TW200833579A - Vacuum suction apparatus - Google Patents
Vacuum suction apparatusInfo
- Publication number
- TW200833579A TW200833579A TW096133530A TW96133530A TW200833579A TW 200833579 A TW200833579 A TW 200833579A TW 096133530 A TW096133530 A TW 096133530A TW 96133530 A TW96133530 A TW 96133530A TW 200833579 A TW200833579 A TW 200833579A
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- vacuum
- suctioned
- suction apparatus
- vacuum suction
- Prior art date
Links
- 239000000758 substrate Substances 0.000 abstract 6
- 238000009434 installation Methods 0.000 abstract 2
- 238000001514 detection method Methods 0.000 abstract 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J15/00—Gripping heads and other end effectors
- B25J15/06—Gripping heads and other end effectors with vacuum or magnetic holding means
- B25J15/0616—Gripping heads and other end effectors with vacuum or magnetic holding means with vacuum
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25B—TOOLS OR BENCH DEVICES NOT OTHERWISE PROVIDED FOR, FOR FASTENING, CONNECTING, DISENGAGING OR HOLDING
- B25B11/00—Work holders not covered by any preceding group in the subclass, e.g. magnetic work holders, vacuum work holders
- B25B11/005—Vacuum work holders
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J19/00—Accessories fitted to manipulators, e.g. for monitoring, for viewing; Safety devices combined with or specially adapted for use in connection with manipulators
- B25J19/02—Sensing devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Robotics (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Controlling Sheets Or Webs (AREA)
- Sheets, Magazines, And Separation Thereof (AREA)
- Manipulator (AREA)
Abstract
To provide a vacuum suction apparatus capable of certainly detecting whether a substrate is suctioned by vacuum or not in short time. When partially having a portion which is not suctioned by vacuum, a substrate W is somewhat off from the upper surface of a substrate installation table 5 at this portion. When the substrate W is off therefrom, pressure detected in a vacuum detection hole 8 which opens at this portion or a portion which is individually adjacent to this portion becomes high because of the entrance of air from the outside. Thus, etermination that the substrate W is certainly suctioned to the upper surface of the substrate installation table 5 can be made when all of a plurality of pressure sensors 11 provided sense vacuum.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006244923A JP2008066607A (en) | 2006-09-11 | 2006-09-11 | Vacuum suction apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200833579A true TW200833579A (en) | 2008-08-16 |
Family
ID=39207942
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW096133530A TW200833579A (en) | 2006-09-11 | 2007-09-07 | Vacuum suction apparatus |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2008066607A (en) |
KR (1) | KR20080023642A (en) |
CN (1) | CN101145536A (en) |
TW (1) | TW200833579A (en) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5126091B2 (en) * | 2009-02-02 | 2013-01-23 | ウシオ電機株式会社 | Work stage and exposure apparatus using the work stage |
JP5280242B2 (en) * | 2009-02-12 | 2013-09-04 | 日置電機株式会社 | Adsorption device, inspection device, and mounting state determination method |
DE102009018434B4 (en) * | 2009-04-22 | 2023-11-30 | Ev Group Gmbh | Receiving device for holding semiconductor substrates |
CN102096116A (en) * | 2010-12-03 | 2011-06-15 | 惠州市赛能电池有限公司 | Pole piece detecting device of battery lamination machine |
CN102323452A (en) * | 2011-05-30 | 2012-01-18 | 天津必利优科技发展有限公司 | Air sucking assembly for adsorbing minute objects |
KR101672779B1 (en) * | 2014-08-29 | 2016-11-07 | 주식회사 태성기연 | Tempered glass panel touch sensor processing equipment and the processing method |
KR20170050658A (en) * | 2015-10-30 | 2017-05-11 | 주식회사 프로텍 | Flowrate Measuring Type Viscous Liquid Dispenser and Dispending Method |
CN106950485A (en) * | 2017-03-24 | 2017-07-14 | 京东方科技集团股份有限公司 | A kind of tester substrate microscope carrier and substrate test equipment |
CN107081676A (en) * | 2017-06-27 | 2017-08-22 | 盐城市宁润玻璃制品有限公司 | A kind of production fixing device of glassware |
CN108489992A (en) * | 2018-05-25 | 2018-09-04 | 江苏亿可得电子科技有限公司 | A kind of chip gold thread detection device |
CN109483429B (en) * | 2018-10-18 | 2020-10-16 | 武汉华星光电半导体显示技术有限公司 | Bearing device and bearing method |
KR102287439B1 (en) * | 2019-04-23 | 2021-08-09 | 주식회사 탑 엔지니어링 | Coating device with pressure unit and coating method using the same |
CN110369936A (en) * | 2019-07-19 | 2019-10-25 | 晶澳(邢台)太阳能有限公司 | Adsorbent equipment and photovoltaic string welding machine |
CN113001202A (en) * | 2021-04-28 | 2021-06-22 | 亿铨机械(嘉兴)有限公司 | Workbench exchange structure of vertical machining center |
CN113211316B (en) * | 2021-05-24 | 2022-03-11 | 大连理工大学 | A wireless detection platform and detection method for self-rotation grinding of semiconductor wafers |
-
2006
- 2006-09-11 JP JP2006244923A patent/JP2008066607A/en active Pending
-
2007
- 2007-09-07 TW TW096133530A patent/TW200833579A/en unknown
- 2007-09-07 KR KR1020070090720A patent/KR20080023642A/en not_active Ceased
- 2007-09-10 CN CNA2007101460977A patent/CN101145536A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
CN101145536A (en) | 2008-03-19 |
KR20080023642A (en) | 2008-03-14 |
JP2008066607A (en) | 2008-03-21 |
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