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SU921124A1 - Способ металлизации отверстий печатных плат - Google Patents

Способ металлизации отверстий печатных плат Download PDF

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Publication number
SU921124A1
SU921124A1 SU792772501A SU2772501A SU921124A1 SU 921124 A1 SU921124 A1 SU 921124A1 SU 792772501 A SU792772501 A SU 792772501A SU 2772501 A SU2772501 A SU 2772501A SU 921124 A1 SU921124 A1 SU 921124A1
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SU
USSR - Soviet Union
Prior art keywords
printed circuit
carried out
heat treatment
holes
metallization
Prior art date
Application number
SU792772501A
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English (en)
Inventor
Юрий Иванович Михайлов
Алмаксуд Магомедович Маккаев
Олег Иванович Ломовский
Владимир Вячеславович Болдырев
Original Assignee
Институт Физико-Химических Основ Переработки Минерального Сырья Со Ан Ссср
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Application filed by Институт Физико-Химических Основ Переработки Минерального Сырья Со Ан Ссср filed Critical Институт Физико-Химических Основ Переработки Минерального Сырья Со Ан Ссср
Priority to SU792772501A priority Critical patent/SU921124A1/ru
Priority to JP55501143A priority patent/JPS59500869A/ja
Priority to DE3045281T priority patent/DE3045281C2/de
Priority to PCT/SU1980/000063 priority patent/WO1980002570A1/ru
Priority to US06/243,929 priority patent/US4576689A/en
Priority to FR8013535A priority patent/FR2459300A1/fr
Priority to SE8101066A priority patent/SE442124B/sv
Application granted granted Critical
Publication of SU921124A1 publication Critical patent/SU921124A1/ru

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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/08Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1603Process or apparatus coating on selected surface areas
    • C23C18/1605Process or apparatus coating on selected surface areas by masking
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1633Process of electroless plating
    • C23C18/1655Process features
    • C23C18/1664Process features with additional means during the plating process
    • C23C18/1667Radiant energy, e.g. laser
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1633Process of electroless plating
    • C23C18/1675Process conditions
    • C23C18/1678Heating of the substrate
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1633Process of electroless plating
    • C23C18/1675Process conditions
    • C23C18/168Control of temperature, e.g. temperature of bath, substrate
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/38Coating with copper
    • C23C18/40Coating with copper using reducing agents
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1633Process of electroless plating
    • C23C18/1646Characteristics of the product obtained
    • C23C18/165Multilayered product
    • C23C18/1653Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/1851Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material
    • C23C18/1872Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment
    • C23C18/1886Multistep pretreatment
    • C23C18/1893Multistep pretreatment with use of organic or inorganic compounds other than metals, first
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/2006Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
    • C23C18/2046Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
    • C23C18/2073Multistep pretreatment
    • C23C18/2086Multistep pretreatment with use of organic or inorganic compounds other than metals, first
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00Processes for servicing or operating cells for electrolytic coating
    • C25D21/02Heating or cooling
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/38Electroplating: Baths therefor from solutions of copper
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/46Electroplating: Baths therefor from solutions of silver
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10Electroplating with more than one layer of the same or of different metals
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48After-treatment of electroplated surfaces
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/002Details
    • H01G4/005Electrodes
    • H01G4/008Selection of materials
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/42Plated through-holes or plated via connections
    • H05K3/422Plated through-holes or plated via connections characterised by electroless plating method; pretreatment therefor
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/42Plated through-holes or plated via connections
    • H05K3/423Plated through-holes or plated via connections characterised by electroplating method
    • H05K3/424Plated through-holes or plated via connections characterised by electroplating method by direct electroplating
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02TCLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
    • Y02T50/00Aeronautics or air transport
    • Y02T50/60Efficient propulsion technologies, e.g. for aircraft
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S205/00Electrolysis: processes, compositions used therein, and methods of preparing the compositions
    • Y10S205/918Use of wave energy or electrical discharge during pretreatment of substrate or post-treatment of coating

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemically Coating (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
  • Electroluminescent Light Sources (AREA)

Description

(5) СПОСОБ МЕТАЛЛИЗАЦИИ ОТВЕРСТИЙ ПЕЧАТНЫХ ПЛАТ
I
Изобретение относитс  к изготовлению печатных пЛат, в частности к йеталлизации стенок отверстий односторонних , двухсторонних и многослойных печатных плат.
Известен способ металлизации отверстий печатных плат, основанный на химическом осаждении меди на диэлектрическую поверхность, которую предварительно активируют путем обработки в растворе хлористого олова, промывки , обработки ,в растворе хлористого паллади , промывки, а после химической металлизации осуществл ют электрохимическое наращивание покрыти  требуемой толщины 1 .
Однако данный способ не обеспечивает надежность межслойных соединений в печатных платах из-за контактного выделени  паллади  на торцах медных контактных площадок. Эта палладиева  пленка в процессе изготовлени  и эксплуатации платы эффективно.. поглощает водород, гфевраща сь в гидРИД паллади  - хрупкий и неэлектрорроводный , материал, в результате чего нарушаетс  механический и электри ,ческий крнтакт и плата выходит из стро . Кроме того, способ технологически сложен, предусматривает операцию химическогоМеднени , требует использовани  дорогих и дефицитных реактивов .
Наиболее близким по технической
10 сущности  вл етс  способ металлизации отверстий печатных плат, включающий их обезжиривание, активацию и электрохимическое наращивание металла 2.
IS
Недостатками известного способа  вл ютс  сложность технологического процесса и слаба  адгези .
Цель изобретени  - упрощение технологического процесса и улучшение
20 адгезии.
Поставленна  цель достигаетс  тем, что в способе металлизации отверстий печатных плат, включающем их обезжи39 ривание, активацию и электрохимичес кое напр жение металла, активирование осущестбл ют путем смачивани  в растворе фосфорсодержащей соли меди ипоследующей термообработки. При этом термообработку провод т путем нагрева в нормальных услови х до температуры 100-135 С- в течение мин.. КрЬме того, термообработку провод т путем облучени  ИК-лучами до тем пературы 220-270°С в течение 7-20 с. Термообработку провод т путем совместного .облучени  ИК- и УФ-лучами до температуры 180-220°С в течение 5-12 с. Способ осуществл етс  следующим образом. . . В процессе активировани  при сма .чивании заготовки на поверхность сте нок отверстий наноситс  тонкий -слой водного раствора фосфорсодержащей со ли меди. При термообработке, в услови х интенсивного испарени  раствори тел , вначале происходит осаждение на поверхность-стенки свердой термочувствительной соли .меди, а затем ее разложение с образованием активных медных частиц, а сама поверхност стенок отверстий становитс  электропроводной . В результате, после промывки становитс  возможным электрохимическое наращивание на стенки отверстий сло  металла требуемой толщины . П р и м е р 1. Печатную плату из фольгированного стеклотекстолита с просферленными отверсти ми обезжиривают в растворе порошка Лотос, декапируют в растворе сол ной кислоты, промывают в воде в течение 1-2 мин. Затем плату смачивают в растворе фосфорсодержащей соли меди с концентрацией 300 г/л в течение 20 с методом протока раствора через отверсти . После этого подвергают термообработке путем нагрева при тем пературе в течение 7 мин до полного завершени  термического разложени  твердого осадка на поверхности стенок отверстий. Плату промывают водой и подвергают электрохимическому меднению в известных ваннах, например: CuSO SHzO 230 г/л, H2S04 ( уд. вес. 1,8) 60 г/л, CjHsdl 10 МЛ/Л Плотность тока 2,5-3,0А/дм,.темпер тура l8-25°C, врем  выдержки 60 мин до толщины 30 мк. П р И М е р 2. Электрохимическую металлизацию сквозных отверстий печатной платы ведут как в примере 1, но активирование стенок отверстий осуществл ют путем смачивани  платы в растворе фосфорсодержащей -соли меди с концентрацией 100 г/л в течение 20 с и термообработки ИК-излучателем при температуре 270°С в течение 20 с, после чего следует промывка и электрохимическое наращивани  покрыти , на стенки отверсти . П р и м е р 3. Электрохимическую металлизацию сквозных отверстий пеп четной платы ведут как в примере 1, но активирование стенок отверстий осуществл ют путем смачивани  платы в растворе фосфорсодержащей соли меди с концентрацией 20 г/л в течение 20 си термообработкой совместно ИК- и У|15-лучами, например установкой ПР-3796, используемой в производстве .печатных плат дл  оплавлени  сплава олово-свинец, в которой примен ютс  галогенные йодонаполненные лампы КГИ-220-2000-. Термообработка ведетс  при температуре 220°С в течение 7с. Указанный способ обеспечивает следующие преимущества. Во-первых,резко упрощаетс  технологический процесс электрохимической металлизации сквозных отверстий печатных плат, как;это следует из приведенной схемы. Упрощение св зано с сокращением числа стадий, уменьшением дли-тельности процесса (врем , требуемое дл  подготовки отверстий к электрохимическому наращиванию покрыти , сокращаетс  от мин до 2-15 мин в зависимости от условий термообработки ) , отсутствием необходимости в приготовл нии , использовании, корректировке и утилизации отходов различных растворов при активировании стенок отверстий и их электрохимическом меднении . Исключение операции химического меднени  позвол етна серийном предпри тии сократить линию мета/1лизации отверстий от 20 м до 8 м, освободить производственные площадки и рабочую силу. Во-вторых, улучшаетс  адгези  металл ического покрыти  к стенкам отверстий . Предлагаемый, способ исключает проблемы технологической надежности сцеплени  металлического покрыти  .с торцами медных контактных площадок, поскольку исключает применение солей
паллади . С другой стороны, способ обеспечивает повышение прочности сцеплени  с диэлектрической поверхностью стенок отверстий. Результаты испытаний прочности сцеплени  металлизированного пистона со стенками отверстий выполненных на р де предпри тий, показывают , что отверсти  в платах допускают 12-20-кратную перепайку, тогда как известный способ обеспечивает лишь 3-5-кратную перепайку.
В-третьих, способ исключае.т из применени  дорогие и дефицитные вещества .

Claims (3)

1. Способ металлизации отверстий печатных плат, включающий их обезжиривание , активацию и электрохимическое наращивание металла,.о т л и чающийс  тем, что, с целью . упрощени  технологического процесса и улучшени  адгезии, активирование осуществл ют путем смачивани  в растворе фосфорсодержащей соли меди и последующей термообработки.
2,Способ по П.1, о т л и ч а ющ и и с   тем, что термообработку првод т путем нагрева в нормальных услови х до температуры 100-135 С в течение 7-15 мин.
3.Способ по п. 1, о т л и ч а ющ и и с   тем, что термообработку провод т путем облучени  ИК-лучами до температуры 220-270 С в течение 7-20 с.
Ц. Способ по п. Т,отличающ и и с   тем, что термообработку провод т путем совместного облучени  ИК- и УФ-лучами до температуры 180220 с в течение 5-12 с.
Источники информации, прин тые во внимание при экспертизе
1.Федулова А. Д., Котов Е. П. и др. Многослойные печатные платы. М., Советское радио, 1977, с. 133 1 37.
2.Авторское свидетельство СССР , .кл. Н 05 К 3/10, 1975 (прототип ) .
SU792772501A 1979-06-19 1979-06-19 Способ металлизации отверстий печатных плат SU921124A1 (ru)

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SU792772501A SU921124A1 (ru) 1979-06-19 1979-06-19 Способ металлизации отверстий печатных плат
JP55501143A JPS59500869A (ja) 1979-06-19 1980-04-25 メタライジング溶液および方法
DE3045281T DE3045281C2 (de) 1979-06-19 1980-04-25 Loesung und verfahren zur elektrochemischen metallisierung von dielektrika
PCT/SU1980/000063 WO1980002570A1 (en) 1979-06-19 1980-04-25 Solution for activation of dielectric surface and obtaining conducting layer thereon
US06/243,929 US4576689A (en) 1979-06-19 1980-04-25 Process for electrochemical metallization of dielectrics
FR8013535A FR2459300A1 (fr) 1979-06-19 1980-06-18 Solution pour la metallisation electrochimique de materiaux dielectriques, procede de metallisation electrochimique de materiaux dielectriques au moyen de ladite solution, et materiaux dielectriques traites conformement audit procede
SE8101066A SE442124B (sv) 1979-06-19 1981-02-17 Forfarande for elektrokemisk metallisering av ett dielektrikum samt aktiveringslosning for anvendning hervid

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SE442124B (sv) 1985-12-02
JPS59500869A (ja) 1984-05-17
DE3045281T1 (de) 1982-02-18
JPS6133077B2 (ru) 1986-07-31
WO1980002570A1 (en) 1980-11-27
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DE3045281C2 (de) 1984-03-08
FR2459300A1 (fr) 1981-01-09
US4576689A (en) 1986-03-18

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