/9〇7 system can be further coupled to the underlying programmable element through one of the vertical and horizontal connection lines. In the illustrated construction, each coupling terminates at a high impedance node in the programmable logic circuit and the line capacitance is used to stabilize the control voltage on the configured node. A cross-sectional view of a second embodiment of a 3D fpga in accordance with the present teachings is shown in Figure 9B. Among them, a RAM element (in Fig. 9A) is replaced by a R〇M element. In this particular embodiment, an r〇m component is only connected to a metal supply or a metal connection. An R〇M component can be a hardwired RAM component to always store a specific data value (it is easy to see that the two sides of a latch can be shorted to the power supply and ground supply, so the latch always maintains a specific data value. ). In Figure 9B, metal lines 942, 944 carry electrical power, while metal lines 943, 945 carry ground. The metal stub 932 can be coupled to electrical power (metal wire 942) or ground (metal wire 943). The metal stub 934 can be similarly grounded to power (wire 944) or ground (wire 943). Therefore—custom metal patterns provide configuration for the following programmable components. A separate metal layer comprising lines 942 through 945 as shown in Figure 提供 provides the ability to provide different power voltages to stubs 932, 934 as compared to the underlying logic power voltage. If the same power and ground voltage are sufficient, additional metal layers such as 942 to 945 are not required; instead, the power and grounded power in the wires 933, 935 are used to supply power to the short columns to the required voltage level. . Thus metal 134972.doc •54· 200931806 short columns 932, 9M can be customized to obtain a predetermined data value to stylize the following programmable elements. Between the metal stubs 932 and 934, a longer metal line 933 that runs perpendicular to the view is used for power, ground or global control signals. In other embodiments, a plurality of parallel global metal lines may be positioned between two adjacent metal stubs. The description of the incorporated disclosure demonstrates converting a RAM-based PLD device to a R〇M-based PLD device, both of which preserve a timing characteristic, or achieve a higher performance conversion' or achieve a lower Power conversion. Metal regions 941 and 946 can be used as pad regions for 3D FPGAs. When constructing a system having multiple wafers, a pad area as shown may need to be bonded to other IC devices. In one embodiment, pad regions 941 and 946 can be positioned along the perimeter of the PLD. In another embodiment, the pad regions can be positioned in a grid above the top surface of the PLD. A redistribution metal layer can be used to couple the perimeter pad region (e.g., 931) to the redistributed pad region (e.g., 940) above the metal stub region 932. The metal stubs 932/934 can be further coupled to the underlying programmable elements through one of the vertical and horizontal connection lines. In the illustrated construction, each twist can be terminated at a high impedance node in the logic circuit, and line capacitance can be used to stabilize the control voltage on such capacitor configurable nodes. Another advantage in the current teaching is that there is no switching signal traversing the vertically configured line segment and the configuration line segment can absorb as many detours as needed to maintain the signal integrity of the timing critical line in the FpGA. Figure 10A shows a preferred embodiment of a configuration memory that constructs a programmable element, a programmable interconnect, and a vertical connection. A transistor is used in the module layer 1〇〇1 to construct a circuit. Such circuits include AND, nand, 〇r 134972.doc -55- 200931806 type logic circuits, inverters, buffers, driver type signal recovery circuits, latches, flip-flops, memory type storage circuits, MUX, switches , crossbar type connectivity circuit, LUT, ALU, DSP, CPU type calculation circuit, PLL, DLL, AtoD, DtoA type analog circuit, and ip block. Therefore, the mode group 1001 includes the programmable found in the typical integrated circuit. And non-programmable circuit components. The module layer 101 may include one or more metal layers to provide a level of interconnection among the transistors. The module layer 101 can include one or more configurable components, and/or one or more components that form the configuration circuitry required for the configuration module O - or a plurality of configurable components One of the knives. A plurality of metal interconnects in the module layers, such as 1002, 1〇〇3, and 1〇〇4, are provided to interconnect circuit blocks within the module layer 101. In a preferred embodiment, a plurality of interconnect lines in the module layer 1002 traverse a first direction. A plurality of interconnect lines in the module layer 1003 traverse a second direction orthogonal to the first direction. A plurality of interconnect lines in the module layer 1004 traverse the first direction. Similarly, a plurality of metal module layers are vertically configured to provide enhanced routing between circuit nodes in the module 1001. Such interconnect lines are present but are not shown in Figure 9A. A module layer 1 〇〇 5 includes a plurality of configuration memory cells such as 916 in Figure 9A. (Not shown in Figure 1A, the metal short column layer 9〇1 to 908 from the figure). A configuration memory unit can include a unit cell area 1006. The unit cells are replicated in a contiguous array to construct the module layer 1005. Each of the module layers 1〇〇5 is coupled to one or more programmable elements in the module layer read, which is not shown in Figure i〇a. In order to facilitate this shank, a new Lai metal layout pattern will be discussed. 134972.doc •56- 200931806

諸如购之—金屬模組層包括複數個重複區域。在-區 域内,-第一部分包括實質上較長金屬線。長金屬線可跨 越該第一或第二方向上的整個長度’或該長度的大部分。 在該重複區域内,—第二部分包括實質上短金屬線。短金 屬,可跨越-單位單元_、幾個單位單元讓、或一單 位單7L的》之長度。此等線路可按需要橫穿該第一及 第二方向。此等短線路促進組態記憶體單元與底層可程式 化元件的垂直互連。因此應該注意單元觸垂直地耦合至 金屬模組層10G4中的-短線路,接著耦合至模組層刪中 的一紐金屬線路等等,直至其耦合至模組層1〇〇1中的可程 式化邏輯元件&外’此等短線路促進長線路至模組層 1001中的切換TL件之耦合。例如,若模組層1〇〇3中的一長 線路不得不耦合至模組層1002中的一長線路,則其必須首 先橫穿模組層1〇〇1中的一開關之一第一節點,而且該開關 之一第二節點必須往回橫穿。此線路路徑可載送對該設計 係臨界的切換信號。所示配置允許一線路照字面意思垂直 向下穿過短線路區域以最小化與2D FPGA之較長選路偏移 相關聯的時序延遲。 接著揭示新穎晶片構造之一第二態樣。採用圖10A中所 不的3D結構,在每一個模組層(例如1〇〇2至1〇〇4)中特別製 作包含諸如1006之一單位單元區域的一較小垂直行以包括 垂直對準結構。在圖1 〇B中顯示從最上組態模組層丨〇〇5至 最下邏輯電晶體模組層1〇〇1的一單一單位單元以更詳細地 解說此新穎3D構造。頂部組態記憶體模組層1〇17(類似於 134972.doc •57· 200931806For example, the metal module layer includes a plurality of repeating regions. Within the - region, the first portion includes substantially longer metal lines. The long metal wire may span the entire length ' or the majority of the length in the first or second direction. Within the repeating region, the second portion includes substantially short metal lines. Short metal, can span the length of - unit unit _, several unit units, or one unit single 7L. These lines can traverse the first and second directions as needed. These short lines facilitate the vertical interconnection of the configuration memory cells with the underlying programmable elements. Therefore, it should be noted that the cell touch is vertically coupled to the -short line in the metal module layer 10G4, and then coupled to the one-metal metal line of the module layer, etc. until it is coupled to the module layer 1〇〇1. The stylized logic elements & externally these short lines facilitate the coupling of long lines to the switching TLs in the module layer 1001. For example, if a long line in the module layer 1〇〇3 has to be coupled to a long line in the module layer 1002, it must first traverse one of the switches in the module layer 1〇〇1. The node, and one of the switches, the second node must cross back. This line path can carry a critical switching signal to the design. The configuration shown allows a line to literally pass vertically down the short line area to minimize the timing delay associated with the longer routing offset of the 2D FPGA. A second aspect of one of the novel wafer configurations is then disclosed. Using a 3D structure not shown in FIG. 10A, a smaller vertical line including a unit cell area such as 1006 is specifically formed in each of the module layers (for example, 1〇〇2 to 1〇〇4) to include vertical alignment. structure. A single unit cell from the uppermost configuration module layer 丨〇〇5 to the lowermost logic transistor module layer 〇〇1 is shown in Figure 1 〇B to illustrate this novel 3D configuration in more detail. Top configuration memory module layer 1〇17 (similar to 134972.doc •57· 200931806

圖9 A中的912)現在包括一單一記憶體單元。其可以係一 4T912) in Figure 9A now includes a single memory unit. It can be a 4T

或6T或8T SRAM單元,或任何其他記憶體元件。在圖10B 中,基於解說目的而顯示圖7C及圖7D之8T-SRAM單元。 金屬層1016(與圖9A中的901至908相同,其未在圖10A中加 以顯示)包括如圖9A中所示的金屬短柱902、904。模組層 1016中的金屬短柱係耦合至模組層丨〇丨7中的sram單元輸 出(耦合未加以顯示)。模組層1016中的金屬線跨越整個長 參 度,因此重複單元形成一長金屬線。在其他具體實施例 中’可在模組層1 〇 16中構造複數個較長並聯金屬線。類似 於模組層1016但具有在正交於模組1〇16中的金屬之方向上 運行的金屬之另一模組層係定位於模組1〇16下方。基於方 便,圖10B中未顯示該模組層。模組層1〇15中的線路經配 置用以包括一第一區域以及一第二區域。在該第一區域 中,複數個線路彼此並聯地運行該單位單元的整個長度。 當在一陣列中重複該等單元時,此等線路形成長線路❹在 該第二區域中,複數個線路運行部分單元距離。此等線路 係用於區域互連,而且可按需要不在特定預選定方向上運 行。同樣地,模組層1〇14至1012中的單位單元具有類似的 線路配置。在一較佳具體實施例中’垂直鄰近模組層中的 長線路係配置為彼此正2。在其他具體實施{列中,前二個 連續模組層可具有並聯長互連,而後二個連續模組: 有正交於該前二個連續模組層的並聯長互連。模組層咖 下方的金屬層未在圖10B中加以顯示而且可以想 包括在模組層1011中。在模組層1011 _ 隹这早7L内定位 134972.doc -58- 200931806 一或多個電晶體。此係一非重複幾何結構。包含不相同元 件的複數個單位單元幾何結構(例如1011)形成佔用圖i〇a 中的模組層1001之完整邏輯區塊。因此一重複金屬及組態 單元完全麵合並組態圖10之模組1011及模組1001中的隨機 定位之可程式化元件之一系統。 因此圖1 0A中的一垂直組態之可程式化邏輯裝置(PLD) 包括:一單位單元1006’其中該單位單元邊界包括—第一 方向上的一第一尺寸(例如圖8中的8〇5)以及正交於該第一 方向之一第二方向上的一第二尺寸(例如圖8中的8〇4);以 及組態圮憶體單元1 〇〇5之一陣列,該陣列係藉由將一記憶 體單元放置在單位單元1006邊界内並複製該單位單元以形 成該記憶體陣列來構造;以及複數個可程式化元件,其係 定位於實質上類似於組態記憶體單元陣列丨〇〇5之幾何結構 的幾何結構1001中;以及第一金屬單元1 〇〇4之一陣列, 該陣列係藉由複製一陣列中的該單位單元丨〇〇6尺寸之一第 金屬單元而構造,該第一金屬單元進一步包含:一第一 區域,其具有一或多個並聯金屬匯流排線(例如圖8中單位 單元803内的802),一匯流排線在該第一或第二方向上的 相對單元邊界之間延伸以形成一全通匯流排線路;以及一 第一區域,其具有粞合至定位於該第一金屬短柱上方的一 組態記憶體單元之一金屬短柱(例如圖8中單位單元8〇3内 的801)以及疋位於該第一金屬短柱下方的該等可程式化元 件之一或多者。 圖10A之裝置進—步包括:第二金屬單元1〇〇3之一陣 134972.doc •59- 200931806 列,該陣列係藉由複製一陣列中的該單位單元1006尺寸之 一第二金屬單元來構造,該第二金屬單元進一步包含:一 第一區域,其具有二或多個並聯金屬線,一金屬線在該第 一或第二方向上的相對單元邊界之間延伸以形成全域選路 線路,以及一第二區域,其具有金屬短柱及金屬線以促進 組態記憶體單元及信號之垂直選路。圖1〇B中顯示垂直定 位的單位單元。 圖10B中的單位單元包括:一基板區域1〇11,其包含具 有可程式化元件的電路區塊之一部分;以及一組態記憶體 單元1017’其係耦合至該等可程式化元件之一或多者,其 中:該記憶體單元係實質上定位於該基板區域之上;而且 該s己憶體單元以及基板區域幾何結構係實質上類似的。該 單位單7L進一步包括:一金屬單元1〇16,其具有組態記憶 體單元10 17尺寸;以及一金屬短柱,其係耦合至組態記憶 體單元1017以及該等可程式化元件之一或多者,其中:該 金屬單元係定位於該記憶體單元下方及該基板區域上方; 而且该金屬單元進一步包括鄰近於該金屬短柱的一或多個 金屬線。 為了構造較大可程式化邏輯瓦,以一陣列形式進一步重 複圖10A之結構。因此必須由模組層丨〇〇5中的組態單元密 度滿足區域1001之每一個程式化需求。現在記憶體單元之 有效率定位的陣列可採用垂直耦合組態方案有效地組態隨 機定位之可程式化元件。當以陣列形式重複圖1〇A中的結 構時,產生較大有效率定位之記憶體單元陣列,此類陣列 134972.doc -60- 200931806 有效率地程式化較低織物中的較高密度之可程式化元件。 IDS參考中揭示先前技術FPGA產品通常將可程式化邏輯 區塊與ip核心組合。每一 FPGA賣主將一較佳位置處的ιρ 區塊疋位於可程式化邏輯織物内並將1?及邏輯皆耦合至互 連矩陣。接著揭示新穎3D產品中的此IP整合。圖iiA顯示 一第一可程式化邏輯瓦11〇1、一第二可程式化邏輯瓦11〇3 以及定位於該二個可程式化邏輯瓦之間的ιρ區塊丨〖〇2。可 程式化邏輯瓦1101可包括複數個可程式化邏輯單元 1101a ’該可程式化單元包含具有可程式化邏輯元件以及 可程式化選路元件的可程式化元件。在一較佳具體實施例 中’瓦1101係藉由複製一陣列中的一單位邏輯單元U01a 來構造。雖然圖11A基於解說目的而顯示一 3x3陣列,但是 該瓦可具有較小或較大數目的單位邏輯單元》IP區塊U 〇2 包括三個區域:鄰近於瓦11〇1的一第一區域11〇2a、一第 二中心區域1102b、以及鄰近於瓦11 〇3的一第三區域 1102c。進一步構造該IP區塊,因此區域11〇2b實質上不含 任何可程式化元件。作為一範例,若IP區塊丨1〇2係一雙埠 記憶體區域,則區域11 〇2b可包括複數個雙埠記憶體位 元’整個區域不包含耦合至組態記憶體位元的可組態節 點。在區域11 02a及11 〇2c中配置組態IP區塊1102需要的所 有組態元件。因此IP區塊11 02中的區域11 〇2a包括複數個 可程式化元件,例如邏輯及選路元件,一或多個該等元件 係耦合至一組態記憶體單元。同樣地IP區塊1102中的區域 1102c包括複數個可程式化元件,例如邏輯及選路元件, 134972.doc -61· 200931806 一或多個該等元件係耦合至一組態記憶體單元。在雙埠記 憶體ip之範例中,此類組態位元可提供改變該記憶體區塊 之寬度及深度的能力。此類組態位元可進一步提供用以將 複數個實體6己憶體區塊組合成一單一邏輯記憶體區塊。此 一配置之優點將在構造組態記憶體以程式化此等可程式化 元件期間變得清楚。 圖11Β顯示用以程式化可程式化瓦、11〇3以及ip區 塊1102中的邏輯元件之組態記憶體構造。該組態記憶體配 置具有三個區域:包含組態記憶體位元的區域丨丨丨丨及 1113 ’以及明顯不含任何組態記憶體位元的區域u丨2。區 域mi中的記憶體位元之一第一部分程式化瓦11〇1中的可 程式化元件。區域1111中的記憶體位元之一第二部分程式 化IP區塊11 02之區域11 02a中的可程式化元件。區域jin中 的二個記憶體位元部分組合以形成單元之一個鄰接陣列; 1111 a中所示的一單一記憶體單元。與二個分離的記憶體 £塊或隨機s己憶體相比,此形成一極有效率的較大記恨體 單元陣列。因此不像先前技術組態記憶體配置一樣,以所 說明的方式構造IP區塊並將一可程式化瓦定位成鄰近於該 IP區塊允許該等電路組件之二者中的隨機定位之可程式化 元件藉由記憶體元件之一單一鄰接陣列來程式化^容易注 意區域1113中的記憶體元件之鄰接陣列程式化ιρ區域 1102c以及可程式化瓦11〇3中的所有可程式化元件。 圖11C顯示3D垂直定位該組態記憶體平面於該可程式化 瓦以及IP區塊上方。基於簡單而未顯示具有互連的垂直組 134972.doc -62· 200931806 態(例如圖10A及10B中的層1012至1015)。此類互連包括通 道及線路結構,其耦合該組態平面中的一單一組態位元 (1111及1113)至该石夕平面中的一或多個可程式化元件(no】 及 1102a、1102c、11〇3)。應進一步注意 1112與11〇21?之間 的垂直區域係用於互連層中以定位需要較大金屬區域的寬 電力及接地匯流排。在一第一具體實施例中,丨〗丨2與 1102b之間的垂直區域亦包括將資料寫入組態記憶體平面 及矽平面並從其讀取資料所需要的驅動器電路組件以及佈 線組件。因此,圖1 〇C之三維可程式化邏輯裝置(pLD)包 括:一或多個智慧財產(IP)核心1102,每一 ip核心包含: 一固定電路區域11 〇2b,以及一可程式化電路區域n 〇2a, 其具有用以組態該IP核心的複數個可程式化元件;以及一 可程式化邏輯區塊陣列區域11 〇 1,其包含:經複製用以形 成該陣列的複數個實質上相同可程式化邏輯區塊(例如圖 11A中的11〇1 a),每一該邏輯區塊進一步包含複數個可程 式化元件;以及一可程式化區域(由^(^及丨丨〇2&組成的區 域),其包含該可程式化邏輯區塊陣列區域之隨機定位的 可程式化元件以及該等IP區塊可程式化電路區域之一或多 者;以及一組態記憶體陣列1111 ’其包含經複製用以構造 該陣列的一組態記憶體單元(例如圖丨1B中的i丨丨la), 一記 憶體單元係耦合至該可程式化區域中的該等可程式化元件 之一或多者,該記憶體陣列程式化該可程式化區域,其 中:記憶體陣列11 11係實質上定位於該可程式化區域上 方;而且該記憶體陣列幾何結構係實質上類似於該可程式 134972.doc -63- 200931806 化區域。 圖12解說組合複數個可程式化瓦以及11?區塊以達到依據 當前教示的三維垂直組態優點。圖12a顯示四個可程式化 瓦1201、1203、1207及1209之佈局配置,每一瓦包含如圖 7B中所示的複數個可程式化邏輯區塊。因此該等瓦之每一 者係類似於圖11A中所示的瓦iioi及11〇3。瓦12〇ι、 1203、1207及1209之每一者進一步包括隨機定位於該瓦之 實質上矩形幾何結構上的複數個可程式化元件,每一該可 程式化元件係構造於該矽基板層上。圖12A進一步顯示五 個 IP 區塊 1202、1204、1205、1206及 1208。實質上矩形 ip 區塊包含與該等可程式化瓦匹配的幾何結構,因此當定位 於如圖12 A中所示的可程式化瓦之間時,組合的幾何結構 包括所示的一實質上矩形幾何結構。因此圖12A解說一極 緊密且仔細製作的矽基板覆蓋區,其與組合指定的電路區 塊之其他方法相比達到明顯較小的Si覆蓋區^ ip區塊 1202、1204、1206及1208係在構造上類似於圖ha中所論 述的IP區塊11 02。在一個範例中,其可以係如圖〗丨a中所 示的相同功能性之四個類似IP區塊11 〇2。在另一個範例 中’其可以係四個不同功能IP區塊,每一區塊係以圖11A 中說明的方式來構造。IP區塊12 02、1204、1206及1208之 每一者包括諸如可程式化邏輯元件及/或可程式化選路元 件的可程式化元件與不可程式化電路組件。在IP區塊12〇2 中’該等可程式化元件係定位於區域1202a及1202c中,而 該等不可程式化電路組件係定位於區域12〇2b中。IP區塊 134972.doc •64· 200931806 1202係定位於可程式化瓦1201與1203之間,因此區域 1202a係鄰近於瓦1201,而且區域1202c係鄰近於如圖12A 中所示的瓦1203。在圖12A中,可看出IP區塊1204係定位 • 於可程式化瓦1201與1207之間,因此區域1204a係鄰近於 - 瓦1201,而且區域1204c係鄰近於瓦1207。在圖12A中,可 看出IP區塊1206係定位於可程式化瓦1203與1209之間,因 此區域1205a係鄰近於瓦1203,而且區域1206c係鄰近於瓦 1209。在圖12A中’可看出IP區塊1208係定位於可程式化 ® 瓦1207與1209之間,因此區域1208a係鄰近於瓦1207,而 且區域1208c係鄰近於瓦1209。構造IP區塊1205,因此其 包括四個邊角區域1205&、1205。、1205(1及12056中的可程 式化元件,同時具有如圖12A中所示之其餘區域1205b中的 不可程式化電路組件。將IP區塊定位於圖12A中的中心處 時,該等邊角可程式化區域之每一者與相鄰可程式化區域 組合以形成一鄰接較大可程式化區域。例如,區域丨2〇 1、 l202a、l205a以及1204a形成一第一可程式化象限,其包 ❹ 含該區域内的隨機定位之可程式化元件。同樣地,區域 1203、1202c、1205e以及1206a形成一第二可程式化象 ' 限’其包含該區域内的隨機定位之可程式化元件。同樣 地,區域1209、1206c、1205d以及1208c形成一第三可程 式化象限’其包含該區域内的隨機定位之可程式化元件。 最終’區域1207、1204c、1205c以及1208a形成一第四可 程式化象限’其包含該區域内的隨機定位之可程式化元 件。在圖12A中可看出,區域1204b、1205b、1202b、 134972.doc -65- 200931806 1206b及1208b中的不可程式化電路組件組合以形成水平及 垂直循跡於該四個可程式化象限之間。因此圖12A表示包 含可程式化瓦及IP區塊的一 3D半導體裴置之一 Si基板部分 ' (或一 “基板區域)。該3D半導體裝置中可存在許多此類區 - 域。 圖12B中顯示用以程式化圖12A中的可程式化元件之垂 直定位的組態記憶體元件。存在四個鄰接組態記憶體陣列 1211、1213、1219及1217’每一者分別程式化圖12A之該 © 等第一、第二、第三及第四象限中的可程式化元件。圖 12B中新穎的係組態記憶體元件形成一鄰接陣列丨2丨】以程 式化下面複數個變化電路中的可程式化元件:瓦1201中的 可程式化元件、IP區塊區域1202a、1205a及1204a(自三個 不同IP區塊)中的可程式化元件所採用的方式。此允許鄰 接組態記憶體陣列之極有效率佈局程式化預隔離的底層可 程式化元件以使可程式化邏輯瓦與可程式化邏輯裝置中遇 ©到的IP區塊之整合可行。圖12B中的區域1212實質上不含 組態S己憶體元件。此類區域係用於電力及接地分配所需要 的寬金屬循跡,以及寫入/讀取資料至該垂直組態記憶體 ' 層所需要的電路組件。 圖12C中顯示圖12A及圖12B之3維構造。其中,圖12A形 成一第一電路層於底部上,而圖12B形成該一第二電路層 於該第一層之頂部上。可容易想像可倒轉該等層位置。在 該二層之間可存在複數個金屬層,此類層基於簡單而未在 圖12C中加以顯示。此外,可容易想像金屬層可存在於所 134972.doc -66· 200931806 不的頂部層上方’或者所示的二層之間可以不存在金屬 層。在一給定象限中,一組態記憶體元件係耦合至同一象 限下面的一或多個可程式化元件。鄰接地配置於該第一象 限之一陣列令的記憶體元件可完全(或接近完全)組態隨機 刀配於底部層上之該第一象限中的可程式化元件。此等可 程式化元件可屬於諸如可程式化邏輯電路、”電路以及 I/O電路的電路區塊之組合。因此,圖12A至C顯示一三維 可程式化邏輯裝置(PLD)之一部分,#包含:一可程式化 © 邏輯區塊⑽4e、12G5e、12G7及12G9a),其具有隨機定位 於該邏輯區塊内的複數個可組態元件;以及組態記憶體單 7L 1217之一第一陣列,其具有經複製用以構造該第一陣列 的一組態記憶體單元(例如圖i 1B中的記憶體單元丨丨丨丨a), 一圮憶體單元係耦合至該等可組態元件之一或多者,該第 一陣列中的複數個記憶體單元係耦合至邏輯區塊中的該複 數個可組態元件以程式化該邏輯區塊至一使用者說明書; ❹ 其中,該第一陣列1207以及該可程式化邏輯區塊(12〇4c、 1205c、1207及1209a)具有一實質上類似的佈局幾何結 構’而且該第一陣列係實質上定位於該邏輯區塊之上。 圖13A及B顯示一新穎3D PLD。圖13B係用以較佳解說 該等電路區塊的圖13A之一部分的放大圖《基於解說目 的’僅顯示典型PLD中遇到的幾個組件。圖13顯示諸如 1305之複數個可程式化I/O單元、諸如13〇4之複數個可程 式化IP區塊、諸如1303a一 1或1303a_2或1303a_3之複數個 邏輯區塊。該邏輯區塊可以係一邏輯單元或一邏 134972.doc -67· 200931806 輯區塊(1303a_2)或一邏輯陣列區塊(1303a—3)。因此,圖 13係一三維可程式化邏輯裝置(PLD),其包含:複數個j/〇 單元1305,每一 I/O單元包含:一固定電路區域(1305a及 - 1305b);以及一可程式化電路區域(1305c),其具有用以組 4 態該I/O單元(1305)的複數個可程式化元件;以及一或多個 智慧財產(IP)核心1304 ’每一 IP核心包含:一固定電路區 域(1304b);以及一可程式化電路區域(1304a或1304b),其 具有用以組態該IP核心的複數個可程式化元件;以及一可 © 程式化邏輯區塊陣列區域(1303a—3),其包含:經複製用以 形成該陣列的複數個實質上相同的可程式化邏輯區塊 (1303a一 2或1303 a_l) ’每一該邏輯區塊進一步包含複數個 可程式化元件’以及·可程式化區域1303a,其包含該可 程式化邏輯區塊陣列區域13 03a_3之隨機定位的可程式化 元件,ip核心可程式化電路區域之一或多者(例如1304a, 但是鄰近於1303a_3)以及I/O單元可程式化電路區域之一或 φ 多者(例如13〇k,但是鄰近於1303a_3);以及一組態記憶 體陣列1313a,其包含經複製用以構造該陣列的一組態記 憶體單兀131 3a_l,一記憶體單元係耦合至該該可程式化 區域中的該等可程式化元件之一或多者,記憶體單元 13 13a程式化可程式化區域丨3〇3a,其中:該記憶體陣列係 實質上定位在該可程式化區域之上,而且該記憶體陣列以 及可程式化區域幾何結構係實質上相同的。 在一項具體實施例中,諸如3D pld或3D FPGA之一 3D 裝置提供共用接針以減少接針計數並因此減少成本。在其 134972.doc •68· 200931806 他具體實施例中,-或多個組態信號係採用該扣裝置之輸 輸出接針而多王以提供多功能接針m,該多功 月匕接針係相合至至少—個輸入緩衝器輸入,以及至少一個 輸出緩衝器輸出。輸入緩衝器之輸出可麵合至一可程式化 ΜυΧ電路,而至輸出緩衝器的輸入可輕合至該扣裝置之 -電路。-或多個緩衝器及可程式化驗可組態以達到_ 高阻抗狀態(ΑΚΑ三態)。該等緩衝器及廳X可藉由组態纪 憶體以及内部及外部控制信號來組態,該等外部信號係透 過其他多功能接針接收。因此該等緩衝器之輸出係與個別 控制信號並聯耗合,因此共用接針之每一者從該緩衝器接 2:控制信號以及一輸出二者。為回應一控制信號,該緩 /之輸出係停用的(即,三態),因此外部組態資料(例如 自:增壓峨)係從共用接針讀取至該晶片上的— ❹ =記憶體(例如SRAM)中。當進行該組態中,該 叙合至該3°晶片之另-輸入或輸出。簡言之,可由„3D :曰片控制器接收組態信號以回應相同節 (例如重設),續黧銪朴及1^ 的其他裝置計 其他時間與該控制器外部 一控制器之祖^因此,可極大減少使用各種組態信號的 2 ° δ十數。在另一項具體實施例中,提供一多 針以處置電力及時脈輸入。在此具體實施例中,一 時Ms號經嵌入用以調變一 從該卿置内的電力接針=振盛内的電力接針。隨後 施例中,提供一夕 取時脈資訊。在另一項具體實 進行其他接: > 功月巨接針以處置電力及重設輸入。亦可 進仃其他接針共用配置 I34972.doc -69· 200931806 在另一㉟具體實施例中,該裝置中之接針可經組態用以 最佳化至該晶片的接地及電力分配。例如,該裝置可在一 或多個輸入/輸出接針之中心處具有—大接地或電力區域 而且該接針包含耦合至該等區域的可組態構件。 在藉由參考併入的揭示内容中說明依據當前教示的一 3D ic之製造。基於完全而提供一簡要說明。藉由利用一asic 製造中使用的標準邏輯程序流程來形成用於可程式化及固 定電路元件的電晶體及選路。在構造一特定互連層之後, 將用於形成3D組態記憶體元件的額外處理步驟插入至邏輯 流程中。本文中使用的下列術語係與某些製程相關聯的縮 寫字。縮寫字及其縮寫係如下: VT 臨限電壓 LDN 輕度摻雜NMOS汲極 LDP 輕度摻雜PMOS汲極 LDD 輕度摻雜汲極 RTA 快速熱退火 Ni 鎳 Ti 鈦 TiN 氮化鈦 W 鶴 s 源極 D 汲極 G 閘極 ILD 層間介電質 134972.doc -70- 200931806 IMD 金屬間介電質Or a 6T or 8T SRAM cell, or any other memory component. In Fig. 10B, the 8T-SRAM cells of Figs. 7C and 7D are displayed for illustrative purposes. Metal layer 1016 (same as 901 through 908 in Figure 9A, which is not shown in Figure 10A) includes metal stubs 902, 904 as shown in Figure 9A. The metal stubs in the module layer 1016 are coupled to the sram unit outputs in the module layer 7 (coupling not shown). The metal lines in the module layer 1016 span the entire long dimension, so the repeating unit forms a long metal line. In other embodiments, a plurality of longer parallel metal lines can be constructed in the module layer 1 〇 16. Another module layer similar to the module layer 1016 but having metal running in the direction orthogonal to the metal in the module 1〇16 is positioned below the module 1〇16. For convenience, the module layer is not shown in Figure 10B. The lines in the module layer 1〇15 are configured to include a first area and a second area. In the first region, a plurality of lines run the entire length of the unit cell in parallel with each other. When the units are repeated in an array, the lines form a long line ❹ in the second area, and the plurality of lines operate a portion of the unit distance. These lines are used for regional interconnections and can be operated in a specific pre-selected direction as needed. Similarly, the unit cells in the module layers 1〇14 to 1012 have similar line configurations. In a preferred embodiment, the long line systems in the 'vertical adjacent module layers are configured to be positive 2 to each other. In other embodiments {column, the first two consecutive module layers may have parallel long interconnects, and the last two consecutive modules: there are parallel long interconnects orthogonal to the first two consecutive module layers. The metal layer under the module layer is not shown in Figure 10B and may be included in the module layer 1011. Position one or more transistors 134972.doc -58- 200931806 within 7L of the module layer 1011 _ 早. This is a non-repetitive geometry. A plurality of unit cell geometries (e.g., 1011) containing different elements form a complete logical block occupying the module layer 1001 in Figure i〇a. Therefore, a repeating metal and configuration unit is fully integrated with one of the modules 1011 of FIG. 10 and one of the randomly configurable programmable elements in the module 1001. Thus, a vertically configured programmable logic device (PLD) in FIG. 10A includes: a unit cell 1006' wherein the unit cell boundary includes a first dimension in the first direction (eg, 8 in FIG. 8). 5) and a second dimension orthogonal to the second direction of the first direction (eg, 8〇4 in FIG. 8); and an array of configured memory cells 1 〇〇5, the array Constructed by placing a memory cell within the boundary of unit cell 1006 and copying the unit cell to form the memory array; and a plurality of programmable elements positioned substantially similar to the array of configuration memory cells An array of geometric structures 1001 of 丨〇〇5; and an array of first metal elements 1 〇〇4, the array being replicated by one of the unit cells 丨〇〇6 in the array The first metal unit further includes: a first region having one or more parallel metal bus bars (such as 802 in the unit cell 803 in FIG. 8), and a bus bar at the first or second Relative cell boundary Extending to form an all-way busbar line; and a first region having a metal stub coupled to one of the configuration memory cells positioned above the first metal stub (eg, unit cell in Figure 8) 801) in 8〇3 and one or more of the programmable elements located below the first metal stub. The apparatus of FIG. 10A further includes: a second metal unit 1〇〇3 array 134972.doc • 59- 200931806, the array is by copying one of the unit cells 1006 in the array to the second metal unit The second metal unit further includes: a first region having two or more parallel metal lines, a metal line extending between opposite cell boundaries in the first or second direction to form a global routing circuit And a second region having metal stubs and metal lines to facilitate vertical routing of the configuration memory cells and signals. The unit of vertical positioning is shown in Figure 1B. The unit cell in FIG. 10B includes: a substrate region 1〇11 including a portion of a circuit block having a programmable element; and a configuration memory unit 1017' coupled to one of the programmable elements Or more, wherein: the memory cell is substantially positioned above the substrate region; and the s-resonant cell and the substrate region geometry are substantially similar. The unit unit 7L further includes: a metal unit 1 〇 16 having a configuration memory unit 10 17 size; and a metal stub coupled to the configuration memory unit 1017 and one of the programmable elements Or more, wherein: the metal unit is positioned below the memory unit and above the substrate area; and the metal unit further comprises one or more metal lines adjacent to the metal stub. To construct a larger programmable logic tile, the structure of Figure 10A is further repeated in an array. Therefore, each of the stylized requirements of the region 1001 must be satisfied by the configuration unit density in the module layer 丨〇〇5. The array of efficiently positioned memory cells can now effectively configure the programmable components of random positioning using a vertically coupled configuration scheme. When the structure of Figure 1A is repeated in an array, resulting in a more efficient positioning of the memory cell array, such an array 134972.doc -60- 200931806 efficiently stylizes the higher density in the lower fabric Programmable components. The IDS reference reveals that prior art FPGA products typically combine a programmable logic block with an ip core. Each FPGA vendor places the ιρ block at a preferred location within the programmable logic fabric and couples both the logic and the logic to the interconnect matrix. This IP integration in the novel 3D product is then revealed. Figure iiA shows a first programmable logic tile 11〇1, a second programmable logic tile 11〇3, and an ιρ block 丨〇2 positioned between the two programmable logic tiles. The programmable logic tile 1101 can include a plurality of programmable logic cells 1101a'. The programmable cells include programmable components having programmable logic elements and programmable routing elements. In a preferred embodiment, the tile 1101 is constructed by duplicating a unit of logic unit U01a in an array. Although FIG. 11A shows a 3×3 array for illustrative purposes, the tile may have a smaller or larger number of unit logic cells. The IP block U 〇 2 includes three regions: a first region adjacent to the tile 11〇1. 11〇2a, a second central region 1102b, and a third region 1102c adjacent to the tile 11〇3. The IP block is further constructed such that the area 11〇2b contains substantially no programmable elements. As an example, if the IP block 丨1〇2 is a double-byte memory area, the area 11 〇2b may include a plurality of double-turn memory bits. The entire area does not include a configurable coupling to the configuration memory bit. node. All configuration elements required to configure IP block 1102 are configured in areas 11 02a and 11 〇 2c. Thus, area 11 〇 2a in IP block 102 includes a plurality of programmable elements, such as logic and routing elements, one or more of which are coupled to a configuration memory unit. Similarly, area 1102c in IP block 1102 includes a plurality of programmable elements, such as logic and routing elements, 134972.doc - 61. 200931806 One or more of these elements are coupled to a configuration memory unit. In the example of the ip 埠 ip ip, such a configuration bit can provide the ability to change the width and depth of the memory block. Such configuration bits can be further provided to combine a plurality of entity 6 memory blocks into a single logical memory block. The advantages of this configuration will become apparent during the construction of the configuration memory to stylize these programmable elements. Figure 11 shows the configuration memory structure used to program the programmable elements, the 11〇3, and the logic elements in the ip block 1102. The configuration memory configuration has three areas: the area containing the configuration memory bits and 1113 ' and the area u丨2 which is clearly free of any configured memory bits. The first part of the memory bit in the region mi is a stylized component of the stylized tile 11〇1. The second portion of the memory bit in region 1111 is a programmable element in the region 11 02a of the programmed IP block 117. The two memory bit portions in region jin are combined to form an contiguous array of cells; a single memory cell as shown in 1111a. This results in a very efficient array of larger hate units compared to two separate memory blocks or random s. Thus, unlike prior art configuration memory configurations, constructing an IP block in the manner illustrated and positioning a programmable tile adjacent to the IP block allows for random positioning in both of the circuit components. The stylized component is programmed by a single contiguous array of memory components. It is easy to note that the adjacent array of stylized ιρ regions 1102c of the memory components in region 1113 and all of the programmable components in the programmable tiles 11〇3. Figure 11C shows the 3D vertical positioning of the configuration memory plane above the programmable tile and the IP block. The vertical group 134972.doc - 62 · 200931806 state (e.g., layers 1012 through 1015 in Figures 10A and 10B) is shown based on simplicity. Such interconnects include channel and line structures that couple a single configuration bit (1111 and 1113) in the configuration plane to one or more programmable elements (no) and 1102a in the plane 1102c, 11〇3). It should be further noted that the vertical area between 1112 and 11〇21? is used in the interconnect layer to locate wide power and ground busbars that require larger metal areas. In a first embodiment, the vertical area between 丨 丨 2 and 1102b also includes the driver circuit components and wiring components required to write data to and read data from the configuration memory plane and the 矽 plane. Thus, the three-dimensional programmable logic device (pLD) of FIG. 1C includes: one or more intellectual property (IP) cores 1102, each ip core comprising: a fixed circuit area 11 〇 2b, and a programmable circuit a region n 〇 2a having a plurality of programmable elements for configuring the IP core; and a programmable logic block array region 11 〇 1 comprising: a plurality of entities replicated to form the array The same programmable logic block (for example, 11〇1 a in FIG. 11A), each of the logic blocks further includes a plurality of programmable elements; and a programmable area (by ^(^和丨丨〇) 2&a region comprising: a randomly locating programmable element of the programmable logic block array region and one or more of the IP block programmable circuit regions; and a configuration memory array 1111 'which includes a configuration memory unit (eg, i丨丨la in FIG. 1B) that is replicated to construct the array, the memory unit being coupled to the programmable portion of the programmable region One or more of the components, the record The memory array stylizes the programmable region, wherein: the memory array 11 11 is substantially positioned above the programmable region; and the memory array geometry is substantially similar to the programmable 134972.doc -63 - 200931806 Areas. Figure 12 illustrates the combination of a plurality of programmable tiles and 11? blocks to achieve the three-dimensional vertical configuration advantages according to the current teaching. Figure 12a shows the layout of four programmable tiles 1201, 1203, 1207 and 1209 Configuration, each watt contains a plurality of programmable logic blocks as shown in Figure 7B. Thus each of the tiles is similar to the tiles iioi and 11 〇 3 shown in Figure 11A. Each of 1203, 1207, and 1209 further includes a plurality of programmable elements randomly positioned on the substantially rectangular geometry of the tile, each of the programmable components being constructed on the substrate layer. Further shown are five IP blocks 1202, 1204, 1205, 1206, and 1208. The substantially rectangular ip block contains a geometry that matches the programmable tiles, and thus is positioned as shown in Figure 12A. Between tiles The combined geometry includes a substantially rectangular geometry as shown. Thus, Figure 12A illustrates a very tight and carefully fabricated germanium substrate footprint that is significantly smaller than other methods of combining specified circuit blocks. The Si coverage areas ip blocks 1202, 1204, 1206, and 1208 are similar in construction to the IP block 102 discussed in Figure ha. In one example, it may be as shown in Figure 丨a Four similar IP blocks 11 〇 2 of the same functionality. In another example, 'they can be four different functional IP blocks, each of which is constructed in the manner illustrated in Figure 11A. Each of the IP blocks 12 02, 1204, 1206, and 1208 includes programmable elements and non-programmable circuit components such as programmable logic elements and/or programmable routing elements. In the IP block 12〇2, the programmable elements are located in regions 1202a and 1202c, and the non-programmable circuit components are located in the region 12〇2b. The IP block 134972.doc • 64· 200931806 1202 is positioned between the programmable tiles 1201 and 1203 such that the region 1202a is adjacent to the tile 1201 and the region 1202c is adjacent to the tile 1203 as shown in Figure 12A. In Figure 12A, it can be seen that the IP block 1204 is positioned between the programmable tiles 1201 and 1207 such that the region 1204a is adjacent to the tile 1201 and the region 1204c is adjacent to the tile 1207. In Figure 12A, it can be seen that IP block 1206 is positioned between programmable tiles 1203 and 1209, such that region 1205a is adjacent to tile 1203 and region 1206c is adjacent to tile 1209. It can be seen in Figure 12A that the IP block 1208 is positioned between the programmable ® tiles 1207 and 1209 such that the region 1208a is adjacent to the tile 1207 and the region 1208c is adjacent to the tile 1209. The IP block 1205 is constructed so that it includes four corner regions 1205 & 1205. 1205 (a programmable element in 1 and 12056, having a non-programmable circuit component in the remaining region 1205b as shown in Figure 12A. When the IP block is positioned at the center in Figure 12A, the equal edge Each of the angularly programmable regions is combined with an adjacent programmable region to form a contiguous larger programmable region. For example, regions 丨2, l202a, l205a, and 1204a form a first programmable quadrant. It includes a randomly configurable programmable element within the region. Similarly, regions 1203, 1202c, 1205e, and 1206a form a second programmable image 'limit' that includes stylized random positioning within the region. Similarly, regions 1209, 1206c, 1205d, and 1208c form a third programmable quadrant that includes randomly located programmable elements within the region. Finally, 'regions 1207, 1204c, 1205c, and 1208a form a fourth. Programmable quadrant 'which contains randomly located programmable elements within the region. As can be seen in Figure 12A, no in regions 1204b, 1205b, 1202b, 134972.doc -65- 200931806 1206b and 1208b The stylized circuit components are combined to form horizontal and vertical tracking between the four programmable quadrants. Thus, Figure 12A shows a Si substrate portion of a 3D semiconductor device comprising a programmable tile and an IP block (or A "substrate area." There may be many such area-domains in the 3D semiconductor device. Figure 12B shows a configuration memory element for programming the vertical positioning of the programmable elements of Figure 12A. There are four adjacencies The configuration memory arrays 1211, 1213, 1219, and 1217' each program the programmable elements in the first, second, third, and fourth quadrants of Fig. 12A, etc. The novel system in Fig. 12B The configuration memory elements form an contiguous array to program the programmable elements in the plurality of varying circuits: the programmable elements in the tiling 1201, the IP block areas 1202a, 1205a, and 1204a (from three The way in which the programmable elements in different IP blocks are used. This allows extremely efficient layout of the adjacent configuration memory arrays to program the pre-isolated underlying programmable elements to make the programmable logic tiles and programmable logic The integration of the IP block to which the access is made is feasible. The area 1212 in Figure 12B is substantially free of the configuration S memory element. This type of area is used for wide metal tracking required for power and ground distribution, and Write/read data to the circuit components required for the vertical configuration memory layer. Figure 3C shows the 3-dimensional configuration of Figures 12A and 12B, wherein Figure 12A forms a first circuit layer on the bottom, and Figure 12B forms the second circuit layer on top of the first layer. It is easy to imagine that the layers can be reversed. There may be a plurality of metal layers between the two layers, such layers being simple based and not shown in Figure 12C. Furthermore, it is readily conceivable that the metal layer may be present above the top layer of 134972.doc -66.200931806 or that there may be no metal layer between the two layers shown. In a given quadrant, a configuration memory element is coupled to one or more programmable elements below the same quadrant. A memory component contiguously disposed in one of the arrays of the first quadrants can be fully (or nearly completely) configured to randomly program the programmable elements in the first quadrant on the bottom layer. Such programmable components may belong to a combination of circuit blocks such as programmable logic circuits, "circuits, and I/O circuits. Thus, Figures 12A-C show a portion of a three-dimensional programmable logic device (PLD), # Including: a programmable © logical block (10) 4e, 12G5e, 12G7, and 12G9a) having a plurality of configurable components randomly positioned within the logical block; and a first array of configuration memory single 7L 1217 Having a configuration memory unit (eg, memory unit 丨丨丨丨a in FIG. i 1B) that is replicated to construct the first array, to which a memory unit is coupled One or more of the plurality of memory cells in the first array are coupled to the plurality of configurable components in the logic block to program the logic block to a user specification; ❹ wherein the An array 1207 and the programmable logic blocks (12〇4c, 1205c, 1207, and 1209a) have a substantially similar layout geometry 'and the first array is positioned substantially above the logic block. 13A and B show a novel 3D PLD Figure 13B is an enlarged view of a portion of Figure 13A for better illustration of the circuit blocks. "On the basis of an illustration, only a few components encountered in a typical PLD are shown. Figure 13 shows a plurality of programmable elements such as 1305. An I/O unit, a plurality of programmable IP blocks such as 13〇4, a plurality of logical blocks such as 1303a-1 or 1303a_2 or 1303a_3. The logical block may be a logical unit or a logic 134972.doc - 67· 200931806 block (1303a_2) or a logic array block (1303a-3). Therefore, FIG. 13 is a three-dimensional programmable logic device (PLD), which includes: a plurality of j/〇 units 1305, each The I/O unit includes: a fixed circuit area (1305a and - 1305b); and a programmable circuit area (1305c) having a plurality of programmable elements for grouping the I/O unit (1305). And one or more intellectual property (IP) cores 1304' each IP core includes: a fixed circuit area (1304b); and a programmable circuit area (1304a or 1304b) having to configure the IP core a plurality of programmable components; and one can be stylized A block array region (1303a-3) comprising: a plurality of substantially identical programmable logic blocks (1303a-2 or 1303 a_l) copied to form the array. Each of the logic blocks further Included in the plurality of programmable elements' and the programmable region 1303a, comprising a randomly configurable programmable component of the programmable logic block array region 13 03a_3, one or more of the ip core programmable circuit regions (eg, 1304a, but adjacent to 1303a_3) and one or more of the I/O unit programmable circuit regions (eg, 13〇k, but adjacent to 1303a_3); and a configuration memory array 1313a that includes replicated a configuration memory unit 131 3a_1 for constructing the array, a memory unit coupled to one or more of the programmable elements in the programmable region, and a memory unit 13 13a stylized The programmable region 丨3〇3a, wherein: the memory array is substantially positioned over the programmable region, and the memory array and the programmable region geometry are substantially identical. In one embodiment, a 3D device, such as a 3D pld or 3D FPGA, provides a common pin to reduce pin count and thus cost. In its specific embodiment, 134972.doc • 68· 200931806, in the specific embodiment, - or a plurality of configuration signals are used to output the output pin of the buckle device, and the king provides the multi-function pin m, the multi-function moon pin The system is coupled to at least one input buffer input and at least one output buffer output. The output of the input buffer can be combined to a programmable circuit, and the input to the output buffer can be tapped to the circuit of the device. - or multiple buffers and programmable assays configurable to achieve a _ high impedance state (ΑΚΑ tristate). These buffers and halls X can be configured by configuring the memory and internal and external control signals that are received through other multi-function contacts. Therefore, the outputs of the buffers are shunted in parallel with the individual control signals, so that each of the shared pins is connected from the buffer to both the control signal and an output. In response to a control signal, the output of the buffer is deactivated (ie, tri-stated), so external configuration data (eg, self-energizing) is read from the shared pin onto the wafer - ❹ = In memory (such as SRAM). When this configuration is performed, this is combined to the other input or output of the 3° wafer. In short, the configuration signal can be received by the „3D: 曰片 controller in response to the same section (for example, reset), and the other devices of the 黧铕 及 and 1^ count the other time and the ancestor of a controller outside the controller ^ Therefore, the 2 ° δ tens of the various configuration signals can be greatly reduced. In another embodiment, a multi-pin is provided to handle the power and pulse input. In this embodiment, the Ms number is temporarily embedded. In order to adjust the power pin from the inside of the house = the power pin in Zhensheng. In the following example, provide the information of the time of the day. In another case, the other connection: > Pins for handling power and resetting inputs. Other pin sharing configurations can also be used. I34972.doc -69· 200931806 In another 35 embodiment, the pins in the device can be configured to be optimized Grounding and power distribution to the wafer. For example, the device can have a large ground or power region at the center of one or more input/output pins and the pins include configurable components coupled to the regions. Illustrated in the disclosure incorporated by reference According to the current teaching of a 3D ic manufacturing, a brief description is provided based on the completeness. By using a standard logic program flow used in the manufacture of asic to form a transistor and routing for programmable and fixed circuit components. After constructing a particular interconnect layer, additional processing steps for forming a 3D configuration memory component are inserted into the logic flow. The following terms used herein are abbreviations associated with certain processes. Abbreviations and their abbreviations The system is as follows: VT threshold voltage LDN lightly doped NMOS drain LDP lightly doped PMOS drain LDD lightly doped bungee RTA rapid thermal annealing Ni nickel Ti Ti Ti Titanium nitride W crane s source D bungee G gate ILD interlayer dielectric 134972.doc -70- 200931806 IMD intermetal dielectric

Cl 接點1 V1 通道1Cl contact 1 V1 channel 1

Ml 金屬1 p 1 多晶碎1 P- 正光摻雜物(硼物種,bf2) N- 負光摻雜物(磷、砷) P+ 正高摻雜物(棚物種,bf2)Ml metal 1 p 1 polycrystalline 1 P-positive dopant (boron species, bf2) N-negative dopant (phosphorus, arsenic) P+ positively high dopant (shed species, bf2)

N+ 負高摻雜物(磷、砷)N+ negative high dopant (phosphorus, arsenic)

Gox 閘極氧化物 C2 接點2 LPCVD 低壓化學汽相沈積 CVD 化學汽相沈積 ΟΝΟ 氧化物-氮化物-氧化物 LTO 低溫氧化物 在1C製造行業中,一邏輯程序係用以在一矽基板層上製 造CMOS裝置。首先,電晶體係構造於該矽基板上,而且 複數個金屬層係用以互連該等電晶體以形成期望電路。透 過耦合至外部裝置的墊結構來存取此等電路。此等cm〇s 裝置可用以在-積體電路中構建AND閘極、〇r閘極、反 相器、LUT、MUX、加法器、乘法器、Ip區塊、記憶體以 及以傳遞閘極為基礎的邏輯功能。採用邏輯程序構建的電 路在1C行業中已為人熟知並且僅在本文中基於解說目的而加 以呈現。-範例性邏輯程序可包括下列步驟之—或多者: 134972.doc -71 - 200931806 p型基板啟動晶圓 淺溝渠隔離:溝渠蝕刻、溝渠填充以及CMP 犧牲氧化物 '* PMOSVt遮罩及植入物 • NMOS VT遮罩及植入物 Ρ井植入物遮罩及植入物透過場 Ν井植入物遮罩及植入物透過場 摻雜物活化及退火 〇 犧牲氧化物蚀刻 閘極氧化/雙閘極氧化物選項 閘極多晶石夕(GP)沈積 GP遮罩及触刻 LDN遮罩及植入物 LDP遮罩及植入物 間隔物氧化物沈積及間隔物蝕刻 Ν+遮罩及NMOS Ν+ G、S、D植入物 Ρ +遮罩及PMOS Ν+ G、S、D植入物 ' Ni沈積 • RTA退火-Ni矽化金屬沈積(S/D/G區域及互連)Gox gate oxide C2 contact 2 LPCVD low pressure chemical vapor deposition CVD chemical vapor deposition 氧化物 oxide-nitride-oxide LTO low temperature oxide in the 1C manufacturing industry, a logic program used in a substrate layer A CMOS device is fabricated on it. First, an electro-crystalline system is constructed on the germanium substrate, and a plurality of metal layers are used to interconnect the transistors to form a desired circuit. These circuits are accessed through a pad structure that is coupled to an external device. These cm〇s devices can be used to construct AND gates, 〇r gates, inverters, LUTs, MUXs, adders, multipliers, Ip blocks, memory, and transfer gates in an integrated circuit. Logic function. Circuits constructed using logic programs are well known in the 1C industry and are presented only in this context for illustrative purposes. - An exemplary logic program may include the following steps - or more: 134972.doc -71 - 200931806 p-type substrate startup wafer shallow trench isolation: trench etching, trench filling, and CMP sacrificial oxide '* PMOSVt mask and implant • NMOS VT masks and implants, well implant masks and implants through field well implant masks and implants through field dopant activation and annealing 〇 sacrificial oxide etch gate oxidation /Double Gate Oxide Option Gate Polycrystalline Platinum (GP) Deposition GP Mask and Touch LDN Mask and Implant LDP Mask and Implant Spacer Oxide Deposition and Spacer Etch Ν+Mask And NMOS Ν+ G, S, D Implants + Mask and PMOS Ν+ G, S, D Implants' Ni Deposition • RTA Annealing - Ni Deuterated Metal Deposition (S/D/G Regions and Interconnects)

未反應的Ni蝕刻 ' ILD氧化物沈積及CMPUnreacted Ni Etching ' ILD Oxide Deposition and CMP

接點C 1遮蔽及蝕刻 金屬Ml沈積、金屬遮蔽及钱刻 IMD氧化物沈積及CMP -72- 134972.doc 200931806 通道v 1遮蔽及蝕刻 複數個金屬及通道圖案化以形成互連 鈍化氧化物沈積 ' 塾遮罩及餘刻 此一邏輯程序在一基板上形成電晶體之一層。此一邏輯 程序構建如此揭示内容中定義的複數個模組層。一第一模 組層可以係一圖案化單一金屬層。一第二模組層可包括從 開始至包括ILD氧化沈積及CMP步驟的所有處理步驟。採 〇 用一邏輯程序構造的積體電路係在本文中定義為2D 1C。 一 CMOSFET薄膜電晶體(TFT)模組層或一互補閘控FET (CGated-FET)TFT模組層可在整個邏輯製程中於各點處加 以插入至一邏輯程序中以構建3D 1C。在一第一具體實施 例中,可在C1處理之後且在Ml處理之前添加該TFT程序。 在一第二具體實施例中,可在Vn處理之後且在M(n+1)處 理之前插入該TFT程序至邏輯程序。在另一具體實施例 中,可在沈積頂部金屬之後插入該TFT程序。組態電路之 〇 全部或一些可採用TFT電晶體構建於該等邏輯電晶體上 方。一範例性TFT程序可包括下列一或多個步驟: • 接點遮罩及蝕刻 W矽化物(或A1)插塞填充及CMP 非晶Pl(多晶矽1)沈積 P1遮罩及蝕刻Contact C 1 Masking and Etching Metal M1 Deposition, Metal Masking, and IMD Oxide Deposition and CMP -72-134972.doc 200931806 Channel v 1 masks and etches a plurality of metal and channel patterns to form interconnect passivation oxide deposition The 塾 mask and the remainder of this logic program form a layer of a transistor on a substrate. This logic program builds a plurality of module layers as defined in the disclosure. A first modular layer can be patterned into a single metal layer. A second module layer can include all processing steps from the beginning to including the ILD oxidative deposition and CMP steps. The integrated circuit constructed with a logic program is defined herein as 2D 1C. A CMOSFET thin film transistor (TFT) module layer or a complementary gated FET (TFTated-FET) TFT module layer can be inserted into a logic program at various points throughout the logic process to construct 3D 1C. In a first embodiment, the TFT program can be added after the C1 process and before the M1 process. In a second embodiment, the TFT program can be inserted into the logic program after the Vn process and before the M(n+1) process. In another embodiment, the TFT program can be inserted after the top metal is deposited. Configuring the circuit 〇 All or some of the TFT transistors can be built on top of the logic transistors. An exemplary TFT program can include one or more of the following steps: • Contact masking and etching W germanide (or A1) plug filling and CMP amorphous Pl (polycrystalline germanium 1) deposition P1 masking and etching

Vtn遮罩及P-植入物(NMOS Vt)Vtn mask and P-implant (NMOS Vt)

Vtp遮罩及N-植入物(PMOS Vt) 134972.doc -73- 200931806 TFT Gox (70A 至 200A PECVD)沈積 非晶P2(多晶矽2)沈積 N+遮罩及植入物(NMOS閘極及互連) ' P +遮罩及植入物(PMOS閘極及互連) - 硬遮罩氧化物沈積 P2遮罩及蝕刻 LDN遮罩及NMOS S/D N-尖端植入物 LDP遮罩及PMOS S/D P-尖端植入物 © 間隔物LTO或電漿氮化物沈積 間隔物LTO蝕刻及清理以形成間隔物並曝露P1及P2 Ni沈積 RTA矽化金屬沈積及退火(S/D/G區域及互連)Vtp mask and N-implant (PMOS Vt) 134972.doc -73- 200931806 TFT Gox (70A to 200A PECVD) deposited amorphous P2 (polycrystalline germanium 2) deposited N+ mask and implant (NMOS gate and mutual Even) 'P + mask and implant (PMOS gate and interconnect) - Hard mask oxide deposited P2 mask and etched LDN mask and NMOS S/D N-tip implant LDP mask and PMOS S/D P-tip implants © spacer LTO or plasma nitride deposition spacers LTO etch and clean to form spacers and expose P1 and P2 Ni deposits RTA deuterated metal deposition and annealing (S/D/G regions and interconnection)

過度Ni蝕刻 摻雜物活化退火 ILD氧化物沈積及CMP 接點遮罩及蝕刻 V W插塞形成及CMP 金屬沈積及餘刻 • TFT程序科技由創建NMOS及PMOS非晶矽或多晶矽電晶 體於單晶NMOS及PMOS裝置上方組成。此等非晶矽電晶 體可藉由可用於處理行業中的各種技術(例如雷射結晶化) 來退火,以改良TFT之移動率及電晶體特性。因此電晶體 之一第二層可實質上製造於電晶體之一第一層上方以增加 可用於矽之單位區域中的電晶體密度。在一較佳具體實施 134972.doc -74- 200931806 例中,TFT電晶體之該第二層可用以構造記憶體單元之一 陣列以程式化一梦基板電晶體第一層上的隨機定位之可程 式化元件。 如論述所證實,記憶體受控制傳遞電晶體邏輯元件提供 —有力工具以製造開關。此類開關係在PLD及FPGA裝置 中共同遇到。藉由組態元件之3維整合以及當前揭示的該 s己憶體之可替代模組性概念以及藉由參考併入的揭示内 容’可大大地減少組態記憶體之高成本。此等進步允許設 計高度經濟、更可靠、較低耗散功率、較高效能、較高位 準的整合以及易於轉換為ASIC、FPGA裝_置。在一個態樣 中,較便宜的記憶體元件允許因可程式化性而使用較多記 憶體。此增強構建大邏輯區塊的能力(即粗顆粒優點),同 時維持較小元件邏輯擬合(即細顆粒優點)。此外,較大顆 粒需要較小連接性:相鄰單元及遠處單元此進一步簡化該 互連結構。因此採用3D可程式化架構實現較佳可程式化邏 輯及較佳可程式化互連。 一 3維SRAM程序整合減少此等互連結構的可重新程式化 性之成本。同樣地,任何其他3維記憶體科技將提供相同 的成本優點。此一3D科技可以係可程式化熔絲鏈結,其中 藉由一雷射槍達到該程式化。其可藉由磁性記憶體或鐵電 s己憶體來達到。一方法亦經顯示用以映射可程式化元件至 一特定應用硬線元件,其中該等線路延遲不受該變化的影 響。該轉換允許進一步減少該使用者的成本,因此在透過 原始FPGA裝置設計一 ASIC中提供_替代性技術,並且達 134972.doc -75- 200931806 到接近ASIC邏輯密度的FpGA邏輯密度。 及直各種㊉^附圖詳細說明本發明之—解說性具體實施例 多改’但是應瞭解本發明並不限於此精確的具體 實把例及說明的修改,而且其 久# m几!i 、 由熟各此項技術者實行 =變化及另外的修改而不稅離如所附_請專利範圍中定 義的本發明之範疇及精神。 【圖式簡單說明】Excessive Ni etch dopant activation annealing ILD oxide deposition and CMP contact masking and etching VW plug formation and CMP metal deposition and residuals • TFT program technology by creating NMOS and PMOS amorphous germanium or polycrystalline germanium transistors in single crystal It is composed above the NMOS and PMOS devices. These amorphous germanium crystals can be annealed by various techniques (e.g., laser crystallization) that can be used in the processing industry to improve the mobility and transistor characteristics of the TFT. Thus a second layer of a transistor can be fabricated substantially over the first layer of one of the transistors to increase the density of the transistors available in the unit region of the germanium. In a preferred embodiment, 134972.doc-74-200931806, the second layer of the TFT transistor can be used to construct an array of memory cells to program the random positioning on the first layer of a dream substrate transistor. Stylized components. As the discussion demonstrates, the memory is provided by a controlled transfer transistor logic element - a powerful tool to make the switch. Such open relationships are encountered in both PLD and FPGA devices. The high cost of configuration memory can be greatly reduced by the 3-dimensional integration of the configuration elements and the currently disclosed alternative modularity concepts of the suffix and the disclosed content by reference. These advances allow for a highly economical, reliable, low-dissipated power, high performance, high level of integration and ease of conversion to ASIC and FPGA packages. In one aspect, the less expensive memory components allow more memory to be used due to programmability. This enhances the ability to build large logical blocks (i.e., coarse grain advantages) while maintaining the logical fit of smaller components (i.e., fine particle advantages). In addition, larger particles require less connectivity: adjacent cells and distant cells, which further simplifies the interconnect structure. Therefore, a 3D programmable architecture is used to achieve better programmable logic and better programmable interconnects. A 3D SRAM program integration reduces the cost of reprogrammability of such interconnect structures. As such, any other 3D memory technology will offer the same cost advantages. This 3D technology can be a stylized fuse link in which the stylization is achieved by a laser gun. It can be achieved by magnetic memory or ferroelectric suffix. A method is also shown for mapping programmable elements to a particular application hardwire component, wherein the line delays are unaffected by the change. This conversion allows for further reduction in the cost of the user, thus providing an alternative technique in designing an ASIC through the original FPGA device and reaching 134972.doc -75-200931806 to an FpGA logic density close to the ASIC logic density. DETAILED DESCRIPTION OF THE INVENTION The present invention is described in detail with respect to the specific embodiments of the present invention. i, by the skilled person, the implementation of the changes and other modifications without taxation of the scope and spirit of the invention as defined in the appended claims. [Simple description of the map]

圖1顯示利用—邏輯元件的-範例性互連結構。 圖2顯示一範例性邏輯元件。 圖3 A顯示一範例性熔絲鏈結點對點連接。 圖3B顯示一範例性抗熔絲點對點連接。 圖3C顯示一範例性傳遞閘極點對點連接。 圖3D顯示一範例性浮動傳遞閘極點對點連接。 圖4A顯示用於一 6T SRAM元件的一範例性組態。 圓4B顯示具有SRAM記憶體控制的範例性可程式化傳遞 閘極開關。 圖4C顯示用於圖4B中的開關之符號。 圖5 A顯示由一個記憶體位元控制的一範例性2:1 mux。 圖5B顯示由2個記憶體位元控制的一範例性4:1 MUX。 圖5C顯示由3個記憶體位元控制的一範例性3:1 MUX。 圖6A顯示一 3D可程式化邏輯裝置之一第一具體實施 例0 圖6B顯示一 3D可程式化邏輯裝置之一第二具體實施 例。 134972.doc -76· 200931806 圖6C顯示圖6A之俯視圖’其中頂部記憶體層已加以移 除。 圖7A顯示從頂部向下剝離至多晶矽層的一 2d FPGA之俯 視圖。 圖7B顯示依據本發明之一可程式化邏輯區塊。 圖7C顯示依據本發明之一組態記憶體陣列。 圖7D顯示圖7C中所示之記憶體陣列中使用的一記憶體 單元。 圖8顯示依據本發明之一頂部金屬層。 圖9A顯示3D Fpga中的頂部金屬及RAM組態之斷面 圖。 圖9B顯示3E) FPGA中的頂部金屬及ROM組態之斷面圖。 圖10A顯示基板電路、中間金屬層及頂部組態記憶體之 一 3D視圖。 圖10B顯示經複製用以構造圖10A的一單位單元。 圖11A顯示定位於二個可程式化邏輯區塊之間的一 IP區 塊。 圖11B顯示用於程式化圖ha中的可程式化元件之一組 態記憶體陣列。 圖11C顯示重疊配置的圖ha及11B之一 3D視圖。 圖12A顯示具有複數個可程式化邏輯區塊定位的複數個 IP區塊。 圖12B顯示經構造用以程式化圖12A的組態記憶體陣 列。 134972.doc •77- 200931806 圖12C顯示圖12A及12B之3D配置。 圖13A顯示一 3D FPGA/PLD,其中由垂直記憶體程式化 邏輯。 ' 圖13B顯示圖13A之一部分的放大圖。 - 【主要元件符號說明】 101至104 邏輯元件 201至205 元件 310 導電熔絲鏈結 ❿ 320 電容抗熔絲元件 330 傳遞閘極裝置 340 浮動傳遞閘極裝置 401 NMOS電晶體/裝置 402 NMOS電晶體/裝置 403 反相器 404 反相器 410 傳遞閘極/NMOS電晶體 ❹ 450 元件/組態電路 460 交又陰影圓圈 ' 511 傳遞閘極 512 傳遞閘極 531 傳遞閘極 532 傳遞閘極 533 傳遞閘極 550 組態電路 134972.doc -78- 200931806 561 記憶體元件 562 記憶體元件 571 記憶體元件 " 572 記憶體元件 , 573 記憶體元件 601 半導體晶片區域/晶片 602 墊區域/墊 603 電路區塊/3D組態電路 Ο 604 金屬匯流排線 605 金屬匯流排線 606 金屬線 607 金屬線 608 可程式化邏輯區塊陣列 609 可程式化選路區域 610 智慧財產(IP)核心/IP電路區塊 701至706 ❹ 列 707a, 707b SRAM單元 711 可程式化電路/LUT/電路區塊/LUT電路 ' 712 可程式化輸入MUX 713 可程式化選路電路 714 可程式化暫存器 715 可程式化輸入MUX 716 可程式化輸入MUX 717 可程式化輸出MUX 134972.doc -79- 200931806 718 可程式化輸出MUX 721 記憶體單元 731 反相器 — 732 存取電晶體 - 733 電晶體 801 金屬短柱 802 金屬線 803 金屬單位單元/區域 ❹ 804 第二尺寸 805 第一尺寸 901 金屬區域/墊區域/金屬短柱層 902 金屬短柱/金屬短枉層 903 金屬線/金屬短柱陣列/金屬短柱層 904 金屬短柱/金屬短柱層 905 金屬線/金屬短柱陣列/金屬短柱層 906 金屬短柱/金屬短柱層 ❹ 907 金屬線/金屬短柱陣列/金屬短柱層 908 金屬區域/墊區域/金屬短柱層 * 912 頂部組態記憶體模組層 913 金屬區域 915 通道 916 記憶體單元 917 金屬線 931 周長塾區域 134972.doc -80- 200931806 ❹Figure 1 shows an exemplary interconnect structure using a logic element. Figure 2 shows an exemplary logic element. Figure 3A shows an exemplary fuse link junction-to-point connection. Figure 3B shows an exemplary anti-fuse point-to-point connection. Figure 3C shows an exemplary transfer gate point-to-point connection. Figure 3D shows an exemplary floating transfer gate point-to-point connection. Figure 4A shows an exemplary configuration for a 6T SRAM device. Circle 4B shows an exemplary programmable transfer gate switch with SRAM memory control. Figure 4C shows the symbols used for the switches in Figure 4B. Figure 5A shows an exemplary 2:1 mux controlled by a memory bit. Figure 5B shows an exemplary 4:1 MUX controlled by 2 memory bits. Figure 5C shows an exemplary 3:1 MUX controlled by 3 memory bits. Figure 6A shows a first embodiment of a 3D programmable logic device. Figure 6B shows a second embodiment of a 3D programmable logic device. 134972.doc -76· 200931806 Figure 6C shows a top view of Figure 6A where the top memory layer has been removed. Figure 7A shows a top view of a 2d FPGA stripped down from the top to the polysilicon layer. Figure 7B shows a programmable logic block in accordance with one of the present inventions. Figure 7C shows a memory array configured in accordance with one of the present inventions. Figure 7D shows a memory cell used in the memory array shown in Figure 7C. Figure 8 shows a top metal layer in accordance with the present invention. Figure 9A shows a cross-sectional view of the top metal and RAM configuration in 3D Fpga. Figure 9B shows a cross-sectional view of the top metal and ROM configuration in the 3E) FPGA. Figure 10A shows a 3D view of the substrate circuitry, the intermediate metal layer, and the top configuration memory. Figure 10B shows a unit cell that has been replicated to construct Figure 10A. Figure 11A shows an IP block positioned between two programmable logic blocks. Figure 11B shows an array of configuration memory for stylizing the programmable elements in Figure ha. Figure 11C shows a 3D view of Figures ha and 11B of the overlapping configuration. Figure 12A shows a plurality of IP blocks with a plurality of programmable logic block locations. Figure 12B shows an array of configuration memory configured to program the Figure 12A. 134972.doc • 77- 200931806 Figure 12C shows the 3D configuration of Figures 12A and 12B. Figure 13A shows a 3D FPGA/PLD in which logic is programmed by vertical memory. Figure 13B shows an enlarged view of a portion of Figure 13A. - [Major component symbol description] 101 to 104 Logic elements 201 to 205 Element 310 Conductive fuse link ❿ 320 Capacitor anti-fuse element 330 Transfer gate device 340 Floating transfer gate device 401 NMOS transistor/device 402 NMOS transistor / device 403 inverter 404 inverter 410 pass gate / NMOS transistor ❹ 450 component / configuration circuit 460 cross shadow circle ' 511 pass gate 512 pass gate 531 pass gate 532 pass gate 533 pass gate Pole 550 configuration circuit 134972.doc -78- 200931806 561 memory element 562 memory element 571 memory element " 572 memory element, 573 memory element 601 semiconductor wafer area / wafer 602 pad area / pad 603 circuit block /3D configuration circuit 604 604 metal bus line 605 metal bus line 606 metal line 607 metal line 608 programmable logic block array 609 programmable routing area 610 intellectual property (IP) core / IP circuit block 701 To 706 ❹ column 707a, 707b SRAM unit 711 programmable circuit / LUT / circuit block / LUT circuit ' 712 programmable input MU X 713 Programmable Routing Circuitry 714 Programmable Register 715 Programmable Input MUX 716 Programmable Input MUX 717 Programmable Output MUX 134972.doc -79- 200931806 718 Programmable Output MUX 721 Memory Unit 731 Inverter - 732 Access Transistor - 733 Transistor 801 Metal Short Post 802 Metal Wire 803 Metal Unit Cell / Zone 804 Second Size 805 First Size 901 Metal Area / Pad Area / Metal Short Post Layer 902 Metal Short Column/metal short layer 903 metal wire/metal short column array/metal short column layer 904 metal short column/metal short column layer 905 metal wire/metal short column array/metal short column layer 906 metal short column/metal short column layer 907 907 Metal Wire/Metal Short Post Array/Metal Short Post 908 Metal Area/Mat Area/Metal Short Post Layer* 912 Top Configuration Memory Module Layer 913 Metal Area 915 Channel 916 Memory Unit 917 Metal Line 931 Circumference塾 area 134972.doc -80- 200931806 ❹

932 金屬短柱/金屬短柱區域 933 金屬線 934 金屬短柱 935 金屬線 940 整區域 941 金屬區域/墊區域 942至945 金屬線/線路 946 金屬區域/墊區域 1001 模組層/幾何結構 1002 模組層/ 1003 模組層/第二金屬單元 1004 模組層/第一金屬單元 1005 模組層/記憶體單元 1006 單位單元區域/單位單元 1011 模組層/基板區域 1012至1015 模組層 1016 金屬層/模組層/金屬單元 1017 模組層/記憶體單元 1101 第一可程式化邏輯瓦/可程式 1101a 可程式化邏輯單元 1102 IP區塊/智慧財產(IP)核心 1102a 第一區域/可程式化元件 1102b 第二中心區域/固定電路區域 1102c 第三區域/可程式化元件 化元件 134972.doc -81 · 200931806 1103 第二可程式化邏輯瓦/可程式化元件 1111 區域/組態位元/記憶體陣列 1111a 組態記憶體單元 ' 1112 區域 - 1113 區域/組態位元 1201 可程式化瓦 1202 IP區塊 1202a 區域 ❹ 1202b 區域 1202c 區域 1203 可程式化瓦 1204 IP區塊 1204a 區域 1204b 區域 1204c 區域/可程式化邏輯區塊 1205 IP區塊 ❹ 1205a 區域 1205b 區域 * 1205c 區域/可程式化邏輯區塊 1205d 區域 1205e 區域 1206 IP區塊 1206a 區域 1206b 區域 134972.doc -82- 200931806 1206c 區域 1207 1208 可程式化瓦/可程式化邏輯區塊/第一陣列 IP區塊 * 1208a 區域 1208b 區域 1208c 區域 1209 可程式化瓦 1211 ❹ 1212 組態記憶體陣列 區域 1213 組態記憶體陣列 1217 組態記憶體陣列 1219 組態記憶體陣列 1303a 可程式化區域 1303a一1 邏輯區塊 1303a—2 邏輯區塊 1303a 3 A 一 邏輯區塊/可程式化邏輯區塊陣列區威 Ir 1304 可程式化IP區塊/智慧財產(IP)核心 1304a 可程式化電路區域 1304b 固定電路區域/可程式化電路區域 1305 I/O單元 1305a 固定電路區域 1305b 固定電路區域 1305c 可程式化電路區域 1313a 組態記憶體陣列 134972.doc -83- 200931806 1313a一1 組態記憶體單元 A 節點 B 節點 BL 存取線路 BS 存取線路 GA 存取線路 GB 存取線路 I〇至 I3 輸入 0 輸出 So至 s2 記憶體元件輸出 So' 輸出控制信號 ❹ I34972.doc -84-932 Metal Short Column / Metal Short Column Area 933 Metal Wire 934 Metal Short Column 935 Metal Wire 940 Entire Area 941 Metal Area / Pad Area 942 to 945 Metal Line / Line 946 Metal Area / Pad Area 1001 Module Layer / Geometry 1002 Mode Group layer / 1003 module layer / second metal unit 1004 module layer / first metal unit 1005 module layer / memory unit 1006 unit unit area / unit unit 1011 module layer / substrate area 1012 to 1015 module layer 1016 Metal Layer / Module Layer / Metal Unit 1017 Module Layer / Memory Unit 1101 First Programmable Logic Tile / Programmable 1101a Programmable Logic Unit 1102 IP Block / Intellectual Property (IP) Core 1102a First Area / Programmable component 1102b second central region/fixed circuit region 1102c third region/programmable component device 134972.doc -81 · 200931806 1103 second programmable logic tile/programmable component 1111 area/configuration bit Meta/memory array 1111a Configuration memory unit '1112 area - 1113 area/configuration bit 1201 Programmable tile 1202 IP block 1202a Area ❹ 1202b Field 1202c Area 1203 Programmable Tile 1204 IP Block 1204a Area 1204b Area 1204c Area/Programmable Logic Block 1205 IP Block ❹ 1205a Area 1205b Area* 1205c Area/Programmable Logic Block 1205d Area 1205e Area 1206 IP Block 1206a Area 1206b Area 134972.doc -82- 200931806 1206c Area 1207 1208 Programmable Tile/Programmable Logic Block/First Array IP Block* 1208a Area 1208b Area 1208c Area 1209 Programmable Tile 1211 ❹ 1212 Configuring memory array area 1213 Configuring memory array 1217 Configuring memory array 1219 Configuring memory array 1303a Programmable area 1303a-1 Logic block 1303a-2 Logic block 1303a 3 A One logical block/can Stylized Logic Block Array Area Ir 1304 Programmable IP Block/Intelligent Property (IP) Core 1304a Programmable Circuit Area 1304b Fixed Circuit Area/Programmable Circuit Area 1305 I/O Unit 1305a Fixed Circuit Area 1305b Fixed Circuit area 1305c programmable circuit area 1313a configuration memory array 1349 72.doc -83- 200931806 1313a-1 Configuration Memory Unit A Node B Node BL Access Line BS Access Line GA Access Line GB Access Line I〇 to I3 Input 0 Output So to s2 Memory Element Output So ' Output control signal ❹ I34972.doc -84-

Claims (1)

200931806 十、申請專利範固: h 一種二維可程式化邏輯裝置(PLD),其包含: -可程式化邏輯區塊’其具有以一預定佈局幾何結構 * 疋位於該邏輯區塊中的複數個可組態元件;以及 . 、組態δ己憶體單元之-第-陣列’該等記憶體單元之每 。^係_ α至4等可組態元件之—或多者以程式化該邏 輯區塊至一使用者說明書,其中該第一陣列實質上符合 該預定佈局幾何結構而且該第-陣列係實質上定位於該 〇 邏輯區塊上方或下方。 2·如請求項1之裝置,其進一步包含: 輸入/輸出(I/O)單元,其具有帶定位於其中的複數個 可組態元件之-第一1/0區域以及一第二1/〇區域;以及 組態記憶體單元之一第二陣列,其具有複數個組態記 憶體單元,該等第二陣列記憶體單元之每一者係耦合至 該第一 I/O區域中的該等可組態元件之一或多者以程式化 該1/()單元至一使用者說明書,其中該第二陣列以及該第 I/O區域實質上符合該預定佈局幾何結構而且該第二陣 • 列係實質上定位於該第一I/O區域上方或下方。 '3·如叫求項2之裝置,其中該等第一及第二記憶體陣列合 併以形成組態記憶體單元之一鄰接陣列,並且其中該鄰 接陣列係實質上與該第二丨/O區域不重叠。 4_如請求項1之裝置,其進一步包含: 一可程式化智慧財產(IP)區塊,其具有帶定位在一區 域内的複數個可組態元件之一第一〇>區域以及一第二I/p 134972.doc 200931806 區域;以及 組態記憶體單元之一第三陣列,其具有複數個組態記 憶體單元’該等第三陣列記憶體單元之每—者係麵合至 該第一 I p區域中的該等可組態元件之一或多者以程式化 該IP區塊至一使用者說明書,其中該第三陣列以及該第 IP區域實質上付合該預定佈局幾何結構而且該第三陣 列係實質上定位於該第一IP區域上方或下方。 5,如請求項4之裝置,其中該等第一及第三記憶體陣列合 併以形成組態記憶體單元之一鄰接陣列,並且其中該鄰 接陣列係實質上與該第二IP區域不重疊。 6. 如凊求項5之裝置,其中一電力匯流排以及一接地匯流 排之一或多者係定位於該第二1?區域之上。 7. 如請求項1之裝置,其中該記憶體單元包含下列之一: 一隨機存取記憶體(RAM)元件以及一唯讀記憶體(R〇M) 元件。 8. 如請求項7之裝置’其中該R〇m元件包含下列之一:柄 σ至電力供應電壓的一金屬線路以及麵合至一接地供 應電壓的一金屬線路。 9. 如請求項1之裝置,其中該記憶體單元包含下列的至少 項 電炫絲鍵結、一雷射炼絲鍵結、一抗熔絲電容 器、一靜態隨機存取記憶體(SRAM)單元、一動態隨機存 取記憶體(DRAM)單元、一金屬任選鏈結、一可抹除可 程式化唯讀記憶體(EPROM)單元、一電子可抹除可程式 化唯讀記憶體(EEPROM)單元、一快閃記憶體單元、一 134972.doc 200931806 碳奈米[-電化學單元、一電機單元、一電阻調變元 件、一機械隔膜'一光學單元、一電磁單元以及一鐵電 單元。 10. 如请求項1之裝置,其中互連以及選路信號之一或多者 . 係定位於記憶體單元之該陣列上方或下方。 11. 一種三維可程式化邏輯裝置(pld),其包含: 複數個I/O單元,每一 1/〇單元包含:一固定電路區 域;以及一可程式化電路區域,其具有用以組態該1/0單 © 元的複數個可程式化元件;以及 戈夕個智慧財產(IP)核心,每一 IP核心包含:一固 定電路區域;以及一可程式化電路區域,其具有用以組 態該IP核心的複數個可程式化元件;以及 一可程式化邏輯區塊陣列區域,其包含:經複製用以 形成該陣列的複數個實質上相同可程式化邏輯區塊,每 一該邏輯區塊進一步包含複數個可程式化元件;以及 一可程式化區域,其包含該可程式化邏輯區塊陣列區 域之定位的可程式化元件、IP核心可程式化電路區域之 該一或多者以及I/O單元可程式化電路區域之該一或多 • 者;以及 一組態記憶體陣列,其包含耦合至該可程式化區域中 的該等可程式化元件之一或多者的組態記憶體單元,該 記憶體陣列程式化該可程式化區域,其中: 該記憶體陣列係實質上定位於該可程式化區域上方 或下方;以及 134972.doc 200931806 該記憶體陣列與可程式化區域佈局幾何結構係實質 上相同的。 12. 如請求項11之裝置,其中該可程式化區域之一可程式化 元件包含下列之一:一可程式化邏輯元件以及一可程式 化選路元件》 13. 如請求項U之裝置,其中一電力匯流排以及一接地匯流 排之至少一項係定位於該ip核心固定電路區域之上。 14. 如請求項n之裝置,其中該組態記憶體單元包含下列之 一:—隨機存取記憶體(RAM)元件以及一唯讀記憶體 (ROM)元件。 15. 如請求項14之裝置,其中該R〇M元件包含耦合至一電力 供應電壓的一金屬線路以及耦合至一接地供應電壓的一 金屬線路之,**。 16. 如請求項14之裝置,其中該11八1^元件包含下列的至少一 項· 一電熔絲鏈結、一雷射熔絲鏈結、一抗溶絲電容 器、一SRAM單元、一DRAM單元、一金屬任選鏈結、 EPROM單元、一 EEPROM單元、一快閃記憶體單元、 一碳奈米管、一電化學單元、一電機單元、一電阻調變 70件、—機械隔膜、一光學單元、一電磁單元以及一鐵 電單元。 1 7.如凊求項丨丨之裝置,其中一或多個互連以及信號選路線 路係定位於該記憶體單元陣列上方或下方。 18. —種三維可程式化邏輯裝置(pLD),其包含: 複數個分配之可程式化元件,其係定位於一基板區域 134972.doc -4 - 200931806 中;以及 組態記憶體單元之一鄰接陣列,複數個該等記憶體單 元係耦合至該複數個可程式化元件以組態該等可程式化 • 元件,其中: ^ 該記憶體陣列係實質上定位於該基板區域上方或下 方;以及 該記憶體陣列以及該等基板區域佈局幾何結構係實 質上類似的。 ❹ I9.如請求項18之裝置,其進一步包含金屬單元之一鄰接陣 列,每一金屬單元具有組態記憶體單元尺寸而且一金屬 短柱係耦合至一該組態記憶體單元以及該等可程式化元 件之一或多者》 20.如請求項19之裝置,其中二或多個金屬單元進一步包括 鄰近於從該單元之一端延伸至該單元之相對端的該金屬 短柱之—金屬、線,其中二或多個鄰近金料元形成一連 續金屬線。 ❹21 ·如請求項19之裝置,其中該金屬單元陣列係定位於該記 ' .隐體單元陣列下方並在該基板區域上方。 月托項18之裝置’其包含複數個多功能I/O墊,每一 …係耦口至-第一及第二緩衝器,其中該等第一及第 ,衝器包3耦合至該等組態記憶體單元的該等可程式 化元件之一或多者。 一二长項22之襄置,其中該等多功能1/〇墊之—或多者進 =含下列之-或多者:—電力供應墊、—接地供應 時脈墊一裝置組態墊、一輸入墊以及一輸出塾。 134972.doc200931806 X. Patent application: h A two-dimensional programmable logic device (PLD) comprising: - a programmable logic block 'having a complex geometry in a predetermined layout * 疋 in the logical block Configurable components; and . . . configure each of the memory cells of the - Array of δ hexamed cells. ^ _ _ α to 4 or other configurable elements - or more to program the logic block to a user specification, wherein the first array substantially conforms to the predetermined layout geometry and the first array is substantially Located above or below the logical block. 2. The device of claim 1, further comprising: an input/output (I/O) unit having a plurality of configurable components positioned therein - a first 1/0 region and a second 1/ a second array of one of the configuration memory cells having a plurality of configuration memory cells, each of the second array memory cells being coupled to the first I/O region One or more of the configurable elements to program the 1/() unit to a user specification, wherein the second array and the I/O area substantially conform to the predetermined layout geometry and the second array • The column is positioned substantially above or below the first I/O area. [3] The apparatus of claim 2, wherein the first and second memory arrays are combined to form a contiguous array of one of the configuration memory cells, and wherein the contiguous array is substantially associated with the second 丨/O The areas do not overlap. 4) The apparatus of claim 1, further comprising: a programmable intellectual property (IP) block having a first 〇 > region and a plurality of configurable components positioned within an area a second I/p 134972.doc 200931806 region; and a third array of one of the configuration memory cells having a plurality of configuration memory cells each of the third array memory cells One or more of the configurable elements in the first Ip region to program the IP block to a user specification, wherein the third array and the IP region substantially conform to the predetermined layout geometry Moreover, the third array is positioned substantially above or below the first IP region. 5. The device of claim 4, wherein the first and third memory arrays are combined to form an adjacent array of one of the configuration memory cells, and wherein the adjacent array system does not substantially overlap the second IP region. 6. The apparatus of claim 5, wherein one or more of the power bus and a ground bus are positioned above the second zone. 7. The device of claim 1, wherein the memory unit comprises one of: a random access memory (RAM) component and a read only memory (R〇M) component. 8. The device of claim 7 wherein the R〇m component comprises one of: a metal line of the handle σ to the power supply voltage and a metal line that is coupled to a ground supply voltage. 9. The device of claim 1, wherein the memory unit comprises at least the following item of electric wire bonding, a laser wire bonding key, an anti-fuse capacitor, and a static random access memory (SRAM) unit. a dynamic random access memory (DRAM) cell, a metal optional link, an erasable programmable read only memory (EPROM) cell, and an electronic erasable programmable read only memory (EEPROM) cell , a flash memory unit, a 134972.doc 200931806 carbon nano [- electrochemical unit, a motor unit, a resistance modulation element, a mechanical diaphragm 'an optical unit, an electromagnetic unit and a ferroelectric unit. 10. The device of claim 1, wherein one or more of the interconnect and routing signals are positioned above or below the array of memory cells. 11. A three-dimensional programmable logic device (pld) comprising: a plurality of I/O cells, each of the 1/〇 cells comprising: a fixed circuit region; and a programmable circuit region having a configuration a plurality of programmable elements of the 1/0 single element; and a core of intellectual property (IP), each IP core comprising: a fixed circuit area; and a programmable circuit area having a group a plurality of programmable elements of the IP core; and a programmable logic block array region comprising: a plurality of substantially identical programmable logic blocks replicated to form the array, each of the logic The block further includes a plurality of programmable elements; and a programmable area including the positionable programmable component of the programmable logic block array region, the one or more of the IP core programmable circuit regions And one or more of the programmable circuit regions of the I/O unit; and a configuration memory array including one or more of the programmable elements coupled to the programmable region a memory unit that stylizes the programmable region, wherein: the memory array is substantially positioned above or below the programmable region; and 134972.doc 200931806 the memory array and The stylized area layout geometry is essentially the same. 12. The device of claim 11, wherein the one of the programmable regions comprises one of the following: a programmable logic component and a programmable routing component. 13. A device as claimed in claim U, At least one of the power bus and a ground bus is positioned above the ip core fixed circuit area. 14. The apparatus of claim n, wherein the configuration memory unit comprises one of: a random access memory (RAM) component and a read only memory (ROM) component. 15. The device of claim 14, wherein the R〇M component comprises a metal line coupled to a power supply voltage and a metal line coupled to a ground supply voltage, **. 16. The device of claim 14, wherein the 11 8 1 component comprises at least one of the following: an electrical fuse link, a laser fuse link, an anti-solvent capacitor, an SRAM cell, a DRAM Unit, a metal optional link, an EPROM unit, an EEPROM unit, a flash memory unit, a carbon nanotube, an electrochemical unit, a motor unit, a resistor 70, a mechanical diaphragm, an optical unit , an electromagnetic unit and a ferroelectric unit. 1 7. A device as claimed, wherein one or more interconnects and signal routing paths are positioned above or below the array of memory cells. 18. A three-dimensional programmable logic device (pLD) comprising: a plurality of assigned programmable elements positioned in a substrate area 134972.doc -4 - 200931806; and one of the configuration memory cells Adjacent to the array, a plurality of the memory cells are coupled to the plurality of programmable elements to configure the programmable elements, wherein: ^ the memory array is substantially positioned above or below the substrate area; And the memory array and the substrate area layout geometry are substantially similar. The device of claim 18, further comprising an adjacent array of metal cells, each metal cell having a configuration memory cell size and a metal stub coupled to a configuration memory cell and the 20. The device of claim 19, wherein the two or more metal units further comprise metal, wires adjacent to the metal stub extending from one end of the unit to the opposite end of the unit , wherein two or more adjacent gold elements form a continuous metal line. The device of claim 19, wherein the metal cell array is positioned below the invisible cell array and above the substrate region. The device of the monthly item 18 includes a plurality of multifunctional I/O pads, each of which is coupled to the first and second buffers, wherein the first and third, the packet 3 are coupled to the Configuring one or more of the programmable elements of the memory unit. The setting of one or two long items 22, wherein the multi-function 1/〇 pad-or multi-into = the following - or more: - power supply pad, - ground supply clock pad - device configuration pad, An input pad and an output port. 134972.doc
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CN106650047A (en) * 2016-12-05 2017-05-10 深圳市紫光同创电子有限公司 Programmable logic device layout method and device
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US12147290B2 (en) 2023-02-13 2024-11-19 Quanta Computer Inc. Capturing and using dynamic information to manage field replace units

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US6917219B2 (en) * 2003-03-12 2005-07-12 Xilinx, Inc. Multi-chip programmable logic device having configurable logic circuitry and configuration data storage on different dice
US7190190B1 (en) * 2004-01-09 2007-03-13 Altera Corporation Programmable logic device with on-chip nonvolatile user memory

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TWI420334B (en) * 2009-09-30 2013-12-21 Hon Hai Prec Ind Co Ltd Printed circuit board layout system and method for merging polygons printed circuit board
CN106650047A (en) * 2016-12-05 2017-05-10 深圳市紫光同创电子有限公司 Programmable logic device layout method and device
CN106650047B (en) * 2016-12-05 2020-06-30 深圳市紫光同创电子有限公司 Programmable logic device layout method and device
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US12147290B2 (en) 2023-02-13 2024-11-19 Quanta Computer Inc. Capturing and using dynamic information to manage field replace units

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