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TW200609999A - Process module tuning - Google Patents

Process module tuning

Info

Publication number
TW200609999A
TW200609999A TW094116961A TW94116961A TW200609999A TW 200609999 A TW200609999 A TW 200609999A TW 094116961 A TW094116961 A TW 094116961A TW 94116961 A TW94116961 A TW 94116961A TW 200609999 A TW200609999 A TW 200609999A
Authority
TW
Taiwan
Prior art keywords
process module
module tuning
dynamic
outputs
data
Prior art date
Application number
TW094116961A
Other languages
English (en)
Other versions
TWI389166B (zh
Inventor
Barnett, Jr
Mark K Ekblad
Jeffrey M Parker
Original Assignee
Sensarray Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sensarray Corp filed Critical Sensarray Corp
Publication of TW200609999A publication Critical patent/TW200609999A/zh
Application granted granted Critical
Publication of TWI389166B publication Critical patent/TWI389166B/zh

Links

Classifications

    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D23/00—Control of temperature
    • G05D23/19—Control of temperature characterised by the use of electric means
    • G05D23/1927—Control of temperature characterised by the use of electric means using a plurality of sensors
    • G05D23/193—Control of temperature characterised by the use of electric means using a plurality of sensors sensing the temperaure in different places in thermal relationship with one or more spaces
    • G05D23/1931—Control of temperature characterised by the use of electric means using a plurality of sensors sensing the temperaure in different places in thermal relationship with one or more spaces to control the temperature of one space
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B13/00—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion
    • G05B13/02—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
    • G05B13/04—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric involving the use of models or simulators
    • G05B13/042—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric involving the use of models or simulators in which a parameter or coefficient is automatically adjusted to optimise the performance

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Health & Medical Sciences (AREA)
  • Artificial Intelligence (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Evolutionary Computation (AREA)
  • Medical Informatics (AREA)
  • Software Systems (AREA)
  • Remote Sensing (AREA)
  • Feedback Control In General (AREA)
TW094116961A 2004-05-25 2005-05-24 處理模組調諧 TWI389166B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/855,696 US7415312B2 (en) 2004-05-25 2004-05-25 Process module tuning

Publications (2)

Publication Number Publication Date
TW200609999A true TW200609999A (en) 2006-03-16
TWI389166B TWI389166B (zh) 2013-03-11

Family

ID=34970501

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094116961A TWI389166B (zh) 2004-05-25 2005-05-24 處理模組調諧

Country Status (3)

Country Link
US (1) US7415312B2 (zh)
TW (1) TWI389166B (zh)
WO (1) WO2005116782A1 (zh)

Families Citing this family (56)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7403834B2 (en) * 2003-05-08 2008-07-22 Regents Of The University Of California Methods of and apparatuses for controlling process profiles
EP2284184A3 (en) * 2004-01-09 2011-05-18 Novozymes, Inc. Bacillus YvmA inactivation
US7415312B2 (en) * 2004-05-25 2008-08-19 Barnett Jr James R Process module tuning
US7566181B2 (en) * 2004-09-01 2009-07-28 Tokyo Electron Limited Controlling critical dimensions of structures formed on a wafer in semiconductor processing
US7751908B2 (en) * 2004-12-02 2010-07-06 Taiwan Semiconductor Manufacturing Co., Ltd. Method and system for thermal process control
US8150558B2 (en) * 2004-12-08 2012-04-03 Iwate University Temperature control method and temperature controller
JP4839702B2 (ja) * 2005-07-04 2011-12-21 オムロン株式会社 温度制御方法、調整装置、温度調節器、プログラム、記録媒体および熱処理装置
CN101322083A (zh) 2005-12-05 2008-12-10 费舍-柔斯芒特系统股份有限公司 利用并行过程仿真的多目标预测过程优化
US7505949B2 (en) * 2006-01-31 2009-03-17 Caterpillar Inc. Process model error correction method and system
US20080294291A1 (en) * 2007-05-24 2008-11-27 Johnson Controls Technology Company Building automation systems and methods for controlling interacting control loops
US7848840B2 (en) * 2008-01-04 2010-12-07 Applied Materials, Inc. Method of controlling process parameters for semiconductor manufacturing apparatus
US8337757B2 (en) * 2008-02-07 2012-12-25 Precision Combustion, Inc. Reactor control method
US8311653B2 (en) * 2008-02-08 2012-11-13 Honeywell International Inc. Apparatus and method for system identification and loop-shaping controller design in a process control system
US8115140B2 (en) * 2008-07-31 2012-02-14 Tokyo Electron Limited Heater assembly for high throughput chemical treatment system
US8637794B2 (en) 2009-10-21 2014-01-28 Lam Research Corporation Heating plate with planar heating zones for semiconductor processing
KR101841378B1 (ko) 2009-12-15 2018-03-22 램 리써치 코포레이션 Ｃｄ 균일성을 향상시키기 위한 기판 온도의 조절
JP5269128B2 (ja) * 2010-03-12 2013-08-21 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置および方法
TWI406643B (zh) * 2010-04-30 2013-09-01 Univ Nat Chiao Tung 回饋控制方法及其回饋控制裝置
US9488974B2 (en) * 2010-08-17 2016-11-08 Massachusetts Institute Of Technology Method and apparatus for pulse-modulated feedback control
US8791392B2 (en) 2010-10-22 2014-07-29 Lam Research Corporation Methods of fault detection for multiplexed heater array
US8546732B2 (en) * 2010-11-10 2013-10-01 Lam Research Corporation Heating plate with planar heater zones for semiconductor processing
FI126110B (fi) * 2011-01-19 2016-06-30 Ouman Oy Menetelmä, laitteisto ja tietokoneohjelmatuote toimilaitteen ohjaamiseksi lämpötilan säätelyssä
US9307578B2 (en) 2011-08-17 2016-04-05 Lam Research Corporation System and method for monitoring temperatures of and controlling multiplexed heater array
US10388493B2 (en) 2011-09-16 2019-08-20 Lam Research Corporation Component of a substrate support assembly producing localized magnetic fields
US8624168B2 (en) 2011-09-20 2014-01-07 Lam Research Corporation Heating plate with diode planar heater zones for semiconductor processing
US8461674B2 (en) 2011-09-21 2013-06-11 Lam Research Corporation Thermal plate with planar thermal zones for semiconductor processing
US9324589B2 (en) 2012-02-28 2016-04-26 Lam Research Corporation Multiplexed heater array using AC drive for semiconductor processing
US8809747B2 (en) * 2012-04-13 2014-08-19 Lam Research Corporation Current peak spreading schemes for multiplexed heated array
US10049948B2 (en) 2012-11-30 2018-08-14 Lam Research Corporation Power switching system for ESC with array of thermal control elements
ES2776004T3 (es) * 2013-03-15 2020-07-28 Kaeser Kompressoren Se Desarrollo de un modelo superior para el control y/o monitorización de una instalación de compresor
DK177915B1 (en) * 2013-05-28 2015-01-05 Core As Process control method
US20150060013A1 (en) * 2013-09-05 2015-03-05 Applied Materials, Inc. Tunable temperature controlled electrostatic chuck assembly
MX387047B (es) 2013-11-06 2025-03-11 WATT Fuel Cell Corp Reactor quimico con multiple para manejo de un flujo de medio de reaccion gaseoso al mismo.
CA2929680C (en) 2013-11-06 2019-03-26 Watt Fuel Cell Corp. Liquid fuel cpox reformers and methods of cpox reforming
US9627701B2 (en) 2013-11-06 2017-04-18 Watt Fuel Cell Corp. Integrated gaseous fuel CPOX reformer and fuel cell systems, and methods of producing electricity
KR101865032B1 (ko) 2013-11-06 2018-06-07 와트 퓨얼 셀 코퍼레이션 액체 연료 cpox 개질장치-연료 전지 시스템, 및 전기 생산 방법
AU2014346741B2 (en) 2013-11-06 2017-01-19 Watt Fuel Cell Corp. Gaseous fuel CPOX reformers and methods of CPOX reforming
JP6285563B2 (ja) 2013-11-06 2018-02-28 ワット・フューエル・セル・コーポレイションＷａｔｔ Ｆｕｅｌ Ｃｅｌｌ Ｃｏｒｐ． 構造成分としてペロブスカイトを有する改質器
US9739496B2 (en) * 2013-12-16 2017-08-22 Johnson Controls Technology Company Systems and methods for estimating a return time
US9543171B2 (en) 2014-06-17 2017-01-10 Lam Research Corporation Auto-correction of malfunctioning thermal control element in a temperature control plate of a semiconductor substrate support assembly that includes deactivating the malfunctioning thermal control element and modifying a power level of at least one functioning thermal control element
US10381248B2 (en) * 2015-06-22 2019-08-13 Lam Research Corporation Auto-correction of electrostatic chuck temperature non-uniformity
US10763142B2 (en) 2015-06-22 2020-09-01 Lam Research Corporation System and method for determining field non-uniformities of a wafer processing chamber using a wafer processing parameter
US9779974B2 (en) 2015-06-22 2017-10-03 Lam Research Corporation System and method for reducing temperature transition in an electrostatic chuck
US10386821B2 (en) 2015-06-22 2019-08-20 Lam Research Corporation Systems and methods for calibrating scalar field contribution values for a limited number of sensors including a temperature value of an electrostatic chuck and estimating temperature distribution profiles based on calibrated values
EP3323018B1 (en) 2015-07-16 2020-09-02 ASML Netherlands B.V. Inspection substrate and inspection method
JP6647931B2 (ja) * 2016-03-16 2020-02-14 株式会社Kelk 半導体ウェーハの温度制御装置、および半導体ウェーハの温度制御方法
US20170268941A1 (en) * 2016-03-21 2017-09-21 Globalfoundries Inc. Tactile sensing intrumented wafer
US20180062491A1 (en) * 2016-08-25 2018-03-01 United States Department Of The Navy Interstructural and Inertial Actuator
US10627123B2 (en) * 2016-12-09 2020-04-21 Johnson Controls Technology Company Thermostat with master control features
US20180366354A1 (en) 2017-06-19 2018-12-20 Applied Materials, Inc. In-situ semiconductor processing chamber temperature apparatus
KR102025145B1 (ko) * 2017-09-01 2019-09-25 두산중공업 주식회사 플랜트 데이터 예측 장치 및 방법
WO2019226252A1 (en) * 2018-05-24 2019-11-28 Applied Materials, Inc. Virtual sensor for spatially resolved wafer temperature control
US11533783B2 (en) * 2019-07-18 2022-12-20 Applied Materials, Inc. Multi-zone heater model-based control in semiconductor manufacturing
KR102403198B1 (ko) * 2019-07-19 2022-05-27 세메스 주식회사 기판 처리 장치 및 기판 처리 방법
US20230350438A1 (en) * 2022-04-29 2023-11-02 Semes Co., Ltd. Process measurement apparatus and method
US20240339341A1 (en) * 2023-04-07 2024-10-10 Applied Materials, Inc. Automatic control of substrates

Family Cites Families (57)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USRE32369E (en) 1980-11-17 1987-03-10 Ball Corporation Monolithic microwave integrated circuit with integral array antenna
US5252435A (en) 1990-01-30 1993-10-12 Matsushita Electric Industrial Co., Ltd. Method for forming pattern
US5262944A (en) 1992-05-15 1993-11-16 Hewlett-Packard Company Method for use of color and selective highlighting to indicate patient critical events in a centralized patient monitoring system
EP0645033B1 (en) * 1992-06-12 1996-12-04 The Dow Chemical Company Intelligent process control communication system and method
JP2969034B2 (ja) 1993-06-18 1999-11-02 東京エレクトロン株式会社 搬送方法および搬送装置
US5444637A (en) * 1993-09-28 1995-08-22 Advanced Micro Devices, Inc. Programmable semiconductor wafer for sensing, recording and retrieving fabrication process conditions to which the wafer is exposed
US5435646A (en) 1993-11-09 1995-07-25 Hughes Aircraft Company Temperature measurement using ion implanted wafers
US5516608A (en) 1994-02-28 1996-05-14 International Business Machines Corporation Method for controlling a line dimension arising in photolithographic processes
US5519605A (en) 1994-10-24 1996-05-21 Olin Corporation Model predictive control apparatus and method
US6010538A (en) 1996-01-11 2000-01-04 Luxtron Corporation In situ technique for monitoring and controlling a process of chemical-mechanical-polishing via a radiative communication link
AU1843597A (en) 1996-01-31 1997-08-22 Asm America, Inc. Model-based predictive control of thermal processing
US5920478A (en) * 1997-06-27 1999-07-06 Oakleaf Engineering, Inc. Multi-input multi-output generic non-interacting controller
US5969639A (en) 1997-07-28 1999-10-19 Lockheed Martin Energy Research Corporation Temperature measuring device
US6148201A (en) * 1997-08-06 2000-11-14 Nortel Networks Corporation Scalable wireless network architecture based on subscriber distribution
US5970313A (en) 1997-12-19 1999-10-19 Advanced Micro Devices, Inc. Monitoring wafer temperature during thermal processing of wafers by measuring sheet resistance of a test wafer
US6222161B1 (en) * 1998-01-12 2001-04-24 Tokyo Electron Limited Heat treatment apparatus
JP3246891B2 (ja) 1998-02-03 2002-01-15 東京エレクトロン株式会社 熱処理装置
US6744346B1 (en) 1998-02-27 2004-06-01 Micron Technology, Inc. Electronic device workpieces, methods of semiconductor processing and methods of sensing temperature of an electronic device workpiece
US6244121B1 (en) 1998-03-06 2001-06-12 Applied Materials, Inc. Sensor device for non-intrusive diagnosis of a semiconductor processing system
US6075909A (en) 1998-06-26 2000-06-13 Lucent Technologies, Inc. Optical monitoring system for III-V wafer processing
US6325536B1 (en) 1998-07-10 2001-12-04 Sensarray Corporation Integrated wafer temperature sensors
US6279402B1 (en) 1998-08-10 2001-08-28 Applied Materials, Inc. Device for measuring pressure in a chamber
US6140833A (en) 1998-11-16 2000-10-31 Siemens Aktiengesellschaft In-situ measurement method and apparatus for semiconductor processing
JP3455458B2 (ja) 1999-02-01 2003-10-14 東京エレクトロン株式会社 塗布、現像装置及び塗布現像処理における基板再生システム
WO2000068986A1 (en) 1999-05-07 2000-11-16 Tokyo Electron Limited Method and apparatus for vacuum treatment
US6190040B1 (en) 1999-05-10 2001-02-20 Sensarray Corporation Apparatus for sensing temperature on a substrate in an integrated circuit fabrication tool
US6191394B1 (en) * 1999-05-19 2001-02-20 Tokyo Electron Ltd. Heat treating apparatus
US6617553B2 (en) 1999-05-19 2003-09-09 Applied Materials, Inc. Multi-zone resistive heater
US6235439B1 (en) 1999-05-19 2001-05-22 International Business Machines Corporation Method for controlling image size of integrated circuits on wafers supported on hot plates during post exposure baking of the wafers
US6100506A (en) 1999-07-26 2000-08-08 International Business Machines Corporation Hot plate with in situ surface temperature adjustment
US6445963B1 (en) * 1999-10-04 2002-09-03 Fisher Rosemount Systems, Inc. Integrated advanced control blocks in process control systems
TW518639B (en) * 1999-11-18 2003-01-21 Tokyo Electron Ltd Heat treatment device, cooling treatment device and cooling treatment method
TW525213B (en) 2000-02-16 2003-03-21 Hitachi Ltd Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units
US6691068B1 (en) * 2000-08-22 2004-02-10 Onwafer Technologies, Inc. Methods and apparatus for obtaining data for process operation, optimization, monitoring, and control
US6377130B1 (en) 2000-09-12 2002-04-23 Rockwell Collins, Inc. Temperature stabilized CMOS oscillator circuit
DE10059665C1 (de) * 2000-12-01 2002-07-11 Steag Hamatech Ag Verfahren zum thermischen Behandeln von Substraten
US6995691B2 (en) 2001-02-14 2006-02-07 Heetronix Bonded structure using reacted borosilicate mixture
NL1017593C2 (nl) 2001-03-14 2002-09-17 Asm Int Inspectiesysteem ten behoeve van procesapparaten voor het behandelen van substraten, alsmede een sensor bestemd voor een dergelijk inspectiesysteem en een werkwijze voor het inspecteren van procesapparaten.
US6542835B2 (en) 2001-03-22 2003-04-01 Onwafer Technologies, Inc. Data collection methods and apparatus
US6789034B2 (en) 2001-04-19 2004-09-07 Onwafer Technologies, Inc. Data collection methods and apparatus with parasitic correction
TW594455B (en) 2001-04-19 2004-06-21 Onwafer Technologies Inc Methods and apparatus for obtaining data for process operation, optimization, monitoring, and control
US6971036B2 (en) 2001-04-19 2005-11-29 Onwafer Technologies Methods and apparatus for low power delay control
US7282889B2 (en) 2001-04-19 2007-10-16 Onwafer Technologies, Inc. Maintenance unit for a sensor apparatus
US6671660B2 (en) 2001-04-19 2003-12-30 Onwafer Technologies, Inc. Methods and apparatus for power control
WO2002091248A1 (en) * 2001-05-04 2002-11-14 Therma-Wave, Inc. Systems and methods for metrology recipe and model generation
JP3825277B2 (ja) * 2001-05-25 2006-09-27 東京エレクトロン株式会社 加熱処理装置
US6889568B2 (en) 2002-01-24 2005-05-10 Sensarray Corporation Process condition sensing wafer and data analysis system
US7289230B2 (en) 2002-02-06 2007-10-30 Cyberoptics Semiconductors, Inc. Wireless substrate-like sensor
US6901300B2 (en) 2002-02-07 2005-05-31 Fisher-Rosemount Systems, Inc.. Adaptation of advanced process control blocks in response to variable process delay
US6907364B2 (en) 2002-09-16 2005-06-14 Onwafer Technologies, Inc. Methods and apparatus for deriving thermal flux data for processing a workpiece
US7212950B2 (en) 2002-09-18 2007-05-01 Onwafer Technologies, Inc. Methods and apparatus for equipment matching and characterization
US7006900B2 (en) 2002-11-14 2006-02-28 Asm International N.V. Hybrid cascade model-based predictive control system
JP4328516B2 (ja) * 2002-11-21 2009-09-09 エルピーダメモリ株式会社 レジストパターンの形成方法及び加熱処理装置
US7135852B2 (en) * 2002-12-03 2006-11-14 Sensarray Corporation Integrated process condition sensing wafer and data analysis system
US7151366B2 (en) * 2002-12-03 2006-12-19 Sensarray Corporation Integrated process condition sensing wafer and data analysis system
US7016754B2 (en) 2003-05-08 2006-03-21 Onwafer Technologies, Inc. Methods of and apparatus for controlling process profiles
US7415312B2 (en) * 2004-05-25 2008-08-19 Barnett Jr James R Process module tuning

Also Published As

Publication number Publication date
TWI389166B (zh) 2013-03-11
US20050267606A1 (en) 2005-12-01
US7415312B2 (en) 2008-08-19
WO2005116782A1 (en) 2005-12-08

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