TW200500798A - Inorganic material film, inorganic material film structure, manufacturing process thereof, and transfer film - Google Patents
Inorganic material film, inorganic material film structure, manufacturing process thereof, and transfer filmInfo
- Publication number
- TW200500798A TW200500798A TW093114346A TW93114346A TW200500798A TW 200500798 A TW200500798 A TW 200500798A TW 093114346 A TW093114346 A TW 093114346A TW 93114346 A TW93114346 A TW 93114346A TW 200500798 A TW200500798 A TW 200500798A
- Authority
- TW
- Taiwan
- Prior art keywords
- inorganic material
- material film
- photosensitive composition
- film
- manufacturing process
- Prior art date
Links
- 229910010272 inorganic material Inorganic materials 0.000 title abstract 8
- 239000011147 inorganic material Substances 0.000 title abstract 8
- 238000004519 manufacturing process Methods 0.000 title abstract 3
- 239000000203 mixture Substances 0.000 abstract 4
- 238000001354 calcination Methods 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 239000011800 void material Substances 0.000 abstract 2
- 239000011247 coating layer Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 239000000843 powder Substances 0.000 abstract 1
- 238000011282 treatment Methods 0.000 abstract 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65B—MACHINES, APPARATUS OR DEVICES FOR, OR METHODS OF, PACKAGING ARTICLES OR MATERIALS; UNPACKING
- B65B31/00—Packaging articles or materials under special atmospheric or gaseous conditions; Adding propellants to aerosol containers
- B65B31/04—Evacuating, pressurising or gasifying filled containers or wrappers by means of nozzles through which air or other gas, e.g. an inert gas, is withdrawn or supplied
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B15/00—Details of spraying plant or spraying apparatus not otherwise provided for; Accessories
Landscapes
- Dispersion Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Materials For Photolithography (AREA)
- Silicon Compounds (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Gas-Filled Discharge Tubes (AREA)
- Formation Of Insulating Films (AREA)
- Liquid Crystal (AREA)
- Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Laminated Bodies (AREA)
Abstract
Provided are an inorganic material film having a low dielectric constant and a high precision fine structure, an inorganic material film structure, a manufacturing process thereof, and a transfer film which can be easily produced, having good adhesion to a substrate, and having a photosensitive composition of good developability. The inorganic material film is a porous inorganic material film obtained by calcining a photosensitive composition containing at an inorganic powder. The inorganic material film has a void area ratio of 5 to 75% and a void size of O.1 to 30μm A process for manufacturing the inorganic material film structure by providing the photosensitive composition on a substrate, subjecting it to exposure and development treatments to form a pattern and then calcining it. A transfer film having a coating layer containing the above photosensitive composition on a flexible temporary support.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003146327A JP3804016B2 (en) | 2003-05-23 | 2003-05-23 | Inorganic material film, inorganic material film structure, method for producing the same, and transfer film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW200500798A true TW200500798A (en) | 2005-01-01 |
Family
ID=33533208
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW093114346A TW200500798A (en) | 2003-05-23 | 2004-05-21 | Inorganic material film, inorganic material film structure, manufacturing process thereof, and transfer film |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP3804016B2 (en) |
| KR (1) | KR20040100957A (en) |
| TW (1) | TW200500798A (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7214466B1 (en) * | 2005-12-14 | 2007-05-08 | E. I. Du Pont De Nemours And Company | Cationically polymerizable photoimageable thick film compositions, electrodes, and methods of forming thereof |
| JP2007287559A (en) * | 2006-04-19 | 2007-11-01 | Sony Corp | Plasma display panel and method of manufacturing the same |
| JP4917466B2 (en) * | 2007-03-30 | 2012-04-18 | 日本電信電話株式会社 | Thin film formation method |
| KR100936518B1 (en) * | 2008-09-19 | 2010-01-13 | 재단법인대구경북과학기술원 | Curable composition for liquid crystal display and liquid crystal display comprising barrier rib and alignment layer manufactured using the same |
| JP5524776B2 (en) * | 2010-09-10 | 2014-06-18 | 日本電信電話株式会社 | Thin film forming method and sheet film |
| JPWO2015041007A1 (en) * | 2013-09-20 | 2017-03-02 | 並木精密宝石株式会社 | SUBSTRATE AND MANUFACTURING METHOD THEREOF, LIGHT EMITTING ELEMENT AND ITS MANUFACTURING METHOD, AND DEVICE HAVING THE SUBSTRATE OR LIGHT EMITTING ELEMENT |
| JP2018110137A (en) * | 2015-03-19 | 2018-07-12 | アダマンド並木精密宝石株式会社 | SUBSTRATE AND ITS MANUFACTURING METHOD, LIGHT EMITTING ELEMENT AND ITS MANUFACTURING METHOD, AND APPARATUS HAVING THE SUBSTRATE OR LIGHT EMITTING ELEMENT |
| JP7434736B2 (en) * | 2019-06-28 | 2024-02-21 | Ｔｏｐｐａｎホールディングス株式会社 | Light control sheet and light control device |
-
2003
- 2003-05-23 JP JP2003146327A patent/JP3804016B2/en not_active Expired - Fee Related
-
2004
- 2004-05-18 KR KR1020040035155A patent/KR20040100957A/en not_active Application Discontinuation
- 2004-05-21 TW TW093114346A patent/TW200500798A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| JP2004345917A (en) | 2004-12-09 |
| KR20040100957A (en) | 2004-12-02 |
| JP3804016B2 (en) | 2006-08-02 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP2637062A3 (en) | Pattern forming method | |
| TW200801788A (en) | Resist underlayer coating forming composition for mask blank, mask blank and mask | |
| EP1248305A3 (en) | Method of forming magnetic memory | |
| TW200734825A (en) | Silicon-containing resist underlayer coating forming composition for forming resist under-layer coating of photo-crosslink cure | |
| TW200801801A (en) | Process for producing patterned film and photosensitive resin composition | |
| TW200710580A (en) | Resist underlayer coating forming composition for forming photocrosslinking curable resist underlayer coating | |
| EP1845416A3 (en) | Coating compositions for photolithography | |
| JPS57130430A (en) | Pattern formation | |
| TW553823B (en) | Casting film for producing ceramic green sheet and process for producing the casting film | |
| TW200500798A (en) | Inorganic material film, inorganic material film structure, manufacturing process thereof, and transfer film | |
| JPS57202537A (en) | Resist composition for dry development | |
| TW200506538A (en) | Resist pattern thickening material, process for forming resist pattern using the same, and process for manufacturing semiconductor device using the same | |
| WO2005004210A3 (en) | Imprint lithography process and sensor | |
| TW200503046A (en) | Inorganic material film, inorganic material film structure, manufacturing process thereof, and transfer film | |
| TW200502434A (en) | Adhesive layer forming method | |
| JPS5687471A (en) | Coating process | |
| TW200608575A (en) | Preparation method of thin film transistor and its structure | |
| JPS53120527A (en) | Forming method of positive type radiation sensitive material layer | |
| JPS6461025A (en) | Method of finely processing polyimide film | |
| JPS5515149A (en) | Forming method of resist for microfabrication | |
| TW200710942A (en) | Method for fabricating semiconductor device including resist flow process and film coating process | |
| JPS5224084A (en) | Semiconductor manufacturing rpocess | |
| JPS5580323A (en) | Pattern forming method for photoresist-film | |
| EP1143297A3 (en) | Method for forming pattern | |
| TW364204B (en) | Method for producing semiconductor capacitor of the semiconductor and its eletrode plate |