SG11201401251TA - Slurry and method for producing slurry - Google Patents
Slurry and method for producing slurryInfo
- Publication number
- SG11201401251TA SG11201401251TA SG11201401251TA SG11201401251TA SG11201401251TA SG 11201401251T A SG11201401251T A SG 11201401251TA SG 11201401251T A SG11201401251T A SG 11201401251TA SG 11201401251T A SG11201401251T A SG 11201401251TA SG 11201401251T A SG11201401251T A SG 11201401251TA
- Authority
- SG
- Singapore
- Prior art keywords
- slurry
- producing
- producing slurry
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
- C09K3/1472—Non-aqueous liquid suspensions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/007—Use, recovery or regeneration of abrasive mediums
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/06—Grinders for cutting-off
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/04—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools
- B28D5/045—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools by cutting with wires or closed-loop blades
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1409—Abrasive particles per se
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
- C09K3/1463—Aqueous liquid suspensions
-
- H10P52/00—
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/10—Greenhouse gas [GHG] capture, material saving, heat recovery or other energy efficient measures, e.g. motor control, characterised by manufacturing processes, e.g. for rolling metal or metal working
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011235924A JP5594273B2 (en) | 2011-10-27 | 2011-10-27 | Slurry and slurry manufacturing method |
| PCT/JP2012/006377 WO2013061519A1 (en) | 2011-10-27 | 2012-10-04 | Slurry and slurry manufacturing method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11201401251TA true SG11201401251TA (en) | 2014-08-28 |
Family
ID=48167376
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11201401251TA SG11201401251TA (en) | 2011-10-27 | 2012-10-04 | Slurry and method for producing slurry |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US9260643B2 (en) |
| JP (1) | JP5594273B2 (en) |
| KR (1) | KR101887874B1 (en) |
| CN (1) | CN103906601B (en) |
| DE (1) | DE112012003990B4 (en) |
| SG (1) | SG11201401251TA (en) |
| TW (1) | TWI500478B (en) |
| WO (1) | WO2013061519A1 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6432453B2 (en) | 2015-06-23 | 2018-12-05 | 株式会社Sumco | Wire saw device and workpiece cutting method |
| JP6604313B2 (en) | 2016-11-10 | 2019-11-13 | 株式会社Sumco | Abrasive Grain Evaluation Method and Wafer Manufacturing Method |
| CN106914804A (en) * | 2017-03-28 | 2017-07-04 | 安庆机床有限公司 | Integrated ball crusher |
| CN109530061B (en) * | 2018-12-07 | 2020-11-03 | 徐州徐薯薯业科技有限公司 | Wheat grinder |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1143923A (en) | 1965-04-06 | 1969-02-26 | Rank Xerox Ltd | Improvements in polishing and polishing materials |
| JPS63114865A (en) | 1986-10-30 | 1988-05-19 | Shin Etsu Chem Co Ltd | Ultra-precise polishing abrasive material |
| US6046110A (en) | 1995-06-08 | 2000-04-04 | Kabushiki Kaisha Toshiba | Copper-based metal polishing solution and method for manufacturing a semiconductor device |
| JPH09314459A (en) * | 1996-05-29 | 1997-12-09 | Sanyo Chem Ind Ltd | Water lap liquid composition |
| US6602439B1 (en) * | 1997-02-24 | 2003-08-05 | Superior Micropowders, Llc | Chemical-mechanical planarization slurries and powders and methods for using same |
| GB2351294B (en) | 1998-04-03 | 2002-06-26 | Kao Corp | Cutting oil composition |
| JP4248895B2 (en) | 2003-02-27 | 2009-04-02 | Sumco Techxiv株式会社 | Slurry regeneration method and wire saw system |
| JP2006224266A (en) * | 2005-02-18 | 2006-08-31 | Sumco Corp | Ingot cutting method with wire saw |
| JP5352872B2 (en) * | 2007-03-15 | 2013-11-27 | 国立大学法人宇都宮大学 | Method for producing composite particles for polishing |
| WO2010113678A1 (en) * | 2009-03-31 | 2010-10-07 | 出光興産株式会社 | Working fluid for brittle material and working fluid for hard material |
| JP4605298B1 (en) * | 2009-07-03 | 2011-01-05 | 横浜ゴム株式会社 | Pneumatic tire |
| JP2011171689A (en) * | 2009-07-07 | 2011-09-01 | Kao Corp | Polishing liquid composition for silicon wafer |
| JP5499324B2 (en) * | 2010-04-28 | 2014-05-21 | 旭硝子株式会社 | Glass substrate for information recording medium, polishing colloidal silica slurry for manufacturing the same, and information recording medium |
-
2011
- 2011-10-27 JP JP2011235924A patent/JP5594273B2/en active Active
-
2012
- 2012-10-04 SG SG11201401251TA patent/SG11201401251TA/en unknown
- 2012-10-04 US US14/349,276 patent/US9260643B2/en active Active
- 2012-10-04 CN CN201280051638.7A patent/CN103906601B/en active Active
- 2012-10-04 DE DE112012003990.4T patent/DE112012003990B4/en active Active
- 2012-10-04 WO PCT/JP2012/006377 patent/WO2013061519A1/en not_active Ceased
- 2012-10-04 KR KR1020147010957A patent/KR101887874B1/en active Active
- 2012-10-25 TW TW101139497A patent/TWI500478B/en active
Also Published As
| Publication number | Publication date |
|---|---|
| KR101887874B1 (en) | 2018-08-14 |
| JP2013091141A (en) | 2013-05-16 |
| TW201336627A (en) | 2013-09-16 |
| DE112012003990B4 (en) | 2021-07-08 |
| DE112012003990T5 (en) | 2014-06-12 |
| US9260643B2 (en) | 2016-02-16 |
| KR20140103907A (en) | 2014-08-27 |
| WO2013061519A1 (en) | 2013-05-02 |
| US20150000208A1 (en) | 2015-01-01 |
| CN103906601B (en) | 2017-06-20 |
| CN103906601A (en) | 2014-07-02 |
| TWI500478B (en) | 2015-09-21 |
| JP5594273B2 (en) | 2014-09-24 |
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