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SG11201401251TA - Slurry and method for producing slurry - Google Patents

Slurry and method for producing slurry

Info

Publication number
SG11201401251TA
SG11201401251TA SG11201401251TA SG11201401251TA SG11201401251TA SG 11201401251T A SG11201401251T A SG 11201401251TA SG 11201401251T A SG11201401251T A SG 11201401251TA SG 11201401251T A SG11201401251T A SG 11201401251TA SG 11201401251T A SG11201401251T A SG 11201401251TA
Authority
SG
Singapore
Prior art keywords
slurry
producing
producing slurry
Prior art date
Application number
SG11201401251TA
Inventor
Koji Kitagawa
Original Assignee
Shinetsu Handotai Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinetsu Handotai Kk filed Critical Shinetsu Handotai Kk
Publication of SG11201401251TA publication Critical patent/SG11201401251TA/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/14Anti-slip materials; Abrasives
    • C09K3/1454Abrasive powders, suspensions and pastes for polishing
    • C09K3/1472Non-aqueous liquid suspensions
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • B28D5/007Use, recovery or regeneration of abrasive mediums
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B27/00Other grinding machines or devices
    • B24B27/06Grinders for cutting-off
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/04Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools
    • B28D5/045Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools by cutting with wires or closed-loop blades
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/14Anti-slip materials; Abrasives
    • C09K3/1409Abrasive particles per se
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/14Anti-slip materials; Abrasives
    • C09K3/1454Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463Aqueous liquid suspensions
    • H10P52/00
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/10Greenhouse gas [GHG] capture, material saving, heat recovery or other energy efficient measures, e.g. motor control, characterised by manufacturing processes, e.g. for rolling metal or metal working

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
SG11201401251TA 2011-10-27 2012-10-04 Slurry and method for producing slurry SG11201401251TA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2011235924A JP5594273B2 (en) 2011-10-27 2011-10-27 Slurry and slurry manufacturing method
PCT/JP2012/006377 WO2013061519A1 (en) 2011-10-27 2012-10-04 Slurry and slurry manufacturing method

Publications (1)

Publication Number Publication Date
SG11201401251TA true SG11201401251TA (en) 2014-08-28

Family

ID=48167376

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201401251TA SG11201401251TA (en) 2011-10-27 2012-10-04 Slurry and method for producing slurry

Country Status (8)

Country Link
US (1) US9260643B2 (en)
JP (1) JP5594273B2 (en)
KR (1) KR101887874B1 (en)
CN (1) CN103906601B (en)
DE (1) DE112012003990B4 (en)
SG (1) SG11201401251TA (en)
TW (1) TWI500478B (en)
WO (1) WO2013061519A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6432453B2 (en) 2015-06-23 2018-12-05 株式会社Sumco Wire saw device and workpiece cutting method
JP6604313B2 (en) 2016-11-10 2019-11-13 株式会社Sumco Abrasive Grain Evaluation Method and Wafer Manufacturing Method
CN106914804A (en) * 2017-03-28 2017-07-04 安庆机床有限公司 Integrated ball crusher
CN109530061B (en) * 2018-12-07 2020-11-03 徐州徐薯薯业科技有限公司 Wheat grinder

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1143923A (en) 1965-04-06 1969-02-26 Rank Xerox Ltd Improvements in polishing and polishing materials
JPS63114865A (en) 1986-10-30 1988-05-19 Shin Etsu Chem Co Ltd Ultra-precise polishing abrasive material
US6046110A (en) 1995-06-08 2000-04-04 Kabushiki Kaisha Toshiba Copper-based metal polishing solution and method for manufacturing a semiconductor device
JPH09314459A (en) * 1996-05-29 1997-12-09 Sanyo Chem Ind Ltd Water lap liquid composition
US6602439B1 (en) * 1997-02-24 2003-08-05 Superior Micropowders, Llc Chemical-mechanical planarization slurries and powders and methods for using same
GB2351294B (en) 1998-04-03 2002-06-26 Kao Corp Cutting oil composition
JP4248895B2 (en) 2003-02-27 2009-04-02 Sumco Techxiv株式会社 Slurry regeneration method and wire saw system
JP2006224266A (en) * 2005-02-18 2006-08-31 Sumco Corp Ingot cutting method with wire saw
JP5352872B2 (en) * 2007-03-15 2013-11-27 国立大学法人宇都宮大学 Method for producing composite particles for polishing
WO2010113678A1 (en) * 2009-03-31 2010-10-07 出光興産株式会社 Working fluid for brittle material and working fluid for hard material
JP4605298B1 (en) * 2009-07-03 2011-01-05 横浜ゴム株式会社 Pneumatic tire
JP2011171689A (en) * 2009-07-07 2011-09-01 Kao Corp Polishing liquid composition for silicon wafer
JP5499324B2 (en) * 2010-04-28 2014-05-21 旭硝子株式会社 Glass substrate for information recording medium, polishing colloidal silica slurry for manufacturing the same, and information recording medium

Also Published As

Publication number Publication date
KR101887874B1 (en) 2018-08-14
JP2013091141A (en) 2013-05-16
TW201336627A (en) 2013-09-16
DE112012003990B4 (en) 2021-07-08
DE112012003990T5 (en) 2014-06-12
US9260643B2 (en) 2016-02-16
KR20140103907A (en) 2014-08-27
WO2013061519A1 (en) 2013-05-02
US20150000208A1 (en) 2015-01-01
CN103906601B (en) 2017-06-20
CN103906601A (en) 2014-07-02
TWI500478B (en) 2015-09-21
JP5594273B2 (en) 2014-09-24

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