SG106057A1 - Magnet for generating a magnetic field in an ion source - Google Patents
Magnet for generating a magnetic field in an ion sourceInfo
- Publication number
- SG106057A1 SG106057A1 SG200104694A SG200104694A SG106057A1 SG 106057 A1 SG106057 A1 SG 106057A1 SG 200104694 A SG200104694 A SG 200104694A SG 200104694 A SG200104694 A SG 200104694A SG 106057 A1 SG106057 A1 SG 106057A1
- Authority
- SG
- Singapore
- Prior art keywords
- magnet
- generating
- magnetic field
- ion source
- ion
- Prior art date
Links
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US63332400A | 2000-08-07 | 2000-08-07 | |
US09/633,322 US6583544B1 (en) | 2000-08-07 | 2000-08-07 | Ion source having replaceable and sputterable solid source material |
Publications (1)
Publication Number | Publication Date |
---|---|
SG106057A1 true SG106057A1 (en) | 2004-09-30 |
Family
ID=33479356
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200104693A SG108825A1 (en) | 2000-08-07 | 2001-08-03 | Ion source having replaceable and sputterable solid source material |
SG200104694A SG106057A1 (en) | 2000-08-07 | 2001-08-03 | Magnet for generating a magnetic field in an ion source |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200104693A SG108825A1 (en) | 2000-08-07 | 2001-08-03 | Ion source having replaceable and sputterable solid source material |
Country Status (1)
Country | Link |
---|---|
SG (2) | SG108825A1 (en) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62271334A (en) * | 1986-05-16 | 1987-11-25 | Mitsubishi Electric Corp | Ion source for ion implantation device |
JPH05109365A (en) * | 1991-10-11 | 1993-04-30 | Japan Steel Works Ltd:The | Electronic cyclotron resonant ion source |
JPH09129151A (en) * | 1995-11-06 | 1997-05-16 | Hitachi Ltd | Negative ion source device |
JP2001160368A (en) * | 1999-12-01 | 2001-06-12 | Sumitomo Eaton Noba Kk | Ion source |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4016421A (en) * | 1975-02-13 | 1977-04-05 | E. I. Du Pont De Nemours And Company | Analytical apparatus with variable energy ion beam source |
US4166952A (en) * | 1978-02-24 | 1979-09-04 | E. I. Du Pont De Nemours And Company | Method and apparatus for the elemental analysis of solids |
US5262652A (en) * | 1991-05-14 | 1993-11-16 | Applied Materials, Inc. | Ion implantation apparatus having increased source lifetime |
US5497006A (en) * | 1994-11-15 | 1996-03-05 | Eaton Corporation | Ion generating source for use in an ion implanter |
US5703372A (en) * | 1996-10-30 | 1997-12-30 | Eaton Corporation | Endcap for indirectly heated cathode of ion source |
US5852345A (en) * | 1996-11-01 | 1998-12-22 | Implant Sciences Corp. | Ion source generator auxiliary device for phosphorus and arsenic beams |
JP3660457B2 (en) * | 1996-12-26 | 2005-06-15 | 株式会社東芝 | Ion generator and ion irradiation device |
-
2001
- 2001-08-03 SG SG200104693A patent/SG108825A1/en unknown
- 2001-08-03 SG SG200104694A patent/SG106057A1/en unknown
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62271334A (en) * | 1986-05-16 | 1987-11-25 | Mitsubishi Electric Corp | Ion source for ion implantation device |
JPH05109365A (en) * | 1991-10-11 | 1993-04-30 | Japan Steel Works Ltd:The | Electronic cyclotron resonant ion source |
JPH09129151A (en) * | 1995-11-06 | 1997-05-16 | Hitachi Ltd | Negative ion source device |
JP2001160368A (en) * | 1999-12-01 | 2001-06-12 | Sumitomo Eaton Noba Kk | Ion source |
Also Published As
Publication number | Publication date |
---|---|
SG108825A1 (en) | 2005-02-28 |
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