SU1369546A1 - Photosensitive composition for holography - Google Patents
Photosensitive composition for holographyInfo
- Publication number
- SU1369546A1 SU1369546A1 SU3881812/04A SU3881812A SU1369546A1 SU 1369546 A1 SU1369546 A1 SU 1369546A1 SU 3881812/04 A SU3881812/04 A SU 3881812/04A SU 3881812 A SU3881812 A SU 3881812A SU 1369546 A1 SU1369546 A1 SU 1369546A1
- Authority
- SU
- USSR - Soviet Union
- Prior art keywords
- photosensitive
- component
- composition
- solvent
- film
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title abstract 6
- 238000001093 holography Methods 0.000 title 1
- 239000002904 solvent Substances 0.000 abstract 3
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical group [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 abstract 1
- IYRMKQDXCIACFW-UHFFFAOYSA-N 3,9-diazido-1,2,4-trifluoroacridine Chemical group C1=CC=C2N=C(C(F)=C(C(F)=C3F)N=[N+]=[N-])C3=C(N=[N+]=[N-])C2=C1 IYRMKQDXCIACFW-UHFFFAOYSA-N 0.000 abstract 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical group COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 abstract 1
- 229920001568 phenolic resin Polymers 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
Landscapes
- Materials For Photolithography (AREA)
Abstract
FIELD: photosensitive compositions. SUBSTANCE: composition is based on film-forming component, solvent and photosensitive component. Film-forming component is phenolformaldehyde resin of the formula HO--OH where n = 4-8, molecular mass is 642; solvent is diglyme; photosensitive component is 1,2,4-trifluoro-3,9-diazidoacridine. Composition has, wt.-%: film-forming component 7.5-15; photosensitive component 0.5-1.5, and solvent - the rest. Proposed compositions ensure to obtain diffraction lattices at high resolution and high stability of photosensitive layers (5 months), resolution capacity is 3600 lines/mm (as compared with 1000) and diffraction effectiveness at 300-400 nm - 49-51% (as compared with 30% in photoresist). EFFECT: enhanced resolution capability of composition. 3 tbl
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SU3881812/04A SU1369546A1 (en) | 1985-04-11 | 1985-04-11 | Photosensitive composition for holography |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SU3881812/04A SU1369546A1 (en) | 1985-04-11 | 1985-04-11 | Photosensitive composition for holography |
Publications (1)
Publication Number | Publication Date |
---|---|
SU1369546A1 true SU1369546A1 (en) | 1996-07-20 |
Family
ID=60533695
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SU3881812/04A SU1369546A1 (en) | 1985-04-11 | 1985-04-11 | Photosensitive composition for holography |
Country Status (1)
Country | Link |
---|---|
SU (1) | SU1369546A1 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2007004995A1 (en) * | 2005-07-04 | 2007-01-11 | National University Of Singapore | Radiation crosslinker |
RU2648048C1 (en) * | 2017-02-01 | 2018-03-22 | Федеральное государственное унитарное предприятие "Государственный научный центр "Научно-исследовательский институт органических полупродуктов и красителей" | Negative photoresist for "explosive" photolithography |
-
1985
- 1985-04-11 SU SU3881812/04A patent/SU1369546A1/en active
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2007004995A1 (en) * | 2005-07-04 | 2007-01-11 | National University Of Singapore | Radiation crosslinker |
US8105745B2 (en) | 2005-07-04 | 2012-01-31 | National University Of Singapore | Radiation crosslinker |
RU2648048C1 (en) * | 2017-02-01 | 2018-03-22 | Федеральное государственное унитарное предприятие "Государственный научный центр "Научно-исследовательский институт органических полупродуктов и красителей" | Negative photoresist for "explosive" photolithography |
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