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TW200504467A - Coloring photosensitive resin composition - Google Patents

Coloring photosensitive resin composition

Info

Publication number
TW200504467A
TW200504467A TW093117027A TW93117027A TW200504467A TW 200504467 A TW200504467 A TW 200504467A TW 093117027 A TW093117027 A TW 093117027A TW 93117027 A TW93117027 A TW 93117027A TW 200504467 A TW200504467 A TW 200504467A
Authority
TW
Taiwan
Prior art keywords
rpm
photosensitive resin
resin composition
measured
coloring photosensitive
Prior art date
Application number
TW093117027A
Other languages
Chinese (zh)
Other versions
TWI342983B (en
Inventor
Koji Ichikawa
Original Assignee
Sumitomo Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co filed Critical Sumitomo Chemical Co
Publication of TW200504467A publication Critical patent/TW200504467A/en
Application granted granted Critical
Publication of TWI342983B publication Critical patent/TWI342983B/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/23—Photochromic filters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/74—Applying photosensitive compositions to the base; Drying processes therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

This invention provides a coloring photosensitive resin composition containing a coloring agent (A), a binder polymer (B), a photo polymerizing compound (C), a photo polymerizing initiator (D), a solvent (E), and a surfactant (F). The composition has such property that, when X is a viscosity of the composition measured at 23 DEG C, after being set still, with a rotary viscosimeter with its rotor rotating at 10 rpm, Y is a viscosity measured with the rotary viscosimeter with its rotor rotating at 10 rpm after having rotated at 100 rpm for 1 min., the value of Y/X being 0.97 < Y/X < 1.01 with X and Y each measured less than l0rnPa.S. When a coating layer is formed by using such a solution saving coaler as a slit coaler, a coating film of excellent uniformity can be obtained.
TW093117027A 2003-07-16 2004-06-14 Coloring photosensitive resin composition TWI342983B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003197752 2003-07-16

Publications (2)

Publication Number Publication Date
TW200504467A true TW200504467A (en) 2005-02-01
TWI342983B TWI342983B (en) 2011-06-01

Family

ID=34587132

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093117027A TWI342983B (en) 2003-07-16 2004-06-14 Coloring photosensitive resin composition

Country Status (3)

Country Link
KR (1) KR101096838B1 (en)
CN (1) CN100592205C (en)
TW (1) TWI342983B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI397768B (en) * 2008-02-13 2013-06-01 Fujifilm Corp Colored photosensitive composition, color filter and method of producing thereof

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4657808B2 (en) * 2005-05-24 2011-03-23 東京応化工業株式会社 Photosensitive composition and color filter formed from the photosensitive composition
KR101314033B1 (en) * 2005-06-15 2013-10-01 제이에스알 가부시끼가이샤 Photosensitive resin composition, method for forming spacer for display panel
JP4828275B2 (en) * 2006-03-30 2011-11-30 新日鐵化学株式会社 Light-shielding resin composition for color filter and color filter
JP5117002B2 (en) * 2006-07-10 2013-01-09 富士フイルム株式会社 Photocurable composition and pattern forming method using the same
JP2008070480A (en) * 2006-09-12 2008-03-27 Az Electronic Materials Kk Photoresist solvent and slit coating photoresist composition using the same
WO2010090406A2 (en) * 2009-02-04 2010-08-12 동우화인켐 주식회사 Colored photosensitive resin composition, color filter, and liquid crystal display device comprising same
KR102654926B1 (en) * 2016-08-10 2024-04-05 삼성디스플레이 주식회사 Photoresist composition and method for forming a metal pattern using the same
KR101933940B1 (en) * 2018-01-31 2018-12-31 동우 화인켐 주식회사 Colored photosensitive resin composition, color filter comprising black matrix and/or column spacer produced using the same, and image display device including color filter

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4346230B2 (en) * 2000-09-12 2009-10-21 三菱化学株式会社 Color filter composition and color filter
JP2002372779A (en) * 2001-06-15 2002-12-26 Toray Ind Inc Resist for color filter and method for producing color filter

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI397768B (en) * 2008-02-13 2013-06-01 Fujifilm Corp Colored photosensitive composition, color filter and method of producing thereof

Also Published As

Publication number Publication date
KR20050009175A (en) 2005-01-24
TWI342983B (en) 2011-06-01
KR101096838B1 (en) 2011-12-22
CN1577089A (en) 2005-02-09
CN100592205C (en) 2010-02-24

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Legal Events

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MK4A Expiration of patent term of an invention patent