TW200622226A - Optical method for detecting the surface structure on thin film of nano crystal - Google Patents
Optical method for detecting the surface structure on thin film of nano crystalInfo
- Publication number
- TW200622226A TW200622226A TW093140978A TW93140978A TW200622226A TW 200622226 A TW200622226 A TW 200622226A TW 093140978 A TW093140978 A TW 093140978A TW 93140978 A TW93140978 A TW 93140978A TW 200622226 A TW200622226 A TW 200622226A
- Authority
- TW
- Taiwan
- Prior art keywords
- thin film
- nano crystal
- surface structure
- film
- optical
- Prior art date
Links
- 239000002159 nanocrystal Substances 0.000 title abstract 6
- 230000003287 optical effect Effects 0.000 title abstract 6
- 239000010409 thin film Substances 0.000 title abstract 6
- 238000000034 method Methods 0.000 title abstract 3
- 239000010408 film Substances 0.000 abstract 3
- 238000000151 deposition Methods 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- 238000005259 measurement Methods 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 239000002344 surface layer Substances 0.000 abstract 1
- 238000000427 thin-film deposition Methods 0.000 abstract 1
Landscapes
- Length Measuring Devices By Optical Means (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Abstract
The invention is proposed a kind of optical method for detecting the surface structure on thin film of nano crystal. It utilities the gas phase deposition to get the property of surface structure with the low integral rate of nano crystal film. The thin film of the nano crystal is divided into high and low refraction index surface layers to generate the twin-structure with non-uniformity. Using the optical mode of twin-structure to simulate the performance of nano crystal. It is also to note that the thin film deposition process for thin film is done and if the film structure is fitted with optical mode of the twin-structure, it shows the nano crystal for the thin film. Thus, the surface structure and thickness of nano thin film in processing can be detected precisely using optical apparatus' measurement and optical parameters' calculation for the film and substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW093140978A TW200622226A (en) | 2004-12-28 | 2004-12-28 | Optical method for detecting the surface structure on thin film of nano crystal |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW093140978A TW200622226A (en) | 2004-12-28 | 2004-12-28 | Optical method for detecting the surface structure on thin film of nano crystal |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW200622226A true TW200622226A (en) | 2006-07-01 |
Family
ID=57808458
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW093140978A TW200622226A (en) | 2004-12-28 | 2004-12-28 | Optical method for detecting the surface structure on thin film of nano crystal |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TW200622226A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10030306B2 (en) | 2012-10-26 | 2018-07-24 | Applied Materials, Inc. | PECVD apparatus and process |
| CN112361973A (en) * | 2020-11-18 | 2021-02-12 | 华侨大学 | Method for detecting thickness and optical constant of diamond film |
| TWI756454B (en) * | 2017-07-25 | 2022-03-01 | 美商克萊譚克公司 | Multilayer film metrology using an effective media approximation |
| CN115683561A (en) * | 2022-09-23 | 2023-02-03 | 中国科学院上海光学精密机械研究所 | Characterization method of optical constant of ultrathin film |
-
2004
- 2004-12-28 TW TW093140978A patent/TW200622226A/en unknown
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10030306B2 (en) | 2012-10-26 | 2018-07-24 | Applied Materials, Inc. | PECVD apparatus and process |
| TWI632250B (en) * | 2012-10-26 | 2018-08-11 | 應用材料股份有限公司 | PECVD equipment and processes |
| TWI756454B (en) * | 2017-07-25 | 2022-03-01 | 美商克萊譚克公司 | Multilayer film metrology using an effective media approximation |
| CN112361973A (en) * | 2020-11-18 | 2021-02-12 | 华侨大学 | Method for detecting thickness and optical constant of diamond film |
| CN115683561A (en) * | 2022-09-23 | 2023-02-03 | 中国科学院上海光学精密机械研究所 | Characterization method of optical constant of ultrathin film |
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