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SU197803A1 - - Google Patents

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Publication number
SU197803A1
SU197803A1 SU1083760A SU1083760A SU197803A1 SU 197803 A1 SU197803 A1 SU 197803A1 SU 1083760 A SU1083760 A SU 1083760A SU 1083760 A SU1083760 A SU 1083760A SU 197803 A1 SU197803 A1 SU 197803A1
Authority
SU
USSR - Soviet Union
Prior art keywords
cooling
gas
carbon dioxide
cooled
carried out
Prior art date
Application number
SU1083760A
Other languages
Russian (ru)
Original Assignee
А. Н. Сафонников Институт электросварки Е. О. Патона
Publication of SU197803A1 publication Critical patent/SU197803A1/ru

Links

Description

СПОСОБ ОХЛАЖДЕНИЯ ФОРМИРУЮЩИХ COOLING METHOD FORMED

Известен способ охлаждени  формирующих приспособлений водой.A known method of cooling the shaping devices with water.

Предложенный способ отличаетс  от известного тем, что охлаждение производ т газообразными смес ми, имеюпдими отрицательную температуру, причем процесс охлаждени  осуществл ют замкнутым циклом охлаждаемого газа.The proposed method differs from that known in that the cooling is carried out by gaseous mixtures having a negative temperature, the cooling process being carried out in a closed cycle of the gas to be cooled.

Это позвол ет снизить дефекты в сварных соединени х и тем самым повысить качество сварки, а также улучшить услови  труда и повысить надежность эксплуатации оборудовани  с точки зрени  техники безопасности.This allows reducing defects in welded joints and thus improving the quality of welding, as well as improving working conditions and increasing reliability of equipment operation from the point of view of safety engineering.

Охлаждение по предлагаемому способу осуществл етс  по схеме, представленной на чертеже .The cooling according to the proposed method is carried out according to the scheme shown in the drawing.

Из контейнера 1 твердую углекислоту подают Б газификатор 2, в котором она газифицируетс . Газификатор обогреваетс  различными источниками тепла. Интенсивность газификации зависит от требуемого расхода газа. Из газификатора углекислый газ подают в холодильник 3, где он охлаждаетс  до требуемой температуры (зависит от технологического процесса). Обычно эта температура должна быть в пределах от О до -40°С.From container 1 solid carbon dioxide is fed B to a gasifier 2, in which it is gasified. The gasifier is heated by various heat sources. The intensity of gasification depends on the required gas flow. From the gasifier, carbon dioxide is fed to refrigerator 3, where it is cooled to the required temperature (depending on the process). Typically, this temperature should be in the range from 0 to -40 ° C.

тель) 4, легко отключаемый от оби.1,ей системы . Из нагревател  4 газ подаетс  непосредственно к распределительному устройству 5, из распределительного устройства - в мед,ные охлаждаемые приспособлени , иснользуемые при сварке (формирующие подкладки) либо плавке (кристаллизатор).tel) 4, easily disconnected from obi.1, to her system. From heater 4, gas is fed directly to switchgear 5, from switchgear to copper, cooling equipment used during welding (forming pads) or smelting (mold).

С целью экономии расхода газа последний из охлаждаемых приснособлений нодаетс  вIn order to save gas consumption, the last of the cooled devices is mounted in

очиститель 6 дл  удалени  загр знений и иримесей . Очищенный таким образом углекисльгй газ направл етс  в комплексный агрегат 7, состо щий из компрессора, холодильника и сборника. В комнлексном агрегате газообразла  углекислота подвергаетс  сжатию до 60- 70 агм и благодар  охлаждению проточной водой переводитс  в жидкое состо ние. Затем в результате нонижени  давлени  над жидкостью последн   превращаетс  в снегообразиу О массу. Снегообразную массу прессуют или же блоки (брикеты) твердой углекислоты образуютс  непосредственно в специальных генераторах 8. После этого цикл повтор етс  сначала.cleaner 6 for removing contaminants and primers. The carbon dioxide gas thus purified is directed to the complex unit 7, consisting of a compressor, a refrigerator and a collector. In a complex gas-gas aggregate, carbon dioxide is compressed to 60-70 agm and, due to cooling with running water, is converted into a liquid state. Then, as a result of the non-lowering of the pressure above the liquid, the latter turns into a snow mass of 0 mass. The snow mass is pressed or blocks (briquettes) of solid carbon dioxide are formed directly in special generators 8. After this, the cycle is repeated from the beginning.

25 ПРИСПОСОБЛЕНИЙ25 DEVICES

с целью повышени  качества сварки и улучшени  условий труда, охлаждение производ т газообразными смес ми, имеюшими отрицательную температуру, причем процесс охлаждени  осуществл ют замкнутым циклом движени  охлаждаемого газа.in order to improve the quality of welding and improve working conditions, cooling is produced by gaseous mixtures having a negative temperature, the cooling process being carried out in a closed loop movement of the cooled gas.

SU1083760A SU197803A1 (en)

Publications (1)

Publication Number Publication Date
SU197803A1 true SU197803A1 (en)

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Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4653582A (en) * 1985-05-22 1987-03-31 Treco Products, Inc. Point indicating system for combat sports
US4844346A (en) * 1988-04-21 1989-07-04 Coffey Robert G Grove sprayer
US4898080A (en) * 1987-08-11 1990-02-06 Lieberman Walter G Fluid powered linear slide
US4949671A (en) * 1985-10-24 1990-08-21 Texas Instruments Incorporated Processing apparatus and method
US5060497A (en) * 1986-04-02 1991-10-29 Nissan Motor Co., Ltd. Method of forming asymmetrical articles by rolling
US5217761A (en) * 1990-12-25 1993-06-08 Chugai Ro Co., Ltd. Sheet plasma CVD apparatus
US5391232A (en) * 1985-12-26 1995-02-21 Canon Kabushiki Kaisha Device for forming a deposited film
US5772771A (en) * 1995-12-13 1998-06-30 Applied Materials, Inc. Deposition chamber for improved deposition thickness uniformity
US6070551A (en) * 1996-05-13 2000-06-06 Applied Materials, Inc. Deposition chamber and method for depositing low dielectric constant films
US6884296B2 (en) * 2002-08-23 2005-04-26 Micron Technology, Inc. Reactors having gas distributors and methods for depositing materials onto micro-device workpieces

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4653582A (en) * 1985-05-22 1987-03-31 Treco Products, Inc. Point indicating system for combat sports
US4949671A (en) * 1985-10-24 1990-08-21 Texas Instruments Incorporated Processing apparatus and method
US5391232A (en) * 1985-12-26 1995-02-21 Canon Kabushiki Kaisha Device for forming a deposited film
US5060497A (en) * 1986-04-02 1991-10-29 Nissan Motor Co., Ltd. Method of forming asymmetrical articles by rolling
US4898080A (en) * 1987-08-11 1990-02-06 Lieberman Walter G Fluid powered linear slide
US4844346A (en) * 1988-04-21 1989-07-04 Coffey Robert G Grove sprayer
US5217761A (en) * 1990-12-25 1993-06-08 Chugai Ro Co., Ltd. Sheet plasma CVD apparatus
US6015591A (en) * 1995-12-13 2000-01-18 Applied Materials, Inc. Deposition method
US5772771A (en) * 1995-12-13 1998-06-30 Applied Materials, Inc. Deposition chamber for improved deposition thickness uniformity
US6251187B1 (en) 1995-12-13 2001-06-26 Applied Materials, Inc. Gas distribution in deposition chambers
US6070551A (en) * 1996-05-13 2000-06-06 Applied Materials, Inc. Deposition chamber and method for depositing low dielectric constant films
US6416823B2 (en) 1996-05-13 2002-07-09 Applied Materials, Inc. Deposition chamber and method for depositing low dielectric constant films
US6589610B2 (en) 1996-05-13 2003-07-08 Applied Materials, Inc. Deposition chamber and method for depositing low dielectric constant films
US6833052B2 (en) 1996-05-13 2004-12-21 Applied Materials, Inc. Deposition chamber and method for depositing low dielectric constant films
US7413627B2 (en) 1996-05-13 2008-08-19 Applied Materials, Inc. Deposition chamber and method for depositing low dielectric constant films
US6884296B2 (en) * 2002-08-23 2005-04-26 Micron Technology, Inc. Reactors having gas distributors and methods for depositing materials onto micro-device workpieces

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