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TW200508648A - Antireflection coating, antireflection film, polar plate, image display device and hard-coat treated article - Google Patents

Antireflection coating, antireflection film, polar plate, image display device and hard-coat treated article

Info

Publication number
TW200508648A
TW200508648A TW093119047A TW93119047A TW200508648A TW 200508648 A TW200508648 A TW 200508648A TW 093119047 A TW093119047 A TW 093119047A TW 93119047 A TW93119047 A TW 93119047A TW 200508648 A TW200508648 A TW 200508648A
Authority
TW
Taiwan
Prior art keywords
antireflection
hard
display device
image display
coating
Prior art date
Application number
TW093119047A
Other languages
Chinese (zh)
Inventor
Akihiro Matsufuji
Tatsuhiko Obayashi
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of TW200508648A publication Critical patent/TW200508648A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
    • C09D175/04—Polyurethanes
    • C09D175/14—Polyurethanes having carbon-to-carbon unsaturated bonds
    • C09D175/16—Polyurethanes having carbon-to-carbon unsaturated bonds having terminal carbon-to-carbon unsaturated bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/46—Antireflective coatings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Laminated Bodies (AREA)
  • Polarising Elements (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

To provide a coating type antireflection coating suitable for mass production, an antireflection coating having lower reflectivity and excellent scratching resistance, an antireflection film comprising the antireflection coating provided on a transparent support, as well as provide an image display device having a surface with excellent scratching resistance and refection resistance, and a hard-coat treated article. The antireflection coating having a cured coating formed from a curing composition consisting of a copolymer (P) comprising a polymerization unit of a fluorine-containing monmer and a polymerization unit having an ethylene-based unsaturated group on the side chain and only a carbon atom on the main chain, and a curing resin comprising 2 or more ethylene-based unsaturated groups within the same molecule; as well as an antireflection film comprising the antireflection coating provided on a transparent support, an image display device composed of the antireflection film, and a hard-coat treated article.
TW093119047A 2003-07-24 2004-06-29 Antireflection coating, antireflection film, polar plate, image display device and hard-coat treated article TW200508648A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003279009A JP2005043749A (en) 2003-07-24 2003-07-24 Antireflection coating, antireflection film, polarizing plate, image display device and hard-coated article

Publications (1)

Publication Number Publication Date
TW200508648A true TW200508648A (en) 2005-03-01

Family

ID=34265250

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093119047A TW200508648A (en) 2003-07-24 2004-06-29 Antireflection coating, antireflection film, polar plate, image display device and hard-coat treated article

Country Status (3)

Country Link
JP (1) JP2005043749A (en)
KR (1) KR20050012148A (en)
TW (1) TW200508648A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI407159B (en) * 2005-04-15 2013-09-01 Nitto Denko Corp Uv-absorbing layer for polarizer plate
TWI421864B (en) * 2007-12-27 2014-01-01 Taiyo Yuden Kk Information recording media and its manufacturing method
TWI448720B (en) * 2008-03-31 2014-08-11 Nof Corp Antireflection material and electronic image display apparatus having the antireflection material
TWI628456B (en) * 2012-03-23 2018-07-01 凸版印刷股份有限公司 Antireflective film
TWI718535B (en) * 2018-05-18 2021-02-11 南韓商Ｌｇ化學股份有限公司 Anti-reflective film, polarizing plate, and display apparatus
CN112941922A (en) * 2021-01-29 2021-06-11 广州新莱福新材料股份有限公司 Projection cloth and preparation method thereof

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006328341A (en) * 2005-04-28 2006-12-07 Jsr Corp Ethylenically unsaturated group-containing fluorine-containing polymer having high fluorine content, and method for producing the same
JP2007052282A (en) * 2005-08-18 2007-03-01 Bridgestone Corp Film for plasma display
US7553543B2 (en) * 2005-12-16 2009-06-30 E. I. Du Pont De Nemours And Company Composite structure having a fluoroelastomeric anti-reflective coating with non-fluorinated cross-linking
JP2007277504A (en) * 2006-03-15 2007-10-25 Jsr Corp Curable resin composition and antireflection film
JP2007262202A (en) * 2006-03-28 2007-10-11 Jsr Corp Curable resin composition, cured film and anti-reflection film
JP4740184B2 (en) 2006-05-16 2011-08-03 日東電工株式会社 Polarizing plate and image display device using the same
US8034434B2 (en) 2007-02-09 2011-10-11 Mitsubishi Rayon Co., Ltd. Transparent molded body and antireflective member using the same
JP2009221475A (en) * 2008-02-21 2009-10-01 Nippon Shokubai Co Ltd Curable resin composition and cured product
JP2009221474A (en) * 2008-02-21 2009-10-01 Nippon Shokubai Co Ltd Curable resin composition and cured product
JP2011048000A (en) * 2009-08-25 2011-03-10 Dainippon Printing Co Ltd Antireflection film, polarizing plate, and display device
JP5817059B2 (en) * 2011-09-06 2015-11-18 株式会社ミマキエンジニアリング UV ink printing method
JP2015024498A (en) * 2013-06-17 2015-02-05 富士フイルム株式会社 Substrate with decorative material pattern and method for producing the same, multilayer material for forming decorative material, and decorative material pattern-containing multilayer material for forming decorative material
KR101692182B1 (en) * 2013-06-18 2017-01-02 코니카 미놀타 가부시키가이샤 Organic light-emitting element
JP2016156844A (en) * 2013-07-01 2016-09-01 旭硝子株式会社 Fluorine-containing polymer, hard coat layer formation composition and article having hard coat layer
JP2016045230A (en) * 2014-08-20 2016-04-04 大日本印刷株式会社 Front plate for display device and manufacturing method of the same
JP2018183877A (en) * 2015-09-24 2018-11-22 日本製紙株式会社 Hard coat film
JP6707966B2 (en) 2016-04-18 2020-06-10 日本電気硝子株式会社 Shading plate
WO2025070147A1 (en) * 2023-09-29 2025-04-03 富士フイルム株式会社 Cured film, optical film, and image display device

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003026732A (en) * 2001-04-13 2003-01-29 Fuji Photo Film Co Ltd Fluorinated copolymer, film-forming composition, reflection-preventive membrane, reflection-preventive film and image display device

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI407159B (en) * 2005-04-15 2013-09-01 Nitto Denko Corp Uv-absorbing layer for polarizer plate
US8709192B2 (en) 2005-04-15 2014-04-29 Nitto Denko Corporation Protective cover sheet comprising a UV-absorbing layer for a polarizer plate and method of making the same
TWI421864B (en) * 2007-12-27 2014-01-01 Taiyo Yuden Kk Information recording media and its manufacturing method
TWI448720B (en) * 2008-03-31 2014-08-11 Nof Corp Antireflection material and electronic image display apparatus having the antireflection material
TWI628456B (en) * 2012-03-23 2018-07-01 凸版印刷股份有限公司 Antireflective film
TWI718535B (en) * 2018-05-18 2021-02-11 南韓商Ｌｇ化學股份有限公司 Anti-reflective film, polarizing plate, and display apparatus
US11732142B2 (en) 2018-05-18 2023-08-22 Lg Chem, Ltd. Anti-reflective film, polarizing plate, and display apparatus
CN112941922A (en) * 2021-01-29 2021-06-11 广州新莱福新材料股份有限公司 Projection cloth and preparation method thereof

Also Published As

Publication number Publication date
KR20050012148A (en) 2005-01-31
JP2005043749A (en) 2005-02-17

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