TW200811311A - Method for metallizing plastic surface - Google Patents
Method for metallizing plastic surface Download PDFInfo
- Publication number
- TW200811311A TW200811311A TW096126389A TW96126389A TW200811311A TW 200811311 A TW200811311 A TW 200811311A TW 096126389 A TW096126389 A TW 096126389A TW 96126389 A TW96126389 A TW 96126389A TW 200811311 A TW200811311 A TW 200811311A
- Authority
- TW
- Taiwan
- Prior art keywords
- plastic
- catalyst
- liquid
- treatment liquid
- compound
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/28—Sensitising or activating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/28—Sensitising or activating
- C23C18/30—Activating or accelerating or sensitising with palladium or other noble metal
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/54—Electroplating of non-metallic surfaces
- C25D5/56—Electroplating of non-metallic surfaces of plastics
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Electrochemistry (AREA)
- Chemically Coating (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
Description
200811311 九、發明說明 【發明所屬之技術領域】 本發明係有關塑膠表面之金屬化方法,更詳細者係有 關於保持鍍敷被鍍敷製品之作業中之機架表面不會鍍敷析 出,於塑膠表面形成具有高密合性之鍍敷被膜的方法。 【先前技術】 先行技術中,於丙烯腈•丁二烯·苯乙烯(ABS )樹 脂、聚碳酸酯/丙烯腈•丁二烯·苯乙烯(PC/ABS )等之 塑膠表面藉由鍍敷進行金屬化處理時,公知者有爲提高塑 膠表面與鍍敷被膜之密合性,於鍍敷處理前使塑膠表面藉 由鉻酸與硫酸之混合液進行粗化之蝕刻處理。 惟,該飩刻處理中,使用有害的6價鉻,於60°C以上 之高溫下進行作業,而導致作業環境變差,且其度水處理 亦非得注意不可之問題存在。又,於該飩刻處理後所進行 的鍍敷步驟中,其PC/ABS等之鍍敷於不易析出之塑膠表 面上進行鍍敷時,直接鍍敷於所謂直接電鍍之吸附金屬觸 媒時,務必進行爲使增加觸媒金屬吸附之調整處理,惟, 經由此處理後,機架表面亦出現鍍敷析出。因此,由調整 處理移至電鍍時務必交換機架,導致其係業性極爲不良之 問題存在。> 由此等問題,被期待提供一種取代鉻酸與硫酸混合液 之飩刻劑,如:取代此等蝕刻劑後,藉由過錳酸鹽及磷酸 之混合液進行蝕刻處理’接著以離子性之觸媒液處理等, -4- 200811311 之後,進行鍍敷之無鉻鍍敷過程被揭示之(專利文獻1) 〇 惟,該步驟中,以離子性之觸媒液處理後,對於塑膠 表面之觸媒金屬的吸附量雖然增加’卻亦於機架之塗層表 面吸附觸媒金屬,因此隨後的鍍敷過程與塑膠表面同時亦 於機架表面出現鍍敷析出之問題。又’於此過程中’爲使 觸媒金屬還原之還原劑因自然分解而缺乏實用性之問題存 在。 專利文獻1 : WO 2005/094394號手冊 【發明內容】 因此,本發明之課題係提供一種於無鉻之塑膠表面的 金屬化過程中,可做成充份密合鍍敷於塑膠表面,且於機 架不會鍍敷析出之實用性高的塑膠表面之金屬化方法。 本發明者,爲解決該課題進行精密硏討後結果發現, 將塑膠表面以含有過錳酸鹽等之鈾刻處理液處理後,藉由 以含有特定之化合物之賦予觸媒增強液處理後,該賦予觸 媒處理後可使觸媒金屬以選擇性吸附於塑膠表面,且該吸 附量亦增加。進一步持續該賦予觸媒處理同時進行鍍敷處 理後,仍可做成充份密合鍍敷於塑膠表面上,且於機架塗 層表面不會鍍敷析出,進而完成本發明。 亦即’本發明係將塑膠以含有過鍤酸鹽及無機酸之鈾 刻處理液處理後,接著,使該處理之塑膠於其表面露出之 官能基上以含有具選擇吸附性之化合物之賦予觸媒增強液 5- 200811311 處理後,進一步於以該賦予觸媒增強液所處理之塑膠上利 用賦予觸媒處理液賦予觸媒後,隨後,於賦予該觸媒之塑 膠上進行金屬鍍敷者爲其特徵之塑膠表面之金屬化方法。 本發明塑膠表面之金屬化方法可做成充份密合鍍敷於 塑膠表面,且於機架不會鍍敷析出,爲實用性極高之方法 。本發明塑膠表面之金屬化方法可增加對於塑膠表面之觸 媒金屬的吸附量,因此,對於先行技術之方法中,不易吸 附觸媒金屬之塑膠仍可進行相同之鍍敷。 所以,本發明塑膠表面之金屬化方法係以無鉻之塑膠 表面的金屬化過程爲良好方法。 【實施方式】 〔發明實施之最佳形態〕200811311 IX. INSTRUCTIONS OF THE INVENTION [Technical Fields of the Invention] The present invention relates to a metallization method for a plastic surface, and more particularly to the fact that the surface of the frame in the operation of maintaining the plated product to be plated is not plated and precipitated. A method of forming a coated film having high adhesion on a plastic surface. [Prior Art] In the prior art, the surface of plastics such as acrylonitrile butadiene styrene (ABS) resin, polycarbonate/acrylonitrile butadiene styrene (PC/ABS) was plated. In the metallization treatment, in order to improve the adhesion between the surface of the plastic and the plating film, the plastic surface is etched by roughening the mixture of chromic acid and sulfuric acid before the plating treatment. However, in the engraving treatment, the use of harmful hexavalent chromium is carried out at a high temperature of 60 ° C or higher, which results in a deterioration of the working environment, and the treatment of the degree of water must not be an issue. Further, in the plating step performed after the etching treatment, when plating such as PC/ABS is applied to the surface of the plastic which is hard to be deposited, the plating is directly applied to the so-called direct plating adsorption metal catalyst. It is necessary to carry out the adjustment treatment for increasing the adsorption of the catalytic metal, but after the treatment, the plating of the surface of the frame is also precipitated. Therefore, it is necessary to change the process from the adjustment process to the plating, which results in a problem that the system is extremely poor. > With respect to such problems, it is expected to provide a etchant for replacing a mixture of chromic acid and sulfuric acid, such as: after replacing these etchants, etching treatment is carried out by a mixture of permanganate and phosphoric acid. Sexual contact liquid treatment, etc., -4- 200811311, the chrome-free plating process for plating is disclosed (Patent Document 1). In this step, after the ionic catalyst liquid is treated, the plastic is applied. Although the adsorption amount of the catalyst metal on the surface is increased, the catalyst metal is also adsorbed on the coating surface of the frame, so that the subsequent plating process and the plastic surface also cause plating precipitation on the surface of the frame. Further, in this process, there is a problem that the reducing agent for reducing the catalytic metal is decomposed due to natural decomposition. Patent Document 1: WO 2005/094394 Manual [Summary of the Invention] Accordingly, the object of the present invention is to provide a surface that can be sufficiently adhered to a plastic surface during metallization of a chrome-free plastic surface. The metallization method of the plastic surface with high practicability of the precipitation is not plated. The inventors of the present invention have found that the surface of the plastic is treated with a uranium engraving treatment solution containing permanganate or the like, and then treated with a catalyst-enhancing liquid containing a specific compound. After the catalyst treatment, the catalyst metal can be selectively adsorbed on the plastic surface, and the adsorption amount is also increased. Further, after the catalyst treatment is carried out and the plating treatment is performed, the plating can be sufficiently adhered to the surface of the plastic, and the surface of the frame coating layer is not plated and precipitated, thereby completing the present invention. That is, the present invention treats the plastic with a uranium engraving treatment solution containing perrhenate and a mineral acid, and then imparts a selective adsorption property to the functional group on which the treated plastic is exposed on the surface. After the treatment of the catalyst-enhancing liquid 5-200811311, the catalyst is applied to the plastic treated with the catalyst-enhancing liquid, and then the metal is applied to the plastic to which the catalyst is applied. A metallization method for a plastic surface characterized by it. The metallization method of the plastic surface of the invention can be made to be fully adhered and plated on the surface of the plastic, and is not plated and precipitated in the frame, which is a highly practical method. The metallization method of the plastic surface of the present invention can increase the adsorption amount of the catalyst metal on the plastic surface. Therefore, in the prior art method, the same plating can be performed on the plastic which is not easy to adsorb the catalyst metal. Therefore, the metallization process of the plastic surface of the present invention is a good method for the metallization process of the chrome-free plastic surface. [Embodiment] [Best Mode for Carrying Out the Invention]
本發明塑膠表面之金屬化方法(以下稱「本發明方法 」)中做爲金屬化之對象之塑膠並未特別受限,一般如: 丙烯腈•丁二烯·苯乙烯(ABS )、聚碳酸酯/丙烯腈•丁 二烯·苯乙烯(PC/ABS )、丙烯腈·苯乙烯•丙烯酸酯 (ASA )、聚矽氧系複合橡膠-丙烯腈-苯乙烯(SAS )、 no ril、聚丙烯、聚碳酸酯(PC)、丙烯腈、苯乙烯、聚乙 酸酯、聚苯乙烯、聚醯胺、芳香族聚醯胺、聚乙烯、聚醚 酮、聚對苯二甲酸乙二醇酯、聚對苯二甲酸丁二醇酯、聚 颯、聚醚醚礪、聚醚醯亞胺、改性聚苯醚、聚苯硫醚、聚 醯胺、聚驢亞胺、環氧樹脂、液晶聚合物等,上述各聚合 物之共聚物等例。本發明方法中,特別以ABS及PC/ABS 200811311 之表面進行金屬化者宜。 本發明中,首先,使該塑膠表面藉由含有過錳酸鹽與 無機酸之蝕刻處理液處理之。做爲此鈾刻處理液所含有之 過錳酸鹽者並無特別受限,一般可使用過錳酸鉀、過錳酸 鈉等之過錳酸之金屬鹽。此過錳酸鹽之飩刻處理液中之濃 度以0.0005mol/L以上者宜,較佳者爲0.005〜0.5mol/L。 另外,含於飩刻處理液之無機酸並未特別受限,一般如: 選自磷酸、硫酸及硝酸所成群中至少1種之無機酸例,較 佳者爲磷酸。此等無機酸之飩刻處理液中之濃度以2mol/L 以上者宜,較佳者爲6〜12mol/L。以該鈾刻處理液處理塑 膠表面時,使液溫爲〇〜50°C,較佳者爲25〜40°C,於此, 將塑膠浸漬1〜30分鐘,較佳者爲5〜15分鐘後處理即可。 經由此蝕刻處理液之處理後,於塑膠表面露出官能基,具 體例如:露出羥基、羧基等親水性之官能基。 進行該飩刻處理之塑膠表面接著於經由上述處理之塑 膠表面露出之官能基上以含有具選擇吸附性化合物(以下 稱此爲「選擇吸附性化合物」)之賦予觸媒增強液處理之 。做爲於此賦予觸媒增強液所含之選擇吸附性化合物者只 要於如上述之官能基上具有選擇吸附性之化合物即可,未 特別限定,一般如:含氮原子之化合物,含3個以上氮原 子之化合物或分子量爲1 00以上之化合物、較佳者爲含有 3個以上氮原子、分子量爲1 00以上之化合物例。做爲此 選擇吸附性化合物之具體例者如:乙烯三胺、三乙烯四胺 等之乙烯二胺系化合物(其中去除乙烯二胺);epomin 200811311 SP-003、epomin SP-012、epomin SP-200 (均爲日本觸媒 股份公司製)等之乙烯亞胺系高分子化合物;PAA-03、 PAA-D41-HC1 (均爲日東紡紗股份公司製)等之烯丙基胺 系高分子化合物;PAS-92、PAS-M-1、PAS-880 C均爲日 東紡紗股份公司製)等之二烯丙基胺系高分子化合物; PVAM-0570-B (三菱化學股份公司製)等之乙烯胺系高分 子化合物例。此等選擇吸附性化合物中又特別以乙烯亞胺 系高分子化合物、烯丙基胺系高分子化合物及二烯丙基胺 系高分子化合物爲最佳。此等選擇吸附性化合物之賦予觸 媒增強液中之濃度爲 以上者宜,較佳者爲 100〜1 000mg/L。又,此賦予觸媒增強液係藉由如:氫氧化 鈉、硫酸等調整其pH爲5〜12,較佳者爲8〜10。利用此賦 予觸媒增強液處理該塑膠表面時,使液溫爲0〜7 0 °C者宜, 較佳者爲25〜35°C,於此將塑膠浸漬1〜20分鐘,較佳者 浸漬2〜3分鐘處理即可。 進行該賦予觸媒增強處理之塑膠表面接著利用賦予觸 媒處理液賦予觸媒。此賦予觸媒處理一般只要用於鍍敷步 驟之賦予觸媒即可,並未特別受限,通常以含有貴金屬者 宜,更佳者爲含有鈀者,特別是鈀/鍚混合膠體觸媒溶液 爲最佳。於塑膠表面賦予此等觸媒時,使賦予觸媒處理液 之液溫爲10〜60°c者宜,較佳者爲20〜50°c,將塑膠於此 浸漬1〜2 0分鐘,較佳者爲浸漬2〜5分鐘處理即可。 如此賦予觸媒之塑膠表面接著藉由無電解金屬鍍敷、 金屬電鑛(直接電鑛)%之金屬鑛敷後5進行塑膠表面之 -8- 200811311 金屬化。 於塑膠表面之金屬化使用無電解金屬鍍敷時,利用賦 予觸媒處理液賦予觸媒後,進一步以含有鹽酸或硫酸之活 化處理液處理亦可。此活化處理液中鹽酸或硫酸之濃度爲 0.5mol/L以上者宜,較佳者爲1〜4mol/L。利用此等活化處 理液處理塑膠表面時,將活化處理液之液溫爲〇〜60 °C者宜 ,較佳者爲30〜45°C,將塑膠於此浸漬1〜20分鐘,較佳 者浸漬2〜5分鐘處理即可。 如上述賦予觸媒、活性化處理之塑膠接著進行無電解 金鍍敷處理。無電解金屬鍍敷處理可使用公知的無電解鍍 鎳液、無電解鍍銅液、無電解鍍鈷液等之無電解鑛敷後依 常法進行之。具體而言,以無電解鍍鎳液於塑膠表面進行 鍍敷處理時,將塑膠浸漬於PH8〜10、30〜50°C之液溫的無 電解鍍鎳液中5〜1 5分鐘處理即可。 又’塑膠表面之金屬化中使用金屬電鍍(直接電鍍) 時,利用賦予觸媒處理液賦予觸媒後,進一步亦可以含有 銅離子以pH7以上,較佳者爲PH12以上之活化處理液處 理之。含於此活化處理液之銅離子的來源並未特別限定, 一般如:硫酸銅之例。利用活化處理液處理塑膠表面時, 使活化處理液之液溫爲0〜60°C者宜,更佳者爲30〜5(TC, 於此浸漬塑膠1〜20分鐘,較佳者爲2〜50分鐘處理即可。 如上述賦予觸媒、活性化處理之塑膠接著浸漬於硫酸 銅浴#泛用之電鍍銅浴後以一般之條件如:1〜5 A / d m2、 2〜10分鐘處理即可。 -9- 200811311 又,如上述於塑膠表面進行無電解電鍍、金屬電鍍等 之金屬鍍敷後,更於金屬化之塑膠表面上依其目的進行 各種電鍍銅、電鍍鎳亦可。 〔實施例〕 以下顯示實施例及比較例,進行本發明更具體之說明 。惟,本發明並未受限於此等。 〔參考例1〕 使用做爲試料之5 0x 1 00x3mm之ABS樹脂(UMGABS 股份公司製),將此於含有 O.Olmol/L之過錳酸鉀及 7.5mol/L之磷酸之35°C蝕刻處理液中浸漬10分鐘。另外 ,將上述試料於含有3.5mol/L之鉻酸酐及3.6m〇l/L之硫 酸之65 °C触刻液中浸漬1 0分鐘。利用傅里葉轉換紅外線 分光光度計(FT/IR 6100 FV型(日本分光股份公司製) ® ),藉由1次反射ATR法分析浸漬後之各ABS樹脂之表 面。其結果示於圖i。 • 以含有過錳酸之蝕刻處理液所處理之AB S樹脂表面於 . 334001^1附近出現源於羥基、羧基之波峰。另外,於未進 行蝕刻處理之ABS樹脂表面則未出現源於羥基、羧基之 波峰。又’以含有鉻酸之鈾刻處理液所處理之ABS樹脂 表面幾乎未出現源於羥基、羧基之波峰。 〔實施例1〕 -10- 200811311 (無電解鍍敷被膜之製作):The metal which is the object of metallization in the metallization method of the plastic surface of the present invention (hereinafter referred to as "the method of the present invention") is not particularly limited, and generally, for example, acrylonitrile butadiene styrene (ABS), polycarbonate Ester/acrylonitrile butadiene styrene (PC/ABS), acrylonitrile styrene acrylate (ASA), polyoxymethylene composite rubber-acrylonitrile-styrene (SAS), no ril, polypropylene , polycarbonate (PC), acrylonitrile, styrene, polyacetate, polystyrene, polyamine, aromatic polyamine, polyethylene, polyether ketone, polyethylene terephthalate, Polybutylene terephthalate, polyfluorene, polyetheretherether, polyetherimine, modified polyphenylene ether, polyphenylene sulfide, polyamine, polyimine, epoxy resin, liquid crystal polymerization Examples of the copolymers of the above polymers, and the like. In the method of the present invention, it is preferred to carry out metallization on the surface of ABS and PC/ABS 200811311. In the present invention, first, the plastic surface is treated by an etching treatment liquid containing permanganate and a mineral acid. The permanganate contained in the uranium engraving treatment liquid is not particularly limited, and a metal salt of permanganic acid such as potassium permanganate or sodium permanganate can be generally used. The concentration in the permanganate etching treatment liquid is preferably 0.0005 mol/L or more, preferably 0.005 to 0.5 mol/L. Further, the inorganic acid contained in the etching treatment liquid is not particularly limited, and is generally, for example, an inorganic acid selected from the group consisting of phosphoric acid, sulfuric acid and nitric acid, and preferably a phosphoric acid. The concentration in the etching solution of the inorganic acid is preferably 2 mol/L or more, preferably 6 to 12 mol/L. When the surface of the plastic is treated with the uranium engraving treatment liquid, the liquid temperature is 〇50 ° C, preferably 25 to 40 ° C, and the plastic is immersed for 1 to 30 minutes, preferably 5 to 15 minutes. After processing. After the treatment of the etching treatment liquid, the functional group is exposed on the surface of the plastic, and for example, a hydrophilic functional group such as a hydroxyl group or a carboxyl group is exposed. The plastic surface subjected to the engraving treatment is then treated with a catalyst-enhancing liquid containing a selective adsorbing compound (hereinafter referred to as "selective adsorbing compound") on a functional group exposed through the surface of the above-mentioned treated plastic. The selective adsorbing compound contained in the catalyst-enhancing liquid is not particularly limited as long as it has a selective adsorption property on the functional group as described above, and is generally, for example, a compound containing a nitrogen atom, and contains three The compound of the above nitrogen atom or the compound having a molecular weight of 100 or more is preferably a compound having three or more nitrogen atoms and a molecular weight of 100 or more. Specific examples of the adsorbent compound selected for this purpose include ethylene diamine compounds such as ethylene triamine and triethylenetetramine (in which ethylene diamine is removed); epomin 200811311 SP-003, epomin SP-012, epomin SP- Ethylene imine polymer compound such as 200 (both manufactured by Nippon Shokubai Co., Ltd.); allylamine polymer compound such as PAA-03, PAA-D41-HC1 (both manufactured by Nitto Spinning Co., Ltd.) ; PAS-92, PAS-M-1, PAS-880 C are all diallylamine-based polymer compounds such as Nitto Spinning Co., Ltd.; PVAM-0570-B (manufactured by Mitsubishi Chemical Corporation) An example of a vinylamine polymer compound. Among these selective adsorbing compounds, an ethyleneimine-based polymer compound, an allylamine-based polymer compound, and a diallylamine-based polymer compound are particularly preferable. The concentration of the selective adsorbing compound in the catalyst-enhancing liquid is preferably the above, preferably 100 to 1 000 mg/L. Further, the catalyst-improving liquid is adjusted to have a pH of 5 to 12, preferably 8 to 10, by, for example, sodium hydroxide or sulfuric acid. When the surface of the plastic is treated with the catalyst-enhancing liquid, the liquid temperature is preferably 0 to 70 ° C, preferably 25 to 35 ° C, and the plastic is immersed for 1 to 20 minutes, preferably impregnated. 2 to 3 minutes to process. The plastic surface to which the catalyst-enhancing treatment is applied is then applied to the catalyst by the application of the catalyst treatment liquid. The catalyst treatment is generally not limited as long as it is used for the plating step, and is usually limited to a noble metal, and more preferably a palladium-containing, especially palladium/ruthenium mixed colloid catalyst solution. For the best. When the catalyst is applied to the surface of the plastic, the temperature of the liquid to which the catalyst treatment liquid is applied is preferably 10 to 60 ° C, preferably 20 to 50 ° C, and the plastic is immersed therein for 1 to 20 minutes. The best one can be treated by dipping for 2 to 5 minutes. The plastic surface thus imparted to the catalyst is then metallized on the surface of the plastic by electroless metal plating, metal ore (direct electric ore), and metallization. When the metallization of the plastic surface is carried out by electroless metal plating, the catalyst may be added to the catalyst treatment liquid, and further treated with an active treatment liquid containing hydrochloric acid or sulfuric acid. The concentration of hydrochloric acid or sulfuric acid in the activation treatment liquid is preferably 0.5 mol/L or more, preferably 1 to 4 mol/L. When treating the plastic surface with the activation treatment liquid, the liquid temperature of the activation treatment liquid is preferably 〇60 ° C, preferably 30 to 45 ° C, and the plastic is immersed therein for 1 to 20 minutes, preferably Dip for 2 to 5 minutes. The plastic which is subjected to the catalyst and the activation treatment as described above is then subjected to an electroless gold plating treatment. The electroless metal plating treatment can be carried out by a conventional method using electroless mineral plating such as a known electroless nickel plating solution, an electroless copper plating solution, or an electroless cobalt plating solution. Specifically, when the electroless nickel plating solution is applied to the surface of the plastic, the plastic is immersed in an electroless nickel plating solution at a liquid temperature of pH 8 to 10 and 30 to 50 ° C for 5 to 15 minutes. . Further, when metal plating (direct plating) is used for metallization of the plastic surface, after the catalyst is supplied to the catalyst treatment liquid, the copper ion may further contain a copper ion at a pH of 7 or higher, preferably an activation treatment liquid having a pH of 12 or higher. . The source of the copper ion contained in the activation treatment liquid is not particularly limited, and is generally exemplified by copper sulfate. When the plastic surface is treated by the activation treatment liquid, the liquid temperature of the activation treatment liquid is preferably 0 to 60 ° C, more preferably 30 to 5 (TC, and the plastic is impregnated for 1 to 20 minutes, preferably 2 to 2). The treatment can be carried out for 50 minutes. The plastic which is given the catalyst and activated treatment is then immersed in a copper sulphate bath for general use, such as: 1~5 A / d m2, 2~10 minutes. -9- 200811311 In addition, after the metal plating such as electroless plating or metal plating is applied to the surface of the plastic, various kinds of electroplated copper or nickel plating may be performed on the surface of the metallized plastic according to the purpose. EXAMPLES Hereinafter, the present invention will be described more specifically by way of examples and comparative examples. However, the present invention is not limited thereto. [Reference Example 1] ABS resin (UMGABS shares) of 50 x 1 00 x 3 mm used as a sample was used. The company's sample was immersed in a 35 ° C etching treatment solution containing 0.5 mol/L of potassium permanganate and 7.5 mol/L of phosphoric acid for 10 minutes. In addition, the above sample was contained in 3.5 mol/L of chromium. The acid anhydride and 3.6 m〇l/L of sulfuric acid were immersed in a 65 °C contact solution for 10 minutes. The surface of each of the impregnated ABS resins was analyzed by a single-reflection ATR method using a Fourier transform infrared spectrophotometer (FT/IR 6100 FV type (manufactured by JASCO Corporation)). The results are shown in Fig. i. • The surface of the AB S resin treated with an etching solution containing permanganic acid appears to be a peak derived from a hydroxyl group or a carboxyl group in the vicinity of .334001^1. Further, the surface of the ABS resin which has not been subjected to etching treatment does not appear to be derived from a hydroxyl group. The peak of the carboxyl group. Further, the surface of the ABS resin treated with the uranium etching solution containing chromic acid hardly appeared from the peak of the hydroxyl group and the carboxyl group. [Example 1] -10- 200811311 (Production of electroless plating film) :
使用做爲試料之50x 1 00x3mm之ABS樹脂(UMGABS 股份公司製),將此於含有O.Olmol/Ι之過錳酸鉀及 7.5mol/l之磷酸的35°C鈾刻處理液中浸漬1〇分鐘。接著 ,將此於以氫氧化鈉調整200mg/l之PAA-〇3(聚條丙基 胺:日東紡紗股份公司製)之pH爲1 0之3 0。(:赋予觸媒 增強液中浸漬 2分鐘。進一步將此於室溫下浸漬於 1.2mol/l之鹽酸中1分鐘後,再於含有l〇ml/l之CT-580 (存原Udilyt股份公司製)及2·5πιο1/1鹽酸之35。〇銷/鍚 混合膠體觸媒溶液中浸漬4分鐘後,於ABS樹脂上賦予 觸媒。再將此於由1.2mol/l之鹽酸所成之35°C活性化處 理液中浸瀆4分鐘後,使觸媒活化。隨後,於PH8.8,35 °C之無電解鍍鎳液ENILEX N卜5 (荏原Udilyt股份公司製 )中浸漬10分鐘,於ABS樹脂上進行膜厚爲0.5 μηι之無 電解鍍鎳。之後,於含有150g/l之ν-345 (荏原Udilyt股 份公司製)之酸活化溶液中,室溫下浸漬1分鐘。接著, 將此於含有 0.75m〇l/l之硫酸鎳、0.4mol/l之氯化鎳及 0.5 5mol/l之硼酸之45°C瓦特浴中以2V/dm2浸漬3分鐘。 進一步將此於含有l〇ml/l PDC (荏原Udilyt股份公司製 )及0.5 mol/1硫酸之室溫銅取代溶液中浸漬1分鐘,進行 銅取代。再將此以 3A/dm2於含有 0.9mol/l硫酸銅, 0.55mol/l 及 0.0017mol/l 氯之 25°C 硫酸鍍銅液 EP-30(荏 原Udilyt股份公司製)中浸漬40分鐘後,於ABS樹脂上 進行膜厚爲20μπι之電鍍銅。之後,將此於70°C下進行退 -11 - 200811311 火1小時。 〔比較例1〕 (無電解鍍敷被膜之製作(1)): 於實施例1之步驟中,未於賦予觸媒增強液中做2分 鐘浸漬處理之外,同法於ABS樹脂上進行無電解鍍鎳。 〔比較例2〕 (無電解鍍敷被膜之製作(2 )): 使用做爲試料之50xlO〇x3mm之ABS樹脂(UMGABS 股份公司製),將此於含有 O.Olmol/l之過錳酸鉀及 7.5mol/i之磷酸之35t蝕刻處理液中浸漬10分鐘。接著 將此於含有〇.〇〇24mol/l之氯化鈀之50°C之觸媒溶液中浸 漬4分鐘後,於ABS樹脂上賦予觸媒。再使PC-66H (荏 原Udilyt股份公司製)於含有10ml/l之35°C活化處理液 中浸漬4分鐘,使觸媒活化。隨後,與實施例1之無電解 鍍鎳以後同法處理之。 〔比較例3〕 (無電解鍍敷被膜之製作(3)): 比較例2之步驟中,以於含有〇.〇〇19mol/l之2-胺基 吡啶與0.00094mol/l之硫酸鈀之50°C觸媒溶液取代含有 〇·〇〇24ιη〇1/1之氯化鈀之50°C觸媒溶液浸漬4分鐘之外, 同法於ABS樹脂上進行無電解鍍鎳。 -12- 200811311 〔試·驗例1〕 以目測進行評定該實施例1及比較例1〜3所得之無電 解鍍鎳被膜之ABS樹脂中之析出性、對於機架被覆之析 出。又,如下進行測定ABS樹脂上之鈀吸附量及密合強 度。此等結果如表1所示。 〈測定方法〉 (鈀觸媒之吸附量) 將吸附於AB S樹脂表面之鈀離子還原處理後,以王水 溶解鈀後,利用高周波電漿發光分析裝置ICPS-7510 (股 份公司島津製作所製)測定該溶液之吸光度後,測定鈀的 吸附量。 (密合強度測定): 依 JIS H8630附屬書 6,於 ABS樹脂表面形成約 2 0μπι之電鍍銅被膜後,於70°C下退火1小時,之後以張 力強度試驗機AGS-H50 0N (股份公司島津製作所製)測定 密合強度。 〔表1〕 無電解鍍敷被膜 析出性 對於機架被覆之 析出 鈀觸媒之吸附量 (mg/dm2) 密合強度 (kgf/cm) 實施例1 良好 Μ y\\\ 0.108 1.4 比較例1 有未析出部分 Μ j\\\ 0.025 - 比較例2 良好 有 0.063 1.4 比較例3 良好 有 0.082 1.4 -:不可測定 -13- 200811311 實施例1中鈀觸媒之吸附量增加,無電解鍍敷被膜之 析出性及密合強度爲良好者。且,此步驟中於機架被覆未 出現鍍敷析出。反之,比較例1中於機架雖無鍍敷析出, 對於ABS樹脂之鈀吸附量卻減少,出現鍍敷之未析出部 份。又,比較例2及比較例3中,對於ABS樹脂雖充份 取得鈀的吸附量,卻於機架被覆出現鍍敷析出。 ⑩ 〔實施例2〕 (對於ABS樹脂上之直接電鍍) 使用做爲試料之50x1 00x3mm之ABS樹脂(UMGABS 股份公司製),將此於含有 O.Olmol/l之過錳酸鉀及 7.5mol/l磷酸之35°C鈾刻處理液中浸漬1〇分鐘。接著將 此於以氫氧化鈉調整200mg/l之PAA-03 (聚戊胺:日東 紡紗股份公司製)爲pHIO之30°C賦予觸媒增強液中浸漬 ® 2分鐘後,進一步將此於1.2mol/l鹽酸,室溫下浸漬1分 鐘。再將此於含有25ml/l之D-POPACT (荏原Udilyt股 份公司製)、1.2mol/l鹽酸及1 .7mol/l氯化鈉之35°C活化 . 劑中浸漬4分鐘。接著,於含有l〇〇m〗/l之D-POPMEA ( 荏原 Udilyt股份公司製)及 l〇〇ml/l D-POPMEB (荏原 Udilyt股份公司製)之45°C之金屬化中浸漬3分鐘。最後 ,於含有硫酸銅〇.9mol/l、0.55mol/l之硫酸及〇.〇17mol/l 鹽酸之25 °C EP-3 0 (硫酸銅鍍敷液:荏原Udilyt股份公司 製)中浸漬1〇分鐘,使通電初期爲soft start (最初30秒 -14- 200811311 以0.5V ’接下來的30秒以1.0V進行,最後爲1.5V), 於AB S樹脂上進行直接電鍍。 於AB S樹脂上進行直接電鎞之結果,於通電5分鐘後 ,機架被覆未出現鍍敷析出,試料可鍍敷於整體。又,與 試驗例1同法所測定之鍍敷被膜密合強度爲〇.8kgf/cm。 〔實施例3〕 (對於各種樹脂上之無電解鍍敷被膜之製作): 除使用做爲試料之各種樹脂(ABS、PC/ABS (含65% 之 PC ) 、ASA、SAS、PC ( UMGABS 股份公司製)、 noril ( General Electric 製)、聚丙烯(日本 p〇lyChem 股 份公司製))之外,與實施例1同法,於各樹脂上進行無 電解鍍鎳。 〔比較例4〕 (對於各種樹脂上之無電解鍍敷被膜之製作): 使用做爲試料之各種樹脂(八88、?(:/八88(含65%之 PC) 、ASA、SAS、PC( UMGABS 股份公司製)、η o r i 1 ( General Electric製)、聚丙烯(日本Polychem股份公司 製),將此於含有3.5mol/l之鉻酸酐及3.6mol/l硫酸之 65 °C蝕刻溶液中浸漬 1 〇分鐘。接著,將此於含有 0 · 5 mο 1 /1 鹽酸及 1 0m 1 /1 之 enil eX RD (甚原 Udi 1 y t 股份公 司製)之25 °C還原液中浸漬2分鐘。進一步將此與實施例 1之1.2m〇l/l之鹽酸浸漬(噴鍍)以後同法處理之。 -15- 200811311 〔試驗例2〕 以目測評定上述實施例3及比較例4所得無電解鍍敷 被膜之各種樹脂中之析出性、對於機架被覆之析出。又, 與試驗例1同法測定各種樹脂上取得無電解鍍敷被膜之密 合強度。此等結果示於表2。The 50% 1 00 x 3 mm ABS resin (manufactured by UMGABS Co., Ltd.) was used as a sample, and this was immersed in a 35 ° C uranium engraving treatment solution containing 0.5 mol of potassium permanganate and 7.5 mol/l of phosphoric acid. Minutes. Then, the pH of PAA-〇3 (poly-propylamine: manufactured by Nitto Spinning Co., Ltd.) adjusted to 200 mg/l with sodium hydroxide was changed to 10%. (: immersion in the catalyst-enhancing liquid for 2 minutes. Further immersing in 1.2 mol/l hydrochloric acid at room temperature for 1 minute, and then in CT-580 containing l〇ml/l (Sudi Udilyt Co., Ltd.) And 3·5πιο1/1 hydrochloric acid 35. After immersing for 4 minutes in the sputum/钖 mixed colloidal catalyst solution, the catalyst was added to the ABS resin, and this was made up of 1.2 mol/l hydrochloric acid. After immersing in the activation treatment liquid for 4 minutes, the catalyst was activated, and then immersed in an electroless nickel plating solution ENILEX Nb 5 (manufactured by Udilyt Co., Ltd.) at pH 8.8 and 35 ° C for 10 minutes. An electroless nickel plating having a film thickness of 0.5 μm was carried out on the ABS resin, and then immersed in an acid activation solution containing 150 g/l of ν-345 (manufactured by Udilyt Co., Ltd.) for 1 minute at room temperature. This was immersed in a 45 ° C Watt bath containing 0.75 m·l/l of nickel sulfate, 0.4 mol/l of nickel chloride and 0.55 mol/l of boric acid for 2 minutes at 2 V/dm 2 . Mol/l PDC (manufactured by Ubilyt Co., Ltd.) and a room temperature copper substitution solution of 0.5 mol/1 sulfuric acid for 1 minute to carry out copper substitution. This is further included in 3A/dm2. After immersing in a 25 ° C sulfuric acid copper plating solution EP-30 (manufactured by Udilyt Co., Ltd.) of 0.9 mol/l of copper sulfate, 0.55 mol/l and 0.0017 mol/l of chlorine for 40 minutes, the film thickness on the ABS resin was Electroplating copper of 20 μm. After that, the steel was dehydrated at 70 ° C for 1 hour. [Comparative Example 1] (Production of electroless plating film (1)): In the step of Example 1, Electroless nickel plating was performed on the ABS resin in the same manner as in the catalyst-enhancing liquid for 2 minutes. [Comparative Example 2] (Preparation of electroless plating film (2)): Use as a sample 50xlO〇x3mm of ABS resin (manufactured by UMGABS Co., Ltd.), immersed in a 35t etching treatment solution containing 0.5 mol/l of potassium permanganate and 7.5 mol/i of phosphoric acid for 10 minutes.浸渍. After immersing in a catalyst solution of 50 mol/l of palladium chloride at 50 ° C for 4 minutes, a catalyst was added to the ABS resin, and then PC-66H (manufactured by Udilyt Co., Ltd.) was contained at 10 ml/l. The catalyst was immersed in the activation treatment liquid at 35 ° C for 4 minutes to activate the catalyst. Subsequently, it was treated in the same manner as the electroless nickel plating of Example 1. [Comparative Example 3] (Preparation of electroless plating film (3)): In the step of Comparative Example 2, it was carried out by containing 19 mol/l of 2-aminopyridine and 0.00094 mol/l of palladium sulfate. The electroless nickel plating was carried out on the ABS resin in the same manner as the 50 ° C catalyst solution was immersed in a 50 ° C catalyst solution containing palladium chloride of 〇·〇〇 24 〇η〇 1/1 for 4 minutes. -12-200811311 [Testing Example 1] The precipitation property in the ABS resin of the electroless nickel-plated film obtained in Example 1 and Comparative Examples 1 to 3 and the precipitation on the frame were evaluated by visual observation. Further, the amount of palladium adsorbed on the ABS resin and the adhesion strength were measured as follows. These results are shown in Table 1. <Measurement method> (Adsorption amount of palladium catalyst) After the palladium ion adsorbed on the surface of the AB S resin was subjected to reduction treatment, the palladium was dissolved in aqua regia, and the high-frequency plasma luminescence analyzer ICPS-7510 (manufactured by Shimadzu Corporation) was used. After measuring the absorbance of the solution, the amount of adsorption of palladium was measured. (Measurement of adhesion strength): According to JIS H8630 Attachment 6, an electroplated copper film of about 20 μm was formed on the surface of the ABS resin, and then annealed at 70 ° C for 1 hour, after which the tensile strength tester AGS-H50 0N (Joint Company) The contact strength was measured by Shimadzu Corporation. [Table 1] Adsorption amount of electroless plating film deposition property on the palladium catalyst deposited on the frame (mg/dm2) Adhesion strength (kgf/cm) Example 1 Good y y\\\ 0.108 1.4 Comparative Example 1 There is unprecipitated portion Μ j\\\ 0.025 - Comparative Example 2 Good 0.063 1.4 Comparative Example 3 Good 0.082 1.4 -: Unmeasured -13 - 200811311 The adsorption amount of the palladium catalyst in Example 1 is increased, and the electroless plating film is formed. The precipitation and adhesion strength are good. Moreover, no plating deposition occurred in the rack coating in this step. On the other hand, in Comparative Example 1, although no plating was deposited on the frame, the amount of palladium adsorbed on the ABS resin was decreased, and the unexposed portion of the plating occurred. Further, in Comparative Example 2 and Comparative Example 3, the amount of adsorption of palladium was sufficiently obtained for the ABS resin, but plating was deposited on the frame. 10 [Example 2] (For direct plating on ABS resin) A 50% 00 x 3 mm ABS resin (manufactured by UMGABS Co., Ltd.) was used as a sample, and this was contained in potassium permanganate containing 0.001 mol/l and 7.5 mol/ l Immersion in the 35 ° C uranium engraving treatment solution for 1 minute. Then, the PAA-03 (polyamylamine: manufactured by Nitto Spinning Co., Ltd.) adjusted to 200 mg/l of sodium hydroxide was added to the catalyst-enhanced liquid for 30 minutes at pH °C for 2 minutes, and then further 1.2 mol/l hydrochloric acid, immersed for 1 minute at room temperature. Further, this was immersed in a solution containing 25 ml/l of D-POPACT (manufactured by Udilyt Co., Ltd.), 1.2 mol/l hydrochloric acid, and 1.7 mol/l of sodium chloride at 35 ° C for 4 minutes. Then, it was immersed for 3 minutes in a metallization of 45 ° C of D-POPMEA (manufactured by Ebara Udilyt Co., Ltd.) and l〇〇ml/l D-POPMEB (manufactured by Ebara Udilyt Co., Ltd.). . Finally, it was immersed in 25 °C EP-3 0 (copper sulfate plating solution: manufactured by Ubilyt Co., Ltd.) containing copper sulfate 〇.9 mol/l, 0.55 mol/l sulfuric acid and 〇.〇17 mol/l hydrochloric acid. In the first minute, the initial stage of energization was soft start (first 30 seconds -14 - 200811311 at 0.5V 'the next 30 seconds at 1.0V, and finally 1.5V), and direct plating was performed on the AB S resin. As a result of direct electroporation on the AB S resin, after 5 minutes of energization, the rack coating did not appear to be plated, and the sample was plated on the whole. Further, the plating film adhesion strength measured by the same method as in Test Example 1 was 〇8 kgf/cm. [Example 3] (Production of electroless plating film on various resins): Except for various resins (ABS, PC/ABS (including 65% PC), ASA, SAS, PC (UMGABS shares) used as samples Electroless nickel plating was performed on each of the resins in the same manner as in Example 1 except that the company (manufactured by Nippon Co., Ltd.) and polypropylene (manufactured by Nippon Chemical Co., Ltd.). [Comparative Example 4] (Production of electroless plating film on various resins): Various resins were used as samples (eight 88, ? (: / eight 88 (including 65% PC), ASA, SAS, PC) (manufactured by UMGABS Co., Ltd.), η ori 1 (manufactured by General Electric Co., Ltd.), and polypropylene (manufactured by Polychem Co., Ltd., Japan), in an etching solution containing 65 mol/l of chromic anhydride and 3.6 mol/l of sulfuric acid at 65 °C After immersing for 1 minute, the mixture was immersed in a 25 ° C reducing solution containing 0. 5 mο 1 /1 hydrochloric acid and 10 m 1 /1 of enil eX RD (manufactured by Udi 1 yt Co., Ltd.) for 2 minutes. Further, this was treated in the same manner as the 1.2 m〇l/l hydrochloric acid of Example 1 after the immersion (spray plating). -15-200811311 [Test Example 2] The electrolessness obtained in the above Example 3 and Comparative Example 4 was visually evaluated. The precipitation property in the various resins of the plating film and the precipitation on the frame were measured. The adhesion strength of the electroless plating film was measured in the same manner as in Test Example 1. The results are shown in Table 2.
〔表2〕〔Table 2〕
無電解鍍敷被膜 析出性 對於機架被覆之 析出 密合強度 (kgf/cm) 實施例3 ABS 良好 Ant ΠΤΓ j\\\ 1.4 PC/ABS 良好 4rrr πιι: /\\\ 0.8 ASA 良好 I111I J\\\ 0.8 SAS 良好 4nr mr y\\\ 1.1 noril 良好 4fTT Μι II: J v w 1.0 聚丙烯 良好 inL· jim y\\\ 1.2 PC 良好 ^frrr nn: /\ \\ 0.1 比較例4 ABS 良好 4nr itTr j\\\ 1.2 PC/ABS 良好 >frrf: ΊΠΓ /\\\ 0.8 ASA 良好 4rvf 111ΙΓ J\\\ 0.7 SAS 良好 y v w 0.9 noril 有未析出部份 AnL· Till j\\\ 丨 聚丙烯 有未析出部份 M j\ \\ PC 未析出 4nr liir - 不可測定 實施例3取得之無電解鍍敷被膜完全賦予於任意之樹 脂上,可取得比較例4(鉻酸蝕刻過程)同等以上之密合 強度。又,實施例3於任意樹脂中進行無電解鍍敷時,對 -16 - 200811311 於機架被覆仍無鍍敷析出。另外,比較例4(鉻酸蝕刻過 程)於nor il、聚丙烯樹脂中出現未析出部份,於PC樹脂 則完全無鍍敷析出。 〔實施例4〕 (賦予觸媒增強液之效果): 實施例1之步驟中,將賦予觸媒增強液之有效成份變 更爲由PAA-03 (聚烯丙基胺:日東紡紗股份公司製)以 下之表 4 所載者或 Adecahorp、Adecatol、Adecablulonic (均爲旭電化工業股份公司製)、enadicol ( Lion股份公 司製)之外,同法於AB S樹脂上進行無電解鍍鎳。於取 得無電解鍍敷被膜之AB S樹脂中與試驗例1同法評定其 析出性、對於機架被覆之析出。又,與試驗例1同法測定 A B S樹脂上的鈀吸附量。此等結果示於表3 °Electroless plating film deposition property Precipitation adhesion strength (kgf/cm) for rack coating Example 3 ABS Good Ant ΠΤΓ j\\\ 1.4 PC/ABS Good 4rrr πιι: /\\\ 0.8 ASA Good I111I J\ \\ 0.8 SAS Good 4nr mr y\\\ 1.1 noril Good 4fTT Μι II: J vw 1.0 Polypropylene good inL· jim y\\\ 1.2 PC good ^frrr nn: /\ \\ 0.1 Comparative example 4 ABS Good 4nr itTr j\\\ 1.2 PC/ABS Good>frrf: ΊΠΓ /\\\ 0.8 ASA Good 4rvf 111ΙΓ J\\\ 0.7 SAS Good yvw 0.9 noril There are unprecipitated parts AnL· Till j\\\ 丨Polypropylene has not Precipitated portion M j \ \\ PC is not precipitated 4 nr liir - Unmeasured The electroless plating film obtained in Example 3 is completely applied to any resin, and Comparative Example 4 (chromic acid etching process) can be obtained in an equivalent or more. strength. Further, in Example 3, when electroless plating was carried out in any of the resins, the coating of -16 - 200811311 on the frame was not plated. Further, in Comparative Example 4 (chromic acid etching process), unprecipitated portions appeared in nor il and polypropylene resin, and no plating was deposited on PC resin. [Example 4] (Effect of imparting a catalyst reinforcing liquid): In the step of Example 1, the active ingredient to the catalyst-enhancing liquid was changed to PAA-03 (polyallylamine: manufactured by Nitto Spinning Co., Ltd.) In addition to those contained in Table 4 below, or Adecahorp, Adecatol, Adecablulonic (all manufactured by Asahi Denki Kogyo Co., Ltd.) and enadicol (manufactured by Lion Co., Ltd.), electroless nickel plating is performed on the AB S resin. In the AB S resin obtained by obtaining an electroless plating film, the precipitation property was evaluated in the same manner as in Test Example 1, and precipitation on the frame was evaluated. Further, the amount of palladium adsorbed on the A B S resin was measured in the same manner as in Test Example 1. These results are shown in Table 3 °
-17- 200811311 〔表 3-1 〕-17- 200811311 [Table 3-1]
賦予觸媒增強液之有效成分 分子量 氮原子數 構造式 單乙醇胺1] 61.08 1 ΗΟ〜叫 乙烯二胺υ 60.11 2 η2ν^/ΝΗ2 乙烯二胺系化合物 (二乙烯三胺)1) 103.17 3 Η 乙烯二胺系化合物 (三乙烯四胺)1〉 146.3 4 1 Η 乙烯二胺系化合物 (五乙烯六胺)υ 232.44 6 乙烯亞胺系高分子化合物 (SP-003)2) 300 >5 乙烯亞胺系高分子化合物 (SP0-012)2) 1,200 >10 乙烯亞胺系高分子化合物 (SP200)2) 20,000 >10 烯丙基胺系高分子化合物 (ΡΑΑ-03)3) 3,000 >10 H —c-c—— H2 lH 〒h2 nh2 n 烯丙基胺系高分子化合物 (PAA-D41-HCL)3) 20,000 >10 - Π補 n 二烯丙基胺系高分子化合物 (PAS-92)3) 5,000 >10 if—η λ h2c ch2 八C「 H H n -18- 200811311 〔表 3-2〕The active ingredient of the catalyst-enhancing liquid, the molecular weight, the number of nitrogen atoms, the structural monoethanolamine 1] 61.08 1 ΗΟ~called ethylene diamine υ 60.11 2 η2ν^/ΝΗ2 ethylene diamine compound (diethylenetriamine) 1) 103.17 3 Η ethylene Diamine compound (triethylenetetramine) 1> 146.3 4 1 乙烯 Ethylene diamine compound (pentaethylene hexamine) 232 232.44 6 Ethylene imine polymer compound (SP-003) 2) 300 > 5 Ethylene Amine-based polymer compound (SP0-012) 2) 1,200 > 10 ethyleneimine-based polymer compound (SP200) 2) 20,000 > 10 allylamine-based polymer compound (ΡΑΑ-03) 3) 3,000 > 10 H —cc — H2 lH 〒h2 nh2 n Allylamine-based polymer compound (PAA-D41-HCL) 3) 20,000 > 10 - Π n n-diallyl-based polymer compound (PAS-92 3) 5,000 >10 if-η λ h2c ch2 八C" HH n -18- 200811311 [Table 3-2]
二烯丙基胺系高分子化合物 (PAS-M-1)3) 20,000 >10 Η H _ _c 一 c--c—c— H2 丫 | h2 h2C\,h2 八cr h3c h n 二烯丙基胺系高分子化合物 (PAS-880)3) 40,000 >10 Ilc Η H c\. Ic p __\ 1 M f 1 ^ \ \ ch> / h n 乙烯胺系高分子化合物 (PVAM-0570-B)4) 400,000 >10 h42 — —π 甘氨酸” 75.7 1 HjN^^COOH 牛磺酸” 125.15 1 〇V0 h2n^^ soh 胺乙硫醇υ 157.2 1 h2h〜sh 1 ) :和光純藥工股份公司 2) :曰本觸媒股份公司 3 ) :曰東紡紗股份公司 4) :三菱化學股份公司 -19- 200811311Diallylamine-based polymer compound (PAS-M-1)3) 20,000 >10 Η H _ _c a c--c-c- H2 丫| h2 h2C\,h2 八cr h3c hn diallyl Amine-based polymer compound (PAS-880) 3) 40,000 > 10 Ilc Η H c\. Ic p __\ 1 M f 1 ^ \ \ ch> / hn Vinylamine-based polymer compound (PVAM-0570-B) 4) 400,000 >10 h42 — —π-glycine” 75.7 1 HjN^^COOH Taurine” 125.15 1 〇V0 h2n^^ soh Amine ethanethiol hydrazine 157.2 1 h2h~sh 1 ) : Heguang Pure Pharmaceutical Co., Ltd. 2 ) : Sakamoto Catalyst Co., Ltd. 3) : Mindong Spinning Co., Ltd. 4): Mitsubishi Chemical Corporation -19- 200811311
〔表4〕 賦予觸媒增強液之有效成分 無電解鍍敷被膜之析出 性 對於機架被覆之 析出 鈀觸媒之吸附量 (mg/dm2) 單乙醇胺 有未析出部份 Ant τΤΓΓ j\\\ 0.026 乙烯二胺 有未析出部份 4τττ. ΊΠ1 /ν\\ 0.022 乙烯二胺系化合物 (二乙烯三胺) 良好 4ητ ίΠΓ J 1 \\ 0.045 乙烯二胺系化合物 (三乙烯四胺) 良好 4nr ΤίΤΠ /\\\ 0.050 乙烯二胺系化合物 (五乙烯六胺) 良好 >frrr ΝΙΓ j\\\ 0.061 乙烯亞胺系高分子化合物 (SP-003) 良好 ΙΠΓ J\\\ 0.074 乙烯亞胺系高分子化合物 (SP0-012) 良好 4πΐ ΊΠΓ j\\\ 0.122 乙烯亞胺系高分子化合物 (SP200) 良好 ιΓΤΤ: j\\\ 0.107 烯丙基胺系高分子化合物 (PAA-03) 良好 >fr|T 111 ι: 0.108 烯丙基胺系高分子化合物 (PAA-D41-HCL) 餅 ^fnrr ill Γ J\\\ 0.079 二烯丙基胺系高分子化合物 (PAS-92) 良好 >frrT llil J\\\ 0.049 二烯丙基胺系高分子化合物 (PAS-M-1) 良好 4mi Τ1Π: j \ w 0.068 二烯丙基胺系高分子化合物 (PAS-880) 良好 ^111 J\ \\ 0.048 乙烯胺系高分子化合物 (PVAM-0570-B) 良好 M y\\\ 0.082 甘氨酸 有未析出部份 >fnr IMr /\\\ 0.029 牛磺酸 有未析出部份 Arvt. illl 0.023 胺乙硫醇 有未析出部份 >frrr ΊΙΙΙ: J\\\ 0.033 Adecahorp 有未析出部份 4rrC JOlt \ 0.024 Adecatol 有未析出部份 有 0.031 Adecablulonic 有未析出部份 有 0.029 enadicol 有未析出部份 4ττΐ zleC jw\ 0.029 無賦予觸媒增強液之處理 有未析出部份 ^frrr. ΠΙΙΓ 0.025 -20 - 200811311 做爲賦予觸媒增強液之有效成份者使用 合物、乙烯亞胺系高分子化合物、烯丙基胺 物、二烯丙基胺系高分子化合物、乙烯胺系 後,均使鈀吸附量增加,機架不會析出可取 析出性。對於此,1分子內具2個以下氮原 單乙醇胺、乙烯二胺、甘氨酸、牛磺酸、胺 化合物未出現鈀吸附量的增加。另外,陰離 劑之 Adecahorp、enadicol亦未特別出現· 效果。又,非離子系界面活性劑之 Adecablulonic中未出現鈀吸附量的增加, 架被覆之析出。 〔實施例5〕 (蝕刻處理液中之無機酸效果): 實施例1中,除使鈾刻處理液之組成變 所示之外,同法於AB S樹脂上進行無電解 例1同法評定所得無電解鎳被膜ABS樹脂 等結果示於表5。又,依以下膠帶剝離試驗 解鍍鎳被膜之密合強度。 〈測定方法〉 於無電解鍍鎳之試料表面上以指腹將透 :nichivan股份公司製)密合後,於90°上 。剝離透明膠帶-後,經由目測確定鍍敷被膜 乙烯二胺系化 系高分子化合 高分子化合物 得良好的鍍敷 子之化合物的 基乙硫醇等之 子系界面活性 吸附量增加之 A d e c a t ο 1 、 更出現對於機 換爲以下表5 鍍鎳。與試驗 之析出性。此 評定所得無電 明膠帶(CT24 方將膠帶剝離 是否與膠帶一 -21 - 200811311 起剝離。 〔表5〕 蝕刻處理液之組成 無電解鍍敷被膜之析出性 膠帶剝離試驗 過鍤酸鉀 有未析出部份 出現剝離 磷酸 有未析出部份 出現剝離 過錳酸鉀+磷酸 >frrf YlUZ /\\\ 未出現剝離 過錳酸鉀十硫酸 Μ y\\\ 未出現剝離 過錳酸鉀+硝酸 ^frrr. 1 III, y v\n 未出現剝離 過錳酸鉀與無機酸之混合溶液均出現良好的鍍敷析出 性、治合強度亦咼之膠帶剝離試驗。另外,過猛酸鉀、磷 酸分別單一組成之液中其塑膠表面幾乎未改質,因此,於 之後的無電解鍍鎳中出現未析出部份。又,鍍敷部份之密 合強度亦低、於膠帶輕易被剝離之。 . 〔實施例6〕 (含有賦予觸媒增強液之水溶液的pH效果) 實施例1之步驟中,使用氫氧化鈉與硫酸調整賦予觸 媒增強液pH爲下表6所記載之値除外,同法於ABS樹脂 上進行無電解鍍鎳。與試驗例1同法評定所得無電解鎳被 膜之AB S樹脂中之析出性及對於機架被覆之析出。又, 與試驗例1同法測定ABS樹脂上之鈀吸附量。此等結果 合倂示於表6。 -22- 200811311 〔表6〕 賦予觸媒增強液之PH 無電解鍍敷被膜析 出性 對於機架被覆析出 鈀觸媒之吸附量 (mg/dm2) 5.0 良好 yfrrC Μ 0.045 6.0 良好 Μ 0.061 7.0 良好 Μ 0.063 8.0 良好 難 0.073 9.0 良好 yfTTt Μ 0.094 100 良好 >frrp Μ 0.108 11.0 良好 AvaL Μ 0.116 12.0 良好 4rcL 無 0.102 無賦予觸媒增強液之處理— 有未析出部份 Μ 0.025 於賦予觸媒增強液PH爲5 · 0〜1 2 · 0 °中對於機架未出 現鍍敷析出,出現絕吸附量增加之效果。 〔實施例7〕 (賦予觸媒增強液濃度之效果) 實施例1之步驟中,使賦予觸媒增強液中有效成份之 聚烯丙基胺(PAA-03 :日東紡紗股份公司製)之濃度調整 爲表7所載之値除外,同法於AB S樹脂上進行無電解鍍 鎳。與試驗例1同法評定所得無電解鎳被膜之ABS樹脂 中對於機架被覆之析出。又,與試驗例1同法測定ABS 樹脂上鈀之吸附量。此等結果合倂示於表7。 -23- 200811311 〔表η 賦予觸媒增強液中聚烯丙胺 濃度 對於機架被覆之析出 銷觸媒之吸附量(mg/dm2) 10mg/l 4nL· Ι1ΤΓ j\ w 0.066 lOOmg/1 4ττΤ ι ΙΤΓ J\\\ 0.098 lg/1 無 0.119 10g/l 4rrr nil y\\\ 0.098 無賦予觸媒增強液之處理 M y\\\ 0.025 φ 無關聚烯丙基胺之濃度’抑制對於機架被覆之析出’ 出現鈀吸附量之增加效果。 〔產業上可利用性〕 本發明塑膠表面之金屬化方法係可做成充份密合鍍敷 於塑膠表面,且於機架不會鍍敷析出之實用性高的方法。 又,本發明方法可增加對於塑膠表面之觸媒金屬的吸附量 ,因此,於先行技術之方法中不易吸附觸媒金屬之塑膠亦 _ 可鍍敷。 因此,本發明係適用於無鉻之塑膠表面之金屬化過程 【圖式簡單說明】 〔圖1〕 圖1係使ABS樹脂表面之表面以傅里葉變換紅外線分 光光度計所測定之結果(1 :無蝕刻處理之ABS樹脂表面 、2 :以含有鉻酸之蝕刻處理液處理後之AB S樹脂表面、 -24- 200811311 ABS樹脂表面) 3 :以含有過錳酸之触刻處理液處理後之[Table 4] The precipitation of the electroless plating film which is an effective component of the catalyst-enhancing liquid, and the adsorption amount of the palladium catalyst deposited on the rack coating (mg/dm2), the unprecipitated portion of the monoethanolamine, Ant τΤΓΓ j\\\ 0.026 ethylene diamine has unprecipitated portion 4τττ. ΊΠ1 /ν\\ 0.022 ethylene diamine compound (diethylenetriamine) good 4ητ ίΠΓ J 1 \\ 0.045 ethylene diamine compound (triethylenetetramine) good 4nr ΤίΤΠ /\\\ 0.050 Ethylene diamine compound (pentaethylene hexamine) Good >frrr ΝΙΓ j\\\ 0.061 Ethylene imine polymer compound (SP-003) Good ΙΠΓ J\\\ 0.074 Ethylene imide high Molecular compound (SP0-012) Good 4πΐ ΊΠΓ j\\\ 0.122 Ethyleneimine polymer compound (SP200) Good ιΓΤΤ: j\\\ 0.107 Allylamine polymer compound (PAA-03) Good >fr |T 111 ι: 0.108 Allylamine-based polymer compound (PAA-D41-HCL) cake ^fnrr ill Γ J\\\ 0.079 Diallylamine-based polymer compound (PAS-92) Good > frrT llil J\\\ 0.049 Diallylamine-based polymer compound (PAS-M-1) Good 4mi Τ1Π: j \ w 0.068 Diallylamine-based polymer compound (PAS-880) Good ^111 J\ \\ 0.048 Vinylamine-based polymer compound (PVAM-0570-B) Good M y\\\ 0.082 Glycine Unprecipitated part >fnr IMr /\\\ 0.029 Taurine has unprecipitated part Arvt. illl 0.023 Amine ethanethiol has unprecipitated part >frrr ΊΙΙΙ: J\\\ 0.033 Adecahorp has unprecipitated part 4rrC JOlt \ 0.024 Adecatol has unprecipitated portion 0.031 Adecablulonic with unprecipitated portion 0.029 enadicol with unprecipitated portion 4ττΐ zleC jw\ 0.029 No catalyst-enhancing liquid treatment with unprecipitated portion ^frrr. ΠΙΙΓ 0.025 - 20 - 200811311 As a compound for imparting an effective component of a catalyst-enhancing liquid, a palladium is used as a compound, an ethyleneimine-based polymer compound, an allylamine compound, a diallylamine-based polymer compound, or a vinylamine system. As the amount of adsorption increases, the rack does not precipitate for decomposability. In this case, there is no increase in the amount of palladium adsorption in the presence of two or less nitrogen original monoethanolamine, ethylene diamine, glycine, taurine or amine compound in one molecule. In addition, the Adecahorp and enadicol of the anion agent did not particularly appear. Further, in the Adecablulonic of the nonionic surfactant, no increase in the amount of palladium adsorption occurred, and the precipitate was precipitated. [Example 5] (Inorganic acid effect in etching treatment liquid): In Example 1, except that the composition of the uranium engraving treatment liquid was changed, the same method as in the electroless example 1 was performed on the AB S resin. The results of the obtained electroless nickel film ABS resin and the like are shown in Table 5. Further, the adhesion strength of the nickel plating film was solved by the following tape peeling test. <Measurement Method> On the surface of the sample for electroless nickel plating, it was passed through a fingertip: Nichivan Co., Ltd.), and it was placed at 90°. After the scotch tape was peeled off, it was confirmed by visual observation that the amount of interfacial activity adsorption amount of the sub-ethyl thiol or the like of the compound having a plated ethylene diamine-based polymer compound compound having a good plating property was increased. A decat ο 1 More appears for the machine to be replaced by the following table 5 nickel plating. And the precipitation of the test. The electroless gelatin tape obtained by this evaluation ( whether the tape peeled off by the CT24 side is peeled off from the tape - 21 - 200811311. [Table 5] The composition of the etching treatment liquid The precipitation of the electroless plating film The tape peeling test has not precipitated potassium citrate Partially peeled off phosphoric acid has not precipitated part, peeled potassium permanganate + phosphoric acid > frrf YlUZ /\\\ No peeling of potassium permanganate decahydrate y\\\ No peeling of potassium permanganate + nitric acid Frrr. 1 III, yv\n No peeling test was carried out in which the mixed solution of potassium permanganate and inorganic acid showed good plating precipitation and the strength of the combination was also good. In addition, potassium permanate and phosphoric acid were single. In the liquid of the composition, the surface of the plastic is hardly modified, so that undecomposed portions appear in the subsequent electroless nickel plating. Moreover, the adhesion strength of the plated portion is also low, and the tape is easily peeled off. Example 6] (pH effect containing an aqueous solution to which a catalyst-enhancing liquid is added) In the step of Example 1, except that the pH of the catalyst-enhancing liquid is adjusted using sodium hydroxide and sulfuric acid as described in the following Table 6, the same method is used. ABS resin Electroless nickel plating was carried out, and the precipitation property in the AB S resin of the obtained electroless nickel film and the precipitation on the frame coating were evaluated in the same manner as in Test Example 1. Further, the palladium adsorption amount on the ABS resin was measured in the same manner as in Test Example 1. The results are shown in Table 6. -22- 200811311 [Table 6] PH to the catalyst-enhanced liquid Electroless plating film deposition property The adsorption amount of the palladium catalyst precipitated on the rack (mg/dm2) 5.0 Good yfrrC Μ 0.045 6.0 Good Μ 0.061 7.0 Good Μ 0.063 8.0 Good Difficulty 0.073 9.0 Good yfTTt Μ 0.094 100 Good >frrp Μ 0.108 11.0 Good AvaL Μ 0.116 12.0 Good 4rcL No 0.102 No Catalyst Enhancer Treatment - No Precipitation Part of Μ 0.025 gives an effect of increasing the amount of adsorption of the catalyst in the case where the pH of the catalyst-enhancing liquid is 5 · 0 to 1 2 · 0 °, and no increase in the amount of adsorption occurs. [Example 7] (Protection of catalyst-enhancing liquid The effect of the concentration) In the step of the first embodiment, the concentration of the polyallylamine (PAA-03: manufactured by Nitto Spinning Co., Ltd.) which is an active ingredient in the catalyst-enhancing liquid is adjusted to be as shown in Table 7, Same law Electroless nickel plating was carried out on the AB S resin, and the precipitate of the ABS resin of the obtained electroless nickel film was evaluated in the same manner as in Test Example 1. Further, the adsorption amount of palladium on the ABS resin was measured in the same manner as in Test Example 1. The results are shown in Table 7. -23- 200811311 [Table η The concentration of polyallylamine in the catalyst-enhanced liquid is adsorbed to the catalyst of the rack-coated precipitation pin (mg/dm2) 10 mg/l 4nL· Ι1ΤΓ j\ w 0.066 lOOmg/1 4ττΤ ι ΙΤΓ J\\\ 0.098 lg/1 None 0.119 10g/l 4rrr nil y\\\ 0.098 No treatment with catalyst-enhanced liquid M y\\\ 0.025 φ Irrelevant polyallyl The concentration of the amine 'suppresses the precipitation of the rack coating' and the effect of increasing the amount of palladium adsorption occurs. [Industrial Applicability] The metallization method of the plastic surface of the present invention can be formed into a method of sufficiently adhering and plating on a plastic surface, and which is not practically plated and deposited in a frame. Further, the method of the present invention can increase the amount of adsorption of the catalytic metal to the surface of the plastic. Therefore, the plastic which is less likely to adsorb the catalytic metal in the prior art method can also be plated. Therefore, the present invention is applicable to the metallization process of a chrome-free plastic surface [Simplified description of the drawing] [Fig. 1] Fig. 1 shows the result of measuring the surface of the ABS resin surface by a Fourier transform infrared spectrophotometer (1) : surface of ABS resin without etching treatment, 2: surface of AB S resin treated with etching solution containing chromic acid, surface of -24-200811311 ABS resin) 3 : treated with a contact treatment liquid containing permanganic acid
-25--25-
Claims (1)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006204993A JP4275157B2 (en) | 2006-07-27 | 2006-07-27 | Metallization method for plastic surfaces |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200811311A true TW200811311A (en) | 2008-03-01 |
Family
ID=38981299
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW096126389A TW200811311A (en) | 2006-07-27 | 2007-07-19 | Method for metallizing plastic surface |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP4275157B2 (en) |
KR (1) | KR101365970B1 (en) |
CN (1) | CN101490310B (en) |
TW (1) | TW200811311A (en) |
WO (1) | WO2008012984A1 (en) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101555614B (en) * | 2008-04-11 | 2011-03-30 | 深圳富泰宏精密工业有限公司 | Plastic surface galvanizing method |
JP5371393B2 (en) | 2008-11-27 | 2013-12-18 | ユーエムジー・エービーエス株式会社 | Plating resin composition and resin plating product |
KR101284479B1 (en) * | 2011-06-30 | 2013-07-16 | 영남대학교 산학협력단 | Plating method of Acrylonitrile-Butadiene-Styrene copolymer using manganate salt as etchant |
DE102011111294B4 (en) * | 2011-08-26 | 2018-12-20 | Atotech Deutschland Gmbh | Process for the treatment of plastic substrates and apparatus for the regeneration of a treatment solution |
CN102409320B (en) * | 2011-11-29 | 2015-02-25 | 沈阳工业大学 | Electroplating pretreatment method for acrylonitrile butadiene styrene (ABS) plastic surface |
JP5742701B2 (en) * | 2011-12-14 | 2015-07-01 | トヨタ自動車株式会社 | Electroless plating method |
KR101410395B1 (en) * | 2013-01-17 | 2014-06-20 | 한진화학(주) | Method for plating an antenna according to double injection molding |
JP5875195B2 (en) * | 2013-08-22 | 2016-03-02 | 柿原工業株式会社 | Resin plating method using ozone water treatment |
KR20180077326A (en) | 2013-10-22 | 2018-07-06 | 오꾸노 케미칼 인더스트리즈 컴파니,리미티드 | Composition for etching treatment of resin material |
JP2015190056A (en) * | 2014-03-31 | 2015-11-02 | 株式会社サーテックカリヤ | Electroless-plating method, and electroless-plated article |
US11047052B2 (en) | 2014-07-10 | 2021-06-29 | Okuno Chemical Industries Co., Ltd. | Resin plating method |
JPWO2017056285A1 (en) * | 2015-10-01 | 2018-10-04 | 株式会社Jcu | Etching solution for resin molding and its use |
JP6750293B2 (en) * | 2016-04-28 | 2020-09-02 | 栗田工業株式会社 | How to treat plastic surface |
JP6288213B1 (en) | 2016-11-01 | 2018-03-07 | 栗田工業株式会社 | Plastic surface treatment method |
JP2019044229A (en) | 2017-09-01 | 2019-03-22 | 栗田工業株式会社 | Plating pretreatment method for abs resin surface, plating treatment method for abs resin surface, and abs resin-plated product |
JP6477831B1 (en) | 2017-10-31 | 2019-03-06 | 栗田工業株式会社 | Method for hydrophilizing polyphenylene sulfide resin |
KR20190102477A (en) | 2018-02-26 | 2019-09-04 | 주식회사 로빈첨단소재 | Polymer compound having metallic texture and manufacturing method therof |
KR102232079B1 (en) | 2019-06-19 | 2021-03-25 | 대영엔지니어링 주식회사 | Plating method for improving surface properties of nonconductive plastic |
KR102572523B1 (en) * | 2019-10-18 | 2023-08-30 | 주식회사 엘지화학 | Thermoplastic resin composition, method for producing the same, molding products comprising the composition, and method for producing the molding products |
KR20220085250A (en) | 2020-12-15 | 2022-06-22 | 대영엔지니어링 주식회사 | Plating method for improving surface properties of nonconductive plastic |
KR20240080215A (en) | 2022-11-28 | 2024-06-07 | 대영엔지니어링 주식회사 | Plating method for improving properties of painting subject |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4701351A (en) * | 1986-06-16 | 1987-10-20 | International Business Machines Corporation | Seeding process for electroless metal deposition |
JP3150590B2 (en) * | 1995-11-29 | 2001-03-26 | 株式会社日立製作所 | Base treatment method for electroless plating |
DE10138446A1 (en) * | 2001-08-04 | 2003-02-13 | Enthone Omi Deutschland Gmbh | Process for metallizing plastic surfaces |
US6645557B2 (en) | 2001-10-17 | 2003-11-11 | Atotech Deutschland Gmbh | Metallization of non-conductive surfaces with silver catalyst and electroless metal compositions |
DE10259187B4 (en) * | 2002-12-18 | 2008-06-19 | Enthone Inc., West Haven | Metallization of plastic substrates and solution for pickling and activation |
JP2005232501A (en) * | 2004-02-17 | 2005-09-02 | Univ Kanagawa | Thin film forming method and electronic device substrate using the same |
JP2005232338A (en) * | 2004-02-20 | 2005-09-02 | Daicel Polymer Ltd | Plated resin molding |
DE102004026489B3 (en) * | 2004-05-27 | 2005-09-29 | Enthone Inc., West Haven | Process for the metallization of plastic surfaces |
-
2006
- 2006-07-27 JP JP2006204993A patent/JP4275157B2/en active Active
-
2007
- 2007-05-21 CN CN2007800273670A patent/CN101490310B/en active Active
- 2007-05-21 KR KR1020097002064A patent/KR101365970B1/en active Active
- 2007-05-21 WO PCT/JP2007/060332 patent/WO2008012984A1/en active Application Filing
- 2007-07-19 TW TW096126389A patent/TW200811311A/en unknown
Also Published As
Publication number | Publication date |
---|---|
WO2008012984A1 (en) | 2008-01-31 |
JP4275157B2 (en) | 2009-06-10 |
KR101365970B1 (en) | 2014-02-21 |
KR20090036123A (en) | 2009-04-13 |
JP2008031513A (en) | 2008-02-14 |
CN101490310A (en) | 2009-07-22 |
CN101490310B (en) | 2011-05-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TW200811311A (en) | Method for metallizing plastic surface | |
JP4786708B2 (en) | Surface modification liquid for plastic and method for metallizing plastic surface using the same | |
TWI415680B (en) | Palladium complex and the use of the catalyst to impart treatment liquid | |
US7578947B2 (en) | Method for etching non-conductive substrate surfaces | |
US20090092757A1 (en) | Composition for etching treatment of resin molded article | |
CN103774122B (en) | A method for electroless metallization | |
KR102366687B1 (en) | Composition for pretreatment for electroless plating, pretreatment method for electroless plating, and electroless plating method | |
US9551073B2 (en) | Method for depositing a first metallic layer onto non-conductive polymers | |
WO2008068049A1 (en) | Pre-treatment solution and method of forming a layer of a coating metal on a plastics surface containing substrate | |
TW200907110A (en) | Etching solution and plastic surface metalizing method | |
Borris et al. | Improvement of the adhesion of a galvanic metallization of polymers by surface functionalization using dielectric barrier discharges at atmospheric pressure | |
EP3565915B1 (en) | Surface activated polymers | |
JP2019131839A (en) | Method of manufacturing plating film coated body, and pretreatment liquid | |
JPH0247547B2 (en) | ||
JP2023023770A (en) | Electroless plating method | |
JP2011213019A (en) | Plating receptive film and method for manufacturing metal film material using the same |