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TW200911951A - Pressure-sensitive adhesive sheet - Google Patents

Pressure-sensitive adhesive sheet Download PDF

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Publication number
TW200911951A
TW200911951A TW097115452A TW97115452A TW200911951A TW 200911951 A TW200911951 A TW 200911951A TW 097115452 A TW097115452 A TW 097115452A TW 97115452 A TW97115452 A TW 97115452A TW 200911951 A TW200911951 A TW 200911951A
Authority
TW
Taiwan
Prior art keywords
antistatic
adhesive sheet
layer
film
acid
Prior art date
Application number
TW097115452A
Other languages
Chinese (zh)
Other versions
TWI454549B (en
Inventor
Kousuke Yonezaki
Tatsumi Amano
Kazuma Mitsui
Takeshi Sutou
Atsushi Takashima
Kenji Hayasaka
Kazuhito Okumura
Original Assignee
Nitto Denko Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Denko Corp filed Critical Nitto Denko Corp
Publication of TW200911951A publication Critical patent/TW200911951A/en
Application granted granted Critical
Publication of TWI454549B publication Critical patent/TWI454549B/en

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
    • B32B7/12Interconnection of layers using interposed adhesives or interposed materials with bonding properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/18Layered products comprising a layer of synthetic resin characterised by the use of special additives
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/29Laminated material
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/01Use of inorganic substances as compounding ingredients characterized by their specific function
    • C08K3/017Antistatic agents
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/0008Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0075Antistatics
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/40Additional features of adhesives in the form of films or foils characterized by the presence of essential components
    • C09J2301/41Additional features of adhesives in the form of films or foils characterized by the presence of essential components additives as essential feature of the carrier layer
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2423/00Presence of polyolefin
    • C09J2423/10Presence of homo or copolymers of propene
    • C09J2423/106Presence of homo or copolymers of propene in the substrate
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2433/00Presence of (meth)acrylic polymer
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2471/00Presence of polyether
    • C09J2471/006Presence of polyether in the substrate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Laminated Bodies (AREA)
  • Adhesive Tapes (AREA)
  • Adhesives Or Adhesive Processes (AREA)

Abstract

To provide an inexpensive surface protective film which is excellent in the ability to protect an adherend (especially an optical sheet) and capable of carrying out an inspection of a defect on the adherend (in particular, the optical sheet) with high precision, at the state that a surface-protective film (especially a pressure-sensitive adhesive sheet) is adhered to the adherend; and to provide an inexpensive surface protective film which prevents the adherend (especially an optical member, such as an optical sheet) from being electrostatically charged during processing or transportation of the adherend (in particular, optical sheet) and further has an antifouling function. A removable pressure-sensitive adhesive sheet includes a pressure-sensitive adhesive layer formed on one side of a base layer, and an anti-static layer on the surface of the other side, wherein the anti-static layer contains a polymer type anti-static agent comprising polyether-ester amides.

Description

200911951 九、發明說明: 【發明所屬之技術領域】 本發明係關於一種具有抗靜電性之再剝離型黏著片材。 作為上述再剝離型黏著片材,例如可列舉:建築保養用遮 蔽帶、汽車塗裝用遮蔽帶、電子零件(導線架、印刷基板) 用遮蔽帶、喷砂用遮蔽帶等遮蔽帶類;銘窗框用表面保護 冑膜^學塑膠用表面保護薄膜、光學玻璃用表面保護薄 冑π車保€用表面保護薄臈、金屬板用表面保護薄膜等 ° 表面保護薄膜類;背面研磨膠帶、以護薄膜固定用膠 帶、切割用膠帶、導線架固定用膠帶、清潔勝帶、除塵用 f帶载帶、蓋帶等半導體.電子零件製造步驟用黏著膠 帶類;電子設備或電子零件之捆包用膠帶類;運輸時之暫 時固定膠帶類;捆紮用膠帶類;標籤類等。其中,尤其可 用作需求透明性之液晶顯示器、有機 EL(electr〇iuminescence)電致發光、場發射顯示器等之面 板所使用的偏光板或波長板等之光學構件用保護薄膜。 U 【先前技術】 田剛,對偏光板等光學用片材進行加工或將該光學用片 材安裝於其他構件等之步驟時,預先於該光學用片材上貼 附表面保護薄膜,以應對該作業過程中該光學用片材受到 的損傷或污染等。由於光學用片材係在貼附有表面保護薄 膜之狀態下進行傷痕等之檢查’因此作為該保護薄膜用基 材,使用聚酯薄膜等透明性較高之基材(例如,參照專利 文獻1〜5)。 130902.doc 200911951 $ ’為防止因摩擦或剝離導致之帶電,通常於該 :5相上設置抗靜電層’並塗佈黏著劑加以乾燥,再將 :離薄臈貼合於該面,然後根據目標偏光角度或相位角度 、于裁斷#層特^片數而保存(例如,參照專利文獻6)。200911951 IX. DESCRIPTION OF THE INVENTION: TECHNICAL FIELD The present invention relates to a re-peelable adhesive sheet having antistatic properties. Examples of the above-mentioned re-peelable adhesive sheet include a mask for building maintenance, a mask for automobile coating, a mask for electronic parts (a lead frame and a printed substrate), and a mask for sandblasting; Surface protection for sashes, surface protection film for plastics, surface protection for optical glass, thin surface protection, surface protection film for surface protection, surface protection film, etc. Protective film fixing tape, cutting tape, lead frame fixing tape, cleaning tape, f-load tape for dust removal, cover tape, etc. Adhesive tape for electronic component manufacturing steps; packaging for electronic equipment or electronic parts Tapes; temporary fixing tapes during transportation; tapes for strapping; labels, etc. In particular, it can be used as a protective film for an optical member such as a polarizing plate or a wave plate used for a panel such as a liquid crystal display, an organic EL (electriumiuminescence) electroluminescence or a field emission display. U [Prior Art] When the optical sheet such as a polarizing plate is processed or the optical sheet is attached to another member or the like, a surface protective film is attached to the optical sheet in advance to cope with The optical sheet is damaged or contaminated during the operation. In the case of the substrate for a protective film, a substrate having a high transparency such as a polyester film is used as the substrate for the protective film (for example, see Patent Document 1). ~5). 130902.doc 200911951 $ 'To prevent charging due to friction or peeling, usually put the antistatic layer on the 5 phase and apply an adhesive to dry it, then: stick the thin crucible to the surface, then according to The target polarization angle or phase angle is saved by cutting the number of layers # (for example, refer to Patent Document 6).

然而’表面保護薄膜之裁斷作業中,自該裁斷面露出之 黏著劑會附著於其他保護薄膜表面,妨礙產品檢查,而且 由於發黏^成為運送產品時之障礙。因此,作為上述缺點 策提出種於保護薄膜的一個側面上設有抗污染層 、表面保沒4膜(例如,參照專利文獻7)。然而已明確,上 述方去存在生產步驟增多而導致成本上升之問題。 專利文獻1:曰本專利特開平07_31116〇號公報 專利文獻2 .日本專利特開2003-089178號公報 專利文獻3 :曰本專利特開2005-002220號公報 專利文獻4 :曰本專利特開2005-125659號公報 專利文獻5 .日本專利特開2004-0940 12號公報 專利文獻6 :日本專利特開2001-096698號公報 專利文獻7 :日本專利特開平1 1-2561 15號公報 【發明内容】 發明所欲解決之問題 鑒於此種情況,本發明之目的在於提供一種廉價之表面 保護薄薄膜,其對被黏附體(尤其為光學片材等光學構件) 之保濩性能優異,且可於貼附有該表面保護薄膜(黏著片 材)之狀態下精度良好地進行被黏附體(尤其為光學片材)之 缺陷檢查。又,本發明之目的在於提供一種具有如下特點 130902.doc 200911951 的廉價之表面保護薄薄膜:於被黏附體(尤其為光學片材) 之加工、搬4時,不會使被黏附體(尤其為光學片材)帶 電,進而具有抗污染功能。 解決問題之技術手段 本發明者等人為達成上述課題而反覆努力研究,結果發 現’利用如下所示之黏著片材可達成上述目的 了本發明。 取 即’本發明之黏著片材之特徵在於··其係再剝離型,且 係於基材層之其中—個面上具備黏著劑層、於另-個面上 ί備抗靜電層者,且上述抗靜電層含有包含聚醚醋醯胺之 尚分子型抗靜電劑。 /艮據本發明’如實施例之結果所示,具備含有上述包含 聚醚醋醯胺之高分子型抗靜電劑之抗靜電層的黏著片材, 成為如下表面保護薄膜:對被黏附體(尤其為光學片材等 光學構件)之保護性能優異,且可於貼附有該表面保護薄 :(黏者片材)之狀態下精度良好地進行被黏附體(尤其為光 干片材)之缺陷檢查;且上述黏著片材成為如下的廉價之 表面保護薄膜:於被黏附體(尤其為光學片村)之加工、、搬 达日’’不會使被黏附體(尤其為光學片材)帶電,進而具 抗污染功能。上述黏著片材表現出验 =日㈣’但-般推測’藉由使用利用上述含有特定的組 2向分子型抗靜電劑之抗靜電層,不會發黏或妨礙產品 仏―:接著可靠性、透明性優異’且可廉價地進行製造。 又’藉由將上述高分子型抗靜電劑用於抗靜電層,即使進 130902.doc 200911951 行水洗或濕毛巾擦拭等處理亦幾乎未見抗靜電能力之下 降’可獲得穩定之抗靜電能力。 上述黏著片材之特徵在於:上述抗靜電層含有包含聚醚 醋醯胺之高分子型抗靜電劑。 再者,所謂本發明之聚醚酯醯胺,係指由聚醯胺嵌段及 聚氧烷二醇嵌段所構成、且藉由酯鍵使該等嵌段鍵結之嵌 段共聚物。 本發明中,較好的是,上述抗靜電層含有聚醚酯醯胺及 聚醯胺纖維。 又,更好的是,上述抗靜電層含有聚醚酯醯胺、聚醯胺 纖維、以及無機鹽及/或有機鹽。 本么月中,較好的是,上述抗靜電層含有丙烯樹脂。 又軏好的疋,上述抗靜電層含有丙烯均聚物及/或丙 烯一烯烴隨機共聚物…上述抗靜電層亦可含有使用茂 金屬觸媒而聚合之丙烯·α_烯烴隨機共聚物。However, in the cutting operation of the surface protective film, the adhesive exposed from the cut surface adheres to the surface of the other protective film, hindering the inspection of the product, and the adhesiveness becomes a hindrance when the product is transported. Therefore, as one of the above disadvantages, it is proposed to provide a contamination-preventing layer and a surface-preserving film on one side of the protective film (for example, refer to Patent Document 7). However, it has been clarified that there is a problem that the above-mentioned side has an increase in production steps and an increase in cost. Patent Document 1: Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. 2003-089178. Patent Document 3: Japanese Patent Laid-Open No. Hei No. 2005-002220 Patent Document 4: Japanese Patent Laid-Open No. 2005 Japanese Patent Laid-Open Publication No. Hei. No. Hei. No. Hei. No. Hei. No. 2001-096698. DISCLOSURE OF THE INVENTION PROBLEMS TO BE SOLVED BY THE INVENTION In view of such circumstances, an object of the present invention is to provide an inexpensive surface-protecting thin film which is excellent in the protective property against an adherend (particularly an optical member such as an optical sheet) and can be attached In the state in which the surface protective film (adhesive sheet) is attached, the defect inspection of the adherend (especially an optical sheet) is performed with high precision. Further, it is an object of the present invention to provide an inexpensive surface protection thin film having the following characteristics 130902.doc 200911951: when the object to be adhered (especially an optical sheet) is processed and moved, the adherend is not made (especially It is charged for the optical sheet and has anti-pollution function. MEANS FOR SOLVING THE PROBLEMS The present inventors have made intensive studies to achieve the above problems, and as a result, have found that the present invention can be achieved by the use of an adhesive sheet as described below. The adhesive sheet of the present invention is characterized in that it is a re-peeling type, and is provided with an adhesive layer on one surface of the substrate layer and an antistatic layer on the other surface. Further, the antistatic layer contains a molecular antistatic agent containing polyether acetamide. According to the present invention, as shown in the results of the examples, the adhesive sheet comprising the antistatic layer containing the above-mentioned polymer type antistatic agent containing polyether acetamide is a surface protective film: the adherend ( In particular, it is excellent in the protective performance of an optical member such as an optical sheet, and the adherend (especially a light-dry sheet) can be accurately performed in a state in which the surface protective thin: (adhesive sheet) is attached. Defect inspection; and the above-mentioned adhesive sheet is an inexpensive surface protection film which is processed in the adherend (especially in the optical film village), and does not cause the adherend (especially an optical sheet) It is charged and has anti-pollution function. The above adhesive sheet exhibits a test = day (four) 'but generally speculate' by using the above-mentioned antistatic layer containing a specific group of 2-way molecular type antistatic agents, which does not stick or hinder the product 仏 -: reliability It is excellent in transparency and can be manufactured at low cost. Further, by using the above-mentioned polymer type antistatic agent for the antistatic layer, even if it is treated with water washing or wet towel wiping, the antistatic property is hardly lowered, and stable antistatic ability can be obtained. The adhesive sheet is characterized in that the antistatic layer contains a polymer type antistatic agent containing polyether acetamide. Further, the polyetheresteramine of the present invention means a block copolymer composed of a polyammonium block and a polyoxyalkylene glycol block and bonded to the blocks by an ester bond. In the present invention, it is preferred that the antistatic layer contains a polyether ester decylamine and a polyamide fiber. Further, more preferably, the antistatic layer contains a polyether ester decylamine, a polyamide fiber, and an inorganic salt and/or an organic salt. In the present month, it is preferred that the antistatic layer contains an acrylic resin. Further, the antistatic layer contains a propylene homopolymer and/or a propylene-olefin random copolymer. The antistatic layer may further contain a propylene/α-olefin random copolymer polymerized using a metallocene catalyst.

方面車又好的是,上述基材層係包含丙稀樹脂,又, 更好的是’上述基材層係包含丙烯均聚物及/或丙稀·心烯 ,隨機共聚物。又,上述基材層可包含使用茂金屬觸媒而 聚合之丙烯·α-烯烴隨機共聚物。 又,較好的是,上述黏著劑層係包含(甲基)丙稀酸系聚 合物’該(甲基)丙烯酸系聚合物係以具有碳數為Μ之烷 基之㈣酸醋及/或甲基丙稀酸酿之!種或2種以上作為主 成進而氟好的疋,上述黏著劑層係對上述(甲基)丙 婦酸系聚合物進行交聯處理而獲得之交聯結構體。 130902.doc 200911951 另一方面’本發明之黏著片材由於具有如上所述之作用 效果,因此較好的是尤其可用於光學構件之表面 【實施方式】 以下,對本發明之實施形態進行詳細說日月。 本發明之黏著片材之特徵在於,其係再剝離型,且传於 基材層之其中一個面上具備黏著劑層、於另一個面上且備 抗靜電層者,且上述抗靜電層含有包含聚_旨醯胺之高分 子型抗靜電劑。 Ο 作為用作基材層之材料,只要材獲得具有較高透明性 之黏著片材之塑膠’則並無特別限定,可使用聚丙稀、聚 醋、聚碳酸酉旨、聚醯胺、聚醯亞胺、丙稀酸、聚苯乙婦、 乙酸s旨、聚_、三醋酸纖維素等透明樹脂。該等之中, 自生產性、成型性方財慮,可較好地使用聚丙烯樹脂。 該等可單獨使用,亦可混合使用2種以上。 作為聚丙烯’可列舉:作為均聚物之均質型、作為丙 烯烯烴隨機共聚物之隨機型、作為丙婦α·婦烴嵌段丑 :物之彼段型’自獲得透明性較高之黏著片材的觀點考 '。、尤可較好地使用均質型或隨機型。此處所謂透明性較 高’係指以JISK7361定義之全光線透過率為嶋以上、較 好的疋90%以上、更好的是92%以上且以爪以”6定義 之霧度為9%以下、較好的是霧度為州以下、更好的是7% 以下、尤其好的是未滿6%者。該等可單獨使用亦可混 合使用2種以上。 作為上述均質型聚丙埽樹脂,只要為可獲得作為目標的 130902.doc 200911951 具有較高透明性之黏著片材之樹脂,則並無特別限制。作 為市售品,例如可列舉:ZS1327A、F1〇4A、㈧、】 59〇〇(上述均為Prime Polymer公司製造)等。 作為隨機型丙烯·α_烯烴隨機共聚物之^烯烴成分,例 有乙鮮、1-丁稀、h戊稀、卜己稀、卜庚稀、卜辛稀、= 基丁烯·!、"基戊烯q、3_甲基己烯]等較好的是乙 烯、1-丁烯、3_甲基丁稀」、4·甲基戍稀^。又,此外可 使用4-甲基_Μ·己二烯、5·甲基],4己二烯、甲基Μ· =-烯、1,9-癸:烯等非共輛二烯料聚合物成分之—部 分。進而,亦可將降冰片烯等環狀烯烴聚合。 作為上述隨機共聚物,例如可列舉:丙烯.乙烯隨機丘 聚物、丙烯.i-丁烯隨機共聚物、丙烯七己烯隨機共; 物、丙烯.乙烯.1-辛烯隨機共聚物 '丙烯.乙烯·“丁烯隨機 ,、聚物等。作為市售品,例如可列舉:F327、厂、j_ 5710(上述均為Pdme ρ〇1_Γ公司製造卜心⑽卿別、Preferably, the base material layer comprises an acryl resin, and more preferably, the base material layer comprises a propylene homopolymer and/or a propylene/nonene, a random copolymer. Further, the base material layer may include a propylene·α-olefin random copolymer polymerized using a metallocene catalyst. Further, it is preferable that the adhesive layer contains a (meth)acrylic acid polymer, and the (meth)acrylic polymer is a (four) acid vinegar having an alkyl group having a carbon number of ruthenium and/or Methyl acrylate is brewed! The above-mentioned adhesive layer is a crosslinked structure obtained by subjecting the above (meth)-glycolic acid-based polymer to a crosslinking treatment. 130902.doc 200911951 On the other hand, the adhesive sheet of the present invention is preferably used for the surface of an optical member because it has the above-described effects. [Embodiment] Hereinafter, embodiments of the present invention will be described in detail. month. The adhesive sheet of the present invention is characterized in that it is a re-peelable type, and is provided on one of the surface of the substrate layer with an adhesive layer on the other surface and an antistatic layer on the other surface, and the antistatic layer contains A polymeric antistatic agent comprising poly-p-amine. Ο As the material used as the substrate layer, there is no particular limitation as long as the material obtains the plastic sheet of the adhesive sheet having high transparency, and polypropylene, polyester, polycarbonate, polyamide, polyfluorene can be used. A transparent resin such as imine, acrylic acid, polystyrene, acetic acid, poly-, or cellulose triacetate. Among these, a polypropylene resin can be preferably used in terms of productivity and moldability. These may be used alone or in combination of two or more. Examples of the polypropylene include a homogenous type of a homopolymer, a random type which is a random copolymer of a propylene olefin, and a ugly form of a propylene cation. The view of the sheet is tested. In particular, it is preferable to use a homogeneous type or a random type. Here, the term "high transparency" means that the total light transmittance defined by JIS K7361 is 嶋 or more, preferably 疋 90% or more, more preferably 92% or more, and the haze defined by the claw is 9% is 9%. In the following, it is preferable that the haze is 7% or less, more preferably 7% or less, and particularly preferably 6% or less. These may be used singly or in combination of two or more kinds. There is no particular limitation as long as it is a resin which has a high transparency of the adhesive sheet of 130902.doc 200911951. As a commercial item, for example, ZS1327A, F1〇4A, (8), 59〇 〇 (all of the above are manufactured by Prime Polymer Co., Ltd.), etc. As an olefin component of a random propylene/α-olefin random copolymer, there are, for example, ethyl fresh, 1-butadiene, h-pentap, baked, and b-glycene. Preferably, it is ethylene, 1-butene, 3-methylbutyl sulphate, and 4-methyl oxime, etc., such as bismuth, = butylbutene, and " pentylene oxide, q-methyl hexene. Rare ^. Further, it is also possible to use a non-common diene polymerization such as 4-methyl-indene-hexadiene, 5-methyl], 4-hexadiene, methylhydrazine--ene, and 1,9-fluorene-ene. Part of the composition of matter. Further, a cyclic olefin such as norbornene may be polymerized. As the above-mentioned random copolymer, for example, propylene, ethylene random mixture, propylene. i-butene random copolymer, propylene hephexene random copolymer; propylene, ethylene, 1-octene random copolymer 'propylene "Ethylene", "butene is random, a polymer, etc. As a commercial item, for example, F327, factory, j_5710 (all of the above are made by Pdme ρ〇1_Γ company, Buxin (10),

Wintech WFX4 . Wintech WFX4T . Wintech WFX4TA ^ ntech WFW4(上述均為日本p〇lypr〇公司製造)等。該等 之中’自獲得透明性更優異之薄膜的觀點考慮,可較好地 使用利用茂金屬觸媒而聚合之丙烯·α·烯烴隨機共聚物。 又’自成為組成均勻之共聚物、獲得具有較高透明性之基 材層的觀點考慮,可較好地制利用茂金屬_而聚合之 丙烯·α_烯烴隨機共聚物。 此處作為使用茂金屬觸媒而聚合之丙稀心缔經隨機共 聚物所使用之,烴,例如有乙烯、-戊烯、卜 130902.doc 200911951 己烯、1-庚烯、1-辛烯、3_ 甲美己嫌1堃, 土丁烯-1、4-曱基戊烯-1、3_ 甲基己烯-1專,較好的是 4甲其a咕, 1_ 丁烯、3-甲基丁烯q、 4-曱基戊烯-i。又’此外可使用 ^ 其_1 4 3 _ 甲基· 1,4_己二烯、5-甲 土 _,-己二烯、7-曱基 _;!,6_辛二、 一祕从★ 1’9·癸二稀等非共輕 一烯作為聚合物成分的一部 us μ- ^ 運而’亦可將降冰片烯等 %狀稀^合。作為上 ㈣ 斑.工β 、取物之具體例’可列 舉.丙烯.乙烯隨機共聚物、 席1 - 丁烯隨機共聚物、丙 烯小己烯隨機共聚物、丙烯 ㈣6烯1辛烯隨機共聚物、丙 烯·乙烯.1-丁烯隨機共聚物等。 又’作為使用茂金屬觸媒而平人 x 年、墘σ之丙烯_α-烯烴隨機共聚 物,自成形性之觀點考岸, 。 $ “ 了較好地使用熔點為 〜15〇C、尤其為11〇。〇〜135。^去从也 u 者。作為其等之具體 例,例如可列舉:Wintprfi WPV/c wlntech WFX6、Wintech WFX4、Wintech WFX4. Wintech WFX4T. Wintech WFX4TA ^ ntech WFW4 (all of which are manufactured by the Japanese company p〇lypr〇). Among these, from the viewpoint of obtaining a film having more excellent transparency, a propylene·α·olefin random copolymer polymerized by a metallocene catalyst can be preferably used. Further, from the viewpoint of obtaining a uniform copolymer and obtaining a base layer having high transparency, a propylene/α-olefin random copolymer polymerized by using a metallocene can be preferably used. Here, as a propylene-based random copolymer which is polymerized using a metallocene catalyst, hydrocarbons such as ethylene, -pentene, bur 130902.doc 200911951 hexene, 1-heptene, 1-octene 3_ 甲美己一堃1, 1,4-butene-1, 4-decylpentene-1, 3-methylhexene-1, preferably 4 甲, a 咕, 1_ butene, 3- Base butene q, 4-decylpentene-i. Also 'can be used ^ _1 4 3 _ methyl · 1, 4- hexadiene, 5- carbene _, - hexadiene, 7-fluorenyl _;!, 6 _ xin, a secret from ★ 1'9·癸2 dilute and other non-co-light monoolefins as a component of the polymer component us μ- ^ can also be used as a rare form of norbornene. Specific examples of the upper (four) plaque, work β, and the extract may be exemplified. propylene. ethylene random copolymer, s-butene random copolymer, propylene small hexene random copolymer, propylene (tetra) 6-ene 1-octene random copolymer , propylene, ethylene, 1-butene random copolymer, and the like. Further, as a random copolymer of propylene_α-olefin which uses a metallocene catalyst and is flat for x years and 墘σ, it is tested from the viewpoint of formability. $ "It is better to use a melting point of ~15 〇C, especially 11 〇. 〇~135. ^ goes from ü. As a specific example thereof, for example, Wintprfi WPV/c wlntech WFX6, Wintech WFX4 ,

Wintech WFX4T ^ Wintech WFX4TA . w . 、Wintech WFW4(上 述均為日本Polypro公司贺谇、笪古隹 j I k)等市售品。此處,熔點表示 ϋ 由示差掃描熱量計之熔解波峰溫度所求出之值。 此處,茂金屬_係含有如下成分之觸媒:含有具有環 戊一烯基骨架之配位基的週期表第4族的過渡金屬化合物 (所謂茂金屬化合物)、與茂金屬化合物反應而可活化為穩 定之離子狀態的促進劑、及視需要而含有的有機鋁化合 物,眾所周知之觸媒均可使用。茂金屬化合物較好的是可 進行丙烯之立體規則性聚合之交聯型茂金屬化合物,更好 的是具有等規性之交聯型茂金屬化合物。 作為茂金屬化合物,例如,日本專利特開昭6〇_35〇〇7 130902.doc -12· 200911951 號、日本專利特開昭61_130314號、曰本專利特開昭队 295607號、日本專利特開平U75609號、日本專利特開平 2-41303號、日本專利特開平2_131488號、日本專利特開= 2-76887號、日本專利特開平3_163〇88號、日本專利特開平 4-300887號、日本專利特開平4·2η694號、日本專利特開 平5-43616號、日本專利特開平5_2〇9〇13號、日本專利特開 平6-239914號、日本專利特表平7_5〇4934號、日本專利特 開平8-85708號各公報中已有所揭示。 ηWintech WFX4T ^ Wintech WFX4TA . w . , Wintech WFW4 (the above are all Japanese Polypro company He Wei, 笪古隹 j I k) and other commercial products. Here, the melting point means ϋ the value obtained by the melting peak temperature of the differential scanning calorimeter. Here, the metallocene is a catalyst containing a transition metal compound of a Group 4 of the periodic table (a so-called metallocene compound) having a ligand having a cyclopentaenyl skeleton, and reacting with the metallocene compound. An accelerator that is activated to a stable ionic state and an organoaluminum compound that is optionally contained may be used as a known catalyst. The metallocene compound is preferably a crosslinked type metallocene compound which can carry out stereoregular polymerization of propylene, and more preferably a crosslinked type metallocene compound having an isotacticity. As a metallocene compound, for example, Japanese Patent Laid-Open No. 〇〇35〇〇7 130902.doc -12·200911951, Japanese Patent Laid-Open No. 61_130314, Sakamoto Patent Special Open 295607, Japanese Patent Special Kaiping U75609, Japanese Patent Laid-Open No. 2-41303, Japanese Patent Laid-Open No. Hei 2_131488, Japanese Patent Laid-Open No. 2-76887, Japanese Patent Laid-Open No. Hei 3_163〇88, Japanese Patent Laid-Open No. 4-300887, Japanese Patent Special Kaiping 4·2η694, Japanese Patent Laid-Open No. 5-43616, Japanese Patent Laid-Open No. 5-2〇9〇13, Japanese Patent Laid-Open No. Hei 6-239914, Japanese Patent Special Table No. 7_5〇4934, Japanese Patent Special Open 8 It has been disclosed in the publications No. -85708. η

更具體而言,可例示:亞曱基(環戊二烯基)(3,4-二甲基 環戊二烯基)二氣化鍅、異亞丙基(環戊二烯基)(3,4-二甲基 環戊二烯基)二氣化锆、亞乙基(環戊二烯基)(3,5_二甲基戊 二烯基)二氣化鍅、亞曱基雙(茚基)二氣化锆、亞乙基雙 (2-曱基節基)二氯化锆、亞乙基U2•雙(4_苯基節基)二氣化 錯、異亞丙基(環戊二烯基)(苐基)二氯化锆、異亞丙基(4_ 甲基環戊二烯基)(3-第三丁基節基)二氣化锆、二甲基亞矽 烧基(環戊二烯基)(四曱基環戊二烯基)二氣化鍅、二曱基 亞矽烷基雙(茚基)二氣化鍅、二曱基亞矽烷基雙(4,5,6,7_ 四氫茚基)二氣化鍅、二甲基亞矽烷基(環戊二烯基第基) 二氯化锆、二甲基亞矽烷基(環戊二烯基)(八氫第基)二氣 化鍅、二曱基亞矽烷基雙[4-(1-苯基_3_曱基節基)]二氯化 錯、二甲基亞石夕院基(葬基)第三丁基醯胺二氯化錯、曱基 苯基亞矽烷基雙[1-(2-甲基-4,5-苯并(茚基)]二氣化鍅、二 曱基亞石夕烧基雙[1-(2-甲基-4,5-苯并茚基)]二氣化結、二甲 基亞石夕烧基雙[1-(2-甲基-4-苯基-4H-莫基)]二氣化錯、二 130902.doc -13- 200911951 甲基亞矽烷基雙[1-(2-曱基-4-(4-氯苯基)-4H-莫基)]二氯化 锆、二曱基亞矽烷基雙[1-(2-乙基-4-(4-氣苯基)-4H-奠基)] 二氣化鍅、二甲基亞矽烷基雙[1-(2-乙基-4-萘基_4H-奠 基)]二氯化錘、二苯基亞矽烷基雙[1-(2-曱基-4-(4-氣苯 基)-4H-奠基)]二氯化锆、二曱基亞矽烷基雙[ι_(2_甲基_4_ 苯基茚基)]二氣化錘、二曱基亞矽烷基雙[1-(2-乙基_4-苯 基茚基)]二氣化锆、二甲基亞矽烷基雙乙基_4_萘基- 4H-萁基)]二氯化锆、二曱基鍺烯雙(茚基)二氯化锆、二曱 基鍺烯(環戊二烯基)(苐基)二氯化锆等锆化合物。亦可相 同使用將上述化合物中之鍅取代成鈦、鉻之化合物。有時 亦可使用錯化合物與鉻化合物等之混合物。又,氣化物可 取代成其他_素化合物、曱基、異丁基、苄基等烴基,二 甲基醯胺、二乙基醯胺等醯胺基,曱氧基、苯氧基等烷氧 基,氫化基等。 又,茂金屬化合物亦可承載於無機或有機化合物載體而 使用。作為該載體’較好的是無機或有機化合物之多孔質 化α物,具體可列舉:離子交換性層狀矽酸鹽、沸石、 si〇2 Α12〇3、矽鋁氧化物、Mg〇、Zr〇2、Ti〇2、β2〇3、More specifically, an anthracenylene (cyclopentadienyl) (3,4-dimethylcyclopentadienyl) di-vaporized hydrazine, an isopropylidene (cyclopentadienyl) (3) can be exemplified. , 4-dimethylcyclopentadienyl) zirconium dihydride, ethylene (cyclopentadienyl) (3,5-dimethylpentadienyl) di-vaporized bismuth, fluorenylene bis (茚)) zirconium dihydride, ethylene bis(2-indenyl) zirconium dichloride, ethylene U2 • bis (4-phenylphenyl) digastric, isopropylidene (ring Pentadienyl)(fluorenyl)zirconium dichloride, isopropylidene (4-methylcyclopentadienyl) (3-tert-butyl)-zirconium dihydride, dimethyl sulfoxide (cyclopentadienyl) (tetradecylcyclopentadienyl) di-vaporized hydrazine, dimercaptoalkylene bis(indenyl) di-vaporized hydrazine, dimercaptoarylene bis (4,5, 6,7_tetrahydroindenyl) bismuth hydride, dimethyl sulfenyl (cyclopentadienyl) zirconium dichloride, dimethyl sulfenyl (cyclopentadienyl) (octahydrogen) Dimethyl hydrazine, dimercaptoalkylene bis[4-(1-phenyl_3_fluorenyl)]dichloromethane, dimethyl sulfite (base) Tert-butyl decylamine dichloromethane, nonylphenyl hydrazinoalkyl bis[1-(2-methyl-4,5-benzo(indenyl)] bismuth hydride, diterpene sulfite Di-[1-(2-methyl-4,5-benzofluorenyl)] di-gasification, dimethyl sulfite bis[1-(2-methyl-4-phenyl- 4H-Moji)] gasification error, two 130902.doc -13- 200911951 methyl sulfenyl bis[1-(2-mercapto-4-(4-chlorophenyl)-4H-methyl)] Zirconium dichloride, dimercaptoalkylene bis[1-(2-ethyl-4-(4-carbophenyl)-4H-foundation)] bismuth hydride, dimethyl fluorenylene bis[1] -(2-ethyl-4-naphthyl_4H-foundation)] dichlorinated hammer, diphenylarylene alkyl bis[1-(2-mercapto-4-(4-phenylphenyl)-4H- Foundation)] zirconium dichloride, dimercaptoalkylene bis[ι_(2_methyl_4_phenylindolyl)] gasifier, dimercaptoalkylene bis[1-(2-ethyl _4-Phenylfluorenyl)]zirconium dihydride, dimethyl sulfenyl bis-ethyl-4-indolyl-4H-indenyl]] zirconium dichloride, dinonyl decene bis(indenyl) A zirconium compound such as zirconium dichloride or dinonyl decene (cyclopentadienyl) (fluorenyl) zirconium dichloride. A compound in which ruthenium in the above compound is substituted into titanium or chromium can also be used in the same manner. Sometimes a mixture of a wrong compound and a chromium compound or the like can also be used. Further, the vapor compound may be substituted with another hydrocarbon compound such as a sulfonium compound, a mercapto group, an isobutyl group or a benzyl group, a decylamino group such as dimethyl decylamine or diethyl decylamine, or an alkoxy group such as a decyloxy group or a phenoxy group. Base, hydrogenated group, and the like. Further, the metallocene compound can also be used in an inorganic or organic compound carrier. The carrier is preferably a porous alpha compound of an inorganic or organic compound, and specific examples thereof include an ion-exchange layered niobate, zeolite, si〇2Α12〇3, niobium aluminum oxide, Mg〇, Zr. 〇2, Ti〇2, β2〇3,

BaO、Th〇2等無機化合物;由多孔質聚烯 ;’二乙烯基苯共聚物、烯烴.丙烯酸共聚物等所 構成之有機化合物;或其等之混合物。 促2 2與茂金屬化合物反應而可活化為穩定之離子狀態的 ,, ' 例如可列舉:有機鋁氧化物(例如,鋁氧烷化合 物)、離子夺她k a 、性層狀矽酸鹽、路易斯酸、含硼化合物、 130902.doc 200911951 離子性化合物、含氟有機化合物。 作為有機鋁化合物,例如 . 一 了列舉.二乙基鋁、三異丙基 紹、二異丁基銘等三惊其·¢2 _ 一 土’ ,二烷基鋁鹵化物、烷基鋁倍 半鹵化物、烷基鋁二鹵化物、 烷基鋁虱化物、有機鋁烷醇 鹽等。 作為聚合法,可列舉:於 、上述觸媒存在下’使用惰性溶 劑之聚料法、溶液法,實質上不使用溶劑之氣相法,或以 Γ (- 聚合I體為溶劑之總體聚合法等。作為獲得上述丙婦·α_稀 經共聚物之方法’例如,可調節聚合溫度或共聚單體量而 適當控制分子量及結晶性之分布,藉此獲得所需聚合物。 該等基材層所使用之樹脂可單獨使用或混合使用罐以 上。又,基材層可為單層或由2層以上之不同樹脂層形 成土材層之厚度通常為1〇〜2〇〇叫較好的是〜刚 μιη ’更好的是30〜7〇 μηι。 再者,上述基材層中,可於不損及本發明之目的之範圍 内適當添加抗氧化劑、潤滑劑、抗結塊劑、紫外線吸收劑 等薄膜基材通常所使用之各種添加劑、填充劑。又,亦可 適當地對薄膜表面進行酸處理' 鹼處理、底塗處理、電暈 處理、電漿處理、紫外線處理等^接著處理。 又,本發明之抗靜電層之特徵在於含有高分子型抗靜電 ^ ’該抗靜電層較好的是,由上述基材層所使用之合成樹 脂及尚分子型抗靜電劑形成。 作為抗靜電層所使用之合成樹脂,在上述基材層所使用 之合成樹脂之中,自生產性、成型性、進而自抗污染性的 130902.doc -15· 200911951 方面考慮,可較好地使用聚丙烯樹脂。 作為上述聚丙烯,可列舉:作為均聚物 丙烯·α-烯烴隨機共聚物之隨機 乍為 取仏 作為丙烯·α-烯烴嵌俨 …勿之隨機型’自透明性之觀點考 & 質型或隨機型。 了較好地使用均 .ι.:\ :為亡述均質型聚丙稀樹脂’只要為可獲得成為 2較向透明性之黏著片材之樹脂,則並無特別限制,作 為市售品,例如可列舉ZS1327A、Fi〇4a、h 59〇〇(上述均為prime p〇lymei^司製造)等。 作為隨機型丙烯.心烯烴成分,例如有乙烯丁烯、1 戊婦、1-己烯、1-庚烯、;!_辛稀、3_甲基丁H、心甲基戍 烯-1、%甲基己烯_丨等,較好的是乙烯、^丁烯、3_〇基 丁烯-1、4-甲基戊烯·丨。又,此外可使用4•曱基己: 稀、5-甲基-1,4·己二烯、7_甲基-以-辛二烯、U9_癸二烯 等非共軛二烯作為聚合物成分之一部分。進而亦可將降冰 片烯等環狀烯烴聚合。 作為隨機型丙烯·α-烯烴隨機共聚物,與上述所使用者相 同’例如可列舉:丙烯·乙烯隨機共聚物、丙烯·〗_丁烯隨 機共聚物、丙烯.i-己烯隨機共聚物、丙烯.乙烯.i_辛烯隨 機共聚物、丙烯·乙烯.丨_ 丁烯隨機共聚物等。作為市售 品’例如可列舉:F327、J-5910、J-5710(上述均為primeAn inorganic compound such as BaO or Th〇2; an organic compound composed of a porous polyolefin; a divinylbenzene copolymer, an olefin, an acrylic copolymer or the like; or a mixture thereof. The 2 2 is reacted with the metallocene compound to be activated to a stable ionic state, and 'for example, an organoaluminum oxide (for example, an aluminoxane compound), an ion-enhanced ka, a layered citrate, and a Lewis Acid, boron-containing compound, 130902.doc 200911951 ionic compound, fluorine-containing organic compound. As an organoaluminum compound, for example, one of the examples. diethylaluminum, triisopropyl succinyl, diisobutyl sulphate, etc., succinct ¢2 _ a soil', dialkyl aluminum halide, alkyl aluminum sesquihalide Alkyl aluminum dihalide, alkyl aluminum halide, organoaluminum alkoxide, and the like. Examples of the polymerization method include a polymerization method using an inert solvent in the presence of the above catalyst, a solution method, a gas phase method in which a solvent is not substantially used, or an overall polymerization method in which a polymerization medium is used as a solvent. In the method of obtaining the above-mentioned propylene/α-thin copolymer, for example, the polymerization temperature or the comonomer amount can be adjusted to appropriately control the distribution of molecular weight and crystallinity, thereby obtaining a desired polymer. The resin used for the layer may be used alone or in combination. In addition, the substrate layer may be a single layer or a layer of different layers of two or more resin layers may be formed. The thickness of the layer is usually 1 〇 2 〇〇 2 It is ~ just μιη 'better 30~7〇μηι. Further, in the above substrate layer, an antioxidant, a lubricant, an anti-caking agent, and an ultraviolet ray may be appropriately added within a range not impairing the object of the present invention. Various additives and fillers commonly used for film substrates such as absorbents. Alternatively, the surface of the film may be subjected to acid treatment as an alkali treatment, a primer treatment, a corona treatment, a plasma treatment, an ultraviolet treatment, etc. Another The antistatic layer of the present invention is characterized in that it contains a polymer type antistatic layer. The antistatic layer is preferably formed of a synthetic resin used in the above substrate layer and a molecular type antistatic agent. Among the synthetic resins used in the above-mentioned base material layer, a polypropylene resin can be preferably used from the viewpoints of productivity, moldability, and further self-resistance resistance 130902.doc -15·200911951. As the above-mentioned polypropylene, a random enthalpy as a homopolymer propylene·α-olefin random copolymer is taken as a propylene·α-olefin intercalation... a random type of 'self-transparency' and a plastid type Or a random type. It is not particularly limited as long as it is a resin which can be used as an adhesive sheet which is a relatively transparent one. Examples of the product to be sold include ZS1327A, Fi〇4a, h59〇〇 (all of which are manufactured by prime p〇lymei^), etc. As a random type of propylene. Heart olefin component, for example, ethylene butene, 1 pentyl, 1 -hexene, 1-heptene, ; , 3-methylbutyric acid H, cardiomethyl decene-1, % methylhexene hydrazine, etc., preferably ethylene, butene, 3 fluorenyl butene-1, 4-methylpentene · 丨. In addition, 4·曱基己: di-, 5-methyl-1,4·hexadiene, 7-methyl-iso-octadiene, U9_decadiene, etc. The olefin is a part of the polymer component. Further, a cyclic olefin such as norbornene can be polymerized. The random propylene/α-olefin random copolymer is the same as the above-mentioned user', for example, a propylene/ethylene random copolymer , propylene·y_butene random copolymer, propylene.i-hexene random copolymer, propylene, ethylene, i-octene random copolymer, propylene, ethylene, 丨_butene random copolymer, and the like. As a commercial item, for example, F327, J-5910, and J-5710 (both of which are prime)

Polymer公司製造)、Wintech WFX6、wintech WFX4、 Wintech WFX4T、Wintech WFX4TA、Wintech WFW4(上 述均為日本P〇lypro公司製造)等。該等之中,自成為組成 130902.doc • 16· 200911951 明性之抗靜電層的觀點 媒而聚合之丙稀· α-稀烴 考 隨 均勻之共聚物、獲得具有較高透 慮’可較好地使用利用茂金屬觸 機共聚物。 此處’作為使用茂金屬觸媒而聚合之丙稀,α_稀煙雜 聚物所使用之α·稀煙’例如有乙稀、ν 丁稀、b戊稀、【 己稀、庚烯、辛豨、3_甲基丁烯七心甲基戊m 甲基己烯-!等’較好的是乙烯、m 3_甲基丁烯心 4-曱基戊烯-1。又,此外Made by Polymer), Wintech WFX6, Wintech WFX4, Wintech WFX4T, Wintech WFX4TA, Wintech WFW4 (all of which are manufactured by P〇lypro, Japan). Among these, from the viewpoint of the composition of the antistatic layer of 130902.doc • 16· 200911951, the propylene-α-dilute hydrocarbon polymerized with the uniform copolymer can be obtained with higher permeability. Good use of metallocene contact copolymers. Here, 'as a propylene which is polymerized using a metallocene catalyst, α·smoke which is used for α-dilute smoke heteropolymers is, for example, ethylene, ν butyl, b pentene, hexamethylene, heptene, Xin, 3, methylbutene, heptamethylpentene, m-methylhexene, etc., preferably ethylene, m 3 -methylbutene, 4-decylpentene-1. Again, in addition

此外可使用4-甲基-1,4-己二烯、5-曱 基-1,4-己二烯、7-甲基_ι 6在· - β ,6辛一烯、1,9-癸二烯等非共軛 二烯作為聚合物成分之一部分。進而,亦可將降冰片烯等 環狀稀烴共聚合。作么、+,,、 乍為上迷隨機共聚物之具體例,可列 舉:丙稀.乙稀隨機共聚物、丙稀]·丁賴機共聚物、丙 稀· i-己豨隨機共聚物、丙烯·乙稀]_辛烯隨機共聚物、丙 稀·乙烯·1-丁烯隨機共聚物等。 又作為使用戊金屬觸媒而聚合之丙稀·稀煙隨機共聚 物’自成形性以及與抗靜電劑之相容性之觀財慮,可較 好地使用炼點為11Crc〜15(rc、尤其為…。㈠抓者。作 為其等之具體例,例如可列舉:Wintech爾6、偏― WFX4 Wintech WFX4T ^ Wintech WFX4TA ' Wintech WFW4(上述均為日本p〇iypr。公司製造)等市售品。 本發月所m之同分子型抗靜電劑含有聚_自旨醯胺欲段 二聚物作為主成分’該聚㈣醯胺嵌段共聚物係由聚酿胺 聚氧烷一醇肷段所構成。嵌段共聚物之聚醯胺嵌段 具有用以均勻地分散於形成抗靜電層之合成樹脂中的功 130902.doc •17- 200911951 能1氧烧二醇後段具有抗靜電之功能。因此,利用包含 忒等兩種成分之共聚物’抗靜電劑均勻分散於抗靜電層 中,從而可表現出穩定之抗靜電能力,且可形成透明性^ 高之抗靜電層。又,藉由使用含有上述嵌段共聚物之抗靜 t劑,即便進行水洗、濕毛巾擦拭等處理時抗靜電能力亦 幾乎不會下降,從而可獲得穩定之抗靜電能力。 作為形成上述嵌段共聚物之聚醯胺嵌段,例如為:藉由 將琥珀酸、己二酸、癸二酸、十二烷二酸、對笨二甲酸、 J 間苯二曱酸、丨,4-環己二羧酸此類碳數為4〜20之二羧酸與 四亞甲基二胺、五亞甲基二胺、六亞甲基二胺、九亞曱基 二胺、十亞甲基二胺、2,2,4-三甲基六亞甲基二胺、2,4,4_ 三甲基六亞甲基二胺、1,3-雙(胺曱基)環己烷、丨,4-雙(胺 曱基)環己烷、亞甲基雙(4-胺基環己烷)、間二甲笨二胺、 對一曱本二胺此類碳數為4〜20之二胺的聚縮合而獲得者; 藉由己内醯胺、十一内醯胺、十二内醯胺此類内醯胺之開 , 環聚合而獲得者;藉由6-胺基己酸、9-胺基壬酸、1丨_胺基 十一烷酸、I2·胺基十二烷酸之此類基羧酸之聚縮合而獲 得者;或藉由上述内醯胺與二羧酸與二胺之共聚而獲得 者。該等可單獨使用,亦可混合使用2種以上。 作為上述聚醯胺片段(聚醯胺嵌段)之具體例,例如可列 舉:尼龍4、尼龍6、尼龍46、尼龍66、尼龍610、尼龍 61 2、尼龍6T、尼龍61、尼龍9T、尼龍1 1、尼龍1 2、尼龍 6/66(表示尼龍6與尼龍66之共聚物,以下相同)、尼龍 6/12、尼龍 6/610、尼龍 66/12、尼龍 6/66/610 等。 130902.doc 200911951 作為聚醯胺嵌段之數量平均分子量,可使用·〜咖。 上述數量平均分子量係利用凝膠滲透層析儀(Gpc,㈣· permeation chromatography)之以聚甲基丙歸酸 所求出者。 、"'值 作為聚氧烧二醇嵌段,例如,可使用具有碳 伸燒基之聚氧炫二醇。作為具體例,例如可列舉:聚氧乙 t醇、聚氧丙二醇、聚氧丁二醇、聚氧乙二醇/聚氧丙二 知隨機共聚物或嵌段共聚物等。該等可單獨使用,亦可$ 合使用2種以上。 & 作為聚氧烷二醇嵌段之數量平垃八 J刀于置,可借用 200〜6000。上述數晉卓的八2曰〆 1这數里千均分子量係利用凝膠滲透層析儀 (GPC)之以聚乙二醇或聚苯乙烯換算值所求出者。 聚醯胺嵌段係藉由S旨鍵與聚氧院二醇嵌段鍵結,具有經 二:鍵而反覆交替鍵結之結構。聚醯胺嵌段與聚氧烷二 ^欠1 又之自旨化反應可使^前眾所周知之方法,例如可利Further, 4-methyl-1,4-hexadiene, 5-mercapto-1,4-hexadiene, 7-methyl-ι 6 in -β, 6-octene, 1,9- can be used. A non-conjugated diene such as a decadiene is partially included as a polymer component. Further, a cyclic diluent such as norbornene may be copolymerized. Specific examples of the above-mentioned random copolymers include: propylene, ethylene random copolymer, propylene], Dinglai copolymer, propylene, i-hexane, random copolymer , propylene·ethylene]_octene random copolymer, propylene, ethylene, 1-butene random copolymer, and the like. Further, as a self-formability of the propylene and thin-smoke random copolymer polymerized using a pentad metal catalyst, and the compatibility with the antistatic agent, the refining point can be preferably used as 11Crc~15 (rc, In particular, (a) the catcher. As a specific example of such, for example, Wintech 6 and WFX4 Wintech WFX4T ^ Wintech WFX4TA 'Wintech WFW4 (all of which are manufactured by Japan p〇iypr.) are commercially available. The same type of antistatic agent of the present invention contains a poly- (tetra) decylamine block copolymer as a main component of the poly(tetra)guanamine block copolymer. The polyammonium block of the block copolymer has a function for uniformly dispersing in the synthetic resin forming the antistatic layer. 130902.doc • 17- 200911951 The first stage of the oxypropylene diol has an antistatic function. Therefore, the copolymer antistatic agent containing two components such as hydrazine is uniformly dispersed in the antistatic layer, thereby exhibiting stable antistatic ability and forming an antistatic layer having high transparency. Using an antistatic agent containing the above block copolymer, ie When the treatment with water washing, wet towel wiping, etc., the antistatic property is hardly lowered, and stable antistatic ability can be obtained. As the polyamine block forming the above block copolymer, for example, by using succinic acid, Adipic acid, sebacic acid, dodecanedioic acid, p-dicarboxylic acid, J-mesophthalic acid, hydrazine, 4-cyclohexanedicarboxylic acid, such as 4 to 20 dicarboxylic acids and 4 Methyldiamine, pentamethylenediamine, hexamethylenediamine, nonadenylenediamine, decamethylenediamine, 2,2,4-trimethylhexamethylenediamine, 2 ,4,4_trimethylhexamethylenediamine, 1,3-bis(amine-decyl)cyclohexane, anthracene, 4-bis(aminoindenyl)cyclohexane, methylenebis(4-amine Cyclohexane), m-dimethyldiamine, obtained by polycondensation of a diamine having a carbon number of 4 to 20; a caprolactam, eleven decylamine, ten Diendammine, such as decylamine, obtained by ring polymerization; by 6-aminocaproic acid, 9-amino decanoic acid, 1 丨-aminoundecanoic acid, I2·amino 12 Obtaining a polycondensation of an alkanoic acid such a carboxylic acid; or by the above The phthalamide is obtained by copolymerization of a dicarboxylic acid and a diamine. These may be used alone or in combination of two or more. Specific examples of the polyamine moiety (polyamine block) include, for example, Nylon 4, nylon 6, nylon 46, nylon 66, nylon 610, nylon 61, nylon 6T, nylon 61, nylon 9T, nylon 1 1, nylon 1, 2, nylon 6/66 (representing copolymer of nylon 6 and nylon 66) , the same as the following), nylon 6/12, nylon 6/610, nylon 66/12, nylon 6/66/610, etc. 130902.doc 200911951 As the number average molecular weight of the polyamine block, it can be used. The above-mentioned number average molecular weight is determined by polymethyl propyl acid by a gel permeation chromatography (Gpc, permeation chromatography). , "' value As the polyoxyalkylene glycol block, for example, a polyoxynonol having a carbon-extinguishing group can be used. Specific examples thereof include polyoxyethylene t-alcohol, polyoxypropylene glycol, polyoxybutylene glycol, polyoxyethylene glycol/polyoxypropylene known random copolymer, and block copolymer. These can be used alone or in combination of two or more. & As the number of polyoxyalkylene glycol blocks, it can be borrowed from 200 to 6000. In the above-mentioned number, the number average molecular weight is determined by a polyethylene glycol or polystyrene conversion value by a gel permeation chromatography (GPC). The polyamine block is bonded to the polyoxyethylene diol block by a S-bond, and has a structure in which a double bond is alternately bonded. The polyamido block and the polyoxyalkylene are inferior to the self-reacting reaction, so that the well-known methods, such as

U 口下方法獲得:使上述聚酿胺與聚氧貌二醇於二敌酸之 存在下進行聚縮合;使分 二醇進行聚縮合等。子末U竣酸之聚酿胺與聚氧烧 又,上述酯化反應中可使用眾所 周之δ旨化_。作為 酉曰化觸媒,例如可列舉: 美鍅笪r 4銻系觸媒、氧化單丁 “觸Γ:媒、鈦酸四丁醋等鈦系觸媒、錯酸四丁醋等 二相對於Γ鋅等醋酸金屬鹽系觸媒等。觸媒之使用量 為相對於聚醯胺嵌段與聚氧烧二醇⑽H重 0.1〜5重量%。該等觸媒單 里吊‘、'、 早獨使用亦可混合使用2種以 130902.doc -19- 200911951 上。 作為本發明之聚醚酯醯胺,可較好地使用聚醚酯醯胺中 所含之聚氧烷二醇嵌段之含量為5〜8〇重量%、較好的是 10~70重量。/◦者。 又,作為聚醚酯醯胺之數量平均分子量,可使用 400〜50000,較好的是1〇〇〇〜2〇〇〇〇。上述數量平均分子量 係利用凝膠參透層析儀(GPC)之以聚$乙締換算值所求出 者。 本發明所使用之高分子型抗靜電劑,藉由在上述聚鍵醋 醯胺中併用與聚醚酯醯胺具有親和性之纖維、例如聚醯胺 纖維’而表現出良好之抗靜電性。雖然該等機制之詳情尚 不明確,但一般認為,醯胺纖維在不溶解之聚烯烴中形成 ,.罔狀結構,進而聚醚酯醯胺吸附鍵結於該聚醯胺纖維,由 此形成有效率之離子傳導網路。 作為本發明所使用之聚醯胺纖維之聚醯胺,例如為:藉 由琥珀酸、己二酸、癸二酸、十二烷二酸、對苯二曱酸、 間苯二曱酸、丨,4-環己二羧酸此類碳數為4〜20之二羧酸與 四亞甲基二胺、五亞甲基二胺、六亞甲基二胺、九亞曱基 二胺、十亞甲基二胺、2,2,4_三曱基六亞曱基二胺、2,4,4_ 三甲基六亞曱基二胺、;!,3_雙(胺曱基)環己烷、丨,4_雙(胺 甲基)環己烷、亞甲基雙(4_胺基環己烷)、間二曱苯二胺、 對一甲苯二胺此類碳數為4〜2〇之二胺的聚縮合而獲得者·, 藉由己内醯胺、十—内醯胺、十二内醯胺此類内醯胺之開 環聚合而獲得者;藉由6-胺基己酸、9-胺基壬酸、11-胺基 130902.doc -20- 200911951 十一烷酸、12-胺基十二烷酸此類胺基羧酸之聚縮合而獲 得者;或藉由上述内醯胺與二羧酸與二胺之共聚合等而獲 得者。該等聚醯胺可單獨使用,亦可混合使用2種以上。 作為上述聚醯胺片段之具體例,可列舉:尼龍4、尼龍 6、尼龍46、尼龍66、尼龍6 10、尼龍61 2、尼龍6T、尼龍 61、尼龍9T、尼龍11、尼龍12、尼龍6/66(表示尼龍6與尼 龍66之共聚物,以下相同)、尼龍6/丨2、尼龍6/6丨〇、尼龍 66/12、尼龍 6/66/610 等。U sub-method obtained: polycondensation of the above polyamine and polyoxymorphic diol in the presence of dicarboxylic acid; polycondensation of the diol. At the end of the U-acid, the polyamine and the polyoxygen are burned. In the above esterification reaction, the δ can be used. Examples of the oximation catalyst include, for example, a ruthenium-based catalyst, an oxidized monobutylene, a catalyzed: a medium, a titanium-based catalyst such as tetrabutyl vinegar, or a tetrabasic vinegar. A metal acetate-based catalyst such as bismuth zinc or the like. The amount of the catalyst used is 0.1 to 5% by weight based on the polyamine block and the polyoxyalkylene glycol (10) H. The catalysts are slinged in the ', ', early The two types may be used alone or in combination with 130902.doc -19-200911951. As the polyether ester guanamine of the present invention, the polyoxyalkylene glycol block contained in the polyether ester guanamine may be preferably used. The content is 5 to 8 % by weight, preferably 10 to 70% by weight. Further, as the number average molecular weight of the polyether ester guanamine, 400 to 50000, preferably 1 〇〇〇 is used. The above-mentioned number average molecular weight is determined by a gel permeation chromatography (GPC) in terms of a poly-ethylene-based conversion value. The polymer-type antistatic agent used in the present invention is as described above. The poly-labeled acetamide and the fiber having affinity with the polyetheresteramine, such as polyamine fiber, exhibit good antistatic properties. The details of the mechanism are not clear, but it is generally believed that the guanamine fiber is formed in the insoluble polyolefin, and the ruthenium structure, and then the polyether ester guanamine is adsorbed and bonded to the polyamide fiber, thereby forming an efficient effect. Ion-conducting network. Polyamine which is a polyamine fiber used in the present invention, for example, by succinic acid, adipic acid, sebacic acid, dodecanedioic acid, terephthalic acid, m-benzene Dicapric acid, hydrazine, 4-cyclohexanedicarboxylic acid, such a dicarboxylic acid having 4 to 20 carbon atoms and tetramethylene diamine, pentamethylenediamine, hexamethylenediamine, and quinone Diamine, decamethyldiamine, 2,2,4-tridecylhexamethylenediamine, 2,4,4-trimethylhexamethylenediamine, ;!,3_bis (amine Mercapto) cyclohexane, hydrazine, 4_bis(aminomethyl)cyclohexane, methylenebis(4-aminocyclohexane), m-diphenylene diamine, p-toluenediamine Obtained by the polycondensation of a diamine of 4 to 2 〇, obtained by ring-opening polymerization of decylamine such as caprolactam, decanoin, and dodecanoin; by 6 - aminohexanoic acid, 9-amino decanoic acid, 11-amino group 130902. Doc -20- 200911951 obtained by polycondensation of an amino acid such as undecanoic acid or 12-aminododecanoic acid; or by copolymerization of the above internal amine with a dicarboxylic acid and a diamine The polyamine may be used singly or in combination of two or more. Specific examples of the polyamidene fragment include nylon 4, nylon 6, nylon 46, nylon 66, nylon 6 10, and nylon. 61 2. Nylon 6T, nylon 61, nylon 9T, nylon 11, nylon 12, nylon 6/66 (representing the copolymer of nylon 6 and nylon 66, the same below), nylon 6/丨2, nylon 6/6丨〇, Nylon 66/12, nylon 6/66/610, etc.

又’較合適的是,本發明所使用之聚醯胺纖維為 0.5〜500 dtex、較好的是i〜1〇〇 dtex之聚醯胺纖維。 再者,所謂dtex,係指被稱為線密度或纖度之單位,係 表不長度為10000瓜之單纖維之克單位重量的單位 dtex=l g/10000 m)。 mm,較好的是0.1〜2〇 mm。 至於聚醯胺纖維之合I i 1 Μ . « - Ρ < 3 ΐ為’相對於聚醚酯醯胺與聚醯胺 纖維之總重量較好的a 〇 于的疋9〜96重量%,更好的是20〜91重量 %,進而更好的是25〜8〇重量%。 本發明所使用之高公; 门刀子型抗靜電劑,藉由在上述聚醚醋 S&胺及酿胺纖維中;隹 '步併用無機鹽及/或有機鹽,而Further, it is preferable that the polyamide fiber used in the present invention is a polyamide fiber having a thickness of from 0.5 to 500 dtex, preferably from i to 1 Å dtex. Further, the term "dtex" means a unit called linear density or fineness, and is a unit of gram weight per unit weight of 10,000 melons, dtex = 1 g / 10000 m). Mm, preferably 0.1 to 2 mm. As for the polyamine fiber, I i 1 Μ . « - Ρ < 3 ΐ is '9~96% by weight relative to the total weight of the polyether ester amide and the polyamide fiber, a9~96% by weight, More preferably, it is 20 to 91% by weight, and more preferably 25 to 8 % by weight. The high-knife type knives type antistatic agent used in the above-mentioned polyether vinegar S&amine and amine-brown fiber; and the inorganic salt and/or organic salt is used in combination with

進一步獲得抗靜電性倍H 性優異之抗靜電層。一般認為,藉 用無機鹽及/或有機_ ^ 精田祈 嚴’離子成分會在聚醚酯醯 傳導網路上移動, < 雕寸 而表現出優異之抗靜電性。 至於無機鹽,作太认人 ’、、、 金屬及驗土金屬之鹽,例如可歹, 130902.docFurther, an antistatic layer excellent in antistatic property and double H property is obtained. It is generally believed that the use of inorganic salts and/or organic _ ^ Jingtian praying ionic components will move on the polyether ester 传导 conductive network, and will exhibit excellent antistatic properties. As for inorganic salts, it is too salty, ', metal, and salt of metal for soil testing, such as 歹, 130902.doc

-2K 200911951 舉:鋰、鈉、鉀等鹼金屬及鎂、鈣等鹼土金屬之有機酸、 磺酸、無機酸之鹽,及_化物等。 作為鹼金屬及鹼土金屬之鹽之具體較好的例,例如可列 舉·氯化鋰、氯化鈉、氯化鉀、溴化鋰、溴化鈉、溴化鉀 等鹼金屬之齒化物;過氯酸鋰、過氯酸鈉、過氯酸鉀等鹼 金屬之無機酸鹽;醋酸鉀、硬脂酸鋰等鹼金屬之有機酸 鹽,辛嶒酸、十二烷磺酸、十四烷磺酸、十八烷磺酸、二 十四烷%酸、2-乙基己磺酸等烷基之碳數為8〜24之烷磺酸 之驗金屬Μ ;苯續酸、萘續酸等芳香族確酸之驗金屬鹽; 辛基本磺酸、十二烷基苯磺酸、二丁基苯磺酸、二壬基苯 績酸等烧基之碳數為6〜18之㈣苯料之驗金屬鹽;二甲 基萘績酸、二異丙基萘續酸、二丁基萘續酸等院基之碳數 為2〜18之烷基萘磺酸之驗金屬鹽;三氟甲磺酸、五氟乙磺 酸、九氟丁《、雙(三氟甲績醯基)酿亞胺等氣確酸等之 驗金屬鹽等’該等可單獨使用!種,或併用2種以上。 作為有機鹽,可列舉:含氮鑌鹽、含硫鏘鹽、或含㈣ 鹽。具體而言,例如可列舉:㈣鏽陽離子"底咬錄陽離 子m鑌陽離子、具有D比洛琳骨架之陽離子、具有η比 咯骨架之陽離子、咪唑鑌陽離子、四氫嘧啶鑌陽離子、二 氫㈣鐵陽離子…比哇鏽陽離子、吼唾琳鏽陽離子、四院 =陽離子、三貌基疏陽離子、四院基鱗陽離子、將上述 =ΓΓ代成稀基或烧氧基、或進而取代成環氧基 』、ΒΓ、1、A1C1,、勒7-、Βν、ρ ⑽4-、NCV、CH3C⑻、CF3C〇〇·、CH3S(V、⑶ _、 I30902.doc -22- 200911951 (cf3s〇2)2n-、(CF3S〇2)3C-、AsF6.、Sbv、NbF6_、叫 ' F(HF)n- ^ (CN)2N- > C4F9S03- ^ (C2F5S〇2)2N- > C3F7C〇〇-、(邮〇2)(CF3C〇)N_、0H·、p〇4.、C2H5〇s(v、 CH3〇S〇4_等陰離子組合而獲得之鹽。 作為吼㈣陽離子ϋ鑌陽離子、料烧鑌陽離子、 具有対琳骨架之陽離子、及具有吼口各骨架之陽離子之具 體例,例如可列蘼彳 、 Β 舉乙基吡啶鑌陽離子、1-丁基吡啶鏽 陽離子、1-己基吡啶鑌陽離 丁基_3_甲基吡啶鑌陽離 子、_丁基―4-甲基吡啶鑌陽離子、丨_己其 離子、1-丁基34 - Η 己基-3-甲基吼。定鑌陽 ,_一甲基吡啶鏽陽離子、l,l-二甲基吡咯 烷鑌陽離子、;!_乙美〗φ I 丫丞比咯 基吡咯烷鑌陽離子、2_甲其i咐夂以 于1甲基丙 基㈣陽離子、Γ陽離子、卜乙基_2-苯 子。 土弓丨°木陽離子、卜乙基咔唑陽離 作為咪唑鏘陽離子、四氣-2K 200911951: Alkali metals such as lithium, sodium and potassium, and organic acids such as magnesium, calcium and other alkaline earth metals, sulfonic acids, salts of inorganic acids, and _ compounds. Specific examples of the salt of the alkali metal and the alkaline earth metal include, for example, a tooth of an alkali metal such as lithium chloride, sodium chloride, potassium chloride, lithium bromide, sodium bromide or potassium bromide; and perchloric acid; An inorganic acid salt of an alkali metal such as lithium, sodium perchlorate or potassium perchlorate; an organic acid salt of an alkali metal such as potassium acetate or lithium stearate; caprylic acid, dodecanesulfonic acid, tetradecanesulfonic acid, and 18 a metal sulfonate of an alkane sulfonic acid having an alkyl group of 8 to 24 carbon atoms such as an alkanesulfonic acid, a tetradecane-% acid or a 2-ethylhexanoic acid; an aromatic acid such as a benzoic acid or a naphthene acid; Metal salt; octane basic sulfonic acid, dodecyl benzene sulfonic acid, dibutyl benzene sulfonic acid, dimercapto benzoic acid, etc. The carbon number of the burning base is 6~18 (4) benzene material test metal salt; Metal salt of alkylnaphthalenesulfonic acid having a carbon number of 2 to 18, such as methyl naphthalene acid, diisopropyl naphthoic acid, dibutyl naphthalene acid, etc.; trifluoromethanesulfonic acid, pentafluoroethane Sulfonic acid, nonafluorobutene, bis (trifluoromethane), imine, etc., such as metal salts, etc. 'These can be used alone! Kind, or use two or more types together. The organic salt may, for example, be a nitrogen-containing phosphonium salt, a sulfur-containing phosphonium salt or a (iv)-containing salt. Specifically, for example, (4) rust cations " bottom biting cationic m镔 cation, cation having D-Bylon skeleton, cation having η-pyro skeleton, imidazolium cation, tetrahydropyrimidinium cation, dihydrogen (4) Iron cations... than wow rust cations, sputum rust cations, Siyuan = cations, trisyl-based cations, four-yard scaly cations, the above = deuterated into a weak or alkoxy group, or further substituted into a ring Oxygen, ΒΓ, 1, A1C1, 勒7-, Βν, ρ (10)4-, NCV, CH3C(8), CF3C〇〇, CH3S(V, (3) _, I30902.doc -22- 200911951 (cf3s〇2) 2n -, (CF3S〇2) 3C-, AsF6., Sbv, NbF6_, called 'F(HF)n-^(CN)2N- > C4F9S03-^(C2F5S〇2)2N- > C3F7C〇〇-, (Post 2) (CF3C〇) N_, 0H·, p〇4., C2H5〇s (v, CH3〇S〇4_ and other anions combined to obtain a salt. As a ruthenium (tetra) cation cation cation, feed 镔Specific examples of the cation, the cation having the sulfonate skeleton, and the cation having the skeleton of the gargle, for example, can be listed as ruthenium, 乙基ethylpyridinium cation, and 1-butylpyridine rust. Cation, 1-hexylpyridinium cation butyl-3-methylpyridinium cation, _butyl-4-methylpyridinium cation, 丨_hexyl ion, 1-butyl 34- Η hexyl-3-methyl吼 吼 镔 镔 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , ,咐夂 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1

CJ ,,, 定鑷輯子、及二氫嘧啶鑌 體例,例如可列查 子、丨3·_ 7 A L 』幻舉· Μ·二甲基咪唑鏽陽離 . 1_τ « . -乙基_3_甲基咪唑鏽陽離 千1 丁基甲基咪唑鏽陽 料 離子、K辛灵3 m ^己基·3_甲基味唾銪陽 土 -3-甲基咪唑鏽陽離 陽離子、:U+ 一、1六基-3-甲基咪唑鏽 ψ . 一、元土 _3-甲基咪唑鏽陽離子、1-十四浐A 3 甲基咪唑鑷陽離子、丨 十四烷基-3_ 乙基-2,3__甲其丄,一甲基丙基咪唑鏽陽離子、1-一甲基味唑鏽陽離子 陽離子' 1 p I 1 丁基_2,3_二f基咪唑鏘 匕暴-2,3-二甲基咪 1,4,5,6-四氫嘧 鏑除離子、1,3-二F基- 乳途咬鏑陽離子、1 ,,一曱基-1,4,5,6-四氫啦 130902.doc -23 - 200911951 咬錯陽離子、1>2 叫四甲基-1 4 5 6四::氣㈣鐵陽離子、 — ,4,5,6·四虱噹啶鏽陽離子、i 3 _ ,4_一虱嘧啶鑷陽離子、丨,3_二甲美 —,一甲基- 子、123-二田且 土 ’6-—氫嘧啶鏽陽離 ,’ 一 基-1,4~二氫嘧啶鏽陽離子、 】,6_二氫哺啶鏽陽離子、山 ,:-二甲基 離子、1,2,3,4-四曱Α ^ 土 -1,4·二虱嘧啶鏽陽 曱基-1,6-一虱噹啶鑌陽離子等。 作為比唑鏽陽離子、及吡 可列舉:“甲基㈣陽離子、3 例’例如 乙基㈠^料料料等。甲基㈣料離子、】-CJ , ,, 定镊辑, and dihydropyrimidinium, for example, can be listed, 丨3·_ 7 AL 』幻举·Μ·dimethylimidazole rust cation. 1_τ « . -Ethyl_3 _Methylimidazole rust cations from 1 1 butyl methyl imidazole rust cation ions, K lingling 3 m ^ hexyl · 3 _ methyl saponin salinity soil - 3-methylimidazole rust cation cation,: U + one, 1 Hexyl-3-methylimidazolium rust. I. Tertial _3-methylimidazolium rust cation, 1-tetradecyl A 3 methylimidazolium cation, 丨tetradecyl-3_ethyl-2,3_ _Kakiqi, 1-methylpropylimidazole rust cation, 1-methyl-methyl azole rust cation cation ' 1 p I 1 butyl 2,3_di-f-imidazolium -2-2,3-dimethyl Chimi 1,4,5,6-tetrahydropyrimidine deionization, 1,3-di F-based - lactose cation, 1, 1, fluorenyl-1,4,5,6-tetrahydro-la 130902 .doc -23 - 200911951 biting the wrong cation, 1>2 is called tetramethyl-1 4 5 6 four:: gas (four) iron cation, — , 4,5,6·tetradecene pyridine cation, i 3 _ , 4 _ 虱 pyrimidine cation, 丨, 3 dimethyl meth-, monomethyl-sub, 123- two fields and soil '6--hydropyrimidine rust cation, '一基-1 4~ dihydropyrimidine rust cation, 】, 6_ dihydropyridinium rust cation, mountain, :-dimethyl ion, 1,2,3,4-tetrazine ^ soil-1,4·dipyrimidine rust Indomethacin-1,6-one guanidine cations and the like. Examples of the azole cation and the pyridine include "methyl (tetra) cation, 3 examples, for example, an ethyl (i) material, etc. methyl (tetra) ion,] -

U 離^為四烧基錢陽離子、三烧基鎮陽離子、及四烧基鱗陽 以及將上職基之—部分取代成烯基^氧基進而 =環氧基之陽離子的具體例,例如可列舉:四甲基録 =子、四乙基録陽離子、四丙基錢陽離子、四丁基録陽 四戊基釦陽離子、四己基銨陽離子、四庚基銨陽離 、二甲基庚基銨陽離子、三甲基癸基㈣離子、三乙基 甲基錢陽離子、三乙基丙基錢陽離子、三乙基戊基録陽離 子二乙基己基鏔陽離子、三乙基庚基銨陽離子、三丁基 乙基知陽離子 '三戊基丁基錄陽離子、三己基甲基錢陽離 子、=基戊基銨陽離子、三庚基甲基録陽離子、三庚基 ’安陽離子二辛基^基録陽離子、縮水甘油基三甲基 銨陽離子、二烯丙基二甲基銨陽離子、N,N-二甲基-N,N_ 二丙基銨陽離子、N,N_二甲基_N,N_二己基銨陽離子、 Ν,Ν·二丙基_N,N_二己基銨陽離子、N,N_二甲基乙基· N-丙基銨陽離子、N,N_二甲基_N•乙基_N_丁基銨陽離子、 I30902.doc -24- 200911951 N,N_二F基乙基_N_戊基銨陽離子、队尺-二τ基乙 f-N-己基銨陽離子、N,Nm乙基_N_庚基銨陽離 、N,N-二甲基-N_乙基_N_壬基銨陽離子、N,N-二〒基_ N-丙基-Ν·丁基銨陽離 , 土 丁化以一 Τ基丙基-Ν-戊基銨 Ν,Ν-一 f基_Ν_丙基_Ν_己基銨陽離子、队队二甲 基-Ν-丙基_Ν_庚基錄陽離子、Ν算二甲基·ν_ 丁基j己美U is a specific example of a tetracalcium cation, a tricalcium cation, a tetraalkyl cation, and a cation in which an upper group is partially substituted with an alkenyloxy group and an epoxy group, for example, Listed: tetramethyl record = sub, tetraethyl cation, tetrapropyl cation, tetrabutyl cation tetrapentyl cation, tetrahexylammonium cation, tetraheptyl ammonium cation, dimethyl heptyl ammonium Cation, trimethylsulfonyl (tetra) ion, triethyl methyl cation, triethyl propyl cation, triethyl pentyl cation diethyl diethyl decyl cation, triethyl heptyl ammonium cation, tributyl Benzyl cation cation 'tributylbutyl cation, trihexyl methyl cation, = pentyl ammonium cation, triheptyl methyl cation, triheptyl 'an cation dioctyl ^ cation Glycidyl trimethylammonium cation, diallyldimethylammonium cation, N,N-dimethyl-N,N-dipropylammonium cation, N,N-dimethyl-N,N-dihexyl Ammonium cation, hydrazine, hydrazine dipropyl _N,N-dihexyl ammonium cation, N,N-dimethylethyl·N-propyl Ammonium cation, N,N-dimethyl-N•ethyl_N_butylammonium cation, I30902.doc -24- 200911951 N,N_di-F-ethylethyl-N-pentyl ammonium cation, team ruler- Di-t-t-ethyl-fN-hexylammonium cation, N,Nmethyl-N-heptyl ammonium cation, N,N-dimethyl-N-ethyl-N-decyl ammonium cation, N,N-di _ N-propyl-hydrazine-butylammonium cation, sulphate-mercaptopropyl-indole-amylammonium ruthenium, Ν--f-yl-Ν-propyl-Ν-hexyl ammonium cation, team Team dimethyl-Ν-propyl_Ν_heptyl cation, 二 二 · · 丁基 丁基

叙%離子、Ν Ν-二甲其Μ 丁 jHl XT ,一 f基-N-丁基-N-庚基銨陽離子、ν,ν-二%% ion, Ν Ν-dimethylpyrene Μ jHl XT , a f-based-N-butyl-N-heptyl ammonium cation, ν, ν-

T基N -戍基-N -己基瞒齡_2_ "NT >W T 已丞钕陽離子、Ν,Ν_二甲基_Ν•己基 基叙%離子、Ν Ν- ** 7其μ田# \τ 一 ,乙基-Ν_甲基—Ν·丙基銨陽離子、ν,ν_ 乙基Ν甲基_Ν_戊基録陽離子、ν具二乙基甲基 庚基知:知離子、7 «· XT co « 于N,N-一乙基_N_甲基_n_(2•甲氧基乙基)銨 陽離子、N,N-二乙基-N-丙基-N-戊基錢陽離子、N具二丙 基_N-甲基·N_乙基錄陽離子、n,n_二丙基_N_甲基暴戊基 錄陽離子、N,N_二丙基_N•丁基·Ν·己基銨陽離子、N,N二 丁基N甲基善戊基錢陽離子、ν,ν·二丁基甲基七_己 基錄陽離子、]Sf-甲其Μ 7 Α χτ ^ N f基-N-乙基_N_丙基_N_戊基銨陽離子、 三甲基疏陽離子、三乙基鎮陽離子、三丁基錄陽離子、三 己基鎮陽離子、二甲基癸基鎮陽離子、二乙基甲基錄陽離 子、-丁基乙基錄陽離子、四甲基鱗陽離子、四乙基鱗陽 離子、四丁基鱗陽離子、四戊基鱗陽離子、四己基鱗陽離 子、四庚基鱗陽離子、四辛基鱗陽離子、三甲基癸基鱗陽 離子、二乙基甲基鱗陽離子、三丁基乙基鱗陽離子等。 作為本發明所使用之有機鹽之具體例,例如,可自上述 陽離子成分與陰離子成分之組合中適當地選擇使用,可歹; 130902.doc -25- 200911951 舉:四氟硼酸1 - 丁基吡啶鑌、六氟鱗酸1 - 丁基吡啶鏘、四 款硼酸1 - 丁基-3-曱基<7比σ定鑌、三氟甲續酸1 - 丁基-3-甲基°比 啶鑌、雙(三氟甲磺醯基)醯亞胺卜丁基-3 -曱基吡啶鑌、雙 (五氟乙磺醯基)酿亞胺1_ 丁基_3_甲基吡啶鑌、四氟硼酸1-己基吡啶鏽、四氟硼酸2-甲基-1 -吡咯啉鑌、四氟硼酸1 -乙 基-2-苯基吲α朵鑌、四氟删酸丨,2_二甲基吲哚鏽、四氟删酸 1 -乙基咔嗤鏽、四氟硼酸1 _乙基_3 -曱基咪唑鑌、乙酸1 -乙 基-3-曱基咪咬鑷、三氟乙酸丨_乙基_3_曱基咪唑鏽、七氟 丁酸1-乙基-3-甲基咪唑鏽、三氟甲磺酸乙基_3_甲基咪唑 鏽、全敗丁磺酸1_乙基_3_甲基咪唑鏽、二氰胺丨_乙基_3_甲 基味唾鑌、雙(三氟曱磺醯基)醯亞胺卜乙基_3_甲基咪唑 鑌、雙(五氟乙磺醯基)醯亞胺丨_乙基_3_甲基咪唑鑌、丨_乙 基-3-甲基咪唑三(三氟甲磺醯基)曱基化物、四氟硼酸丨_丁 基-3-曱基咪唑鏽、六氟磷酸丨_ 丁基_3_甲基咪唑鑌、三氟 乙酸1-丁基-3-甲基咪唑鏽、七氟丁酸丨_ 丁基_3_曱基咪唑 錄、二氟甲磺酸1-丁基-3-曱基咪唑鑌、全氟丁磺酸丨_丁 基-3-甲基咪唑鑌、雙(三氟甲磺醯基)醯亞胺卜丁基_3_曱基 咪唑鏽、溴化丨_己基-3-曱基咪唑鏽、氯化1-己基_3_曱基咪 唑鏘、四氟硼酸己基_3_甲基咪唑鏽、六氟磷酸1-己基_3-曱基米唑鎬、三氟甲磺酸丨_己基_3_甲基咪唑鏽、四氟硼酸 1-辛基-3-甲基咪唑鑌、六氟磷酸丨_辛基_3_曱基咪唑鏽、四 氟硼酸1-己基·2,3·二甲基咪唑鏽、雙(三氟甲磺醯基)醯亞 胺1,2-二甲基_3_丙基咪唑鏽、四氟硼酸丨·曱基吡唑鑌、四 氟硼酸3_甲基吡唑鏽、雙(三氟曱磺醯基)醯亞胺四己基 130902.doc •26- 200911951 銨、四氟硼酸二烯丙基二甲基銨、三氟甲磺酸二烯丙基二 甲基銨、雙(三氟曱磺醯基)醯亞胺二烯丙基二曱基銨、雙 (五氟乙磺醯基)醯亞胺二烯丙基二甲基銨、四氟硼酸n,n_ 二乙基-N-曱基-N-(2-曱氧基乙基)銨、三氟甲磺酸N,小二 乙基-N-甲基-Ν·(2-曱氧基乙基)銨、雙(三氟甲磺醯基)醯亞 胺Ν,Ν-二乙基-Ν-甲基-Ν-(2-甲氧基乙基)銨、雙(五氟乙磺 醯基)醯亞胺Ν,Ν-二乙基-Ν-曱基·Ν-(2-甲氧基乙基)敍、:r 氟甲磺酸縮水甘油基三甲基銨、雙(三氟甲磺醯基)醯亞胺 水甘油基二甲基叙、雙(五氟乙確酿基)酸亞胺縮水甘油 基二曱基銨、(二齓曱石黃醯基)三氟乙醯胺1_ 丁基0比咬鑌、 (一氟甲&酿基)二乱乙酿胺1-丁基-3-曱基。比〇定鑌、(三說甲 石頁酿基)三氟乙醯胺1 -乙基-3-甲基咪唑鑌、(三氟甲績醯基) 二氟乙醯胺N,N-二乙基-N-甲基-N-(2-曱氧基乙基)|安、(三 氟甲磺醯基)三氟乙醯胺二烯丙基二甲基銨、(三氟曱續醯 基)三氟乙醯胺縮水甘油基三甲基銨、雙(三氟曱磺醯基)醯 亞胺N,N-二曱基-N-乙基-N-丙基銨、雙(三氟曱磺醯基)醯 亞胺N,N-二曱基-N-乙基-N-丁基銨、雙(三氟曱磺醯基)醯 亞胺N,N-二甲基乙基-N-戊基銨、雙(三氟甲磺醯基)醯 亞胺N,N-二曱基-N-乙基-N-己基銨、雙(三氟曱續醯基)醯 亞胺N,N-二曱基-N-乙基-N-庚基敍、雙(三氟甲續醯基)醯 亞胺N,N-二甲基-N-乙基-N-壬基銨、雙(三氟曱續醯基)贐 亞胺N,N-二曱基-N,N-二丙基銨、雙(三氟曱磺醯基)醯亞胺 N,N-二甲基-N-丙基-N- 丁基銨、雙(三氟甲確醢基)醯亞胺 N,N-二甲基-N-丙基-N-戊基銨、雙(三氟曱磺醯基)醯亞胺 130902.doc •27· 200911951 N,N-二曱基-N-丙基-N-己基銨、雙(三氟甲磺醯基)醯亞胺 N,N-二曱基-N-丙基-N-庚基銨、雙(三氟曱磺醯基)醯亞胺 N,N-二甲基-N-丁基-N-己基銨、雙(三氟曱磺醯基)醯亞胺 Ν,Ν-二曱基-N-丁基-N-庚基銨、雙(三氟曱磺醯基)醯亞胺 Ν,Ν-二甲基-Ν-戊基-Ν-己基銨、雙(三氟曱磺醯基)醯亞胺 Ν,Ν-二甲基-Ν,Ν-二己基銨、雙(三氟甲磺醯基)醯亞胺三曱T-based N-mercapto-N-hexyl age _2_ "NT > WT has been cation, Ν, Ν _ dimethyl Ν 己 己 叙 叙 离子 离子 离子 ** ** 7 # \τ一,ethyl-Ν-methyl-Ν·propylammonium cation, ν,ν_ethylΝmethyl_Ν_pentyl cation, ν with diethylmethylheptyl Know: ion, 7 «· XT co « N,N-monoethyl_N_methyl_n_(2•methoxyethyl)ammonium cation, N,N-diethyl-N-propyl-N-pentyl Money cation, N with dipropyl_N-methyl·N_ethyl cation, n, n-dipropyl _N-methyl pentyl cation, N, N-dipropyl _N • butyl Ν··························································· N-ethyl_N_propyl_N_pentyl ammonium cation, trimethyl cation, triethyl cation, tributyl cation, trihexyl cation, dimethyl sulfonium cation, diethyl a methyl group cation, a butyl cation, a tetramethyl cation, a tetraethyl cation, a tetrabutyl cation, Tetrapentyl cation, tetrahexyl cation, tetraheptyl cation, tetraoctyl cation, trimethyl decyl cation, diethyl methyl cation, tributyl ethyl cation. Specific examples of the organic salt used in the present invention can be appropriately selected from the combination of the above cationic component and anionic component, for example, 130902.doc -25- 200911951: 1 - butylpyridine tetrafluoroborate镔, 1,4-butylpyridinium hexafluorophosphate, 4-butyl-3-mercapto group of four boronic acids <7 ratio σ 镔 镔, trifluoromethyl acid 1-butyl-3-methyl pyridine Bismuth, bis(trifluoromethanesulfonyl) oximine, butyl-3-pyridinium pyridinium, bis(pentafluoroethanesulfonyl), iminoimide, 1-butyl-3-methylpyridinium, tetrafluoroboric acid -Hexylpyridine rust, 2-methyl-1-pyrroline tetrafluoroborate, 1-ethyl-2-phenylindole tetrahydroborate, tetrafluoro-indole, 2-dimethyl sulfonate , tetrafluoro-decanoic acid 1-ethyl cerium rust, tetrafluoroboric acid 1 _ ethyl _3 - decyl imidazolium, acetic acid 1-ethyl-3-mercapto amide, bismuth trifluoroacetate _ ethyl _ 3_mercaptoimidazole rust, heptafluorobutyric acid 1-ethyl-3-methylimidazole rust, trifluoromethanesulfonate ethyl _3_methylimidazole rust, total defeating butanesulfonic acid 1_ethyl _3_A Imidazolium rust, dicyandiamide oxime_ethyl_3_methyl saponin, bis(trifluorosulfonyl sulfhydryl) hydrazine Amine-ethyl 3-methylimidazolium, bis(pentafluoroethanesulfonyl) guanimine oxime_ethyl_3_methylimidazolium, 丨_ethyl-3-methylimidazolium tris(trifluoromethanesulfonate Sulfhydryl) hydrazide, cesium tetrafluoroborate _butyl-3-mercaptoimidazole rust, bismuth hexafluorophosphate _ butyl _3_methylimidazolium, 1-butyl-3-methylimidazole trifluoroacetate Rust, barium heptafluorobutyrate _ butyl_3_mercaptopazolium, 1-butyl-3-mercaptoimidazolium difluoromethanesulfonate, hydrazine-butyl-3-methylimidazolium perfluorobutanesulfonate Bismuth, bis(trifluoromethanesulfonyl) fluorene iodide butyl _3_mercaptoimidazole rust, ruthenium bromide hexyl-3-mercaptoimidazole rust, 1-hexyl _3_decyl imidazolium chloride, four Hexyl-3-methylimidazolium fluoroborate, 1-hexyl-3-carbamidazole hexafluorophosphate, 丨_hexyl_3_methylimidazolium trifluoromethanesulfonate, 1-octyltetrafluoroborate- 3-methylimidazolium, ruthenium hexafluorophosphate_3_mercaptoimidazole rust, 1-hexyltetrafluoroborate, 2,3·dimethylimidazolium rust, bis(trifluoromethanesulfonyl)pyrene Amine 1,2-dimethyl-3-imidazolium rust, bismuth tetrafluoroborate, fluorenylpyridinium tetrafluoroborate, bis-trifluorosulfonium sulfonate醯iamine tetrahexyl 130902.doc •26- 200911951 Ammonium, diallyldimethylammonium tetrafluoroborate, diallyldimethylammonium triflate, bis(trifluorosulfonyl)醯imino diallyldimethylammonium, bis(pentafluoroethanesulfonyl) quinone imide diallyldimethylammonium, tetrafluoroborate n,n_diethyl-N-fluorenyl-N- (2-decyloxyethyl)ammonium, trifluoromethanesulfonic acid N, small diethyl-N-methyl-indole (2-decyloxyethyl) ammonium, bis(trifluoromethanesulfonyl)醯iamine oxime, Ν-diethyl-hydrazine-methyl-Ν-(2-methoxyethyl)ammonium, bis(pentafluoroethanesulfonyl) ruthenium oxime, Ν-diethyl-hydrazine - mercapto·Ν-(2-methoxyethyl), :r fluoroglycidyl glycidyl trimethylammonium, bis(trifluoromethanesulfonyl) quinone imine hydroglyceryl dimethyl , bis(pentafluoroethylene), acid imine glycidyl diammonium ammonium, (di-cyanate xanthyl) trifluoroacetamide 1_butyl 0 than bite, (fluorofluoro & brewing) Di-branched amine 1-butyl-3-indenyl. 〇定〇, (three said stone tablets) trifluoroacetamide 1-ethyl-3-methylimidazolium, (trifluoromethane) difluoroacetamide N, N-diethyl -N-methyl-N-(2-decyloxyethyl)|An, (trifluoromethanesulfonyl) trifluoroacetamido diallyldimethylammonium, (trifluoromethane) Trifluoroacetamide glycidyl trimethylammonium, bis(trifluorosulfonylsulfonyl) quinone imine N,N-dimercapto-N-ethyl-N-propylammonium, bis(trifluoroanthracene) Sulfhydryl) quinone imine N,N-dimercapto-N-ethyl-N-butylammonium, bis(trifluorosulfonylsulfonyl) quinone imine N,N-dimethylethyl-N- Amyl ammonium, bis(trifluoromethanesulfonyl) quinone imine N,N-dimercapto-N-ethyl-N-hexylammonium, bis(trifluoromethyl fluorenyl) quinone imine N,N- Dimercapto-N-ethyl-N-heptyl, bis(trifluoromethylsulfonyl) quinone imine N,N-dimethyl-N-ethyl-N-decyl ammonium, bis(trifluoro醯 赆 赆) 赆 imine N, N-dimercapto-N, N-dipropylammonium, bis(trifluorosulfonylsulfonyl) quinone imine N, N-dimethyl-N-propyl- N-butylammonium, bis(trifluoromethyl) quinone imine N,N-dimethyl-N-propyl-N-amyl ammonium, Bis(trifluorosulfonylsulfonyl) quinone imine 130902.doc •27· 200911951 N,N-dimercapto-N-propyl-N-hexylammonium, bis(trifluoromethanesulfonyl) quinone imine N , N-dimercapto-N-propyl-N-heptyl ammonium, bis(trifluorosulfonylsulfonyl) quinone imine N,N-dimethyl-N-butyl-N-hexylammonium, bis ( Trifluorosulfonyl sulfhydryl hydrazide, hydrazine-dimercapto-N-butyl-N-heptyl ammonium, bis(trifluorosulfonyl sulfhydryl) quinone imine, hydrazine-dimethyl-hydrazine - amyl-indole-hexyl ammonium, bis(trifluorosulfonylsulfonyl) quinone imine, hydrazine-dimethyl-hydrazine, hydrazine-dihexylammonium, bis(trifluoromethanesulfonyl) quinone imine曱

基庚基銨、雙(三氟曱磺醯基)醯亞胺Ν,Ν-Ν-丙基銨、雙(三氟甲磺醯基)醯亞胺ν,Ν-二乙基-Ν-甲基-Ν-戊基銨、雙(三氟甲磺醯基)醯亞胺ν,Ν-二乙基-Ν-曱基-Ν-庚基錢、雙(三氟曱磺醯基)醯亞胺Ν,Ν·二乙基_Ν_丙基_ Ν-戊基銨、雙(三氟甲磺醯基)醯亞胺三乙基丙基銨、雙(三 敗曱磺醯基)醯亞胺三乙基戊基銨 '雙(三氟曱磺醯基)醯亞 胺三乙基庚基銨、雙(三氟曱磺醯基)醯亞胺Ν,Ν_二丙基_Ν_ 甲基-Ν-乙基銨、雙(三氟甲磺醯基)醯亞胺Ν,Ν_二丙基-Ν· 甲基Ν戊基知、雙(二氟甲續醢基)醯亞胺ν,ν_二丙基_ν_ 丁基-Ν-己基銨、雙(三氟曱磺醯基)醯亞胺ν,ν_二丙基_ Ν,Ν-二己基銨、雙(三氟甲磺醯基)醯亞胺ν,ν_二丁基—Ν—甲 基-Ν-戊基銨、雙(三氟甲磺醯基)醯亞胺ν,ν_二丁基甲 基-Ν-己基銨、雙(三氟曱磺醯基)醯亞胺三辛基曱基銨、雙 (三敗甲伽基)醯亞胺Ν-甲基·Ν-乙基-Ν-丙基_Ν•戊基2 等。該等可單獨使用丨種,或併用2種以上。 土 上述無機鹽及有機鹽可於如 π、如下轭圍内使用:相對於聚醚 醋醯胺及聚醯胺纖維之總重量 里里為0·001〜10重量%,較好的 疋0.01〜5重量。/〇。又,亦可於 不扣及本發明之效果之範圍 130902.doc -28- 200911951 内適當地併用無機鹽及有機鹽。 又,本發明之抗靜電劑例如可作為汽巴精化(Ciba Speciahy Chemicals)公司製造之 irgastat pa 及 IRGASTAT P22(商品名#而胃f性獲取。 本心月之同刀子型抗靜電劑之使用量為,相對於形成抗 靜電層之合成樹脂;+ 了細及抗静電劑之總重量為1〜50重量。/。,較 好的疋3〜4〇重量% ’更好的是5〜35重量%,尤其好的是 10〜30重量%。甚卜化古、 it円为子型抗靜電劑之使用量未滿1重 量%’則有時抗靜電性較差,另…,若上述高分子型 抗靜電劑之使用I翻讲ς Λ i θ 重量%,則有時薄膜之外觀會惡 化。 曰心 上述合成樹脂與抗靜電劑之混合方法並無特別限定,例 如可列舉如下方、 .用滾桶混合機、帶_拌機、亨 〜㈣將合成樹脂與抗靜電劑乾摻混合;2)將 树知及抗靜電劑乾換接 顆粒;3)預先製作ip 擠出機進行㈣混合並製成 混人機 °樹脂與抗靜電劑之母膠,利用上述 '吧。機將该母膠、合成 、、 摻混合等。 、θ、以及視需要將其他添加劑乾 抗靜電層之厚度通常為1〜100 μΐΏ,較好的是2 80 更好的是⑽叫,進而更好/a55t的疋2〜80μη1’ 5〜30μηι。 更好的疋5〜5〇 μπι,尤其好的是 電層再二明…之範圍内,於上述抗靜 收劑等薄膜Α材通:所心潤滑劑、抗結塊劑、紫外線吸 、基材通常所使用之各種添加劑、填充劑。 130902.doc -29. 200911951 上述基材層、抗靜電層之製薄膜方法並無特別限定,可 使用擠壓法、膨脹法、管式法等製膜方法。任一方法均可 藉由如下方式而製膜··自可進行複合擠麼之模具將樹脂於 積層狀態下擠壓而製膜;或將抗靜電層積層於基材層上; 或使用接著劑或接著層貼合基材層與抗靜電層。再者,基 材層亦可製成2層以上之多層構成。本發明中,為表現出 透明性’較好的是利用複合擠壓法之製膜。 利用複合擠壓法時,可使形成基材層之樹脂之溫度為例 士 Μ 280 C ’使形成抗靜電層之樹脂之溫度為例如 5 230 C ’使模具之溫度為例如i 8〇〜28〇。。,於此條件下 成形。 ^壓法中’例如可將各層積層之後進行加熱壓接,亦可 預先將各層加熱之後進行壓接。 接著劑之方法,例如,可使用乙^醋酸乙稀 U物、甲基丙烯酸甲醋聚合物彈性體Hexoheptyl ammonium, bis(trifluorosulfonylsulfonyl) quinone imine, Ν-Ν-propyl ammonium, bis(trifluoromethanesulfonyl) quinone imine ν, Ν-diethyl-fluorene-a Ν-Ν-amyl ammonium, bis(trifluoromethanesulfonyl) quinone imine ν, Ν-diethyl-fluorenyl-fluorenyl-fluorenyl-heptyl, bis(trifluorosulfonyl) Amine oxime, Ν·diethyl Ν 丙基 propyl Ν 戊-amyl ammonium, bis(trifluoromethanesulfonyl) quinone imine triethyl propyl ammonium, bis (tris-sulfonyl sulfonyl) fluorene Amine triethyl amyl ammonium 'bis(trifluorosulfonylsulfonyl) quinone imine triethylheptyl ammonium, bis(trifluorosulfonylsulfonyl) quinone imine, Ν_dipropyl Ν Ν methyl - Ν-ethylammonium, bis(trifluoromethanesulfonyl) ruthenium oxime, Ν-dipropyl-fluorene, methyl hydrazino, bis(difluoromethyl) quinone imine ν, __Dipropyl _ν_ butyl-hydrazino-hexylammonium, bis(trifluorosulfonylsulfonyl) quinone imine ν, ν_dipropyl hydrazine, hydrazine-dihexylammonium, bis(trifluoromethanesulfonate)醯 醯 imine ν, ν _ dibutyl hydrazine - methyl - hydrazine - amyl ammonium, bis (trifluoromethanesulfonyl) quinone imine ν, ν - dibutyl methyl - Ν - hexyl ammonium, double (trifluorosulfonyl) imine Yue ammonium group, bis (three lost Jiaji A) (PEI) · Ν- Ν- methyl ethyl propyl -Ν- _Ν • 2-pentyl and the like. These may be used alone or in combination of two or more. The above inorganic salt and organic salt may be used in a yoke such as π: the total weight of the polyether acetamide and the polyamide fiber is 0. 001 to 10% by weight, preferably 疋 0.01~ 5 weight. /〇. Further, inorganic salts and organic salts may be suitably used in combination within the range of 130902.doc -28- 200911951 which does not detract from the effects of the present invention. Further, the antistatic agent of the present invention can be used, for example, as an irgastat pa and an IRGASTAT P22 manufactured by Ciba Speciahy Chemicals Co., Ltd. (trade name #和胃性性性. Use of the same knife-type antistatic agent of the heart of the month) The amount is, relative to the synthetic resin forming the antistatic layer; + the total weight of the fine and antistatic agent is 1 to 50% by weight. /, preferably 疋 3 to 4 〇% by weight 'better 5~ 35% by weight, particularly preferably 10 to 30% by weight. Even if it is less than 1% by weight of the anti-static agent, it is sometimes inferior in antistatic property, and... When the use of the molecular antistatic agent is described above, the appearance of the film may be deteriorated. The mixing method of the synthetic resin and the antistatic agent is not particularly limited, and examples thereof include the following. The synthetic resin and the antistatic agent are dry blended with a drum mixer, a mixer, and a (4); 2) the tree and the antistatic agent are dry-exchanged with the particles; 3) the ip extruder is pre-made for (4) mixing. And make the masterbatch of resin and antistatic agent, use the above. The masterbatch, synthesis, blending, and the like. , θ, and other additives as needed. The thickness of the antistatic layer is usually from 1 to 100 μΐΏ, preferably from 2 80, more preferably (10), and even more preferably / a55t of 疋2 to 80 μη1' 5 to 30 μη. More preferably 疋5~5〇μπι, especially in the range of electric layer and second-order, in the above-mentioned anti-static agent, such as film antimony material: heart lubricant, anti-caking agent, ultraviolet absorption, base Various additives and fillers commonly used in materials. 130902.doc -29. 200911951 The film forming method of the base material layer and the antistatic layer is not particularly limited, and a film forming method such as an extrusion method, an expansion method, or a tubular method can be used. Any of the methods can be formed by: forming a film by pressing a resin in a laminated state from a mold which can be subjected to a composite extrusion; or laminating an antistatic layer on a substrate layer; or using an adhesive Or the layer is adhered to the substrate layer and the antistatic layer. Further, the base material layer may be formed in a multilayer of two or more layers. In the present invention, in order to exhibit transparency, it is preferred to form a film by a coextrusion method. When the coextrusion method is used, the temperature of the resin forming the substrate layer can be, for example, 280 C 'the temperature of the resin forming the antistatic layer is, for example, 5 230 C ', so that the temperature of the mold is, for example, i 8 〇 28 Hey. . Formed under these conditions. In the "pressing method", for example, each layer may be laminated by heating and pressure bonding, or each layer may be heated in advance and then pressure-bonded. As a method of the subsequent agent, for example, ethyl acetate, methyl methacrylate polymer elastomer can be used.

L 二為本發明之黏著劑層所使用之黏著劑,只要二 板表面等留有殘膠或污染該表面,且具有能以 為黏㈣之方式黏著之特性,則可無特別限定地使用。作 膠糸,座 内烯酸系、天然橡膠系、合成橡 々糸、乙烯·酉曰酸乙烯酯共聚物 乙烯-異戍二稀嵌段共聚物、苯乙;^丙稀酸醋系、苯 系、聚胺基甲酸醋系、聚-烯肷段共聚物 示寺之各種黏著劑。 該等黏著劑中,自容易獲 m μ Λ ώ 权同、且表現出盥光 學月材之良好密著特性之勒 見出,、先 田号慮,可較好地使 130902.doc -30· 200911951 用丙烯酸系黏著劑。 丙烯酸黏著劑使用(曱基)丙烯酸系聚合物作為基質聚合 物’該(曱基)丙烯酸系聚合物含有50〜100重量%之具有碳 數為1〜14之烷基的(曱基)丙烯酸酯作為單體成分。 作為本發明所使用之(曱基)丙烯酸系聚合物,只要為具 有與上述者相應之黏著性的(曱基)丙烯酸系聚合物,則並 無特別限定。 再者’本發明之(曱基)丙烯酸系聚合物係指丙烯酸系聚 δ物及/或甲基丙烯酸系聚合物。又’(甲基)丙烯酸烧基酯 係指丙烯酸烷基酯及/或曱基丙烯酸烷基酯,(甲基)丙烯酸 酿係指丙烯酸酯及/或曱基丙烯酸酯。 作為具有碳數為1〜14之烷基之(曱基)丙烯酸酯的具體 例’例如可列舉:(甲基)丙烯酸甲酯、(曱基)丙烯酸乙 酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸第二丁酯、(甲基) 丙婦酸第二丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸己 酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸正辛酯、(甲 基)丙烯酸異辛酯、(甲基)丙烯酸正壬酯、(甲基)丙稀酸異 壬酯、(甲基)丙烯酸正癸酯、(曱基)丙烯酸異癸酯、(甲基) 丙烯酸正十二烷基酯、(甲基)丙烯酸正十三烷基酯、(甲 基)丙烯酸正十四燒基酯等。 其中,用於本發明之再剝離型黏著片材之情形時,可較 好地使用(甲基)丙烯酸己酯、(曱基)丙烯酸2_乙基己酯、 (甲基)丙烯fee正辛酯、(甲基)丙烯酸異辛酯、(甲基)丙稀酸 正壬酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸正癸酯、(甲 130902.doc •31 - 200911951 基)丙烯酸異癸s旨、(甲基)丙烯酸正十二烷基醋、(甲基)内 稀酸正十三院基醋、(甲基)丙婦酸正十四燒基g旨等具有碳 數為6〜14之烷基的(甲基)丙烯酸醋。藉由使用由以碳數為 6〜14之烷基為主成分之(甲基)丙烯酸酯所構成之(甲基)丙 烯酸系聚合物,容易將對被黏附體之黏著力控制為較低, 因而再剝離性優異。L 2 is an adhesive used in the adhesive layer of the present invention, and may be used without particular limitation as long as the surface of the second plate or the like remains residual or contaminates the surface, and has a property of being adhered to the adhesive (four). Used as a plastic enamel, a olefinic acid system, a natural rubber system, a synthetic rubber lanthanum, an ethylene vinyl phthalate copolymer, an ethylene-isoindole dilute block copolymer, a phenylethyl group, an acrylic acid vinegar system, and a benzene group. The system, the polyurethane vinegar-based, and the poly-olefin-based copolymer show various adhesives of the temple. Among these adhesives, it is easy to obtain the m μ Λ 权 right, and it shows the good adhesion characteristics of the optical moon, and the first field can be used to make 130902.doc -30· 200911951 Acrylic adhesive. The acrylic adhesive uses a (fluorenyl) acrylic polymer as a matrix polymer. The (fluorenyl) acrylic polymer contains 50 to 100% by weight of a (fluorenyl) acrylate having an alkyl group having 1 to 14 carbon atoms. As a monomer component. The (fluorenyl) acrylic polymer to be used in the present invention is not particularly limited as long as it is a (fluorenyl) acrylic polymer having adhesion to the above. Further, the (fluorenyl) acrylic polymer of the present invention means an acrylic polyvalent content and/or a methacrylic polymer. Further, '(meth)acrylic acid alkyl ester means an alkyl acrylate and/or an alkyl methacrylate, and (meth) acrylic styrene means an acrylate and/or a methacrylate. Specific examples of the (fluorenyl) acrylate having an alkyl group having 1 to 14 carbon atoms include, for example, methyl (meth)acrylate, ethyl (meth)acrylate, and n-butyl (meth)acrylate. , (butyl) (meth) acrylate, second butyl (meth) acrylate, isobutyl (meth) acrylate, hexyl (meth) acrylate, 2-ethyl methacrylate Ester, n-octyl (meth)acrylate, isooctyl (meth)acrylate, n-decyl (meth)acrylate, isodecyl (meth)acrylate, n-decyl (meth)acrylate, ( Mercapto isocyanuric acid ester, n-dodecyl (meth)acrylate, n-tridecyl (meth)acrylate, n-tetradecyl (meth)acrylate, and the like. Among them, in the case of the re-peelable adhesive sheet of the present invention, hexyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, (meth) propylene fee octyl can be preferably used. Ester, isooctyl (meth)acrylate, n-decyl (meth)acrylate, isodecyl (meth)acrylate, n-decyl (meth)acrylate, (A 130902.doc •31 - 200911951 Acrylic isophthalic acid, (meth)acrylic acid n-dodecyl vinegar, (methyl) dilute acid, thirteen yards vinegar, (methyl) propyl benzoic acid, tetradecyl ketone, etc. A (meth)acrylic acid vinegar having a number of 6 to 14 alkyl groups. By using a (meth)acrylic polymer composed of a (meth) acrylate having an alkyl group having a carbon number of 6 to 14 as a main component, it is easy to control the adhesion to the adherend to be low. Therefore, the removability is excellent.

U 上述具有碳數為1〜丨4之烷基之(甲基)丙烯酸酯可單獨使 用’亦可混合使用2種以上,較好的是在(甲基)丙烯酸系聚 1之所有單體成分中為5G〜⑽重量%,更好的是6〇〜995 重量%,進而更好的是70〜99重量%。 ,’本發明中,除上述具有碳數為卜14之院基之(甲基) 、烯駄§曰之外,可使用可與交聯劑反應的含官能基之單體 或用以調整(甲基)丙稀酸系聚合物之玻璃轉移點或剝離性 之其他聚合性單體成分。 :為上述含官能基之單體’例如,可適當地使用含羧基 之早體j含酸if基之單體、含經基之單體、含胺基之單 體。:含環氧基之單體、含異氰酸酯基之單體、含氮丙啶基 單體等具有作為父聯化基點峡作用的官能基的成分。 作為含竣基之單體,例如可列舉:(甲基)丙烯酸、(甲 基)丙稀酸繞基乙酿、(甲基)丙稀酸叛基戍酿、伊康酸、順 丁稀二酸、反丁烯二酸、丁稀酸、異丁烯酸等。 :為含酸軒基之單體,例如可列舉:順丁稀二酸針、伊 ^酉文酐、上述含有羧基之單體之酸酐體等。 作為含經基之單體,例如可列舉·(甲基)丙稀酸2_經乙 130902.doc 32- 200911951 醋、(甲基)丙烯酸2-羥丙基、(甲基)丙烯酸4_羥丁酯、(甲 基)丙烯酸6-羥己酯、(甲基)丙烯酸8_羥辛酯、(甲基)丙婦 酸10-羥癸酯、(曱基)丙烯酸12_羥十二烷基酯、甲基丙烯 酸(4-羥曱基環己基)醋、N_羥甲基(甲基)丙烯醯胺、乙烯 醇、烯丙醇、2-羥基乙基乙烯醚、4_羥基丁基乙烯醚、二 乙二醇單乙烯醚等。 作為含胺基之單體,例如可列舉:(曱基)丙烯酸胺乙 酯、(甲基)丙烯酸N,N-二甲胺乙酯、(甲基)丙烯酸队冰二 曱胺丙酯等。 作為含環氧基之單體,例如可列舉:(甲基)丙烯酸縮水 甘油酯、(甲基)丙烯酸甲基縮水甘油酯、烯丙基縮水甘油 醚等。 作為含異氰酸酯基之單體,例如可列舉:2_甲基丙烯醯 氧基乙基異氰酸醋等。 上述含官能基之(f基)丙烯酸酯可單獨使用,亦可混合 使用2種以上,整體含量較好的是在(甲基)丙烯酸系聚合物 之所有單體成分中為〇〜15重量,更好的是〇卜15重量 /〇,進而更好的是0.2〜12重量。/。,尤其好的是〇·3〜1〇重量 /〇。若上述含官能基之(甲基)丙稀酸酯之含量少於〇1重量 %,則存在如下傾向:利用交聯劑之交聯形成不充分,黏 著劑組成物之凝聚力變小,而導致留有殘膠。另一方面, 右上述含官能基之(甲基)丙烯酸酯之含量超過丨5重量%, 則存在如下傾向:黏著劑組成物之凝聚力過大而流動性下 降,被黏附體之濡濕不充分,導致產生剝離。 130902.doc •33· 200911951 可於不知害本發明效果之範圍内,使用用以調整 (甲土)丙稀i系聚合物之玻璃轉移點或剝離性之聚合性單 體等,作為其他聚合性單體成分。U (meth) acrylate having an alkyl group having a carbon number of 1 to 4 may be used singly or in combination of two or more kinds, preferably all monomer components of (meth)acrylic poly 1 . The amount is 5 G to (10)% by weight, more preferably 6 to 995 % by weight, still more preferably 70 to 99% by weight. , 'In the present invention, in addition to the above (meth) group having a carbon number of 14 and a fluorene group, a functional group-containing monomer reactive with a crosslinking agent may be used or used for adjustment ( The other polymerizable monomer component of the glass transition point or the releasability of the methyl)acrylic acid polymer. The monomer containing a functional group is, for example, a carboxyl group-containing precursor j-containing acid-containing monomer, a radical-containing monomer, and an amine group-containing monomer. A component having an epoxy group-containing monomer, an isocyanate group-containing monomer, an aziridine-containing monomer or the like having a functional group acting as a parental branching point gorge. Examples of the mercapto group-containing monomer include (meth)acrylic acid, (meth)acrylic acid, ketone, (meth)acrylic acid, ruthenium, and itaconic acid. Acid, fumaric acid, butyric acid, methacrylic acid, and the like. The monomer containing an acid group may, for example, be a butyric acid diacid needle, an oxime anhydride, or an acid anhydride body of the above carboxyl group-containing monomer. Examples of the monomer containing a radical include, for example, (meth)acrylic acid 2_B, 130902.doc 32-200911951 vinegar, 2-hydroxypropyl (meth)acrylate, 4-hydroxyl (meth)acrylate Butyl ester, 6-hydroxyhexyl (meth)acrylate, 8-hydroxyoctyl (meth)acrylate, 10-hydroxydecyl (meth)propionate, 12-hydroxydodecyl (meth)acrylate Ester, (4-hydroxydecylcyclohexyl) methacrylate, N-hydroxymethyl (meth) acrylamide, vinyl alcohol, allyl alcohol, 2-hydroxyethyl vinyl ether, 4-hydroxybutyl vinyl Ether, diethylene glycol monovinyl ether, and the like. Examples of the amino group-containing monomer include (mercapto)ethyl acrylate, N,N-dimethylaminoethyl (meth)acrylate, and (meth)acrylic acid glacial propylamine. Examples of the epoxy group-containing monomer include glycidyl (meth)acrylate, methyl glycidyl (meth)acrylate, and allyl glycidyl ether. Examples of the isocyanate group-containing monomer include 2-methylpropenyloxyethyl isocyanate and the like. The functional group-containing (f-based) acrylate may be used singly or in combination of two or more kinds, and the total content is preferably from 〇 15 to 15 parts by weight of all the monomer components of the (meth)acrylic polymer. More preferably, it is 15 weight/twist, and more preferably 0.2 to 12 weight. /. Especially good is 〇·3~1〇 weight / 〇. When the content of the functional group-containing (meth) acrylate is less than 〇1% by weight, there is a tendency that the crosslinking by the crosslinking agent is insufficient, and the cohesive force of the adhesive composition becomes small, resulting in Residual glue is left. On the other hand, when the content of the functional group-containing (meth) acrylate on the right side exceeds 5% by weight, there is a tendency that the cohesive force of the adhesive composition is too large and the fluidity is lowered, and the wetness of the adherend is insufficient, resulting in insufficient wetness. Peeling occurs. 130902.doc •33· 200911951 It is possible to use a polymerizable monomer for adjusting the glass transition point or the releasability of the (soil) propylene i-based polymer as an additional polymerizable property without departing from the effects of the present invention. Monomer component.

作為其他聚合性單體成分,例如可適當使时續酸基之 單體、含魏基之單體、含氰基之單體、乙_旨類、芳香 族乙烯基化合物等提高凝聚力、耐熱性之成分,或含醯胺 基之早體、含醯亞胺基之單體、N_丙浠醯基嗎琳、乙烯縫 類等提高接著力或具有作為交聯化基點而起作料官能基 作為含収基之單體,例如可列舉1乙料酸、婦丙 基續酸Ή甲基)丙稀醯胺_2_曱基丙石黃酸、(甲基)丙稀酿 胺丙續酸、(甲基)丙嫌g参石生& )丙烯酉文只丙酯、(甲基)丙烯醯氧基萘磺 酸、乙烯基磺酸鈉等。 作為含魏基之單體,例如可列舉㈣基乙基丙稀酿基 她。作為含氰基之單體,例如可列舉:丙烯 丙烯腈。 土 作為乙烯酯類,例如可列舉:醋酸乙烯酯、丙酸 酯、十二烷酸乙烯酯等。 作為芳香族乙稀基化合物,例如可列舉:苯^、氣苯 乙稀、氣曱基苯乙稀、α_甲美笑 〒基本乙烯、其他取代苯乙烯 4 〇 作為含醯胺基之單體,例如可 j到舉.丙稀醯胺、曱基丙 烯醯胺、二乙基丙烯醯胺、Ν_ 土 G琊基°比咯烷酮' Ν,Ν-二甲 基丙烯醯胺、Ν,Ν-二曱基曱基而榼破的 、 丞丙烯醯胺、Ν,Ν-二乙基丙烯 130902.doc -34- 200911951 酿胺、N,N-二γ其田甘 一 丞τ基丙烯醯胺、Ν,Ν,-亞曱基雙丙烯醯 胺、Ν,Ν-二甲脸丢苴工 杈丙基丙烯醯胺、N,N-二曱胺丙基曱基丙烯 醯胺、二丙_丙烯醯胺等。 —作為3醯亞胺基之單體,例如可列舉:冑己基馬來醯亞 ”丙基馬來醯亞胺、N_環己基馬來醯亞胺、伊康醯亞 胺等。 作為乙烯醚類,例如可列舉:甲基乙烯醚、乙基乙烯 醚、異丁基乙烯醚等。 上述其他聚合性單體成分可單獨使用,亦可混合使用2 種以上’整體含量較好的是在(甲基)丙烯酸系聚合物之所 有單體成分中為〇〜35重量%,更好的是〇〜3〇重量%,尤其 好的疋0〜25重量。可藉由使用上述其他聚合性單體成 分,而適當調節良好之接著性。 又’作為基質聚合物,上述(曱基)丙烯酸系聚合物之玻 璃轉移溫度(Tg)通常較好的是_1〇(rc〜0〇c,更好的是_8〇(3(:〜 -1 〇 C °若玻璃轉移溫度高於,則有時難以獲得充分之 黏著力。再者’可藉由適當變更所使用之單體成分、其等 之組成比’而將(曱基)丙烯酸系聚合物之玻璃轉移溫度 (Tg)調整為上述範圍内。又,(甲基)丙烯酸系聚合物可為 隨機共聚物、嵌段共聚物、接枝共聚物等之任一種。 上述丙烯酸聚合物可利用溶液聚合、乳化聚合、塊狀聚 合、懸浮聚合等通常用作丙烯酸聚合物之合成方法的聚合 方法而獲得。 本發明中’自較容易地獲得目標黏著劑組成物之理由考 130902.doc -35- 200911951 慮,可較好地使用溶液聚合、乳化聚合。 對於溶液聚合,可使Μ前作為黏著劑之溶液聚合方法 =的方法。例如,首先將上述單體、共聚單體混合, 並添加聚合起始劑及溶劑,進行溶液聚合。 :為本發明所使用之聚合起始劑,可制偶氮系化合物 或過氣化物等。 作為偶氮:系化合物之具體例’可列舉:2,2、偶氮雙異丁 猜 2,2-偶亂雙里戍赔、2 2’槪备德/ 、 IX m 2,2 -偶氮雙(4-甲氧基·2,4_二甲基 戊腈)、2,2,-偶氮雙(2,4_二甲基戊 ,Further, as another polymerizable monomer component, for example, a monomer having a sulfonic acid group, a monomer containing a thio group, a monomer having a cyano group, a B-type, an aromatic vinyl compound, or the like can be suitably used to improve cohesive force and heat resistance. a component, or an anthraquinone-containing precursor, a quinone-containing monomer, an N-propyl hydrazinyl group, a vinyl sulcate, or the like, which has an adhesion or a functional group as a crosslinking crosslinking point. Examples of the monomer having a accepting group include, for example, 1 ethyl acid, propyl propyl hydrazine methyl propyl amide _2 曱 曱 丙 propyl propyl phthalate, (meth) acrylamide, and (Methyl)-propyl glycerin ginseng & propylene propyl methacrylate, (meth) propylene phthaloxy naphthalene sulfonic acid, sodium vinyl sulfonate, and the like. As the monomer containing a Wei group, for example, a (tetra)ethyl propylene base can be cited. Examples of the cyano group-containing monomer include propylene acrylonitrile. Soil Examples of the vinyl esters include vinyl acetate, propionate, and vinyl dodecanoate. Examples of the aromatic vinyl compound include benzene, styrene, acetophenone, α-methylpyrazine, and other substituted styrenes as oxime-containing monomers. , for example, can be exemplified by acrylamide, mercapto acrylamide, diethyl acrylamide, Ν 土 土 土 土 土 二 二 二 二 二 二 二 二 二 二 二 二 二- 丞 曱 的 、 丞 丞 丞 、 、 、 902 902 902 902 902 902 902 902 902 902 902 902 902 902 902 902 902 902 902 902 902 902 902 902 902 902 902 902 902 902 902 902 902 902 902 902 902 902 902 902 902 902 902 902 902 902 Ν,--indenyl bis acrylamide, hydrazine, hydrazine - dimethylform oxime propyl propyl amide, N, N-diaminopropyl propyl decyl acrylamide, dipropyl propylene amide, etc. . — Examples of the monomer of the 3 fluorinium imine group include hexamethylene mercapine, propyl maleimide, N-cyclohexylmaleimide, Ikonide, and the like. Examples of the type include methyl vinyl ether, ethyl vinyl ether, and isobutyl vinyl ether. The other polymerizable monomer components may be used singly or in combination of two or more kinds. In all the monomer components of the methyl)acrylic polymer, 〇3 to 35 wt%, more preferably 〇3 to 3 wt%, particularly preferably 0 to 25 wt%, can be used by using the other polymerizable monomers described above. Ingredients, and properly adjust the good adhesion. Also as the matrix polymer, the glass transition temperature (Tg) of the above (mercapto) acrylic polymer is usually preferably _1 〇 (rc 〜 0 〇 c, better) It is _8 〇 (3 (: ~ -1 〇 C °) If the glass transition temperature is higher, it may be difficult to obtain sufficient adhesion. In addition, 'the monomer component used can be appropriately changed, etc. The composition ratio 'and the glass transition temperature (Tg) of the (fluorenyl) acrylic polymer is adjusted to Further, the (meth)acrylic polymer may be any of a random copolymer, a block copolymer, a graft copolymer, etc. The above acrylic polymer may be solution polymerization, emulsion polymerization, bulk polymerization, or the like. Suspension polymerization or the like is generally obtained as a polymerization method for a synthetic method of an acrylic polymer. In the present invention, the reason for obtaining the target adhesive composition more easily is 130902.doc-35-200911951, and the solution can be preferably used. Polymerization or emulsion polymerization. For solution polymerization, a method of solution polymerization as an adhesive can be used. For example, first, the above monomer and comonomer are mixed, and a polymerization initiator and a solvent are added to carry out solution polymerization. The polymerization initiator used in the present invention may be an azo compound or a pervaporate. Specific examples of the azo: compound are as follows: 2, 2, azobisisodin 2, 2 - 偶乱双里戍, 2 2'槪德德, IX m 2,2 - azobis(4-methoxy-2,4-dimethylvaleronitrile), 2,2,-azo Bis(2,4-dimethyl pentane,

Tot、 J 2,2-偶虱雙(2-甲基 丁腈)、1,1,·偶氮雙(環己烷小甲腈 甲m 2,2·偶氮雙(2,4,4-三 甲基戍院)、二甲基_2,2,偶氮雙(2_甲基丙酸酉旨)等。 作為過氧化物之具體例,可列舉: 氧化. 、氧化本甲醯、氫過 乳化弟二丁基、氫過氧化二-第三 =丁 # 、A e 丁基過氣化苯f酸第 —丁酗、過氧化二異丙苯、1,1_雙(第三丁 三甲基環己炫、U·雙(第三丁基過氧化)環H^·。3,3,5- Ο 用=之有機溶劑。例如可列二醋酸乙 ^ ^ S曰等S曰類,甲苯、苯等芳香族烴類,正己 凡、正庚烷專脂肪族烴類,環己烷、 ^ ii . ® ^ ^ 甲基娘己烷等脂環式 工類f基乙基酮、甲基異丁基,等 用1種或組合使請以上。 _專。溶劑亦可使 上述聚合起始劑可單獨使用,亦 整俨人曰4 M j j混合使用2種以上, 二體丫相對於100重量份之單體通常為0 001〜04重量 η較好的是使用0,002〜0.2重量份。 對於乳化聚合,例如,首先將上 1早體、共聚單體混 130902.doc -36 - 200911951 合,並於其中調配乳化劑及水,然後乳化而製備乳液。此 時之單體可為所使用之所有單體的全部量,或亦可調配總 量之一部分而於聚合過程中滴加剩餘單體。繼而,於該乳 液中添加聚合起始劑及視裳盈、夭& . w祝*要添加水,進行乳化聚合(乳 液聚合)。 本發明所使用之乳化劑、聚合起始劑等並無特別限定, 可適當地選擇使用。 作為本發明所使用之乳化劑,可列舉:烷基硫酸酯類、 烧基苯石黃酸鹽類、烧基石黃基琥拍酸鹽類、聚氧乙稀烧基硫 酸鹽類、聚氧乙烯烧基麟酸醋類等陰離子系乳化劑;聚氧 乙烯烷基醚類、聚氧乙烯烷基苯基醚類、聚氧乙烯-聚乳 丙稀嵌段聚合物類;山梨糖醇軒脂肪酸酿類、聚氧乙稀月旨 肪酸醋類等非離子純化劑等。該等乳化劑可單獨使用, 亦可混合使用2種以上。 Ο 進而’作為反應性乳化劑’可使用導入有丙烯基、婦丙 土、(甲基)丙烯醯基、稀丙基_基等自由基聚合性官能基 應性官能基)之乳化劑。具體而言,例如,可列舉曰本 專利特開平4·5細號公報所記载㈣,可列舉:Α料⑽ 收1〇、HS-2〇、KH-10、BC-〇5、BC_1〇、BC_2〇(第一工業 製f公司製造)、Adeka Reas〇ap SE__(旭電化工業公司 製造)、Latemul PD-104(花王公司製造)等。 乳化劑之使用量自聚合穩定性或機械穩定性考慮,較好 的-相對於100重量份之單體為Ο],重量份,更 〇·3〜5重量份。 130902.doc -37· 200911951 再者,本發明中所使用之水可僅於製備乳液時調配,亦 或可於製備乳液之後進一步調配,可根據下述聚合方法而 適當選擇。又,水之調配量並無特別限定,以如下方式調 整:使乳液聚合(乳化聚合)後之(甲基)丙賴系聚合物之 固形分達到30〜75重量%,較好的是35〜7〇重量%。 作為本發明所使用之乳化聚合用聚合起始劑,例如可列 舉:2,2,_偶氮雙異丁腈、2,2,_偶氮雙(2-腓基丙貌)二氫氣 化物、π-偶氮雙[2♦甲基咪哇琳_2•基)丙貌]二氮氣 化物、2,2,-偶氮雙(2-甲基丙脒)二硫酸鹽、2,2,_偶氣雙 (邮’_二亞甲基丁基月米)、2,2,_偶氮雙[N-(2-趣基乙基)_2-甲 基丙脾]水合物等偶氮系起始劑;過硫酸卸、過硫酸銨等 =鹽’過氧化二碳酸二(2_乙基己基)醋、過氧化二碳 弟三丁基環己基)醋、過氧化二碳酸二·第二丁醋、 過氧化新癸酸第三丁_、過氧 C'- 特戊酸第三丁醋、過氧化二月桂過氧化 1,1,3,3-四甲基丁基過氧化·2_乙 正辛醯、 基苯甲醢基)、過氧化…二氧化二(4_甲 ’ —U二己基過氧化)環己燒、氣過氧化第三丁基 氧化虱4過氧化物系起始劑;過錢_ 合、過氧化物與抗壞血酸納之::…讀之、組 加以組合的氧化還原系起始劑等,^過氧化物與還原劑 上述聚合起始劑可單獨二:不限定於其等。 總含量相對於_重量份之單體合使用2種以上, 較好的是使用G.002〜G.()5重量份。*為G.G(H〜〜1重量份, 130902.doc -38. 200911951 合:1合(乳液聚合)之方法並無特別限定,可自-併聚 σ 併添加法)、連續滴入法(單 Λ 加法)、將盆入, 1早體滴加法、皁體乳液滴 )將其4組合之聚合法等中適當選擇。 一併聚合法甲,例如,於反鹿 乳化劑、及水i"°。添加單體混合物、 後進一牛^ 丁授掉混合’藉此乳化而製備乳液,然 水,進二、反應容器中加入聚合起始劑及視需要加入 水,進订乳化聚合(乳液聚合)。 ::連續滴加法中,例如,首先加入單體混合 劑及水並進行授拌混合,藉子化 ^ ^ , 叩表備,商加液,並且向 反應令為中添加聚合起始劑及水,繼 應容器内,進行乳化聚合(乳液聚合)。/⑺加至反 緩:為乳液聚合後之添加劑,例如可適當使用。H值 衝幻、中和劑、發泡抑制劑、穩定劑等。 二tr中,聚合時亦可使用鏈轉移劑。藉由使用該 專鍵轉移劑,可調整(甲基)丙稀酸系聚合物之分子量等。Tot, J 2,2- even bis (2-methylbutyronitrile), 1,1, azobis (cyclohexane small carbonitrile, m 2,2 azobis (2,4,4- Trimethyl sulfonate), dimethyl-2,2, azobis(2-methylpropionate), etc. Specific examples of the peroxide include: oxidation, oxidation of methyl formamidine, hydrogen Over-emulsified dibutyl, hydrogen peroxide di-third = butyl #, A e butyl pervaporated benzene f acid first - butyl hydrazine, dicumyl peroxide, 1, 1 _ double (third ternary Methylcyclohexanone, U·bis(t-butylperoxy) ring H^·.3,3,5- 有机 Organic solvent with =. For example, S 曰 such as diacetate Aromatic hydrocarbons such as toluene and benzene, tetrahydrogen, n-heptane-specific aliphatic hydrocarbons, cyclohexane, ^ ii. ® ^ ^ methyl hexane, alicyclic work, f-ethyl ketone, methyl Isobutyl, etc. can be used in one or a combination of the above. _Special. Solvent can also be used to make the above polymerization initiators can be used alone, and more than two kinds of 曰 4 M jj mixed, two 丫 relative to 100 The parts by weight of the monomers are usually from 0 001 to 04 by weight η, preferably from 0,002 to 0.2 parts by weight. For example, first, the first and the comonomers are mixed 130902.doc -36 - 200911951, and the emulsifier and water are formulated therein, and then emulsified to prepare an emulsion. At this time, the monomer can be used. The total amount of the monomer, or one part of the total amount, may be added to the remaining monomer during the polymerization. Then, the polymerization initiator is added to the emulsion, and the liquid is added to the emulsion, and the 祝& The emulsifier, the polymerization initiator, and the like used in the present invention are not particularly limited, and can be appropriately selected and used. Examples of the emulsifier used in the present invention include alkyl sulfates. Anionic emulsifiers such as benzoate, pyrophylline, sulphate, sulphate, polyoxyethylene sulphate, polyoxyethylene sulphate, etc.; polyoxyethylene hydride Non-ionic purification of aryl ethers, polyoxyethylene alkyl phenyl ethers, polyoxyethylene-polyacrylic propylene block polymers, sorbitan fatty acid brewing, polyoxyethylene thinning acid vinegar Agents, etc. These emulsifiers can be used alone or in combination Two or more types. Further, as the reactive emulsifier, a radically polymerizable functional group such as a propenyl group, a propylene terephthalate, a (meth)acrylonyl group or a propyl group can be used. Specific examples of the emulsifier include, for example, (4) described in the Japanese Patent Laid-Open Publication No. Hei 4, No. 5, which can be cited as: (1), HS, HS-2〇, KH-10, BC-〇5 BC_1〇, BC_2〇 (manufactured by Daiichi Industrial Co., Ltd.), Adeka Reas〇ap SE__ (manufactured by Asahi Denki Kogyo Co., Ltd.), and Latemul PD-104 (manufactured by Kao Corporation). The amount of the emulsifier used is preferably from 聚合], by weight, more preferably from 3 to 5 parts by weight, based on the polymerization stability or mechanical stability. 130902.doc -37· 200911951 Further, the water used in the present invention may be formulated only in the preparation of the emulsion, or may be further formulated after the preparation of the emulsion, and may be appropriately selected according to the polymerization method described below. Further, the amount of water to be blended is not particularly limited, and is adjusted in such a manner that the solid content of the (meth) propylene-based polymer after emulsion polymerization (emulsification polymerization) is 30 to 75% by weight, preferably 35 to 7〇% by weight. Examples of the polymerization initiator for emulsion polymerization used in the present invention include 2,2,-azobisisobutyronitrile and 2,2,-azobis(2-mercaptopropene) dihydride. Π-azobis[2♦methylmwynline_2•yl)propene]dinitrogen, 2,2,-azobis(2-methylpropionamidine) disulfate, 2,2,_ Azo-double (mail '_ dimethylene butyl quaternary rice), 2,2, azobis[N-(2-cylethyl)_2-methylpropane spleen] hydrate, etc. Starting agent; persulfate unloading, ammonium persulfate, etc. = salt 'dioxydicarbonate di(2-ethylhexyl) vinegar, dicarbodibutylcyclohexyl) vinegar, diperoxydicarbonate Vinegar, peroxy neodecanoic acid tributyl _, peroxy C'-pivalic acid third butyl vinegar, dilaurate peroxide peroxidation 1,1,3,3-tetramethylbutyl peroxidation · 2_B醯 醯 , 苯 苯 ) ) 过 过 过 过 过 二 二 二 二 二 二 二 二 二 二 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 ; over the money _ combined, peroxide and ascorbate sodium:: ... read, group combined with redox initiators, etc. ^ Above peroxide polymerization initiator with a reducing agent may be used alone II: and the like is not limited thereto. The total content is used in combination of two or more kinds based on _ parts by weight of the monomer, and it is preferred to use 5 parts by weight of G.002 to G.(). * is GG (H ~ ~ 1 part by weight, 130902. doc - 38. 200911951 combined: 1 method (emulsion polymerization) is not particularly limited, can be self-merging σ and adding method), continuous instillation method (single Λ Addition method, potting, 1 early body dropping method, soap body lotion), and 4 combinations of polymerization methods, etc., are appropriately selected. The method is also combined with, for example, an anti-deer emulsifier, and water i"°. The monomer mixture is added, and then the mixture is added, and the emulsion is prepared by emulsification. Then, water is added to the reaction vessel, and a polymerization initiator is added thereto, and if necessary, water is added to prepare an emulsion polymerization (emulsion polymerization). :: In the continuous dropping method, for example, first adding a monomer mixture and water and mixing and mixing, substituting the compound, preparing the liquid, and adding a polymerization initiator and water to the reaction. The emulsion polymerization (emulsion polymerization) is carried out in the container. / (7) Addition to retardation: It is an additive after emulsion polymerization, and can be suitably used, for example. H value, such as blitz, neutralizer, foaming inhibitor, stabilizer, etc. In the second tr, a chain transfer agent can also be used in the polymerization. The molecular weight of the (meth)acrylic acid polymer can be adjusted by using the specific bond transfer agent.

U 作為鏈轉移劑’例如可列舉:十二燒基硫醇、縮水甘油 基硫醇、毓基醋酸、2_疏基 , 人^等鍵轉移劑可單獨使用,亦可混合使用2種以上’蛐 3里較好的是相對於100重量份之單體為0.0W重量份/ =於:用(甲基)丙烯酸系聚合物作為黏著劑組成物之 4夺’藉由使(甲基)丙稀酸系聚合物適當地交聯,可進 步獲诗耐熱性、低污染性優異之黏著片材。 作為父聯方法之具體方法,有添加異氰酸S旨化合物、環 130902.doc -39· 200911951 氧化合物、三聚氰胺系樹脂、氮丙d全彳卜人仏 钆内疋化合物、碳化二醯亞 胺化合物、金屬螯合物化合物等化合物而進行反應的所謂 使用交聯劑的方法,上述化合物具有可與(甲基)丙稀酸夺 聚合物中作為適當之交聯化基點而含有之絲、經基、胺 基、醯胺基等反應之基。該等化合物可單獨使用,亦可混 合使用2種以上。 其中,作為異氰酸酉旨化合物,可列舉:甲苯二異氮酸 醋、二甲苯二異氰㈣等芳香族異氰酸g旨;異佛爾綱二異 氰酸醋等脂環族異氰酸_ ·’ A亞甲基二異氰酸自旨等脂肪族 異氣酸S旨等。其中,自主要藉媒、奋# 罟獲侍適當之凝聚力之觀點考 慮,可尤其好地使用異氰酸醋化合物或環氧化合物。該等 化合物可單獨使用,亦可混合使用2種以上。U, as a chain transfer agent, for example, a divalent alkyl thiol, a glycidyl thiol, a thioglycolic acid, a 2 - thiol group, and a key transfer agent such as a human can be used singly or in combination of two or more kinds. Preferably, 蛐3 is 0.0W parts by weight relative to 100 parts by weight of the monomer / =: using (meth)acrylic polymer as the adhesive composition of 4" by (meth) propyl The dilute acid polymer is appropriately crosslinked, and the adhesive sheet excellent in heat resistance and low pollution can be improved. As a specific method of the parent-linked method, there is a compound of isocyanate added, ring 130902.doc -39· 200911951 oxygen compound, melamine resin, nitrogen-acrylic acid, ruthenium ruthenium compound, carbodiimide A method of using a crosslinking agent which reacts with a compound such as a compound or a metal chelate compound, and the above compound has a silk which can be contained as a suitable crosslinking point in a (meth)acrylic acid absorbing polymer. a group of a reaction group such as a group, an amine group, a guanamine group or the like. These compounds may be used singly or in combination of two or more. In addition, examples of the isocyanate-based compound include aromatic isocyanic acid such as toluene diisocyanate and xylene diisocyanate (tetra); and alicyclic isocyanide such as isophora diisocyanate. Acid _·' A methylene diisocyanate is intended to be an aliphatic isogas such as S. Among them, isocyanate compounds or epoxy compounds can be particularly preferably used from the viewpoint of the main cohesiveness of the media and the company. These compounds may be used singly or in combination of two or more.

U 作為上述聚異氰酸酯化合物,例如可列舉:伸丁基二異 氛酸醋、六亞甲基二異氰酸醋等低級脂肪族聚異二醋 類:環戊烷二異氰酸醋、環己烷二異氰酸醋、異佛_二 異氰酸酯等脂環族異氰酸酯類;2,"苯二異氰酸酯、 4,4,-二笨基曱烧二異氰酸酿、笨二曱基二異氰酸醋等^香 族二異氰酸酯类員;三羥曱基丙烷/曱苯二異氰酸_三聚物 加成物(商品名Coronate L)’三羥甲基丙烷/六亞曱基二異 氰酸酯三聚物加成物(商品名c〇r〇nate HL)、六亞甲基二異 氰酸酯之異氰尿酸酯體(商品名C〇ronate HX)[上述均為曰 本聚胺酯工業公司製造]等異氰酸酯加成物等。該等化合 物可單獨使用,亦可混合使用2種以上。 作為上述環氧化合物,可列舉:N,N,N,,N,_四縮水甘油 130902.doc -40- 200911951 基-間二甲苯二胺(商品名TETRAD_X)、!,3_雙(Μ ^由^胺甲基)環己院(商品*tetrad_c)[上述 菱 斯化學公司製造]等1等化合物可單獨使 二 使用2種以上。 力『此。 作為上述三聚氰胺系樹脂’可列舉六經甲基三聚氰胺 4。作為氮丙。定衍生物,例如可列舉作為市售品之商口名 7、ταζΜ、ταζο(以上均為相互藥工公司製造)等:口該 專化合物可單獨使用,亦可混合使用2種以上。U, as the polyisocyanate compound, for example, a lower aliphatic polyisophthalic acid such as butyl diisocyanate or hexamethylene diisocyanate: cyclopentane diisocyanate or cyclohexane An alicyclic isocyanate such as alkane diisocyanate or isophora diisocyanate; 2, " phenyl diisocyanate, 4,4,-diphenyl sulfonium diisocyanate, stupid dimercapto diisocyanate Acidic vinegar, etc. ^ scented diisocyanate; trihydroxy hydrazine propane / phthalic acid diisocyanate _ terpolymer adduct (trade name Coronate L) 'trimethylolpropane / hexamethylene diisocyanate three Isocyanate such as a polymer adduct (trade name c〇r〇nate HL), hexamethylene diisocyanate isocyanurate body (trade name C〇ronate HX) [all of which are manufactured by 曰本聚胺酯工业公司] Additives, etc. These compounds may be used singly or in combination of two or more. Examples of the epoxy compound include N, N, N, N, _ tetraglycidyl 130902.doc -40- 200911951 keto-m-xylene diamine (trade name TETRAD_X), Further, 2 or more compounds such as 3_bis(Μ^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^ Force "this. As the melamine-based resin, hexamethyl-methyl melamine 4 can be cited. As nitrogen and hydrogen. For example, the commercial product may be exemplified as a commercial product, ταζΜ, ταζο (all of which are manufactured by Mutual Pharmaceutical Co., Ltd.), and the like. The compound may be used singly or in combination of two or more.

再者,較好的是,使由乳化聚合而獲得之(甲基)丙稀酸 系聚合物交聯時,使用水溶性交聯劑。 作為水溶性交聯劑,例如可列舉:聚乙二醇二縮水甘油 醚等環氧化合物、水分散型異氰酸酯化合物、噚唑啉化合 物、氮丙啶化合物、親水化處理碳化二醯亞胺化合物、活 性羥甲基化合物、活性烷氧基甲基化合物、金屬螯合物 等。 。 交聯劑之使用量可根據與應交聯之丙烯酸聚合物之平 衡、進而根據黏著片材之使用用途而適當地選擇。為利用 丙烯酸黏著劑之凝聚力而獲得充分之耐熱性,一般而言, 較好的疋相對於100重置份之上述丙烯酸聚合物含有 0.01〜15重量份之交聯劑,更好的是含有〇5〜1〇重量份之交 聯劑。若交聯劑之含量少於〇·〇1重量份,則存在如下傾 向:利用交聯劑之交聯形成不充分,黏著劑組成物之凝聚 力變小’有時無法獲得充分之耐熱性,又,會導致留有殘 膠。另一方面,若交聯劑之含量超過15重量份,則存在如 130902.doc •41 · 200911951 下傾向:聚合物之凝聚力較大,因而流動性下降,對被黏 附體之濡濕不充分,導致產生剝離。 又’亦可添加具有2個以上的放射線反應性不飽和鍵之 多s能單體作為實質上之交聯劑,並利用放射線等進行交 聯。 作為具有2個以上的放射線反應性不飽和鍵之多官能單 體’可使用具有2個以上的乙烯基、丙烯醯基、甲基丙稀 酿基、乙稀基苄基此種可利用放射線照射進行交聯處理 (硬化)之1種或2種以上的放射線反應性不飽和鍵之多官能 單體成分。再者,通常可較好地使用放射線反應性不飽和 鍵為1 0個以下者。多官能單體亦可併用2種以上。作為多 官能單體之具體例,可列舉:乙二醇二(甲基)丙烯酸酯、 一乙一醇二(曱基)丙烯酸酯、四乙二醇二(甲基)丙烯酸 新戊一醇二(曱基)丙烯酸酯、1,6-己二醇二(甲基)丙稀 酸酯、三羥曱基丙烷三(曱基)丙烯酸酯、季戊四醇三(甲 基)丙烤酸酿、二季戊四醇六(甲基)丙烯酸酯、二乙稀基 苯、N,N’-亞甲基雙丙稀醯胺等。 多官能單體之使用量,可根據與應交聯之丙烯酸聚合物 之平衡、進而根據黏著片材之使用用途而適當地選擇。為 利用丙烯酸黏著劑之凝聚力獲得充分之耐熱性,通常較好 的是,相對於1〇〇重量份之丙烯酸聚合物調配〇1〜3〇重量 伤之夕g忐單體。又,自柔軟性、接著性方面考慮,更好 的是,相對於100重量份之丙烯酸聚合物調配1〇重量份以 下之多官能單體。 130902.doc •42· 200911951 作為放射線,例如可列舉♦•紫外線、雷射線、α射線、p 射線、γ射線、X射線、電子束等,自控制性及操作性良好 程度、成本方面考慮,可較好地使用紫外線。更好的是使 用波長為200〜400 nm之紫外線。紫外線可使用高壓水銀 燈、微波激發型燈、化學燈等適當光源而照射。 再者,使用紫外線作為放射線之情形時,在丙烯黏著劑 中添加光聚合起始劑。Further, it is preferred to use a water-soluble crosslinking agent when crosslinking the (meth)acrylic acid polymer obtained by emulsion polymerization. Examples of the water-soluble crosslinking agent include an epoxy compound such as polyethylene glycol diglycidyl ether, a water-dispersed isocyanate compound, an oxazoline compound, an aziridine compound, a hydrophilized carbodiimide compound, and an activity. A methylol compound, a reactive alkoxymethyl compound, a metal chelate or the like. . The amount of the crosslinking agent to be used can be appropriately selected depending on the balance with the acrylic polymer to be crosslinked, and further depending on the intended use of the adhesive sheet. In order to obtain sufficient heat resistance by utilizing the cohesive force of the acrylic adhesive, generally, the ruthenium preferably contains 0.01 to 15 parts by weight of a crosslinking agent, more preferably ruthenium, with respect to 100 parts by weight of the above acrylic polymer. 5 to 1 part by weight of the crosslinking agent. When the content of the crosslinking agent is less than 重量·〇1 parts by weight, there is a tendency that the crosslinking by the crosslinking agent is insufficient, and the cohesive force of the adhesive composition becomes small, and sometimes sufficient heat resistance cannot be obtained. Will cause residual glue. On the other hand, if the content of the crosslinking agent exceeds 15 parts by weight, there is a tendency such as 130902.doc •41 · 200911951: the cohesive force of the polymer is large, so the fluidity is lowered, and the wetness of the adherend is insufficient, resulting in insufficient Peeling occurs. Further, a plurality of s energy monomers having two or more radiation-reactive unsaturated bonds may be added as a substantial crosslinking agent, and may be crosslinked by radiation or the like. As a polyfunctional monomer having two or more radiation-reactive unsaturated bonds, it is possible to use radiation having two or more vinyl groups, acrylonitrile groups, methyl propylene groups, and ethyl benzyl groups. A polyfunctional monomer component of one or two or more kinds of radiation-reactive unsaturated bonds which are subjected to crosslinking treatment (hardening). Further, in general, it is preferable to use a radiation reactive unsaturated bond of 10 or less. Two or more kinds of polyfunctional monomers may be used in combination. Specific examples of the polyfunctional monomer include ethylene glycol di(meth)acrylate, monoethylene glycol bis(indenyl)acrylate, and tetraethylene glycol di(meth)acrylic acid pentaerythritol II ( Mercapto) acrylate, 1,6-hexanediol di(methyl) acrylate, trishydroxypropyl propane tris(decyl) acrylate, pentaerythritol tris(methyl) propane acid brewing, dipentaerythritol (Meth) acrylate, diethyl benzene, N, N'-methylene propylene amide, and the like. The amount of the polyfunctional monomer to be used can be appropriately selected depending on the balance with the acrylic polymer to be crosslinked, and further depending on the intended use of the adhesive sheet. In order to obtain sufficient heat resistance by utilizing the cohesive force of the acrylic adhesive, it is usually preferred to formulate 〇1 to 3 〇 of the weight of the acrylic polymer with respect to 1 part by weight of the acrylic polymer. Further, from the viewpoint of flexibility and adhesion, it is more preferable to formulate 1 part by weight or less of the polyfunctional monomer with respect to 100 parts by weight of the acrylic polymer. 130902.doc •42· 200911951 Examples of radiation include ♦•UV, Ray ray, α-ray, p-ray, γ-ray, X-ray, and electron beam. It is self-controlled, operability, and cost. Better use of ultraviolet light. More preferably, ultraviolet rays having a wavelength of 200 to 400 nm are used. The ultraviolet light can be irradiated with a suitable light source such as a high pressure mercury lamp, a microwave excitation lamp, or a chemical lamp. Further, when ultraviolet rays are used as the radiation, a photopolymerization initiator is added to the propylene adhesive.

作為光聚合起始劑,只要是根據放射線反應性成分之種 類而可成為其聚合反應之引發物、藉由照射適當波長之紫 外線產生自由基或陽離子之物質即可,作為光自由基聚合 起始劑’例如可列舉:安息香、安息香甲醚、安息香^ 輕、鄰苯曱醯基苯甲酸對安息香乙越、安息香異丙 醚、α-甲基安息香等安息香_,苄基二甲基縮酮、三氯苯 乙酮、2,2-一乙氧基苯乙酮、丨_羥基環己基苯基酮等笨乙 酮類,2-輕基-2-曱基苯丙酮、2_經基_4,_異丙基_2·甲基笨 丙酮等苯丙酮類,:苯曱酮、甲基二苯甲酮、對氯二笨甲 酮、對二甲胺基二苯曱酮等二苯甲酮類,2_氣氧硫 咖星、2-乙基冬氧硫·[ 2_異丙基冬氧硫㈣ : 咖星類,雙(2,4,6·三曱基苯甲醯基)_苯基氧化膦、2,4,6^ 甲基苯甲醯基二苯基氧化膦、(2,4,6•三甲基苯甲醯基’地 氧基)-苯基氧化膦等醯基氧化膦類,苯偶醯、二苯并 酮、α-醯基肟酯等。 义庚 作為光陽離子聚合起始劑, 鹽、芳香族錤鹽、芳香族錡鹽 例如可列舉:芳香族重氮 等鏽鹽,或鐵-丙二烯錯合 130902.doc •43- 200911951 物、二茂鈦錯合物、芳基石夕燒醇-銘錯合物等有機金屬錯 口物類,硝基苄基酯 '磺酸衍生物、磷酸酯、磺酸衍生 物、魏醋、苯紛石黃酸醋、二偶氮蔡酿、n_經基酿亞胺續 酸酿等。 上述光聚合起始劑亦可併用2種以上。較好的是,光聚 合起始劑相對於1〇〇重量份之丙烯酸聚合物通常為〇卜1〇 重量份、較好的是在〇.2〜7重量份之範圍内調配光聚合起 始劑。The photopolymerization initiator may be an initiator of a polymerization reaction depending on the kind of the radiation-reactive component, and may be a substance which generates a radical or a cation by irradiation of ultraviolet rays having an appropriate wavelength as an initiator of photoradical polymerization. The agent 'for example, benzoin, benzoin methyl ether, benzoin ^ light, o-benzoylbenzoic acid to benzoin, benzoin isopropyl ether, α-methylbenzoin and the like benzoin _, benzyl dimethyl ketal, Ethyl ketones such as trichloroacetophenone, 2,2-ethoxyacetophenone, and hydrazine-hydroxycyclohexyl phenyl ketone, 2-light-based-2-mercaptopropiophenone, and 2-amino group- 4 Phenyl ketone such as isopropylidene-2·methyl phenylacetone, benzophenone such as benzophenone, methyl benzophenone, p-chlorodibenzophenone or p-dimethylaminobenzophenone Class, 2_oxygen thio-caffeine, 2-ethyloxosulfuryl·[ 2_isopropylaspartic oxysulfide (4): coffee star, bis(2,4,6·tridecylbenzhydryl)_ Phenylphosphine oxide, 2,4,6^methylbenzimidyldiphenylphosphine oxide, (2,4,6•trimethylbenzylidenethiol)-phenylphosphine oxide Phosphine oxides Dibenzo ketone, α- acyl oxime ester and the like. Yigen is used as a photocationic polymerization initiator, and examples of the salt, the aromatic phosphonium salt, and the aromatic phosphonium salt include a rust salt such as aromatic diazo, or an iron-propadiene mismatch 130902.doc • 43-200911951. Organic metal miscellaneous compounds such as ferrocene complex, aryl sage, and complex complex, nitrobenzyl ester 'sulfonic acid derivative, phosphate ester, sulfonic acid derivative, Wei vinegar, benzene fluorite Yellow vinegar, diazo bacillus brewing, n_ basal brewing, and so on. The photopolymerization initiator may be used in combination of two or more kinds. Preferably, the photopolymerization initiator is usually 1 part by weight, more preferably 2 to 7 parts by weight, based on 1 part by weight of the acrylic polymer. Agent.

進而’亦可併用胺㈣光起始聚合助劑。作為上述光起 始:劑,τ列舉:2-二曱基胺基乙基苯甲酸醋、二甲基胺 ^本乙_、對二甲基胺基笨f酸乙、對二甲基胺基苯甲 酉欠異戊®θ等。上述光聚合起始助劑亦可併用2種以上。較 好的是,相對於ΗΗ)之重量份丙烯酸聚合物,調配〇〇5〜1〇 重量份之聚合起始助劑,更好的是在〇1〜7重量份之範圍 内調配聚合起始助劑。 進而’本發明之黏著片材所使用之黏著劑組成物中,可 根據所制之料而適當地添加先前公知之㈣增黏劑或 表面潤滑劑、界面活性劑、均染劑、抗氧化劑、抗腐餘 劑、光敎劑、紫外線吸收劑、聚合抑制劑、㈣偶合 劑、無機或有機填充劑、金屬粉、顏料等之粉體、粒子 狀、箔狀物等先前公知之各種添加劑。 另-方面’本發明之黏著劑層係使如上黏著劑組成物交 聯而形成者。X ’本發明之黏著片材係將該黏著劑層形成 於基材層(支持薄膜)上而成者。此時,黏著劑組成物之交 130902.doc •44· 200911951 聯通常係在塗佈黏著劑組成物之後進行 , 之黏著劑組成物所形成 #、° ·父聯後 成黏著劑層之方法並無特別限制,例如,可 藉由如下方式而製作:將上 臈上,乾烊除者劑、、且成物塗佈於支持薄 乾各除去聚合溶劑(有機溶劑 支持薄腺卜拟士 t X,合及)等,於 叉丹溥膜上形成黏著劑層。此後, 著劑層之成分過渡或調整交聯反應等。^仃热化以調整黏 物塗佈於支持薄膜上製作㈣片 ’將黏者劑組成 新添加聚合溶劑及I人 、μ可於該組成物中 W汉/ ^聚合溶劑以外之1 可將黏著劑組成物均勻地塗佈於支持薄膜上/以 又,作為本發明之黏著劑 著片材所用之方法。且體而山;成方法’可使用製造黏 /、體而δ,例如可列舉, 版印刷塗佈法、反向塗佈法、輕 4輥塗法、凹 塗佈法、含浸及簾塗法土法、噴塗法、氣刀 法。又及簾塗法、利用㈣式塗佈機等之擠屬塗佈 使上述黏著劑層之厚度通常為3〜100_、較好的是 μηι左右之方式,將 持薄膜上之單面,而成…/點者片材㈣形成於支 成為片材狀或帶狀等之形能。 又,本發明之黏著片材較好的是 :一 靜電之塑膠產品等。其中 ”;谷易產生 用夕後上^ 尤其疋作為液晶顯示器等所使 用之偏先板、波長板、相位差板、光學 吏 材、增亮薄膜等以保護光學構 、 、片 保護薄膜非常有用。干構件表面為目的而使用之表面 實施例 130902.doc -45· 200911951 :下$對具體表示本發明之構成及效果之實施例等加以 定。* ’實施例等中之評價項目係以如下方式進行測 <分子量之測定> 分子量係使用GPC裝置(T〇s〇h股份有限公司製造,HLc_ 8220GPC)進行測定。測定條件如下所述。 •樣品濃度:0.2 wt% (THF溶液) ,樣品注入量:10 μΐ •溶離液:thf •流速:0,6 ml/min •測定溫度:4 〇。〇 •管柱: 樣品管柱:TSKguardc〇lumn SuperHZ H〇 支卜丁队㈣Further, it is also possible to use an amine (iv) photoinitiator polymerization aid in combination. As the above-mentioned photoinitiator: τ is exemplified by 2-didecylaminoethyl benzoic acid vinegar, dimethylamine^benzine _, p-dimethylamino phenyl acid, and p-dimethylamino group. Benzoquinone owes isoamyl® θ and the like. The photopolymerization initiation aid may be used in combination of two or more kinds. Preferably, the polymerization initiator is blended in an amount of 5 to 1 part by weight based on the weight of the acrylic polymer, more preferably in the range of 1 to 7 parts by weight of the polymerization. Auxiliary. Further, in the adhesive composition used in the adhesive sheet of the present invention, previously known (4) tackifiers or surface lubricants, surfactants, leveling agents, antioxidants, and the like may be appropriately added depending on the materials to be prepared. Various previously known additives such as anti-corrosion agent, photo-tanning agent, ultraviolet absorber, polymerization inhibitor, (iv) coupling agent, inorganic or organic filler, metal powder, pigment, and the like, powder, particulate, and foil. Further, the adhesive layer of the present invention is formed by crosslinking the above-mentioned adhesive composition. X' The adhesive sheet of the present invention is obtained by forming the adhesive layer on a substrate layer (support film). At this time, the adhesion of the adhesive composition 130902.doc •44·200911951 is usually carried out after the application of the adhesive composition, and the adhesive composition forms a method of forming an adhesive layer after the father and the joint. There is no particular limitation, and for example, it can be produced by applying a top coat, a dry remover, and a product to support a thin dry removal of a polymerization solvent (organic solvent support thin abundance t X, And, etc., an adhesive layer is formed on the tantalum film. Thereafter, the composition of the coating layer is transitioned or the crosslinking reaction is adjusted. ^仃heating to adjust the viscosity of the coating on the support film to make (4) sheet 'to make the adhesive composition of the newly added polymerization solvent and I, μ can be in the composition W / / polymerization solvent can be adhered to The composition of the agent is uniformly applied to the support film / in turn, as a method of the adhesive sheet of the present invention. The method can be used to produce a binder/body and δ, and examples thereof include a plate coating method, a reverse coating method, a light 4-roll coating method, a concave coating method, an impregnation method, and a curtain coating method. Soil method, spray method, air knife method. Further, the curtain coating method and the coating method of the (four) type coating machine or the like are used so that the thickness of the pressure-sensitive adhesive layer is usually from 3 to 100 Å, preferably about μηι, and the single surface of the film is held. .../pointer sheet (4) is formed in a shape that is formed into a sheet shape or a belt shape. Further, the adhesive sheet of the present invention is preferably: an electrostatic plastic product or the like. "In the case of the use of the liquid crystal display, etc., the wavelength plate, the phase difference plate, the optical coffin, the brightness enhancement film, etc. are useful for protecting the optical structure and the sheet protection film. The surface of the dry member surface is used for the purpose of the embodiment 130902.doc-45·200911951: The following is an example of the embodiment and the effect of the present invention. * The evaluation items in the examples and the like are as follows Measurement by Method <Measurement of Molecular Weight> The molecular weight was measured using a GPC apparatus (manufactured by T〇s〇h Co., Ltd., HLc_8220GPC). The measurement conditions were as follows: • Sample concentration: 0.2 wt% (THF solution), Sample injection amount: 10 μΐ • Dissolution solution: thf • Flow rate: 0,6 ml/min • Measurement temperature: 4 〇. 〇 • Column: Sample column: TSKguardc〇lumn SuperHZ H〇支卜丁队 (4)

SuperHZM-H(2 支) 參考管柱:丁SKgelSuperH-RC(l 支) •檢測器:示差折射計(RI) 再者’分子量係以聚苯乙烯換算值而求出。 <玻璃轉移溫度(Tg)之測定> <玻璃轉移溫度之測定> 所獲得之(甲基)丙烯酸系聚合物之玻璃轉移溫度 Tg( C),係使用下述文獻值作為各單體之均聚物之玻璃轉 移溫度TgnfC ),並利用下式而求出。 式·· l/(Tg+ 273)=X[Wn/(Tgn+ 273)] [式中’ Tg(°C)表示共聚物之玻璃轉移溫度,wn(-)表示 130902.doc •46- 200911951 各早體之重量分峯 <-p / 〇^>,. gn(C)表示各單體之均聚物 移溫度(°C),η表示久留挪 坡螭轉 7 衣不各早體之種類。]SuperHZM-H (2 pieces) Reference column: Ding SKgel SuperH-RC (1 branch) • Detector: Differential refractometer (RI) The molecular weight is determined by the value of polystyrene. <Measurement of glass transition temperature (Tg)><Measurement of glass transition temperature> Glass transition temperature Tg(C) of the obtained (meth)acrylic polymer, using the following literature values as the respective sheets The glass transition temperature TgnfC of the homopolymer was determined by the following formula. L·(Tg+ 273)=X[Wn/(Tgn+ 273)] [wherein Tg(°C) represents the glass transition temperature of the copolymer, and wn(-) represents 130902.doc •46- 200911951 The weight fraction of the body <-p / 〇^>,. gn(C) represents the homopolymer shift temperature (°C) of each monomer, and η represents the type of the long-term sloping 7 7 . ]

(文獻值,參照中部蹲踩ρΕ| 1 I 丨左s開發中心出版部發行”丙 舳t σ成6又5十、信用及開發”) 7 •丙烯酸2-乙基己酯:_7〇<t •甲基丙稀酸正丁 @旨:2〇〇c •丙烯酸2-羥基乙酯:_15 •丙烯酸:1 0 6 °C。(Document value, refer to the central 蹲 Ε Ε Ε | 1 I 丨 Zuo s Development Center Publishing Department issued "Bing 舳 t σ into 6 and 50, credit and development") 7 • 2-ethylhexyl acrylate: _7 〇 < t • Methyl acrylate Ding @: 2〇〇c • 2-hydroxyethyl acrylate: _15 • Acrylic acid: 1 0 6 °C.

〈熔點(Tm)之測定&gt; 抗靜電薄膜所使用之各樹脂之聚合物的熔點(。。),係 〇電子工業么司製造之示差掃描熱量計⑽進行 定。測定條件為,取用約5 mg之樣品,於· 〇c下保持5分 鐘後’以HTC/min之降溫速度冷卻至听,然後以呢/分 鐘之升溫速度使樣品料。求出此時㈣得线解曲線I 波峰溫度作為熔點fC)。 &lt; 薄膜之製備&gt; (抗靜電薄膜(A)) 利用雙軸擠壓機(料筒設定溫度:22(rc),將9〇重量份之 利用茂金屬觸媒而聚合之隨機聚丙烯樹脂(日本p〇lypr〇公 司製造,Wintech WFX4,熔點:125t:)、及1〇重量份高分 子型抗靜電劑(汽巴精化公司製造,IRGASTAT P18)熔融 混練,並製成顆粒。將該樹脂組成物作為抗靜電層,並將 利用茂金屬觸媒而聚合之隨機聚丙烯樹脂(日本p〇lypr〇公 司製造,Wintech WFX4,熔點:125。〇作為基材層,利用 130902.doc -47· 200911951 T模(模具溫度:22〇。〇進行二層複合擠壓,通過2〇。〇之洗 鑄輥,以5 m/min之牽引速度獲得抗靜電層為ι〇叫、基材 層為30㈣之薄膜。對所獲得之薄膜的與抗靜電層面相反 之面進行電暈放電處理’獲得抗靜電薄膜(Α)。 (抗靜電薄膜(Β)) 利用雙軸擠壓機(料筒設定溫度:22〇。〇,將75重量份之 利用茂金屬觸媒而聚合之隨機聚丙烯樹脂(日本Ρ。咖0公 司製造,WinteCh WFX4,炫點:125dc)、及25重量份之高 分子型抗靜電劑(汽巴精化公司製造,irgastat pi8)溶 融混練’並製成顆粒。將該樹脂組成物作為抗靜電層,並 將利用茂金屬觸媒而聚合之隨機聚丙稀樹脂(日本p。咖〇 公司製造’ Wintech WFX4,炫點:125。〇作為基材層利 用T模(模具溫度:220。〇進行二層複合擠壓,通過2〇。〇之 洗鎿報’以5 m/min之牽引速度獲得抗靜電層為1〇 _、基 材層為30叫之薄膜。對所獲得之薄膜的與抗靜電層面相 反之面進行電暈放電處理,獲得抗靜電薄臈(b)。 (抗靜電薄膜(C)) 利用雙轴擠壓機(料筒設定溫度:22〇。〇,將6〇重量份之 利用茂金屬觸媒而聚合之隨機聚丙烯樹脂(日本p一⑺公 司製造’ Wintech WFX4,炫點:125。〇、及4〇重量份之高 分子型抗靜電劑(汽巴精化公司製造,嶋㈣pi8)熔 融混練,並製成顆粒。將該樹脂組成物作為抗靜電層,並 將利用茂金屬觸媒而聚合之隨機聚丙烯樹脂(曰本Μ—。 公司製造,Wintech WFX4’炫點:12叫作為基材層,利 130902.doc •48· 200911951 用T模(模具溫度:220 C)進行二層複合擠壓,通過2〇°c之 澆鑄輥,以5 m/min之牽引速度獲得抗靜電層為1〇 μιη、基 材層為30 μιη之薄膜。對所獲得之薄膜的與抗靜電層面相 反之面進行電暈放電處理,獲得抗靜電薄膜(c)。 (抗靜電薄膜(D)) 利用於雙軸擠壓機(料筒設定溫度:22〇。〇 ,將乃重量份 之利用茂金屬以外之觸媒而聚合之隨冑聚丙烯樹脂(prime Polymer公司製造,F327,熔點:138。〇)、及乃重量份之高<Measurement of Melting Point (Tm)&gt; The melting point (.) of the polymer of each resin used for the antistatic film was determined by a differential scanning calorimeter (10) manufactured by 〇电子工业. The measurement conditions were as follows: a sample of about 5 mg was taken and kept under ·c for 5 minutes, and then cooled to a temperature of HTC/min, and then the sample was taken at a temperature increase rate of ah/min. At this time, (4) the line solution curve I peak temperature is obtained as the melting point fC). &lt;Preparation of film&gt; (Antistatic film (A)) Using a biaxial extruder (cylinder set temperature: 22 (rc), 9 parts by weight of a random polypropylene resin polymerized by a metallocene catalyst (manufactured by Japan p〇lypr〇, Wintech WFX4, melting point: 125t:), and 1 part by weight of a polymer type antistatic agent (manufactured by Ciba Specialty Chemicals Co., Ltd., IRGASTAT P18), which is melt-kneaded and made into pellets. The composition was used as an antistatic layer, and a random polypropylene resin polymerized by a metallocene catalyst (manufactured by Pylypr Co., Ltd., Wintech WFX4, melting point: 125. 〇 as a substrate layer, 130902.doc-47· 200911951 T-die (die temperature: 22 〇. 二 two-layer composite extrusion, through 2 〇. 洗 洗 洗 洗 洗 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , The film is subjected to corona discharge treatment on the opposite side of the obtained film from the antistatic layer. [Antistatic film (Α) is obtained. (Antistatic film (Β)) Using a biaxial extruder (barrel set temperature: 22〇.〇, 75 parts by weight of the use of metallocene touch The polymerized random polypropylene resin (manufactured by Nippon Kasuga Co., Ltd., WinteCh WFX4, Hyun: 125dc), and 25 parts by weight of a polymer type antistatic agent (manufactured by Ciba Specialty Chemicals Co., Ltd., irgastat pi8) And made into a granule. The resin composition was used as an antistatic layer, and a random polypropylene resin polymerized by a metallocene catalyst (manufactured by Japan P. Co., Ltd.) Wintech WFX4, Hyun: 125. Using the T-die (mold temperature: 220. 二 two-layer composite extrusion, through 2 〇. 〇 鎿 鎿 ' ' at a traction speed of 5 m / min to obtain an antistatic layer is 1 〇 _, the substrate layer is 30 The film is subjected to corona discharge treatment on the opposite side of the obtained film from the antistatic layer to obtain an antistatic thin film (b). (Antistatic film (C)) Using a biaxial extruder (cylinder set temperature) :22〇.〇, 6 parts by weight of a random polypropylene resin polymerized by a metallocene catalyst (manufactured by Japan P-(7) Co., Ltd.' Wintech WFX4, Hyun: 125. 〇, and 4 〇 by weight of polymer Antistatic agent (manufactured by Ciba Specialty Chemicals Co., Ltd., 嶋(4)pi8) Melt and knead and make granules. The resin composition is used as an antistatic layer, and a random polypropylene resin polymerized by a metallocene catalyst (Sakamoto Μ-., manufactured by the company, Wintech WFX4' Hyun: 12 is used as a base. Material layer, benefit 130902.doc •48· 200911951 Two-layer composite extrusion was carried out with T-die (die temperature: 220 C), and the anti-static layer was obtained by a casting roller of 2 °°c at a pulling speed of 5 m/min. 1 〇 μηη, the substrate layer is a film of 30 μm. The obtained film was subjected to corona discharge treatment on the opposite side to the antistatic layer to obtain an antistatic film (c). (Antistatic film (D)) Used in a twin-screw extruder (cylinder set temperature: 22 〇. 〇, will be a part by weight of a polypropylene resin polymerized by a catalyst other than metallocene (prime Polymer Manufactured, F327, melting point: 138. 〇), and the weight is high

分子型抗靜電劑(汽巴精化公司製造,IRgastat pi8)熔 融混練’並製成顆粒。將該樹脂組成物作為抗靜電層,將 利用茂金屬觸媒而聚合之隨機聚丙烯樹脂(日本以丨沖⑺公 司製造’ Winteeh WFX4,炼點:125。〇作為基材層,利用 T模(模具溫度:22(rc)進行二層複合擠壓,通過赃之洗 鑄親,以5 m/min之牽引速度獲得抗靜電層為1()叫、基材 層為3〇 μ:η之薄膜。對所獲得之薄膜的與抗靜電層面相反 之面進行電暈放電處理’獲得抗靜電薄膜⑴)。 (抗靜電薄膜(Ε)) 利用雙軸擠壓機(料筒設定溫度:22〇。〇,將75重量份之 利用茂金屬以外之觸媒而聚合之隨機聚丙烯樹脂一Molecular antistatic agent (manufactured by Ciba Specialty Chemicals, IRgastat pi8) was melted and kneaded and made into granules. The resin composition was used as an antistatic layer, and a random polypropylene resin polymerized by a metallocene catalyst (manufactured by Hiroshi (7), Japan, Winteeh WFX4, refining point: 125. 〇 as a substrate layer, using a T-die ( Mold temperature: 22 (rc) for two-layer composite extrusion, through the washing and casting of the crucible, the antistatic layer was obtained at a pulling speed of 5 m/min, and the substrate layer was a film of 3〇μ:η. Corona discharge treatment was performed on the opposite side of the obtained film from the antistatic layer. [Antistatic film (1) was obtained. (Antistatic film (Ε)) Using a biaxial extruder (barrel set temperature: 22 〇. 〇, 75 parts by weight of a random polypropylene resin polymerized by a catalyst other than metallocene

Polymer公司製造’ F327,熔點. 蝽.,沾.138C)、及25重量份之高 分子型抗靜電劑(汽巴精化公司製造,mGASTAT Ρ1δ)溶 融混練,並製成顆粒。將該樹脂組成物作為抗㈣層,將 利用茂金屬以外之觸媒而聚合 „ , ν η , &amp;丨道機聚丙烯樹脂(PrimeThe Polymer Company manufactures 'F327, melting point. 蝽., dip. 138C), and 25 parts by weight of a high molecular type antistatic agent (manufactured by Ciba Specialty Chemicals Co., Ltd., mGASTAT Ρ1δ), which is fused and granulated. The resin composition is used as an anti-(four) layer, and is polymerized by a catalyst other than metallocene. „ , ν η , &amp; 丨 机 machine polypropylene resin (Prime

Polymer公司製造’ F327,熔點:m C)作為基材層,利用 130902.doc •49- 200911951 T模(模具溫度:22〇°C)進行二層複合擠壓,通過20。〇之洗 鑄輥,以5 m/min之牽引速度獲得抗靜電層為ι〇 μιη、基材 層為30㈣之薄膜。對所獲得之薄膜的與抗靜電層面相反 之面進行電暈放電處理’獲得抗靜電薄膜(Ε)。 (抗靜電薄膜(F)) 利用雙軸擠壓機(料筒設定溫度:22〇。〇,將75重量份之 利用茂金屬以外之觸媒而聚合之均質聚丙烯樹脂(prime Polymer公司製造,ZS1327A,熔點:162。〇、及^重量份 之冋刀子型抗靜電劑(汽巴精化公司製造, P18)熔融混練,並製成顆粒。將該樹脂組成物作為抗靜電 層,並將上述均質聚丙烯樹脂(Prime p〇lymer公司製造, ZS1327A,熔點:162°c)作為基材層,利用τ模(模具溫 度.220C)進行二層複合擠壓,通過2〇&lt;3(:之澆鑄輥,以$ m/nHn之牽引速度獲得抗靜電層為10 μιη、基材層為30 μη! 之薄膜。對所獲得之薄膜的與抗靜電層面相反之面進行電 暈放電處理’獲得抗靜電薄膜(F)。 (未經抗靜電處理之薄膜(G)) 將利用茂金屬觸媒而聚合之隨機聚丙烯樹脂(曰本 P〇lypr〇公司製造,Wintech WFX4,熔點:125。〇作為基 材層利用T模(模具溫度:2 2 0 °C )進行單層擠壓,通過 2〇C之澆鑄輥,以5 m/min之牽引速度獲得基材層為4〇 之4膜對所獲得之薄膜之單面進行電暈放電處理,獲得 未經抗靜電處理之薄膜(G)。 (未經抗靜電處理之薄膜(Η)) 130902.doc •50- 200911951 將利用茂金屬以外之觸媒而聚合之均質聚丙烯樹脂 (Prime Polymer公司製造,ZS1327A ’ 熔點:162eC)作為基 材層,利用T模(模具溫度:220°C)進行單層擠壓,通過 2〇C之洗每親,以5 m/min之牽引速度獲得基材層為40 μηι 之薄膜。對所獲得之薄膜之單面進行電暈放電處理,獲得 未經抗靜電處理之薄膜(Η)。 (未經抗靜電處理之薄膜(I)) 將利用茂金屬以外之觸媒而聚合之隨機聚丙烯樹脂 (Prime P〇lymer公司製造,F327,熔點:138°C)作為基材 層’利用T模(模具溫度:220。〇進行單層擠壓,通過2〇〇C 之澆鑄親,以5 m/min之牽引速度獲得基材層為40 μηι之薄 膜。對所獲得之薄膜之單面進行電暈放電處理,獲得未經 抗靜電處理之薄膜(I)。 (抗靜電薄膜(J)) 利用雙軸擠壓機(料筒設定溫度:220°C ),將75重量份之 利用茂金屬以外之觸媒而聚合之嵌段聚丙稀樹脂(Prime Polymer公司製造,F707W)、及25重量份之高分子型抗靜 電劑(汽巴精化公司製造,IRGASTAT P18)熔融混練,並 製成顆粒。將該樹脂組成物作為抗靜電層,並將上述嵌段 聚丙稀樹脂(Prime Polymer公司製造,F7〇7W)作為基材 層,利用T模(模具溫度:220。〇進行二層複合擠壓,通過 2〇°C之澆鑄輥,以5 m/min之牽引速度獲得抗靜電層為1〇 μιη、基材層為30 μιη之薄膜。對所獲得之薄膜的與抗靜電 層面相反之面進行電暈放電處理,獲得抗靜電薄膜(J)。 130902.doc •51 · 200911951 (抗靜電薄膜(κ)) 利用雙軸擠壓機(料筒設定溫度:220。〇,將75重量份之 利用茂金屬以外之觸媒而聚合之嵌段聚丙烯樹脂(巧丨抓 Polymer公司製造,F7〇7w)、及25重量份之高分子型抗靜 電劑(八巴精化公司製造,IRGASTAT P18)熔融混練,並 製成顆粒。將該樹脂組成物作為抗靜電層,並將利用茂金 屬觸媒而聚合之隨機聚丙烯樹脂(日本Polypro公司製造,Polymer manufactured by 'F327, melting point: m C) as a substrate layer, using a 130902.doc •49-200911951 T-die (mold temperature: 22 〇 ° C) for two-layer composite extrusion, passing 20. The casting roll was obtained at a pulling speed of 5 m/min to obtain a film having an antistatic layer of ι〇 μιη and a substrate layer of 30 (four). The surface of the obtained film opposite to the antistatic layer was subjected to corona discharge treatment to obtain an antistatic film (Ε). (Antistatic film (F)) Using a biaxial extruder (cylinder set temperature: 22 〇. 〇, 75 parts by weight of a homogeneous polypropylene resin polymerized by a catalyst other than metallocene (prime polymer company, ZS1327A, melting point: 162. 〇, and ^ parts by weight of 冋 knife type antistatic agent (Ciba Specialty Chemicals Co., Ltd., P18) melt-kneaded and made into granules. The resin composition is used as an antistatic layer, and the above homogenization Polypropylene resin (manufactured by Prime p〇lymer Co., Ltd., ZS1327A, melting point: 162 ° C) was used as a substrate layer, and a two-layer composite extrusion was carried out by a τ mold (mold temperature: 220 C), and passed through 2 〇 &lt; 3 (: casting) Roll, obtain a film with an antistatic layer of 10 μηη and a substrate layer of 30 μη! at a pulling speed of $ m/nHn. Corona discharge treatment is performed on the opposite side of the obtained film from the antistatic layer. Film (F). (Anti-antistatic treated film (G)) A random polypropylene resin polymerized by a metallocene catalyst (manufactured by 〇本〇 P〇lypr〇, Wintech WFX4, melting point: 125. 〇 as a base) The material layer utilizes a T-die (mold temperature: 2 2 0 °C) Single-layer extrusion was carried out, and a single-sided film of 4 mm was obtained by a casting roll of 2 〇C at a pulling speed of 5 m/min, and a single side of the obtained film was subjected to corona discharge treatment to obtain a non-resistant film. Electrostatically treated film (G). (Anti-antistatic treated film (Η)) 130902.doc •50- 200911951 A homogeneous polypropylene resin polymerized by a catalyst other than metallocene (manufactured by Prime Polymer, ZS1327A' Melting point: 162eC) As a substrate layer, a single layer extrusion was carried out using a T-die (die temperature: 220 ° C), and each substrate was washed by 2 〇 C, and the substrate layer was obtained at a pulling speed of 5 m/min. The film is subjected to corona discharge treatment on one side of the obtained film to obtain a film (Η) which is not subjected to antistatic treatment. (The film (I) which is not subjected to antistatic treatment) will utilize a catalyst other than the metallocene. Polymerized random polypropylene resin (manufactured by Prime P〇lymer, F327, melting point: 138 ° C) as a substrate layer 'using a T-die (mold temperature: 220. 单 single-layer extrusion, casting by 2〇〇C) Pro, a film having a substrate layer of 40 μηι was obtained at a pulling speed of 5 m/min. One side of the obtained film was subjected to corona discharge treatment to obtain a film (I) which was not subjected to antistatic treatment. (Antistatic film (J)) Using a biaxial extruder (cylinder set temperature: 220 ° C), 75 parts by weight of a block polypropylene resin (F707W manufactured by Prime Polymer Co., Ltd., F707W) polymerized with a catalyst other than metallocene, and 25 parts by weight of a polymer type antistatic agent (manufactured by Ciba Specialty Chemicals, IRGASTAT P18) ) Melt and knead and make into pellets. The resin composition was used as an antistatic layer, and the above-mentioned block polypropylene resin (F7〇7W, manufactured by Prime Polymer Co., Ltd.) was used as a substrate layer, and a two-layer composite extrusion was carried out by a T-die (mold temperature: 220 Å). A film having an antistatic layer of 1 μm and a substrate layer of 30 μm was obtained by a casting roll of 2 ° C at a pulling speed of 5 m/min. The surface of the obtained film opposite to the antistatic layer was electrically charged. Halo discharge treatment, obtain antistatic film (J) 130902.doc •51 · 200911951 (antistatic film (κ)) Using a biaxial extruder (barrel set temperature: 220. 〇, 75 parts by weight A block polypropylene resin polymerized by a catalyst other than metal (manufactured by Polymer Co., Ltd., F7〇7w), and 25 parts by weight of a polymer type antistatic agent (manufactured by 八巴精化公司, IRGASTAT P18) melt-kneading And made into a pellet. The resin composition is used as an antistatic layer, and a random polypropylene resin polymerized by a metallocene catalyst (manufactured by Polypro Corporation, Japan,

Wlntech WFX4,熔點·· 125°C)作為基材層,利用T模(模具 孤度· 220 C)進行二層複合擠壓,通過⑼它之澆鑄輥,以$ m/min之牽引速度獲得抗靜電層為1〇 pm、基材層為π 之薄膜對所獲付之溥膜的與抗靜電層面相反之面進行電 暈放電處理,獲得抗靜電薄膜(K)。 (抗靜電薄膜(L)) 將經抗靜電處理之聚酯薄臈(三菱化學聚酯薄膜公司製 造,T100G,厚度:38 μιη)作為抗靜電薄膜(L)。 (抗靜電薄膜(M)) 利用雙軸擠壓機(料筒設定溫度:22(rc),將9〇重量份之 利用茂金屬觸媒而聚合之隨機聚丙烯樹脂(日本p〇lypr〇&amp; 司製造,Wintech WFX4,熔點:、及1〇重量份之並 非含有聚醚酯醯胺之高分子型抗靜電劑的抗靜電劑(第一 工業制藥公司製造,Resistat PE132 ’多元醇系衍生物)中 熔融混練,並製成顆粒化。將該樹脂組成物作為抗靜電 層,並將利用茂金屬觸媒而聚合之隨機聚丙烯樹脂(日本 Polypro公司製造,Wintech WFX4,熔點:125。〇作為基 130902.doc -52- 200911951 材層’利用T模(模具溫度:220°C )進行二層複合擠壓,通 過20°C之澆鑄輥,以5 m/min之牵引速度獲得抗靜電層為 10 μιη、基材層為3〇 μηι之薄膜。對所獲得之薄膜的與抗靜 電層面相反之面進行電暈放電處理,獲得抗靜電薄膜 (Μ)。 (抗靜電薄膜(Ν)) 利用雙軸擠壓機(料筒設定溫度:22〇。〇,將9〇重量份之 利用茂金屬觸媒而聚合之隨機聚丙烯樹脂(日本Ρο丨公 司製造,Wintech WFX4,熔點:125t)、及1〇重量份之並 非含有聚醚酯醯胺之高分子型抗靜電劑的抗靜電劑(三井_ 杜邦聚合化學公司製造,Entira MK400 ’離聚物)熔融混 練,並製成顆粒。將該樹脂組成物作為抗靜電層,並將利 用茂金屬觸媒而聚合之隨機聚丙烯樹脂(日本p〇lypr〇公司 製造,Wintech WFX4 ’熔點:125。〇作為基材層,利用τ 模(模具溫度:220°C)進行二層複合擠壓,通過2〇t:之澆鑄 輥,以5 m/min之牽引速度獲得抗靜電層為1〇 μηι、基材層 為3〇 pm之薄膜。對所獲得之薄膜的與抗靜電層面相反之 面進行電暈放電處理,獲得抗靜電薄膜(Ν)。 (抗靜電薄膜(〇)) 利用雙轴擠壓機(料筒設定溫度:22(rc),將40重量份之 利用茂金屬觸媒而聚合之隨機聚丙烯樹脂(日本polypro公 司製造,Wintech WFX4,熔點:125。〇、及6〇重量份之高 分子型抗靜電劑(汽巴精化公司製造,irgastat 熔 融混練,並製成顆粒。將該樹脂組成物作為抗靜電層,並 130902.doc -53- 200911951 將利用茂金屬觸媒而聚合之隨機聚丙烯樹脂(日本p〇lypr〇 公司製造,Wintech WFX4,熔點:125。〇作為基材層,利 用T模(模具溫度:220。〇進行二層複合擠壓,通過2〇。〇之 澆鑄輥,以5 m/min之牽引速度獲得抗靜電層為1〇 μηι、基 材層為30 μιη之薄膜。對所獲得之薄膜的與抗靜電層面相 反之面進行電暈放電處理,獲得抗靜電薄膜(〇)。 &lt;甲基(丙稀酸)系聚合物之製備&gt; (丙烯酸系聚合物(Α)) 於具備攪拌翼、溫度計、氮氣導入管、冷凝器之四口燒 瓶中,添加200重量份之丙烯酸2_乙基己酯、8重量份之丙 稀酸2-經基乙S旨、〇.4重量份之作為聚合起始劑的2,2,_偶氣 雙異丁腈、及312重量份之醋酸乙酯,一邊緩緩攪拌一邊 導入氮氣,將燒瓶内之液溫保持為65t:附近而進行約㈧、 時之聚合反應,製備丙烯酸系聚合物⑷溶液(4〇重量%)。 上述丙烯酸系聚合物(A)之重量平均分子量為5〇萬,玻璃 轉移溫度(Tg)為-68°C。 〇 (丙烯酸系聚合物 將由38重量份之丙烯酸2_乙基己酯、心重量份之甲基丙 烯酸正丁酯及2重量份之丙烯酸構成之單體混合物,:為 減劑的重量份之聚氧乙烯壬基苯基越及Μ重量份: 聚氧乙烯壬基苯基醚硫酸銨’以及80重量份之水乳化分 散。將該乳化物添加於具備溫度計、授掉機、氮氣導入; 及回流冷凝管之四口燒瓶中,於〇,〇2重量份之作為聚合: 始劑的2,2,-偶氮雙(2_脒基丙脒)二氫氯化物 〇你卜,於 I30902.doc •54- 200911951 50°C下進行7小時之乳化聚合。其後,添加氨水及水,調 整成固形分為40%、pH值為8.0,獲得丙烯酸系聚合物(B) 水分散體。所獲得之水分散體之粒徑為0.2 μιη。又,丙烯 酸系聚合物(Β)之溶劑不溶部分為92°/❶,溶劑可溶部分之分 子量為60萬’玻璃轉移溫度(;Tg)為_2rc。 [實施例1] (黏著劑溶液之製備)Wlntech WFX4, melting point · 125 ° C) as a substrate layer, a two-layer composite extrusion using a T-die (die density · 220 C), through (9) its casting rolls, at a traction speed of $ m / min A film having an electrostatic layer of 1 〇pm and a substrate layer of π was subjected to a corona discharge treatment on the opposite surface of the obtained ruthenium film opposite to the antistatic layer to obtain an antistatic film (K). (Antistatic film (L)) An antistatic film of polyester antimony (manufactured by Mitsubishi Chemical Polyester Film Co., Ltd., T100G, thickness: 38 μm) was used as an antistatic film (L). (Antistatic film (M)) Using a twin-screw extruder (cylinder set temperature: 22 (rc), 9 parts by weight of a random polypropylene resin polymerized by a metallocene catalyst (Japanese p〇lypr〇 & amp) Manufactured by Wintech WFX4, melting point: and 1 part by weight of antistatic agent which is not a polymeric antistatic agent containing polyether ester decylamine (manufactured by First Industrial Pharmaceutical Co., Ltd., Resistat PE132 'Polyol derived The product is melt-kneaded and granulated. The resin composition is used as an antistatic layer, and a random polypropylene resin (manufactured by Polypro, Japan, Wintech WFX4, melting point: 125. Base 130902.doc -52- 200911951 The material layer is subjected to two-layer composite extrusion using a T-die (die temperature: 220 ° C), and the antistatic layer is obtained by a casting roller at 20 ° C at a pulling speed of 5 m/min. 10 μηη, the substrate layer is a film of 3〇μηι. The surface of the obtained film opposite to the antistatic layer is subjected to corona discharge treatment to obtain an antistatic film (Μ). (Antistatic film (Ν)) Shaft extruder (barrel set temperature 22〇.〇, 9 parts by weight of a random polypropylene resin polymerized by a metallocene catalyst (manufactured by Nippon Co., Ltd., Wintech WFX4, melting point: 125t), and 1 part by weight of a polyether ester 醯An antistatic agent of an amine polymer type antistatic agent (Mitsui _ DuPont Polymer Chemical Co., Ltd., Entira MK400 'ionomer) is melt-kneaded and made into granules. The resin composition is used as an antistatic layer, and a metallocene is used. A random polypropylene resin polymerized by a catalyst (manufactured by Japan p〇lypr〇 Co., Ltd., Wintech WFX4 'melting point: 125. As a substrate layer, a two-layer composite extrusion was carried out by using a τ die (mold temperature: 220 ° C). 2〇t: The casting roll obtained a film with an antistatic layer of 1〇μηι and a substrate layer of 3〇pm at a pulling speed of 5 m/min. The surface of the obtained film opposite to the antistatic layer was electrically charged. Corona discharge treatment, obtaining an antistatic film (Ν). (Antistatic film (〇)) Using a biaxial extruder (cylinder set temperature: 22 (rc), 40 parts by weight of a metallocene catalyst was used for polymerization. Random polypropylene resin (Japanese polyp Made by ro company, Wintech WFX4, melting point: 125. 〇, and 6 〇 parts by weight of polymer antistatic agent (manufactured by Ciba Specialty Chemicals Co., Ltd., irgastat melt-kneaded, and granulated. The resin composition is used as an antistatic layer. And 130902.doc -53- 200911951 A random polypropylene resin polymerized by a metallocene catalyst (manufactured by P. Lypr, Japan, Wintech WFX4, melting point: 125). 〇 As the substrate layer, the T-die (mold temperature: 220. 二 two-layer composite extrusion, through 2 〇. 浇 casting roller, at 5 m / min traction speed to obtain antistatic layer is 1 〇 μηι, base The material layer is a film of 30 μm. The surface of the obtained film opposite to the antistatic layer is subjected to corona discharge treatment to obtain an antistatic film (〇). &lt;Preparation of methyl (acrylic) polymer> (Acrylic polymer (Α)) In a four-necked flask equipped with a stirring blade, a thermometer, a nitrogen gas introduction tube, and a condenser, 200 parts by weight of 2-ethylhexyl acrylate and 8 parts by weight of acrylic acid 2 were added. - 2,2,_dioxane diisobutyronitrile as a polymerization initiator, and 312 parts by weight of ethyl acetate as a polymerization initiator, and introducing nitrogen gas while stirring slowly, the flask was introduced The liquid temperature in the vicinity was maintained at 65 t: in the vicinity, and polymerization was carried out at about (8), to prepare a solution of the acrylic polymer (4) (4% by weight). The weight average molecular weight of the acrylic polymer (A) was 50,000. The glass transition temperature (Tg) is -68 ° C. 〇 (acrylic polymer will be 38 a monomer mixture of 2-ethylhexyl acrylate, n-butyl methacrylate in a weight part by weight, and 2 parts by weight of acrylic acid: a part by weight of the polyoxyethylene nonylphenyl group as a weight reducing agent Μ by weight: polyoxyethylene nonylphenyl ether ammonium sulfate' and 80 parts by weight of water are emulsified and dispersed. The emulsion is added to a four-necked flask equipped with a thermometer, a transfer machine, a nitrogen gas introduction, and a reflux condenser. 〇 〇, 〇 2 parts by weight as a polymerization: 2,2,-azobis(2-mercaptopropyl hydrazine) dihydrochloride of the starting agent, at I30902.doc •54- 200911951 50°C The emulsion polymerization was carried out for 7 hours. Thereafter, aqueous ammonia and water were added to adjust the solid content to 40% and the pH was 8.0 to obtain an aqueous dispersion of the acrylic polymer (B). The particle size of the obtained aqueous dispersion was Further, the solvent-insoluble portion of the acrylic polymer (Β) was 92°/❶, and the molecular weight of the solvent-soluble portion was 600,000'. The glass transition temperature (Tg) was _2rc. [Example 1] (Adhesive) Preparation of agent solution)

以醋酸乙酯將上述丙烯酸系聚合物(A)溶液(4〇重量%)稀 釋成20重量%,於100重量份之該溶液中添加〇 8重量份之 六亞甲基二異氰酸酯之異氰尿酸酯體(日本聚胺酯工業公 司製造,Coronate HX)、及0.4重量份之作為交聯觸媒的二 月桂酸二丁基錫(1重量%醋酸乙酯溶液),於常溫(25。〇下 進行約1分鐘之混合攪拌,製備丙烯酸系黏著劑溶液(1)。 (黏著片材之製作) 將上述丙烯酸系黏著劑溶液(丨)塗佈於單面實施有聚矽 氧處理之聚對苯二甲酸乙二醋薄膜(厚度為25㈣的聚石夕 氧處理面,於⑽下加熱3分鐘,形成厚度為2〇 _之黏 著劑層。將上述黏著劑層貼合於如上所製作之抗靜電薄膜 (A)之電暈處理面,製作黏著片材。 [實施例2] (黏著片材之製作) 以 除使用抗靜電薄膜(B)代替上述抗靜電薄 與實施例1相同之方式,製作黏著片材。 [實施例3 ] 130902.doc -55- 200911951 (黏著片材之製作) 除使用抗靜電薄膜(C)代替上述抗靜電薄膜(A)之外,以 與實施例1相同之方式,製作黏著片材。 [實施例4] (黏著片材之製作) 除使用抗靜電薄膜(D)代替上述抗靜電薄膜(A)之外,以 與實施例1相同之方式,製作黏著片材。 [實施例5] (黏著片材之製作) 除使用抗靜電薄膜(E)代替上述抗靜電薄膜(A)之外,以 與實施例1相同之方式,製作黏著片材。 [實施例6 ] (黏著片材之製作) 除使用抗靜電薄臈(F)代替上述抗靜電薄臈(A)之外,以 與實施例1相同之方式,製作黏著片材。 [實施例7] (黏著劑溶液之製備) 直接使用上述丙烯酸系聚合物(B)水分散體(4〇重量%), 於其中,針對每100重量份之聚合物固形分添加4重量份之 含呤唑啉基的水溶性交聯劑(日本觸媒公司製造,Epocr〇s WS500’十坐琳值:22〇),於常溫(25t:)下進行約】分鐘之 混合攪拌,製備丙烯酸黏著劑水分散體(2)。 (黏著片材之製作) 將上述丙烯酸黏著劑水分散體(2)塗佈於如上所製作之 130902.doc -56- 200911951 抗靜電薄膜(A)之電暈處理面上,於90〇c下加熱3分鐘,形 成厚度為5 μιη之黏著劑層。繼而,於上述黏著劑層之表面 貼合未經處理之聚乙烯薄膜(厚度為6〇 μηι),製作黏著片 材。 [實施例8 ] (黏著片材之製作) 除使用抗靜電薄膜(F)代替上述抗靜電薄膜(Α)之外,以 與實施例7相同之方式,製作黏著片材。The above acrylic polymer (A) solution (4% by weight) was diluted to 20% by weight with ethyl acetate, and 8 parts by weight of hexamethylene diisocyanate isocyanuric was added to 100 parts by weight of the solution. An acid ester body (manufactured by Nippon Polyurethane Industry Co., Ltd., Coronate HX), and 0.4 parts by weight of dibutyltin dilaurate (1% by weight ethyl acetate solution) as a crosslinking catalyst, and about 1 at room temperature (25. The acrylic adhesive solution (1) was prepared by mixing and stirring for a minute. (Preparation of Adhesive Sheet) The above-mentioned acrylic adhesive solution (丨) was applied to a polyethylene terephthalate which was subjected to polyfluorination treatment on one side. A vinegar film (a layer of 25 (four) having a thickness of 25 (4) was heated at (10) for 3 minutes to form an adhesive layer having a thickness of 2 Å. The above adhesive layer was applied to the antistatic film prepared as above (A). [Embodiment 2] (Production of Adhesive Sheet) An adhesive sheet was produced in the same manner as in Example 1 except that the antistatic film (B) was used instead of the above antistatic film. [Embodiment 3] 130902.doc -55- 200911951 (Production of Adhesive Sheet) An adhesive sheet was produced in the same manner as in Example 1 except that the antistatic film (C) was used instead of the above antistatic film (A). [Example 4] (Adhesive sheet) Preparation) An adhesive sheet was produced in the same manner as in Example 1 except that the antistatic film (D) was used instead of the above antistatic film (A). [Example 5] (Production of adhesive sheet) Except for use An adhesive sheet was produced in the same manner as in Example 1 except that the antistatic film (E) was used instead of the above antistatic film (A). [Example 6] (Production of adhesive sheet) In addition to using an antistatic thin film ( F) An adhesive sheet was produced in the same manner as in Example 1 except that the above antistatic thin ruthenium (A) was used. [Example 7] (Preparation of Adhesive Solution) The above acrylic polymer (B) was directly used. An aqueous dispersion (4% by weight) in which 4 parts by weight of a oxazoline group-containing water-soluble crosslinking agent (manufactured by Nippon Shokubai Co., Ltd., Epocr〇s WS500') is added per 100 parts by weight of the polymer solid content. Ten sitting value: 22〇), under normal temperature (25t:) Acrylic adhesive aqueous dispersion (2) was prepared by mixing with a bell. (Preparation of adhesive sheet) The above aqueous acrylic adhesive dispersion (2) was applied to 130902.doc -56-200911951 as described above. The corona-treated surface of the film (A) was heated at 90 ° C for 3 minutes to form an adhesive layer having a thickness of 5 μm. Then, an untreated polyethylene film (thickness) was attached to the surface of the above adhesive layer. An adhesive sheet was prepared for 6 〇 μηι. [Example 8] (Production of adhesive sheet) In the same manner as in Example 7, except that an antistatic film (F) was used instead of the above-mentioned antistatic film (Α) , making adhesive sheets.

[比較例1 ] (黏著片材之製作) 將上述丙;If酸系黏著劑溶液⑴塗佈於^面實施有聚石夕 氧處理之聚對苯二甲酸乙二酿薄膜(厚度為25㈣的聚石夕 乳處理面上,於11G°C下加熱3分鐘,形成厚度為2〇 _之 黏著劑層。將上述黏著劑層貼合於如上所製作之未經抗靜 電處理之薄膜⑹之電暈處理面,製作黏著片材。 [比較例2] (黏著片材之製作) 除使用未經抗靜電處理 溥膜(H)代替上述未經抗靜電 處里之薄膜(G)之外,以斑 片材。 ”比較例1相同之方式,製作黏著 [比較例3] (黏著片材之製作) 除使用未經抗靜電處理 理之笼植^、 溥膜⑴代替上述未經抗靜電處 埋之溥膜(G)之外,以與 ^ 車例1相同之方式,製作黏著片 130902.doc -57· 200911951 材。 [比較例4] (黏著片材之製作) 之薄臈 除使用抗靜電薄膜⑺代替上述未經抗靜電處理 ⑼之外’以與比較例i相同之方式,製作黏著片材 [比較例5] (黏著片材之製作)[Comparative Example 1] (Production of Adhesive Sheet) The above-mentioned C; If acid-based adhesive solution (1) was applied to a polyethylene terephthalate film having a thickness of 25 (four). The poly-stone treatment surface was heated at 11 G ° C for 3 minutes to form an adhesive layer having a thickness of 2 Å. The adhesive layer was attached to the non-antistatic treated film (6) as described above. The surface of the halo was treated to prepare an adhesive sheet. [Comparative Example 2] (Production of Adhesive Sheet) Except that the film (G) which was not subjected to antistatic treatment was used instead of the film (G) which was not in the above-mentioned antistatic place, Spotted sheet. "Comparative Example 1 was prepared in the same manner as in Comparative Example 3 [Comparative Example 3] (Production of Adhesive Sheet) In addition to the use of cages without antistatic treatment, the enamel film (1) was replaced by the above-mentioned non-antistatic burying. In addition to the ruthenium film (G), an adhesive sheet 130902.doc-57·200911951 was produced in the same manner as in Example 1. [Comparative Example 4] (Production of adhesive sheet) Except for using antistatic The film (7) was made in the same manner as in Comparative Example i instead of the above-mentioned antistatic treatment (9). Sheet [Comparative Example 5] (Production of adhesive sheet)

除使用抗靜電薄膜(K)代替上述抗靜電薄膜(G)之外,以 與比較例1相同之方式,製作黏著片材。 [比較例6] (黏著片材之製作) #將上述丙烯酸系黏著劑溶液⑴塗佈於單面實施有聚石夕 乳處理之聚對苯二甲酸乙二醋薄膜(厚度為25 _的聚石夕 氧?理面上,於UCTC下加熱3分鐘,形成厚度為2〇 _之 黏著劑層。將上述黏著劑層貼合於如上所製作之抗靜電薄 膜(L)之與抗靜電處理面相反之面,製作黏著片材。‘ [比較例7] (黏著片材之製作) 除使用抗靜電薄膜(Μ)代替上述未經抗靜電處理之薄臈 (G)之外,以與比較例i相同之方式,製作黏著片材。 [比較例8] (黏著片材之製作) 除使用抗靜電薄臈(N)代替上述未經抗靜電處理之薄臈 (G)之外’以與比較例1相同之方式,製作黏著片材。 130902.doc -58- 200911951 [參考例1 ] (黏著片材之製作) 除使用抗靜電薄膜⑼代替上述抗靜電薄膜⑷之外 與實施例1相同之方式,製作黏著片材。 針對上述實施例'比較例及參考例中所獲得之黏 材’以如下要領進行全光線透過率、霧度、表面電阻率、 黏著力及抗污染性之測定·評價。 &lt;全光線透過率之測定&gt;An adhesive sheet was produced in the same manner as in Comparative Example 1, except that the antistatic film (K) was used instead of the above antistatic film (G). [Comparative Example 6] (Production of Adhesive Sheet) # Apply the above-mentioned acrylic adhesive solution (1) to a polyethylene terephthalate film (concentration of 25 Å) which was treated with a polylithic treatment on one side. On the shixi oxygen surface, it was heated under UCTC for 3 minutes to form an adhesive layer having a thickness of 2 〇. The adhesive layer was bonded to the antistatic film (L) and the antistatic treated surface prepared as described above. On the contrary, an adhesive sheet was produced. '[Comparative Example 7] (Production of Adhesive Sheet) In addition to the use of an antistatic film (Μ) instead of the above-mentioned antistatically treated thin crucible (G), i. The adhesive sheet was produced in the same manner. [Comparative Example 8] (Production of Adhesive Sheet) In addition to using the antistatic thin crucible (N) instead of the above-mentioned non-antistatic treated thin crucible (G) The adhesive sheet was produced in the same manner as in Example 1. 130902.doc -58- 200911951 [Reference Example 1] (Production of Adhesive Sheet) The same as Example 1 except that the antistatic film (9) was used instead of the above antistatic film (4). In the manner of making the adhesive sheet, the above examples are obtained in the comparative example and the reference example. The sticky material 'is measured in the following essentials transmittance, haze, surface resistivity, stain resistance and adhesive force and evaluation of total light &lt;. Total light transmittance of &gt;

全光線透過率之測定係根據JIS K7361「塑膠-透明材料 之全光線透過率的測試方法」所規定之方法,I用霧度計 (村上色彩技術研究所製造,型)進行。 &lt;霧度之測定&gt; 霧度之測定係根據JIS K7136「塑膠·透明材料之霧度的 求出方法」所規定之方法’使用霧度計(村上色彩技術研 究所製造,HM-1 5 0型)進行。 &lt;初始表面電阻率之測定&gt; 初始表面電阻率之測定係根據JIS K69U「熱硬化性塑The measurement of the total light transmittance was carried out in accordance with the method specified in JIS K7361 "Testing method for total light transmittance of plastic-transparent materials", and I was carried out by a haze meter (manufactured by Murakami Color Research Institute). &lt;Measurement of Haze&gt; The measurement of the haze is based on the method specified in JIS K7136, "Method for Determining the Haze of Plastic and Transparent Materials", using a haze meter (manufactured by Murakami Color Research Institute, HM-1 5) Type 0). &lt;Measurement of initial surface resistivity&gt; The initial surface resistivity was measured according to JIS K69U "Thermal hardening plastic"

膠通常測試方法」所規定之方法,使用敎器(東亞DKK 公司製造’ DSM-8103)’測定抗靜電層表面之電阻值⑷/⑴ 而進行。將施加電壓設為500 v,測定電壓施加後經過3〇 秒後之值。關於測定環境,係於溫度為23^、相對濕度為 50% RH之環境下測定。 &lt;水洗後表面電阻率之測定&gt; 將黏著片材浸潰於40。(:之溫水中3〇分鐘後,利用碎布擦 130902.doc -59- 200911951 去水,其後,於溫度為23°C、相對濕度為50% RH之環境 下放置2小時,製成評價用樣品。根據JIS K6911「熱硬化 性塑膠通常測試方法」所規定之方法,使用測定器(東亞 DKK公司製造,DSM-8103),對上述樣品測定抗靜電層表 面之電阻值(Ω/口)。將施加電壓設為500 V,測定電壓施加 後經過30秒後之值。關於測定環境,係於溫度為23°C、相 對濕度為50% RH之環境下測定。 &lt;黏著力之測定&gt; 將黏著片材切割成寬度為25 mm,以78.5 N/cm之線性壓 力貼合於丙烯酸樹脂板(三菱麗陽公司製造,「Acrylite L」),30分鐘後於拉伸速度為300 mm/min、剝離角度為 1 80°之條件下,利用拉伸測試機測定黏著力。 &lt;抗污染性之評價&gt; 於黏著片材之抗靜電層上貼合黏著膠帶No. 31B(日東電 工公司製造)之黏著面,使No. 3 1B之丙烯酸系黏著劑附著 於抗靜電層後,用碎布輕輕擦拭,確認是否可除去黏著 劑。可除去之情形時評價為◦,無法除去之情形時評價為 上述結果示於表1及表2。 [表1] 基材層 抗, 爭電層 樹脂 厚度 [μηιΐ 樹脂 抗靜電層 厚度 _ 抗靜電薄膜(A) 隨機聚丙烯Wintech WFX4 30 隨機聚丙烯Wintech WFX4 IRGASTAT P18 10 抗靜電薄膜(B) 隨機聚丙烯Wintech WFX4 30 隨機聚丙稀Wintech WFX4 IRGASTAT P18 10 130902.doc -60- 200911951 抗靜電薄膜(c) 隨機聚丙烯Wintech WFX4 30 隨機聚丙稀Wintech ~~-__WFX4 IRGASTAT P18 10 抗靜電薄膜(D) 隨機聚丙稀Wintech WFX4 30 隨機聚丙烯F327 IRGASTAT P18 10 抗靜電薄膜(E) 隨機聚丙烯F327 30 隨機聚丙烯F327 IRGASTAT P18 10 抗靜電薄膜(F) 均質聚丙烯 ZS1327A 30 均質聚丙烯 ZS1327A IRGASTAT P18 10 未經抗靜電處理之 薄膜(G) 隨機聚丙烯Wintech WFX4 30 無 - - 未經抗靜電處理之 薄膜(H) 均質聚丙烯 ZS1327A 30 無 - - 未經抗靜電處理之 薄膜(I) 隨機聚丙烯F327 30 無 - - 抗靜電薄膜(J) 嵌段聚丙烯F707W 30 嵌段聚丙烯F707W IRGASTAT P18 10 抗靜電薄膜(K) 隨機聚丙烯Wintech WFX4 30 嵌段聚丙烯F707W IRGASTAT P18 10 抗靜電薄膜(L) 抗靜電處理PET 38 - - - 抗靜電薄膜(M) 隨機聚丙稀Wintech WFX4 30 隨機聚丙烯Wintech WFX4 Resistat PE132 10 抗靜電薄膜(N) 隨機聚丙稀Wintech WFX4 30 隨機聚丙烯Wintech WFX4 Entira MK400 10 抗靜電薄膜(〇) 隨機聚丙稀Wintech WFX4 30 隨機聚丙烯Wintech WFX4 IRGASTAT P18 10 [表2] 全光線透過 率[%] 表面電阻率 勒始黏著力 [Ν/25 mm] 霧度[%] 初始表面電 阻率[Ω/匚]] 水洗後表面電 阻率[Ω/QI 抗污染性[-] 實施例1 92.3 5.0 3.7xl010 3.lxl〇10 0.3 〇 實施例2 92.3 5.8 3_6xl010 2.5x10〗。 0.3 〇 實施例3 92.5 6.3 4.9xl09 5.9x109 0.3 〇 實施例4 92.3 8.5 2_7xl010 1.9xl〇10 0.3 〇 實施例5 92.4 6.4 1.7xlO,0 1.4xl010 0.3 〇 實施例6 92.1 ------ 8.5 1.5xl010 1.4xl010 0.3 〇 實施例7 92.2 — 5.7 3.7xl010 3.1xl〇10 1.2 〇 實施例8 92.0 8.5 l_5xl010 1.4xl010 2.2 〇 比較例1 92.6 1.6 lxlO14以上 未測定 0.3 〇 比較例2 92.8 1.5 lxlO14以上 未測定 0.3 〇 比較例3 92.6 2.0 lxlO14以上 未測定 0.3 〇 比較例4 91.3 18.8 1.5xl〇10 1.4X101。 0.4 〇 比較例5 91.5 ----------------- 21.6 1.5xl〇10 1.6xl〇10 0.3 〇 130902.doc -61 - 200911951 比較例6 90.7 2.1 4.8xl〇9 未測定 0.1 X 比較例7 92.2 1.2 1.5xl〇n 1.8xl012 0.3 〇 比較例8 90.5 40.5 lxlO14以上 未測定1 0.3 〇 參考例1 91.4 14.9 l.lxlO9 5.9xl〇'° 0.3 〇 自上述表1及2之結果可知’使用根據本發明而製作之黏 著片材之情形時(實施例丨〜8),任一實施例中,透明性尤 其優異,以及抗靜電性優異。進而可知,任一實施例中抗 污染功能均優異。The method specified in the "General Test Method for Glue" was carried out by measuring the resistance value (4) / (1) of the surface of the antistatic layer using a crucible (manufactured by Toa DKK Corporation, DSM-8103). The applied voltage was set to 500 v, and the value after 3 seconds passed after the voltage application was measured. The measurement environment was measured in an environment having a temperature of 23 ° and a relative humidity of 50% RH. &lt;Measurement of surface resistivity after washing&gt; The adhesive sheet was impregnated at 40. (: After 3 minutes in warm water, use a rag to wipe 130902.doc -59- 200911951 to remove water, then place it in an environment with a temperature of 23 ° C and a relative humidity of 50% RH for 2 hours. For the above sample, the resistance value (Ω/□) of the surface of the antistatic layer was measured using a measuring instrument (DSM-8103, manufactured by Toa DKK Co., Ltd.) according to the method specified in JIS K6911 "Testing methods for thermosetting plastics". The applied voltage was set to 500 V, and the value after 30 seconds after the application of the voltage was measured. The measurement environment was measured in an environment of a temperature of 23 ° C and a relative humidity of 50% RH. &lt;Measurement of adhesion force &gt The adhesive sheet was cut into a width of 25 mm and bonded to an acrylic plate ("Acrylite L" manufactured by Mitsubishi Rayon Co., Ltd.) at a linear pressure of 78.5 N/cm. The tensile speed was 300 mm after 30 minutes. Min, the peeling angle was 180 °, and the adhesion was measured by a tensile tester. &lt;Evaluation of antifouling&gt; Adhesive tape No. 31B was adhered to the antistatic layer of the adhesive sheet (Nitto Denko Corporation) Manufactured by the adhesive side, making No. 3 1B acrylic After the adhesive adhered to the antistatic layer, it was gently wiped with a rag to confirm whether or not the adhesive could be removed. When it was removed, it was evaluated as ◦, and when it could not be removed, the above results were evaluated in Tables 1 and 2. Table 1] Substrate layer resistance, dielectric layer resin thickness [μηιΐ resin antistatic layer thickness _ antistatic film (A) random polypropylene Wintech WFX4 30 random polypropylene Wintech WFX4 IRGASTAT P18 10 antistatic film (B) random polypropylene Wintech WFX4 30 Random Polypropylene Wintech WFX4 IRGASTAT P18 10 130902.doc -60- 200911951 Antistatic Film (c) Random Polypropylene Wintech WFX4 30 Random Polypropylene Wintech ~~-__WFX4 IRGASTAT P18 10 Antistatic Film (D) Random Polypropylene Wintech WFX4 30 random polypropylene F327 IRGASTAT P18 10 antistatic film (E) random polypropylene F327 30 random polypropylene F327 IRGASTAT P18 10 antistatic film (F) homogeneous polypropylene ZS1327A 30 homogeneous polypropylene ZS1327A IRGASTAT P18 10 without antistatic Treated film (G) Random polypropylene Wintech WFX4 30 None - - Antistatic treated film (H) Homogenized polypropylene ZS1327A 30 No - - Film without antistatic treatment (I) Random polypropylene F327 30 None - - Antistatic film (J) Block polypropylene F707W 30 Block polypropylene F707W IRGASTAT P18 10 Antistatic film (K) Random polypropylene Wintech WFX4 30 Block Polypropylene F707W IRGASTAT P18 10 Antistatic Film (L) Antistatic Treatment PET 38 - - - Antistatic Film (M) Random Polypropylene Wintech WFX4 30 Random Polypropylene Wintech WFX4 Resistat PE132 10 Antistatic Film (N) Random Polypropylene Rare Wintech WFX4 30 Random Polypropylene Wintech WFX4 Entira MK400 10 Antistatic Film (〇) Random Polypropylene Wintech WFX4 30 Random Polypropylene Wintech WFX4 IRGASTAT P18 10 [Table 2] Total Light Transmittance [%] Surface Resistivity Initial Adhesion [Ν/25 mm] Haze [%] Initial surface resistivity [Ω/匚]] Surface resistivity after washing [Ω/QI Pollution resistance [-] Example 1 92.3 5.0 3.7xl010 3.lxl〇10 0.3 〇 Example 2 92.3 5.8 3_6xl010 2.5x10〗. 0.3 〇Example 3 92.5 6.3 4.9xl09 5.9x109 0.3 〇Example 4 92.3 8.5 2_7xl010 1.9xl〇10 0.3 〇Example 5 92.4 6.4 1.7xlO,0 1.4xl010 0.3 〇Example 6 92.1 ------ 8.5 1.5 Xl010 1.4xl010 0.3 〇Example 7 92.2 — 5.7 3.7xl010 3.1xl〇10 1.2 〇Example 8 92.0 8.5 l_5xl010 1.4xl010 2.2 〇Comparative Example 1 92.6 1.6 lxlO14 or more not measured 0.3 〇Comparative Example 2 92.8 1.5 lxlO14 or more not determined 0.3 〇Comparative Example 3 92.6 2.0 lxlO14 or more not determined 0.3 〇Comparative Example 4 91.3 18.8 1.5xl〇10 1.4X101. 0.4 〇Comparative Example 5 91.5 ----------------- 21.6 1.5xl〇10 1.6xl〇10 0.3 〇130902.doc -61 - 200911951 Comparative Example 6 90.7 2.1 4.8xl〇9 Not determined 0.1 X Comparative Example 7 92.2 1.2 1.5xl〇n 1.8xl012 0.3 〇Comparative Example 8 90.5 40.5 lxlO14 or more Not determined 1 0.3 〇Reference Example 1 91.4 14.9 l.lxlO9 5.9xl〇'° 0.3 〇From Tables 1 and 2 above As a result, it was found that [in the case of using the adhesive sheet produced according to the present invention (Examples 丨 8), in any of the examples, the transparency was particularly excellent, and the antistatic property was excellent. Further, it is understood that the anti-contamination function is excellent in any of the examples.

130902.doc -62-130902.doc -62-

Claims (1)

200911951 十、申請專利範圍·· 丨.一種再剝離型黏著片材,其特徵在於:其係於基材層之 其中冑面上具備黏著劑層、於另一個面上具備抗靜電 層者且上述抗靜電層含有包含聚鍵自旨酿胺之高分子型 抗*静·電劑。 2. 3. 4. 5. 士广求項1之再剝離型黏著片材,其中上述高分子型抗 靜電劑進一步含有聚醯胺纖維。 如請求項㈤之再剝離型黏著片材,其中高分子型抗靜 電劑進一步含有無機鹽及/或有機鹽。 月求項1至3中任-項之再剝離型黏著片材,其中上述 抗靜電層含有丙烯樹脂。 如請求項丨至4中任—項之再剝離型黏著片材,其中上述 :靜電層含有丙烯均聚物及/或丙烯·α,烴隨機共聚 6.200911951 X. Patent Application Scope · A re-peelable adhesive sheet characterized in that it is provided with an adhesive layer on the surface of the substrate layer and an antistatic layer on the other surface. The antistatic layer contains a polymer type antistatic agent containing a poly bond from the amine. 2. 3. 4. 5. The re-peelable adhesive sheet of the above-mentioned item 1, wherein the above-mentioned polymer type antistatic agent further contains polyamide fibers. The re-peelable adhesive sheet according to the item (5), wherein the polymer type antistatic agent further contains an inorganic salt and/or an organic salt. A re-peelable adhesive sheet according to any one of items 1 to 3, wherein the antistatic layer contains an acrylic resin. The re-peelable adhesive sheet according to any one of the preceding claims, wherein: the electrostatic layer contains propylene homopolymer and/or propylene·α, and the hydrocarbon is randomly copolymerized. 如請求項1至5中任-項之再剝離型黏著片材 抗靜電層含有使用茂金屬觸媒而聚合之 共聚物。 ,其中上述 α-烯烴隨機 °明’項1至6中任-項之再剝離型黏著片材 基材層包含丙稀樹月I 8.如。月求項1至7中任—項之再 i ^ ® , A 舶考片材,其中上述 土材層係包含丙烯均聚物及/ 物。 飞内琊‘烯烴隨機共聚 9. 如請求項1至8中任一 基材層係包含使用茂 3々何,其中上 金屬觸媒而聚合之%比 來口 &lt;丙烯·α-烯烴隨 130902.doc 200911951 共聚物。 10.如請求項1至9中任—項之再剝離型黏著片材,其中上述 黏著劑層包含(甲基)丙烯酸系聚合物,該(甲基)丙烯酸 系聚合物係以具有碳數為丨〜】4之烷基的丙烯酸酯及/或尹 基丙烯酸酯之1種或2種以上為主成分。 1 1. 12. :::項1〇之再剝離型勒著片材,其中上述黏著❹传 :(甲基)丙烯酸系聚合物交聯而獲得者。 … 如屿求項1至〗丨中任一 光學構件之表面保護。、_型黏著片材’其用於 130902.doc 200911951 七、指定代表圖: (一) 本案指定代表圖為:(無)。 (二) 本代表圖之元件符號簡單說明: 八、本案若有化學式時,請揭示最能顯示發明特徵的化學式: (無) C, 130902.docThe re-peelable adhesive sheet according to any one of claims 1 to 5, wherein the antistatic layer contains a copolymer polymerized using a metallocene catalyst. The re-peelable adhesive sheet substrate layer of any one of the above-mentioned α-olefins, wherein any of the above items 1 to 6 contains propylene tree I 8. In the first and second sub-items 1 to 7, the i ^ ® , A test sheet, wherein the soil layer comprises propylene homopolymer and/or material. Random olefin olefin copolymerization 9. The substrate layer according to any one of claims 1 to 8 comprises the use of lanthanum 3, wherein the upper metal catalyst is polymerized in proportion to the mouth &lt; propylene·α-olefin with 130902 .doc 200911951 Copolymer. The re-peelable adhesive sheet according to any one of claims 1 to 9, wherein the adhesive layer comprises a (meth)acrylic polymer having a carbon number of One or two or more kinds of acrylates and/or cyanoacrylates of the alkyl group of 4 to 4 are mainly composed. 1 1. 12. ::: Item 1 再 Re-peeling type sheet, wherein the above-mentioned adhesive ❹ is obtained by crosslinking (meth)acrylic polymer. ... The surface protection of any optical component in the case of item 1 to 〖丨. _ type adhesive sheet' is used for 130902.doc 200911951 VII. Designation of representative drawings: (1) The representative representative of the case is: (none). (2) A brief description of the symbol of the representative figure: 8. If there is a chemical formula in this case, please disclose the chemical formula that best shows the characteristics of the invention: (none) C, 130902.doc
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