SU111517A1 - Device for creating and maintaining high vacuum in gas discharge devices - Google Patents

Description

To create and maintain high vacuum in gas discharge iribors, devices are used that contain an auxiliary gas discharge device connected to the main device and absorbing its vapor by the metal of its sputtered electrode.

The proposed device is more perfect in comparison with the known devices of this kind, since it provides absorption of the entire spectrum of vapors and gases and a longer service life of the device.

For this purpose, the sputtering electrode of the auxiliary gas discharge device is made of a metal that is capable of absorbing gas and not interacting with mercury; it is sprayed by ion bombardment.

The drawing shows a schematic diagram of the proposed device.

Inside the main gas discharge device / or in a separate device connected to it. The camera is placed an auxiliary gas discharge device containing a sputtering electrode 2, to which a negative potential is applied. The electrode 2 is made of titanium, zirconium, tantalum, niobium, or another metal that has the ability to absorb gas and is not interacting with mercury.

Near the electrode 2 there is an auxiliary electrode 3 to which a positive potential is applied with respect to the common cathode 4.

If a certain potential difference occurs between the electrodes 2 and 3, ion bombardment of the electrode 2 occurs, causing it to dissipate. The sprayed metal of the electrode 2 is deposited on the screen 5, which prevents the parts of the instrument from becoming contaminated by the sprayed metal. To prevent flaking of films from the screen

5, it has a special configuration (ribbed surface, perforation, etc., etc.).

Screen 5 is potentially connected to the cathode 4k. A large resistivity 6 is introduced into this circuit, which prevents the cascade arc and the release of the absorbed gases when a cathode filament appears on the screen.

Subject matter and ii

1. A device for creating and maintaining high vacuum in gas discharge devices by means of an auxiliary gas discharge device connected to them, in which vapor is absorbed by the metal of the sputtering electrode, characterized by

that, in order to ensure the possibility of absorbing the entire spectrum of gases n vapors n for a single cJJOK nribor service, it dissociates an electrode made of a metal that is capable of absorbing gas and does not interact with mercury, by performing ion bombardment of this electrode.

2. The device on n. 1, this is due to the fact that an auxiliary electrode is provided to create the conditions for ionization near the dissociating electrode.

3. The device according to paragraphs. 1 and 2, characterized in that, for deposition of the sprayed metal, a screen is provided, which is under a positive potential relative to the sprayed electrode.

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