TW200710237A - Vacuum device and method for treating a substance in a gas phase - Google Patents
Vacuum device and method for treating a substance in a gas phaseInfo
- Publication number
- TW200710237A TW200710237A TW095113727A TW95113727A TW200710237A TW 200710237 A TW200710237 A TW 200710237A TW 095113727 A TW095113727 A TW 095113727A TW 95113727 A TW95113727 A TW 95113727A TW 200710237 A TW200710237 A TW 200710237A
- Authority
- TW
- Taiwan
- Prior art keywords
- substance
- gas phase
- treating
- vacuum device
- deposition
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D7/00—Sublimation
- B01D7/02—Crystallisation directly from the vapour phase
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
- B01D3/10—Vacuum distillation
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
Abstract
The invention relates to a vacuum device (100) which comprises at least one deposition device (20.1, 20.2) which is used to deposit a substance from the gas phase. The at least one deposition device (20.1, 20.2) comprises a deposition body (21, 22) which comprises an inner surface which is used to receive the deposited substance and a plurality of heating elements (25) which are arranged in a distributed manner in the volume of the deposition body (21, 22).
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/EP2005/004175 WO2006111180A1 (en) | 2005-04-19 | 2005-04-19 | Vacuum device and method for treating a substance in a gas phase |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200710237A true TW200710237A (en) | 2007-03-16 |
TWI332033B TWI332033B (en) | 2010-10-21 |
Family
ID=34967463
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095113727A TW200710237A (en) | 2005-04-19 | 2006-04-18 | Vacuum device and method for treating a substance in a gas phase |
Country Status (3)
Country | Link |
---|---|
DE (1) | DE112005003542A5 (en) |
TW (1) | TW200710237A (en) |
WO (1) | WO2006111180A1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102017003516A1 (en) * | 2017-04-11 | 2018-10-11 | Creaphys Gmbh | Coating apparatus and method for reactive vapor deposition under vacuum on a substrate |
DE102022110071A1 (en) | 2022-02-01 | 2023-08-03 | Seifert Systems Ltd. | Air conditioning device for operation in an industrial environment |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1084239B (en) * | 1959-02-11 | 1960-06-30 | Gea Luftkuehler Ges M B H | Method and device for the continuous separation of sublimation products from hot carrier gases |
CH472364A (en) * | 1966-12-22 | 1969-05-15 | Geigy Ag J R | Process for the preparation of a new polycyclic amine |
US5354563A (en) * | 1985-07-15 | 1994-10-11 | Research Development Corp. Of Japan | Water dispersion containing ultrafine particles of organic compounds |
DE19755266C1 (en) * | 1997-12-12 | 1999-02-25 | Gea Luftkuehler Happel Gmbh | Desublimation housing has lower levels of ribbed tubes replaced |
US6811592B2 (en) * | 2002-03-01 | 2004-11-02 | Johnson & Johnson Vision Care, Inc. | Thin film in-line degasser |
-
2005
- 2005-04-19 DE DE112005003542T patent/DE112005003542A5/en not_active Withdrawn
- 2005-04-19 WO PCT/EP2005/004175 patent/WO2006111180A1/en active Application Filing
-
2006
- 2006-04-18 TW TW095113727A patent/TW200710237A/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
TWI332033B (en) | 2010-10-21 |
WO2006111180A1 (en) | 2006-10-26 |
DE112005003542A5 (en) | 2008-02-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2007053607A3 (en) | Pumping system for atomic layer deposition | |
TW200644085A (en) | A plasma enhanced atomic layer deposition system having reduced contamination | |
TW200716778A (en) | A method and system for precursor delivery | |
TW200746269A (en) | Vapor phase growth apparatus and method for vapor phase growth | |
EP1630250A4 (en) | Chemical vapor deposition film formed by plasma cvd process and method for forming same | |
HK1046538A1 (en) | Apparatus for the simultaneous deposition by physical vapor deposition and chemical vapor depositionand method therefor. | |
WO2008078502A1 (en) | Film deposition apparatus and film deposition method | |
EP1852522A4 (en) | Vapor deposited film by plasma cvd method | |
GB0207350D0 (en) | Surface | |
WO2005124859A3 (en) | Methods and apparatuses for depositing uniform layers | |
TW200628619A (en) | Vacuum coating system | |
EP1794346A4 (en) | Apparatus and method for depositing a material on a substrate | |
EP2034045A3 (en) | Reduction of etch-rate drift in HDP processes | |
TW200722544A (en) | Method for depositing a vapour deposition material | |
SG108942A1 (en) | Vacuum arc vapor deposition apparatus | |
WO2012170511A3 (en) | Methods for cleaning a surface of a substrate using a hot wire chemical vapor deposition (hwcvd) chamber | |
EP1952971A4 (en) | Method for the surface treatment of structures that are made from a composite material, using beams of atmospheric plasma | |
ZA200800674B (en) | Firing support for ceramics and method for obtaining same | |
WO2008078500A1 (en) | Film deposition apparatus and film deposition method | |
TW200614365A (en) | Method for providing uniform removal of organic material | |
MXPA04001102A (en) | Surface treatment system, surface treatment method and product produced by surface treatment method. | |
TW200710291A (en) | Vapor phase growing apparatus and vapor phase growing method | |
TW200506082A (en) | Shutter disk and blade for physical vapor deposition chamber | |
EP1650788A4 (en) | Vapor deposition apparatus and vapor deposition method | |
TW200710237A (en) | Vacuum device and method for treating a substance in a gas phase |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |