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SG10201913407TA - Manufacturing method of smoothing a semiconductor surface - Google Patents

Manufacturing method of smoothing a semiconductor surface

Info

Publication number
SG10201913407TA
SG10201913407TA SG10201913407TA SG10201913407TA SG10201913407TA SG 10201913407T A SG10201913407T A SG 10201913407TA SG 10201913407T A SG10201913407T A SG 10201913407TA SG 10201913407T A SG10201913407T A SG 10201913407TA SG 10201913407T A SG10201913407T A SG 10201913407TA
Authority
SG
Singapore
Prior art keywords
smoothing
manufacturing
semiconductor surface
semiconductor
Prior art date
Application number
SG10201913407TA
Inventor
Gang Wang
Charles Lottes
Sasha Kweskin
Original Assignee
Globalwafers Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Globalwafers Co Ltd filed Critical Globalwafers Co Ltd
Publication of SG10201913407TA publication Critical patent/SG10201913407TA/en

Links

Classifications

    • H10P90/1914—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/011—Manufacture or treatment of image sensors covered by group H10F39/12
    • H10F39/026—Wafer-level processing
    • H10P14/24—
    • H10P14/3411—
    • H10P14/3446—
    • H10P70/15—
    • H10P90/1916—
    • H10P95/906—
    • H10W10/181—
SG10201913407TA 2015-11-20 2016-11-15 Manufacturing method of smoothing a semiconductor surface SG10201913407TA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US201562257764P 2015-11-20 2015-11-20

Publications (1)

Publication Number Publication Date
SG10201913407TA true SG10201913407TA (en) 2020-03-30

Family

ID=57485896

Family Applications (2)

Application Number Title Priority Date Filing Date
SG10201913407TA SG10201913407TA (en) 2015-11-20 2016-11-15 Manufacturing method of smoothing a semiconductor surface
SG11201804271QA SG11201804271QA (en) 2015-11-20 2016-11-15 Manufacturing method of smoothing a semiconductor surface

Family Applications After (1)

Application Number Title Priority Date Filing Date
SG11201804271QA SG11201804271QA (en) 2015-11-20 2016-11-15 Manufacturing method of smoothing a semiconductor surface

Country Status (7)

Country Link
US (4) US10529616B2 (en)
EP (1) EP3378094B1 (en)
JP (1) JP6749394B2 (en)
CN (2) CN117198983A (en)
SG (2) SG10201913407TA (en)
TW (2) TWI693640B (en)
WO (1) WO2017087393A1 (en)

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Also Published As

Publication number Publication date
WO2017087393A1 (en) 2017-05-26
SG11201804271QA (en) 2018-06-28
JP2019501523A (en) 2019-01-17
TW201828364A (en) 2018-08-01
US20190333804A1 (en) 2019-10-31
US10985049B2 (en) 2021-04-20
EP3378094A1 (en) 2018-09-26
CN108780776B (en) 2023-09-29
US10529616B2 (en) 2020-01-07
EP3378094B1 (en) 2021-09-15
JP6749394B2 (en) 2020-09-02
CN108780776A (en) 2018-11-09
US10818539B2 (en) 2020-10-27
TWI693640B (en) 2020-05-11
US20200411364A1 (en) 2020-12-31
CN117198983A (en) 2023-12-08
TWI626690B (en) 2018-06-11
US10755966B2 (en) 2020-08-25
TW201730961A (en) 2017-09-01
US20190385901A1 (en) 2019-12-19
US20180330983A1 (en) 2018-11-15

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