TW200832746A - Light-emitting diode device and manufacturing method thereof - Google Patents
Light-emitting diode device and manufacturing method thereof Download PDFInfo
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- TW200832746A TW200832746A TW96103007A TW96103007A TW200832746A TW 200832746 A TW200832746 A TW 200832746A TW 96103007 A TW96103007 A TW 96103007A TW 96103007 A TW96103007 A TW 96103007A TW 200832746 A TW200832746 A TW 200832746A
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200832746 九、發明說明: 【發明所屬之技術領域】 本發明係關於一種電激發光裝置及其製造方法,特 別是關於一種發光二極體裝置及其製造方法。 寸 w 【先前技術】 -發光二極體(Light Emitting Diode,LED)是一種 冷光發光元件,其係利用半導體材料中電子電洞結合所 釋放出的能量,以光的形式釋出。依據使用材料的不 同,其可發出不同波長的單色光,而主要可區分為可見 光發光二極體與不可見光(紅外線)發光二極體兩 由於發光二極體相較於傳統燈泡發光的形式,具有省 、電、耐震及閃爍速度快等優點,因此成為日常生活中不 可或缺的重要元件。 立明芩妝圖1,其為習知之一種發光二極體裝置的示 •思圖。習知之一種發光二極體裝置1係包括至少一發光 二極體元件10黏貼於一透明基板u上。其中,發^二 極體=件10係包括一第一半導體層1〇卜一發光層1〇2 及:第二半導體層103,第一半導體層10卜發光層1〇2 及第一半^體層1〇3係依序設置,一第_接觸電極 係連結於第-半導體層10卜-第二接觸電極1〇5係連 結於第二半導體層1G3’以第—半導體層⑻為卩型半 導體層,而第二半導體層103為n型半導體層為例說 明,當分別對第一半導M 1〇1、g二半導體層1〇3施BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electroluminescent device and a method of fabricating the same, and more particularly to a light emitting diode device and a method of fabricating the same. Inch w [Prior Art] - Light Emitting Diode (LED) is a kind of cold light emitting element that is released in the form of light by utilizing the energy released by the combination of electron holes in a semiconductor material. Depending on the materials used, it can emit monochromatic light of different wavelengths, and can be mainly divided into visible light emitting diodes and invisible light (infrared) light emitting diodes. Two forms of light emitting diodes compared to conventional light bulbs. It has the advantages of economy, electricity, shock resistance and fast flashing speed, so it becomes an indispensable important component in daily life. Fig. 1, which is a schematic diagram of a conventional light-emitting diode device. A conventional light-emitting diode device 1 includes at least one light-emitting diode element 10 adhered to a transparent substrate u. Wherein, the emitter diode 10 includes a first semiconductor layer 1 and a light-emitting layer 1〇2 and a second semiconductor layer 103, a first semiconductor layer 10, a light-emitting layer 1〇2, and a first half. The bulk layer 1 〇 3 is sequentially disposed, a first _ contact electrode is connected to the first semiconductor layer 10 - the second contact electrode 1 〇 5 is connected to the second semiconductor layer 1G3 ′, and the first semiconductor layer (8) is a 卩 type semiconductor a layer, and the second semiconductor layer 103 is an n-type semiconductor layer as an example, when the first semiconductor M 1 〇 1, g two semiconductor layers 1 〇 3 are respectively applied
28306-CP 5 200832746 以電壓而產+ φ Α丄 芝玉流時,利用Ρ型半導體層及η型半導 層令:電:電洞相結合,而將電能轉換為光能。一 :二知圖2A,其為圖丨之發光二極體裝置之光場 、丁/ν"Θ 〇發光二極體裝置1更包括一封裝單元12, 一般常用之封梦罝斤η於从 各 1 于衣早兀12係為-透鏡,其係呈半球體, ^ : χ —極體元件1 〇所發射的光線予以集中,即 :線::的方向係集中於一光軸0S1附近,是以僅適 能量集中的照明器材例如手電筒、檯燈或交 二極體聚置:導=的/圖2Β’其為圖2Α之發光 裝置!應用;意圖’當將上述之發光二極體 一 、4不面板之側向式背光模、组時,通常需 入射進以Γ合來提高光線的均句性。然而,由於側向 逐漸衰咸一二6之光線會隨著距發光源之距離增加而 逐漸农,、’因此限制了顯示面板之發光面積。 播癸:解夬上f問題,請參照圖3A,其為習知之另- - ^ 〇 心、圖。白知係揭露另一種應用於 知尤一極體裝置2之一锫^ ,,^ ^ ^ 鏡體22,其係結合於基板21以 先二極體元件20,鏡體22之表面鄰近於光軸 OS2周緣係具有—凹處 不凹州迎於九軸 # 〇S2 F# '/f ^ Φ 而形成發散面,用以將靠近光 罕由附近集中的氺 〇幻,俾使發光二極體4= 發散而遠離光軸 、置2如供均勻且大範圍的發光 面和,而可直接應用於背 置。然而,如圖3Β_,^^中’免除導光板之設 稱結構’是以發光面積Α亦::之鏡體22係為圓對 亦主圓對稱形狀,當複數發光28306-CP 5 200832746 Producing with voltage + φ Α丄 When using Ρ-type semiconductor layers and η-type semi-conducting layers, electricity: holes are combined to convert electrical energy into light energy. A: The second figure 2A, which is the light field of the light-emitting diode device of the figure, the D-/V" 〇 〇 LED device 1 further comprises a package unit 12, which is generally used to seal the dream Each of the 1 ray is a lens, which is a hemisphere, and the light emitted by the 极-polar element 1 予以 is concentrated, that is, the direction of the line:: is concentrated near an optical axis 0S1. It is a lighting device with only suitable energy concentration such as a flashlight, a desk lamp or a cross-polar body: the guide = / Figure 2 Β 'It is the illuminating device of Figure 2! Application; Intention 'When the above-mentioned light-emitting diodes 1 and 4 are non-panel-type lateral backlight modules and groups, it is usually necessary to inject and combine to improve the uniformity of light. However, since the light gradually fading in the lateral direction gradually increases with the distance from the illuminating source, the light-emitting area of the display panel is limited. Broadcasting: To solve the problem of f, please refer to Figure 3A, which is another of the well--^ 〇 heart, figure. The white body reveals another lens body 22 which is applied to the first-level device 2, which is bonded to the substrate 21 to the first diode element 20, and the surface of the mirror body 22 is adjacent to the light. The periphery of the shaft OS2 has a concave-shaped concave state that greets the nine-axis # 〇S2 F# '/f ^ Φ and forms a divergent surface, which is used to bring the illusion close to the vicinity of the light, and to make the light-emitting diode 4 = diverging away from the optical axis, set 2 for a uniform and wide range of light-emitting surfaces, and can be directly applied to the back. However, as shown in Fig. 3Β, the design structure of the light-removing plate is omitted, and the mirror body 22 is a circular pair and a main circular symmetrical shape.
28306-CP 200832746 二極體裝置2排列而應用作為背光模組之背光源時,將 會造成相鄰發光二極體裝置2的發光面積A相互重疊, 而造成發光強度不均勻的現象。 且 有鑑於此,如何提供一種能夠調整光場形狀及光場 強度分佈的發光二極體裝置及其製造方法,實為現今的 重要課題之一。 【發明内容】 有鏗於上述課題,本發明之目的為提供一種能夠調 整光場形狀及光場強度分佈的發光二極體裝置及其製 造方法。 緣疋,為達上述目的,依據本發明之一種發光二極 體裝置包括一基板以及至少一發光二極體元件。其中, 基板係具有相對設置之一第一表面及一第二表面,第一 表面係具有複數個階級狀凸塊,而發光二極體元件係設 置於基板之一侧。 為達上述目的,依據本發明之一種發光二極體裝置 之製造方法包括下列步驟:提供一板體;形成至少一發 光二極體元件於板體之上,發光二極體元件依序包括一 第一半導體層、一發光層及一第二半導體層,第一半導 體層形成於板體上;提供一基板,具有一表面且其上係 具有複數個階級狀凸塊;黏貼基板於發光二極體元件之 上;以及移除板體。 為達上述目的,依據本發明之另一種發光二極體裝28306-CP 200832746 When the diode devices 2 are arranged and used as a backlight of the backlight module, the light-emitting areas A of the adjacent light-emitting diode devices 2 overlap each other, resulting in uneven luminous intensity. In view of this, how to provide a light-emitting diode device capable of adjusting the shape of a light field and a light field intensity distribution and a method of manufacturing the same are one of the important issues of the present day. SUMMARY OF THE INVENTION In view of the above problems, an object of the present invention is to provide a light-emitting diode device capable of adjusting a light field shape and a light field intensity distribution, and a method of fabricating the same. In order to achieve the above object, a light emitting diode device according to the present invention comprises a substrate and at least one light emitting diode element. The substrate has a first surface and a second surface disposed opposite to each other. The first surface has a plurality of step-like bumps, and the LED elements are disposed on one side of the substrate. In order to achieve the above object, a method for fabricating a light-emitting diode device according to the present invention comprises the steps of: providing a plate body; forming at least one light-emitting diode element on the plate body, and the light-emitting diode element sequentially comprises a a first semiconductor layer, a light-emitting layer and a second semiconductor layer, the first semiconductor layer is formed on the plate body; a substrate is provided, has a surface and has a plurality of step-like bumps thereon; and the adhesive substrate is disposed on the light-emitting diode Above the body element; and removing the board. In order to achieve the above object, another light-emitting diode package according to the present invention
28306-CP 7 200832746 置之製造方法包括下列步驟:提供一板體,具有一表面 且其上係具有複數個階級狀凸塊;以及形成至少—發光 二極體元件於板體之上,發光二極體元件依序包括一第 一半導體層、一發光層及一第二半導體層,第一半導體 層形成於板體上。 承上所述,因依據本發明之一種發光 裒置及 其製造方法係於基板或板體之一侧形成複數個階級狀 凸塊,此些階級狀凸塊係用以調整發光二極體元件所發 出光束之光場相位或方向,達到改變光束之光場形狀或 調整光場強度分佈的功能,進而使複數個發光二極體元 件之發光面積彼此不發生重疊,而有效改善習知技術發 光強度不均勻的現象。其中此些階級狀凸塊係可形成於 基板或板體之-出光表面上,抑或形成於基板 的接合介面上。另外,利用此些階級狀凸塊之 十,可達到導正習知技術光線集中侷限於光軸 之現象’而達到均勾化發光面積之目的。 【實施方式】 之一』::苓'知相關圖式’說明依據本發明較佳實施^ 之種务光—極體駐 件將以i日η & 其製造方法,其中相同的天 件將以相同的參照符號加以說明。 請芩照圖4A,+於 ^ ^ ^ m ^ ,、為依據本务明較佳實施例之一 毛光一極體I置的示音 種發光二極體裝置^ 據柄明較佳實施例之 匕括一基板3 1以及至少一發光28306-CP 7 200832746 The manufacturing method comprises the steps of: providing a plate body having a surface and having a plurality of step-like bumps thereon; and forming at least a light-emitting diode element on the plate body, and emitting light The polar body component sequentially includes a first semiconductor layer, a light emitting layer and a second semiconductor layer, and the first semiconductor layer is formed on the plate body. According to the above, an illuminating device and a manufacturing method thereof according to the present invention form a plurality of step-like bumps on one side of a substrate or a board, and the stepped bumps are used to adjust the illuminating diode component. The phase or direction of the light field of the emitted light beam reaches the function of changing the shape of the light field of the light beam or adjusting the intensity distribution of the light field, so that the light-emitting areas of the plurality of light-emitting diode elements do not overlap each other, thereby effectively improving the conventional technology. Uneven intensity. The step-like bumps may be formed on the light-emitting surface of the substrate or the board, or formed on the bonding interface of the substrate. In addition, by using the ten-thickness of the class-like bumps, it is possible to achieve the purpose of guiding the conventional technique to concentrate light on the optical axis and achieve the purpose of uniformizing the light-emitting area. Embodiments of the present invention: The same reference symbols are used for explanation. Referring to FIG. 4A, FIG. 4 is a ^ ^ ^ m ^ , which is a sound-emitting diode device according to one embodiment of the preferred embodiment of the present invention. Include a substrate 3 1 and at least one illumination
28306-CP 200832746 ^ 極體元件32。 在本貫施例中,基板3 1係可為一透光基板,其材 質係選自環氧樹脂(Epoxy)、光學玻璃(〇ptical glass)、 半V體及其組合所構成的群組,其中半導體係可為皿_ v 私、π-νι族或w族之半導體。另外,此基板31亦可為 一般通用之磊晶基板,其材質係包括碳化矽或氧化鋁, ‘ 例如是三氧化二鋁(Al2 〇3 )等。 _ 基板31係具有相對設置之一第一表面311及一第 一表面3 12,第一表面311係具有複數個階級狀凸塊 313,在本實施例中,此些階級狀凸塊313係為具有平 坦表面之二疋光學凸塊,此些階級狀凸塊313係呈對稱 排列、非對稱排列或不規則排列,其中對稱排列意即相 ^對光束之光軸而呈對稱排列,在本實施例中,各階級狀 凸塊313係具有一微結構,此微結構係具有2η個階層 結構’其中η係為一正整數。 _ 然而,本發明並不限制於此,例如,此些階級狀凸 塊313除了可為具有平坦表面之二元光學凸塊之外,亦 可為具有-曲形表面之凸塊,其剖面可為凸狀(如圖 4Β所不)、凹狀(如圖4C所示)、波浪狀(如圖所 示)或其他形狀。需注意的是,為清楚顯示,圖仙至 圖4D係僅繪出圖4A中虛線圓部分之各種凸塊之剖面 不思圖,然貫際應用時則是代表發光二極體裝置3之基 板31之第一表面311上之所有階級狀凸塊313之形式。 如圖4A所不,發光二極體元件32係設置於基板28306-CP 200832746 ^ Polar body element 32. In the present embodiment, the substrate 31 may be a transparent substrate, and the material thereof is selected from the group consisting of epoxy resin, optical glass, half V body, and combinations thereof. The semiconductor system may be a semiconductor of the dish _ v private, π-νι group or w group. Further, the substrate 31 may be a general-purpose epitaxial substrate made of tantalum carbide or aluminum oxide, for example, aluminum oxide (Al 2 〇 3 ) or the like. The substrate 31 has a first surface 311 and a first surface 312. The first surface 311 has a plurality of step-like bumps 313. In this embodiment, the stepped bumps 313 are a two-dimensional optical bump having a flat surface, wherein the step-like bumps 313 are symmetrically arranged, asymmetrically arranged or irregularly arranged, wherein the symmetric arrangement means that the optical axes of the beams are symmetrically arranged, in this embodiment In the example, each of the class-like bumps 313 has a microstructure having 2n hierarchical structures 'where n is a positive integer. _ However, the present invention is not limited thereto. For example, the stepped bumps 313 may be, in addition to the binary optical bumps having a flat surface, a bump having a curved surface, and the cross section thereof may be It is convex (as shown in Figure 4), concave (as shown in Figure 4C), wavy (as shown) or other shape. It should be noted that, for the sake of clarity, FIG. 4D only depicts the cross-sections of the various bumps in the circled portion of FIG. 4A, but the substrate of the LED device 3 is applied in a continuous application. The form of all of the stepped bumps 313 on the first surface 311 of 31. As shown in FIG. 4A, the LED component 32 is disposed on the substrate.
28306-CP 9 200832746 31之一側,在本實施例中,發光二極體元件32係連結 於基板31之第二表面312側,發光二極體元件%係包 括一第一半導體層321、一發光層322及一第二半導體 層323,依第二半導體層323、發光層322及第一半導 體^ 321之順序設置於基板31之第二表面312侧。在 本貫施例中,第一半導體層321係可為一 n型半導體 層’而第一半導體^ 323係、可為—P型+導體層,然此 僅為舉例性’當$,第一半導體们21 &第二半導體層 323為n型半導體層及p型半導體層之應用,係可依據 貫際需求而加以互換。 另卜如圖5所示,其為依據本發明較佳實施例之 另一種光—極體裝置的示意圖。本實施例之發光二極 二^件32亦可連結於基板3丨之第一表面3 11側,即發 光極體兀件32係面對基板3 i之第一表面3 i丨黏貼於 其上,於此,本實施例之發光二極體裝置3更包括一透 光2貼層33黏貼基板3丨與發光二極體元件w,即透 一 ^ 4層33係e又置於基板31與發光二極體元件w之 間其中透光黏貼層33之材質係包括環氧樹脂。 如圖4A與圖5所示’本實施例之發光二極體裝置 穷一:包括一電極對34,其係包括-第-接觸電極341 ::弟,電極342,分別連結於第一半導體層321 接二半導體層323 ’當藉由第-接觸電極341及第二 1極W分別對第_半導體们21及第二半導體層 也乂私【而產生電流時,第一半導體層32 i及第二28306-CP 9 200832746 31 is one side, in this embodiment, the light emitting diode element 32 is connected to the second surface 312 side of the substrate 31, and the light emitting diode element % includes a first semiconductor layer 321, The light-emitting layer 322 and the second semiconductor layer 323 are disposed on the second surface 312 side of the substrate 31 in the order of the second semiconductor layer 323, the light-emitting layer 322, and the first semiconductor 321 . In the present embodiment, the first semiconductor layer 321 may be an n-type semiconductor layer 'the first semiconductor 323, which may be a -P type + conductor layer, but for example only 'when $, first The application of the semiconductors 21 & second semiconductor layer 323 to the n-type semiconductor layer and the p-type semiconductor layer can be interchanged according to the needs of the semiconductor. Further, as shown in Fig. 5, it is a schematic view of another light-polar device according to a preferred embodiment of the present invention. The light-emitting diodes 32 of the present embodiment may also be coupled to the first surface 3 11 side of the substrate 3, that is, the light-emitting electrode 32 is attached to the first surface 3 i of the substrate 3 i. The light-emitting diode device 3 of the present embodiment further includes a light-transmissive 2-layer 33 bonded to the substrate 3 and the light-emitting diode element w, that is, the transparent layer 4 is placed on the substrate 31 and The material of the light-transmitting adhesive layer 33 between the light-emitting diode elements w includes an epoxy resin. As shown in FIG. 4A and FIG. 5, the light-emitting diode device of the present embodiment is one of the poor: one electrode pair 34, which includes a first-contact electrode 341, and an electrode 342, which are respectively connected to the first semiconductor layer. The second semiconductor layer 32 and the second semiconductor layer 323' are respectively smothered by the first contact electrode 341 and the second first electrode W. two
28306-CP 200832746 半=體層323之電子及電洞係於發光層322發生結合, 而電子電洞結合所釋放的能量將轉為產生一光束,該光 束係向基板31射出,藉由此些階級狀凸塊313階級狀 微:構設計來調整光束之相位或方向,使光束之光場形 狀王非一般之圓形,而可依據結構之設計使光場形狀呈 三角形、四邊形或多邊形。如圖6所示,其為依據本發 :車父佳實施例之一種發光二極體裝置之光場形狀的示 瞻:圖。在圖6中係以光場形狀為正方形為例說明,相鄰 :置之發光二極體裝置3所產生之複數道光束,由於光 %形狀可調整’因此可設計使相鄰之發光面積A,不會相 互重疊與干擾,而有效改善發光強度不均勻的問題,並 達到光束形狀整形及調整光場強度分佈的功能。 另外,本實施例之發光二極體裝置3更可包括一透 光導電層係設置於發光二極體元件32及基板31之間 (圖未頒示),用以提高電流之擴散效率,以提高發光 _ 一極體裝置3的發光效率。其中,透明導電層之材質係 延自氧化銦錫、氧化鎘錫、氧化銻錫及其組合所構成的 群組。 在本實施例中,如圖4A與圖5所示,發光二極體 I置3係可應用於覆晶(fiip-chip )形式之封裝結構, 於此,發光二極體裝置3更包括一散熱基板35,發光 二極體元件32係以覆晶形式連結於散熱基板35上,連 接务光—極體元件32之第一接觸電極341及第二接觸 電極342係設置於發光二極體元件32及散熱基板35之28306-CP 200832746 The electrons and holes of the half body layer 323 are combined in the light-emitting layer 322, and the energy released by the electron hole combination is converted into a light beam, which is emitted toward the substrate 31, thereby using these classes. The shape of the bump 313 is micro-shaped: the design is to adjust the phase or direction of the light beam, so that the shape of the light field of the light beam is not circular, and the shape of the light field can be triangular, quadrangular or polygonal according to the design of the structure. As shown in Fig. 6, it is a view of the shape of the light field of a light-emitting diode device according to the embodiment of the present invention. In FIG. 6, the light field shape is square as an example, and adjacent: the plurality of light beams generated by the light-emitting diode device 3 can be adjusted because the light % shape can be adjusted, so that the adjacent light-emitting area A can be designed. It does not overlap and interfere with each other, but effectively improves the problem of uneven luminous intensity, and achieves the function of shaping the beam shape and adjusting the intensity distribution of the light field. In addition, the light-emitting diode device 3 of the present embodiment further includes a light-transmissive conductive layer disposed between the light-emitting diode element 32 and the substrate 31 (not shown) for improving current diffusion efficiency. Increasing the luminous efficiency of the one-electrode device 3. The material of the transparent conductive layer is extended from the group consisting of indium tin oxide, cadmium tin oxide, antimony tin oxide and combinations thereof. In this embodiment, as shown in FIG. 4A and FIG. 5, the LEDs 3 can be applied to a package structure in a fiip-chip form. Here, the LED device 3 further includes a package. The heat dissipation substrate 35 and the light emitting diode element 32 are connected to the heat dissipation substrate 35 in a flip chip form, and the first contact electrode 341 and the second contact electrode 342 of the connection light body element 32 are disposed on the light emitting diode element. 32 and heat dissipation substrate 35
28306-CP 11 200832746 間0 再請參照圖7、圖8A與圖8B,依據本發明較佳實 施例之一種發光二極體裝置之製造方法,包括步驟^ 至步驟S2。步驟si係提供一板體,具有一表面且其上 係具有複數個階級狀凸塊;以及步驟S2係形成至少一 發光二極體元件於板體之上,發光二極體元件依序包括 一第一半導體層、一發光層及一第二半導體層,第一半 導體層形成於板體上。而為使說明更容易瞭解,以下相 同元件係以相同之元件標號標示。 於步驟S1中,提供板體30作為製作發光二極酽元 件之一暫時性基板,其之材質係包括碳化矽(3η=〇η carbide )或氧化紹(sapphire )例如三氧化二銘( 〇3) ’在板體經過適當之清洗步驟後以進行後續之發 二極體元件的磊晶層成長。 在此步驟中,板體30之表 塊,此結構係可藉由下列步驟形成。如圖所示,首 ,’係形成-光阻層PR於板體30上,於本實施例中 =ΓΤ為正光阻係數之光阻層,當然亦可為負 Η糸數之光阻層;之後,透過一 ==於本實施例中,曝光的步驟係為灰 對光阻其係可經由複數道曝光的程序以 曰PRk成不同程度的曝光效 成對_PR造成不同=光 果,再依據曝光結果錄光阻層PR及部分之板體28306-CP 11 200832746 0 Referring again to FIG. 7, FIG. 8A and FIG. 8B, a method of manufacturing a light-emitting diode device according to a preferred embodiment of the present invention includes steps from step S2 to step S2. Step si provides a plate body having a surface and having a plurality of step-like bumps thereon; and step S2 forms at least one light-emitting diode element on the plate body, and the light-emitting diode element sequentially includes one The first semiconductor layer, a light emitting layer and a second semiconductor layer are formed on the plate body. In order to make the description easier to understand, the same components are denoted by the same reference numerals. In the step S1, the plate body 30 is provided as a temporary substrate for fabricating the light-emitting diode component, and the material thereof comprises tantalum carbide (3η=〇η carbide) or sapphire (such as bismuth oxide) (〇3) After the plate has undergone a suitable cleaning step, the epitaxial layer growth of the subsequent diode element is performed. In this step, the surface of the plate 30, which is formed by the following steps. As shown in the figure, the first, 'the formation of the photoresist layer PR on the plate body 30, in this embodiment = ΓΤ is the photoresist layer of the positive photoresist coefficient, of course, can also be a negative number of photoresist layer; Thereafter, through a == in the present embodiment, the step of exposing is a gray-to-resistance process, and the process of exposing through the plurality of channels is performed by 曰PRk to different degrees of exposure effect to _PR to cause different = light fruit, and then Recording the photoresist layer PR and part of the plate body according to the exposure result
28306-CP 12 200832746 3〇’以形成此些階級狀凸塊313。在本實施例中,光阻 層PR及部分之板體30的移除動作,係藉由蝕刻的方式 移除’其係選用對板體30及光阻層PR的蝕刻率相當= 蝕刻液,以將灰階曝光的結果轉置於板體3〇上,S形 成此些階級狀凸塊313。 夕 另外,於步驟S1中,此些階級狀凸塊313結構亦 可由下列步驟來形成◊首先,塗佈一光阻層PR於板體 30上;之後以一模仁5壓印光阻層pR,模仁5係具有 此些階級狀凸塊的反向圖案,且壓印方式係可以一軟壓 印方式或一熱壓印方式來形成;待光阻層pR固化後, 移除該模仁5 ;最後,再依據光阻層pR之此些階級狀 凸塊313,’移除光阻層PR及部分之板體3〇,以形成此 些階級狀凸塊313。於此,由於光阻層pR之材質與光 阻層PR及部分之板體3〇的移除方式係如前所述,故不 在此贅述。 在本實施例中,所形成之此些階級狀凸塊313係為 具有平坦表面之二元光學凸塊來呈現,其係具有2,個 階層之微結構,且n係為一正整數,而此些階級狀凸塊 313可以對稱排列、非對稱排列或不規則排列。然每一 白、、及凸塊3 13亦可為具有一曲形表面之凸塊,其剖面可 為凸狀(如圖4Β所示)、凹狀(如圖4C所示)、波浪 狀(如圖4D所示)或其他形狀。 於步驟S2中,如圖δΒ所示,形成發光二極體元件 32於板體30之上,即於板體3〇之上依序成長一第一28306-CP 12 200832746 3〇' to form such stepped bumps 313. In this embodiment, the removal operation of the photoresist layer PR and a portion of the plate body 30 is removed by etching, and the etching rate of the plate body 30 and the photoresist layer PR is equivalent to etchant. The results of the gray scale exposure are transferred to the plate body 3, and S forms the step-like bumps 313. In addition, in step S1, the structure of the stepped bumps 313 may also be formed by the following steps. First, a photoresist layer PR is coated on the plate body 30; then the photoresist layer pR is imprinted with a mold 5 The mold 5 has a reverse pattern of the step-like bumps, and the embossing method can be formed by a soft embossing method or a hot embossing method; after the photoresist layer pR is cured, the mold core is removed. Finally, the photoresist layer PR and a portion of the plate body 3 are removed according to the stepped bumps 313 of the photoresist layer pR to form the stepped bumps 313. Here, since the material of the photoresist layer pR and the photoresist layer PR and a portion of the plate body 3 are removed as described above, they will not be described here. In this embodiment, the stepped bumps 313 are formed by a binary optical bump having a flat surface, which has 2, a hierarchical microstructure, and n is a positive integer, and The class-like bumps 313 may be arranged symmetrically, asymmetrically, or irregularly. Each of the white and/or bumps 3 13 may also be a bump having a curved surface, and the cross section may be convex (as shown in FIG. 4A), concave (as shown in FIG. 4C), and wavy ( As shown in Figure 4D) or other shapes. In step S2, as shown in FIG. δ, the light-emitting diode element 32 is formed on the plate body 30, that is, sequentially grown on the plate body 3〇.
28306-CP 13 200832746 第二半導體層323, 係可為一 η型半導體 Ρ型半導體層,然此 半導體層321、一發光層322及一 在本貫施例中,第一半導體層321 層’而第二半導體層323係可為一 僅為舉例性,並不僅限於此。 的形成亦可以在步驟 此外,此些階級狀凸塊313 S2之後進行。 於步驟S2之後 極體元# 32,在本實施例中,俜二二:發光 分之第4導體層323及發光層32Vj方式移除部 於包m形成—第一接觸電極341, 半;3=上’以及形成一第二接觸電極342,於第二 ㈣二曰:側,而使第一接觸電極341及第二接 =4。2分別電性連接第一半導體層321及第二半導 ,另外,發光二極體裝置於形成電極341,、342,之 t更包括-步驟’將該發光二極體裝置連結於一散熱 土反35 ’而應用於覆晶形式之封裝結構,然此僅為舉 例,並不以此為限。 牛 〜再請參照圖9、圖與圖_,依據本發明較佳 貝施例之另一種發光二極體裝置之製造方法包括步驟 S1至S5。步驟S1’係提供—板體;步驟S2,係形成至 少一發,二極體元件於板體之上,發光二極體元件依序 包括:弟一半導體層、-發光層及-第二半導體層,第 一半導體層形成於板體上;步驟S3,係提供—基板,具28306-CP 13 200832746 The second semiconductor layer 323 can be an n-type semiconductor germanium-type semiconductor layer, but the semiconductor layer 321, a light-emitting layer 322 and a first semiconductor layer 321 layer in the present embodiment The second semiconductor layer 323 may be merely exemplary and is not limited thereto. The formation may also be performed in the step, after the stepped bumps 313 S2. After the step S2, the body element #32, in the embodiment, the second conductor layer 323 and the light-emitting layer 32Vj removal portion are formed in the package m - the first contact electrode 341, half; And a second contact electrode 342 is formed on the second (four) diode side, and the first contact electrode 341 and the second connection = 4. 2 are electrically connected to the first semiconductor layer 321 and the second semiconductor, respectively. In addition, the LED device is formed on the electrodes 341, 342, and further includes a step of "connecting the LED device to a heat dissipation earth 35" and applying the package structure in a flip chip form. It is only an example and is not limited to this. Further, referring to Fig. 9, Fig. and Fig. _, a method of manufacturing another light emitting diode device according to a preferred embodiment of the present invention includes steps S1 to S5. Step S1' is to provide a plate body; step S2 is to form at least one hair, the diode element is above the plate body, and the light emitting diode element sequentially comprises: a semiconductor layer, a light emitting layer and a second semiconductor a layer, the first semiconductor layer is formed on the board; in step S3, the substrate is provided
28306-CP 14 200832746 有一表面且其上係具有複數個階級狀凸塊丨步驟,係 黏貼基板於發光二極體元件之上;以及步驟S5,係移除 板體。 於步驟S1,中,板體30之材質以及功能特徵係如前 實施例所述,故不再贅述。 於步驟S2’中,發光二極體元件32之結構、材質及 配置關係如前實施例所述,故亦不在此贅述。28306-CP 14 200832746 has a surface having a plurality of stepped bumps thereon, the substrate being adhered to the LED component; and in step S5, the panel is removed. In step S1, the material and functional characteristics of the board 30 are as described in the previous embodiment, and therefore will not be described again. In the step S2', the structure, material and arrangement relationship of the LED component 32 are as described in the previous embodiment, and therefore are not described herein.
於步驟S3’中,提供一表面具有複數個階級狀凸塊 3 13的基板3 1,在本實施例中,如圖丨〇 a所示,基板 31係具有相對設置之一第一表面3〗〗及一第二表面 312,此些階級狀凸塊313係形成於第一表面3ιι上, 而此些階級狀凸塊313的形成方式係如前實施例所 述,利用光阻灰階曝光(如圖1〇B所示)或是光阻壓印 方式再配合蝕刻方式成形,且此些階級狀凸塊313的結 構特徵及排列方式亦如前實施例所述,故不再贅述。在 本實施例中,基板31係為一透光基板,其之材質係選 自環氧樹脂、光學玻璃、半導體及其組合所構成的群 組,其中半導體係可為m-v族、Π-Υ!族或JV族之半導 於步驟S4’中,黏貼具有此些階級狀凸塊313之基 板31於發光二極體元件32之上,如圖1〇A所示,係以 基板31之第一表面311面對發光二極體元件32之第二 半導體層323黏貼於其上,於此,基板31係藉由一= 光黏貼層33黏貼於發光二極體元件32,其中透光黏貼In the step S3', a substrate 311 having a plurality of step-like bumps 3 13 on the surface is provided. In the embodiment, as shown in FIG. 丨〇a, the substrate 31 has a first surface 3 opposite to each other. And a second surface 312, the stepped bumps 313 are formed on the first surface 3 ιι, and the stepped bumps 313 are formed in the same manner as in the previous embodiment, using photoresist gray scale exposure ( As shown in FIG. 1B, or the photoresist stamping method is formed by etching, and the structural features and arrangement of the stepped bumps 313 are also as described in the previous embodiment, and thus will not be described again. In this embodiment, the substrate 31 is a transparent substrate, and the material thereof is selected from the group consisting of epoxy resin, optical glass, semiconductor, and combinations thereof, wherein the semiconductor system can be mv, Π-Υ! The semiconductor or JV family is semi-conductive in step S4', and the substrate 31 having the step-like bumps 313 is pasted on the light-emitting diode element 32, as shown in FIG. The surface 311 is adhered to the second semiconductor layer 323 of the light-emitting diode element 32. The substrate 31 is adhered to the light-emitting diode element 32 by a light-adhesive layer 33.
28306-CP 200832746 層33之材質係包括環氧樹脂。 另外,基板31亦可以其之第二表面312面對發光 二極體元件32之第二半導體層323而黏貼於其上(圖 未顯示),而使此些階級狀凸塊313形成於發光二極體 裝置之一出光表面上。 於步驟S5’中,以例如雷射剝除(laser lift-off)製 私移除板體3 0,在此步驟之前或之後,更可包括翻轉 發光二極體裝置,以利後續之製程步驟。 於步驟S5’之後,更包括一步驟,移除部分之發光 二極體元件32,在本實施例中,部分之第一半導體層 321及發光層322係以例如蝕刻方式移除,於此步驟之 後’形成一第一接觸電極341於第一半導體層321之一 側且形成一弟二接觸電極342於移除部分上,而使第 一接觸電極341及第二接觸電極342分別電性連接第一 半導體層321及第二半導體層323。 在本實施例中,於步驟S5,之後,更可包括一步驟 S6,係將該發光二極體裝置連結於一散熱基板35,以 應用於覆晶形式之封裝結構,然此僅為舉例,並不以此 為限。 綜上所述,因依據本發明之一種發光二極體裝置及 其衣k方法,其係於基板或板體之一側形成複數個階級 狀凸塊,此些階級狀凸塊係用以調整發光二極體元件所 發出光束之光場相位或方向,達到改變光束之光場形狀 或調整光場強度分佈的功能,進而使複數個發光二極體28306-CP 200832746 The material of layer 33 is epoxy. In addition, the substrate 31 may have its second surface 312 facing the second semiconductor layer 323 of the LED component 32 and adhered thereto (not shown), so that the stepped bumps 313 are formed on the light-emitting diodes 313. One of the polar body devices is on the light surface. In step S5', the board body 30 is removed by, for example, laser lift-off, and before or after this step, the flip-light diode device may be further included to facilitate the subsequent process steps. . After step S5', a step is further included to remove a portion of the LED component 32. In this embodiment, a portion of the first semiconductor layer 321 and the luminescent layer 322 are removed by, for example, etching. Then, a first contact electrode 341 is formed on one side of the first semiconductor layer 321 and a second contact electrode 342 is formed on the removed portion, and the first contact electrode 341 and the second contact electrode 342 are electrically connected. A semiconductor layer 321 and a second semiconductor layer 323. In this embodiment, after step S5, a step S6 is further included, and the LED device is coupled to a heat dissipation substrate 35 to be applied to the package structure in a flip chip form. Not limited to this. In summary, according to the light-emitting diode device and the clothing k method thereof according to the present invention, a plurality of step-like bumps are formed on one side of the substrate or the plate body, and the step-like bumps are used for adjusting The phase or direction of the light field of the beam emitted by the LED component reaches the function of changing the shape of the light field of the beam or adjusting the intensity distribution of the light field, thereby enabling a plurality of light-emitting diodes
28306-CP 16 200832746 元件之發光面積彼此不發生重疊,而有效改善習知技術 發光強度不均勻的現象。其中此些階級狀凸塊係可形成 於基板或板體之-表面上,抑或形成於基板與發光二極 體凡件的接合介面上。另外,利用此些階級狀凸塊之结 構設計亦可達到導正習知技術光線集令褐附 近,現象’而達到均勾化發光面積之目的。又再:軸: • 了 p,級狀凸塊的設計之外’亦可於發光路徑上另外設 一適當之透鏡(lens ),亦即,將凡 又 盥氺Φ日”鉍々 將透鏡叹置於階級狀凸塊 ,、先束』之目的物之間’藉以調 而使得應用更為廣泛。 κ尤子扣性, 以上所述僅為舉例性,而非為限制性者 離本發明之精神與範嘴 可未脫 更,妁廄勺入# μ 了,、進仃之專效修改或變 更均應包含於後附之申請專利範圍中。 【圖式簡單說明】 圖1為習知之一種發# — 圖2A 1先一極體I置的示意圖。 圖2b為圖的示意圖。 圖。 兔光二極體裝置與導光板的示意 圖3A為習知之另 圖-為圖C二極體震置的示意圖。 意圖。 X光—極體裝置之光場形狀的示28306-CP 16 200832746 The light-emitting areas of the components do not overlap each other, and the phenomenon of uneven luminous intensity of the prior art is effectively improved. The step-like bumps may be formed on the surface of the substrate or the board, or formed on the bonding interface between the substrate and the light-emitting diode. In addition, the structural design of the class-like bumps can also achieve the purpose of guiding the conventional light ray to make the brown color close to the phenomenon, and achieve the purpose of uniformly illuminating the light-emitting area. Again: the axis: • p, outside the design of the graded bumps 'can also set a suitable lens (lens) on the light path, that is, the 盥氺 日 日 日 铋々 透镜 透镜 透镜 透镜 透镜 透镜 透镜 透镜Putting it in a class-like bump, and between the objects of the first bundle, is used to make the application more extensive. The above is only an example, not a limitation, from the present invention. The spirit and the mouth of the mouth can be removed, and the special effects or modifications of the sputum should be included in the scope of the patent application attached. [Simplified Schematic] Figure 1 is a conventional one. Figure 2A is a schematic diagram of a first pole body I. Figure 2b is a schematic diagram of the figure. Fig. 3A is a schematic diagram of a rabbit light diode device and a light guide plate. Schematic. Intention. X-ray - the representation of the shape of the light field of the polar body device
襄置=為圖依據本發明較佳實施例之-種發光二極體 28306-CP 17 200832746襄 为 为 为 为 28 28 306 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28
圖 4B 至圖 4DAm/iA L ^ 為圖4A中虛線圓部分之各種凸塊之 剖面不意圖。 $ 5為依據本發明較佳實施例之另一種發光二極 體衣置的示意圖。 圖6為依據本發明較佳實施例之一種發光二極體 裝置之光場形狀的示意圖。 ^ 圖7為依據本發明較佳實施例之—種發光二極體 裝置的流程圖。 圖8A與圖8B為依據本發明較佳實施例之一種發 光一極體裝置的流程示意圖。 圖9為依據本發明較佳實施例之另一種發光二極 體裝置的流程圖。 圖10A與圖10B為依據本發明較佳實施例之另一 種發光二極體裝置的流程示意圖。 元件符號說明·· 1、2、3 :發光二極體裝置 1〇、20、32 :發光二極體元件 1G1、321 :第一半導體層 102、 322 :發光層 103、 323 :第二半導體層 HM、341、341’ :第一接觸電極 105、342、342, ··第二接觸電極 11 :透明基板4B to 4DAm/iA L ^ are cross-sectional views of the various bumps of the dotted circle portion in Fig. 4A. $5 is a schematic illustration of another light-emitting diode garment in accordance with a preferred embodiment of the present invention. Figure 6 is a schematic illustration of the shape of a light field of a light emitting diode device in accordance with a preferred embodiment of the present invention. Figure 7 is a flow chart of a light emitting diode device in accordance with a preferred embodiment of the present invention. 8A and 8B are schematic flow charts of a light-emitting diode device according to a preferred embodiment of the present invention. Figure 9 is a flow chart of another light emitting diode device in accordance with a preferred embodiment of the present invention. 10A and 10B are schematic flow charts of another light emitting diode device according to a preferred embodiment of the present invention. DESCRIPTION OF SYMBOLS · 1, 2, 3: Light-emitting diode devices 1〇, 20, 32: Light-emitting diode elements 1G1, 321 : First semiconductor layers 102, 322: Light-emitting layers 103, 323: Second semiconductor layer HM, 341, 341': first contact electrodes 105, 342, 342, · second contact electrode 11: transparent substrate
28306-CP 18 200832746 12 :封裝單元 21、31 :基板 22 :鏡體 30 :板體 3 11 :第一表面 312 :第二表面 313 :階級狀凸塊 33 :透光黏貼層 34 :電極對 35 :散熱基板 5 :模仁 6 :導光板 051 :光轴 052 :光軸 A、A’ :發光面積 PR :光阻層 Μ :光罩 S1〜S2、S1’〜S6,:流程步驟 28306-CP 1928306-CP 18 200832746 12 : package unit 21, 31: substrate 22: mirror body 30: plate body 3 11 : first surface 312 : second surface 313 : step-like bump 33 : light-transmissive adhesive layer 34 : electrode pair 35 : heat dissipation substrate 5 : mold core 6 : light guide plate 051 : optical axis 052 : optical axis A, A ' : light-emitting area PR : photoresist layer Μ : masks S1 to S2, S1' to S6, flow: step 28306-CP 19
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
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TWI426627B (en) * | 2010-06-15 | 2014-02-11 | Hon Hai Prec Ind Co Ltd | Light-emitting diode |
US8946729B2 (en) | 2010-06-04 | 2015-02-03 | Tsinghua University | Light emitting diode |
CN105006504A (en) * | 2015-05-13 | 2015-10-28 | 友达光电股份有限公司 | Micro light-emitting diode device and manufacturing method thereof |
CN115513360A (en) * | 2022-09-29 | 2022-12-23 | 广东省科学院半导体研究所 | Method for improving light extraction efficiency of LED based on super-structured surface, corresponding LED device and application |
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Cited By (8)
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US8946729B2 (en) | 2010-06-04 | 2015-02-03 | Tsinghua University | Light emitting diode |
TWI426627B (en) * | 2010-06-15 | 2014-02-11 | Hon Hai Prec Ind Co Ltd | Light-emitting diode |
CN105006504A (en) * | 2015-05-13 | 2015-10-28 | 友达光电股份有限公司 | Micro light-emitting diode device and manufacturing method thereof |
US9825200B2 (en) | 2015-05-13 | 2017-11-21 | Au Optronics Corporation | Micro-light-emitting diode device and method for manufacturing the same |
TWI610459B (en) * | 2015-05-13 | 2018-01-01 | 友達光電股份有限公司 | Miniature light emitting diode device and manufacturing method thereof |
CN105006504B (en) * | 2015-05-13 | 2018-03-27 | 友达光电股份有限公司 | Micro light-emitting diode device and manufacturing method thereof |
US10658540B2 (en) | 2015-05-13 | 2020-05-19 | Au Optronics Corporation | Micro-light-emitting diode device |
CN115513360A (en) * | 2022-09-29 | 2022-12-23 | 广东省科学院半导体研究所 | Method for improving light extraction efficiency of LED based on super-structured surface, corresponding LED device and application |
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