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TW200616093A - Bipolar transistor with graded base layer - Google Patents

Bipolar transistor with graded base layer

Info

Publication number
TW200616093A
TW200616093A TW094136479A TW94136479A TW200616093A TW 200616093 A TW200616093 A TW 200616093A TW 094136479 A TW094136479 A TW 094136479A TW 94136479 A TW94136479 A TW 94136479A TW 200616093 A TW200616093 A TW 200616093A
Authority
TW
Taiwan
Prior art keywords
base layer
iii
indium
nitrogen
flow rates
Prior art date
Application number
TW094136479A
Other languages
Chinese (zh)
Inventor
Roger E Welser
Paul M Deluca
Charles R Lutz
Kevin S Stevens
Noren Pan
Original Assignee
Kopin Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/969,804 external-priority patent/US7345327B2/en
Application filed by Kopin Corp filed Critical Kopin Corp
Publication of TW200616093A publication Critical patent/TW200616093A/en

Links

Landscapes

  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Bipolar Transistors (AREA)

Abstract

A semiconductor material which has a high carbon dopant concentration includes gallium, indium, arsenic and nitrogen. The disclosed semiconductor materials have a low sheet resistivity because of the high carbon dopant concentrations obtained. The material can be the base layer of gallium arsenide-based heterojunction bipolar transistors and can be lattice-matched to gallium arsenide emitter and/or collector layers by controlling concentrations of indium and nitrogen in the base layer. The base layer can have a graded band gap that is formed by changing the flow rates during deposition of Ⅲ and Ⅴ additive elements employed to reduce band gap relative to different Ⅲ-Ⅴ elements that represent the bulk of the layer. The flow rates of the Ⅲ and Ⅴ additive elements maintain an essentially constant doping-mobility product value during deposition and can be regulated to obtain pre-selected base-emitter voltages at junctions within a resulting transistor.
TW094136479A 2004-10-20 2005-10-19 Bipolar transistor with graded base layer TW200616093A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/969,804 US7345327B2 (en) 2000-11-27 2004-10-20 Bipolar transistor

Publications (1)

Publication Number Publication Date
TW200616093A true TW200616093A (en) 2006-05-16

Family

ID=57808027

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094136479A TW200616093A (en) 2004-10-20 2005-10-19 Bipolar transistor with graded base layer

Country Status (1)

Country Link
TW (1) TW200616093A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI678883B (en) * 2012-06-14 2019-12-01 美商西凱渥資訊處理科技公司 Power amplifier modules
US11984423B2 (en) 2011-09-02 2024-05-14 Skyworks Solutions, Inc. Radio frequency transmission line with finish plating on conductive layer

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11984423B2 (en) 2011-09-02 2024-05-14 Skyworks Solutions, Inc. Radio frequency transmission line with finish plating on conductive layer
TWI678883B (en) * 2012-06-14 2019-12-01 美商西凱渥資訊處理科技公司 Power amplifier modules
US10771024B2 (en) 2012-06-14 2020-09-08 Skyworks Solutions, Inc. Power amplifier modules including transistor with grading and semiconductor resistor
US11451199B2 (en) 2012-06-14 2022-09-20 Skyworks Solutions, Inc. Power amplifier systems with control interface and bias circuit
US12143077B2 (en) 2012-06-14 2024-11-12 Skyworks Solutions, Inc. Power amplifier modules including semiconductor resistor and tantalum nitride terminated through wafer via

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