[go: up one dir, main page]

TW200710237A - Vacuum device and method for treating a substance in a gas phase - Google Patents

Vacuum device and method for treating a substance in a gas phase

Info

Publication number
TW200710237A
TW200710237A TW095113727A TW95113727A TW200710237A TW 200710237 A TW200710237 A TW 200710237A TW 095113727 A TW095113727 A TW 095113727A TW 95113727 A TW95113727 A TW 95113727A TW 200710237 A TW200710237 A TW 200710237A
Authority
TW
Taiwan
Prior art keywords
substance
gas phase
treating
vacuum device
deposition
Prior art date
Application number
TW095113727A
Other languages
Chinese (zh)
Other versions
TWI332033B (en
Inventor
Hartmut Froeb
Jens Drechsel
Original Assignee
Creaphys Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Creaphys Gmbh filed Critical Creaphys Gmbh
Publication of TW200710237A publication Critical patent/TW200710237A/en
Application granted granted Critical
Publication of TWI332033B publication Critical patent/TWI332033B/zh

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D7/00Sublimation
    • B01D7/02Crystallisation directly from the vapour phase
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D3/00Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • B01D3/10Vacuum distillation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)

Abstract

The invention relates to a vacuum device (100) which comprises at least one deposition device (20.1, 20.2) which is used to deposit a substance from the gas phase. The at least one deposition device (20.1, 20.2) comprises a deposition body (21, 22) which comprises an inner surface which is used to receive the deposited substance and a plurality of heating elements (25) which are arranged in a distributed manner in the volume of the deposition body (21, 22).
TW095113727A 2005-04-19 2006-04-18 Vacuum device and method for treating a substance in a gas phase TW200710237A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2005/004175 WO2006111180A1 (en) 2005-04-19 2005-04-19 Vacuum device and method for treating a substance in a gas phase

Publications (2)

Publication Number Publication Date
TW200710237A true TW200710237A (en) 2007-03-16
TWI332033B TWI332033B (en) 2010-10-21

Family

ID=34967463

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095113727A TW200710237A (en) 2005-04-19 2006-04-18 Vacuum device and method for treating a substance in a gas phase

Country Status (3)

Country Link
DE (1) DE112005003542A5 (en)
TW (1) TW200710237A (en)
WO (1) WO2006111180A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102017003516A1 (en) * 2017-04-11 2018-10-11 Creaphys Gmbh Coating apparatus and method for reactive vapor deposition under vacuum on a substrate
DE102022110071A1 (en) 2022-02-01 2023-08-03 Seifert Systems Ltd. Air conditioning device for operation in an industrial environment

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1084239B (en) * 1959-02-11 1960-06-30 Gea Luftkuehler Ges M B H Method and device for the continuous separation of sublimation products from hot carrier gases
CH472364A (en) * 1966-12-22 1969-05-15 Geigy Ag J R Process for the preparation of a new polycyclic amine
US5354563A (en) * 1985-07-15 1994-10-11 Research Development Corp. Of Japan Water dispersion containing ultrafine particles of organic compounds
DE19755266C1 (en) * 1997-12-12 1999-02-25 Gea Luftkuehler Happel Gmbh Desublimation housing has lower levels of ribbed tubes replaced
US6811592B2 (en) * 2002-03-01 2004-11-02 Johnson & Johnson Vision Care, Inc. Thin film in-line degasser

Also Published As

Publication number Publication date
TWI332033B (en) 2010-10-21
WO2006111180A1 (en) 2006-10-26
DE112005003542A5 (en) 2008-02-28

Similar Documents

Publication Publication Date Title
WO2007053607A3 (en) Pumping system for atomic layer deposition
TW200644085A (en) A plasma enhanced atomic layer deposition system having reduced contamination
TW200716778A (en) A method and system for precursor delivery
TW200746269A (en) Vapor phase growth apparatus and method for vapor phase growth
EP1630250A4 (en) Chemical vapor deposition film formed by plasma cvd process and method for forming same
HK1046538A1 (en) Apparatus for the simultaneous deposition by physical vapor deposition and chemical vapor depositionand method therefor.
WO2008078502A1 (en) Film deposition apparatus and film deposition method
EP1852522A4 (en) Vapor deposited film by plasma cvd method
GB0207350D0 (en) Surface
WO2005124859A3 (en) Methods and apparatuses for depositing uniform layers
TW200628619A (en) Vacuum coating system
EP1794346A4 (en) Apparatus and method for depositing a material on a substrate
EP2034045A3 (en) Reduction of etch-rate drift in HDP processes
TW200722544A (en) Method for depositing a vapour deposition material
SG108942A1 (en) Vacuum arc vapor deposition apparatus
WO2012170511A3 (en) Methods for cleaning a surface of a substrate using a hot wire chemical vapor deposition (hwcvd) chamber
EP1952971A4 (en) Method for the surface treatment of structures that are made from a composite material, using beams of atmospheric plasma
ZA200800674B (en) Firing support for ceramics and method for obtaining same
WO2008078500A1 (en) Film deposition apparatus and film deposition method
TW200614365A (en) Method for providing uniform removal of organic material
MXPA04001102A (en) Surface treatment system, surface treatment method and product produced by surface treatment method.
TW200710291A (en) Vapor phase growing apparatus and vapor phase growing method
TW200506082A (en) Shutter disk and blade for physical vapor deposition chamber
EP1650788A4 (en) Vapor deposition apparatus and vapor deposition method
TW200710237A (en) Vacuum device and method for treating a substance in a gas phase

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees