SG10201501328WA - Controlled ambient system for interface engineering - Google Patents

Controlled ambient system for interface engineering

Info

Publication number: SG10201501328WA
Authority: SG; Singapore
Prior art keywords: controlled ambient; interface engineering; ambient system; engineering; interface
Prior art date: 2006-08-30

Application number

SG10201501328WA

Inventor

John Boyd

Yezdi Dordi

Tiruchirapalli Arunagiri

Benjamin W Mooring

John Parks

William Thie

Fritz C Redeker

Arthur M Howald

Alan Schoepp

David Hemker

Woods Carl

Alexander Yoon Hyungsuk

Owczarz Aleksander

Original Assignee

Lam Res Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2006-08-30

Filing date

2007-08-28

Publication date

2015-04-29

2006-08-30 Priority claimed from US11/513,634 external-priority patent/US8771804B2/en

2006-12-15 Priority claimed from US11/639,752 external-priority patent/US9117860B2/en

2006-12-15 Priority claimed from US11/611,758 external-priority patent/US20080057182A1/en

2007-08-28 Application filed by Lam Res Corp filed Critical Lam Res Corp

2015-04-29 Publication of SG10201501328WA publication Critical patent/SG10201501328WA/en

Classifications

- H10P72/0461—
- H10P14/20—
- H10P72/0402—
- H10P72/0468—
- H10P72/3304—
- H10P95/00—

SG10201501328WA 2006-08-30 2007-08-28 Controlled ambient system for interface engineering SG10201501328WA (en)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
US11/513,634 US8771804B2 (en)	2005-08-31	2006-08-30	Processes and systems for engineering a copper surface for selective metal deposition
US11/639,752 US9117860B2 (en)	2006-08-30	2006-12-15	Controlled ambient system for interface engineering
US11/611,758 US20080057182A1 (en)	2006-08-30	2006-12-15	Method for gap fill in controlled ambient system

Publications (1)

Publication Number	Publication Date
SG10201501328WA true SG10201501328WA (en)	2015-04-29

Family

ID=39136542

Family Applications (2)

Application Number	Title	Priority Date	Filing Date
SG2011062171A SG174750A1 (en)	2006-08-30	2007-08-28	Controlled ambient system for interface engineering
SG10201501328WA SG10201501328WA (en)	2006-08-30	2007-08-28	Controlled ambient system for interface engineering

Family Applications Before (1)

Application Number	Title	Priority Date	Filing Date
SG2011062171A SG174750A1 (en)	2006-08-30	2007-08-28	Controlled ambient system for interface engineering

Country Status (6)

Country	Link
JP (1)	JP5417174B2 (en)
KR (2)	KR101455955B1 (en)
CN (2)	CN101529556B (en)
SG (2)	SG174750A1 (en)
TW (1)	TWI447831B (en)
WO (1)	WO2008027386A2 (en)

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KR101455955B1 (en) *	2006-08-30	2014-10-31	램 리써치 코포레이션	Controlled ambient system for interface engineering
US9865501B2 (en) *	2013-03-06	2018-01-09	Lam Research Corporation	Method and apparatus for remote plasma treatment for reducing metal oxides on a metal seed layer
TWI584370B (en) *	2013-08-27	2017-05-21	東京威力科創股份有限公司	A substrate processing method, a substrate processing apparatus, and a memory medium
KR20170095829A (en) *	2014-12-23	2017-08-23	인텔 코포레이션	Decoupled via fill
US10249521B2 (en) *	2016-03-17	2019-04-02	Lam Research Ag	Wet-dry integrated wafer processing system
US10443146B2 (en)	2017-03-30	2019-10-15	Lam Research Corporation	Monitoring surface oxide on seed layers during electroplating
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CN120376473B (en) *	2025-06-26	2025-09-23	昆山科比精工设备有限公司	A transfer device for silicon wafer copper plating pretreatment

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KR101455955B1 (en) *	2006-08-30	2014-10-31	램 리써치 코포레이션	Controlled ambient system for interface engineering

2007
- 2007-08-28 KR KR1020137032044A patent/KR101455955B1/en active Active
- 2007-08-28 CN CN2007800402135A patent/CN101529556B/en active Active
- 2007-08-28 SG SG2011062171A patent/SG174750A1/en unknown
- 2007-08-28 SG SG10201501328WA patent/SG10201501328WA/en unknown
- 2007-08-28 WO PCT/US2007/018924 patent/WO2008027386A2/en not_active Ceased
- 2007-08-28 JP JP2009526680A patent/JP5417174B2/en active Active
- 2007-08-28 KR KR1020097006393A patent/KR101423350B1/en active Active
- 2007-08-28 CN CN201110044283.6A patent/CN102347210B/en active Active
- 2007-08-29 TW TW096131993A patent/TWI447831B/en active

Also Published As

Publication number	Publication date
TWI447831B (en)	2014-08-01
SG174750A1 (en)	2011-10-28
JP2010503210A (en)	2010-01-28
CN102347210B (en)	2015-08-05
KR20090069278A (en)	2009-06-30
KR101423350B1 (en)	2014-07-24
KR101455955B1 (en)	2014-10-31
CN101529556B (en)	2012-05-30
KR20140002811A (en)	2014-01-08
CN102347210A (en)	2012-02-08
WO2008027386A3 (en)	2008-08-21
TW200832586A (en)	2008-08-01
WO2008027386A2 (en)	2008-03-06
JP5417174B2 (en)	2014-02-12
CN101529556A (en)	2009-09-09

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