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SG147285A1 - Dry reactive ion etching - Google Patents

Dry reactive ion etching

Info

Publication number
SG147285A1
SG147285A1 SG200401970-9A SG2004019709A SG147285A1 SG 147285 A1 SG147285 A1 SG 147285A1 SG 2004019709 A SG2004019709 A SG 2004019709A SG 147285 A1 SG147285 A1 SG 147285A1
Authority
SG
Singapore
Prior art keywords
reactive ion
ion etching
dry
film resist
dry reactive
Prior art date
Application number
SG200401970-9A
Inventor
Chong Wai Mun
Kathirgamasundaram Sooriakumar
Poon Lye Yoong
Original Assignee
Sensfab Pte Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sensfab Pte Ltd filed Critical Sensfab Pte Ltd
Priority to SG200401970-9A priority Critical patent/SG147285A1/en
Publication of SG147285A1 publication Critical patent/SG147285A1/en

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  • Drying Of Semiconductors (AREA)

Abstract

DRY REACTIVE ION ETCHING A method of etching a wafer includes the steps of applying a dry film resist to a surface to be etched, curing the dry film resist, patterning the dry film resist to expose areas of the wafer to be etched, etching the wafer with a dry reactive ion etch and removing the remaining dry film resist.
SG200401970-9A 2004-04-07 2004-04-07 Dry reactive ion etching SG147285A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
SG200401970-9A SG147285A1 (en) 2004-04-07 2004-04-07 Dry reactive ion etching

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SG200401970-9A SG147285A1 (en) 2004-04-07 2004-04-07 Dry reactive ion etching

Publications (1)

Publication Number Publication Date
SG147285A1 true SG147285A1 (en) 2008-11-28

Family

ID=40032338

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200401970-9A SG147285A1 (en) 2004-04-07 2004-04-07 Dry reactive ion etching

Country Status (1)

Country Link
SG (1) SG147285A1 (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5174857A (en) * 1990-10-29 1992-12-29 Gold Star Co., Ltd. Slope etching process
WO2003007357A1 (en) * 2001-07-10 2003-01-23 Tokyo Electron Limited Dry etching method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5174857A (en) * 1990-10-29 1992-12-29 Gold Star Co., Ltd. Slope etching process
WO2003007357A1 (en) * 2001-07-10 2003-01-23 Tokyo Electron Limited Dry etching method

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