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SG11201503108WA - Aromatic imide compound and method for producing same - Google Patents

Aromatic imide compound and method for producing same

Info

Publication number
SG11201503108WA
SG11201503108WA SG11201503108WA SG11201503108WA SG11201503108WA SG 11201503108W A SG11201503108W A SG 11201503108WA SG 11201503108W A SG11201503108W A SG 11201503108WA SG 11201503108W A SG11201503108W A SG 11201503108WA SG 11201503108W A SG11201503108W A SG 11201503108WA
Authority
SG
Singapore
Prior art keywords
producing same
imide compound
aromatic imide
aromatic
compound
Prior art date
Application number
SG11201503108WA
Inventor
Eri Hirahara
Ralph Dammel
Georg Pawlowski
Hirahara Eri
Dammel Ralph
Pawlowski Georg
Original Assignee
Az Electronic Materials Luxembourg Sarl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Az Electronic Materials Luxembourg Sarl filed Critical Az Electronic Materials Luxembourg Sarl
Publication of SG11201503108WA publication Critical patent/SG11201503108WA/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D221/00Heterocyclic compounds containing six-membered rings having one nitrogen atom as the only ring hetero atom, not provided for by groups C07D211/00 - C07D219/00
    • C07D221/02Heterocyclic compounds containing six-membered rings having one nitrogen atom as the only ring hetero atom, not provided for by groups C07D211/00 - C07D219/00 condensed with carbocyclic rings or ring systems
    • C07D221/04Ortho- or peri-condensed ring systems
    • C07D221/06Ring systems of three rings
    • C07D221/14Aza-phenalenes, e.g. 1,8-naphthalimide
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D401/00Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
    • C07D401/02Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings
    • C07D401/04Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings directly linked by a ring-member-to-ring-member bond
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D401/00Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
    • C07D401/02Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings
    • C07D401/12Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings linked by a chain containing hetero atoms as chain links
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D403/00Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00
    • C07D403/02Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings
    • C07D403/04Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings directly linked by a ring-member-to-ring-member bond
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D405/00Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
    • C07D405/02Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
    • C07D405/04Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings directly linked by a ring-member-to-ring-member bond
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D409/00Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
    • C07D409/02Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
    • C07D409/04Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings directly linked by a ring-member-to-ring-member bond
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D409/00Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
    • C07D409/02Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
    • C07D409/06Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D409/00Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
    • C07D409/02Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
    • C07D409/12Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a chain containing hetero atoms as chain links
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D471/00Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00
    • C07D471/02Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00 in which the condensed system contains two hetero rings
    • C07D471/06Peri-condensed systems
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D471/00Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00
    • C07D471/12Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00 in which the condensed system contains three hetero rings
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0045Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0046Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Indole Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Other In-Based Heterocyclic Compounds (AREA)
  • Plural Heterocyclic Compounds (AREA)
SG11201503108WA 2012-11-12 2013-10-28 Aromatic imide compound and method for producing same SG11201503108WA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012248648A JP5990447B2 (en) 2012-11-12 2012-11-12 Aromatic imide compound and method for producing the same
PCT/JP2013/079140 WO2014073409A1 (en) 2012-11-12 2013-10-28 Aromatic imide compound and method for producing same

Publications (1)

Publication Number Publication Date
SG11201503108WA true SG11201503108WA (en) 2015-06-29

Family

ID=50684518

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201503108WA SG11201503108WA (en) 2012-11-12 2013-10-28 Aromatic imide compound and method for producing same

Country Status (9)

Country Link
US (1) US9505721B2 (en)
JP (1) JP5990447B2 (en)
KR (1) KR101781706B1 (en)
CN (1) CN104797560B (en)
DE (1) DE112013005388T5 (en)
MY (1) MY170486A (en)
SG (1) SG11201503108WA (en)
TW (1) TWI610921B (en)
WO (1) WO2014073409A1 (en)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6137862B2 (en) * 2013-02-20 2017-05-31 アーゼッド・エレクトロニック・マテリアルズ(ルクセンブルグ)ソシエテ・ア・レスポンサビリテ・リミテ Negative photosensitive siloxane composition
US9383644B2 (en) 2014-09-18 2016-07-05 Heraeus Precious Metals North America Daychem LLC Sulfonic acid derivative compounds as photoacid generators in resist applications
US9477150B2 (en) * 2015-03-13 2016-10-25 Heraeus Precious Metals North America Daychem LLC Sulfonic acid derivative compounds as photoacid generators in resist applications
CN107810179B (en) * 2015-08-21 2021-10-22 贺利氏电子化工有限责任公司 Sulfonic acid derivative compounds as photoacid generators in resist applications
EP3182203A1 (en) 2015-12-18 2017-06-21 Heraeus Precious Metals North America Daychem LLC A combination of nit derivatives with sensitizers
KR102130135B1 (en) * 2017-09-04 2020-07-03 주식회사 엘지화학 Multi function photoacid generator and photoresist composition for thick layer comprising the same
KR102129049B1 (en) * 2017-09-11 2020-07-01 주식회사 엘지화학 Photoacid generator and chemically amplified positive-type photoresist composition for thick film comprising the same
KR102146095B1 (en) * 2017-09-15 2020-08-19 주식회사 엘지화학 Photoacid generator and photoresist composition for thick layer comprising the same
CN110041317B (en) * 2019-05-16 2022-01-04 福州大学 Naphthalimide fluorescent probe and preparation and application thereof
CN112552280A (en) * 2019-09-25 2021-03-26 常州强力先端电子材料有限公司 High-acid-yield sulfimide photo-acid generator
WO2021057813A1 (en) * 2019-09-25 2021-04-01 常州强力先端电子材料有限公司 Sulfimide photo-acid generator, photosensitive resin composition, patterning method, use of photosensitive resin composition
CN112558409B (en) * 2019-09-25 2022-05-20 常州强力先端电子材料有限公司 Sulfonylimide photoacid generators capable of highly generating acid on line I
CN114114839A (en) * 2020-09-01 2022-03-01 常州强力先端电子材料有限公司 Photosensitive resin composition, patterning method and application of photosensitive resin composition
CN112094232B (en) * 2020-09-18 2022-04-08 河北凯力昂生物科技有限公司 Synthesis method of N-hydroxynaphthalimide mesylate
CN112094231B (en) * 2020-09-18 2022-04-08 河北凯力昂生物科技有限公司 Synthesis method of N-hydroxynaphthalimide trifluoromethanesulfonate
CN114516863B (en) * 2020-11-19 2024-06-21 常州强力电子新材料股份有限公司 Imide sulfonate photoacid generator with high acid yield, composition and application
CN117658997A (en) * 2022-08-26 2024-03-08 常州强力先端电子材料有限公司 Sulfonate photoacid generator, preparation method thereof, patterning method, resist composition and application thereof

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4371605A (en) 1980-12-09 1983-02-01 E. I. Du Pont De Nemours And Company Photopolymerizable compositions containing N-hydroxyamide and N-hydroxyimide sulfonates
US6582879B2 (en) * 2001-03-27 2003-06-24 Korea Research Institute Of Chemical Technology Reactive photo acid-generating agent and heat-resistant photoresist composition with polyamide precursor
JP4590821B2 (en) * 2003-01-14 2010-12-01 コニカミノルタホールディングス株式会社 Actinic ray curable ink composition and image forming method using the same
CA2683900A1 (en) * 2007-04-27 2008-11-06 Valspar Sourcing, Inc. Crosslinkable imide polyester coating
FR2935977B1 (en) * 2008-09-15 2010-12-17 Centre Nat Rech Scient PHOTOCHIMIC HYDROLYSIS-POLYCONDENSATION PROCESS OF STERICALLY CONCEALED CHROMOPHORES, CATALYSED WITH PHOTOGENERIC ACID AND APPLICATIONS THEREOF
US8455176B2 (en) 2008-11-12 2013-06-04 Az Electronic Materials Usa Corp. Coating composition
CN101602856A (en) * 2009-07-23 2009-12-16 中国科学院化学研究所 A kind of polyimide resin terminated by phenylacetylene naphthalene anhydride group and its preparation method and application
EP2524914B1 (en) * 2010-01-13 2019-07-03 Adeka Corporation Sulfonic acid derivative compound and naphthalic acid derivative compound

Also Published As

Publication number Publication date
MY170486A (en) 2019-08-07
TWI610921B (en) 2018-01-11
JP2014094926A (en) 2014-05-22
DE112013005388T5 (en) 2015-08-13
TW201425299A (en) 2014-07-01
US9505721B2 (en) 2016-11-29
CN104797560A (en) 2015-07-22
JP5990447B2 (en) 2016-09-14
KR20150087846A (en) 2015-07-30
KR101781706B1 (en) 2017-09-25
CN104797560B (en) 2016-10-12
WO2014073409A1 (en) 2014-05-15
US20150299132A1 (en) 2015-10-22

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