TW200931072A - Integrated optical film - Google Patents

Abstract

The subject invention provides an optical film comprising a substrate and a micro-structured layer on a surface of the substrate, wherein the micro-structured layer comprises one or more first zones comprising at least one kind of multi-peak columnar structure wherein said multi-peak columnar structure is an union structure formed from at least two columnar structures overlapping with each other and the portion with the biggest height of the multi-peak columnar structure of the first zone is composed of an arc columnar structure; and wherein the micro-structured layer optionally comprises one or more second zones comprising at least one kind of single-peak prism columnar structure.

Description

200931072 IX. Description of the Invention: [Technical Field] The present invention relates to an optical film, and more particularly to an optical film applied to a liquid crystal display. [Prior Art] Since the liquid crystal panel itself does not emit light, the backlight module as a brightness source is an important component of the LCD display function, and is very important for improving the brightness of the liquid crystal display. At present, the use of a wide variety of optical films in the backlight module provides an application that can increase the brightness of the LCD panel to make the light source the most efficient, without the need to change any component design or consume additional energy. Economical and simple solution. Figure 简单 is a simple illustration of the various optical films contained in the backlight module. As shown in Figure ,, the general backlight module contains

The optical film system includes a reflective film (1) disposed under the light guide (2); and other optical films disposed above the light guide plate (2), which are sequentially diffused from the bottom to the top (3) ), concentrating films (4) and (5) and protective diffusion film (6). The main function of the diffusion film is to provide a uniform surface light source for the liquid crystal display. The concentrating film industry S is called "Brightness Enhancement Film" or "prism film". The main function of the concentrating film is to collect scattered light by refraction and internal total reflection, and concentrate it to about ±35 degrees. The positive viewing angle (On.—the brightness of the LCD between the two. The commonly used concentrating film uses a linear columnar structure arranged regularly to achieve the concentrating effect. The concentrating film is shown in Figure 2. The sentence person further comprises a substrate 21 and a plurality of 稜鏡 structures 22 located above the substrate 21, and the 稜鏡 structures are parallel to each other, wherein each 稜鏡 structure is composed of two inclined ridges The inclined surface is formed by the two inclined surfaces 128054.doc 200931072 intersecting at the top of the crucible to form a peak 23' and each intersecting another inclined surface of the adjacent crucible at the bottom of the crucible to form a valley 24. Since the conventional collecting film is a fixed width The regular strip structure 'so it is easy to produce light interference with the reflected or refracted light from other diaphragms in the display or other reflected or refracted light of the concentrating sheet itself' resulting in the appearance of a moire or Newton ring in appearance. Externally, as shown in Fig. 3, the conventional concentrating film system has independent columnar structures. Under this structure, most of the light is still unable to concentrate to a positive viewing angle of about ±35 degrees, for example, rays 31 and 32. No light is concentrated to about ±35 ❹

Within the range of the positive angle of view, it cannot be effectively utilized. Therefore, how to make the light through the concentrating film more effective has been a problem to be solved in the related industry. It is known that a protective diffusion film (or an upper diffusion film) can be disposed on the concentrating film to improve the above optical interference. It is a phenomenon that prevents the concentrating film and the panel or other film from vibrating during transportation to cause mutual damage. However, the disadvantage of this method is that the cost is increased and the backlight module will be complicated. In addition, in addition to the protective diffusion film to prevent the concentrating film from being scratched by contact with the panel, a protective film is also required before assembly to avoid damage that may occur during storage and/or transport of the concentrating film. The use of a protective diffusion film and a protective film all increase the required cost. SUMMARY OF THE INVENTION In view of the above, the present invention provides an optical film to improve the above disadvantages, which can reduce the optical interference phenomenon, and the brightness 4 can avoid the scratch caused by the mutual contact between the optical mold and other optical films or panels, and further The cost of the diffusion film or the attached protective tape. 128054.doc 200931072 The present invention provides an optical cartridge comprising a substrate and a microstructure layer on a surface of the substrate, wherein the microstructure layer comprises one or more first regions, the first region comprising At least one multimodal columnar structure consisting of a union structure formed by at least two columnar structures overlapping each other and the multimodal (four) structure_maximum height is an arcuate columnar structure; And the microstructure layer optionally includes one or more second regions, the second region comprising at least one unimodal columnar structure. [Embodiment] As used herein, 'multimodal columnar structure refers to a union structure formed by overlapping at least two columnar structures with each other' and the height of the valley line between any two adjacent columnar structures is such a two phase The height of the lower columnar structure is between 3〇% and 95%. In this context, a unimodal columnar structure refers to a structure consisting of a single columnar structure having only a single bee, the valley between the single-peak shuttle columnar structure and its adjacent columnar structure. The height of the line is 29.9% of the height of the lower one of the uniaxial columnar structure and its adjacent columnar structure. When the height of the valley line between the adjacent two columnar structures falls within the above range, in the present invention, the two columnar structures are each regarded as a unimodal columnar structure. As used herein, valley line refers to a line formed by the adjacent sides of adjacent two columnar structures. As used herein, the height of the columnar structure refers to the vertical distance of the peak of the columnar structure relative to the bottom of the columnar structure. In this context, the height of the valley line refers to the vertical distance of the valley line relative to the bottom of the adjacent two columns 128054.doc -8 - 200931072. Width refers to the distance between the two valleys adjacent to the columnar structure herein, both sides of the columnar structure. The columnar structure of the present invention is known to those of ordinary skill in the art to which the present invention is composed of two inclined planes which intersect at the top of the crucible to form peaks. Each of the other inclined surfaces of the adjacent columnar structures intersects at the bottom to form a valley.弧 弧 The curved columnar structure used in the present invention is well known to those of ordinary skill in the art, and is composed of two inclined planes, the intersection of the tops of the two inclined planes is passivated to form a curved surface. And the two inclined planes may each form a valley with another inclined surface of the adjacent columnar structure at the bottom. In this context, the highest point of the curved surface of the curved columnar structure is defined as the peak of the curved columnar structure, and the height of the curved columnar structure refers to the vertical distance of the curved columnar structure relative to the bottom of the curved columnar structure. In this context, the angle at which the two inclined planes of the curved columnar structure intersect is the angle of the apex angle of the curved columnar structure. The substrate used in the optical film of the present invention may be any one known to those skilled in the art to which the present invention pertains, such as glass or plastic. The plastic substrate is not particularly limited, and is not limited to, for example, but not limited to, a polyester resin such as polyethylene terephthalate (PET) or polyethylene naphthalate (p〇iyethylene naphthalate). , PEN) ., t acrylic acid gg resin (p〇iyacryiate resin), such as polymethyl methacrylate (PMMA); polyolefin resin 128054.doc 200931072 (polyolefin resin), such as polyethylene (PE) or poly Propylene (pp); polystyrene resin; polyicycloolefin resin; polyimide resin; polycarbonate resin, polyurethane resin (p 〇iyUrethane resin); triacetate cellulose (TAC); polylactic acid; or a mixture thereof. Preferred is polyethylene terephthalate, polymethyl methacrylate, polycyclocarbon resin, cellulose triacetate, polylactic acid or a mixture thereof, more preferably polyethylene terephthalate. The thickness of the base material will generally depend on the desired optical product, preferably between about 50 microns and about 300 microns. The microstructure layer of the optical medium of the present invention may be composed of any resin having a refractive index greater than that of air. In general, the higher the refractive index, the better the effect. The resin used to form the micro-structure layer is well known to those skilled in the art, for example, a thermosetting resin or an ultraviolet curing resin. It is an ultraviolet curing resin. A monomer which can be used to constitute the above ultraviolet curable resin is, for example but not limited to, an acrylate monomer. The types of the above acrylate monomers are, for example but not limited to, acrylates, methacrylates, urethane acrylates, polyester acrylates, ep〇xy acrylates. Or a mixture thereof, preferably an acrylate or a mercapto acrylate. Further, the above acrylate monomer may have one or more functional groups, preferably a polyfunctional group. Examples of acrylate monomers suitable for use in the present invention are, for example, selected from the group consisting of (meth) acrylates, triprol pyiyiene glycol di (meth) acrylate, M-butanediol bis ( Methyl)acrylic brewing 128054.doc -10· 200931072 (l,4-butanediol di(meth)acrylate), 1,6·hexanediol bis(indenyl)acrylic acid vinegar (1,6-hexanediol di(meth) Acrylate), polyethyleneglycol di(meth) acrylate, allylated cyclohexyl di(meth)acrylate , (isocyanurate di(meth)acrylate), 2-phenoxyethyl (mercapto) propylene <2-phenoxyl ethyl (meth) Acrylate, ethoxylated trimethylol propane ❹ tri(meth) acrylate, propoxylated glycerol tri (meth)acrylate), trimethylol propane tri(meth)acrylate e), a group consisting of Cumyl Phenoxyl Ethyl Acrylate (CPEA) and a mixture thereof. Examples of commercially available acrylate monomers include those manufactured by Sartomer under the trade names SR454®, SR494®, SR9020®, SR9021® or SR9041®; manufactured by Eternal under the trade name 624-100®, © EM210 ® or EM2108®; and manufactured by UCB, trade name

Ebecryl 600®, Ebecryl 830®, Ebecryl 3605® or Ebecryl '6700®. The resin forming the microstructure layer may be added with any conventional additives, such as a photoinitiator, a crosslinking agent, an inorganic fine particle, a leveling agent, an antifoaming agent or an antistatic agent, etc., and the kind thereof is the technical field to which the present invention pertains. Among those who are familiar with the usual knowledge. An antistatic agent may be added to the resin for forming the microstructure layer as needed, 128054.doc 11 200931072 to make the obtained optical film have an antistatic effect, thereby improving work efficiency. The antistatic agents useful in the present invention are well known to those of ordinary skill in the art to which the present invention pertains, for example, but not limited to, ethoxylated glycerols, quaternary amine compounds, fatty amines. Derivatives, epoxy resins (such as polyethylene oxide), siloxane or other alcohol derivatives (such as ruthenium glycol or polyethylene glycol oxime). • The photoinitiator which can be used in the present invention is a radical which generates a radical upon irradiation with light, and which initiates a polymerization reaction by the transfer of a radical. Photoinitiators suitable for use in the present invention are well known to those of ordinary skill in the art to which the present invention pertains, for example, but not limited to, benzophenone, benzoin. , 2-hydroxy-2-methyl-l-phenyl-propan-l-one, 2,2-dimethoxy- 1,2-diphenyl -1-嗣(2,2_dimeth〇xy_12_diphenyiethan i_ one), 1-hydroxycyclohexyl phenyl ketone (1_hydr〇xy cycl〇hexyi rushing as ketone), 2,4,6-trimercaptobenzamide diphenyl 2,4,6-trimethylbenzoyl diphenyl phosphine oxide, or a mixture of them. A preferred photoinitiator is benzophenone or 1-cyclohexyl phenyl ketone. In order to increase the hardness of the microstructure layer, inorganic microparticles may be added to the resin as needed. The inorganic microparticles useful in the present invention are well known to those of ordinary skill in the art to which the invention pertains, such as, but not limited to, oxidative, dioxin, titanate, oxidized, alumina, titania, sulfuric acid. About, barium sulfate, carbonated or a mixture thereof, preferably dioxins, cerium oxide, zinc oxide or a mixture thereof. The above inorganic fine particles have a particle size of about 0.01 μm to 128,054.doc • 12·200931072 of about 10 μm. The microstructure layer of the present invention comprises one or more first regions, each of the first regions comprising at least one multimodal columnar structure, the multi-column column structure being formed by overlapping at least two columnar structures with each other The structure is composed of a curved columnar structure at a maximum height in the multimodal columnar structure. When the microstructure layer of the present invention comprises a plurality of first-regions, the first regions may be the same or different. - the adjacent side faces of the adjacent two columnar structures in the above-mentioned peak-column structure are connected to form a valley line, and the valley line has a twist of 30% of the height of the adjacent two columnar structures It is up to 95%, preferably from 30% to 85%, more preferably from 45% to 8%. . Preferably, the multimodal columnar structure is composed of a columnar structure selected from the group consisting of a curved columnar structure, a columnar structure, and a mixture thereof, and the columnar structures may be equal or unequal, Isometric or unequal width. Preferably, the multimodal columnar structure is composed of two or more arcuate columnar structures, and the superior system is composed of two arcuate columnar structures having the same height, width, apex angle and radius of curvature. Composition. ❹ In the present invention, by using the multi-peak columnar structure of the first region, it is possible to effectively utilize the light which is not effectively utilized on both sides when the conventional technique uses a single columnar structure or a single curved columnar structure. As shown in FIG. 4 or 5, when a single columnar structure or a single arcuate columnar structure is used, the light emitted by the light 31 cannot be effectively utilized; if it is modified into a multimodal columnar structure as in the present invention, The light exiting position of the original light 31 is adjusted to a light exiting position such as the light 41 or 51 so that the light can be effectively utilized. In addition, those having ordinary knowledge in the technical field of the present invention generally expect that the arc-shaped columnar structure has good scratch resistance but poor light collecting effect, and the present invention is designed by designing a maximum height as an arc 128054.doc -13- 200931072 In the multi-peak columnar structure composed of the columnar structure, the scratch resistance of the optical film can be improved, and since the multimodal columnar structure has more than two at a fixed distance (the melon to 20 (^m)) The peak can improve the light collecting effect and improve the shortcoming of the light collecting effect when only the curved columnar structure is used. A step-up enhances the overall brightness of the optical film, and the microstructure layer of the present invention can include one or more second parts as needed. a region, each of the second regions comprising at least one unimodal columnar structure. When the microstructure layer of the present invention comprises a plurality of second regions, the second regions may be the same or different; 〇 (4) When two or more unimodal 稜鏡 columnar structures are included, the single columnar structure may be of equal height or unequal height, equal width or unequal width. The second area preferably comprises two or two. More than one single-peak columnar structure, better package Two or more single-peak columnar structures having the same height, width and apex angle. When the microstructure layer of the present invention includes the first region and the second region at the same time, the maximum of the multi-peak columnar structure of the first region The height is formed by an arc-shaped columnar structure φ, and the maximum height of the multi-peak columnar structure of the first region is greater than the maximum height of the single-peak columnar structure of the first region. a sharp corner of the columnar structure in the first region and the second region of the microstructure layer due to contact with other optical films or panels. According to the present invention, the multi-peak columnar structure for forming the first region and The columnar structure and the curved columnar structure of the single-peak columnar structure of the first region are preferably symmetric columnar structures. The use of the symmetric columnar structure not only simplifies the processing method but also facilitates the control of the light collecting effect. The height of the columnar or curved columnar structure used in the present invention is 128054.doc -14-200931072. Depending on the desired optical product, it is generally in the range of 5 micrometers to 1 micrometer. Good between 10 microns The range of 50 micrometers, more preferably in the range of 20 micrometers to 40 micrometers. The highest radius of curvature of the curved cylindrical top surface used in the present invention is between 2 micrometers and 50 micrometers, preferably between 5 micrometers and 35 micrometers. Between the micrometers, more preferably between 5 micrometers and 2 micrometers. The apex angles of the columnar or curved columnar structures used in the present invention may be the same or different from each other, and are between 4 turns. To 12 〇., preferably between 6 〇.

❹ In order to achieve both high resistance and high luminance characteristics, the apex angle of the columnar structure is preferably 80. To 95. The angle of the apex angle of the curved columnar structure is between. to%. . According to a preferred embodiment of the present invention, the microstructure layer of the present invention comprises a first region, wherein the first region comprises at least one multimodal columnar structure, and the multimodal columnar structure is composed of two curved columnar structures. A union structure formed by overlapping each other; and the microstructure layer comprises a second region comprising at least one unimodal columnar structure. When the microstructure layer of the present invention comprises two or more different first regions (X. 〜, X2, X3, ...), the first regions may be any column, that is, may be a random structure, arranged Example: =: XlXlX2XlX2X丨, Χιχ2χιΧιΧ2, etc.; can also be a repeating structure, such as but not limited to: XlX2XiX2 〇2 χΐΧΐΧ2ΧιΧιΧ2. When the microstructure layer of the present invention simultaneously includes - or a plurality of identical or different first-regions and/or a plurality of identical or different second regions, the first region (X) and the second region of the microstructure layer ( y) may be arranged in any suitable order, that is, may be a random structure, the arrangement of which is F Ν 式 例如 例如 例如 例如 例如 例如 例如 例如 例如 例如 例如 例如 xx ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; 15· 128054.doc 200931072 For example but not limited to: XyXyXy, xxyxxy#. The microstructure layer of the present invention preferably comprises a repeating structure composed of a first region and a second region, more preferably a repeating structure composed of a plurality of identical first regions and a plurality of identical second regions. The ratio of the width of the first region to the width of the second region is between 0.1 and 10, preferably between 0.5 and 3, more preferably between i and 3. In general, if the ratio of the width of the first region to the width of the second region is less than 0.1, the overall scratch resistance of the optical film is relatively poor. Hereinafter, the configuration of the microjunction layer of the optical film of the present invention will be exemplified by the following description, and only the fourth embodiment is intended to limit the present invention. Any modifications and changes that can be easily made by anyone familiar with the art are included in the disclosure of this prospectus. As shown in FIG. 6a to FIG. 12, the optical film of the present invention is formed on the surface of the substrate 3A to form microstructure layers 310' 410, 510, 610, 710, 810 and 910, and the microstructure layer can be formed in the manner of : Prepared together with the substrate in an integrally formed manner; or prepared by any conventional processing method, for example, forming a microstructure layer on a substrate by coating and compression, or coating the structure required for re-engraving. In the embodiment of Fig. 6a and Fig. 6b, the first region comprises a multimodal columnar structure 320, which is a combination of two equal height curved columnar structures 32〇a and overlapping each other, wherein the arc The degree h of the valley line between the columnar structures 32〇a & 32〇b is the arcuate columnar structure 32〇& and the height % of 32〇b is 60/0, the first area can be as shown in & The illustration includes a monohedral columnar structure 340 of equal height and equal width, or two equator columns 340 of equal height and equal width as shown in Figure 6b. 128054.doc • 16 · 200931072 In the embodiment of Fig. 7, the first region comprises a multimodal columnar structure 42〇, which is composed of three arcuate columns of equal height (Ha). 42 ribs and 420c overlap each other to form a joint structure, wherein the height of the valley line between the arcuate columnar structures 42〇a and 420b is 〇% of the print, the arcuate columnar structure 42 and the valley between the 420c The height of the line is also H2i5〇%; the second area comprises a single-peak columnar structure 440 or more than two single-peak columnar structures - as shown in the right side of Figure 7, the second area It may comprise three unimodal 稜鏡 columnar structures) 'The unimodal 稜鏡 columnar structures are unequal height but equal width 稜鏡 columnar structures. In the embodiment of FIG. 8, the first region comprises a multimodal columnar structure 52〇 or comprises a multimodal columnar structure 521, wherein the multimodal columnar structure 52 is composed of two arcuate columnar structures 520a of unequal heights. And the 520b overlaps each other to form a joint structure. The lower height of the arcuate columnar structures 520a and 520b is 52〇a, the height of which is Η*, and the valley line between the arcuate columnar structures 52〇a and 520b The height 匕 is 55 % of the ' ' multi-peak columnar structure 521 is a combination structure formed by two arc-shaped columnar structures 521a and 521b of unequal heights overlapping each other, curved columnar structures 521 & and 5211? The lower height is 521b, the height is 115, the height hs of the valley line between the arcuate columnar structure 52 la and 52 lb is 65% of Hs; the second area contains a single-peak columnar structure or contains two More than one single-peak prism columnar structure. In the embodiment of Fig. 9, the first region comprises a multimodal columnar structure 62〇, which is composed of two equal heights (the columnar structures 620a and 620c having a height of HO and a height greater than the columnar shape) The height of the valley line between the columnar structure 620a and the curved column structure 128054.doc 17 200931072 620b is 62% of the H6, The height 117 of the valley line between the columnar columnar structure 620c and the curved columnar structure 620b is also 62% of 116; the second region comprises a plurality of unimodal prism columnar structures 640 of equal height but unequal width. In an embodiment, the first region comprises a multi-peak columnar structure 720, which is a combination of a curved columnar structure 720a and a columnar structure 720b. The height of the structure 720a is greater than the height of the prism columnar structure 720b, the height H8 of the columnar columnar structure 720b, and the height h8 of the valley line between the arcuate columnar structure 720a and the prism columnar structure 720b is 45%; The second region comprises unimodal columnar structures 740 and 741 of unequal height and unequal width. In the sample, the first region comprises a multi-peak columnar structure 820 or comprises a multi-peak columnar structure 821, the multi-peak columnar structure 820 is composed of two unequal-high columnar structures 820a and 820c and a height greater than the The arc-shaped columnar structure 820b of the prism columnar structure overlaps with each other, and the height h9 of the valley line between the columnar columnar structure 820a and the curved columnar structure 820b is the height of the columnar structure 820a. 67%, the height h1() of the valley line between the prism columnar structure 820c and the curved columnar structure 820b is 58% of the height H10 of the columnar structure 820c, and the multimodal columnar structure 821 is composed of two a converging structure formed by overlapping the arcuate columnar structures 821a and 821b with each other in height (Hn), wherein the height hn of the valley line between the arcuate columnar structures 821a and 821b is 60% of Hn; The two regions comprise at least one unimodal columnar structure. 840, and the two columnar structures 840 can be equal or not equal in height, equal in width or unequal in width. In the embodiment of Figure 12, the first The area contains a multi-peak columnar structure 920, 128054.doc •18- 200931072 It is composed of two contoured arcuate columns 920&am And a combination structure formed by overlapping 920b with each other, wherein the height of the valley line between the curved columnar structures 920a and 920b is 58% of the height Hi2 of the arcuate columnar structures 92〇& and 92〇1); The second region comprises two monoclinic columnar structures 940 and 941 of equal height and equal width, wherein the height of the valley line between the single peak and the columnar structure 94〇 and 941 is height h, and 3 is a single peak. The heights H13 of the columnar structures 940 and 941 are 22%. Figure 13 is a plan view showing an embodiment of an optical film of the present invention, wherein the multi-peak columnar structure of the first region and the single-peak columnar structure of the second region are columnar structures of 〇 linear extension. The columnar structure of the present invention is not limited to a columnar structure extending in a straight line, and may be a columnar structure extending in a curve (as shown in Fig. 14) or a line extending. Further, the peak heights of the columnar structures may not vary in the direction of extension, but may vary regularly or irregularly along the direction of extension. If the columnar structure <peaks are intended to change regularly or irregularly along the direction of extension, they may be designed to be fabricated in one piece, or a columnar structure having a peak height that does not vary in the direction of extension, and then The secondary processing is performed such that the peak height of the columnar structure changes regularly or irregularly along the extending direction. In addition, in addition to the two inclined planes as described herein before, the columnar structure or the curved columnar structure for the present invention may be used, and two inclined curved surfaces curved along the extending direction may be used to constitute the The columnar structure or the arcuate columnar structure, and the radius of curvature of the inclined surfaces may each change regularly or irregularly along the extending direction thereof. According to the present invention, the columnar structures of the multimodal columnar structure constituting the first region and the unimodal columnar structure of the second region may be parallel or non-parallel to each other, and are not parallel to each other. The structure may be in the form of 128054.doc 200931072 that has intersected or not intersected. To enhance the hardness and to avoid scratching the surface of the substrate, the optical properties of the film are affected, and a scratch-resistant layer may be formed on the other surface of the substrate relative to the microstructure layer as needed. The above-mentioned anti-layer may be smooth or non-smooth, for example, having a fine uneven structure. The anti-layer of the present invention may be formed by any conventional method, such as, but not limited to, screen printing, spray coating, embossing, or coating a surface of a substrate with a diffusion-resistant particle-resistant layer or the like, wherein the coating contains The anti-layer of the diffusion particles provides some degree of light diffusion to the layer. The thickness of the above-mentioned anti-layer is preferably between 1 and 50 microns, more preferably between 1 and 10 microns. According to the present invention, it is preferred to apply a hard cover liquid comprising a diffusion particle and at least one resin selected from the group consisting of an ultraviolet curable resin, a thermosetting resin, a thermoplastic resin, and a mixture thereof on a substrate, and if necessary, Thermal curing, ultraviolet curing, or heating and ultraviolet double curing to form a scratch-resistant layer, and thereby making the scratch-resistant layer have a textured structure. The amount of the diffusion particles is 0.1 to 10% by weight based on the total weight of the resin component in the hard coat liquid.紫外线 UV curable resin which can be used in the scratch-resistant layer of the present invention is as described herein before it can optionally include an oligomer having a molecular weight of from about 1〇3 to about 1〇4. Those skilled in the art are known, for example, acrylate oligomers such as, but not limited to, urethane acrylate vinegar such as aliphatic urethane acrylate, aliphatic amine hydrazine aHphatic urethane hexaacrylate and aromatic urethane hexaacrylate; epoxy acrylate such as bisphenol 128054.doc -20- 200931072 A epoxy dipropionate (bisphenol-A epoxy diacrylate) and novolac epoxy acrylate; polyacetal acrylate, such as polyester diacrylate; or pure acrylic acid vinegar.

The thermosetting resins useful in the present invention generally have an average molecular weight of from about 1 〇 4 to about 2 x 10 6 , preferably from about 2 x 10 4 to about 3 x 105, more preferably from about 4 x 10 4 to about 105. The thermosetting resin of the present invention may be selected from a polyester resin containing a hydroxyl group (-OH) and/or a carboxyl group (-COOH), an epoxy resin, a polymethyl acrylate resin, a polyacrylate resin, a polyamide resin, A group consisting of a fluorocarbon resin, a polyimide resin, a polyurethane resin, an alkyd resin, and a mixture thereof preferably contains a trans-base (_OH) and/or a rebel group (- A polymethyl methacrylate resin or a polyacetic acid vinegar resin such as polyacrylic acid acrylate resin. The thermoplastic resin which can be used in the scratch-resistant layer of the present invention may be selected from the group consisting of polyester resins; polydecyl acrylate resins such as polymethyl methacrylate (pMMA); and mixtures thereof. The diffusion particles which can be used in the scratch-resistant layer of the present invention are not particularly limited and are well known to those skilled in the art to which the present invention pertains, and may be organic particles such as (mercapto) acrylic resin, urethane resin. Or an anthracene resin or a mixture thereof; or an inorganic particle such as oxidized, cerium oxide, titanium dioxide, oxidized oxidized, oxidized, zinc sulfide, barium sulfate or a mixture thereof or a combination of the two. Preferred particles are organic particles. The shape of the above-mentioned diffusion particles is not particularly limited, and may be, for example, a (four) shape, a rhombus shape, or the like, and the particle size thereof is preferably between 1 and 30 μm. The scratch-resistant layer of the present invention may optionally include any technical field 128054.doc of the present invention. 21 - 200931072 An additive known to those skilled in the art, such as, but not limited to, an antistatic agent, a photoinitiator, a leveling agent, a wetting agent, a dispersing agent or inorganic fine particles. Examples of antistatic agents, photoinitiators and inorganic microparticles suitable for use in the present invention are as previously described herein. The anti-reflective layer of the optical film of the invention has good antistatic property and high hardness property, and its surface resistivity is between 1 and 8 (1), which is in the mouth ((Ω/□ represents ohm/m square)' and according to JIS Κ 5400 standard Method measurement, the pencil hardness can reach 3Η Ο

Or more, and measured according to the JIS K7i36 standard method, having a haze of from 1% to 98%. The order of preparing the microstructure layer and the scratch-resistant layer of the optical film of the present invention by any conventional method and preparing the microstructure layer and the scratch-resistant layer is not particularly limited. The microstructure layer of the optical film of the present invention can be made in any manner known to those of ordinary skill in the art to which the present invention pertains, for example, by a method comprising the steps of: (4) mixing a resin with a suitable additive to form a gel.涂料(b) on a cylindrical blank (or roller), with a diamond tool moving on the rotating drum in a direction transverse to the drum, by controlling the speed of movement of the diamond tool and/or The rotation speed of the drum causes the diamond tool to lie on the drum. (c) 'The roller is then engraved on the substrate or roller by thermal transfer or heat. Rolling embossing, squeezing the coating to form a structured surface; and 128054.doc -22. 200931072 (d) irradiating the coating with energy rays or heat or both to cure the coating. The scratch-resistant layer of the optical film of the present invention can be produced in any manner known to those skilled in the art to which the present invention pertains, for example, by coating a coating composition comprising particles, a resin, and an optional additive on a substrate to form a coating. The layer is then irradiated with energy rays or heat or both to cure the coating. The following examples are intended to be illustrative of the invention and are not intended to limit the scope of the invention. Any modifications and variations made by anyone skilled in the art are intended to be included within the scope of the disclosure and the scope of the appended claims. Preparation of Glue A will be 60 grams of EM210® (2-phenoxyethylpropionate, sold by Eternap>) and 60 grams of 624-l® (epoxy acrylate, by Eternal Corporation) Sold out) Mix 'and then add 5g Chivacure® BP as a photoinitiator (benzophenone, supplied by Double Bond Chemicals) at 5〇t: and at 1转速rpm to form a gel Liquid A. ® Preparation of Glue B. Solvent (40 g of toluene), acrylate monomer (1 g of dipentaerythritol hexaacrylate, 2 g of trimethylolpropane triacrylate, 14 g of pentaerythritol triacrylate), oligomerization The mixture (28 g of aliphatic urethane hexaacrylate [Etercure 6145-100, Eternal]) and a photoinitiator (6 g of 1 hydroxycyclohexyl phenyl ketone) were mixed and stirred at a high speed to obtain a solid fraction of about 6 〇% and a total of about 100 grams of resin formula B'. Solvent (27 g 曱 stupid, 13. 5 g of butanone), 克 5 g of acrylic microparticles 128054.doc •23· 200931072 [SSX-108, Japan Sekisui Chemical Co., Ltd.; average particle size 8 μπι], 40 g Resin formula 、·, thermosetting resin (20 g acrylate resin [Eterac 7365-S-30, Eternal] (solid content about 300/.)) and 2 g antistatic agent [〇1^1:8-36M-AS , Marubishi oil Chem. Co., Ltd. (about 20% solids), forming a gum B (about 30% solids).

Mould roller engraving C 'The precision roller surface is electroplated with electroless nickel or oxygen-free copper, with CNC ultra-precision precision lathe with tool positioning instrument, and single crystal drill with different r value and angle © stone knife, lathe speed below 500 rpm, into The upper limit of the amount of 〇.〇15mm, the numerical control (NC) program is written according to the set pattern, and the required diamond knife is used. With the aid of the tool positioning instrument, the tool is changed at the appropriate time to prepare the surface of the roller. The microstructured groove is used as a mold for subsequent processing. As described herein before, the order of preparing the microstructured layer and the scratch-resistant layer is not particularly limited, and the preparation method is as follows. Preparation of microstructure layer. Apply glue A onto a polyethylene terephthalate (PET) substrate [A4300®, TOYOBO; thickness 188 μη] to form a coating, and then use The roller of the micro-structured groove obtained by the method of engraving C of the mold roller forms a structured surface on the coating by embossing, and then uses energy rays (200-400 nm UV lamp, intensity: 150 at normal temperature). ~300 mJ/cm2, time: 2 to 15 seconds) The coating is irradiated to cure. Preparation of scratch-resistant layer Coating the glue B on the surface of the substrate with RDS applicator bar #3, after 1 〇〇 <) (: dry 128054.doc •24· 200931072 After drying for 1 minute, then UV exposure machine Table (Fusion UV, F600V, 600 W/inch, Η-type lamp source), energy ray 200 mJ/cm2, time: 2~15 seconds, and solidified to obtain a scratch-resistant layer with a thickness of about 5 μηι. An optical film prepared by the above method, the microstructure comprising a repeating structure composed of a first region and a 'second region, wherein the first region comprises a multimodal columnar structure composed of two arc-shaped columnar structures The height of the intersecting valley line of the two columnar structures in the multi-peak curved columnar structure is about 58% of the height of the adjacent two columnar structures having a lower height; and wherein the second area comprises two singles Peak prism columnar structure. Various characteristic tests were carried out, and the results of the test were as shown in the following Tables 1, 2, 3 and 4. Comparative Example 1 The optical film of Comparative Example 1 was prepared by the above preparation method, in which the mold roller engraved the roller of C Is designed such that the microstructure of the fabricated optical film has a plurality of non-parallel and intersectable The unstructured columnar structure has a microstructure such as a commercially available concentrating film 96SM (Eternal Co.). Various characteristic tests were carried out, and the results of the test are shown in Table 1 below. Comparative Example 2 Commercially available concentrating film PTR733 (Xinhe Company), the microstructure was a lenticular structure. Test Method A: The films of Example 1, Comparative Example 1, and Comparative Example 2 were subjected to the following tests and recorded in Tables 1 and 2.锣#卉亮彦's wide/轼: Using the NDH 5000W haze meter [曰本电色公司], according to the nS K71 36 standard method, measuring the haze of the sample to be tested 128054.doc •25- 200931072 (Hz) and all Light transmittance (Tt). 硬笔硬彦 test powder: pencil using the pencil hardness tester [Elcometer 3086, SCRATCH BOY] to test the surface of the microstructured layer of the sample to be tested by JISK-5400 using Mitsubishi pencil (2H, 3H) Hardness: Zhongpu Hard Friends: Using the pendulum hardness tester [Braive Instruments, model Pendulum Hardness Konig type], directly test the hardness and wear resistance of the microstructure layer of the sample to be tested with its 稜鏡 microstructure layer, the test stroke is 60° to Between 3 0°, record the number of swings. When the surface hardness of the sample to be tested is harder, the number of swings of the pendulum can be more than that of the surface of the sample to be tested. The seal test: using a linear wear tester [TABER 5750] on a weight platform of 600 g (long area) The 3M BEF-III-10T diaphragm (length and width 20 mmx20 mm) is attached to the 20 mmx20 mm wide, and the weight and scratch resistance of the microstructure layer of the sample to be tested is directly tested by the 稜鏡 microstructure layer to test the stroke. 2 inch, 1 0 cycle/min speed for 10 cycles scraping test. Table 1 Haze Hz (%) Total light transmittance Tt (%) Pencil hardness scratch resistance test Pendulum hardness (number of swings) Example 1 94.57 24.56 3H No scratch 71 Comparative Example 1 96.75 5.56 严重 Severe scratch 48 by example 1 and the results of Comparative Example 1 show that the same glue is used, but the different microstructures are engraved, and the hardness and scratch resistance of the optical film are changed. The optical film of the present invention has better hardness and heavy pressure and scratch resistance. The damage of the microstructure layer can be effectively avoided, thereby saving the cost of using the upper diffusion film and the protective film. 128054.doc -26- 200931072 Table 2 Haze Hz (%) Total light transmittance Tt(°/o) Pencil hardness scratch resistance test pendulum hardness (number of swings) Example 1 94.57 24.56 3H No scratch 71 Comparative example 2 92.86 59.92 3H No scratches 103 As can be seen from Table 2, the hardness and scraping ability of Example 1 and Comparative Example 2 were similar. Further, the optical films of Example 1 and Comparative Example 2 were subjected to the following tests to compare their luminance gain effects. Test Method B: Brightness test: The film of Example 1 and Comparative Example 2 and the diffusion film [DI-780A and DI-600A] produced by Eternal Co., Ltd. were combined with a backlight to form various modules for luminance analysis. Backlight 1 : Based on a direct-lit backlight of 10 cm square, the structure is such that four straight-tube type cold cathode tubes (CCFLs) are placed on the anti-UV reflective film, and a 2 mm diffuser plate is placed to homogenize the light source. Backlight 2: Based on the 17"side backlight, the structure is a reflective film. The light guide plate and the reflector are placed on both sides of the light guide plate and a cold cathode lamp (CCFL). Use a luminance meter [Topcon, SC-777] to measure the luminance of the backlight and the module to be tested at a distance of 2 ° from the backlight directly above the backlight (0 ° angle) (Brightness; unit :cd/m2). Using the central luminance value of the backlight as the base value, dividing the difference between the central luminance value of the module to be tested and the base value by the base value and multiplying by 100%, the module to be tested is compared with the backlight 128054. .doc -27- 200931072 Brightness gain value. The results are reported in Table 3 and Table.

❹ 128054.doc -28 - 200931072 Table 3 10-10 Forward luminance value (cd/m2) Luminance gain (%) Backlight 1 3915.35 0 Moonlight Township 1 plus January diffusion film (DI-780A) and a comparative example 2 diaphragm 5408.23 +38 backlight 1 plus one piece of lower diffusion film (DI-780A) and one piece of embodiment 1 diaphragm 5665.76 +45 backlight 1 plus two pieces of comparative example 2 amine 1599 +43 backlight 1 plus two examples 1臈& 6561.08 +68 ❹Table 4 17"Sideside backlight^ ~ Forward luminance value (cd/m2) Luminance gain (%) Backlight 2 180.7 0 Backlight 2 plus one piece of lower diffusion film (DI_78〇A) And a comparative example 2 45 456.1 + 152 light source 2 plus a piece of lower diffusion film (DI-780A) and a piece of Example 1 film 609 + 237 comparison results of Example 1 and Comparative Example 2 of Tables 3 and 4 It can be seen that: (1) The forward luminance value of the original 10 cnix 1〇cm direct type backlight 1 is 3916.35 cd/m2, plus a piece of lower diffusion film (DI_78〇A) and one piece of embodiment 1 臈片可可为45 The luminance gain value of %' makes the luminance reach 5665.76 cd/m. However, 'Backlight 1 plus a piece of lower diffusion film (DI_78〇A) and one piece of Comparative Example 2 provide only 38% brightness. Gain value, the luminance reached 5408.23 cd / m2 »Thus' Example 1 of the present invention can be both membrane and scratch luminance. Comparing the backlight 1 with the two concentrating film modules, the luminance gain value (Example!: 68%) of the first embodiment of the present invention is significantly better than the luminance gain value (43%) of Comparative Example 2. 128054.doc -29- 200931072 (2) The positive luminance value of the original 17" side backlight 2 is 18 〇, 7 cd/m2, plus a piece of lower diffusion film (DI-780A) and one embodiment 1 The film provides a luminance gain of 237%, which achieves a luminance of 6〇9 cd/m2; however, backlight 2 plus a lower diffusion film (DI-780A) and a comparative example 2 film can only provide 152% The luminance gain value has a luminance of 456.1 cd/m2. Compared with the backlight 2 plus a piece of the lower diffusion film (DI-780A) and a piece of the film of the comparative example 2, the film of the first embodiment of the present invention can be provided. Preferably, the optical film of the present invention has good scratch resistance and high luminance gain characteristics. [Fig. 1] Various opticals of the backlight module BRIEF DESCRIPTION OF THE DRAWINGS Fig. 2 is a schematic view of a conventional concentrating film. Fig. 3 is a schematic view showing the light output of a conventional prism column structure. Fig. 4 and Fig. 5 are schematic diagrams showing the light output of the multimodal columnar structure of the present invention. Fig. 6a to Fig. 12 A schematic view of an embodiment of an optical film of the present invention. Fig. 13 and Fig. 14 are views of an embodiment of an optical film of the present invention. . ® [REFERENCE SIGNS LIST 2 main element 321 the light guide plate 22 Prism base structure reflecting the protective film 6 4,5 condensing film diffusing film diffusing film 128054.doc -30- 200931072

23 24 31,32,41,51 300 310, 410, 510, 610, 710, 810 320, 420, 520, 521, 620, 720, 820, 821, 920 340, 440, 540, 541, 640, 740, 741, 940, 941 320a, 3 20b, 420a, 420b, 420c, 520a, 520b, 52 la, 52 lb, 620b, 720a, 820b, 821 a, 82 lb, 920a, 920b 620a, 620c, 720b, 820a, 820c hi to h13

Hb H2, H4 to H6, 118 to 1112 peak-to-valley light-emitting direction, microstructure, first layer, multi-peak columnar structure, second region, single-peak, columnar structure, arc-shaped columnar structure, columnar structure, valley The line is more than the south of the height of two adjacent columnar structures in the multi-front column structure 128054.doc -31 -

Claims (1)

200931072 X. Patent application scope: An optical film, a structural layer, wherein the substrate is contained and the surface is located on one surface of the substrate The microstructure layer includes _ or a plurality of first regions, each of the first regions including a multi-peak columnar structure. The multi-peak columnar structure is a combination structure formed by overlapping at least two columnar structures with each other. And the maximum height of the multi-peak columnar structure is formed by an arc-shaped columnar structure; and the microstructure layer optionally includes one or more second regions, each of the second regions comprising at least one single-peak column Structure. 2. The optical enthalpy of the request, wherein the columnar structure of the multi-column columnar structure for forming the first region is selected from the group consisting of a curved columnar structure, a columnar structure, and a mixture thereof. 3. The optical film of claim 1, wherein the multi-peak columnar structure of the first region is composed of two or more arcuate columnar structures. 4. The optical film of claim 1, wherein the microstructure layer comprises a first region and a first region, the maximum height of the multi-peak columnar structure of the first region being greater than the single-peak columnar structure of the second region maximum height. 5. The optical film of claim 1, wherein the adjacent side faces of the adjacent two columnar structures in the first region multimodal columnar structure are joined to form a valley line, and the height of the valley line is adjacent to two The height of the height of the columnar structure is from 3〇% to 95% 〇6, such as the optical film of the kiss item 5, wherein the height of the valley line is the height of the lower one of the adjacent two columnar structures. 45% to 80%. 7. The optical film of claim 1 or 2, wherein the height of the columnar structure and/or the curved column 128054.doc 200931072 is between 5 microns and loo microns. 8. The optical film of claim 2, wherein the radius of curvature of the top of the curved columnar structure is between 2 microns and 50 microns. 9. The optical film of claim 1 or 2, wherein the apex angle of the columnar columnar structure and/or the curved columnar structure is between 4 turns. To 12 baht. . 10. For the optical film of item 9, the angle of the apex angle of the prismatic columnar structure and/or the curved columnar structure is 60. To 95. . 11. The optical film of item 1 or 2 wherein the arcuate columnar structure and/or the crucible columnar structure is a symmetric columnar structure. 12. The optical film of item 1, wherein the multimodal columnar structure and/or the unimodal columnar structure is a columnar structure extending in a straight line. 13. The optical film of claim 1, wherein the multimodal columnar structure and/or the unimodal columnar structure is a columnar structure extending in a curve or a fold line. 14. The optical film of claim 1, wherein the peak height of the multimodal columnar structure and/or the unimodal columnar structure does not vary in the direction of extension. 15. The optical film of item 1 wherein the peak height of the multimodal columnar structure and/or the unimodal columnar structure is regularly varied along the direction of extension. 16. The optical film of claim 1, wherein the peak height of the multimodal columnar structure and/or the unimodal columnar structure varies irregularly along the extending direction. 17. The seed film 'comprising a substrate, a microstructure layer on a surface of the substrate, and a scratch-resistant layer on the other surface of the substrate, the microstructure layer> comprising the first region a repeating structure formed with the second region, wherein the first region comprises at least one multimodal columnar structure, and the multi-stranded columnar structure is a union formed by overlapping at least two arcuate columnar structures with each other 128054.doc 200931072 structure, wherein adjacent side faces of two adjacent columnar structures are connected to form a valley line, and the height of the valley line is 45% to 80% of the height of the lower one of the adjacent two columnar structures; and the The second region comprises at least one single-peak columnar structure; the maximum height of the multi-peak columnar structure of the first region is greater than the single-peak columnar structure or the multi-peak columnar structure of the first region The biggest 'height. 18. The optical film of claim 17, wherein the scratch resistant layer is smooth. Ο 19. The optical film of claim 17, wherein the scratch resistant layer is non-smooth. 20. The optical film of claim 19, wherein the scratch-resistant layer has a textured structure and comprises diffusing particles and at least one resin selected from the group consisting of ultraviolet curable resins, thermosetting resins, thermoplastic resins, and mixtures thereof. 21. The optical film of item 17, wherein the height of the columnar structure and the curved columnar structure is in the range of 5 micrometers to 1 micrometer. 22. The optical film of item 17, wherein the radius of curvature of the top of the curved columnar structure is between 2 microns and 50 microns. • The optical film of item 17, wherein the prismatic columnar structure and the curved columnar structure have an angle of apex angle of 60. To 95. . 24. The optical film of item 17, wherein the curved columnar structure and the columnar structure are symmetric columnar structures. 25. The optical film of item 17, wherein the arcuate columnar structures have the same height, width, apex angle, and radius of curvature. 26. The optical cartridge of item 17, wherein the repeating structure is formed by staggering the first region and the first region. The optical film of claim 1 or 17, wherein the substrate is selected from the group consisting of polyethylene terephthalate, polydecyl methacrylate, polycycloolefin resin, cellulose triacetate, A group consisting of polylactic acid and mixtures thereof. ❹ 128054.doc