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SG11202109137XA - Improved coating processes - Google Patents

Improved coating processes

Info

Publication number
SG11202109137XA
SG11202109137XA SG11202109137XA SG11202109137XA SG11202109137XA SG 11202109137X A SG11202109137X A SG 11202109137XA SG 11202109137X A SG11202109137X A SG 11202109137XA SG 11202109137X A SG11202109137X A SG 11202109137XA SG 11202109137X A SG11202109137X A SG 11202109137XA
Authority
SG
Singapore
Prior art keywords
coating processes
improved coating
improved
processes
coating
Prior art date
Application number
SG11202109137XA
Inventor
Shi Xu
Tang Zhi
Zhang Yang Rong
Original Assignee
Nanofilm Tech International Limited
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nanofilm Tech International Limited filed Critical Nanofilm Tech International Limited
Publication of SG11202109137XA publication Critical patent/SG11202109137XA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605—Carbon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
    • C23C14/025—Metallic sublayers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/027—Graded interfaces
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0635—Carbides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Carbon And Carbon Compounds (AREA)
SG11202109137XA 2019-03-15 2020-03-13 Improved coating processes SG11202109137XA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP19163306 2019-03-15
PCT/EP2020/056864 WO2020187744A1 (en) 2019-03-15 2020-03-13 Improved coating processes

Publications (1)

Publication Number Publication Date
SG11202109137XA true SG11202109137XA (en) 2021-09-29

Family

ID=65818247

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202109137XA SG11202109137XA (en) 2019-03-15 2020-03-13 Improved coating processes

Country Status (6)

Country Link
US (1) US20220162739A1 (en)
EP (1) EP3938556A1 (en)
JP (1) JP7382124B2 (en)
CN (1) CN111690898B (en)
SG (1) SG11202109137XA (en)
WO (1) WO2020187744A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114483362B (en) 2020-11-13 2024-05-28 纳峰真空镀膜（上海）有限公司 Piston ring and method of manufacturing the same
WO2022253859A1 (en) * 2021-06-04 2022-12-08 Nanofilm Technologies International Limited Anti-static coating
WO2024094872A1 (en) 2022-11-03 2024-05-10 Nanofilm Technologies International Limited Coated solar cell
WO2024094870A1 (en) 2022-11-03 2024-05-10 Nanofilm Technologies International Limited Sealed electrical devices
CN116695079B (en) * 2023-06-09 2024-04-02 深圳市博源碳晶科技有限公司 Heat-conducting insulating diamond composite material substrate and preparation method and application thereof

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ATE65265T1 (en) * 1987-08-26 1991-08-15 Balzers Hochvakuum PROCESS FOR DEPOSITIONING COATINGS ON SUBSTRATES AND VACUUM COATING EQUIPMENT FOR CARRYING OUT THE PROCESS.
EP0439561B1 (en) * 1989-06-27 1994-02-16 Hauzer Holding B.V. Process and device for coating substrates
US5358615A (en) * 1993-10-04 1994-10-25 Motorola, Inc. Process for forming a sputter deposited metal film
DE4405477A1 (en) 1994-02-21 1995-08-24 Hauzer Holding PVD process for the deposition of multi-component hard material layers
CA2305938C (en) 2000-04-10 2007-07-03 Vladimir I. Gorokhovsky Filtered cathodic arc deposition method and apparatus
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US6923891B2 (en) * 2003-01-10 2005-08-02 Nanofilm Technologies International Pte Ltd. Copper interconnects
JP4939032B2 (en) * 2005-02-08 2012-05-23 株式会社神戸製鋼所 Hard film and method for producing hard film
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JP2007291429A (en) * 2006-04-24 2007-11-08 Nissan Motor Co Ltd Hard carbon film
CN100506527C (en) * 2007-06-26 2009-07-01 广州有色金属研究院 Metal carbide/diamond-like carbon (MeC/DLC) nano-multilayer film material and preparation method thereof
JP2009283107A (en) * 2008-05-26 2009-12-03 Fuji Electric Device Technology Co Ltd Protection film mainly including tetrahedral amorphous carbon film and magnetic recording medium having the same
SG177183A1 (en) * 2008-06-09 2012-01-30 Nanofilm Technologies Internat Pte Ltd A novel coating having reduced stress and a method of depositing the coating on a substrate
DE102010028558A1 (en) * 2010-05-04 2011-11-10 Walter Ag PVD hybrid process for the deposition of mixed crystal layers
JP5226826B2 (en) * 2011-04-25 2013-07-03 株式会社神戸製鋼所 Method for producing diamond-like carbon hard multilayer film molded body
US10304665B2 (en) * 2011-09-07 2019-05-28 Nano-Product Engineering, LLC Reactors for plasma-assisted processes and associated methods
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CN106282935A (en) * 2015-05-15 2017-01-04 新科实业有限公司 Material with diamond-like coating and preparation method thereof
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CN107022761B (en) * 2017-04-28 2023-11-03 星弧涂层新材料科技（苏州）股份有限公司 Composite thick film based on diamond-like thin film and film coating method thereof
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CN109371360A (en) * 2018-12-13 2019-02-22 纳峰真空镀膜（上海）有限公司 A kind of preparation method applied to the wear-resisting diamond-like coating on cryogenic material

Also Published As

Publication number Publication date
WO2020187744A1 (en) 2020-09-24
JP7382124B2 (en) 2023-11-16
JP2022525212A (en) 2022-05-11
CN111690898A (en) 2020-09-22
CN111690898B (en) 2024-04-26
US20220162739A1 (en) 2022-05-26
EP3938556A1 (en) 2022-01-19

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