TW200400346A - Multiple degree of freedom interferometer - Google Patents

Abstract

An apparatus includes a multi-axis interferometer for measuring a relative position of a reflective measurement object along multiple degrees of freedom, wherein the interferometer is configured to produce multiple output beams each comprising information about the relative position of the measurement object with respect to a different one of the degrees of freedom. Each output beam includes a beam component that contacts the measurement object at least one time along a common path, and at least one of the beam components further contacts the measurement object at least a second time along a first path different from the common path.

Description

200400346 V. Description of the invention (1) Technical field to which the invention belongs The present invention relates to an interferometer, and in particular to an interferometer with multiple free-form measurement, for measuring a plane mirror measuring object. The prior art displacement measurement interferometer monitor moves its position between the measurement object and the reference object based on the optical interference signal. The interferometer generates the optical interference signal by overlapping and interfering with a measurement beam reflected from a measurement object and a reference beam reflected from a reference object. In many examples, the measurement beam and the reference beam have polarization directions perpendicular to each other, and different frequencies. The different frequencies can be achieved by, for example, laser Zeeman splitting,

Acousto-optical modulation or birefringent element inside the laser to generate. The vertical polarization allows a polarized beam to split to guide the measurement beam and the reference beam to the measurement object and the reference object, and combines the reflected measurement beam and the reference beam to form an overlapping measurement beam and Reference beam. The overlapping beams form an output beam and pass through a polarizer. The polarizer mixes the polarizations of the measurement beam and the reference beam to form a mixed beam. The measurement beam and the reference beam in the mixed beam will interfere with each other, so the intensity of the mixed beam changes with the relative phase change of the measurement beam and the reference beam. A sensor measures the time-varying intensity of the mixed light beam, and generates an electronic interference signal according to the ratio of the intensity. Because the measuring beam and the reference beam have different frequencies, the interference signal includes a "heterodyne"

1057-5464-PF (Nl) .ptd Page 5 200400346 V. Description of the invention (2) The M signal has a frequency equal to the frequency of the measurement beam and the reference beam. If the path length of the measurement beam and the reference beam passes Adjust, ° For example, by adjusting the platform that contains the measurement object, make the measurement: include the Doppler shift (Doppler shift) equal to 2 ynp /; l, where Velocity, λ is the wavelength of the measuring beam and the parameter is the wavelength of the beam, η is the refractive index of the medium through which the beam passes, such as > air \ first or vacuum, and P is the number of times passing through the reference object and the measurement object . ^ The phase change of the measured reference signal is converted to the relative bit 2 of the measured object; the phase change of τ is equal to the change in the length of / (叩 ^ 礼, where L is the change in the distance around the circle, including the quantity The distance around the platform of the object to be measured. No: Yes, the tuan equation may not always be correct. In addition, the amount of the measurement reference signal may change. The amplitude of the change will reduce the accuracy of the phase change. Many Interferometers have non-linear characteristics such as the so-called "periodic error cycl ic errors". This cyclic error can be measured by the phase or the intensity of the reference signal and the long-term change in the optical path. It has a sinusoidal dependency. In particular, the first harmonic has two cycles ^ ^ has a sinusoidal dependency on (2; rpnL) / A, and the periodic error of the second harmonic has a sinusoidal dependency on 2 (2 TrpnL ) / Long. Higher harmonic errors can also be expressed in this way. ^ Tian may also have "non-periodic nonlinearity", such as the lateral direction of the reference beam and the measurement beam in the output beam of the interferometer Displacement (such as " 光 $ 变 beam shear "), When the wave front of the beam and the measuring light beam having a wave wave INTRODUCTION the error (w a v e f r ο n t e r r square r s). This phenomenon is explained by the following. Fans

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200400346 V. Description of the invention (3) The inhomogeneities in the interferometer instrument will cause the wavefront error of the reference beam and the measurement beam. When the reference beam and the measurement beam pass through these uneven materials in the same straight line, the same wavefront error will occur and the interference signals will cancel each other out. In addition, the reference beam and the measurement beam in the output beam are laterally shifted from each other, such as relative beam shear. This beam shearing causes wavefront errors and causes errors in the interference signals obtained from the output beam.

In addition, in many interference systems, the beam shear varies with the position or angle of the measurement object. For example, a change in the angular orientation of a flat mirror measuring object will cause relative beam shear. Therefore, the angle change of the measurement object will cause corresponding errors in the interference signal. Beam combined output optical interference signal measurement, which can or will affect the detection difference, when the interference signal interferes with the fruit machine beam and the amount of color shears to change the steps of the beam by passing the mixed light It also depends on the system of the error signal used for the optical fiber, the measurement of the beam divergence measurement and the wavefront error step and detection. The mixed beam is captured by the mixed beam, and the mixed beam is intercepted into the optical fiber. The mixed beam is truncated due to the mixed amplitude change. For example, in the output beam, the optical path length of the mixed output beam to obtain an electron output beam can be used. A detector focuses on the detector for measurement, a single-mode or multi-mode optical fiber combined beam. Beam Shearing and Beam Stop Nature. Generally, when the output beam is guided to the detector, the 〇 is the net knot generated by the sum of many mechanisms, and the relative beam shear in the reference light caused by the rotation of the measurement object.

, Then use a composite wavelength, such as 5 32nm

200400346 V. Description of the invention (4) and 1064nm, to measure the gas in the measuring path of the dispersion interferometer. The dispersion measurement can be used to convert an optical path length measured with a displacement measurement interferometer into a physical length. This conversion is important because it can be caused by airflow disturbances or uneven density. Affected optical path length

Change to a fixed physical length. X The interferometer mentioned above is usually a component, and the scanner or stepper forms an integrated circuit. The lithography system holds the wafer; a focusing device circle; a scanning or stepping system, and at least one interferometer. Each receiver receives a reflected measuring beam, and the interferometer measures the reflected measuring beam with the interferometer and accurately measures the change. The interferometer causes the exposure area in the lithographic system beam. In many lithography systems and at least one plane mirror, the amount of change is reflected ', such as the height of a platform or the direction of a mirror after reflection. Such as the beam will reduce the measurement beam to overlap. In addition, the measurement beam is transmitted in a manner and its wavefront is formed. The measurement beam and the reference scanner or stepper system are important for lithography to include a cocoa on a wafer. Move the platform to support 'to direct the radiation beam to the crystal to move the platform closer to the radiation beam; the instrument guides a measurement beam to and is connected to a plane mirror of the platform. Each reference beam interferes with each other, and the position of the platform relative to the radiation beam can accurately control the wafer in the radiation. In other applications, the measurement object includes a measurement beam. The slight angular deflection of the measurement object will cause the measurement beam to be uncompensated from the flat fruit. The changing measurement and the weight of the reference beam in the interferometer will not be parallel to each other when the reference beam It will not be aligned. Because the interference between the beams will be along the mixed light

〇 57.5464.PF (Nl) .ptd Page 8 200400346 V. Description of the invention (5) The cross section of the beam changes, so the interference information measured by the detector will be damaged. In order to cope with this problem, the conventional interferometer has a retroreflector to redirect the measurement beam back to the plane mirror, whereby the measurement beam " twice passes through the double pass " the interferometer The path to the measurement object. The retro-reflector makes the measurement less sensitive to changes in the angular rotation of the measurement object. However, even with retro-reflectors, the lateral position of the measurement beam is still sensitive to changes in the angular rotation of the measurement object. In addition, the path of the measurement beam passes through the optical device in the interferometer, and this path is also sensitive to changes in the angular rotation of the measurement object. In general, the interference system is used to measure the position of the wafer platform along multiple measurement axes. For example, a Karst coordinate system is set so that the wafer platform is located on the χ-y plane. The measurement is mainly aimed at the position of the platform on the x-y axis and the angular orientation of the platform in the z-axis. At this time, the platform moves on the x-y plane. In addition, it can monitor the tilt of the wafer platform outside the χ-y plane. For example, 'these skewed features can be used to calculate Abbe of fset errors at the x-y position. The sixth degree of freedom is generated due to the position of 啬, 豆 啬 啬 古. ^, ^ #, (J /; b, ^ in the z-axis direction. In order to measure each degree of freedom directly, an interferometer is used Monitor the axial displacement of the coordinate. For example, in a system measuring the x-y position of the platform and the rotational orientation in the x, y, and z directions, at least three particularly independent measurement beams are reflected from one side of the wafer platform, and At least two particularly independent measuring beams are reflected from the other side. See, for example, US Pat. No. 5,804,832

l〇57-5464-PF (Nl) .ptd Η p. 9 200400346

V. Description of the invention (6) The device & method for projecting the photomask pattern on the substrate by using five measuring axes, the contents of which are referred to here. Each measurement beam is combined with a reference beam to monitor the change in optical path length in the corresponding axis. Since different amounts of light beams are in contact with the wafer platform at different positions, the wafer platform can derive the angular orientation by using the appropriate optical path length measurement results. Therefore, it can monitor every degree of freedom. The system includes at least one measuring beam, and the chirped beam contacts the wafer platform. In addition, as described above, each measurement beam can pass through the wafer platform twice to prevent the angle of the wafer platform from affecting the interference signal. The measuring beam can be a multi-weight measuring beam produced by a multi-axis interferometer produced by a physical separation interferometer. SUMMARY OF THE INVENTION The present invention is characterized by a plane mirror measuring a single optical assembly. Multiple output beams, each-beam path through which the measurement object is generated from non-cyclic errors from different sources (cosine) and wave front, caused by uneven glass and 'some contact with The positioning of the planar retro-reflector is less than the multiple degrees of freedom of the optical elements used. For example, the output beam for the measurement level includes one. As a result, such a degree of freedom of measurement can be determined by, for example, measuring a beam of a cosecant error, a qualitative beam shear, and a measurement of a mirror-measured object. Similarly, the number. The interferometer is used to reduce the non-cyclic relative misalignment correction factor, shear (beam and temperature ladder beams along the interferometer system) of the interferometer system. Derived from the same amount of metering in some productive errors will correspond to the degree of wave shear. And one or more systems usually reduce

1057-5464-PF (Nl) .ptd Page 10 200400346 V. Description of the Invention (7)

According to the measurement, the dry low (such as the source in the tester. From the multi-control, the beam is output. The current instrument used in the system for the interference includes jfeL-a parent j object to the path phase. The interferometer is a flat mirror. The beam interferometer of the measuring interferometer system, such as the overall beam shearing interferometer system, has multiple degrees of freedom to reduce the incidence angle of the multi-axis interference. Generally speaking, the multi-axis integration is based on the setting of multiple measuring beams along the multi-meter system. The system can be set to change the measurement system, but also to change the system, and the system can also measure the change, such as the whole changer system. The interferometer is different. The invention uses the measurement to produce the measurement object to make the angle and Set to one or more bits that have the measured linearity so that multiple beam shift combinations are input. Beam to plane mirror controlled by multiple longitudinal elements. Cyclic error output beam changes towards a beam and changes in the sensing object. When tilting, the semiconductor wafer beam writing system is controlled by the degree of freedom system to reduce the sense of falling objects. The lithography system is used to input 0 to the measured device. (Removal of related instrument systems) Beam Shearing, when it can be combined with the system also has the form and characteristics. It is characterized by a device that includes a relative position of multi-axis interference, where ′ is the position of each output beam. One of the quantities along with the common and as a kind of non-necessary rotation and measurement by one or more plane mirrors can be incorporated into one

The embodiment of measuring multiple reflections and measuring multiple output beams should include a single beam component along a common and the beam touches the device in a separate path. The embodiment may include any one time at least. Relative to the path of the measured object

At least features. The output beam including a beam component that contacts the measurement object along the common path and the first path may further include a second beam component that is not in contact with the measurement object.

〇57-5464-PF (Nl) .ptd Page 11 200400346 V. Description of the invention (8) One of these degrees of freedom may be the distance along a first measurement axis to the measurement object. For example, the output beam containing information about the distance along the first measurement axis to the measurement object may include the beam component along the common path and the first path that contacts the measurement object. In this embodiment, the first position is defined by the common path and the first path. For example, each point on the first measurement axis is equidistant from the common path and the first waypoint. We W ^ and the amount is more along the path of the distance between the object and the second object. The definition of the distance including the beam component is the same as that of the distance including the component along the common angle, and the path follows the output along the path. The first path follows the round, and the first difference is the same. The path beam can be heard, the third quantity, the first measuring axis can define a first plane, in addition to the first measuring plane, the second measuring plane, the second measuring plane, and the second measuring plane can be included in the second measuring plane A second measurement is possible with respect to the beam. The beam can be different from the same path in the same path as the beam. The beam can be measured on the third axis of the second path and the plane includes the measurement axis along the measurement axis. The distance between the wheel and the first path includes the component, and the distance measurement of the second path is connected to the second path including the common difference along a first measurement axis. And the path contact is different from the three path contact-a third measurement of the common path. For example, outside, another light beam touches the path, the second measurement is the same path, and the third measurement object is on the measurement axis to the first and third measurement axes. _ The angle and orientation of the rotation axis are mentioned for the first time, along this and with the first light beam. As for the measurement axis, the quantity and the second component are more along at least the third light measurement object. The path and the second quantity can be related to the information of the output beam. Common path components differ

200400346 V. Description of the invention (9) The second path of another beam component is different, or the common path is different from the third component of the third component, and the third component is the third component. Three or more than the first, the multi-beam includes a multi-axis interferometer and seven less. The axis-mounted interferometer is along the total, wherein the other beam component is in contact with the second beam and may include two rotation axes. The angle of once mentioned that the interference with the exit axis of the light beam path and the interference of the free axis can provide a degree of measurement, and the measurement object can be placed in the same package. The first and the common paths may be the same as the paths. The first rotation defines a plane orthogonal. The object is relative to the information about the first spin. The path is in contact with the third output and the common beam is in contact with the measured object along the common path. The other beam component of the other beam component that touches the measured object component is along the common path. For example, the information about the second rotary car's production yield. Including a beam of light into the path phase, the second car can be a beam with a shaft phase beam and its beam diameter is different, and one of the beams can be orthogonally turned out, and each input component is orthogonal. The other zero component produces at least four output beams, each with different degrees of freedom information. And Shi Yanxi has at least five degrees of freedom, or even a flat mirror. The source is set to direct an input beam into the multi-component including two components with heterodyne frequency division. Each output beam further includes, for example, 'the components of the input beam have each other' = the device further includes a sensor setting to indicate the relative position of the measurement object with respect to different degrees of electrical freedom of the output beam fan by receiving sub-signals. Even ~

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200400346 V. Description of the Invention To this, the device further includes a polarization analyzer 'before each sensor, and is arranged to pass an interfer ermediate polarization to each of the output beams. Points S. Similarly, the Haihai device further includes a fiber optic pickup head (fiber_optic Pick-UP) for coupling each output beam to a corresponding sensor after it passes the corresponding polarization analyzer. The interferometer may be arranged to guide a first light beam from an input light beam to contact the measurement object along the common path, and after contacting the measurement object, the first light beam is divided into multiple sub-beams, wherein This secondary beam corresponds to

The beam component of the output beam that is in contact with the measurement object along the common path. Moreover, the interferometer may be arranged to guide at least one light beam to contact the measurement object along the first path at least a second time to define a light beam component that contacts the measurement object along the common path and the first path. Moreover, the interferometer can be set to obtain another beam from the input beam, and combine the beam that has been in contact with the measurement object twice to another beam to generate a first output beam 'where the first An output beam includes distance information along a measurement axis defined by the common path and the first path to the measurement object. Similarly, the interferometer can be set to direct at least one other light beam along a

The second path touches the measured object at least a second time, and the second path is different from the first road and the second road. For example, the interferometer can be set to enter from the wheel, beam to another set of sub-beams, and combine at least two every 4 beams that are in contact with the measurement object with other ~ sub-beams corresponding to it To generate a corresponding output beam. The chirped interferometer can also be set to get another set of sub-beams from this input beam.

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5. Description of the invention (π) Combine the secondary beam that has been in contact with the measurement object at least twice with the primary beam from another group to generate an output beam, and guide the other secondary beams from the other group along the common path. A different second path contacts the measurement object, and merges another secondary beam that contacts the measurement object along the common path with a secondary beam that contacts the measurement object along the second path to generate another Output beam. In the embodiment with the secondary beam, the interferometer can be set to i)

Combine the first beam with a primary reference beam after contacting the measurement object to define an intermediate beam; ii) divide the intermediate beam into a group of secondary measurement beams and a group of secondary reference beams; iii) guide Each time the measurement beam is to be in contact with the measurement object; iv) after each contact measurement beam is in contact with the measurement object and the corresponding reference beam to generate a pair of output beams, each time The beam corresponds to one of the different secondary measurement beams and the reference beam. The interferometer includes: a common polarized beam splitter set to guide a main measurement beam from an incident input beam along the common path to contact the measurement object; and a return beam assembly for receiving The polarization beam splits an intermediate beam of the main measurement beam, divides the intermediate beam into multiple beams, and directs the multiple beams back to the polarized beam splitting

Device. The polarized beam splitter can guide a main reference beam obtained from the incident input beam to contact a reflective reference, wherein the main measurement beam and the main reference beam correspond to orthogonal polarization components of the incident input beam. The polarized beam splitter is further used to combine the main measurement beam with the reference beam to form the intermediate beam after it contacts the measurement object and the reference object, respectively.

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In addition, the polarized beam splitter is arranged to i) divide the multiple beams into a group of secondary measurement beams and a group of secondary reference beams; Η) guide each of the secondary measurement beams to contact the measurement object; ii 丨) guide the secondary reference beam into contact with the reference object; and iv) combine each secondary measurement beam with the corresponding primary reference beam in contact with the measurement object and the reference object to form A corresponding output beam. In this embodiment t, each measurement beam can contact the measurement object along a path different from the common path. Moreover, the interferometer may include the reference. In addition, the reference object can correspond to another measurement object, such as a differential plane mirror interferometer. In either case, the reference may include a flat mirror. The interferometer further includes a quarter-wave retarder provided between the polarized beam splitter and the measurement object, and a quarter-wave retarder provided between the far-polarized beam splitter and The reference. The chirped interferometer further includes an input beam optical assembly having a non-polarized beam splitter, wherein the input beam optical assembly divides an original input beam into the first-mentioned input beam and a second input beam and The first input beam travels in parallel and guides the first and second input beams to the polarized beam splitter. The returning beam assembly includes at least one set of meandering optical systems and at least one non-polarized beam splitter for dividing the intermediate beam into multiple beams. For example, the set of meandering beams includes a retro-reflector to receive the intermediate beam before any non-polarized beam splitter. The returning beam assembly includes a beam splitter assembly having at least one non-polarized beam splitter, wherein the beam splitter

1057-5464-PF (Nl) .ptd Page 16 200400346 V. Description of the Invention (13) The reflector assembly receives the retro-reflector and directs the multiple beams along the intermediate beam splitter. The beam is a beam splitter. Similarly, the retro-reflection plate is separated from the light beam to reduce the retro-reflector. In other embodiments, the optical system and the distance measuring tortuous optical system include one of a half-wavelength retarder. polarity. The angle measurement of the distance measurement of the tortuous optical system includes a spectrometer that can be used to generate any multiple tortuous beams. The intermediate beam produces multiple beams. The beams are guided back in parallel to the polarizing beam splitter assembly. The returned light beam assembly further includes a retarder plate setter assembly, wherein the retarder plate is rotated with the polarity of the intermediate beam. The tortuous optical system includes an angle measurement tortuosity system, wherein the angle measurement tortuosity light is used to rotate the plurality of light beams. At least the inflection optical system further includes one to five beams, and a retroreflector. The non-polar beam receives the intervening light before / after the faculty. Generally speaking, it includes interferingly generating multiple channels. At least one measurement object is included at least once with respect to an output beam. In addition, the first path through which the dissimilar is contacted is an embodiment of the method. In general, another-a multi-axis interferometer is used to align the positions, wherein the interference output beam includes related aspects. At least as far as the quantity is concerned, the measurement unit is provided with a measuring beam, and the quantity of each degree of freedom along the total beam is divided into at least one measuring object corresponding to at least the measurement measurement set in the present invention to generate the object relative to The path quantity of the same output position of the track is more along the second time. The device described is characterized by a reflective multi-channel rotation and a different method, which includes relevant information. Every contact with this quantity is characteristic of this common path. This device includes the phase of the object to be measured.

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To the location. Each output beam packet contacts the measurement object at least once. The beam component and the first-mentioned light are different from the common path. The first 0 includes a beam component along a common path. At least one round of the outgoing beam includes another output beam component. The other beam component is controlled in contact with the measurement object at least 100 times. The first-mentioned embodiment of the device includes any of the following features. A chirped output beam including an amount of contact with the measurement object along the common path and another beam component contacting the measurement object along the first path includes information about the measurement object relative to a first axis of rotation. Information on angular bearing. For example, the first rotation axis is perpendicular to a plane defined by the common path and the first path. Moreover, a second output beam includes an angular position of the measurement object with respect to a second rotation axis different from the first rotation axis, wherein the second output beam includes contact with the measurement along the common path. The first mentioned beam component and another beam component different from the far first beam component, wherein another beam component in the second output beam is different from the common path A second path is in contact with the measurement object. For example, the second rotation axis is perpendicular to the _th rotation axis. Further embodiments of the second-mentioned device include any features other than those described for the first-mentioned device. Generally speaking, in another aspect, the invention features a method comprising generating multiple output beams with an interferometer, each output beam containing information about the relative position of the measurement object relative to a degree of freedom. Each of the output beams includes a beam component that touches along a common path

200400346 V. Description of the invention (15) At least once on the measuring object. In the case where the beam components are different and the common path is different, the second-mentioned state and the second-mentioned state are present in the present circuit. The system is used to adjust the interferometry system, the wafer phase, and the circuit of the present invention. This lens always adjusts the radiation guide system to adjust the lens assembly. It will see the mask for the first time and the second to make a circle for the integrated light system on another type of circle; a positioning system and any of the above-mentioned masks. The device is used to monitor a manufacturing system on another type circle, a positioning system, the radiation of the radiation source during operation, the location of the positioning, and the monitoring of the interference system. At least one embodiment of the device that outputs a beam component and a path contact method is characterized in that the light-emitting platform of the lithography system package pattern is relative to the device, and the feature of the photo-lens assembly for the mapping is that of another lithography system package. And any light guided through the light mask relative to the spatial pattern relative to the light beam includes the first lift. The other beam component follows the measurement object. It also includes any mapping system corresponding to the above-mentioned lithography, including a flat space, and any radiation-lithography, including a ray. Fortunately, the above mask is used to map the radiation from the radiation system and is used to support the mapping at the station. To the wafer; the position of the round shot; including a radiation source, the interferometer B, B, and the above-mentioned position system, the radiation source and the interferometer are used to spatially radiate the radiation to the source's radiation to form a crystal and a light Hood, device. In order to produce a pattern, the source is controlled by a wafer 'and the position of the radiation. In another form, the present invention is used to make a lithographic mask. The writing beam is engraved on a substrate, and the beam guiding assembly is used to transfer the characteristics of the engraving into a beam writing system. The writing system includes: a radiation source provides a pattern, a platform supports the substrate, and a writing beam to the Substrate,-positioning system

200400346 V. Description of the invention (16) It is used to make the platform and the beam guiding assembly to oppose each other, and the above-mentioned interferometer is used to monitor the position of the platform relative to the beam writing assembly. In another form, the invention features a lithography method for fabricating integrated circuits on a wafer. The lithography method includes: supporting the wafer on a movable platform; spatially mapping patterns to the wafer; adjusting

The location of the platform, and the location of the: using any of the aforementioned interference methods. Q In another version, the invention features another lithography method for fabricating integrated circuits on a wafer. The lithography method includes: guiding an input_ to generate a spatial pattern through a mask; positioning the mask relative to the ^: control; using any of the above-mentioned interference methods to monitor the mask: on the input The position of the radiation; and mapping the space pattern radiation to ~ circle. In another type, the present invention is characterized in that a third lithography method is to manufacture integrated circuits on a wafer, which includes: a lithography system: a mesh to a micro: system A second element is positioned for: exposing the crystallite to space pattern radiation; and using any of the two methods described above to monitor the position of the first element relative to the second element. ~ In another form, a feature of the present invention is an integrated circuit, the method including any of the lithographic methods described above. /; Fabrication In another form, a feature of the present invention ^ A method for making a biological circuit, the method includes using any of the above-mentioned lithography. Integral lithography package is a method used to make ~ HI method. 引 v — Engraving the beam to the substrate for recording

1057-5464-PF (Nl) .ptd Page 20,200400346 V. Description of the invention (17) ------- Substrate engraving day pattern; positioning the substrate relative to the writing beam, using any of the above The interference method monitors the position of the substrate relative to the writing. Wu Wu Unless otherwise defined, all technical or scientific names used herein have the same meaning as recognized by those skilled in the art. In the event of conflict with a product, patent application, patent gazette, and other reference materials, this specification (including definitions) shall prevail. The details of one or more embodiments of the present invention are as follows with reference to the drawings. Other features, objects, and advantages of the invention will be apparent from the description, drawings, and scope of the patent application. ° Embodiment As shown in Figure 1, this trunk can be arranged and set into a variety of processors and computers 90, the process. Each form will follow an optical path marked 20 as an individual and a light path marked 60 as a slave beam by the sensor 70 detected by the sensor 70 and the computer 90 as the signal analyzer "(not shown) before detection, Mix the effects. It is also used in some practical applications for this mixed polarization input. Figure 1 is a schematic diagram of an interferometer system. Linear and angular displacements of the object are measured and monitored. The instrument system includes a light source 10, an interferometer 14, the form of an interferometer, a sensor 70, and an electronic design designed to perform data processing in a known manner. The embodiments are described in detail below. The interferometer beam generally travels to / Leave the mirror 92, and the output beam travels along the interferometer 14 to the sensor 70. This output light is transmitted to the electronic position 80 as an interference signal that generates electrons. Traditionally, a polarizer or '-polarization' is used in a polarized embodiment where the output beam is the measurement and reference beam component of the beam detected by the sensor 70. An optical fiber read head ( (Not shown)

200400346 V. Description of the invention (18) The light beam handle is combined with a remote sensor. The input beam 12 is provided by the light source 10 and is a two-component light beam. The two components have different frequencies and plane polarizations that are perpendicular to each other. Different frequencies can be generated at the light source 10, for example, laser Zeeman splitting, Acousto-optical modulation, or birefringent elements inside the laser. The first embodiment of the interferometer 14 is shown in a stereoscopic view in Figure 2a and includes a two-plane mirror interferometer 114 in an integrated optical assembly. The interferometer 114 is explained by the operation of the interferometer 14. The paths of the measuring beams 2, 1 2 4 and 1 2 6 correspond to the paths indicated by reference numeral 20 in FIG. 1. The two-plane mirror interferometer has a common measuring beam path for one of them to pass to the plane mirror measuring object 92. The common measurement beam path corresponds to the path of the measurement beam 1 2 2. The light beam 12 enters the polarization beam splitter interface 13 and leaves the beam splitter 130 to become a beam 140 '. The beam 140 includes reference and measurement beam divisions. The polarization plane of the two components of the input beam 12 is parallel and perpendicular to the plane of incidence of the light beam 12; the beam component is reflected by the beam splitter 130 and the plane mirror 92, and is reflected by the beam splitter. Passed by 1 3 0, the quarter-wave phase retardation plate 3 2 makes secondary reflection. The second pass through the retardation plate 1 3 2 will rotate the polarization plane of the measuring beam by 90 degrees. The reference beam component of the beam 140 is transmitted by the beam splitter, and is reflected by the plane mirror 194 and the beam splitter 130 ', and is reflected by the quarter-wave phase retardation plate 134 twice. The second pass through the retardation plate 134 rotates the polarization plane of the reference beam by 90 degrees. /

1057-5464-PF (Nl) .ptd Page 22 200400346 V. Description of the invention (19) '-----The first and second parts of the light beam 140 are used as the light beams for the two planes, the interference, Among them, the first and second parts have a measuring beam component '4 etc. 3: The measuring beam component has a common measuring beam path for one of them to reach the plane mirror measuring object 92. The light beam 140 is transmitted by the beam 154 and reflected by the retro-reflector 150 to become the beam 42. One of the first part of the light beam 142 corresponding to the first part of the light beam 14 is transmitted by the non-polarized beam splitter interface ι52 to become the light beam 144, and the second part of one of the light beams 142 corresponds to the second part of the light beam 140. The beam splitter interfaces 152 and 稜鏡 154 reflect and become a beam 1 4 6. The light beam 144 enters the beam splitter interface 130 and leaves the beam splitter interface 130 to become an output beam 160 including reference and measurement beam components. The measured beam component of the light beam 144 is transmitted by the beam splitter interface 130, reflected by the plane mirror 92 and the beam splitter interface 130, and transmitted by the quarter-wave phase retardation plate 1 2 2 for secondary transmission. The reference beam component of the beam 1 4 4 is reflected by the beam splitter interface 130 and the flat mirror 194, transmitted by the beam splitter interface 1 3 0, and twice by the quarter-wave phase retardation plate 1 3 4 transfer. The light beam 146 enters the beam splitter interface 130 and exits the beam splitter interface 130 to become an output beam including a reference and measurement beam component 162 ° beam 1 46. The measured beam component is transmitted by the beam splitter interface 1 30 'by the plane mirror 92 and Reflected by the beam splitter interface 130 and transmitted twice by the quarter-long phase retardation plate 132. The reference beam γ split of the beam 146 is reflected by the beam splitter interface 130 and the plane mirror 94, transmitted by the beam knife light interface \ 3 0, and made by a quarter-wave phase retardation plate 1 3 4 One pass

1057-5464-PF (Nl) .ptd Page 23 200400346

The output beams 160 and 162 are detected by the sensor 70 and generate H surface number 8Q. The sensing means includes a polarizer that mixes the output beam_1, 1 ~ 2 wide reference and measured beam components. Electronic interface of the signal 80. The signal is transmitted to the electronic processing and thunder calendar q n w. Eight w into 90, and processes the information about the displacement of the plane mirror 92 for the > D interferometer 1 axis Xl and &. The average of the displacement χ and the change of the parent is calculated by the electronic processor and the computer 90 as the linear displacement of the plane mirror ^, and the change of (XlG_Xi) is used by the electronic processor and the computer 90 to calculate the change in the angular displacement of the plane mirror 92 as atan [(χΐϋ_χι) / bi] where bi

Measure the spatial distance between the two interferometer measuring axes (see Figure 2b). The measurement change in angle and orientation is in the plane of the two measurement axes. The relative positions of the measurement beams 122, 124, and 126 are shown in the first figure. Similarly, Fig. 2b shows the relative positions of the measurement axis X1 and the palpitations, and the distance h between the measurement axes. The position of the retro-reflector 150 affects the position of the light beam 144 relative to the light beam 140 but does not affect the spatial distance between the light beams 144 and 146. The spatial distance between the beams 44 and 46 is determined by the properties of the rhombus formed by the reflecting surfaces of the beam splitters 152 and 154, and corresponds to the axis Xι. And the pitch of & bi. One

The corresponding feature is that the placement of the rhombus does not affect the space between the measurement axes & and &. The retro-reflector 150 is shown in Figure 1 as a solid cube corner retroreflector. For a solid-phase cube-corner retroreflector, the maximum diameter of a beam or the largest net circular through-hole used to pass any part of the beam through the sector boundary of the cube

1057-5464-PF (Nl) .ptd Page 24 200400346 V. Description of the Invention (21) (maximum clear circular aperture) is 1/2 of the distance between the input and output beams of the retrospective cube corner reflector. However, the maximum clear through holes of other optical components, such as the beam splitter interface 1 2 5, 稜鏡 15 4 and the beam splitter interface 130, are equal to the input and output beams of the cube corner. A factor of 1/2 indicates a loss factor of 2 in the maximum diameter, and the maximum diameter can be used in an interference system provided with a conventional high stability plane mirror interferometer (HSPMIs). In contrast, the interferometer 1 1 4 of the first embodiment can be constructed so that the first embodiment does not have a loss coefficient when a cube-corner retroreflector is used. The position of the light beam 140 relative to the light beams 144 and 146 does not affect the spatial distance h of the axes XlQ and Xl. As a result, the size of the cube-corner retrospective mirror 150 can be selected to be an optical element that sets the diameter of the clear through hole of the interferometer without changing the pitch. The retro-reflector 1 50 is shown in Figure 2a and is a solid cube-corner retro-reflector. The reflective surface of the cube-corner retro-reflector 150 is electroplated to reduce the occurrence of periodic errors in the electronic signal of the signal 80. Refer to, for example, US Patent Application 60 / 371,868 on April 11, 2002 by Henry A. Hill's `` Retroreflector Coating For Heterodyne

Interferometer. " The retroreflector 150 also includes a polarization preserving retroreflector to reduce the occurrence of periodic errors. For example, US Patent Application No. 6, 1 98574B1 "Polarization Preserving Optical System" does not depart from the field and spirit of the present invention. After the listed U.S. patents were incorporated,

200400346 points for the configuration of the retroreflector 1 5 〇

〇57-5464-PF (Nl) .ptd Page 26 V. Description of the invention (22) In the test, the effective net through hole of the polarization retention system is the same. Interferometer, the dual-pass interferometer measurement contributes to a more compact and compact optical system of the two interferometers, which is another advantage of the first embodiment. It includes two traditional HSpMIs. The optical path difference is caused by the interference uniformity. Similarly for the traditional HSPMIs including two-plane mirrors, the use of two separate emitters usually results in a non-peripheral through-measurement beam that is caused by non-peripheral phase measurement changes in the form of manufacturing or cosecant correction coefficients. An embodiment (the beam of the backtracking interferometer is the number corresponding to the non-periodic error generated by the beam with the same mirror measuring object's azimuth change, and offset each other when calculating from ^. This wavefront error can be caused Due to the shape of the optical surface of the light transmitting beam. Another excellent retro-reflector of the first embodiment does not reduce an interferometer angle retro-reflector. Only one retro-reflector is used to measure two of the two measuring bodies Degree of freedom. This special cost integrated optical assembly. The point is that the optical path in the retroreflector 150 is the same. This feature is reduced in the first path difference and appears in a corresponding interferometer with two separate retroreflectors. The interferometer system is one of the interferometers for glass and temperature gradient non-uniform interferometers, such as retro-reflectors, and two individual retro-phase back-period errors. Alignment produces a cosine period error. This correction factor is used to change the dry linear displacement. Another advantage of the optical path in the transmitter 150 for the double-double) is that the wave caused by self-plane shear Part of the previous error is the change of the two electronic interface's informational displacement to the change of angular displacement. The birefringence and reflection of the element 200400346 V. Description of the invention (23) Affects the measurement axis of the two two-pass interferometer Spacing between. Therefore, when assembling an integrated optical assembly, the pitch is not determined by the configuration of retroreflective is, but by the manufacture of a single optical element. Another advantage of the first embodiment is that the configuration of the rhombus formed by the polarizing interface and the reflecting surface of the beam splitter interface 5 and the 54 does not affect the two-pass interferometer. Measure the distance between the axes. Therefore, when assembling an integrated optical assembly, the pitch is determined not by the configuration of the diamond body, but by the manufacture of a single optical element, and the diamond body. Another advantage of this first embodiment is that the configuration of the rhombus formed by the polarization interface of the beam splitter interface and the reflective surface of 154 and the 154 does not affect the electrons of the two two-pass interferometer. Interference signal amplitude. . Another advantage of the first embodiment is that for a given maximum distance 2bi of the measurement beam at the measuring object plane mirror, a larger clear through hole can be accommodated relative to the two plane mirror interferometers In the device, such as the traditional HSPMIs using a cube-corner retroreflector, the beam does not cross the fan-shaped boundary of the retroreflector. Another advantage of the first embodiment is that the angular displacement of the displacement difference obtained from the two two-pass interferometer is less sensitive to the temperature gradient. In the first embodiment, the measurement beam 122 can be regarded as a “first beam” or a “main” measurement beam, and the measurement beam 122 is transmitted to the far-plane mirror measurement object for the first time and then from the pole. The split beam splitter 130 is divided into a plurality of one incoming beams "and a" return beam assembly "including a retro-reflector 150, a beam splitter interface 152, and a flat mirror 154. In the first embodiment, the sub-beams corresponding to the measuring beams 124 and 126 can be considered more

1057-5464-PF (Nl) .ptd 200400346 V. Description of the invention (24) "Secondary" measuring beam, these secondary beams make a second along a path different from the corresponding measuring beam 1 2 2 Pass to the plane mirror to measure the object. Therefore, in the first embodiment, each of these light beams corresponds to a component that contacts an output beam of the measurement object along a common path defined by the measurement beam 122 (a portion of the measurement beam 122), and follows A path different from the common path contacts the measurement object a second time. Moreover, the reference portion of the input beam 12 reflected by the polarized beam splitter interface 130 toward the reference plane mirror 194 can be regarded as a "primary" reference beam, which passes through the reference plane mirror for the first time and then The measurement beam 丨 2 2 is combined (after it passes through the plane mirror to measure the object for the first time) to define an "intermediate" beam. The "intermediate" beam is then made up of the total component of the returned beam into an r-multiplied "beam" beta beam which corresponds to beams 144 and 146. The polarization beam splitter interface 130 divides the multiple beam into a set of secondary measurement beams (corresponding to the measurement beams 124 and 126) and a set of secondary reference beams (corresponds to the second-person pass to the plane mirror). Reference 194). A similar naming scheme is used in the following examples. A second embodiment of the A interferometer 4 is shown in a perspective view of the third & figure, and includes three plane mirror interferometers in an integrated optical assembly, generally labeled as 2 ^ 4 ° interferometer 214 and The operation mode of the interferometer 14 is explained, and a linear displacement of q 9 2 and f 2 solitary plane mirror 9 2 in one direction and a plane mirror 92 «a vertical plane strip sound ancient / six thousand ... ... < monthly orientation. The paths of the f-measuring beams 222, 224, 22 6 and 2 2 8 correspond to the paths represented by μ! _ taxi, ^ jr θ. The three planes two things C. G Qiu ί the same measuring beam path for one pass to a plane mirror, ^ δ measuring beam path corresponds to the measuring beam 222

1057-5464-PF (Nl) .ptd page 28 200400346 V. Description of the invention (25) diameter. Many elements of the second embodiment have the same functions as those of the first embodiment. Elements having the same function in the first and second embodiments are denoted by reference numerals having a difference of 100. The light beam 12 is incident on the polarization beam splitting interface 2 3 0 and leaves the polarization beam splitting interface 230 to become the light beam 240, which includes reference and measurement beam components. The polarization planes of the two components of the incident beam 12 are parallel and perpendicular to the plane of incidence of the beam 12 on the beam splitter interface 230. The three parts of the light beam 240 are used as light beams for three plane mirror interferometers respectively, wherein the three parts have measurement beam components, and the measurement beam components have a common measurement beam path for one pass to the plane mirror measurement object. 92. Other descriptions of the light beam 240 are the same as those corresponding to the description of the light beam 140 of the first embodiment. The first of the three parts of the beam 240 is sequentially transmitted by 稜鏡 254, the retro-reflector 2 50, and the beam splitter interface 252 to become the beam 244 °. The second of the three parts corresponds to the beam 24. One of the first part of the second part, one of the first part of the second part of the light beam 2 40 is reflected by the beam splitter interface 252 and transmitted by the beam splitter interface 1252. Beam beam 246. The third part of the three parts corresponds to a second part of a second part of the light beam 240. A second part of the second part of the light beam "ο" is reflected by the beam splitter interface 252 and is reflected by the beam splitter. The interface 1 252 reflects the light beam 248, which is reflected by the prism holder 6. The light beam 244 enters the polarization beam splitting interface 23 and leaves the polarization beam splitting interface 230 to become a beam 26. The reference and measurement beam components are included.

200400346 V. Description of the invention (26) Other descriptions of the beam 260 are the same as those corresponding to the description of the beam 16 of the first embodiment. The light beam 246 is incident on the polarization beam splitting interface 230 and leaves the polarization beam splitting interface 230 to become the light beam 262, which includes reference and measurement beam components. Other descriptions of the light beam 262 are the same as those corresponding to the description of the light beam 162 of the first embodiment. The light beam 248 is incident on the polarization beam splitting interface 230 and leaves the polarization beam splitting interface 2 3 0 to become the beam 2 6 4 including reference and measurement beam components. The descriptions of the reference and measurement of the light beam 248 traveling through the optical element to form the light beam 2 6 4 are the same as those corresponding to the description of the light beam 1 4 4 forming the light beam 16 0 of the first embodiment. The measuring beams 224, 226, and 228 traveling along path 20 are combined by the output beams 260, 262, and 264, respectively. The measurement beams 222 and 224 are combined with the measurement axis x2, the measurement beams 222 and 226 are combined with the measurement axis x2Q, and the measurement beams 222 and 228 are combined with the measurement axis x2GG (see FIG. 3). The space between X2q and X2 is 1½, and the space between X2⑽ and the plane formed by x2G and 々 is b20. The relative positions of the measurement beams 222, 224, 226, and 28 are shown in Fig. 3b. Also shown in Fig. 3b are measurement axes X2 and X2. As well as the chirp, and measuring the shaft distances b2 and 132. The changes in the three degrees of freedom of the plane mirror 9 2 are calculated by the electronic processor and the computer g 0 using the three measured linear displacements and the measured properties b2 and 1) 2 (). …,2. η The features and advantages of the second embodiment are, for example, a small and rugged integrated optical assembly, low cost, clear through-hole, retro-reflector setting of 2 50, pitch t > 2 vs. bgo's, and reduction of non-periodic Effect of error, with the present invention

1057-5464-PF (Nl) .ptd 200400346 5. The features and advantages corresponding to the first embodiment of the invention description (27) are the same. A modification of the second embodiment is shown in FIG. This second embodiment is modified as a four-axis plane mirror interferometer, which has a polarizing beam splitter of the same size including an interface 23, and a larger measuring beam than the second embodiment of FIG. Through-hole. The clear through-hole here is defined by the boundary of the optical surface, such as the fan-shaped boundary of a cube-corner retroreflective reflector 125. The deformation of this second embodiment usually shows a larger measurement beam clear through-hole to reduce non-periodic non-linear errors caused by wavefront errors and beam shear.

For a given amount of non-periodic non-linear errors caused by wavefront errors and beam shearing, the size of the interferometer deformed in this second embodiment can be reduced compared to the corresponding interferometer in the second embodiment. The Abbe error encountered in the last use of the modification of the second embodiment can be reduced compared to the Abbe error encountered in the second embodiment corresponding to the last use. In the second embodiment, the optical angular resolution (optical angular resolution) on one plane is higher than the corresponding optical angular resolution on the same plane in the second embodiment.

The modified elements of the second embodiment and the elements in the second embodiment have the same reference numerals and have the same functions. Referring to FIG. 10, two cross sections of the interface 1256 are plated and reflected as a reflection interface for a light beam, and the light beams are reflected as light beams 2244 and 2246. The central section of the interface 1256 is unplated and transmits the light beam 2 4 0 ′. The transmitted light beam is then transmitted by the phase retardation plate 1232 and the cube-corner retroreflector 125 to become the light beam 1242. The light beam 1242 is incident on the beam splitter interface 2252 and one of the light beams 1242 is

l〇57-5464-PF (Nl) .ptd Page 31

200400346 V. Description of the invention (28) A part is transmitted and a second part is reflected. The transmitted first part enters the beam splitter interface 3252 and a first part is transmitted to become the light beam 1244 and a second part is reflected to become the light beam 2244 after being reflected by the reflection section of the interface 1256. A part of the second part reflected by the beam interface 2252 is transmitted by the beam splitter interface 32 52 and is reflected by the reflection interface 1 2 5 4 to form a beam 1 2 4 6 and the other part of the reflected second part The component is reflected by the beam splitter interface 3252 and is reflected by one of the interfaces 1254 and 1256. The light beam 1 244 enters the polarized light beam splitting interface 230 and leaves the polarized light beam splitting interface 230 to become a light beam 264 including reference and measurement beam components. Other descriptions of the beam 1264 are the same as those corresponding to the description of the output beam 260 of the second embodiment. The light beam 1 246 is incident on the polarization beam splitting interface 230 and leaves the polarization beam splitting interface 230 to become the beam 1266, which includes reference and measurement beam components. Other descriptions of the light beam 1 2 6 6 are the same as those corresponding to the description of the output light beam 260 of the second embodiment. The light beam 2244 enters the polarizing beam splitting interface 230 and leaves the polarizing beam splitting interface 230 to become the output beam 2264, which includes reference and measurement beam components. The description of the reference of the light beam 2244 and the measurement of the light beam component traveling through the optical element to form the light beam 2264 are the same as those corresponding to the description of the light beam 244 forming the light beam 2 60 of the second embodiment. The light beam 2246 is incident on the polarization beam splitting interface 230 and leaves the polarization beam splitting interface 230 to become the output beam 2266, which includes reference and measurement beam components. The description of the reference and measurement of the light beam 2246 through the optical element to form the light beam 2266 is the same as that corresponding to the description of the light beam 246 forming the light beam 2 62 in the second embodiment.

1057-5464-PF (Nl) .ptd Page 32, 200400346 V. Description of the invention (29) Since the part of the beam 2 2 2 is regarded as the first transmission to the measuring object for each of the four measuring axes The measuring beam of 92 is used as the main measuring beam. The measurement beams 1 224, 2224, 1226, and 2226 traveling along path 20 and the output beams 1264, 2264, 1266, and 2266 are respectively. As shown in FIG. 10, the polarization state of the measurement and reference component of the plane defined by the output beam 1242 and the corresponding input beam from / to the cube-corner retroreflector 1 2 50 is defined with respect to the beam 240 The plane is at 45 degrees. As a result, the polarization of the measurement and reference components of the input beam to the cube corner retro-reflector 1 250 and the plane of the cube retro-reflector 1 250 are misaligned on the fast and slow axes. In order to measure the polarization of the input beam and the polarization state of the reference component to the plane of the cube-corner retroreflector 1 2 50 and the relative rotation effect of the fast axis and the slow axis on the name of the cube-corner retroreflector 1 2 50 For compensation, a phase retardation plate 1 2 3 2 is placed on the path from the input beam to the cube corner retro-reflector 1 2 50, and the fast axis of the phase retardation plate 1 2 3 2 is parallel or perpendicular to the cube corner retrospective Fast axis of reflector 1 250. The phase blocking plate 1232 may also be such that the output beam 1242 comes from the cube corner retro-reflector 1 250. The compensation of the phase retardation property can be additionally provided by placing a phase retardation plate on the path of the input beam and the output beam to the cube-corner retroreflector 1 250. The properties of the phase-blocking plate 1 2 3 2 are determined such as the phase-blocking properties of the cube-corner retroreflector 1 2 50. For a silver-plated cube-corner retroreflector, usually in commercial interferometers, the fast and slow axes of the silver-plated cube-corner retroreflector are relative to the input and wheel beams to the silver-plated cube-corner retroreflection.

1057-5464-PF (Nl) .ptd Page 33 200400346 V. Description of the invention (30) The plane defined by the direction of the device rotates about 3 degrees. In addition, introducing a phase shift of about 180 degrees (sinusoidal value of the phase shift is about 0.1) makes the retroreflective reflection of the cube corner behave like a phase retardation plate at half the wavelength. The phase shift introduced by the phase retardation plate 1 232 is selected to compensate the cube-corner retroreflector 1250 to reduce the periodic error introduced by other methods. Other plating methods can be used on the cube-corner retroreflective reflector 125. For example, Henry A. Hill, "Retroreflector Coating For Hetrodyne Interferometer" filed on April 11, 2000, in US Patent Application No. 60 / 371,868, its content Incorporated herein by reference. It has a plating layer as described in the application, and the plated retroreflective cube corner reflector 1 250 has a half-wavelength phase retardation plate with high precision, with respect to the polarization state of the input and output beams. The phase retardation property in this example uses a standard half-wavelength phase retardation plate as the phase retardation plate 1 2 3 2. An advantage of the modification of the second embodiment is that the effective net through-hole for the measurement beam is increased compared to the effective net through-hole of the second embodiment. This increase is due to the movement of the main measurement beam 222 to a central position between the measurement beams 2224 and 222 6. As a result of the movement, the effective net through-holes of the light beams 2224 and 2226 may be equal to each other, which represents an increase in the effective net through-holes relative to the light beam of the second embodiment, where the effective net through-holes are defined as 2 2 6. The increase of the effective clear through-hole of the second embodiment is that the fast axis and the slow axis of the cube-corner retroreflector 1 2 50 are measured relative to the beam 2 4 0 and the polarization plane of the f-component is rotated approximately. 45 degree. For the rotation of such a fast axis and a slow axis, the fan-shaped boundary of the cube ’s retro-reflective reflector 2 5 0 has

1057-5464-PF (Nl) .ptd Page 34 200400346 V. Description of the invention (31) Two independent and perpendicular degrees of freedom of the measuring beam do a corresponding rotation within 15 degrees, compared to the traditional high Stability flat mirror interferometer. Therefore, the fan-shaped boundary of the cube-corner retro-reflector 1 250 has a relative alignment of approximately 15 degrees relative to the beam shear of the measured beam component of the beam 24 and a corresponding rectangular space surrounded by an increase in the effective net through-hole. . The main measurement beam 222 moves to a central position between the measurement beams 2224 and 2226 without reducing the clear through hole of the cube-corner retroreflector 1 250. Instead, it passes the output beam to the cube-corner retroreflector 1 250 vertically. Output beam 1 242 with horizontal setting. The larger clear beam passing through the measurement beam forms the basis of another advantage of the modification of this second embodiment. For a given beam shear variable and surface configuration specifications of the optical surface, a larger through-hole will result in a corresponding reduction in non-periodic non-linear errors. It is also possible that in the modification of the second embodiment, by moving the main beam 2 2 2 closer to the corresponding edge of the polarized beam splitter having the interface 230, the distance to the beam (toward the reference object 294) 222 is reduced. Abbe effect on a surface. It is possible to move to the corresponding edge without lowering the deformation effective net through hole of the second embodiment, because the beam shear experienced by the main beam 2 2 2 becomes the speculative beam shear experienced by the beams 1224, 2224, 1226, and 2226 Half the result of the change in the orientation of the measuring object 9 2 of the beam shear system. This feature represents another advantage of the modification of the second embodiment. Another advantage of this second embodiment is that the resolution of the angular displacement on the plane defined by the beams 2 2 6 and 2 2 2 6 can be approximated by moving the main beam 222 to a pole with an interface 23 0 The corresponding edge of the beam splitter

200400346 V. Description of the invention (32) plus 0 The rest of the description of the modification of the second embodiment is the same as that of the corresponding part in the second embodiment. It is obvious to those who are familiar with this technique that the measurement beam 丨 226 moves towards the beam 1224. The suspect position is between the beams 丨 226 and 1224 as shown in Figure 10, and is in line with the input beam 丨 2 Without departing from the scope and spirit of the present invention, the position of the reflecting surface 1 2 5 4 is moved.

A third embodiment 14 of this interferometer is shown in a perspective view in Fig. 4a, and includes three flat mirror interferometers, which are generally designated 3 1 4 in an integrated optical assembly. The interferometer 2 1 4 is explained by the operation method of the interferometer 14 and is configured to measure and monitor the linear displacement of the plane mirror 92 in one direction and the angular orientation of the plane mirror 92 in the vertical plane. The paths of the measurement beams 322, 324, 326, 1 3 2 2 and 1 3 2 4 correspond to the paths denoted by reference numeral 2 in the first figure. Both of the three-plane mirror interferometers have a common measurement beam path for a person to pass to the plane mirror measurement object 92. The common measurement beam path corresponds to the path of the measurement beam 3 2 2. Many elements of the third embodiment have the same functions as those of the second embodiment. Elements having the same function in the second and third embodiments are denoted by reference numerals with a difference of 100.

The light beam 12 is incident on the beam splitter interface 358 and a first portion is reflected to become an input light beam 312 after being reflected by the prism 359. One of the light beams 12 is transmitted by the beam splitter interface 358 into an input light beam 1312. The input beam 312 enters the beam splitter interface 33 and exits to form the output beams 360 and 362. Combined with output beams 360 and 362

200400346 V. Description of the invention (33) The measuring beams are 322, 324 and 326. The input beam 1312 enters the beam splitter interface 330 and leaves the interferometer 314 to become an output beam 1364. The measurement beam combined with the output beam 1364 is 1322, 1324. The input beam 312 travels through the interferometer 314 to form the measurement beams 322, 324, and 326, and the output beams 360 and 362, and the input beam 12 in this first embodiment travels through the interferometer 114 to form a measurement beam. The descriptions of 122, 124, and 126 and output beams 160 and 162 are the same. The interferometer including the retro-reflector 1 350 and the polarization beam splitter interface 3 3 0 is a conventional HSPMI. The polarization beam splitter interface 330 has measuring beams 1322 and 1324. Pressing, the input beam 1312 travels through the interferometer 314 to form the measurement beams 1 322, 1 324, and 1 326, and the description of the output beam 1 364 is the same as that of the beam passing through the HSPMI. The measurement beams 3 2 2 and 3 2 4 are combined with the measurement axis χ3, the measurement beams 3 2 2 and 326 are combined with the measurement axis x3G, and the measurement beams 1 322 and 1 324 are combined with the measurement axis x3QG (see section 4b). The spatial distance between x3Q and χ3 is b3, and the spatial distance between the planes formed by X30G and X3G and X3 is b3. The relative positions of the measuring beams 322, 324, 32 6, 1, 32 2 and 1 324 are shown in Figure 4b. Also shown in Figure 4b are the measurement axes x3, x3Q, and X30G, as well as the measurement axis distances b3 and. The three degrees of freedom of the plane mirror 92 are changed by the electronic processor and the computer 90. The measured linear displacements and measured properties b3 and b3 () are used to calculate the features and advantages of the second embodiment. Rugged integrated optical assembly, low cost, clear through-hole, retro-reflector setting of 350

1057-5464-PF (Nl) .ptd Page 37 200400346 V. Description of the invention (34) The effect of the error is the same as the present invention. The general standard operation method in a stereo integrated optical assembly shown in Fig. 5a is explained, and the linear displacement and plane mirror beams 422, 424, 426, and 1 are replaced by reference numeral 20 in Fig. 1 and have a common measurement. Beam, and the other two plane mirrors are transmitted to the plane mirror measuring object measuring beam 3 2 2 and 1 3 2 2. The elements of the embodiment have the same elements with the same function at a distance of h and, and reduce the non-periodic Corresponding Features and Advantages of the First Embodiment One of the fourth embodiment of the interferometer is shown in FIG. 14 and includes four plane mirrors. The interferometer 414 uses the structure of the interferometer 14 to measure and monitor the angular orientation of the plane mirror 92 in one direction 9 2 vertical plane. The paths for metering 1 422, 1 424, and 1 426 correspond to the meter paths. The two paths in the four-plane mirror interferometer are used for one pass to the plane mirror measurement object g 2, and the instrument has a common measurement beam path for _ 9 2. This common measurement beam path corresponds to the measurement path. Many elements of the fourth embodiment are related to the functions of the first. In the first and fourth embodiments, a reference numeral with a difference of 100 is indicated. The light beam 12 is incident on the beam splitter interface 458 and a first portion is reflected to become an input light beam 412 after being reflected by 稜鏡 459. One of the light beams 12 is transmitted by the beam splitter interface 458 into an input beam 1412. The input beam 412 enters the beam splitter interface 430 and leaves the interferometer 414 to become output beams 460 and 462. The measurement beams combined with the output beams 460 and 462 are 422, 424, and 426. The input beam 1412 enters the beam splitter interface 430 and leaves the interferometer 414 to become output beams 1 460 and 1 462. The measuring beam combined with the output beams 1 460 and 1 4 62 is

1057.5464-PF (Nl) .ptd page 38 200400346 V. Description of the invention (35) 1 422, 1 424 and 1 426. The input beam 412 travels through the interferometer 4 14 to form the measurement beams 422, 424, and 426, and the output beams 460 and 462. The input beam 12 travels through the interferometer 114 to form the measurement beam The descriptions of 122, 124, and 126 and output beams 160 and 162 are the same. The input beam 1412 travels through the interferometer 414 to form the measurement beams 1 422, 1424, and 1 4 2 6 and the description of the output beams 1 4 6 0 and 1 4 6 2 as described in the first embodiment. The description of the measurement beams 1 2 2, 124 and 126 and the output beams 160 and 162 by the interferometer 1 1 4 is the same.

The measurement beams 422 and 424 are combined with the measurement axis χ4, the measurement beams 422 and 426 are combined with the measurement axis, and the measurement beams 1 422 and 1 424 are combined with the measurement axis χ_ 'to set the measurement beam 1 4 2 2 And 1 4 2 6 has just been combined with the measurement axis χ4 (see Figure 5b). The spatial distance between χα and X4 is b4, and the interworking distance between χ4_ and the father 4⑽ is d40 ', and the spatial distance between χ_0 and χ4o is. The relative positions of the measuring beams 422, 424, 426, 1422, 1424 and 1426 are shown in Figure 5b. Also shown in Fig. 5b are the measurement axes χ, X4〇, Ago, and X4_ ', and also the measurement axis distances b4 and, and b4. . .

The changes in the three degrees of freedom of the plane mirror 92 and the average slope are calculated by the electronic processor and the computer 90 using the three measured linear displacements and the measured masses h and. The change in the average slope of a slope is used for the change in the orientation of the surface determined by the difference between the changes in the linear displacement of two surfaces. The change in the average slope is on the plane of the change in the two measured ^^ line shifts. In this fourth embodiment, one of the average slope j measured values is determined by atan [(x4◦-x4) / b4] and atan [(X4_—χ) / — $

200400346 V. Description of Invention (36) b40]. The difference between atan [(x4 ()-x4) / b4] and atan [(x4..factory x4G ()) / b4G] is measured from a plane exceeding the distance 1) 4 () (3) to measure the deviation of the plane mirror 92 Departure surface. The difference of the average slope measurement can be used, for example, in the process of drawing a plane mirror object mounted on the platform of a lithography tool, such as US Patent Application No. 60/371, 172 in April 9, 2002 "Method and Apparatus For Stage Mirror Mapping" Henry A 1 1 en H i 1 1 (Z-4 0 2), the content of which is incorporated herein by reference. Additional examples are more Combine any of the above interferometer systems with each other to provide additional measurement axes. For example, a four-axis and three-axis interferometer subassembly, similar to that shown in Figure 10, can be superimposed on an integrated optical assembly In order to provide 7 measuring axes, as shown in Figure 11. The embodiment in Figure 11 includes many components in common with the embodiment in Figure 10, including the polarization beam splitter interface 2 30, to measure Quarter-wave plate 232, reference quarter-wave plate 234, reference plane mirror 294, retardation plate 1 232, retro-reflector 1 250, unpolarized light Beam splitter interfaces 2252 and 3252, and planes 1254 and 1256. Referring to Figure 11, an input beam 1 1 〇1 (as generated by light source 1 〇 in Figure 1) is incident on an input beam splitter assembly 丨 丨 〇 2. The input beam splitting assembly 1 1 0 2 includes a non-polarized beam splitter assembly 1 1 0 3. The input beam splitter assembly divides the input beam into two secondary input beams 1104 and 1105. The input beam 1104 corresponds to the input beam 12 ′ in the embodiment of FIG. 10 and the output beams 1264, i266, 2264, and 226 6 are generated by the interferometer in parallel, as in the embodiment of FIG. 10. The secondary input Beam 1105 travels parallel to and below the secondary input beam 1104. The secondary input beam

1057-5464-PF (Nl) .ptd 200400346 V. Description of the invention (37) 11 05 and its components travel in the interferometer, similar to the secondary input beam 11104, and produce output beams 1 266, 2264 , And 2266 ,. To generate such an output beam, this embodiment further includes a plane mirror 1254, a non-polarizing beam splitter interface 2252, and a second retro-reflector 125o. In this particular embodiment, the 'measurement beam components 1 264, 1 266, 2264, and 2266 of the output beam are in contact with different measurement beam components corresponding to the output beams 1 266, 2264, and 226 6'. Plane mirror for measuring objects. Furthermore, in this particular embodiment, a fourth output beam obtained from the secondary input beam 丨 05 is unnecessary, so the right part of the beam splitting interface 2252 is only a flat mirror. Referring again to FIG. 11, this embodiment further shows a back plate 2 3 3 for fixing the four-blade wavelength plate 232 to the polarized beam splitter optical system corresponding to the interface 230 when different components are integrated into a single Interferometer assembly. This embodiment further shows a polarized leak filter 117, which includes a pair of wedges, one of which is birefringent. The polarization leak filter introduces a slight difference in the direction of travel between the vertical polarization components of the secondary input beam 'as the output beam passes through the polarization leak filter and the slight difference is greatly compensated. This polarization leak filter reduces the periodic errors caused by polarization mixing and other effects caused by imperfections in the optical system of the interferometer. An example of this polarization leak filter can be described in more detail in U.S. Patent Application 10/174, 149 "INTERFEROMETRY SYSTEM AND METHOD EMPLOYING AN ANGULAR DIFFERENCE IN PROPAGATION BETWEEN ORTHOGONALLY POLARIZED INPUT BEAM COMPONENTS"

1057-5464-PF (Nl) .ptd

Page 41

200400346 V. Description of Invention (38)

Peter J. de Gr〇〇t et al. Twisted on June 17, 2002, incorporated herein by reference. Each of the output beams in the neodymium embodiment described herein includes information about the change in distance from a particular measurement axis to the measurement object. As above · The information about the change of the angular position of the measuring object can be calculated from the measuring object and the distance of the measuring axis. In the following additional embodiment /, two, the interferometer can generate one or more output light beams and directly measure the measurement object = two j bits. In this embodiment, the two components of the Γ angle measurement wheel beam contact the measurement object at points separated from each other. The obtained ^ xi number corresponds to an optical difference, which represents a change in the angular orientation of the measurement object with respect to a special rotation axis. Examples may include interferometers that measure ^ = of the angles relative to one or more different rotation axes. Moreover, the interferometer may further include a change in the distance of the output beam to the measurement object along one or more measurement axes. "Refer to Fig. 12a-e. An embodiment of a multi-axis interferometer includes a high-stability plane mirror interferometer (HSPMI) and an angular displacement interferometer. The ~ HSPMI and the angular displacement interferometer share some common Optical element. The HSPMI is shown schematically in Figure 12b, and the angular displacement interferometer is shown schematically in Figure 12c. The HSPMI generates a first output beam 1 272 packets = about a first measurement axis to A plane mirror measures information about the distance change of the object 128 °, and the angular displacement interferometer generates a second "angular measurement" output beam 1 273 including information about the change in the angular orientation of the plane mirror object relative to a first axis of rotation . & Referring to Figure 1 2a, the light source 1 1 〇 generates the input beam 丨 丨 2 (as described above)

200400346 V. Description of the invention (39) (refer to Figure 1) and guide to the polarized beam splitter 1281, which splits the input beam 112 into beams 1291 and 1292. The light beam 1 2 9 1 can be regarded as a “main” measurement beam, and the light beam 1 2 9 2 can be regarded as a main reference beam. The main measuring beam is transmitted by a polarizing beam splitter, reflected by a plane mirror measuring object 1 2 0, and then returned to the polarizing beam splitter after passing through a quarter wave blocking plate twice. 282 The quarter-wave blocking plate 1282 rotates its linear polarization by 90 degrees. Due to the second pass, the polarized beam splitter reflects the main measurement beam towards the return beam assembly 1 285. The main reference beam is reflected by the polarized beam splitter, reflected by a plane mirror reference 1 2 8 3, and then returned to the polarized beam splitter after passing through a quarter wave blocking plate 1 284 twice, The quarter-wave retarder 1 284 rotates its linear polarization by 90 degrees. Due to the second pass, the polarized beam splitter passes the main reference beam. Furthermore, the main measurement beam is combined with the main reference beam to define an intermediate beam 1290. The return beam assembly 1 285 includes a non-polarized beam splitter 1 286 which divides the intermediate beam into a plurality of beams including a beam 1 293 and a beam 1 294. Beam 1 293 is transmitted by beam splitter 1 286, and then retro-reflector 1 287 is guided back to polarized beam splitter 1281, while beam 1 294 is reflected by beam splitter 1 286, and guided by polarizer 1 288 1281, and then passed by the half-wave blocking plate 1 2 89 before reaching the polarized beam splitter. The half-wave retardation plate is arranged to rotate the measurement and reference components in the rotating beam 1 294 at a linear polarity of 90 degrees. Beam 1 293 corresponds to the components of these distance measurement output beams 1 272

1057-5464-PF (Nl) .ptd Page 43 200400346 V. One of the description of the invention (40), and the polarization beam splitter measures a first mirror to measure the object to define the primary measurement beam 2 9 5 and pass it to the plane mirror reference to define the primary reference beams 1 295 and 1 296 respectively reflected from the plane mirror, pass through a wave blocking plate twice, and recombined by the polarization beam splitter Measure the output beam 1 2 7 2. In particular, the secondary measurement light mainly measures the light beam 1291, and the secondary reference light beam 1296 examines the light beam 1292. Therefore, the distance measurement output beam 1272 is in contact with the measurement object twice, the first time is along a common path by one of the main meanings, and the second time is a different path by the second measurement. Distance measurement output beam measurement and direct polarization are obtained by mixing polarizers 1 2 7 4

Measured by sensor 1 275. Figure 12b shows the part of the interferometer that constitutes the HSPMI output beam. The light beam 1 2 9 4 corresponds to one of the angle measurement output beams 1 2 7 3 'and the polarized beam splitter measures one of the first plane mirrors to define another secondary measurement. To this plane mirror reference: set] = 9 to 7 1 298. Beams 1 297 and 1 298 reflect the other quarter-wave retardation plates from their flat mirrors respectively, and the polarized beams are split to form an angle measurement output beam 1 273. In particular, with the polarization rotation of 1 289, the secondary measurement beam 1297 is the examination beam 1292, and the secondary reference beam 1298 is obtained from 1291. Therefore, one of the angular measurement output light beams 1273 is reflected toward the plane and a second light beam 1 296 thereof is reflected. The light passes through the individual quarters to form a distance beam. 1 2 9 5 is derived from the reference beam defined by the main beam of the measurement beam component and the measurement beam. The intensity of the vertical beam is derived from the distance amount. These parts are reversed, and the reference light and the second-order half-wave resistance are obtained from the components, which are directed toward the first beam. The first beam is combined with the main parameters of the lag plate to measure the main beam.

1057-5464-PF (Nl) .ptd p. 44 200400346

In the same path, contact the measuring object once as a part of the primary measurement beam. Then, touch the reference object as a part of the secondary reference beam 1 298. The angle is measured as one of the output beams 1 273 and the second. The component contacts the reference object as a part of the primary reference beam and then follows a different path from the common path: the contact with the measurement object once as a part of the secondary measurement beam 1 297. The angle measurement of the output beam and the vertical polarization of the reference component are measured by the polarizer 丨 2 7 6 and the intensity of the beam is measured by the sensor 丨 2 7 7. Figure 12c shows the part of the interferometer that forms the angular displacement interferometer and generates the angular measurement output beam. … The angular displacement interferometer makes the angular measurement of the component of the output beam 丨 2 73, and produces a relative phase difference when the plane mirror measures the object with an angular azimuth change center on the planes of Figs. 12a and 12c ... The relation between phase and phase difference and θ2 is as follows: Angle is also ^ 2 = k2n2b2 θ2 (i) where h is the distance between the planes of the measuring object (see Figures 2a and 12c) between the beams. ， Wave number dagger = 2 疋 / 又 2, eight is the wavelength of the input beam 11 2, 仏 is the configuration of the reference beam and the refraction beam spot of the gas in the measurement beam path on the plane mirror measurement object 1 2 8 0 As shown in Fig. 12 (b), the light spots are arranged in a straight line, along the s-axis of the linear displacement measurement light @ Beam Interferometer, parallel to the reference beam and the internal measurement beam of the angular displacement measurement interferometer. Since the total f of the interferometer shown in the embodiment in Fig. 12a is a non-limiting example of Y, its displacement is equal to 1.5 times the interval between the measurement beam of the linear displacement interferometer and the plane mirror.

1057-5464-PF (Nl) .ptd Page 45 200400346 V. Description of the Invention (42) The non-polarized beam splitter 1286 using a mirror and a pentagonal prism 1 288 has a single reflecting surface (as shown in Figure 12c. (Represented by R). Therefore, the angular displacement interferometer in Fig. 12a is configured to measure the components of the output beam at this angle and transmit them in parallel to each other. In addition, it is configured such that the angle measurement output light component is interposed between the angular displacement interferometer and the detector 1 2 9 4 or the beam shearing of the optical fiber reading head can be

Was reduced. As mentioned above, the relative beam shear 2 represents the change in the angle and orientation of the plane mirror measuring object on the plane of Fig. 12a, and the change in the physical length of the 2 denier angle measuring beam from the plane mirror measuring object to the polarized beam splitter 1281 , And 吣 represents the refractive index of the glass in the interferometer. The shoulder 6 is independent of the linear displacement of the object measured by the plane mirror. Similarly, the angular displacement interferometer in Figure 12 / Figure 1 is configured so that the paths in different output light deniers @ glass will be the same, where 1 angular displacement interference is not sensitive to temperature changes of the body. The angular displacement interferometer is also equipped with the same output beam path length in the gas. The angular displacement interferometer changes the air density in the environment. The advantage of the example is that it is used for measurement. The beam of light passes through the mirror to measure the object only once. This corner house, also vertical shift single-configured to reduce the number of light source settings, mind:

Sexuality. However, it can also be designed such that the non-linear light beam of the measuring light passes through the plane mirror to measure the object multiple times. Beam and the reference: Another advantage of the embodiment shown in Fig. 12a is that the first beam and the angular displacement output light / linear displacement wheel are measured in a ten-curve mirror.

200400346 V. Measuring beam path of invention description (43). This path corresponds to the component of the input beam 1 12 which is transmitted by the polarized beam splitter to become the main measurement beam 1 2 9 1 〇 Another advantage of the embodiment in Figure 12a is that The position of the measuring object of the light beam on the plane mirror will not be sheared due to the change of the angular orientation of the measuring object. This is because each component of the angle measurement output beam contacts the measuring object of the plane mirror only once. The non-polarized beam splitter uses a mirror and the pentagram (R in FIG. 12 c) has an image inversion characteristic of a single reflecting surface. Combining the reflected light with the non-polarized beam splitter and the pentagram (R in Fig. 12c) 'will also produce the image reversal characteristics of a multiple reflective surface reflector (as shown in Fig. 12e). The reflector shown in Figure 12e can be replaced with a reflector R, which has a facet that can be used as a non-polarized beam splitter. Another embodiment may include a combination of returning reflective surfaces in the beam set to provide image inversion characteristics for a single reflective surface. Generally speaking, the angle measurement component of the main beam reflected by the reflecting surface is set, so that the sum of the angles between the incident beam and the reflecting beam at each reflecting surface is zero, or an integer multiple of 360 degrees, where each angle is The incident beam is measured to the reflected beam and has a positive value. It is measured counterclockwise. If it is measured in a clockwise direction, a negative value is obtained. In many embodiments, there are an odd number of reflections from a surface with several normals on a common plane. Figures 13a, 13b and 13c show another embodiment of the invention. This embodiment is similar to the embodiment in FIG. 12a and includes a linear displacement interferometer (such as HSPMI) and an angular displacement interferometer. However, here

200400346 V. Description of the invention (44) In the embodiment, the measurement beam plane of the linear displacement interferometer and the measurement beam plane of the angular displacement interferometer are orthogonal to each other. The planes of Figs. 13a and 3b are parallel to each other and are separated by a distance h, as shown in Fig. 3c. Figure 1 3c depicts a schematic view of the interferometer from the side. Many of the components of the interferometer correspond to the components of the embodiment in Figure 12a. The linear displacement interferometers in Figs. 1a to 1c are HSPMI as in Fig. 2a. The plane defined by the reference beam and the measurement beam of the HSPMI lies on the plane of Fig. 13a. The operation of the angular displacement interferometer in this embodiment (FIGS. 13a to 1c) is the same as the embodiment in FIG. 12a, and an intermediate beam 1290 is generated. In the subsequent operation of the intermediate beam, the non-polarized beam splitter 386 replaces the beam splitter 1 286, and the pentagon 稜鏡 1 388 replaces the pentagon 稜鏡 1 288. Similarly, the polarized beam splitter 1381 replaces the polarized beam splitter 1281. Referring to Figs. 13a to 13c, the beam splitter 1 386 receives the intermediate beam 1290 and reflects a part of it from the plane of Fig. 13a, where it is passed through the half-wave blocking plate 1 by a pentagon 1 1 8 8 ' 3 89, the polarized beam splitter 1381 reflected back to the plane of FIG. In the embodiment of Fig. 12a ', the half-wave retardation plate rotates the linear polarization of the component of the light beam 1 394 by 90 degrees. Beam 1 394 corresponds to one of these components of the beam 373 from the angle measurement wheel 'and the polarized beam splitter reflects a first part of it to the plane mirror measurement object to define another secondary measurement beam丨 3 9 7 and pass a second part to the plane mirror reference to define the primary reference beam 1398. The light beams 1397 and 1398 are reflected from their plane mirrors respectively, and pass through them twice.

Page 48 200400346 V. Description of the invention (45) The other quarter-wave retardation plate forms an angular measurement output beam with a polarization rotation of 1 3 7 3 1 3 8 9 and the test beam 1392, and This secondary reference is 1391. Therefore, the angle measurement output contacts the measurement object once in the same path and then touches the reference object once as a secondary measurement output beam. One of the 3rd and 3rd part of the first reference beam is then touched along the measurement object. The strength of the angular displacement interferometer, which is obtained by mixing the measurement of the output beam with the reference point once as a secondary measurement, will cause a relative phase shift between the angles when the angular position is turned ^. The relationship of θ3 is as follows: 3 The polarization beam splitter is used for recombination with. In particular, a half-wave retardation plate is used to measure the beam 1 3 9 7 is obtained from the main reference beam 1 3 98 is obtained from one of the main measurement beams 1 3 7 3. A part of the measuring beam must refer to a part of the beam 1 398, and the angular two-component contacting the reference object as a main path different from the common path actually connects a part of the measuring beam 1 3 9 7. The angular amount of vertical polarization is measured by the polarizer 1 3 7 6 degrees by the sensor 1 3 7 7. The relative phase shift and angle change of the components of the beam 1 3 7 3 measured by the plane mirror on the plane measurement wheel in Fig. 1b. \ U3 υ3 where 'ba is the reference beam, (2) 1 3 c), wave The number k3 = 2 π / Youli 'is the distance between the beams (refer to | represents the reference beam and the wavelength of the second-generation-meter wheel beam " 2, ~ the refractive index of the beam spot in the plane mirror amount Z As shown in the implementation of Figures 13a to 13c, the position configuration is as shown in Figure 13d. Figure 14a represents the advantages of the present invention as described above. The embodiment of Figure 12a is further increased and implemented. In this embodiment, compared with σ, a compensation element Cl, and half the wave resistance

200400346

The retardation plate 1489, the half-wave retardation plate 1 489 first receives the distance measurement output beam 1 272 before the compensation element π. Many components of the interferometer are provided with the same reference numerals as the embodiment of Fig. 12a. The function of the 7L piece C1 is to further reduce or remove the relative beam shear of the reference component and the measured component T in the output beam of the angular displacement interferometer. The path length of the beam of the angular displacement interferometer in glass or chirp in air remains the same. The compensating element enables the angle to measure the beam components of the output beam. From the contact of the compensation element to the measurement object to its combination by the polarized beam splitter to generate an angle measurement output beam, they pass through equal paths. length. Therefore, any lateral displacement caused by the non-vertical reflection of the angle measurement beam from the measurement object is equal to the two components of the output beam of the angle measurement. Three examples of element C1 are shown in Figures 14c, 14d and 14e.平面 The planes of Figures 14c, 14d, and 14e are orthogonal to the plane of Figure 14a. The different path of the beam component of the output beam of the angular displacement interferometer is equal to 6 and the refractive index of the gas in the element C1 is equal to 吣. Therefore, there is no relative shear between the measured beam component and the test beam component of the output beam of the angular displacement interferometer, whether it is in the interferometer group, the monk detector, or the optical fiber reading head (F0P ). Fig. 14c shows an embodiment of the component C1, which includes two polarized beam splitters PBS6 and PBS7 connected to a retro-reflector RR41. Figure 14d shows an embodiment of the element C1, which includes a polarized beam splitting! § PBS8 'and two retro-reflectors RR42, RR43. Fig. 14e does not show an embodiment of the element C1, which includes a polarized light

200400346 V. Description of the invention (47) and 1 / 4-wavelength polarized beam splitter PBS9, connected to two mirrors jo, M2, QW1 and QW2. From the angle displacement of the output beam of the interferometer passing through the element C1, the generated reference beam and the path of the measuring beam in the glass are unbalanced. The reference beam component of the input beam and the measuring beam component can pass through the element C1. The difference in optical path length is compensated. The half-wave plate in Figure 丨 4a rotates the polarization of the corresponding beam by 90 degrees, so that the channel is centered and the channel through which the beam passes through the element C1 has the same value in the glass. Differential shear, the embodiment in Figure 14a also has the advantages described above. In a further embodiment, one or more compensation elements may be applied differently from the method of Fig. 14a. For example, the compensation elements c 2 and c 3 may be arranged as shown in Fig. 14b. In a further embodiment, one or more compensation elements may be set in a similar manner to the embodiment of Figs. 13a to 13c 'to further reduce or remove the shear between the angular measurement output beam components. Another embodiment of the interferometer of the present invention is shown in Figs. 15a to 15c, which combines the elements of the embodiments of Figs. 13a to 13c and Fig. 14a to generate a distance measurement output beam 1 2 7 2 and angle measurement output beams 1 2 7 3 and 1 3 7 3. The angle measurement output beam measurement plane mirror measurement object changes the angular orientation of the object with respect to two mutually perpendicular rotation axes. To generate this third output beam, the returned beam assembly 1 585 includes unpolarized beam splitters 1 2 8 6 and 1 3 8 6 and pentagons 1 2 8 8 and 1 3 8 8. This embodiment also includes a compensation element C5 to further reduce the angle to measure the output beam component.

1057-5464-PF (Nl) .ptd page 51 200400346 V. Description of the invention (48) "-Differential shear between 1273 and 1 373. Figure 15a shows the intent of the interferometer to measure the distance between the output beam 1 272, the angular measurement output beam 1 273, and the plane of the component beams used to generate the output beams. Figure 5b shows a side view of the interferometer, which includes beam 1 394, which is split to generate the second beams for generating a second angle measurement output beam and output beam 1 373. Figure 15c shows another side view of the interferometer on another lower plane and parallel to the interferometer of Figure 5c. The size of the pentagonal prism 1288 corresponds to the size of the pentagonal prism 1388. Therefore, the ratio of the chirped beam shear and the corresponding angular displacement of the object measured by the plane mirror are equal for the output beam components of the angular displacement interferometer. Complementary state C 5 (refer to Figure 15 c) can be used for linear displacement interferometers and angular displacement interferometers. The single compensator C5, referring to FIG. 15c, includes a polarized beam splitter EPBSn and pBsl2, and a retro-reflector RR51. The position of the beam spot on the plane mirror is shown in Figure 5d. In addition to further reducing the differential shear by the compensation element C5, the embodiments in Figs. 15a to 15c also have the above-mentioned advantages. Fig. 6 is a schematic diagram of an interferometer system, in which the linear and angular displacements of the plane mirror measuring member 92 can be measured. As shown in FIG. 6, the interferometer system includes an interferometer 14, which can be any of the above-mentioned interferometers, and a dynamic beam steering element, which controls the direction in which the input light beam 2 strikes the interferometer 14. The purpose of changing the input beam 12 is to remove or reduce the interferometer.

200400346 V. Description of the invention (49) Non-periodic error of the step signal. The non-periodic error is eliminated by eliminating the light change in the interferometer 14 and the picker 70. The interferometer system further includes a light source 丨 0, the generator 70, the servo controller 94, and the transducer number 9 ϋ 112 ' Detection, 90. According to the type of interferometer, the interference beam contacting chirps follows the optical path from 20 ′, and the light beam exits from the interference. The types of the light beam 112 along the optical path are the same as those in the first figure. Passed by the path 20, and controlled by a =, the measuring beam 96 is controlled by the servo controller 94 of the feeding controller 94 to the mirror 92. The transducer 8 is a signal of conviction generated by electronic processing and electric paste.

Here. The U-backup UI8! Control can be in one or two modes. -A mode is oral feeding "* The dexterity of the dynamic element 98; No. =: the amount of angular deviation between the beam incident on the mirror 92 and zero degrees. The 2 m 1 angle can be fully or partially based on, for example, The rotation change of the mirror 92 measured by the interferometer 14. The interferometer system includes a dynamic beam steering element. Patent No. 6, 252, 667, 6 3 1 3 918 (Direct brake) was moved to Wu Guo and to ΓΓ P w patent and patent 6,271,923 and invention of pct pubilcation wooo / 6 6 9 6 9 2 are all referenced. The accuracy of measuring the direction of the beam in path 20 needs to be maintained, but different

1057-5464-PF (Nl) .ptd Page 53 200400346 V. Description of the invention (50) Policy ------ The rotation angle of the mirror 92. The linear displacement change measured by the interferometer system is generally a displacement change defined by a beam steering element on a line orthogonal to the reflection surface of the mirror 92. The error caused by the deviation of the measured beam from the orthogonal line in the direction ε can be (1-Co # ε, so taking δ difference 1 ppb and error 0 · Ippb as examples, the corresponding ε can be η λ 1 is the factory 3 · 2 X 1 〇 and $ 1 · 〇 χ 1 0-5. Generally the range of 0 can be the number 1 degree of the π diameter, where Θ is the reflecting surface of the mirror 9 2 with respect to The U-shirt tool is rotated by the fixed reference structure of the system. Therefore, the required accuracy of e relative to Θ is 3.2% and 丨%. This feature of the present invention reduces the control of the dynamic beam steering element The performance requirements of the system. This is very important for feedforward systems. Another consequence of reducing the need for ε accuracy is that the accuracy of the feedforward or feedback control system can be simply determined in situ. A correction An example of the program of the system is the position of the beam steering element of the scanning mirror 92 after a fixed rotation, and the detection of the position of the mirror 92 at a fixed rotation when ε = 0, by monitoring the heterodyne or Is the magnitude of the electronic interference signal. It will move from the orthogonal line to the lithography tool The conversion factor of the measurement change between the fixed reference structures of the measurement system is cos2 0. Generally, the range of 0 is on the order of 0 · 0 0 1 degree. Therefore, for the conversion factor of ppb and pppp '0 The corresponding error should be χ 1〇_7 and x 1〇_8. The conversion factor needed to obtain the information in Θ is obtained from the change in the linear displacement. Figure 7 shows an interferometer system The linear and angular displacement of the plane mirror measuring member 92 can be measured and monitored. As shown in Figure 7, the

200400346 V. Description of the invention (51)-The interferometer system includes an interferometer 4 and a dynamic beam control element to control the direction of the input beam 12 to the interferometer 14 and the output beam 60 to the detector 70. direction.疋 To eliminate dryness errors. The angle in the non-peripheral detector 70 changes. Beam 11 2, detection processor and electrical interference beam edge to detector 70, beam 12 is the same. 'Measuring the measuring beam mirror 92. In the transducer servo control signal signal 82, the direction of the input beam 12 and the output beam 60 must be changed. The non-periodic error of the electronic interference signal of the output beam of the instrument 14 is eliminated by eliminating the interference in the interferometer 4 and the beam. The interferometer system that shears and removes the incident beam from the detector 70 further includes a light source, which generates a lighter 70, a servo controller 94, a transducer 96, and an electron 90. With each type of interferometer, the contact lens is directed to an optical path 20, and the output beam is emitted from the interferometer 14 along the optical path 60. The type of the beam 112 and the rotation of the beam steering element 98 in the i-th figure are determined by the transducer The 96 control is transmitted by the path 20, and incident at a zero degree angle of incidence to the 96 is controlled by the servo control signal 86 of the servo controller 94. 8 ^ From the servo system and dynamic beam generated by the jt sub-processor and computer 90 The control system, the corresponding interferometer system in the wrong figure, and the interferometer difference ε and the conversion factor in Figure 7 are the same as those in the sixth state beam steering system. In the interference description, the plane mirror reference can be integrated in the radio The reference part can be a second measuring part, and the-part can be included in a flat mirror interferometer. In this embodiment, the additional optical suspension device is used to couple the beam to The second quantity 200400346 V. Description of the invention (52) The reference mirror on the test piece. The above-mentioned interference system provides high-precision measurement. This system is particularly useful for lithography applications to make large-size integrated circuits ,E.g F ^ lithography crystal brain is the key technology of the semiconductor manufacturing industry. The improvements are stacked reduced width less important challenge 100_, reference Semic〇nduct〇r

Industry Roadmap, p82 (1997). Abundance is directly related to, for example, the accuracy of distance measurement interferometers that position wafers and mask platforms. Since a lithography tool can produce an output value of $ 50 1 0 0 / per year, the economic value of improving the distance measurement interferometer is huge. For each 1% improvement on the tool, an economic effect of about ㈣ can be achieved. Manufacturing of integrated circuits and sales of lithographic tools. The lithography tool's function is to guide the mask pattern wafer. This process involves determining the position of the wafer on the photoresist (exposure).夂 Align the radiation line (alignment) In order to accurately set the wafer, on the B wafer, it can be marked by a special Θ on the next day 9 ^ Alignment mark at this position, definition; I: Measure. The measurement position of the alignment mark defines the position of the wafer in the tool. Lizhou Circle The location of the radiating line with the pattern. According to this rumor, the crystalline-resistable-movable platform is calibrated, and the wafer is moved so that: the coated light is placed on the wafer. The M-wheel rays can accurately illuminate a radiation source light plate during the exposure process, which scatters the radiation to produce the reticle with a macro and pattern. It can be a photomask. line. In the case of the division, a reduction lens collects the scattering = interchangeable. Shrinking lithography radiation and forming a shrinkage

200400346 V. Description of the invention (53) --------- Small image. In proximity transfer, the scattered radiation passes through a short distance (usually on the order of micrometers) and contacts the wafer to produce a ：: i image. The radiation starts a chemical reaction in the photoresist and transfers a pattern into the photoresist. The interference system is an important component of the positioning mechanism, which can control the position of the wafer and the reticle, and record the reduced image on the wafer. If the interference system includes the above-mentioned features, the periodic error of distance measurement can be minimized and the accuracy can be improved. Generally speaking, the lithography system includes an illumination system and a wafer positioning system. The illumination system includes a radiation source for providing radiation, such as ultraviolet light, visible light, X-rays, an electron beam or an ion beam, and a reticle or a mask for imparting a pattern of light rays, thereby generating Patterned radiating lines. In addition, for reducing lithography, the illumination system may include a lens group for printing the patterned radiation onto the wafer. The patterned radiation is placed on the photoresist on the wafer. The illumination system also includes a photomask platform to support the photomask, and a certain position system to adjust the position of the photomask platform relative to the radiation. The wafer positioning system includes a wafer platform for holding the wafer and a positioning system 'for adjusting the position of the wafer platform relative to the patterned ray. The fabrication of the integrated circuit may include a plurality of exposure steps. Please refer to J. R. Sheats and B. W. Smith, in Micro1ithography: Science and Techno 1ogy (Marce1 Dekker, Inc, New York, 1998) ° The above-mentioned interference system can be used to accurately measure the wafer platform and

1057-5464-PF (Nl) .ptd Page 57 200400346 V. Description of the Invention (54) The position of the photomask platform relative to other components of the exposure system, such as lens groups, radiation sources, or bearing structures. In each example, the interference system can be set on a static structure, and the measurement device can be set on a movable element such as a photomask or a wafer platform. This situation can also be converted into that the interference system is provided on a movable element and the measurement element is provided on a static element. More generally, the interference system can be used to measure the position of any component of an exposure system relative to any other component. An example of a lithography scanner 800 for an interference system 8 26 is shown in Figure 8a. The interference system is used to accurately measure the wafer position in an exposure system. Here, the platform 822 is used to carry and position the wafer. The scanner 800 includes a frame 802 that bears other support structures and various elements on these structures. An exposure base 804 is provided above with a lens housing 806, which is provided with a reticle or reticle platform 8 1 6 for supporting the reticle or the reticle. A positioning system is used to position the mask relative to the exposure equipment, and is indicated by element 817. The positioning system 817 may include, for example, a piezoelectric transducer element and corresponding electronic parts. Although it is not included in the above embodiment, the above-mentioned interference system can be used to accurately measure the position of the reticle platform, or other movable components that need to be accurately positioned (see supra Sheats and Smith Microlithographv: — Science and Technology ) ° Hanging below the exposure foundation 804 is a support foundation 813, which carries a wafer platform 822. The platform 822 includes a plane mirror 828 for reflecting a measurement beam 854 guided to the platform by the interference system 826. A positioning system for positioning the platform 822 is indicated by element 819. The positioning system 819 may include,

1057-5464-PF (Nl) .ptd Page 58 200400346 V. Description of the Invention (55) For example, piezoelectric transducer elements and corresponding control electronics. The measurement beam is reflected back to the interference system, which is set on the exposure base 804. The interference system may be any one of the above embodiments. In operation, the radiation beam 810, such as ultraviolet light, passes through a light beam to form an optical group 8 1 2 and is transmitted downward after being reflected by a mirror 8 1 4. Therefore, the radiation beam passes through a photomask (not shown) carried by the photomask platform 8 1 6. The mask is reflected on a wafer (not shown) on a wafer platform 822 through a lens group 808. The foundation 8 0 4 and the various elements it supports utilize a spring 8 2 0 to be independent of environmental vibrations. / 'The previously described interference system may' but is not limited to the same wafer, except that the electron beam of the ultraviolet beam, the ion beam and another embodiment of the lithography scanner can be used to measure distances along multiple axes And the angle or the reticle (or the reticle) platform. In addition, other light beams, such as X-rays, can be used. (Pictured) along a wide path of an external reference ’contacting some structures-reference: mirror / counter figure 2 = beam, such as lens housing 80 6. The reference measurement beam 854 and the reference beam generation interference system 826 are combined with the displacement of the radiation beam. In addition, the surface phase system 826 can be used to measure the reticle or "in other embodiments, the interference, or the position of the other coverable platform 816 of the scanning system can be changed to the interference system. For similar micro-views, the position of the system changes. Finally, the scanner. ~ System, which can include a stepper or

200400346 V. Description of the invention (56) Lithography is a difficult part of the method for manufacturing semiconductor devices. For example, U.S. Patent No. 5,483, 343 outlines this manufacturing step. These steps are described here using Figures 8b and 8c. The 8b diagram is a manufacturing flowchart of a semiconductor device, such as a semiconductor wafer, a liquid crystal panel or a charge coupler. Step 851 is a design process for designing a circuit of the semiconductor device. Step 8 52 is a manufacturing process based on the circuit pattern design. Step 8 5 3 is a process of making a wafer using a material such as silicon. Step 8 54 is a wafer process, called pre-processing. The mask and wafer are prepared in advance, and the circuit is formed on the wafer through lithography. In order to form a circuit with sufficient accuracy on the wafer, interference positioning of the lithography tool relative to the wafer is necessary. The interference method and system described here are particularly beneficial for improving the effect of lithography. Step 855 is a combination step, which is called post-processing, in which the wafer after the processing in steps 8 to 54 is formed into a semiconductor wafer. This step includes assembly and packaging. Step 8 5 6 is an inspection step in which operability inspection, durability inspection, and other semiconductor device problems caused by step 8 5 5. Through these processes, the semiconductor device can step 857 ,. < Step 8c is an oxidation step 61 for oxidizing the surface of the wafer. Step 862 is two-phase: build-up ... to form a layer of insulation on the surface of the wafer: thousands of electrodes. Step 864 is an ion implantation process for implanting ions.

200400346 V. Description of the invention (57) Circle. Step 865 is a photoresist process for applying a photoresist to the crystal. Step 866 is an exposure process, in which the pattern on the photomask is transferred using the above-mentioned exposure device using exposure. Again, as mentioned, the use of this interference system and method can improve the precision of the lithography step. Step 867 is a developing step for performing a development knife on the wafer. Step 869 is a photoresist stripping process to remove the circuit pattern. By repeating this process, the pattern of the circuit: and = the crystal. The interference system can be used in other applications when the object needs accurate measurement. For example, The direct writing beam is: Γ × light 'ion beam or electron beam' marks the pattern on a substrate. It can be used to measure the relative movement of the substrate and the direct writing beam X h Example 2. -Beam direct writing system The schematic diagram of 900 is as follows.-The light source 91. Generates a constant writing beam 912 to: the household = 9 "'Guide the radiation beam to the-substrate 916, which is made by Ko = and a support. In order to determine the relative position of the platform, the interference guides-the reference beam 922 to-the mirror 924, and guides a measurement beam = 928. Since the reference beam contact is provided on the beam focusing combination 2, the beam direct writing system is an example using an array reference. The mirror 920 may be any of the interference systems described above. The change in position by this interference system corresponds to the phase of the direct writing beam 9 丨 2 and the substrate 9 丨 6. The interference system 9200 transmits a measurement signal 9 32 to the controller 930, and sets the relative position between the direct writing beam 912 and the substrate 916. Controls

1057.5464-PF (Nl) .ptd page 61 200400346 V. Description of the invention (58) 930 transmits-output signal 934 to _ basic 93 6, its branch and positioning platform 918. In addition, the controller 930 sends a signal 938 to the light source 910 to change the intensity of the direct writing light beam 912, so that the signal is more than enough.私 l a — Wen Yi and ^, Han.豕 1 Write the first contact with the substrate with sufficient strength. In addition, in some embodiments, the controller 930 can cause the beam focusing group 9.14 to scan the write-through beam in an area of the substrate, for example, using,

Therefore, the US board / controller 9300 system guides other elements of the system to print the picture to the side board. The action of this transfer image of the private seven M Wei I., M ^ / 丨 ^ tea is based on the electronic design pattern stored in the controller. In the case of φ, fighter ^ 丨 ~ electricity pa ^ A ^. 丄 -l, the direct writing beam prints the pattern to a light plate. The substrate is etched directly with the direct writing beam to form a substrate. Direct writing system The direct writing light includes electrons to the outside line for focusing, while limiting the scope of the god and protection. It is used to transfer the pattern to a chrome beam as an electron beam, and the beam is empty. Similarly, when the ion beam, the beam focusing group lens is used to focus and guide the particle rays, for example, X-rays, violet includes corresponding optical elements, 硌 硌 as above, but it is not used to, 'without departing from the invention For the perfect decoration, the warranty definition of the present invention shall prevail. The fabrication of the system is a lithography. In this example, the beam is, for example, a subfield generating substrate. This is either visible focus and guides the present invention. In any surrounding area, a photomask is still attached to the rear. One of them, where the beam path passes, for example, an electric beam, such as a direct writing beam of light, the radiation of which I ’m familiar with this. I can make a little application. Specially made photoelectron beams can be used as direct writing light and enclosed in the photon beam or dynamic quadrupole. It can be used to focus the radiation beam to the substrate. Range

200400346 Brief Description of Drawings Figure 1 is a schematic diagram of an interferometer system. Figure 2a is a perspective view of a first embodiment of a multi-axis interferometer. Fig. 2b shows the relative position of the measuring beam in the first embodiment. Figure 3a is a perspective view of a second embodiment of a multi-axis interferometer. Fig. 3b shows the relative position of the measurement beam in the second embodiment. Figure 4a is a perspective view of a third embodiment of a multi-axis interferometer. Fig. 4b shows the relative position of the measurement beam in the third embodiment. Figure 5a is a perspective view of a fourth embodiment of a multi-axis interferometer. Fig. 5b shows the relative position of the measuring beam in the fourth embodiment. Figure 6 is a schematic diagram of an interferometer system including a dynamic light manipulation element for directing an input beam into the interferometer. Figure 7 is a schematic diagram of an interferometer system including a dynamic beam steering element for directing an input beam into the interferometer and directing one or more output beams out of the interferometer. FIG. 8a is a schematic diagram of a lithography system for manufacturing integrated circuits. Figures 8b-8c are flow diagrams illustrating the steps for manufacturing integrated circuits. FIG. 9 is a schematic diagram of a beam writing system. Fig. 10 is another perspective view of the second embodiment shown in Fig. 3a. Figure 11 is another implementation of the interferometer integrated with the interferometer shown in Figure 10

1057-5464-PF (Nl) .ptd Page 63 200400346 Schematic illustration of the example of a perspective view. Figure 12a is a plan view of another embodiment of an interferometer system. Figure 12b is a plan view of the distance measuring part of the interferometer. Figure 12c is a plan view of the angle measuring part of the interferometer. Figure 12d depicts the distribution of light spots on the measuring object of the plane mirror. Figure 1 2e is a schematic diagram of a component that can be used in another interferometer system. Figures 13a, 13b, and 13c are plan views of another embodiment of the interferometer system, Figure 13a is a plan view of a first plane of the interferometer system, and Figure 13b is a second plane of the interferometer system FIG. 13c is a plan view of a third plane of the interferometer system; and FIG. 13d is a distribution diagram depicting the distribution of light points on a plane mirror measurement object of the interferometer system. Figures 14a and 14b are plan views of additional embodiments of an interferometer system including one or more compensation elements. Figures 14c, 14d, and 14e are schematic diagrams of different forms of compensation elements. Figures 15a, 15b, and 15c are plan views of another additional embodiment of an interferometer system; Figure 15a is a plan view of a first plane of the interferometer system; Figure 15b is one of the interferometer systems. A plan view of two planes; FIG. 15 c is a plan view of a third plane of the interferometer system; and

1057-5464-PF (Nl) .ptd Page 64 200400346 Brief Description of Drawings Figure 15d is a diagram depicting the distribution of light spots on the measuring object of the plane mirror of the interferometer system. Identical reference 4 indicates the symbol of 10 ~ light source; I4 ~ interferometer; 60 ~ light path; 80 ~ signal; 8 ~ servo control signal; 9 ~ 2 ~ face mirror; 9 ~ 6 ~ transducer ; II 0 ~ light source; 114 ~ flat mirror interferometer; 1 3 0 ~ polarized beam splitter 132 ~ quarter wavelength phase 134 ~ quarter wavelength phase 1 40 ~ beam; 144 ~ beam; 1 5 0 ~ Retro-reflector; 1 5 2 ~ non-polarized beam splitting 154 ~ 稜鏡; 162 ~ output beam; 2 1 4 ~ interferometer; 222 ~ 224 > 226 and 22 represent the same elements. 12 ~ input light beam; 20 ~ optical path; 70 ~ sensor; 8 2 ~ servo signal; 9 0 ~ electronic processor and computer; 9 4 ~ servo controller; 9 8 ~ dynamic element; 112 ~ beam; 122, 124 and 126 ~ measuring beam; interface; bit blocking plate; bit blocking plate; 142 ~ beam; 146 ~ beam; device interface; 160 ~ output beam; 194 ~ plane mirror; 8 ~ measuring beam;

1057-5464-PF (Nl) .ptd Page 65 200400346 Schematic illustration of 230 ~ polarized beam splitting interface; 232 ~ quarter wave plate; 2 3 3 ~ back plate 240 ~ beam; 244 ~ beam 246 ~ Beam; 248 ~ beam 2 50 ~ retrospective mirror; 252 ~ beam splitter interface; 2 5 4 ~ prism 2 5 6 ~ prism; 260 ~ beam 2 6 2 ~ beam; 264 ~ beam 3 1 2 ~ input beam; 322 , 324, 326 ~ measuring beam; 330 ~ beam splitter interface; 358 ~ beam splitter interface; 359 ~ prism; 360, 362 ~ output beam;

412 ~ input beam; 414 ~ interferometer; 422, 4 2 4, 4 2 6 ~ measuring beam 430 ~ beam splitter interface j 458 ~ beam splitter interface, 459 ~ 稜鏡; 460, 4 62 ~ output 800 ~ Lithography scanner; 802 ~ frame; 804 ~ exposure base; 806 ~ lens housing 808 ~ lens group; 810 ~ radiation beam 812 ~ optical group; 813 ~ support base 814 ~ mirror; 816 ~ photomask platform 817 ~ positioning system; 819 ～ Positioning system 1057-5464-PF (Nl) .ptd Page 66 200400346 Schematic description 822 ～ Platform; 826 ～ Interference system; 828 ～ Plane mirror; 854 ～ Measuring beam; 851 > 852 ···, 857 ~ steps; 861, 8 6 2 ···, 8 6 9 ~ steps; 9 0 0 ~ beam direct writing system; 910 ~ light source; 912 ~ direct writing beam; 914 ~ beam focusing combination; 916 ~ substrate; 918 ~ Mobile platform; 920 ~ Interference system; 922 ~ Reference beam; 924 ~ hiL. · Mirror, 926 ~ Measuring beam; 928 ~ Mirror, 930 ~ Controller; 932 ~ Measurement signal; 934 ~ Output signal; 936 ~ Basic 938 ~ signal; 9 4 4 ~ signal; 11 0 1 ~ input beam; 1102 production ~ beam splitter assembly; 11 0 3 ~ non-polarized beam splitter assembly; 1104, 1105 ~ secondary input beam 9 1107, ~ Polarized bubble leak filter; 1224 > 2224 ^ 1226 '2 2 2 6 ~ Measuring beam; 1 232, ~ Phase retardation plate, 1 242--beam; 1 244 · ~ beam; 1 246-^ beam 1 250, ~ cube corner retro-reflector; 1 252, ~ beam splitter interface;

1057-5464-PF (Nl) .ptd p. 67 200400346

1 254 ~ reflection interface; 1 256 ~ interface; 1264, 1266, 2264, 2266 ~ output beam; 1 2 5 0 '~ second retro-reflector; 1 254, ~ plane mirror; 1266, 2264', 2266 '~ output Beam; 1 272 ~ first output beam; 1273 ~ output beam; 1274 ~ polarizer; 1 275 ~ sensor; 1 280 ~ plane mirror measuring object; 1 2 8 1 ~ polarized beam splitter; 1 2 8 2 ~ quarter wave retardation plate; 1283 ~ plane mirror reference; 1284 ~ quarter wave retardation plate 1 285 ~ return beam assembly; 1 286 ~ non-polarized beam splitter 1 287 ~ retro reflector 1 288 ~ 5 稜鏡; 1 2 8 9 ~ half-wave retardation plate; 1 2 0 9 ~ intermediate beam; 1291, 1292 ~ beam; 1293, 1294 ~ beam; 1 295 ~ secondary measurement beam; 1 296 ~ Secondary reference beam; 1 297 ~ secondary measurement beam; 1 298 ~ secondary reference beam; 1 3 1 2 ~ input beam; 1 322, 1 324, 1 326 ~ measurement beam; 1 350 ~ retro-reflector; 1 364 ~ output beam; 1 373 ~ angle measurement output beam; 1 3 7 6 ~ polarizer; 1 3 7 7 ~ sensor; 1 3 8 1 ~ pole Beam splitter; 138 6 ~ unpolarized beam splitter;

1057-5464-PF (Nl) .ptd Page 68 200400346 Schematic description of 1388 ~ pentagonal 稜鏡; 1389 ~ half-wave retardation plate; 1391 ~ main measurement beam; 1392 ~ main reference beam; 1 394 ~ beam; 1 397 ~ secondary measurement beam; 1398 ~ secondary reference beam; 1412 ~ input beam; 1 422, 1 424 to, 1 426 ~ measurement beam; 1460, 1462 ~ output beam; 1 489 ~ half-wave retardation plate 1585 ~ return beam assembly; 2244, 2246 ~ beam; 2252 ~ interface; 2252 ~ non-polarized beam splitter interface; 2264 ~ beam, 2266 ~ output beam; 3252 ~ interface; Cl, C2, C3, C5 ~ compensation element ;

M1, M2 ~ face mirrors; PBS6, PBS7, PBS8, PBS9, PBS11, PBS12 ~ polarized beam splitters; QW1, QW2 ~ 1/4 wavelength polarizers; R R 4 1, R R 5 1 ~ retro-reflector.

1057-5464-PF (Nl) .ptd Page 69

Claims (1)

200400346 VI. Scope of patent application ^ 1 A device including: a multi-axis interferometer that measures the relative position of a reflection amount along multiple degrees of freedom; — First include the relative position of the measurement object with respect to a different degree of freedom. Each of the output beams includes a beam component that touches the measurement object at least once along a common slightly%; and At least one of the beam components makes a second contact with the measurement object along a first path different from the common path & h 2 · The device according to item 1 of the scope of the patent application, wherein the output beam in which the common path and the first path are in contact with the measurement object further includes a second beam component, and the second beam The component is not in contact with the measurement object. 3. The device according to item 1 of the scope of patent application, wherein one of the degrees of freedom is a distance along a first measurement axis to the measurement object. 4 · The device according to item 3 of the scope of patent application, wherein the above-mentioned output beam contains information about the distance along the first measurement axis to the measurement object, including along the common path and the first path The beam component in contact with the measurement object. 5. The device according to item 4 of the scope of the patent application, wherein the first measurement axis is defined by the common path and the / Losson. 6. The device according to item 5 of the scope of patent application, wherein each point on the first measurement axis is equidistant from the common path and the corresponding point on the first path. '7 · The device as described in item 4 of the patent application, wherein the other beam 200400346 VI. Scope of patent application The component is in contact with the measurement object along a second path which is different from the common path. 8. The device according to item 7 of the scope of patent application, wherein the output beams in contact with the measurement object along the common path and the second path include information about a second measurement axis to the measurement object. Distance information, the second measurement axis is defined by the common path and the second path, and is different from the first measurement axis. 9. The device according to item 8 of the scope of patent application, wherein a third beam component is further along a third path different from the common path, and at least makes a second contact with the measurement object. 10. The device according to item 9 of the scope of patent application, wherein the output beams in contact with the measurement object along the common path and the third path include information about a third measurement axis to the measurement. For the distance information of objects, the third measurement axis is defined by the common path and the third path, and is different from the first and second measurement axes. 11. The device according to item 10 of the scope of patent application, wherein the first and second measurement axes define a first plane, and the second and third measurement axes define a difference from the first One of the planes is the second plane. 1 2. The device according to item 4 of the scope of patent application, wherein the second of the output beams includes the angular orientation of the measurement object with respect to a first rotation axis. 1 3. The device as described in item 12 of the scope of the patent application, wherein the second output beam includes the first-mentioned beam component that is in contact with the measurement object along the common path, and is in contact with another A beam component with different beam components 1057-5464-PF (Nl) .ptd Page 71 200400346 6. The scope of the patent application, wherein the other beam component contacts the measurement object along a second path different from the common path. 14. The device according to item 13 of the scope of patent application, wherein the first path is different from the second path. 15. The device according to item 14 of the scope of patent application, wherein the first rotation axis is perpendicular to a plane defined by a common path and the second path. 16. The device according to item 13 of the scope of patent application, wherein a third output light beam includes an angular position of the measurement object with respect to a second rotation axis different from the first rotation axis, wherein The third output beam includes the first-mentioned beam component that contacts the measurement object along the common path, and another beam component different from the first beam component, wherein the other beam component The measurement object is contacted along a third path different from the common path. 1 7. The device according to item 16 of the scope of patent application, wherein the second rotation axis is orthogonal to the first rotation axis. 1 8. The device according to item 1 of the scope of patent application, wherein the multi-axis interferometer generates at least four output beams, and each output beam contains information of a different degree of freedom of the multiple degrees of freedom. 19. The device according to item 1 of the scope of patent application, wherein the multi-axis interferometer provides information on at least five degrees of freedom. 20. The device as described in item 1 of the scope of patent application, wherein the multi-axis interferometer provides information on at least seven degrees of freedom. 2 1. The device according to item 1 of the scope of patent application, wherein the measuring object includes a flat mirror. 1057-5464-PF (Nl) .ptd Page 72 200400346 200400346 ί ΐ m :: secondary light ί touches the measurement object along the first path, and the amount of light m touches the common path and the first path contacts the 29. The device basin device set according to item 28 of the scope of patent application In order to give #f $ | 丨 里 ,, ^ Τ «Λ interferes with the target, & 5, the beam will wait for another beam, and will be in contact with the ^ ^ object to ^, twice this time The light beams are combined to a second light beam that produces a first output light beam, wherein the first output light beam includes a distance from the measurement object along a measurement axis defined by the common path and the first path. 2: 3. The device according to item 28 of the scope of patent application, wherein the interferometer is arranged to guide at least another light beam along a second path to contact the measuring object at least a second time, the second path being different from the common Path and the first path. 3 1 · The device according to item 30 of the scope of patent application, wherein the interferometer is configured to obtain another set of sub-beams from the input beam, and will contact the measurement object for at least two Each secondary beam is combined with a secondary beam corresponding to one of the other set of secondary beams to produce A corresponding output beam. 3 2 · The device described in item 28 of the patent application 'where the interferometer is set to obtain another / group of secondary beams from the input beam' and will come into contact with the 3: measuring object at least two Each subsequent beam is combined with one of the other set of sub-beams to generate an output beam, and the traveler guides another beam from the other set of sub-beams along a second path different from the common path to contact the This quantity ✓The object, and combines another fire beam that contacts the measurement object along the common path with the secondary beam that contacts the measurement object along the second path to produce another output beam. 0 〇57-5464-PF (Nl) .ptd Page 74 200400346 VI. Patent Application Range 33. The device described in Item 27 of the Patent Application Range, where the interferometer is further δ and i) will be in contact with the amount The first beam after measuring the object is combined with a primary reference beam to define an intermediate beam; ii) the intermediate beam is divided into a group of secondary measurement beams and a group of secondary reference beams; iii) each secondary measurement is guided The light beam is in contact with the measurement object; iv) each of the primary measurement beam after contacting the measurement object and the corresponding secondary reference beam are recombined to generate a corresponding output beam, each of which corresponds to A different secondary measurement and reference beam. 34. The device as described in item} of the patent application scope, wherein the interferometer comprises: a common polarized beam splitter that guides a main measurement beam from an incident input beam along a common path with the amount Contact with the measuring object; and a return beam assembly, receiving an intermediate beam containing the main measurement beam from the polarized beam splitter, splitting the intermediate beam into multiple beams, and then directing the multiple beams back to the Polarized beam splitter. 35. The device according to item 34 of the scope of the patent application, wherein the polarized beam splitter is further provided to guide a main reference beam obtained from the incident input beam to a reflected reference object, wherein the main quantity The measurement beam and the main reference beam correspond to orthogonal polarization components of the incident input beam. 3 6 · The device described in item 34 of the scope of patent application, wherein the polarized beam splitter is further configured to make the main measurement beam and the reference beam after they are in contact with the measurement object and the reference object, respectively. Combined to form the intermediate beam. 37. The device according to item 36 of the scope of patent application, wherein the polarization 1057-5464-PF (Nl) .ptd Page 75 200400346 VI. Patent application range The beam splitter is set to i) divide the multiple beams into a set of secondary measurement beams and a set of secondary reference beams; ii) Guide each primary measurement beam to contact the measurement object; iii) guide each / secondary reference beam to contact the reference object; and iv) separate each primary measurement beam and the corresponding secondary reference beam from the The measurement object and the reference object are recombined to form a corresponding output beam. 38. The device according to item 37 of the scope of patent application, wherein each of the secondary measurement beams contacts the measurement object along a path different from the common path. 39. The device according to item 37 of the scope of patent application, wherein the interferometer further comprises a reference object. 40. The device as described in claim 39, wherein the reference object includes a flat mirror. 4 1 · The device as described in item 37 of the scope of patent application, wherein the interferometer further comprises a measuring quarter-wave denier, located between the polarized beam splitter and the measuring object . 4 2 · The device as described in item 41 of the patent application range, wherein the interferometer further includes a reference quarter-wave retarder, located between the polarized beam splitter and a far reference. 43. The device according to item 34 of the scope of patent application, wherein the returning beam assembly includes at least one set of tortuous optical systems and at least one non-polarized beam splitter to divide the intermediate beam into multiple beams. 4 4 · The device according to item 43 of the scope of the patent application, wherein the at least one set of tortuous optics includes a retro-reflector setting taking precedence over any non-polarization 1057-5464.PF (Nl) .ptd Page 76 200400346 6. Scope of patent application Beam splitter to receive the intermediate beam. 45. The device according to item 44 of the scope of patent application, wherein the returning beam assembly further includes a beam splitting assembly 'the beam splitting assembly includes at least one non-polarized beam splitter, wherein the beam splitting assembly receives The intermediate beam from the retro-reflector generates multiple beams and directs the multiple beams back to the polarized beam splitter in a direction parallel to the intermediate beam. 46. The device according to item 45 of the scope of patent application, wherein the beam splitting assembly includes a plurality of non-polarized beam splitters. 47. The device according to item 46 of the scope of patent application, wherein the returning beam assembly further includes a blocking plate disposed between the retro-reflector and the beam splitting assembly, wherein the blocking plate The azimuth is used to reduce the rotation of the intermediate beam polarization caused by the retro-reflector. 48. The device according to item 34 of the scope of the patent application, wherein the interferometer further includes an input beam optical assembly, the input beam optical assembly includes a non-polarized beam splitter, and the input beam optical assembly The system divides the original input beam into the first-mentioned input beam and a second input beam traveling in parallel with the first input beam, and guides the first and second input beams to a polarized beam splitter. 4 9 · The device according to item 43 of the scope of the patent application, wherein the at least one set of tortuous optical systems includes a tortuous optical system for measuring angles and a tortuous optical system for measuring distances, wherein the tortuous optical system for measuring angles A half-wave retarder is included to rotate the polarization of at least one of the plurality of beams. 50. The device according to item 49 of the scope of patent application, wherein the measuring angle tortuosity optical system further comprises a pentagonal lens, and the measuring distance is tortuous light. 1057-5464-PF (Nl) .ptd Page 77 200400346 6. Scope of Patent Application The Department of Science and Technology also includes a retro-reflector. 5 1 · The device according to item 43 of the scope of patent application, wherein the non-polarized beam splitter is arranged to take priority over any tortuous optical system to receive the intermediate beam. 5 2 · A method, including: Interferometer to generate multiple output beams, each output beam includes information about the relative position of the measurement object for different degrees of freedom, where each output beam includes a beam component, along a common path Touch the measurement object at least once, and at least one of the beam components in contact with the measurement object at least a second time along the path with the common path. 53 · — A device including:-a multi-axis interferometer to measure a reflection head along multiple degrees of freedom: ί 'where the interferometer is set to generate multiple rounds of light beam 5 = beam including the measurement object relative The difference in the degrees of freedom of the difference is that the beam includes-beam components along-a common path followed by light three: industrial output = beam includes another-beam components and the first mentioned after the first omission: & total ΐ Another—The beam component touches the measurement object at least once along a different path from the common path. ^ Including 5: The device described in Item 53 of this Shenqing Patent Fan Yuan, the upper part, the upper part, the tenth part, the first beam component in contact with the measurement object and the 1057-5464-PF (Nl) .ptd 78 Page 200400346 6. The scope of the patent application along the first path contacts the output beam of another beam component of the measurement object, including information about the angular orientation of the measurement object relative to a first axis of rotation. 5 5. The device according to item 54 of the patent application, wherein the first rotation axis is perpendicular to the common path and a plane defined by the first path. 5 6. The device according to item 54 of the scope of patent application, wherein a second output beam includes information about the angular orientation of the measurement object with respect to a second rotation axis different from the first rotation axis, wherein the The second output beam includes the first-mentioned beam component that is in contact with the measurement object along the common path, and another beam component different from the first beam component, wherein the second output beam Another beam component contacts the measurement object along the second path different from the common path. 5 7. The device according to item 56 of the patent application scope, wherein the second rotation axis is orthogonal to the first rotation axis. 5 8. A method including: the interferometer generates multiple output beams, each output beam including information about the relative position of a measurement object for different degrees of freedom, wherein each output beam includes a beam component, along a common The path touches the measurement object at least once, wherein at least one output beam includes another beam component that is different from the first mentioned beam component, and wherein the other beam component is along a first section that is different from the common path. A path contacts the measurement object at least once. 5 9. — A lithography system is used to manufacture integrated circuits on a wafer. 1057-5464-PF (Nl) .ptd Page 79 200400346 6. The scope of patent application system includes: a platform for ancient _ / π and holding the wafer; • a lighting system for the radiation of the pattern, space and ground Map to the wafer position; the 60-position system of the wafer is used to adjust the position of the platform and the device described in item 1 or 53 of the patent range relative to the mapped radiation, and is used to monitor the phase one. For, the location of the mapped radiation. The system includes a lithography system for manufacturing an integrated circuit on a wafer, which is used to support the wafer; and a lens set, which generates an aerial shot to adjust the wafer to control the light. Including a radiation source, a photomask, a positioning system, an assembly, and the installation described in item 1 or 53 of the scope of patent application. During operation, the radiation source directs the radiation through the photomask in a pattern. Radiation, the position of the positioning system relative to the position of the photomask emitted by the radiation source, the lens assembly mapping the spatial pattern of radiation to the top, and the position of the interferometer system relative to the radiation cover of the radiation source. • A beam writing system for manufacturing a lithographic mask, which is a light source that provides-engraving a beam to make a pattern on a substrate; a platform 'supports the substrate; a beam guiding assembly for transmitting the writing beam to The substrate; 闘 1057-5464-PF (Nl) .ptd Page 80 ____ 一 200400346 6. Patent application scope-The positioning system is used to position the platform and the beam guiding assembly with each other; and the device described in item 1 or 53 of the patent application scope is used to monitor the platform relative to the beam guiding assembly. Cheng's position. 6 2 · — A lithography method for manufacturing integrated circuits on a wafer. The method includes the following steps: Supporting the $ Hai wafer on a movable platform 'Map space pattern radiation to the wafer; adjustment The position of the platform; monitor the position of the platform using the method described in item 52 or item 58 of the scope of patent application. 6 3 · A lithography method for manufacturing an integrated circuit on a wafer, the method includes the following steps: directing an incident radiation through a photomask to generate a spatial pattern radiation; positioning the light relative to the incident radiation A cover; monitoring the position of the platform with respect to the incident radiation by using the method described in item 52 or item 58 of the scope of the patent application; mapping the spatial pattern radiation to the wafer. 64. A method from the perspective of 'for manufacturing integrated circuits on a wafer, the method includes the following steps: a positioning of the first ordinary piece of the lithography system relative to the second element of a lithography system' Exposing the wafer to space pattern radiation; and monitoring the position of the first component relative to the second component by the method described in the 52nd or 58th of the scope of patent application. I 1 I 1 1 I 1 The lithography method described in 6 3, 6 and 4. 66. A method for manufacturing an integrated circuit, the method comprising applying for the lithographic device described in items 59, 60 of the patent scope. June 6 7 — A method for manufacturing a lithographic mask, the method comprising: directing a writing beam to a substrate to cause a pattern on the substrate; positioning the substrate relative to the writing beam; The method described in item 53 or 58 of the scope of the patent application monitors the position of the substrate relative to the writing beam. 1057-5464-PF (Nl) .ptd Page 82