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TW200510784A - Color filter, adjust method of photo-sensitive resin compositions set for color filter and photo-sensitive resin compositions set for color filter - Google Patents

Color filter, adjust method of photo-sensitive resin compositions set for color filter and photo-sensitive resin compositions set for color filter

Info

Publication number
TW200510784A
TW200510784A TW093116646A TW93116646A TW200510784A TW 200510784 A TW200510784 A TW 200510784A TW 093116646 A TW093116646 A TW 093116646A TW 93116646 A TW93116646 A TW 93116646A TW 200510784 A TW200510784 A TW 200510784A
Authority
TW
Taiwan
Prior art keywords
color filter
photo
resin compositions
sensitive resin
compositions set
Prior art date
Application number
TW093116646A
Other languages
Chinese (zh)
Other versions
TWI359959B (en
Inventor
Satoru Tanaka
Original Assignee
Sumitomo Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co filed Critical Sumitomo Chemical Co
Publication of TW200510784A publication Critical patent/TW200510784A/en
Application granted granted Critical
Publication of TWI359959B publication Critical patent/TWI359959B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Structural Engineering (AREA)
  • Mathematical Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Architecture (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Polarising Elements (AREA)
  • Liquid Crystal (AREA)
  • Materials For Photolithography (AREA)

Abstract

A color filter having first color resin composition film, second color resin composition film and third color resin composition film, with its white display coordinate (U'white, V'white) and black display coordinate (U'biack, V'biack) calculated from the three tristimulus values [X, Y, Z] of each film located within the area formed by lines connecting coordinate P1 (0.18, 0.52), coordinate Q1 (0.25, 0.52), coordinate R1 (0.23, 0.42) and coordinate S1 (0.15, 0.42) is disclosed.
TW093116646A 2003-06-10 2004-06-10 Color filter, adjust method of photo-sensitive res TWI359959B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003165558 2003-06-10

Publications (2)

Publication Number Publication Date
TW200510784A true TW200510784A (en) 2005-03-16
TWI359959B TWI359959B (en) 2012-03-11

Family

ID=34509634

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093116646A TWI359959B (en) 2003-06-10 2004-06-10 Color filter, adjust method of photo-sensitive res

Country Status (3)

Country Link
KR (1) KR101021504B1 (en)
CN (1) CN100462796C (en)
TW (1) TWI359959B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI391743B (en) * 2009-01-23 2013-04-01 Au Optronics Corp High color expression display device and method for manufacturing the same
TWI670333B (en) * 2015-01-30 2019-09-01 Sumitomo Chemical Co., Ltd. Colored photosensitive resin composition

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4710703B2 (en) * 2006-04-21 2011-06-29 Ｊｓｒ株式会社 Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display element
US8796952B2 (en) * 2011-03-03 2014-08-05 Cree, Inc. Semiconductor light emitting devices having selectable and/or adjustable color points and related methods
KR101556817B1 (en) * 2011-03-23 2015-10-01 주식회사 엘지화학 Stereoscopic image dislcay device

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08278405A (en) * 1995-04-05 1996-10-22 Kimoto & Co Ltd Optical filter
JP3146138B2 (en) * 1995-08-30 2001-03-12 シャープ株式会社 Reflective liquid crystal display device and information terminal equipment
US6344887B1 (en) * 1999-09-10 2002-02-05 Yao-Dong Ma Full spectrum reflective choleterics display employing circular polarizers with the same polarity but different disposition
JP2001330822A (en) * 2000-03-14 2001-11-30 Seiko Epson Corp Liquid crystal display and electronic equipment
JP2002071938A (en) * 2000-06-15 2002-03-12 Toray Ind Inc Color filter and liquid crystal display device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI391743B (en) * 2009-01-23 2013-04-01 Au Optronics Corp High color expression display device and method for manufacturing the same
TWI670333B (en) * 2015-01-30 2019-09-01 Sumitomo Chemical Co., Ltd. Colored photosensitive resin composition

Also Published As

Publication number Publication date
CN1573472A (en) 2005-02-02
KR101021504B1 (en) 2011-03-16
TWI359959B (en) 2012-03-11
KR20040111030A (en) 2004-12-31
CN100462796C (en) 2009-02-18

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Legal Events

Date Code Title Description
MK4A Expiration of patent term of an invention patent