SU921124A1 - Способ металлизации отверстий печатных плат - Google Patents
Способ металлизации отверстий печатных плат Download PDFInfo
- Publication number
- SU921124A1 SU921124A1 SU792772501A SU2772501A SU921124A1 SU 921124 A1 SU921124 A1 SU 921124A1 SU 792772501 A SU792772501 A SU 792772501A SU 2772501 A SU2772501 A SU 2772501A SU 921124 A1 SU921124 A1 SU 921124A1
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- SU
- USSR - Soviet Union
- Prior art keywords
- printed circuit
- carried out
- heat treatment
- holes
- metallization
- Prior art date
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/08—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1603—Process or apparatus coating on selected surface areas
- C23C18/1605—Process or apparatus coating on selected surface areas by masking
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1655—Process features
- C23C18/1664—Process features with additional means during the plating process
- C23C18/1667—Radiant energy, e.g. laser
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1675—Process conditions
- C23C18/1678—Heating of the substrate
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1675—Process conditions
- C23C18/168—Control of temperature, e.g. temperature of bath, substrate
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
- C23C18/40—Coating with copper using reducing agents
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1646—Characteristics of the product obtained
- C23C18/165—Multilayered product
- C23C18/1653—Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/1851—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material
- C23C18/1872—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment
- C23C18/1886—Multistep pretreatment
- C23C18/1893—Multistep pretreatment with use of organic or inorganic compounds other than metals, first
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
- C23C18/2046—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
- C23C18/2073—Multistep pretreatment
- C23C18/2086—Multistep pretreatment with use of organic or inorganic compounds other than metals, first
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/02—Heating or cooling
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/46—Electroplating: Baths therefor from solutions of silver
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/005—Electrodes
- H01G4/008—Selection of materials
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/42—Plated through-holes or plated via connections
- H05K3/422—Plated through-holes or plated via connections characterised by electroless plating method; pretreatment therefor
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/42—Plated through-holes or plated via connections
- H05K3/423—Plated through-holes or plated via connections characterised by electroplating method
- H05K3/424—Plated through-holes or plated via connections characterised by electroplating method by direct electroplating
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
- Y02T50/00—Aeronautics or air transport
- Y02T50/60—Efficient propulsion technologies, e.g. for aircraft
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S205/00—Electrolysis: processes, compositions used therein, and methods of preparing the compositions
- Y10S205/918—Use of wave energy or electrical discharge during pretreatment of substrate or post-treatment of coating
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Thermal Sciences (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemically Coating (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
- Electroluminescent Light Sources (AREA)
Description
(5) СПОСОБ МЕТАЛЛИЗАЦИИ ОТВЕРСТИЙ ПЕЧАТНЫХ ПЛАТ
I
Изобретение относитс к изготовлению печатных пЛат, в частности к йеталлизации стенок отверстий односторонних , двухсторонних и многослойных печатных плат.
Известен способ металлизации отверстий печатных плат, основанный на химическом осаждении меди на диэлектрическую поверхность, которую предварительно активируют путем обработки в растворе хлористого олова, промывки , обработки ,в растворе хлористого паллади , промывки, а после химической металлизации осуществл ют электрохимическое наращивание покрыти требуемой толщины 1 .
Однако данный способ не обеспечивает надежность межслойных соединений в печатных платах из-за контактного выделени паллади на торцах медных контактных площадок. Эта палладиева пленка в процессе изготовлени и эксплуатации платы эффективно.. поглощает водород, гфевраща сь в гидРИД паллади - хрупкий и неэлектрорроводный , материал, в результате чего нарушаетс механический и электри ,ческий крнтакт и плата выходит из стро . Кроме того, способ технологически сложен, предусматривает операцию химическогоМеднени , требует использовани дорогих и дефицитных реактивов .
Наиболее близким по технической
10 сущности вл етс способ металлизации отверстий печатных плат, включающий их обезжиривание, активацию и электрохимическое наращивание металла 2.
IS
Недостатками известного способа вл ютс сложность технологического процесса и слаба адгези .
Цель изобретени - упрощение технологического процесса и улучшение
20 адгезии.
Поставленна цель достигаетс тем, что в способе металлизации отверстий печатных плат, включающем их обезжи39 ривание, активацию и электрохимичес кое напр жение металла, активирование осущестбл ют путем смачивани в растворе фосфорсодержащей соли меди ипоследующей термообработки. При этом термообработку провод т путем нагрева в нормальных услови х до температуры 100-135 С- в течение мин.. КрЬме того, термообработку провод т путем облучени ИК-лучами до тем пературы 220-270°С в течение 7-20 с. Термообработку провод т путем совместного .облучени ИК- и УФ-лучами до температуры 180-220°С в течение 5-12 с. Способ осуществл етс следующим образом. . . В процессе активировани при сма .чивании заготовки на поверхность сте нок отверстий наноситс тонкий -слой водного раствора фосфорсодержащей со ли меди. При термообработке, в услови х интенсивного испарени раствори тел , вначале происходит осаждение на поверхность-стенки свердой термочувствительной соли .меди, а затем ее разложение с образованием активных медных частиц, а сама поверхност стенок отверстий становитс электропроводной . В результате, после промывки становитс возможным электрохимическое наращивание на стенки отверстий сло металла требуемой толщины . П р и м е р 1. Печатную плату из фольгированного стеклотекстолита с просферленными отверсти ми обезжиривают в растворе порошка Лотос, декапируют в растворе сол ной кислоты, промывают в воде в течение 1-2 мин. Затем плату смачивают в растворе фосфорсодержащей соли меди с концентрацией 300 г/л в течение 20 с методом протока раствора через отверсти . После этого подвергают термообработке путем нагрева при тем пературе в течение 7 мин до полного завершени термического разложени твердого осадка на поверхности стенок отверстий. Плату промывают водой и подвергают электрохимическому меднению в известных ваннах, например: CuSO SHzO 230 г/л, H2S04 ( уд. вес. 1,8) 60 г/л, CjHsdl 10 МЛ/Л Плотность тока 2,5-3,0А/дм,.темпер тура l8-25°C, врем выдержки 60 мин до толщины 30 мк. П р И М е р 2. Электрохимическую металлизацию сквозных отверстий печатной платы ведут как в примере 1, но активирование стенок отверстий осуществл ют путем смачивани платы в растворе фосфорсодержащей -соли меди с концентрацией 100 г/л в течение 20 с и термообработки ИК-излучателем при температуре 270°С в течение 20 с, после чего следует промывка и электрохимическое наращивани покрыти , на стенки отверсти . П р и м е р 3. Электрохимическую металлизацию сквозных отверстий пеп четной платы ведут как в примере 1, но активирование стенок отверстий осуществл ют путем смачивани платы в растворе фосфорсодержащей соли меди с концентрацией 20 г/л в течение 20 си термообработкой совместно ИК- и У|15-лучами, например установкой ПР-3796, используемой в производстве .печатных плат дл оплавлени сплава олово-свинец, в которой примен ютс галогенные йодонаполненные лампы КГИ-220-2000-. Термообработка ведетс при температуре 220°С в течение 7с. Указанный способ обеспечивает следующие преимущества. Во-первых,резко упрощаетс технологический процесс электрохимической металлизации сквозных отверстий печатных плат, как;это следует из приведенной схемы. Упрощение св зано с сокращением числа стадий, уменьшением дли-тельности процесса (врем , требуемое дл подготовки отверстий к электрохимическому наращиванию покрыти , сокращаетс от мин до 2-15 мин в зависимости от условий термообработки ) , отсутствием необходимости в приготовл нии , использовании, корректировке и утилизации отходов различных растворов при активировании стенок отверстий и их электрохимическом меднении . Исключение операции химического меднени позвол етна серийном предпри тии сократить линию мета/1лизации отверстий от 20 м до 8 м, освободить производственные площадки и рабочую силу. Во-вторых, улучшаетс адгези металл ического покрыти к стенкам отверстий . Предлагаемый, способ исключает проблемы технологической надежности сцеплени металлического покрыти .с торцами медных контактных площадок, поскольку исключает применение солей
паллади . С другой стороны, способ обеспечивает повышение прочности сцеплени с диэлектрической поверхностью стенок отверстий. Результаты испытаний прочности сцеплени металлизированного пистона со стенками отверстий выполненных на р де предпри тий, показывают , что отверсти в платах допускают 12-20-кратную перепайку, тогда как известный способ обеспечивает лишь 3-5-кратную перепайку.
В-третьих, способ исключае.т из применени дорогие и дефицитные вещества .
Claims (3)
1. Способ металлизации отверстий печатных плат, включающий их обезжиривание , активацию и электрохимическое наращивание металла,.о т л и чающийс тем, что, с целью . упрощени технологического процесса и улучшени адгезии, активирование осуществл ют путем смачивани в растворе фосфорсодержащей соли меди и последующей термообработки.
2,Способ по П.1, о т л и ч а ющ и и с тем, что термообработку првод т путем нагрева в нормальных услови х до температуры 100-135 С в течение 7-15 мин.
3.Способ по п. 1, о т л и ч а ющ и и с тем, что термообработку провод т путем облучени ИК-лучами до температуры 220-270 С в течение 7-20 с.
Ц. Способ по п. Т,отличающ и и с тем, что термообработку провод т путем совместного облучени ИК- и УФ-лучами до температуры 180220 с в течение 5-12 с.
Источники информации, прин тые во внимание при экспертизе
1.Федулова А. Д., Котов Е. П. и др. Многослойные печатные платы. М., Советское радио, 1977, с. 133 1 37.
2.Авторское свидетельство СССР , .кл. Н 05 К 3/10, 1975 (прототип ) .
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SU792772501A SU921124A1 (ru) | 1979-06-19 | 1979-06-19 | Способ металлизации отверстий печатных плат |
JP55501143A JPS59500869A (ja) | 1979-06-19 | 1980-04-25 | メタライジング溶液および方法 |
DE3045281T DE3045281C2 (de) | 1979-06-19 | 1980-04-25 | Loesung und verfahren zur elektrochemischen metallisierung von dielektrika |
PCT/SU1980/000063 WO1980002570A1 (en) | 1979-06-19 | 1980-04-25 | Solution for activation of dielectric surface and obtaining conducting layer thereon |
US06/243,929 US4576689A (en) | 1979-06-19 | 1980-04-25 | Process for electrochemical metallization of dielectrics |
FR8013535A FR2459300A1 (fr) | 1979-06-19 | 1980-06-18 | Solution pour la metallisation electrochimique de materiaux dielectriques, procede de metallisation electrochimique de materiaux dielectriques au moyen de ladite solution, et materiaux dielectriques traites conformement audit procede |
SE8101066A SE442124B (sv) | 1979-06-19 | 1981-02-17 | Forfarande for elektrokemisk metallisering av ett dielektrikum samt aktiveringslosning for anvendning hervid |
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SU792772501A SU921124A1 (ru) | 1979-06-19 | 1979-06-19 | Способ металлизации отверстий печатных плат |
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SU921124A1 true SU921124A1 (ru) | 1982-04-15 |
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SU792772501A SU921124A1 (ru) | 1979-06-19 | 1979-06-19 | Способ металлизации отверстий печатных плат |
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US (1) | US4576689A (ru) |
JP (1) | JPS59500869A (ru) |
DE (1) | DE3045281C2 (ru) |
FR (1) | FR2459300A1 (ru) |
SE (1) | SE442124B (ru) |
SU (1) | SU921124A1 (ru) |
WO (1) | WO1980002570A1 (ru) |
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-
1979
- 1979-06-19 SU SU792772501A patent/SU921124A1/ru active
-
1980
- 1980-04-25 DE DE3045281T patent/DE3045281C2/de not_active Expired
- 1980-04-25 JP JP55501143A patent/JPS59500869A/ja active Granted
- 1980-04-25 WO PCT/SU1980/000063 patent/WO1980002570A1/ru active Application Filing
- 1980-04-25 US US06/243,929 patent/US4576689A/en not_active Expired - Fee Related
- 1980-06-18 FR FR8013535A patent/FR2459300A1/fr active Granted
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1981
- 1981-02-17 SE SE8101066A patent/SE442124B/sv not_active IP Right Cessation
Cited By (1)
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RU2708677C1 (ru) * | 2019-02-08 | 2019-12-11 | Федеральное государственное автономное образовательное учреждение высшего образования "Национальный исследовательский Томский государственный университет" (ТГУ, НИ ТГУ) | Способ металлизации сквозных отверстий в полуизолирующих полупроводниковых подложках |
Also Published As
Publication number | Publication date |
---|---|
FR2459300B1 (ru) | 1984-01-27 |
SE442124B (sv) | 1985-12-02 |
JPS59500869A (ja) | 1984-05-17 |
DE3045281T1 (de) | 1982-02-18 |
JPS6133077B2 (ru) | 1986-07-31 |
WO1980002570A1 (en) | 1980-11-27 |
SE8101066L (sv) | 1981-02-17 |
DE3045281C2 (de) | 1984-03-08 |
FR2459300A1 (fr) | 1981-01-09 |
US4576689A (en) | 1986-03-18 |
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