TW200921769A - Plating apparatus for metallization on semiconductor workpiece - Google Patents

Abstract

The present invention provides a plating apparatus with multiple anode zones and cathode zones. The electrolyte flow within each zone is controlled individually with independent flow control devices. A gas bubble collector whose surface is made into pleated channels is implemented for gas removal by collecting small bubbles. coalescing them, and releasing the residual gas. A buffer zone built within the gas bubble collector further allows unstable microscopic bubbles to dissolve.

Description

200921769 IX. INSTRUCTIONS OF THE INVENTION: FIELD OF THE INVENTION The present invention relates generally to electroplating apparatus, and more particularly to apparatus for electrochemically forming a metal layer on a thin resistive substrate,制造 Manufacture of ultra-large-scale integrated bodies on the wafer (part of the ulsi structure. & $ ^ [Prior Art] In the ULSI, an interconnect structure is formed, in the αα%, in the resistive substrate of the tantalum (the seed layer) The metal layer is deposited by electrochemical method, usually a copper layer, which is generally achieved by a plating apparatus. The electric house includes the following components: an anode, a power source, and a conductive crystal crucible 15] 3 固 holding device, and an electrolyte unit, the electrolyte unit comprising a mixed solution composed of an acid, a metal, a genus & I salt and other additives. In the traditional electric boat process, the meal is connected to a The current density in the range of the seed layer is not uniform. Because of the existence of the transparent effect, the current density around the substrate is higher. The A, 丨L of the current is dense. Non-uniformity makes the wafer The edge has a higher plating rate and the wafer has a lower plating rate of φ 曰 day β. The unevenness of the plating film due to the difference in the plating rate of the f+ T “clamping position at the edge of the wafer and the center portion, The subsequent planarization step in the process flow of the 益 益 仔 device becomes difficult. A % pole system with independent electric 湃 & & 电 电 可 amp can be applied to the plating device to overcome the above A system for the above-mentioned system is described in US Pat. No. 6,391,166. When using an inert anode or a plurality of inert anodes for electrical forging, it will be in the process of electricity during the 200921769 Produce the system, or the electric raft; the air bubbles may also be introduced by the electrolyte supply system. When the intervention operation or the process of the maintenance process is in contact with the surface of the ruthenium forming the hole in the process, the device will be in the electric mine. The yield rate is reduced. In the force m, when a large amount of bubbles are generated in the electrolyte, a large amount of bubbles are generated, and the electricity and electroplating device % are changed and severely lowered. The diameter is blocked and the modern electroplating device based on the principle of pollution and natural convection φ / θ is used for hanging and hanging....: but these devices usually do not work on small surfaces. They are difficult to be removed by the buoyancy, the attachment force and the resultant force of the blood//i/jaw generated by the electroplating device. The conventional defoaming defoaming device comprises a porous layer, the porous layer It has a dry tan surface and is a noisy technique. i κ variable production... φ隹] cone "has eliminated a large number of small bubbles without changing the body % and electric field, but to introduce a kind of small bubbles that can become atmospheric :: Pack, and mechanism, and increase the membrane surface area to remove bubbles. The U 4 #胄 size gradually becomes smaller. It is necessary to add the organic additive in the electromineral solution to achieve non-porous filling. These organic components are solved in electroplating and k-private. The decomposed product accumulates in the plating bath and reduces the abundance of the true charge. If these products are incorporated as impurities into the plating film, they will become a hole for 4,466, and a core nucleus~' causing the reliability of the device to fail. In the more advanced electroplating process technology, to improve the discharge and replenishment of the plating solution. The rate to ensure the freshness of the chemical usually requires higher costs. . In the case where the fluid field is not specifically designed in the electroplating apparatus, the fresh active organic constituents and the decomposed by-products in the electroplated spears will be uneven in the electrolyte close to the surface of the crystal surface of 200921769. ::? Rate (this rate is the quality control of the discharge of the electric clock and the problem of replenishment cannot be solved simply by raising the mountain.) The invention is an embodiment of the invention. The coating set includes at least two anodes of the anode and the anode of the valley, and the handle is small; plus a ', two fluid anode circulation systems in the inner and the evening, at least two cathodes and two cathode circulation systems, a buffer zone, a name that forces the bubbles to coalesce, a t 1 hunting u bubble collector, a power subsystem, a thunder + device capable of effectively removing plating by-products, and an electrolyte fluid field controller System, electrolyte distribution subsystem, jade solution 2, and wafer holding device. The bubble 隼 奘 & & & & & & & & & & & & & % & & & & 装置 装置 装置 装置 装置 装置 装置 装置 装置 装置 装置 装置 装置 装置 装置 装置 装置 装置 装置 装置 装置 装置 装置 装置 装置 装置 装置 装置 装置In the pleated channel, the second person is inverted V-shaped, and the bubble after the convergence is guided to move upward along the passage or the groove. And the pleated channel increases the bubble collection, thus increasing the total electrolyte flow area, so that the electrolyte is blocked in the small bubble.

The partial pores of the earthworm bubble collector can still be tilted 0"L. The embodiment of the hairy month also provides an additional buffer zone between the membranes, which 2, the product / medium electrolyte cycle rate is significantly lower than Cathode chamber. The buffer area allows the broken bubbles of the film to pass through the bottom film to be dissolved before reaching the top film. f The present invention includes a package-to-cat-type error by controlling the electrolysis close to the surface of the crystal moon.

In the field of electroplating, the method of effectively supplying organic additives from the surface of the coffin and effectively removing by-products from the surface of the electric ore base. Electrolyte fluid field control is achieved by a combination of fluid velocity and on-off time for the fluid region in the cathode chamber. The electrolyte fluid field control subsystem independently controls the fluid velocity and start-stop time in each flow = zone. The efficient supply of organic additives improves the metal filling of the vias, trenches and dual damascene structures on the substrate, while the effective removal of plating by-products reduces the imperfections of the plated metal film. [Embodiment] Figs. 1a, 1b, and 1B show an electroplating apparatus according to an embodiment of the present invention. The keying device includes a lower chamber u for accommodating the anode and including a plurality of anode regions 110, and an upper chamber 12 including a plurality of cathode regions 12A having independent cathode electrolyte inlets m. Both the anode region 11A and the cathode region 120 are separated by a plurality of longitudinally disposed partition walls 1〇2. The lower chamber U and the upper chamber 12 are connected to each other by a bubble collector ι 5 disposed laterally.

U is in each anode region of the lower guanamine 11 " wipe, a ring-shaped yang 1 is supported by 19 pedestal 1 〇 7 and is connected to an independently controlled power channel i7. Cavity... 7 has a number of typed... for fixing the yang and - hai pillars coated with a non-conductive material. The bottom of the device is detachable' to facilitate replacement of the anode. A hard frame ι 6 located above the anode provides mechanical support for the bubble collector and the superstructure of the dam. Each ring is a single piece or consists of a plurality of connected pieces. The power supply of the ore device includes a plurality of lightning sources 丨丨7. According to an embodiment, the lower chamber includes at least two anode regions 11A. Isolation bile (10) surrounds each of the 200921769 open v anodes 1 0 1 and separates the electric field and limits the electrolyte fluid field. The wall of the 1 0 2 is far from the non-conductive, chemically resistant plastic. According to the embodiment, the partition wall 102 has a plurality of small holes which are located at a position close to the bubble collecting H 1 〇 5 as a passage for the bubble. According to another embodiment, the spacer 胄1〇2 has no apertures thereon to completely isolate the electrolyte in adjacent anode regions. The plating current or voltage is independently applied to each of the annular anodes by the power supply channel i丨7. Each individual channel of the power supply can apply voltage and waveform to each of the ring anodes according to a preset time. The power supply can be a DC or pulsed power supply. An anode fluid distribution subsystem consists of a separate anolyte inlet 103 and a separate anolyte outlet 119 connected to the electrolyte flow control device in each anode region. The anode fluid distribution subsystem is used to supply electrolyte to each anode region and to discharge old electrolyte, decomposition products and particles from each anode region. The separate anolyte circulation system in each anode region minimizes mixing between the anode electrolyte streams in different anode regions. Bubble collector 105 is formed by attaching one or more permeable membranes to a rigid open or meshed frame wherein the frame is tapered or inverted cone shaped. The four tanks 5 located around the bubble collector frame collect bubbles and direct them to a gas outlet 1 〇 6. The grooves 1 15 may be inclined to form an angle with respect to the horizontal plane. A gas outlet 106 is connected to the recess to discharge the collected gas. One or more attached permeable membranes 302 (see Figure 3a) can be designed for different functions up to 200921769. The underlying film acts as a bubble with a bubble diameter greater than a few micrometers to tens of tens of ruthenium, blocking straight bubbles. The decomposition product produced in the gland, the 隹/驭 is prevented from being supplied to the lower chamber; the membrane is at the same time, the membrane is also raised at the same time, for example, the membrane of the bubble collector is selected from the group of columns. Porous fluoroplastic (OVT?, 5, sulphuric acid (PVF), polyvinylidene fluoride (pVDF), .w; rolled ethylene (PTFE), perfluoroalkoxy resin (PFA), Flatness of the hole in the membrane

Rn ^ 卞叼 diameter is 2 / / m to m. In another embodiment, the upper film is slanted ... 16 as a barrier to i C bubbles having a diameter less than 2 " m. This membrane allows specific ions to pass but prevents the passage of I macromolecules. According to an embodiment, the upper film is made of a fluorine-containing plastic having a specific functional group in the group, and the pores of the upper film have an average diameter of from 2 to 150 nm. ’

J The permeable membrane has a bad passage on the surface to enhance the effect of bubble collection' and increase the total area of the permeable membrane. The pleated channel has a v-shaped or inverted V-shaped cross section. This configuration forces the bubbles to first accumulate in the channels before directing the residual gas to exit upwardly along the channels. According to an embodiment, the pleated channel can be oriented, spirally arranged or annularly arranged, and the angle between two adjacent side walls of the pleated channel is i 〇. To 120. . The maximum height of each pleated channel is between 2mm and 30_. The sum of the volume forces exerted on a bubble in a static electrolyte solution (ignoring gravity) is given by equation (1) and is closely related to the radius of the bubble: 4 TVgpr1 - βπηνΓ ( 1 ) where F is the volume force The resultant force 'r is the radius of the bubble, and v is the speed of the bubble 10 200921769? 7 is the viscosity coefficient of the electrolytic solution. A /, a bubble with a semi-twisted j, is difficult to move in the electrolyte solution' due to the volumetric force of the same. In order to effectively remove them from the electrolyte solution, they need to be aggregated into large bubbles. The monolithic channel forces the gas moving path to converge at the bottom of the channel so that the bubbles converge there and* as the size of the bubbles becomes larger, a larger volume of force will push them: the channel moves up and exits. Γ Furthermore, reducing the angle between the two adjacent side walls of the pleated channel results in a smaller resistance to the buoyancy effect due to the contact of the bubble with the side wall, making it easier for the bubble to move to the bottom of the pleated channel. On the other hand, the pleated channels also increase the surface area of the membrane, resulting in an increase in the total electrolyte flow area of the surface. The large surface area allows sufficient electrolyte to circulate in the presence of small bubbles that adhere to the film and partially block the pores. The large surface area also increases the effect of specific ions passing through. In Figures 1 a and 1 b, according to the embodiment, the upper chamber 12 includes a cathode region 12 〇 having a circular cross section (except for one cathode in the middle, which is circular in cross section). Each cathode in the upper chamber 12 = 1 2 〇 ^ has a separate supply electrolyte connection to the electrolyte flow control device. U The excess electrolyte overflows from the periphery of the upper chamber and exits at the outlet U8. The line of electrolyte inlet (1) passes through the bubble collector frame and the barrier 1〇2 to reach each of the individual cathode regions 12〇. The electrolyte flow control device in the cathode region can be set with different flow rates and switches to enable the flow line of the fluid field to be integrally controlled or locally controlled in a specific process step. 200921769 Localized field control is required for electrolysis The freshness of the liquid mixture, especially the electric clock, has to be maintained in the mixture. The concentration of the organic additive affects the electrical material rate, the charge, and the defects on the bond mold. It is also desirable for the local fluid to effectively remove the by-products from the zone to detect the brake products and prevent them from binding into the positive membrane. By removing by-products from the vicinity of the shovel charge in the Meng and grooved structures that are growing in the ruthenium, the through-hole m-plating fill defect can be minimized and the most (four)

The reliability of the 1 line and the contacts is ' ς 置 置 置 置 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整The center part of the electroplated substrate is edged. The niobium area has opposite fresh organic additives and reaction by-products, and the exchange rate of the dip is the same. Fresh organic additives and reaction by-products are equal in the entire electroplating area. The exchange rate ensures that the resulting composition of electricity (4) is m, in other words, improves the ultimate resistance and uniformity of electromigration resistance of the devices fabricated at different locations on the substrate.

In summary, by locally controlling the fluid field, the following effects can be obtained: controlling the uniformity of the thickness of the electro-bond film on the entire substrate; controlling the uniformity of the composition of the plating film on the entire substrate; controlling the entire substrate The uniformity of the resistivity of the plating film on the upper layer controls the uniformity of the anti-caries migration property of the antimony film on the entire substrate. The upper end of the upper chamber 12 also has a fluid dispersing device 112 that is positioned close to the substrate such that a microscopic uniform fluid field is created at the top of each cathode region. According to one embodiment, the fluid sub-difference is made of the following materials: porous ceramic, chemically resistant 12 200921769 etched plastic material. The substrate holding device 1 2 located above the upper chamber 1 2 holds the substrate 1 2 2 and conducts current thereto. For a detailed description of the substrate holding device, reference is made to US 6 '248' 22 2, US 6, 72 6, 8 23 and US 6, 749, 728, each of which is assigned to the applicant of the present application With this. The electrolyte solution from the anolyte tank 240 is supplied to each of the anode regions at a set of flow rates. The electrolyte solution passes through pump 233, filter 232, and flow control device 204 before reaching each anode region. The electrolyte in each anode region is returned to the anolyte tank 24 by an outlet 219 located at the bottom of the lower chamber. The returned electrolyte solution is controlled by the flow control device 238. The gas collected in the lower chamber is discharged from the gas outlet 206 to the anolyte tank 24, and then sent from the anode electrolyte tank 240 to the exhaust unit 241. A pressure leak valve 2 is located between the filter thief 2 32 and the anolyte tank 24 〇. The electrolyte solution in the catholyte tank 2 5 〇 is supplied to each of the cathode regions at a set of flow rates. The electrolyte solution passes through pump 236, filter 235, and flow control device 2〇8 before reaching the cathode region. The electrolyte solution of each cathode region is returned to the cathode electrolytic bath 250 via the outlet 2?8 on the side wall of the upper chamber. A pressure leak valve 237 is located between the filter 235 and the cathode electrolyte bath 250. The pressure leak valves 234 and 237 are opened when the flow control devices 2 0 4 and 2 0 8 are closed. Figures 3a, 3b and 3c show a first embodiment of a bubble trap, wherein Figure 3a is a perspective view of the bubble collector, Figure 3b is a cross section thereof, and Figure 3c is a view of the bubble collector assembled with the wall Detailed structure. 13 200921769 ie 仏 仏 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 , , 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 ^ face = jin, the radial opening 3 ° a number of openings m into the upper cavity: the solution of the solution solution through the frame after the bubble along the radial pleats: small to the wall m The aperture 308, as shown in the figure, is moved upwards, through the embodiment of the spacer frame, moving up 7"". According to the groove 3 1 5 of the bubble of the inverted cone I J. Concave; 1 ζ / bag collector periphery Sing wood groove 3 1 5 is connected to the makeup outlet 306. In the following figures, the figure is a gas outlet for the body discharge to simplify the description. The embodiment ignores the groove and the X. According to the use of a tapered frame, a solid shoal of the shoal is collected at the tip of the cone bubble collector at a position slightly lower than the highest point of the tip. . , the milk V out to the positive 4a, 4b and 4c shows + 7 friends, ts 4 ., the second embodiment of the bubble collector, the 丫圔 4a 疋έ 疋έ 气泡 收 55 55 55 55 55 55 、 、 、 、 The stereoscopic map of the stolen, the face is collected, and Fig. 4c is the bubble receiving/and the P-knife wearing structure. The details of the collection and connection to the wall are as shown in Figures 4a and 4b: ^ The spiral pleated channel 401 is located in a pleat of a cone or inverted cone ......4: Figure 4 "b The spiral-shaped pleated channel 4〇1 may be in the same cross-sectional shape as the radial pleated channel described above. Several n sweat L 405 are used to pass the electrolyte solution. The bubble after the merging passes along the pleated channel of the screw (four). The small hole 4 上 on the partition wall 407 passes through 8' as shown in Fig. 4c. Moving upwards 14 200921769 The body is collected and exported in a similar manner to the __庵& Figures 5a / 5b and 5c show a third embodiment of a bubble trap, wherein Figure 5a is a perspective view of the bubble collector, Figure 5 is a partial cross-section thereof, and Figure 5 is a gas/pack collector and isolation The detailed structure of the part that is connected. , as shown in Figures 5a and 5b, a plurality of annular pleated channels 5〇1 are located in a :: or inverted tapered frame, on the upper side of Figure 5 "σ 5b"

- Pills, the roads are set in different vertical positions. According to an embodiment, each of the other: the adjacent side walls of the pleated channel have the same angle. According to a further embodiment, the different annular pleated channels have different angles of loss between the side walls. For each annular pleated channel' it has the same cross-sectional shape as the radial pleated channel described above. Several open 1 5G5 are used to pass the electrolyte solution. The bubbles that have merged in the lower channel are moved to the upper channel via the path 509 connecting the adjacent channels and the small holes 5〇8 on the partition wall 507, as shown in Fig. 5c. The upwardly moving gas is collected and exported in a similar manner to the first embodiment. Figures 6a, 6b, 6c and 6d show a fourth embodiment of a bubble trap, wherein Figure 6a is a perspective view of the bubble collector, Figure 6b is a partial cross-section thereof, and Figures 6c and 6d are two of the bubble collectors. This is the way to connect the wall to remove the collected bubbles from the detailed structure of the channel. The fourth embodiment is similar to the third embodiment except that the annular pleated channel is placed 5 in the same vertical position on the plane frame 600. 15 200921769 According to the first example, each of the positive open, the isolation _ 卜 ^ ancient π y 疋 疋 is completely separated by the separation wall 'from the & a long time for the gas to pass through the liquid and the adjacent anode to prevent the anode anodic electrode The electrolyte in the domain is in turn. Including - independent gas out ‘------------------------------------------------- After being gathered in the "column", it is received in the 通道, 尨 尨 丄 丄 丄 丄 丄 - - - - - , , ,

The hanging ancient 郫8 r /, V-shaped ^ section of the channel ^ transport. The collected gas is discharged via the connection to the "Military Road 60' and returned to the positive =: tank via the barrier 60 7 as shown in Figure 6. Shown. In another embodiment, the bubble formed by the flow of the electrolyte after the collection of the polythene is pressed under the = very close to the highest portion of the outlet having the V-shaped cross-section channel. Medium' and return to the anolyte tank, as shown in Figure 6d

In another example, the channel between the two walls has only a half V-shaped cross section. A wall cuts the channel at the lowest portion of the channel having a v-shaped cross section, and the latter wall intercepts the channel at the highest portion of the channel having the v-shaped cross section. In this particular arrangement, the surface between the two adjacent barriers no longer requires a pleated channel, and the bubble collector is suitable for situations where it is not necessary to completely remove all of the microbubbles. In Figures 6a and 6b, where 605 is the opening of the frame 600. Figure 7 shows the ratio of the total area of the film having the radially pleated channels to the total area of the film without the pleated channels. The variables used in the calculation are given in Table 1. The total area of the film having the radially pleated channels based on the first embodiment can be calculated via the formula (2). This ratio increases as the number of channels increases and the maximum height of the channel increases. The higher the ratio, the larger the area in which the electrolyte flows through 16 200921769. As shown, in the case of 200 radially-oriented channels having a maximum height of 10 mm, the total area of the membrane is three times the total area of the membrane without the pleated channels. Table 1 Radius of the tapered base R Cone and degree 锥形 Length of the tapered busbar L Maximum height of the pleated channel h Number of the tracked channel η Area h. L2 -i?2 sin2 (-) Η -Ϋ + H2 ){ S- h2L2 Η2 Η1 R2 π , π, + --(R cos(—)- V η η hAL1 -i?2sin2(-) Η

(2) where 7Γ Ά2 - and 2 sin2(-) [7172 7Γ~

|(7?cos(-) - [y + Η2 + + R2 sin2(ξ)(1 - + LS =--------i 2 Figure 8 shows the fifth embodiment of the bubble collector A cross section with a radial pleated channel and a buffer between the membranes.

As shown in Fig. 8, the bubble collector has at least two permeable membranes 802, 803 with a buffer zone 804 between the permeable membranes and a frame 800 for supporting these permeable membranes. A plurality of openings as electrolyte inlets are provided in the same manner as in the first embodiment, and the pooled bubbles are moved upward and discharged in a manner similar to the first embodiment. In Fig. 8, 807 is a partition wall '806 is a gas outlet, and 815 is a groove. ^ 〜1 Occupation 0 U U 彳 upper layer There is a gap between the permeable membrane 8G3 to form a buffer zone. The flow rate of the electrolyte in the buffer region 804 is sufficiently slow to provide a sufficient intervening word for the dissolution of the bubble in the region due to its instability. In the present application, the "microbubble" means less than Under the hole (four) bubble. The electrolyte in the buffer zone is independently controlled by an additional electrolyte fouling system to provide a higher ratio than the upper calendar. This pressure differential ensures that the lower electrolysis of the liquid U- "IL is strong to prevent the ions from passing through the upper film due to the temporary attachment of the shake and the film. ...> This buffer area can be applied in the application.任 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃 仃The decomposing material of the electric chain device and its holding device are not shown; the knife drawing lc shows a screenshot of the same electroplating device, in which a top view of the electroplating device, wherein the fluid is 18 200921769, the device and the substrate The holding device is not shown; FIG. 2 shows a schematic view of the electrolysis cycle in the electroplating device; FIG. 3a shows a perspective view of the bubble collector of the first embodiment; FIG. 3b shows the bubble collector of FIG. 3a. Figure 3c shows a detailed view of the portion of the bubble collector connected to the partition wall; Figure 4a shows a perspective view of the bubble collector of the second embodiment; Figure 4b shows the bubble shown in Figure 4a Figure 4c shows a detailed view of the portion of the bubble collector connected to the partition wall; Figure 5a shows a perspective view of the bubble collector of the third embodiment; Figure 5b shows Figure 5a Partial cross section of the bubble collector shown Figure 5c shows a detailed view of the portion of the bubble collector connected to the partition wall; Figure 6a shows a perspective view of the bubble collector of the fourth embodiment; Figure 6b shows the bubble collector of Figure 6a Partial cross section; Fig. 6c shows a detailed view of a portion of the bubble collector connected to the partition wall according to an embodiment; Fig. 6d shows a portion of the bubble collector connected to the partition wall according to another embodiment Detailed view; Figure 7 shows the area ratio as a function of the number of radially arranged pleated channels having different maximum channel heights; Figure 8 shows a cross section of a bubble collector according to a fifth embodiment. 19 200921769 [Main component symbol description 11. Lower cavity I 0 1. Anode 103. Anolyte inlet 106. Gas outlet II 0. Anode region 112. Fluid dispersion device 11 6. Frame 11 8. Outlet 1 2 0. Cathode region 122. Substrate 206. Gas outlet 218. Outlet 232. Filter 236. Pump 235. Filter 23 8. Flow control device 241. Exhaust device 3 00. Frame 3 02. Permeable membrane 306. Gas outlet 3 0 8. Small hole 400. Frame 405. Opening 12. Upper chamber 102. Wall 105. Bubble collector 107. Cavity base 111. Catholyte inlet I 15. Groove II 7. Power channel 119. Anode electrolyte Outlet 121. Substrate holding device 204. Flow control device 208. Flow control device 219 'outlet 233. Pump 234. Pressure leak valve 237. Pressure leak valve 240. Anolyte tank 250. Catholyte tank 3 0 1. Pleated Shaped channel 3 05. Opening 307. Wall 315. Groove 401. Pleated channel 407. Wall 20 200921769 4 0 8 ., J, 500. Frame 501. Pleated channel 505. Opening. 507. 5 0 8 . Kid L. 5 09. Path 600. Frame. 601. Pleated channel 605. Opening 606. Pipe 607. Wall 609. Path 610. Outlet duct 802. Lower layer permeable membrane 803. Upper layer permeable membrane 804. Buffer area 806. Gas outlet 807. Wall 815. Four slots \ 21

Claims (1)

200921769, the scope of application for patents: L kinds of electroplating devices, including: each:: cavity pole:: several are separated by several partition walls & the area forms an upper cavity of anolyte, 4 1 丄 shield group includes several The catholyte is circulated by the plurality of isolated stepping domains, the middle mother and the lowering *T pole & the bubble collector, and the bubble collectors disposed in the lower chamber and the upper chamber collect bubbles, forcing Bubbles are coalesced and directed out of the apparatus; a fluid dispersion device 'disposed on top of the upper chamber; a substrate holding device in which the fluid dispersion device holds the substrate and conducts current to the substrate; Independently controlled channel power supply; electrolyte flow control device for controlling the electrolyte of the chamber; and several fluid distribution subsystems for dispensing the electrolyte 2; as described in claim 1 of the scope of the patent application, The bubble collector comprises: one or more frames 'supporting one or more permeable paths, and the bubbles after the aggregation are moved upwards to - wherein the permeable membrane closest to the lower cavity has a V shape Shaped channel section JI 'pleated bubble in said anode region through which the cathode region separated by separate control systems, wherein the above gas bubble coalescence after, for use in the respective regions to the cavity. Characterized by: a film; a gas outlet; a V-shaped or inverted channel is collected and 22 200921769 is forced to gather; and the permeable membrane closest to the upper chamber is permeable through the closest lower chamber Microbubbles of the membrane. 3. The device of claim 2, wherein the permeable membrane closest to the lower chamber is made of one of the following materials: polyvinyl fluoride (PVF), polyvinylidene fluoride ( PVDF), polytetracycline (PTFE), perfluoroalkoxy resin (PFA)' with a pore size of between 50 # in between' the permeable membrane closest to the lower chamber will be produced in the lower chamber The decomposition product is separated from the electrolyte above it. 4. The device of claim 2, wherein the permeable membrane closest to the upper chamber is made of one of the following materials: polyvinyl fluoride (PVF), polyvinylidene fluoride ( pVDF), polytetrafluoroethylene garden), perfluoro alkoxy resin side, on the pore diameter two to Between 15 and 15 the permeable membrane closest to the upper chamber filters specific ions. The device is characterized in that the angle between them is 1 〇. Up to 5_ between two adjacent side walls of the weight passage as described in claim 2 of the patent application. It is characterized in that the central angle is lowered by 6. The device according to claim 2 reduces the resistance between the two adjacent side walls of the pleated channel 23 200921769 bubble and the side wall, so that and. The buoyant effect produced by the bubble r饬 contact is added to the buoyant channel and is there to increase the loading described in item 2, as claimed in claim 2, and in the middle E?t, ° The arrangement is increased by the number of effective tables of the pleated channel bubble collector of the large entanglement, which is characterized by the area. 8. The pleated channel 彳a according to claim 2 is arranged to the right, and is characterized in that the directional direction is arranged on a tapered or inverted tapered frame. 9. Patent application The pleated channel according to the second item is arranged in a spiral arrangement on the frame of the inverted cone of the v-th member, and the device is as described in claim 2, The annular passage is arranged in a circle, and is characterized by, or an inverted tapered frame. 11. The pleated passage is arranged in a plane in a plane as described in claim 2 Add ', set. The same vertical position on the wood is characterized by 12. The device according to claim 2, characterized in that 24 200921769 is arranged in a circular arrangement of the pleated channels in different vertical positions on a plane frame. The scope of the patent application is characterized in that, in each anode region, an anode is surrounded by one of the walls and the 2C anode is connected to an independently controlled channel of the power supply system. The device of claim 1, wherein the bubble collector comprises one or more permeable membranes; providing a gap between the membranes to form a buffer _; The liquid is independently controlled. 15. Please ask for the scope of patents! The apparatus of the invention is characterized in that in each of the cathode regions, at least one independently controlled electrolyte inlet is provided to control its local fluid field. The apparatus of claim 15 wherein the localized fluid field within the plurality of cathode regions is used to control the transport and exchange of reactants and by-products near the reaction surface of the substrate. . The apparatus of claim 15, wherein the partial fluid field in the plurality of cathode regions of the substrate is used to control the composition uniformity of the plating film in the range of 200921769. The device of claim 5, characterized in that the local fluid field in the plurality of cathode regions is used to control the filling properties over the entire substrate. 19. The device according to claim 15, wherein the R portion of the plurality of cathode regions is used to control the resistance of the plating film in the entire substrate. Rate uniformity. The device of claim 15, wherein the partial flow "丨L body field in the plurality of cathode regions is used to control uniform electromigration resistance of the plating film in the entire ceramic field Sex. Soil 21 · A plating apparatus comprising: a lower chamber comprising a plurality of partition walls - 885, wherein each anode region comprises a separate anode region, less than one independent I gas ^ σ; The system and the upper chamber 'includes a plurality of cathodic cycle systems separated by a number of seven, each of which is separated by a wall in the cathode area. The catholyte circulation system is independently controlled, 26 200921769 bubble collector, set in the lower part Between the cavity and the upper chamber; a fluid dispersing device 'disposed on top of the upper chamber, a substrate holding device above the fluid dispersing device for holding the substrate and conducting current to the substrate; An independently controlled channel of power; an electrolyte flow control device for controlling the electrolyte in various regions of the chamber; and a plurality of fluid distribution subsystems for dispensing electrolyte into the chamber. 22. The device of claim 21, wherein the bubble collector comprises: one or more frames 'supporting one or more permeable membranes; the surface of the bubble collector is An anode region is inclined '10' from the horizontal. To 6 〇. Angle. 23. The device of claim 22, wherein the permeable membrane closest to the lower chamber is made of one of the following materials: polyvinyl fluoride (PVF), polyvinylidene fluoride ( PVDF), polytetrafluoroethylene (PTFE), perfluoroalkoxy resin (PFA), having a pore size of 2 between claws and 50 /zm, the permeable membrane closest to the lower chamber will be in the lower chamber The decomposition product produced in the separation is separated from the electrolyte above it. The device according to claim 22, wherein the permeable membrane closest to the upper chamber is made of one of the following materials: polyvinyl fluoride (PVF), polyvinylidene fluoride. Ethylene (PVDF), polytetrafluoroethylene (PTFE), perfluoroalkoxy resin (PFA), having a pore diameter of between 2 and 15 〇nm, the permeable membrane filtration electrolyte closest to the upper chamber = specific ion. 25. The apparatus of claim 22, wherein the gas in each of the anode regions of the ' 〆, 玉仕 is first collected at the bubble collection location and thereafter separately derived. The device of claim 22, wherein the bubble collector comprises more than one permeable membrane; and a gap is provided between the membranes to form a buffer region; The electrolyte in the 友, '友冲区 area is independently controlled. The apparatus described in claim 27, wherein the device is characterized in eight s,:, an anode region, an anode is completely connected to the power supply system by a single anode of the partition wall. Channel. 28. The apparatus of claim 21, wherein the electrolysis controlled at 28 200921769 provides at least one independent liquid inlet in each cathode region to control its local fluid field. The device of claim 28, wherein the local flow in the plurality of cathode regions is used to control the vicinity of the reaction surface of the substrate. Material transfer and exchange of reactants and by-products. 30. The apparatus of claim 28, wherein the local flow #m body in the plurality of cathode regions of the substrate is used to control the compositional uniformity of the entire batch of electric ore film. 31. The device of claim 28, wherein the device is characterized by a filling property in a localized range within the plurality of cathode regions. " for controlling the entire substrate. According to the application of the patent application, the resistivity uniformity of the partial inner plating film in the plurality of cathode regions. The device described in the item is characterized in that the fluid field is used to control the entire substrate 33. The device according to claim 28 is characterized in that the partial fluid field in the plurality of cathode regions is used in 29 200921769 Controls the electromigration resistance uniformity of the plated film over the entire substrate. 30