[go: up one dir, main page]

TW200704589A - Process for the production of hydrochlorosilanes - Google Patents

Process for the production of hydrochlorosilanes

Info

Publication number
TW200704589A
TW200704589A TW095107967A TW95107967A TW200704589A TW 200704589 A TW200704589 A TW 200704589A TW 095107967 A TW095107967 A TW 095107967A TW 95107967 A TW95107967 A TW 95107967A TW 200704589 A TW200704589 A TW 200704589A
Authority
TW
Taiwan
Prior art keywords
silicon
hydrochlorosilanes
production
hydrogen
copper
Prior art date
Application number
TW095107967A
Other languages
Chinese (zh)
Other versions
TWI454424B (en
Inventor
William C Breneman
Original Assignee
Rec Silicon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=36991997&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=TW200704589(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Rec Silicon Inc filed Critical Rec Silicon Inc
Publication of TW200704589A publication Critical patent/TW200704589A/en
Application granted granted Critical
Publication of TWI454424B publication Critical patent/TWI454424B/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • C07F7/12Organo silicon halides
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/08Compounds containing halogen
    • C01B33/107Halogenated silanes
    • C01B33/1071Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • C01B33/10742Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/38Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals
    • B01J23/40Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals of the platinum group metals
    • B01J23/42Platinum
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/70Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
    • B01J23/72Copper
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J27/00Catalysts comprising the elements or compounds of halogens, sulfur, selenium, tellurium, phosphorus or nitrogen; Catalysts comprising carbon compounds
    • B01J27/06Halogens; Compounds thereof
    • B01J27/08Halides
    • B01J27/122Halides of copper
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • B01J37/16Reducing
    • B01J37/18Reducing with gases containing free hydrogen
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • C07F7/12Organo silicon halides
    • C07F7/16Preparation thereof from silicon and halogenated hydrocarbons direct synthesis

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Catalysts (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)

Abstract

Hydrogen-containing chlorosilanes are prepared by reacting hydrogen with silicon tetrachloride and/or hydrogen chloride and silicon wherein the surface of the silicon has been modified by a chemical vapor deposition of one or more catalytic materials, such as copper.
TW095107967A 2005-03-09 2006-03-09 Process for the production of hydrochlorosilanes TWI454424B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2005/008204 WO2006098722A1 (en) 2005-03-09 2005-03-09 Process for the production of hydrochlorosilanes

Publications (2)

Publication Number Publication Date
TW200704589A true TW200704589A (en) 2007-02-01
TWI454424B TWI454424B (en) 2014-10-01

Family

ID=36991997

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095107967A TWI454424B (en) 2005-03-09 2006-03-09 Process for the production of hydrochlorosilanes

Country Status (8)

Country Link
EP (1) EP1861408A4 (en)
JP (1) JP4813545B2 (en)
KR (1) KR101176088B1 (en)
CN (1) CN101189245B (en)
DE (1) DE112005003497T5 (en)
NO (1) NO20076030L (en)
TW (1) TWI454424B (en)
WO (1) WO2006098722A1 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI469922B (en) * 2008-11-05 2015-01-21 Lord Ltd Lp An apparatus and process for hydrogenation of a silicon tetrahalide and silicon to trihalosilane
TWI571438B (en) * 2014-07-22 2017-02-21 韓華化學股份有限公司 Method for preparing trichlorosilane
TWI574915B (en) * 2011-10-20 2017-03-21 陝西有色天宏瑞科矽材料有限責任公司 Fouling reduction in hydrochlorosilane production

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101279734B (en) * 2008-05-30 2010-06-02 广州吉必盛科技实业有限公司 Method for synthesizing polysilicon raw material trichlorosilane
DE102008002537A1 (en) * 2008-06-19 2009-12-24 Evonik Degussa Gmbh Process for the removal of boron-containing impurities from halosilanes and plant for carrying out the process
US7927984B2 (en) * 2008-11-05 2011-04-19 Hemlock Semiconductor Corporation Silicon production with a fluidized bed reactor utilizing tetrachlorosilane to reduce wall deposition
WO2010132418A1 (en) * 2009-05-12 2010-11-18 Procedyne Corporation Fluidized bed process for synthesizing trichlorosilane and a trichlorosilane synthesizer
KR101672796B1 (en) * 2009-11-10 2016-11-07 주식회사 케이씨씨 Method for producing high purity trichlorosilane for poly-silicon using chlorine gas or hydrogen chloride
JP5542026B2 (en) 2010-10-27 2014-07-09 信越化学工業株式会社 Purification method of chlorosilanes
WO2013138461A1 (en) * 2012-03-14 2013-09-19 Centrotherm Photovoltaics Usa, Inc. Trichlorosilane production
KR101462634B1 (en) * 2013-03-07 2014-11-17 한화케미칼 주식회사 Method for preparing trichlorosilane
KR20150143794A (en) * 2013-04-19 2015-12-23 알이씨 실리콘 인코포레이티드 Corrosion and fouling reduction in hydrochlorosilane production
KR101519498B1 (en) * 2013-06-19 2015-05-12 한화케미칼 주식회사 Method for preparing trichlorosilane
CN105080434B (en) * 2014-04-18 2018-02-27 新特能源股份有限公司 A kind of catalytic reactor, system, the method for silicon tetrachloride catalytic hydrogenation
KR20170095356A (en) * 2014-12-18 2017-08-22 헴로크 세미컨덕터 오퍼레이션즈 엘엘씨 Methods of hydrogenating a halosilane
WO2019068335A1 (en) * 2017-10-05 2019-04-11 Wacker Chemie Ag Method for producing chlorosilanes
CN113651844B (en) * 2021-08-20 2023-09-12 唐山偶联硅业有限公司 Process for preparing dimethylhydrochlorosilane by continuous method

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2499009A (en) * 1947-02-15 1950-02-28 Linde Air Prod Co Chlorosilanes
US4676967A (en) * 1978-08-23 1987-06-30 Union Carbide Corporation High purity silane and silicon production
US4314908A (en) * 1979-10-24 1982-02-09 Union Carbide Corporation Preparation of reaction mass for the production of methylchlorosilane
JPS58161915A (en) * 1982-03-17 1983-09-26 Shin Etsu Chem Co Ltd Manufacture of trichlorosilane
US4526769A (en) * 1983-07-18 1985-07-02 Motorola, Inc. Trichlorosilane production process
JPS62288109A (en) * 1986-06-05 1987-12-15 Mitsubishi Metal Corp Production of trichlorosilane
JPH0788214B2 (en) * 1986-10-15 1995-09-27 三井東圧化学株式会社 Method for producing trichlorosilane
JP2613260B2 (en) * 1988-06-09 1997-05-21 三井東圧化学株式会社 Method for producing trichlorosilane
JP2613259B2 (en) * 1988-06-09 1997-05-21 三井東圧化学株式会社 Method for producing trichlorosilane
JPH01313318A (en) * 1988-06-10 1989-12-18 Mitsui Toatsu Chem Inc Production of trichlorosilane
US4973725A (en) * 1988-06-28 1990-11-27 Union Carbide Chemicals And Plastics Company Inc. Direct synthesis process for organohalohydrosilanes
US5051248A (en) * 1990-08-15 1991-09-24 Dow Corning Corporation Silane products from reaction of silicon monoxide with hydrogen halides
CA2055304A1 (en) * 1990-12-06 1992-06-07 Roland L. Halm Metal catalyzed production of tetrachlorosilanes
US5250716A (en) * 1992-05-28 1993-10-05 Mui Jeffrey Y P Method for making a silicon/copper contact mass suitable for direct reaction
US5329038A (en) * 1993-12-29 1994-07-12 Dow Corning Corporation Process for hydrogenation of chlorosilane
JP3708648B2 (en) * 1995-12-25 2005-10-19 株式会社トクヤマ Method for producing trichlorosilane
DE19654154A1 (en) * 1995-12-25 1997-06-26 Tokuyama Corp Tri:chloro:silane production for high purity silicon@ precursor
JP3708649B2 (en) * 1995-12-25 2005-10-19 株式会社トクヤマ Method for producing metal silicon particles having copper silicide
KR100210261B1 (en) * 1997-03-13 1999-07-15 이서봉 Method of production for poly crystal silicon
US6057469A (en) * 1997-07-24 2000-05-02 Pechiney Electrometallurgie Process for manufacturing active silicon powder for the preparation of alkyl- or aryl-halosilanes
DE10045367A1 (en) * 2000-09-14 2002-03-28 Bayer Ag Process for the preparation of trichlorosilane
DE10049963B4 (en) * 2000-10-10 2009-04-09 Evonik Degussa Gmbh Process for the preparation of trichlorosilane

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI469922B (en) * 2008-11-05 2015-01-21 Lord Ltd Lp An apparatus and process for hydrogenation of a silicon tetrahalide and silicon to trihalosilane
TWI574915B (en) * 2011-10-20 2017-03-21 陝西有色天宏瑞科矽材料有限責任公司 Fouling reduction in hydrochlorosilane production
TWI571438B (en) * 2014-07-22 2017-02-21 韓華化學股份有限公司 Method for preparing trichlorosilane
US10065864B2 (en) 2014-07-22 2018-09-04 Hanwha Chemical Corporation Method of preparing trichlorosilan

Also Published As

Publication number Publication date
EP1861408A1 (en) 2007-12-05
JP2008532907A (en) 2008-08-21
WO2006098722A1 (en) 2006-09-21
JP4813545B2 (en) 2011-11-09
CN101189245A (en) 2008-05-28
CN101189245B (en) 2012-06-13
KR20080008323A (en) 2008-01-23
EP1861408A4 (en) 2011-08-03
TWI454424B (en) 2014-10-01
DE112005003497T5 (en) 2008-01-24
KR101176088B1 (en) 2012-08-22
NO20076030L (en) 2007-12-07

Similar Documents

Publication Publication Date Title
TW200704589A (en) Process for the production of hydrochlorosilanes
PL2134767T3 (en) Process for making hydrolyzable silylated polymers
GB2516372A (en) High quality large scale single and multilayer graphene production by chemical vapor deposition
GB2437693B (en) Chemical vapor deposition reactor having multiple inlets
GB201205801D0 (en) Process
DK2190443T3 (en) Carbon nanotube powder, carbon nanotube and process for making it
EA201100568A1 (en) Method for producing high purity silicon carbide from hydrocarbons and silicon oxide
PL2250298T3 (en) Method and system for depositing a metal or metalloid on carbon nanotubes
MY149829A (en) Epichlorohydrin, manufacturing process and use
WO2007120871A3 (en) Production of silicon through a closed-loop process
WO2007062190A3 (en) Chemical compounds
EP1855863A4 (en) Processes for the production of organometallic compounds
TW200721269A (en) Deposition apparatus for semiconductor processing
TW200714670A (en) Process for the continuous production of silylated resin
WO2008146741A1 (en) Process and apparatus for producing trichlorosilane and process for producing polycrystalline silicon
WO2007120511A3 (en) Methods for synthesizing ammonia borane
PL1891004T3 (en) Pentafluorosulphanyl-substituted compound and its use for producing medicaments
WO2009035130A3 (en) Process for producing 2,3,3,3-tetrafluoropropene
WO2006120449A8 (en) Nanostructure production methods and apparatus
EP1874438A4 (en) Gas purification process
AU2001291829A1 (en) Method for producing chlorosilanes
AU2002217047A1 (en) Method for producing trichlorosilane
ZA200800455B (en) Catalyst for hydrogen production from water gas shift reaction
FI20115321A0 (en) A method for depositing one or more polycrystalline silicon layers on a substrate
TW200833704A (en) Tantalum and niobium compounds and their use for chemical vapour deposition (CVD)