TW200720842A - A squarilium compound and the short-wave length source photo polymerization composition using thereof - Google Patents
A squarilium compound and the short-wave length source photo polymerization composition using thereofInfo
- Publication number
- TW200720842A TW200720842A TW095138663A TW95138663A TW200720842A TW 200720842 A TW200720842 A TW 200720842A TW 095138663 A TW095138663 A TW 095138663A TW 95138663 A TW95138663 A TW 95138663A TW 200720842 A TW200720842 A TW 200720842A
- Authority
- TW
- Taiwan
- Prior art keywords
- short
- wave length
- polymerization composition
- photo polymerization
- length source
- Prior art date
Links
- 150000001875 compounds Chemical class 0.000 title abstract 3
- 238000006116 polymerization reaction Methods 0.000 title abstract 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 abstract 2
- 125000000547 substituted alkyl group Chemical group 0.000 abstract 2
- 206010034972 Photosensitivity reaction Diseases 0.000 abstract 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 abstract 1
- 239000003999 initiator Substances 0.000 abstract 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 abstract 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 1
- 230000036211 photosensitivity Effects 0.000 abstract 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C225/00—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones
- C07C225/20—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to carbon atoms of rings other than six-membered aromatic rings of the carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C225/00—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones
- C07C225/22—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D295/08—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly bound oxygen or sulfur atoms
- C07D295/096—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly bound oxygen or sulfur atoms with the ring nitrogen atoms and the oxygen or sulfur atoms separated by carbocyclic rings or by carbon chains interrupted by carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D295/12—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms
- C07D295/135—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms with the ring nitrogen atoms and the substituent nitrogen atoms separated by carbocyclic rings or by carbon chains interrupted by carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B57/00—Other synthetic dyes of known constitution
- C09B57/007—Squaraine dyes
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2601/00—Systems containing only non-condensed rings
- C07C2601/04—Systems containing only non-condensed rings with a four-membered ring
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polymerisation Methods In General (AREA)
- Materials For Photolithography (AREA)
Abstract
[subject] The present invention provides a short-wave length source light photo polymerization composition having an excellent photosensitivity to the short-wave length source light. [solution] A photo polymerization composition, which contains a squarilium compound of the following formula (I), [wherein, R1 and R2 may be the same or different, each represents a hydrogen atom or an optionally substituted alkyl group, etc., X represents a group of the formula (A): (wherein, R3 represents a phenyl group etc., R4 represents a methyl group or an ethyl group, R5, R6 , R7, and R8 may be the same or different, each represents a hydrogen atom or an optionally substituted alkyl group, etc.) etc.], and a radical initiator and a compound having an ethylenic unsaturated double bond.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005308892 | 2005-10-24 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200720842A true TW200720842A (en) | 2007-06-01 |
Family
ID=37967691
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095138663A TW200720842A (en) | 2005-10-24 | 2006-10-20 | A squarilium compound and the short-wave length source photo polymerization composition using thereof |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPWO2007049579A1 (en) |
TW (1) | TW200720842A (en) |
WO (1) | WO2007049579A1 (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20100065112A1 (en) | 2008-09-15 | 2010-03-18 | Thompson Mark E | Organic Photosensitive Devices Comprising a Squaraine Containing Organoheterojunction and Methods of Making Same |
JP5550136B2 (en) * | 2010-03-05 | 2014-07-16 | カーリットホールディングス株式会社 | Photosensitive composition for blue-violet semiconductor laser |
EP2673321A2 (en) * | 2011-02-09 | 2013-12-18 | Stephen R. Forrest | Organic photosensitive devices comprising aryl squaraines and methods of making the same |
JP5646426B2 (en) * | 2011-09-30 | 2014-12-24 | 富士フイルム株式会社 | Colored photosensitive composition, color filter, method for producing the same, and liquid crystal display device |
JP6151033B2 (en) * | 2013-01-28 | 2017-06-21 | カーリットホールディングス株式会社 | UV curable resin composition |
JP6126851B2 (en) * | 2013-01-28 | 2017-05-10 | カーリットホールディングス株式会社 | UV curable resin composition |
JP6509600B2 (en) * | 2015-03-17 | 2019-05-08 | 株式会社日本触媒 | Method for producing cured product containing oxocarbon compound |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5147758A (en) * | 1991-02-19 | 1992-09-15 | E. I. Du Pont De Nemours And Company | Red sensitive photopolymerizable compositions |
JP2871181B2 (en) * | 1991-07-09 | 1999-03-17 | ブラザー工業株式会社 | Photocurable composition |
WO1996009289A1 (en) * | 1994-09-21 | 1996-03-28 | Kyowa Hakko Kogyo Co., Ltd. | Photopolymerizable composition containing squarylium compound |
JPH09127694A (en) * | 1995-10-31 | 1997-05-16 | Mitsubishi Chem Corp | Photopolymerizable composition |
KR100799523B1 (en) * | 1999-12-16 | 2008-01-31 | 교와 핫꼬 케미칼 가부시키가이샤 | Squarium compound and optical recording medium prepared using the same |
JP4183918B2 (en) * | 2001-02-14 | 2008-11-19 | 株式会社リコー | Optical recording medium and optical recording method using the same |
JP4156215B2 (en) * | 2001-06-14 | 2008-09-24 | 株式会社リコー | Optical recording medium, optical recording method and optical recording apparatus using the same |
AU2003236353A1 (en) * | 2002-04-08 | 2003-10-20 | Kyowa Hakko Chemical Co., Ltd. | Photopolymerizable composition |
JP2005319728A (en) * | 2004-05-11 | 2005-11-17 | Ricoh Co Ltd | Optical recording medium, recording / reproducing method using the same, and optical recording apparatus |
WO2006041156A1 (en) * | 2004-10-14 | 2006-04-20 | Kyowa Hakko Chemical Co., Ltd. | Squarylium compound, photo-electric converting material comprising the same, photo-electric converting element, and photoelectrochemical cell |
JPWO2006041155A1 (en) * | 2004-10-14 | 2008-05-22 | 協和発酵ケミカル株式会社 | SQUARYLIUM COMPOUND AND PHOTOELECTRIC CONVERSION MATERIAL, PHOTOELECTRIC CONVERSION ELEMENT AND PHOTOELECTROCHEMICAL CELL USING THE SAME |
-
2006
- 2006-10-20 TW TW095138663A patent/TW200720842A/en unknown
- 2006-10-24 WO PCT/JP2006/321098 patent/WO2007049579A1/en active Application Filing
- 2006-10-24 JP JP2007542576A patent/JPWO2007049579A1/en not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
JPWO2007049579A1 (en) | 2009-04-30 |
WO2007049579A1 (en) | 2007-05-03 |
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