TW200904899A - Composition and method of forming protecting film, laminate and method for manufacturing same - Google Patents
Composition and method of forming protecting film, laminate and method for manufacturing same Download PDFInfo
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- TW200904899A TW200904899A TW097112932A TW97112932A TW200904899A TW 200904899 A TW200904899 A TW 200904899A TW 097112932 A TW097112932 A TW 097112932A TW 97112932 A TW97112932 A TW 97112932A TW 200904899 A TW200904899 A TW 200904899A
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- Prior art keywords
- group
- active energy
- energy ray
- parts
- protective film
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- 239000000203 mixture Substances 0.000 title claims abstract description 104
- 238000000034 method Methods 0.000 title claims abstract description 33
- 238000004519 manufacturing process Methods 0.000 title description 3
- -1 alkyl silicate series Chemical class 0.000 claims abstract description 112
- 239000002253 acid Substances 0.000 claims abstract description 26
- 125000003118 aryl group Chemical group 0.000 claims abstract description 16
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- 125000000962 organic group Chemical group 0.000 claims abstract description 11
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 10
- 239000000758 substrate Substances 0.000 claims abstract description 10
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- MBAKFIZHTUAVJN-UHFFFAOYSA-I hexafluoroantimony(1-);hydron Chemical compound F.F[Sb](F)(F)(F)F MBAKFIZHTUAVJN-UHFFFAOYSA-I 0.000 description 5
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- LSTZTHCEEPHCNQ-UHFFFAOYSA-N 3-(2,5-dioxabicyclo[2.1.0]pentan-3-yloxy)-2,5-dioxabicyclo[2.1.0]pentane Chemical compound C1(C2C(O2)O1)OC1C2C(O2)O1 LSTZTHCEEPHCNQ-UHFFFAOYSA-N 0.000 description 4
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- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
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- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
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- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 1
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- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 1
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- YLHXLHGIAMFFBU-UHFFFAOYSA-N methyl phenylglyoxalate Chemical compound COC(=O)C(=O)C1=CC=CC=C1 YLHXLHGIAMFFBU-UHFFFAOYSA-N 0.000 description 1
- 229940017219 methyl propionate Drugs 0.000 description 1
- JZMJDSHXVKJFKW-UHFFFAOYSA-N methyl sulfate Chemical compound COS(O)(=O)=O JZMJDSHXVKJFKW-UHFFFAOYSA-N 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- MJFVSNHXRYJOLC-UHFFFAOYSA-N n-amino-n-benzylhydroxylamine Chemical compound NN(O)CC1=CC=CC=C1 MJFVSNHXRYJOLC-UHFFFAOYSA-N 0.000 description 1
- UVDCUKIODQWCPR-UHFFFAOYSA-N n-amino-n-phenylhydroxylamine Chemical compound NN(O)C1=CC=CC=C1 UVDCUKIODQWCPR-UHFFFAOYSA-N 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
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- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- OROJFILAYVDTTR-UHFFFAOYSA-N oxirane;4-(2-phenylpropan-2-yl)phenol Chemical compound C1CO1.C=1C=C(O)C=CC=1C(C)(C)C1=CC=CC=C1 OROJFILAYVDTTR-UHFFFAOYSA-N 0.000 description 1
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 description 1
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- 239000001301 oxygen Substances 0.000 description 1
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- FZUGPQWGEGAKET-UHFFFAOYSA-N parbenate Chemical compound CCOC(=O)C1=CC=C(N(C)C)C=C1 FZUGPQWGEGAKET-UHFFFAOYSA-N 0.000 description 1
- 229940059574 pentaerithrityl Drugs 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
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- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 1
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- 235000019260 propionic acid Nutrition 0.000 description 1
- 125000005767 propoxymethyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])[#8]C([H])([H])* 0.000 description 1
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- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
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- 230000009257 reactivity Effects 0.000 description 1
- 230000035807 sensation Effects 0.000 description 1
- 229940076279 serotonin Drugs 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- PNGLEYLFMHGIQO-UHFFFAOYSA-M sodium;3-(n-ethyl-3-methoxyanilino)-2-hydroxypropane-1-sulfonate;dihydrate Chemical compound O.O.[Na+].[O-]S(=O)(=O)CC(O)CN(CC)C1=CC=CC(OC)=C1 PNGLEYLFMHGIQO-UHFFFAOYSA-M 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- LRBQNJMCXXYXIU-NRMVVENXSA-N tannic acid Chemical compound OC1=C(O)C(O)=CC(C(=O)OC=2C(=C(O)C=C(C=2)C(=O)OC[C@@H]2[C@H]([C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)O2)OC(=O)C=2C=C(OC(=O)C=3C=C(O)C(O)=C(O)C=3)C(O)=C(O)C=2)O)=C1 LRBQNJMCXXYXIU-NRMVVENXSA-N 0.000 description 1
- 229940033123 tannic acid Drugs 0.000 description 1
- 235000015523 tannic acid Nutrition 0.000 description 1
- 229920002258 tannic acid Polymers 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- BSYVTEYKTMYBMK-UHFFFAOYSA-N tetrahydrofurfuryl alcohol Chemical compound OCC1CCCO1 BSYVTEYKTMYBMK-UHFFFAOYSA-N 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 230000003442 weekly effect Effects 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/045—Polysiloxanes containing less than 25 silicon atoms
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/63—Additives non-macromolecular organic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
- C08K5/37—Thiols
- C08K5/375—Thiols containing six-membered aromatic rings
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Paints Or Removers (AREA)
- Laminated Bodies (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Silicon Polymers (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
Description
200904899 九、發明說明: 【發明所屬之技術領域】 本發明係有關於一種能夠在短時間形成耐擦傷性的優 良透明保護被膜之保護被膜形成方法、該方法所使用的組 成物及形成該保護被膜而成的積層體與其製法。 【先前技術】 近年來,耐破碎性、輕量性優良的丙烯酸樹脂、聚碳 酸酯樹脂等透明塑膠材料被廣泛地使用來代替透明玻璃。 但是因爲透明塑膠材料與玻璃比較時,表面硬度較低,會 有表面容易受傷之問題。 因此’以往爲了改良塑膠材料的耐擦傷性,已進行許 多的嘗試。最通常的方法之一,有一種廣被悉的方法(參照 專利文獻1、2),係利用烷氧基矽烷化合物的加水分解及隨 後之縮合反應,在基材表面形成由具有矽氧烷鍵之無機系 高分子所構成的保護被膜之方法。但是,該等方法時,因 爲必須數十分鐘至數小時的加熱時間用以形該保護被膜, 會有生產力方面的問題。 爲了解決該等問題,例如有提案(例如,參照專利文獻 3、4)揭示一種組成物,該組成物係含有在分子內具有矽氧 烷骨架且具有反應性的矽烷醇基、烷氧基矽烷基等之砂氧 烷低聚物、及活性能量感應性陽離子聚合引發劑作爲必要 成分,並藉由照射活性能量線使其硬化而在短時間形成保 護被膜。 具體上,係在基材塗布此種組成物,藉由照射紫外線 200904899 等的活性能量線且以陽離子聚合引發劑所產生的酸作爲觸 媒,而在政院醇基、院氧基砍院基之間形成砂氧院鍵並硬 化,來形成保護被膜。依照該方法時’雖然能夠在短時間 形成被膜,但是依照所使用的活性能量線感應性陽離子聚 合引發劑的種類及添加量、活性能量線的照射方法’所得 到的保護被膜的物性會有重大的變化’會有無法顯現耐擦 傷性等物性之問題。 專利文獻1 :特開昭4 8-26 8 22號公報 專利文獻2 :特開昭5 5 -9497 1號公報 專利文獻3 :特開昭5 3 -97098號公報 專利文獻4 :特開昭56- 1 0695 8號公報 【發明内容】 發明所欲解決之課題 本發明係爲了解決上述先前技術而進行。亦即,本發 明的目的係提供一種保護被膜形成方法,一種該保護被膜 形成方法所使用的組成物,及一種形成該保護被膜而成的 積層體,該保護被膜形成方法能夠在短時間形成耐擦傷性 等的被膜性能優良之無機系的透明保護被膜。 解決課題之手段 爲了達成上述目的’本發明者重複專心硏討之結果, 發現特定結構之芳香族鏡鹽型酸產生劑藉由照射活性能量 線能夠非常有效地形成砍氧院鍵,藉由在基材上塗布含有 形成矽氧烷低聚物等的特定矽氧烷鍵而得到的化合物、及 特定結構的芳香族鏡鹽型酸產生劑之活性能量線硬化性組 200904899 成物,並照射活性能量線,能夠在短時間硬化而形成具有 優良的被膜性能之保護被膜,而完成了本發明。 亦即,本發明係一種保護被膜形成方法,係在基材塗 布含有選自矽氧烷低聚物、有機矽烷類及矽酸烷基酯類之 至少1種(A),及通式(1)所示之芳香族锍鹽型酸產生劑 (B)’並藉由光照射來使前述光硬化性組成物硬化,[Technical Field] The present invention relates to a method for forming a protective film of an excellent transparent protective film capable of forming scratch resistance in a short period of time, a composition used in the method, and a protective film formed thereon The laminated body and its method of production. [Prior Art] In recent years, transparent plastic materials such as acrylic resin and polycarbonate resin which are excellent in crush resistance and light weight have been widely used in place of transparent glass. However, when the transparent plastic material is compared with glass, the surface hardness is low, and there is a problem that the surface is easily injured. Therefore, in the past, many attempts have been made to improve the scratch resistance of plastic materials. One of the most common methods, there is a widely known method (refer to Patent Documents 1, 2), which utilizes the hydrolysis of an alkoxydecane compound and subsequent condensation reaction to form a bond having a decane on the surface of the substrate. A method of protecting a film composed of an inorganic polymer. However, in such a method, since it takes tens of minutes to several hours of heating time to form the protective film, there is a problem in productivity. In order to solve such problems, for example, there is a proposal (for example, refer to Patent Documents 3 and 4) to disclose a composition containing a decyl alcohol group having a siloxane skeleton in a molecule and having reactivity, an alkoxy decane. A moxa oxide oligomer such as a base or an active energy-inductive cationic polymerization initiator is used as an essential component, and is cured by irradiation of an active energy ray to form a protective film in a short time. Specifically, the composition is coated on a substrate by irradiating an active energy ray such as ultraviolet ray 200904899 and an acid generated by a cationic polymerization initiator as a catalyst, and in the academy alcohol base, A sand oxide bond is formed and hardened to form a protective film. According to this method, although the film can be formed in a short period of time, the physical properties of the protective film obtained in accordance with the type and amount of the active energy ray-initiating cationic polymerization initiator to be used and the irradiation method of the active energy ray are significant. The change 'can't show the problem of physical properties such as scratch resistance. [Patent Document 1] Japanese Laid-Open Patent Publication No. JP-A No. 5-8-9 - 1 0695 No. 8 SUMMARY OF INVENTION Technical Problem The present invention has been made to solve the above prior art. That is, an object of the present invention is to provide a protective film forming method, a composition used in the protective film forming method, and a laminated body formed by forming the protective film, which can form a resistant film in a short time. An inorganic transparent protective film having excellent film properties such as scratch resistance. Means for Solving the Problem In order to achieve the above object, the inventors of the present invention repeated the results of intensive deliberation, and found that the aromatic mirror salt-type acid generator of a specific structure can form a chopped oxygen bond very efficiently by irradiating the active energy ray. An active energy ray-curable group 200904899 containing a compound obtained by forming a specific oxyalkylene bond such as a decane oxide oligomer and an aromatic mirror salt type acid generator having a specific structure is applied to the substrate, and the activity is irradiated. The energy ray can be hardened in a short time to form a protective film having excellent film properties, and the present invention has been completed. That is, the present invention is a method for forming a protective film by coating at least one (A) selected from the group consisting of a siloxane oxide, an organic decane, and an alkyl phthalate, and a general formula (1) ) the aromatic sulfonium-type acid generator (B)' shown and hardens the photocurable composition by light irradiation.
(式中,R1、R2及R3係各自表示氫、碳數1~10的有機基、 鹵素基或羥基,R4係表示碳數1〜1 0的脂肪族烴基,R5係 表示亦可具有取代基之芳香族烴基,χ_係表示相對陰離 子)。 而且,本發明係一種保護被膜形成方法,其中藉由照 射活性能量線來使述活性能量線硬化用組成物硬化時,係 在照射活性能量線時、照射活性能量線後、或是兩者,加 熱活性能量線硬化性組成物。 又,本發明係一種活性能量線硬化用的組成物,其係 含有選自矽氧烷低聚物、有機矽烷類及矽酸烷基酯類之至 少1種(A),及通式(1)所示之芳香族锍鹽型酸產生劑(B),(wherein R1, R2 and R3 each represent hydrogen, an organic group having 1 to 10 carbon atoms, a halogen group or a hydroxyl group, R4 represents an aliphatic hydrocarbon group having 1 to 10 carbon atoms, and R5 represents a substituent which may have a substituent. The aromatic hydrocarbon group, χ_ is a relative anion). Further, the present invention is a method for forming a protective film, wherein when the active energy ray hardening composition is cured by irradiation of an active energy ray, when the active energy ray is irradiated, after the active energy ray is irradiated, or both, The active energy ray-curable composition is heated. Further, the present invention is a composition for active energy ray hardening, which comprises at least one selected from the group consisting of a siloxane oxide, an organic decane, and an alkyl phthalate (A), and a formula (1) ) an aromatic phosphonium salt type acid generator (B),
200904899 (式中,R1、R2及R3係各自表示氫、碳數1〜10的有機基、 幽素基或羥基,R4係表示碳數1〜10的脂肪族烴基,R5係 表示亦可具有取代基之芳香族烴基,X'係表示相對陰離 子)。 而且,本發明係關於一種積層體,其係在基材的表面 具有前述活性能量線硬化用的組成物之硬化被膜。 又,本發明係關於一種積層體的製法,係藉由前述保 護被膜形成方法在基材的表面設置保護被膜。 發明之效果 依照本發明,能夠在短時間形成外觀、透明性及耐擦 傷性等優良之無機系的保護被膜。 【實施方式】 在本發明的活性能量線硬化用的組成物之(A)成分, 係使用選自矽氧烷低聚物、有機矽烷類及矽酸烷基酯類等 之至少1種。 在本發明所使用的矽氧烷低聚物,係在分子內含有以 矽氧烷鍵作爲主骨架、且以光照射而從芳香族锍鹽型酸產 生劑(B)產生的酸作爲觸媒時能夠縮合的矽烷醇基、或烷氧 基甲矽烷基之低聚物。含低聚物之矽烷醇基與矽烷醇基或 烷氧基甲矽烷基縮合而形成矽氧烷鍵。含有低聚物之烷氧 基矽烷基亦能夠與矽烷醇基直接鍵結,亦能夠一次加水分 解成爲矽烷醇基後,與矽烷醇基或烷氧基甲矽烷基縮合而 形成矽氧烷鍵。 烷氧基甲矽烷基可舉出例如甲氧基甲矽烷基、乙氧基 200904899 甲矽烷基及丙氧基甲矽烷基等。從加水分解速度' 縮合速 度快而言,以甲氧基甲矽烷基或乙氧基甲矽烷基爲佳。 矽氧烷低聚物的分子量沒有特別限定’重量平均分子 量時以500〜50, 〇〇〇的範圍內爲佳。藉由使重量平均分子量 爲5 0 0以上,能夠提高組成物的成膜性,同時能夠提高所 得到的保護被膜的耐擦傷性、耐裂縫性。又,藉由在5 0,0 0 0 以下,能夠提高所得到的保護被膜之均勻性及透明性。特 別是該重量平均分子量爲800〜10,〇〇〇的範圍內爲更佳。 矽氧烷低聚物可單獨利用1種,亦可混合使用複數種。 矽氧烷低聚物能夠使用直接利用由各廠商市售者,亦 可使用以各種有機矽烷類、矽酸烷基酯類等作爲原料,藉 由加水分解、縮合而合成得到者。 較佳是通式(2)所示之有機矽烷類及通式(3)所$ 2 $ 酸烷基酯類之任一種以上的化合物的加水分解、始 刑白衆物。 R6aSi(OR7)4.a (2) (式中,R6係表示碳數1~10的有機基,R7係表示碳數】5 的烷基或碳數1〜4的醯基’ a係表示〇~3中任一考的整數), R8 — Ο OR10 ISi —Ο IOR11 R9 (3) n (式中,R8、R9、R1Q及R11係各自獨立地表示1〜5 的烷基 -10- 200904899 η係表示2~20中任一者的整數)。 有機矽烷類的具體例可舉出四乙氧基矽烷、四甲氧基 矽烷、甲基三乙氧基矽烷、甲基三甲氧基矽烷、苯基三乙 氧基矽烷、苯基三甲氧基矽烷、乙烯基三乙氧基矽烷、乙 烯基三甲氧基矽烷、2-(3,4_乙氧基環己基)乙基三乙氧基矽 烷、2-(3,4-乙氧基環己基)乙基三甲氧基矽烷、3-環氧丙氧 基丙基三乙氧基矽烷、3 -環氧丙氧基丙基三甲氧基矽烷、 3-甲基丙烯醯氧基丙基三乙氧基矽烷、3-甲基丙烯醯氧基 丙基三甲氧基矽烷、3 -丙烯醯氧基丙基三乙氧基矽烷、3-丙烯醯氧基丙基三甲氧基矽烷、對乙烯基伸烷基三乙氧基 矽烷、對乙烯基伸烷基三甲氧基矽烷、二甲基二乙氧基矽 烷及二甲基二甲氧基矽烷等。 其中,從加水分解、縮合反應快而言’以四甲氧基矽 烷、四乙氧棊矽烷、甲基三甲氧基矽烷、甲基三乙氧基矽 烷、二甲基二甲氧基矽烷、二甲基二乙氧基矽烷、苯基三 甲氧基矽院及苯基三乙氧基砍院寺爲佳。 矽酸烷基酯類的具體例可舉出矽酸甲酯、矽酸乙酯、 矽酸異丙酯、矽酸正丙酯、矽酸異丁酯及矽酸正丁酯等。 該等之中,從加水分解、縮合反應快而言,以R8〜R11 的全部都是甲基之矽酸甲酯、r8〜rM的全部都是乙基之砂 酸乙酯爲佳。 在本發明的(A)成分之有機矽烷類’可舉出前面例示作 爲矽氧烷低聚物的原料之通式(2)所示之有機矽烷類。 在本發明的(A)成分之有機矽烷類之矽酸院基醋’可舉 -11 - 200904899 出前面例示作爲矽氧烷低聚物的原料之通式Ο)所示之矽 酸烷基酯類。 在本發明係使用通式(1)所示之芳香族锍鹽型酸產生 劑(B)。200904899 (wherein R1, R2 and R3 each represent hydrogen, an organic group having 1 to 10 carbon atoms, a hydroxy group or a hydroxyl group, R4 represents an aliphatic hydrocarbon group having 1 to 10 carbon atoms, and R5 means that it may have a substitution. The aromatic hydrocarbon group, the X' system represents a relative anion). Furthermore, the present invention relates to a laminated body comprising a cured film of the composition for active energy ray hardening on the surface of a substrate. Further, the present invention relates to a method for producing a laminate in which a protective film is provided on a surface of a substrate by the above-described method for forming a protective film. According to the present invention, an inorganic protective film excellent in appearance, transparency, scratch resistance, and the like can be formed in a short period of time. [Embodiment] The component (A) of the active energy ray-curing composition of the present invention is at least one selected from the group consisting of a siloxane oxide oligomer, an organic decane, and an alkyl phthalate. The oxirane oligomer used in the present invention contains an acid derived from an aromatic sulfonium type acid generator (B) as a catalyst in a molecule containing a decane bond as a main skeleton and irradiated with light. An oligomer of a decyl alcohol group or an alkoxycarbenyl group which can be condensed. The oligomer-containing stanol group is condensed with a stanol group or an alkoxycarbenyl group to form a decane bond. The alkoxyalkyl group containing an oligomer can also be directly bonded to a stanol group, and can also be condensed with a stanol group or an alkoxycarbenyl group to form a decane bond after being hydrolyzed to a stanol group. The alkoxycarbenyl group may, for example, be methoxymethylidene alkyl group, ethoxy group 200904899 formamyl group or propoxymethyl group. From the viewpoint of the hydrolysis rate of the hydrolysis, the condensation rate is preferably methoxymercaptoalkyl or ethoxymethylcarbonyl. The molecular weight of the decane oligomer is not particularly limited. The weight average molecular weight is preferably 500 to 50, preferably in the range of ruthenium. When the weight average molecular weight is 50,000 or more, the film formability of the composition can be improved, and the scratch resistance and crack resistance of the obtained protective film can be improved. Further, by 50 or less, the uniformity and transparency of the obtained protective film can be improved. In particular, the weight average molecular weight is from 800 to 10, more preferably in the range of ruthenium. The oxirane oligomer may be used singly or in combination of plural kinds. The oxirane oligomer can be used as it is, and can be used as a raw material by various commercially available decanes or alkyl phthalates, and can be synthesized by hydrolysis and condensation. It is preferred that the organic decane represented by the formula (2) and the compound of any one or more of the alkyl esters of the formula (3) are hydrolyzed and precipitated. R6aSi(OR7)4.a (2) (wherein R6 represents an organic group having 1 to 10 carbon atoms, R7 represents a carbon number] 5 or an alkyl group having a carbon number of 1 to 4' a represents 〇 An integer of any of ~3, R8 — Ο OR10 ISi — Ο IOR11 R9 (3) n (wherein R8, R9, R1Q, and R11 each independently represent an alkyl group of 1 to 5-10-200904899 η It is an integer representing any of 2 to 20.) Specific examples of the organic decanes include tetraethoxydecane, tetramethoxydecane, methyltriethoxydecane, methyltrimethoxydecane, phenyltriethoxydecane, and phenyltrimethoxydecane. , vinyl triethoxy decane, vinyl trimethoxy decane, 2-(3,4-ethoxycyclohexyl)ethyl triethoxy decane, 2-(3,4-ethoxycyclohexyl) Ethyltrimethoxydecane, 3-glycidoxypropyltriethoxydecane, 3-glycidoxypropyltrimethoxydecane, 3-methylpropenyloxypropyltriethoxy Decane, 3-methacryloxypropyltrimethoxydecane, 3-propenyloxypropyltriethoxydecane, 3-propenyloxypropyltrimethoxydecane, p-vinylalkylene Ethoxy decane, p-vinyl alkyltrimethoxy decane, dimethyl diethoxy decane, dimethyl dimethoxy decane, and the like. Among them, from the hydrolysis and condensation reaction, 'tetramethoxy decane, tetraethoxy decane, methyl trimethoxy decane, methyl triethoxy decane, dimethyl dimethoxy decane, two Methyldiethoxydecane, phenyltrimethoxyanthracene and phenyltriethoxycasting temple are preferred. Specific examples of the alkyl phthalate include methyl decanoate, ethyl decanoate, isopropyl citrate, n-propyl decanoate, isobutyl phthalate, and n-butyl phthalate. Among these, from the viewpoint of the hydrolysis and the condensation reaction, it is preferred that all of R8 to R11 are methyl decanoate and all of r8 to rM are ethyl ethyl oleate. The organodecanes of the component (A) of the present invention are exemplified by the organodecanes represented by the formula (2) which are exemplified above as the raw material of the decane oxide oligomer. In the organic decane-based decanoic acid-based vinegar of the component (A) of the present invention, the alkyl phthalate ester represented by the above formula exemplified as the raw material of the decane oxide oligomer is exemplified. class. In the present invention, the aromatic onium salt type acid generator (B) represented by the formula (1) is used.
(式中,R1、R2及R3係各自表示氫、碳數1~1〇的有機基、 鹵素基或羥基,R4係表示碳數1~1〇的脂肪族烴基,R5係 表示亦可具有取代基之芳香族烴基,X·係表示相對陰離 子)。 X —的具體例可舉出 SbF〆、PF6_、AsF6·、BF4·、CF3S〇3· 等。就活性而言,以SbF6_、PF6_爲佳。 藉由使用通式(1)所示之芳香族锍鹽型酸產生劑,藉由 光照射能夠在短時間效率良好地形成矽氧烷系無機被膜。 與使用其他的光感應用光酸產生劑時比較,能夠得到良好 的被膜物性。 即便在基材塗布含有有機矽烷類或矽酸烷基酯類及通 常的活性能量線感應性陽離子聚合引發劑之活性能量線硬 化性組成物並照射活性能量線,因爲組成物的成膜性低, 無法形成保護被膜。但是,作爲活性能量線感應性陽離子 聚合引發劑,藉由使用通式(1)所示之芳香族鏑鹽型酸產生 劑,能夠提高組成物的成膜性,來形成保護被膜。 -12- 200904899 使用有機矽烷類或矽酸烷基酯時,該等可單獨使用, 亦可加入該等加水分解所必要的水分而使用。 (A)成分以並用矽氧烷低聚物的至少1種及選自有機 矽烷類及矽酸烷基酯類之至少1種爲佳。藉由提高矽氧烷 低聚物的含有率,能夠提升硬化被膜的耐裂縫性。藉由提 高有機矽烷類或矽酸烷基酯類的含有率,能夠提升硬化被 膜的耐擦傷性及硬度。並用矽氧烷低聚物的至少1種及選 自有機矽烷類及矽酸烷基酯類之至少1種時,可只有使用 該等的並用物,亦可加入有機矽烷類或矽酸烷基酯類加水 分解所必要的水分而使用。 又,藉由照射活性能量線來使前述活性能量線硬化性 組成物硬化時,能夠在照射活性能量線時、照射活性能量 線後、或是兩者均進行加熱,都能夠提升被膜性能。 芳香族锍鹽型酸產生劑的具體例可舉出例如六氟銻酸 苄基-4-羥苯基甲基毓、六氟磷酸苄基-4-羥苯基甲基毓、六 氟砷酸.苄基羥苯基甲基毓、四氟硼酸苄基-4-羥苯基甲基 锍、三氧甲院磺酸;基-4 -經苯基甲基鏡、對甲苯擴酸;基 -4 -羥苯基甲基毓、六氟銻酸甲苄基-4-羥苯基甲基锍、六氟 磷酸甲苄基-4-羥苯基甲基鏑、六氟銻酸4_乙醯氧基苯基苄 基甲基锍、六氟銻酸4 -乙醯氧基苯基二甲基锍、六氟銻酸 苄基4 -甲醯氧基苯基甲基锍、六氟銻酸苄基2 -甲基-4-羥苯 基甲基鏡、六氟砷酸卡基-3-氯-4-經苯基甲基鏡、六氟錄酸 ;基-3-甲基-4-經基-5-第三丁基苯基甲基锍、六氟憐酸4-甲氧基苄基_4_羥苯基甲基毓、六氟銻酸二苄基-4-羥苯基 -13- 200904899 锍、六氟磷酸二苄基-4-羥苯基锍、六氟銻酸4-乙醯氧基苯 基一卡基鏡、六氣錄酸一卡基-4-甲氣基本基鏡、六氣鍊酸 硝基苄基-4-羥苯基甲基毓、六氟銻酸3,5·二硝基苄基-4-羥苯基甲基锍、六氟銻酸/3-萘基甲基-4 _羥苯基甲基鏑、六 氟磷酸/3-萘基甲基-4-羥苯基甲基鏑、六氟銻酸α-萘基甲 基-4-羥苯基甲基锍、六氟磷酸萘基甲基-4-羥苯基甲基 锍等。 其中,從光照射之硬化速度快、所得到保護被膜的耐 擦傷性良好的觀點而言,以具有4·羥苯基直接鍵結於硫原 子(S)而成的結構者爲佳。具體例可舉出六氟銻酸/3 -萘基 甲基-4-羥苯基甲基锍、六氟磷酸萘基甲基-4-羥苯基甲 基锍、六氟銻酸萘基甲基-4-羥苯基甲基毓、六氟磷酸〇: -萘基甲基-4-羥苯基甲基鏑、六氟銻酸甲苄基-4-羥苯基甲 基锍、六氟磷酸甲苄基-4-羥苯基甲基鏑、六氟銻酸苄基-4-羥苯基甲基锍及六氟磷酸苄基-4-羥苯基甲基鏡。 該等芳香族鏑鹽型酸產生劑例如能夠藉由使具有苯基 甲基硫醚或具有取代基之苯基甲基硫醚與芳香族氯甲烷或 是具有取化基之芳香族氯甲烷,在水的存在下、3 5 °C反應 20小時後,添加乙酸乙酯而在1 5 t進行鹽交換(例如 NaSbF 6)3 0分鐘,藉由乙酸乙酯層濃縮等眾所周知的方法 來製造。 又,亦能夠使用市售品。通式(1)所示之芳香族鏑鹽型 酸產生劑的市售可舉出例如「SANEIDO SI-6〇」、「SANEIDO SI-80」、「SANEIDO SI-l〇〇j、「SANEIDO Sl-ll〇」(以上、 -14- 200904899 三新化學工業(股)製 '商標名)等。 芳香族锍鹽型酸產生劑(B)的調配量沒有特別限定,相 對於(A)成分(矽氧烷低聚物、有機矽烷類及矽酸烷基酯類 的合計)的固體成分100質量份,以0.01~10質量份的範圍 爲内佳。但是,在此所稱固體成分係意味著(A)成分係完全 加水分解、縮合時所得到的化合物,在以下所記載亦相同。 含有後述之加水分解、縮聚物(Η)時,相對於(A)的固體成 分100質量份與(H)的固體成分的合計100質量份,以 0.01〜10質量份的範圍內爲佳。0.01質量份以上時,光照射 能夠短時間硬化,且具有能夠得到良好的保護被膜之傾 向。又,1 0質量份以下時,硬化所得到的保護被膜特別是 具有著色少、表面硬度或耐擦傷性良好之傾向。而且,從 硬化性良好、能夠得到良好性能的保護被膜而言,該調配 量係相對於(A)成分(矽氧烷低聚物、有機矽烷類及矽酸烷 基酯類的合計)的固體成分100質量份,以0.05〜5質量份 的範圍內爲更佳。 在本發明所使用的組成物,在不妨礙本發明效果的範 圍內,亦可含有其他的反應性化合物。具體上,係能夠陽 離子聚合之環氧化合物(C)、乙烯醚化合物(D)等。而且, 亦可含有含自由基聚合性雙鍵之單體(E)及具有光感應性 之自由基聚合引發劑(F)。 環氧化合物(C)若是在分子內含有環氧基者,沒有特別 限定。其具體例可舉出乙二醇二環氧丙基醚、聚乙二醇二 環氧丙基醚、丙二醇二環氧丙基醚、三伸丙甘醇二環氧丙 -15- 200904899 基醚、聚丙二醇二環氧丙基醚、丨,4-丁二醇二環氧丙基醚、 新戊二醇二環氧丙基醚、ι,6-己二醇二環氧丙基醚、甘油 二環氧丙基醚、二甘油四環氧丙基醚、三羥甲基丙烷三環 氧丙基醚、2,6-二環氧丙基苯基醚、山梨糖醇三環氧丙基 醚 '三聚異氰酸三環氧丙酯、二環氧丙基胺、二環氧丙基 苄基胺、酞酸二環氧丙基酯、雙酚A二環氧丙基醚、二氧 化丁二烯、二氧化二環戊二烯、3,4-環氧環己烯羧酸與乙 二醇之二酯、3,4-環氧環己基甲基-3,4-環氧環己烷羧酸 酯、3,4-環氧-6-甲基環己基甲基-3,4-環氧-6-甲基環己烷羧 酸酯、己二酸雙(3,4-環氧環己基甲基)酯、環氧化二環戊二 烯醇環氧丙基醚、新戊四醇聚環氧丙基醚、雙酚A型環氧 樹脂與環氧乙烷之加成物、苯酚酚醛清漆型環氧樹脂及甲 酚酚醛清漆型環氧樹脂等。其中,因爲硬化速度快、所得 到的保護被膜的耐擦傷性良好,以在分子內含有2個以上 的環氧基之芳香族環氧化合物爲佳。環氧化合物可單獨使 用1種類,亦可組合使用2種類以上。 乙烯醚化合物(D)係在分子內含有乙烯醚基之化合 物。乙烯醚化合物的具體例可舉出正丙基乙烯醚、異丙基 乙烯醚、正丁基乙烯醚、異丁基乙烯醚、2-乙基己基乙烯 醚、十八烷基乙烯醚、環己基乙烯醚、羥基乙基乙烯醚、 羥基丁基乙烯醚、1,4-丁二醇二乙烯醚、1,6-己二醇二乙烯 醚、1,9-壬二醇二乙烯醚、環己二醇二乙烯醚、環己烷二 甲醇二乙烯醚、乙二醇二乙烯醚、二甘醇乙烯醚、三甘醇 二乙烯醚、聚乙二醇二乙烯醚、三羥甲基丙烷三乙烯醚及 -16- 200904899 新戊四醇四乙烯醚等。 含有自由基聚合性雙鍵之單體(E)若是具有自由基聚 合性雙鍵時,其結構沒有特別限定。特別是從聚合速度快、 以在分子內含有丙烯醯基或甲基丙烯醯基之單官能或多官 能(甲基)丙烯酸酯化合物爲佳。 單官能(甲基)丙烯酸酯化合物的具體例可舉出(甲基) 丙烯酸苯酯、(甲基)丙烯酸苄酯、(甲基)丙烯酸苯基乙酯、 (甲基)丙烯酸苯氧基乙酯、對異丙苯基苯酚環氧乙烷改性 (甲基)丙烯酸酯、(甲基)丙烯酸異莰酯、(甲基)丙烯酸環己 酯、(甲基)丙烯酸二環戊烯酯、(甲基)丙烯酸二環戊酯、(甲 基)丙烯酸四氫糠酯、(甲基)丙烯酸甲酯、(甲基)丙烯酸乙 酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯 酸異丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸戊酯、(甲 基)丙烯酸2-乙基己酯、(甲基)丙烯酸正己酯、(甲基)丙烯 酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯、(甲基)丙烯酸 2-羥基丁酯、(甲基)丙烯酸4-羥基丁酯、(甲基)丙烯酸四氫 糠酯及(甲基)丙烯酸磷乙酯等。 多官能(甲基)丙烯酸酯化合物的具體例可舉出乙二醇 二(甲基)丙烯酸酯、二甘醇二(甲基)丙烯酸酯、三甘醇二(甲 基)丙烯酸酯、聚乙二醇二(甲基)丙烯酸酯、三伸丙二醇二 (甲基)丙烯酸酯、聚丙二醇二(甲基)丙烯酸酯、聚丁二醇二 (甲基)丙烯酸酯、1,3 -丁二醇二(甲基)丙烯酸酯、1,6-己二 醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、2,2-雙 [4-(甲基)丙烯醯氧基苯基]-丙烷、2,2-雙[4-(甲基)丙烯醯氧 -17- 200904899 基乙氧基苯基]-丙烷、2,2-雙[4-(甲基)丙烯醯氧基二乙氧基 苯基]-丙烷、2,2-雙[4-(甲基)丙烯醯氧基五乙氧基苯基]-丙 烷、2,2-雙[4-(甲基)丙烯醯氧基乙氧基-3-苯基苯基]-丙 院、雙[4-(甲基)丙嫌釀基本硫基]硫酸、雙[4-(甲基)丙稀醯 氧基苯基]-楓、雙[4-(甲基)丙烯醯氧基乙氧基苯基]_颯、雙 [4-(甲基)丙烯醯氧基二乙氧基苯基]-颯、雙[4-(甲基)丙嫌 醯氧基五乙氧基苯基]-颯、雙[4-(甲基)丙烯醯氧基乙氧基 -3-苯基苯基]-颯、雙[4-(甲基)丙烯醯氧基乙氧基_3,5_二甲 基苯基]-颯、雙[4-(甲基)丙烯醯氧基苯基]-颯、雙[4-(甲基) 丙嫌醯氧基乙氧基苯基]-硫酸、雙[4-(甲基)丙嫌醯氧基五 乙氧基苯基]-硫醚、雙[4-(甲基)丙烯醯氧基乙氧基-3_苯基 苯基]-硫醚、雙[4-(甲基)丙烯醯氧基乙氧基-3,5 -二甲基苯 基]-硫酸、2,2-雙[4·(甲基)丙嫌酸氧基乙氧基- 3,5-二溴苯基 丙烷]、三羥甲基丙烷三(甲基)丙烯酸酯、四羥甲基甲烷三 (甲基)丙烯酸酯、四羥甲基甲烷四(甲基)丙烯酸酯及二新戊 四醇六(甲基)丙烯酸酯等。 其中,從硬化性良好、所得到保護被膜的耐擦傷性優 良而言,以多官能(甲基)丙烯酸酯爲更佳。含有自由基聚 合性雙鍵之單體(E)可單獨使用1種類,亦可混合使用複數 種類。 · 具有光感應性之自由基聚合引發劑(F)係感應可見光 線或紫外線等活性能量線產生活性自由基種,來引發含有 自由基聚合性雙鍵之單體(E)進行聚合之成分。具有光感應 性之自由基聚合引發劑(F)之具體例可舉出3,3_二甲基- 4- -18- 200904899 甲氧基-二苯基酮、苄基二甲基縮酮、對二甲胺基苯甲酸異 戊酯、對二甲胺基苯甲酸乙酯、二苯基酮、對甲氧基二苯 基酮' 2,2-二乙氧基'乙醯苯、2,2-二甲氧基-1,2-二苯基乙烷 -1-酮、1-羥基環己基苯基酮、乙醛酸甲基苯酯、乙醛酸乙 基苯酯、2-羥基-2-甲基-1-苯基丙烷-1-酮、2-甲基-^[4-(甲 硫基)苯基]-2-味啉丙酮-1,2,4,6-三甲基苯甲醯基二苯基氧 化膦等。其中,從硬化速度快而言,以乙醛酸甲基苯酯、 2-羥基-2-甲基-1-苯基丙烷-1-酮、1-羥基環己基苯基酮、 2,2_二甲氧基-1,2 -二苯基乙烷-1-酮、苄基二甲基縮酮及 2,4,6-三甲基苯甲醯基二苯基氧化膦爲佳。該等具有光感應 性之自由基聚合引發劑(F)可單獨使用1種,亦可混合使用 2種以上。 光感應性之自由基聚合引發劑(F)的調配量沒有特別 限定,相對於(E)成分100質量份,以〇.〇1〜10質量份的範 圍內爲佳。就照射活性能量線之硬化速度快而言,該調配 量爲以0.0 1質量份以上爲佳,就被膜的耐擦傷性而言,以 1〇質量份以下爲佳。以〇.〇5~5質量份的範圍內爲更佳。 在本發明所使用的活性能量線硬化性組成物,更含有 高分子化合物(G)亦佳。藉由調配高分子化合物(G),能夠 對被膜賦予柔軟性來抑制產生裂縫。高分子化合物(G)可舉 出例如聚丙烯酸系聚合物、聚乙烯系聚合物、聚醚系聚合 物及聚二烷基矽氧烷(矽樹脂)等。其中,以使用聚醚系聚 合物爲佳,具體上,可舉出聚乙二醇。 高分子化合物(G)的調配量沒有特別限定,相對於(A) -19- 200904899 成分(矽氧烷低聚物、有機矽烷類及矽酸烷基酯類的合計) 的固體成分100質量份,以0〜50質量份的範圍爲佳,以 1〜1 〇質量份的範圍爲更佳。 此外,在本發明所使用的活性能量線硬化性組成物, 亦可按照必要調配聚合物微粒子、膠體狀二氧化矽、膠體 狀金屬、光敏化劑(例如蒽系化合物、噻噸酮系化合物、蒽 醌系化合物、萘系化合物及芘系化合物等)、塡料、染料、 顏料、顏料分散劑、流動調整劑、調平劑、消泡劑、紫外 線吸收劑、光安定劑、抗氧化劑、熱感應性自由基聚合引 發劑及感應性陽離子聚合引發劑等。 爲了提升本發明所使用活性能量線硬化性組成物之硬 化物的耐磨耗性,以含有通式(4)所示之有機砂院有機砂院 類及通式(5)所示之矽酸烷基酯之任一種以上的化合物與 數量平均粒徑爲5~200奈米的膠體狀二氧化矽之加水分 解、縮聚物(H)爲佳。含有(H)成分時,(A)成分(矽氧烷低聚 物、有機矽烷類及矽酸烷基酯類的合計)的固體成分與(H) 成分的固體成分之固體成分比以9: 1~5: 5爲佳’以8: 2~6 : 4爲特佳。 R12bSi(OR13)4-b ⑷ (式中,R12係表示碳數1〜10的有機基,r13係表示碳數1〜5 的烷基或碳數1〜4的醯基,b係表示〇〜3的整數) -20- 200904899 R14一 〇, OR16 ISi-0 I OR17 R15 (5) m (式中,r14、R15、R16及R17係各自獨立地表示1~5的烷基, m係表示2~20中任一者的整數)° 有機矽烷類及矽酸烷基酯類之具體例可舉出例如前述 者。 膠體狀二氧化矽可舉出例如二氧化矽微粒子在水中均 勻分散而成之水性二氧化砂溶膠及在分散溶劑均句分散而 成的有機二氧化砂溶膠。分散溶劑可舉出例如甲醇、乙醇、 2-丙醇、1-丁醇、乙二醇等醇類、丙酮、甲基乙基酮、甲 基異丁基酮等酮類、乙酸甲酯、乙酸乙酯、乙酸丁醋等醋 類、苯、甲苯、二甲苯等芳香族烴類、乙二醇一烷基醚、 丙二醇一烷基醚等甘油醚。分散溶劑可使用1種’或是並 用2種以上。(wherein R1, R2 and R3 each represent hydrogen, an organic group having 1 to 1 carbon atoms, a halogen group or a hydroxyl group, R4 represents an aliphatic hydrocarbon group having 1 to 1 carbon number, and R5 represents a substitution or substitution. The aromatic hydrocarbon group of the group, X. represents a relative anion). Specific examples of X- are SbF〆, PF6_, AsF6·, BF4·, CF3S〇3· and the like. In terms of activity, SbF6_ and PF6_ are preferred. By using the aromatic sulfonium salt type acid generator represented by the formula (1), the siloxane oxide-based inorganic film can be efficiently formed in a short time by light irradiation. Good film properties can be obtained as compared with the case where a photoacid generator is applied using other light sensations. Even when an active energy ray-curable composition containing an organic decane or an alkyl phthalate and a usual active energy ray-inducing cationic polymerization initiator is applied to a substrate and irradiated with an active energy ray, the film formation property of the composition is low. , The protective film cannot be formed. However, the active energy ray-inducing cationic polymerization initiator can form a protective film by using the aromatic sulfonium salt type acid generator represented by the general formula (1) to improve the film formability of the composition. -12- 200904899 When organic decanes or alkyl phthalates are used, these may be used singly or in addition to the water necessary for hydrolysis. The component (A) is preferably at least one selected from the group consisting of a halogenated alkane oligomer and at least one selected from the group consisting of an organic decane and an alkyl phthalate. By increasing the content of the siloxane oligomer, the crack resistance of the cured film can be improved. By increasing the content of organic decanes or alkyl phthalates, the scratch resistance and hardness of the cured film can be improved. When at least one of the siloxane oxide oligomers and at least one selected from the group consisting of organic decanes and alkyl phthalates is used, only the combined materials may be used, and organic decanes or alkyl citrates may be added. The ester is used by adding water necessary for water decomposition. Further, when the active energy ray-curable composition is cured by irradiation with an active energy ray, the film performance can be improved when the active energy ray is irradiated, after the active energy ray is irradiated, or both are heated. Specific examples of the aromatic onium salt type acid generator include, for example, benzyl-4-hydroxyphenylmethylphosphonium hexafluoroantimonate, benzyl-4-hydroxyphenylmethylsulfonium hexafluorophosphate, and hexafluoroarsenic acid. .Benzyl hydroxyphenylmethyl hydrazine, benzyl-4-hydroxyphenylmethyl hydrazine tetrafluoroborate, methoxy sulfonic acid; -4-methyl phenylmethyl mirror, p-toluene acid expansion; 4-Hydroxyphenylmethylhydrazine, benzyl benzyl hydroxy-4-hydroxyphenylmethyl hydrazine, methylbenzyl-4-hydroxyphenylmethyl sulfonium hexafluorophosphate, hexafluoroantimonic acid 4 醯Oxyphenyl benzyl methyl hydrazine, hexafluoroantimonic acid 4-ethoxylated phenyl dimethyl hydrazine, hexafluoroantimonic acid benzyl 4-methyl methoxy phenyl methyl hydrazine, hexafluoroantimonic acid benzyl 2-methyl-4-hydroxyphenylmethyl mirror, hexafluoroarsenic acid kaki-3-chloro-4-phenylmethyl mirror, hexafluoro acid; -3-methyl-4- 5--5-butylphenylmethylhydrazine, hexafluoro-petic acid 4-methoxybenzyl 4-hydroxyphenylmethylhydrazine, hexafluoroantimonate dibenzyl-4-hydroxyphenyl-13 - 200904899 锍, dibenzyl-4-hydroxyphenylphosphonium hexafluorophosphate, 4-ethenyloxyphenyl 1-carbyl hexafluoroantimonate, six gas recording one card base-4-methyl basic microscope Six gas chain acid nitrobenzyl-4- Hydroxyphenylmethylhydrazine, hexafluoroantimonic acid 3,5·dinitrobenzyl-4-hydroxyphenylmethylhydrazine, hexafluoroantimonic acid/3-naphthylmethyl-4 hydroxyphenylmethylhydrazine , hexafluorophosphoric acid/3-naphthylmethyl-4-hydroxyphenylmethylhydrazine, hexafluoroantimony acid α-naphthylmethyl-4-hydroxyphenylmethylhydrazine, hexafluorophosphorylnaphthylmethyl-4 -Hydroxyphenylmethylhydrazine and the like. Among them, from the viewpoint that the curing speed of light irradiation is fast and the scratch resistance of the obtained protective film is good, it is preferable to have a structure in which a hydroxyphenyl group is directly bonded to a sulfur atom (S). Specific examples thereof include hexafluoroantimonic acid/3-naphthylmethyl-4-hydroxyphenylmethylhydrazine, hexadefluorophosphorylnaphthylmethyl-4-hydroxyphenylmethylhydrazine, and hexafluorodecanoic acid naphthyl 4-Hydroxyphenylmethylhydrazine, bismuth hexafluorophosphate: -naphthylmethyl-4-hydroxyphenylmethylhydrazine, hexafluoroantimonic acid methylbenzyl-4-hydroxyphenylmethylhydrazine, hexafluoro Methylbenzyl-4-hydroxyphenylmethylhydrazine, benzyl-4-hydroxyphenylmethylhydrazine hexafluoroantimonate and benzyl-4-hydroxyphenylmethyl hexafluorophosphate. The aromatic onium salt type acid generator can be, for example, a phenylmethyl sulfide having a phenylmethyl sulfide or a substituent, an aromatic methyl chloride or an aromatic methyl chloride having a substituent. After reacting at 35 ° C for 20 hours in the presence of water, ethyl acetate was added thereto, and salt exchange (for example, NaSbF 6) was carried out at 150 t for 30 minutes, and it was produced by a well-known method such as concentration of an ethyl acetate layer. Further, a commercially available product can also be used. Commercially available aromatic sulfonium-type acid generators represented by the formula (1) include, for example, "SANEIDO SI-6", "SANEIDO SI-80", "SANEIDO SI-l〇〇j, "SANEIDO Sl" -ll〇" (above, -14- 200904899 Sanxin Chemical Industry Co., Ltd. 'trade name'). The amount of the aromatic sulfonium-type acid generator (B) is not particularly limited, and is 100 parts by mass based on the solid content of the component (A) (the total of the decane oligomer, the organodecane, and the alkyl phthalate). The fraction is preferably in the range of 0.01 to 10 parts by mass. However, the solid content referred to herein means a compound obtained by completely hydrolyzing and condensing the component (A), and the same applies to the following description. When the hydrolyzation and the polycondensate (hereinafter referred to as the following) are contained, it is preferably in the range of 0.01 to 10 parts by mass based on 100 parts by mass of the solid component of (A) and 100 parts by mass of the solid component of (H). When the amount is 0.01 parts by mass or more, light irradiation can be hardened for a short period of time, and a good protective film can be obtained. In addition, when it is 10 parts by mass or less, the protective film obtained by curing tends to have less coloration and good surface hardness or scratch resistance. In addition, the amount of the protective film which is excellent in curability and can provide good performance is a solid relative to the component (A) (a total of a siloxane oligomer, an organic decane, and an alkyl phthalate). 100 parts by mass of the component is more preferably in the range of 0.05 to 5 parts by mass. The composition used in the present invention may contain other reactive compounds insofar as the effects of the present invention are not impaired. Specifically, it is an epoxy compound (C) capable of cationic polymerization, a vinyl ether compound (D), and the like. Further, it may contain a monomer (E) having a radical polymerizable double bond and a photopolymerizable radical polymerization initiator (F). The epoxy compound (C) is not particularly limited as long as it contains an epoxy group in the molecule. Specific examples thereof include ethylene glycol diepoxypropyl ether, polyethylene glycol diepoxypropyl ether, propylene glycol diepoxypropyl ether, and triethylene glycol propylene glycol diepoxypropyl-15-200904899 ether. , polypropylene glycol diepoxypropyl ether, hydrazine, 4-butanediol diepoxypropyl ether, neopentyl glycol diepoxypropyl ether, ι, 6-hexanediol diepoxypropyl ether, glycerin Diepoxypropyl ether, diglycerol tetraepoxypropyl ether, trimethylolpropane triepoxypropyl ether, 2,6-dioxypropyl phenyl ether, sorbitol triepoxypropyl ether 'Trimeric isocyanate triglycidyl ester, diepoxypropylamine, diepoxypropylbenzylamine, diepoxypropyl phthalate, bisphenol A diglycidyl ether, dibutyl butyl Diene, dicyclopentadiene dioxide, 3,4-epoxycyclohexenecarboxylic acid and ethylene glycol diester, 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexane Carboxylic acid ester, 3,4-epoxy-6-methylcyclohexylmethyl-3,4-epoxy-6-methylcyclohexanecarboxylate, adipic acid bis(3,4-epoxy ring Hexylmethyl)ester, epoxidized dicyclopentadienol epoxypropyl ether, neopentyl alcohol polyepoxypropyl ether, bisphenol A epoxy resin An adduct with ethylene oxide, a phenol novolac type epoxy resin, and a cresol novolak type epoxy resin. Among them, since the curing rate is fast and the abrasion resistance of the obtained protective film is good, an aromatic epoxy compound containing two or more epoxy groups in the molecule is preferred. The epoxy compound may be used alone or in combination of two or more. The vinyl ether compound (D) is a compound containing a vinyl ether group in the molecule. Specific examples of the vinyl ether compound include n-propyl vinyl ether, isopropyl vinyl ether, n-butyl vinyl ether, isobutyl vinyl ether, 2-ethylhexyl vinyl ether, octadecyl vinyl ether, and cyclohexyl group. Vinyl ether, hydroxyethyl vinyl ether, hydroxybutyl vinyl ether, 1,4-butanediol divinyl ether, 1,6-hexanediol divinyl ether, 1,9-nonanediol divinyl ether, cyclohexyl Glycol divinyl ether, cyclohexane dimethanol divinyl ether, ethylene glycol divinyl ether, diethylene glycol vinyl ether, triethylene glycol divinyl ether, polyethylene glycol divinyl ether, trimethylolpropane triethylene Ether and -16- 200904899 pentaerythritol tetravinyl ether and the like. When the monomer (E) having a radical polymerizable double bond has a radical polymerizable double bond, the structure thereof is not particularly limited. In particular, a monofunctional or polyfunctional (meth) acrylate compound having a high polymerization rate and containing an acryl fluorenyl group or a methacryl fluorenyl group in the molecule is preferred. Specific examples of the monofunctional (meth) acrylate compound include phenyl (meth) acrylate, benzyl (meth) acrylate, phenyl ethyl (meth) acrylate, and phenoxy B (meth) acrylate. Ester, p-cumylphenol oxirane modified (meth) acrylate, isodecyl (meth) acrylate, cyclohexyl (meth) acrylate, dicyclopentenyl (meth) acrylate, Dicyclopentyl (meth)acrylate, tetrahydrofurfuryl (meth)acrylate, methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, (meth)acrylic acid Butyl ester, isobutyl (meth)acrylate, tert-butyl (meth)acrylate, amyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, n-hexyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, (meth)acrylic acid Hydroquinone ester and phosphorus ethyl (meth)acrylate. Specific examples of the polyfunctional (meth) acrylate compound include ethylene glycol di(meth) acrylate, diethylene glycol di(meth) acrylate, triethylene glycol di(meth) acrylate, and polyethylene B. Diol (meth) acrylate, tri-propylene glycol di (meth) acrylate, polypropylene glycol di (meth) acrylate, polybutylene glycol di (meth) acrylate, 1,3-butanediol Di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, neopentyl glycol di(meth)acrylate, 2,2-bis[4-(methyl)propene oxide Phenyl]-propane, 2,2-bis[4-(methyl)propene oxime-17- 200904899-ethoxyethoxyphenyl]-propane, 2,2-bis[4-(methyl) propylene oxime Oxydiethoxyphenyl]-propane, 2,2-bis[4-(methyl)propenyloxypentaethoxyphenyl]-propane, 2,2-bis[4-(methyl) Propylene methoxyethoxy-3-phenylphenyl]-propene, bis[4-(methyl)propanoid thiol]sulfate, bis[4-(methyl)propanyloxybenzene Base]-Maple, bis[4-(methyl)acryloxyethoxyethoxyphenyl]-anthracene, bis[4-(methyl)acryloxyloxydiethyl Phenyl]-indole, bis[4-(methyl)-propyl decyloxypentaethoxyphenyl]-indole, bis[4-(methyl) propylene methoxy ethoxy-3-phenyl Phenyl]-indole, bis[4-(methyl)acryloxyethoxyethoxy-3,5-dimethylphenyl]-indole, bis[4-(methyl)acryloxyphenyl] - bismuth, bis[4-(methyl) propyl decyloxyethoxy phenyl]-sulfuric acid, bis[4-(methyl)-propyl decyloxypentaethoxyphenyl]-thioether, double [4-(Methyl)acryloxyethoxyethoxy-3-phenylphenyl]-thioether, bis[4-(methyl)acryloxyethoxyethoxy-3,5-dimethylbenzene - sulfuric acid, 2,2-bis[4.(methyl)propionic acid oxyethoxy-3,5-dibromophenylpropane], trimethylolpropane tri(meth)acrylate, Tetramethylolmethane tri(meth)acrylate, tetramethylolmethanetetra(meth)acrylate, and dipentaerythritol hexa(meth)acrylate. Among them, polyfunctional (meth) acrylate is more preferable because of good curability and excellent scratch resistance of the obtained protective film. The monomer (E) containing a radical polymerizable double bond may be used alone or in combination of plural types. The photo-inductive radical polymerization initiator (F) is a component which induces an active radical species such as visible light rays or ultraviolet rays to generate an active radical species to cause polymerization of a monomer (E) containing a radical polymerizable double bond. Specific examples of the photo-sensitive radical polymerization initiator (F) include 3,3-dimethyl- 4--18- 200904899 methoxy-diphenyl ketone and benzyl dimethyl ketal. p-Isoamyl dimethylaminobenzoate, ethyl p-dimethylaminobenzoate, diphenyl ketone, p-methoxydiphenyl ketone ' 2,2-diethoxy 'ethyl benzene, 2, 2-dimethoxy-1,2-diphenylethane-1-one, 1-hydroxycyclohexyl phenyl ketone, methyl phenyl glyoxylate, ethyl phenyl glyoxylate, 2-hydroxy- 2-methyl-1-phenylpropan-1-one, 2-methyl-^[4-(methylthio)phenyl]-2-sodium acetonide-1,2,4,6-trimethyl Benzopyridinium diphenylphosphine oxide and the like. Among them, from the fast curing rate, methyl phenyl glycolate, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1-hydroxycyclohexyl phenyl ketone, 2, 2 _ Dimethoxy-1,2-diphenylethane-1-one, benzyldimethylketal and 2,4,6-trimethylbenzimidyldiphenylphosphine oxide are preferred. These photo-sensitive radical polymerization initiators (F) may be used alone or in combination of two or more. The amount of the photo-induced radical polymerization initiator (F) is not particularly limited, and is preferably in the range of 1 to 10 parts by mass based on 100 parts by mass of the component (E). In the case where the curing rate of the irradiation active energy ray is fast, the amount is preferably 0.01 part by mass or more, and the abrasion resistance of the film is preferably 1 part by mass or less. It is more preferably in the range of 5 to 5 parts by mass. The active energy ray-curable composition used in the present invention is also preferably a polymer compound (G). By blending the polymer compound (G), it is possible to impart flexibility to the film to suppress the occurrence of cracks. The polymer compound (G) may, for example, be a polyacrylic polymer, a polyethylene polymer, a polyether polymer or a polydialkylsiloxane (anthracene resin). Among them, a polyether polymer is preferably used, and specific examples thereof include polyethylene glycol. The amount of the polymer compound (G) to be blended is not particularly limited, and is 100 parts by mass based on the solid content of the components (the total of the oxane oligomer, the organodecane, and the alkyl decanoate) of (A) -19-200904899. It is preferably in the range of 0 to 50 parts by mass, more preferably in the range of 1 to 1 part by mass. Further, in the active energy ray-curable composition used in the present invention, polymer microparticles, colloidal cerium oxide, colloidal metal, and photosensitizer (for example, an anthraquinone compound, a thioxanthone compound, or the like) may be blended as necessary. Lanthanide compounds, naphthalene compounds and lanthanoid compounds, etc., pigments, dyes, pigments, pigment dispersants, flow regulators, leveling agents, antifoaming agents, UV absorbers, light stabilizers, antioxidants, heat Inductive radical polymerization initiator, inductive cationic polymerization initiator, and the like. In order to improve the abrasion resistance of the cured product of the active energy ray-curable composition used in the present invention, the organic sand garden of the organic sand chamber represented by the general formula (4) and the tannic acid represented by the general formula (5) are contained. It is preferred that the compound of any one or more of the alkyl esters is hydrolyzed and the polycondensate (H) of colloidal cerium oxide having a number average particle diameter of 5 to 200 nm. When the component (H) is contained, the solid content of the solid component of the component (A) (the total of the decane oligomer, the organodecane, and the alkyl phthalate) and the solid component of the component (H) are 9: 1~5: 5 is good' with 8: 2~6: 4 is especially good. R12bSi(OR13)4-b (4) (wherein R12 represents an organic group having 1 to 10 carbon atoms, r13 represents an alkyl group having 1 to 5 carbon atoms or a fluorenyl group having 1 to 4 carbon atoms, and b represents 〇~ Integer of 3) -20- 200904899 R14 〇, OR16 ISi-0 I OR17 R15 (5) m (wherein r14, R15, R16 and R17 each independently represent an alkyl group of 1 to 5, and m represents 2 Specific examples of any of ~20) ° Specific examples of the organic decanes and alkyl phthalates include the above-mentioned ones. The colloidal cerium oxide may, for example, be an aqueous silica sand sol in which cerium oxide microparticles are uniformly dispersed in water, and an organic cerium oxide sol which is dispersed in a dispersion solvent. Examples of the dispersing solvent include alcohols such as methanol, ethanol, 2-propanol, 1-butanol, and ethylene glycol; ketones such as acetone, methyl ethyl ketone, and methyl isobutyl ketone; methyl acetate and acetic acid; An glycerin such as ethyl acetate or butyl acetate, or an aromatic hydrocarbon such as benzene, toluene or xylene, or a glyceryl ether such as ethylene glycol monoalkyl ether or propylene glycol monoalkyl ether. The dispersing solvent may be used singly or in combination of two or more.
膠體狀二氧化矽中的數量平均粒徑爲5~200奈米。藉 由使用數量平均粒徑爲5奈米以上的膠體狀二氧化砂’能 夠對硬化被膜賦予耐擦傷性及硬度。又,藉由使用數量平 均粒徑爲2 0 0奈米以下的膠體狀二氧化矽’能夠控制硬化 被膜的透明性。膠體狀二氧化矽的數量平均粒徑以10〜100 奈米爲佳。又,數量平均粒徑的測定法可舉出例如使用電 子顯微鏡觀察之方法。 爲了調整固體成分濃度、提升分散安定性、塗布性、 -21 - 200904899 提升與基材之黏附性等之目的’本發明所使用的活性能量 線硬化性組成物亦可含有有機溶劑。有機溶劑可舉出例如 醇類、酮類、醚類、酯類、賽路蘇(cellosolve)類及芳香族 化合物類等。 具體上可舉出甲醇、乙醇、1-丙醇、2-丙醇、1-丁醇、 2- 丁醇、異丁醇 '第三丁醇、苄醇、2-甲氧基乙醇、2-乙氧 基乙醇、2-(甲氧基甲氧基)乙醇、2-丁氧基乙醇、糠醇、四 氫糠醇、二甘醇、二甘醇一甲基醚、二甘醇一乙基醚、二 甘醇一丁基醚、1-甲氧基-2-丙醇、1-乙氧基-2-丙醇、二伸 丙甘醇、二伸丙甘醇一甲基醚' 二伸丙甘醇一乙基酸、三 甘醇一甲基醚、雙丙酮醇、丙酮、甲基乙基酮、2 -戊酮、 3- 戊酮、2-己酮、甲基異丁基酮' 2-庚酮、4-庚酮、二異丁 基酮、環己酮、甲基環己酮、乙醯苯、二乙基醚、二丙基 醚、二異丙基醚、二丁基醚、二己基醚' 茴香醚、苯乙醚、 四氫呋喃、四氫吡喃、1,2-二甲氧基乙烷、1,2-二乙氧基乙 烷、1,2-二丁氧基乙烷、二甘醇二甲基醚、二甘醇二乙基 醚、二甘醇二丁基醚、甘油醚、乙酸甲酯、乙酸乙酯、乙 酸丙酯、乙酸異丙酯、乙酸丁酯、乙酸異丁酯、乙酸第二 丁酯、乙酸戊酯、乙酸異戊酯、乙酸3 -甲氧基丁酯、乙酸 2-乙基丁酯、乙酸2-乙基己酯、丙酸甲酯、丙酸乙酯、丙 酸丁酯、7-丁內酯、乙酸2-甲氧基乙酯、乙酸2-乙氧基乙 酯、乙酸2-丁氧基乙酯、乙酸2-苯氧基乙酯、二甘醇一乙 基醚乙酸酯、二甘醇一 丁基醚乙酸酯、苯、甲苯及二甲苯 等。該等有機溶劑可單獨使用,亦可混合使用2種以上。 -22- 200904899 相對於(A)〜(Η)成分的合計量100重量份,有機溶劑的 含量以在〇〜1〇〇〇質量份的範圍內爲佳,以在〇〜1〇〇質量份 的範圍內爲更佳。這是因爲1 000質量份以下時,不容易產 生因固體成分太低致使產生塗膜變薄之問題,具有能夠得 到耐擦傷性良好的保護被膜之傾向。 能夠藉由例如在由塑膠等所構成的材料表面,以被膜 厚度爲0.5〜100微米左右塗布本發明所使用的活性能量線 硬化性組成物,接著.,照射活性能量線使其硬化,來形成 保護被膜。 活性能量線硬化性組成物的塗布能夠使用先前眾所周 知的方法,例如使用噴霧器、輥塗布器、凹版塗布器、苯 胺印刷器、網版印刷器、旋轉塗布器、淋塗機及靜電塗飾 等來進行。 活性能量線可舉出例如真空紫外線、紫外線、可見光 線等。具體例可舉出例低壓水銀燈、中壓水銀燈、高壓水 銀燈、超高壓水銀燈、白熾電燈泡、氙燈、鹵素燈、碳弧 燈、鹵化金屬燈、螢光燈、鎢燈、鎵燈、準分子雷射燈及 太陽光等作爲光源之光線。其中,以低壓水銀燈、中壓水 銀燈、高壓水銀燈、超高壓水銀燈及鹵化金屬燈作爲光源 之光線爲佳。活化射線可單獨使用1種類,亦可使用不同 種類的複數種類。 又,本發明所使用的活性能量線硬化性組成物亦可配 合照射活性能量線照射而進行加熱,能夠有效地進行硬 化。通常,已知使用光酸產生劑之此種反應時,藉由在光 -23- 200904899 照射之同時,或光照射後進行加熱,能夠促進硬化。但是 本發明的(A)成分時,除了本發明的酸產生劑以外,無法觀 察到加熱對促進硬化有大的效果。相對地,使用本發明的 酸產生劑時,能夠觀察到加熱有大的促進效果。 加熱可在照射活性能量線時加熱,亦可在照射活性能 量線後加熱。又,亦可在該兩者進行加熱。加熱可使用紅 外線加熱器等加熱,亦可使熱風循環來加熱。 又’在本發明之照射活性能量線時之加熱,不只是指 與照射同時之加熱,亦包含照射前加熱硬化性組成物,且 將硬化性組成物保持在高溫狀態照射活性能量線。 在照射活性能量線之前進行加熱時,以使活性能量線 硬化性組成物的溫度爲50〜1 00 °C的範圍爲佳。在與照射活 性能量線同時加熱時’以使活性能量線硬化性組成物的溫 度爲5 0〜1 0 0 °C的範圍爲佳。在照射活性能量線後加熱時, 以在50〜100 °C的環境下加熱1〜60分鐘爲佳。 在本發明’組成物能夠以作爲塗料材或印墨材料的方 式塗布在例如由金屬板、金屬罐等的金屬材料、紙、木質 材等的天然材料、陶瓷等的無機質材料、丙烯酸樹脂、聚 碳酸酯樹脂等塑膠成形物、PET、聚烯烴等的薄膜、電極沈 積塗飾扳、層壓板等的複合材料等所構成的基材’並藉由 使其硬化而在基材上形成保護被膜。 實施例 以下’詳細地敘述本發明的實施例,但是本發明未限 定於此等。在以下所記載之「份」係表示「質量份。 -24 - 200904899 <合成例> <合成例1 >矽氧烷低聚物A 1的合成 添加18.0克甲基三甲氧基砂垸(信越化學工業(股) 製、分子量136·2)、2.97克苯基三甲氧基矽烷(信越化學工 業(股)製、分子量198.3)、1〇.〇克異丙醇、水’並攪拌成 爲均勻的溶液。而且,添加15.9克水並邊擾拌邊在80C加 熱9小時,來進行加水分解、縮合’成爲政氧烷低聚物。 而且追加異丙醇使全體爲54_1克’來得到固體成分濃度爲 2 0質量%之矽氧烷低聚物A 1。而且使用G P C來測定重量平 均分子量時’換算成聚苯乙儲分子量爲約2,〇〇〇。 但是,在此所稱固體成分濃度係意味著相對於溶液全 體,完全地加水分解、縮合時所得到的矽氧烷低聚物的質 量分率,以下的矽氧烷低聚物A2及A3亦同樣。 <合成例2>矽氧烷低聚物A2的合成 在1 0 · 0克換算成二氧化矽濃度爲5 3質量%的矽酸甲酯 (COLCOAT(股)製、平均約七聚物、平均分子量爲約7 89、 商品名:METHYLSILICATE 53 A)及17.3克甲基三甲氧基 矽烷中,添加10.0克異丙醇並攪拌而成爲均勻的溶液。而 且’添加1 〇. 5克水,並邊攪拌邊在8 0°C加熱3小時,來進 行加水分解、縮合,成爲矽氧烷低聚物。而且追加異丙醇 使全體爲69.2克,來得到固體成分濃度爲20質量%之矽氧 烷低聚物A2。而且使用GPC來測定重量平均分子量時, 換算成聚苯乙烯分子量爲約6,500。 <合成例3>矽氧烷低聚物A3的合成 -25- 200904899 添加16.34克甲基三甲氧基矽烷、5.95克苯基三甲氧 基矽院、10.0克異丙醇並攪拌成爲均勻的溶液。而且,添 加1 6 · 2克水並邊攪拌邊在8 0 °c加熱9小時,來進行加水分 解、縮合,成爲矽氧烷低聚物。而且追加異丙醇使全體爲 59.6克,來得到固體成分濃度爲20質量%之矽氧烷低聚物 A3。而且使用GPC來測定重量平均分子量時,換算成聚苯 乙稀分子量爲約1,700。 <合成例4>有機矽烷與膠體狀二氧化矽之加水分解、縮聚 物 Η1的合成 在具有攪拌器及冷卻器之5 00毫升茄型燒瓶’加入 克膠體狀二氧化矽之異丙醇分散膠體二氧化矽(日產化學 工業(股)製、商品名:SNOTEX IPA-ST-L)、6.8克甲基三甲 氧基矽烷、5.4克純水及74.6克異丙醇,並使用水浴在80 °C加熱、攪拌4小時,來進行加水分解、縮合’得到固體 成分濃度2 0質量%的縮聚物 Η 1溶液。 但是,在此所稱固體成分濃度係意意味著相對於溶液 全體,完全加水分解、縮合時所得到的有機矽烷類或矽酸 烷基酯類與膠體狀二氧化矽之加水分解、縮聚物’在以下 的Η2及Η3亦同樣。 <合成例5 >矽酸烷酯與膠體狀二氧化矽之加水分解、縮聚 物Η2的合成 在具有攪拌器及冷卻器之500毫升茄型燒瓶’加入100 克膠體狀二氧化矽之異丙醇分散膠體二氧化矽(日產化學 工業(股)製、商品名:SNOTEX IPA-ST)、11.75克矽酸甲 -26- 200904899 酯四聚物(COLCOAT(股)製、商品名:METHYLSILICATE 5 1 )、9.0克純水及5 9.2 5克異丙醇’並使用水浴在8 0 °C加 熱、攪拌4小時,來進行加水分解、縮合’得到固體成分 濃度20質量%的縮聚物H2溶液。 <合成例6>化合物A4的合成 添加14.72克甲基三甲氧基砂院、2_68克苯基二甲氧 基矽烷 、1.64 克二甲基二甲氧基矽烷 (TORAY-DOWCORNING(股)製、分子量 120.2),加入 16.84 克異丙醇、14.12克純水並攪拌來得到固體成分濃度爲20 質量%之化合物A4。但是,在此所稱固體成分濃度係意意 味著相對於溶液全體,完全加水分解、縮合時所得到的有 機矽烷類或矽酸烷基酯類之加水分解、縮聚物’在以下的 A5~A7亦同樣。 <合成例7>化合物A5的合成 在17.73克甲基三甲氧基矽烷、1.94克苯基三甲氧基 矽烷,添加1 5 . 1 8克異丙醇、1 5 . 1 4克純水並攪拌來得到固 體成分濃度爲2 0質量%之化合物A 5。 <合成例8 >化合物A 6的合成 在9.16克甲基三甲氧基矽烷、3.08克苯基三甲氧基较 烷、4.92克3-環氧丙氧基丙基三甲氧基矽烷(信越化學工業 (股)製、分子量236.1),添加21.64克異丙醇、11.20克純 水並攪拌來得到固體成分濃度爲20質量%之化合物A6 ° <合成例9>化合物A7的合成 在1.78克換算成二氧化矽濃度爲53質量%的矽酸甲 -27- 200904899 酯、13.32克甲基三甲氧基矽烷、2.42克苯基三甲氧基矽 烷、1.48克二甲基二甲氧基矽烷,添加16.92克異丙醇、 14.08克純水,並攪拌得到固體成分濃度爲20質量%之化 合物A 7。 <合成例1 〇>有機矽烷與膠體狀二氧化矽之加水分解、縮聚 物H3的合成 在具有攪拌器及冷卻器之5 0 0毫升茄型燒瓶,加入100 克膠體狀二氧化矽之異丙醇分散膠體二氧化矽(日產化學 工業(股)製、商品名:SNOTEX IPA-ST)、6.8克甲基三甲 氧基矽烷、5 · 4克純水及7 4.6克異丙醇,並使用水浴在8 0 °C加熱、攪拌4小時,來進行加水分解、縮合,得到固體 成分濃度2 0質量%的縮聚物 Η 3溶液。 <實施例1 > [活性能量線硬化性組成物的調製] 在(Α)成分爲50.0份於合成例1所得到矽氧烷低聚物 Α1的固體成分濃度20質量%溶液(固體成分爲10.0份)中, 混合0.4份(Β)成分之六氟銻酸苄基-4-羥苯基甲基毓的50 質量%丫 -丁內酯溶液(固體成分爲0.2份)、10.0份溶劑之異 丙醇、15.0 份r- 丁內酯、10.0 份丁基賽路蘇 (b u t y 1 c e 11 〇 s ο 1 v e)、0.0 1 份調平劑之砂系界面活性劑 (TORAY-DOWCORNING公司製、商品名L-700 1 ),作爲活 性能量線硬化性組成物。 [光硬化性組成物膜的形成] 將該活性能量線硬化性組成物適當地滴加在長度爲1 0 -28- 200904899 公分、寬度爲 10公分、厚度爲 3毫米的丙烯酸酯板 (MITSUBISHI RAYON 股份公司製、商品名「ACRYLAIT EX」) 上,使用硬塗法(使用棒塗布器No. 26),以乾燥後的厚度 爲3〜4微米的方式塗布,並在室溫自然乾燥約60分鐘。 [保護被膜的形成] 而且,使用具備輸送器之120W/cm的高壓水銀燈(OAK 股份公司製、紫外線照射裝置、HANDY-UV- 1 2 00、 QRU-2161),照射累積光量爲lOOOmJ/cm2的紫外線,並使 其硬化而得到保護被膜。累積光量係使用紫外線光量計 (OAK股份公司製、UV-351型)來測定。因照射紫外線之試 樣的最高溫度爲3 3 t。 [被膜的評價] 將所得到的保護薄膜,使用以下的方法評價。 1) 外觀 藉由目視觀察具有保護薄膜之丙烯酸酯板的透明 性、裂縫、有無白化,並使用以下的基準評價。 「〇」:透明且無裂縫、白化缺陷者(良好)。 「X」:有不透明的部分、有裂縫、白化等缺陷者(不 良)。 2) 膜厚度 使用掃描型電子顯微鏡觀察具有保護薄膜之丙烯酸 酯板的剖面,來測定膜厚度。 3 )耐擦傷性 使用# 〇 0 〇 〇鋼絲絨對具有保護被膜之丙烯酸酯板的表 -29- 200904899 面以9.8x1 04 Pa施加壓力而往復摩擦10次,並依照以下的 基準評價在Ixlcm的範圍所產生的傷痕根數。 A :傷痕 〇根(有光澤面) B :傷痕 1〜9根(有光澤面) C+:傷痕 〜49根(有光澤面) C-:傷痕 50~99根(有光澤面) D :傷痕 1 〇 〇根以上(有光澤面) E :光澤面消失 4)鉛筆硬度 依照:TIS-K5600(鉛筆搔刮試驗)評價保護被膜的鉛筆 硬度。 結果,本實施例的被膜係具有良好的外觀、耐擦傷 性。結果如表1所示。 <實施例2〜5> 除了( A)成分及(B )成分係調配表i所記載者以外,與 實施例1同樣地進行,來實施活性能量線硬化性組成物的 調製、光硬化性組成物膜的形成、保護被膜的形成及被膜 的評價。結果如表1所示。 <實施例6> 與實施例1同樣地進行,來進行調製活性能量線硬化 性組成物、光硬化性組成物膜的形成,而且,在照射紫外 線的同時,使用鹵素燈加熱試樣至約7(rc,來進行被膜的 硬化。隨後,與實施例!同樣地進行評價被膜。結果如表 1所示。 -30- 200904899 <實施例7 > 與實施例1同樣地進行’來進行調製活性能量線硬化 性組成物、光硬化性組成物膜的形成,並藉由照射紫外糸复 來進行膜的硬化。而且,使用熱風乾燥器進行後熟化,並 在90°C乾燥1 〇分鐘,來形成保護被膜。隨後,與實施例丄 同樣地進行評價被膜。結果如表1所示。 <實施例8> 與實施例6同樣地進行’來進行調製活性能量線硬化 性組成物、光硬化性組成物膜的形成,並藉由照射紫外線 來進行膜的硬化。而且’使用熱風乾燥器進行後熟化,並 在90°C乾燥10分鐘,來形成保護被膜。隨後,與實施例i 同樣地進行評價被膜。結果如表1所示。 <比較例1〜3> 除了(A)成分及(B,)成分係調配表2所記載者以外, 與實施例i同樣地進行,來進行調製活性能量線硬化性組 成物、光硬化性組成物膜的形成,並藉由照射紫外線來進 行膜的硬化’且進行評價被膜。結果如表2所示。 <比較例4 > 除了(A)成分及(B,)成分係調配表2所記載者以外, 與實施Μ 6關地進G,來進行調製、活性能量線硬化性組 成物、光硬化性組成物膜的形成’並藉由照射紫外線來進 行膜的硬f匕’來形成保護被膜。隨後,使用與實施例】同 樣的方法來實施被膜的評價。結果如表2所示。 <比較例5> -31- 200904899 除了(A)成分及(B’ )成分係調配表2所記 與實施例7同樣地進行,來進行調製活性能量 成物、光硬化性組成物膜的形成,並藉由照射 行膜的硬化,且進行後熟化,來形成保護被膜 用與實施例1同樣的方法來實施被膜的評價。 所示。 <比較例6 > 除了(A)成分及(B’ )成分係調配表2所記 與實施例8同樣地進行,來進行調製活性能量 成物、光硬化性組成物膜的形成,並藉由照射 行膜的硬化,且進行後熟化,來形成保護被膜 用與實施例1同樣的方法來實施被膜的評價。 所示。 <比較例7> 與實施例1同樣地進行,來進行活性能量 成物的調製、光硬化性組成物膜的形成。而且 加熱1 2 0分鐘來替代光硬化,以進行被膜的硬 與實施例1同樣地進行評價被膜。結果如表2 由實施例、比較例可以得知,依照本發明 形成方法時,藉由短時間光照射,能夠形成外 性優良的保護被膜。另一方面,明確地知道使 酸產生劑時,難以顯現良好的耐擦傷性。又, 所示,得知在本發明所使用的光硬化性組成物 時係無法形成外觀、耐擦傷性優良的保護被膜 載者以外, 線硬化性組 紫外線來進 。隨後,使 結果如表2 載者以外, 線硬化性組 紫外線來進 。隨後,使 結果如表2 線硬化性組 ,進行9 0 °C 化。隨後, 所示。 的保護被膜 觀、耐擦傷 用其他的光 如比較例7 ,只有加熱 -32- 200904899 [表i]The number average particle diameter in the colloidal ceria is 5 to 200 nm. By using a colloidal silica sand having a number average particle diameter of 5 nm or more, it is possible to impart scratch resistance and hardness to the hardened film. Further, the transparency of the cured film can be controlled by using a colloidal cerium oxide having an average particle diameter of 200 nm or less. The number average particle diameter of the colloidal cerium oxide is preferably from 10 to 100 nm. Further, the method of measuring the number average particle diameter is, for example, a method of observation using an electron microscope. The active energy ray-curable composition used in the present invention may contain an organic solvent for the purpose of adjusting the concentration of the solid component, improving the dispersion stability, and coating properties, and enhancing the adhesion to the substrate, etc. - 21 - 200904899. The organic solvent may, for example, be an alcohol, a ketone, an ether, an ester, a cellosolve or an aromatic compound. Specific examples thereof include methanol, ethanol, 1-propanol, 2-propanol, 1-butanol, 2-butanol, isobutanol 't-butanol, benzyl alcohol, 2-methoxyethanol, and 2- Ethoxyethanol, 2-(methoxymethoxy)ethanol, 2-butoxyethanol, decyl alcohol, tetrahydrofurfuryl alcohol, diethylene glycol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, Diethylene glycol monobutyl ether, 1-methoxy-2-propanol, 1-ethoxy-2-propanol, di-propanol, di-propanol monomethyl ether Alcohol monoethyl acid, triethylene glycol monomethyl ether, diacetone alcohol, acetone, methyl ethyl ketone, 2-pentanone, 3-pentanone, 2-hexanone, methyl isobutyl ketone ' 2- Heptone, 4-heptanone, diisobutyl ketone, cyclohexanone, methylcyclohexanone, acetophenone, diethyl ether, dipropyl ether, diisopropyl ether, dibutyl ether, two Hexyl ether 'anisole, phenethyl ether, tetrahydrofuran, tetrahydropyran, 1,2-dimethoxyethane, 1,2-diethoxyethane, 1,2-dibutoxyethane, two Glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dibutyl ether, glyceryl ether, methyl acetate, ethyl acetate, propyl acetate, acetic acid Propyl ester, butyl acetate, isobutyl acetate, second butyl acetate, amyl acetate, isoamyl acetate, 3-methoxybutyl acetate, 2-ethylbutyl acetate, 2-ethylhexyl acetate Ester, methyl propionate, ethyl propionate, butyl propionate, 7-butyrolactone, 2-methoxyethyl acetate, 2-ethoxyethyl acetate, 2-butoxyethyl acetate, 2-phenoxyethyl acetate, diethylene glycol monoethyl ether acetate, diethylene glycol monobutyl ether acetate, benzene, toluene and xylene. These organic solvents may be used singly or in combination of two or more. -22- 200904899 The content of the organic solvent is preferably in the range of 〇1 to 1 part by mass, based on 100 parts by weight of the total of the components (A) to (Η), in terms of 〇1 to 1 part by mass. The range is better. When the amount is less than 1,000 parts by mass, the problem that the coating film is thinned due to the low solid content is less likely to occur, and the protective film having a good scratch resistance tends to be obtained. The active energy ray-curable composition used in the present invention can be applied to the surface of a material made of plastic or the like at a thickness of about 0.5 to 100 μm, for example, and then irradiated with an active energy ray to be cured. Protect the film. The application of the active energy ray-curable composition can be carried out by a previously known method, for example, using a sprayer, a roll coater, a gravure coater, a flexographic printer, a screen printer, a spin coater, a coater, and an electrostatic coating. . Examples of the active energy ray include vacuum ultraviolet rays, ultraviolet rays, visible rays, and the like. Specific examples include low-pressure mercury lamps, medium-pressure mercury lamps, high-pressure mercury lamps, ultra-high pressure mercury lamps, incandescent bulbs, xenon lamps, halogen lamps, carbon arc lamps, metal halide lamps, fluorescent lamps, tungsten lamps, gallium lamps, and excimer lasers. Light, light, etc. as a light source. Among them, light with a low-pressure mercury lamp, a medium-pressure mercury lamp, a high-pressure mercury lamp, an ultra-high pressure mercury lamp, and a halogenated metal lamp as a light source is preferred. The activation ray can be used alone or in combination of different types. Further, the active energy ray-curable composition used in the present invention can be heated by irradiation with an active energy ray, and can be effectively hardened. In general, when such a reaction using a photoacid generator is known, it is possible to promote hardening by irradiation with light -23-200904899 or heating after light irradiation. However, in the case of the component (A) of the present invention, in addition to the acid generator of the present invention, it is not observed that heating has a large effect on promoting hardening. On the other hand, when the acid generator of the present invention is used, it is observed that heating has a large promoting effect. Heating can be performed by heating the active energy ray, or by heating the active energy ray. Further, it is also possible to heat both of them. The heating can be performed by using an infrared heater or the like, or the hot air can be circulated to heat. Further, the heating in the case of irradiating the active energy ray of the present invention includes not only heating simultaneously with irradiation but also heating the curable composition before irradiation, and irradiating the active energy ray with the curable composition at a high temperature. When the heating is performed before the irradiation of the active energy ray, the temperature of the active energy ray-curable composition is preferably in the range of 50 to 100 °C. It is preferable that the temperature of the active energy ray-curable composition is from 50 to 100 ° C when it is heated simultaneously with the irradiation activity. When heating after irradiating the active energy ray, it is preferred to heat it at 50 to 100 ° C for 1 to 60 minutes. In the present invention, the composition can be applied as a coating material or an ink material to a metal material such as a metal plate or a metal can, a natural material such as paper or wood, an inorganic material such as ceramics, an acrylic resin, or a polymer. A plastic molded product such as a carbonate resin, a film such as a film of PET or polyolefin, a composite material such as an electrodeposition coating plate or a laminate, and the like are formed, and a protective film is formed on the substrate by curing. EXAMPLES Hereinafter, the examples of the present invention will be described in detail, but the present invention is not limited thereto. The "parts" described below indicate "parts by mass. -24 - 200904899 <Synthesis Example><Synthesis Example 1 > Synthesis of siloxane oxide oligomer A 1 18.0 g of methyltrimethoxy sand was added.垸 (Shin-Etsu Chemical Industry Co., Ltd., molecular weight 136·2), 2.97 g of phenyltrimethoxydecane (manufactured by Shin-Etsu Chemical Co., Ltd., molecular weight 198.3), 1 〇. 异丙 isopropyl alcohol, water' and stirring A uniform solution was obtained, and 15.9 g of water was added thereto, and the mixture was heated at 80 C for 9 hours while stirring, and then hydrolyzed and condensed to become an ophthalmic oligomer. Further, isopropyl alcohol was added to make the whole of 54_1 g. When the weight average molecular weight is measured by GPC, the molecular weight of the polyphenylene carbonate is about 2, 〇〇〇. However, the solid is referred to herein as a solid component concentration of 20% by mass. The component concentration means the mass fraction of the azide oligomer obtained at the time of completely hydrolyzing and condensing the entire solution, and the following alumoxane oligomers A2 and A3 are also the same. <Synthesis Example 2> The synthesis of the oxirane oligomer A2 is converted into 1 0 · 0 g Methyl decanoate having a cerium oxide concentration of 53% by mass (manufactured by COLCOAT (manufactured by COLCOAT, average about heptamer, average molecular weight of about 7 89, trade name: METHYLSILICATE 53 A) and 17.3 g of methyltrimethoxydecane) Add 10.0 g of isopropyl alcohol and stir to form a homogeneous solution. Also, add 1 〇. 5 g of water and heat at 80 ° C for 3 hours while stirring to carry out hydrolysis and condensation to form a low oxime. Further, isopropyl alcohol was added in an amount of 69.2 g to obtain a decane alkane oligomer A2 having a solid concentration of 20% by mass, and when the weight average molecular weight was measured by GPC, the molecular weight converted to polystyrene was about 6,500. <Synthesis Example 3> Synthesis of oxane oligomer A3-25-200904899 16.34 g of methyltrimethoxydecane, 5.95 g of phenyltrimethoxyanthracene, 10.0 g of isopropyl alcohol, and stirred to be uniform were added. In addition, 1 6 · 2 g of water was added and heated at 80 ° C for 9 hours while stirring to carry out hydrolysis and condensation to form a decane oligomer, and isopropyl alcohol was added to make the whole 59.6 g. To obtain a solid concentration of 20% by mass When the weight average molecular weight is measured by GPC, the molecular weight converted to polystyrene is about 1,700. <Synthesis Example 4> Hydrolysis and polycondensation of organic decane and colloidal cerium oxide Synthesis of the material 1 in a 500 ml eggplant flask with a stirrer and a cooler. Adding isopropyl alcohol dispersed colloidal cerium oxide (manufactured by Nissan Chemical Industries Co., Ltd., trade name: SNOTEX IPA- ST-L), 6.8 g of methyltrimethoxydecane, 5.4 g of pure water and 74.6 g of isopropyl alcohol, and heated and stirred at 80 ° C for 4 hours in a water bath to carry out hydrolysis and condensation to obtain a solid concentration of 2 0% by mass of the polycondensate Η 1 solution. However, the term "solid content concentration" as used herein means the hydrolysis and condensation of organic decane or alkyl decanoate and colloidal cerium oxide obtained by total hydrolysis and condensation. The same applies to the following Η2 and Η3. <Synthesis Example 5 > Synthesis of water-decomposed alkyl phthalate and colloidal cerium oxide, synthesis of polycondensate Η 2 Addition of 100 g colloidal cerium oxide in a 500 ml eggplant flask having a stirrer and a cooler Propylene alcohol dispersion colloidal cerium oxide (manufactured by Nissan Chemical Industry Co., Ltd., trade name: SNOTEX IPA-ST), 11.75 g phthalic acid methyl -26-200904899 ester tetramer (COLCOAT (trade name), trade name: METHYLSILICATE 5 1), 9.0 g of pure water and 59.2 g of isopropyl alcohol' were heated and stirred at 80 ° C for 4 hours using a water bath to carry out hydrolysis and condensation to obtain a polycondensate H2 solution having a solid concentration of 20% by mass. <Synthesis Example 6> Synthesis of Compound A4: 14.72 g of methyltrimethoxysilane, 2 to 68 g of phenyldimethoxydecane, and 1.64 g of dimethyldimethoxydecane (TORAY-DOWCORNING) Molecular weight 120.2), 16.84 g of isopropyl alcohol and 14.12 g of pure water were added and stirred to obtain a compound A4 having a solid concentration of 20% by mass. However, the term "solid content concentration" as used herein means a hydrolyzed or polycondensate of an organic decane or an alkyl phthalate obtained by completely hydrolyzing and condensing the entire solution, in the following A5 to A7. The same is true. <Synthesis Example 7> Synthesis of Compound A5 In 17.73 g of methyltrimethoxydecane and 1.94 g of phenyltrimethoxydecane, 15.81 g of isopropyl alcohol, 15.1 g of pure water and stirring were added. The compound A 5 having a solid concentration of 20% by mass was obtained. <Synthesis Example 8 > Synthesis of Compound A 6 at 9.16 g of methyltrimethoxydecane, 3.08 g of phenyltrimethoxybutane, and 4.92 g of 3-glycidoxypropyltrimethoxydecane (Shin-Etsu Chemical) Industrial (stock) system, molecular weight 236.1), 21.64 g of isopropyl alcohol and 11.20 g of pure water were added and stirred to obtain a compound A6 ° having a solid concentration of 20% by mass. [Synthesis Example 9 > Synthesis of Compound A7 at 1.78 g As a ceria having a concentration of 53% by mass of phthalic acid methyl -27-200904899 ester, 13.32 g of methyl trimethoxy decane, 2.42 g of phenyl trimethoxy decane, and 1.48 g of dimethyl dimethoxy decane, 16.92 was added. Isopropyl alcohol, 14.08 g of pure water, and stirred to obtain a compound A 7 having a solid concentration of 20% by mass. <Synthesis Example 1 〇> Hydrolysis of organic decane and colloidal cerium oxide, synthesis of polycondensate H3 In a 500 ml eggplant type flask equipped with a stirrer and a cooler, 100 g of colloidal cerium oxide was added thereto. Isopropanol dispersion colloidal cerium oxide (manufactured by Nissan Chemical Industry Co., Ltd., trade name: SNOTEX IPA-ST), 6.8 g of methyltrimethoxy decane, 5.4 g of pure water and 7 4.6 g of isopropyl alcohol, and The mixture was heated and stirred at 80 ° C for 4 hours in a water bath to carry out hydrolysis and condensation to obtain a polycondensate Η 3 solution having a solid concentration of 20% by mass. <Example 1> [Preparation of active energy ray-curable composition] The solid content of the oxime oligomer Α1 obtained in Synthesis Example 1 was 20% by mass (solid content) In a 10.0 part), 0.4 parts by weight of a 50% by mass 丫-butyrolactone solution of benzyl-4-hydroxyphenylmethyl hydrazine hexafluoroantimonate (solid content: 0.2 parts) and 10.0 parts of a solvent are mixed. Isopropanol, 15.0 parts of r-butyrolactone, 10.0 parts of butyl sedum (buty 1 ce 11 〇s ο 1 ve), 0.01 part of a leveling agent sand-based surfactant (TORAY-DOWCORNING) , trade name L-700 1 ), as an active energy ray-curable composition. [Formation of Photocurable Composition Film] The active energy ray-curable composition was appropriately dropped on an acrylate board (MITSUBISHI RAYON) having a length of 10-28-200904899 cm, a width of 10 cm, and a thickness of 3 mm. Co., Ltd., product name "ACRYLAIT EX"), applied by a hard coating method (using a bar coater No. 26), dried to a thickness of 3 to 4 μm, and naturally dried at room temperature for about 60 minutes. . [Formation of protective film] A high-pressure mercury lamp (manufactured by OAK Co., Ltd., UV irradiation device, HANDY-UV-1 2 00, QRU-2161) equipped with a conveyor of 120 W/cm was used, and the cumulative amount of light was 1000 mJ/cm 2 . Ultraviolet rays are hardened to obtain a protective film. The cumulative amount of light was measured using an ultraviolet light meter (manufactured by OAK Co., Ltd., UV-351 type). The maximum temperature of the sample irradiated with ultraviolet light is 3 3 t. [Evaluation of Film] The obtained protective film was evaluated by the following method. 1) Appearance The transparency, crack, and whitening of the acrylate plate having the protective film were visually observed, and the following criteria were used for evaluation. "〇": transparent and crack-free, whitening defects (good). "X": There are opaque parts, cracks, whitening and other defects (poor). 2) Film thickness The film thickness was measured by observing the cross section of the acrylate plate having the protective film using a scanning electron microscope. 3) Scratch resistance using # 〇0 〇〇 steel wool on the acrylate plate with the protective film, the surface of Table -29- 200904899 was rubbed and rubbed 10 times with a pressure of 9.8x1 04 Pa, and evaluated in Ixlcm according to the following criteria. The number of scars produced by the range. A: Scars (shiny face) B: 1 to 9 scars (glossy face) C+: Scars ~ 49 (glossy faces) C-: 50 to 99 scars (glossy faces) D: Scars 1 Above the root (glossy side) E: The shiny side disappears 4) Pencil hardness The pencil hardness of the protective film is evaluated in accordance with TIS-K5600 (pencil scratch test). As a result, the film system of the present embodiment has a good appearance and scratch resistance. The results are shown in Table 1. <Examples 2 to 5> The preparation of the active energy ray-curable composition and the photocurability were carried out in the same manner as in Example 1 except that the components (A) and (B) were prepared in accordance with Table i. Formation of a composition film, formation of a protective film, and evaluation of a film. The results are shown in Table 1. <Example 6> The preparation of the active energy ray-curable composition and the photocurable composition film was carried out in the same manner as in Example 1, and the sample was heated with a halogen lamp while irradiating ultraviolet rays. 7 (rc), the film was cured. Then, the film was evaluated in the same manner as in Example! The results are shown in Table 1. -30-200904899 <Example 7 > In the same manner as in Example 1, ' The formation of the active energy ray-curable composition and the photocurable composition film is carried out, and the film is cured by irradiation with ultraviolet ray. Further, it is post-cured using a hot air dryer and dried at 90 ° C for 1 〇 minute. The protective film was formed in the same manner as in Example 。. The results are shown in Table 1. <Example 8> In the same manner as in Example 6, the active energy ray-curable composition was prepared. The photocurable composition film was formed, and the film was cured by irradiation with ultraviolet rays. Further, it was post-cured using a hot air dryer and dried at 90 ° C for 10 minutes to form a protective film. Then, the film was evaluated in the same manner as in Example i. The results are shown in Table 1. <Comparative Examples 1 to 3> Except that the components (A) and (B,) were prepared in Table 2, and Examples In the same manner, the active energy ray-curable composition and the photocurable composition film were formed, and the film was cured by irradiation with ultraviolet rays, and the film was evaluated. The results are shown in Table 2. Comparative Example 4 > In addition to the components described in Table (2) and (B,), the composition of Table 2 is adjusted, and the active energy ray-curable composition and photocurable composition are prepared. The protective film was formed by irradiating ultraviolet rays to form a protective film. The evaluation of the film was carried out in the same manner as in Example. The results are shown in Table 2. <Comparative Example 5> -31-200904899 In the same manner as in the seventh embodiment, the composition of the component (A) and the component (B') was prepared in the same manner as in the case of the seventh embodiment, and the formation of the active energy-generating material and the photocurable composition film was carried out. Hardened by the illuminating film, and After the aging, the protective film was formed to evaluate the film in the same manner as in Example 1. [Comparative Example 6 > In addition to (A) component and (B') component formulation table 2 In the same manner as in Example 1, the formation of the protective active energy product and the photocurable composition film was carried out in the same manner as in Example 1, and the protective film was formed by curing the film and curing the film. Evaluation of the film was carried out. <Comparative Example 7> The preparation of the active energy product and the formation of the photocurable composition film were carried out in the same manner as in Example 1. Further, the photocuring was replaced by heating for 120 minutes. The film was evaluated in the same manner as in Example 1 in which the film was hardened. As a result, as seen from the examples and the comparative examples, in the case of the formation method of the present invention, it is possible to form a protective film having excellent externality by short-time light irradiation. On the other hand, when the acid generator is clearly known, it is difficult to exhibit good scratch resistance. In the case of the photocurable composition used in the present invention, it is known that the protective film is excellent in appearance and scratch resistance, and the line curable group is irradiated with ultraviolet rays. Subsequently, the results were as shown in Table 2, and the line hardening group was irradiated with ultraviolet rays. Subsequently, the results were as shown in Table 2, the line hardening group, and subjected to 90 °C. Subsequently, as shown. Protective film, scratch resistance, other light, as in Comparative Example 7, only heating -32- 200904899 [Table i]
成分 實方ΐ 1 2 3 4 5 6 7 8 (A)成分 調配量(份) (固體成分(份)) Α1 50.0 (10.0) Α1 50.0 (10.0) Α1 50.0 (10.0) Α1 50.0 (10.0) Α2 50.0 (10.0) Α1 50.0 (10.0) A1 50.0 (10.0) A1 50.0 (10.0) (B)成分 調配量(份) (固體成分(份)) Β1 0.4 (0.2) Β2 0.4 (0.2) Β3 0.4 (0.2) Β4 0.4 (0.2) Β1 0.4 (0.2) Β1 0.4 (0.2) B1 0.4 (0.2) B1 0.4 (0.2) UV照射量 (mJ/cm2) 1000 1000 1000 1000 1000 1000 1000 1000 UV照射時加熱 - - - - - 70°C - 7〇°c 後熟化 - - - - - - 90°C ' 10分鐘 90。。、 10分鐘 外觀 〇 〇 〇 〇 〇 〇 〇 〇 膜厚度(微米) 3.4 4.0 3.7 3.3 3.8 3.4 3.9 3.2 耐擦傷性 C+ C+ C+ C+ Β Β B B 鉛筆硬度 5Η 5Η 5Η 5Η 5Η 4Η 6H 4HIngredients ΐ 1 2 3 4 5 6 7 8 (A) Ingredients (parts) (solid content (parts)) Α1 50.0 (10.0) Α1 50.0 (10.0) Α1 50.0 (10.0) Α1 50.0 (10.0) Α2 50.0 (10.0) Α1 50.0 (10.0) A1 50.0 (10.0) A1 50.0 (10.0) (B) Composition (parts) (solid content (parts)) Β1 0.4 (0.2) Β2 0.4 (0.2) Β3 0.4 (0.2) Β4 0.4 (0.2) Β1 0.4 (0.2) Β1 0.4 (0.2) B1 0.4 (0.2) B1 0.4 (0.2) UV irradiation (mJ/cm2) 1000 1000 1000 1000 1000 1000 1000 1000 Heating during UV irradiation - - - - - 70 °C - 7〇°c post-curing - - - - - - 90 °C '10 minutes 90. . 10 minutes Appearance 〇 〇 〇 〇 〇 〇 〇 〇 Film thickness (micron) 3.4 4.0 3.7 3.3 3.8 3.4 3.9 3.2 Scratch resistance C+ C+ C+ C+ Β Β B B Pencil hardness 5Η 5Η 5Η 5Η 5Η 4Η 6H 4H
[表2][Table 2]
成分 比較例 1 2 3 4 5 6 7 (A)成分 A1 A1 A1 A1 A1 A1 A1 調配量(份) 50.0 50.0 50.0 50.0 50.0 50,0 50.0 (固體成分(份)) (10.0) (10.0) (10.0) (10.0) (10.0) (10.0) (10.0) (B)成分 B1 調配量(份) - - - 墨 - - 0.4 (固體成分(份)) (0.2) (B’戚分 ΒΊ B’2 B,3 ΒΊ B,1 B,1 調配量(份) 0.4 0.4 0.4 0.4 0.4 0.4 - (固體成分(份)) (0.2) (0.2) (0.2) (0.2) (0.2) (0.2) UV照射量 (mJ/cm2) 1000 1000 1000 1000 1000 1000 * UV照射時加熱 - - - 70°C - 70°C - 後熟化 - - - - 90°C、 10分鐘 90。。、 10分鐘 90°C、 10分鐘 外觀 〇 〇 〇 〇 〇 〇 〇 膜厚度(微米) 3.2 3.3 3.4 3.1 3.9 3.2 3.4 耐擦傷性 D E E D D D E 鉛筆硬度 3H 4H 3H 3H 3H 3H 3H -33- 200904899 [表3] — I..··. — 表中的略號 A1 在合成例1所得到固體成分濃度爲20質量%之矽氧烷低聚物A1溶液 _ A2 在合成例2所得到固體成分濃度爲20質量%之矽氧烷低聚物A2溶液 _ B1 六氟銻酸苄基-4-羥苯基甲基鏑的50質量% r -丁內酯溶液 - B2 六氟銻酸沒-萘基甲基-4-羥苯基甲基毓的50質量% r-丁內酯溶液 ___ B3 六氟銻酸甲苄基-4-羥苯基甲基鏑的50質量% r -丁內酯溶液 _ B4 六氟磷酸苄基-4-羥苯基甲某锍的50質量% r -丁內酯溶液 _ B,1 雙六氟磷酸硫代雙(4,1-伸苯基)-S,S,S’,S’ -四苯基二锍與六氟磷酸二苯基(4-苯硫 基苯基)銃的50質量%碳酸丙烯酯溶液 (DOW Chemical 日本股份公司製、商品名:「CYRACURE UVI-6992」) —_ B’2 六氟磷酸二甲基-4-羥苯基鏑的50質量% r -丁內酯溶液 B,3 六氟磷酸 1-(4-甲基苯基)[4-(2-甲基丙基)苯基]碘鐡 (Iodonium,(4-methylphenyl)[4-(2-methylpr〇pyl)phenyl]-hexaflurophosphate(l-)) (CIBA SPECIALTY CHEMICALS 公司製、商品名:「IRGACURE250 丨) A3 在合成例3所得到固體成分濃度爲20質量%之矽氧烷低聚物A3溶液 HI 在合成例4所得到固體成分濃度爲20質量%之縮聚物H1溶液 (有機矽烷與膠體狀二氧化矽之加水分解、縮聚物) H2 在合成例5所得到固體成分濃度爲20質量%之縮聚物H2溶液 (矽酸烷基酯與膠體狀二氧化矽之加水分解、縮聚物) A4 在合成例6所得到固體成分濃度爲20質量%之化合物A4溶液 A5 在合成例7所得到固體成分濃度爲20質量%之化合物A5溶液 A6 在合成例8所得到固體成分濃度爲20質量%之化合物A6溶液 A7 在合成例9所得到固體成分濃度爲20質量%之化合物A7溶液 H3 在合成例10所得到固體成分濃度爲20質量%之縮聚物H3溶液 (有機矽烷與膠體狀二氧化矽之加水分解、縮聚物) <實施例9 > [活性能量線硬化性組成物的調製] 在(A)成分爲3 5.0份於合成例3所得到矽氧烷低聚物 A3的固體成分濃度20質量%溶液(固體成分爲7.0份)、(H) 成分爲1 5 · 0份於合成例4所得到矽氧烷低聚物Η 1的固體 成分濃度20質量%溶液(固體成分爲3.0份)中,混合〇.4 份(Β)成分之六氟銻酸苄基-4-羥苯基甲基锍的50質量%γ_ 丁內酯溶液(固體成分爲0.2份)、10.0份溶劑之異丙醇、15.0 份r -丁內酯、10.0份丁基賽路蘇、〇·〇ι份調平劑之矽系界 -34- 200904899 面活性劑(TORAY-DOWCORNING公司製、商品名l- 作爲活性能量線硬化性組成物。以下與實施例7同 行光硬化性組成物的形成、保護被膜的形成、評價。 保護被膜亦評價耐磨耗性。結果如表4所示。 [保護被膜] 6)耐磨耗性 測定塔伯磨耗試驗(使用一側5 00克負荷、CS. 品名)磨耗輪、旋轉速度60rpm、試驗次數500次來 驗)後的濁度値。而且將(試驗後的濁度値)-(試驗前 値)所表示的値作爲耐磨耗性(%)表示。 又,在實施例6、7亦追加評價耐磨耗性。結果 例6爲2 1 %,實施例7爲1 8 %。 <實施例10〜13> 除了(A)成分及(B)成分係以調配表4所記載的 來調配表4所記載者以外,與實施例9同樣地進行 行調製活性能量線硬化性組成物、光硬化性組成物 成、藉由照射紫外線之膜的硬化、後熟化,來形成 膜的形成後,隨後,實施被膜的評價。結果如表4 <實施例14> 與實施例1 3同樣地進行,來進行調製活性能量 性組成物、光硬化性組成物膜的形成,進而在藉由 外線之同時,使用鹵素燈加熱試樣至約70°C,來進 的硬化。未進行後熟化。隨後,與實施例3同樣地 實施被膜的評價。結果如表4所示。 7001), 樣地進 而且, • 1 0F(商 實施試 的濁度 ,實施 調配量 ,來進 膜的形 保護被 所示。 線硬化 照射紫 行被膜 進行, -35- 200904899 <比較例8、9> 除了( A)成分、(Η)成分及(B ’ )成分係以調配表5所記 載的調配量來調配表5所記載者以外,與實施例9同樣地 進行,來進行調製活性能量線硬化性組成物、光硬化性組 成物膜的形成、藉由照射紫外線之膜的硬化、熟化來形成 保護被膜的形成後,隨後,實施被膜的評價。結果如表5 所示。 [表4] 成分 9 (Α)成分 調配量(份) (固體成分(份)) (Η)成分 調配量(份) (固體成分(份)) (Β戚分 調配量(份) 個體成分(份)) UV照射量 (mJ/cm2) UV照射時加熱 後熟化 外觀_ 膜厚度(微米) 耐擦傷性 鉛筆硬度 耐磨耗性(%) A3 35.0 (7.0) H1 15.0 (3.0) B1 0.4 (0.2) 1000 9(TC、 10分鐘Ingredient Comparative Example 1 2 3 4 5 6 7 (A) Component A1 A1 A1 A1 A1 A1 A1 Formulation amount (parts) 50.0 50.0 50.0 50.0 50.0 50,0 50.0 (solid content (parts)) (10.0) (10.0) (10.0 (10.0) (10.0) (10.0) (10.0) (B) Component B1 Formulation amount (parts) - - - Ink - - 0.4 (solid content (parts)) (0.2) (B'戚分ΒΊ B'2 B , 3 ΒΊ B,1 B,1 Amount (parts) 0.4 0.4 0.4 0.4 0.4 0.4 - (solid content (parts)) (0.2) (0.2) (0.2) (0.2) (0.2) (0.2) UV exposure ( mJ/cm2) 1000 1000 1000 1000 1000 1000 * Heating during UV irradiation - - - 70 ° C - 70 ° C - Post-curing - - - - 90 ° C, 10 minutes 90 °, 10 minutes 90 ° C, 10 minutes Appearance 〇〇〇〇〇〇〇 film thickness (micron) 3.2 3.3 3.4 3.1 3.9 3.2 3.4 Scratch resistance DEEDDDE Pencil hardness 3H 4H 3H 3H 3H 3H 3H -33- 200904899 [Table 3] — I..··. — Table The acridine oligomer A1 obtained in Synthesis Example 1 has a solid content concentration of 20% by mass. The alkoxysilane oligomer A1 obtained in Synthesis Example 2 has a solid content concentration of 20% by mass. Solution _ B1 hexafluoroantimony 50% by mass of benzyl-4-hydroxyphenylmethylhydrazine r-butyrolactone solution - B2 hexafluoroantimonate 50% by mass of n-naphthylmethyl-4-hydroxyphenylmethylhydrazine Ester solution ___ B3 hexafluoroantimonate methylbenzyl-4-hydroxyphenylmethyl hydrazine 50% by mass r-butyrolactone solution _ B4 hexafluorophosphate benzyl-4-hydroxyphenyl hydrazine 50 mass % r -butyrolactone solution _ B,1 bis(hexafluorophenyl)-S,S,S',S'-tetraphenyldifluorene and diphenyl hexafluorophosphate 50% by mass of propylene carbonate solution of (4-phenylthiophenyl)anthracene (manufactured by Dow Chemical Japan Co., Ltd., trade name: "CYRACURE UVI-6992") —_ B'2 hexafluorophosphate dimethyl-4- 50% by mass of hydroxyphenyl hydrazine r-butyrolactone solution B, 3 hexafluorophosphate 1-(4-methylphenyl)[4-(2-methylpropyl)phenyl]iodonium (Iodonium, ( 4-methylphenyl)[4-(2-methylpr〇pyl)phenyl]-hexaflurophosphate(l-)) (manufactured by CIBA SPECIALTY CHEMICALS, trade name: "IRGACURE250 丨) A3 The solid content concentration obtained in Synthesis Example 3 is 20 mass. % of decane oligomer A3 solution HI The solid content concentration obtained in Synthesis Example 4 was 20 % by mass of polycondensate H1 solution (hydrolysis of organic decane and colloidal cerium oxide, polycondensate) H2 Polycondensate H2 solution having a solid content concentration of 20% by mass obtained in Synthesis Example 5 (alkyl citrate and colloid) Hydrolysis of a cerium oxide, a polycondensate) A4 Compound A4 solution A5 having a solid concentration of 20% by mass in Synthesis Example 6 Compound A5 solution A6 having a solid concentration of 20% by mass obtained in Synthesis Example 7 was synthesized. The compound A6 solution A7 obtained in Example 8 having a solid content concentration of 20% by mass The compound A7 solution H3 obtained in Synthesis Example 9 having a solid content concentration of 20% by mass The polycondensate having a solid content concentration of 20% by mass obtained in Synthesis Example 10 H3 solution (hydrolysis and condensation of organic decane and colloidal cerium oxide) <Example 9 > [Preparation of active energy ray-curable composition] The component (A) was 3 5.0 parts in Synthesis Example 3. A solid content concentration of 20% by mass of a solution of the siloxane oxide A3 (solid content: 7.0 parts) and (H) component of 15.0 parts of a solid of the siloxane oligomer Η 1 obtained in Synthesis Example 4 were obtained. ingredient a solution of 50% by mass of γ-butyrolactone of benzyl-4-hydroxyphenylmethyl hexafluoroantimonate in a solution of 20 parts by mass (3.0 parts by weight) of a mixture of 〇4 parts (Β) Ingredients: 0.2 parts), 10.0 parts of solvent isopropanol, 15.0 parts of r-butyrolactone, 10.0 parts of butyl serotonin, 〇·〇ι parts of leveling agent 矽 界 -34- 200904899 surfactant ( The product name l- manufactured by TORAY-DOWCORNING Co., Ltd. is an active energy ray-curable composition. The formation of the photocurable composition and the formation and evaluation of the protective film were carried out in the same manner as in Example 7. The protective film was also evaluated for abrasion resistance. The results are shown in Table 4. [Protective film] 6) Abrasion resistance The turbidity 値 after the Taber abrasion test (using a side of 500 gram load, CS. product name), a wear wheel, a rotation speed of 60 rpm, and a test number of 500 times was measured. Further, 値 represented by (turbidity 试验 after the test) - (pre-test 値) is expressed as abrasion resistance (%). Further, in Examples 6 and 7, the abrasion resistance was additionally evaluated. Results Example 6 was 2 1 %, and Example 7 was 18%. <Examples 10 to 13> The active energy ray-curable composition was prepared in the same manner as in Example 9 except that the components (A) and (B) were prepared in the same manner as described in Table 4; The film and the photocurable composition were formed, and the film was formed by curing and post-curing of the film irradiated with ultraviolet rays, and then the film was evaluated. The results are shown in Table 4. <Example 14> The preparation of the active energy-sensitive composition and the photocurable composition film was carried out in the same manner as in Example 13, and the halogen lamp was used for heating test by the external wire. Sample to about 70 ° C, to harden. Not post-maturing. Subsequently, evaluation of the film was carried out in the same manner as in Example 3. The results are shown in Table 4. 7001), sample introduction and, • 10F (the turbidity of the commercial test, the amount of the implementation, the shape protection of the film is shown. The line hardening irradiates the purple film, -35- 200904899 <Comparative Example 8 (9) In the same manner as in Example 9, except that the components (A), (Η), and (B') were prepared in accordance with the blending amounts described in Table 5, the preparation activity was carried out in the same manner as in Example 9. The formation of the energy ray-curable composition, the photocurable composition film, and the formation of the protective film by curing and aging of the film irradiated with ultraviolet rays, and then evaluation of the film were carried out. The results are shown in Table 5. 4] Ingredient 9 (Α) Ingredients (parts) (solid content (parts)) (Η) Ingredients (parts) (solid content (parts)) (Β戚份量(份) Individual ingredients (parts) UV irradiation amount (mJ/cm2) Curing appearance after heating by UV irradiation _ Film thickness (micron) Scratch resistance Pencil hardness abrasion resistance (%) A3 35.0 (7.0) H1 15.0 (3.0) B1 0.4 (0.2) 1000 9 (TC, 10 minutes)
〇 3.5 C+ 4H A3 40.0 (8.0) H2 10.0 (2.0) B1 0.4 (0.2) 1000 90°C、 10分鐘〇 3.5 C+ 4H A3 40.0 (8.0) H2 10.0 (2.0) B1 0.4 (0.2) 1000 90°C, 10 minutes
〇 4.1 C+ 4H 實施例 11 A3 35.0 (7.0) H1 15.0 (3.0) B3 0.4 (0.2) 1000 90。。、 10分鐘 〇 3.8 C+ 4H 10〇 4.1 C+ 4H Example 11 A3 35.0 (7.0) H1 15.0 (3.0) B3 0.4 (0.2) 1000 90. . , 10 minutes 〇 3.8 C+ 4H 10
-36- 200904899 [表5] 成分 比較例 8 9 (A)成分 A3 A3 調配量(份) 35.0 35.0 個體成分(份)) (7.0) (7.0) (H)成分 H1 H1 調配量(份) 15.0 15.0 涸體成分(份)) (3.0) (3.0) (B’戚分 B’ 1 B,3 調配量(扮) 0.4 0.4 個體成分(份)) (0.2) (0.2) UV照射量 (mJ/cm2) 1000 1000 UV照射時加熱 _ - 後熟化 90°C ' 90°C ' 10分鐘 10分鐘 外觀 〇 〇 膜厚度(微米) 4.2 3.6 耐擦傷性 D D 錄硬度 4H 4H 耐磨耗性(%) 53 42 <實施例1 5 > 在(A)成分爲50.0份於合成例6所得到化合物A4的固 體成分濃度20質量%溶液(固體成分爲1〇.〇份),混合0.4 份(B)成分之六氟銻酸苄基-4-羥苯基甲基锍的50質量%γ· 丁內酯溶液(固體成分爲〇 . 2份)、1 0.0份溶劑之異丙醇、1 5.0 份r -丁內酯、1〇.〇份丁基賽路蘇、〇.〇1份調平劑之矽系界 面活性劑(TORAY-DOWCORNING公司製、商品名L-700I), 作爲活性能量線硬化性組成物。以下與實施例6同樣地進 行光硬化性組成物的形成、保護被膜的形成、評價。結果 如表6所示。 <實施例16~20> 除了(A)成分及(B)成分係以調配表6所記載者以外’ 與實施例1 5同樣地進行,來實施活性能量線硬化性組成物 -37- 200904899 的調製、光硬化性組成物膜的形成、被膜的評價。結果如 表6所示。 <實施例21> 與實施例1 6同樣地進行,來進行調製活性能量線硬化 性組成物、光硬化性組成物膜的形成,並藉由照射紫外線 來進行膜的硬化。而且,以熱風乾燥器在9 0°C乾燥1 0分 鐘進行後熟化,來形成保護被膜。隨後,與實施例1同樣 地進行評價被膜。結果如表6所示。 <實施例22> 在(A)成分爲35.0份於合成例6所得到化合物A4的固 體成分濃度20質量%溶液(固體成分爲7·0份)、(H)成分爲 15.0份於合成例10所得到縮聚物Η3的固體成分濃度20 質量%溶液(固體成分爲3.0份)中,混合0.4份(Β)成分之六 氟銻酸甲苄基-4-羥苯基甲基鏑的50質量%γ-丁內酯溶液 (固體成分爲0.2份)、10.0份溶劑之異丙醇、15.0份r-丁 內酯、1 〇 . 〇份丁基賽路蘇、0.0 1份調平劑之矽系界面活性 劑(TORAY-DOWCORNING公司製、商品名L-700 1 ),作爲 活性能量線硬化性組成物。以下與實施例1 5同樣地進行光 硬化性組成物的形成、保護被膜的形成、評價。結果如表 6所示。 <比較例1 〇〜1 2 > 除了(A)成分及(B’)成分係調配表7所記載者以外,與 實施例1 5同樣地進行,來進行調製活性能量線硬化性組成 物、光硬化性組成物膜的形成、照射紫外線,但是膜未硬 -38- 200904899 化。結果如表7所示。 <比較例1 3 > 除了( B ’)成分係調配表7所記載者以外,與實施例2 2 同樣地進行’來進行活性能量線硬化性組成物的調製、光 硬化性組成物膜的形成、照射紫外線,但是膜未硬化。結 果如表7所示。 〈實施例23 > 在(A)成分爲1 5 _ 0份於合成例1所得到矽氧烷低聚物 A1的固體成分濃度20質量%溶液(固體成分爲3_〇份)、350 份於η成例7所得到化合物A 5的固體成分濃度2 〇質量% 溶液(固體成分爲7.0份)中’混合〇.4份(B)成分之六氟銻 酸卡基-4-經苯基甲基鏡的50質量% γ -丁內醋溶液(固體成 分爲〇 · 2份)、1 0.0份溶劑之異丙醇、1 5 · 〇份r -丁內醋、 1 〇 · 〇份丁基賽路蘇、0 _ 0 1份調平劑之砂系界面活性劑 (TORAY-DOWCORNING公司製、商品名L-7 00 1 ),作爲活 性能量線硬化性組成物。以下與實施例6同樣地進行光硬 化性組成物的形成、保護被膜的形成、評價。結果如表8 所示。 <實施例24> 除了(A)成分及(B)成分係調配表8所記載者以外,與 實施例2 3同樣地進行’來實施活性能量線硬化性組成物的 調製、光硬化性組成物膜的形成、被膜的評價。結果如表 8所示。 <實施例25> -39- 200904899 在(A)成分爲12.0份於合成例1所得到矽氧烷低聚物 A1的固體成分濃度20質量%溶液(固體成分爲2.4份)、28.0 份於合成例7所得到化合物A 5的固體成分濃度2 0質量% 溶液(固體成分爲5.6份)、(H)成分爲1〇.〇份於合成例10 所得到縮聚物H3的固體成分濃度20質量%溶液(固體成分 爲2.0份)中,混合0.4份(B)成分之六氟銻酸苄基-4-羥苯 基甲基锍的5〇質量°/^-丁內酯溶液(固體成分爲0.2份)、 10.0份溶劑之異丙醇、15.0份τ -丁內酯、1〇·〇份丁基賽路 蘇 、0.0 1 份調平劑之矽系界面活性劑 (TO R AY-D Ο W C ORN IN G公司製、商品名L-7001),作爲活 性能量線硬化性組成物。隨後與實施例2 3同樣地進行光硬 化性組成物的形成、保護被膜的形成、評價。結果如表8 所示。 <比較例1 4、1 5 > 除了(A)成分及(B,)成分係調配表9所記載者以外,與 實施例1 5同樣地進行’來實施活性能量線硬化性組成物的 調製、光硬化性組成物膜的形成及藉由照射紫外線之膜的 硬化。結果如表9所示。 -40- 200904899 [表6]-36- 200904899 [Table 5] Composition Comparison Example 8 9 (A) Component A3 A3 Formulation amount (parts) 35.0 35.0 Individual component (parts) (7.0) (7.0) (H) Component H1 H1 Formulation amount (parts) 15.0 15.0 Carcass Ingredients (parts)) (3.0) (3.0) (B'戚B' 1 B,3 Formulation (dress) 0.4 0.4 Individual ingredients (parts) (0.2) (0.2) UV exposure (mJ/ Cm2) 1000 1000 UV irradiation heating _ - Post-curing 90 ° C '90 ° C ' 10 minutes 10 minutes Appearance film thickness (micron) 4.2 3.6 Scratch resistance DD Recording hardness 4H 4H Wear resistance (%) 53 42 <Example 1 5 > In the component (A), 50.0 parts of the compound A4 obtained in Synthesis Example 6 was dissolved in a solid content of 20% by mass (solid content: 1 part), and 0.4 parts (B) was mixed. 50% by mass γ·butyrolactone solution of hexafluoroantimonate benzyl-4-hydroxyphenylmethylhydrazine (solid content: 份. 2 parts), 10.0 parts of solvent isopropanol, 1 5.0 parts r - Butyrolactone, 1 〇 〇 butyl 赛赛苏, 〇. 〇 1 part of the leveling agent lanthanide surfactant (manufactured by TORAY-DOWCORNING Co., Ltd., trade name L-700I), as active energy ray hardenability CompositionIn the same manner as in Example 6, the formation of the photocurable composition and the formation and evaluation of the protective film were carried out. The results are shown in Table 6. <Examples 16 to 20> The active energy ray-curable composition-37-200904899 was carried out in the same manner as in Example 15 except that the components (A) and (B) were prepared in the same manner as in Table 6. Preparation, formation of a photocurable composition film, and evaluation of a film. The results are shown in Table 6. <Example 21> The preparation of the active energy ray-curable composition and the photocurable composition film was carried out in the same manner as in Example 166, and the film was cured by irradiation with ultraviolet rays. Further, it was post-cured by drying in a hot air dryer at 90 ° C for 10 minutes to form a protective film. Subsequently, the film was evaluated in the same manner as in Example 1. The results are shown in Table 6. <Example 22> The component (A) was 35.0 parts of the compound A4 obtained in Synthesis Example 6 and had a solid content concentration of 20% by mass (solid content: 7.0 parts) and (H) component: 15.0 parts. 10 parts of the obtained polycondensate Η3 solid content concentration 20% by mass solution (solid content: 3.0 parts), mixed with 0.4 parts of (Β) component of hexafluoroantimonate methylbenzyl-4-hydroxyphenylmethyl hydrazine 50 mass %γ-butyrolactone solution (solid content: 0.2 parts), 10.0 parts of solvent isopropanol, 15.0 parts of r-butyrolactone, 1 〇. 丁基butyl butyl sulcata, 0.01 part of leveling agent A surfactant (trade name: L-700 1 manufactured by TORAY-DOWCORNING Co., Ltd.) is used as an active energy ray-curable composition. The formation of the photocurable composition and the formation and evaluation of the protective film were carried out in the same manner as in Example 15. The results are shown in Table 6. <Comparative Example 1 〇~1 2 > In the same manner as in Example 15, except that the components (A) and (B') were prepared in Table 7, the active energy ray-curable composition was prepared. The photocurable composition film is formed and irradiated with ultraviolet rays, but the film is not hard-38-200904899. The results are shown in Table 7. <Comparative Example 1 3 > The preparation of the active energy ray-curable composition and the photocurable composition film were carried out in the same manner as in Example 2 except that the (B') component was prepared in Table 7 The formation of ultraviolet rays, but the film is not hardened. The results are shown in Table 7. <Example 23 > The component (A) was 1 5 _ 0 parts of a solid content concentration of 20% by mass of a siloxane oxide oligomer A1 obtained in Synthesis Example 1 (solid content: 3 〇 part), 350 parts The solid content concentration of the compound A 5 obtained in Example 7 was 2% by mass. The solution (solid content: 7.0 parts) was mixed with 4 parts of the component (B) of hexafluoroantimonic acid kaki-4-phenyl group. Molecular 50% by mass γ-butane vinegar solution (solid content is 〇·2 parts), 10.0 parts of solvent isopropanol, 1 5 · 〇 part of r-butyrol vinegar, 1 〇 · 〇 butyl赛路苏, 0 _ 0 1 leveling agent sand-based surfactant (manufactured by TORAY-DOWCORNING Co., Ltd., trade name L-7 00 1 ), as an active energy ray-curable composition. The formation of the photohardenable composition and the formation and evaluation of the protective film were carried out in the same manner as in Example 6. The results are shown in Table 8. <Example 24> The preparation of the active energy ray-curable composition and the photocurability composition were carried out in the same manner as in Example 23 except that the components (A) and (B) were prepared in Table 8. Formation of a film and evaluation of a film. The results are shown in Table 8. <Example 25> -39-200904899 In a component (A), 12.0 parts of a solution having a solid content concentration of 20% by mass of a siloxane oxide oligomer A1 obtained in Synthesis Example 1 (solid content: 2.4 parts), 28.0 parts The solid content concentration of the compound A 5 obtained in Synthesis Example 7 was 20% by mass, the solution (solid content: 5.6 parts), and the (H) component was 1 part. The solid content concentration of the polycondensate H3 obtained in Synthesis Example 10 was 20 mass. In a solution of % (solid content: 2.0 parts), 0.4 parts of a component (B) of hexafluoroantimonate benzyl-4-hydroxyphenylmethylhydrazine in a 5 〇 mass / / - butyrolactone solution (solid content is 0.2 parts), 10.0 parts of solvent isopropanol, 15.0 parts of τ-butyrolactone, 1 part 〇 butyl celecoxib, 0.01 part of leveling agent lanthanide surfactant (TO R AY-D Ο WC ORN IN G company, trade name L-7001), as an active energy ray-curable composition. Subsequently, formation of a photohardenable composition, formation of a protective film, and evaluation were carried out in the same manner as in Example 23. The results are shown in Table 8. <Comparative Example 1 4, 1 5 > In the same manner as in Example 15, except that the components (A) and (B,) were prepared in accordance with Table 9, the active energy ray-curable composition was subjected to Modulation, formation of a photocurable composition film, and hardening of a film irradiated with ultraviolet rays. The results are shown in Table 9. -40- 200904899 [Table 6]
成分 實施例 15 16 17 18 19 20 21 22 (A)成分 A4 A4 A4 A5 A6 A7 A4 A4 調配量(份) 50.0 50.0 50.0 50.0 50.0 50.0 50.0 35.0 (固體成分(份)) (10.0) (10.0) (10.0) (10.0) (10.0) (10.0) (10.0) (7.0) (H戚分 H3 調配量(份) - - - - - - 15.0 (固體成分(份)) (3.0) ⑻成分 B1 B3 B4 B3 B3 B3 B3 B3 調配量(份) 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 個體成分(份)) (0.2) (0.2) (0.2) (0.2) (0.2) (0.2) (0.2) (0.2) UV照射量 (mJ/cm2) 1000 1000 1000 1000 1000 1000 1000 1000 UV照射時加熱 70°C 70°C 70°C 70°C 70°C 70°C 70°C 70°C 後熟化 - - - - - - 90°C、 10分鐘 - 外觀 〇 〇 〇 〇 〇 〇 〇 〇 膜厚度(微米) 3.5 3.2 3.6 3.7 3.9 3.8 3.3 4.0 耐擦傷性 C+ C+ C+ B B c+ B B 鉛筆硬度 4H 4H 4H 4H 5H 4H 5H 6HIngredient Example 15 16 17 18 19 20 21 22 (A) Component A4 A4 A4 A5 A6 A7 A4 A4 Formulation amount (parts) 50.0 50.0 50.0 50.0 50.0 50.0 50.0 35.0 (solid content (parts)) (10.0) (10.0) ( 10.0) (10.0) (10.0) (10.0) (10.0) (7.0) (H 戚 H3 ration (parts) - - - - - - 15.0 (solid content (parts)) (3.0) (8) Component B1 B3 B4 B3 B3 B3 B3 B3 Formulation amount (parts) 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 Individual components (parts)) (0.2) (0.2) (0.2) (0.2) (0.2) (0.2) (0.2) (0.2) UV irradiation (mJ/cm2) 1000 1000 1000 1000 1000 1000 1000 1000 Heating at 70 °C during UV irradiation 70°C 70°C 70°C 70°C 70°C 70°C 70°C Post-curing - - - - - - 90 °C, 10 minutes - Appearance film thickness (micron) 3.5 3.2 3.6 3.7 3.9 3.8 3.3 4.0 Scratch resistance C+ C+ C+ BB c+ BB Pencil hardness 4H 4H 4H 4H 5H 4H 5H 6H
[表7] 成分 比較例 10 11 12 13 (A戚分 A4 A4 A4 A4 調配量(份) 50.0 50.0 50.0 35.0 (固體成分(份)) (10.0) (10.0) (10.0) (7.0) (H)成分 H3 調配量(份) - - - 15.0 個體成分(份)) (3.0) (B’戚分 B* 1 B' 2 B’ 3 B’ 1 調配量(份) 0.4 0.4 0.4 0.4 涸體成分(份)) (0.2) (0.2) (0.2) (0.2) UV照射量 (mJ/cm2) 1000 1000 1000 1000 UV照射時加熱 70。。 70。。 70°C 70°C 後熟化 - - - - 外觀 無法成膜 無法成膜 無法成膜 無法成膜 膜厚度(微米) - - - - 耐擦傷性 - - - - 鉛筆硬度 - - - - -41 - 200904899[Table 7] Ingredient Comparative Example 10 11 12 13 (A 戚 A4 A4 A4 A4 A4 Amount (parts) 50.0 50.0 50.0 35.0 (solid content (parts)) (10.0) (10.0) (10.0) (7.0) (H) Ingredient H3 Formulation (Parts) - - - 15.0 Ingredient (parts)) (3.0) (B'戚B* 1 B' 2 B' 3 B' 1 Formulation (parts) 0.4 0.4 0.4 0.4 Carcass ()) (0.2) (0.2) (0.2) (0.2) UV irradiation (mJ/cm2) 1000 1000 1000 1000 Heat 70 when UV irradiation. . 70. . After 70 ° C 70 ° C post-curing - - - - Appearance can not be formed into a film can not be formed into a film can not be filmed film thickness (micron) - - - - scratch resistance - - - - pencil hardness - - - - -41 - 200904899
[表8] 成分 實施例 23 24 25 (A)成分 i周配量(份) (固體成分(份)) A1 15.0 (3.0) A1 15.0 (3.0) A1 12.0 (2.4) A5 35.0 (7.0) A6 35.0 (7.0) A5 28.0 (5.6) (H)成分 調配量(份) 個體成分(份)) - - H3 10.0 (2.0) ⑻成分 調配量(份) (固體成分(份)) B1 0.4 (0.2) B1 0.4 (0.2) B1 0.4 (0.2) UV照射量 (mJ/cm2) 1000 1000 1000 UV照射時加熱 70°C 70。。 70°C 外觀 〇 〇 〇 膜厚度(微米) 3.3 3.5 4.1 耐擦傷性 B B B 鉛筆硬度 5H 5H 6H[Table 8] Ingredient Example 23 24 25 (A) Component i weekly dosing amount (parts) (solid content (parts)) A1 15.0 (3.0) A1 15.0 (3.0) A1 12.0 (2.4) A5 35.0 (7.0) A6 35.0 (7.0) A5 28.0 (5.6) (H) Ingredients (parts) Individual components (parts) - - H3 10.0 (2.0) (8) Ingredients (parts) (solid content (parts)) B1 0.4 (0.2) B1 0.4 (0.2) B1 0.4 (0.2) UV irradiation amount (mJ/cm2) 1000 1000 1000 Heating at 70 ° C 70 during UV irradiation. . 70°C Appearance 〇 〇 膜 Film thickness (micron) 3.3 3.5 4.1 Scratch resistance B B B Pencil hardness 5H 5H 6H
[表9] 成分 比較例 14 15 (A)成分 調配量(份) (固體成分(份)) A1 15.0 (3.0) A1 15.0 (3.0) A5 35,0 (3.0) A6 35.0 (3.0) ⑻成分 調配量(份) (固體成分(份)) - - (B’戚分 調配量(份) 涸體成分(份)) B’ 1 0.4 (0.2) B’ 2 0.4 (0.2) UV照射量 (mJ/cm2) 1000 1000 UV照射時加熱 70°C 70°C 外觀 〇 〇 膜厚度(微米) 3.5 3.2 耐擦傷性 D D 鉛筆硬度 4H 4H -42- 200904899 產業上之利用可能性 本發明之積層體,能夠適合於頭燈透鏡或敞篷車頂等 的汽車用零件、機車的防風板、鐵路車輛或飛機等的車窗、 高速公路遮音板、透鏡或過濾器等的光學機器零件、行動 電話或資訊機器殻體、光碟、顯示器或觸控用的功能性薄 膜等。 【圖式簡單說明】 並0 【主要元件符號說明】 4FR1 〇 j \ w -43-[Table 9] Ingredient Comparative Example 14 15 (A) Ingredients (parts) (solid content (parts)) A1 15.0 (3.0) A1 15.0 (3.0) A5 35,0 (3.0) A6 35.0 (3.0) (8) Composition Amount (parts) (solid content (parts)) - - (B' splitting amount (parts) carcass component (parts)) B' 1 0.4 (0.2) B' 2 0.4 (0.2) UV irradiation amount (mJ/ Cm2) 1000 1000 UV irradiation, heating 70 ° C 70 ° C Appearance film thickness (micron) 3.5 3.2 Scratch resistance DD Pencil hardness 4H 4H -42- 200904899 Industrial use possibility The laminate of the present invention can be adapted Optical parts such as automotive parts for headlight lenses or convertible tops, windshields for locomotives, windows for railway vehicles or airplanes, highway soundproof panels, lenses or filters, mobile phones or information machine housings , functional films such as optical discs, monitors or touch screens. [Simple description of the diagram] and 0 [Description of main component symbols] 4FR1 〇 j \ w -43-
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JP5590374B2 (en) * | 2009-09-15 | 2014-09-17 | 三菱レイヨン株式会社 | Active energy ray-curable composition, cured film forming method and laminate |
JP5592202B2 (en) * | 2010-08-31 | 2014-09-17 | サンアプロ株式会社 | Sulfonium salt, photoacid generator and photosensitive resin composition |
CN103517951A (en) * | 2011-05-11 | 2014-01-15 | 三菱丽阳株式会社 | Active energy ray-curable composition, laminate, and method for producing laminate |
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