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SG153018A1 - Ceramic heater, method of manufactruing the same and deposition apparatus for forming a thin layer using the ceramic heater - Google Patents

Ceramic heater, method of manufactruing the same and deposition apparatus for forming a thin layer using the ceramic heater

Info

Publication number
SG153018A1
SG153018A1 SG200808729-8A SG2008087298A SG153018A1 SG 153018 A1 SG153018 A1 SG 153018A1 SG 2008087298 A SG2008087298 A SG 2008087298A SG 153018 A1 SG153018 A1 SG 153018A1
Authority
SG
Singapore
Prior art keywords
ceramic heater
same
manufactruing
forming
thin layer
Prior art date
Application number
SG200808729-8A
Inventor
Seong-Min Lee
Jeong-Duck Choi
Je-Ho Chae
Original Assignee
Komico Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Komico Ltd filed Critical Komico Ltd
Publication of SG153018A1 publication Critical patent/SG153018A1/en

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Resistance Heating (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)

Abstract

In a ceramic heater and a method of manufacturing the same, the ceramic heater includes a plate for supporting a substrate and a heating unit that is installed in an inside of the plate and generates heat for heating the substrate. The plate includes ceramic materials sintered from a ceramic powder by a single sintering process and the heating unit is positioned in the ceramic powder during the single sintering process. Accordingly, the ceramic heater is formed through the single sintering process, thereby reducing manufacturing cost and time. Fig. 4F accompanies the abstract.
SG200808729-8A 2007-11-27 2008-11-25 Ceramic heater, method of manufactruing the same and deposition apparatus for forming a thin layer using the ceramic heater SG153018A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020070121643A KR101177749B1 (en) 2007-11-27 2007-11-27 Ceramic heater, method for manufacturing the same, and apparatus for depositing a thin film having the same

Publications (1)

Publication Number Publication Date
SG153018A1 true SG153018A1 (en) 2009-06-29

Family

ID=40847822

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200808729-8A SG153018A1 (en) 2007-11-27 2008-11-25 Ceramic heater, method of manufactruing the same and deposition apparatus for forming a thin layer using the ceramic heater

Country Status (3)

Country Link
KR (1) KR101177749B1 (en)
SG (1) SG153018A1 (en)
TW (1) TWI398185B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101333629B1 (en) * 2013-07-03 2013-11-27 (주)보부하이테크 Manufacturing method of ceramic heater for aln semiconductor having low leakagecurrent and improved power efficiency and ceramic heater for aln semiconductor having low leakagecurrent and improved power efficiency manufactured by the same
US11330673B2 (en) * 2017-11-20 2022-05-10 Applied Materials, Inc. Heated substrate support

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4445595B2 (en) * 1995-09-12 2010-04-07 日本特殊陶業株式会社 Ceramic heater, ceramic glow plug and manufacturing method thereof
JPH11260534A (en) * 1998-01-09 1999-09-24 Ngk Insulators Ltd Heating apparatus and manufacture thereof
JP2000290777A (en) * 1999-04-07 2000-10-17 Tokyo Electron Ltd Gas treating device, buffle member, and gas treating method
JP2001102157A (en) * 1999-10-01 2001-04-13 Ngk Insulators Ltd Ceramic heater
JP2003212658A (en) * 2002-10-30 2003-07-30 Ibiden Co Ltd Aluminum nitride sintered compact and ceramic substrate
JP4761723B2 (en) * 2004-04-12 2011-08-31 日本碍子株式会社 Substrate heating device
WO2006129643A1 (en) * 2005-05-31 2006-12-07 Tokyo Electron Limited Plasma treatment apparatus and plasma treatment method

Also Published As

Publication number Publication date
TW200932032A (en) 2009-07-16
KR101177749B1 (en) 2012-08-29
TWI398185B (en) 2013-06-01
KR20090054785A (en) 2009-06-01

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