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TW200745187A - Protecting agent - Google Patents

Protecting agent

Info

Publication number
TW200745187A
TW200745187A TW096114900A TW96114900A TW200745187A TW 200745187 A TW200745187 A TW 200745187A TW 096114900 A TW096114900 A TW 096114900A TW 96114900 A TW96114900 A TW 96114900A TW 200745187 A TW200745187 A TW 200745187A
Authority
TW
Taiwan
Prior art keywords
atom
protecting agent
substituted
alkyl group
oxygen atom
Prior art date
Application number
TW096114900A
Other languages
Chinese (zh)
Inventor
Hiroshi Matsuoka
Ryo Numazaki
Iwao Hotta
Original Assignee
Kyowa Hakko Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyowa Hakko Chemical Co Ltd filed Critical Kyowa Hakko Chemical Co Ltd
Publication of TW200745187A publication Critical patent/TW200745187A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/04—Saturated compounds containing keto groups bound to acyclic carbon atoms
    • C07C49/175—Saturated compounds containing keto groups bound to acyclic carbon atoms containing ether groups, groups, groups, or groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
    • C07B51/00—Introduction of protecting groups or activating groups, not provided for in the preceding groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/10—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton
    • C07C323/11—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C323/12—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and saturated
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)

Abstract

The present invention provides a hydroxyl group or a carboxyl group protecting agent shown by formula (0). (in which, X1 represents a hydrogen atom, X2 represents a halogen atom, or X1 and X2 together forms a bond; R1 and R2 may be different or the same represent a substituted or unsubstituted alkyl group; A represents a oxygen atom or sulfur atom; R3 represents a alkyl group substituted by oxygen atom and/or sulfur atom.
TW096114900A 2006-04-27 2007-04-27 Protecting agent TW200745187A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006122820 2006-04-27

Publications (1)

Publication Number Publication Date
TW200745187A true TW200745187A (en) 2007-12-16

Family

ID=38655571

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096114900A TW200745187A (en) 2006-04-27 2007-04-27 Protecting agent

Country Status (3)

Country Link
JP (1) JPWO2007126050A1 (en)
TW (1) TW200745187A (en)
WO (1) WO2007126050A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI731037B (en) * 2016-03-31 2021-06-21 日商東京應化工業股份有限公司 Method for forming wiring or terminal on substrate

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009081852A1 (en) * 2007-12-20 2009-07-02 Kyowa Hakko Chemical Co., Ltd. Protective agent
WO2013141376A1 (en) * 2012-03-23 2013-09-26 富士フイルム株式会社 Protectant, method for producing compound protected by protectant, resin protected by protectant, photosensitive resin composition containing resin protected by protectant, pattern-forming material, photosensitive film, cured relief pattern, method for producing same, and semiconductor device

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000226340A (en) * 1999-02-04 2000-08-15 Mitsubishi Chemicals Corp Production of phenolic compound having blocked hydroxyl group and positive type radiation sensitive compound
JP4048171B2 (en) * 2001-07-13 2008-02-13 協和発酵ケミカル株式会社 Method for producing ether compounds
JPWO2005023880A1 (en) * 2003-09-03 2006-11-02 協和発酵ケミカル株式会社 Method for producing compound having acid labile group

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI731037B (en) * 2016-03-31 2021-06-21 日商東京應化工業股份有限公司 Method for forming wiring or terminal on substrate

Also Published As

Publication number Publication date
JPWO2007126050A1 (en) 2009-09-10
WO2007126050A1 (en) 2007-11-08

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