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TW200729292A - Apparatus for preserving and using at least one photolithograph projection photo mask and the method using the same in the exposure apparatus - Google Patents

Apparatus for preserving and using at least one photolithograph projection photo mask and the method using the same in the exposure apparatus

Info

Publication number
TW200729292A
TW200729292A TW095144055A TW95144055A TW200729292A TW 200729292 A TW200729292 A TW 200729292A TW 095144055 A TW095144055 A TW 095144055A TW 95144055 A TW95144055 A TW 95144055A TW 200729292 A TW200729292 A TW 200729292A
Authority
TW
Taiwan
Prior art keywords
photo mask
photolithograph
preserving
exposure apparatus
same
Prior art date
Application number
TW095144055A
Other languages
Chinese (zh)
Inventor
Anja Bonness
Marcel Choudhury
Karin Eggers
Andreas Frangen
Norbert Kallis
Keller Wolfgang
Hocke Christoph
Lering Michael
Roesner Michael
Noelscher Christoph
Original Assignee
Qimonda Ag
Qimonda Richmond Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Qimonda Ag, Qimonda Richmond Llc filed Critical Qimonda Ag
Publication of TW200729292A publication Critical patent/TW200729292A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Library & Information Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning In General (AREA)

Abstract

The invention provides an apparatus for preserving and using at least one photolithograph projection photo mask (5) and the method using the same in the exposure apparatus. It installs a blowing and washing mechanism (44), which passes through a valve (34) of the bottom board of a container and connects with a photo mask (5). It can prevent from forming crystal on the photo mask (5) by using blowing gas to remove the impurities within the scope of photo mask (5). It carries out excitation by using microwave source (80) or infrared ray source (90) to remove the already existing crystal efficiently. The invention also involves the method using the apparatus in the exposure apparatus.
TW095144055A 2005-12-22 2006-11-28 Apparatus for preserving and using at least one photolithograph projection photo mask and the method using the same in the exposure apparatus TW200729292A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102005061571 2005-12-22

Publications (1)

Publication Number Publication Date
TW200729292A true TW200729292A (en) 2007-08-01

Family

ID=38251270

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095144055A TW200729292A (en) 2005-12-22 2006-11-28 Apparatus for preserving and using at least one photolithograph projection photo mask and the method using the same in the exposure apparatus

Country Status (3)

Country Link
US (1) US20070187272A1 (en)
CN (1) CN1996142A (en)
TW (1) TW200729292A (en)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
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US20090053017A1 (en) * 2006-03-17 2009-02-26 Shlomo Shmuelov Storage and purge system for semiconductor wafers
EP2077467B9 (en) 2008-01-04 2014-09-03 Adixen Vacuum Products Method for manufacturing photo masks and device for implementing same
KR101253948B1 (en) * 2008-03-05 2013-04-16 알까뗄 루슨트 Method of fabricating photomasks and device for implementing it
US7962242B1 (en) * 2008-03-18 2011-06-14 N&K Technology Inc. Automated spatial flipping apparatus and system for photomasks and photomasks with pellicles
JP2011066259A (en) * 2009-09-18 2011-03-31 Toshiba Corp Mask cleaning method and mask cleaning apparatus
FR2962198B1 (en) * 2010-06-30 2014-04-11 Alcatel Lucent DEVICE FOR DRYING A PHOTOMASK
CN103246159B (en) * 2012-02-09 2015-04-29 中芯国际集成电路制造(上海)有限公司 Device for removing vaporific defects on mask and method thereof
US9256142B2 (en) * 2013-03-11 2016-02-09 Taiwan Semiconductor Manufacturing Company, Ltd. Pellicle mounting system and method
WO2015066484A1 (en) * 2013-10-31 2015-05-07 Entegris, Inc. A modular reticle pod system
CN103713468A (en) * 2013-12-24 2014-04-09 京东方科技集团股份有限公司 Mask case
CN105573051A (en) * 2016-03-22 2016-05-11 上海华力微电子有限公司 Storage method of mask plate
CN106842803A (en) * 2017-03-28 2017-06-13 广州视源电子科技股份有限公司 Film fixing device and medical diagnosis display equipment
CN109932866A (en) * 2017-12-15 2019-06-25 台湾积体电路制造股份有限公司 Photomask carrier box and method for carrying and cleaning photomask device
JP7386742B2 (en) * 2020-03-24 2023-11-27 株式会社Ｓｃｒｅｅｎホールディングス exposure equipment
US12085848B2 (en) * 2020-07-31 2024-09-10 Taiwan Semiconductor Manufacturing Company, Ltd. Photomask cleaning tool

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4511038A (en) * 1984-01-30 1985-04-16 Ekc Technology, Inc. Container for masks and pellicles
US5879458A (en) * 1996-09-13 1999-03-09 Semifab Incorporated Molecular contamination control system
US6216873B1 (en) * 1999-03-19 2001-04-17 Asyst Technologies, Inc. SMIF container including a reticle support structure
US6436586B1 (en) * 1999-04-21 2002-08-20 Shin-Etsu Chemical Co., Ltd. Pellicle with a filter and method for production thereof
US6924492B2 (en) * 2000-12-22 2005-08-02 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
JP2002372777A (en) * 2001-06-18 2002-12-26 Canon Inc Gas replacement method and exposure device
US6637998B2 (en) * 2001-10-01 2003-10-28 Air Products And Chemicals, Inc. Self evacuating micro environment system
US6731378B2 (en) * 2002-02-11 2004-05-04 International Business Machines Corporation Pellicle distortion reduction
US6688344B2 (en) * 2002-05-30 2004-02-10 Taiwan Semiconductor Manufacturing Co., Ltd Container flush and gas charge system and method
WO2004032208A1 (en) * 2002-10-01 2004-04-15 Microtome Precision, Inc. Reduction of electric-field-induced damage in field-sensitive articles
US7371992B2 (en) * 2003-03-07 2008-05-13 Rapt Industries, Inc. Method for non-contact cleaning of a surface
US20050042524A1 (en) * 2003-08-22 2005-02-24 Bellman Robert A. Process for making hard pellicles
US7619718B2 (en) * 2003-10-07 2009-11-17 Asml Holding N.V. Method and system for active purging of pellicle volumes
US7402362B2 (en) * 2004-02-26 2008-07-22 Taiwan Semiconductor Manufacturing Co., Inc. Method and system for reducing and monitoring precipitated defects on masking reticles

Also Published As

Publication number Publication date
CN1996142A (en) 2007-07-11
US20070187272A1 (en) 2007-08-16

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