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SU469237A3 - The method of purification of highly dispersed silicon dioxide - Google Patents

The method of purification of highly dispersed silicon dioxide

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Publication number
SU469237A3
SU469237A3 SU788887A SU788887A SU469237A3 SU 469237 A3 SU469237 A3 SU 469237A3 SU 788887 A SU788887 A SU 788887A SU 788887 A SU788887 A SU 788887A SU 469237 A3 SU469237 A3 SU 469237A3
Authority
SU
USSR - Soviet Union
Prior art keywords
silicon dioxide
highly dispersed
purification
dispersed silicon
water vapor
Prior art date
Application number
SU788887A
Other languages
Russian (ru)
Inventor
Боммер Генрих
Брюннер Хельмут
Йон Вальтер
Вагнер Эрнст
Original Assignee
Дойче Гольд Унд Зильбершейдеанштальт, Фрг (Фирма)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Дойче Гольд Унд Зильбершейдеанштальт, Фрг (Фирма) filed Critical Дойче Гольд Унд Зильбершейдеанштальт, Фрг (Фирма)
Priority to SU788887A priority Critical patent/SU469237A3/en
Application granted granted Critical
Publication of SU469237A3 publication Critical patent/SU469237A3/en

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Description

(54) СПОСОБ ОЧИСТКИ ВЫСОКОДИСПЕРСНОЙ ДВУОКИСИ КРЕМНИЯ(54) METHOD FOR CLEANING HIGH-DISPERSED SILICON DIOXIDE

ющей рН 1,8, вместе с 4,5 м вод ного пара и 5 м сжатого воздуха с давлением 1 ати. Сжатый воздух предварительно нагревают до температуры 140°С. Внутри аппарата поддерживают температуру 520--570°С. Скорость потока вихр щейс  суспензии составл ет 10- 12 см/сек, врем  обработки в целом составл ет около 90 сек. На выходе получают двуокись кремни , имеющую рН 4,0.pH 1.8, together with 4.5 m of water vapor and 5 m of compressed air with a pressure of 1 MPa. Compressed air is preheated to a temperature of 140 ° C. Inside the device maintain the temperature of 520--570 ° C. The flow rate of the vortex slurry is 10-12 cm / s, the treatment time is generally about 90 seconds. At the outlet, silica is obtained having a pH of 4.0.

Пример 2. Подобно примеру 1 загружают кремнекислоту, содержащую примеси F, со значением рН 2,0. Рабочий объем аппарата равен 300 л, т. е. печь в три раза выще, чем в примере 1.Example 2. Similarly to example 1 download silica acid containing impurities F, with a pH value of 2.0. The working volume of the apparatus is 300 liters, i.e. the oven is three times higher than in example 1.

Процесс ведут при температуре 750-800°С. Скорость потока вихр щейс  суспензии 8-The process is conducted at a temperature of 750-800 ° C. The flow rate of the vortex suspension is 8-

10 см/сек. При 4-5 мин обработки очищенна  двуокись кремни  имеет рН 3,8.10 cm / sec. At 4-5 minutes of treatment, purified silica has a pH of 3.8.

Предмет изобретени Subject invention

Claims (2)

1.Способ очистки высокодисперсной двуокиси кремни  путем термообработки ее в присутствии вод ных паров, отличающийс   тем, что, с целью интенсификации и непрерывности процесса, исходную двуокись кремни  подают в поток вод ного пара, движущийс  снизу вверх, и процесс ведут при температуре 450-1000°С, преимущественно 500- 650°С.1. A method for purifying highly dispersed silicon dioxide by heat treating it in the presence of water vapor, characterized in that, for the purpose of intensification and continuity of the process, the initial silicon dioxide is fed into the upwardly moving water vapor stream and the process is conducted at a temperature of 450-1000 ° C, mostly 500–650 ° C. 2.Способ по п. 1, отличающийс  тем, что вод ной пар разбавл ют инертным газом, например воздухом.2. A method according to claim 1, characterized in that the water vapor is diluted with an inert gas, for example air.
SU788887A 1962-07-28 1962-07-28 The method of purification of highly dispersed silicon dioxide SU469237A3 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
SU788887A SU469237A3 (en) 1962-07-28 1962-07-28 The method of purification of highly dispersed silicon dioxide

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SU788887A SU469237A3 (en) 1962-07-28 1962-07-28 The method of purification of highly dispersed silicon dioxide

Publications (1)

Publication Number Publication Date
SU469237A3 true SU469237A3 (en) 1975-04-30

Family

ID=20437451

Family Applications (1)

Application Number Title Priority Date Filing Date
SU788887A SU469237A3 (en) 1962-07-28 1962-07-28 The method of purification of highly dispersed silicon dioxide

Country Status (1)

Country Link
SU (1) SU469237A3 (en)

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