SG11201503108WA - Aromatic imide compound and method for producing same - Google Patents
Aromatic imide compound and method for producing sameInfo
- Publication number
- SG11201503108WA SG11201503108WA SG11201503108WA SG11201503108WA SG11201503108WA SG 11201503108W A SG11201503108W A SG 11201503108WA SG 11201503108W A SG11201503108W A SG 11201503108WA SG 11201503108W A SG11201503108W A SG 11201503108WA SG 11201503108W A SG11201503108W A SG 11201503108WA
- Authority
- SG
- Singapore
- Prior art keywords
- producing same
- imide compound
- aromatic imide
- aromatic
- compound
- Prior art date
Links
- -1 Aromatic imide compound Chemical class 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D221/00—Heterocyclic compounds containing six-membered rings having one nitrogen atom as the only ring hetero atom, not provided for by groups C07D211/00 - C07D219/00
- C07D221/02—Heterocyclic compounds containing six-membered rings having one nitrogen atom as the only ring hetero atom, not provided for by groups C07D211/00 - C07D219/00 condensed with carbocyclic rings or ring systems
- C07D221/04—Ortho- or peri-condensed ring systems
- C07D221/06—Ring systems of three rings
- C07D221/14—Aza-phenalenes, e.g. 1,8-naphthalimide
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D401/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
- C07D401/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings
- C07D401/04—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings directly linked by a ring-member-to-ring-member bond
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D401/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
- C07D401/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings
- C07D401/12—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings linked by a chain containing hetero atoms as chain links
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D403/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00
- C07D403/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings
- C07D403/04—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings directly linked by a ring-member-to-ring-member bond
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
- C07D405/02—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
- C07D405/04—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings directly linked by a ring-member-to-ring-member bond
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
- C07D409/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
- C07D409/04—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings directly linked by a ring-member-to-ring-member bond
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
- C07D409/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
- C07D409/06—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
- C07D409/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
- C07D409/12—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a chain containing hetero atoms as chain links
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D471/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00
- C07D471/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00 in which the condensed system contains two hetero rings
- C07D471/06—Peri-condensed systems
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D471/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00
- C07D471/12—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00 in which the condensed system contains three hetero rings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Indole Compounds (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Other In-Based Heterocyclic Compounds (AREA)
- Plural Heterocyclic Compounds (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012248648A JP5990447B2 (en) | 2012-11-12 | 2012-11-12 | Aromatic imide compound and method for producing the same |
PCT/JP2013/079140 WO2014073409A1 (en) | 2012-11-12 | 2013-10-28 | Aromatic imide compound and method for producing same |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201503108WA true SG11201503108WA (en) | 2015-06-29 |
Family
ID=50684518
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201503108WA SG11201503108WA (en) | 2012-11-12 | 2013-10-28 | Aromatic imide compound and method for producing same |
Country Status (9)
Country | Link |
---|---|
US (1) | US9505721B2 (en) |
JP (1) | JP5990447B2 (en) |
KR (1) | KR101781706B1 (en) |
CN (1) | CN104797560B (en) |
DE (1) | DE112013005388T5 (en) |
MY (1) | MY170486A (en) |
SG (1) | SG11201503108WA (en) |
TW (1) | TWI610921B (en) |
WO (1) | WO2014073409A1 (en) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6137862B2 (en) * | 2013-02-20 | 2017-05-31 | アーゼッド・エレクトロニック・マテリアルズ(ルクセンブルグ)ソシエテ・ア・レスポンサビリテ・リミテ | Negative photosensitive siloxane composition |
US9383644B2 (en) | 2014-09-18 | 2016-07-05 | Heraeus Precious Metals North America Daychem LLC | Sulfonic acid derivative compounds as photoacid generators in resist applications |
US9477150B2 (en) * | 2015-03-13 | 2016-10-25 | Heraeus Precious Metals North America Daychem LLC | Sulfonic acid derivative compounds as photoacid generators in resist applications |
CN107810179B (en) * | 2015-08-21 | 2021-10-22 | 贺利氏电子化工有限责任公司 | Sulfonic acid derivative compounds as photoacid generators in resist applications |
EP3182203A1 (en) | 2015-12-18 | 2017-06-21 | Heraeus Precious Metals North America Daychem LLC | A combination of nit derivatives with sensitizers |
KR102130135B1 (en) * | 2017-09-04 | 2020-07-03 | 주식회사 엘지화학 | Multi function photoacid generator and photoresist composition for thick layer comprising the same |
KR102129049B1 (en) * | 2017-09-11 | 2020-07-01 | 주식회사 엘지화학 | Photoacid generator and chemically amplified positive-type photoresist composition for thick film comprising the same |
KR102146095B1 (en) * | 2017-09-15 | 2020-08-19 | 주식회사 엘지화학 | Photoacid generator and photoresist composition for thick layer comprising the same |
CN110041317B (en) * | 2019-05-16 | 2022-01-04 | 福州大学 | Naphthalimide fluorescent probe and preparation and application thereof |
CN112552280A (en) * | 2019-09-25 | 2021-03-26 | 常州强力先端电子材料有限公司 | High-acid-yield sulfimide photo-acid generator |
WO2021057813A1 (en) * | 2019-09-25 | 2021-04-01 | 常州强力先端电子材料有限公司 | Sulfimide photo-acid generator, photosensitive resin composition, patterning method, use of photosensitive resin composition |
CN112558409B (en) * | 2019-09-25 | 2022-05-20 | 常州强力先端电子材料有限公司 | Sulfonylimide photoacid generators capable of highly generating acid on line I |
CN114114839A (en) * | 2020-09-01 | 2022-03-01 | 常州强力先端电子材料有限公司 | Photosensitive resin composition, patterning method and application of photosensitive resin composition |
CN112094232B (en) * | 2020-09-18 | 2022-04-08 | 河北凯力昂生物科技有限公司 | Synthesis method of N-hydroxynaphthalimide mesylate |
CN112094231B (en) * | 2020-09-18 | 2022-04-08 | 河北凯力昂生物科技有限公司 | Synthesis method of N-hydroxynaphthalimide trifluoromethanesulfonate |
CN114516863B (en) * | 2020-11-19 | 2024-06-21 | 常州强力电子新材料股份有限公司 | Imide sulfonate photoacid generator with high acid yield, composition and application |
CN117658997A (en) * | 2022-08-26 | 2024-03-08 | 常州强力先端电子材料有限公司 | Sulfonate photoacid generator, preparation method thereof, patterning method, resist composition and application thereof |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4371605A (en) | 1980-12-09 | 1983-02-01 | E. I. Du Pont De Nemours And Company | Photopolymerizable compositions containing N-hydroxyamide and N-hydroxyimide sulfonates |
US6582879B2 (en) * | 2001-03-27 | 2003-06-24 | Korea Research Institute Of Chemical Technology | Reactive photo acid-generating agent and heat-resistant photoresist composition with polyamide precursor |
JP4590821B2 (en) * | 2003-01-14 | 2010-12-01 | コニカミノルタホールディングス株式会社 | Actinic ray curable ink composition and image forming method using the same |
CA2683900A1 (en) * | 2007-04-27 | 2008-11-06 | Valspar Sourcing, Inc. | Crosslinkable imide polyester coating |
FR2935977B1 (en) * | 2008-09-15 | 2010-12-17 | Centre Nat Rech Scient | PHOTOCHIMIC HYDROLYSIS-POLYCONDENSATION PROCESS OF STERICALLY CONCEALED CHROMOPHORES, CATALYSED WITH PHOTOGENERIC ACID AND APPLICATIONS THEREOF |
US8455176B2 (en) | 2008-11-12 | 2013-06-04 | Az Electronic Materials Usa Corp. | Coating composition |
CN101602856A (en) * | 2009-07-23 | 2009-12-16 | 中国科学院化学研究所 | A kind of polyimide resin terminated by phenylacetylene naphthalene anhydride group and its preparation method and application |
EP2524914B1 (en) * | 2010-01-13 | 2019-07-03 | Adeka Corporation | Sulfonic acid derivative compound and naphthalic acid derivative compound |
-
2012
- 2012-11-12 JP JP2012248648A patent/JP5990447B2/en active Active
-
2013
- 2013-10-28 KR KR1020157014483A patent/KR101781706B1/en active Active
- 2013-10-28 CN CN201380058490.4A patent/CN104797560B/en active Active
- 2013-10-28 WO PCT/JP2013/079140 patent/WO2014073409A1/en active Application Filing
- 2013-10-28 US US14/439,477 patent/US9505721B2/en not_active Expired - Fee Related
- 2013-10-28 MY MYPI2015701470A patent/MY170486A/en unknown
- 2013-10-28 SG SG11201503108WA patent/SG11201503108WA/en unknown
- 2013-10-28 DE DE112013005388.8T patent/DE112013005388T5/en not_active Withdrawn
- 2013-11-12 TW TW102141050A patent/TWI610921B/en active
Also Published As
Publication number | Publication date |
---|---|
MY170486A (en) | 2019-08-07 |
TWI610921B (en) | 2018-01-11 |
JP2014094926A (en) | 2014-05-22 |
DE112013005388T5 (en) | 2015-08-13 |
TW201425299A (en) | 2014-07-01 |
US9505721B2 (en) | 2016-11-29 |
CN104797560A (en) | 2015-07-22 |
JP5990447B2 (en) | 2016-09-14 |
KR20150087846A (en) | 2015-07-30 |
KR101781706B1 (en) | 2017-09-25 |
CN104797560B (en) | 2016-10-12 |
WO2014073409A1 (en) | 2014-05-15 |
US20150299132A1 (en) | 2015-10-22 |
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