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TW200725166A - Mask-cleaning apparatus and method of cleaning mask - Google Patents

Mask-cleaning apparatus and method of cleaning mask

Info

Publication number
TW200725166A
TW200725166A TW094145770A TW94145770A TW200725166A TW 200725166 A TW200725166 A TW 200725166A TW 094145770 A TW094145770 A TW 094145770A TW 94145770 A TW94145770 A TW 94145770A TW 200725166 A TW200725166 A TW 200725166A
Authority
TW
Taiwan
Prior art keywords
mask
cleaning
stage
cleaning apparatus
unit
Prior art date
Application number
TW094145770A
Other languages
Chinese (zh)
Inventor
Chi-Yu Wang
Shih-Kuang Chen
Chih-Hsing Chen
Original Assignee
Advanced Semiconductor Eng
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Semiconductor Eng filed Critical Advanced Semiconductor Eng
Priority to TW094145770A priority Critical patent/TW200725166A/en
Publication of TW200725166A publication Critical patent/TW200725166A/en

Links

Landscapes

  • Cleaning In General (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

A mask-cleaning apparatus suitable for cleaning a mask is provided. The mask-cleaning apparatus includes a stage, a vertical type mask-fixing unit, and a movable cleaning unit. The vertical type mask-fixing unit is disposed on the stage and suitable for fixing the mask such that the mask stands in a vertical way on the stage. The movable cleaning unit is disposed over the stage to be used for cleaning the mask such that particles and organic matter are difficult to adhere to surfaces of the mask.
TW094145770A 2005-12-22 2005-12-22 Mask-cleaning apparatus and method of cleaning mask TW200725166A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW094145770A TW200725166A (en) 2005-12-22 2005-12-22 Mask-cleaning apparatus and method of cleaning mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW094145770A TW200725166A (en) 2005-12-22 2005-12-22 Mask-cleaning apparatus and method of cleaning mask

Publications (1)

Publication Number Publication Date
TW200725166A true TW200725166A (en) 2007-07-01

Family

ID=57912457

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094145770A TW200725166A (en) 2005-12-22 2005-12-22 Mask-cleaning apparatus and method of cleaning mask

Country Status (1)

Country Link
TW (1) TW200725166A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104941972A (en) * 2015-07-22 2015-09-30 上海华力微电子有限公司 Mask plate surface micronic dust removal device and method
CN110026372A (en) * 2019-03-29 2019-07-19 云谷（固安）科技有限公司 A kind of mask cleaning device
CN113102363A (en) * 2021-05-06 2021-07-13 艾斯尔光电(南通)有限公司 High-efficiency cleaning process for photomask
CN115318727A (en) * 2022-09-14 2022-11-11 长鑫存储技术有限公司 Photomask cleaning device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104941972A (en) * 2015-07-22 2015-09-30 上海华力微电子有限公司 Mask plate surface micronic dust removal device and method
CN110026372A (en) * 2019-03-29 2019-07-19 云谷（固安）科技有限公司 A kind of mask cleaning device
CN113102363A (en) * 2021-05-06 2021-07-13 艾斯尔光电(南通)有限公司 High-efficiency cleaning process for photomask
CN115318727A (en) * 2022-09-14 2022-11-11 长鑫存储技术有限公司 Photomask cleaning device
CN115318727B (en) * 2022-09-14 2023-12-19 长鑫存储技术有限公司 Photomask cleaning device

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