TW200508375A - Cerium-based abrasive containing fluorine and method of producing the same - Google Patents
Cerium-based abrasive containing fluorine and method of producing the sameInfo
- Publication number
- TW200508375A TW200508375A TW093119008A TW93119008A TW200508375A TW 200508375 A TW200508375 A TW 200508375A TW 093119008 A TW093119008 A TW 093119008A TW 93119008 A TW93119008 A TW 93119008A TW 200508375 A TW200508375 A TW 200508375A
- Authority
- TW
- Taiwan
- Prior art keywords
- particle size
- cerium
- based abrasive
- abrasive
- treo
- Prior art date
Links
- 229910052684 Cerium Inorganic materials 0.000 title abstract 4
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 title abstract 4
- 238000000034 method Methods 0.000 title abstract 4
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 title abstract 2
- 229910052731 fluorine Inorganic materials 0.000 title abstract 2
- 239000011737 fluorine Substances 0.000 title abstract 2
- 239000002245 particle Substances 0.000 abstract 7
- 229910052776 Thorium Inorganic materials 0.000 abstract 2
- 229910052770 Uranium Inorganic materials 0.000 abstract 2
- 238000005299 abrasion Methods 0.000 abstract 2
- ZSLUVFAKFWKJRC-IGMARMGPSA-N 232Th Chemical compound [232Th] ZSLUVFAKFWKJRC-IGMARMGPSA-N 0.000 abstract 1
- 230000007423 decrease Effects 0.000 abstract 1
- 229910001404 rare earth metal oxide Inorganic materials 0.000 abstract 1
- JFALSRSLKYAFGM-UHFFFAOYSA-N uranium(0) Chemical compound [U] JFALSRSLKYAFGM-UHFFFAOYSA-N 0.000 abstract 1
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
- Polishing Bodies And Polishing Tools (AREA)
Abstract
The disclosed is a cerium-based abrasive, which contains fluorine and has a 90wt% or more mass ratio of a reduced mass of a total rare earth oxide (TREO) to an abrasive mass, a 0.05wt% or less mass ratio of a total content of Th and U to the TREO ((Th+U)/TREO), and an average particle size according to Blaine's method (DB) of 1.5μm to 2.5μm. The cerium-based abrasive in which the particle size had been set based on the average particle size according to Blaine's method (DB) has been controlled in terms of particle size distribution of the abrasive particles so that necessary abrasion rate can be secured. Therefore, application of the average particle size according to Blaine's method (DB) to standards for setting particle size decreases content of elements such as thorium and uranium and provides a cerium-based abrasive having a higher abrasion rate.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003301327A JP3875668B2 (en) | 2003-08-26 | 2003-08-26 | Cerium-based abrasive containing fluorine and method for producing the same |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200508375A true TW200508375A (en) | 2005-03-01 |
TWI249570B TWI249570B (en) | 2006-02-21 |
Family
ID=34405981
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW93119008A TWI249570B (en) | 2003-08-26 | 2004-06-29 | Cerium-based abrasive containing fluorine and method of producing the same |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP3875668B2 (en) |
CN (1) | CN1300278C (en) |
TW (1) | TWI249570B (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3929481B2 (en) * | 2005-04-04 | 2007-06-13 | 昭和電工株式会社 | Cerium oxide-based abrasive, its production method and use |
JP5512962B2 (en) * | 2008-12-08 | 2014-06-04 | 三井金属鉱業株式会社 | Cerium-based abrasive containing fluorine and sulfur |
PH12013501563A1 (en) | 2011-01-25 | 2016-09-23 | Konica Minolta Inc | Fine abrasive particles and method for producing same |
JP6017315B2 (en) * | 2011-01-27 | 2016-10-26 | 株式会社フジミインコーポレーテッド | Abrasive material and polishing composition |
JP6839767B2 (en) * | 2017-09-11 | 2021-03-10 | 昭和電工株式会社 | Method for manufacturing raw materials for cerium-based abrasives, and method for manufacturing cerium-based abrasives |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09183966A (en) * | 1995-12-29 | 1997-07-15 | Seimi Chem Co Ltd | Production of cerium abrasive |
JP3600725B2 (en) * | 1998-03-24 | 2004-12-15 | 三井金属鉱業株式会社 | Manufacturing method of cerium-based abrasive |
JP2001152134A (en) * | 1999-11-22 | 2001-06-05 | Speedfam Co Ltd | Composition and process for grinding oxide single crystal wafer |
TW586157B (en) * | 2000-04-13 | 2004-05-01 | Showa Denko Kk | Slurry composition for polishing semiconductor device, and method for manufacturing semiconductor device using the same |
JP3838870B2 (en) * | 2000-12-11 | 2006-10-25 | 三井金属鉱業株式会社 | Method for producing raw material for cerium-based abrasive and raw material for cerium-based abrasive produced by the method |
EP1285956A4 (en) * | 2000-05-16 | 2004-09-29 | Mitsui Mining & Smelting Co | Cerium based abrasive material, raw material thereof and method for their preparation |
AU2002218517A1 (en) * | 2000-11-30 | 2002-06-11 | Showa Denko K K | Cerium-based abrasive and production process thereof |
JP3694478B2 (en) * | 2000-11-30 | 2005-09-14 | 昭和電工株式会社 | Cerium-based abrasive and method for producing the same |
-
2003
- 2003-08-26 JP JP2003301327A patent/JP3875668B2/en not_active Expired - Lifetime
-
2004
- 2004-06-29 TW TW93119008A patent/TWI249570B/en not_active IP Right Cessation
- 2004-08-26 CN CNB2004100685518A patent/CN1300278C/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP3875668B2 (en) | 2007-01-31 |
CN1300278C (en) | 2007-02-14 |
TWI249570B (en) | 2006-02-21 |
CN1597829A (en) | 2005-03-23 |
JP2005068312A (en) | 2005-03-17 |
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